JP2008076924A - Exposure device, exposure method and method of manufacturing panel substrate for display - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To finely adjust quantity of light of exposure light by increasing an operation speed of a shutter. <P>SOLUTION: A shutter that blocks exposure light has a plurality of rotor plates 35a, 35b and allows the exposure light passing through a gap produced by rotation of the rotor plates to expose a substrate. Since the rotor plate 35a, 35b, unlike a shutter plate of a conventional rotary shutter mechanism, has a rotation axis R in a direction crossing the propagation direction of the exposure light and has a width W in a direction perpendicular to the rotation axis R, smaller than the optical path diameter of the exposure light, rotation of the shutter can be rapidly started and stopped. The operation speed of the shutter is therefore increased to reduce an open time of the shutter, and the quantity of light of the exposure light is finely adjusted. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an exposure apparatus that performs exposure of a substrate, an exposure method, and a method of manufacturing a display panel substrate using the same in manufacturing a display panel substrate such as a liquid crystal display device.

  Manufacturing of TFT (Thin Film Transistor) substrates, color filter substrates, plasma display panel substrates, organic EL (Electroluminescence) display panel substrates, etc. for liquid crystal display devices used as display panels is performed using an exposure apparatus, and photolithography. This is performed by forming a pattern on the substrate by a technique. The exposure apparatus transfers a mask pattern onto a substrate by irradiating the substrate coated with a photosensitive resin material (photoresist) with exposure light through the mask.

Generally, an exposure light irradiation device of an exposure apparatus includes a light source that generates exposure light and a shutter that blocks exposure light generated by the light source, and adjusts the exposure time by adjusting the opening time of the shutter, The amount of exposure light is kept constant. As a shutter mechanism of such an exposure light irradiation apparatus, for example, there is one described in Patent Document 1.
Japanese Patent Laid-Open No. 11-67656

  The amount of exposure light is proportional to the illuminance of the exposure light and the exposure time. In recent years, as the size of a substrate increases with an increase in the screen size of a display panel, a light source having a higher luminance has been used as a light source of an exposure light irradiation apparatus. The higher the brightness of the light source, the higher the illuminance of the exposure light, the shorter the exposure time, the shorter the tact time, and the higher the throughput.

  On the other hand, in recent years, as high-sensitivity photoresists are put into practical use, the amount of exposure light necessary for exposure has been reduced. When the illuminance of exposure light is high and the amount of exposure light necessary for exposure is small, the shutter opening time must be shortened to shorten the exposure time. However, as disclosed in Patent Document 1, in the conventional shutter in which two shutter plates are operated alternately, the shutter opening time cannot be made shorter than the operation time of each shutter plate.

  In addition, the conventional rotary shutter mechanism described as the prior art in Patent Document 1 requires a shutter plate that is twice or more the optical path diameter of the exposure light, and rapidly rotates a large shutter plate. Since it is difficult to start and stop at the same time, there is a limit to shortening the shutter opening time.

  An object of the present invention is to speed up the operation of the shutter and finely adjust the amount of exposure light. Another object of the present invention is to manufacture a high-quality substrate with a short tact time.

  In the exposure apparatus of the present invention, the shutter for blocking the exposure light has a rotation axis in a direction crossing the traveling direction of the exposure light, and a plurality of rotations whose width in the direction orthogonal to the rotation axis is smaller than the optical path diameter of the exposure light A substrate is provided, and the substrate is exposed by exposure light that has passed through a gap generated by the rotation of each rotating plate.

  Further, the exposure method of the present invention has a plurality of rotating shafts in the direction intersecting with the traveling direction of the exposure light as a shutter for blocking the exposure light, and the width in the direction orthogonal to the rotational axis is smaller than the optical path diameter of the exposure light. The rotating plate is provided, and the substrate is exposed by the exposure light that has passed through the gap generated by the rotation of each rotating plate.

  As a shutter that blocks exposure light, a plurality of rotating plates are provided, and the substrate is exposed by exposure light that has passed through the gap generated by the rotation of each rotating plate, so the amount of exposure light is adjusted by the rotation speed of the rotating plate. The Unlike the shutter plate of the conventional rotary shutter mechanism, each rotary plate has a rotation axis in the direction intersecting with the traveling direction of the exposure light, and the width in the direction orthogonal to the rotation axis is smaller than the optical path diameter of the exposure light. The rotation can be started and stopped rapidly. Accordingly, the speed of the shutter operation is increased, the shutter opening time can be shortened, and the amount of exposure light is finely adjusted.

  Further, by increasing the number of rotating plates, it is possible to cope with an increase in the optical path diameter of the exposure light while suppressing the width in the direction orthogonal to the rotation axis of each rotating plate.

  Furthermore, the exposure apparatus of the present invention is provided such that two adjacent rotating plates partially overlap when viewed in the traveling direction of the exposure light when blocking the exposure light. In the exposure method of the present invention, two adjacent rotating plates are provided so as to partially overlap when viewed in the traveling direction of the exposure light when the exposure light is blocked.

  If a plurality of rotating plates are arranged in a line when blocking exposure light, the edges of each rotating plate must be processed with high precision to prevent exposure light leakage, and each rotation The rotation axis of the plate must be adjusted with high accuracy. In the present invention, the two adjacent rotating plates are provided so as to partially overlap each other when viewed in the traveling direction of the exposure light when the exposure light is blocked, so that it is not necessary to process the edges of each rotating plate with high accuracy. There is no need to adjust the rotation axis of each rotating plate with high accuracy. Therefore, processing and adjustment of each rotating plate are facilitated.

  Further, in the exposure apparatus of the present invention, two adjacent rotating plates rotate in directions opposite to each other. In the exposure method of the present invention, two adjacent rotating plates are rotated in opposite directions.

  As described above, when two adjacent rotating plates are provided so as to partially overlap each other when viewed in the traveling direction of the exposure light when blocking the exposure light, if the two adjacent rotating plates are rotated in the same direction, In order to prevent the two rotating plates from colliding with each other, when they are opened, they must be rotated in the reverse direction when they are closed, or the two rotating plates have to be installed at a considerable distance in the traveling direction of the exposure light. In the present invention, two adjacent rotating plates are rotated in opposite directions, so that it is not necessary to rotate each rotating plate in the reverse direction, and driving of each rotating plate is facilitated. The collision between the two rotating plates can be prevented by simply placing the two rotating plates slightly apart in the direction of travel of the exposure light, so there is no risk of the exposure light diffracting and leaking, and the direction of travel of the exposure light Requires less installation area.

  The method for producing a display panel substrate of the present invention is to transfer the mask pattern onto the substrate using any one of the exposure apparatuses or exposure methods described above. By using the above exposure apparatus or exposure method, the operation of the shutter is accelerated and the amount of exposure light is finely adjusted, so that a high-quality substrate is manufactured with a short tact time.

  According to the exposure apparatus and the exposure method of the present invention, as a shutter for blocking exposure light, the exposure light has a rotation axis in a direction intersecting with the traveling direction of the exposure light, and the width in the direction orthogonal to the rotation axis is the optical path diameter of the exposure light. By providing a plurality of smaller rotating plates and exposing the substrate with exposure light that has passed through the gap generated by the rotation of each rotating plate, the shutter operation speed can be increased and the amount of exposure light can be finely adjusted. it can.

  Further, by increasing the number of rotating plates, it is possible to cope with an increase in the optical path diameter of the exposure light while suppressing the width in the direction orthogonal to the rotation axis of each rotating plate.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, two adjacent rotating plates are provided so as to partially overlap each other when viewed in the traveling direction of the exposure light when blocking the exposure light. And adjustment can be facilitated.

  Furthermore, according to the exposure apparatus and the exposure method of the present invention, it is possible to easily drive each rotary plate by rotating two adjacent rotary plates in opposite directions. The collision between the two rotating plates can be prevented by simply placing the two rotating plates slightly apart in the direction of travel of the exposure light, so there is no risk of the exposure light diffracting and leaking, and the direction of travel of the exposure light Requires less installation area.

  According to the display panel substrate manufacturing method of the present invention, the shutter operation speed can be increased and the amount of exposure light can be finely adjusted, so that a high-quality substrate can be manufactured in a short tact time. .

  FIG. 1 is a view showing the schematic arrangement of an exposure apparatus according to an embodiment of the present invention. This embodiment shows an example of a proximity exposure apparatus that transfers a mask pattern to a substrate by providing a minute gap (proximity gap) between the mask and the substrate. The exposure apparatus includes a base 3, an X guide 4, an X stage 5, a Y guide 6, a Y stage 7, a θ stage 8, a Z-tilt mechanism 9, a chuck 10, a mask holder 20, an exposure light irradiation device 30, and an input / output device 40. The integrated illuminometer 50, the control device 60, and the motor drive circuit 70 are configured. In addition to these, the exposure apparatus includes a carry-in unit for carrying in the substrate 1, a carry-out unit for carrying out the substrate 1, a temperature control unit for managing the temperature in the apparatus, and the like.

  In FIG. 1, the chuck 10 is at an exposure position where the substrate 1 is exposed. The mask 2 is held by the mask holder 20 above the exposure position. The substrate 1 is mounted on the chuck 10 by a carry-in unit (not shown) at a delivery position away from the exposure position, and is recovered from the chuck 10 by a carry-out unit (not shown).

  The chuck 10 is mounted on the θ stage 8 via a Z-tilt mechanism 9, and a Y stage 7 and an X stage 5 are provided below the θ stage 8. The X stage 5 moves in the X direction (the horizontal direction in the drawing) along the X guide 4 provided on the base 3. As the X stage 5 moves in the X direction, the chuck 10 moves between the delivery position and the exposure position. The Y stage 7 moves in the Y direction (the drawing depth direction) along the Y guide 6 provided on the X stage 5. The θ stage 8 rotates in the θ direction, and the Z-tilt mechanism 9 moves and tilts in the Z direction (vertical direction in the drawing).

  At the exposure position, the substrate 1 is positioned by moving the X stage 5 in the X direction, moving the Y stage 7 in the Y direction, and rotating the θ stage 8 in the θ direction. Further, the gap control between the mask 2 and the substrate 1 is performed by the movement and tilt of the Z-tilt mechanism 9 in the Z direction.

  An exposure light irradiation device 30 is provided above the mask holder 20. The exposure light irradiation device 30 includes a lamp 31, a condensing mirror 32, a first flat mirror 33, lenses 34a and 34b, a shutter 35, a collimator lens 36, a second flat mirror 37, and motors 38a and 38b. .

  The exposure light generated by the lamp 31 is condensed by the condenser mirror 32 and reflected by the first plane mirror 33. The exposure light reflected by the first plane mirror 33 is incident on a lens 34a composed of a fly-eye lens or a lot lens, and is transmitted through the lens 34a so that the illuminance distribution becomes uniform. When the shutter 35 is open, the exposure light that has passed through the shutter 35 enters a lens 34b made of a fly-eye lens, a lot lens, or the like, passes through the lens 34b, and the illuminance distribution becomes uniform again. Then, the light passes through the collimator lens 36 to become a parallel light beam, is reflected by the second plane mirror 37, and is applied to the mask 2.

  FIG. 2 is an external view of the shutter. 2A shows a state where the shutter is closed, and FIG. 2B shows a state where the shutter is opened. In the present embodiment, the shutter 35 is composed of two rotating plates 35a and 35b.

  The number of rotating plates constituting the shutter is not limited to this, and the shutter may be constituted by three or more rotating plates.

  The rotating plates 35a and 35b have a rotation axis R in a direction intersecting with the traveling direction of the exposure light indicated by an arrow, and the width W in the direction orthogonal to the rotation axis R is smaller than the optical path diameter of the exposure light. Motors 38a and 38b are connected to the rotation axes R of the rotary plates 35a and 35b, respectively. The motors 38a and 38b are driven by the motor drive circuit 70 of FIG. 1 to rotate the rotating plates 35a and 35b, respectively.

  In the present embodiment, the rotation axis R of the rotating plates 35a and 35b is substantially perpendicular to the traveling direction of the exposure light. However, in the present invention, the rotating axis of the rotating plate is parallel to the traveling direction of the exposure light. If there is no.

  As shown in FIG. 2 (a), the rotating plate 35a and the rotating plate 35b are installed at a distance L in the traveling direction of the exposure light, and when viewed from the traveling direction of the exposure light when the exposure light is blocked. It is provided to overlap. Therefore, when the shutter is closed, there is no gap between the rotating plates 35a and 35b when viewed in the direction of travel of the exposure light, and the exposure light is blocked by the rotating plates 35a and 35b. On the other hand, as shown in FIG. 2B, when the shutter is opened, a gap is generated on both sides of the rotating plates 35a and 35b due to the rotation of the rotating plates 35a and 35b, and the exposure light passes.

  If the rotating plates 35a and 35b are arranged in a line when the exposure light is blocked, the edges of the rotating plates 35a and 35b must be processed with high accuracy in order to prevent leakage of the exposure light. Further, the rotation axis R of the rotary plates 35a and 35b must be adjusted with high accuracy. In the present embodiment, the two adjacent rotating plates 35a and 35b are provided so as to partially overlap when viewed in the traveling direction of the exposure light when the exposure light is blocked, so that the edges of the rotating plates 35a and 35b are highly accurate. There is no need for processing, and there is no need to adjust the rotation axis R of the rotary plates 35a, 35b with high accuracy. Therefore, it becomes easy to process and adjust the rotating plates 35a and 35b.

  In FIG. 1, information such as the size of the substrate 1, the exposure time, and the amount of exposure light necessary for exposure of the substrate 1 is input to the input / output device 40. The control device 60 determines the rotation speed of the rotating plates 35 a and 35 b based on the information input to the input / output device 40 and outputs a rotation instruction signal to the motor drive circuit 70. The motor drive circuit 70 drives the motor 38a and the motor 38b according to the rotation instruction signal from the control device 60, synchronously controls both motors, and rotates the rotating plates 35a and 35b at the instructed rotation speed. The exposure apparatus exposes the substrate 1 with exposure light that has passed through a gap generated by the rotation of the rotating plates 35a and 35b.

  When the rotation of the rotary plates 35a and 35b is completed, the motor drive circuit 70 outputs an operation end signal to the control device 60. The integrating illuminometer 50 measures the amount of exposure light that has passed through the shutter 35, and outputs the measurement result to the control device 60. The control device 60 displays the measurement result of the integrated illuminometer 50 on the input / output device 40.

  3 and 4 are diagrams illustrating the operation of the shutter. 3 and 4 show a state in which the rotary plates 35a and 35b in FIG. 1 are viewed from above. In the present embodiment, when opening and closing the shutter, the two adjacent rotating plates 35a and 35b rotate in opposite directions.

  3 and 4, the rotating plate 35a is rotated counterclockwise and the rotating plate 35b is rotated clockwise. However, the rotating plate 35a is rotated clockwise and the rotating plate 35b is rotated counterclockwise. It may be rotated.

  In the standby state, as shown in FIG. 3A, the rotating plates 35a and 35b are perpendicular to the traveling direction of the exposure light, and the shutter is closed. First, the rotating plates 35a and 35b are rotated in the directions of the respective arrows to open the shutter. As shown in FIGS. 3B, 3C, and 3D, when the rotating plates 35a and 35b are rotated, a gap is generated on both sides of the two rotating plates as viewed in the traveling direction of the exposure light. However, the generated gap gradually increases. As shown in FIG. 3D, when the rotary plates 35a and 35b are rotated 90 degrees, the shutter is completely opened.

  Subsequently, the rotating plates 35a and 35b are further rotated in the directions of the arrows, respectively, and the shutter is closed. FIG. 4A shows the same state as FIG. As shown in FIGS. 4B, 4C, and 4D, when the rotating plates 35a and 35b are further rotated, they are generated on both sides of the two rotating plates as viewed in the traveling direction of the exposure light. The gap becomes gradually smaller. As shown in FIG. 4D, the rotation of the rotating plates 35a and 35b is stopped in a state where the rotating plates 35a and 35b are rotated by 180 degrees. At this time, the rotating plates 35a and 35b are again perpendicular to the traveling direction of the exposure light, and the shutter is closed.

  When two adjacent rotating plates 35a and 35b are provided so as to partially overlap when viewed in the traveling direction of the exposure light when blocking the exposure light, if the two adjacent rotating plates 35a and 35b are rotated in the same direction, In order to prevent the two rotating plates 35a and 35b from colliding with each other, when they are opened, they are reversely rotated when they are closed, or the two rotating plates 35a and 35b are installed at a considerable distance in the traveling direction of the exposure light. There must be. In the present embodiment, the two adjacent rotating plates 35a and 35b are rotated in opposite directions, so that it is not necessary to rotate the rotating plates 35a and 35b in reverse, and the driving of the rotating plates 35a and 35b is facilitated. Since the two rotating plates 35a and 35b can be prevented from colliding with each other by simply placing the two rotating plates 35a and 35b apart from each other in the advancing direction of the exposure light, there is no fear that the exposure light is diffracted and leaked, Further, the installation area in the traveling direction of the exposure light can be reduced.

  In the present embodiment, the amount of exposure light is adjusted by the rotational speed of the rotating plates 35a and 35b. When the rotation speed of the rotating plates 35a and 35b is decreased, the amount of exposure light increases, and when the rotation speed of the rotating plates 35a and 35b is increased, the amount of exposure light decreases.

  In this embodiment, the shutter is opened and closed by a series of operations. However, when the exposure time is long, the rotation of the rotating plates 35a and 35b is temporarily stopped in the state shown in FIG. May be. In this case, the amount of exposure light depends on the rotation speed of the rotating plates 35a and 35b and the stop time for temporarily stopping the rotation of the rotating plates 35a and 35b.

  Unlike the shutter plate of the conventional rotary shutter mechanism, the rotary plates 35a and 35b have a rotation axis R in the direction intersecting with the traveling direction of the exposure light, and the width W in the direction orthogonal to the rotation axis R is the width of the exposure light. Since it is smaller than the optical path diameter, the rotation can be started and stopped rapidly. Therefore, the motor drive circuit 70 can adjust the rotation speed of the rotating plates 35a and 35b from a low speed to a high speed over a wide range and with high precision, and the amount of exposure light can be controlled over a wide range and with high precision.

  According to the embodiment described above, the shutter 35 that blocks the exposure light has the rotation axis R in the direction intersecting with the traveling direction of the exposure light, and the width W in the direction orthogonal to the rotation axis R has the width of the exposure light. Rotating plates 35a and 35b smaller than the optical path diameter are provided, and the substrate 1 is exposed with exposure light that has passed through the gap generated by the rotation of the rotating plates 35a and 35b, thereby speeding up the shutter operation and reducing the amount of exposure light. Can be adjusted slightly.

  Further, by increasing the number of rotating plates, it is possible to cope with an increase in the optical path diameter of exposure light while suppressing the width W of each rotating plate in the direction orthogonal to the rotation axis R.

  Further, by providing two adjacent rotating plates 35a and 35b so as to partially overlap each other when viewed in the traveling direction of the exposure light when blocking the exposure light, the processing and adjustment of the rotating plates 35a and 35b can be facilitated. Can do.

  Further, the two rotating plates 35a and 35b that are adjacent to each other are rotated in opposite directions to facilitate driving of the rotating plates 35a and 35b. Since the two rotating plates 35a and 35b can be prevented from colliding with each other by simply placing the two rotating plates 35a and 35b apart from each other in the advancing direction of the exposure light, there is no fear that the exposure light is diffracted and leaked, Further, the installation area in the traveling direction of the exposure light can be reduced.

  The present invention can be applied not only to a proximity exposure apparatus but also to a projection exposure apparatus that projects a mask pattern onto a substrate using a lens or a mirror.

  By transferring the mask pattern to the substrate using the exposure apparatus or exposure method of the present invention, the shutter operation speed can be increased and the amount of exposure light can be finely adjusted. It can be manufactured with a short tact time.

  For example, FIG. 5 is a flowchart showing an example of the manufacturing process of the TFT substrate of the liquid crystal display device. In the thin film formation step (step 101), a thin film such as a conductor film or an insulator film, which becomes a transparent electrode for driving liquid crystal, is formed on a glass substrate by sputtering, plasma chemical vapor deposition (CVD), or the like. In the resist coating process (step 102), a photosensitive resin material (photoresist) is applied by a roll coating method or the like to form a photoresist film on the thin film formed in the thin film forming process (step 101). In the exposure step (step 103), the mask pattern is transferred to the photoresist film using a proximity exposure apparatus, a projection exposure apparatus, or the like. In the development step (step 104), a developer is supplied onto the photoresist film by a shower development method or the like to remove unnecessary portions of the photoresist film. In the etching process (step 105), a portion of the thin film formed in the thin film formation process (step 101) that is not masked by the photoresist film is removed by wet etching. In the stripping step (step 106), the photoresist film that has finished the role of the mask in the etching step (step 105) is stripped with a stripping solution. Before or after each of these steps, a substrate cleaning / drying step is performed as necessary. These steps are repeated several times to form a TFT array on the glass substrate.

  FIG. 6 is a flowchart showing an example of the manufacturing process of the color filter substrate of the liquid crystal display device. In the black matrix forming step (step 201), a black matrix is formed on the glass substrate by processes such as resist coating, exposure, development, etching, and peeling. In the colored pattern forming step (step 202), a colored pattern is formed on the glass substrate by a dyeing method, a pigment dispersion method, a printing method, an electrodeposition method, or the like. This process is repeated for the R, G, and B coloring patterns. In the protective film forming step (step 203), a protective film is formed on the colored pattern, and in the transparent electrode film forming step (step 204), a transparent electrode film is formed on the protective film. Before, during or after each of these steps, a substrate cleaning / drying step is performed as necessary.

  In the TFT substrate manufacturing process shown in FIG. 5, in the exposure process (step 103), in the color filter substrate manufacturing process shown in FIG. 6, in the black matrix forming process (step 201) and the colored pattern forming process (step 202). In this exposure process, the exposure apparatus or the exposure method of the present invention can be applied.

1 is a diagram showing a schematic configuration of an exposure apparatus according to an embodiment of the present invention. It is an external view of a shutter. It is a figure explaining operation | movement of a shutter. It is a figure explaining operation | movement of a shutter. It is a flowchart which shows an example of the manufacturing process of the TFT substrate of a liquid crystal display device. It is a flowchart which shows an example of the manufacturing process of the color filter board | substrate of a liquid crystal display device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Substrate 2 Mask 3 Base 4 X guide 5 X stage 6 Y guide 7 Y stage 8 θ stage 9 Z-tilt mechanism 10 Chuck 20 Mask holder 30 Exposure light irradiation device 31 Lamp 32 Condensing mirror 33 First plane mirror 34a, 34b Lens 35 Shutter 35a, 35b Rotating plate 36 Collimator lens 37 Second plane mirror 38a, 38b Motor 40 Input / output device 50 Integrated illuminance meter 60 Controller 70 Motor drive circuit

Claims (8)

The shutter that blocks the exposure light has a rotation axis in a direction intersecting the traveling direction of the exposure light, and includes a plurality of rotation plates whose width in the direction orthogonal to the rotation axis is smaller than the optical path diameter of the exposure light,
An exposure apparatus that exposes a substrate with exposure light that has passed through a gap generated by the rotation of each rotating plate.   2. The exposure apparatus according to claim 1, wherein two adjacent rotating plates are provided so as to partially overlap each other when viewed in the traveling direction of the exposure light when blocking the exposure light.   The exposure apparatus according to claim 2, wherein two adjacent rotating plates rotate in opposite directions. As a shutter for blocking exposure light, a plurality of rotation plates having a rotation axis in a direction intersecting with the traveling direction of the exposure light and having a width in a direction perpendicular to the rotation axis smaller than the optical path diameter of the exposure light are provided.
An exposure method comprising exposing a substrate with exposure light passing through a gap generated by rotation of each rotating plate.   The exposure method according to claim 4, wherein two adjacent rotating plates are provided so as to partially overlap each other when viewed in the traveling direction of the exposure light when blocking the exposure light.   6. The exposure method according to claim 5, wherein two adjacent rotating plates are rotated in opposite directions.   A method for manufacturing a display panel substrate, comprising: transferring a mask pattern onto the substrate using the exposure apparatus according to claim 1.   A method for manufacturing a display panel substrate, wherein a mask pattern is transferred to a substrate using the exposure method according to claim 4.

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