JP2008076218A - Visual inspection apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To reduce volume and observe the whole surface of a substrate. <P>SOLUTION: The substrate 2 is kept in a fixed state on a stage 11. An illumination section 3 for irradiating the substrate with illumination light is supported horizontally movably by an arm section 15 supported by the stage 11. An imaging section 4 for imaging the substrate irradiated by the illumination section 3 is supported horizontally movably by an arm section 19. An irradiation angle of the illumination section 3 according to the type of a defect and an imaging angle of the imaging section 4 are stored in a controlling means, and the irradiation angle and imaging angle are previously set according to the defect to be inspected. Without moving the substrate 2, the whole region of the substrate is inspected by horizontal movement by the arm sections while the irradiation angle of the illumination section 3 and the imaging angle of the imaging section 4 are kept constant. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an appearance inspection apparatus for inspecting a substrate such as a glass substrate or a semiconductor substrate for a liquid crystal display (LCD), for example.

Conventionally, in the field of flat panel displays such as liquid crystal displays (LCDs) and plasma displays (PDPs), in order to meet the demands for cost reduction by increasing the screen size and multi-facet, in the manufacturing process of flat panel displays, There is a tendency to increase in size. Such glass substrates are inspected for defects, and as a defect inspection method, macro inspection for visually inspecting foreign matters such as dust on the substrate and defects such as scratches are taken with a high magnification imaging camera. There is a micro-inspection that is magnified on a monitor.
When visual inspection such as macro inspection is performed, the substrate is placed on the stage and moved in the XY axis direction, or the stage is tilted to visually inspect the defect to be inspected.
However, in recent years, large-sized glass substrates have appeared that have become larger and have a side exceeding 2000 mm. In such a case, it is difficult to visually observe the defect by moving the substrate in the XY axis direction or tilting the stage.
Therefore, as one method of defect inspection, by moving the substrate in the X-Y direction and moving one of the illumination unit and the imaging camera, an image of the substrate in the region irradiated by the illumination unit is acquired by the imaging camera. Appearance inspection is performed by visual inspection on the monitor screen. In this case, since one of the illumination unit and the imaging camera is fixedly held, the irradiation angle to the inspection target region, the inspection angle, and the positional relationship between the illumination unit and the imaging camera are limited.

As an example of such a conventional technique, an appearance inspection apparatus described in Patent Document 1 has been proposed. In this apparatus, a substrate placed on a stage can be moved in one direction, and a low-magnification imaging camera is arranged on the upper side so as to be movable in another direction orthogonal to the one direction. As illumination means, a line light for irradiating the substrate from the lateral direction and a ring light fixed to a low-magnification imaging camera are provided.
The substrate on the stage, the imaging camera, and the ring light are integrally moved relative to each other in the orthogonal direction by the biaxial robot, and the image information captured by the imaging camera is displayed on the monitor to perform an appearance inspection. In this apparatus, the stage that supports the substrate and the imaging camera are configured to be movable in directions orthogonal to each other. The ring light is fixed to the imaging camera and is configured to move integrally.
JP 2001-305075 A

  However, in Patent Document 1, since the configuration is such that the substrate is moved together with the stage, an area for preventing interference is required around the stage, and the volume of the appearance inspection apparatus increases as the size of the substrate increases. There are drawbacks. In addition, since the ring light is integrally provided around the imaging camera, the irradiation angle of the illumination light with respect to the substrate and the imaging angle of the imaging camera are limited to a substantially vertical direction, and it is difficult to observe depending on the defect. Therefore, in Patent Document 1, the line light is fixedly arranged at a position different from the ring light and the substrate is selectively irradiated, but such a configuration has a drawback that it is complicated and expensive.

  In view of such circumstances, an object of the present invention is to provide an appearance inspection apparatus capable of inspecting the entire surface of the substrate while suppressing an increase in the volume of the apparatus even when the substrate is enlarged.

An appearance inspection apparatus according to the present invention includes a stage that holds a substrate for inspection in a fixed state, an illumination unit that irradiates illumination light to the substrate, an illumination unit moving mechanism that supports the illumination unit so as to be horizontally movable, An image pickup unit that picks up an image of the substrate irradiated by the illumination unit and an image pickup unit moving mechanism that supports the image pickup unit so as to be horizontally movable are provided.
Accordingly, the entire area of the substrate can be inspected by moving the illumination unit and the imaging unit in the horizontal direction while moving the illumination unit and the imaging unit by the illumination unit moving mechanism and the imaging unit movement mechanism without moving the substrate.

The illumination unit and the imaging unit may be disposed on the surface side of the substrate, and defects on the surface of the substrate can be inspected with reflected light.
Further, the illumination unit and the imaging unit may be disposed on both sides of the substrate, and a defect on the surface of the substrate can be inspected with transmitted light.
The illumination unit and the imaging unit may be horizontally movable individually or integrally.
The inspection target portion of the substrate can be inspected by holding the illumination unit and the imaging unit in a predetermined positional relationship and horizontally moving separately or integrally with the illumination unit moving mechanism and the imaging unit moving mechanism.
The illumination unit moving mechanism may be an arm unit that supports the illumination unit, and the imaging unit moving mechanism may be an arm unit that supports the imaging unit.

An appearance inspection apparatus according to the present invention includes a stage that holds a substrate for inspection in a fixed state, an illumination unit that irradiates illumination light to the substrate, an imaging unit that captures an image of the substrate irradiated by the illumination unit, and an illumination unit And a support unit that supports the imaging unit, and a moving mechanism that horizontally moves the support unit.
The illuminating unit and the imaging unit can be moved together in a state in which the positional relationship between the illuminating unit and the imaging unit is kept constant by horizontally moving the support unit by the moving mechanism.

Further, the support part may be formed in a substantially ring shape, and at least one of the illumination part and the imaging part may be movable along the support part.
Depending on the type of defect to be inspected, the illuminating unit on the support unit and the imaging unit are arranged at a position facing each other or a position not facing each other, and the part to be inspected is reflected by reflected light or irregularly reflected light on the substrate. Can be imaged and observed. Defects on the substrate can be observed with specularly reflected light, and irregularly reflected light is preferable for observing foreign matters on the substrate.
Further, the moving mechanism may include an arm portion. Alternatively, the moving mechanism may include an X-axis rail and a Y-axis rail that are arranged in directions orthogonal to each other and support the support portion so as to be movable in the X-axis and Y-axis directions.
The illumination unit may include an adjustment mechanism that can adjust the irradiation angle of the illumination light with respect to the substrate, and the imaging unit may include an adjustment mechanism that can adjust the imaging angle of the imaging light with respect to the substrate.
In this case, the irradiation angle of the illumination unit with respect to the substrate set by the adjustment mechanism and the imaging angle of the imaging unit are set according to the type of defect to be inspected, and the horizontal movement can be performed while maintaining this positional relationship.

  According to the appearance inspection apparatus of the present invention, by fixing the substrate and moving the imaging unit and the illumination unit in the horizontal direction, the volume of the device can be suppressed even if the size of the substrate increases, and the entire area of the substrate can be suppressed. Can be easily observed.

Hereinafter, embodiments of the present invention will be described in detail with reference to the drawings.
An appearance inspection apparatus according to a first embodiment of the present invention will be described with reference to FIGS.
FIG. 1 is a side view of an essential part showing an appearance inspection unit of an appearance inspection apparatus according to a first embodiment of the present invention, FIG. 2 is a plan view of an essential part of the appearance inspection apparatus, and FIG. 3 shows a mechanism for adjusting an irradiation angle of an illumination part. It is a side view.
An appearance inspection apparatus 1 shown in FIG. 1 shows an appearance inspection unit. For example, a thin substrate 2 such as a glass substrate used for a liquid crystal display (LCD) or a plasma display (PDP) is placed on a stage 11 and fixed. Is retained. The glass substrate 2 is formed in a substantially square or rectangular plate shape of, for example, 2 m × 2 m or more, and an illumination unit 3 and an imaging unit 4 held at a predetermined angle are disposed above the glass substrate 2 in a horizontal direction. It is possible to move to.
The illumination unit 3 includes an illumination light source, a condenser lens system, and the like, and irradiates the inspection target site S that is a partial region of the surface of the substrate 2. The illumination light irradiation angle θ 1 is the light of the illumination light on the substrate 2. Set by axis O1. The imaging unit 4 is configured by an imaging camera or the like and images the inspection target part S on the surface of the substrate 2, and the imaging angle θ <b> 2 of the imaging light is set by the optical axis O <b> 2 of the imaging light with respect to the substrate 2.
The appearance inspection apparatus 1 according to the present embodiment is configured to observe an image picked up by the image pickup unit 4 on a monitor screen instead of the visual observation of the inspector. The image of the inspection target part S of the substrate 2 imaged by the imaging unit 4 is displayed on a monitor screen (not shown), and the inspector has no foreign matter such as dust or defects such as scratches on the inspection target part S of the substrate 2 through the monitor screen. Observe visually.

The appearance inspection apparatus 1 shown in FIG. 2 is a plan view showing a basic configuration including the appearance inspection section shown in FIG.
The substrate 2 is placed on the stage 11 in FIG. 2, and the four peripheral portions are fixed and held by, for example, suction means. Two support shafts 12 and 13 are held upright on the outside of the opposite sides of the substrate 2 on the stage 11. In the illumination system 14 having the illumination unit 3, an arm unit 15 is disposed on the support shaft 12 so as to be horizontally movable. The arm unit 15 is supported on the support shaft 12 so as to be horizontally rotatable, The rotation support shaft 15b is connected to the other end of the one arm 15a, and the second arm 15c is horizontally rotatable with respect to the rotation support shaft 15b. A base 16 for mounting and supporting the illumination unit 3 is connected to the free end of the second arm 15c as a first support unit.
In the imaging system 18 having the imaging unit 4, an arm unit 19 is disposed on the support shaft 13 so as to be horizontally movable. The arm unit 19 is supported on the support shaft 13 so as to be horizontally rotatable, The rotation support shaft 19b is connected to the other end of the one arm 19a, and the second arm 19c is horizontally rotatable about the rotation support shaft 19b. A pedestal 20 for mounting and supporting the imaging unit 4 is connected to the free end of the second arm 19c as a second support unit.

In FIG. 3, the pedestal 16 of the illumination system 14 is provided with an adjustment mechanism 21 that can adjust the depression angle, which is the irradiation angle θ <b> 1 with respect to the substrate 2, according to the type of defect.
In the adjustment mechanism 21, a base 23 that can be rotated in the vertical direction by the shaft portion 22 is provided on the distal end side (in the direction of the imaging unit 4) of the base 16, and the illumination unit 3 is fixedly held on the base 23. A ball screw 24 is attached to the rear end side of the pedestal 16, a motor M 1 is fixed to the pedestal 16 at the base of the ball screw 24, and the tip is connected to the base 23. A long hole 23a is formed in the base 23, and a pin 24b inserted in the long hole 23a is slidably held in a nut portion 24a that is screwed into the ball screw 24.
The motor M1 is connected to a control means 25 for storing the irradiation angle θ1 and the imaging angle θ2 corresponding to the type of defect and outputting them to the motor M1, and the control means 25 indicates the type of defect to be inspected. Input means 26 for inputting is connected.
Here, the irradiation angle θ1 and the imaging angle θ2 are basically different values, but may be set to the same value. The appearance of the defect changes depending on the irradiation angle θ1 and the imaging angle θ2 with respect to the inspection target site S of the substrate 2. Further, the irradiation angle θ1 and the imaging angle θ2 are changed by the control means 25 in accordance with the type of defect, such as whether the defect to be observed is dust, scratch or film irregularity. Therefore, as described above, the irradiation angle θ1 and the imaging angle θ2 of the illumination unit 3 and the imaging unit 4 are set in advance as a positional relationship according to the defect to be observed and registered in the memory of the control unit 25.

Then, the motor M1 is driven by an input from the input means 26 and an instruction from the control means 25, the ball screw 24 rotates forward and backward, and the nut portion 24a moves up and down. As the pin 24b moves up and down integrally with the vertical movement of the nut portion 24a, the base 23 rotates about the shaft portion 22 as the slide moves in the long hole 23a, and the irradiation angle θ1 of the illumination unit 3 is adjusted. . The imaging system 14 is also provided with an adjustment mechanism 21 having the same structure as that of the illumination system 13 for adjusting the imaging angle θ2, and the motor M1 is connected to the control means 25.
Further, when the illuminating unit 3 and the imaging unit 4 are horizontally moved, for example, the arm units 15 and 19 may be manually operated with a joystick or the like, and may be horizontally moved simultaneously or individually.
FIG. 4 shows a modification of the adjustment mechanism 21 of the illumination unit 3 and the imaging unit 4. In the drawing, a shaft portion 22 is inserted through the hole of the pedestal 16, and an output shaft of the motor M1 is connected to the shaft portion 22 in advance. A base 23 is connected to the shaft 22. The base 23 may be rotated in the vertical direction according to the rotational drive of the motor M1, and the irradiation angle θ1 (imaging angle θ2) of the illumination unit 3 (imaging unit 4) may be set to be adjustable.
Since the inspection target site S on the substrate 2 that is irradiated at the irradiation angle θ1 of the illumination unit 3 is imaged at the imaging angle θ2 of the imaging unit 4, the irradiation angle θ1 and the imaging angle θ2 are set and the arm units 15 and 19 are used. By moving the illumination unit 3 and the imaging unit 4 horizontally, the positional relationship such as the distance between the illumination unit 3 and the imaging unit 4 is also maintained substantially constant.

The appearance inspection apparatus 1 according to the present embodiment has the above-described configuration, and when performing macro observation of the presence or absence of defects on the surface of the substrate 2, first, via the input unit 26 according to the type of defect to be observed. The irradiation angle θ1 and the imaging angle θ2 of each adjustment mechanism 21 are adjusted by the control means 25, and the positional relationship between the illumination unit 3 and the imaging unit 4 is set.
Then, a part of the area to be observed on the surface of the substrate 2 is set, and the arms 15 and 19 are horizontally rotated around the support shafts 12 and 13 and the rotation shafts 15b and 19b with a joystick or the like, and the illumination unit 3 In addition, the imaging unit 4 is individually aligned with the first area to be observed. The illumination unit 3 irradiates the inspection target site S with illumination light, the imaging unit 4 captures an image, and the inspector visually observes it via the monitor screen.
Next, the region to be observed on the substrate 2 is moved to another, and similarly, the arms 15 and 19 are horizontally moved, and the illumination unit 3 and the imaging unit 4 are held at predetermined positions to perform illumination and imaging. In this way, the entire surface of the substrate 2 is visually observed on the monitor screen to inspect for the presence of defects.
It is to be noted that a part likely to be defective on the surface of the substrate 2 is visually selected, the illumination unit 3 and the imaging unit 4 are moved to the inspection target site S, irradiated and imaged, and the presence or absence of the defect is confirmed on the monitor screen. It may be.

  As described above, according to the appearance inspection apparatus 1 of the first embodiment, the irradiation angle θ1 set according to the type of defect to be inspected for the illumination unit 3 and the imaging unit 4 without moving the substrate 2, and While maintaining the imaging angle θ2, it is possible to horizontally inspect and inspect each inspection target site S on the substrate 2 on the monitor screen. Therefore, even if the board | substrate 2 enlarges, the enlargement of an apparatus can be suppressed. Further, it is convenient that the illumination unit 3 and the imaging unit 4 can be set in advance at arbitrary angles θ1 and θ2 according to the type of defect.

  FIG. 5 shows a modified example of the appearance inspection apparatus according to the first embodiment. In this appearance inspection apparatus 1, the illumination unit 3 and the imaging unit 4 held horizontally by the arm units 15 and 19 are connected. The members 27 are connected to each other. Therefore, when the illuminating unit 3 and the imaging unit 4 are horizontally moved by the arm units 15 and 19, the illuminating unit 3 and the imaging unit 4 can be moved together while maintaining the same interval and posture. Therefore, the inspection target site S of the substrate 2 can always be observed under the same conditions including the irradiation angle θ1 and the imaging angle θ2.

Next, another embodiment of the present invention will be described, but the same or similar parts and members as those in the first embodiment will be described using the same reference numerals.
A second embodiment of the present invention will be described with reference to FIG. FIG. 6 is a side view of the main part of the appearance inspection apparatus 28.
The appearance observation device 28 according to the second embodiment is intended to capture the transmitted light of the substrate 2 by the illumination unit 3 with the imaging unit 4 and visually observe the image through the monitor screen. As the substrate 2 for transmission observation, for example, there is a color filter of a liquid crystal substrate. Since the liquid crystal panel is observed through the backlight, the color filter's red, blue, and green primary color thin films can each observe a unique color, or the uniform three primary colors can be observed without color unevenness. It is used for visual inspections such as whether there are defects such as holes and scratches.
In the appearance inspection apparatus 28 shown in FIG. 6, the substrate 2 is supported by a stage 11 (not shown). A support shaft 29 disposed in the horizontal direction is disposed on one side of the stage 11. On the support shaft 29, the illumination unit 3 and the arm unit 15 are disposed on one side, for example, the back side, with the substrate 2 (and the stage 11) in between, and the imaging unit 4 and the arm unit 19 are disposed on the other side, for example, the front side. Is arranged.

The arm parts 15 and 19 have substantially the same function as in the first embodiment. That is, the arm portion 15 of the illuminating portion 3 is configured such that the first arm 15a can be rotated in the vertical direction with respect to the support shaft 29, and the height (distance from the substrate 2) can be adjusted. A rotation support shaft 15b connected to the other end of the first arm 15a supports the second arm 15c so as to be horizontally rotatable. The pedestal 16 of the illumination unit 3 is supported on the free end of the second arm 15c. The pedestal 16 is provided with an adjusting mechanism 21 so that the irradiation angle θ1 with respect to the substrate 2 can be adjusted.
The arm portion 19 of the imaging unit 4 has a first arm 19a that can be turned in the vertical direction with respect to the support shaft 29, and a rotation support shaft 19b that is connected to the other end of the first arm 19a. 19c is supported so that horizontal rotation is possible. A pedestal 20 of the imaging unit 4 is supported on the free end of the second arm 19c. In the pedestal 20, the adjustment mechanism 21 can adjust the imaging angle θ <b> 2 of the imaging unit 4 with respect to the substrate 2.
The illumination angle θ1 and the imaging angle θ2 may be set to a right angle with respect to the substrate 2, that is, 90 degrees, or may be inclined to an appropriate angle.

According to the appearance inspection apparatus 28 according to the present embodiment, the arm portion 15 of the arm portions 15 and 19 is rotated around the support shaft 29 toward the back side of the substrate 2. Then, the arm portions 15 and 19 are appropriately moved in the horizontal direction so that the illumination unit 3 is disposed on the back surface side and the imaging unit 4 is disposed on the front surface side with respect to the inspection target site S of the substrate 2 so as to face each other at an appropriate angle. . The illumination unit 3 irradiates the back surface of the substrate 2, the surface of the substrate 2 through which the transmitted light is transmitted is imaged by the imaging unit 4, and the captured image can be transmitted and observed through the monitor screen.
Note that the imaging unit 4 may be disposed on the back side of the illumination unit 3 with respect to the substrate 2.

Next, FIG. 7 is a main part side view showing a modification of the appearance inspection apparatus 28 according to the second embodiment.
The appearance inspection apparatus 31 according to this modification is not provided with a common support shaft 29 for the two arm portions 15 and 19, and the first arm 15 a and 19 a of the arm portions 15 and 19 are supported so as to be horizontally rotatable. Dynamic support shafts 12 and 13 are provided. As a result, the arm portions 15 and 19 can be horizontally rotated in two stages with respect to the rotation support shafts 12 and 13 on the base end side.

Next, a third embodiment of the present invention will be described with reference to FIGS. FIG. 8 is a main part plan view showing the basic configuration of the appearance inspection apparatus, and FIG. 9 is a perspective view of the support ring.
In the figure, a support shaft 36 is held upright on the stage 11 on which the substrate 2 is placed in the appearance inspection apparatus 35, and the arm portion 15 is supported on the support shaft 36 so as to be horizontally rotatable. The arm portion 15 has substantially the same configuration as described above, and includes a first arm 15a, a rotation support shaft 15b, and a second arm 15c. A hollow support ring 37 having a substantially ring shape is cantilevered at the free end of the second arm 15 c, and the illumination unit 3 and the imaging unit 4 are held on the support ring 37.
Next, the structure of the support ring 37 will be described with reference to FIG. A ring-shaped rail 39 is formed on the support ring 37, and the illumination unit 3 and the imaging unit 4 are slidably supported on the rail 39 along the rail 39. Although not shown in the figure, the illumination unit 3 and the imaging unit 4 are each provided with an adjustment mechanism 21 as shown in FIG. 3 or FIG. The illuminating unit 3 irradiates the inspection target site S of the substrate 2 positioned below through the inner hollow portion of the support ring 37, and causes the reflected light on the surface of the substrate 2 to enter the imaging unit 4 to inspect the inspection target site S. It is comprised so that it may image.
The illumination angle θ1 and the imaging angle θ2 of the illumination unit 3 and the imaging unit 4 are appropriately set by the input unit 26 and the control unit 25 according to the type of defect to be observed.

Further, on the back surfaces of the pedestals 16 and 20 of the illumination unit 3 and the imaging unit 4, a rail receiver seated on the rail 39, and a motor or a wheel that slides the illumination unit 3 and the imaging unit 4 along the rail 39 are driven. It is assumed that the part is attached (omitted in the figure). Therefore, the position of the illumination unit 3 and the imaging unit 4 on the rail 39 can be adjusted.
In addition, even if the relative position between the illumination unit 3 and the imaging unit 4 changes, an overlapping region between the irradiation region on the substrate 2 irradiated by the illumination unit 3 and the imaging region on the substrate 2 imaged by the imaging unit 4 is determined as a region to be inspected. S. In particular, if the irradiation angle θ1 and the imaging angle θ2 are made equal, even if the positions of the illumination unit 3 and the imaging unit 4 on the rail 39 change in an arbitrary circumferential direction, the examination target site S can be reliably irradiated and imaged.
For example, when detecting a general defect on the surface of the substrate 2, the imaging unit 4 may be disposed at a position facing the illumination unit 3 at approximately 180 degrees. In this case, only the regular reflection light of the irradiation light from the illumination unit 3 is incident on the imaging unit 4 so that the defect can be imaged clearly. In addition, when detecting a foreign object such as dust or an irregular defect such as a scratch, only the irregularly reflected light is captured by moving the imaging unit 4 to a position shifted from the position facing the illumination unit 3. 4 so that defects such as foreign matter and scratches on the substrate 2 can be reliably detected and observed.

  As described above, according to the visual inspection apparatus 35 according to the present embodiment, the support ring 37 having the illumination unit 3 and the imaging unit 4 can be cantilevered by the arm unit 15, and the illumination unit 3 and the imaging unit 4 are mounted on the rail 39. Since the sliding movement is possible, the position of the illumination unit 3 and the imaging unit 4 and the positional relationship in which the angles θ1 and θ2 are set can be maintained, and defects on the entire surface of the substrate 2 can be observed. And since the specular reflection light and irregular reflection light projected on a defect can be selected arbitrarily and can be imaged with the imaging part 4, even if it is a defect which is hard to see from one direction, it can observe reliably.

Next, a fourth embodiment of the present invention will be described with reference to FIGS. 10 is a plan view of the main part of the appearance inspection apparatus, and FIG. 11 is a side longitudinal sectional view of FIG.
10 and 10, the visual inspection apparatus 40 has the substrate 2 placed on the stage 11, and X guides 41, 41 are disposed on the stage 11 outside the two opposite sides of the substrate 2. Yes. An X-axis rail 42 is stretched over the X guides 41 and 41 so as to be slidable along the arrangement direction of the X guides 41 and 41. In addition, Y guides 44 and 44 are disposed on the stage 11 outside the other two opposite sides of the substrate 2. A Y-axis rail 45 is stretched over the Y guides 44 and 44 so as to be slidable along the arrangement direction of the Y guides 44 and 44.
The X-axis rail 42 and the Y-axis rail 45 are orthogonal to each other.

A substantially cylindrical first holding frame 46a is slidably fitted on the X-axis rail 42, and a second holding frame 46b slidable on the Y-axis rail 45 is connected to the first holding frame 46a. . A support ring 48 having substantially the same configuration as that of the support ring 37 according to the third embodiment is suspended from the holding frame 46 including the first holding frame 46 a and the second holding frame 46 b via an arm portion 47. The lower surface 48 a of the support ring 48 faces the substrate 2, and a concentric rail 39 is provided on the lower surface 48 a, and the illumination unit 3 and the imaging unit 4 are slidably held by the bases 16 and 20 on the rail 39. Has been.
The illumination unit 3 and the imaging unit 4 are appropriately set with an irradiation angle θ1 and an imaging angle θ2 with respect to the surface of the substrate 2 by the adjusting mechanism 21, respectively.
The support ring 48 can be slid in the X-Y direction along the X-axis rail 42 and the Y-axis rail 45 by the holding frame 46, and the irradiation unit 3 can inspect the irradiation light over the entire surface of the substrate 2. The part S can be irradiated, and the examination part S can be imaged by the imaging unit 4 and observed through the monitor screen. Further, the illumination unit 3 and the imaging unit 4 can be held at a position facing the rail 39 or a position shifted from the facing position.
The appearance inspection apparatus 40 according to this embodiment can achieve the same effects as those of the third embodiment.

In each of the embodiments described above, the illumination unit 3 and the imaging unit 4 are each provided with the adjustment mechanism 21 that adjusts the irradiation angle θ1 and the imaging angle θ2, but may be provided only in one of them.
Moreover, although the arm parts 15 and 19 comprised one or two rotation support shafts 15b and 19b, you may provide three or more.
In addition, although the ring-shaped support rings 37 and 48 are provided as support parts for the illumination unit and the imaging unit, the support unit may not be ring-shaped, for example, a substantially rectangular shape or a substantially U-shape or plate in plan view. What is necessary is just to be able to support an illumination part and an imaging part integrally, such as a shape. The connecting member 27 also corresponds to the support portion.

It is a principal part side view which shows the principle of the external appearance inspection part of the external appearance inspection apparatus by 1st embodiment of this invention. It is a principal part top view of the external appearance inspection apparatus by 1st embodiment. It is a side view which shows the adjustment mechanism of the irradiation angle with respect to the board | substrate of an illumination part. It is a side view which shows the modification of the adjustment mechanism shown in FIG. It is a principal part top view which shows the modification of the external appearance inspection apparatus by 1st embodiment. It is a principal part side view of the external appearance inspection apparatus by 2nd embodiment of this invention. It is a principal part side view which shows the modification of the external appearance inspection apparatus by 2nd embodiment. It is a principal part top view of the external appearance inspection apparatus by 3rd embodiment of this invention. It is a perspective view of the support ring of the appearance inspection apparatus shown in FIG. It is a principal part top view of the external appearance inspection apparatus by 4th embodiment of this invention. It is a principal part longitudinal cross-sectional view of the external appearance inspection apparatus shown in FIG.

Explanation of symbols

1, 28, 35, 40 Appearance inspection apparatus 2 Substrate 3 Illuminating unit 4 Imaging unit 11 Stage 15 Arm unit (illuminating unit moving mechanism, moving mechanism)
19 Arm part (imaging part moving mechanism)
21 Adjustment mechanism 25 Control means 27 Connecting member 37, 48 Support ring (support part)
39 Rail 42 X-axis rail 45 Y-axis rail 46 Holding frame

Claims (11)

A stage for holding the inspection substrate in a fixed state;
An illumination unit for illuminating the substrate with illumination light;
An illumination unit moving mechanism that supports the illumination unit so as to be horizontally movable; an imaging unit that images the substrate irradiated by the illumination unit;
An appearance inspection apparatus comprising: an imaging unit moving mechanism that supports the imaging unit so as to be horizontally movable.   The appearance inspection apparatus according to claim 1, wherein the illumination unit and the imaging unit are disposed on a surface side of the substrate.   The visual inspection apparatus according to claim 1, wherein the illumination unit and the imaging unit are disposed on both sides of the substrate.   The visual inspection apparatus according to claim 1, wherein the illumination unit and the imaging unit are horizontally movable individually or integrally.   The appearance inspection apparatus according to claim 1, wherein the illumination unit moving mechanism is an arm unit that supports the illumination unit, and the imaging unit movement mechanism is an arm unit that supports the imaging unit. A stage for holding the inspection substrate in a fixed state;
An illumination unit for illuminating the substrate with illumination light;
An imaging unit for imaging an area of the substrate irradiated by the illumination unit;
An appearance inspection apparatus comprising: a support unit that supports the illumination unit and the imaging unit; and a moving mechanism that horizontally moves the support unit.   The appearance inspection apparatus according to claim 6, wherein the support part is formed in a substantially ring shape, and at least one of the illumination part and the imaging part is movable along the support part.   The appearance inspection apparatus according to claim 6 or 7, wherein the moving mechanism includes an arm portion.   The said moving mechanism is arrange | positioned in the direction orthogonal to each other, The X-axis rail and Y-axis rail which support the said support part so that a movement is possible to a X-axis and a Y-axis direction are provided. Appearance inspection device.   The visual inspection apparatus according to claim 1, wherein the illumination unit includes an adjustment mechanism capable of adjusting an irradiation angle of illumination light to the substrate.   The appearance inspection apparatus according to claim 1, wherein the imaging unit includes an adjustment mechanism capable of adjusting an imaging angle of imaging light with respect to a substrate.

Images