JP2008059945A - Method of manufacturing electronic device - Google Patents
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- JP2008059945A JP2008059945A JP2006236616A JP2006236616A JP2008059945A JP 2008059945 A JP2008059945 A JP 2008059945A JP 2006236616 A JP2006236616 A JP 2006236616A JP 2006236616 A JP2006236616 A JP 2006236616A JP 2008059945 A JP2008059945 A JP 2008059945A
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- 238000004519 manufacturing process Methods 0.000 title claims abstract description 31
- 239000000758 substrate Substances 0.000 claims abstract description 76
- 239000000203 mixture Substances 0.000 claims abstract description 41
- -1 oxetane compound Chemical class 0.000 claims abstract description 25
- 238000007789 sealing Methods 0.000 claims abstract description 22
- 238000000034 method Methods 0.000 claims abstract description 20
- 150000001875 compounds Chemical class 0.000 claims abstract description 19
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- 239000003505 polymerization initiator Substances 0.000 claims abstract description 8
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims abstract description 7
- 229910019142 PO4 Inorganic materials 0.000 claims abstract description 5
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- 230000001678 irradiating effect Effects 0.000 claims abstract description 5
- NBIIXXVUZAFLBC-UHFFFAOYSA-K phosphate Chemical compound [O-]P([O-])([O-])=O NBIIXXVUZAFLBC-UHFFFAOYSA-K 0.000 claims abstract description 5
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- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 3
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 3
- UNMJLQGKEDTEKJ-UHFFFAOYSA-N (3-ethyloxetan-3-yl)methanol Chemical compound CCC1(CO)COC1 UNMJLQGKEDTEKJ-UHFFFAOYSA-N 0.000 description 2
- ZJBRIMSSHOGNHL-UHFFFAOYSA-N 2-[3-[4-[4-[2,3-bis(2-hydroxyethyl)phenyl]sulfanylphenyl]sulfanylphenyl]sulfanyl-2-(2-hydroxyethyl)phenyl]ethanol Chemical compound C1=CC(=C(C(=C1)SC2=CC=C(C=C2)SC3=CC=C(C=C3)SC4=CC=CC(=C4CCO)CCO)CCO)CCO ZJBRIMSSHOGNHL-UHFFFAOYSA-N 0.000 description 2
- BIDWUUDRRVHZLQ-UHFFFAOYSA-N 3-ethyl-3-(2-ethylhexoxymethyl)oxetane Chemical compound CCCCC(CC)COCC1(CC)COC1 BIDWUUDRRVHZLQ-UHFFFAOYSA-N 0.000 description 2
- LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 2
- 239000006087 Silane Coupling Agent Substances 0.000 description 2
- PFHLXMMCWCWAMA-UHFFFAOYSA-N [4-(4-diphenylsulfoniophenyl)sulfanylphenyl]-diphenylsulfanium Chemical compound C=1C=C([S+](C=2C=CC=CC=2)C=2C=CC=CC=2)C=CC=1SC(C=C1)=CC=C1[S+](C=1C=CC=CC=1)C1=CC=CC=C1 PFHLXMMCWCWAMA-UHFFFAOYSA-N 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000011256 inorganic filler Substances 0.000 description 2
- 229910003475 inorganic filler Inorganic materials 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 239000011159 matrix material Substances 0.000 description 2
- 125000000956 methoxy group Chemical group [H]C([H])([H])O* 0.000 description 2
- 125000003566 oxetanyl group Chemical group 0.000 description 2
- 229910000077 silane Inorganic materials 0.000 description 2
- 125000006850 spacer group Chemical group 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- OVSKIKFHRZPJSS-UHFFFAOYSA-N 2,4-D Chemical compound OC(=O)COC1=CC=C(Cl)C=C1Cl OVSKIKFHRZPJSS-UHFFFAOYSA-N 0.000 description 1
- HJEORQYOUWYAMR-UHFFFAOYSA-N 2-[(2-butylphenoxy)methyl]oxirane Chemical group CCCCC1=CC=CC=C1OCC1OC1 HJEORQYOUWYAMR-UHFFFAOYSA-N 0.000 description 1
- FZIIBDOXPQOKBP-UHFFFAOYSA-N 2-methyloxetane Chemical group CC1CCO1 FZIIBDOXPQOKBP-UHFFFAOYSA-N 0.000 description 1
- FNYWFRSQRHGKJT-UHFFFAOYSA-N 3-ethyl-3-[(3-ethyloxetan-3-yl)methoxymethyl]oxetane Chemical compound C1OCC1(CC)COCC1(CC)COC1 FNYWFRSQRHGKJT-UHFFFAOYSA-N 0.000 description 1
- NXHOXSAEFJONFO-UHFFFAOYSA-N 3-ethyl-3-[[4-[4-[(3-ethyloxetan-3-yl)methoxy]phenyl]phenoxy]methyl]oxetane Chemical group C=1C=C(C=2C=CC(OCC3(CC)COC3)=CC=2)C=CC=1OCC1(CC)COC1 NXHOXSAEFJONFO-UHFFFAOYSA-N 0.000 description 1
- 239000004925 Acrylic resin Substances 0.000 description 1
- 229920000178 Acrylic resin Polymers 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
- 238000003848 UV Light-Curing Methods 0.000 description 1
- 239000012790 adhesive layer Substances 0.000 description 1
- 239000003513 alkali Substances 0.000 description 1
- 239000002518 antifoaming agent Substances 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 1
- 239000011247 coating layer Substances 0.000 description 1
- 230000000052 comparative effect Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000008878 coupling Effects 0.000 description 1
- 239000007822 coupling agent Substances 0.000 description 1
- 238000010168 coupling process Methods 0.000 description 1
- 238000005859 coupling reaction Methods 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- FWDBOZPQNFPOLF-UHFFFAOYSA-N ethenyl(triethoxy)silane Chemical compound CCO[Si](OCC)(OCC)C=C FWDBOZPQNFPOLF-UHFFFAOYSA-N 0.000 description 1
- NKSJNEHGWDZZQF-UHFFFAOYSA-N ethenyl(trimethoxy)silane Chemical compound CO[Si](OC)(OC)C=C NKSJNEHGWDZZQF-UHFFFAOYSA-N 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000009472 formulation Methods 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000003999 initiator Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- VSQYNPJPULBZKU-UHFFFAOYSA-N mercury xenon Chemical compound [Xe].[Hg] VSQYNPJPULBZKU-UHFFFAOYSA-N 0.000 description 1
- 229910001507 metal halide Inorganic materials 0.000 description 1
- 150000005309 metal halides Chemical class 0.000 description 1
- 239000012299 nitrogen atmosphere Substances 0.000 description 1
- 229920003986 novolac Polymers 0.000 description 1
- 239000003504 photosensitizing agent Substances 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 239000004033 plastic Substances 0.000 description 1
- 239000004645 polyester resin Substances 0.000 description 1
- 229920001225 polyester resin Polymers 0.000 description 1
- 229920001721 polyimide Polymers 0.000 description 1
- 239000009719 polyimide resin Substances 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 239000012945 sealing adhesive Substances 0.000 description 1
- FZHAPNGMFPVSLP-UHFFFAOYSA-N silanamine Chemical compound [SiH3]N FZHAPNGMFPVSLP-UHFFFAOYSA-N 0.000 description 1
- IYMSIPPWHNIMGE-UHFFFAOYSA-N silylurea Chemical compound NC(=O)N[SiH3] IYMSIPPWHNIMGE-UHFFFAOYSA-N 0.000 description 1
- TXDNPSYEJHXKMK-UHFFFAOYSA-N sulfanylsilane Chemical compound S[SiH3] TXDNPSYEJHXKMK-UHFFFAOYSA-N 0.000 description 1
- UDUKMRHNZZLJRB-UHFFFAOYSA-N triethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OCC)(OCC)OCC)CCC2OC21 UDUKMRHNZZLJRB-UHFFFAOYSA-N 0.000 description 1
- JXUKBNICSRJFAP-UHFFFAOYSA-N triethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CCO[Si](OCC)(OCC)CCCOCC1CO1 JXUKBNICSRJFAP-UHFFFAOYSA-N 0.000 description 1
- DQZNLOXENNXVAD-UHFFFAOYSA-N trimethoxy-[2-(7-oxabicyclo[4.1.0]heptan-4-yl)ethyl]silane Chemical compound C1C(CC[Si](OC)(OC)OC)CCC2OC21 DQZNLOXENNXVAD-UHFFFAOYSA-N 0.000 description 1
- BPSIOYPQMFLKFR-UHFFFAOYSA-N trimethoxy-[3-(oxiran-2-ylmethoxy)propyl]silane Chemical compound CO[Si](OC)(OC)CCCOCC1CO1 BPSIOYPQMFLKFR-UHFFFAOYSA-N 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
- H10K50/00—Organic light-emitting devices
- H10K50/80—Constructional details
- H10K50/84—Passivation; Containers; Encapsulations
- H10K50/842—Containers
- H10K50/8426—Peripheral sealing arrangements, e.g. adhesives, sealants
Landscapes
- Epoxy Resins (AREA)
- Adhesives Or Adhesive Processes (AREA)
- Electroluminescent Light Sources (AREA)
- Sealing Material Composition (AREA)
- Polyethers (AREA)
Abstract
Description
本発明は、電子デバイスの製造方法に関する。詳細には、二枚の基板を狭いギャップで光硬化性封止材により封止した構造を有する電子デバイスの製造方法に関し、特に、有機EL素子を形成する支持基板及び不透明封止用基板を樹脂封止したトップエミッション用有機EL素子の製造方法に関する。 The present invention relates to a method for manufacturing an electronic device. Specifically, the present invention relates to a method of manufacturing an electronic device having a structure in which two substrates are sealed with a photocurable sealing material with a narrow gap, and in particular, a support substrate and an opaque sealing substrate for forming an organic EL element are made of resin. The present invention relates to a method for producing a sealed top emission organic EL element.
有機EL素子等の不透明な基板を樹脂封止した素子の製造においては、熱硬化型の封止樹脂では硬化時間が長くかかり、量産効率が悪い等の理由から、光硬化性樹脂組成物が使用されている。例えば、特許文献1には、有機EL層を設けた支持基板を封止用基板で封止する方法として、UV硬化性樹脂からなる外周封止層を基板上に形成し、封止用基板と支持基板とのアラインメントが完了したなら紫外線を照射してUV硬化性樹脂を硬化させて封止する方法や、カラー有機EL素子の製造方法として、ディスペンサーを用いて外周部に紫外線硬化型接着剤を塗布し、その後に有機EL素子と色変換フィルタ基板とを密着させ、有機EL素子の発光部と色変換フィルタ層とのアラインメントを行い、その後に、紫外線硬化型接着剤に対して紫外線を照射して接着剤層を硬化させて外周封止層を形成する製造方法が開示されている。 In the production of organic EL elements and other opaque substrates, photo-curing resin compositions are used because thermosetting sealing resins take a long time to cure and the mass production efficiency is poor. Has been. For example, in Patent Document 1, as a method of sealing a support substrate provided with an organic EL layer with a sealing substrate, an outer peripheral sealing layer made of a UV curable resin is formed on the substrate, and the sealing substrate and When alignment with the support substrate is completed, UV curable adhesive is applied to the outer periphery using a dispenser as a method of sealing by curing the UV curable resin by irradiating UV light, or as a method of manufacturing a color organic EL element. After coating, the organic EL element and the color conversion filter substrate are brought into close contact with each other, the light emitting portion of the organic EL element and the color conversion filter layer are aligned, and then the ultraviolet curable adhesive is irradiated with ultraviolet rays. A manufacturing method is disclosed in which the outer peripheral sealing layer is formed by curing the adhesive layer.
この製造方法によれば外周封止層は可能であるが、基板の不透明部分は光を充分透過しないので紫外線が届きにくい基板内側部における光硬化は困難である。また、封止層は外周を封止するのみであって、その場合に、外周封止層の内側には内部空間を充填する不活性ゲル等が充填される。しかしながら、素子の面積が大きくなると外周封止層を使用する方法では素子の封止が効果的に行われない。 According to this manufacturing method, an outer peripheral sealing layer is possible, but since the opaque portion of the substrate does not transmit light sufficiently, photocuring at the inner portion of the substrate where ultraviolet rays are difficult to reach is difficult. Moreover, the sealing layer only seals the outer periphery, and in that case, an inert gel or the like that fills the internal space is filled inside the outer peripheral sealing layer. However, when the area of the element is increased, the element is not effectively sealed by the method using the outer peripheral sealing layer.
一方、特許文献2には、不透明部分にも適用できる方法として、特定の光硬化性樹脂組成物を使用した有機EL素子の製造方法が開示されており、それによれば、ガラス基板上に硬化遅延光硬化性樹脂組成物を塗工し、紫外線を照射し、光照射後、直ちにガラス基板と薄膜構造体とを貼り合わせ、加熱して封止する製造方法が開示されている。しかしながらこの製造方法において、基板上へ樹脂組成物を塗工する方法は明示されていない。一般には、基板上に全面に塗工する場合には、塗布面積が大きくなるにつれて塗工時間がかかり、好ましくない。また、光硬化性樹脂組成物は硬化制御剤を使用して硬化遅延を図っているが、アラインメント調整等の必要性から可使時間を長くするために硬化制御剤の使用量が多くなると、樹脂硬化物の物性に悪影響を及ぼし好ましくない。 On the other hand, Patent Document 2 discloses a method for producing an organic EL device using a specific photocurable resin composition as a method that can be applied to an opaque portion. A manufacturing method is disclosed in which a photocurable resin composition is applied, irradiated with ultraviolet rays, and immediately after light irradiation, a glass substrate and a thin film structure are bonded together and heated to seal. However, in this production method, the method for applying the resin composition onto the substrate is not clearly described. In general, when coating is performed on the entire surface of a substrate, the coating time increases as the coating area increases, which is not preferable. In addition, the photocurable resin composition uses a curing control agent to delay the curing, but if the amount of the curing control agent used is increased in order to increase the pot life due to the necessity of alignment adjustment, etc. It adversely affects the physical properties of the cured product and is not preferable.
ところで、トップエミッション方式の有機EL素子の構造は、通常、有機積層体を2枚のガラス等の防湿基板により挟み込み、防湿基板間を封止材により封止されている。上述のとおり従来の有機EL素子は、基板周辺に封止接着剤を塗布して貼りあわせるタイプであるが、素子が大型化する場合には、基板周辺のみならず、基板全面を封止する方が防湿性等に有効である。また、トップエミッション方式有機EL素子の構造によれば、封止材は透明である必要があるとともに、紫外線が多量に照射されると素子にダメージを与える場合もあり、少量の紫外線照射で硬化可能な製造方法が望ましい。
上述の現状に鑑みて、本発明の課題は、二枚の基板を狭いギャップで光硬化性封止材により封止した構造を有する電子デバイスを、硬化制御剤を使用することなく充分な可使時間を確保できる光硬化性樹脂組成物を使用して、精密にギャップコントロール及びアラインメント調整をすることが可能であり、しかも、素子の面積が大きい電子デバイスに対しても充分な封止効果を発揮可能な製造方法を提供することである。 In view of the above-mentioned present situation, an object of the present invention is to sufficiently use an electronic device having a structure in which two substrates are sealed with a photo-curable sealing material with a narrow gap without using a curing control agent. It is possible to precisely control the gap and adjust the alignment by using a photo-curable resin composition that can secure the time, and also exhibits a sufficient sealing effect even for electronic devices with a large element area. It is to provide a possible manufacturing method.
本発明は、二枚の基板を光硬化性封止材で封止した構造を有する電子デバイスの製造方法であって、二枚の基板の少なくとも一方に、(A)水酸基を含有する一官能のオキセタン化合物を20〜80重量部、(B)多官能オキセタン化合物又は多官能エポキシ化合物を80〜20重量部、及び(C)カウンターアニオンがアンチモネート又はフォスフェートであるスルフォニウム塩型光カチオン重合開始剤を(A)及び(B)合計100重量部に対して0.1〜10重量部含有する光硬化性封止材組成物を塗布面全面にわたって等間隔に点塗布する工程(a)、塗布された前記組成物に紫外線を照射する工程(b)、前記工程(b)の後、前記二枚の基板同士を前記組成物を挟んで貼り合せる工程(c)、並びに、貼り合わせた二枚の基板間の前記組成物を紫外線照射及び/又は加熱して硬化させる工程(d)、を含み、かつ、工程(b)の後であって工程(d)の前に、室温において、基板間のギャップ及び/又はアラインメントを調整することを特徴とする電子デバイスの製造方法である。 The present invention is a method for manufacturing an electronic device having a structure in which two substrates are sealed with a photocurable sealing material, and (A) a monofunctional group containing a hydroxyl group in at least one of the two substrates. 20-80 parts by weight of an oxetane compound, (B) 80-20 parts by weight of a polyfunctional oxetane compound or polyfunctional epoxy compound, and (C) a sulfonium salt-type photocationic polymerization initiator whose counter anion is antimonate or phosphate (A) and (B) a step (a) of applying a photocurable sealing material composition containing 0.1 to 10 parts by weight with respect to a total of 100 parts by weight over the entire coated surface at equal intervals (a), After the step (b) of irradiating the composition with ultraviolet rays, the step (c) of bonding the two substrates with the composition sandwiched between the step (b), and the two bonded substrates Between boards A step (d) of curing the composition by UV irradiation and / or heating, and after step (b) and before step (d) at room temperature and / or Or it is the manufacturing method of the electronic device characterized by adjusting alignment.
本発明は、上述の構成により、下記の効果を発揮する。
(1)本発明の製造方法は、硬化制御剤を使用することなく充分な可使時間を確保できる光硬化性樹脂組成物を使用して、精密にギャップコントロール及びアラインメント調整をすることが可能であり、しかも、素子の面積が大きい電子デバイスや大型化した電子デバイスに対しても封止効果を充分発揮可能である。
(2)本発明の製造方法は、特に、トップエミッション用有機EL素子等の不透明な基板を少ない光照射で光硬化性樹脂組成物により全面封止することができる。
The present invention exhibits the following effects by the above-described configuration.
(1) The production method of the present invention can precisely perform gap control and alignment adjustment by using a photocurable resin composition that can ensure a sufficient pot life without using a curing control agent. In addition, the sealing effect can be sufficiently exhibited even for an electronic device having a large element area or an enlarged electronic device.
(2) In the production method of the present invention, in particular, an opaque substrate such as an organic EL element for top emission can be entirely sealed with a photocurable resin composition with a small amount of light irradiation.
本発明において使用する光硬化性樹脂組成物は、(A)水酸基を含有する一官能のオキセタン化合物を20〜80重量部、(B)多官能オキセタン化合物又は多官能エポキシ化合物を80〜20重量部、及び(C)カウンターアニオンがアンチモネート又はフォスフェートであるスルフォニウム塩型光カチオン重合開始剤を(A)及び(B)合計100重量部に対して0.1〜10重量部含有してなる。 The photocurable resin composition used in the present invention comprises (A) 20 to 80 parts by weight of a monofunctional oxetane compound containing a hydroxyl group, and (B) 80 to 20 parts by weight of a polyfunctional oxetane compound or a polyfunctional epoxy compound. And (C) 0.1 to 10 parts by weight of (A) and (B) a total of 100 parts by weight of a sulfonium salt-type photocationic polymerization initiator whose counter anion is antimonate or phosphate.
水酸基を含有する一官能のオキセタン化合物(A)としては、オキセタニル基を分子内に1個有し、かつ、水酸基を含有する化合物であれば特に限定されず、例えば、3−エチル−3−ヒドロキシメチルオキセタンがあるが、これに限られるものではない。 The monofunctional oxetane compound (A) containing a hydroxyl group is not particularly limited as long as it is a compound having one oxetanyl group in the molecule and containing a hydroxyl group. For example, 3-ethyl-3-hydroxy There is methyl oxetane, but it is not limited to this.
その含有量は、(A)及び(B)合計100重量部中、20〜80重量部である。含有量が20重量部未満であると、十分な硬化遅延性は得られず、80重量部を超えると硬化性が悪くなる。下限は好ましくは25重量部、上限は好ましくは70重量部である。 The content is 20 to 80 parts by weight in a total of 100 parts by weight of (A) and (B). If the content is less than 20 parts by weight, sufficient curing retardation cannot be obtained, and if it exceeds 80 parts by weight, the curability is deteriorated. The lower limit is preferably 25 parts by weight, and the upper limit is preferably 70 parts by weight.
多官能オキセタン化合物又は多官能エポキシ化合物(B)としては、2官能以上のオキセタン化合物又はエポキシ化合物を用いることができる。2官能以上のオキセタン化合物、すなわち分子内に2個以上のオキセタニル基を有する化合物としては、例えば、ジ[1−エチル(3−オキセタニル)]メチルエーテル、1,4−ビス[(1−エチル−3−オキセタニル)メトキシ]ベンゼン、1,3−ビス[(1−エチル−3−オキセタニル)メトキシ]ベンゼン、4,4′−ビス[(3−エチル−3−オキセタニル)メトキシ]ビフェニル等が挙げられる。多官能オキセタン化合物は、2官能のものが好ましく、3官能以上のものを使用する場合のその配合量は、2官能以上のオキセタン化合物中、30重量%以下が好ましく、20重量%以下がより好ましい。3官能以上のオキセタン化合物を30重量%を超えて用いると、粘度が高くなったり、十分な硬化遅延性が得られなかったり、得られた硬化物が、硬く脆くなりやすい。 As the polyfunctional oxetane compound or polyfunctional epoxy compound (B), a bifunctional or higher functional oxetane compound or epoxy compound can be used. Examples of the bifunctional or higher oxetane compound, that is, a compound having two or more oxetanyl groups in the molecule include di [1-ethyl (3-oxetanyl)] methyl ether, 1,4-bis [(1-ethyl- 3-oxetanyl) methoxy] benzene, 1,3-bis [(1-ethyl-3-oxetanyl) methoxy] benzene, 4,4′-bis [(3-ethyl-3-oxetanyl) methoxy] biphenyl, and the like. . The polyfunctional oxetane compound is preferably a bifunctional compound, and when a trifunctional or higher functional compound is used, the blending amount thereof is preferably 30% by weight or less, more preferably 20% by weight or less in the bifunctional or higher functional oxetane compound. . When a tri- or higher functional oxetane compound is used in an amount exceeding 30% by weight, the viscosity becomes high, sufficient curing retardation cannot be obtained, and the obtained cured product tends to be hard and brittle.
2官能以上のエポキシ化合物、すなわち分子内に2個以上のエポキシ基を有する化合物としては、例えば、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂等が挙げられる。多官能エポキシ化合物は、2官能のものが好ましく、3官能以上のものの配合量は、2官能以上のエポキシ化合物中、30重量%以下が好ましく、20重量%以下がより好ましい。3官能以上のエポキシ化合物を30重量%を超えて用いると、粘度が高くなったり、十分な硬化遅延性が得られなかったり、得られた硬化物が、硬く脆くなりやすい。 Examples of the bifunctional or higher functional epoxy compound, that is, a compound having two or more epoxy groups in the molecule include, for example, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, hydrogenated bisphenol A type epoxy resin. Etc. The polyfunctional epoxy compound is preferably a bifunctional one, and the blending amount of the trifunctional or higher functional epoxy compound is preferably 30% by weight or less, more preferably 20% by weight or less in the bifunctional or higher functional epoxy compound. When a trifunctional or higher functional epoxy compound is used in excess of 30% by weight, the viscosity becomes high, sufficient curing retardance cannot be obtained, and the obtained cured product tends to be hard and brittle.
多官能オキセタン化合物又は多官能エポキシ化合物(B)の含有量は、(A)及び(B)合計100重量部中、80〜20重量部である。含有量が80重量部を超えると、硬化遅延性が低下し、20重量部未満であると、十分な硬化性は得られない。上限は好ましくは70重量部、下限は好ましくは25重量部である。 Content of a polyfunctional oxetane compound or a polyfunctional epoxy compound (B) is 80-20 weight part in a total of 100 weight part of (A) and (B). When the content exceeds 80 parts by weight, the curing retardation is reduced, and when it is less than 20 parts by weight, sufficient curability cannot be obtained. The upper limit is preferably 70 parts by weight, and the lower limit is preferably 25 parts by weight.
カウンターアニオンがアンチモネート又はフォスフェートであるスルフォニウム塩型光カチオン重合開始剤(C)としては、例えば、ビス[4−(ジフェニルスルホニオ)−フェニル]スルフィドビス−ヘキサフルオロフォスフェート、ビス[4−(ジフェニルスルホニオ)−フェニル]スルフィドビス−ヘキサフルオロアンチモネート、ビス[4−(ジ(2−ハイドロキシエチル)フェニル)スルホニオ−フェニル]スルフィドビス−ヘキサフルオロフォスフェート、ビス[4−(ジ(2−ハイドロキシエチル)フェニル)スルホニオ−フェニル]スルフィドビス−ヘキサフルオロアンチモネート等が挙げられる。これらは、単独もしくは、併用することが可能である。これらのうち、フルオロフォスフェート類がより好ましい。 Examples of the sulfonium salt-type photocationic polymerization initiator (C) in which the counter anion is antimonate or phosphate include bis [4- (diphenylsulfonio) -phenyl] sulfide bis-hexafluorophosphate, bis [4- (Diphenylsulfonio) -phenyl] sulfide bis-hexafluoroantimonate, bis [4- (di (2-hydroxyethyl) phenyl) sulfonio-phenyl] sulfide bis-hexafluorophosphate, bis [4- (di (2 -Hydroxyethyl) phenyl) sulfonio-phenyl] sulfide bis-hexafluoroantimonate and the like. These can be used alone or in combination. Of these, fluorophosphates are more preferred.
その含有量は、(A)及び(B)合計100重量部に対して0.1〜10重量部である。好ましくは1〜5重量部である。 The content is 0.1 to 10 parts by weight with respect to 100 parts by weight in total of (A) and (B). Preferably it is 1-5 weight part.
なお、本発明において使用する光硬化性樹脂組成物においては光増感剤を用いるべきではない。 In the photocurable resin composition used in the present invention, a photosensitizer should not be used.
本発明において使用する光硬化性樹脂組成物には、本発明の目的を阻害しないかぎり、その他の添加剤を使用することができる。このような添加剤としては、シランカップリング剤、レベリング剤、消泡剤、粘着剤等が挙げられる。特に、シランカップリング剤を添加することは、液状樹脂と無機フィラー、スペーサーの馴染みを向上できるという効果がある。シランカップリングとしては、例えば、γ−グリシドキシプロピルトリメトキシシラン、γ−グリシドキシプロピルトリエトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリメトキシシラン、β−(3,4−エポキシシクロヘキシル)エチルトリエトキシシラン、ビニルトリメトキシシラン、ビニルトリエトキシシラン、メルカプトシラン、スルフィドシラン、ウレイドシラン、アミノシラン等が挙げられる。 Other additives can be used in the photocurable resin composition used in the present invention as long as the object of the present invention is not impaired. Examples of such additives include silane coupling agents, leveling agents, antifoaming agents, and pressure-sensitive adhesives. In particular, the addition of a silane coupling agent has the effect of improving the familiarity of the liquid resin, the inorganic filler, and the spacer. Examples of the silane coupling include γ-glycidoxypropyltrimethoxysilane, γ-glycidoxypropyltriethoxysilane, β- (3,4-epoxycyclohexyl) ethyltrimethoxysilane, β- (3,4- Epoxycyclohexyl) ethyltriethoxysilane, vinyltrimethoxysilane, vinyltriethoxysilane, mercaptosilane, sulfide silane, ureidosilane, aminosilane and the like.
上記その他の添加剤の配合量は、光硬化性樹脂組成物100重量部中、好ましくは10重量部以下であり、より好ましくは5重量部以下である。 The blending amount of the other additives is preferably 10 parts by weight or less, more preferably 5 parts by weight or less, in 100 parts by weight of the photocurable resin composition.
本発明において使用する光硬化性樹脂組成物の製造方法にはとくに限定はなく、原料が均一に混ざり合うように混合すればよい。例えば、上記(A)成分、(B)成分、及び光重合開始剤(C)、並びに、無機フィラー、カップリング剤、スペーサー、その他必要成分を配合混合し、常法に従い、加熱減圧下で、攪拌混合し、脱泡、脱水処理を行う。条件としては、60から80℃、1から10torrの減圧下で、30分から2時間、攪拌混合を行う。 There is no limitation in particular in the manufacturing method of the photocurable resin composition used in this invention, What is necessary is just to mix so that a raw material may mix uniformly. For example, the (A) component, the (B) component, and the photopolymerization initiator (C), and an inorganic filler, a coupling agent, a spacer, and other necessary components are mixed and mixed according to a conventional method under heating and reduced pressure. Stir and mix, defoam and dehydrate. As conditions, stirring and mixing are performed for 30 minutes to 2 hours under reduced pressure of 60 to 80 ° C. and 1 to 10 torr.
つぎに、本発明の各工程について説明する。
二枚の基板の少なくとも一方に、上記光硬化性封止材組成物を塗布面全面にわたって等間隔に点塗布する工程(a)
上記基板としては電子デバイスにより異なるが、有機EL素子を例にとれば、例えば、有機EL層を設けた支持基板、封止用ガラス基板、等である。図1及び図2に有機EL素子の封止の概念図を示す。支持基板はパッシベーション膜が形成されていてもよい(図2)。有機EL素子では、色変換フィルタ層を貼りあわせた構造以外に、パッシベーション層(無機層)、色変換フィルタ層、ブラックマトリックス層を設けたものも含まれる。この場合、色変換フィルタ層は、カラーフィルタ層、蛍光変換層、及びカラーフィルタ層と蛍光変換層との積層体の総称である。ブラックマトリックス層は、可視光をよく吸収し、発光部及び色変換フィルタ層に悪影響を与えないものであればよい。支持基板は、ガラスやプラスチックなどからなる絶縁性基板、または、半導電性や導電性基板に絶縁性の薄膜を形成した基板を用いることができる。あるいは、また、ポリオレフィン、アクリル樹脂、ポリエステル樹脂または、ポリイミド樹脂などから形成される可撓性フィルムを、支持基板に用いても良い。塗布対象基板は、貼り付ける両方の基板でもよく、いずれか一方でもよく、工程の簡素化の観点からは一方の基板への塗布が好ましい。
Next, each step of the present invention will be described.
Step (a) of applying the photocurable encapsulant composition on at least one of the two substrates at regular intervals over the entire coated surface (a)
Although the substrate varies depending on the electronic device, for example, a support substrate provided with an organic EL layer, a glass substrate for sealing, and the like when an organic EL element is taken as an example. The conceptual diagram of sealing of an organic EL element is shown in FIG.1 and FIG.2. The support substrate may be provided with a passivation film (FIG. 2). Organic EL elements include those provided with a passivation layer (inorganic layer), a color conversion filter layer, and a black matrix layer in addition to a structure in which a color conversion filter layer is bonded. In this case, the color conversion filter layer is a general term for a color filter layer, a fluorescence conversion layer, and a laminate of the color filter layer and the fluorescence conversion layer. The black matrix layer may be any layer that absorbs visible light well and does not adversely affect the light emitting portion and the color conversion filter layer. As the support substrate, an insulating substrate made of glass, plastic, or the like, or a substrate in which an insulating thin film is formed on a semiconductive or conductive substrate can be used. Alternatively, a flexible film formed from polyolefin, acrylic resin, polyester resin, polyimide resin, or the like may be used for the support substrate. The application target substrate may be both substrates to be attached, or may be either one, and application to one substrate is preferable from the viewpoint of simplifying the process.
光硬化性封止材組成物の塗布は、基板の塗布面全面にわたって塗布する。すなわち、外周部のみに塗布する態様ではなく、塗布対象領域の全面にわたって塗布する。塗布対象領域は、基板の全面であってもよく、一部であってもよい。有機EL素子の場合は基板の全面を塗布対象領域とすることが通常である。塗布は本発明においては、図3に例示するように、点塗布により行う。塗布は、図4に示すように、ディスペンサーを用いて、例えば、ガラス基板上に点塗布する。すなわち、線塗布や面塗布ではなく、封止材樹脂をスポット状に、等間隔で、塗布面全面にわたって塗布する。点塗布は、塗布量の制御が容易であり、塗布速度も速い利点があり、線塗布では始点、終点で塗布量が少なくなり易く、線を曲げるときに塗布量が多くなりやすい欠点があり、面塗布は塗布速度が遅い。また、等間隔の点塗布は、貼り合わせ時に塗布面全面に封止材組成物が展開することができる利点がある。塗布は、高速で等間隔に等量の点塗布が可能な手法であればよく、好ましくは、ジェットディスペンサー、インクジェットディスペンサー等である。塗布量及び点塗布の間隔は、封止材組成物の粘度を考慮して、貼り合わせ時に塗布面全面に封止材が展開するように調節することが好ましく、封止材組成物の粘度としては、塗布速度や塗布量の制御及び塗布面での展開や気泡噛みこみ防止等の観点から、300mPa・s(25℃)以下が好ましく、100mPa・s(25℃)以下がより好ましい。塗布量は、塗布面全面に封止材が展開した場合に塗布厚みが60μm以下となるように制御することが、気泡を噛みこまないようにする観点から、好ましい。また、減圧下に塗布することも封止材組成物中に気泡を生じないようにするうえで好ましい。 The photocurable encapsulant composition is applied over the entire application surface of the substrate. That is, it is not applied to only the outer peripheral portion, but applied over the entire area to be applied. The application target region may be the entire surface of the substrate or a part thereof. In the case of an organic EL element, the entire surface of the substrate is usually the application target region. In the present invention, the application is performed by spot application as illustrated in FIG. As shown in FIG. 4, the application is performed by, for example, spot application on a glass substrate using a dispenser. That is, instead of line coating or surface coating, the encapsulant resin is applied to the entire surface of the coating surface at regular intervals in a spot shape. Point application has the advantage that the application amount is easy to control and the application speed is fast, and the line application tends to reduce the application amount at the start and end points, and tends to increase the application amount when bending the line, Surface coating is slow in coating speed. In addition, equidistant point application has an advantage that the encapsulant composition can be spread over the entire application surface during bonding. The application may be performed by any technique capable of applying an equal amount of dots at equal intervals at high speed, and is preferably a jet dispenser, an inkjet dispenser, or the like. The application amount and the point application interval are preferably adjusted so that the encapsulant spreads over the entire application surface during bonding, taking into account the viscosity of the encapsulant composition, as the viscosity of the encapsulant composition Is preferably 300 mPa · s (25 ° C.) or less, and more preferably 100 mPa · s (25 ° C.) or less, from the viewpoints of controlling the coating speed and coating amount, developing on the coating surface and preventing air entrainment. The coating amount is preferably controlled so that the coating thickness is 60 μm or less when the encapsulant is spread over the entire coated surface from the viewpoint of preventing air bubbles from being caught. Moreover, it is also preferable to apply under reduced pressure in order not to generate bubbles in the encapsulant composition.
また、本発明においては、上記工程(a)の前に、基板上の外周辺部にダム用接着剤を塗布することができる。ダム用接着剤とは、図2及び図3に示すように、塗布対象領域の周囲に接着剤を土手状に塗布することをいう。そして、封止材組成物をダムの内側全面に点塗布する。こうすることにより、封止材組成物が貼り合わせ時にはみ出すことがなく、また、パッシベーション膜が形成されている場合等において塗布層の厚みを調節して基板間のギャップを制御しやすくする。ダム用接着剤としては、熱硬化型であっても、UV硬化型、UV+熱硬化型、2液混合室温硬化型であっても良い。熱硬化型や2液混合室温硬化型の接着剤の場合は、塗布後、硬化処理を予め施しておくことが好ましい。光硬化性樹脂組成物の場合は、予め硬化処理をしてもよく、又は、封止材組成物の硬化処理とともに硬化させてもよい。塗布は、線塗布が可能な手法であればよい。ダム用接着剤の粘度は、30,000mPa・s(25℃)以上が好ましく、上限は1,000,000mPa・sが好ましい。 Moreover, in this invention, the adhesive agent for dams can be apply | coated to the outer periphery part on a board | substrate before the said process (a). As shown in FIG. 2 and FIG. 3, the dam adhesive means that the adhesive is applied in a bank shape around the application target region. Then, the sealing material composition is spot-coated on the entire inner surface of the dam. By doing so, the sealing material composition does not protrude when bonded, and the gap between the substrates can be easily controlled by adjusting the thickness of the coating layer when a passivation film is formed. The adhesive for dams may be a thermosetting type, a UV curing type, a UV + thermosetting type, or a two-component mixed room temperature curing type. In the case of a thermosetting type adhesive or a two-component mixed room temperature curing type adhesive, it is preferable to perform a curing treatment in advance after application. In the case of a photocurable resin composition, it may be cured in advance or may be cured together with the curing treatment of the sealing material composition. Application | coating should just be the method in which line application is possible. The viscosity of the adhesive for dams is preferably 30,000 mPa · s (25 ° C.) or more, and the upper limit is preferably 1,000,000 mPa · s.
塗布された前記組成物に紫外線を照射する工程(b)
紫外線照射は、比較的少量の照射量、例えば、100〜4000mJ/cm2程度、好ましくは300〜3000mJ/cm2の照射エネルギーとなるように行うことができる。照射装置は、例えば、紫外線ランプ(キセノンランプ、キセノン−水銀ランプ、メタルハライドランプ等)、アーク式照射装置等を使用することができる。この照射により封止材組成物は直ちに硬化することはなく、上記光硬化性樹脂組成物の場合、可使時間は例えば3分間以上、例えば、60分程度又はそれ以上とすることができる。
(B) irradiating the applied composition with ultraviolet rays
Ultraviolet irradiation can be performed so that a relatively small amount of irradiation is applied, for example, an irradiation energy of about 100 to 4000 mJ / cm 2 , preferably 300 to 3000 mJ / cm 2 . As the irradiation device, for example, an ultraviolet lamp (xenon lamp, xenon-mercury lamp, metal halide lamp, etc.), an arc type irradiation device, or the like can be used. By this irradiation, the encapsulant composition is not immediately cured, and in the case of the photo-curable resin composition, the pot life can be 3 minutes or longer, for example, about 60 minutes or longer.
前記工程(b)の後、前記二枚の基板同士を前記組成物を挟んで貼り合せる工程(c)
紫外線照射された基板を他の基板と封止材組成物を挟んで貼り合わせ、封止する。貼り合わせは、常圧下でも減圧下でもよく、また、窒素雰囲気中で行うこともできる。減圧下に行うことが、封止材組成物中に気泡を生じないようにするうえで、好ましい。また、必要に応じて、封止材組成物を展開させるために、基板を加圧して貼り合わせを行うこともできる。
After the step (b), the step (c) of bonding the two substrates with the composition interposed therebetween.
The substrate irradiated with ultraviolet rays is bonded to another substrate with a sealing material composition interposed therebetween, and sealed. Bonding may be performed under normal pressure or reduced pressure, and may be performed in a nitrogen atmosphere. It is preferable to carry out under reduced pressure in order not to generate bubbles in the encapsulant composition. Moreover, in order to expand | deploy a sealing material composition as needed, a board | substrate can be pressurized and bonded together.
貼り合わせた二枚の基板間の前記組成物を紫外線照射及び/又は加熱して硬化させる工程(d)
上記光硬化性樹脂組成物は、常温下の場合、硬化に時間がかかることが通常なので、貼り合わせた基板がずれたりしないように、短時間に硬化させることが好ましく、そのために、本発明では、紫外線照射及び/又は加熱をする。すなわち、紫外線照射のみ、加熱のみ、又は、紫外線照射及び加熱の併用が可能であるが、これらのうち紫外線照射と加熱の併用が好ましく、併用の態様としては、紫外線照射後に加熱することが好ましい。加熱は90℃以下が好ましく、80℃程度がより好ましい。加熱時間は、10〜120分が好ましく、より好ましくは30〜60分である。紫外線照射は、500〜6000mJ/cm2程度が好ましく、より好ましくは3000〜6000mJ/cm2の照射エネルギーとなるように行うことができる。紫外線照射及び加熱の併用する場合は、紫外線照射は500〜3000mJ/cm2程度、加熱時間10〜30分が好ましい。
Step (d) of curing the composition between two bonded substrates by ultraviolet irradiation and / or heating.
Since the photocurable resin composition usually takes a long time to cure at room temperature, it is preferably cured in a short time so that the bonded substrates are not displaced. , UV irradiation and / or heating. That is, only ultraviolet irradiation, only heating, or a combination of ultraviolet irradiation and heating can be used, and among these, the combined use of ultraviolet irradiation and heating is preferable. The heating is preferably 90 ° C. or less, and more preferably about 80 ° C. The heating time is preferably 10 to 120 minutes, more preferably 30 to 60 minutes. The irradiation with ultraviolet rays is preferably about 500 to 6000 mJ / cm 2 , and more preferably 3000 to 6000 mJ / cm 2 . When ultraviolet irradiation and heating are used in combination, the ultraviolet irradiation is preferably about 500 to 3000 mJ / cm 2 and the heating time is 10 to 30 minutes.
本発明においては、上記工程(b)の後であって工程(d)の前に、好ましくは、上記工程(c)の後に、室温において、基板間のギャップ及び/又はアラインメントを調整する。有機EL素子、とくに、カラー有機EL素子の場合には、有機EL素子の発光部と色変換フィルタ層とのアラインメントを精密に調整する必要がある。また、基板間のギャップを、好ましくは30μm以下、より好ましくは20μm以下にする。ギャップ調節は、例えば、基板に圧力印加等して適切な間隔になるようにすればよい。有機EL素子等の精密素子においては、このような調整を精密に行うことができ、しかも、そのギャップやアラインメントを損なうことなく封止を完了する必要がある。本発明においては、封止材組成物の可使時間が充分長く、しかも、低粘度を実現可能であるので、このように狭いギャップで精密にギャップコントロールをすることが可能となる。 In the present invention, after the step (b) and before the step (d), preferably after the step (c), the gap and / or alignment between the substrates is adjusted at room temperature. In the case of an organic EL element, particularly a color organic EL element, it is necessary to precisely adjust the alignment between the light emitting portion of the organic EL element and the color conversion filter layer. The gap between the substrates is preferably 30 μm or less, more preferably 20 μm or less. For example, the gap may be adjusted by applying a pressure to the substrate so that an appropriate interval is obtained. In a precision element such as an organic EL element, such adjustment can be performed precisely, and it is necessary to complete sealing without impairing the gap or alignment. In the present invention, since the pot life of the encapsulant composition is sufficiently long and low viscosity can be realized, it is possible to precisely control the gap with such a narrow gap.
本発明の製造方法は、二枚の基板を光硬化性封止材で封止した構造を有する電子デバイスに広く適用可能である。とくに、有機EL素子、なかでも、トップエミッション用有機EL素子に好適に適用することができる。封止は、直接有機EL積層発光体に適用する場合のみならず、有機EL積層発光体の上に成膜された無機膜とガラス基板の貼り合わせにも用いることができる。さらに、有機EL素子だけではなく、液晶表示デバイス、電子ペーパー、有機トランジスタ、有機太陽電池、有機EL照明などにも適応可能である。 The manufacturing method of the present invention can be widely applied to electronic devices having a structure in which two substrates are sealed with a photocurable sealing material. In particular, it can be suitably applied to an organic EL element, especially a top emission organic EL element. Sealing can be used not only for direct application to an organic EL laminated light emitter, but also for bonding an inorganic film formed on an organic EL laminated light emitter to a glass substrate. Furthermore, it is applicable not only to organic EL elements but also to liquid crystal display devices, electronic paper, organic transistors, organic solar cells, organic EL lighting, and the like.
実施例
以下実施例により本発明を更に説明するが本発明はこれに限定されるものではない。以下、部は重量部を示す。
EXAMPLES The present invention will be further described below with reference to examples, but the present invention is not limited thereto. Hereinafter, a part shows a weight part.
以下、略号の意味は以下のとおり。
EPC−835LV:ビスフェノールAエポキシ樹脂とビスフェノールFエポキシ樹脂の混合物。大日本インキ化学工業株式会社製2官能エポキシ化合物。
OXT−101:3−エチル−3−ヒドロキシメチルオキセタン。東亞合成株式会社製水酸基含有1官能オキセタン化合物。
OXT−212:3−エチル−3−(2―エチルヘキシロキシメチル)オキセタン。東亜合成社製1官能オキセタン化合物。
OXT−221:ジ[1−エチル(3−オキセタニル)]メチルエーテル。東亜合成社製2官能オキセタン化合物。
TONE0310:TONE Polyol0310。ダウ・ケミカル日本株式会社製3官能のカプロラクトンポリオール。
DEX−146:P−ターシャリーブチルフェニルグリシジルエーテル。ナガセケムテックス社製1官能エポキシ化合物。
UVI6992:トリアリルスルフォニウムヘキサフルオロフォスフェートの混合物。ダウ・ケミカル日本株式会社製製光カチオン重合開始剤。
UVI6976:トリアリルスルフォニウムヘキサフルオロアンチモネートの混合物。ダウ・ケミカル日本株式会社製光カチオン重合開始剤。
A2074:フォトイニシエーター2074(商品名)、ローディア・ジャパン社製光カチオン重合開始剤。
The meanings of the abbreviations are as follows.
EPC-835LV: A mixture of bisphenol A epoxy resin and bisphenol F epoxy resin. A bifunctional epoxy compound manufactured by Dainippon Ink & Chemicals, Inc.
OXT-101: 3-ethyl-3-hydroxymethyloxetane. Hydroxyl-containing monofunctional oxetane compound manufactured by Toagosei Co., Ltd.
OXT-212: 3-ethyl-3- (2-ethylhexyloxymethyl) oxetane. Monofunctional oxetane compound manufactured by Toa Gosei Co., Ltd.
OXT-221: Di [1-ethyl (3-oxetanyl)] methyl ether. A bifunctional oxetane compound manufactured by Toa Gosei Co., Ltd.
TONE0310: TONE Polyol0310. A trifunctional caprolactone polyol manufactured by Dow Chemical Japan Co., Ltd.
DEX-146: P-tertiary butyl phenyl glycidyl ether. Monofunctional epoxy compound manufactured by Nagase ChemteX Corporation.
UVI6992: a mixture of triallylsulfonium hexafluorophosphate. Photo cationic polymerization initiator manufactured by Dow Chemical Japan Co., Ltd.
UVI6976: a mixture of triallylsulfonium hexafluoroantimonate. Photo cationic polymerization initiator manufactured by Dow Chemical Japan Co., Ltd.
A2074: Photoinitiator 2074 (trade name), a photocationic polymerization initiator manufactured by Rhodia Japan.
実施例1〜6、比較例1〜6
表1の配合で封止材組成物を調整した。各組成物について、以下の項目を評価した。結果を表1に示した。
Examples 1-6, Comparative Examples 1-6
The sealing material composition was adjusted with the formulation shown in Table 1. The following items were evaluated for each composition. The results are shown in Table 1.
<評価方法>
遅延硬化可能時間:封止材組成物を二枚のアルカリガラス板に約20μm厚みになるようにインクジェットディスペンサーで点塗布し、双方のガラスに、50mW/cm2の照射エネルギーで、紫外線を10秒間照射し、両者を貼り合わせた。貼り合わせたガラスを45度の角度に放置した場合にずれなくなった時点を遅延硬化可能時間(分)とした。
硬化性:6J/cm2+80℃/10分で、硬化可能な場合にOKとした。
粘度:25℃に温調された液状組成物をE型(Lタイプ)回転式粘度計て、5rpm回転速度で、粘度を測定した。
<Evaluation method>
Delay curing time: The encapsulant composition is spot-coated on two alkali glass plates with an ink jet dispenser so as to have a thickness of about 20 μm, and ultraviolet rays are applied to both glasses at an irradiation energy of 50 mW / cm 2 for 10 seconds. Irradiated and bonded together. The point of time when the bonded glass did not shift when it was left at an angle of 45 degrees was defined as the delay hardening time (minutes).
Curability: 6 J / cm 2 + 80 ° C./10 min.
Viscosity: An E-type (L type) rotary viscometer was used to measure the viscosity of the liquid composition adjusted to 25 ° C. at a rotation speed of 5 rpm.
10.ガラス基板
11.支持基板
12.封止材組成物
13.有機EL発光体層
14.ダム用接着剤
15.パッシベーション膜
20.点塗布された封止材組成物
30.ディスペンサー
40.紫外線照射
10.
Claims (6)
The electronic device is an organic EL element for top emission, and the photocurable sealing material composition is applied to both the supporting substrate and the opaque sealing substrate forming the organic EL element, or only to the opaque sealing substrate. The manufacturing method in any one of Claims 1-5 applied.
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