WO2020036234A1 - Composition for moistureproof sealing material - Google Patents

Composition for moistureproof sealing material Download PDF

Info

Publication number
WO2020036234A1
WO2020036234A1 PCT/JP2019/032312 JP2019032312W WO2020036234A1 WO 2020036234 A1 WO2020036234 A1 WO 2020036234A1 JP 2019032312 W JP2019032312 W JP 2019032312W WO 2020036234 A1 WO2020036234 A1 WO 2020036234A1
Authority
WO
WIPO (PCT)
Prior art keywords
moisture
composition
group
bisphenol
sealing material
Prior art date
Application number
PCT/JP2019/032312
Other languages
French (fr)
Japanese (ja)
Inventor
祐揮 上田
Original Assignee
日産化学株式会社
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 日産化学株式会社 filed Critical 日産化学株式会社
Publication of WO2020036234A1 publication Critical patent/WO2020036234A1/en

Links

Images

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/20Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the epoxy compounds used
    • C08G59/32Epoxy compounds containing three or more epoxy groups
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09KMATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K3/00Materials not provided for elsewhere
    • C09K3/10Materials in mouldable or extrudable form for sealing or packing joints or covers
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05BELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00Electroluminescent light sources
    • H05B33/02Details
    • H05B33/04Sealing arrangements, e.g. against humidity
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00Organic light-emitting devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10KORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K59/00Integrated devices, or assemblies of multiple devices, comprising at least one organic light-emitting element covered by group H10K50/00

Definitions

  • the present invention relates to a composition for a moisture-proof sealing material, a cured product obtained therefrom, and an organic EL display mounted with the cured product.
  • FPDs flat panel displays
  • LCD liquid crystal display
  • ELD electroluminescence display
  • EL displays especially organic EL displays, are excellent in terms of high brightness, high efficiency, high-speed response, and the like in addition to the high viewing angle and high contrast unique to natural light emission. Attracting attention. Further, since the electrodes and the light-emitting layer are very thin, the possibility of forming them on a plastic base material for use as a flexible display or large-scale flat lighting is also being studied.
  • the organic EL element is composed of an electron injected into the light emitting layer directly from the electron injection electrode or through the electron transport layer, and a hole injected directly into the light emitting layer from the hole injection electrode or through the hole transport layer.
  • Light emission is generated by recombination with the hydrogen.
  • Very active and chemically unstable alloys are used for the electrodes of the organic EL device based on such a light emitting mechanism. Therefore, it is susceptible to corrosion and oxidation by moisture and oxygen from the outside, and a non-light-emitting portion called a dark spot is formed and markedly increased, and luminance decreases with time. Further, since an organic material is used for the light emitting layer and the charge transport layer of the organic EL element, the organic layer is easily deteriorated by moisture and oxygen, and similarly, there is a problem that a dark spot is formed and the luminance is reduced.
  • thermosetting epoxy resin which has been conventionally used for sealing the LCD.
  • thermosetting epoxy resin is used at a high temperature of 150 to 180 ° C. for about 2 hours.
  • the organic EL element is excellent in high brightness, high efficiency, high-speed response and the like, but has low heat resistance, and usually has a heat resistance temperature of about 80 to 100 ° C. For this reason, there has been a problem that even when a thermosetting epoxy resin is used, the sealing of the organic EL display cannot be sufficiently cured by heating.
  • photocurable sealing material that can be cured at low temperature and at high speed
  • photocurable sealing material there are usually a photoradical curable sealing material and a photocationically curable sealing material.
  • An acrylic resin is mainly used as the photo-radical-curable sealing material.
  • an epoxy resin is mainly used as a photocationically curable sealing material (for example, Patent Documents 1 and 2).
  • the acrylic resin has an advantage that various acrylate monomers and oligomers can be used, there is still a problem that the moisture resistance is generally insufficient, and the curing shrinkage is large and the adhesiveness is insufficient. No material has satisfactory performance.
  • the epoxy resin generally has relatively good adhesiveness, but has poor photocurability such as photosensitivity and rapid curability, and has a problem in that it is generally hard and brittle.
  • flexible displays such as rollable and foldable have been actively developed, so that not only a photocuring property but also a mechanical property after curing, particularly a sealing material having high stretchability has been demanded.
  • an object of the present invention is to provide a composition for a moisture-proof sealing material which is excellent in photocurability and further provides a cured product excellent in moisture-proof property and stretchability.
  • the present inventors have conducted intensive studies to solve the above problems, and as a result, among various epoxy resins, an isocyanuric acid-based epoxy compound having a specific structure, and a specific polyfunctional epoxy compound and a polyfunctional oxetane compound. It has been found that a cured product made of a composition containing the compound has moisture-proof properties, stretchability, and high adhesion to a substrate or an electrode, and is excellent as a moisture-proof sealing material for an organic EL device or the like, and has led to the present invention.
  • the present invention provides, as a first aspect, (a) at least one isocyanuric acid-based epoxy compound selected from the group consisting of a compound represented by Formula [1] and a compound represented by Formula [2];
  • a composition for a moisture-proof seal material comprising: b) a polyfunctional epoxy compound having no isocyanuric acid skeleton, (c) a polyfunctional oxetane compound, and (d) a polymerization initiator that generates an acid or a base by active energy rays.
  • R 1 represents a hydrogen atom or a methyl group
  • L 1 represents an alkylene group having 2 to 7 carbon atoms.
  • each R 1 may be the same or different.
  • Each L 1 may be the same or different.
  • R 2 represents a hydrogen atom or a methyl group
  • L 2 represents an alkylene group having 1 to 5 carbon atoms
  • A represents an aliphatic group which may contain a (n + 1) -valent ether bond.
  • n represents an integer of 2 to 5.
  • each R 2 may be the same or different
  • each L 2 may be the same or different.
  • the (b) polyfunctional epoxy compound having no isocyanuric acid skeleton is a bisphenol A epoxy resin, a bisphenol F epoxy resin, a hydrogenated bisphenol A epoxy resin, a hydrogenated bisphenol F epoxy resin, Bisphenol A novolak type epoxy resin, bisphenol F novolak type epoxy resin, and at least one selected from the group consisting of alicyclic polyglycidyl ether type epoxy resin, the composition for a moisture-proof sealing material according to the first aspect
  • the polyfunctional epoxy compound (b) having no isocyanuric acid skeleton is bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, Bisphenol A novolak polyglycidyl ether, and at least one selected from the group consisting of dicyclopentadiene dim
  • the polymerization initiator (d) that generates an acid or a base by an active energy ray is a photoacid generator.
  • the moisture permeability of the cured product measured by the cup method condition B (temperature 40 ° C., relative humidity 90%) of the moisture permeability test method of the moisture-proof packaging material according to JIS Z 0208 (1976) is represented by the following formula: 100 ⁇ m or less 20g / m 2 ⁇ 24h with terms relates moisture sealant composition according to any one of the first aspect to the sixth aspect,
  • the composition for a moisture-proof seal material according to any one of the first to seventh aspects which is a composition for an organic EL display moisture-proof seal material
  • a cured product obtained by curing the moisture-proof sealing material composition according to any one of the first to eighth aspects As a tenth aspect, the present invention relates to an organic EL display on which the cured product according to the ninth aspect is mounted.
  • Epoxy resin is excellent in heat resistance, insulation resistance and adhesion.
  • the isocyanuric acid-based epoxy compound which is a feature of the present invention, has excellent adhesion to various substrates and the like due to its structure containing many polar elements, and has between the isocyanuric acid skeleton and the epoxy ring. Because of its structure containing an alkylene group or an alkylene group and an ester bond, it is excellent in stretchability. Therefore, by curing with a polyfunctional epoxy compound and a polyfunctional oxetane compound not containing a cyanuric acid skeleton, adhesion and moisture resistance are improved. And a sealing material having excellent stretchability.
  • the epoxy ring and the oxetane ring have high reactivity in the presence of an acid or a base
  • the use of a polymerization initiator that generates an acid or a base by an active energy ray enables the activation energy such as light without heating.
  • the reaction proceeds by irradiation with a ray. Therefore, according to the present invention, it is possible to provide a composition for a moisture-proof sealing material which is excellent in photocurability and further provides a cured product excellent in moistureproofness and stretchability.
  • a cured product which is cured by an active energy ray and has excellent moisture-proof properties and stretchability can be obtained. Therefore, a device having low heat resistance such as an organic EL display and susceptible to deterioration by moisture or oxygen is used.
  • a cured product (moisture-proof sealing material) useful as a moisture-proof sealing material can be provided.
  • FIG. 1 is a schematic view of a glass substrate on which a silver electrode used for ion migration evaluation is formed.
  • FIG. 2 is a schematic view showing a process of preparing a test piece used for ion migration evaluation.
  • composition for a moisture-proof seal material of the present invention is, for example, a composition for a moisture-proof seal material used for forming a moisture-proof seal material for effectively sealing an organic EL element in an organic EL display, (A) an isocyanuric acid epoxy compound selected from the compound represented by the formula [1] and the compound represented by the formula [2], (b) a polyfunctional epoxy compound having no isocyanuric acid skeleton, (c) A moisture-proof seal material composition comprising a polyfunctional oxetane compound and (d) a polymerization initiator that generates an acid or a base by an active energy ray.
  • R 1 represents a hydrogen atom or a methyl group
  • L 1 represents an alkylene group having 2 to 7 carbon atoms.
  • each R 1 may be the same or different, and each L 1 may be the same or different.
  • Examples of the alkylene group having 2 to 7 carbon atoms represented by L 1 include ethylene, trimethylene, 1-methylethylene, tetramethylene, 1-methyltrimethylene, 1,1-dimethylethylene, and pentane.
  • Methylene group 1-methyltetramethylene group, 2-methyltetramethylene group, 1,1-dimethyltrimethylene group, 1,2-dimethyltrimethylene group, 2,2-dimethyltrimethylene group, 1-ethyltrimethylene group , Hexamethylene, 1-methylpentamethylene, 2-methylpentamethylene, 3-methylpentamethylene, 1,1-dimethyltetramethylene, 1,2-dimethyltetramethylene, 2,2-dimethyltetramethylene Methylene group, 1-ethyltetramethylene group, 1,1,2-trimethyltrimethylene group, 1,2,2-trimethyl And a 1-ethyl-1-methyltrimethylene group, a 1-ethyl-2-methyltrimethylene group, a cyclohexane-1,4-diyl group, and a heptamethylene group. Especially, a trimethylene group and a hexamethylene group are preferable.
  • the compound represented by the above formula [1] can be prepared by using, for example, an isocyanuric acid and an olefin compound having a leaving group X as a starting material, which are conventionally known (for example, WO 2010/092947 pamphlet, JP 2012-25688 A).
  • Epoxides can be produced. Specifically, after reacting isocyanuric acid with an olefin compound represented by CH 2 CRCR 1 -L 1 -X to produce an olefin-substituted isocyanurate having an unsaturated bond (intermediate), By reacting the (intermediate) with a peroxide, the epoxy compound represented by the above formula [1] can be produced.
  • the leaving group X is not particularly limited as long as it is a group that reacts with the NH group of isocyanuric acid. Examples thereof include a hydroxy group, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, a toluenesulfonyloxy group, and a nitrobenzenesulfonyl group. Examples include an oxy group, an acetoxy group, a trifluoroacetoxy group, a halogen atom and the like.
  • R 1 and L 1 represent the same meaning as described above.
  • Examples of the epoxy compound include tris (3,4-epoxybutyl) isocyanurate, tris (4,5-epoxypentyl) isocyanurate, tris (5,6-epoxyhexyl) isocyanurate, tris (6,7- Epoxyheptyl) isocyanurate, tris (7,8-epoxyoctyl) isocyanurate, tris (8,9-epoxynonyl) isocyanurate and the like.
  • the epoxy compound a commercially available product can be suitably used, and examples thereof include TEPIC (registered trademark) -VL and FL (both manufactured by Nissan Chemical Industries, Ltd.). These epoxy compounds can be used alone or as a mixture of two or more.
  • R 2 represents a hydrogen atom or a methyl group
  • L 2 represents an alkylene group having 1 to 5 carbon atoms
  • A may contain a (n + 1) -valent ether bond. It represents a good aliphatic hydrocarbon group
  • n represents an integer of 2 to 5.
  • each R 2 may be the same or different
  • each L 2 may be the same or different
  • each A may be the same or different
  • Each n may be the same or different.
  • an ethylene group is preferred.
  • Examples of the aliphatic hydrocarbon group which may contain an (n + 1) -valent ether bond represented by A include, for example, those derived by removing (n + 1) hydrogen atoms from an aliphatic hydrocarbon having 1 to 10 carbon atoms. And (n + 1) -valent groups. Further, these groups may contain an ether bond (—O—) between any carbon-carbon bonds.
  • Examples of the aliphatic hydrocarbon having 1 to 10 carbon atoms include methane, ethane, propane, cyclopropane, butane, isobutane, cyclobutane, pentane, isopentane, neopentane, cyclopentane, hexane, isohexane, neohexane and biisopropyl. , Cyclohexane, heptane, octane, 2-ethylhexane, nonane, decane, adamantane and the like.
  • glycerin, diglycerin, triglycerin, 2-hydroxy-1,4-butanediol, trimethylolmethane, 1,1,1-trimethylolethane, 1,1,1-trimethylolpropane examples thereof include (n + 1) -valent groups derived from a polyol selected from the group consisting of ditrimethylolpropane, pentaerythritol, and dipentaerythritol by removing a hydroxy group.
  • a trivalent group derived from 1,1,1-trimethylolpropane by removing a hydroxy group is preferable.
  • the compound represented by the above formula [2] is conventionally known from, for example, tris (carboxyalkyl) isocyanurate and an olefin compound having an ether bond and a group Y that reacts with a carboxyl group as a starting material (for example, International Publication WO 2012/2012). / 128325 pamphlet), etc.).
  • an olefin-substituted isocyanate having an unsaturated bond is reacted by reacting tris (carboxyalkyl) isocyanurate with an olefin compound represented by (CH 2 CRCR 2 —CH 2 —O) n —AY.
  • the compound (intermediate) is reacted with a peroxide to produce the epoxy compound represented by the above formula [2].
  • a synthesis scheme is shown below.
  • the group Y is not particularly limited as long as it reacts with the carboxyl group of isocyanuric acid, and examples thereof include a hydroxy group and a halogen atom.
  • R 2 , L 2 and A represent the same meaning as described above.
  • Examples of the epoxy compound include 1,3,5-tris (2- (2,2-bis (glycidyloxymethyl) butoxycarbonyl) ethyl) isocyanurate and 1,3,5-tris (2- (2,2 2-bis (glycidyloxymethyl) -3- (glycidyloxy) propoxycarbonyl) ethyl) isocyanurate, 1,3,5-tris (2- (1- (glycidyloxymethyl) -2- (glycidyloxy) ethoxycarbonyl) ) Ethyl) isocyanurate and the like.
  • 1,3,5-tris (2- (2,2-bis (glycidyloxymethyl) butoxycarbonyl) ethyl) isocyanurate is preferable.
  • the epoxy compound commercially available products can be suitably used, and examples thereof include TEPIC (registered trademark) -UC (manufactured by Nissan Chemical Industries, Ltd.). These epoxy compounds can be used alone or as a mixture of two or more.
  • the composition for a moisture-proof sealing material of the present invention uses an isocyanuric acid-based epoxy compound, particularly, a semiconductor substrate such as a metal or ceramic, a semiconductor element and a lead electrode to be joined to the semiconductor element, and a cured semiconductor sealing resin.
  • a moisture-proof sealing material having excellent adhesion can be formed.
  • L 1 in the formula [1] represents an alkylene group having 2 to 7 carbon atoms
  • L 2 in the formula [2] represents a carbon atom having 2 to 7 carbon atoms.
  • the composition for a moisture-proof sealing material of the present invention is, for example, a compound represented by the formula A cured product excellent in stretchability can be formed as compared with a composition containing a compound in which L 1 in [1] represents a methylene group.
  • the polyfunctional epoxy compound having no isocyanuric acid skeleton is not particularly limited as long as it contains two or more epoxy groups in one molecule, and a commercially available product can be used.
  • bisphenol A epoxy resin, bisphenol F epoxy resin, hydrogenated bisphenol A epoxy resin, hydrogenated bisphenol F epoxy resin, bisphenol A novolak epoxy resin, bisphenol F novolak epoxy resin, and alicyclic polyglycidyl At least one polyfunctional epoxy compound selected from the group consisting of ether type epoxy resins is preferable, and bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, bisphenol A At least one polyfunctional epoxy compound selected from the group consisting of novolak polyglycidyl ether and dicyclopentadiene dimethanol diglycidyl ether Still more preferably, bisphenol F diglycidyl ether are particularly preferred.
  • epoxy compound commercially available products can be suitably used.
  • jER registered trademark 825, 827, 828, 828EL, 828US, 828XA, 834, 819, 806, 806H, 807, 4004P, 152, 157S70, 630, 630LSD, 871, 1750, YX8000, YX8034, YL980, YL983U, YX7105, YX7110B80, YX7400 Manufactured by Mitsubishi Chemical Corporation], Adeka Resin (registered trademark), EP-4100HF, EP-4901HF, EP-4000S, EP-4000L, EP-4003S, EP-4010S, EP-4010L, EP-4088S, EP-4088L, EP-330 E, EP-3300S, EP-3950S, EP-3950L, EP-3980S, EPR-4030, EP-49-23 (all manufactured by ADEKA Corporation), EPICLON (registered trademark)
  • epoxy compounds can be used alone or as a mixture of two or more.
  • a polyfunctional epoxy compound having no isocyanuric acid skeleton with an isocyanuric acid-based epoxy compound, a skeleton serving as a sufficient barrier against moisture can be obtained, so that a moisture-proof sealing material having high moisture permeability is formed.
  • An epoxy resin composition is obtained.
  • the amount of the polyfunctional epoxy compound (b) having no isocyanuric acid skeleton is, for example, 100 to 1,000 parts by mass, preferably 100 parts by mass, based on 100 parts by mass of the (a) isocyanuric acid-based epoxy compound. It is preferably used in an amount of 200 to 900 parts by mass, more preferably 250 to 500 parts by mass.
  • the polyfunctional oxetane compound is not particularly limited as long as it contains two or more oxetanyl groups in one molecule, and a commercially available product can be used.
  • the polyfunctional oxetane compound include bis ((oxetane-3-yl) methyl) ether, bis ((3-methyloxetane-3-yl) methyl) ether, and bis ((3-ethyloxetane-3-yl) Methyl) ether (DOX), 1,2-bis ((3-ethyloxetan-3-yl) methoxy) ethane, 1,2-bis ((3-ethyloxetan-3-yl) methoxy) propane, 1,3 -Bis ((3-ethyloxetane-3-yl) methoxy) propane, 1,4-bis ((3-ethyloxetane-3-yl) methoxy
  • polyfunctional oxetane compound commercially available products can be suitably used. Examples thereof include Alonoxetane (registered trademark) OXT-121 and 221 (all manufactured by Toagosei Co., Ltd.) and Eternacoll (registered trademark) OXBP. And OXIPA [all manufactured by Ube Industries, Ltd.] and the like. These polyfunctional oxetane compounds can be used alone or in combination of two or more. By using a polyfunctional oxetane compound, a composition for a moisture-proof sealing material having excellent curability in a short time can be obtained.
  • the amount of the (c) polyfunctional oxetane compound to be used is, for example, 1 to 100 parts by mass, preferably 100 parts by mass, based on 100 parts by mass of the (a) isocyanuric acid-based epoxy compound and (b) the polyfunctional epoxy compound in total. Is preferably used in an amount of 2 to 50 parts by mass, more preferably 5 to 25 parts by mass.
  • the moisture-proof sealing material composition of the present invention does not immediately cure even when the components (a) to (d) are mixed, so that the storage stability is excellent and a sufficient working time can be obtained.
  • a photoacid generator As the polymerization initiator that generates acid, a photoacid generator can be used.
  • the photoacid generator is not particularly limited as long as it generates an acid (Lewis acid or Bronsted acid) directly or indirectly by light irradiation.
  • the curable composition containing the photoacid generator is cured by light irradiation without heating, and thus can be suitably used as a moisture-proof sealing material for an organic EL display substrate having low heat resistance.
  • the photoacid generator include onium salts such as iodonium salts, sulfonium salts, phosphonium salts, selenium salts, metallocene complex compounds, iron arene complex compounds, disulfone compounds, sulfonic acid derivative compounds, triazine compounds, acetophenone derivatives And a diazomethane compound.
  • onium salts such as iodonium salts, sulfonium salts, phosphonium salts, selenium salts, metallocene complex compounds, iron arene complex compounds, disulfone compounds, sulfonic acid derivative compounds, triazine compounds, acetophenone derivatives And a diazomethane compound.
  • iodonium salt examples include diphenyliodonium, 4,4′-dichlorodiphenyliodonium, 4,4′-dimethoxydiphenyliodonium, 4,4′-di-tert-butyldiphenyliodonium, and 4-methylphenyl (4- ( 2-methylpropyl) phenyl) iodonium, 3,3'-dinitrophenyliodonium, 4- (1-ethoxycarbonylethoxy) phenyl (2,4,6-trimethylphenyl) iodonium, 4-methoxyphenyl (phenyl) iodonium and the like
  • iodonium chloride, bromide, mesylate, tosylate, trifluoromethanesulfonate, tetrafluoroborate, tetrakis (pentafluorophenyl) borate, hexafluorophosphate, hexafluoroarsene D
  • sulfonium salt examples include triphenylsulfonium, diphenyl (4-tert-butylphenyl) sulfonium, tris (4-tert-butylphenyl) sulfonium, diphenyl (4-methoxyphenyl) sulfonium, and tris (4-methylphenyl) Sulfonium, tris (4-methoxyphenyl) sulfonium, tris (4-ethoxyphenyl) sulfonium, diphenyl (4- (phenylthio) phenyl) sulfonium, tris (4- (phenylthio) phenyl) sulfonium, tris (4- (4-acetyl) Chloride, bromide, trifluoromethanesulfonate, tetrafluoroborate, tetrakis (pentafluorophenyl) borate, hexyl of sulf
  • Examples of the phosphonium salt include chloride, bromide, and tetrafluorophosphonium such as tetraphenylphosphonium, ethyltriphenylphosphonium, tetra (p-methoxyphenyl) phosphonium, ethyltri (p-methoxyphenyl) phosphonium, and benzyltriphenylphosphonium.
  • tetrafluorophosphonium such as tetraphenylphosphonium, ethyltriphenylphosphonium, tetra (p-methoxyphenyl) phosphonium, ethyltri (p-methoxyphenyl) phosphonium, and benzyltriphenylphosphonium.
  • arylphosphonium salts such as borate, hexafluorophosphate and hexafluoroantimonate.
  • selenium salt examples include, for example, triarylselenium salts such as triphenylselenium hexafluorophosphate.
  • iron arene complex compound examples include bis ( ⁇ 5-cyclopentadienyl) ( ⁇ 6-isopropylbenzene) iron (II) hexafluorophosphate.
  • the photoacid generator is commercially available, for example, CPI (registered trademark) -100P, 101A, 200K, 210S, 310B, 310FG, 410S, and IK-1 Co., Ltd.], IRGACURE (registered trademark) 250, 270, 290, GSID 26-1 [all manufactured by BASF Japan Co., Ltd.], WPAG-145, 149, 170, 199, 336, same 367, 370, 469, 638, 699, WPI-113, 116, 169, 170, 124 [all manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.] and the like can be preferably used. . These photoacid generators can be used alone or in combination of two or more.
  • a sulfonium salt compound or an iodonium salt compound is preferable as a polymerization initiator.
  • compounds having an anionic species such as tetrakis (pentafluorophenyl) borate, hexafluorophosphate, and hexafluoroantimonate exhibiting strong acidity, and particularly, a reaction.
  • a salt compound of tetrakis (pentafluorophenyl) borate is preferred from the viewpoint that hydrogen fluoride is not sometimes produced as a by-product.
  • the content of the photoacid generator in the moisture-proof sealing material composition of the present invention is based on 100 parts by mass of the total of (a) the isocyanuric acid-based epoxy compound, (b) the polyfunctional epoxy compound, and (c) the polyfunctional oxetane compound.
  • it can be 0.1 to 20 parts by mass, preferably 0.1 to 10 parts by mass, more preferably 0.5 to 10 parts by mass.
  • a photobase generator can be used as the polymerization initiator for generating a base.
  • the photobase generator is not particularly limited as long as it generates a base (Lewis base or Bronsted base) directly or indirectly by light irradiation. Since the moisture-proof sealing material composition containing the photobase generator cures by light irradiation without heating, it can be suitably used as a moisture-proof sealing material for organic EL display substrates having low heat resistance.
  • the photobase generator can be obtained as a commercial product. Examples thereof include WPBG-174, 018, 041, 015, 172, 166, 140, 168, 025, 167, and 300. , 266, 158, 165, 082, and 027 [all manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.] and the like. These photobase generators can be used alone or in combination of two or more.
  • the content of the photobase generator in the moisture-proof sealing material composition of the present invention is based on 100 parts by mass of (a) an isocyanuric acid-based epoxy compound, (b) a polyfunctional epoxy compound, and (c) a polyfunctional oxetane compound.
  • the amount can be 0.1 to 30 parts by mass, preferably 0.1 to 20 parts by mass, and more preferably 0.5 to 10 parts by mass.
  • the moisture-proof sealing material composition of the present invention may contain a conventional additive as long as the effects of the present invention are not impaired.
  • additives include, for example, solvents, surfactants, adhesion promoters, thickeners, sensitizers, defoamers, leveling agents, coating improvers, lubricants, stabilizers (antioxidants, Heat stabilizers, light stabilizers, etc.), plasticizers, dissolution promoters, fillers (such as silica), antistatic agents, silane coupling agents and the like.
  • solvents for example, solvents, surfactants, adhesion promoters, thickeners, sensitizers, defoamers, leveling agents, coating improvers, lubricants, stabilizers (antioxidants, Heat stabilizers, light stabilizers, etc.), plasticizers, dissolution promoters, fillers (such as silica), antistatic agents, silane coupling agents and the like.
  • silane coupling agent is not particularly limited as long as it contains an alkoxysilyl group and other reactive functional groups in the molecule, and a commercially available product can be used.
  • silane coupling agent examples include vinyl group-containing silane coupling agents such as trimethoxy (vinyl) silane, triethoxy (vinyl) silane, and trimethoxy (7-octenyl) silane; 2- (3,4-epoxycyclohexyl) ethyltrisilane Methoxysilane, 3-glycidyloxypropyldimethoxy (methyl) silane, 3-glycidyloxypropyltrimethoxysilane, diethoxy (3-glycidyloxypropyl) (methyl) silane, triethoxy (3-glycidyloxypropyl) silane, 8-glycidyloxy Epoxy group-containing silane coupling agents such as octyltrimethoxysilane and triethoxy (8-glycidyloxyoctyl) silane; vinylphenyl group-containing silane cups such as trimethoxy (4-vinylphenyl) silane 3-methacryl
  • an epoxy group-containing silane coupling agent is preferable, a glycidyl group-containing silane coupling agent is more preferable, and 3-glycidyloxypropyltrimethoxysilane and triethoxy (3-glycidyloxypropyl) silane are particularly preferable.
  • silane coupling agent for example, Shin-Etsu Silicone (registered trademark) KBM-1003, KBE-1003, KBM-1083, KBM-303, KBM-402 KBM-403, KBE-402, KBE-403, KBM-4803, KBM-1403, KBM-502, KBM-503, KBE-502, KBE-503, KBM-5803 KBM-5103, KBM-602, KBM-603, KBM-6803, KBM-903, KBE-903, KBE-9103P, KBM-573, KBM-575, KBE-585 , The same KBE-9007, the same KBM-9659, the same KBE-9659, the same KBM-802, the same KBM-803, X-12-967C [both manufactured by Shin-Etsu Chemical Co., Ltd.], and the like.
  • Shin-Etsu Silicone registered trademark
  • silane coupling agents can be used alone or as a mixture of two or more. By adding these silane coupling agents, a composition for a moisture-proof sealing material having excellent ion migration resistance can be obtained.
  • a silane coupling agent for example, 0.1% by mass of the total of (a) the isocyanuric acid-based epoxy compound, (b) the polyfunctional epoxy compound, and (c) the polyfunctional oxetane compound. It is preferably used in an amount of 1 to 10 parts by mass, preferably 0.1 to 5 parts by mass, more preferably 0.5 to 2 parts by mass.
  • composition for a moisture-proof sealing material of the present invention can be prepared by mixing the components by a known method.
  • the mixing is not particularly limited as long as it can be uniformly mixed.
  • the mixing is performed under heating as necessary in consideration of the viscosity, and is performed at a temperature of 10 to 100 ° C. for 0.5 to 1 hour. If necessary, defoaming and stirring are further performed to remove air bubbles in the composition.
  • the composition for a moisture-proof seal material of the present invention can be used as a sealing material or an adhesive material between a shield material and a substrate or an electrode in an electric device such as an organic EL display, in particular, an organic EL element of an organic EL display. it can. Thereby, the organic EL element can be prevented from being corroded and oxidized by moisture and oxygen from the outside, and the formation of a dark spot and a decrease in luminance can be prevented.
  • the method for curing the moisture-proof sealing material composition of the present invention is not particularly limited, and a known method such as irradiation with active energy rays such as light can be used.
  • the active energy ray examples include an ultraviolet ray, an electron beam, and an X-ray, and an ultraviolet ray is particularly preferable.
  • a light source used for ultraviolet irradiation a solar ray, a chemical lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, a metal halide lamp, a xenon lamp, a UV-LED, or the like can be used. Since the composition for a moisture-proof seal material of the present invention is cured by being applied and irradiated with an active energy ray, a heating (baking) step at a high temperature is not required for curing. Therefore, it can be suitably used for manufacturing an organic EL element having low heat resistance.
  • the moisture-proof sealing material composition of the present invention is excellent in photocurability and can form a cured product excellent in moisture-proof property, so that various elements can be appropriately sealed. Furthermore, the moisture-proof sealing material composition of the present invention can form a cured product having excellent stretchability, and is therefore very useful as a sealing material for sealing a display element such as an organic EL element used for a flexible display.
  • ADGIC monoallyl diglycidyl isocyanurate [MA-DGIC manufactured by Shikoku Chemicals Co., Ltd.]
  • TEOIC Tris (7,8-epoxyoctyl) isocyanurate [TEPIC (registered trademark) -FL manufactured by Nissan Chemical Industries, Ltd.]
  • TEPEIC Tris (4,5-epoxypentyl) isocyanurate [TEPIC (registered trademark) -VL manufactured by Nissan Chemical Industries, Ltd.]
  • TGIC triglycidyl isocyanurate [TEPIC (registered trademark) -L manufactured by Nissan Chemical Industries, Ltd.)
  • BPAN bisphenol A novolak type epoxy resin [jER (registered trademark) 157S70 manufactured by Mitsubishi Chemical Corporation]
  • BPF bisphenol F type epoxy resin [jER (registered trademark) 807, manufactured by Mitsubishi Chemical Corporation)
  • DCP dicyclopentadiene dimethanol diglycidyl
  • Example 1 20 parts by mass of TEPeIC as an isocyanuric acid-based epoxy compound, 70 parts by mass of BPF as a polyfunctional epoxy compound having no isocyanuric acid skeleton, 10 parts by mass of DOX as a polyfunctional oxetane compound, and 3 parts by mass of C101A (in terms of active ingredient) as a polymerization initiator are mixed. did. This mixture was stirred and defoamed (2,000 rpm for 4 minutes, followed by 1,000 rpm for 4 minutes) to prepare Composition 1. This composition was bar-coated on a PET film [Lumirror (registered trademark) S10 manufactured by Toray Industries, Inc.].
  • This coating film was cured by irradiating it with UV light at 20 mW / cm 2 for 50 seconds using a high-pressure mercury lamp in an air atmosphere.
  • the cured product was peeled from the PET film to obtain a cured film having a thickness of about 100 ⁇ m.
  • Examples 2 to 4, Comparative Examples 1 and 2 Each cured film was obtained in the same manner as in Example 1 except that each composition was changed to the description in Table 1.
  • the compositions 5 and 6 were insufficiently cured under the same curing conditions (exposure conditions) and remained sticky on the surface of the cured product. Therefore, they were further heated (post-cured) on a hot plate at 100 ° C. for 30 minutes.
  • Table 1 shows the moisture permeability and elongation at break of each cured film.
  • the cured products obtained from the compositions of Examples 1 to 4 had lower moisture permeability and the elongation at break than the cured products obtained from the compositions of Comparative Examples 1 and 2. Was also higher. That is, it was shown that the composition of the present invention can provide a cured product having excellent moisture resistance and stretchability. In addition, it was confirmed that the compositions of Examples 1 to 4 obtained cured products excellent in moisture resistance and stretchability only by UV exposure, and were excellent in photocurability.
  • compositions 7 to 10 were prepared in the same manner as in Example 1, except that each composition was changed as described in Table 2.
  • Example 2 A cured film having a thickness of about 100 ⁇ m was prepared in the same manner as in Example 1 except that the obtained composition was used. The moisture permeability of each cured film was evaluated in the same manner as in Example 1. Table 3 shows the results.
  • a silicone rubber spacer having a thickness of 500 ⁇ m was placed on a glass substrate on which two silver electrodes having the shape shown in FIG. 1 were formed, and each composition was applied so as to cover both electrodes. did.
  • the coated substrate was covered with a quartz glass substrate of the same size as that of the coated substrate, which had been previously subjected to a release treatment by Optool (registered trademark) DSX (manufactured by Daikin Industries, Ltd.).
  • Optool registered trademark
  • DSX manufactured by Daikin Industries, Ltd.
  • UV-LED wavelength: 365 nm
  • thermo-hygrostat set to the temperature and humidity shown in Table 3, a DC voltage shown in Table 3 was applied to both electrodes of the obtained test piece, and ion migration occurred (the resistance between both electrodes was 10%). The time up to 5 ⁇ or less) was measured and evaluated. The results are shown in Table 3.
  • the cured products (Examples 6 to 10) obtained from the compositions using the sulfonium salt compounds having tetrakis (pentafluorophenyl) borate ion as the polymerization initiator maintained low moisture permeability. As it was, it was confirmed that the ion migration resistance was excellent. It was also confirmed that the addition of the silane coupling agent further improved the ion migration resistance (Example 10).

Abstract

The purpose of the present invention is to provide a composition for moistureproof sealing materials which has excellent photocurability and gives cured objects excellent in terms of moistureproofness and stretachability. A composition for moistureproof sealing materials which comprises (a) at least one isocyanuric-acid-based epoxy compound selected from the group consisting of compounds represented by formula [1] and compounds represented by formula [2], (b) a polyfunctional epoxy compound having no isocyanuric acid skeleton, (c) a polyfunctional oxetane compound, and (d) a polymerization initiator which generates an acid or a base upon irradiation with actinic rays. (In formula [1], R1 represents a hydrogen atom or a methyl group and L1 represents a C2-7 alkylene group; the R1 moieties may be the same or different and the L1 moieties may be the same or different.) (In formula [2], R2 represents a hydrogen atom or a methyl group, L2 represents a C1-5 alkylene group, A represents an (n+1)-valent aliphatic hydrocarbon group optionally containing an ether bond, and n is an integer of 2-5; the R2 moieties may be the same or different, the L2 moieties may be the same or different, the A moieties may be the same or different, and the n's may be the same or different.)

Description

防湿シール材用組成物Composition for moisture-proof sealing material
 本発明は、防湿シール材用組成物、それから得られた硬化物及び該硬化物を搭載した有機ELディスプレイに関する。 The present invention relates to a composition for a moisture-proof sealing material, a cured product obtained therefrom, and an organic EL display mounted with the cured product.
 近年、電気、電子業界において、種々の表示素子を利用したフラットパネルディスプレイ(FPD)の開発、製造が行われている。これらのディスプレイの多くは、ガラスやプラスチックなどのフラットパネルからなるセルに表示素子を封止したものである。その代表として、液晶ディスプレイ(LCD)、エレクトロルミネッセンスディスプレイ(ELD)、電子ペーパー等が挙げられる。 In recent years, flat panel displays (FPDs) using various display elements have been developed and manufactured in the electric and electronic industries. Many of these displays have a display element sealed in a cell made of a flat panel such as glass or plastic. Typical examples thereof include a liquid crystal display (LCD), an electroluminescence display (ELD), and electronic paper.
 これらのうち、ELディスプレイ、とりわけ有機ELディスプレイは自然発光ならではの高視野角、高コントラスト性に加え、高輝度、高効率、高速応答性等の点で優れており、次世代のフラットパネルディスプレイとして注目を集めている。また、電極及び発光層が非常に薄膜であるため、プラスチック基材上に形成させることで、フレキシブルなディスプレイや大型平面照明用途としての可能性も検討されている。 Among these, EL displays, especially organic EL displays, are excellent in terms of high brightness, high efficiency, high-speed response, and the like in addition to the high viewing angle and high contrast unique to natural light emission. Attracting attention. Further, since the electrodes and the light-emitting layer are very thin, the possibility of forming them on a plastic base material for use as a flexible display or large-scale flat lighting is also being studied.
 有機EL素子は、電子注入電極から直接、又は電子輸送層を介して発光層に注入された電子と、正孔注入電極から直接、又は正孔輸送層を介して発光層に注入された正孔との再結合により発光が生じる。このような発光機構に基づく有機EL素子の電極には、非常に活性で化学的に不安定な合金が用いられている。このため、外部からの水分や酸素による腐食、酸化を受け易く、ダークスポットと呼ばれる未発光部の形成とその著しい増加、及び経時での輝度の低下が見られる。また、有機EL素子の発光層や電荷輸送層には有機材料が用いられているため、水分や酸素により劣化を受け易く、同様にダークスポットの形成や輝度低下を招くという課題があった。 The organic EL element is composed of an electron injected into the light emitting layer directly from the electron injection electrode or through the electron transport layer, and a hole injected directly into the light emitting layer from the hole injection electrode or through the hole transport layer. Light emission is generated by recombination with the hydrogen. Very active and chemically unstable alloys are used for the electrodes of the organic EL device based on such a light emitting mechanism. Therefore, it is susceptible to corrosion and oxidation by moisture and oxygen from the outside, and a non-light-emitting portion called a dark spot is formed and markedly increased, and luminance decreases with time. Further, since an organic material is used for the light emitting layer and the charge transport layer of the organic EL element, the organic layer is easily deteriorated by moisture and oxygen, and similarly, there is a problem that a dark spot is formed and the luminance is reduced.
 そのため、実用的な有機EL素子とするには、有機材料や電極材料に水分や酸素が入らないように、素子を効果的に封止(シール)する必要がある。FPDの封止方法としては、従来LCDの封止に用いられてきた熱硬化型エポキシ樹脂を用いる方法があるが、このような熱硬化型エポキシ樹脂では、150~180℃という高温で2時間程度加熱させる必要があり、生産性が上がらないという課題があった。さらに、有機EL素子は、高輝度、高効率、高速応答性等の点で優れている一方で、耐熱性が低く、耐熱温度は通常80~100℃程度である。このため、有機ELディスプレイのシールにおいては、熱硬化型エポキシ樹脂を用いても十分に加熱硬化できないという課題もあった。 Therefore, in order to make a practical organic EL element, it is necessary to effectively seal the element so that moisture and oxygen do not enter the organic material and the electrode material. As a method for sealing the FPD, there is a method using a thermosetting epoxy resin which has been conventionally used for sealing the LCD. However, such a thermosetting epoxy resin is used at a high temperature of 150 to 180 ° C. for about 2 hours. There was a problem that it was necessary to heat and productivity did not increase. Further, the organic EL element is excellent in high brightness, high efficiency, high-speed response and the like, but has low heat resistance, and usually has a heat resistance temperature of about 80 to 100 ° C. For this reason, there has been a problem that even when a thermosetting epoxy resin is used, the sealing of the organic EL display cannot be sufficiently cured by heating.
 これらの問題を解決するため、低温速硬化が可能な光硬化型シール材の開発が試みられている。光硬化型シール材としては、通常、光ラジカル硬化型シール材と光カチオン硬化型シール材がある。
 光ラジカル硬化型シール材としては、主にアクリル系樹脂が用いられている。
 一方、光カチオン硬化型シール材としては、主にエポキシ系樹脂が用いられている(例えば、特許文献1,2。)。
In order to solve these problems, development of a photocurable sealing material that can be cured at low temperature and at high speed has been attempted. As the photocurable sealing material, there are usually a photoradical curable sealing material and a photocationically curable sealing material.
An acrylic resin is mainly used as the photo-radical-curable sealing material.
On the other hand, an epoxy resin is mainly used as a photocationically curable sealing material (for example, Patent Documents 1 and 2).
特開平11-224771号公報Japanese Patent Application Laid-Open No. H11-224771 特開2014-105286号公報JP 2014-105286 A
 上記アクリル樹脂は、多様なアクリレートモノマー、オリゴマーを使用できるという利点をもっている一方で、一般的に防湿性が不十分であり、また硬化収縮が大きく接着性が不十分であるといった課題もあり、未だ満足できる性能の材料はない。
 また、上記エポキシ樹脂は、一般に接着性は比較的良好であるが、感光性、速硬化性等の光硬化性は乏しく、一般的に硬く脆いという点で課題がある。
 さらに、近年では、ローラブルやフォルダブルといったフレキシブルディスプレイの開発も盛んに行われているため、光硬化性だけでなく、硬化後の機械物性、特に延伸性の高いシール材が求められていた。
 しかしながら、上述の特許文献1に記載の技術では、光カチオン硬化性を向上させるために配合した、水酸基を有する化合物の水酸基による連鎖移動のため高分子量の重合体を得られず、機械物性の向上は期待できない。
While the acrylic resin has an advantage that various acrylate monomers and oligomers can be used, there is still a problem that the moisture resistance is generally insufficient, and the curing shrinkage is large and the adhesiveness is insufficient. No material has satisfactory performance.
The epoxy resin generally has relatively good adhesiveness, but has poor photocurability such as photosensitivity and rapid curability, and has a problem in that it is generally hard and brittle.
Furthermore, in recent years, flexible displays such as rollable and foldable have been actively developed, so that not only a photocuring property but also a mechanical property after curing, particularly a sealing material having high stretchability has been demanded.
However, in the technique described in Patent Document 1 described above, a high molecular weight polymer cannot be obtained due to chain transfer by a hydroxyl group of a compound having a hydroxyl group, which is blended to improve photocationic curability, and mechanical properties are improved. Can not expect.
 したがって、本発明は、光硬化性に優れ、さらに防湿性、延伸性に優れる硬化物が得られる防湿シール材用組成物を提供することを目的とする。 Accordingly, an object of the present invention is to provide a composition for a moisture-proof sealing material which is excellent in photocurability and further provides a cured product excellent in moisture-proof property and stretchability.
 本発明者らは、上記の課題を解決するべく鋭意検討を行った結果、種々のエポキシ樹脂の中でも特定の構造を有するイソシアヌル酸系エポキシ化合物と、特定の多官能エポキシ化合物及び多官能オキセタン化合物とを含む組成物からなる硬化物が、防湿性、延伸性並びに基板や電極等に対する高い密着性を有し、例えば有機EL素子等の防湿シール材として優れていることを見出し本発明に至った。
 すなわち、本発明は、第1観点として、(a)式[1]で表される化合物及び式[2]で表される化合物からなる群から選択される少なくとも一種のイソシアヌル酸系エポキシ化合物、(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物、(c)多官能オキセタン化合物、及び(d)活性エネルギー線により酸又は塩基を発生する重合開始剤を含む、防湿シール材用組成物に関し、
Figure JPOXMLDOC01-appb-C000003
(式中、Rは、水素原子又はメチル基を表し、Lは、炭素原子数2~7のアルキレン基を表す。ここで、各Rは互いに同一であっても異なっていてもよく、各Lは互いに同一であっても異なっていてもよい。)
Figure JPOXMLDOC01-appb-C000004
(式中、Rは、水素原子又はメチル基を表し、Lは、炭素原子数1~5のアルキレン基を表し、Aは、(n+1)価のエーテル結合を含んでいてもよい脂肪族炭化水素基を表し、nは、2~5の整数を表す。ここで、各Rは互いに同一であっても異なっていてもよく、各Lは互いに同一であっても異なっていてもよく、各Aは互いに同一であっても異なっていてもよく、各nは互いに同一であっても異なっていてもよい。)
 第2観点として、前記(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物が、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、水添ビスフェノールF型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、及び脂環式ポリグリシジルエーテル型エポキシ樹脂からなる群から選ばれる少なくとも一種である、第1観点に記載の防湿シール材用組成物に関し、
 第3観点として、前記(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物が、ビスフェノールAジグリシジルエーテル、ビスフェノールFジグリシジルエーテル、水添ビスフェノールAジグリシジルエーテル、水添ビスフェノールFジグリシジルエーテル、ビスフェノールAノボラックポリグリシジルエーテル、及びジシクロペンタジエンジメタノールジグリシジルエーテルからなる群から選ばれる少なくとも一種である、第2観点に記載の防湿シール材用組成物に関し、
 第4観点として、前記(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物が、ビスフェノールFジグリシジルエーテルである、第3観点に記載の防湿シール材用組成物に関し、
 第5観点として、前記(d)活性エネルギー線により酸又は塩基を発生する重合開始剤が光酸発生剤である、第1観点乃至第4観点のうち何れか一つに記載の防湿シール材用組成物に関し、
 第6観点として、前記(a)イソシアヌル酸系エポキシ化合物が前記式[1]で表される化合物である、第1観点乃至第5観点のうち何れか一つに記載の防湿シール材用組成物に関し、
 第7観点として、その硬化物のJIS Z 0208(1976)の防湿包装材の透湿度試験方法のカップ法の条件B(温度40℃、相対湿度90%)により測定された透湿度が、厚さ100μm換算で20g/m・24h以下である、第1観点乃至第6観点のうち何れか一項に記載の防湿シール材用組成物に関し、
 第8観点として、有機ELディスプレイ防湿シール材用組成物である、第1観点乃至第7観点のうち何れか一つに記載の防湿シール材用組成物に関し、
 第9観点として、第1観点乃至第8観点のうち何れか一つに記載の防湿シール材用組成物を硬化してなる硬化物に関し、
 第10観点として、第9観点に記載の硬化物を搭載する、有機ELディスプレイに関する。
The present inventors have conducted intensive studies to solve the above problems, and as a result, among various epoxy resins, an isocyanuric acid-based epoxy compound having a specific structure, and a specific polyfunctional epoxy compound and a polyfunctional oxetane compound. It has been found that a cured product made of a composition containing the compound has moisture-proof properties, stretchability, and high adhesion to a substrate or an electrode, and is excellent as a moisture-proof sealing material for an organic EL device or the like, and has led to the present invention.
That is, the present invention provides, as a first aspect, (a) at least one isocyanuric acid-based epoxy compound selected from the group consisting of a compound represented by Formula [1] and a compound represented by Formula [2]; A composition for a moisture-proof seal material, comprising: b) a polyfunctional epoxy compound having no isocyanuric acid skeleton, (c) a polyfunctional oxetane compound, and (d) a polymerization initiator that generates an acid or a base by active energy rays.
Figure JPOXMLDOC01-appb-C000003
(Wherein, R 1 represents a hydrogen atom or a methyl group, and L 1 represents an alkylene group having 2 to 7 carbon atoms. Here, each R 1 may be the same or different. , Each L 1 may be the same or different.)
Figure JPOXMLDOC01-appb-C000004
(Wherein, R 2 represents a hydrogen atom or a methyl group, L 2 represents an alkylene group having 1 to 5 carbon atoms, and A represents an aliphatic group which may contain a (n + 1) -valent ether bond. Represents a hydrocarbon group, and n represents an integer of 2 to 5. Here, each R 2 may be the same or different, and each L 2 may be the same or different. And each A may be the same or different, and each n may be the same or different.)
As a second viewpoint, the (b) polyfunctional epoxy compound having no isocyanuric acid skeleton is a bisphenol A epoxy resin, a bisphenol F epoxy resin, a hydrogenated bisphenol A epoxy resin, a hydrogenated bisphenol F epoxy resin, Bisphenol A novolak type epoxy resin, bisphenol F novolak type epoxy resin, and at least one selected from the group consisting of alicyclic polyglycidyl ether type epoxy resin, the composition for a moisture-proof sealing material according to the first aspect,
As a third viewpoint, the polyfunctional epoxy compound (b) having no isocyanuric acid skeleton is bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, Bisphenol A novolak polyglycidyl ether, and at least one selected from the group consisting of dicyclopentadiene dimethanol diglycidyl ether, the composition for a moisture-proof sealing material according to the second aspect,
As a fourth aspect, the composition for a moisture-proof sealing material according to the third aspect, wherein (b) the polyfunctional epoxy compound having no isocyanuric acid skeleton is bisphenol F diglycidyl ether.
As a fifth aspect, for the moisture-proof sealing material according to any one of the first to fourth aspects, the polymerization initiator (d) that generates an acid or a base by an active energy ray is a photoacid generator. Regarding the composition,
As a sixth aspect, the composition for a moisture-proof sealing material according to any one of the first to fifth aspects, wherein the (a) isocyanuric acid-based epoxy compound is a compound represented by the formula [1]. With regard to
As a seventh aspect, the moisture permeability of the cured product measured by the cup method condition B (temperature 40 ° C., relative humidity 90%) of the moisture permeability test method of the moisture-proof packaging material according to JIS Z 0208 (1976) is represented by the following formula: 100μm or less 20g / m 2 · 24h with terms relates moisture sealant composition according to any one of the first aspect to the sixth aspect,
As an eighth aspect, the composition for a moisture-proof seal material according to any one of the first to seventh aspects, which is a composition for an organic EL display moisture-proof seal material,
As a ninth aspect, a cured product obtained by curing the moisture-proof sealing material composition according to any one of the first to eighth aspects,
As a tenth aspect, the present invention relates to an organic EL display on which the cured product according to the ninth aspect is mounted.
 エポキシ樹脂は、耐熱性、耐絶縁性及び密着性に優れる。この中でも、本発明の特徴であるイソシアヌル酸系エポキシ化合物は、極性元素を多く含むその構造から、各種基材等に対する密着性に優れるものであり、またイソシアヌル酸骨格とエポキシ環との間に有するアルキレン基或いはアルキレン基及びエステル結合を含むその構造から、延伸性に優れるものであるので、シアヌル酸骨格を含まない多官能のエポキシ化合物及び多官能オキセタン化合物と硬化させることにより、密着性、防湿性及び延伸性に優れるシール材となり得る。
 また、エポキシ環及びオキセタン環は酸又は塩基の存在下での反応性が高いので、活性エネルギー線により酸又は塩基を発生する重合開始剤を使用することで、加熱することなく光等の活性エネルギー線の照射により反応が進行する。
 したがって、本発明によれば、光硬化性に優れ、さらに防湿性、延伸性に優れる硬化物が得られる防湿シール材用組成物を提供できる。
 また、本発明によれば、活性エネルギー線により硬化し、防湿性及び延伸性に優れる硬化物が得られるので、有機ELディスプレイのように耐熱性が低く、水分や酸素により劣化を受けやすい機器の防湿シール材として有用な硬化物(防湿シール材)を提供できる。
Epoxy resin is excellent in heat resistance, insulation resistance and adhesion. Among them, the isocyanuric acid-based epoxy compound, which is a feature of the present invention, has excellent adhesion to various substrates and the like due to its structure containing many polar elements, and has between the isocyanuric acid skeleton and the epoxy ring. Because of its structure containing an alkylene group or an alkylene group and an ester bond, it is excellent in stretchability. Therefore, by curing with a polyfunctional epoxy compound and a polyfunctional oxetane compound not containing a cyanuric acid skeleton, adhesion and moisture resistance are improved. And a sealing material having excellent stretchability.
Further, since the epoxy ring and the oxetane ring have high reactivity in the presence of an acid or a base, the use of a polymerization initiator that generates an acid or a base by an active energy ray enables the activation energy such as light without heating. The reaction proceeds by irradiation with a ray.
Therefore, according to the present invention, it is possible to provide a composition for a moisture-proof sealing material which is excellent in photocurability and further provides a cured product excellent in moistureproofness and stretchability.
Further, according to the present invention, a cured product which is cured by an active energy ray and has excellent moisture-proof properties and stretchability can be obtained. Therefore, a device having low heat resistance such as an organic EL display and susceptible to deterioration by moisture or oxygen is used. A cured product (moisture-proof sealing material) useful as a moisture-proof sealing material can be provided.
図1は、イオンマイグレーション評価に用いた銀電極が形成されたガラス基板の模式図である。FIG. 1 is a schematic view of a glass substrate on which a silver electrode used for ion migration evaluation is formed. 図2は、イオンマイグレーション評価に用いた試験片の作製過程を示す模式図である。FIG. 2 is a schematic view showing a process of preparing a test piece used for ion migration evaluation.
<防湿シール材用組成物>
 本発明の防湿シール材用組成物は、例えば有機ELディスプレイにおいて、有機EL素子を効果的に封止するための防湿シール材を形成するために用いられる防湿シール材用組成物であって、上記(a)式[1]で表される化合物及び式[2]で表される化合物から選択されるイソシアヌル酸系エポキシ化合物、(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物、(c)多官能オキセタン化合物、及び(d)活性エネルギー線により酸又は塩基を発生する重合開始剤を含む、防湿シール材用組成物である。
<Composition for moisture-proof sealing material>
The composition for a moisture-proof seal material of the present invention is, for example, a composition for a moisture-proof seal material used for forming a moisture-proof seal material for effectively sealing an organic EL element in an organic EL display, (A) an isocyanuric acid epoxy compound selected from the compound represented by the formula [1] and the compound represented by the formula [2], (b) a polyfunctional epoxy compound having no isocyanuric acid skeleton, (c) A moisture-proof seal material composition comprising a polyfunctional oxetane compound and (d) a polymerization initiator that generates an acid or a base by an active energy ray.
[(a)成分]
<式[1]で表されるエポキシ化合物>
 上記式[1]中、Rは、水素原子又はメチル基を表し、Lは、炭素原子数2~7のアルキレン基を表す。ここで、各Rは互いに同一であっても異なっていてもよく、各Lは互いに同一であっても異なっていてもよい。
 Lが表す炭素原子数2~7のアルキレン基としては、例えば、エチレン基、トリメチレン基、1-メチルエチレン基、テトラメチレン基、1-メチルトリメチレン基、1,1-ジメチルエチレン基、ペンタメチレン基、1-メチルテトラメチレン基、2-メチルテトラメチレン基、1,1-ジメチルトリメチレン基、1,2-ジメチルトリメチレン基、2,2-ジメチルトリメチレン基、1-エチルトリメチレン基、ヘキサメチレン基、1-メチルペンタメチレン基、2-メチルペンタメチレン基、3-メチルペンタメチレン基、1,1-ジメチルテトラメチレン基、1,2-ジメチルテトラメチレン基、2,2-ジメチルテトラメチレン基、1-エチルテトラメチレン基、1,1,2-トリメチルトリメチレン基、1,2,2-トリメチルトリメチレン基、1-エチル-1-メチルトリメチレン基、1-エチル-2-メチルトリメチレン基、シクロヘキサン-1,4-ジイル基、ヘプタメチレン基等が挙げられる。中でも、トリメチレン基、ヘキサメチレン基が好ましい。
[Component (a)]
<Epoxy compound represented by formula [1]>
In the above formula [1], R 1 represents a hydrogen atom or a methyl group, and L 1 represents an alkylene group having 2 to 7 carbon atoms. Here, each R 1 may be the same or different, and each L 1 may be the same or different.
Examples of the alkylene group having 2 to 7 carbon atoms represented by L 1 include ethylene, trimethylene, 1-methylethylene, tetramethylene, 1-methyltrimethylene, 1,1-dimethylethylene, and pentane. Methylene group, 1-methyltetramethylene group, 2-methyltetramethylene group, 1,1-dimethyltrimethylene group, 1,2-dimethyltrimethylene group, 2,2-dimethyltrimethylene group, 1-ethyltrimethylene group , Hexamethylene, 1-methylpentamethylene, 2-methylpentamethylene, 3-methylpentamethylene, 1,1-dimethyltetramethylene, 1,2-dimethyltetramethylene, 2,2-dimethyltetramethylene Methylene group, 1-ethyltetramethylene group, 1,1,2-trimethyltrimethylene group, 1,2,2-trimethyl And a 1-ethyl-1-methyltrimethylene group, a 1-ethyl-2-methyltrimethylene group, a cyclohexane-1,4-diyl group, and a heptamethylene group. Especially, a trimethylene group and a hexamethylene group are preferable.
 上記式[1]で表される化合物は、例えば、イソシアヌル酸及び脱離基Xを有するオレフィン化合物を出発原料として、従来公知(例えば、国際公開第2010/092947号パンフレット、特開2012-25688号公報等に記載)のエポキシドの合成方法によって製造可能である。
 具体的には、イソシアヌル酸と、CH=CR-L-Xで表されるオレフィン化合物とを反応させて不飽和結合を有するオレフィン置換イソシアヌレート(中間体)を製造した後、該化合物(中間体)と過酸化物を反応させて、上記式[1]で表されるエポキシ化合物を製造することができる。一例として、合成スキームを以下に示す。
 なお、脱離基Xは、イソシアヌル酸のN-H基と反応する基であれば特に限定されないが、例えば、ヒドロキシ基、メタンスルホニルオキシ基、トリフルオロメタンスルホニルオキシ基、トルエンスルホニルオキシ基、ニトロベンゼンスルホニルオキシ基、アセトキシ基、トリフルオロアセトキシ基、ハロゲン原子等が挙げられる。
Figure JPOXMLDOC01-appb-C000005
 上記式中、R及びLは前記と同じ意味を表す。
The compound represented by the above formula [1] can be prepared by using, for example, an isocyanuric acid and an olefin compound having a leaving group X as a starting material, which are conventionally known (for example, WO 2010/092947 pamphlet, JP 2012-25688 A). Epoxides) can be produced.
Specifically, after reacting isocyanuric acid with an olefin compound represented by CH 2 CRCR 1 -L 1 -X to produce an olefin-substituted isocyanurate having an unsaturated bond (intermediate), By reacting the (intermediate) with a peroxide, the epoxy compound represented by the above formula [1] can be produced. As an example, a synthesis scheme is shown below.
The leaving group X is not particularly limited as long as it is a group that reacts with the NH group of isocyanuric acid. Examples thereof include a hydroxy group, a methanesulfonyloxy group, a trifluoromethanesulfonyloxy group, a toluenesulfonyloxy group, and a nitrobenzenesulfonyl group. Examples include an oxy group, an acetoxy group, a trifluoroacetoxy group, a halogen atom and the like.
Figure JPOXMLDOC01-appb-C000005
In the above formula, R 1 and L 1 represent the same meaning as described above.
 上記エポキシ化合物としては、例えば、トリス(3,4-エポキシブチル)イソシアヌレート、トリス(4,5-エポキシペンチル)イソシアヌレート、トリス(5,6-エポキシヘキシル)イソシアヌレート、トリス(6,7-エポキシヘプチル)イソシアヌレート、トリス(7,8-エポキシオクチル)イソシアヌレート、トリス(8,9-エポキシノニル)イソシアヌレート等が挙げられる。
 また上記エポキシ化合物は、市販品を好適に使用することができ、例えば、TEPIC(登録商標)-VL、同FL[何れも日産化学(株)製]等が挙げられる。これらのエポキシ化合物は、単独で又は二種以上の混合物として使用することができる。
Examples of the epoxy compound include tris (3,4-epoxybutyl) isocyanurate, tris (4,5-epoxypentyl) isocyanurate, tris (5,6-epoxyhexyl) isocyanurate, tris (6,7- Epoxyheptyl) isocyanurate, tris (7,8-epoxyoctyl) isocyanurate, tris (8,9-epoxynonyl) isocyanurate and the like.
As the epoxy compound, a commercially available product can be suitably used, and examples thereof include TEPIC (registered trademark) -VL and FL (both manufactured by Nissan Chemical Industries, Ltd.). These epoxy compounds can be used alone or as a mixture of two or more.
<式[2]で表される化合物>
 上記式[2]中、Rは、水素原子又はメチル基を表し、Lは、炭素原子数1~5のアルキレン基を表し、Aは、(n+1)価のエーテル結合を含んでいてもよい脂肪族炭化水素基を表し、nは、2~5の整数を表す。ここで、各Rは互いに同一であっても異なっていてもよく、各Lは互いに同一であっても異なっていてもよく、各Aは互いに同一であっても異なっていてもよく、各nは互いに同一であっても異なっていてもよい。
 Lが表す炭素原子数1~5のアルキレン基としては、例えば、メチレン基、エチレン基、トリメチレン基、メチルエチレン基、テトラメチレン基、1-メチルトリメチレン基、2-メチルトリメチレン基、1,1-ジメチルエチレン基、ペンタメチレン基、1-メチルテトラメチレン基、2-メチルテトラメチレン基、1,1-ジメチルトリメチレン基、1,2-ジメチルトリメチレン基、2,2-ジメチルトリメチレン基、1-エチルトリメチレン基等が挙げられる。中でも、エチレン基が好ましい。
<Compound represented by Formula [2]>
In the formula [2], R 2 represents a hydrogen atom or a methyl group, L 2 represents an alkylene group having 1 to 5 carbon atoms, and A may contain a (n + 1) -valent ether bond. It represents a good aliphatic hydrocarbon group, and n represents an integer of 2 to 5. Here, each R 2 may be the same or different, each L 2 may be the same or different, each A may be the same or different, Each n may be the same or different.
The alkylene group having 1 to 5 carbon atoms which L 2 represents, for example, methylene group, ethylene group, trimethylene group, methylethylene group, tetramethylene group, 1-methyltrimethylene group, 2-methyltrimethylene group, 1 1,1-dimethylethylene group, pentamethylene group, 1-methyltetramethylene group, 2-methyltetramethylene group, 1,1-dimethyltrimethylene group, 1,2-dimethyltrimethylene group, 2,2-dimethyltrimethylene And a 1-ethyltrimethylene group. Among them, an ethylene group is preferred.
 Aが表す(n+1)価のエーテル結合を含んでいてもよい脂肪族炭化水素基としては、例えば、炭素原子数1~10の脂肪族炭化水素から(n+1)個の水素原子を除いて誘導される、(n+1)価の基が挙げられる。またこれらの基は、任意の炭素-炭素結合間にエーテル結合(-O-)を含んでいてもよい。上記炭素原子数1~10の脂肪族炭化水素としては、例えば、メタン、エタン、プロパン、シクロプロパン、ブタン、イソブタン、シクロブタン、ペンタン、イソペンタン、ネオペンタン、シクロペンタン、ヘキサン、イソヘキサン、ネオヘキサン、ビイソプロピル、シクロヘキサン、へブタン、オクタン、2-エチルヘキサン、ノナン、デカン、アダマンタン等が挙げられる。
 具体的には、例えば、グリセリン、ジグリセリン、トリグリセリン、2-ヒドロキシ-1,4-ブタンジオール、トリメチロールメタン、1,1,1-トリメチロールエタン、1,1,1-トリメチロールプロパン、ジトリメチロールプロパン、ペンタエリスリトール、及びジペンタエリスリトールからなる群から選ばれるポリオールからヒドロキシ基を除いて誘導される(n+1)価の基が挙げられる。中でも、1,1,1-トリメチロールプロパンからヒドロキシ基を除いて誘導される3価の基が好ましい。
Examples of the aliphatic hydrocarbon group which may contain an (n + 1) -valent ether bond represented by A include, for example, those derived by removing (n + 1) hydrogen atoms from an aliphatic hydrocarbon having 1 to 10 carbon atoms. And (n + 1) -valent groups. Further, these groups may contain an ether bond (—O—) between any carbon-carbon bonds. Examples of the aliphatic hydrocarbon having 1 to 10 carbon atoms include methane, ethane, propane, cyclopropane, butane, isobutane, cyclobutane, pentane, isopentane, neopentane, cyclopentane, hexane, isohexane, neohexane and biisopropyl. , Cyclohexane, heptane, octane, 2-ethylhexane, nonane, decane, adamantane and the like.
Specifically, for example, glycerin, diglycerin, triglycerin, 2-hydroxy-1,4-butanediol, trimethylolmethane, 1,1,1-trimethylolethane, 1,1,1-trimethylolpropane, Examples thereof include (n + 1) -valent groups derived from a polyol selected from the group consisting of ditrimethylolpropane, pentaerythritol, and dipentaerythritol by removing a hydroxy group. Among them, a trivalent group derived from 1,1,1-trimethylolpropane by removing a hydroxy group is preferable.
 上記式[2]で表される化合物は、例えば、イソシアヌル酸トリス(カルボキシアルキル)及びカルボキシル基と反応する基Y及びエーテル結合を有するオレフィン化合物を出発原料として、従来公知(例えば、国際公開第2012/128325号パンフレット等に記載)のエポキシドの合成方法によって製造可能である。 The compound represented by the above formula [2] is conventionally known from, for example, tris (carboxyalkyl) isocyanurate and an olefin compound having an ether bond and a group Y that reacts with a carboxyl group as a starting material (for example, International Publication WO 2012/2012). / 128325 pamphlet), etc.).
 具体的には、イソシアヌル酸トリス(カルボキシアルキル)と、(CH=CR-CH-O)-A-Yで表されるオレフィン化合物とを反応させて不飽和結合を有するオレフィン置換イソシアヌレート(中間体)を製造した後、該化合物(中間体)と過酸化物を反応させて、上記式[2]で表されるエポキシ化合物を製造することができる。一例として、合成スキームを以下に示す。
 なお、基Yは、イソシアヌル酸のカルボキシル基と反応する基であれば特に限定されないが、例えば、ヒドロキシ基及びハロゲン原子等が挙げられる。
Figure JPOXMLDOC01-appb-C000006
 上記式中、R、L及びAは前記と同じ意味を表す。
Specifically, an olefin-substituted isocyanate having an unsaturated bond is reacted by reacting tris (carboxyalkyl) isocyanurate with an olefin compound represented by (CH 2 CRCR 2 —CH 2 —O) n —AY. After producing the nurate (intermediate), the compound (intermediate) is reacted with a peroxide to produce the epoxy compound represented by the above formula [2]. As an example, a synthesis scheme is shown below.
The group Y is not particularly limited as long as it reacts with the carboxyl group of isocyanuric acid, and examples thereof include a hydroxy group and a halogen atom.
Figure JPOXMLDOC01-appb-C000006
In the above formula, R 2 , L 2 and A represent the same meaning as described above.
 上記エポキシ化合物としては、例えば、1,3,5-トリス(2-(2,2-ビス(グリシジルオキシメチル)ブトキシカルボニル)エチル)イソシアヌレート、1,3,5-トリス(2-(2,2-ビス(グリシジルオキシメチル)-3-(グリシジルオキシ)プロポキシカルボニル)エチル)イソシアヌレート、1,3,5-トリス(2-(1-(グリシジルオキシメチル)-2-(グリシジルオキシ)エトキシカルボニル)エチル)イソシアヌレート等が挙げられる。中でも、1,3,5-トリス(2-(2,2-ビス(グリシジルオキシメチル)ブトキシカルボニル)エチル)イソシアヌレートが好ましい。
 また上記エポキシ化合物は、市販品を好適に使用することができ、例えば、TEPIC(登録商標)-UC[日産化学(株)製]等が挙げられる。これらのエポキシ化合物は、単独で又は二種以上の混合物として使用することができる。
Examples of the epoxy compound include 1,3,5-tris (2- (2,2-bis (glycidyloxymethyl) butoxycarbonyl) ethyl) isocyanurate and 1,3,5-tris (2- (2,2 2-bis (glycidyloxymethyl) -3- (glycidyloxy) propoxycarbonyl) ethyl) isocyanurate, 1,3,5-tris (2- (1- (glycidyloxymethyl) -2- (glycidyloxy) ethoxycarbonyl) ) Ethyl) isocyanurate and the like. Among them, 1,3,5-tris (2- (2,2-bis (glycidyloxymethyl) butoxycarbonyl) ethyl) isocyanurate is preferable.
As the epoxy compound, commercially available products can be suitably used, and examples thereof include TEPIC (registered trademark) -UC (manufactured by Nissan Chemical Industries, Ltd.). These epoxy compounds can be used alone or as a mixture of two or more.
 本発明の防湿シール材用組成物はイソシアヌル酸系エポキシ化合物を用いることにより、特に、金属やセラミック等の半導体基板、半導体素子及び半導体素子と接合するリード電極等、並びに半導体封止樹脂硬化物と優れた密着性を有する防湿シール材を形成することができる。
 また、本発明のイソシアヌル酸系エポキシ化合物は、式[1]中のLが炭素原子数2乃至7のアルキレン基を表するものであり、また式[2]中のLが炭素原子数1~5のアルキレン基を表し且つAが(n+1)価のエーテル結合を含んでいてもよい脂肪族炭化水素基を表すものであるので、本発明の防湿シール材用組成物は、例えば、式[1]中のLがメチレン基を表すものを含む組成物と比して延伸性に優れる硬化物を形成することができる。
The composition for a moisture-proof sealing material of the present invention uses an isocyanuric acid-based epoxy compound, particularly, a semiconductor substrate such as a metal or ceramic, a semiconductor element and a lead electrode to be joined to the semiconductor element, and a cured semiconductor sealing resin. A moisture-proof sealing material having excellent adhesion can be formed.
In the isocyanuric acid epoxy compound of the present invention, L 1 in the formula [1] represents an alkylene group having 2 to 7 carbon atoms, and L 2 in the formula [2] represents a carbon atom having 2 to 7 carbon atoms. Since A represents an alkylene group of 1 to 5 and A represents an aliphatic hydrocarbon group which may contain an (n + 1) -valent ether bond, the composition for a moisture-proof sealing material of the present invention is, for example, a compound represented by the formula A cured product excellent in stretchability can be formed as compared with a composition containing a compound in which L 1 in [1] represents a methylene group.
[(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物]
 イソシアヌル酸骨格を有さない多官能エポキシ化合物としては、エポキシ基を1分子中に2個以上含むものであれば、特に限定されず、市販品として入手可能なものを使用できる。例えば、1,2,7,8-ジエポキシオクタン、1,4-ブタンジオールジグリシジルエーテル、1,6-へキサンジオールジグリシジルエーテル、1,6-ジメチロールパーフルオロヘキサンジグリシジルエーテル、(ポリ)エチレングリコールジグリシジルエーテル、(ポリ)プロピレングリコールジグリシジルエーテル、ネオペンチルグリコールジグリシジルエーテル、グリセロールトリグリシジルエーテル、ジグリセロールポリグリシジルエーテル、トリメチロールエタントリグリシジルエーテル、トリメチロールプロパントリグリシジルエーテル、ペンタエリスリトールジグリシジルエーテル、ペンタエリスリトールテトラグリシジルエーテル、ペンタエリスリトールポリグリシジルエーテル、ソルビトールポリグリシジルエーテル、1,4-シクロヘキサンジメタノールジグリシジルエーテル、ジシクロペンタジエンジメタノールジグリシジルエーテル、ジブロモフェニル=グリシジル=エーテル、2,6-ジグリシジルフェニル=グリシジル=エーテル、レゾルシノールジグリシジルエーテル、ビス(2,7-ジグリシジルオキシナフタレン-1-イル)メタン、1,1,2,2-テトラキス(4-グリシジルオキシフェニル)エタン、1,1,3-トリス(4-グリシジルオキシフェニル)プロパン、ビスフェノールAジグリシジルエーテル、ビスフェノールFジグリシジルエーテル、ビスフェノールSジグリシジルエーテル、テトラブロモビスフェノールAジグリシジルエーテル、水添ビスフェノールAジグリシジルエーテル、水添ビスフェノールFジグリシジルエーテル、ビスフェノールヘキサフルオロアセトンジグリシジルエーテル、ビス(2,3-エポキシシクロペンチル)エーテル、1,2-ビス(3,4-エポキシシクロヘキシルメトキシ)エタン、エチレングリコールビス(3,4-エポキシシクロヘキサンカルボキシレート)、3,4-エポキシシクロヘキサンカルボン酸(3,4-エポキシシクロヘキシル)メチル、4,5-エポキシ-2-メチルシクロヘキサンカルボン酸4,5-エポキシ-2-メチルシクロヘキシルメチル、アジピン酸ビス(3,4-エポキシシクロヘキシルメチル)、1,2-エポキシ-4-(エポキシエチル)シクロヘキサン、4-(スピロ[3,4-エポキシシクロヘキサン-1,5’-[1,3]ジオキサン]-2’-イル)-1,2-エポキシシクロヘキサン、アジピン酸ジグリシジル、フタル酸ジグリシジル、テトラヒドロフタル酸ジグリシジル、1,2-シクロヘキサンジカルボン酸ジグリシジル、N,N-ジグリシジル-4-グリシジルオキシアニリン、N,N,N’,N’-テトラグリシジル-m-キシリレンジアミン、1,3-ビス(N,N-ジグリシジルアミノメチル)シクロヘキサン、4,4’-メチレンビス(N,N-ジグリシジルアニリン)、2-(4,4-ジメチルペンタン-2-イル)-5,7,7-トリメチルオクタン酸2,2-ビス(グリシジルオキシメチル)ブチル、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、水添ビスフェノールF型エポキシ樹脂、ビスフェノールS型エポキシ樹脂、脂環式エポキシ樹脂、トリスフェノールメタン型エポキシ樹脂、テトラフェノールエタン型エポキシ樹脂、脂環式ポリグリシジルエーテル型エポキシ樹脂、フェノールノボラック型エポキシ樹脂、クレゾールノボラック型エポキシ樹脂、ナフタレンノボラック型エポキシ樹脂、アントラセンノボラック型エポキシ樹脂、ビフェニレンノボラック型エポキシ樹脂、キシリレンノボラック型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、トリフェノールメタンノボラック型エポキシ樹脂、テトラキスフェノールノボラック型エポキシ樹脂、ジシクロペンタジエンノボラック型エポキシ樹脂等が挙げられるが、これらに限定されるものではない。
[(B) Polyfunctional epoxy compound having no isocyanuric acid skeleton]
The polyfunctional epoxy compound having no isocyanuric acid skeleton is not particularly limited as long as it contains two or more epoxy groups in one molecule, and a commercially available product can be used. For example, 1,2,7,8-diepoxyoctane, 1,4-butanediol diglycidyl ether, 1,6-hexanediol diglycidyl ether, 1,6-dimethylol perfluorohexane diglycidyl ether, (poly ) Ethylene glycol diglycidyl ether, (poly) propylene glycol diglycidyl ether, neopentyl glycol diglycidyl ether, glycerol triglycidyl ether, diglycerol polyglycidyl ether, trimethylolethane triglycidyl ether, trimethylolpropane triglycidyl ether, pentaerythritol Diglycidyl ether, pentaerythritol tetraglycidyl ether, pentaerythritol polyglycidyl ether, sorbitol polyglycidyl ether 1,4-cyclohexanedimethanol diglycidyl ether, dicyclopentadiene dimethanol diglycidyl ether, dibromophenyl glycidyl ether, 2,6-diglycidylphenyl glycidyl ether, resorcinol diglycidyl ether, bis (2.7 -Diglycidyloxynaphthalen-1-yl) methane, 1,1,2,2-tetrakis (4-glycidyloxyphenyl) ethane, 1,1,3-tris (4-glycidyloxyphenyl) propane, bisphenol A diglycidyl Ether, bisphenol F diglycidyl ether, bisphenol S diglycidyl ether, tetrabromobisphenol A diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl Ether, bisphenol hexafluoroacetone diglycidyl ether, bis (2,3-epoxycyclopentyl) ether, 1,2-bis (3,4-epoxycyclohexylmethoxy) ethane, ethylene glycol bis (3,4-epoxycyclohexanecarboxylate) 3,4-epoxycyclohexanecarboxylate (3,4-epoxycyclohexyl) methyl, 4,5-epoxy-2-methylcyclohexanecarboxylate 4,5-epoxy-2-methylcyclohexylmethyl, adipate bis (3,4 -Epoxycyclohexylmethyl), 1,2-epoxy-4- (epoxyethyl) cyclohexane, 4- (spiro [3,4-epoxycyclohexane-1,5 '-[1,3] dioxane] -2'-yl) -1,2-epoxycyclohexyl Diglycidyl adipate, diglycidyl phthalate, diglycidyl tetrahydrophthalate, diglycidyl 1,2-cyclohexanedicarboxylate, N, N-diglycidyl-4-glycidyloxyaniline, N, N, N ′, N′-tetraglycidyl-m -Xylylenediamine, 1,3-bis (N, N-diglycidylaminomethyl) cyclohexane, 4,4'-methylenebis (N, N-diglycidylaniline), 2- (4,4-dimethylpentane-2- Yl) -2,2-bis (glycidyloxymethyl) butyl-5,7,7-trimethyloctanoate, bisphenol A epoxy resin, bisphenol F epoxy resin, hydrogenated bisphenol A epoxy resin, hydrogenated bisphenol F epoxy Resin, bisphenol S type epoxy resin, alicyclic epoxy Resin, trisphenolmethane epoxy resin, tetraphenolethane epoxy resin, alicyclic polyglycidyl ether epoxy resin, phenol novolak epoxy resin, cresol novolak epoxy resin, naphthalene novolak epoxy resin, anthracene novolak epoxy resin, Biphenylene novolak epoxy resin, xylylene novolak epoxy resin, bisphenol A novolak epoxy resin, bisphenol F novolak epoxy resin, triphenolmethane novolak epoxy resin, tetrakisphenol novolak epoxy resin, dicyclopentadiene novolak epoxy resin, etc. But are not limited to these.
 中でも、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、水添ビスフェノールF型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、及び脂環式ポリグリシジルエーテル型エポキシ樹脂からなる群から選ばれる少なくとも一種の多官能エポキシ化合物が好ましく、ビスフェノールAジグリシジルエーテル、ビスフェノールFジグリシジルエーテル、水添ビスフェノールAジグリシジルエーテル、水添ビスフェノールFジグリシジルエーテル、ビスフェノールAノボラックポリグリシジルエーテル、及びジシクロペンタジエンジメタノールジグリシジルエーテルからなる群から選ばれる少なくとも一種の多官能エポキシ化合物がより好ましく、ビスフェノールFジグリシジルエーテルが特に好ましい。
 また上記エポキシ化合物は、市販品を好適に使用することができ、例えば、jER(登録商標)825、同827、同828、同828EL、同828US、同828XA、同834、同819、同806、同806H、同807、同4004P、同152、同157S70、同630、同630LSD、同871、同1750、同YX8000、同YX8034、同YL980、同YL983U、同YX7105、同YX7110B80、同YX7400[何れも三菱ケミカル(株)製]、アデカレジン(登録商標)、同EP-4100HF、同EP-4901HF、同EP-4000S、同EP-4000L、同EP-4003S、同EP-4010S、同EP-4010L、同EP-4088S、同EP-4088L、同EP-3300E、同EP-3300S、同EP-3950S、同EP-3950L、同EP-3980S、同EPR-4030、同EP-49-23[何れも(株)ADEKA製]、EPICLON(登録商標)EXA-850CRP、同EXA-830CRP、同EXA-830LVP、同EXA-835LV、同HP-4032D、同HP-7200L、同HP-7200、同HP-7200H、同HP-7200HH、同HP-7200HHH、同HP-4700、同HP-4770、同HP-5000、同HP-6000、同EXA-4850-150、同EXA-4850-1000、同EXA-4816[何れもDIC(株)製]等が挙げられる。
 これらのエポキシ化合物は、単独で又は二種以上の混合物として使用することができる。
 これらイソシアヌル酸骨格を有さない多官能エポキシ化合物をイソシアヌル酸系エポキシ化合物と組み合せることにより、水分に対して十分なバリアとなる骨格が得られるので、耐透湿性の高い防湿シール材を形成することができるエポキシ樹脂組成物が得られる。
Among them, bisphenol A epoxy resin, bisphenol F epoxy resin, hydrogenated bisphenol A epoxy resin, hydrogenated bisphenol F epoxy resin, bisphenol A novolak epoxy resin, bisphenol F novolak epoxy resin, and alicyclic polyglycidyl At least one polyfunctional epoxy compound selected from the group consisting of ether type epoxy resins is preferable, and bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, bisphenol A At least one polyfunctional epoxy compound selected from the group consisting of novolak polyglycidyl ether and dicyclopentadiene dimethanol diglycidyl ether Still more preferably, bisphenol F diglycidyl ether are particularly preferred.
As the epoxy compound, commercially available products can be suitably used. For example, jER (registered trademark) 825, 827, 828, 828EL, 828US, 828XA, 834, 819, 806, 806H, 807, 4004P, 152, 157S70, 630, 630LSD, 871, 1750, YX8000, YX8034, YL980, YL983U, YX7105, YX7110B80, YX7400 Manufactured by Mitsubishi Chemical Corporation], Adeka Resin (registered trademark), EP-4100HF, EP-4901HF, EP-4000S, EP-4000L, EP-4003S, EP-4010S, EP-4010L, EP-4088S, EP-4088L, EP-330 E, EP-3300S, EP-3950S, EP-3950L, EP-3980S, EPR-4030, EP-49-23 (all manufactured by ADEKA Corporation), EPICLON (registered trademark) EXA- 850CRP, EXA-830CRP, EXA-830LVP, EXA-835LV, HP-4032D, HP-7200L, HP-7200, HP-7200H, HP-7200HH, HP-7200HHH, HP- 4700, HP-4770, HP-5000, HP-6000, EXA-4850-150, EXA-4850-1000, and EXA-4816 (all manufactured by DIC Corporation).
These epoxy compounds can be used alone or as a mixture of two or more.
By combining such a polyfunctional epoxy compound having no isocyanuric acid skeleton with an isocyanuric acid-based epoxy compound, a skeleton serving as a sufficient barrier against moisture can be obtained, so that a moisture-proof sealing material having high moisture permeability is formed. An epoxy resin composition is obtained.
 本発明において、(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物の使用量は、前記(a)イソシアヌル酸系エポキシ化合物100質量部に対して、例えば100~1,000質量部、好ましくは200~900質量部、さらに好ましくは250~500質量部の量で使用することが好ましい。 In the present invention, the amount of the polyfunctional epoxy compound (b) having no isocyanuric acid skeleton is, for example, 100 to 1,000 parts by mass, preferably 100 parts by mass, based on 100 parts by mass of the (a) isocyanuric acid-based epoxy compound. It is preferably used in an amount of 200 to 900 parts by mass, more preferably 250 to 500 parts by mass.
[(c)多官能オキセタン化合物]
 多官能オキセタン化合物としては、オキセタニル基を1分子中に2個以上含むものであれば特に限定されず、市販品として入手可能なものを使用できる。
 多官能オキセタン化合物としては、例えば、ビス((オキセタン-3-イル)メチル)エーテル、ビス((3-メチルオキセタン-3-イル)メチル)エーテル、ビス((3-エチルオキセタン-3-イル)メチル)エーテル(DOX)、1,2-ビス((3-エチルオキセタン-3-イル)メトキシ)エタン、1,2-ビス((3-エチルオキセタン-3-イル)メトキシ)プロパン、1,3-ビス((3-エチルオキセタン-3-イル)メトキシ)プロパン、1,4-ビス((3-エチルオキセタン-3-イル)メトキシ)ブタン、1,6-ビス((3-エチルオキセタン-3-イル)メトキシ)ヘキサン、1,1,1-トリス((3-エチルオキセタン-3-イル)メトキシメチル)プロパン、1,2-ビス((3-エチルオキセタン-3-イル)メトキシ)ベンゼン、1,3-ビス((3-エチルオキセタン-3-イル)メトキシ)ベンゼン、1,4-ビス((3-エチルオキセタン-3-イル)メトキシ)ベンゼン、1,4-ビス((3-エチルオキセタン-3-イル)メトキシメチル)ベンゼン(XDO)、2,2′-ビス((3-エチルオキセタン-3-イル)メトキシ)ビフェニル、4,4′-ビス((3-エチルオキセタン-3-イル)メトキシ)ビフェニル、4,4′-ビス((3-エチルオキセタン-3-イル)メトキシメチル)ビフェニル、ビス((3-エチルオキセタン-3-イル)メチル)イソフタレート等が挙げられ、特にビス((3-エチルオキセタン-3-イル)メチル)エーテルが好ましい。
 また上記多官能オキセタン化合物は、市販品を好適に使用することができ、例えば、アロンオキセタン(登録商標)OXT-121、同221[何れも東亞合成(株)製]、Eternacoll(登録商標)OXBP、同OXIPA[何れも宇部興産(株)製]等が挙げられる。
 これらの多官能オキセタン化合物は、単独で又は二種以上を組み合わせて使用することができる。
 多官能オキセタン化合物を用いることにより、短時間での硬化性に優れた防湿シール材用組成物が得られる。
[(C) Polyfunctional oxetane compound]
The polyfunctional oxetane compound is not particularly limited as long as it contains two or more oxetanyl groups in one molecule, and a commercially available product can be used.
Examples of the polyfunctional oxetane compound include bis ((oxetane-3-yl) methyl) ether, bis ((3-methyloxetane-3-yl) methyl) ether, and bis ((3-ethyloxetane-3-yl) Methyl) ether (DOX), 1,2-bis ((3-ethyloxetan-3-yl) methoxy) ethane, 1,2-bis ((3-ethyloxetan-3-yl) methoxy) propane, 1,3 -Bis ((3-ethyloxetane-3-yl) methoxy) propane, 1,4-bis ((3-ethyloxetane-3-yl) methoxy) butane, 1,6-bis ((3-ethyloxetane-3 -Yl) methoxy) hexane, 1,1,1-tris ((3-ethyloxetane-3-yl) methoxymethyl) propane, 1,2-bis ((3-ethyloxetane- -Yl) methoxy) benzene, 1,3-bis ((3-ethyloxetane-3-yl) methoxy) benzene, 1,4-bis ((3-ethyloxetane-3-yl) methoxy) benzene, 1,4 -Bis ((3-ethyloxetane-3-yl) methoxymethyl) benzene (XDO), 2,2'-bis ((3-ethyloxetane-3-yl) methoxy) biphenyl, 4,4'-bis (( 3-ethyloxetane-3-yl) methoxy) biphenyl, 4,4'-bis ((3-ethyloxetane-3-yl) methoxymethyl) biphenyl, bis ((3-ethyloxetane-3-yl) methyl) iso Phthalate and the like are mentioned, and bis ((3-ethyloxetane-3-yl) methyl) ether is particularly preferable.
As the polyfunctional oxetane compound, commercially available products can be suitably used. Examples thereof include Alonoxetane (registered trademark) OXT-121 and 221 (all manufactured by Toagosei Co., Ltd.) and Eternacoll (registered trademark) OXBP. And OXIPA [all manufactured by Ube Industries, Ltd.] and the like.
These polyfunctional oxetane compounds can be used alone or in combination of two or more.
By using a polyfunctional oxetane compound, a composition for a moisture-proof sealing material having excellent curability in a short time can be obtained.
 本発明において、(c)多官能オキセタン化合物の使用量は、前記(a)イソシアヌル酸系エポキシ化合物及び(b)多官能エポキシ化合物の合計100質量部に対して、例えば1~100質量部、好ましくは2~50質量部、さらに好ましくは5~25質量部の量で使用することが好ましい。 In the present invention, the amount of the (c) polyfunctional oxetane compound to be used is, for example, 1 to 100 parts by mass, preferably 100 parts by mass, based on 100 parts by mass of the (a) isocyanuric acid-based epoxy compound and (b) the polyfunctional epoxy compound in total. Is preferably used in an amount of 2 to 50 parts by mass, more preferably 5 to 25 parts by mass.
[(d)活性エネルギー線により酸又は塩基を発生する重合開始剤]
 重合開始剤としては、光等の活性エネルギー線により酸又は塩基を発生し、(a)イソシアヌル酸系エポキシ化合物、(b)多官能エポキシ化合物及び(c)多官能オキセタン化合物の重合を開始できればよい。これにより、本発明の防湿シール材組成物は成分(a)乃至成分(d)を混合しても直ちに硬化が生じないため、保存安定性に優れ、また十分な作業時間が得られる。
[(D) Polymerization initiator generating acid or base by active energy ray]
As a polymerization initiator, it is sufficient that an acid or a base is generated by an active energy ray such as light to initiate polymerization of (a) an isocyanuric acid-based epoxy compound, (b) a polyfunctional epoxy compound, and (c) a polyfunctional oxetane compound. . Accordingly, the moisture-proof sealing material composition of the present invention does not immediately cure even when the components (a) to (d) are mixed, so that the storage stability is excellent and a sufficient working time can be obtained.
 酸を発生する重合開始剤としては、光酸発生剤を用いることができる。光酸発生剤は、光照射により直接又は間接的に酸(ルイス酸あるいはブレンステッド酸)を発生するものであれば特に限定されない。また、光酸発生剤を配合した硬化性組成物は、加熱によらず、光照射で硬化するので、耐熱性の低い有機ELディスプレイ基板用の防湿シール材として好適に使用することができる。 As the polymerization initiator that generates acid, a photoacid generator can be used. The photoacid generator is not particularly limited as long as it generates an acid (Lewis acid or Bronsted acid) directly or indirectly by light irradiation. Further, the curable composition containing the photoacid generator is cured by light irradiation without heating, and thus can be suitably used as a moisture-proof sealing material for an organic EL display substrate having low heat resistance.
 光酸発生剤の具体例としては、ヨードニウム塩、スルホニウム塩、ホスホニウム塩、セレニウム塩等のオニウム塩、メタロセン錯体化合物、鉄アレーン錯体化合物、ジスルホン系化合物、スルホン酸誘導体化合物、トリアジン系化合物、アセトフェノン誘導体化合物、ジアゾメタン系化合物などを挙げることができる。 Specific examples of the photoacid generator include onium salts such as iodonium salts, sulfonium salts, phosphonium salts, selenium salts, metallocene complex compounds, iron arene complex compounds, disulfone compounds, sulfonic acid derivative compounds, triazine compounds, acetophenone derivatives And a diazomethane compound.
 上記ヨードニウム塩としては、例えば、ジフェニルヨードニウム、4,4’-ジクロロジフェニルヨードニウム、4,4’-ジメトキシジフェニルヨードニウム、4,4’-ジ-tert-ブチルジフェニルヨードニウム、4-メチルフェニル(4-(2-メチルプロピル)フェニル)ヨードニウム、3,3’-ジニトロフェニルヨードニウム、4-(1-エトキシカルボニルエトキシ)フェニル(2,4,6-トリメチルフェニル)ヨードニウム、4-メトキシフェニル(フェニル)ヨードニウム等のヨードニウムの、クロリド、ブロミド、メシレート、トシレート、トリフルオロメタンスルホネート、テトラフルオロボレート、テトラキス(ペンタフルオロフェニル)ボレート、ヘキサフルオロホスフェート、ヘキサフルオロアルセネート、ヘキサフルオロアンチモネートなどのジアリールヨードニウム塩等が挙げられる。 Examples of the iodonium salt include diphenyliodonium, 4,4′-dichlorodiphenyliodonium, 4,4′-dimethoxydiphenyliodonium, 4,4′-di-tert-butyldiphenyliodonium, and 4-methylphenyl (4- ( 2-methylpropyl) phenyl) iodonium, 3,3'-dinitrophenyliodonium, 4- (1-ethoxycarbonylethoxy) phenyl (2,4,6-trimethylphenyl) iodonium, 4-methoxyphenyl (phenyl) iodonium and the like Of iodonium, chloride, bromide, mesylate, tosylate, trifluoromethanesulfonate, tetrafluoroborate, tetrakis (pentafluorophenyl) borate, hexafluorophosphate, hexafluoroarsene DOO, diaryliodonium salts such as hexafluoroantimonate, and the like.
 上記スルホニウム塩としては、例えば、トリフェニルスルホニウム、ジフェニル(4-tert-ブチルフェニル)スルホニウム、トリス(4-tert-ブチルフェニル)スルホニウム、ジフェニル(4-メトキシフェニル)スルホニウム、トリス(4-メチルフェニル)スルホニウム、トリス(4-メトキシフェニル)スルホニウム、トリス(4-エトキシフェニル)スルホニウム、ジフェニル(4-(フェニルチオ)フェニル)スルホニウム、トリス(4-(フェニルチオ)フェニル)スルホニウム、トリス(4-(4-アセチルフェニルチオ)フェニル)スルホニウム等のスルホニウムの、クロリド、ブロミド、トリフルオロメタンスルホネート、テトラフルオロボレート、テトラキス(ペンタフルオロフェニル)ボレート、ヘキサフルオロホスフェート、ヘキサフルオロアルセネート、ヘキサフルオロアンチモネート、トリス(トリフルオロメチルスルホニル)メタニドなどのトリアリールスルホニウム塩等が挙げられる。 Examples of the sulfonium salt include triphenylsulfonium, diphenyl (4-tert-butylphenyl) sulfonium, tris (4-tert-butylphenyl) sulfonium, diphenyl (4-methoxyphenyl) sulfonium, and tris (4-methylphenyl) Sulfonium, tris (4-methoxyphenyl) sulfonium, tris (4-ethoxyphenyl) sulfonium, diphenyl (4- (phenylthio) phenyl) sulfonium, tris (4- (phenylthio) phenyl) sulfonium, tris (4- (4-acetyl) Chloride, bromide, trifluoromethanesulfonate, tetrafluoroborate, tetrakis (pentafluorophenyl) borate, hexyl of sulfonium such as phenylthio) phenyl) sulfonium Hexafluorophosphate, hexafluoroarsenate, hexafluoroantimonate, triarylsulfonium salts, such as tris (trifluoromethylsulfonyl) methanide and the like.
 上記ホスホニウム塩としては、例えば、テトラフェニルホスホニウム、エチルトリフェニルホスホニウム、テトラ(p-メトキシフェニル)ホスホニウム、エチルトリ(p-メトキシフェニル)ホスホニウム、ベンジルトリフェニルホスホニウム等のホスホニウムの、クロリド、ブロミド、テトラフルオロボレート、ヘキサフルオロホスフェート、ヘキサフルオロアンチモネートなどのアリールホスホニウム塩等が挙げられる。 Examples of the phosphonium salt include chloride, bromide, and tetrafluorophosphonium such as tetraphenylphosphonium, ethyltriphenylphosphonium, tetra (p-methoxyphenyl) phosphonium, ethyltri (p-methoxyphenyl) phosphonium, and benzyltriphenylphosphonium. And arylphosphonium salts such as borate, hexafluorophosphate and hexafluoroantimonate.
 上記セレニウム塩としては、例えば、トリフェニルセレニウムヘキサフルオロホスフェートなどのトリアリールセレニウム塩等が挙げられる。 << Examples of the selenium salt include, for example, triarylselenium salts such as triphenylselenium hexafluorophosphate.
 上記鉄アレーン錯体化合物としては、例えば、ビス(η5-シクロペンタジエニル)(η6-イソプロピルベンゼン)鉄(II)ヘキサフルオロホスフェート等が挙げられる。 {Examples of the iron arene complex compound include bis (η5-cyclopentadienyl) (η6-isopropylbenzene) iron (II) hexafluorophosphate.
 また、光酸発生剤は市販品として入手可能であり、例えば、CPI(登録商標)-100P、同101A、同200K、同210S、同310B、同310FG、同410S、IK-1[何れもサンアプロ(株)製]、IRGACURE(登録商標)250、同270、同290、GSID26-1[何れもBASFジャパン(株)製]、WPAG-145、同149、同170、同199、同336、同367、同370、同469、同638、同699、WPI-113、同116、同169、同170、同124[何れも富士フイルム和光純薬(株)製]等を好適に用いることができる。
 これらの光酸発生剤は単独で、又は二種以上を組み合わせて用いることができる。
 これらの中でも、重合開始剤として、スルホニウム塩化合物又はヨードニウム塩化合物が好ましく、例えば強酸性を示すテトラキス(ペンタフルオロフェニル)ボレート、ヘキサフルオロホスフェート、ヘキサフルオロアンチモネート等のアニオン種を有する化合物、特に反応時にフッ化水素を副生しない観点からテトラキス(ペンタフルオロフェニル)ボレートの塩化合物が好ましい。
The photoacid generator is commercially available, for example, CPI (registered trademark) -100P, 101A, 200K, 210S, 310B, 310FG, 410S, and IK-1 Co., Ltd.], IRGACURE (registered trademark) 250, 270, 290, GSID 26-1 [all manufactured by BASF Japan Co., Ltd.], WPAG-145, 149, 170, 199, 336, same 367, 370, 469, 638, 699, WPI-113, 116, 169, 170, 124 [all manufactured by Fujifilm Wako Pure Chemical Industries, Ltd.] and the like can be preferably used. .
These photoacid generators can be used alone or in combination of two or more.
Among these, a sulfonium salt compound or an iodonium salt compound is preferable as a polymerization initiator. For example, compounds having an anionic species such as tetrakis (pentafluorophenyl) borate, hexafluorophosphate, and hexafluoroantimonate exhibiting strong acidity, and particularly, a reaction. A salt compound of tetrakis (pentafluorophenyl) borate is preferred from the viewpoint that hydrogen fluoride is not sometimes produced as a by-product.
 本発明の防湿シール材組成物における光酸発生剤の含有量は、(a)イソシアヌル酸系エポキシ化合物、(b)多官能エポキシ化合物及び(c)多官能オキセタン化合物の合計100質量部に対して、例えば0.1~20質量部、好ましくは0.1~10質量部、さらに好ましくは0.5~10質量部とすることができる。 The content of the photoacid generator in the moisture-proof sealing material composition of the present invention is based on 100 parts by mass of the total of (a) the isocyanuric acid-based epoxy compound, (b) the polyfunctional epoxy compound, and (c) the polyfunctional oxetane compound. For example, it can be 0.1 to 20 parts by mass, preferably 0.1 to 10 parts by mass, more preferably 0.5 to 10 parts by mass.
 また、塩基を発生する重合開始剤としては、光塩基発生剤を用いることができる。光塩基発生剤は、光照射により直接又は間接的に塩基(ルイス塩基あるいはブレンステッド塩基)を発生するものであれば特に限定されない。光塩基発生剤を配合した防湿シール材組成物は、加熱によらず、光照射で硬化するので、耐熱性の低い有機ELディスプレイ基板用の防湿シール材として好適に使用することができる。 光 As the polymerization initiator for generating a base, a photobase generator can be used. The photobase generator is not particularly limited as long as it generates a base (Lewis base or Bronsted base) directly or indirectly by light irradiation. Since the moisture-proof sealing material composition containing the photobase generator cures by light irradiation without heating, it can be suitably used as a moisture-proof sealing material for organic EL display substrates having low heat resistance.
 光塩基発生剤としては、例えば、9-アントリルメチル=N,N-ジエチルカルバメート等のアルキルアミン系光塩基発生剤;9-アントリル=N,N-ジシクロヘキシルカルバメート、1-(9,10-アントラキノン-2-イル)エチル=N,N-ジシクロヘキシルカルバメート、ジシクロヘキシルアンモニウム=2-(3-ベンゾイルフェニル)プロピオネート、9-アントリル=N-シクロヘキシルカルバメート、1-(9,10-アントラキノン-2-イル)エチル=N-シクロヘキシルカルバメート、シクロヘキシルアンモニウム=2-(3-ベンゾイルフェニル)プロピオネート、(E)-N-シクロヘキシル-3-(2-ヒドロキシフェニル)アクリルアミド等のシクロアルキルアミン系光塩基発生剤;9-アントリルメチル=ピペリジン-1-カルボキシレート、(E)-1-ピペリジノ-3-(2-ヒドロキシフェニル)-2-プロペン-1-オン、(2-ニトロフェニル)メチル=4-ヒドロキシピペリジン-1-カルボキシレート、(2-ニトロフェニル)メチル=4-(メタクリロイルオキシ)ピペリジン-1-カルボキシレート等のピペリジン系光塩基発生剤;グアニジニウム=2-(3-ベンゾイルフェニル)プロピオネート、1,2-ジイソプロピル-3-(ビス(ジメチルアミノ)メチレン)グアニジニウム=2-(3-ベンゾイルフェニル)プロピオネート、1,2-ジシクロヘキシル-4,4,5,5-テトラメチルビグアニジウム=n-ブチルトリフェニルボラート、1,5,7-トリアザビシクロ[4.4.0]デカ-5-エニウム=2-(9-オキソキサンテン-2-イル)プロピオネート等のグアニジン系光塩基発生剤;1-(9,10-アントラキノン-2-イル)エチル=イミダゾール-1-カルボキシレート等のイミダゾール系光塩基発生剤等が挙げられる。
 また、光塩基発生剤は市販品として入手可能であり、例えば、WPBG-174、同018、同041、同015、同172、同166、同140、同168、同025、同167、同300、同266、同158、同165、同082、同027[何れも富士フイルム和光純薬(株)製]等を好適に用いることができる。
 これら光塩基発生剤は、一種を単独で、又は二種以上を組み合わせて用いることができる。
Examples of the photobase generator include alkylamine photobase generators such as 9-anthrylmethyl = N, N-diethylcarbamate; 9-anthryl = N, N-dicyclohexylcarbamate; 1- (9,10-anthraquinone) -2-yl) ethyl = N, N-dicyclohexylcarbamate, dicyclohexylammonium = 2- (3-benzoylphenyl) propionate, 9-anthryl = N-cyclohexylcarbamate, 1- (9,10-anthraquinone-2-yl) ethyl = N-cyclohexylcarbamate, cyclohexylammonium = cycloalkylamine-based photobase generator such as 2- (3-benzoylphenyl) propionate, (E) -N-cyclohexyl-3- (2-hydroxyphenyl) acrylamide; 9-anthrylmethy = Piperidine-1-carboxylate, (E) -1-piperidino-3- (2-hydroxyphenyl) -2-propen-1-one, (2-nitrophenyl) methyl = 4-hydroxypiperidine-1-carboxylate , (2-nitrophenyl) methyl 4- (methacryloyloxy) piperidine-1-carboxylate and other piperidine photobase generators; guanidinium 2- (3-benzoylphenyl) propionate, 1,2-diisopropyl-3- (Bis (dimethylamino) methylene) guanidinium = 2- (3-benzoylphenyl) propionate, 1,2-dicyclohexyl-4,4,5,5-tetramethylbiguanidium = n-butyltriphenylborate, 1, 5,7-triazabicyclo [4.4.0] dec-5-enium = A guanidine-based photobase generator such as-(9-oxoxanthen-2-yl) propionate; an imidazole-based photobase generator such as 1- (9,10-anthraquinone-2-yl) ethyl imidazole-1-carboxylate And the like.
The photobase generator can be obtained as a commercial product. Examples thereof include WPBG-174, 018, 041, 015, 172, 166, 140, 168, 025, 167, and 300. , 266, 158, 165, 082, and 027 [all manufactured by Fuji Film Wako Pure Chemical Industries, Ltd.] and the like.
These photobase generators can be used alone or in combination of two or more.
 本発明の防湿シール材組成物における光塩基発生剤の含有量は、(a)イソシアヌル酸系エポキシ化合物、(b)多官能エポキシ化合物及び(c)多官能オキセタン化合物の合成100質量部に対して、例えば0.1~30質量部、好ましくは0.1~20質量部、さらに好ましくは0.5~10質量部とすることができる。 The content of the photobase generator in the moisture-proof sealing material composition of the present invention is based on 100 parts by mass of (a) an isocyanuric acid-based epoxy compound, (b) a polyfunctional epoxy compound, and (c) a polyfunctional oxetane compound. For example, the amount can be 0.1 to 30 parts by mass, preferably 0.1 to 20 parts by mass, and more preferably 0.5 to 10 parts by mass.
[その他成分]
 また、本発明の防湿シール材組成物は、本発明の効果を損なわない範囲で慣用の添加剤を含んでいてもよい。このような添加剤としては、例えば、溶剤、界面活性剤、密着促進剤、増粘剤、増感剤、消泡剤、レベリング剤、塗布性改良剤、潤滑剤、安定剤(酸化防止剤、熱安定剤、耐光安定剤など)、可塑剤、溶解促進剤、充填材(シリカなど)、帯電防止剤、シランカップリング剤などが挙げられる。これらの添加剤は単独で又は二種以上組み合わせてもよい。
[Other components]
Further, the moisture-proof sealing material composition of the present invention may contain a conventional additive as long as the effects of the present invention are not impaired. Such additives include, for example, solvents, surfactants, adhesion promoters, thickeners, sensitizers, defoamers, leveling agents, coating improvers, lubricants, stabilizers (antioxidants, Heat stabilizers, light stabilizers, etc.), plasticizers, dissolution promoters, fillers (such as silica), antistatic agents, silane coupling agents and the like. These additives may be used alone or in combination of two or more.
[シランカップリング剤]
 上記シランカップリング剤としては、分子内にアルコキシシリル基及びその他の反応性官能基含むものであれば特に限定されず、市販品として入手可能なものを使用できる。
[Silane coupling agent]
The silane coupling agent is not particularly limited as long as it contains an alkoxysilyl group and other reactive functional groups in the molecule, and a commercially available product can be used.
 シランカップリング剤としては、例えば、トリメトキシ(ビニル)シラン、トリエトキシ(ビニル)シラン、トリメトキシ(7-オクテニル)シラン等のビニル基含有シランカップリング剤;2-(3,4-エポキシシクロヘキシル)エチルトリメトキシシラン、3-グリシジルオキシプロピルジメトキシ(メチル)シラン、3-グリシジルオキシプロピルトリメトキシシラン、ジエトキシ(3-グリシジルオキシプロピル)(メチル)シラン、トリエトキシ(3-グリシジルオキシプロピル)シラン、8-グリシジルオキシオクチルトリメトキシシラン、トリエトキシ(8-グリシジルオキシオクチル)シラン等のエポキシ基含有シランカップリング剤;トリメトキシ(4-ビニルフェニル)シラン等のビニルフェニル基含有シランカップリング剤;3-メタクリロイルオキシプロピルジメトキシ(メチル)シラン、3-メタクリロイルオキシプロピルトリメトキシシラン、ジエトキシ(3-メタクリロイルオキシプロピル)メチルシラン、トリエトキシ(3-メタクリロイルオキシプロピル)シラン、トリメトキシ(8-メタクリロイルオキシオクチル)シラン等のメタクリル基含有シランカップリング剤;3-アクリロイルオキシプロピルトリメトキシシラン等のアクリル基含有シランカップリング剤;3-((2-アミノエチル)アミノ)プロピルジメトキシ(メチル)シラン、3-((2-アミノエチル)アミノ)プロピルトリメトキシシラン、8-((2-アミノエチル)アミノ)オクチルトリメトキシシラン、3-アミノプロピルトリメトキシシラン、3-アミノプロピルトリエトキシシラン、N-(1,3-ジメチルブチリデン)-3-トリエトキシシリルプロピルアミン、トリメトキシ(3-フェニルアミノプロピル)シラン、トリメトキシ(3-((2-((ビニルベンジル)アミノ)エチル)アミノ)プロピル)シラン塩酸塩等のアミノ基含有シランカップリング剤;トリメトキシ(3-ウレイドプロピル)シラン、トリエトキシ(3-ウレイドプロピル)シラン等のウレイド基含有シランカップリング剤;トリエトキシ(3-イソシアナトプロピル)シラン等のイソシアネート基含有シランカップリング剤;トリス(3-トリメトキシシリルプロピル)イソシアヌレート、トリス(3-トリエトキシシリルプロピル)イソシアヌレート等のイソシアヌレート型シランカップリング剤;3-メルカプトプロピルジメトキシ(メチル)シラン、3-メルカプトプロピルトリメトキシシラン等のメルカプト基含有シランカップリング剤;(3-トリメトキシシリルプロピル)コハク酸無水物等の酸無水物型シランカップリング剤等が挙げられる。
 中でも、エポキシ基含有シランカップリング剤が好ましく、グリシジル基含有シランカップリング剤がより好ましく、3-グリシジルオキシプロピルトリメトキシシラン、及びトリエトキシ(3-グリシジルオキシプロピル)シランが特に好ましい。
Examples of the silane coupling agent include vinyl group-containing silane coupling agents such as trimethoxy (vinyl) silane, triethoxy (vinyl) silane, and trimethoxy (7-octenyl) silane; 2- (3,4-epoxycyclohexyl) ethyltrisilane Methoxysilane, 3-glycidyloxypropyldimethoxy (methyl) silane, 3-glycidyloxypropyltrimethoxysilane, diethoxy (3-glycidyloxypropyl) (methyl) silane, triethoxy (3-glycidyloxypropyl) silane, 8-glycidyloxy Epoxy group-containing silane coupling agents such as octyltrimethoxysilane and triethoxy (8-glycidyloxyoctyl) silane; vinylphenyl group-containing silane cups such as trimethoxy (4-vinylphenyl) silane 3-methacryloyloxypropyldimethoxy (methyl) silane, 3-methacryloyloxypropyltrimethoxysilane, diethoxy (3-methacryloyloxypropyl) methylsilane, triethoxy (3-methacryloyloxypropyl) silane, trimethoxy (8-methacryloyloxyoctyl) A) silane-containing silane coupling agent such as silane; acryl-containing silane coupling agent such as 3-acryloyloxypropyltrimethoxysilane; 3-((2-aminoethyl) amino) propyldimethoxy (methyl) silane, 3- ((2-aminoethyl) amino) propyltrimethoxysilane, 8-((2-aminoethyl) amino) octyltrimethoxysilane, 3-aminopropyltrimethoxysilane, 3-aminopropyl Piltriethoxysilane, N- (1,3-dimethylbutylidene) -3-triethoxysilylpropylamine, trimethoxy (3-phenylaminopropyl) silane, trimethoxy (3-((2-((vinylbenzyl) amino) Amino group-containing silane coupling agents such as ethyl) amino) propyl) silane hydrochloride; ureido group-containing silane coupling agents such as trimethoxy (3-ureidopropyl) silane and triethoxy (3-ureidopropyl) silane; triethoxy (3- Isocyanate group-containing silane coupling agents such as isocyanatopropyl) silane; isocyanurate type silane coupling agents such as tris (3-trimethoxysilylpropyl) isocyanurate and tris (3-triethoxysilylpropyl) isocyanurate; 3- Mercap Mercapto group-containing silane coupling agents such as tripropyldimethoxy (methyl) silane and 3-mercaptopropyltrimethoxysilane; and acid anhydride type silane coupling agents such as (3-trimethoxysilylpropyl) succinic anhydride. Can be
Among them, an epoxy group-containing silane coupling agent is preferable, a glycidyl group-containing silane coupling agent is more preferable, and 3-glycidyloxypropyltrimethoxysilane and triethoxy (3-glycidyloxypropyl) silane are particularly preferable.
 また上記シランカップリング剤は、市販品を好適に使用することができ、例えば、信越シリコーン(登録商標)KBM-1003、同KBE-1003、同KBM-1083、同KBM-303、同KBM-402、同KBM-403、同KBE-402、同KBE-403、同KBM-4803、同KBM-1403、同KBM-502、同KBM-503、同KBE-502、同KBE-503、同KBM-5803、同KBM-5103、同KBM-602、同KBM-603、同KBM-6803、同KBM-903、同KBE-903、同KBE-9103P、同KBM-573、同KBM-575、同KBE-585、同KBE-9007、同KBM-9659、同KBE-9659、同KBM-802、同KBM-803、同X-12-967C[何れも信越化学工業(株)製]等が挙げられる。 Commercially available products can be suitably used as the silane coupling agent. For example, Shin-Etsu Silicone (registered trademark) KBM-1003, KBE-1003, KBM-1083, KBM-303, KBM-402 KBM-403, KBE-402, KBE-403, KBM-4803, KBM-1403, KBM-502, KBM-503, KBE-502, KBE-503, KBM-5803 KBM-5103, KBM-602, KBM-603, KBM-6803, KBM-903, KBE-903, KBE-9103P, KBM-573, KBM-575, KBE-585 , The same KBE-9007, the same KBM-9659, the same KBE-9659, the same KBM-802, the same KBM-803, X-12-967C [both manufactured by Shin-Etsu Chemical Co., Ltd.], and the like.
 これらのシランカップリング剤は、単独で又は二種以上の混合物として使用することができる。
 これらシランカップリング剤を添加することにより、イオンマイグレーション耐性に優れた防湿シール材用組成物が得られる。
These silane coupling agents can be used alone or as a mixture of two or more.
By adding these silane coupling agents, a composition for a moisture-proof sealing material having excellent ion migration resistance can be obtained.
 本発明において、シランカップリング剤を添加する場合、前記(a)イソシアヌル酸系エポキシ化合物、(b)多官能エポキシ化合物及び(c)多官能オキセタン化合物の合計100質量部に対して、例えば0.1~10質量部、好ましくは0.1~5質量部、さらに好ましくは0.5~2質量部の量で使用することが好ましい。 In the present invention, when a silane coupling agent is added, for example, 0.1% by mass of the total of (a) the isocyanuric acid-based epoxy compound, (b) the polyfunctional epoxy compound, and (c) the polyfunctional oxetane compound. It is preferably used in an amount of 1 to 10 parts by mass, preferably 0.1 to 5 parts by mass, more preferably 0.5 to 2 parts by mass.
[防湿シール材用組成物の調製方法]
 本発明の防湿シール材用組成物は、各成分を周知の方法で混合することにより調製することができる。混合は、均一に混合できれば特に限定されるものではなく、例えば粘度を考慮して必要に応じて加熱下で行われ、10~100℃の温度で0.5~1時間行う。必要であれば、さらに脱泡撹拌を行い組成物中の気泡を除去する。
[Method of preparing composition for moisture-proof sealing material]
The composition for a moisture-proof sealing material of the present invention can be prepared by mixing the components by a known method. The mixing is not particularly limited as long as it can be uniformly mixed. For example, the mixing is performed under heating as necessary in consideration of the viscosity, and is performed at a temperature of 10 to 100 ° C. for 0.5 to 1 hour. If necessary, defoaming and stirring are further performed to remove air bubbles in the composition.
[有機ELディスプレイ]
 本発明の防湿シール材用組成物は、有機ELディスプレイ等の電気機器、特に有機ELディスプレイの有機EL素子における封止(シール)材あるいはシールド材と基板若しくは電極との接着材として使用することができる。
 これにより、有機EL素子を外部からの水分や酸素による腐食、酸化を防止でき、ダークスポットの形成や輝度低下を防止できる。
 また、本発明の防湿シール材用組成物の硬化方法は、特に限定されないが、光等の活性エネルギー線照射等の公知の方法を利用できる。活性エネルギー線としては、紫外線、電子線、X線等が挙げられ、特に紫外線が好ましい。紫外線照射に用いる光源としては、太陽光線、ケミカルランプ、低圧水銀灯、高圧水銀灯、メタルハライドランプ、キセノンランプ、UV-LED等が使用できる。
 本発明の防湿シール材用組成物は、塗布し活性エネルギー線を照射することで硬化するので、硬化させるのに高温での加熱(ベーク)工程を必要としない。したがって、耐熱性の低い有機EL素子の製造に好適に使用できる。
[Organic EL display]
The composition for a moisture-proof seal material of the present invention can be used as a sealing material or an adhesive material between a shield material and a substrate or an electrode in an electric device such as an organic EL display, in particular, an organic EL element of an organic EL display. it can.
Thereby, the organic EL element can be prevented from being corroded and oxidized by moisture and oxygen from the outside, and the formation of a dark spot and a decrease in luminance can be prevented.
The method for curing the moisture-proof sealing material composition of the present invention is not particularly limited, and a known method such as irradiation with active energy rays such as light can be used. Examples of the active energy ray include an ultraviolet ray, an electron beam, and an X-ray, and an ultraviolet ray is particularly preferable. As a light source used for ultraviolet irradiation, a solar ray, a chemical lamp, a low-pressure mercury lamp, a high-pressure mercury lamp, a metal halide lamp, a xenon lamp, a UV-LED, or the like can be used.
Since the composition for a moisture-proof seal material of the present invention is cured by being applied and irradiated with an active energy ray, a heating (baking) step at a high temperature is not required for curing. Therefore, it can be suitably used for manufacturing an organic EL element having low heat resistance.
 本発明の防湿シール材組成物は、光硬化性に優れ、防湿性に優れる硬化物を形成できるので、各種素子を適切にシールすることが可能である。さらに、本発明の防湿シール材組成物は、延伸性に優れる硬化物を形成できるので、フレキシブルディスプレイに使用する有機EL素子等の表示素子をシールするためのシール材として非常に有用である。 湿 The moisture-proof sealing material composition of the present invention is excellent in photocurability and can form a cured product excellent in moisture-proof property, so that various elements can be appropriately sealed. Furthermore, the moisture-proof sealing material composition of the present invention can form a cured product having excellent stretchability, and is therefore very useful as a sealing material for sealing a display element such as an organic EL element used for a flexible display.
 以下、実施例及び比較例を挙げて、本発明をより具体的に説明するが、本発明は下記の実施例に限定されるものではない。なお、実施例において、試料の調製及び物性の分析に用いた装置及び条件は、以下のとおりである。 Hereinafter, the present invention will be described more specifically with reference to Examples and Comparative Examples, but the present invention is not limited to the following Examples. In the examples, the devices and conditions used for sample preparation and physical property analysis are as follows.
(1)撹拌脱泡
 装置:(株)シンキー製 自転・公転ミキサー あわとり練太郎(登録商標)ARE-310
(2)バーコート塗布
 装置:(株)エスエムテー製 PM-9050MC
 バーコーター:テスター産業(株)製 SA-203 No.65、ウエット膜厚148.6μm
 塗布速度:4m/分
(3)透湿度
 恒温恒湿装置:エスペック(株)製 小型環境試験器 SH-262
 透湿カップ:(株)井元製作所製 透湿カップ(ねじ締付式)
(4)引張試験
 装置:(株)島津製作所製 卓上形精密万能試験機オートグラフAGS-5kNX
 つかみ具:空気式平面形つかみ具
 つかみ歯:ラバーコートつかみ歯
 引張速度:5mm/分
 測定温度:室温(およそ23℃)
(5)イオンマイグレーション評価
 評価装置:エスペック(株)製 エレクトロケミカルマイグレーション評価システム AMI-025-U-5
 恒温恒湿装置:エスペック(株)製 小型環境試験器 SH-222
(1) Stirring and defoaming device: Rotating / revolving mixer manufactured by Shinky Co., Ltd. Awatori Rentaro (registered trademark) ARE-310
(2) Bar coater: PM-9050MC manufactured by SMT Co., Ltd.
Bar coater: SA-203 No. manufactured by Tester Sangyo Co., Ltd. 65, wet film thickness: 148.6 μm
Coating speed: 4 m / min (3) Moisture permeability Constant temperature and humidity device: Small environmental tester SH-262 manufactured by Espec Corporation
Moisture permeable cup: Made by Imoto Manufacturing Co., Ltd.
(4) Tensile test equipment: Tabletop precision universal testing machine Autograph AGS-5kNX manufactured by Shimadzu Corporation
Gripping tool: Pneumatic flat gripping tool Gripping tooth: Rubber coated gripping tooth Peeling speed: 5 mm / min Measurement temperature: Room temperature (about 23 ° C)
(5) Ion migration evaluation evaluation apparatus: Electrochemical migration evaluation system AMI-025-U-5 manufactured by Espec Corporation
Constant temperature and humidity device: Small environmental tester SH-222 manufactured by Espec Corporation
 また、用いた略号の意味は、以下のとおりである。
ADGIC:モノアリルジグリシジルイソシアヌレート[四国化成工業(株)製 MA-DGIC]
TEOIC:トリス(7,8-エポキシオクチル)イソシアヌレート[日産化学(株)製 TEPIC(登録商標)-FL]
TEPeIC:トリス(4,5-エポキシペンチル)イソシアヌレート[日産化学(株)製 TEPIC(登録商標)-VL]
TGIC:トリグリシジルイソシアヌレート[日産化学(株)製 TEPIC(登録商標)-L]
BPAN:ビスフェノールAノボラック型エポキシ樹脂[三菱ケミカル(株)製 jER(登録商標)157S70]
BPF:ビスフェノールF型エポキシ樹脂[三菱ケミカル(株)製 jER(登録商標)807]
DCP:ジシクロペンタジエンジメタノールジグリシジルエーテル[(株)ADEKA製 アデカレジン(登録商標)EP-4088L]
DOX:3,3’-(オキシビス(メチレン))ビス(3-エチルオキセタン)[東亞合成(株)製 アロンオキセタン(登録商標)OXT-221]
C100P:ジフェニル(4-(フェニルチオ)フェニル)スルホニウムヘキサフルオロホスフェート[サンアプロ(株)製 CPI(登録商標)-100P、50%プロピレンカーボネート溶液]
C101A:ジフェニル(4-(フェニルチオ)フェニル)スルホニウムヘキサフルオロアンチモネート(V)[サンアプロ(株)製 CPI(登録商標)-101A、50%プロピレンカーボネート溶液]
C310B:トリアリールスルホニウムテトラキス(ペンタフルオロフェニル)ボレート[サンアプロ(株)製 CPI(登録商標)-310B]
GTMS:3-グリシジルオキシプロピルトリメトキシシラン[信越化学工業(株)製 信越シリコーン(登録商標)KBM-403]
The meanings of the abbreviations used are as follows.
ADGIC: monoallyl diglycidyl isocyanurate [MA-DGIC manufactured by Shikoku Chemicals Co., Ltd.]
TEOIC: Tris (7,8-epoxyoctyl) isocyanurate [TEPIC (registered trademark) -FL manufactured by Nissan Chemical Industries, Ltd.]
TEPEIC: Tris (4,5-epoxypentyl) isocyanurate [TEPIC (registered trademark) -VL manufactured by Nissan Chemical Industries, Ltd.]
TGIC: triglycidyl isocyanurate [TEPIC (registered trademark) -L manufactured by Nissan Chemical Industries, Ltd.)
BPAN: bisphenol A novolak type epoxy resin [jER (registered trademark) 157S70 manufactured by Mitsubishi Chemical Corporation]
BPF: bisphenol F type epoxy resin [jER (registered trademark) 807, manufactured by Mitsubishi Chemical Corporation)
DCP: dicyclopentadiene dimethanol diglycidyl ether [ADEKARESIN (registered trademark) EP-4088L manufactured by ADEKA Corporation]
DOX: 3,3 ′-(oxybis (methylene)) bis (3-ethyloxetane) [Alonoxetane (registered trademark) OXT-221 manufactured by Toagosei Co., Ltd.]
C100P: diphenyl (4- (phenylthio) phenyl) sulfonium hexafluorophosphate [CPI (registered trademark) -100P, 50% propylene carbonate solution manufactured by San Apro Co., Ltd.]
C101A: diphenyl (4- (phenylthio) phenyl) sulfonium hexafluoroantimonate (V) [CPI (registered trademark) -101A manufactured by San Apro Co., Ltd., 50% propylene carbonate solution]
C310B: Triarylsulfonium tetrakis (pentafluorophenyl) borate [CPI (registered trademark) -310B manufactured by San Apro Co., Ltd.]
GTMS: 3-glycidyloxypropyltrimethoxysilane [Shin-Etsu Silicone (registered trademark) KBM-403 manufactured by Shin-Etsu Chemical Co., Ltd.]
[実施例1]
 イソシアヌル酸系エポキシ化合物としてTEPeIC20質量部、イソシアヌル酸骨格を有さない多官能エポキシ化合物としてBPF70質量部、多官能オキセタン化合物としてDOX10質量部、及び重合開始剤としてC101A3質量部(有効成分換算)を混合した。この混合物を、撹拌脱泡(2,000rpmで4分間、続けて1,000rpmで4分間)し、組成物1を調製した。
 この組成物を、PETフィルム[東レ(株)製 ルミラー(登録商標)S10]上にバーコート塗布した。この塗膜を、空気雰囲気下、高圧水銀ランプを用いUV光を20mW/cmで50秒間照射することで、硬化させた。硬化物をPETフィルムから剥離し、およそ100μmの膜厚を有する硬化膜を得た。
[Example 1]
20 parts by mass of TEPeIC as an isocyanuric acid-based epoxy compound, 70 parts by mass of BPF as a polyfunctional epoxy compound having no isocyanuric acid skeleton, 10 parts by mass of DOX as a polyfunctional oxetane compound, and 3 parts by mass of C101A (in terms of active ingredient) as a polymerization initiator are mixed. did. This mixture was stirred and defoamed (2,000 rpm for 4 minutes, followed by 1,000 rpm for 4 minutes) to prepare Composition 1.
This composition was bar-coated on a PET film [Lumirror (registered trademark) S10 manufactured by Toray Industries, Inc.]. This coating film was cured by irradiating it with UV light at 20 mW / cm 2 for 50 seconds using a high-pressure mercury lamp in an air atmosphere. The cured product was peeled from the PET film to obtain a cured film having a thickness of about 100 μm.
 得られた硬化膜の、透湿度及び破断伸びを評価した。各評価の手順を以下に示す。結果を表1に示す。 (4) The moisture permeability and elongation at break of the obtained cured film were evaluated. The procedure of each evaluation is shown below. Table 1 shows the results.
[透湿度]
 硬化膜の透湿度を、JIS Z 0208:1976防湿包装材の透湿度試験方法(カップ法)に準じて、透湿カップに塩化カルシウムを入れ、硬化膜から切り出した試験片を透湿カップ開口部に装着して試験体とした(透過面積28.3cm)。試験体を温度40℃、相対湿度90%(条件B)に設定した恒温恒湿装置中に入れた。24時間経過後、試験体を取り出し試験体の質量を測定した。試験体を再び恒温恒湿装置中に入れ24時間間隔で試験体を取り出して秤量する操作を、質量増加が一定になるまで繰り返し、膜の透湿度(実測)を算出した。
 なお、本試験では、試験片の膜厚の差異による影響を考慮し、膜厚が80~500μmの範囲となるように作製した硬化膜の透湿度を測定し、次式により100μm厚に換算した値を評価値とした。
 透湿度[g/m・24h]=透湿度(実測)×試験片膜厚[μm]÷100[μm]
[Moisture permeability]
The moisture permeability of the cured film was measured according to JIS Z 0208: 1976, a moisture permeability test method for a moisture-proof packaging material (cup method). To form a test body (transmission area: 28.3 cm 2 ). The test specimen was placed in a thermo-hygrostat set at a temperature of 40 ° C. and a relative humidity of 90% (condition B). After a lapse of 24 hours, the specimen was taken out and the mass of the specimen was measured. The operation of placing the test sample in the thermo-hygrostat again, taking out the test sample at 24 hour intervals and weighing it was repeated until the weight increase became constant, and the moisture permeability (actual measurement) of the membrane was calculated.
In this test, the moisture permeability of the cured film produced so that the film thickness was in the range of 80 to 500 μm was measured in consideration of the influence of the difference in the film thickness of the test piece, and converted into a 100 μm thickness by the following equation. The value was used as the evaluation value.
Moisture permeability [g / m 2 · 24h] = moisture permeability (measured) × test KatamakuAtsu [μm] ÷ 100 [μm]
[破断伸び]
 硬化膜を長さ60mm、幅15mmの矩形に切り取り、試験片を作製した。試験片の長手方向の両端から20mmずつを掴むように万能試験機のつかみ具に取り付け、引張試験を行った。試験片の両破断片の中心線が一直線上にあるように破断面を突き合わせて測定したときの標点間(つかみ具間)の長さI[mm]を測定し、次式により破断伸びを算出した。
 破断伸びδ[%]=(I-I)÷I×100
 (I:原標点間距離=20[mm])
[Elongation at break]
The cured film was cut into a rectangle having a length of 60 mm and a width of 15 mm to prepare a test piece. The test piece was attached to a grip of a universal testing machine so as to grip 20 mm each from both ends in the longitudinal direction, and a tensile test was performed. The length I [mm] between the gauge points (between the grippers) when the fractured sections were butted so that the center lines of both fractured pieces of the test piece were on a straight line was measured. Calculated.
Elongation at break δ [%] = (I 0 ) ÷ I 0 × 100
(I 0 : distance between original reference points = 20 [mm])
[実施例2~4、比較例1,2]
 各組成を表1の記載に変更した以外は実施例1と同様に操作し、各硬化膜を得た。なお、組成物5,6については、同様の硬化条件(露光条件)では硬化不十分となり、硬化物表面にべたつきが残っていたため、さらに100℃のホットプレートで30分間加熱(ポストキュア)した。各硬化膜の、透湿度及び破断伸びを、表1に併せて示す。
[Examples 2 to 4, Comparative Examples 1 and 2]
Each cured film was obtained in the same manner as in Example 1 except that each composition was changed to the description in Table 1. The compositions 5 and 6 were insufficiently cured under the same curing conditions (exposure conditions) and remained sticky on the surface of the cured product. Therefore, they were further heated (post-cured) on a hot plate at 100 ° C. for 30 minutes. Table 1 shows the moisture permeability and elongation at break of each cured film.
Figure JPOXMLDOC01-appb-T000007
Figure JPOXMLDOC01-appb-T000007
 表1に示すように、実施例1~4の組成物から得られた硬化物は、比較例1,2の組成物から得られた硬化物と比較して、透湿度が低く、また破断伸びも高いことが確認された。すなわち、本発明の組成物は、防湿性、延伸性に優れる硬化物が得られることが示された。
 また、実施例1~4の組成物はUV露光のみで防湿性、延伸性に優れた硬化物が得られ、光硬化性に優れることが確認された。
As shown in Table 1, the cured products obtained from the compositions of Examples 1 to 4 had lower moisture permeability and the elongation at break than the cured products obtained from the compositions of Comparative Examples 1 and 2. Was also higher. That is, it was shown that the composition of the present invention can provide a cured product having excellent moisture resistance and stretchability.
In addition, it was confirmed that the compositions of Examples 1 to 4 obtained cured products excellent in moisture resistance and stretchability only by UV exposure, and were excellent in photocurability.
[実施例5~10]
 各組成を表2の記載に変更した以外は実施例1と同様に操作し、組成物7~10を調製した。
[Examples 5 to 10]
Compositions 7 to 10 were prepared in the same manner as in Example 1, except that each composition was changed as described in Table 2.
 得られた組成物を用いた以外は実施例1と同様に操作し、およそ100μmの膜厚を有する硬化膜をそれぞれ作製した。各硬化膜の透湿度を実施例1と同様に評価した。結果を表3に示す。 操作 A cured film having a thickness of about 100 μm was prepared in the same manner as in Example 1 except that the obtained composition was used. The moisture permeability of each cured film was evaluated in the same manner as in Example 1. Table 3 shows the results.
 また、図1に示す形状の2つの銀電極が形成されたガラス基板上に、図2に示すように、厚さ500μmのシリコーンゴム製スペーサーを置き、両電極を覆うように各組成物を塗布した。この塗布基板に、予めオプツール(登録商標)DSX[ダイキン工業(株)製]で離型処理した、塗布基板と同サイズの石英ガラス基板を被せた。UV-LED(波長:365nm)を用い、石英ガラス基板側からUV光を100mW/cmで10秒間照射することで、塗布した組成物を硬化させた。その後、石英ガラス基板及びスペーサーを取り去り、厚さ500μmの硬化物で両電極が封止された試験片を得た。 Further, as shown in FIG. 2, a silicone rubber spacer having a thickness of 500 μm was placed on a glass substrate on which two silver electrodes having the shape shown in FIG. 1 were formed, and each composition was applied so as to cover both electrodes. did. The coated substrate was covered with a quartz glass substrate of the same size as that of the coated substrate, which had been previously subjected to a release treatment by Optool (registered trademark) DSX (manufactured by Daikin Industries, Ltd.). Using a UV-LED (wavelength: 365 nm), UV light was irradiated from the quartz glass substrate side at 100 mW / cm 2 for 10 seconds to cure the applied composition. Thereafter, the quartz glass substrate and the spacer were removed to obtain a test piece in which both electrodes were sealed with a cured product having a thickness of 500 μm.
 表3に記載の温度、湿度に設定した恒温恒湿装置内で、得られた試験片の両電極に表3に記載の直流電圧を印加し、イオンマイグレーション発生(両電極間の抵抗値が10Ω以下となった時点)までの時間を測定、評価した。結果を表3に併せて示す。 In a thermo-hygrostat set to the temperature and humidity shown in Table 3, a DC voltage shown in Table 3 was applied to both electrodes of the obtained test piece, and ion migration occurred (the resistance between both electrodes was 10%). The time up to 5 Ω or less) was measured and evaluated. The results are shown in Table 3.
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000008
Figure JPOXMLDOC01-appb-T000009
Figure JPOXMLDOC01-appb-T000009
 表3に示すように、重合開始剤としてテトラキス(ペンタフルオロフェニル)ボレートイオンを有するスルホニウム塩化合物を使用した組成物から得られた硬化物(実施例6~10)は、低い透湿度を維持したまま、イオンマイグレーション耐性に優れることが確認された。また、シランカップリング剤を添加することで、より一層イオンマイグレーション耐性に優れることが確認された(実施例10)。 As shown in Table 3, the cured products (Examples 6 to 10) obtained from the compositions using the sulfonium salt compounds having tetrakis (pentafluorophenyl) borate ion as the polymerization initiator maintained low moisture permeability. As it was, it was confirmed that the ion migration resistance was excellent. It was also confirmed that the addition of the silane coupling agent further improved the ion migration resistance (Example 10).
1.銀電極
2.組成物
3.スペーサー
1. Silver electrode2. Composition 3. spacer

Claims (10)

  1. (a)式[1]で表される化合物及び式[2]で表される化合物からなる群から選択される少なくとも一種のイソシアヌル酸系エポキシ化合物、(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物、(c)多官能オキセタン化合物、及び(d)活性エネルギー線により酸又は塩基を発生する重合開始剤を含む、防湿シール材用組成物。
    Figure JPOXMLDOC01-appb-C000001
    (式中、Rは、水素原子又はメチル基を表し、Lは、炭素原子数2~7のアルキレン基を表す。ここで、各Rは互いに同一であっても異なっていてもよく、各Lは互いに同一であっても異なっていてもよい。)
    Figure JPOXMLDOC01-appb-C000002
    (式中、Rは、水素原子又はメチル基を表し、Lは、炭素原子数1~5のアルキレン基を表し、Aは、(n+1)価のエーテル結合を含んでいてもよい脂肪族炭化水素基を表し、nは、2~5の整数を表す。ここで、各Rは互いに同一であっても異なっていてもよく、各Lは互いに同一であっても異なっていてもよく、各Aは互いに同一であっても異なっていてもよく、各nは互いに同一であっても異なっていてもよい。)
    (A) at least one isocyanuric acid-based epoxy compound selected from the group consisting of the compound represented by the formula [1] and the compound represented by the formula [2]; (b) a polyfunctional compound having no isocyanuric acid skeleton A composition for a moisture-proof sealing material, comprising: an epoxy compound; (c) a polyfunctional oxetane compound; and (d) a polymerization initiator that generates an acid or a base by an active energy ray.
    Figure JPOXMLDOC01-appb-C000001
    (Wherein, R 1 represents a hydrogen atom or a methyl group, and L 1 represents an alkylene group having 2 to 7 carbon atoms. Here, each R 1 may be the same or different. , Each L 1 may be the same or different.)
    Figure JPOXMLDOC01-appb-C000002
    (Wherein, R 2 represents a hydrogen atom or a methyl group, L 2 represents an alkylene group having 1 to 5 carbon atoms, and A represents an aliphatic group which may contain a (n + 1) -valent ether bond. Represents a hydrocarbon group, and n represents an integer of 2 to 5. Here, each R 2 may be the same or different, and each L 2 may be the same or different. And each A may be the same or different, and each n may be the same or different.)
  2. 前記(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物が、ビスフェノールA型エポキシ樹脂、ビスフェノールF型エポキシ樹脂、水添ビスフェノールA型エポキシ樹脂、水添ビスフェノールF型エポキシ樹脂、ビスフェノールAノボラック型エポキシ樹脂、ビスフェノールFノボラック型エポキシ樹脂、及び脂環式ポリグリシジルエーテル型エポキシ樹脂からなる群から選ばれる少なくとも一種である、請求項1に記載の防湿シール材用組成物。 (B) The polyfunctional epoxy compound having no isocyanuric acid skeleton is a bisphenol A type epoxy resin, a bisphenol F type epoxy resin, a hydrogenated bisphenol A type epoxy resin, a hydrogenated bisphenol F type epoxy resin, a bisphenol A novolak type epoxy resin The composition for a moisture-proof sealing material according to claim 1, wherein the composition is at least one selected from the group consisting of a resin, a bisphenol F novolak type epoxy resin, and an alicyclic polyglycidyl ether type epoxy resin.
  3. 前記(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物が、ビスフェノールAジグリシジルエーテル、ビスフェノールFジグリシジルエーテル、水添ビスフェノールAジグリシジルエーテル、水添ビスフェノールFジグリシジルエーテル、ビスフェノールAノボラックポリグリシジルエーテル、及びジシクロペンタジエンジメタノールジグリシジルエーテルからなる群から選ばれる少なくとも一種である、請求項2に記載の防湿シール材用組成物。 (B) the polyfunctional epoxy compound having no isocyanuric acid skeleton is bisphenol A diglycidyl ether, bisphenol F diglycidyl ether, hydrogenated bisphenol A diglycidyl ether, hydrogenated bisphenol F diglycidyl ether, bisphenol A novolak polyglycidyl The composition for a moisture-proof sealing material according to claim 2, wherein the composition is at least one selected from the group consisting of ether and dicyclopentadiene dimethanol diglycidyl ether.
  4. 前記(b)イソシアヌル酸骨格を有さない多官能エポキシ化合物が、ビスフェノールFジグリシジルエーテルである、請求項3に記載の防湿シール材用組成物。 The composition for a moisture-proof sealing material according to claim 3, wherein the polyfunctional epoxy compound (b) having no isocyanuric acid skeleton is bisphenol F diglycidyl ether.
  5. 前記(d)活性エネルギー線により酸又は塩基を発生する重合開始剤が光酸発生剤である、請求項1乃至請求項4のうち何れか一項に記載の防湿シール材用組成物。 The composition for a moisture-proof sealing material according to any one of claims 1 to 4, wherein the polymerization initiator (d) that generates an acid or a base by an active energy ray is a photoacid generator.
  6. 前記(a)イソシアヌル酸系エポキシ化合物が前記式[1]で表される化合物である、請求項1乃至請求項5のうち何れか一項に記載の防湿シール材用組成物。 The composition for a moisture-proof sealing material according to any one of claims 1 to 5, wherein the (a) isocyanuric acid-based epoxy compound is a compound represented by the formula [1].
  7.  その硬化物のJIS Z 0208(1976)の防湿包装材の透湿度試験方法のカップ法の条件B(温度40℃、相対湿度90%)により測定された透湿度が、厚さ100μm換算で20g/m・24h以下である、請求項1乃至請求項6のうち何れか一項に記載の防湿シール材用組成物。 The moisture permeability of the cured product measured under the cup method condition B (temperature 40 ° C., relative humidity 90%) of the moisture permeability test method of the moisture-proof packaging material according to JIS Z 0208 (1976) is 20 g / 100 μm in terms of thickness. m is 2 · 24h or less, according to claim 1 or moisture sealant composition according to any one of claims 6.
  8.  有機ELディスプレイ防湿シール材用組成物である、請求項1乃至請求項7のうち何れか一項に記載の防湿シール材用組成物。 The composition for a moisture-proof seal material according to any one of claims 1 to 7, which is a composition for an organic EL display moisture-proof seal material.
  9. 請求項1乃至請求項8のうち何れか一項に記載の防湿シール材用組成物を硬化してなる硬化物。 A cured product obtained by curing the moisture-proof sealing material composition according to any one of claims 1 to 8.
  10. 請求項9に記載の硬化物を搭載する、有機ELディスプレイ。 An organic EL display on which the cured product according to claim 9 is mounted.
PCT/JP2019/032312 2018-08-17 2019-08-19 Composition for moistureproof sealing material WO2020036234A1 (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2018-153529 2018-08-17
JP2018153529A JP2021181504A (en) 2018-08-17 2018-08-17 Composition for moisture-proof seal material

Publications (1)

Publication Number Publication Date
WO2020036234A1 true WO2020036234A1 (en) 2020-02-20

Family

ID=69525396

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2019/032312 WO2020036234A1 (en) 2018-08-17 2019-08-19 Composition for moistureproof sealing material

Country Status (3)

Country Link
JP (1) JP2021181504A (en)
TW (1) TW202018052A (en)
WO (1) WO2020036234A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114315809A (en) * 2020-09-29 2022-04-12 湖南云科化工有限公司 Preparation method of triglycidyl isocyanurate

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003096184A (en) * 2001-07-17 2003-04-03 Mitsui Chemicals Inc Photocurable resin composition
JP2006082322A (en) * 2004-09-15 2006-03-30 Konica Minolta Holdings Inc Substrate film for display and organic electroluminescence element
JP2008059945A (en) * 2006-08-31 2008-03-13 Nagase Chemtex Corp Method of manufacturing electronic device
WO2015064410A1 (en) * 2013-10-30 2015-05-07 積水化学工業株式会社 Sealing agent for organic el display elements
JP2015098519A (en) * 2013-11-18 2015-05-28 住友ベークライト株式会社 Resin composition, component, optical device and electronic device
JP2016012559A (en) * 2014-06-03 2016-01-21 積水化学工業株式会社 Sealant for organic electroluminescence display device

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2003096184A (en) * 2001-07-17 2003-04-03 Mitsui Chemicals Inc Photocurable resin composition
JP2006082322A (en) * 2004-09-15 2006-03-30 Konica Minolta Holdings Inc Substrate film for display and organic electroluminescence element
JP2008059945A (en) * 2006-08-31 2008-03-13 Nagase Chemtex Corp Method of manufacturing electronic device
WO2015064410A1 (en) * 2013-10-30 2015-05-07 積水化学工業株式会社 Sealing agent for organic el display elements
JP2015098519A (en) * 2013-11-18 2015-05-28 住友ベークライト株式会社 Resin composition, component, optical device and electronic device
JP2016012559A (en) * 2014-06-03 2016-01-21 積水化学工業株式会社 Sealant for organic electroluminescence display device

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN114315809A (en) * 2020-09-29 2022-04-12 湖南云科化工有限公司 Preparation method of triglycidyl isocyanurate
CN114315809B (en) * 2020-09-29 2023-12-15 湖南云科化工有限公司 Preparation method of triglycidyl isocyanurate

Also Published As

Publication number Publication date
TW202018052A (en) 2020-05-16
JP2021181504A (en) 2021-11-25

Similar Documents

Publication Publication Date Title
JP6549984B2 (en) Curable resin composition for sealing an organic electroluminescence display device, curable resin sheet for sealing an organic electroluminescence display device, and an organic electroluminescence display device
TWI525121B (en) Curable composition and the use thereof, cured product, electronic or optoelectronic device, and method of affecting the transmission of water vapor with respect to an electronic or optoelectronic device
JP2001040068A (en) Photopolymerizable composition
JP5153498B2 (en) Resin composition
JP6014325B2 (en) Sealant for organic electroluminescence display element
JP2008111105A (en) Cation-polymerizable adhesive for plastic substrate, laminated body and polarizing plate using the same
JP5799177B2 (en) Light post-curing resin composition
JP2023022039A (en) Sealant, cured body, organic electroluminescent display, and method for producing device
JPWO2014181787A1 (en) Curable epoxy resin composition and cured product thereof, diolefin compound and method for producing the same, and method for producing diepoxy compound
JP5555614B2 (en) Sealant for organic electroluminescence display element
JP6109636B2 (en) Photocurable resin composition
WO2020036234A1 (en) Composition for moistureproof sealing material
WO2015087807A1 (en) Curable resin composition for sealing organic electroluminescent display element, curable resin sheet for sealing organic electroluminescent display element, and organic electroluminescent display element
JP2008305580A (en) Post-light curing composition, sealant for organic electroluminescent element, manufacturing method of organic electroluminescent display, and organic electroluminescent display
WO2019244780A1 (en) Sealing agent for display element and cured product thereof
JP2011021183A (en) Photocurable resin composition, sealing agent for organic electroluminescence display elements, and organic electroluminescence display element
JP2005187636A (en) Photo-curable resin composition, adhesive for display device, method of bonding and display device
WO2022239674A1 (en) Sealant for display element, cured product thereof, and display device
JP2016176030A (en) Curable composition and cured product thereof
EP4050060A1 (en) A photocurable adhesive or sealant composition
EP4050061A1 (en) Near-infrared (nir) sensitized adhesive and sealant compositions
JP2003301027A (en) Photocurable resin composition
WO2020196776A1 (en) Protection member for semiconductor, protection composition for inkjet coating-type semiconductor, and method for producing semiconductor apparatus using same, and semiconductor apparatus
TW202323462A (en) Curable resin composition, coating layer, and film
JP2020055936A (en) Sealant and electronic material

Legal Events

Date Code Title Description
121 Ep: the epo has been informed by wipo that ep was designated in this application

Ref document number: 19850187

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: DE

122 Ep: pct application non-entry in european phase

Ref document number: 19850187

Country of ref document: EP

Kind code of ref document: A1

NENP Non-entry into the national phase

Ref country code: JP