JP2008026093A5 - - Google Patents

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Publication number
JP2008026093A5
JP2008026093A5 JP2006197590A JP2006197590A JP2008026093A5 JP 2008026093 A5 JP2008026093 A5 JP 2008026093A5 JP 2006197590 A JP2006197590 A JP 2006197590A JP 2006197590 A JP2006197590 A JP 2006197590A JP 2008026093 A5 JP2008026093 A5 JP 2008026093A5
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JP
Japan
Prior art keywords
thin film
film
amorphous
layer
multilayer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006197590A
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English (en)
Japanese (ja)
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JP2008026093A (ja
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Publication date
Application filed filed Critical
Priority to JP2006197590A priority Critical patent/JP2008026093A/ja
Priority claimed from JP2006197590A external-priority patent/JP2008026093A/ja
Publication of JP2008026093A publication Critical patent/JP2008026093A/ja
Publication of JP2008026093A5 publication Critical patent/JP2008026093A5/ja
Pending legal-status Critical Current

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JP2006197590A 2006-07-20 2006-07-20 多層膜反射鏡およびその製造方法 Pending JP2008026093A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2006197590A JP2008026093A (ja) 2006-07-20 2006-07-20 多層膜反射鏡およびその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006197590A JP2008026093A (ja) 2006-07-20 2006-07-20 多層膜反射鏡およびその製造方法

Publications (2)

Publication Number Publication Date
JP2008026093A JP2008026093A (ja) 2008-02-07
JP2008026093A5 true JP2008026093A5 (ko) 2009-09-03

Family

ID=39116878

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006197590A Pending JP2008026093A (ja) 2006-07-20 2006-07-20 多層膜反射鏡およびその製造方法

Country Status (1)

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JP (1) JP2008026093A (ko)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN102782531B (zh) * 2009-12-15 2014-12-17 卡尔蔡司Smt有限责任公司 用于极紫外光刻的反射光学元件
KR20150048901A (ko) * 2010-06-25 2015-05-07 캐논 아네르바 가부시키가이샤 스퍼터링 장치, 박막증착 방법 및 컨트롤 디바이스
KR102051730B1 (ko) * 2018-01-12 2019-12-04 한양대학교 산학협력단 스페이서 패턴 및 위상변위 패턴을 포함하는 위상변위 마스크 및 그 제조 방법
US11275300B2 (en) * 2018-07-06 2022-03-15 Applied Materials Inc. Extreme ultraviolet mask blank defect reduction
TWI818151B (zh) 2019-03-01 2023-10-11 美商應用材料股份有限公司 物理氣相沉積腔室及其操作方法

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2001027700A (ja) * 1999-07-14 2001-01-30 Nikon Corp 多層膜反射鏡、多層膜反射鏡の製造方法、多層膜反射鏡の応力の制御方法および露光装置
US6228512B1 (en) * 1999-05-26 2001-05-08 The Regents Of The University Of California MoRu/Be multilayers for extreme ultraviolet applications
JP4461652B2 (ja) * 2001-07-31 2010-05-12 株式会社ニコン 多層膜反射鏡及び多層膜反射鏡の製造方法
EP3389056A1 (en) * 2003-06-02 2018-10-17 Nikon Corporation Multilayer film reflector and x-ray exposure system
JP2005049122A (ja) * 2003-07-30 2005-02-24 Nikon Corp 多層膜反射鏡及び露光装置

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