JP2008026093A5 - - Google Patents
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- JP2008026093A5 JP2008026093A5 JP2006197590A JP2006197590A JP2008026093A5 JP 2008026093 A5 JP2008026093 A5 JP 2008026093A5 JP 2006197590 A JP2006197590 A JP 2006197590A JP 2006197590 A JP2006197590 A JP 2006197590A JP 2008026093 A5 JP2008026093 A5 JP 2008026093A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- amorphous
- layer
- multilayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
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- 239000010409 thin film Substances 0.000 claims description 13
- 239000010408 film Substances 0.000 claims description 10
- 238000010884 ion-beam technique Methods 0.000 claims description 3
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Description
本発明の多層膜反射鏡の製造方法は、基板上に、Ｍｏ薄膜からなる第１層と、Ｓｉ薄膜からなる第２層を交互に積層した反射多層膜を有する多層膜反射鏡の製造方法であって、前記第１層の成膜工程において非晶質のＭｏ薄膜を成膜する工程と、非晶質のＭｏ薄膜にイオンビームを照射する工程と、イオンビームを照射した前記非晶質のＭｏ薄膜上に前記第２層を成膜する工程と、を有することを特徴とする。 The manufacturing method of the multilayer-film reflective mirror of this invention is a manufacturing method of the multilayer-film reflective mirror which has the reflective multilayer film which laminated | stacked the 1st layer which consists of Mo thin films, and the 2nd layer which consists of Si thin films on a board | substrate alternately. there are the steps of forming an amorphous Mo thin in the film forming process of the first layer, the steps you an ion beam is irradiated on the Mo thin film of amorphous, the amorphous irradiated with ion beams And depositing the second layer on the Mo thin film.
Claims (3)
前記第１層の成膜工程において非晶質のＭｏ薄膜を成膜する工程と、
非晶質のＭｏ薄膜にイオンビームを照射する工程と、
イオンビームを照射した前記非晶質のＭｏ薄膜上に前記第２層を成膜する工程と、を有することを特徴とする多層膜反射鏡の製造方法。 A method of manufacturing a multilayer reflector having a reflective multilayer film in which a first layer made of Mo thin film and a second layer made of Si thin film are alternately laminated on a substrate,
A step of forming an amorphous Mo thin film in the step of forming the first layer;
A step you an ion beam is irradiated on the Mo thin film of amorphous
And a step of forming the second layer on the amorphous Mo thin film irradiated with an ion beam .
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006197590A JP2008026093A (en) | 2006-07-20 | 2006-07-20 | Multilayer film reflection mirror and method for manufacturing it |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006197590A JP2008026093A (en) | 2006-07-20 | 2006-07-20 | Multilayer film reflection mirror and method for manufacturing it |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008026093A JP2008026093A (en) | 2008-02-07 |
| JP2008026093A5 true JP2008026093A5 (en) | 2009-09-03 |
Family
ID=39116878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006197590A Pending JP2008026093A (en) | 2006-07-20 | 2006-07-20 | Multilayer film reflection mirror and method for manufacturing it |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008026093A (en) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP5716038B2 (en) * | 2009-12-15 | 2015-05-13 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Reflective optical element for EUV lithography |
| KR20130059384A (en) * | 2010-06-25 | 2013-06-05 | 캐논 아네르바 가부시키가이샤 | Sputtering device, deposition method, and control device |
| KR102051730B1 (en) * | 2018-01-12 | 2019-12-04 | 한양대학교 산학협력단 | Phase shifter mask that comprising spacer pattern and phase shift pattern, and fabricating method of the same |
| US11275300B2 (en) | 2018-07-06 | 2022-03-15 | Applied Materials Inc. | Extreme ultraviolet mask blank defect reduction |
| TWI818151B (en) | 2019-03-01 | 2023-10-11 | 美商應用材料股份有限公司 | Physical vapor deposition chamber and method of operation thereof |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001027700A (en) * | 1999-07-14 | 2001-01-30 | Nikon Corp | Multi-layer film reflecting mirror, manufacture of it, control method for stress of multi-layer film reflecting mirror, and exposure device |
| US6228512B1 (en) * | 1999-05-26 | 2001-05-08 | The Regents Of The University Of California | MoRu/Be multilayers for extreme ultraviolet applications |
| JP4461652B2 (en) * | 2001-07-31 | 2010-05-12 | 株式会社ニコン | Multilayer film reflector and method for producing multilayer film mirror |
| EP3389056A1 (en) * | 2003-06-02 | 2018-10-17 | Nikon Corporation | Multilayer film reflector and x-ray exposure system |
| JP2005049122A (en) * | 2003-07-30 | 2005-02-24 | Nikon Corp | Multilayer-film reflector and exposure device |
-
2006
- 2006-07-20 JP JP2006197590A patent/JP2008026093A/en active Pending
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