JP2008232806A5 - - Google Patents

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Publication number
JP2008232806A5
JP2008232806A5 JP2007072429A JP2007072429A JP2008232806A5 JP 2008232806 A5 JP2008232806 A5 JP 2008232806A5 JP 2007072429 A JP2007072429 A JP 2007072429A JP 2007072429 A JP2007072429 A JP 2007072429A JP 2008232806 A5 JP2008232806 A5 JP 2008232806A5
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JP
Japan
Prior art keywords
substrate
optical element
plasmon resonance
manufacturing
film made
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JP2007072429A
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JP2008232806A (en
JP5016958B2 (en
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Priority claimed from JP2007072429A external-priority patent/JP5016958B2/en
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Publication of JP2008232806A5 publication Critical patent/JP2008232806A5/ja
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Claims (10)

第1の材料からなる基板上に局在プラズモン共鳴を生ずる金属材料を配して構成される局在プラズモン共鳴を利用する光学素子の製造方法であって、
表面に複数の、突起部もしくは窪み部、を有する前記基板を用意する工程と、
前記基板の表面に対し、該表面の法線の方向に対して斜めの方向から第2の材料からなる膜を形成する工程と、を有し、
(1)第2の材料を前記金属材料として、前記基板上に前記金属材料からなる膜を部分的に形成すること、または、
(2)第2の材料を前記基板面から除去可能な材料として、第2の材料からなる膜を前記基板上に形成後、第3の材料としての金属材料からなる膜を前記第2の材料からなる膜が形成された前記基板上に形成し、第2の材料からなる膜を除去して、前記基板上に前記金属材料からなる膜を部分的に残すこと、
を特徴とする局在プラズモン共鳴を利用する光学素子の製造方法
A method for manufacturing an optical element using localized plasmon resonance configured by arranging a metal material that generates localized plasmon resonance on a substrate made of a first material,
Preparing the substrate having a plurality of protrusions or depressions on the surface; and
Forming a film made of a second material from a direction oblique to the surface normal to the surface of the substrate,
(1) Using the second material as the metal material, partially forming a film made of the metal material on the substrate, or
(2) After forming a film made of the second material on the substrate as a material capable of removing the second material from the substrate surface, a film made of a metal material as the third material is formed on the second material. Forming on the substrate on which the film made of is formed, removing the film made of the second material, and partially leaving the film made of the metal material on the substrate;
A method of manufacturing an optical element using localized plasmon resonance characterized by the following .
前記工程(1)における金属材料からなる膜が前記基板上に形成されずに第1の材料からなる基板が露出して構成される開口の大きさが、10nmから500nmの範囲にある請求項1に記載の局在プラズモン共鳴を利用する光学素子の製造方法。2. The size of the opening formed by exposing the substrate made of the first material without forming the film made of the metal material in the step (1) on the substrate is in the range of 10 nm to 500 nm. A manufacturing method of an optical element using the localized plasmon resonance described in 1. 前記工程(2)における第2の材料からなる膜がエッチングで除去可能な膜である請求項1に記載の局在プラズモン共鳴を利用する光学素子の製造方法。The method of manufacturing an optical element using localized plasmon resonance according to claim 1, wherein the film made of the second material in the step (2) is a film that can be removed by etching. 前記工程(2)における金属材料からなる膜の大きさが、10nmから500nmの範囲にある請求項3に記載の局在プラズモン共鳴を利用する光学素子の製造方法。The method of manufacturing an optical element using localized plasmon resonance according to claim 3, wherein the film made of the metal material in the step (2) has a size in a range of 10 nm to 500 nm. 前記工程(2)における金属材料からなる膜は該膜を形成するための材料を前記基板の表面に対して垂直方向から供給することにより形成される請求項1、3及び4のいずれかに記載の局在プラズモン共鳴を利用する光学素子の製造方法。 According to any one of claims 1, 3 and 4 the film made of a metal material in step (2) is formed by supplying the vertical material for forming the membrane to the surface of the substrate A method of manufacturing an optical element using localized plasmon resonance. 前記金属材料が、金、銀、銅およびアルミニウムからなる群から選ばれた金属材料、あるいは、前記群から選ばれた2以上の金属材料からなる合金である請求項1〜5のいずれかに記載の局在プラズモン共鳴を利用する光学素子の製造方法。 Wherein said metallic material is gold, silver, copper and a metal material selected from the group consisting of aluminum, or any one of claims 1 to 5, an alloy of two or more metal materials selected from the group A method of manufacturing an optical element using localized plasmon resonance . 前記基板の有する突起部もしくは窪み部は、型の押し付けにより形成されている請求項1〜6のいずれかに記載の局在プラズモン共鳴を利用する光学素子の製造方法。 The method of manufacturing an optical element using localized plasmon resonance according to any one of claims 1 to 6, wherein the protrusion or depression of the substrate is formed by pressing a mold . 前記基板の表面の法線の方向に対して斜めの方向から成膜用材料を斜め蒸着により、供給する請求項1〜7のいずれかに記載の局在プラズモン共鳴を利用する光学素子の製造方法。The method for manufacturing an optical element using localized plasmon resonance according to any one of claims 1 to 7, wherein a film-forming material is supplied by oblique vapor deposition from a direction oblique to a direction normal to the surface of the substrate. . 前記光学素子はセンサである請求項1〜8のいずれかに記載の局在プラズモン共鳴を利用する光学素子の製造方法 Method of manufacturing an optical element utilizing localized plasmon resonance according to claim 1 wherein the optical element is a sensor. 前記光学素子はフィルタである請求項1〜8のいずれかに記載の局在プラズモン共鳴を利用する光学素子の製造方法 The method of manufacturing an optical element using localized plasmon resonance according to claim 1, wherein the optical element is a filter .
JP2007072429A 2007-03-20 2007-03-20 Optical element manufacturing method Expired - Fee Related JP5016958B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2007072429A JP5016958B2 (en) 2007-03-20 2007-03-20 Optical element manufacturing method

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Application Number Priority Date Filing Date Title
JP2007072429A JP5016958B2 (en) 2007-03-20 2007-03-20 Optical element manufacturing method

Publications (3)

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JP2008232806A JP2008232806A (en) 2008-10-02
JP2008232806A5 true JP2008232806A5 (en) 2010-05-27
JP5016958B2 JP5016958B2 (en) 2012-09-05

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Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6067290B2 (en) * 2011-09-13 2017-01-25 旭化成株式会社 Metamaterial transfer laminate and method for producing metamaterial transferred substrate
JP5957877B2 (en) * 2011-12-26 2016-07-27 旭硝子株式会社 Metamaterial manufacturing method and metamaterial
JP2014190834A (en) 2013-03-27 2014-10-06 Fujifilm Corp Optical field enhancement device and method for manufacturing the same
JP6790498B2 (en) * 2016-06-24 2020-11-25 凸版印刷株式会社 Display
US11220735B2 (en) * 2018-02-08 2022-01-11 Medtronic Minimed, Inc. Methods for controlling physical vapor deposition metal film adhesion to substrates and surfaces

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WO2005017570A2 (en) * 2003-08-06 2005-02-24 University Of Pittsburgh Surface plasmon-enhanced nano-optic devices and methods of making same

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