JP2008026093A5 - - Google Patents
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- Publication number
- JP2008026093A5 JP2008026093A5 JP2006197590A JP2006197590A JP2008026093A5 JP 2008026093 A5 JP2008026093 A5 JP 2008026093A5 JP 2006197590 A JP2006197590 A JP 2006197590A JP 2006197590 A JP2006197590 A JP 2006197590A JP 2008026093 A5 JP2008026093 A5 JP 2008026093A5
- Authority
- JP
- Japan
- Prior art keywords
- thin film
- film
- amorphous
- layer
- multilayer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010409 thin film Substances 0.000 claims description 13
- 239000010408 film Substances 0.000 claims description 10
- 238000010884 ion-beam technique Methods 0.000 claims description 4
- 238000004519 manufacturing process Methods 0.000 claims description 3
- 239000000758 substrate Substances 0.000 claims description 3
- 229910052763 palladium Inorganic materials 0.000 claims 1
- 229910052703 rhodium Inorganic materials 0.000 claims 1
- 229910052707 ruthenium Inorganic materials 0.000 claims 1
- 229910052726 zirconium Inorganic materials 0.000 claims 1
- 238000000151 deposition Methods 0.000 description 1
- 238000000034 method Methods 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006197590A JP2008026093A (ja) | 2006-07-20 | 2006-07-20 | 多層膜反射鏡およびその製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2006197590A JP2008026093A (ja) | 2006-07-20 | 2006-07-20 | 多層膜反射鏡およびその製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2008026093A JP2008026093A (ja) | 2008-02-07 |
| JP2008026093A5 true JP2008026093A5 (enrdf_load_stackoverflow) | 2009-09-03 |
Family
ID=39116878
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006197590A Pending JP2008026093A (ja) | 2006-07-20 | 2006-07-20 | 多層膜反射鏡およびその製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2008026093A (enrdf_load_stackoverflow) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2011073157A1 (en) * | 2009-12-15 | 2011-06-23 | Carl Zeiss Smt Gmbh | Reflective optical element for euv lithography |
| JP5792723B2 (ja) * | 2010-06-25 | 2015-10-14 | キヤノンアネルバ株式会社 | スパッタリング装置、成膜方法、および制御装置 |
| KR102051730B1 (ko) * | 2018-01-12 | 2019-12-04 | 한양대학교 산학협력단 | 스페이서 패턴 및 위상변위 패턴을 포함하는 위상변위 마스크 및 그 제조 방법 |
| US11275300B2 (en) | 2018-07-06 | 2022-03-15 | Applied Materials Inc. | Extreme ultraviolet mask blank defect reduction |
| TWI818151B (zh) | 2019-03-01 | 2023-10-11 | 美商應用材料股份有限公司 | 物理氣相沉積腔室及其操作方法 |
| JP7596908B2 (ja) * | 2021-04-20 | 2024-12-10 | 株式会社デンソー | 半導体ウェハ、圧電素子、および半導体ウェハの製造方法 |
Family Cites Families (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001027700A (ja) * | 1999-07-14 | 2001-01-30 | Nikon Corp | 多層膜反射鏡、多層膜反射鏡の製造方法、多層膜反射鏡の応力の制御方法および露光装置 |
| US6228512B1 (en) * | 1999-05-26 | 2001-05-08 | The Regents Of The University Of California | MoRu/Be multilayers for extreme ultraviolet applications |
| JP4461652B2 (ja) * | 2001-07-31 | 2010-05-12 | 株式会社ニコン | 多層膜反射鏡及び多層膜反射鏡の製造方法 |
| EP2490227B1 (en) * | 2003-06-02 | 2014-11-19 | Nikon Corporation | Multilayer film reflector and X-ray exposure system |
| JP2005049122A (ja) * | 2003-07-30 | 2005-02-24 | Nikon Corp | 多層膜反射鏡及び露光装置 |
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2006
- 2006-07-20 JP JP2006197590A patent/JP2008026093A/ja active Pending