JP2008021968A5 - - Google Patents

Download PDF

Info

Publication number
JP2008021968A5
JP2008021968A5 JP2007121187A JP2007121187A JP2008021968A5 JP 2008021968 A5 JP2008021968 A5 JP 2008021968A5 JP 2007121187 A JP2007121187 A JP 2007121187A JP 2007121187 A JP2007121187 A JP 2007121187A JP 2008021968 A5 JP2008021968 A5 JP 2008021968A5
Authority
JP
Japan
Prior art keywords
resistance layer
bit line
resistance
memory device
nonvolatile memory
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2007121187A
Other languages
English (en)
Japanese (ja)
Other versions
JP2008021968A (ja
Filing date
Publication date
Priority claimed from KR1020060065469A external-priority patent/KR20080006358A/ko
Application filed filed Critical
Publication of JP2008021968A publication Critical patent/JP2008021968A/ja
Publication of JP2008021968A5 publication Critical patent/JP2008021968A5/ja
Pending legal-status Critical Current

Links

JP2007121187A 2006-07-12 2007-05-01 不揮発性メモリ素子の動作方法 Pending JP2008021968A (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
KR1020060065469A KR20080006358A (ko) 2006-07-12 2006-07-12 비휘발성 메모리 소자의 동작 방법

Publications (2)

Publication Number Publication Date
JP2008021968A JP2008021968A (ja) 2008-01-31
JP2008021968A5 true JP2008021968A5 (enExample) 2010-06-17

Family

ID=38999940

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2007121187A Pending JP2008021968A (ja) 2006-07-12 2007-05-01 不揮発性メモリ素子の動作方法

Country Status (3)

Country Link
JP (1) JP2008021968A (enExample)
KR (1) KR20080006358A (enExample)
CN (1) CN101106135A (enExample)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100946179B1 (ko) * 2008-05-29 2010-03-09 한국과학기술원 비휘발성 반도체 메모리 소자 및 그 제조방법
US8194441B2 (en) * 2010-09-23 2012-06-05 Micron Technology, Inc. Phase change memory state determination using threshold edge detection
JP5763004B2 (ja) 2012-03-26 2015-08-12 株式会社東芝 不揮発性半導体記憶装置
US11316105B2 (en) * 2020-03-17 2022-04-26 International Business Machines Corporation Phase change material switch and method of fabricating same

Similar Documents

Publication Publication Date Title
JP5028011B2 (ja) 二種の抵抗体を含む不揮発性メモリ素子
US7714313B2 (en) Resistive RAM having at least one varistor and methods of operating the same
KR100682895B1 (ko) 다양한 저항 상태를 지닌 저항체를 이용한 비휘발성메모리 소자 및 그 작동 방법
CN100593242C (zh) 包括一个电阻器和一个二极管的非挥发性存储器
US8587984B2 (en) Sensing resistance variable memory
KR100738070B1 (ko) 한 개의 저항체와 한 개의 트랜지스터를 지닌 비휘발성메모리 소자
JP4684297B2 (ja) 不揮発性半導体記憶装置の書き込み方法
CN100388388C (zh) 半导体存储器设备及数据写入方法
US20170309339A1 (en) Architecture for cmos under array
CN102263122B (zh) 非易失性存储装置
JP2009033177A5 (enExample)
WO2007145295A1 (ja) 不揮発性メモリ装置
US10482953B1 (en) Multi-state memory device and method for adjusting memory state characteristics of the same
JP2008021968A5 (enExample)
JP2007221123A (ja) 不揮発性メモリ素子及びその動作方法
US7636251B2 (en) Methods of operating a non-volatile memory device
KR100624463B1 (ko) 노어 구조의 하이브리드 멀티비트 비휘발성 메모리 소자 및그 동작 방법
JP2008021968A (ja) 不揮発性メモリ素子の動作方法
JP2014063549A (ja) 半導体記憶装置
KR101123736B1 (ko) 멀티 레벨 ReRAM 메모리 장치 및 그 제조 방법
US11527290B2 (en) Method of programming nonvolatile memory device including reversible resistance device
US8149610B2 (en) Nonvolatile memory device
TWI443662B (zh) 非揮發性記憶裝置
JP2009212245A (ja) 可変抵抗素子