JP2008010591A - Light emitting device, manufacturing method thereof, package, and substrate for mounting light emitting element - Google Patents

Light emitting device, manufacturing method thereof, package, and substrate for mounting light emitting element Download PDF

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JP2008010591A
JP2008010591A JP2006178618A JP2006178618A JP2008010591A JP 2008010591 A JP2008010591 A JP 2008010591A JP 2006178618 A JP2006178618 A JP 2006178618A JP 2006178618 A JP2006178618 A JP 2006178618A JP 2008010591 A JP2008010591 A JP 2008010591A
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light emitting
resin
emitting device
emitting element
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JP5233087B2 (en
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Michihide Miki
倫英 三木
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Nichia Chemical Industries Ltd
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/44Structure, shape, material or disposition of the wire connectors prior to the connecting process
    • H01L2224/45Structure, shape, material or disposition of the wire connectors prior to the connecting process of an individual wire connector
    • H01L2224/45001Core members of the connector
    • H01L2224/45099Material
    • H01L2224/451Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof
    • H01L2224/45138Material with a principal constituent of the material being a metal or a metalloid, e.g. boron (B), silicon (Si), germanium (Ge), arsenic (As), antimony (Sb), tellurium (Te) and polonium (Po), and alloys thereof the principal constituent melting at a temperature of greater than or equal to 950°C and less than 1550°C
    • H01L2224/45144Gold (Au) as principal constituent
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/80Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected
    • H01L2224/85Methods for connecting semiconductor or other solid state bodies using means for bonding being attached to, or being formed on, the surface to be connected using a wire connector
    • H01L2224/85909Post-treatment of the connector or wire bonding area
    • H01L2224/8592Applying permanent coating, e.g. protective coating
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/15Details of package parts other than the semiconductor or other solid state devices to be connected
    • H01L2924/181Encapsulation

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Abstract

<P>PROBLEM TO BE SOLVED: To provide a light emitting device along with its manufacturing method, a package, and a substrate for mounting a light emitting element, capable of preventing sulphiding on the surface of silver plating applied on an internal lead which is exposed from the inside surface of an opening of a support body of an LED, and capable of preventing degradation in maintenance coefficient of the optical output as time passes. <P>SOLUTION: In a package 1, an internal lead 13a is exposed on a part of the inside surface of an opening of a support body 11 comprising the opening for storing a light emitting element. An external lead 13b which is electrically conductive to the internal lead is led outside the support body, with at least the internal lead being applied with silver plating 14. An LED chip 15 is mounted inside the opening of the support body, and an electrode 15a is electrically connected to the internal lead. A thin film coat 16 for preventing sulphiding of silver plating with film thickness being 1 μm or less is formed to cover at least the silver plating surface of the internal lead, inside the opening of the support body. The thin film coat 16 is provided by injecting the solution of specified resin, and then letting a solvent to evaporate to cure the resin. Further, a translucent resin 17 is embedded to cover at least the thin film coat and the LED chip, inside the opening part of the support body. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

本発明は、発光装置およびその製造方法に係り、特に開口部の底面に発光素子を収納し、発光素子を透光性樹脂で封止した構造を有する発光装置及びその製造方法や、基板に発光素子を実装し、発光素子を透光性樹脂で封止した構造を有する発光装置及びその製造方法に関する。   The present invention relates to a light emitting device and a method for manufacturing the same, and more particularly, to a light emitting device having a structure in which a light emitting element is housed on the bottom of an opening and the light emitting element is sealed with a translucent resin, and a method for manufacturing the light emitting device. The present invention relates to a light-emitting device having a structure in which an element is mounted and the light-emitting element is sealed with a light-transmitting resin, and a manufacturing method thereof.

今日、表面実装型や砲弾型などの種々の発光装置が様々な分野に利用されている。発光装置の一例である発光ダイオード(LED)は、支持体となる基板上にLEDチップを透光性樹脂によってダイボンディングされている。また、LEDチップの各電極とワイヤなどを用いて電気的に接続させると共に所望に応じてLEDチップを保護する透光性樹脂で被覆してある。   Today, various light emitting devices such as a surface mount type and a shell type are used in various fields. In a light-emitting diode (LED) which is an example of a light-emitting device, an LED chip is die-bonded with a light-transmitting resin on a substrate serving as a support. The LED chip is covered with a translucent resin that is electrically connected to each electrode using a wire or the like and protects the LED chip as desired.

LEDチップのダイボンディング・ワイヤボンディング後に基板の開口部内部に注入される樹脂には、一般に絶縁性且つ透光性を有し室温で液状の樹脂が使用される。具体例として、エポキシ樹脂やアクリレート樹脂、ウレタン樹脂、シリコーン樹脂、ポリイミド樹脂等の熱硬化性樹脂、又はアクリル樹脂、ポリカーボネート樹脂、ポリノルボルネン樹脂等の熱可塑性樹脂が使用される。   As the resin that is injected into the opening of the substrate after die bonding and wire bonding of the LED chip, a resin that is generally insulating and translucent and that is liquid at room temperature is used. As a specific example, a thermosetting resin such as an epoxy resin, an acrylate resin, a urethane resin, a silicone resin, or a polyimide resin, or a thermoplastic resin such as an acrylic resin, a polycarbonate resin, or a polynorbornene resin is used.

熱硬化性樹脂を用いた場合、樹脂硬化のため加熱により透光性樹脂を形成させることができる。熱硬化性樹脂の特徴としては、成形時に熱硬化反応を伴い圧縮成形のような簡単な方法で成形可能であり堅くて頑丈な樹脂が得られる。耐熱性については、全般的に熱可塑性樹脂よりも優れている。   When a thermosetting resin is used, a translucent resin can be formed by heating for resin curing. As a feature of the thermosetting resin, a resin that can be molded by a simple method such as compression molding with a thermosetting reaction at the time of molding can be obtained. About heat resistance, it is generally superior to thermoplastic resin.

また、熱可塑性樹脂を用いた場合、溶剤を揮発させることにより透光性樹脂を形成させることができる。熱可塑性樹脂の特徴としては、化学構造的には線状高分子を成している。また、押出成形、射出成形によって効率よく加工することができ、成形不良品については再製利用も可能である。更に、熱硬化性樹脂よりも透明樹脂を成形し易く、透光性に優れている。   Moreover, when a thermoplastic resin is used, a translucent resin can be formed by volatilizing a solvent. The thermoplastic resin is characterized by a linear polymer in terms of chemical structure. Moreover, it can process efficiently by extrusion molding and injection molding, and a defective product can be reused. Furthermore, it is easier to mold a transparent resin than a thermosetting resin, and is excellent in translucency.

なお、特許文献1の半導体発光装置では、発光素子マウント部の表面を覆う蛍光膜層を形成する点が開示されている。また、特許文献2のLEDランプでは、LEDチップを囲むカップの内面を覆う被覆層を形成する点が開示されている。これらの特許文献1,2中の被覆層は、蛍光体を含み、蛍光体を固定するためにかなりの膜厚を必要とする。また、特許文献3の発光装置では、樹脂基板の開口部内に蛍光体を含む透明ポリイミドシリコーン樹脂からなる皮膜を形成する点が開示されている。この場合、色調を変える添加剤を含む透明ポリイミドシリコーン樹脂の皮膜を100μmの膜厚で形成している。
特開2000−150966号公報 特開2002−50799号公報 特開2006−60005号公報
In addition, in the semiconductor light-emitting device of patent document 1, the point which forms the fluorescent film layer which covers the surface of a light emitting element mount part is disclosed. Moreover, in the LED lamp of patent document 2, the point which forms the coating layer which covers the inner surface of the cup surrounding LED chip is disclosed. These coating layers in Patent Documents 1 and 2 contain a phosphor and require a considerable film thickness in order to fix the phosphor. Moreover, in the light-emitting device of patent document 3, the point which forms the film | membrane which consists of transparent polyimide silicone resin containing fluorescent substance in the opening part of a resin substrate is disclosed. In this case, a film of transparent polyimide silicone resin containing an additive that changes the color tone is formed with a film thickness of 100 μm.
JP 2000-150966 A JP 2002-50799 A JP 2006-60005 A

ところで、近年のLEDチップの高出力化に伴い、耐熱性、耐光性に富むシリコーン樹脂が頻繁に使用されるようになってきた。シリコーン樹脂は、透光性を有し、滴下等によりLEDチップを封止し易いため、開口部を有する発光装置に広く使用されている。開口部の底面にLEDチップを収納し、LEDチップを透光性樹脂で封止した構造を有する発光装置を形成する際、光取り出し効率を向上させるために、開口部内に露出している内部リードに銀メッキを施す構造が多く採用される。   By the way, with the recent increase in output of LED chips, silicone resins having high heat resistance and light resistance have been frequently used. Silicone resin has translucency and is easy to seal the LED chip by dropping or the like, and thus is widely used for light emitting devices having openings. In order to improve the light extraction efficiency when forming a light emitting device having a structure in which the LED chip is housed on the bottom surface of the opening and the LED chip is sealed with a translucent resin, the internal leads exposed in the opening Many structures are used in which silver plating is applied.

しかし、シリコーン樹脂を用いて封止した場合、シリコーン樹脂はガスを透過し易いので、例えば車載用等の屋外用途の発光装置では内部リードの銀メッキが硫化し易いという問題が発生する。銀メッキの硫化により、銀メッキが黒色化し、発光装置の光出力低下が生じるという問題がある。   However, when sealing with a silicone resin, the silicone resin easily transmits gas. For example, in a light emitting device for outdoor use such as in-vehicle use, there arises a problem that silver plating of internal leads is easily sulfided. There is a problem that the silver plating is blackened due to the sulfurization of the silver plating, and the light output of the light emitting device is reduced.

本発明者は前記した問題点を解決すべく鋭意研究した結果、本発明を成すに至ったものであり、本発明は前記した内部リード、リフレクター部等に使用されている銀の表面の硫化を防止し、時間経過に伴う光出力の維持率の低下を防止し得る発光装置およびその製造方法を提供することを目的とする。   As a result of earnest research to solve the above-mentioned problems, the present inventor has reached the present invention, and the present invention is directed to sulfidation of the surface of silver used in the above-described internal lead, reflector part, etc. An object of the present invention is to provide a light emitting device that can prevent the decrease in the maintenance ratio of the light output with time and a method for manufacturing the same.

第1の発明に係る発光装置は、発光素子収納用の開口部を有する支持体の開口部内面に内部リードが露出し、当該内部リードに電気的に連なる外部リードが前記支持体の外部に引き出され、少なくとも前記内部リードの露出部に銀が使用されたパッケージと、前記支持体の開口部内面において少なくとも前記内部リードの前記銀の表面を被覆するように形成された所定の物質からなる薄膜コートと、前記支持体の開口部内に実装され、前記内部リードと電気的に接続された電極を有する発光素子と、を具備する。この発光装置において、さらに、少なくとも前記支持体の開口部内の前記発光素子を封止する透光性樹脂を有することも可能である。   In the light emitting device according to the first aspect of the present invention, the internal lead is exposed on the inner surface of the opening of the support having the opening for accommodating the light emitting element, and the external lead electrically connected to the internal lead is drawn out of the support. A package in which silver is used at least for the exposed portion of the internal lead, and a thin film coat made of a predetermined substance formed so as to cover at least the silver surface of the internal lead on the inner surface of the opening of the support. And a light-emitting element mounted in the opening of the support and having an electrode electrically connected to the internal lead. The light emitting device may further include a light transmissive resin that seals at least the light emitting element in the opening of the support.

第2の発明に係る発光装置は、配線パターンが形成され、前記配線パターンの少なくとも一部は銀メッキが施された発光素子実装用の基板と、記銀メッキの表面を被覆するように形成された所定の物質からなる薄膜コートと、前記基板に実装され、前記配線パターンと電気的に接続された電極を有する発光素子と、を具備する。この発光装置において、さらに、少なくとも前記発光素子を封止する透光性樹脂を有することも可能である。   A light emitting device according to a second aspect of the present invention has a wiring pattern formed, and at least a part of the wiring pattern is formed so as to cover the surface of the light emitting element mounted with silver plating and the surface of the silver plating. And a light emitting element having an electrode mounted on the substrate and electrically connected to the wiring pattern. This light-emitting device can further include a light-transmitting resin that seals at least the light-emitting element.

前記各発光装置において、前記薄膜コートは、硫黄成分を透過し難い機能を有するものであり、H2 S透過性が100×10-9(ml・cm/sec・cm2 ・cmHg)以下、あるいは、SO2 透過性が150×10-9(ml・cm/sec・cm2 ・cmHg)以下が好ましい。また、膜厚は50μm以下、特に30μm以下、さらに10μm以下が好ましい。また、前記薄膜コートを形成する所定の物質は、溶剤で希釈したエポキシ樹脂、オキセタン樹脂、ウレタン樹脂、アクリレート樹脂、ポリイミド樹脂、フッ素樹脂、シルセスキオキサン誘導体、変成シリコーン樹脂、アクリル樹脂、ポリカーボネート樹脂、又はポリノルボルネン樹脂のうち少なくとも1種の溶液が用いられ、前記溶剤を揮発させることによって形成されたものである。 In each of the light emitting devices, the thin film coat has a function of hardly transmitting a sulfur component, and H 2 S permeability is 100 × 10 −9 (ml · cm / sec · cm 2 · cmHg) or less, or The SO 2 permeability is preferably 150 × 10 −9 (ml · cm / sec · cm 2 · cmHg) or less. The film thickness is preferably 50 μm or less, particularly 30 μm or less, and more preferably 10 μm or less. The predetermined substance forming the thin film coat is epoxy resin diluted with a solvent, oxetane resin, urethane resin, acrylate resin, polyimide resin, fluororesin, silsesquioxane derivative, modified silicone resin, acrylic resin, polycarbonate resin Alternatively, at least one solution of polynorbornene resin is used and is formed by volatilizing the solvent.

前記各発明の発光装置において、前記透光性樹脂は、シリコーン樹脂であることが望ましいが、他の樹脂でもよい。前記透光性樹脂は、波長変換物質および/または無機フィラーが含有されていてもよい。この際、基板やパッケージ、LEDチップとの熱膨張係数に近似したものとし、透光性樹脂とパッケージ等との剥離を防止することが望ましい。例えば発光素子としてInGaN系の青色発光LEDチップ、波長変換物質としてYAG蛍光体を使用することにより、白色発光LED装置を容易かつ安価に実現することができる。   In the light emitting device of each of the inventions, the translucent resin is preferably a silicone resin, but may be other resins. The translucent resin may contain a wavelength conversion substance and / or an inorganic filler. At this time, it is desirable that the thermal expansion coefficient approximates that of the substrate, the package, and the LED chip to prevent the translucent resin from being separated from the package. For example, by using an InGaN-based blue light-emitting LED chip as a light-emitting element and a YAG phosphor as a wavelength conversion material, a white light-emitting LED device can be easily and inexpensively realized.

第3の発明に係る発光装置の製造方法は、発光素子と、前記発光素子が実装されたパッケージと、を有する発光装置の製造方法であって、発光素子収納用の開口部を有する支持体の開口部内面に内部リードが露出し、当該内部リードに電気的に連なる外部リードが前記支持体の外部に引き出され、少なくとも前記内部リードの露出部分に銀が使用されたパッケージを用いて、前記支持体の開口部内に発光素子を固着し、前記発光素子の電極を前記内部リードに電気的に接続する工程と、前記支持体の開口部内において少なくとも前記内部リードの銀の表面を被覆するように溶剤で希釈した所定の物質の溶液を注入した後に前記溶剤を揮発させて薄膜コートを形成する工程と、を具備する。この発光装置の製造方法において、前記所定の物質は、エポキシ樹脂、オキセタン樹脂、ウレタン樹脂、アクリレート樹脂、ポリイミド樹脂、フッ素樹脂、シルセスキオキサン誘導体、変成シリコーン樹脂、アクリル樹脂、ポリカーボネート樹脂、又はポリノルボルネン樹脂のうち少なくとも1種であり、硫黄成分を透過し難い機能を有することが望ましい。また、前記薄膜コートを形成した後、さらに、前記発光素子を覆うように液状の透光性樹脂を注入して硬化させる工程を有することも可能である。また、前記透光性樹脂は、シリコーン樹脂であることが望ましいが、他の樹脂でもよい。また、前記所定の物質を溶剤で希釈する割合は、前記溶剤に対する前記所定の物質量が50重量%以下、特に30重量%以下、さらに10重量%以下であることが望ましい。   A method for manufacturing a light emitting device according to a third aspect of the present invention is a method for manufacturing a light emitting device having a light emitting element and a package on which the light emitting element is mounted, the support having an opening for accommodating the light emitting element. An internal lead is exposed on the inner surface of the opening, an external lead electrically connected to the internal lead is drawn out of the support, and at least the exposed portion of the internal lead is used in the package using silver. Fixing the light emitting element in the opening of the body and electrically connecting the electrode of the light emitting element to the internal lead; and a solvent so as to cover at least the silver surface of the internal lead in the opening of the support And a step of injecting a solution of a predetermined substance diluted in step (b) and volatilizing the solvent to form a thin film coat. In this method for manufacturing a light emitting device, the predetermined substance is epoxy resin, oxetane resin, urethane resin, acrylate resin, polyimide resin, fluororesin, silsesquioxane derivative, modified silicone resin, acrylic resin, polycarbonate resin, or poly It is desirable that it is at least one of norbornene resins and has a function that hardly allows the sulfur component to permeate. In addition, after the thin film coat is formed, a liquid translucent resin may be injected and cured so as to cover the light emitting element. The translucent resin is preferably a silicone resin, but may be other resins. The ratio of the predetermined substance diluted with the solvent is preferably 50% by weight or less, particularly 30% by weight or less, and more preferably 10% by weight or less based on the solvent.

第4の発明に係る発光装置の製造方法は、発光素子と、前記発光素子が実装された基板と、を有する発光装置の製造方法であって、配線パターンが形成され、前記配線パターンの少なくとも一部は銀メッキが施された基板に、発光素子を固着し、前記発光素子の電極を前記配線パターンに電気的に接続する工程と、溶剤で希釈した所定の物質の溶液を少なくとも前記配線パターンの銀メッキの表面を被覆するように付着させた後に前記溶剤を揮発させて薄膜コートを形成する工程と、を具備する。この発光装置の製造方法において、前記所定の物質の溶液を付着する手段は、スプレー噴霧手段、インクジェット塗布手段、カーテン塗工手段、滴下手段、前記基板を前記所定の物質の溶液中に浸漬する手段のいずれかである。また、前記薄膜コートを形成した後、さらに、前記発光素子を覆うように液状の透光性樹脂を注入して硬化させる工程を有することも可能である。また、前記透光性樹脂は、シリコーン樹脂であることが望ましいが、他の樹脂でもよい。また、前記所定の物質を溶剤で希釈する割合は、前記溶剤に対する前記所定の物質量が50重量%以下、特に30重量%以下、さらに10重量%以下であることが望ましい。溶剤で希釈した比較的低粘度の樹脂を用いると、スプレー噴霧手段等に効果的に使用できる。また、薄膜状に樹脂をスプレーした場合は揮発量が少なくてすむので、比較的高粘度の樹脂を使用できる。   A method for manufacturing a light emitting device according to a fourth invention is a method for manufacturing a light emitting device having a light emitting element and a substrate on which the light emitting element is mounted, wherein a wiring pattern is formed, and at least one of the wiring patterns is formed. The part is a step of fixing the light emitting element to a silver-plated substrate and electrically connecting the electrode of the light emitting element to the wiring pattern; and a solution of a predetermined substance diluted with a solvent at least in the wiring pattern. Forming a thin film coat by volatilizing the solvent after the silver plating surface is deposited so as to cover the surface. In the method of manufacturing the light emitting device, the means for attaching the solution of the predetermined substance is spray spray means, ink jet coating means, curtain coating means, dripping means, means for immersing the substrate in the solution of the predetermined substance. One of them. In addition, after the thin film coat is formed, a liquid translucent resin may be injected and cured so as to cover the light emitting element. The translucent resin is preferably a silicone resin, but may be other resins. The ratio of the predetermined substance diluted with the solvent is preferably 50% by weight or less, particularly 30% by weight or less, and more preferably 10% by weight or less based on the solvent. When a resin having a relatively low viscosity diluted with a solvent is used, it can be effectively used for spraying means and the like. Further, when the resin is sprayed in a thin film shape, the amount of volatilization can be reduced, so that a relatively high viscosity resin can be used.

第5の発明に係るパッケージは、発光素子収納用の開口部を有する支持体の開口部内面に内部リードが露出し、当該内部リードに電気的に連なる外部リードが前記支持体の外部に引き出され、少なくとも前記内部リードの露出部に銀が使用されたパッケージであって、前記支持体の開口部内面において、前記発光素子との接続部分を除き、前記内部リードの前記銀の表面を被覆するように形成された所定の物質からなる薄膜コートが形成されている。   In the package according to the fifth aspect of the invention, the internal lead is exposed on the inner surface of the opening of the support having an opening for housing the light emitting element, and the external lead electrically connected to the internal lead is drawn out of the support. A package in which silver is used at least for the exposed portion of the internal lead, and covers the surface of the silver of the internal lead except for a connection portion with the light emitting element on the inner surface of the opening of the support. A thin film coat made of a predetermined material is formed.

第6の発明に係る発光素子実装用の基板は、配線パターンが形成され、前記配線パターンの少なくとも一部は銀メッキが施された発光素子実装用の基板であって、発光素子との接続部分を除き、前記銀メッキの表面を被覆するように形成された所定の物質からなる薄膜コートが形成されている。   A light emitting element mounting substrate according to a sixth aspect of the present invention is a light emitting element mounting substrate on which a wiring pattern is formed, and at least a part of the wiring pattern is subjected to silver plating, and a connection portion with the light emitting element A thin film coat made of a predetermined material is formed so as to cover the surface of the silver plating.

請求項1の発光装置によれば、支持体の開口部内面に露出している内部リードに施されている銀の表面の硫化を防止でき、時間経過に伴う光出力の維持率の低下を防止することができる。   According to the light emitting device of claim 1, it is possible to prevent sulfidation of the silver surface applied to the internal lead exposed on the inner surface of the opening of the support, and to prevent a decrease in the light output maintenance rate with time. can do.

請求項2の発光装置によれば、請求項1の発光装置の支持体の開口部内の発光素子を保護することができる。   According to the light emitting device of claim 2, the light emitting element in the opening of the support of the light emitting device of claim 1 can be protected.

請求項3の発光装置によれば、発光素子実装用の基板上の配線パターンに施された銀メッキの表面の硫化を防止でき、時間経過に伴う光出力の維持率の低下を防止することができる。   According to the light emitting device of claim 3, it is possible to prevent sulfidation of the surface of the silver plating applied to the wiring pattern on the substrate for mounting the light emitting element, and to prevent a decrease in the maintenance ratio of the light output with time. it can.

請求項4の発光装置によれば、請求項3の発光装置の発光素子実装用の基板上の発光素子を保護することができる。   According to the light emitting device of claim 4, the light emitting element on the substrate for mounting the light emitting element of the light emitting device of claim 3 can be protected.

請求項5乃至7の発光装置によれば、請求項1または3の発光装置において、薄膜コートのH2 S透過性、あるいは、SO2 透過性、あるいは、膜厚として望ましい範囲を規定することにより、薄膜コートに硫黄成分を透過し難い機能を持たせることが可能である。また、少量の樹脂により硫化を防止することができる。 According to the light-emitting device of claims 5 to 7, in the light-emitting device of claim 1 or 3, by defining a desirable range as H 2 S permeability, SO 2 permeability, or film thickness of the thin film coat. In addition, it is possible to give the thin film coat a function that hardly allows the sulfur component to permeate. Further, sulfidation can be prevented with a small amount of resin.

請求項8の発光装置によれば、請求項1または3の発光装置において、薄膜コートを形成する所定の物質として望ましい例を規定することにより、薄膜コートに硫黄成分を透過し難い機能を持たせることが可能である。   According to the light emitting device of claim 8, in the light emitting device of claim 1 or 3, by defining a desirable example as a predetermined substance for forming the thin film coat, the thin film coat has a function that hardly allows the sulfur component to pass therethrough. It is possible.

請求項9の発光装置によれば、請求項2または4の発光装置において、透光性樹脂の望ましい例を規定することにより、発光素子を容易に封止できる。   According to the light emitting device of claim 9, in the light emitting device of claim 2 or 4, the light emitting element can be easily sealed by defining a desirable example of the translucent resin.

請求項10の発光装置によれば、請求項2または4の発光装置において、透光性樹脂に波長変換物質およびフィラーを含むことによって、例えば白色発光装置を容易かつ安価に実現することができる。   According to the light emitting device of claim 10, in the light emitting device of claim 2 or 4, for example, a white light emitting device can be realized easily and inexpensively by including the wavelength converting substance and the filler in the translucent resin.

請求項11の発光装置の製造方法によれば、請求項1の発光装置を容易に実現することができる。   According to the method for manufacturing a light emitting device of claim 11, the light emitting device of claim 1 can be easily realized.

請求項12の発光装置の製造方法によれば、薄膜コートを形成する所定の物質を規定することにより、硫黄成分を透過し難い機能を有する薄膜コートを容易に実現することができる。   According to the light emitting device manufacturing method of the twelfth aspect, by defining the predetermined substance for forming the thin film coat, it is possible to easily realize the thin film coat having a function that hardly transmits the sulfur component.

請求項13の発光装置の製造方法によれば、請求項11の発光装置の製造方法においてさらに透光性樹脂を形成することにより、発光素子を保護することができる。   According to the method for manufacturing a light emitting device of claim 13, the light emitting element can be protected by further forming a translucent resin in the method for manufacturing the light emitting device of claim 11.

請求項14の発光装置の製造方法によれば、請求項13の発光装置の製造方法において透光性樹脂の望ましい例を規定することにより、発光素子を容易に封止できる。   According to the method for manufacturing a light emitting device of claim 14, the light emitting element can be easily sealed by defining a desirable example of the translucent resin in the method for manufacturing the light emitting device of claim 13.

請求項15の発光装置の製造方法によれば、請求項3の発光装置を容易に実現することができる。     According to the method for manufacturing a light emitting device of claim 15, the light emitting device of claim 3 can be easily realized.

請求項16の発光装置の製造方法によれば、請求項15の発光装置の製造方法において所定の物質の溶液を付着する手段の望ましい例を規定することにより、所望の薄膜コートを容易に実現することができる。   According to the method for manufacturing a light emitting device of claim 16, a desired thin film coat can be easily realized by defining a desirable example of means for attaching a solution of a predetermined substance in the method for manufacturing a light emitting device of claim 15. be able to.

請求項17の発光装置の製造方法によれば、請求項15の発光装置の製造方法においてさらに透光性樹脂を形成することにより、発光素子を保護することができる。   According to the method for manufacturing a light emitting device of claim 17, the light emitting element can be protected by further forming a translucent resin in the method for manufacturing the light emitting device of claim 15.

請求項18の発光装置の製造方法によれば、請求項17の発光装置の製造方法において透光性樹脂の望ましい例を規定することにより、発光素子を容易に封止できる。   According to the method for manufacturing a light emitting device of claim 18, the light emitting element can be easily sealed by defining a desirable example of the translucent resin in the method for manufacturing the light emitting device of claim 17.

請求項19のパッケージによれば、請求項1の発光装置に使用可能なパッケージを提供することができる。     According to the package of claim 19, it is possible to provide a package that can be used for the light emitting device of claim 1.

請求項20の発光素子実装用の基板によれば、請求項3の発光装置に使用可能な基板を提供することができる。   According to the substrate for mounting a light emitting element of claim 20, a substrate usable for the light emitting device of claim 3 can be provided.

以下、図面を参照して本発明に係る発光装置の実施形態および実施例を説明するが、本発明は、これらの実施形態および実施例に限定されるものではない。また、この説明に際して、全図にわたり共通する部分には共通する参照符号を付す。   Hereinafter, embodiments and examples of the light-emitting device according to the present invention will be described with reference to the drawings, but the present invention is not limited to these embodiments and examples. Further, in this description, common reference numerals are assigned to portions common to all the drawings.

<第1の実施形態(パッケージ収納タイプの発光装置)>
図1は、本発明の発光装置の第1の実施形態として、発光素子としてLEDチップを用いた表面実装型のLED装置の構造の一例を模式的に示す断面図である。まず、図1のLED装置の概要を説明する。
<First Embodiment (Package Storage Type Light Emitting Device)>
FIG. 1 is a cross-sectional view schematically showing an example of the structure of a surface-mounted LED device using an LED chip as a light-emitting element, as a first embodiment of the light-emitting device of the present invention. First, the outline | summary of the LED apparatus of FIG. 1 is demonstrated.

パッケージ1は、樹脂製の支持体11と例えばリードフレームからなる導電部材を有する。支持体11は上面側に発光素子収納用の開口部(凹部)を有し、開口部内面の一部にリードフレームの内部リード13aが露出し、この内部リードに電気的に連なる外部リード13bが支持体外部に引き出され、少なくとも内部リード13aに銀(Ag)メッキ14が施されている。そして、開口部内にLEDチップ15が実装され、LEDチップ15の電極15aが内部リード13aに電気的に接続されている。さらに、開口部内面において少なくとも内部リード13aの銀メッキ表面を被覆するように、所定の樹脂の溶液が注入され、溶剤が揮発されて硬化されてなる膜厚が50μm以下、より好ましくは30μm、特に望ましくは10μm以下の銀メッキ硫化防止用の薄膜コート16が形成されている。そして、開口部内の少なくとも薄膜コート16およびLEDチップ15を覆うように透光性樹脂17が埋め込まれている。   The package 1 includes a resin support 11 and a conductive member made of, for example, a lead frame. The support 11 has an opening (concave portion) for accommodating a light emitting element on the upper surface side, and an internal lead 13a of a lead frame is exposed at a part of the inner surface of the opening, and an external lead 13b electrically connected to the internal lead is provided. The lead is pulled out of the support, and silver (Ag) plating 14 is applied to at least the internal lead 13a. The LED chip 15 is mounted in the opening, and the electrode 15a of the LED chip 15 is electrically connected to the internal lead 13a. Furthermore, a film thickness of 50 μm or less, more preferably 30 μm, in particular, a film obtained by injecting a predetermined resin solution and volatilizing and curing the solvent so as to cover at least the silver plating surface of the inner lead 13 a on the inner surface of the opening, Desirably, a thin film coat 16 for preventing silver plating sulfidation of 10 μm or less is formed. A translucent resin 17 is embedded so as to cover at least the thin film coat 16 and the LED chip 15 in the opening.

次に、図1のLED装置の製造工程の一例を説明する。まず、一対の内部リード13aと一対の外部リード13bとを有するリードフレームおよびインサート成形可能な耐熱性樹脂を用いて、パッケージ1をインサート形成する。この際、発光素子収納用の開口部を有する樹脂からなる支持体11の開口部内面に一対の内部リード13aを露出させ、一対の外部リード13bを外部へ引き出すように成形する。上記リードフレームは、例えば平板状の金属部材が用いられており、熱伝導性の良い例えば銅板に対して光反射性を高めるために銀メッキ14が施されてなる。   Next, an example of a manufacturing process of the LED device of FIG. 1 will be described. First, the package 1 is insert-formed using a lead frame having a pair of internal leads 13a and a pair of external leads 13b and a heat-resistant resin capable of insert molding. At this time, the pair of internal leads 13a are exposed on the inner surface of the opening of the support 11 made of a resin having an opening for housing the light emitting element, and the pair of external leads 13b are formed to be drawn out. For example, a flat metal member is used for the lead frame, and a silver plate 14 is applied to enhance the light reflectivity of, for example, a copper plate having good thermal conductivity.

次に、支持体11の開口部内に発光素子として例えばInGaAlN系の窒化物半導体からなるLEDチップ15の下面を例えば透光性エポキシ樹脂を用いてダイボンディングにより固着する。次に、LEDチップ上面(発光面側)に形成されている一対の電極15aと一対の内部リード13aとの間をそれぞれ導電性ワイヤ(例えば金線)18を用いてワイヤボンディング接続する。次に、支持体11の開口部内の少なくとも内部リード13aの銀メッキの表面を被覆するように膜厚が10μm以下の薄膜コート16を形成する。この薄膜コート16を形成する際、例えば所定の変成シリコーン樹脂を溶剤で溶かした溶液を開口部内に適量注入し、ベーキングを行って溶剤を揮発させ、樹脂を硬化させる。または、インクジェット等を用いて、銀メッキ部にのみ薄膜コートを形成することもできる。ここで、変成シリコーン樹脂の一例として、特開2004−292779号公報に記載されている組成物を用いることができる。   Next, the lower surface of the LED chip 15 made of, for example, an InGaAlN-based nitride semiconductor as a light emitting element is fixed to the opening of the support 11 by die bonding using, for example, a translucent epoxy resin. Next, a wire bonding connection is made between the pair of electrodes 15a formed on the upper surface (light emitting surface side) of the LED chip and the pair of internal leads 13a using conductive wires (for example, gold wires) 18 respectively. Next, a thin film coat 16 having a film thickness of 10 μm or less is formed so as to cover at least the silver-plated surface of the internal lead 13 a in the opening of the support 11. When the thin film coat 16 is formed, for example, an appropriate amount of a solution in which a predetermined modified silicone resin is dissolved in a solvent is injected into the opening, and baking is performed to volatilize the solvent, thereby curing the resin. Alternatively, a thin film coat can be formed only on the silver plating portion using an ink jet or the like. Here, the composition described in Unexamined-Japanese-Patent No. 2004-292779 can be used as an example of a modified silicone resin.

次に、支持体11の開口部内の少なくとも薄膜コート16およびLEDチップ15、さらに導電性ワイヤ18を覆うように液状のシリコーン樹脂などの透光性樹脂17を注入して硬化させることにより、開口部内を封止する。この後、外部リード13bを表面実装に適した所望の端子形状に加工する。   Next, a translucent resin 17 such as a liquid silicone resin is injected and cured so as to cover at least the thin film coat 16 and the LED chip 15 in the opening of the support 11 and the conductive wire 18, thereby hardening the inside of the opening. Is sealed. Thereafter, the external lead 13b is processed into a desired terminal shape suitable for surface mounting.

上記したような工程を経て得られた表面実装型のLED装置は、インサート成形可能な耐熱性樹脂からなり、LEDチップ収納用の開口部を有する支持体11と、この支持体11の開口部内面に露出する内部リード13aおよび支持体外部に引き出された外部リード13bを有する。少なくとも内部リード13aには銀メッキ14が施されている。そして、支持体11の開口部内に固着され、内部リード13aに電気的に接続された電極15aを有するLEDチップ15と、支持体11の開口部内面において内部リード13aの銀メッキ表面および開口部内面(リフレクター)の表面を被覆するように、所定の変成シリコーン樹脂が溶剤中に溶かされた後で硬化された膜厚が10μm以下の薄膜コート16を有する。そして、支持体の開口部内の薄膜コート16およびLEDチップ15を被覆するように注入され、硬化された透光性樹脂17を有する。   The surface-mount type LED device obtained through the above-described steps is made of a heat-resistant resin that can be insert-molded, and has a support 11 having an opening for housing an LED chip, and an inner surface of the opening of the support 11. An internal lead 13a exposed to the outside and an external lead 13b drawn to the outside of the support. Silver plating 14 is applied to at least the internal lead 13a. The LED chip 15 having the electrode 15a fixed in the opening of the support 11 and electrically connected to the internal lead 13a, and the silver plating surface and the opening inner surface of the internal lead 13a on the inner surface of the opening of the support 11 A thin film coat 16 having a thickness of 10 μm or less cured after a predetermined modified silicone resin is dissolved in a solvent so as to cover the surface of the (reflector). And it has the translucent resin 17 which was inject | poured and hardened so that the thin film coat 16 and LED chip 15 in the opening part of a support body might be coat | covered.

上記したような構成の表面実装型のLED装置は、薄膜コート16の存在によって、内部リード13aの銀メッキ表面に対する所望の硫化防止効果が得られ、時間経過に伴う光出力の維持率の低下を防止可能であることが確認された。また、開口部内面に対する酸化防止効果を奏することが確認された。なお、薄膜コート16の存在によって透光性樹脂17の劣化などをきたすことはない。   In the surface mount type LED device having the above-described configuration, the presence of the thin film coat 16 can provide a desired sulfidation preventing effect on the silver plating surface of the internal lead 13a, and decrease the light output maintenance rate with time. It was confirmed that it can be prevented. Moreover, it was confirmed that there exists an antioxidant effect with respect to the inner surface of an opening part. Note that the presence of the thin film coat 16 does not cause deterioration of the translucent resin 17.

なお、支持体11の外部から開口部内面部へLEDチップ15に電源を供給する手段は、前記リードフレームに限らず、他の導電部材を用いてもよい。また、透光性樹脂17は、LEDチップ15から放出される光をLEDチップ15の発光色とは異なる波長(例えば補色関係を有する)の光に変換する波長変換物質(例えば蛍光体)、および/または、フィラーを含んでもよい。   The means for supplying power to the LED chip 15 from the outside of the support 11 to the inner surface of the opening is not limited to the lead frame, and other conductive members may be used. In addition, the translucent resin 17 includes a wavelength conversion substance (for example, a phosphor) that converts light emitted from the LED chip 15 into light having a wavelength (for example, a complementary color) different from the emission color of the LED chip 15, and / Or a filler may be included.

さらに、開口部内には、薄膜コート16を形成した後に、必ずしも封止部材を注入しないでもよく、あるいは、無機バインダー、N2 ,Arなどの不活性ガスを充填してもよく、あるいは、開口部内を真空またはそれに近い状態にしてもよい。 Further, after the thin film coat 16 is formed in the opening, the sealing member may not necessarily be injected, or an inert gas such as an inorganic binder, N 2 , or Ar may be filled, or May be in a vacuum or close to it.

以下、上記した発光装置における各構成要素について詳述する。   Hereinafter, each component in the above-described light emitting device will be described in detail.

(支持体11) 支持体は、LEDチップを配置させ、外部からの電流をLEDチップに供給するリード電極が付加されるので、耐熱性や絶縁性を有するものが好適に用いられる。このような支持体の具体的材料としては、ガラスエポキシ、ビスマレイミドトリアジン(以下BTレジンとも呼ぶ)、セラミックス、液晶ポリマーやポリブチレンテレフタレート樹脂(PBT樹脂)が好適に挙げられる。また、LEDチップからの光を効率よく反射させるために基板を構成する樹脂に酸化チタンなどの白色顔料などを混合させることができる。   (Support 11) Since the support is provided with a lead electrode on which the LED chip is arranged and an electric current from the outside is supplied to the LED chip, one having heat resistance and insulation is preferably used. Specific examples of such a support include glass epoxy, bismaleimide triazine (hereinafter also referred to as BT resin), ceramics, liquid crystal polymer, and polybutylene terephthalate resin (PBT resin). Moreover, in order to reflect the light from an LED chip efficiently, white pigments, such as a titanium oxide, can be mixed with resin which comprises a board | substrate.

樹脂により支持体をモールド成形させる場合は、内部に配置されるLEDチップに電力を供給するリード電極をインサート成形などで比較的簡単に形成することができる。リード電極は、銅および銅合金等の電気良導体により形成することができる。本実施形態では、リード電極は、発熱を効率よく放出させるものが好ましく、銅電極を使用している。LEDチップからの光の反射性を向上させるために、リード電極の表面に銀メッキ14を施しているが、アルミニウム、金等の平滑な金属メッキを施すこともできる。   When the support is molded with resin, the lead electrode for supplying power to the LED chip disposed therein can be formed relatively easily by insert molding or the like. The lead electrode can be formed of a good electrical conductor such as copper and a copper alloy. In this embodiment, the lead electrode is preferably one that efficiently releases heat, and a copper electrode is used. In order to improve the reflectivity of light from the LED chip, the surface of the lead electrode is subjected to silver plating 14, but smooth metal plating such as aluminum or gold can also be performed.

ガラスエポキシおよびBTレジンにより支持体を構成させる場合は、銅張りガラスエポキシおよび銅箔を圧着したBTレジンに所望のパターンを作るためにケミカルエッチングを行う。これにドリル加工、パンチングプレス加工により側壁部となる穴を作ったガラスエポキシおよびBTレジンを接着剤で張り合わせ形成する。セラミックにより支持体を構成させる場合は、セラミック焼成前の原料となるグリーンシート上に所望のパターンで高融点金属を含有した導電性ペーストを印刷する。グリーンシートを複数重ね合わせ支持体形状にさせた後に焼成してセラミック支持体を形成する。導電性ペーストは焼成時に樹脂成分が飛び外部との電気的接続が可能な電極層として残る。   When the support is constituted by glass epoxy and BT resin, chemical etching is performed to form a desired pattern on BT resin to which copper-clad glass epoxy and copper foil are bonded. Glass epoxy and BT resin in which holes to be side walls are formed by drilling and punching press are bonded to each other with an adhesive. When the support is made of ceramic, a conductive paste containing a refractory metal is printed in a desired pattern on a green sheet that is a raw material before firing the ceramic. A plurality of green sheets are stacked to form a support, and then fired to form a ceramic support. The conductive paste is left as an electrode layer that can be electrically connected to the outside when the resin component jumps during firing.

(発光素子15) 発光素子の種類は特に制限されるものではないが、例えば、MOCVD法等によって基板上にInN、AlN、GaN、InGaN、AlGaN、InGaAlN等の窒化物半導体を発光層として形成させたもの、一例として、サファイア基板上にn型GaNよりなるn型コンタクト層と、n型AlGaNよりなるn型クラッド層と、p型GaNよりなるp型コンタクト層とが順次に積層された構造のものを使用する。また、半導体の構造としては、MIS接合、PIN接合やPN接合などを有するホモ構造、ヘテロ結合あるいはダブルヘテロ結合のものが挙げられる。半導体の材料やその混晶比によって発光波長を種々選択できる。また、半導体活性層を量子効果が生ずる薄膜に形成させた単一量子井戸構造や多重量子井戸構造とすることができる。また、活性層には、Si、Ge等のドナー不純物および/またはZn、Mg等のアクセプター不純物がドープされる場合もある。発光素子の発光波長は、その活性層のInGaNのIn含有量を変えるか、または活性層にドープする不純物の種類を変えることにより、紫外領域から赤色まで変化させることができる。   (Light-Emitting Element 15) The type of light-emitting element is not particularly limited. For example, a nitride semiconductor such as InN, AlN, GaN, InGaN, AlGaN, or InGaAlN is formed as a light-emitting layer on a substrate by MOCVD or the like. As an example, an n-type contact layer made of n-type GaN, an n-type cladding layer made of n-type AlGaN, and a p-type contact layer made of p-type GaN are sequentially stacked on a sapphire substrate. Use things. The semiconductor structure includes a homostructure having a MIS junction, a PIN junction, a PN junction, etc., a hetero bond, or a double hetero bond. Various emission wavelengths can be selected depending on the semiconductor material and the mixed crystal ratio. Moreover, it can be set as the single quantum well structure or the multiple quantum well structure which formed the semiconductor active layer in the thin film which produces a quantum effect. The active layer may be doped with donor impurities such as Si and Ge and / or acceptor impurities such as Zn and Mg. The emission wavelength of the light-emitting element can be changed from the ultraviolet region to red by changing the In content of InGaN in the active layer or changing the type of impurities doped in the active layer.

一般に窒化物半導体(InX GaY Al1-X-Y N、0≦X、0≦Y、0≦X+Y≦1)は、結晶成長が難しく、絶縁性のサファイア基板上に形成される。サファイア基板上に形成された窒化物半導体に電力を供給するためには正極(p電極)および負極(n電極)を同一面側(半導体積層面側)に形成せざるを得ず、オーミック接触をとり、かつ、効率的に電流を注入させるためには透光性の電極として金薄膜などが用いられる。このような電極は薄膜にして透光性を持たせているものの金属からなるが故に、窒化物半導体を利用したLEDチップの活性層で生成した光は部分的に反射される。 In general, a nitride semiconductor (In X Ga Y Al 1-XY N, 0 ≦ X, 0 ≦ Y, 0 ≦ X + Y ≦ 1) is difficult to grow a crystal and is formed on an insulating sapphire substrate. In order to supply power to the nitride semiconductor formed on the sapphire substrate, the positive electrode (p electrode) and the negative electrode (n electrode) must be formed on the same surface side (semiconductor laminated surface side), and ohmic contact is made. In order to inject current efficiently, a gold thin film or the like is used as a translucent electrode. Although such an electrode is made of a metal although it is a thin film and has translucency, light generated in the active layer of the LED chip using a nitride semiconductor is partially reflected.

このようなLEDチップは支持体上にダイボンド機器を用いてマウントすることができる。また、LEDチップ上に設けられた電極と、金線ワイヤを利用して電気的に接続させることができる。   Such an LED chip can be mounted on a support using a die-bonding device. Moreover, it can electrically connect with the electrode provided on the LED chip, and a gold wire.

発光素子は、460nm近傍に発光ピーク波長を持つ青色発光の発光素子、410nm近傍に発光ピーク波長を持つ青紫色発光の発光素子、365nm近傍に発光ピーク波長を持つ紫外線発光の発光素子などを使用することができる。   As the light emitting element, a blue light emitting element having an emission peak wavelength near 460 nm, a blue-violet light emitting element having an emission peak wavelength near 410 nm, an ultraviolet light emitting element having an emission peak wavelength near 365 nm, or the like is used. be able to.

白色発光の発光装置を実現する場合には、例えば青色発光の発光素子と、透光性被覆部材に含まれる蛍光物質としてYAG蛍光体(Ce等のランタノイド系元素で主に賦活される希土類アルミン酸塩蛍光体)との組合せを使用することによって、発光素子による発光とYAG蛍光体による発光との混色によって白色発光が得られる。   When realizing a white light emitting device, for example, a blue light emitting element and a YAG phosphor (a rare earth aluminate mainly activated by a lanthanoid element such as Ce) as a fluorescent material contained in the light-transmitting coating member By using a combination with a salt phosphor, white light emission can be obtained by mixing colors of light emitted from the light emitting element and light emitted from the YAG phosphor.

(導電性ワイヤ18) 導電性ワイヤとしては、発光素子の電極とのオーミック性、機械的接続性、電気伝導性および熱伝導性が良いものが求められる。熱伝導率としては、0.01cal /(S )(cm2 )(℃/cm)以上が好ましく、より好ましくは、0.5cal/(S )(cm2 )(℃/cm)以上である。また、作業性などを考慮して導電性ワイヤの直径は、好ましくは10μm以上、45μm以下である。このような導電性ワイヤとして、具体的には、金、銅、白金、アルミニウム等の金属およびそれらの合金を用いたワイヤが挙げられる。このような導電性ワイヤは、ワイヤボンディング装置によって、各発光素子と内部端子との間に容易にボンディング接続させることができる。 (Conductive Wire 18) The conductive wire is required to have good ohmic properties, mechanical connectivity, electrical conductivity, and thermal conductivity with the electrode of the light emitting element. The thermal conductivity, preferably 0.01cal / (S) (cm 2 ) (℃ / cm) or higher, more preferably is 0.5cal / (S) (cm 2 ) (℃ / cm) or more. In consideration of workability and the like, the diameter of the conductive wire is preferably 10 μm or more and 45 μm or less. Specific examples of such conductive wires include wires using metals such as gold, copper, platinum, and aluminum, and alloys thereof. Such a conductive wire can be easily bonded and connected between each light emitting element and the internal terminal by a wire bonding apparatus.

(薄膜コート16) 薄膜コートは、硫黄成分を透過し難い機能を有するものであればよく、例えばH2 S透過性が100×10-9(ml・cm/sec・cm2 ・cmHg)以下、あるいは、SO2 透過性が150×10-9(ml・cm/sec・cm2 ・cmHg)以下であり、膜厚が50μm以下、望ましくは10μm以下である。この薄膜コート16は、所定の物質を溶剤で希釈した溶液を開口部内に適量注入した後、溶剤を揮発させることにより、形成することが可能である。ここで、所定の物質は、エポキシ樹脂、オキセタン樹脂、ウレタン樹脂、アクリレート樹脂、ポリイミド樹脂、フッ素樹脂、シルセスキオキサン誘導体、変成シリコーン樹脂、アクリル樹脂、ポリカーボネート樹脂、又はポリノルボルネン樹脂のうち少なくとも1種である。また、前記溶剤で希釈する所定の物質の割合は、溶剤に対する所定の物質量が50重量%以下、特に30重量%以下、さらに10重量%以下が好ましい。この揮発させる溶剤を回収して、再利用することもできる。 (Thin Film Coat 16) The thin film coat only needs to have a function that hardly allows the sulfur component to permeate. For example, H 2 S permeability is 100 × 10 −9 (ml · cm / sec · cm 2 · cmHg) or less, Alternatively, the SO 2 permeability is 150 × 10 −9 (ml · cm / sec · cm 2 · cmHg) or less, and the film thickness is 50 μm or less, preferably 10 μm or less. The thin film coat 16 can be formed by injecting an appropriate amount of a solution obtained by diluting a predetermined substance with a solvent into the opening, and then volatilizing the solvent. Here, the predetermined substance is at least one of epoxy resin, oxetane resin, urethane resin, acrylate resin, polyimide resin, fluororesin, silsesquioxane derivative, modified silicone resin, acrylic resin, polycarbonate resin, or polynorbornene resin. It is a seed. The ratio of the predetermined substance diluted with the solvent is preferably 50% by weight or less, particularly preferably 30% by weight or less, and more preferably 10% by weight or less based on the solvent. The solvent to be volatilized can be recovered and reused.

(透光性樹脂17) 透光性封止材は、支持体開口部内に設けるものであり、LEDチップからの光を効率よく外部に透過させると共に、外力、塵芥などからLEDチップや金ワイヤなどを保護するものである。このような透光性封止材としては、シリコーン樹脂、変成シリコーン樹脂、エポキシ樹脂、アクリレート樹脂、ウレタン樹脂、ポリイミド樹脂等の熱硬化性樹脂、あるいはアクリル樹脂、ポリカーボネット樹脂、ポリノルボルネン樹脂等の熱可塑性樹脂から選択された少なくとも一種を用いることができる。   (Translucent resin 17) The translucent sealing material is provided in the opening of the support, efficiently transmits light from the LED chip to the outside, and from an external force, dust, etc., such as an LED chip or a gold wire. Is to protect. Examples of such a light-transmitting sealing material include thermosetting resins such as silicone resins, modified silicone resins, epoxy resins, acrylate resins, urethane resins, polyimide resins, acrylic resins, polycarbonate resins, polynorbornene resins, and the like. At least one selected from thermoplastic resins can be used.

また、透光性樹脂は、波長変換物質および/または無機フィラーが含有されていてもよい。この際、基板やパッケージ、LEDチップとの熱膨張係数に近似したものとし、透光性樹脂とパッケージ等との剥離を防止することが望ましい。例えば発光素子としてInGaN系の青色発光LEDチップ、波長変換物質としてYAG蛍光体を使用することにより、白色発光LED装置を容易かつ安価に実現することができる。   The translucent resin may contain a wavelength conversion substance and / or an inorganic filler. At this time, it is desirable that the thermal expansion coefficient approximates that of the substrate, the package, and the LED chip to prevent the translucent resin from being separated from the package. For example, by using an InGaN-based blue light-emitting LED chip as a light-emitting element and a YAG phosphor as a wavelength conversion material, a white light-emitting LED device can be easily and inexpensively realized.

<第2の実施形態(段差付きパッケージ収納タイプの発光装置)>
図2は、第2の実施形態に係る表面実装型のLED装置の構造の一例を模式的に示す断面図である。図2のLED装置は、図1を参照して前述した第1の実施形態のLED装置と比べて、パッケージ1aの開口部内底面の一部(例えば中央部)が低くなった段差部11aが形成されており、開口部内底面上にLEDチップ15がフェースアップ実装されている。内部リード13aは、段差部上面に露出している点が異なり、その他は同じである。段差部側壁面にも銀メッキが施されることが望ましい。内部リード13aとLEDチップ上面の電極15aとは導電性ワイヤ18によりボンディング接続されている。そして、少なくとも開口部内面の一部を被覆するように膜厚が例えば10μm以下の薄膜コート16が形成されている。さらに、開口部の内部には、内部リード13a、LEDチップ15、導電性ワイヤ18を覆うようにシリコーン樹脂17が埋め込まれている。
<Second Embodiment (Package Storage Type Light Emitting Device with Step)>
FIG. 2 is a cross-sectional view schematically showing an example of the structure of the surface-mount LED device according to the second embodiment. The LED device of FIG. 2 is formed with a stepped portion 11a in which a part (for example, the central portion) of the inner bottom surface of the opening of the package 1a is lower than the LED device of the first embodiment described above with reference to FIG. The LED chip 15 is mounted face up on the inner bottom surface of the opening. The internal lead 13a is different in that it is exposed on the upper surface of the stepped portion, and the others are the same. It is desirable that the side wall surface of the step portion is also subjected to silver plating. The internal lead 13a and the electrode 15a on the upper surface of the LED chip are bonded and connected by a conductive wire 18. A thin film coat 16 having a film thickness of, for example, 10 μm or less is formed so as to cover at least a part of the inner surface of the opening. Further, a silicone resin 17 is embedded in the opening so as to cover the internal leads 13 a, the LED chip 15, and the conductive wires 18.

上記構成の図2のLED装置においても、図1を参照して前述した図1のLED装置と基本的に同様の効果が得られるほか、LEDチップの実装位置がワイヤボンディング(2ndボンディング)の位置よりも低いカップ構造を有するので、LEDチップを実装するよりも先に銀メッキをコートすることができる。これにより、チップ上面電極(ワイヤの1stボンディング位置)、および、2ndボンディング位置にコーティング樹脂が被覆されず、封止用透光樹脂との界面がボンディングワイヤの金線部分に存在せず、異なる樹脂物性界面での金線破断が発生しないので、信頼性が向上する。   In the LED device of FIG. 2 having the above-described configuration, basically the same effect as the LED device of FIG. 1 described above with reference to FIG. 1 can be obtained, and the mounting position of the LED chip is the position of wire bonding (2nd bonding). Since it has a lower cup structure, silver plating can be coated before mounting the LED chip. Accordingly, the coating resin is not coated on the chip upper surface electrode (1st bonding position of the wire) and the 2nd bonding position, and the interface with the light-transmitting resin for sealing does not exist in the gold wire portion of the bonding wire, which is a different resin. Since the gold wire breakage does not occur at the physical property interface, the reliability is improved.

<第3の実施形態(基板搭載タイプの発光装置)>
図3は、本発明の発光装置の第3の実施形態として、発光素子としてLEDチップを用いた表面実装型のLED装置の構造の一例を模式的に示す断面図である。図3のLED装置は、図1を参照して前述した第1の実施形態のLED装置と比べて、パッケージ1に代えて、発光素子実装用の基板30を使用している点が主に異なる。
<Third Embodiment (Board Mount Type Light Emitting Device)>
FIG. 3 is a cross-sectional view schematically showing an example of the structure of a surface-mounted LED device using an LED chip as a light-emitting element, as a third embodiment of the light-emitting device of the present invention. The LED device of FIG. 3 is mainly different from the LED device of the first embodiment described above with reference to FIG. 1 in that a light emitting element mounting substrate 30 is used instead of the package 1. .

発光素子実装用の基板30は、ガラスエポキシ、セラミックスなどからなる平板タイプの基板(例えば印刷配線板)31の上面に配線パターン32が設けられ、この配線パターン32の少なくとも一部(例えば先端部)は例えば銀メッキ33が施され、この銀メッキ33の表面を被覆するように所定の物質からなる薄膜コート34が形成されている。そして、基板31上にはLEDチップ35が例えばフェースアップ実装されており、LEDチップ35の電極が例えばボンディングワイヤ36により配線パターン32と電気的に接続されている。前記LEDチップ35を実装した後、さらに、LEDチップ35を覆うように透光性樹脂(例えばシリコーン樹脂)37で封止している。なお、前記配線パターン32は基板側面部に引き出され、外部端子となっている。   The substrate 30 for mounting a light emitting element is provided with a wiring pattern 32 on the upper surface of a flat plate type substrate (for example, printed wiring board) 31 made of glass epoxy, ceramics, etc., and at least a part (for example, a front end portion) of the wiring pattern 32. For example, silver plating 33 is applied, and a thin film coat 34 made of a predetermined material is formed so as to cover the surface of the silver plating 33. The LED chip 35 is mounted face-up on the substrate 31, for example, and the electrodes of the LED chip 35 are electrically connected to the wiring pattern 32 by, for example, bonding wires 36. After the LED chip 35 is mounted, the LED chip 35 is further sealed with a translucent resin (for example, silicone resin) 37 so as to cover the LED chip 35. The wiring pattern 32 is drawn out to the side surface of the substrate and serves as an external terminal.

薄膜コート34は、第1の実施形態で前述した薄膜コート16と同様であり、硫黄成分を透過し難い機能を有する。この薄膜コート34の形成は、所定の物質を溶剤で希釈した溶液を少なくとも配線パターンの銀メッキの表面を被覆するように付着させた後に溶剤を揮発させることにより可能である。所定の物質の溶液を付着する手段は、スプレー噴霧手段、インクジェット塗布手段、カーテン塗工手段、滴下手段、基板を所定の物質の溶液中に浸漬する手段のいずれかを用いることができる。所定の物質を溶剤で希釈する割合は、溶剤に対する所定の物質量が50重量%以下、特に30重量%以下、さらに10重量%以下が好ましい。所定の樹脂を溶剤で希釈した比較的低粘度の溶液を用いると、スプレー噴霧手段等に効果的に使用できる。また、樹脂を薄膜状にスプレーした場合は揮発量が少なくてすむので、比較的高粘度の樹脂を使用することもできる。   The thin film coat 34 is the same as the thin film coat 16 described in the first embodiment, and has a function of hardly allowing the sulfur component to pass therethrough. The thin film coat 34 can be formed by volatilizing the solvent after adhering a solution obtained by diluting a predetermined substance with a solvent so as to cover at least the silver plating surface of the wiring pattern. As the means for attaching the solution of the predetermined substance, any of spray spraying means, inkjet coating means, curtain coating means, dropping means, and means for immersing the substrate in the predetermined substance solution can be used. The proportion of the predetermined substance diluted with the solvent is preferably 50% by weight or less, particularly 30% by weight or less, and more preferably 10% by weight or less based on the solvent. When a relatively low viscosity solution obtained by diluting a predetermined resin with a solvent is used, it can be effectively used for spraying means. Further, when the resin is sprayed in a thin film, the amount of volatilization can be reduced, so that a relatively high viscosity resin can be used.

<第4の実施形態(基板搭載タイプ、リフレクター付きの発光装置)>
図4は、本発明の発光装置の第4の実施形態として、リフレクター付きの表面実装型のLED装置の構造の一例を模式的に示す断面図である。図4のLED装置は、図3を参照して前述した第3の実施形態のLED装置と比べて、基板30上でLEDチップ35の周りを囲むようにリフレクター40が搭載されて固着されている点が主に異なる。
<Fourth embodiment (substrate mounting type, light emitting device with reflector)>
FIG. 4: is sectional drawing which shows typically an example of the structure of the surface-mount type LED device with a reflector as 4th Embodiment of the light-emitting device of this invention. The LED device of FIG. 4 is mounted and fixed with a reflector 40 so as to surround the LED chip 35 on the substrate 30 as compared with the LED device of the third embodiment described above with reference to FIG. The point is mainly different.

リフレクター40は、平板状の基体の中央部が開口されており、この開口内部のテーパ状の側壁面は銀メッキ33が施されて反射面とされている。そして、基板31上にLEDチップ35がフェースアップ実装された状態で所定の物質からなる薄膜コート34が、少なくとも配線パターン32上の銀メッキ33の表面およびリフレクター40の反射面を被覆するように形成されている。なお、リフレクター40の反射面を被覆する薄膜コート34は、リフレクター40を基板31上に搭載する前に形成しておき、リフレクター40を基板31上に搭載した後には形成しないようにしてもよい。さらに、リフレクター40の開口内部でLEDチップ35を覆うように透光性樹脂37で封止している。   The reflector 40 has an opening at the center of a flat substrate, and the tapered side wall surface inside the opening is silver-plated 33 to be a reflecting surface. A thin film coat 34 made of a predetermined material is formed so as to cover at least the surface of the silver plating 33 on the wiring pattern 32 and the reflection surface of the reflector 40 with the LED chip 35 face-up mounted on the substrate 31. Has been. The thin film coat 34 that covers the reflecting surface of the reflector 40 may be formed before the reflector 40 is mounted on the substrate 31 and may not be formed after the reflector 40 is mounted on the substrate 31. Further, the LED chip 35 is covered with a translucent resin 37 so as to cover the inside of the opening of the reflector 40.

上記した第4の実施形態に係る基板搭載タイプ、リフレクター付きの発光装置においても、前述した第1の実施形態に係るパッケージ収納タイプの発光装置と同様に、薄膜コート34の存在による効果が得られる。   Also in the light emitting device with the substrate mounting type and the reflector according to the fourth embodiment described above, the effect due to the presence of the thin film coat 34 is obtained as in the case of the light emitting device of the package storage type according to the first embodiment described above. .

以下、具体的実施例について詳述するが、これらに限定されるものではない。
[実施例1〜2] 実施例1〜2では、図1に示したようなパッケージ1の開口部内底面に、青色(470nm)が発光可能な窒化物半導体を発光層に持ったLEDチップをダイボンディングにより配置させた。LEDチップはサファイア基板上に窒化ガリウムからなるバッファ層、GaNからなるn型コンタクト兼クラッド層、GaAlNからなるp型クラッド層、GaNからなるp型コンタクト層が積層されたものである。n型コンタクト層およびp型クラッド層との間には単一量子井戸構造となるInGaN層が形成されている。サファイア基板上に形成された半導体層側から正極および負極の電極を形成させるために窒化物半導体の一部をエッチングさせてn型コンタクト層を露出させてある。p型コンタクト層上には金薄膜をオーミック電極として形成させてある。
Specific examples will be described in detail below, but the present invention is not limited to these examples.
[Examples 1 and 2] In Examples 1 and 2, an LED chip having a light emitting layer with a nitride semiconductor capable of emitting blue (470 nm) on the bottom surface of the opening of the package 1 as shown in FIG. Arranged by bonding. In the LED chip, a buffer layer made of gallium nitride, an n-type contact / cladding layer made of GaN, a p-type cladding layer made of GaAlN, and a p-type contact layer made of GaN are stacked on a sapphire substrate. An InGaN layer having a single quantum well structure is formed between the n-type contact layer and the p-type cladding layer. In order to form positive and negative electrodes from the semiconductor layer formed on the sapphire substrate, a part of the nitride semiconductor is etched to expose the n-type contact layer. A gold thin film is formed as an ohmic electrode on the p-type contact layer.

パッケージ1は、予め形成させたリード電極を金型内に配置させ、ポリアミド樹脂を注入させることにより成形した。パッケージの開口部内底面にリード電極の一部(内部リード13a)が露出しており、内部リード13aは銀メッキが施されている。パッケージの開口部内底面は、鏡面の如く一定方向から入射したLEDチップからの光の大部分を特定方向に反射可能な平面(平滑面)とされている。このような平面上に配置されたLEDチップ15から放出される縦方向の光は、効率よく前面に放出することができる。そのため、内部リード13aの銀メッキ表面、開口部内の底面および側面はLEDチップ15からの光を効率よく反射することが可能となる。   The package 1 was formed by placing a pre-formed lead electrode in a mold and injecting a polyamide resin. A part of the lead electrode (internal lead 13a) is exposed on the inner bottom surface of the opening of the package, and the internal lead 13a is silver-plated. The inner bottom surface of the opening of the package is a flat surface (smooth surface) that can reflect most of the light from the LED chip incident from a certain direction, such as a mirror surface, in a specific direction. The light in the longitudinal direction emitted from the LED chip 15 arranged on such a plane can be efficiently emitted to the front surface. Therefore, the silver-plated surface of the internal lead 13a, the bottom surface and the side surface in the opening can efficiently reflect the light from the LED chip 15.

パッケージ1の開口部内に透光性エポキシ樹脂を用いてLEDチップ15をダイボンディングによりマウントさせた。LEDチップ15の各電極15aと内部リード13aとを金線18を用いてワイヤボンディングさせ電気的に導通をとってある。   The LED chip 15 was mounted by die bonding using a translucent epoxy resin in the opening of the package 1. Each electrode 15a of the LED chip 15 and the internal lead 13a are wire-bonded using a gold wire 18 and are electrically connected.

さらに、パッケージの開口部内の少なくとも内部リード13aの銀メッキと開口部内面からなるリフレクターの表面を被覆するように膜厚が10μm以下の薄膜コート16を形成した。この際、所定の樹脂を溶剤で溶かした溶液を開口部内に注入し、ベークによって溶剤を揮発させ、樹脂を硬化させて薄膜コート16を形成した。   Further, a thin film coat 16 having a film thickness of 10 μm or less was formed so as to cover at least the surface of the reflector made of silver plating of the internal lead 13a and the inner surface of the opening in the opening of the package. At this time, a solution in which a predetermined resin was dissolved in a solvent was poured into the opening, the solvent was volatilized by baking, and the resin was cured to form the thin film coat 16.

次に、支持体11の開口部内の少なくとも薄膜コート16およびLEDチップ15、さらに導電性ワイヤ18を覆うように液状の透光性樹脂17を注入して硬化させた。このような封止用の透光性樹脂として、シリコーン樹脂を用いる。   Next, a liquid translucent resin 17 was injected and cured so as to cover at least the thin film coat 16 and the LED chip 15 in the opening of the support 11 and the conductive wire 18. A silicone resin is used as such a translucent resin for sealing.

この後、外部リード13bを表面実装に適した所望の端子形状に加工する、例えば支持体側面から支持体底面に沿って底面側に折り曲げることによって外部端子13cを形成し、この外部端子13cを表面実装時に半田付け接続する。   Thereafter, the external lead 13b is processed into a desired terminal shape suitable for surface mounting. For example, the external terminal 13c is formed by bending from the side surface of the support body to the bottom surface side along the bottom surface of the support body. Solder connection when mounting.

上記したような工程を経て得られた表面実装型のLED装置は、第1の実施形態で前述したような効果が得られる。具体的に、薄膜コート形成の処理方法を異ならせた実施例1〜2により得た処理品1〜2について、硫化試験装置で硫化試験を行った結果、確認された効果を比較例(薄膜コートが形成されていない)と対比する。薄膜コート形成の処理方法は、溶剤としてアセトンあるいはPGMEA(プロピレングリコールモノエチルエーテルアセテート)を用いた。そして、前記樹脂を溶剤で希釈した溶液をディスペンサーから開口部内に滴下し、硬化(例えば120℃で1時間)により溶剤を揮発させて薄膜コートを形成して硬化(最大150℃で1時間)させる。この際、溶液の種類と濃度を異ならせて得た実施例1〜2により得た処理品1〜2について、硫化試験装置で硫化試験を行った。
(処理方法) 溶剤 樹脂 濃度
実施例1(処理品1) アセトン 9.9 g 0.1 g 1%
実施例2(処理品2) アセトン 9.95g 0.05g 0.5%
(試験条件)40℃、80%RH、H2 S流量15ppmの雰囲気下、96時間爆露

(試験結果) 薄膜コート 光出力の取り出し効率 低 下 率
(比較例1) 無し 初期値の84% 16%
実施例1(処理品1) 有り 初期値の94% 6%
実施例2(処理品2) 有り 初期値の93% 7%

処理品1〜2によればLED寿命が比較例の2.6倍延びるものと推定される。
[実施例3]
The surface-mount type LED device obtained through the above-described steps can obtain the effects described above in the first embodiment. Concretely, as a result of conducting a sulfidation test with a sulfidation test apparatus on the processed products 1 and 2 obtained in Examples 1 and 2 with different processing methods for forming a thin film coat, the confirmed effect was compared with a comparative example (thin film coat). Is not formed). As a processing method for forming the thin film coat, acetone or PGMEA (propylene glycol monoethyl ether acetate) was used as a solvent. And the solution which diluted the said resin with the solvent is dripped in an opening part from a dispenser, a solvent is volatilized by hardening (for example, 120 degreeC for 1 hour), a thin film coat is formed, and it hardens (at 150 degreeC at maximum for 1 hour). . Under the present circumstances, the sulfuration test was done with the sulfuration test apparatus about the processed goods 1-2 obtained by Example 1-2 obtained by varying the kind and density | concentration of a solution.
(Treatment method) Solvent Resin concentration Example 1 (Treatment product 1) Acetone 9.9 g 0.1 g 1%
Example 2 (treated product 2) Acetone 9.95 g 0.05 g 0.5%
(Test conditions) Explosion for 96 hours in an atmosphere of 40 ° C., 80% RH, H 2 S flow rate of 15 ppm

(Test result) Thin film coating Light output extraction efficiency Low rate (Comparative example 1) None 84% of initial value 16%
Example 1 (treated product 1) Yes 94% of initial value 6%
Example 2 (Processed product 2) Yes 93% of initial value 7%

According to the processed products 1 and 2, it is estimated that the LED life is 2.6 times longer than that of the comparative example.
[Example 3]

実施例1と同様に前記樹脂を溶剤で希釈した溶液ををディスペンサーから開口内部に滴下した後、樹脂が硬化しない条件(25℃、8時間)で大気中に放置し、溶剤を揮発させた。コートした樹脂は硬化していないことを確認した後、透光性のシリコーン樹脂を滴下し、透光性シリコーン樹脂とコート樹脂とを同時に硬化させた後、実施例1〜2と同様に、硫化試験装置で硫化試験を行った結果、実施例1〜2と同様の効果が得られた。 In the same manner as in Example 1, a solution obtained by diluting the resin with a solvent was dropped from the dispenser into the opening, and then left in the atmosphere under the condition that the resin did not cure (25 ° C., 8 hours) to volatilize the solvent. After confirming that the coated resin is not cured, a translucent silicone resin is dropped, and the translucent silicone resin and the coat resin are cured simultaneously, and then, in the same manner as in Examples 1 and 2, As a result of conducting a sulfuration test with a test apparatus, the same effects as in Examples 1 and 2 were obtained.

(処理方法) 溶剤 樹脂 濃度
実施例3(処理品3) アセトン 9.9 g 0.1 g 1%
(試験結果) 薄膜コート 光出力の取り出し効率 低 下 率
(比較例1) 無し 初期値の84% 16%
実施例3(処理品3) 封止樹脂と同時硬化 初期値の94% 6%
[実施例4〜7] 実施例4〜7では、図2に示したようなパッケージ1の開口部内底面に、青色(470nm)が発光可能な窒化物半導体を発光層に持ったLEDチップをダイボンディングにより配置させ、フェースアップ実装している。この場合、内部リードは、開口部内底面の段差部上面に露出している。銀メッキは、リードフレームの少なくとも内部リードの表面に施されており、さらに望ましくは開口部内面にも施されている。内部リードとLEDチップ上面の電極とは導電性ワイヤによりボンディング接続されている。そして、少なく開口部内面の一部と内部リード13aの銀メッキ表面を被覆するように、所定の樹脂が注入されて硬化されてなる膜厚が例えば10μm以下の銀メッキ硫化防止用の薄膜コート16が形成されている。シリコーン樹脂18は、開口部内で内部リード13a、LEDチップ15、導電性ワイヤ18を覆うように埋め込まれている。
(Treatment method) Solvent Resin concentration Example 3 (Treatment product 3) Acetone 9.9 g 0.1 g 1%
(Test result) Thin film coating Light output extraction efficiency Low rate (Comparative Example 1) None 84% of initial value 16%
Example 3 (treated product 3) Simultaneous curing with sealing resin 94% of initial value 6%
[Examples 4 to 7] In Examples 4 to 7, an LED chip having a light emitting layer with a nitride semiconductor capable of emitting blue (470 nm) is formed on the bottom surface of the opening of the package 1 as shown in FIG. It is arranged by bonding and mounted face up. In this case, the internal lead is exposed on the upper surface of the stepped portion on the inner bottom surface of the opening. The silver plating is applied to at least the surface of the inner lead of the lead frame, and more preferably to the inner surface of the opening. The internal lead and the electrode on the upper surface of the LED chip are bonded and connected by a conductive wire. Then, a thin film coat 16 for preventing silver plating sulfidation having a thickness of, for example, 10 μm or less, in which a predetermined resin is injected and cured so as to cover at least a part of the inner surface of the opening and the silver plating surface of the internal lead 13a. Is formed. The silicone resin 18 is embedded so as to cover the internal lead 13a, the LED chip 15, and the conductive wire 18 in the opening.

上記したような工程を経て得られた表面実装型のLED装置は、図2を参照して前述した第2の実施形態の表面実装型のLED装置と同様の効果が得られる。なお、実施例1〜7の薄膜コートに使用した所定の樹脂は、実施の形態に示す公報の実施例45のシリコーン樹脂を用いている。また、薄膜コート形成の処理方法を異ならせた実施例により得た処理品について、硫化試験装置で硫化試験を行った結果、実施例1〜3と同様の効果が得られた。
(処理方法) 溶剤 樹脂 濃度
実施例4(処理品1) アセトン 9.9 g 0.1 g 1%
実施例5(処理品2) アセトン 9.95g 0.05g 0.5%
実施例6(処理品3) PGMEA9.9 g 0.1 g 1%
実施例7(処理品4) PGMEA9.95g 0.05g 0.5%
(試験条件)40℃、80%RH、H2 S流量15ppmの雰囲気下、96時間爆露

(試験結果) 薄膜コート 光出力の取り出し効率 低 下 率
(比較例2) 無し 初期値の83.8% 16.2%
実施例4(処理品4) 有り 初期値の98.1% 1.9%
実施例5(処理品5) 有り 初期値の97.7% 2.3%
実施例6(処理品6) 有り 初期値の98.9% 1.1%
実施例7(処理品7) 有り 初期値の99.0% 1.0%
処理品4〜7によればLED寿命が比較例の7〜16倍延びるものと推定される。
The surface-mounted LED device obtained through the above-described steps can achieve the same effects as the surface-mounted LED device of the second embodiment described above with reference to FIG. In addition, the predetermined resin used for the thin film coat of Examples 1-7 uses the silicone resin of Example 45 of the gazette shown in the embodiment. Further, as a result of conducting a sulfuration test with a sulfuration test apparatus on the processed products obtained by different examples of the thin film coat formation processing method, the same effects as in Examples 1 to 3 were obtained.
(Treatment method) Solvent Resin concentration Example 4 (Treatment product 1) Acetone 9.9 g 0.1 g 1%
Example 5 (treated product 2) Acetone 9.95 g 0.05 g 0.5%
Example 6 (treated product 3) PGMEA 9.9 g 0.1 g 1%
Example 7 (treated product 4) PGMEA 9.95 g 0.05 g 0.5%
(Test conditions) Explosion for 96 hours in an atmosphere of 40 ° C., 80% RH, H 2 S flow rate of 15 ppm

(Test result) Thin film coating Light output extraction efficiency Low rate (Comparative Example 2) None 83.8% of initial value 16.2%
Example 4 (treated product 4) Yes 98.1% of initial value 1.9%
Example 5 (Processed product 5) Yes 97.7% of initial value 2.3%
Example 6 (treated product 6) Yes 98.9% of initial value 1.1%
Example 7 (Processed product 7) Yes 99.0% of initial value 1.0%
According to the processed goods 4-7, it is estimated that LED lifetime extends 7 to 16 times of a comparative example.

本発明の発光装置およびその製造方法は、各種インジケータ、ディスプレイ、光プリンターの書き込み光源やバックライト用光源などに適用される。   The light emitting device and the manufacturing method thereof of the present invention are applied to various indicators, displays, writing light sources for optical printers, light sources for backlights, and the like.

本発明の発光装置の第1の実施形態に係る表面実装型のLED装置の構造の一例を模式的に示す断面図。Sectional drawing which shows typically an example of the structure of the surface-mount type LED device which concerns on 1st Embodiment of the light-emitting device of this invention. 本発明の発光装置の第2の実施形態に係る表面実装型のLED装置の構造の一例を模式的に示す断面図。Sectional drawing which shows typically an example of the structure of the surface mount type LED device which concerns on 2nd Embodiment of the light-emitting device of this invention. 本発明の発光装置の第3の実施形態に係る表面実装型のLED装置の構造の一例を模式的に示す断面図。Sectional drawing which shows typically an example of the structure of the surface mount type LED device which concerns on 3rd Embodiment of the light-emitting device of this invention. 本発明の発光装置の第4の実施形態に係る表面実装型のLED装置の構造の一例を模式的に示す断面図Sectional drawing which shows typically an example of the structure of the surface mount type LED device which concerns on 4th Embodiment of the light-emitting device of this invention.

符号の説明Explanation of symbols

1…パッケージ、11…樹脂製の支持体、13a…内部リード、13b…外部リード、14…銀メッキ、15…LEDチップ、15a…LEDチップの電極、16…薄膜コート、17…透光性樹脂、18…導電性ワイヤ。   DESCRIPTION OF SYMBOLS 1 ... Package, 11 ... Resin support body, 13a ... Internal lead, 13b ... External lead, 14 ... Silver plating, 15 ... LED chip, 15a ... Electrode of LED chip, 16 ... Thin film coat, 17 ... Translucent resin , 18 ... conductive wire.

Claims (20)

発光素子収納用の開口部を有する支持体の開口部内面に内部リードが露出し、当該内部リードに電気的に連なる外部リードが前記支持体の外部に引き出され、少なくとも前記内部リードの露出部に銀が使用されたパッケージと、
前記支持体の開口部内面において少なくとも前記内部リードの前記銀の表面を被覆するように形成された所定の物質からなる薄膜コートと、
前記支持体の開口部内に実装され、前記内部リードと電気的に接続された電極を有する発光素子と、
を具備することを特徴とする発光装置。
An internal lead is exposed on the inner surface of the opening of the support having an opening for accommodating the light emitting element, and an external lead electrically connected to the internal lead is drawn out of the support, and at least on the exposed portion of the internal lead A package using silver,
A thin film coat made of a predetermined substance formed so as to cover at least the silver surface of the internal lead on the inner surface of the opening of the support;
A light emitting device mounted in the opening of the support and having an electrode electrically connected to the internal lead;
A light-emitting device comprising:
前記発光装置は、さらに、少なくとも前記支持体の開口部内の前記発光素子を封止する透光性樹脂を有することを特徴とする請求項1に記載の発光装置。 The light emitting device according to claim 1, further comprising a translucent resin that seals at least the light emitting element in the opening of the support. 配線パターンが形成され、前記配線パターンの少なくとも一部は銀メッキが施された発光素子実装用の基板と、
前記銀メッキの表面を被覆するように形成された所定の物質からなる薄膜コートと、
前記基板に実装され、前記配線パターンと電気的に接続された電極を有する発光素子と、を具備することを特徴とする発光装置。
A wiring pattern is formed, and at least a part of the wiring pattern is a silver-plated substrate for mounting a light emitting element,
A thin film coat made of a predetermined material formed to cover the surface of the silver plating;
A light emitting device comprising: a light emitting element mounted on the substrate and having an electrode electrically connected to the wiring pattern.
前記発光装置は、さらに、少なくとも前記発光素子を封止する透光性樹脂を有することを特徴とする請求項3に記載の発光装置。 The light emitting device according to claim 3, further comprising a translucent resin that seals at least the light emitting element. 前記薄膜コートは、H2 S透過性が100×10-9(ml・cm/sec・cm2 ・cmHg)以下であることを特徴とする請求項1又は請求項3に記載の発光装置。 The light-emitting device according to claim 1, wherein the thin film coat has a H 2 S permeability of 100 × 10 −9 (ml · cm / sec · cm 2 · cmHg) or less. 前記薄膜コートは、SO2 透過性が150×10-9(ml・cm/sec・cm2 ・cmHg)以下であることを特徴とする請求項1又は請求項3に記載の発光装置。 The light-emitting device according to claim 1, wherein the thin film coat has an SO 2 permeability of 150 × 10 −9 (ml · cm / sec · cm 2 · cmHg) or less. 前記薄膜コートは、膜厚が50μm以下であることを特徴とする請求項1又は請求項3に記載の発光装置。 The light-emitting device according to claim 1, wherein the thin film coat has a film thickness of 50 μm or less. 前記所定の物質は、溶剤で希釈したエポキシ樹脂、オキセタン樹脂、ウレタン樹脂、アクリレート樹脂、ポリイミド樹脂、フッ素樹脂、シルセスキオキサン誘導体、変成シリコーン樹脂、アクリル樹脂、ポリカーボネート樹脂、又はポリノルボルネン樹脂のうち少なくとも1種の溶液が用いられ、前記溶剤を揮発させることによって形成されたことを特徴とする請求項1又は請求項3に記載の発光装置。 The predetermined substance is an epoxy resin diluted with a solvent, an oxetane resin, a urethane resin, an acrylate resin, a polyimide resin, a fluorine resin, a silsesquioxane derivative, a modified silicone resin, an acrylic resin, a polycarbonate resin, or a polynorbornene resin. The light emitting device according to claim 1 or 3, wherein at least one solution is used and the solvent is volatilized. 前記透光性樹脂は、シリコーン樹脂である請求項2又は請求項4に記載の発光装置。 The light-emitting device according to claim 2, wherein the translucent resin is a silicone resin. 前記透光性樹脂は、波長変換物質および/または無機フィラーが含有されていることを特徴とする請求項2又は請求項4に記載の発光装置。 The light-emitting device according to claim 2, wherein the translucent resin contains a wavelength conversion substance and / or an inorganic filler. 発光素子と、前記発光素子が実装されたパッケージと、を有する発光装置の製造方法であって、
発光素子収納用の開口部を有する支持体の開口部内面に内部リードが露出し、当該内部リードに電気的に連なる外部リードが前記支持体の外部に引き出され、少なくとも前記内部リードの露出部分に銀が使用されたパッケージを用いて、前記支持体の開口部内に発光素子を固着し、前記発光素子の電極を前記内部リードに電気的に接続する工程と、
前記支持体の開口部内において少なくとも前記内部リードの銀の表面を被覆するように溶剤で希釈した所定の物質の溶液を注入した後に前記溶剤を揮発させて薄膜コートを形成する工程と、
を具備することを特徴とする発光装置の製造方法。
A method of manufacturing a light emitting device having a light emitting element and a package on which the light emitting element is mounted,
An internal lead is exposed on the inner surface of the opening of the support having an opening for accommodating the light emitting element, and an external lead electrically connected to the internal lead is drawn out of the support, and at least on an exposed portion of the internal lead. Using a package in which silver is used, fixing a light emitting element in the opening of the support, and electrically connecting an electrode of the light emitting element to the internal lead;
Forming a thin film coat by volatilizing the solvent after injecting a solution of a predetermined substance diluted with a solvent so as to cover at least the silver surface of the internal lead in the opening of the support;
A method of manufacturing a light emitting device, comprising:
前記所定の物質は、エポキシ樹脂、オキセタン樹脂、ウレタン樹脂、アクリレート樹脂、ポリイミド樹脂、フッ素樹脂、シルセスキオキサン誘導体、変成シリコーン樹脂、アクリル樹脂、ポリカーボネート樹脂、又はポリノルボルネン樹脂のうち少なくとも1種であることを特徴とする請求項11に記載の発光装置の製造方法。 The predetermined substance is at least one of epoxy resin, oxetane resin, urethane resin, acrylate resin, polyimide resin, fluorine resin, silsesquioxane derivative, modified silicone resin, acrylic resin, polycarbonate resin, or polynorbornene resin. The method for manufacturing a light emitting device according to claim 11, wherein: 前記薄膜コートを形成した後、さらに、前記発光素子を覆うように液状の透光性樹脂を注入して硬化させる工程を有することを特徴とする請求項11に記載の発光装置の製造方法。 The method of manufacturing a light emitting device according to claim 11, further comprising a step of injecting and curing a liquid translucent resin so as to cover the light emitting element after forming the thin film coat. 前記透光性樹脂は、シリコーン樹脂であることを特徴とする請求項13に記載の発光装置の製造方法。 The method of manufacturing a light emitting device according to claim 13, wherein the translucent resin is a silicone resin. 発光素子と、前記発光素子が実装された基板と、を有する発光装置の製造方法であって、
配線パターンが形成され、前記配線パターンの少なくとも一部は銀メッキが施された基板に発光素子を固着し、前記発光素子の電極を前記配線パターンに電気的に接続する工程と、
溶剤で希釈した所定の物質の溶液を少なくとも前記配線パターンの銀メッキの表面を被覆するように付着させた後に前記溶剤を揮発させて薄膜コートを形成する工程と、
を具備することを特徴とする発光装置の製造方法。
A method of manufacturing a light emitting device having a light emitting element and a substrate on which the light emitting element is mounted,
Forming a wiring pattern, fixing a light emitting element to a silver plated substrate at least a part of the wiring pattern, and electrically connecting an electrode of the light emitting element to the wiring pattern;
Forming a thin film coat by volatilizing the solvent after attaching a solution of a predetermined substance diluted with a solvent so as to cover at least the surface of the silver plating of the wiring pattern;
A method of manufacturing a light emitting device, comprising:
前記所定の物質の溶液を付着する手段は、スプレー噴霧手段、インクジェット塗布手段、カーテン塗工手段、滴下手段、前記基板を前記所定の物質の溶液中に浸漬する手段のいずれかであることを特徴とする請求項15に記載の発光装置の製造方法。 The means for adhering the solution of the predetermined substance is any one of spray spraying means, ink jet coating means, curtain coating means, dripping means, and means for immersing the substrate in the solution of the predetermined substance. A method for manufacturing a light emitting device according to claim 15. 前記薄膜コートを形成した後、さらに、前記発光素子を覆うように透光性樹脂で封止する工程を有することを特徴とする請求項15に記載の発光装置の製造方法。 16. The method for manufacturing a light-emitting device according to claim 15, further comprising a step of sealing with a light-transmitting resin so as to cover the light-emitting element after forming the thin film coat. 前記透光性樹脂は、シリコーン樹脂であることを特徴とする請求項17に記載の発光装置の製造方法。 The method of manufacturing a light emitting device according to claim 17, wherein the translucent resin is a silicone resin. 発光素子収納用の開口部を有する支持体の開口部内面に内部リードが露出し、当該内部リードに電気的に連なる外部リードが前記支持体の外部に引き出され、少なくとも前記内部リードの露出部に銀が使用されたパッケージであって、
前記支持体の開口部内面において、前記発光素子との接続部分を除き、前記内部リードの前記銀の表面を被覆するように形成された所定の物質からなる薄膜コートが形成されていることを特徴とするパッケージ。
An internal lead is exposed on the inner surface of the opening of the support having an opening for accommodating the light emitting element, and an external lead electrically connected to the internal lead is drawn out of the support, and at least on the exposed portion of the internal lead A package using silver,
A thin film coat made of a predetermined substance formed so as to cover the surface of the silver of the internal lead is formed on the inner surface of the opening of the support, except for a connection portion with the light emitting element. And package.
配線パターンが形成され、前記配線パターンの少なくとも一部は銀メッキが施された発光素子実装用の基板であって、
発光素子との接続部分を除き、前記銀メッキの表面を被覆するように形成された所定の物質からなる薄膜コートが形成されていることを特徴とする発光素子実装用の基板。
A wiring pattern is formed, and at least a part of the wiring pattern is a substrate for mounting a light emitting element on which silver plating is applied,
A substrate for mounting a light-emitting element, wherein a thin film coat made of a predetermined material is formed so as to cover the surface of the silver plating except for a connection portion with the light-emitting element.
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Cited By (39)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009170825A (en) * 2008-01-19 2009-07-30 Nichia Corp Light emitting device and manufacturing method thereof
JP2009206124A (en) * 2008-02-26 2009-09-10 Shin Etsu Chem Co Ltd Sealing method of led device, and led device
JP2009260053A (en) * 2008-04-17 2009-11-05 Nichia Corp Light emitting device
WO2009157288A1 (en) * 2008-06-25 2009-12-30 シャープ株式会社 Light-emitting device and method for producing same
WO2010038451A1 (en) * 2008-09-30 2010-04-08 パナソニック株式会社 Package for optical semiconductor device, optical semiconductor device using the package, and methods for producing same
JP2010153632A (en) * 2008-12-25 2010-07-08 Panasonic Corp Lead, wiring member, package component, metal component having resin, resin-sealed semiconductor device, and method of manufacturing them
JP2010232203A (en) * 2009-03-25 2010-10-14 Toyoda Gosei Co Ltd Light emission device and method of manufacturing the same
JP2011096842A (en) * 2009-10-29 2011-05-12 Showa Denko Kk Light emitting device, light emitting module, and lighting system
JP2011165852A (en) * 2010-02-09 2011-08-25 Nichia Corp Manufacturing method of light-emitting device
EP2365549A1 (en) * 2010-03-12 2011-09-14 Asahi Glass Company, Limited Light-emitting device
JP2012043847A (en) * 2010-08-13 2012-03-01 Citizen Holdings Co Ltd Semiconductor light-emitting device and manufacturing method thereof
JP2012069539A (en) * 2010-08-25 2012-04-05 Nichia Chem Ind Ltd Manufacturing method of light-emitting device
JP2012094587A (en) * 2010-10-25 2012-05-17 Hitachi Chem Co Ltd Method for manufacturing optical semiconductor device and optical semiconductor device
US8319242B2 (en) 2010-07-08 2012-11-27 Shin-Etsu Chemical Co., Ltd. Light-emitting semiconductor device, mounted substrate, and fabrication method thereof
US8373187B2 (en) 2009-06-19 2013-02-12 Stanley Electric Co., Ltd. Semiconductor light emitting device
JP2013143559A (en) * 2012-01-13 2013-07-22 Nichia Chem Ind Ltd Light emitting device and lighting device
JP2013145852A (en) * 2012-01-16 2013-07-25 Fuji Mach Mfg Co Ltd Semiconductor package and manufacturing method of the same
JP2013214760A (en) * 2013-06-05 2013-10-17 Sharp Corp Light-emitting device and process of manufacturing the same
JP2013225576A (en) * 2012-04-20 2013-10-31 Dainippon Printing Co Ltd Optical semiconductor device
WO2013183706A1 (en) * 2012-06-06 2013-12-12 日立化成株式会社 Optical semiconductor device
WO2013183705A1 (en) * 2012-06-06 2013-12-12 日立化成株式会社 Optical semiconductor device production method and optical semiconductor device
JP2013254825A (en) * 2012-06-06 2013-12-19 Hitachi Chemical Co Ltd Optical semiconductor device, method for manufacturing the same, base substance to be used for manufacturing the same and reflector molding
JP2014022651A (en) * 2012-07-20 2014-02-03 Hitachi Chemical Co Ltd Optical semiconductor device, manufacturing method of the same, base substrate and reflector mold used for manufacturing the same
KR20140024383A (en) 2011-06-02 2014-02-28 가부시키가이샤 네오맥스 마테리아르 Substrate for light emitting elements, material for substrates, and light emitting module
JP2014078612A (en) * 2012-10-11 2014-05-01 Toyoda Gosei Co Ltd Semiconductor light-emitting element and light-emitting device
JP5486733B2 (en) * 2011-04-05 2014-05-07 三井金属鉱業株式会社 Light emitting device
WO2015018843A1 (en) * 2013-08-08 2015-02-12 Osram Opto Semiconductors Gmbh Optoelectronic component and method for the production thereof
EP2819191A4 (en) * 2012-02-20 2015-10-21 Sharp Kk Light emission device and illumination device
US9335006B2 (en) 2006-04-18 2016-05-10 Cree, Inc. Saturated yellow phosphor converted LED and blue converted red LED
US9379295B2 (en) 2009-01-19 2016-06-28 Rohm Co., Ltd. Method for manufacturing LED module, and LED module
CN106117553A (en) * 2016-05-03 2016-11-16 南昌大学 A kind of protective agent for improving the LED anti-curability of silver dollar part and preparation and application
KR20170010329A (en) 2009-07-15 2017-01-26 가부시키가이샤 간작크 Coating method
KR101904263B1 (en) * 2011-11-07 2018-10-04 엘지이노텍 주식회사 Light Emitting Device Package
JP2019050425A (en) * 2018-12-14 2019-03-28 日亜化学工業株式会社 Light-emitting device
JP2019201232A (en) * 2019-08-30 2019-11-21 日亜化学工業株式会社 Light-emitting device
JP2019201195A (en) * 2018-05-15 2019-11-21 東貝光電科技股▲ふん▼有限公司Unity Opto Technology Co.,Ltd. Led light source, led light source manufacturing method, and downlight type display device
US10490712B2 (en) 2011-07-21 2019-11-26 Cree, Inc. Light emitter device packages, components, and methods for improved chemical resistance and related methods
US10686107B2 (en) 2011-07-21 2020-06-16 Cree, Inc. Light emitter devices and components with improved chemical resistance and related methods
US11563156B2 (en) 2011-07-21 2023-01-24 Creeled, Inc. Light emitting devices and components having improved chemical resistance and related methods

Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01299894A (en) * 1988-05-30 1989-12-04 Bridgestone Corp Electroviscous liquid
JPH02298084A (en) * 1989-05-12 1990-12-10 Matsushita Electric Ind Co Ltd Sealing of light-emitting diode
JPH05175553A (en) * 1991-12-20 1993-07-13 Sanyo Electric Co Ltd Light emitting diode device
JPH09206592A (en) * 1996-02-06 1997-08-12 Miyoshi Oil & Fat Co Ltd Resin for adsorption of selenium and recovering method of selenium from solution containing selenium
JPH115062A (en) * 1997-04-23 1999-01-12 Nkk Corp Organic coated steel sheet excellent in corrosion resistance
JP2002094122A (en) * 2000-07-13 2002-03-29 Matsushita Electric Works Ltd Light source and its manufacturing method
JP2003270017A (en) * 2002-03-20 2003-09-25 Hitachi Ltd Sealing structure for thermal flowmeter
JP2004292779A (en) * 2002-04-26 2004-10-21 Kanegafuchi Chem Ind Co Ltd Curing composition, cured product, method for producing the same, and light-emitting diode sealed with the cured product
JP2006049533A (en) * 2004-08-04 2006-02-16 Wacker Asahikasei Silicone Co Ltd Resin sealing light emitting diode device and sealing method
JP2006060005A (en) * 2004-08-19 2006-03-02 Shin Etsu Chem Co Ltd Light emitting device and its manufacturing method
JP2006093738A (en) * 2003-04-24 2006-04-06 Nichia Chem Ind Ltd Semiconductor device and method of manufacturing the same
JP2007266349A (en) * 2006-03-29 2007-10-11 Matsushita Electric Ind Co Ltd Conductive member for semiconductor device, package for semiconductor device, and manufacturing method of them
JP2007266343A (en) * 2006-03-29 2007-10-11 Toyoda Gosei Co Ltd Light emitting device

Patent Citations (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01299894A (en) * 1988-05-30 1989-12-04 Bridgestone Corp Electroviscous liquid
JPH02298084A (en) * 1989-05-12 1990-12-10 Matsushita Electric Ind Co Ltd Sealing of light-emitting diode
JPH05175553A (en) * 1991-12-20 1993-07-13 Sanyo Electric Co Ltd Light emitting diode device
JPH09206592A (en) * 1996-02-06 1997-08-12 Miyoshi Oil & Fat Co Ltd Resin for adsorption of selenium and recovering method of selenium from solution containing selenium
JPH115062A (en) * 1997-04-23 1999-01-12 Nkk Corp Organic coated steel sheet excellent in corrosion resistance
JP2002094122A (en) * 2000-07-13 2002-03-29 Matsushita Electric Works Ltd Light source and its manufacturing method
JP2003270017A (en) * 2002-03-20 2003-09-25 Hitachi Ltd Sealing structure for thermal flowmeter
JP2004292779A (en) * 2002-04-26 2004-10-21 Kanegafuchi Chem Ind Co Ltd Curing composition, cured product, method for producing the same, and light-emitting diode sealed with the cured product
JP2006093738A (en) * 2003-04-24 2006-04-06 Nichia Chem Ind Ltd Semiconductor device and method of manufacturing the same
JP2006049533A (en) * 2004-08-04 2006-02-16 Wacker Asahikasei Silicone Co Ltd Resin sealing light emitting diode device and sealing method
JP2006060005A (en) * 2004-08-19 2006-03-02 Shin Etsu Chem Co Ltd Light emitting device and its manufacturing method
JP2007266349A (en) * 2006-03-29 2007-10-11 Matsushita Electric Ind Co Ltd Conductive member for semiconductor device, package for semiconductor device, and manufacturing method of them
JP2007266343A (en) * 2006-03-29 2007-10-11 Toyoda Gosei Co Ltd Light emitting device

Cited By (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9335006B2 (en) 2006-04-18 2016-05-10 Cree, Inc. Saturated yellow phosphor converted LED and blue converted red LED
JP2009170825A (en) * 2008-01-19 2009-07-30 Nichia Corp Light emitting device and manufacturing method thereof
JP2009206124A (en) * 2008-02-26 2009-09-10 Shin Etsu Chem Co Ltd Sealing method of led device, and led device
JP2009260053A (en) * 2008-04-17 2009-11-05 Nichia Corp Light emitting device
US9520542B2 (en) 2008-06-25 2016-12-13 Sharp Kabushiki Kaisha Light emitting device and method for producing same
WO2009157288A1 (en) * 2008-06-25 2009-12-30 シャープ株式会社 Light-emitting device and method for producing same
JP2010010279A (en) * 2008-06-25 2010-01-14 Sharp Corp Light-emitting device and manufacturing method therefor
US9276179B2 (en) 2008-06-25 2016-03-01 Sharp Kabushiki Kaisha Light emitting device and method for producing same
WO2010038451A1 (en) * 2008-09-30 2010-04-08 パナソニック株式会社 Package for optical semiconductor device, optical semiconductor device using the package, and methods for producing same
US8981401B2 (en) 2008-09-30 2015-03-17 Panasonic Intellectual Property Management Co., Ltd. Package for optical semiconductor device, optical semiconductor device using the package, and methods for producing same
JP5307824B2 (en) * 2008-09-30 2013-10-02 パナソニック株式会社 Package for optical semiconductor device, optical semiconductor device using the same, and manufacturing method thereof
JP2010153632A (en) * 2008-12-25 2010-07-08 Panasonic Corp Lead, wiring member, package component, metal component having resin, resin-sealed semiconductor device, and method of manufacturing them
US9379295B2 (en) 2009-01-19 2016-06-28 Rohm Co., Ltd. Method for manufacturing LED module, and LED module
JP2010232203A (en) * 2009-03-25 2010-10-14 Toyoda Gosei Co Ltd Light emission device and method of manufacturing the same
US8373187B2 (en) 2009-06-19 2013-02-12 Stanley Electric Co., Ltd. Semiconductor light emitting device
KR20170010329A (en) 2009-07-15 2017-01-26 가부시키가이샤 간작크 Coating method
JP2011096842A (en) * 2009-10-29 2011-05-12 Showa Denko Kk Light emitting device, light emitting module, and lighting system
JP2011165852A (en) * 2010-02-09 2011-08-25 Nichia Corp Manufacturing method of light-emitting device
US8319240B2 (en) 2010-03-12 2012-11-27 Asahi Glass Company, Limited Light-emitting device
EP2365549A1 (en) * 2010-03-12 2011-09-14 Asahi Glass Company, Limited Light-emitting device
US8319242B2 (en) 2010-07-08 2012-11-27 Shin-Etsu Chemical Co., Ltd. Light-emitting semiconductor device, mounted substrate, and fabrication method thereof
JP2012043847A (en) * 2010-08-13 2012-03-01 Citizen Holdings Co Ltd Semiconductor light-emitting device and manufacturing method thereof
JP2012069539A (en) * 2010-08-25 2012-04-05 Nichia Chem Ind Ltd Manufacturing method of light-emitting device
US9306127B2 (en) 2010-08-25 2016-04-05 Nichia Corporation Light emitting device that includes protective film having uniform thickness
US9087966B2 (en) 2010-08-25 2015-07-21 Nichia Corporation Light emitting device that includes reflective film surface covered with protective film having uniform thickness
JP2012094587A (en) * 2010-10-25 2012-05-17 Hitachi Chem Co Ltd Method for manufacturing optical semiconductor device and optical semiconductor device
JP2014096602A (en) * 2011-04-05 2014-05-22 Mitsui Mining & Smelting Co Ltd Light-emitting device
JP5486733B2 (en) * 2011-04-05 2014-05-07 三井金属鉱業株式会社 Light emitting device
US9166119B2 (en) 2011-04-05 2015-10-20 Mitsui Mining & Smelting Co., Ltd. Light-emitting device
KR20140024383A (en) 2011-06-02 2014-02-28 가부시키가이샤 네오맥스 마테리아르 Substrate for light emitting elements, material for substrates, and light emitting module
US11563156B2 (en) 2011-07-21 2023-01-24 Creeled, Inc. Light emitting devices and components having improved chemical resistance and related methods
US10686107B2 (en) 2011-07-21 2020-06-16 Cree, Inc. Light emitter devices and components with improved chemical resistance and related methods
US10490712B2 (en) 2011-07-21 2019-11-26 Cree, Inc. Light emitter device packages, components, and methods for improved chemical resistance and related methods
KR101904263B1 (en) * 2011-11-07 2018-10-04 엘지이노텍 주식회사 Light Emitting Device Package
JP2013143559A (en) * 2012-01-13 2013-07-22 Nichia Chem Ind Ltd Light emitting device and lighting device
JP2013145852A (en) * 2012-01-16 2013-07-25 Fuji Mach Mfg Co Ltd Semiconductor package and manufacturing method of the same
EP2819191A4 (en) * 2012-02-20 2015-10-21 Sharp Kk Light emission device and illumination device
US9577153B2 (en) 2012-02-20 2017-02-21 Sharp Kabushiki Kaisha Light emission device and illumination device
JP2013225576A (en) * 2012-04-20 2013-10-31 Dainippon Printing Co Ltd Optical semiconductor device
US9634210B2 (en) 2012-06-06 2017-04-25 Hitachi Chemical Company, Ltd Optical semiconductor device production method and optical semiconductor device
JPWO2013183705A1 (en) * 2012-06-06 2016-02-01 日立化成株式会社 Optical semiconductor device manufacturing method and optical semiconductor device
JP2013254825A (en) * 2012-06-06 2013-12-19 Hitachi Chemical Co Ltd Optical semiconductor device, method for manufacturing the same, base substance to be used for manufacturing the same and reflector molding
WO2013183706A1 (en) * 2012-06-06 2013-12-12 日立化成株式会社 Optical semiconductor device
US9525114B2 (en) 2012-06-06 2016-12-20 Hitachi Chemical Company, Ltd. Optical semiconductor device
WO2013183705A1 (en) * 2012-06-06 2013-12-12 日立化成株式会社 Optical semiconductor device production method and optical semiconductor device
JPWO2013183706A1 (en) * 2012-06-06 2016-02-01 日立化成株式会社 Optical semiconductor device
JP2014022651A (en) * 2012-07-20 2014-02-03 Hitachi Chemical Co Ltd Optical semiconductor device, manufacturing method of the same, base substrate and reflector mold used for manufacturing the same
JP2014078612A (en) * 2012-10-11 2014-05-01 Toyoda Gosei Co Ltd Semiconductor light-emitting element and light-emitting device
US9496459B2 (en) 2012-10-11 2016-11-15 Toyoda Gosei Co., Ltd. Semiconductor light emitting element and light emitting device
JP2013214760A (en) * 2013-06-05 2013-10-17 Sharp Corp Light-emitting device and process of manufacturing the same
US9564566B2 (en) 2013-08-08 2017-02-07 Osram Opto Semiconductors Gmbh Optoelectronic component and method for the production thereof
WO2015018843A1 (en) * 2013-08-08 2015-02-12 Osram Opto Semiconductors Gmbh Optoelectronic component and method for the production thereof
CN106117553A (en) * 2016-05-03 2016-11-16 南昌大学 A kind of protective agent for improving the LED anti-curability of silver dollar part and preparation and application
JP2019201195A (en) * 2018-05-15 2019-11-21 東貝光電科技股▲ふん▼有限公司Unity Opto Technology Co.,Ltd. Led light source, led light source manufacturing method, and downlight type display device
JP2019050425A (en) * 2018-12-14 2019-03-28 日亜化学工業株式会社 Light-emitting device
JP2019201232A (en) * 2019-08-30 2019-11-21 日亜化学工業株式会社 Light-emitting device
JP7057512B2 (en) 2019-08-30 2022-04-20 日亜化学工業株式会社 Light emitting device

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