JP2008004602A5 - - Google Patents

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Publication number
JP2008004602A5
JP2008004602A5 JP2006169981A JP2006169981A JP2008004602A5 JP 2008004602 A5 JP2008004602 A5 JP 2008004602A5 JP 2006169981 A JP2006169981 A JP 2006169981A JP 2006169981 A JP2006169981 A JP 2006169981A JP 2008004602 A5 JP2008004602 A5 JP 2008004602A5
Authority
JP
Japan
Prior art keywords
metal surface
treatment liquid
wiring board
manufacturing
flip chip
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2006169981A
Other languages
English (en)
Japanese (ja)
Other versions
JP4839138B2 (ja
JP2008004602A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2006169981A priority Critical patent/JP4839138B2/ja
Priority claimed from JP2006169981A external-priority patent/JP4839138B2/ja
Priority to US11/760,291 priority patent/US7642130B2/en
Priority to TW096120959A priority patent/TW200802658A/zh
Priority to KR1020070059921A priority patent/KR20070120896A/ko
Publication of JP2008004602A publication Critical patent/JP2008004602A/ja
Publication of JP2008004602A5 publication Critical patent/JP2008004602A5/ja
Application granted granted Critical
Publication of JP4839138B2 publication Critical patent/JP4839138B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2006169981A 2006-06-20 2006-06-20 配線基板の製造方法 Expired - Fee Related JP4839138B2 (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006169981A JP4839138B2 (ja) 2006-06-20 2006-06-20 配線基板の製造方法
US11/760,291 US7642130B2 (en) 2006-06-20 2007-06-08 Manufacturing method of wiring substrate
TW096120959A TW200802658A (en) 2006-06-20 2007-06-11 Manufacturing method of wiring substrate
KR1020070059921A KR20070120896A (ko) 2006-06-20 2007-06-19 배선 기판의 제조 방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006169981A JP4839138B2 (ja) 2006-06-20 2006-06-20 配線基板の製造方法

Publications (3)

Publication Number Publication Date
JP2008004602A JP2008004602A (ja) 2008-01-10
JP2008004602A5 true JP2008004602A5 (https=) 2009-04-30
JP4839138B2 JP4839138B2 (ja) 2011-12-21

Family

ID=38862088

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006169981A Expired - Fee Related JP4839138B2 (ja) 2006-06-20 2006-06-20 配線基板の製造方法

Country Status (4)

Country Link
US (1) US7642130B2 (https=)
JP (1) JP4839138B2 (https=)
KR (1) KR20070120896A (https=)
TW (1) TW200802658A (https=)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4576270B2 (ja) * 2005-03-29 2010-11-04 昭和電工株式会社 ハンダ回路基板の製造方法
WO2007007865A1 (en) * 2005-07-11 2007-01-18 Showa Denko K.K. Method for attachment of solder powder to electronic circuit board and solder-attached electronic circuit board
WO2007029866A1 (en) * 2005-09-09 2007-03-15 Showa Denko K.K. Method for attachment of solder powder to electronic circuit board and soldered electronic circuit board
JP2013004738A (ja) 2011-06-16 2013-01-07 Shinko Electric Ind Co Ltd 配線基板の製造方法
US8618647B2 (en) 2011-08-01 2013-12-31 Tessera, Inc. Packaged microelectronic elements having blind vias for heat dissipation
TWI557855B (zh) * 2011-12-30 2016-11-11 旭德科技股份有限公司 封裝載板及其製作方法
US10886250B2 (en) 2015-07-10 2021-01-05 Invensas Corporation Structures and methods for low temperature bonding using nanoparticles
TWI822659B (zh) 2016-10-27 2023-11-21 美商艾德亞半導體科技有限責任公司 用於低溫接合的結構和方法
CN116848631A (zh) 2020-12-30 2023-10-03 美商艾德亚半导体接合科技有限公司 具有导电特征的结构及其形成方法

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2681738B2 (ja) * 1993-05-12 1997-11-26 昭和電工株式会社 連続的はんだ回路形成法
JP3536954B2 (ja) * 1995-04-14 2004-06-14 富士写真フイルム株式会社 ハロゲン化銀乳剤
US5736074A (en) * 1995-06-30 1998-04-07 Micro Fab Technologies, Inc. Manufacture of coated spheres
TW453137B (en) * 1997-08-25 2001-09-01 Showa Denko Kk Electrode structure of silicon semiconductor device and the manufacturing method of silicon device using it
JP3678048B2 (ja) * 1999-04-05 2005-08-03 松下電器産業株式会社 半田プリコート方法および半田プリコート基板
AU2003256837A1 (en) * 2002-07-26 2004-02-16 Muna Ahmed Abu-Dalo Removing metals from solution using metal binding compounds and sorbents therefor
JP4006409B2 (ja) 2004-03-17 2007-11-14 新光電気工業株式会社 配線基板の製造方法
JP4421367B2 (ja) * 2004-04-23 2010-02-24 日本高純度化学株式会社 置換型無電解金めっき液

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