JP2007529881A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2007529881A5 JP2007529881A5 JP2006552572A JP2006552572A JP2007529881A5 JP 2007529881 A5 JP2007529881 A5 JP 2007529881A5 JP 2006552572 A JP2006552572 A JP 2006552572A JP 2006552572 A JP2006552572 A JP 2006552572A JP 2007529881 A5 JP2007529881 A5 JP 2007529881A5
- Authority
- JP
- Japan
- Prior art keywords
- immersion
- exposure
- photoresist layer
- immersion medium
- immersion lithography
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 238000007654 immersion Methods 0.000 claims 9
- 238000000034 method Methods 0.000 claims 9
- 238000000671 immersion lithography Methods 0.000 claims 8
- 229920002120 photoresistant polymer Polymers 0.000 claims 8
- 239000000463 material Substances 0.000 claims 3
- 239000013067 intermediate product Substances 0.000 claims 2
- 230000003287 optical effect Effects 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical group [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 claims 2
- 230000001419 dependent effect Effects 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP04290429A EP1564592A1 (en) | 2004-02-17 | 2004-02-17 | Protection of resist for immersion lithography technique |
| PCT/EP2005/001511 WO2005078525A2 (en) | 2004-02-17 | 2005-02-15 | Immersion lithography technique and product using a protection layer covering the resist |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2007529881A JP2007529881A (ja) | 2007-10-25 |
| JP2007529881A5 true JP2007529881A5 (https=) | 2008-04-03 |
Family
ID=34684792
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006552572A Withdrawn JP2007529881A (ja) | 2004-02-17 | 2005-02-15 | 浸漬リソグラフィー技法及び製品 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US20080171285A1 (https=) |
| EP (2) | EP1564592A1 (https=) |
| JP (1) | JP2007529881A (https=) |
| KR (1) | KR20060133976A (https=) |
| CN (1) | CN101558357A (https=) |
| TW (1) | TW200538881A (https=) |
| WO (1) | WO2005078525A2 (https=) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050161644A1 (en) | 2004-01-23 | 2005-07-28 | Peng Zhang | Immersion lithography fluids |
| TWI259319B (en) | 2004-01-23 | 2006-08-01 | Air Prod & Chem | Immersion lithography fluids |
| JP4551701B2 (ja) * | 2004-06-14 | 2010-09-29 | 富士フイルム株式会社 | 液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法 |
| WO2006009169A1 (ja) | 2004-07-21 | 2006-01-26 | Nikon Corporation | 露光方法及びデバイス製造方法 |
| JP4696558B2 (ja) * | 2005-01-07 | 2011-06-08 | Ｊｓｒ株式会社 | フォトレジストパターン形成方法、及びフォトレジストパターン形成用基板 |
| US20070084793A1 (en) * | 2005-10-18 | 2007-04-19 | Nigel Wenden | Method and apparatus for producing ultra-high purity water |
| JP2009117832A (ja) * | 2007-11-06 | 2009-05-28 | Asml Netherlands Bv | リソグラフィの基板を準備する方法、基板、デバイス製造方法、密封コーティングアプリケータ及び密封コーティング測定装置 |
| JP6400161B1 (ja) * | 2017-08-08 | 2018-10-03 | キヤノン株式会社 | 成膜方法、ドライフィルムの製造方法、および液体吐出ヘッドの製造方法 |
| PT117491B (pt) * | 2021-09-30 | 2024-03-12 | Univ De Coimbra | Copolímero cromogénico, seu método de obtenção, produtos que o incorporam e método de deteção de contrafação e autenticaçao de produtos |
| CN116263564A (zh) * | 2021-12-13 | 2023-06-16 | 长鑫存储技术有限公司 | 光刻胶图案的形成方法和光刻胶结构 |
| US12607935B2 (en) | 2021-12-13 | 2026-04-21 | Changxin Memory Technologies, Inc. | Method of forming photoresist pattern, and photoresist structure |
| CN115047728B (zh) * | 2022-07-01 | 2025-04-08 | 中国科学院光电技术研究所 | 等离子体共振腔透镜光刻的成像结构保护方法及其结构 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4346164A (en) * | 1980-10-06 | 1982-08-24 | Werner Tabarelli | Photolithographic method for the manufacture of integrated circuits |
| JPH06130657A (ja) * | 1991-08-20 | 1994-05-13 | Mitsubishi Rayon Co Ltd | ドライフィルムレジスト |
| JP3281053B2 (ja) * | 1991-12-09 | 2002-05-13 | 株式会社東芝 | パターン形成方法 |
| JP3158710B2 (ja) * | 1992-09-16 | 2001-04-23 | 日本ゼオン株式会社 | 化学増幅レジストパターンの形成方法 |
| US6727047B2 (en) * | 1999-04-16 | 2004-04-27 | Applied Materials, Inc. | Method of extending the stability of a photoresist during direct writing of an image upon the photoresist |
| US20010044077A1 (en) * | 1999-04-16 | 2001-11-22 | Zoilo Chen Ho Tan | Stabilization of chemically amplified resist coating |
| US6788477B2 (en) * | 2002-10-22 | 2004-09-07 | Taiwan Semiconductor Manufacturing Co., Ltd. | Apparatus for method for immersion lithography |
| US7432042B2 (en) * | 2003-12-03 | 2008-10-07 | United Microelectronics Corp. | Immersion lithography process and mask layer structure applied in the same |
| US20060008746A1 (en) * | 2004-07-07 | 2006-01-12 | Yasunobu Onishi | Method for manufacturing semiconductor device |
-
2004
- 2004-02-17 EP EP04290429A patent/EP1564592A1/en not_active Withdrawn
-
2005
- 2005-02-15 CN CNA2005800013797A patent/CN101558357A/zh active Pending
- 2005-02-15 US US10/595,762 patent/US20080171285A1/en not_active Abandoned
- 2005-02-15 JP JP2006552572A patent/JP2007529881A/ja not_active Withdrawn
- 2005-02-15 EP EP05707399A patent/EP1716453A2/en not_active Withdrawn
- 2005-02-15 KR KR1020067009317A patent/KR20060133976A/ko not_active Withdrawn
- 2005-02-15 WO PCT/EP2005/001511 patent/WO2005078525A2/en not_active Ceased
- 2005-02-17 TW TW094104674A patent/TW200538881A/zh unknown
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| TWI236579B (en) | Method and system for immersion lithography | |
| JP2007529881A5 (https=) | ||
| TW200520053A (en) | Immersion lithographic process using a conforming immersion medium | |
| CN100555083C (zh) | 用于浸入式光刻的可除去薄膜 | |
| JP2008310314A5 (https=) | ||
| US20140186773A1 (en) | Coating material and method for photolithography | |
| JP2006520104A5 (https=) | ||
| EP1939691A3 (en) | Pattern forming method, resist composition for multiple development used in the pattern forming method, developer for negative development used in the pattern forming method, and rinsing solution for negative development used in the pattern forming method | |
| TW200606179A (en) | Material for forming resist protection film for liquid immersion lithography and method for forming resist pattern by using the protection film | |
| JP2005250487A5 (https=) | ||
| JP2008309878A5 (https=) | ||
| EP2498133A3 (en) | Resin pattern, method for producing the pattern, method for producing MEMS structure, method for manufacturing semiconductor device, and method for producing plated pattern | |
| TWI266373B (en) | Pattern forming method and method of manufacturing semiconductor device | |
| CN102141728B (zh) | 立体图纹形成方法 | |
| WO2006023037A3 (en) | Photopolymerizable silicone materials forming semipermeable membranes for sensor applications | |
| TW201044115A (en) | Method and system for forming a pattern in a semiconductor device, and semiconductor device | |
| JP2006270057A5 (https=) | ||
| TW200619866A (en) | Aligner, exposing method, and device manufacturing method | |
| EP2610673A3 (en) | Method for manufacturing lithographic printing plates | |
| TW200625445A (en) | Substrate processing method | |
| JP2008102348A5 (https=) | ||
| JP2005136289A5 (https=) | ||
| TW200628952A (en) | Method for manufacturing array board for display device | |
| JP2006085157A5 (https=) | ||
| WO2005078525A3 (en) | Immersion lithography technique and product using a protection layer covering the resist |