JP2007523482A - 半導体チップの積層を備えた半導体素子、および、その製造方法 - Google Patents
半導体チップの積層を備えた半導体素子、および、その製造方法 Download PDFInfo
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Abstract
Description
Claims (16)
- 半導体チップ(1,2)の積層(100)を備えた半導体素子であって、
半導体チップ積層(100)における半導体チップ(1,2)が、重なり合って密着して固定、配置されており、
半導体チップ(1,2)は、該半導体チップのエッジまで広がるコンタクト面(5)と、半導体チップ側面(10)の少なくとも1つの上部エッジ(8)から下部エッジ(9)まで延びる導体部分(7)とを有し、
上記導体部分は、半導体チップ積層(100)における半導体チップ(1,2)の上記コンタクト面(5)と電気的に接続している、半導体素子。 - 請求項1に記載の半導体素子であって、
上記半導体チップ(1,2)は、異なる大きさになっている、半導体素子。 - 請求項1または2に記載の半導体素子であって、
上記半導体チップ(1,2)では、そのエッジ(6)で、コンタクト面(5)の数が異なっている、半導体素子。 - 請求項1〜3の何れか1項に記載の半導体素子であって、
導電性の上記導体部分(7)は、自由に選択された積層順で、半導体チップのエッジ(6)、半導体側面(10)、半導体上面(11)、及び/または半導体裏面(12)に接着して配置されている、半導体素子。 - 請求項1〜4の何れか1項に記載の半導体素子であって、
上記導体部分(7)は、金属ナノ粒子が充填され、かつ導電性を有する接着性プラスチックレジストを含んでいる、半導体素子。 - 請求項5に記載の半導体素子であって、
ナノ粒子が充填された上記プラスチックレジストは、溶媒に溶解可能になっている、半導体素子。 - 請求項5また6に記載の半導体素子であって、
ナノ粒子が充填された上記プラスチックレジストは、レーザ除去により、パターニング可能になっている、半導体素子。 - 請求項5〜7の何れか1項に記載の半導体素子であって、
ナノ粒子が充填された上記プラスチックレジストは、フォトリソグラフィにより、パターニング可能になっている、半導体素子。 - 請求項1〜8の何れか1項に記載の半導体素子であって、
上記半導体チップ積層(100)は、多層型再配線層を備え、該多層型再配線層では、ナノ粒子が充填され、かつ導電性を有するプラスチックレジストがパターンニングされており、
半導体チップ(1,2)の側面(6)間に、絶縁層(16,17)が配されている、半導体素子。 - 半導体チップ(1,2)の積層(100)を備えた半導体素子の製造方法であって、
上記方法は、
コンタクト面(6)が半導体チップ(1,2)のエッジ(6)まで広がった半導体チップ(1,2)を製造する工程と、
重なり合うように、半導体チップ(1,2)を密着固定し、半導体積層(100)を形成する工程と、
ナノ粒子が充填されたプラスチックレジストからなる層(15)で、半導体積層(100)を封入する工程と、
上記の層(15)をパターンニングし、重なり合って積層された半導体チップ(1,2)のコンタクト面(15)間に、配線部(7)を形成する工程と、を備えた、方法。 - 請求項10に記載の方法であって、
半導体積層(100)を封入するための、プラスチックレジストからなる層(15)は、噴霧される、方法。 - 請求項10または11に記載の方法であって、
プラスチックレジストからなる層(15)で封入するために、半導体積層(100)を、ナノ粒子が充填されたプラスチックレジストの槽中に浸す、方法。 - 請求項10〜12の何れか1項に記載の方法であって、
ナノ粒子が充填されたプラスチックレジストをパターンニングし、配線部(7)を形成するために、レーザ除去法を用いる、方法。 - 請求項10〜12の何れか1項に記載の方法であって、
プラスチックレジストからなるナノ粒子充填層(15)をパターンニングし、配線部(7)を形成するために、フォトリソグラフィ法を行う、方法。 - 請求項10〜12の何れか1項に記載の方法であって、
精密注入技術により、半導体積層(100)選択的に、配線部(7)を形成する、方法。 - 請求項10〜15の何れか1項に記載の方法であって、
半導体積層(100)に、絶縁層(16,17)に代えて多層配線部(7)を形成する、方法。
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DE102004008135A DE102004008135A1 (de) | 2004-02-18 | 2004-02-18 | Halbleiterbauteil mit einem Stapel aus Halbleiterchips und Verfahren zur Herstellung desselben |
PCT/DE2005/000215 WO2005081315A2 (de) | 2004-02-18 | 2005-02-09 | Halbleiterbauteil mit einem stapel aus halbleiterchips und verfahren zur herstellung desselben |
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JP2009124056A (ja) * | 2007-11-19 | 2009-06-04 | Panasonic Corp | 半導体チップ及び半導体チップ積層モジュールならびにそれらの製造方法 |
JP2012511835A (ja) * | 2008-12-09 | 2012-05-24 | ヴァーティカル・サーキツツ・インコーポレーテッド | 電気伝導材料のエアゾール・アプリケーションによって形成される半導体ダイ相互接続 |
KR101187214B1 (ko) | 2009-03-13 | 2012-10-02 | 테세라, 인코포레이티드 | 본드 패드를 통과하여 연장된 비아를 갖는 마이크로전자 소자를 포함하는 적층형 마이크로전자 어셈블리 |
US8551815B2 (en) | 2007-08-03 | 2013-10-08 | Tessera, Inc. | Stack packages using reconstituted wafers |
US8680662B2 (en) | 2008-06-16 | 2014-03-25 | Tessera, Inc. | Wafer level edge stacking |
US8884403B2 (en) | 2008-06-19 | 2014-11-11 | Iinvensas Corporation | Semiconductor die array structure |
US8912661B2 (en) | 2009-11-04 | 2014-12-16 | Invensas Corporation | Stacked die assembly having reduced stress electrical interconnects |
US8999810B2 (en) | 2006-10-10 | 2015-04-07 | Tessera, Inc. | Method of making a stacked microelectronic package |
US9048234B2 (en) | 2006-10-10 | 2015-06-02 | Tessera, Inc. | Off-chip vias in stacked chips |
US9147583B2 (en) | 2009-10-27 | 2015-09-29 | Invensas Corporation | Selective die electrical insulation by additive process |
US9153517B2 (en) | 2008-05-20 | 2015-10-06 | Invensas Corporation | Electrical connector between die pad and z-interconnect for stacked die assemblies |
US9252116B2 (en) | 2007-09-10 | 2016-02-02 | Invensas Corporation | Semiconductor die mount by conformal die coating |
US9305862B2 (en) | 2008-03-12 | 2016-04-05 | Invensas Corporation | Support mounted electrically interconnected die assembly |
US9490195B1 (en) | 2015-07-17 | 2016-11-08 | Invensas Corporation | Wafer-level flipped die stacks with leadframes or metal foil interconnects |
US9508691B1 (en) | 2015-12-16 | 2016-11-29 | Invensas Corporation | Flipped die stacks with multiple rows of leadframe interconnects |
US9595511B1 (en) | 2016-05-12 | 2017-03-14 | Invensas Corporation | Microelectronic packages and assemblies with improved flyby signaling operation |
US9728524B1 (en) | 2016-06-30 | 2017-08-08 | Invensas Corporation | Enhanced density assembly having microelectronic packages mounted at substantial angle to board |
US9825002B2 (en) | 2015-07-17 | 2017-11-21 | Invensas Corporation | Flipped die stack |
US9871019B2 (en) | 2015-07-17 | 2018-01-16 | Invensas Corporation | Flipped die stack assemblies with leadframe interconnects |
US10566310B2 (en) | 2016-04-11 | 2020-02-18 | Invensas Corporation | Microelectronic packages having stacked die and wire bond interconnects |
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US9508691B1 (en) | 2015-12-16 | 2016-11-29 | Invensas Corporation | Flipped die stacks with multiple rows of leadframe interconnects |
US9859257B2 (en) | 2015-12-16 | 2018-01-02 | Invensas Corporation | Flipped die stacks with multiple rows of leadframe interconnects |
US10566310B2 (en) | 2016-04-11 | 2020-02-18 | Invensas Corporation | Microelectronic packages having stacked die and wire bond interconnects |
US9595511B1 (en) | 2016-05-12 | 2017-03-14 | Invensas Corporation | Microelectronic packages and assemblies with improved flyby signaling operation |
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Also Published As
Publication number | Publication date |
---|---|
EP1716595A2 (de) | 2006-11-02 |
US8354299B2 (en) | 2013-01-15 |
WO2005081315A3 (de) | 2005-12-15 |
EP1716595B1 (de) | 2008-09-10 |
DE102004008135A1 (de) | 2005-09-22 |
JP4511561B2 (ja) | 2010-07-28 |
US20130105992A1 (en) | 2013-05-02 |
WO2005081315A2 (de) | 2005-09-01 |
US20100207277A1 (en) | 2010-08-19 |
DE502005005325D1 (de) | 2008-10-23 |
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