JP2007518267A5 - - Google Patents

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Publication number
JP2007518267A5
JP2007518267A5 JP2006549286A JP2006549286A JP2007518267A5 JP 2007518267 A5 JP2007518267 A5 JP 2007518267A5 JP 2006549286 A JP2006549286 A JP 2006549286A JP 2006549286 A JP2006549286 A JP 2006549286A JP 2007518267 A5 JP2007518267 A5 JP 2007518267A5
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JP
Japan
Prior art keywords
metal block
evaporation
aerosol
inlet
evaporation chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006549286A
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English (en)
Japanese (ja)
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JP2007518267A (ja
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Publication date
Priority claimed from US10/769,011 external-priority patent/US20050147749A1/en
Application filed filed Critical
Publication of JP2007518267A publication Critical patent/JP2007518267A/ja
Publication of JP2007518267A5 publication Critical patent/JP2007518267A5/ja
Pending legal-status Critical Current

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JP2006549286A 2004-01-05 2004-12-15 液状前駆物質のための高性能蒸発器、及び、半導体の薄膜蒸着における複数の液状前駆物質の蒸発 Pending JP2007518267A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US53428604P 2004-01-05 2004-01-05
US10/769,011 US20050147749A1 (en) 2004-01-05 2004-01-30 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition
PCT/US2004/041944 WO2005068682A2 (en) 2004-01-05 2004-12-15 High-performance vaporizer for liquid-precursor and multi-liquid-precursor vaporization in semiconductor thin film deposition

Publications (2)

Publication Number Publication Date
JP2007518267A JP2007518267A (ja) 2007-07-05
JP2007518267A5 true JP2007518267A5 (https=) 2008-02-14

Family

ID=34713809

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006549286A Pending JP2007518267A (ja) 2004-01-05 2004-12-15 液状前駆物質のための高性能蒸発器、及び、半導体の薄膜蒸着における複数の液状前駆物質の蒸発

Country Status (4)

Country Link
US (1) US20050147749A1 (https=)
EP (1) EP1704267A2 (https=)
JP (1) JP2007518267A (https=)
WO (1) WO2005068682A2 (https=)

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JP6675865B2 (ja) * 2015-12-11 2020-04-08 株式会社堀場エステック 液体材料気化装置
KR102483924B1 (ko) * 2016-02-18 2023-01-02 삼성전자주식회사 기화기 및 이를 구비하는 박막 증착 장치
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