JP2007281317A - Aligner - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To prevent exposure of parts between exposure regions which are adjacent to each other outside several exposure regions set on an object to be exposed. <P>SOLUTION: The aligner is provided with a stage 5 for transferring a glass substrate 1 for a color filter, a mask stage 6 for holding a photomask 16, a light source 7 for irradiating the photomask 16 with exposure light, a photo-integrator 8 for equalizing luminance distribution of the exposure light to be applied to the photomask 16, a condenser lens 9 for turning the exposure light to be applied to the photomask 16 into parallel light, an imaging lens 10 for focusing the end face image of the photo-integrator 8 before the condenser lens 9, and a shutter 11 which is arranged near the imaging position of the imaging lens 10 and switches between irradiation and interruption of the exposure light in synchronization with subsequential passage of several exposure regions under the photomask 16 by the movement of the glass substrate 1 for the color filter. In this case, the shutter 11 is so constructed that the width of its light interception part 24 can be changed according to the width of parts between adjacent exposure regions. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention provides a predetermined exposure pattern sequence through a photomask for a plurality of exposure areas set at predetermined intervals along the transport direction on the surface of the exposure target while transporting the exposure target in the predetermined direction. In particular, the present invention relates to an exposure apparatus that attempts to prevent a portion between adjacent exposure areas outside the plurality of exposure areas from being exposed.

A conventional exposure apparatus exposes a mask pattern for one layer to each of a plurality of exposure regions of the substrate by relatively moving a stage on which the substrate is placed and a photomask corresponding to a layer to be exposed. The position of the stage relative to the photomask when exposed to the plurality of exposure areas is measured for each area, and the photomask in a state positioned with respect to a predetermined position recognition mark on the substrate is used as a reference. Means for acquiring a relative position of the stage at the time of exposure with respect to a plurality of exposure areas; and positioning the photomask by detecting the position recognition mark, and the acquired relative position is determined based on the photomask at that time. Means for moving the stage and the photomask relative to each other while measuring the position of the stage relative to the photomask so as to be reproduced. When the stage and the photomask are moved relative to each other and positioned with respect to the plurality of exposure areas on the substrate to expose and form the first layer pattern, the other exposure areas based on one exposure area The relative position data is stored, and when the second layer pattern is formed by exposure, the stage and the photomask are relatively moved and positioned based on the relative position data for exposure. (For example, see Patent Document 1).
Japanese Patent Laid-Open No. 2004-246025

  However, in such a conventional exposure apparatus, the mask pattern of the photomask is exposed by stepping the substrate and switching the plurality of exposure areas set on the substrate one by one. In other words, the plurality of exposure areas are not exposed while the substrates disposed in close proximity to each other are transported at a constant speed in a direction perpendicular to the arrangement direction of the plurality of mask patterns formed on the photomask.

  On the other hand, in the case of an exposure apparatus that exposes a plurality of exposure regions while transporting the substrate at a constant speed in a direction orthogonal to the arrangement direction of the plurality of mask patterns formed on the photomask, FIG. As shown, for example, among a plurality of exposure regions 2 set in the conveyance direction (arrow A direction) of the glass substrate 1 for color filter, between the first exposure region 2a and the second exposure region 2b. The portion 3a, the portion 3b between the second exposure region 2b and the third exposure region 2c, and the portion 3c between the third exposure region 2c and the fourth exposure region 2d are also included. As a result, the exposure pattern row 4 formed by the plurality of mask patterns is formed, which may deteriorate the appearance quality of the product.

  Therefore, the present invention addresses such problems, and exposure that attempts to prevent exposure between portions of adjacent exposure areas outside the plurality of exposure areas set on the object to be exposed. An object is to provide an apparatus.

  In order to achieve the above object, an exposure apparatus according to a first aspect of the present invention is configured to place an object to be exposed, in which a plurality of exposure areas are arranged in at least one row, on an upper surface, and to set the plurality of exposure areas in the setting direction. A stage that conveys the object to be exposed; a mask stage that is disposed above the stage and that holds a photomask for forming a predetermined exposure pattern row in close proximity to the object to be exposed; and the object to be exposed A light source that is constantly lit during the exposure period for the light source and irradiates the photomask held on the mask stage with exposure light, and is disposed between the mask stage and the light source, and the exposure light applied to the photomask is parallel light. A condensing lens that is disposed between the light source and the condensing lens, and forms an image of the light source on the front side of the condensing lens; and The portion between the adjacent exposure regions in the plurality of exposure regions is moved in synchronism with the passage under the photomask sequentially by the conveyance of the exposure object. A shutter that switches between exposure light irradiation and light shielding, and the shutter is configured to change a width for shielding the exposure light in accordance with a width of a portion between the adjacent exposure regions. is there.

  With such a configuration, the exposure object having a plurality of exposure areas arranged on the upper surface of the stage on the upper surface is placed on the upper surface, and the exposure object is conveyed in the setting direction of the plurality of exposure areas. The photomask for holding a photomask for forming a predetermined exposure pattern sequence is held close to and opposite to the object to be exposed on the mask stage, and the photomask held on the mask stage is exposed with a light source that is constantly lit during the exposure period for the object to be exposed. Irradiate light. At that time, an image of the light source is formed on the front side of the condenser lens by the imaging lens, and the exposure light applied to the photomask by the condenser lens is converted into parallel light. At this time, a shutter disposed in the vicinity of the imaging position of the image of the light source by the imaging lens is synchronized with the portion between the adjacent exposure areas in the plurality of exposure areas sequentially passing under the photomask. Then, the exposure light is switched between irradiation and shielding by changing the width for shielding the exposure light in accordance with the width of the portion between the adjacent exposure regions.

  An exposure apparatus according to a second aspect of the present invention places an exposure object having a plurality of exposure areas arranged in at least one line on the upper surface, and conveys the exposure object in a setting direction of the plurality of exposure areas. A stage, a mask stage disposed above the stage and configured to hold a photomask for forming a predetermined exposure pattern row in close proximity to the object to be exposed; and constantly lit during an exposure period for the object to be exposed A light source that irradiates the photomask held on the mask stage with exposure light, and a photo integrator that is disposed between the mask stage and the light source and uniformizes the luminance distribution of the exposure light irradiated on the photomask. And a condensing lens disposed between the mask stage and the photo integrator, for collimating the exposure light applied to the photo mask, and the photo An imaging lens disposed between the integrator and the condensing lens, and forms an end face image of the photo integrator on the near side of the condensing lens, and an image of the end face image of the photo integrator by the imaging lens The exposure light is disposed in the vicinity of the position, and moves in synchronization with the portion of the plurality of exposure areas adjacent to each other passing through the lower side of the photomask sequentially by transporting the object to be exposed. And a shutter that switches between irradiation and light shielding, and the shutter is configured such that the width for shielding the exposure light can be changed according to the width of the portion between the adjacent exposure regions.

  With such a configuration, the exposure object having a plurality of exposure areas arranged on the upper surface of the stage on the upper surface is placed on the upper surface, and the exposure object is conveyed in the setting direction of the plurality of exposure areas. The photomask for holding a photomask for forming a predetermined exposure pattern sequence is held close to and opposite to the object to be exposed on the mask stage, and the photomask held on the mask stage is exposed with a light source that is constantly lit during the exposure period for the object to be exposed. Irradiate light. At that time, the brightness distribution of the exposure light applied to the photomask with the photo integrator is made uniform, the end face image of the photo integrator is formed on the front side of the condenser lens with the imaging lens, and the photo mask is irradiated with the condenser lens. The exposure light to be converted into parallel light. At this time, a shutter disposed in the vicinity of the imaging position of the image of the light source by the imaging lens is synchronized with the portion between the adjacent exposure areas in the plurality of exposure areas sequentially passing under the photomask. Then, the exposure light is switched between irradiation and shielding by changing the width for shielding the exposure light in accordance with the width of the portion between the adjacent exposure regions.

  Further, the shutter forms a light shielding portion by superimposing a plurality of light shielding members, and moves the other light shielding member with respect to one of the light shielding members in the transport direction of the object to be exposed to increase the light shielding width. It can be changed. As a result, the other light-shielding member is moved in the conveyance direction of the object to be exposed according to the width of the portion between the adjacent exposure regions, based on one light-shielding member formed by overlapping a plurality of light-shielding members. Thus, the light shielding width is changed to shield the portion between adjacent exposure regions.

  Furthermore, the shutter forms a light shielding portion by superimposing a plurality of light shielding members, and a plurality of sets of light shielding portions are provided at predetermined intervals along the transport direction of the object to be exposed. The light shielding width can be changed by moving another light shielding member in the conveying direction of the object to be exposed with respect to one light shielding member among the members. Accordingly, a plurality of sets of light shielding portions formed by overlapping a plurality of light shielding members are provided at predetermined intervals along the conveyance direction of the object to be exposed, and other light shielding members are adjacent to each other with reference to one light shielding member of each light shielding portion. The light shielding width is changed by moving in the conveying direction of the object to be exposed in accordance with the width of the portion between the matching exposure regions, and the portions between the adjacent exposure regions are sequentially shielded from light.

  The shutter has a portion between adjacent exposure regions of the object to be exposed in a state where the other light shielding member is moved by a predetermined amount in the conveying direction of the object to be exposed with respect to the one light shielding member. In synchronization with passing under the photomask, the exposure object can be moved in the direction opposite to the conveying direction. As a result, with the other light-shielding member moved by a predetermined amount in the conveyance direction of the object to be exposed with respect to one light-shielding member, the portion of the shutter between the adjacent exposure regions of the object to be exposed is under the photomask. In synchronism with passing the side, the object moves in the direction opposite to the conveying direction of the object to be exposed, and the portion between the adjacent exposure regions on the object to be exposed is shielded by the one light shielding member and the other light shielding member.

  An exposure apparatus according to a third aspect of the present invention places an object to be exposed in which a plurality of exposure areas are set in at least one line on the upper surface, and conveys the object to be exposed in a setting direction of the plurality of exposure areas. A stage, a mask stage disposed above the stage and configured to hold a photomask for forming a predetermined exposure pattern row in close proximity to the object to be exposed; and constantly lit during an exposure period for the object to be exposed And a light source for irradiating the photomask held on the mask stage with exposure light, and a condensing lens disposed between the mask stage and the light source for making the exposure light irradiated on the photomask parallel light. , Disposed between the mask stage and the condensing lens, and a portion between adjacent exposure regions in the plurality of exposure regions is transported under the photomask in order by conveying the object to be exposed. A shutter that moves in synchronization with passing and switches between irradiation of exposure light and blocking of light, and the shutter has a width that blocks exposure light according to a width of a portion between the adjacent exposure regions Can be changed.

  With such a configuration, the exposure object having a plurality of exposure areas arranged on the upper surface of the stage on the upper surface is placed on the upper surface, and the exposure object is conveyed in the setting direction of the plurality of exposure areas. The photomask for holding a photomask for forming a predetermined exposure pattern sequence is held close to and opposite to the object to be exposed on the mask stage, and the photomask held on the mask stage is exposed with a light source that is constantly lit during the exposure period for the object to be exposed. Irradiate light. At that time, the exposure light applied to the photomask by the condenser lens is made parallel light. At this time, a shutter disposed between the mask stage and the condensing lens moves in synchronization with the portion between the adjacent exposure areas in the plurality of exposure areas sequentially passing under the photomask. In addition, the exposure light is switched between irradiation and shielding by changing the width for shielding the exposure light in accordance with the width of the portion between the adjacent exposure regions.

  Further, the shutter forms a light shielding portion by overlapping a plurality of light shielding members, and moves the other light shielding member with respect to one of the light shielding members in a direction opposite to the conveying direction of the object to be exposed. The width of can be changed. Thus, with respect to one light shielding member formed by overlapping a plurality of light shielding members, another light shielding member is used as a reference in a direction opposite to the conveyance direction of the object to be exposed according to the width of the portion between adjacent exposure regions. To change the light shielding width to shield the portion between adjacent exposure regions.

  Furthermore, the shutter forms a light shielding portion by superimposing a plurality of light shielding members, and a plurality of sets of light shielding portions are provided at predetermined intervals along the transport direction of the object to be exposed. The light shielding width can be changed by moving another light shielding member in a direction opposite to the conveying direction of the object to be exposed with respect to one light shielding member among the members. Accordingly, a plurality of sets of light shielding portions formed by overlapping a plurality of light shielding members are provided at predetermined intervals along the conveyance direction of the object to be exposed, and other light shielding members are adjacent to each other with reference to one light shielding member of each light shielding portion. The light shielding width is changed by moving in the direction opposite to the conveying direction of the object to be exposed in accordance with the width of the portion between the matching exposure regions, and the portions between the adjacent exposure regions are sequentially shielded from light.

  The shutter moves between adjacent exposure regions of the object to be exposed in a state where the other light shielding member is moved by a predetermined amount in the direction opposite to the conveying direction of the object to be exposed with respect to the one light shielding member. This portion can be moved in the conveying direction of the object to be exposed in synchronization with passing under the photomask. As a result, with the other light-shielding member moved by a predetermined amount in the direction opposite to the conveyance direction of the object to be exposed with respect to one light-shielding member, the portion of the shutter between the adjacent exposure areas of the object to be exposed is photo In synchronization with passing through the lower side of the mask, the object moves in the conveying direction of the object to be exposed, and the portion between the adjacent exposure regions on the object to be exposed is shielded by the one light shielding member and the other light shielding member.

  According to the exposure apparatus of the first aspect, it is possible to prevent a portion between adjacent exposure areas from being exposed outside the plurality of exposure areas set along the transport direction on the object to be exposed. Can do. Therefore, the appearance quality of the product can be improved. In this case, since the light shielding width of the shutter can be changed according to the width of the portion between the adjacent exposure regions, it is possible to cope with any object to be exposed having different exposure region setting intervals with one shutter. Can be expanded. Further, since the shutter is disposed in the vicinity of the imaging position of the image of the light source by the imaging lens, the shutter can be made small, and the shutter can be easily disposed avoiding interference with surrounding components. it can.

  In addition, according to the exposure apparatus of the second aspect, it is possible to prevent a portion between adjacent exposure areas from being exposed outside the plurality of exposure areas set along the transport direction on the object to be exposed. can do. Therefore, the appearance quality of the product can be improved. Also in this case, since the light shielding width of the shutter can be changed according to the width of the portion between the adjacent exposure regions, it can be applied to any object to be exposed having different exposure region setting intervals with one shutter. Can be expanded. Further, since the shutter is disposed in the vicinity of the imaging position of the end surface image of the photo integrator by the imaging lens, the shutter can be made small, and the shutter can be easily arranged avoiding interference with surrounding components. be able to. Furthermore, since the exposure light applied to the photomask by the photo integrator can be made uniform, the exposure object can be exposed uniformly.

  Furthermore, according to the invention according to claim 3 or 7, the exposure light shielding width is changed by changing the movement amount of the other light shielding member with respect to one light shielding member of the light shielding part formed by overlapping a plurality of light shielding members. Can be easily changed. Therefore, it is possible to easily cope with any object to be exposed having different exposure area setting intervals with a single shutter. In this case, if the shutter is moved in synchronization with the portions between the adjacent exposure regions of the plurality of exposure regions sequentially passing under the photomask, the portions between the adjacent exposure regions are blocked by the light shielding portion. The light can be shielded, and when the portion between the adjacent exposure areas has passed under the photomask, the next exposure area can be exposed by returning the shutter to the original position at high speed.

  Furthermore, according to the invention of claim 4, the width of the exposure light can be reduced by changing the amount of movement of the other light shielding member relative to one light shielding member of the light shielding portion formed by overlapping a plurality of light shielding members. Can be easily changed. Therefore, it is possible to easily cope with any object to be exposed having different exposure area setting intervals with a single shutter. Further, since a plurality of sets of light shielding portions are provided at predetermined intervals along the conveyance direction of the object to be exposed, the shutter is synchronized with the portion between the adjacent exposure regions of the object to be exposed passing under the photomask. If the object is moved in the direction opposite to the conveying direction of the object to be exposed, the portions between the adjacent exposure regions can be sequentially shielded by the plurality of light shielding portions. In this case, it is not necessary to return the shutter to the original position at a high speed every time a portion between adjacent exposure areas has passed through the lower side of the photomask. Can be maintained with high accuracy.

  According to the fifth aspect of the present invention, the shutter is moved in a direction opposite to the conveyance direction of the object to be exposed in synchronization with a portion between adjacent exposure regions of the object to be exposed passing under the photomask. The portion between adjacent exposure regions on the object to be exposed can be shielded from light. Therefore, the part between each adjacent exposure area | region can be reliably light-shielded.

  In addition, according to the exposure apparatus of the sixth aspect, it is possible to prevent a portion between adjacent exposure areas from being exposed outside the plurality of exposure areas set along the transport direction on the object to be exposed. can do. Therefore, the appearance quality of the product can be improved. In this case, since the light shielding width of the shutter can be changed according to the width of the portion between the adjacent exposure regions, it is possible to cope with any object to be exposed having different exposure region setting intervals with one shutter. Can be expanded. In addition, since the shutter is disposed between the mask stage and the condenser lens, the light shielding width of the shutter can be formed with the same size as the width of the portion between adjacent exposure regions of the object to be exposed. The shutter can be easily designed.

  According to the eighth aspect of the invention, the width of the exposure light can be easily reduced by changing the amount of movement of the other light shielding member with respect to the one light shielding member of the light shielding portion formed by overlapping a plurality of light shielding members. Can be changed to Therefore, it is possible to easily cope with any object to be exposed having different exposure area setting intervals with a single shutter. Further, since a plurality of sets of light shielding portions are provided at predetermined intervals along the conveyance direction of the object to be exposed, the shutter is synchronized with the portion between the adjacent exposure regions of the object to be exposed passing under the photomask. Then, if the object to be exposed is moved in the conveying direction, the portions between the adjacent exposure regions can be shielded sequentially. In this case, it is not necessary to return the shutter to the original position at a high speed every time a portion between adjacent exposure areas has passed through the lower side of the photomask. Can be maintained with high accuracy.

  According to the ninth aspect of the invention, the shutter is moved in the conveyance direction of the object to be exposed in synchronization with a portion between adjacent exposure regions of the object to be exposed passing under the photomask. The portion between adjacent exposure regions on the object to be exposed can be shielded from light. Therefore, the part between each adjacent exposure area | region can be reliably light-shielded.

  Embodiments of the present invention will be described below in detail with reference to the accompanying drawings. FIG. 1 is a front view showing a schematic configuration of a first embodiment of an exposure apparatus according to the present invention. This exposure apparatus is configured to transfer a predetermined exposure pattern via a photomask to a plurality of exposure areas set at predetermined intervals along the transfer direction on the surface of the exposure target while transferring the exposure target in a predetermined direction. A column 5 is formed. The stage 5, the mask stage 6, the light source 7, the photo integrator 8, the condenser lens 9, the imaging lens 10, the shutter 11, the imaging unit 12, and the drive control unit 13 ( (See FIG. 7). In the following description, the case where the object to be exposed is the color filter glass substrate 1 coated with a color resist will be described.

As shown in FIG. 2, the stage 5 includes a color filter glass substrate 1 in which a plurality of exposure regions 2 are set in at least one line, for example, at different intervals G ₁ and G ₂ (shown in two lines in the figure). Is mounted on the upper surface 5a, and the glass substrate for color filter 1 is transported in the setting direction of the plurality of exposure regions 2, and is transported at a constant speed (V in the direction indicated by the arrow A in FIG. ) To move. In FIG. 2, reference numeral 2a indicates the first exposure area, reference numeral 2b indicates the second exposure area, reference numeral 2c indicates the third exposure area, and reference numeral 2d indicates the fourth exposure area. Show. Further, reference numeral 3a indicates a portion between the first and second exposure areas 2a and 2b (hereinafter referred to as “first inter-cell area”), and reference numeral 3b indicates the second and third exposure areas 2b. , 2c (hereinafter referred to as "second inter-cell region"), 3c is a portion between third and fourth exposure regions 2c, 2d (hereinafter referred to as "third inter-cell region"). ").

  A mask stage 6 is disposed above the stage 5. The mask stage 6 holds the photomask 15 in close proximity to the color filter glass substrate 1 through a predetermined gap, for example, a gap of 100 to 300 μm. The alignment mechanism can be moved in a direction orthogonal to the transport direction, and can be rotated around the central portion, so that alignment adjustment between the photomask 15 and the color filter glass substrate 1 is possible.

  Here, the photomask 15 is for transferring a mask pattern formed thereon by irradiation of exposure light to a color resist coated on the glass substrate 1 for color filter, and is transparent as shown in FIG. It consists of a substrate 16, a light shielding film 17, a mask pattern 18, a viewing window 19, and a mask side alignment mark 20.

  The transparent substrate 16 is a transparent glass substrate that transmits ultraviolet light and visible light with high efficiency, and is made of, for example, quartz glass. As shown in FIG. 1, a light shielding film 17 is formed on one surface 16 a of the transparent substrate 16. The light shielding film 17 shields exposure light and is formed of an opaque thin film of, for example, chromium (Cr).

As shown in FIG. 3, a plurality of mask patterns 18 are formed on the light shielding film 17 in one direction. The plurality of mask patterns 18 are openings having a predetermined shape that allow exposure light to pass therethrough, and are capable of irradiating exposure light onto the color filter glass substrate 1 that is transported oppositely, and on the color filter glass substrate 1 shown in FIG. The image is transferred onto the pixels 22 of the black matrix 21 formed in (1). For example, the pixel 22 has a width that substantially matches the width of the pixels 22 and is long in the direction orthogonal to the arrangement direction, and is formed at an interval that matches the 3-pitch interval of the pixels 22. Further, as shown in FIG. 3, the upper edge portion is previously set as the reference position R ₁ in the drawing of the mask pattern 18a is located in the example central.

As shown in FIG. 3, a viewing window 19 is formed in the light shielding film 17 in the vicinity of the plurality of mask patterns 18 in the side of the arrangement direction. This viewing window 19 is for observing the substrate-side alignment mark 23 and the pixel 22 of the black matrix 21 formed on the color filter glass substrate 1 shown in FIG. means 12 can detect the reference position R ₂ position and preset in the right upper corner in this figure pixels 22a positioned at the center as shown in FIG. 4, for example of the black matrix 21 of the substrate side alignment mark 23 It has become. Then, as shown in FIG. 3, it is formed in a rectangular shape extending from the center side toward one end 15a in parallel with the arrangement direction of the plurality of mask patterns 18.

As shown in FIG. 3, a plurality of mask side alignment marks 20 are formed on the light shielding film 17 so as to be arranged side by side from the center side toward the other end 15 b on one side of the viewing window 19. The plurality of mask-side alignment marks 20 are used to align the reference position R ₁ preset in the mask pattern 18 with the reference position R ₂ preset in the pixel 22 of the color filter glass substrate 1. And is formed corresponding to the mask pattern 18. Further, the formation position is such that the upper edge of the mask alignment mark 20 in FIG. 3 coincides with the upper edge of the corresponding mask pattern 18. For example, the mask side alignment mark 20 formed on the central side of the light shielding film 17 is set in advance as the reference mark 20a. Thus, by the above-described reference mark 20a and the color substrate side alignment mark 23 of the filter glass substrate 1 is adjusted in position so that a predetermined positional relationship, the reference position R ₁ in the mask pattern 18 and the color filter and the reference position R ₂ of the use of glass substrate 1 is adapted to be aligned.

  As shown in FIG. 1, the photomask 15 is held on the mask stage 6 with the side on which the light shielding film 17 is formed facing down.

  A light source 7 is disposed above the mask stage 6. The light source 7 is always turned on during the exposure period for the color filter glass substrate 1 and irradiates the photomask 15 held on the mask stage 6 with exposure light, and emits exposure light including ultraviolet rays. For example, an ultra high pressure mercury lamp, a xenon lamp, an ultraviolet light emitting laser, or the like.

  A photo integrator 8 is disposed between the mask stage 6 and the light source 7. The photo integrator 8 makes the luminance distribution of the exposure light applied to the photo mask 15 uniform, and is a kaleidoscope or a fly-eye lens, for example. In the present embodiment, a kaleidoscope is used, and the shape of the end face 8a is rectangular, and the exposure light is irradiated only on the regions where the plurality of mask patterns 18 are formed on the photomask 15. Note that if the filter that reflects or absorbs ultraviolet rays and transmits visible light is formed so as to cover the viewing window 19 and the mask-side alignment mark 20 of the photomask 15, exposure light may be irradiated to the entire photomask 15.

  A condenser lens 9 is disposed between the mask stage 6 and the photo integrator 8. The condenser lens 9 is a condensing lens that converts exposure light into parallel light and irradiates the photomask 15 vertically.

  An imaging lens 10 is disposed between the photo integrator 8 and the condenser lens 9. The imaging lens 10 is a convex lens that forms an image of the end face 8a of the photo integrator 8 once in front of the condenser lens 9 in the vicinity of the front focal point of the condenser lens 9.

  A shutter 11 is provided in the vicinity of the image forming position of the image of the end face 8 a of the photo integrator 8 by the image forming lens 10. The shutter 11 moves in synchronization with the movement of the color filter glass substrate 1 so that the plurality of exposure regions 2 sequentially pass under the mask pattern 18 of the photomask 15 to irradiate and block exposure light. A structure for switching and capable of changing the width for blocking exposure light (the width of the light blocking portion 24) in accordance with the width of the first to third inter-cell regions 3a to 3c of the glass substrate 1 for color filter. It is said.

  Specifically, the shutter 11 forms a light-shielding portion 24 by superimposing a plurality of light-shielding members, and the light-shielding portion 24 is moved along the conveyance direction of the color filter glass substrate 1 (the direction of arrow A shown in FIG. 1). A plurality of sets are provided at predetermined intervals, and the light shielding width can be changed by moving another light shielding member in the conveyance direction of the color filter glass substrate 1 with respect to one light shielding member among the plurality of light shielding members of each light shielding portion 24. The first to third cells of the color filter glass substrate 1 in a state where the other light shielding member is moved by a predetermined amount in the transport direction of the color filter glass substrate 1 with respect to one light shielding member. In synchronism with the passage of the interspaces 3a to 3c below the mask pattern 16 of the photomask 15, for example, a glass substrate for a color filter by moving means (not shown) combining a motor, a gear, a rail, and the like. And it is movable in the conveying direction and opposite to the direction (arrow B direction shown in FIG. 1) of the. And as shown in FIG. 5, the shutter main-body part 25, the movement light-shielding piece 26, and the movement light-shielding piece drive part 27 are provided.

  The shutter main body 25 forms the main body of the shutter 11, and as shown in FIG. 5, as shown in FIG. The same number of first to fourth slits 28a to 28d as the fourth exposure regions 2a to 2d are formed. In this case, the slits 28a to 28d are formed at a pitch of 2 g where the width is g, and the portions between the slits are first fixed light-shielding pieces 29a, second fixed light-shielding pieces 29b, The third fixed light shielding piece 29c is used. The first to third fixed light shielding pieces 29a to 29c serve as the one light shielding member, and the width thereof is the same g as the width of the slit.

Here, when the magnification of the condenser lens 9 is M, the width g of the first to third fixed light-shielding pieces 29a to 29c shown in FIG. 5A is the same as that of the glass substrate 1 for color filter shown in FIG. Of the first to third inter-cell regions 3a to 3c, g = G ₂ / M is set corresponding to the narrowest width, for example, the width G ₂ of the second and third inter-cell regions 3b and 3c. . Or you may make it respond | correspond to the width | variety of the narrowest area | region between cells among the glass substrates for various color filters. The width w of the first to fourth slits 28a to 28d in the direction orthogonal to the moving direction indicated by the arrow B is at least w when the total width of the plurality of mask patterns 18 of the photomask 15 shown in FIG. = W / M. The moving speed v in the direction of arrow B is v = V / M, where V is the transport speed of the color filter glass substrate 1. In FIG. 5A, a hatched region Q is an exposure light irradiation region.

On the first to third fixed light-shielding pieces 29a to 29c, moving light-shielding pieces 26 as other light-shielding members are provided so as to be movable and overlapped with each other. The moving light-shielding piece 26 moves on the first to third fixed light-shielding pieces 29a to 29c of the shutter main body 25 in the transport direction of the color filter glass substrate 1, and the movement amount and the first to first and the width _{g x} of the light shielding portion 24 which is determined with a width g of 3 fixed shading piece 29a~29c which can be changed, the width g is substantially of the first to third fixed shading piece 29a~29c They are formed with the same width g. And it guides to the groove | channel 30a of the guide part 30 provided along the both edges parallel to the moving direction shown by the arrow B on the upper surface of the shutter main-body part 25, and the direction of the arrow a and b shown in FIG.5 (b) Can be moved to.

  The moving light-shielding piece driving unit 27 individually moves each moving light-shielding piece 26 by a predetermined amount according to the widths of the first to third inter-cell regions 3a to 3c of the color filter glass substrate 1 as shown in FIG. ) In the direction indicated by arrow a (the same direction as the conveyance direction indicated by arrow A), and at the speed v, it moves in the direction of arrow b opposite to arrow a (the same direction as arrow B). Electromagnetic actuators and the like.

  The exposure optical system 31 includes the light source 7, the photo integrator 8, the imaging lens 10, the condenser lens 9, the mask stage 6, and the shutter 11.

  An imaging unit 12 is disposed above the stage 5. The imaging means 12 includes a substrate-side alignment mark 23 shown in FIG. 4 formed on the color filter glass substrate 1 and a mask-side alignment mark 20 shown in FIG. A line CCD 33 that captures and captures images within the same field of view and includes a large number of light receiving elements arranged in a straight line, and a substrate side that is disposed in front of the line CCD 33 and formed on the color filter glass substrate 1 An image pickup lens 34 for forming an image of the alignment mark 23 and the mask side alignment mark 20 formed on the pixel 22 and the photomask 15 on the line CCD 33 is provided.

  Further, as shown in FIG. 1, an optical distance correction unit 35 is disposed between the line CCD 33 and the imaging lens 34 on the optical path of the imaging unit 12. This optical distance correction means 35 is for substantially matching the optical distance between the line CCD 33 of the image pickup means 12 and the color filter glass substrate 1 and the optical distance between the line CCD 33 of the image pickup means 12 and the photomask 15. There is a transparent member having a predetermined refractive index larger than the refractive index of air, for example, a glass plate. Specifically, the optical distance correction means 35 is disposed on an optical path connecting the line CCD 33 of the image pickup means 12 and the color filter glass substrate 1 through a viewing window 19 formed in the photomask 15. As a result, the image of the substrate-side alignment mark 23 and the like of the glass substrate 1 for color filter and the image of the mask-side alignment mark 20 of the photomask 15 which are shifted in the optical axis direction of the image pickup means 12 are placed on the line CCD 33. Images can be formed simultaneously.

  A driving control means 13 shown in FIG. 7 is provided in connection with the conveying means 14, the moving means of the shutter main body 25, the moving light-shielding piece driving section 27, and the alignment mechanism of the mask stage 6. The drive control means 13 is configured such that the moving speed of the stage 5, the moving speed and moving amount of the shutter main body 25, the moving direction and moving amount and moving speed of the moving light shielding piece 26, the photomask 15 and the color filter glass substrate 1. The input unit 36, the storage unit 37, the calculation unit 38, the conveyance unit drive control unit 39, the position detection sensor 40 of the conveyance unit, and the shutter main body unit drive control unit 41 are controlled. A position detection sensor 42 of the shutter main body 25, a moving light shielding piece drive control unit 43, a position detection sensor 44 of the moving light shielding piece 26, a mask stage drive control unit 45, and a control unit 46.

  The input means 36 is used by the operator for position data of the end portions E1 to E4 of the exposure regions 2a to 2d of the color filter glass substrate 1 shown in FIG. 2, the first to third inter-cell regions 3a to 3c, and the like. For example, a keyboard can be used to input data on the width G of a non-exposure area where exposure is not desired. The width G of the non-exposure area is not input directly, but the position data of the start end and end end of the non-exposure area is input, and the calculation unit 38 described later based on the position data. The width G of the non-exposure area may be calculated by calculation.

  The storage unit 37 stores the position data of the end portions E1 to E4 of the exposure areas 2a to 2d input by the input means 36, the data of the width G of the non-exposure area, and the like. It is memory.

Further, the calculation unit 38 calculates the width g _x (= G / M) of the light shielding unit 24 of the shutter 11 by dividing the width G of the non-exposure region by the magnification M of the condenser lens 9. When the position data of the start and end portions of the non-exposure area is input, the calculation unit 38 calculates the width G of the non-exposure area based on the position data.

  Further, the transfer means drive control unit 39 controls the transfer means 14 to move the stage 5 at a predetermined speed, and when the end sensor (not shown) detects the moving end in the direction of arrow A shown in FIG. Is reversed at a high speed in the direction opposite to the arrow A, and the stage 5 is stopped when the start sensor (not shown) detects the movement start. Further, the movement of the stage 5 in the direction orthogonal to the arrow A may be controlled. And the position detection sensor 40 of the said conveyance means 14 detects the position of the stage 5, and outputs the positional information, for example, is a linear sensor or a rotary encoder.

  The shutter main body drive control unit 41 controls the moving means of the shutter main body 25, and when the end portions E1 to E4 of the first to third exposure regions 2a to 2c are detected, the shutter main body 25. Is moved by a distance 2g at a speed v in the direction of arrow B shown in FIG. 1 and stopped. When all exposures are completed, the initial position is restored. Further, the position detection sensor 42 of the shutter main body 25 detects the moving distance of the shutter main body 25, and is, for example, a linear sensor or a rotary encoder.

  The moving light-shielding piece drive control unit 43 controls the moving light-shielding piece drive unit 27, and moves the moving light-shielding piece 26 by a predetermined distance in the direction of arrow a shown in FIG. And then return at a speed v in the direction of arrow b. When the non-exposure area includes up to a partial exposure area, the moving light shielding piece 26 is moved in the direction of the arrow a by the distance g and stopped as it is. The position detection sensor 44 of the moving light shielding piece 26 detects the moving distance of the moving light shielding piece 26, and is, for example, a linear sensor or a rotary encoder.

Further, the mask stage drive controller 45 controls the mask stage alignment mechanism to align the mask pattern 18 of the photomask 15 with the pixels 22 of the glass substrate 1 for color filter.
The control unit 46 appropriately controls the drive control unit 13 as a whole.

Next, the operation of the exposure apparatus configured as described above will be described.
Here, as shown in FIG. 4, the glass substrate 1 for color filter to be used has an opaque film made of Cr or the like formed on one surface of a transparent glass substrate. As shown in FIG. The pixels 22 are formed in a matrix. Further, positional deviation of a substantially central portion of one end portion 1a side, and the reference position R ₂ which is previously set to the reference position R ₁ and the color filter glass substrate 1 set in advance in the photomask 15 shown in FIG. 3 One elongated substrate-side alignment mark 23 is formed in order to correct and correct alignment. Further, on the side of the substrate-side alignment mark 23, a plurality of alignment confirmation marks 47 are arranged from the central side toward one side end 1b so as to correspond to the pixels 22 and coincide with the three pitch intervals of the pixel 22 array. Formed at intervals. The substrate-side alignment mark 23 and the alignment confirmation mark 47 are formed so that the upper edge of each mark 47 and the upper edge of the corresponding pixel 22 in FIG.

  The color filter glass substrate 1 thus formed is coated with a predetermined color resist on the upper surface, and the end 1a side where the substrate-side alignment mark 23 is formed is the leading side in the transport direction indicated by arrow A in FIG. Placed on the upper surface 5a of the stage 5 and conveyed by the conveying means 14 in the direction of arrow A at a constant speed V.

  On the other hand, as shown in FIG. 3, the photomask 15 has the end portion 15c side on which the observation window 19 is formed positioned on the front side in the transport direction indicated by the arrow A, and forms a light shielding film 17 as shown in FIG. It is held on the mask stage 6 with the finished surface down. And it is made to oppose and adjoin to the upper surface of the glass substrate 1 for color filters conveyed.

  In this state, the imaging means 12 images the substrate side alignment mark 23, the alignment confirmation mark 47, and the pixel 22 on the color filter glass substrate 1 through the viewing window 19 formed in the photomask 15. In this case, an optical distance correction means 35 is disposed on the optical path connecting the line CCD 33 of the image pickup means 12 and the color filter glass substrate 1 through the viewing window 19 formed in the photomask 15, and the optical distance is reduced. Since the optical distance between the line CCD 33 of the image pickup means 12 and the photomask 15 is substantially matched, the substrate-side alignment on the color filter glass substrate 1 located in the optical axis direction of the image pickup means 12 is shifted. The image of the mark 23 and the like and the image of the mask side alignment mark 20 of the photomask 15 are simultaneously formed on the line CCD 33 of the imaging means 12. Therefore, the image of the substrate-side alignment mark 23 and the like and the image of the mask-side alignment mark 20 that are simultaneously imaged by the imaging unit 12 are simultaneously processed by an image processing unit (not shown).

Here, first, the substrate-side alignment mark 23 of the color filter glass substrate 1 and the mask-side alignment mark 20 of the photomask 15 observed by the imaging means 12 through the viewing window 19 of the photomask 15 as shown in FIG. And are simultaneously imaged. At this time, the cell number of the light receiving element of the line CCD 33 detecting the substrate side alignment mark 23 and the cell number of the light receiving element of the line CCD 33 detecting the reference mark 20a of the photomask 15 are read and provided in the image processing unit. The distance L is calculated by a calculation unit (not shown). Then, it is compared with a predetermined distance L ₀ set and stored in advance.

Then, as shown in FIG. 6, the mask stage drive control unit 45 shown in FIG. 7 is set so that the distance L between the substrate side alignment mark 23 and the reference mark 20a becomes L ₀ or L ₀ ± x (x is an allowable value). As a result, the alignment mechanism (not shown) is driven and controlled, the mask stage 6 is moved, and the photomask 15 held on the mask stage 6 is moved in the directions of arrows X and Y. Thus, the fact that the reference position R ₂ of the reference position R ₁ and the color filter glass substrate 1 of the photo mask 15 is matched within a predetermined tolerance.

  Next, the alignment confirmation mark 47 of the color filter glass substrate 1 is imaged by the imaging means 12 through the viewing window 19 of the photomask 15. Then, the cell number of the light receiving element of the line CCD 33 that detects each alignment confirmation mark 47 and the cell number of the light receiving element of the line CCD 33 that detects each mask-side alignment mark 20 of the photomask 15 are read. The average cell number is calculated. The average value is compared with the cell number of the light receiving element of the line CCD 33 that has detected the substrate-side alignment mark 23 of the color filter glass substrate 1 immediately after alignment adjustment, and when both coincide with each other within a predetermined allowable range. Then, it is determined that the alignment has been performed reliably, and exposure light is irradiated onto the photomask 15. Thereby, the image of the mask pattern 18 of the photomask 15 is transferred onto the pixels 22 of the color filter glass substrate 1. If the average value does not match the cell number, for example, the color filter glass substrate 1 is determined to be of a different type or a defective product of the black matrix 21, and in this case, the exposure is stopped. Alarm.

Thereafter, the captured image data and the image processing unit look-up table reference position R ₂ of the glass substrate 1 for a color filter stored in the storage unit not shown of (LUT) in the imaging unit 13 are compared, a reference position _{R 2} is detected. Then, the cell number of the light receiving elements of the line CCD33 detected the reference position R _2, and cell number of the light receiving elements of the line CCD33 detecting the reference mark 20a of the photomask 15 are compared, both the distance L is L ₀ Alternatively, the photomask 15 is slightly moved in the directions of arrows X and Y so that L ₀ ± x. In addition, the photomask 15 is rotated and adjusted with its center as the central axis as necessary. Thereby, even if the glass substrate 1 for color filters is conveyed while swinging in a direction orthogonal to the conveyance direction indicated by the arrow A, the photomask 15 moves following the movement. Thus, the mask pattern 18 of the photomask 15 is transferred to the conveyed color filter glass substrate 1, and the stripe-shaped exposure pattern row 4 is accurately formed on the predetermined pixels 22 of the color filter glass substrate 1. The Rukoto.

Next, in the exposure apparatus of the present invention, the exposure stop operation for the non-exposure area will be described with reference to FIGS. Here, as shown in FIG. 2, for example, a width G ₁ of the first inter-cell area 3a as a non-exposure region the second and third inter-cell area 3b, larger than the width G ₂ of 3c, For example, the color filter glass substrate 1 formed in a relationship of G ₂ <G ₁ <2G ₂ is used, and the first to third inter-cell regions 3a to 3c and the fourth exposure region 2d are exposed. The case where no is performed will be described.

First, in step S1 shown in FIG. 8, the position data of the terminal portions E1 to E4 of the first to fourth exposure regions 2a to 2d of the color filter glass substrate 1 shown in FIG. 2 is shown in FIG. Input by the input means 36 and stored in the storage unit 37. Further, data of the width G ₁ of the first non-exposure area, the width G ₂ of the _second non-exposure area, and the width G ₃ of the third non-exposure area shown in FIG. The data of the widths G _{1 to} G ₃ of the non-exposure area is divided by the magnification M of the condenser lens 9 to calculate the width g _x of the light shielding unit 24 and stored in the storage unit 37.

  Next, in step S2, the color filter glass substrate 1 is placed on the upper surface 5a of the stage 5 and conveyed at a predetermined speed V in the direction of arrow A shown in FIG. At this time, as shown in FIG. 9A, the shutter 11 is stopped with the center of the first slit 28a aligned with the optical axis center of the exposure light.

  In step S3, when the substrate-side alignment mark 23 of the color filter glass substrate 1 shown in FIG. 2 is detected, the light source 7 is turned on after a predetermined time has elapsed, as shown in FIG. 10 (e) or FIG. Exposure to the first exposure region 2a is executed.

  In step S4, it is determined whether or not the end of the exposure area has been detected. In this case, the control unit 46 monitors the position information input from the position detection sensor 40 of the transport unit 14 and compares it with the position data at the end of the exposure area read from the storage unit 37. “YES” is determined, and an exposure region end detection signal shown in FIG. 10B is sent to the shutter main body drive control unit 41 and the moving light shielding piece drive control unit 43. Here, first, the end E1 of the first exposure region 2a is detected. Then, the process proceeds to step S5.

  In step S5, the control unit 46 determines whether or not the detected end portion is the last one. That is, it is determined whether or not the detected end portion is the end portion E4 of the fourth exposure region 2d. In this case, as shown in FIG. 9 (a), the terminal end E1 is not the last one, so the determination is “NO” and the process proceeds to step S6.

In step S6, the width g _x (= G / M) of the light shielding unit 24 of the shutter 11 corresponding to the width G of the non-exposure area is read from the storage unit 37, and the control unit 46 determines whether or not g _x <2g. To do.

Here, first, the width g _x (= G ₁ / M) of the light shielding unit 24 corresponding to the width G ₁ of the first non-exposure region is read from the storage unit 37. In this case, the first non-exposed areas, since corresponding to the first inter-cell area 3a as shown in FIG. 2, the width _{G 1} is _G 2 _<G 1 <2G ₂ as described above. Accordingly, the width g _x (= G ₁ / M) of the light shielding unit 24 at this time is g _x <2 g (= 2G ₂ / M), and “YES” determination is made, and the process proceeds to step S7.

In step S7, the movement amount (g _x -g) of the moving light shielding piece 26 is calculated by the calculation unit 38 shown in FIG. Here, first, (G ₁ / M−g) is calculated, and as shown in FIG. 9 (a) or FIG. 10 (d), the moving light-shielding piece 26 is (G ₁ / M−g) in the direction of arrow a. Moved.

In step S8, as shown in FIG. 9B or FIG. 10C, the shutter main body 25 is moved at the speed v (= V) with the moving light-shielding piece 26 moved by (G ₁ / Mg). / M) to move in the direction of arrow B. As a result, the light shielding portion 24 of the shutter 11 moves in synchronization with the passage of the first non-exposure region (first inter-cell region 3a) below the mask pattern 18 of the photomask 15, and the exposure light is transmitted. It will be shielded from light. Then, as shown in FIG. 9C or FIG. 10C, the shutter 11 stops when it moves a distance 2g. Then, the process proceeds to step S9.

In step S9, as shown in FIG. 9D or FIG. 10D, the moving light shielding piece 26 is moved in the arrow b direction at the speed v. Then, as shown in FIG. 9E or FIG. 10D, when the moving light shielding piece 26 moves by a distance (G ₁ / Mg) and returns to the original state, the moving light shielding piece 26 is stopped. Thereby, as shown in FIG.10 (e) or FIG. 11, the exposure with respect to the 1st non-exposure area | region (1st area | region 3a between cells) can be stopped.

  Next, step S4 is executed again, and exposure is performed on the second exposure region 2b as shown in FIG. 10E or FIG. 11 until the end E2 of the second exposure region 2b is detected. Done. And if the said termination | terminus part E2 is detected, it will progress to step S5. In this case, since the end E2 is not the last one, “YES” determination is made, and the process proceeds to step S6.

Here, the second non-exposed region is a region 3b between the second cell, since its width is _{G 2,} the width _{g x} of the light-shielding portion 24 of the shutter 11 and the corresponding g _{(= G} 2 / M). Therefore, since g _x <2 g, step S6 is “YES” determination.

In step S7, the movement amount (g _x -g) of the moving light shielding piece 26 is calculated. In this case, since g _x = g as described above, the moving amount (g _x −g) of the moving light shielding piece 26 is zero. Therefore, as shown in FIG. 10D, the moving light shielding piece 26 is not moved. Then, in step S8, the shutter main body 25 is moved in the direction of arrow B at the speed v, so that the second inter-cell region which is the second non-exposure region as shown in FIG. The exposure to 3b is stopped. In step S7, since the moving light shielding piece 26 is not moved, the moving light shielding piece 26 in step S9 is not moved in the b direction.

  Next, returning to step S4, as shown in FIG. 10E or FIG. 11, until the end E3 of the third exposure area 2d is detected, the third exposure area 2d is detected. Exposure is performed. And if the said termination | terminus part E3 is detected, it will progress to step S5. Also in this case, since the terminal end E3 is not the final end, the process proceeds to step S6.

Here, as shown in FIG. 2, the third non-exposure area is the third inter-cell area 3c and the fourth exposure area 2d, and the width G ₃ thereof is G ₃ > 2G ₂ . Accordingly, the width g _x (= G ₃ / M) of the light shielding portion 24 of the shutter 25 corresponding to the width G ₃ of the third non-exposure region is g _x > 2g (= 2G ₂ / M), and step S6. Is “NO” determination and the process proceeds to step S10.

  In step S10, the moving light shielding piece 26 is moved in the direction a by g as shown in FIG. 5 or FIG. 10 (d) to completely cover the fourth slit 28d.

  In step S11, the shutter main body 25 is moved by a distance 2g in the direction of arrow B shown in FIG. Thereafter, step S4 is executed until the end E4 of the fourth exposure area 2d is detected, and as shown in FIG. 10E or 11, the third non-exposure area, that is, the third Exposure to the inter-cell region 3c and the fourth exposure region 2d is stopped. And if the said termination | terminus part E4 is detected, it will progress to step S5.

  In this case, since the end portion E4 is the last one, step S5 is “YES” determination, the process proceeds to step S12, the light source 7 is turned off, and the exposure to the color filter glass substrate 1 is completed.

  If, for example, two exposure optical systems 31 are arranged in a direction orthogonal to the transport direction (arrow A direction) in a plane parallel to the upper surface 5a of the stage 5, the first to fourth exposure regions 2a are arranged. The exposure can be performed simultaneously on the exposure region 2 next to 2d.

In the above description, the case where the width G _{1 of} the first inter-cell region (first non-exposure region) 3a is G ₂ <G ₁ <2G ₂ has been described, but G ₁ > 2G ₂ There may be. In this case, since g _x (= G ₁ / M) is g _x > 2 g (= 2G ₂ / M), step S6 is “NO” and the process proceeds to step S10. In step S10, the movable light-shielding piece 26 is moved in the direction a by g to close the first slit 28a. In this state, the shutter body 25 is moved at a speed v by 2g in the direction of arrow B shown in FIG. Move and stop. Here, when the start end portion of the second exposure area 2b is detected, if the moving light shielding piece 26 is moved at the speed v in the direction of the arrow b, the exposure of the first inter-cell area 3a is stopped and the next Exposure to the second exposure region 2b can be started.

  In the above embodiment, the case where the photo integrator 8 is disposed between the light source 7 and the imaging lens 10 has been described. However, the present invention is not limited to this, and the photo integrator 8 may not be provided. In this case, the imaging lens 10 may be disposed so as to form an image of the light source 7 in the vicinity of the front focal point of the condenser lens 9.

  FIG. 12 is a front view showing a schematic configuration of the second embodiment of the exposure apparatus according to the present invention. In this exposure apparatus, a glass substrate 1 for color filter in which a plurality of exposure regions 2a to 2d as shown in FIG. 2 are set in at least one line is placed on the upper surface 5a, and the plurality of exposure regions 2a to 2d are arranged. A stage 5 that transports the color filter glass substrate 1 in a setting direction, and a photomask 15 that is disposed above the stage 5 and forms a predetermined exposure pattern array is close to the color filter glass substrate 1. A mask stage 6 that is held in place, a light source 7 that is constantly lit during the exposure period for the color filter glass substrate 1 and that irradiates the photomask 15 held on the mask stage 6 with exposure light, and the mask stage 6. A photo integrator 8 disposed between the light source 7 and uniforming the luminance distribution of the exposure light applied to the photo mask 15; A condenser lens 9 disposed between the stage 6 and the photo integrator 8 and having a front focal point positioned in the vicinity of the end face 8a of the photo integrator 8 to irradiate the photo mask 15 with parallel exposure light; and the mask The first to third inter-cell regions 3a to 3c are disposed between the stage 6 and the condenser lens 9 and sequentially pass under the photomask 15 by the conveyance of the color filter glass substrate 1. A shutter 11 that moves in synchronization and switches between irradiation and shielding of exposure light. The shutter 11 shields exposure light according to the width of the first to third inter-cell regions 3a to 3c. The width can be changed. The photo integrator 8 may be omitted. In this case, the front focal point of the condenser lens 9 is disposed so as to be positioned in the vicinity of the condensing point of the light source 7.

Here, the shutter 11 forms a light shielding portion 24 by overlapping a plurality of light shielding members, and a plurality of sets of the light shielding portions 24 are arranged at predetermined intervals along the conveyance direction indicated by the arrow A of the color filter glass substrate 1. The moving light-shielding piece 26 with respect to the first to third fixed light-shielding pieces 29a to 29c among the plurality of light-shielding members of the respective light-shielding portions 24 is provided in a direction opposite to the conveying direction of the color filter glass substrate 1 (same figure The width g _x of the light-shielding portion 24 can be changed by moving in the direction of arrow b shown in FIG.

  The shutter 11 moves the movable light-shielding piece 26 by a predetermined amount in the direction opposite to the conveyance direction of the color filter glass substrate 1 (in the direction of arrow b) with respect to the first to third fixed light-shielding pieces 29a to 29c. In this state, the first to third inter-cell regions 3a to 3c can move in the transport direction (arrow A direction) of the color filter glass substrate 1 in synchronization with passing under the photomask 15. It has become.

  A specific configuration example of the shutter 11 is the same as that shown in FIG. 5, and first to fourth slits 28 a to 28 d are formed in the shutter body portion 25 of an opaque plate material, and the first to fourth slits are formed. Between the slits 28a to 28d, first to third fixed light-shielding pieces 29a to 29c are arranged thereon, the moving light-shielding pieces 26 are arranged thereon, and the moving light-shielding piece drive unit (not shown) that moves each moving light-shielding piece 26 individually. It has.

In this case, unlike the first embodiment, since the condenser lens 9 is not interposed between the shutter 11 and the color filter glass substrate 1, the first to third fixed-side light shielding pieces 29a to 29c are used. 2 is the narrowest of the first to third inter-cell regions 3a to 3c of the color filter glass substrate 1 shown in FIG. 2, for example, the width of the second and third inter-cell regions 3b and 3c. The same width as G ₂ (g = G ₂ ) or the same width as the width of the narrowest inter-cell region among the various color filter glass substrates. The width w in the direction orthogonal to the moving direction of the first to fourth slits 28a to 28d is substantially the same as the total width W of the plurality of mask patterns 18 of the photomask 15 shown in FIG. 3 (w = W). Formed. Furthermore, the moving speed v in the direction of arrow A is set to be the same as the transport speed V of the color filter glass substrate 1 (v = V).

  In the first and second embodiments, the widths of the first to fourth lits 28 a to 28 d in the moving direction of the shutter 11 are set to the first to third fixed light shielding pieces 29 a to 29 c and the moving light shielding piece 26. However, the present invention is not limited to this, and the widths of the slits 28a to 28d may be larger than the width g of each light shielding piece.

  In the first and second embodiments described above, the first to third fixed light shielding pieces 29a to 29b are formed between the slits of the plurality of slits formed in the shutter main body 25 by the shutter 11, and moved in a superimposed manner. The case where the light shielding pieces 26 are provided has been described. However, the present invention is not limited to this, and a plurality of sets of light shielding members are provided at a predetermined interval along the conveyance direction of the glass substrate 1 for color filters as a set. It may be a thing. Alternatively, the shutter 11 is formed with a plurality of light shielding films such as Cr formed in a predetermined shape on a glass substrate at a predetermined interval, and the light shielding width of the exposure light by the light shielding film can be changed according to the width of the inter-cell region. As described above, a plurality of the glass substrates may be overlapped.

  Furthermore, the shutter 11 may be provided with a set of a plurality of light-shielding members superimposed. In this case, the shutter 11 is returned to the original position at high speed every time the inter-cell region of the color filter glass substrate 1 is shielded from light.

  Furthermore, in the above description, the case where the shutter 11 is formed by superimposing a plurality of light shielding members has been described. However, the present invention is not limited to this, and the shutter 11 may be configured so that the light shielding width can be changed. Any configuration may be used.

  In the above description, the case where the object to be exposed is the color filter glass substrate 1 has been described. However, the present invention is not limited to this, and any substrate that forms the stripe-shaped exposure pattern row 4 in the plurality of exposure regions 2 may be used. Anything may be used.

It is a front view which shows schematic structure of 1st Embodiment of the exposure apparatus by this invention. It is a top view which shows an example of the some exposure area | region set to the glass substrate for color filters used in the said exposure apparatus. It is a top view which shows one structural example of the photomask used in the said exposure apparatus. It is a top view which shows the example of 1 structure of the glass substrate for color filters used in the said exposure apparatus. It is a figure which shows one structural example of the shutter used in the said exposure apparatus, (a) is a top view, (b) is the OO sectional view taken on the line of (a). It is explanatory drawing which shows position alignment with the said photomask and the glass substrate for color filters. It is a block diagram which shows the drive control means of the said exposure apparatus. It is a flowchart explaining the exposure stop operation | movement to a non-exposure area | region in the said exposure apparatus. It is explanatory drawing which shows the exposure stop operation | movement with respect to the 1st non-exposure area | region of the glass substrate for color filters in the exposure operation | movement by the said exposure apparatus. It is a timing chart explaining the operation | movement of a shutter synchronized with the several exposure area | region of the said glass substrate for color filters passing under the photomask sequentially, and exposure and exposure stop. It is a top view which shows the state by which the exposure to several non-exposure area | region was stopped in the example of formation of the exposure pattern row | line | column by the said exposure apparatus. It is a front view which shows schematic structure of 2nd Embodiment of the exposure apparatus by this invention. It is a top view which shows the example of formation of the exposure pattern row | line | column by the conventional exposure apparatus.

Explanation of symbols

1 ... Glass substrate for color filter (exposed body)
2, 2a to 2d ... exposure area 3a to 3c ... first to third inter-cell area (a part between adjacent exposure areas in a plurality of exposure areas)
4 ... Exposure pattern row 5 ... Stage 6 ... Mask stage 7 ... Light source 8 ... Photo integrator 9 ... Condenser lens (condensing lens)
DESCRIPTION OF SYMBOLS 10 ... Imaging lens 11 ... Shutter 15 ... Photomask 18 ... Mask pattern 24 ... Light-shielding part 25 ... Shutter main-body part 26 ... Moving light-shielding piece (other light-shielding member)
28a-28d ... 1st-4th slit 29a-29c ... 1st-3rd fixed light-shielding piece (one light-shielding member)

Claims (9)

A stage for placing an exposure object set with a plurality of exposure areas arranged in at least one line on the upper surface, and transporting the exposure object in a setting direction of the plurality of exposure areas;
A mask stage that is disposed above the stage and holds a photomask for forming a predetermined exposure pattern row in close proximity to the object to be exposed;
A light source that is constantly lit during an exposure period for the object to be exposed, and that irradiates exposure light onto a photomask held on the mask stage;
A condensing lens disposed between the mask stage and the light source, which converts the exposure light applied to the photomask into parallel light;
An imaging lens that is disposed between the light source and the condenser lens and forms an image of the light source on the front side of the condenser lens;
Arranged in the vicinity of the image formation position of the image of the light source by the imaging lens, and the portions between the adjacent exposure areas in the plurality of exposure areas are successively transferred to the lower side of the photomask by the conveyance of the exposure object. A shutter that moves in synchronization with passing and switches between irradiation of exposure light and shielding of light; and
The exposure apparatus according to claim 1, wherein the shutter is configured such that a width for shielding exposure light can be changed in accordance with a width of a portion between the adjacent exposure regions. A stage for placing an exposure object set with a plurality of exposure areas arranged in at least one line on the upper surface, and transporting the exposure object in a setting direction of the plurality of exposure areas;
A mask stage that is disposed above the stage and holds a photomask for forming a predetermined exposure pattern row in close proximity to the object to be exposed;
A light source that is constantly lit during an exposure period for the object to be exposed, and that irradiates exposure light onto a photomask held on the mask stage;
A photo integrator that is disposed between the mask stage and the light source and uniformizes a luminance distribution of exposure light applied to the photo mask;
A condensing lens disposed between the mask stage and a photo integrator, which converts exposure light applied to the photo mask into parallel light;
An imaging lens that is disposed between the photo integrator and the condenser lens, and forms an end face image of the photo integrator on the near side of the condenser lens;
Arranged near the imaging position of the end face image of the photo integrator by the imaging lens, the portion between the exposure areas adjacent to each other in the plurality of exposure areas by the transport of the exposure object is below the photomask. A shutter that moves in synchronization with sequential passage of light and switches between irradiation of exposure light and shielding of light,
The exposure apparatus according to claim 1, wherein the shutter is configured such that a width for shielding exposure light can be changed in accordance with a width of a portion between the adjacent exposure regions.   The shutter forms a light shielding portion by overlapping a plurality of light shielding members, and the light shielding width can be changed by moving another light shielding member in the conveyance direction of the object to be exposed with respect to one of the light shielding members. The exposure apparatus according to claim 1 or 2, wherein   The shutter forms a light shielding portion by overlapping a plurality of light shielding members, and a plurality of sets of the light shielding portions are provided at predetermined intervals along the conveyance direction of the object to be exposed. 3. The exposure apparatus according to claim 1, wherein the light shielding width can be changed by moving another light shielding member in the conveying direction of the object to be exposed with respect to one light shielding member.   The shutter is configured such that a portion between adjacent exposure regions of the object to be exposed is the photo element in a state in which another light shielding member is moved by a predetermined amount in the conveyance direction of the object to be exposed with respect to the one light shielding member. 5. An exposure apparatus according to claim 3, wherein the exposure apparatus is movable in a direction opposite to a conveying direction of the object to be exposed in synchronization with passing under the mask. A stage for placing an exposure object set with a plurality of exposure areas arranged in at least one line on the upper surface, and transporting the exposure object in a setting direction of the plurality of exposure areas;
A mask stage that is disposed above the stage and holds a photomask for forming a predetermined exposure pattern row in close proximity to the object to be exposed;
A light source that is constantly lit during an exposure period for the object to be exposed, and that irradiates exposure light onto a photomask held on the mask stage;
A condensing lens disposed between the mask stage and the light source, which converts the exposure light applied to the photomask into parallel light;
The portion between the exposure areas disposed between the mask stage and the condensing lens and passing through the exposure object sequentially passes under the photomask. A shutter that moves synchronously and switches between irradiation of exposure light and shielding of light; and
The exposure apparatus according to claim 1, wherein the shutter is configured such that a width for shielding exposure light can be changed in accordance with a width of a portion between the adjacent exposure regions.   The shutter forms a light-shielding portion by overlapping a plurality of light-shielding members, and moves the other light-shielding member with respect to one of the light-shielding members in a direction opposite to the conveying direction of the object to be exposed. The exposure apparatus according to claim 6, wherein the exposure apparatus can be changed.   The shutter forms a light shielding portion by overlapping a plurality of light shielding members, and a plurality of sets of the light shielding portions are provided at predetermined intervals along the conveyance direction of the object to be exposed. 7. The exposure apparatus according to claim 6, wherein the light shielding width can be changed by moving another light shielding member with respect to one light shielding member in a direction opposite to a conveying direction of the object to be exposed.   The shutter is a portion between adjacent exposure regions of the object to be exposed in a state where another light shielding member is moved by a predetermined amount in the direction opposite to the conveying direction of the object to be exposed with respect to the one light shielding member. 9. The exposure apparatus according to claim 7, wherein the exposure apparatus is movable in the transport direction of the object to be exposed in synchronization with passing under the photomask.

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