JP2007266504A - 露光装置 - Google Patents

露光装置 Download PDF

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Publication number
JP2007266504A
JP2007266504A JP2006092338A JP2006092338A JP2007266504A JP 2007266504 A JP2007266504 A JP 2007266504A JP 2006092338 A JP2006092338 A JP 2006092338A JP 2006092338 A JP2006092338 A JP 2006092338A JP 2007266504 A JP2007266504 A JP 2007266504A
Authority
JP
Japan
Prior art keywords
substrate
liquid
exposure apparatus
coplanar
wafer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2006092338A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007266504A5 (enExample
Inventor
Keiji Emoto
圭司 江本
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Priority to JP2006092338A priority Critical patent/JP2007266504A/ja
Priority to TW096108637A priority patent/TW200739278A/zh
Priority to US11/685,449 priority patent/US7705969B2/en
Priority to KR1020070026552A priority patent/KR100883810B1/ko
Publication of JP2007266504A publication Critical patent/JP2007266504A/ja
Publication of JP2007266504A5 publication Critical patent/JP2007266504A5/ja
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/42—Projection printing apparatus, e.g. enlarger, copying camera for automatic sequential copying of the same original
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03D—APPARATUS FOR PROCESSING EXPOSED PHOTOGRAPHIC MATERIALS; ACCESSORIES THEREFOR
    • G03D3/00—Liquid processing apparatus involving immersion; Washing apparatus involving immersion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/67005—Apparatus not specifically provided for elsewhere
    • H01L21/67242—Apparatus for monitoring, sorting or marking
    • H01L21/67248—Temperature monitoring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
JP2006092338A 2006-03-29 2006-03-29 露光装置 Withdrawn JP2007266504A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP2006092338A JP2007266504A (ja) 2006-03-29 2006-03-29 露光装置
TW096108637A TW200739278A (en) 2006-03-29 2007-03-13 Exposure apparatus
US11/685,449 US7705969B2 (en) 2006-03-29 2007-03-13 Exposure apparatus
KR1020070026552A KR100883810B1 (ko) 2006-03-29 2007-03-19 노광장치

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006092338A JP2007266504A (ja) 2006-03-29 2006-03-29 露光装置

Publications (2)

Publication Number Publication Date
JP2007266504A true JP2007266504A (ja) 2007-10-11
JP2007266504A5 JP2007266504A5 (enExample) 2009-05-14

Family

ID=38558376

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006092338A Withdrawn JP2007266504A (ja) 2006-03-29 2006-03-29 露光装置

Country Status (4)

Country Link
US (1) US7705969B2 (enExample)
JP (1) JP2007266504A (enExample)
KR (1) KR100883810B1 (enExample)
TW (1) TW200739278A (enExample)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008172214A (ja) * 2006-12-08 2008-07-24 Asml Netherlands Bv 基板支持体およびリソグラフィプロセス
JP2016189027A (ja) * 2012-05-29 2016-11-04 エーエスエムエル ネザーランズ ビー．ブイ． 支持装置、リソグラフィ装置及びデバイス製造方法
JP2017032999A (ja) * 2012-05-29 2017-02-09 エーエスエムエル ネザーランズ ビー．ブイ． オブジェクトホルダ及びリソグラフィ装置

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SG188899A1 (en) * 2004-09-17 2013-04-30 Nikon Corp Substrate holding device, exposure apparatus, and device manufacturing method
US7433016B2 (en) * 2005-05-03 2008-10-07 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP5020662B2 (ja) 2006-05-26 2012-09-05 キヤノン株式会社 ステージ装置、露光装置、及びデバイス製造方法
US20080198346A1 (en) * 2007-02-16 2008-08-21 Canon Kabushiki Kaisha Exposure apparatus and method for manufacturing device
US20080198348A1 (en) * 2007-02-20 2008-08-21 Nikon Corporation Apparatus and methods for minimizing force variation from immersion liquid in lithography systems
US8514365B2 (en) * 2007-06-01 2013-08-20 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2010140958A (ja) * 2008-12-09 2010-06-24 Canon Inc 露光装置及びデバイス製造方法
NL2005874A (en) * 2010-01-22 2011-07-25 Asml Netherlands Bv A lithographic apparatus and a device manufacturing method.
JP5918965B2 (ja) 2011-10-25 2016-05-18 キヤノン株式会社 加工機システム及び加工機の配置方法
JP5943742B2 (ja) * 2012-07-04 2016-07-05 三菱電機株式会社 半導体試験治具およびそれを用いた半導体試験方法
US10578959B2 (en) 2015-04-29 2020-03-03 Asml Netherlands B.V. Support apparatus, lithographic apparatus and device manufacturing method
NL2017014A (en) 2015-06-23 2016-12-29 Asml Netherlands Bv A Support Apparatus, a Lithographic Apparatus and a Device Manufacturing Method
CN121002449A (zh) * 2023-03-13 2025-11-21 Asml荷兰有限公司 衬底支撑件和光刻设备

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2002158154A (ja) 2000-11-16 2002-05-31 Canon Inc 露光装置
US7372541B2 (en) 2002-11-12 2008-05-13 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
DE60335595D1 (de) 2002-11-12 2011-02-17 Asml Netherlands Bv Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
US7110081B2 (en) 2002-11-12 2006-09-19 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN101713932B (zh) 2002-11-12 2012-09-26 Asml荷兰有限公司 光刻装置和器件制造方法
TWI232357B (en) 2002-11-12 2005-05-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
CN101382738B (zh) 2002-11-12 2011-01-12 Asml荷兰有限公司 光刻投射装置
SG121822A1 (en) 2002-11-12 2006-05-26 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4529433B2 (ja) 2002-12-10 2010-08-25 株式会社ニコン 露光装置及び露光方法、デバイス製造方法
KR20120127755A (ko) 2002-12-10 2012-11-23 가부시키가이샤 니콘 노광장치 및 디바이스 제조방법
TWI295414B (en) 2003-05-13 2008-04-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
US7213963B2 (en) 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005072132A (ja) 2003-08-21 2005-03-17 Nikon Corp 露光装置及びデバイス製造方法
TWI263859B (en) 2003-08-29 2006-10-11 Asml Netherlands Bv Lithographic apparatus and device manufacturing method
JP4747263B2 (ja) * 2003-11-24 2011-08-17 カール・ツァイス・エスエムティー・ゲーエムベーハー オブジェクティブにおける光学素子のための保持装置
SG2014014955A (en) * 2003-12-03 2014-07-30 Nippon Kogaku Kk Exposure apparatus, exposure method, method for producing device, and optical part
JP2005175016A (ja) * 2003-12-08 2005-06-30 Canon Inc 基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
US7227619B2 (en) * 2004-04-01 2007-06-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP2005302880A (ja) 2004-04-08 2005-10-27 Canon Inc 液浸式露光装置
JP2007123525A (ja) * 2005-10-27 2007-05-17 Toshiba Corp 液浸露光装置及び半導体装置の製造方法
US7787101B2 (en) * 2006-02-16 2010-08-31 International Business Machines Corporation Apparatus and method for reducing contamination in immersion lithography
US20080198346A1 (en) * 2007-02-16 2008-08-21 Canon Kabushiki Kaisha Exposure apparatus and method for manufacturing device

Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008172214A (ja) * 2006-12-08 2008-07-24 Asml Netherlands Bv 基板支持体およびリソグラフィプロセス
JP2016189027A (ja) * 2012-05-29 2016-11-04 エーエスエムエル ネザーランズ ビー．ブイ． 支持装置、リソグラフィ装置及びデバイス製造方法
JP2017032999A (ja) * 2012-05-29 2017-02-09 エーエスエムエル ネザーランズ ビー．ブイ． オブジェクトホルダ及びリソグラフィ装置
US9785055B2 (en) 2012-05-29 2017-10-10 Asml Netherlands B.V. Object holder and lithographic apparatus
US9915877B2 (en) 2012-05-29 2018-03-13 Asml Netherlands B.V. Object holder and lithographic apparatus
JP2018136560A (ja) * 2012-05-29 2018-08-30 エーエスエムエル ネザーランズ ビー．ブイ． オブジェクトホルダ及びリソグラフィ装置
US10120292B2 (en) 2012-05-29 2018-11-06 Asml Netherlands, B.V. Support apparatus, lithographic apparatus and device manufacturing method
US10481502B2 (en) 2012-05-29 2019-11-19 Asml Netherlands B.V. Object holder and lithographic apparatus
US10747125B2 (en) 2012-05-29 2020-08-18 Asml Netherlands B.V. Support apparatus, lithographic apparatus and device manufacturing method

Also Published As

Publication number Publication date
US20070229787A1 (en) 2007-10-04
TW200739278A (en) 2007-10-16
KR20070098527A (ko) 2007-10-05
US7705969B2 (en) 2010-04-27
KR100883810B1 (ko) 2009-02-16

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