JP2007194126A - 走査電子顕微鏡 - Google Patents
走査電子顕微鏡 Download PDFInfo
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- JP2007194126A JP2007194126A JP2006012744A JP2006012744A JP2007194126A JP 2007194126 A JP2007194126 A JP 2007194126A JP 2006012744 A JP2006012744 A JP 2006012744A JP 2006012744 A JP2006012744 A JP 2006012744A JP 2007194126 A JP2007194126 A JP 2007194126A
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- 230000000979 retarding effect Effects 0.000 claims abstract description 19
- 238000010894 electron beam technology Methods 0.000 claims description 42
- 239000011810 insulating material Substances 0.000 claims description 3
- 238000005259 measurement Methods 0.000 abstract description 19
- 230000003287 optical effect Effects 0.000 abstract description 6
- 239000000523 sample Substances 0.000 description 72
- 235000012431 wafers Nutrition 0.000 description 38
- 230000001133 acceleration Effects 0.000 description 14
- 238000000605 extraction Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 6
- 208000031427 Foetal heart rate deceleration Diseases 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 239000004065 semiconductor Substances 0.000 description 4
- 238000010586 diagram Methods 0.000 description 3
- 238000001514 detection method Methods 0.000 description 2
- 230000002411 adverse Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 230000005284 excitation Effects 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
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Classifications
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
- G01N23/2251—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion using incident electron beams, e.g. scanning electron microscopy [SEM]
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/004—Charge control of objects or beams
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/21—Focus adjustment
- H01J2237/216—Automatic focusing methods
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24564—Measurements of electric or magnetic variables, e.g. voltage, current, frequency
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Testing Or Measuring Of Semiconductors Or The Like (AREA)
Abstract
【解決手段】試料上方に配置されるリタ−ディング電圧を印加するための電極板を2つの部分に分割し、分割した各々の電極の電位を切り替えることにより、両電極板間の静電容量から試料の帯電電圧を測定し、当該測定結果に基づいて光学系を制御する。
【選択図】図1
Description
事前準備
(1)Bareウェーハでの静電容量を算出する。 C=Q/V・・・式1
(2)BareウェーハでのC-V直線を算出する。
実測定時
(3)試料の静電容量を測定する。 C’=Q’/V・・・式2
(4)式1,2よりC’を算出する。 C’=C×Q’/Q・・式3
(CとQは(1)より既知でありQ’は Q’=Itより算出)
(5)C→C’による電圧変動を試料帯電電圧とし、(2)の関係式より算出する。
Q:Bareウェーハの電荷
Q’:試料の電荷
C:Bareウェーハの静電容量
C’:試料の静電容量
V:電圧
I:電流
t:時間
Claims (3)
- 電子線源と、
前記電子線源からの電子線を照射する試料を保持するステージと、
前記電子線を前記ステージに保持された試料上に集束させるための対物レンズと、
前記試料と前記対物レンズとの間に配置された電子線の通過開口を有する電極板と、
前記試料と前記電極板との間に電圧を印加して前記電子線源からの電子線を所望の電圧まで減速させるためのリターディング手段と、
を備えた走査電子顕微鏡において、
前記電極板は2以上の互いに絶縁された領域に分割されており、前記電極板の分割された領域のうち前記試料と電気的に接続された1の領域と他の領域との間の静電容量を測定し、その測定値に基づいて前記試料の帯電電圧を検出することを特徴とする走査電子顕微鏡。 - 前記試料の高さを検出する手段と、
検出された前記試料の高さ情報に基づいて、前記リターディング手段及び前記対物レンズを制御して電子線の前記試料に対するフォーカス合わせを行う手段とをさらに備えていることを特徴とする請求項1に記載の走査電子顕微鏡。 - 前記電極板の分割された領域同士は絶縁材料を介して互いに接続されていることを特徴とする請求項1又は2に記載の走査電子顕微鏡。
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006012744A JP4616180B2 (ja) | 2006-01-20 | 2006-01-20 | 走査電子顕微鏡 |
US11/655,275 US7514683B2 (en) | 2006-01-20 | 2007-01-19 | Scanning electron microscope |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006012744A JP4616180B2 (ja) | 2006-01-20 | 2006-01-20 | 走査電子顕微鏡 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2007194126A true JP2007194126A (ja) | 2007-08-02 |
JP4616180B2 JP4616180B2 (ja) | 2011-01-19 |
Family
ID=38449648
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006012744A Expired - Fee Related JP4616180B2 (ja) | 2006-01-20 | 2006-01-20 | 走査電子顕微鏡 |
Country Status (2)
Country | Link |
---|---|
US (1) | US7514683B2 (ja) |
JP (1) | JP4616180B2 (ja) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009043936A (ja) * | 2007-08-09 | 2009-02-26 | Hitachi High-Technologies Corp | 電子顕微鏡 |
WO2011007517A1 (ja) * | 2009-07-15 | 2011-01-20 | 株式会社 日立ハイテクノロジーズ | 試料電位測定方法、及び荷電粒子線装置 |
CN102288628A (zh) * | 2011-05-18 | 2011-12-21 | 华南理工大学 | 具有智能测控技术的固体材料二次电子发射系数测试装置 |
WO2013187115A1 (ja) * | 2012-06-15 | 2013-12-19 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2011041100A1 (en) * | 2009-09-30 | 2011-04-07 | Carl Zeiss Nts, Llc | Variable energy charged particle systems |
JP6913344B2 (ja) * | 2017-03-27 | 2021-08-04 | 株式会社日立ハイテクサイエンス | 荷電粒子ビーム装置 |
US10096447B1 (en) * | 2017-08-02 | 2018-10-09 | Kla-Tencor Corporation | Electron beam apparatus with high resolutions |
Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56107166A (en) * | 1981-01-23 | 1981-08-25 | Ando Electric Co Ltd | Surfacial electrometer |
JPH09178823A (ja) * | 1995-12-26 | 1997-07-11 | Dainippon Screen Mfg Co Ltd | 非接触電気測定用センサ |
JP2000133194A (ja) * | 1998-10-29 | 2000-05-12 | Hitachi Ltd | 走査形電子顕微鏡 |
JP2000260371A (ja) * | 1999-03-09 | 2000-09-22 | Toshiba Corp | 電子ビーム描画装置用電極及びその製造方法 |
JP2001052642A (ja) * | 1999-08-11 | 2001-02-23 | Toshiba Corp | 走査型電子顕微鏡及び微細パターン測定方法 |
JP2005005151A (ja) * | 2003-06-12 | 2005-01-06 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
Family Cites Families (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH07245075A (ja) | 1994-03-04 | 1995-09-19 | Horon:Kk | 自動焦点合わせ装置 |
JP3014369B2 (ja) | 1998-08-28 | 2000-02-28 | 株式会社日立製作所 | 試料の高さ計測手段を備えた電子ビーム装置 |
-
2006
- 2006-01-20 JP JP2006012744A patent/JP4616180B2/ja not_active Expired - Fee Related
-
2007
- 2007-01-19 US US11/655,275 patent/US7514683B2/en not_active Expired - Fee Related
Patent Citations (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS56107166A (en) * | 1981-01-23 | 1981-08-25 | Ando Electric Co Ltd | Surfacial electrometer |
JPH09178823A (ja) * | 1995-12-26 | 1997-07-11 | Dainippon Screen Mfg Co Ltd | 非接触電気測定用センサ |
JP2000133194A (ja) * | 1998-10-29 | 2000-05-12 | Hitachi Ltd | 走査形電子顕微鏡 |
JP2000260371A (ja) * | 1999-03-09 | 2000-09-22 | Toshiba Corp | 電子ビーム描画装置用電極及びその製造方法 |
JP2001052642A (ja) * | 1999-08-11 | 2001-02-23 | Toshiba Corp | 走査型電子顕微鏡及び微細パターン測定方法 |
JP2005005151A (ja) * | 2003-06-12 | 2005-01-06 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
Cited By (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009043936A (ja) * | 2007-08-09 | 2009-02-26 | Hitachi High-Technologies Corp | 電子顕微鏡 |
WO2011007517A1 (ja) * | 2009-07-15 | 2011-01-20 | 株式会社 日立ハイテクノロジーズ | 試料電位測定方法、及び荷電粒子線装置 |
JP5205515B2 (ja) * | 2009-07-15 | 2013-06-05 | 株式会社日立ハイテクノロジーズ | 試料電位測定方法、及び荷電粒子線装置 |
US9129775B2 (en) | 2009-07-15 | 2015-09-08 | Hitachi High-Technologies Corporation | Specimen potential measuring method, and charged particle beam device |
CN102288628A (zh) * | 2011-05-18 | 2011-12-21 | 华南理工大学 | 具有智能测控技术的固体材料二次电子发射系数测试装置 |
WO2013187115A1 (ja) * | 2012-06-15 | 2013-12-19 | 株式会社 日立ハイテクノロジーズ | 荷電粒子線装置 |
JP2014002835A (ja) * | 2012-06-15 | 2014-01-09 | Hitachi High-Technologies Corp | 荷電粒子線装置 |
KR20140143441A (ko) * | 2012-06-15 | 2014-12-16 | 가부시키가이샤 히다치 하이테크놀로지즈 | 하전 입자선 장치 |
US9324540B2 (en) | 2012-06-15 | 2016-04-26 | Hitachi High-Technologies Corporation | Charged particle beam device |
KR101685274B1 (ko) * | 2012-06-15 | 2016-12-09 | 가부시키가이샤 히다치 하이테크놀로지즈 | 하전 입자선 장치 |
Also Published As
Publication number | Publication date |
---|---|
US7514683B2 (en) | 2009-04-07 |
JP4616180B2 (ja) | 2011-01-19 |
US20070235646A1 (en) | 2007-10-11 |
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