JP2007170958A5 - - Google Patents

Download PDF

Info

Publication number
JP2007170958A5
JP2007170958A5 JP2005368372A JP2005368372A JP2007170958A5 JP 2007170958 A5 JP2007170958 A5 JP 2007170958A5 JP 2005368372 A JP2005368372 A JP 2005368372A JP 2005368372 A JP2005368372 A JP 2005368372A JP 2007170958 A5 JP2007170958 A5 JP 2007170958A5
Authority
JP
Japan
Prior art keywords
flow path
microchip
glass
manufacturing
covered
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005368372A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007170958A (ja
JP4695977B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005368372A priority Critical patent/JP4695977B2/ja
Priority claimed from JP2005368372A external-priority patent/JP4695977B2/ja
Publication of JP2007170958A publication Critical patent/JP2007170958A/ja
Publication of JP2007170958A5 publication Critical patent/JP2007170958A5/ja
Application granted granted Critical
Publication of JP4695977B2 publication Critical patent/JP4695977B2/ja
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JP2005368372A 2005-12-21 2005-12-21 マイクロチップ及びその製造方法 Expired - Fee Related JP4695977B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005368372A JP4695977B2 (ja) 2005-12-21 2005-12-21 マイクロチップ及びその製造方法

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005368372A JP4695977B2 (ja) 2005-12-21 2005-12-21 マイクロチップ及びその製造方法

Publications (3)

Publication Number Publication Date
JP2007170958A JP2007170958A (ja) 2007-07-05
JP2007170958A5 true JP2007170958A5 (enrdf_load_stackoverflow) 2008-12-11
JP4695977B2 JP4695977B2 (ja) 2011-06-08

Family

ID=38297716

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005368372A Expired - Fee Related JP4695977B2 (ja) 2005-12-21 2005-12-21 マイクロチップ及びその製造方法

Country Status (1)

Country Link
JP (1) JP4695977B2 (enrdf_load_stackoverflow)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5137007B2 (ja) * 2007-11-14 2013-02-06 ローム株式会社 マイクロチップ
JP5974429B2 (ja) 2011-07-20 2016-08-23 ソニー株式会社 複合材料構造物及びその製造方法
JP5814054B2 (ja) * 2011-09-26 2015-11-17 信越石英株式会社 微小中空流路を有する石英ガラス物品の製造方法
US10133156B2 (en) 2012-01-10 2018-11-20 Apple Inc. Fused opaque and clear glass for camera or display window
EP2859409B1 (en) * 2012-06-08 2021-07-21 Apple Inc. Fused opaque and clear glass for camera or display window
WO2016121929A1 (ja) * 2015-01-30 2016-08-04 株式会社ニコン 流体デバイス、温度制御装置、温度制御方法、核酸増幅装置および核酸増幅方法
JP7342839B2 (ja) * 2020-10-27 2023-09-12 信越化学工業株式会社 合成石英ガラス基板の加工方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH07114148B2 (ja) * 1987-12-23 1995-12-06 シャープ株式会社 マイクロ波吸収発熱材料
JP4540160B2 (ja) * 1999-12-27 2010-09-08 京セラ株式会社 黒色系焼結石英
JP4773035B2 (ja) * 2000-06-28 2011-09-14 スリーエム イノベイティブ プロパティズ カンパニー 強化サンプル処理装置、システムおよび方法
SE0004297D0 (sv) * 2000-11-23 2000-11-23 Gyros Ab Device for thermal cycling
JP2004053345A (ja) * 2002-07-18 2004-02-19 Tosoh Quartz Corp 平面型フローセル、その製造方法、及び測定方法
JP4411390B2 (ja) * 2004-04-12 2010-02-10 独立行政法人産業技術総合研究所 マイクロ液流制御方法及び制御装置

Similar Documents

Publication Publication Date Title
JP2007170958A5 (enrdf_load_stackoverflow)
WO2006081270A8 (en) Electrokinetic concentration device and methods of use thereof
PL2227829T3 (pl) Udoskonalenia elementów zdolnych do zbierania światła
JP2009066851A5 (enrdf_load_stackoverflow)
FR3011679B1 (fr) Procede ameliore d'assemblage par collage direct entre deux elements, chaque element comprenant des portions de metal et de materiaux dielectriques
JP2009521663A5 (enrdf_load_stackoverflow)
JP2011141265A5 (enrdf_load_stackoverflow)
TW200710932A (en) Baseplate processing equipment, heating device used on the baseplate processing equipment and method for manufacturing semiconductors therewith
DE602005003722D1 (de) Feine Legierungspartikel mit unebenen Oberflächen und zugehöriges Herstellungsverfahren
EP1930474A4 (en) SURFACE CONDITIONING COMPOSITION, PRODUCTION METHOD AND SURFACE CONDITIONING METHOD
RU2015141390A (ru) Спектрометр на основе анализа подвижности ионов (IMS) с камерой переноса заряженных материалов
JP2010219515A5 (enrdf_load_stackoverflow)
JP2008016444A5 (enrdf_load_stackoverflow)
CN104536068A (zh) 一种近红外可调频吸收器
WO2005103226A3 (en) Plasma-enhanced functionalization of inorganic oxide surfaces
TW200631076A (en) Heater for semiconductor manufacturing device
FR2955852B1 (fr) Dispositif microfluideique en verre, ceramique ou vitroceramique, comprenant une couche intermediaire de traitement comprenant au moins une face ayant une surface structuree ouverte definissant un microcanal ferme par une couche formant feuille en verre, ceramique ou vitroceramique essentiellement plane
WO2007044934A3 (en) Methods for characterizing semiconductor material using optical metrology
WO2008048209A3 (en) Functionalization of nanofluidic channels
WO2007099577A3 (en) Method of forming layers of getter material on glass parts
KR101683190B1 (ko) 고온 발열용 마이크로웨이브 발열체
FI20045084A0 (fi) Menetelmä materiaalin työstämiseksi suuritehotiheyksisellä sähkömagneettisella säteilyllä
JP2006032930A5 (enrdf_load_stackoverflow)
JP2010022703A5 (enrdf_load_stackoverflow)
JP2009072446A5 (enrdf_load_stackoverflow)