JP2007066538A - Manufacturing method of organic electroluminescent element - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a manufacturing method of a thin and light-weighted organic EL element which prevents the occurrence of secondary failures due to installation of a flexible sealing member for suppressing dark spots and can secure a long lifetime for a luminance layer, without requiring measures on cost increase and measures on production capacity. <P>SOLUTION: The manufacturing method of an organic EL element pastes together a flexible sealing member through a liquid-sealing agent in the light-emitting region or surrounding of the organic EL element formed on a substrate and seals the organic EL element. The liquid-sealing agent is applied on any of the flexible sealing member or the light-emitting region or surrounding of the light-emitting region, and then the flexible sealing member is mounted on the light-emitting region, and a diffusion inhibited region of the liquid-sealing agent is crimped and held by a first crimping member. Thereafter, by crimping the arrangement position of the liquid-sealing agent using a second crimping member to primarily paste together the flexible sealing member, and then by subjecting the liquid-sealing agent to hardening treatment, the flexible sealing member is pasted together. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a method for producing an organic electroluminescence element (hereinafter also referred to as an organic EL element).

  In recent years, organic EL elements using organic substances have been promising for use as solid light-emitting inexpensive, large-area full-color display elements and writing light source arrays, and active research and development have been promoted. The organic EL element includes a first electrode (anode or cathode) formed on a substrate, an organic compound layer (single layer portion or multilayer portion) containing an organic light emitting material laminated thereon, that is, a light emitting layer, It is a thin film type element having a second electrode (cathode or anode) laminated on the light emitting layer. When a voltage is applied to such an organic EL element, electrons are injected from the cathode and holes are injected from the anode into the organic compound layer. It is known that light is obtained by releasing energy as light when the electrons and holes recombine in the light emitting layer and the energy level returns from the conduction band to the valence band.

  As described above, since the organic EL element is a thin film type element, when an organic EL panel in which one or a plurality of organic EL elements are formed on a substrate is used as a surface light source such as a backlight, a surface light source. It is possible to easily make a device equipped with In addition, when a display device is configured using an organic EL panel in which a predetermined number of organic EL elements as pixels are formed on a substrate as a display panel, the liquid crystal display device has high visibility and no viewing angle dependency. There are benefits that cannot be obtained. The configuration of the organic EL element will be described with reference to FIG.

  FIG. 8 is a schematic cross-sectional view showing an example of the layer structure of the organic EL element.

  In the figure, 1 indicates an organic EL element. The organic EL element 1 has an anode 102, a hole transport layer (hole injection layer) 103, an organic compound layer (light emitting layer) 104, an electron injection layer 105, a cathode 106, an adhesive, and a substrate 101. The agent layer 107 and the flexible sealing member 108 are provided in this order. In the organic EL element shown in this figure, a hole injection layer (not shown) may be provided between the anode 102 and the hole transport layer 103. Further, an electron transport layer (not shown) may be provided between the cathode 106, the organic compound layer (light emitting layer) 104, and the electron injection layer 105. In the organic EL element 1, a gas barrier film (not shown) may be provided between the anode 102 and the substrate 101. Further, a protective layer (not shown) may be provided on the cathode 106.

  The layer configuration of the organic EL element shown in this figure shows an example, but the following configuration can be given as a layer configuration of another typical organic EL element.

(1) Substrate / anode / light emitting layer / electron transport layer / cathode / sealing layer (2) Substrate / anode / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode / sealing layer (3) ) Substrate / anode / hole transport layer (hole injection layer) / emission layer / hole blocking layer / electron transport layer / cathode buffer layer (electron injection layer) / cathode / sealing layer (4) substrate / anode / anode Buffer layer (hole injection layer) / hole transport layer / light emitting layer / hole blocking layer / electron transport layer / cathode buffer layer (electron injection layer) / cathode / sealing layer In the case of an organic EL device, usually the first The electrode (anode) 102 side is the observation side, and the first electrode (anode) 102 includes ITO (mixture of tin oxide and indium oxide), IZO (mixture of zinc oxide and indium oxide), ZnO, SnO ₂ , In ₂ O _3. Etc. are known. Among them, the ITO electrode has a high light transmittance of 90% or more and a low sheet resistance value of 10Ω / □ or less, and is also used as a transparent electrode for liquid crystal displays and solar cells. Further, the IZO electrode has an advantage that a predetermined low resistance value can be obtained without heating the substrate at the time of formation, and the film surface is smoother than the ITO electrode.

  In applying the organic EL element as shown in FIG. 8 to a display device, stable light emission of the three primary colors of RGB is an indispensable condition. However, in an organic EL element, a non-emission point called a dark spot is generated by long-time driving, and the growth of the dark spot is one of the causes for shortening the lifetime of the organic EL element. It is known that a dark spot is generally generated in a size that cannot be seen with the naked eye immediately after driving, and grows by continuous driving using this as a core. Further, it is known that dark spots are generated even in a storage state where driving is not performed and grows with time.

  There are various causes of the dark spot, but external factors include crystallization of the organic layer due to the penetration of moisture and oxygen into the device, peeling of the second electrode, and the like. As internal factors, short spots due to crystal growth of the metal constituting the second electrode, crystallization and deterioration of the organic layer due to heat generation due to light emission, and the like are considered as factors of dark spots.

  As a countermeasure for preventing the occurrence of these dark spots, for example, JP-A-5-182759 and JP-A-5-36475 cover and seal an EL element in a dry nitrogen atmosphere with a metal or glass sealing can. How to do is described. However, since a glass or metal sealing can is used, there is a limit to reducing the thickness and weight of the organic EL element. In addition, in the manufacturing process, a step of encapsulating a desiccant inside the airtight case, a step of applying a photocurable resin to the airtight case, a step of bonding the light transmissive substrate and the airtight case, a step of curing the photocurable resin Therefore, there was a problem in terms of productivity and manufacturing cost.

  Further, as a countermeasure for reducing the occurrence of dark spots and reducing the thickness and weight, for example, in Japanese Patent Application Laid-Open Nos. 2001-307871 and 2002-50470, sealing is performed using a film having a high barrier property such as a metal foil. Describes a method for obtaining a thin and lightweight organic EL device excellent in moisture resistance.

  However, there is a problem that it is difficult to bond the metal foil so that the entire thickness of the adhesive layer is uniform so that the metal foil is held without bending and no bubbles remain in the adhesive layer. . In particular, it was difficult to seal a metal foil having a thickness of 50 μm or less without causing wrinkles or the like. Furthermore, due to the flexibility of the metal foil, it is difficult to keep the sealing surface of the organic EL element after sealing smooth, and therefore the amount of moisture entering from the side surface of the sealed EL element varies from side to side and is stable. It was difficult to produce an organic EL device having moisture resistance.

  Furthermore, a method of using such a film having a high barrier property as a sealing member and sealing without causing wrinkles or the like has been studied. For example, a method of integrating a sealing member by sandwiching and pressing a resin member between a display region formed on a substrate and the sealing member is known (see, for example, Patent Document 1). ).

  However, in the method described in Patent Document 1, there is a concern that the resin member protrudes when pressed and adheres to the external electrode, thereby causing a secondary failure. In addition, a protective wall is provided around the light emitting area (display area) and electrode area formed on the substrate, and a sealing resin is sandwiched between the light emitting area (display area) and the sealing member and pressed. A method for fixing a sealing member is known (for example, see Patent Document 2).

  However, the method described in Patent Document 2 eliminates the secondary failure caused by the protrusion of the sealing resin, but requires additional measures for cost increase and production capacity to increase the number of steps for providing a protective wall. Is concerned.

In such a situation, the occurrence of secondary failure due to the provision of a flexible sealing member to suppress the occurrence of dark spots is prevented, and no cost increase measures or production capacity measures are required, and the long life of the light emitting layer Therefore, development of a method for manufacturing an organic EL element that obtains a thin and lightweight organic EL element is desired.
JP 2002-216950 A JP 2004-31226 A

  The present invention has been made in view of the above situation, and its purpose is to prevent the occurrence of secondary failure due to the provision of a flexible sealing member for suppressing the occurrence of dark spots, to prevent cost increase, and to increase production capacity. It is an object of the present invention to provide a method for producing a thin and lightweight organic EL element that requires no measures and can extend the life of the light emitting layer.

  The above object of the present invention has been achieved by the following constitution.

  (1) A step of sequentially forming at least a first electrode layer, an organic compound layer including a light emitting layer, a cathode layer including a second electrode, and a sealing layer on a substrate, and forming a sealing layer Is a method of manufacturing an organic electroluminescent element in which a flexible sealing member is bonded and disposed around a light emitting region and a periphery via a liquid sealant, wherein the liquid sealant is at least flexible. On the light emitting region formed on the substrate, after coating the flexible sealing member on the light emitting region formed on the substrate or on the periphery of the light emitting region. The liquid sealing agent diffusion prohibition region is pressure-bonded and held by the first pressure-bonding member from above the flexible sealing member, and the liquid sealing agent is disposed by pressure-bonding by the second pressure-bonding member. Primary attachment of the flexible sealing member After, the liquid sealing agent was cured, method of manufacturing an organic electroluminescent device, which comprises laminating the flexible sealing member.

(2) The method of manufacturing an organic electroluminescence element according to (1), wherein the Young's modulus of the first pressure-bonding member that contacts the flexible sealing member is 1 × 10 ⁻³ GPa to 80 GPa. .

(3) The organic according to (1) or (2) above, wherein the Young's modulus of the surface of the second pressure-bonding member in contact with the flexible sealing member is 1 × 10 ⁻³ GPa to 80 GPa. Manufacturing method of electroluminescent element.

(4) Any of the above (1) to (3), wherein the surface pressure when the liquid sealant diffusion prohibited region by the first pressure bonding member is pressure bonded is 1 × 10 ⁻² MPa to 10 MPa. The manufacturing method of the organic electroluminescent element of 1 item | term.

(5) Any one of the above (1) to (4), wherein the surface pressure when the liquid sealant is disposed by the second pressure bonding member is 1 × 10 ⁻² MPa to 10 MPa. The manufacturing method of the organic electroluminescent element of description.

  (6) The method for manufacturing an organic electroluminescence element according to any one of (1) to (5), wherein the diffusion prohibition region is a light emitting region.

  (7) The method for producing an organic electroluminescent element according to any one of (1) to (6), wherein the diffusion prohibition region is an external electrode extraction region.

(8) The Young's modulus of the flexible sealing member is 1 × 10 ⁻³ GPa to 80 GPa, and the thickness is 10 μm to 500 μm. Any one of (1) to (7), The manufacturing method of the organic electroluminescent element of description.

(9) The bonding of the flexible sealing member is performed under a reduced pressure condition of 10 Pa to 1 × 10 ⁻⁴ Pa, according to any one of (1) to (8), Manufacturing method of organic electroluminescent element.

  By providing a flexible sealing member to suppress the occurrence of dark spots, secondary failures can be prevented, cost saving measures and production capacity measures are not required, the life of the light emitting layer can be extended, A manufacturing method of a light-weight organic EL element can be provided, and a high-quality organic EL element can be produced.

  Embodiments of the present invention will be described with reference to FIGS. 1 to 7, but the present invention is not limited thereto.

  FIG. 1 is a schematic diagram showing an example of a process for producing an organic EL element when a belt-like film is used as a substrate.

  In the figure, reference numeral 2 denotes a manufacturing apparatus for producing an organic EL element. The manufacturing apparatus 2 includes an organic compound layer forming step 3, a cathode layer forming step 4, a cutting step 5, a flexible sealing member bonding step 6, and a recovery step 7.

  The organic compound layer forming step 3 includes a strip-shaped flexible support supply section 301, a strip-shaped flexible support cleaning surface modification processing section 302, a first coating / drying section 303, and a first heat processing section. 304, a second charge removal processing unit 305, a second application / drying unit 306, a second heat treatment unit 307, a third charge removal processing unit 308, and a first recovery unit 309.

  In the supply unit 301, the strip-shaped flexible support A301a in which the gas barrier film and the anode layer including the first electrode are already formed in this order is wound around the winding core and supplied in a roll state.

  The cleaning surface modification processing unit 302 performs cleaning to modify the surface of the anode layer (not shown) of the strip-shaped flexible support A301b sent from the supply unit 301 before applying the organic compound layer forming coating solution. It has surface modification processing means 302a and first charge removal processing means 302b.

  The first coating / drying unit 303 applies the first organic compound layer forming coating solution to the backup roll 303a holding the strip-shaped flexible support A301b and the strip-shaped flexible support A301b held by the backup roll 303a. And a first drying device 303c for removing the solvent of the first organic compound layer 301c formed on the anode layer (not shown) on the belt-like flexible support A301b. Yes. Reference numeral 304 denotes a first heat treatment unit.

  Reference numeral 305 denotes a second charge removal processing means for removing charge from the formed first organic compound layer 301c. In this figure, the first organic compound layer forming coating liquid refers to a hole transport layer forming coating liquid, and the first organic compound layer 301c refers to a hole transport layer.

  The second application / drying unit 306 applies a second organic compound layer forming coating solution to a strip-shaped flexible support having a first organic compound layer (hole transport layer) 301c held by a backup roll 306a. And a second wet coater 306b and a second drying device 306c for drying the second organic compound layer 301d formed on the first organic compound layer (hole transport layer) 301c. In the drawing, the second organic compound layer forming coating liquid refers to the light emitting layer forming coating liquid, and the second organic compound layer 301 d refers to the light emitting layer.

  Reference numeral 307 denotes a second heat treatment unit. The second heat treatment unit 307 has the same configuration as the first heat treatment unit 304, and is formed on the first organic compound layer (hole transport layer) 301c. Two organic compound layers (light emitting layers) 301d are heated from the back side of the belt-like flexible support by the back side heat transfer method.

  Reference numeral 308 denotes third neutralization processing means for performing neutralization of the formed second organic compound layer (light emitting layer) 301e. The second drying device 306c has the same structure as the first drying device 303c. The first static elimination processing unit 302b, the second static elimination processing unit 305, and the third static elimination processing unit 308 may be the same.

  This figure shows a case where there are two units of the first application / drying unit 303 and the second application / drying unit 304 as the application / drying unit, but it can be increased as necessary. Yes.

  The cathode layer formation step 4 includes a material supply unit 401, a first cathode layer formation unit 402, a second cathode layer formation unit 403, and a second winding unit 404, and is collected from the supply unit 401. Up to the portion 404 is continuously performed under reduced pressure conditions.

  In the supply unit 401, an anode, a hole transport layer, and an organic compound layer (light emitting layer) were formed on the belt-shaped flexible support manufactured by the manufacturing apparatus 3, and wound around a winding core. A roll-shaped belt-like flexible support B301f is supplied.

  The electron injection layer 301g is formed by the first cathode layer forming unit 402 on the organic compound layer (light emitting layer) of the strip-shaped flexible support B301f having the organic compound layer (light emitting layer) unwound from the supply unit 401. . Reference numeral 402a denotes a vapor deposition apparatus, and 402b denotes an evaporation source container.

  In the second cathode layer forming unit 403, the cathode layer 301h of the second electrode is formed on the electron injection layer 301g formed in the first cathode layer forming unit 402. Reference numeral 403a denotes a vapor deposition apparatus, and reference numeral 403b denotes an evaporation source container. The strip-shaped flexible support C301i in which the cathode layer 301h of the second electrode is formed by the second cathode layer forming unit 403 is wound around the winding core by the collecting unit 404 to become a roll-shaped strip-shaped flexible support C301j.

  The cutting step 5 includes a supply unit 501 for a roll-shaped strip-shaped flexible support C301j, a punching cutting device 502 that cuts the roll-shaped strip-shaped flexible support C301j into sheets, and a second sheet that is cut into sheets. The sheet-like flexible support D301k on which the cathode layer 301h of the electrode is formed includes a recovery unit 503, and a recovery unit 504 that recovers the strip-shaped flexible support C301j after punching and cutting.

  The flexible sealing member laminating step 6 is a sheet-like sheet-like sheet formed with a liquid sealant coating device 601 for coating a liquid sealant on a single-wafer flexible support D301k and a cathode layer 301h. A stacking device 602 that stacks the sheet-like flexible sealing members 602a on the flexible support D301k, and a sealing member that bonds the stacked sheet-like flexible sealing members A combination device 603. The flexible sealing member bonding step 6 will be described in detail with reference to FIGS. In addition, you may provide the protective layer formation process (not shown) which forms a protective layer before the flexible sealing member bonding process 6. FIG.

  In this figure, the roll-like strip-shaped flexible support C301j on which the cathode layer 301h of the second electrode is formed is cut into a single sheet before the flexible sealing member bonding step, and the second electrode Although the single-wafer flexible support D301k having the cathode layer 301h is formed, a single-wafer sheet-like flexible sealing member is bonded to each single-wafer flexible support D301k. The strip-shaped flexible sealing member is used, and the strip-shaped flexible sealing member is bonded to the strip-shaped flexible support D301i on which the cathode layer 301h of the second electrode is formed, and then cut into a single sheet. You may be the method to do.

  FIG. 2 is a schematic view of a method for producing an organic EL element using a single-wafer sheet-like substrate.

  In the figure, 8 indicates a manufacturing apparatus. Reference numeral 801 denotes a supply unit that supplies the sheet-like substrate 801a to the process. Reference numeral 802 denotes a substrate cleaning for cleaning the surface of the single-wafer sheet-like substrate 801a before the first electrode is vapor-deposited on the surface of the single-wafer sheet-like substrate 801a supplied from the supply unit 801. A processing device is shown.

  Reference numeral 803 denotes a first anode layer forming unit for forming the first electrode on the single-wafer sheet-like substrate 801a after the cleaning process, 803a denotes a vapor deposition apparatus, and 803b denotes an evaporation source container.

  Reference numeral 804 denotes a hole transport layer forming portion that forms a hole transport layer on the first electrode except for a part of the single-wafer sheet-like substrate 801b on which the first electrode is formed that serves as an external extraction electrode of the first electrode. 804a indicates a vapor deposition apparatus, and 804b indicates an evaporation source container.

  Reference numeral 805 denotes a light emitting layer forming portion for forming a light emitting layer on the hole transport layer of the single wafer sheet substrate 801c on which the hole transport layer is formed, 805a denotes a vapor deposition device, and 805b denotes an evaporation source container.

  Reference numeral 806 denotes an electron injection layer forming portion for forming an electron injection layer on the light emitting layer of the single wafer sheet substrate 801d on which the light emitting layer is formed, 406a denotes a vapor deposition apparatus, and 806b denotes an evaporation source container.

  Reference numeral 807 denotes a second electrode forming portion that forms the second electrode in a state orthogonal to the first electrode on the electron injection layer of the single-wafer sheet-like substrate 801e on which the electron injection layer is formed, and 807a denotes a vapor deposition apparatus. Reference numeral 807b denotes an evaporation source container. Note that a protective layer forming step (not shown) for forming a protective layer may be provided after the second electrode forming portion 807.

  Reference numeral 808 denotes a flexible sealing member bonding step in which a flexible sealing member is bonded onto the single-wafer sheet-like substrate 801f on which the second electrode is formed. The organic EL element 9 is completed by bonding a flexible sealing member. The flexible sealing member bonding step 808 includes a liquid sealing agent coating device 808a for applying a liquid sealing agent to the sheet-like substrate 801f on which the second electrode is formed, and a sheet on which the liquid sealing agent is applied. Sheet-sheet flexible sealing member stacking device 808b for stacking sheet-sheet flexible sealing members on leaf-sheet-like substrate 801f, and stacked sheet-sheet flexible sealing members stacked And a sealing member laminating apparatus 808c for laminating the film on the second electrode of the sheet-like substrate 801f. Reference numeral 809 denotes a collection unit for collecting the organic EL element 9. The bonding apparatus 808c can use the same thing as the sealing member bonding apparatus 603 shown in FIG.

  In addition, although this figure shows the case where the liquid sealing agent is applied to the single-wafer sheet-like substrate 801f, the liquid sealing agent may be applied on the single-wafer sheet-like flexible sealing member 808b1 side. Moreover, both the sheet-fed sheet-like substrate 801f and the sheet-fed sheet-like flexible sealing member 808b1 may be used, and selection is possible as necessary.

  After the sealing member bonding step shown in FIGS. 1 and 2, a liquid sealing agent curing treatment step may be provided separately, or may be incorporated into the sealing member bonding device 603. The curing treatment step can be appropriately selected according to the type of liquid sealant used (for example, a thermosetting sealant, an ultraviolet curable sealant, etc.).

The cleaning surface modification process performed before applying the organic compound layer forming coating liquid in the step of manufacturing the organic EL element shown in FIGS. 1 and 2 includes a low-pressure mercury lamp, an excimer lamp, a plasma cleaning apparatus, and the like. Can be mentioned. As conditions for the cleaning surface modification treatment using a low-pressure mercury lamp, for example, a cleaning surface modification treatment is performed by irradiating a low-pressure mercury lamp with a wavelength of 184.2 nm at an irradiation intensity of 5 to ²⁰ mW / cm ² and a distance of 5 to 15 mm. Conditions are mentioned. For example, atmospheric pressure plasma is preferably used as the condition for the cleaning surface modification treatment by the plasma cleaning apparatus. Examples of the cleaning conditions include conditions in which a gas containing oxygen of 1 to 5% by volume is used for argon gas, and the cleaning surface modification treatment is performed at a frequency of 100 KHz to 150 MHz, a voltage of 10 V to 10 KV, and an irradiation distance of 5 to 20 mm.

  Examples of the charge removal processing means performed in the step of manufacturing the organic EL element shown in FIG. 1 include a light irradiation method and a corona discharge method, and these can be appropriately selected and used as necessary. . The light irradiation type generates weak ions, and the corona discharge type generates air ions by corona discharge. The air ions are attracted to the charged object to compensate for the opposite polarity charge and neutralize static electricity. A static eliminator using corona discharge or a static eliminator using soft X-rays can be used. Since the first charge removal processing means removes the charge of the base material, adhesion of dust and dielectric breakdown are prevented, so that the yield of the elements can be improved.

  The vapor deposition apparatus shown in FIGS. 1 and 2 is not particularly limited, and for example, sputtering, reactive sputtering, molecular beam epitaxy, cluster ion beam method, ion plating method, plasma polymerization method, atmospheric pressure plasma A polymerization method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used, and can be selected and used as necessary.

  FIG. 3 is a schematic plan view showing a state in which a liquid sealing agent is applied to the substrate on which up to the second electrode shown in FIG. 2 is formed. FIG. 3A is a schematic plan view of the substrate on which up to the second electrode shown in FIG. 2 is formed. FIG. 3B is a schematic plan view showing a state in which a liquid sealing agent is applied to the light emitting region of the substrate on which the second electrode shown in FIG. 3A is formed. FIG. 3C is a schematic plan view showing a state in which a liquid sealing agent is applied around the light emitting region of the substrate on which the second electrodes shown in FIG. 3A are formed.

  In the figure, reference numeral 801f denotes a single-wafer sheet-like substrate on which up to the second electrode is formed. Reference numeral 801f1 denotes a first electrode formed on a single sheet substrate, and 801f2 denotes a second electrode formed on an organic compound layer (not shown) including a light emitting layer. Reference numeral 801f3 denotes a light emitting region (a range surrounded by a thick line in the drawing) having an organic compound layer including a light emitting layer. Reference numeral 801f4 denotes a liquid sealing agent applied to the light emitting region 801f3. Reference numeral 801f5 denotes a liquid sealant coated around the light emitting region.

  In the present invention, the diffusion-prohibited region refers to a region that causes a failure due to adhesion of the liquid sealing agent due to the spread (diffusion) of the applied liquid sealing agent when the flexible sealing member is bonded. For example, in the case of FIG. 3B, the flexible sealing member is bonded onto the light emitting area coated with the liquid sealing agent. A first electrode 801f1 and a second electrode 801f2. In the case of (c) in FIG. 3, the flexible sealing member is pasted on the periphery of the light emitting region coated with the liquid sealant, including the light emitting region. Includes a first electrode 801f1, a second electrode 801f2, and a light emitting region 801f3, which are external extraction electrodes.

  The method for applying the liquid sealant is not particularly limited, and examples thereof include a method used for applying a normal sealant such as a spray method, an extrusion nozzle method, and a screen printing method. The viscosity of the liquid sealant to be used is preferably 40 Pa · s to 400 Pa · s in consideration of coating uniformity, spreadability of the sealant at the time of bonding and pressing, and the like.

  Examples of the liquid sealing agent according to the present invention include photocuring and thermosetting sealing agents having reactive vinyl groups of acrylic acid oligomers and methacrylic acid oligomers, and moisture curing type seals such as 2-cyanoacrylic acid esters. Examples thereof include a sealing agent such as an agent, an epoxy-based heat and chemical curing type (two-component mixture), and a cationic curing type ultraviolet curing epoxy resin sealing agent. In addition, since an organic EL element may deteriorate by heat processing, what can be adhesively cured from room temperature to 80 ° C. is preferable. A desiccant may be dispersed in the adhesive. It is preferable to add a filler to the liquid sealant as necessary. The addition amount of the filler is preferably 5 to 70% by volume in consideration of adhesive strength. In addition, the size of the filler to be added is preferably 1 μm to 100 μm in consideration of the adhesive strength, the thickness of the sealant after bonding and bonding, and the like. The kind of filler to be added is not particularly limited, and examples thereof include soda glass, non-alkali glass, or silica, titanium dioxide, antimony oxide, titania, alumina, zirconia, tungsten oxide, and other metal oxides. The bonding of the flexible sealing member will be described with reference to FIGS.

  When a liquid sealing agent is applied to the light emitting region as shown in FIG. 3B, a protective layer (not shown) may be formed on the second electrode in the light emitting region in advance. .

  The protective layer refers to a layer that covers the second electrode and the organic layer, forms an inorganic or organic layer in contact with the support base, and protects the second electrode and the organic layer. In this case, the material for forming the protective layer may be any material as long as it has a function of suppressing intrusion of elements that cause deterioration of the element such as moisture and oxygen. For example, silicon oxide, silicon dioxide, silicon nitride, or the like may be used. I can do it. Further, in order to improve the brittleness of the protective layer, it is preferable to have a laminated structure of these inorganic layers and layers made of organic materials. The method for forming the protective layer is not particularly limited. For example, the vacuum deposition method, the sputtering method, the reactive sputtering method, the molecular beam epitaxy method, the cluster ion beam method, the ion plating method, the plasma polymerization method, the atmospheric pressure plasma weighting. A combination method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, or the like can be used.

  FIG. 4 is a schematic view of a sealing member bonding apparatus used in the manufacturing apparatus shown in FIG. (A) of FIG. 4 is a schematic perspective view of the sealing member bonding apparatus used for the manufacturing apparatus shown in FIG. FIG. 4B is a schematic cross-sectional view taken along line AA ′ of FIG.

  In the figure, 808c shows a sealing member bonding apparatus. The sealing member bonding apparatus 808c bonds a flexible sealing member on the liquid sealing agent coated on the light emitting region of the single-wafer sheet-like substrate 801f (see FIG. 2) on which the second electrode is formed. The first press member 808c1, the second press member 808c2, the upper die 808c3 to which the first press member 808c1 and the second press member 808c2 are attached, and the upper die 808c3 in the vertical direction (the arrow direction in the figure). And a lower mold 808c5 having four guide posts 808c4 that enable the above-described operation.

The first crimping member 808c1 is attached to four linear guides 808c6 attached to the upper mold 808c3. Reference numeral 808c61 denotes a spring of an elastic member for pressure-bonding and holding the diffusion prohibition region of the liquid sealant with the first pressure-bonding member 808c1 when the sealing member is bonded.
The lower mold 808c5 is connected to a plurality of suction holes (not shown) for sucking and fixing the single-wafer sheet-like substrate on which the second electrodes are formed and a suction pump (not shown) when the sealing member is bonded. And a suction pipe (not shown).

  Reference numeral 808c8 denotes a drive source for operating the upper mold 808c3 in the vertical direction (arrow direction in the drawing) along the guide post 808c4. Reference numeral 808c9 denotes an attachment member disposed on the upper surface 808c31 of the upper mold 808c3, and a drive shaft 808c7 is attached thereto.

  The sealing member bonding apparatus 808c shown in this figure is used when a liquid sealing agent is applied as shown in FIG. 3 (b). The first pressure-bonding member 808c1 presses and holds the periphery of the light-emitting region, which is the diffusion-inhibiting region of the liquid sealant, and the second pressure-bonding member 808c2 pressure-bonds the light-emitting region coated with the liquid sealant. Note that a protective layer (not shown) may be formed in advance in the light emitting region of the single-wafer sheet substrate 801f (see FIG. 2) on which the second electrode is formed.

  FIG. 5 is a schematic view of another type of sealing member bonding apparatus used in the manufacturing apparatus shown in FIG. (A) of FIG. 4 is a schematic perspective view of the sealing member bonding apparatus of the other system currently used for the manufacturing apparatus shown in FIG. FIG. 4B is a schematic cross-sectional view taken along line AA ′ of FIG.

  In the figure, 808'c represents a sealing member bonding apparatus. The sealing member laminating apparatus 808'c is a flexible sealing member on the liquid sealing agent coated around the light emitting region of the sheet-like substrate 801f (see FIG. 2) on which the second electrode is formed. An upper die 808'c3 to which a first crimping member 808'c1, a second crimping member 808'c2, a first crimping member 808'c1 and a second crimping member 808'c2 are attached, The upper die 808'c3 has a lower die 808'c5 having four guide posts 808'c4 that allow the upper die 808'c3 to be operated in the vertical direction (the arrow direction in the figure).

The first crimping member 808'c1 is attached to four linear guides 808'c6 attached to the upper mold 808'c3. Reference numeral 808′c61 denotes a spring of an elastic member for pressure-bonding and holding the diffusion prohibition region of the liquid sealant with the first pressure-bonding member 808′c1 when the sealing member is bonded.
The lower mold 808'c5 has a plurality of suction holes (not shown) for sucking and fixing the single-wafer sheet-like substrate on which the second electrodes are formed when a sealing member is bonded, and a suction pump (not shown) It is preferable to have a suction pipe (not shown) connected to.
Reference numeral 808'c8 denotes a drive source for operating the upper mold 808'c3 in the vertical direction (arrow direction in the drawing) along the guide post 808'c4. Reference numeral 808'c9 denotes an attachment member disposed on the upper surface 808'c31 of the upper mold 808'c3, and a drive shaft 808'c7 is attached thereto.

  Sealing member bonding apparatus 808'c shown in this figure is used when a liquid sealing agent is applied as shown in (c) of FIG. The first pressure-bonding member 808'c1 presses and holds the light-emitting region, which is the diffusion-inhibiting region of the liquid sealant, and the second pressure-bonding member 808'c2 pressure-bonds the periphery of the light-emitting region coated with the liquid sealant. ing.

  6 uses the sealing member bonding apparatus shown in FIG. 4 and is flexible on the liquid sealing agent applied to the light emitting region of the single-wafer sheet-like substrate on which the second electrode shown in FIG. 3 is formed. It is a schematic fragmentary sectional view which shows the state which bonds a sealing member.

  In the figure, reference numeral 11 denotes a flexible sealing member stacked on a liquid sealing agent applied to the light emitting region. When the flexible sealing member is bonded, the first pressure-bonding member 808c1 holds the liquid sealant diffusion-inhibited area (around the light-emitting area) by pressure, and the second pressure-bonding member 808c2 is applied to the light-emitting area. The flexible sealing member on the sealing agent is pressed. This state is the same even if the sealing member bonding apparatus shown in FIG. 5 is used. That is, when the flexible sealing member is bonded, the first pressure-bonding member 808'c1 holds the liquid sealant diffusion-inhibited region (light-emitting region) by pressure, and the second pressure-bonding member 808'c2 The flexible sealing member on the liquid sealant coated on the surface is pressed.

Young's modulus of the first pressure-bonding member for bonding holds the diffusion inhibition region of the liquid sealant, considering adhesion and spreading prevention wetting of the sealant, preventing damage and the like to the flexible sealing member, 1 × 10 ^- It is preferably ³ GPa to 80 GPa.

The Young's modulus of the second pressure-bonding member for pressure-bonding the flexible sealing member on the liquid sealant is 1 × 10 in consideration of adhesion, uniform pressure-bonding, prevention of damage to the flexible sealing member, and the like. ^-3 GPa to 80 GPa is preferable.

When the flexible sealing member is bonded, the surface pressure of the first pressure-bonding member that presses and holds the diffusion-prohibited region of the liquid sealant is reduced in adhesion and prevention of spreading of the sealant, Considering prevention of scratches and the like, the pressure is preferably 1 × 10 ⁻² MPa to 10 MPa.

In order to ensure the gas barrier properties required when commercializing organic EL elements as display devices,
The water vapor permeability of the flexible sealing member is preferably 0.01 g / m ² · day or less, and the oxygen permeability is preferably 0.01 ml / m ² · day · atm or less. The moisture permeability is a value measured mainly by the MOCON method by a method based on the JIS K7129B method (1992), and the oxygen permeability is a value measured mainly by the MOCON method by a method based on the JIS K7126B method (1987). is there.

The Young's modulus of the flexible sealing member is 1 × 10 ⁻³ GPa in consideration of adhesion between the flexible sealing member, the first pressure-bonding member, and the second pressure-bonding member and prevention of spreading of the sealing agent. It is 80 GPa and the thickness is preferably 10 μm to 500 μm.

The bonding of the flexible sealing member was returned to atmospheric pressure after bonding, the influence of oxygen and moisture present in the sealing process environment, the prevention of air bubbles mixing into the bonding portion, the diffusion of the seal due to air bubbles mixing, and the bonding. In consideration of the diffusion of the sealing agent due to the external pressure at the time, it is preferably performed under reduced pressure conditions of 10 Pa to 1 × 10 ⁻⁴ Pa.

As a flexible sealing member used in the present invention, a barrier layer is formed by vapor deposition or coating on a support made of a flexible resin film such as polyethylene terephthalate, nylon, polycarbonate, acrylic, polyether sulfide, polysulfone or the like. Examples thereof include a formed material or a material using a metal foil as a barrier layer. Examples of the barrier layer include metals such as In, Sn, Pb, Au, Cu, Ag, Al, Ti, and Ni, MgO, SiO, SiO ₂ , Al ₂ O ₃ , GeO, NiO, CaO, BaO, and Fe ₂ O. ₃ , materials in which metal oxides such as Y ₂ O ₃ and TiO ₂ are vapor-deposited. Moreover, as a material of the metal foil, for example, a metal material such as aluminum, copper, or nickel, or an alloy material such as stainless steel or an aluminum alloy can be used, but aluminum is preferable in terms of workability and cost. The film thickness is about 1 to 100 μm, preferably about 10 to 50 μm. In order to facilitate handling during production, a film such as polyethylene terephthalate or nylon may be laminated in advance. In addition to the resin film, a metal film made of one or more metals or alloys selected from the group consisting of stainless steel, iron, copper, aluminum, magnesium, nickel, zinc, chromium, titanium, molybdenum, silicon, germanium, and tantalum is also available. It is possible to use.

  FIG. 7 is possible on the liquid sealant coated on the light emitting region of the single-wafer sheet-like substrate on which the second electrode shown in FIG. 3 is formed using the sealing member bonding apparatus shown in FIG. It is a schematic flowchart until it bonds a flexible sealing member.

  In S1, a sealing member laminating apparatus 808c and a single-wafer sheet-like substrate 801f on which a second electrode in which a liquid sealant 801f4 is coated in a light emitting region 801f3 as shown in FIG. 3B is formed. Be prepared.

  In S2, the flexible sealing member 11 is stacked on the liquid sealing agent 801f4 of the single-wafer sheet-like substrate 801f. At this time, the size of the flexible sealing member 11 to be used is preferably the same as the size of the single-wafer sheet-like substrate 801f. In a state where the flexible sealing members 11 are stacked, the single-wafer sheet-like substrate 801f is placed at a designated position on the upper surface 808c51 of the lower mold 808c5 of the sealing member bonding apparatus 808c. Note that if the lower mold 808c5 has a suction mechanism, it is preferable that the lower mold 808c5 is suction-fixed after being placed at a specified position.

  In S3, the upper mold 808c3 is lowered by the drive mechanism 808c8 (see FIG. 4) (in the direction of the arrow in the figure), and the first pressure-bonding member 808c1 holds the periphery of the light-emitting area, which is the liquid sealant diffusion-inhibited area, And

In S4, the upper mold 808c3 is further lowered by the drive mechanism 808c8 (see FIG. 4) (in the direction of the arrow in the drawing), and the light emitting area where the liquid sealant is applied by the second pressure-bonding member 808c2 is applied to the surface pressure 1 ×. Pressure bonding is performed in the range of 10 ⁻² MPa to 10 MPa. By further lowering the upper die 808c3, the pressure-bonding and holding around the light-emitting region, which is the diffusion-inhibiting region of the liquid sealant by the first pressure-bonding member 808c1, becomes complete, and the light-emitting region coated with the liquid sealant is pressure-bonded. The range of the liquid sealant that spreads (diffuses) is restricted, and unnecessary adhesion around the first electrode, the second electrode, and the light emitting region can be prevented. A flexible sealing member will be in the state bonded primarily by crimping with the 2nd crimping | compression-bonding member 808c2. Thereafter, the bonding of the flexible sealing member is completed by performing a curing process. S4 is preferably performed under a reduced pressure condition of 10 Pa to 1 × 10 ⁻⁴ Pa.

  The curing process may be performed in a separate process, or may be performed by a method in which the second crimping member 808c2 of the sealing member bonding apparatus 808c has a curing process function. For example, when the liquid sealing agent is a thermosetting type, a method of heating the second pressure bonding member 808c2 with a heating mechanism may be used. In the case of an ultraviolet curable type, a method in which the second pressure-bonding member 808c2 is made of an ultraviolet transmissive material and irradiated with ultraviolet rays may be used.

  A single-wafer sheet-like substrate on which a second electrode coated with a liquid sealant 801f4 is formed as shown in (c) of FIG. 3, using a sealing member laminating apparatus 808′c shown in FIG. Also in the case of 801f, the flexible sealing member can be bonded by the same flow as this figure only by the diffusion prohibition region of the liquid sealant being the light emitting region and the portion to be crimped around the light emitting region.

When manufacturing an organic EL element using the manufacturing apparatus shown in FIGS. 1 and 2, FIG. 4 to FIG. 4 are used to bond a flexible sealing member on the light emitting region of the substrate on which up to the second electrode is formed. The following effect is acquired by bonding using the flexible sealing member bonding apparatus shown in 7. FIG.
1) The quality of the organic EL element can be stabilized by preventing the liquid sealant from spreading (diffusion) into the diffusion-prohibited area during pressure bonding.
2) The diffusion of the sealing agent to the external electrode, which is a diffusion prohibited area, is prevented, and problems such as electrode grounding failure can be avoided.
3) The diffusion of the sealing agent to the light emitting region, which is a diffusion prohibited region, is prevented, the contamination between the organic layer and the like forming the light emitting region and the sealing agent can be prevented, and problems such as defective emission can be avoided .
4) Installation of a protective wall or the like for the purpose of preventing the spread of the sealing agent is not necessary, and the configuration of the organic EL element is simplified, thereby reducing the cost.

  Hereinafter, the gas barrier layer, the first electrode, the hole transport layer, the light emitting layer, the electron transport layer, the second electrode, the sealing layer and the like constituting the organic EL device according to the present invention will be described.

  Examples of the substrate according to the present invention include a single wafer substrate and a strip-shaped flexible substrate. Examples of the single substrate include a transparent glass plate and a sheet-like transparent resin film. Examples of the resin film include polyesters such as polyethylene terephthalate (PET) and polyethylene naphthalate (PEN), polyethylene, polypropylene, cellophane, cellulose diacetate, cellulose triacetate, cellulose acetate butyrate, cellulose acetate propionate (CAP), Cellulose esters such as cellulose acetate phthalate (TAC) and cellulose nitrate or derivatives thereof, polyvinylidene chloride, polyvinyl alcohol, polyethylene vinyl alcohol, syndiotactic polystyrene, polycarbonate, norbornene resin, polymethylpentene, polyether ketone, polyimide , Polyethersulfone (PES), polyphenylene sulfide, polysulfones, Cycloolefin resins such as polyether imide, polyether ketone imide, polyamide, fluororesin, nylon, polymethyl methacrylate, acrylic or polyarylate, Arton (trade name, manufactured by JSR) or Appel (trade name, manufactured by Mitsui Chemicals) Is mentioned. A transparent resin film is mentioned as a strip | belt-shaped flexible board | substrate, The same resin film as a single wafer board | substrate can be used.

When a transparent resin film is used as the substrate, a gas barrier film is preferably formed on the surface of the resin film as necessary. Examples of the gas barrier film include an inorganic film, an organic film, or a hybrid film of both. As a characteristic of the gas barrier film, the water vapor permeability is preferably 0.01 g / m ² · day · atm or less. Furthermore, a high barrier film having an oxygen permeability of 10 ⁻³ ml / m ² / day or less and a water vapor permeability of 10 ⁻⁵ g / m ² / day or less is preferable.

  As a material for forming the barrier film, any material may be used as long as it has a function of suppressing intrusion of elements that cause deterioration of elements such as moisture and oxygen. For example, silicon oxide, silicon dioxide, silicon nitride, or the like can be used. Further, in order to improve the brittleness of the film, it is more preferable to have a laminated structure of these inorganic layers and layers made of organic materials. Although there is no restriction | limiting in particular about the lamination | stacking order of an inorganic layer and an organic layer, It is preferable to laminate | stack both alternately several times. The method for forming the barrier film is not particularly limited. For example, the vacuum deposition method, the sputtering method, the reactive sputtering method, the molecular beam epitaxy method, the cluster ion beam method, the ion plating method, the plasma polymerization method, the atmospheric pressure plasma weighting. A combination method, a plasma CVD method, a laser CVD method, a thermal CVD method, a coating method, and the like can be used, but an atmospheric pressure plasma polymerization method as described in JP-A-2004-68143 is particularly preferable.

As the first electrode, an electrode material made of a metal, an alloy, an electrically conductive compound, or a mixture thereof having a high work function (4 eV or more) is preferably used. Specific examples of such an electrode substance include metals such as Au, and conductive transparent materials such as CuI, indium tin oxide (ITO), SnO ₂ , and ZnO. Alternatively, an amorphous material such as IDIXO (In ₂ O ₃ .ZnO) capable of forming a transparent conductive film may be used. For the anode, these electrode materials may be formed into a thin film by a method such as vapor deposition or sputtering, and a pattern having a desired shape may be formed by a photolithography method, or when the pattern accuracy is not required (about 100 μm or more) ), A pattern may be formed through a mask having a desired shape when the electrode material is deposited or sputtered. When light emission is extracted from the anode, the transmittance is desirably greater than 10%, and the sheet resistance as the anode is preferably several hundred Ω / □ or less. Further, although the film thickness depends on the material, it is usually selected in the range of 10 to 1000 nm, preferably 10 to 200 nm.

  A hole injection layer (anode buffer layer) may be present between the first electrode and the light emitting layer or the hole transport layer. The hole injection layer is a layer provided between the electrode and the organic layer in order to lower the driving voltage and improve the luminance of light emission. “The organic EL element and the forefront of industrialization (November 30, 1998, NTS) The details are described in the second volume, Chapter 2, “Electrode Materials” (pages 123 to 166) of “The Company”. Examples of the material used for the anode buffer layer (hole injection layer) include materials described in JP-A No. 2000-160328.

  The hole transport layer is made of a hole transport material having a function of transporting holes, and in a broad sense, a hole injection layer and an electron blocking layer are also included in the hole transport layer. The hole transport layer can be provided as a single layer or a plurality of layers. The hole transport material has any one of hole injection or transport and electron barrier properties, and may be either organic or inorganic. For example, triazole derivatives, oxadiazole derivatives, imidazole derivatives, polyarylalkane derivatives, pyrazoline derivatives and pyrazolone derivatives, phenylenediamine derivatives, arylamine derivatives, amino-substituted chalcone derivatives, oxazole derivatives, styrylanthracene derivatives, fluorenone derivatives, hydrazone derivatives, Examples include stilbene derivatives, silazane derivatives, aniline copolymers, and conductive polymer oligomers, particularly thiophene oligomers.

  The above-mentioned materials can be used as the hole transport material, but it is preferable to use a porphyrin compound, an aromatic tertiary amine compound and a styrylamine compound, particularly an aromatic tertiary amine compound. Representative examples of aromatic tertiary amine compounds and styrylamine compounds include N, N, N ', N'-tetraphenyl-4,4'-diaminophenyl; N, N'-diphenyl-N, N'- Bis (3-methylphenyl)-[1,1′-biphenyl] -4,4′-diamine (TPD); 2,2-bis (4-di-p-tolylaminophenyl) propane; 1,1-bis (4-di-p-tolylaminophenyl) cyclohexane; N, N, N ′, N′-tetra-p-tolyl-4,4′-diaminobiphenyl; 1,1-bis (4-di-p-tolyl) Aminophenyl) -4-phenylcyclohexane; bis (4-dimethylamino-2-methylphenyl) phenylmethane; bis (4-di-p-tolylaminophenyl) phenylmethane; N, N'-diphenyl-N, N ' − (4-methoxyphenyl) -4,4'-diaminobiphenyl; N, N, N ', N'-tetraphenyl-4,4'-diaminodiphenyl ether; 4,4'-bis (diphenylamino) quadriphenyl; N, N, N-tri (p-tolyl) amine; 4- (di-p-tolylamino) -4 '-[4- (di-p-tolylamino) styryl] stilbene; 4-N, N-diphenylamino- (2-diphenylvinyl) benzene; 3-methoxy-4′-N, N-diphenylaminostilbenzene; N-phenylcarbazole, and also two of those described in US Pat. No. 5,061,569. Having a condensed aromatic ring in the molecule, for example, 4,4'-bis [N- (1-naphthyl) -N-phenylamino] biphenyl (NPD), JP-A-4-3086 4,4 ', 4 "-tris [N- (3-methylphenyl) -N-phenylamino] triphenylamine in which three triphenylamine units described in Japanese Patent No. 8 are linked in a starburst type ( MTDATA) and the like.

  Furthermore, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used. In addition, inorganic compounds such as p-type-Si and p-type-SiC can also be used as the hole injection material and the hole transport material.

  JP-A-11-251067, J. Org. Huang et. al. A so-called p-type hole transport material described in a book (Applied Physics Letters 80 (2002), p. 139) can also be used. In the present invention, it is preferable to use these materials because a light-emitting element with higher efficiency can be obtained.

  Although there is no restriction | limiting in particular about the film thickness of a positive hole transport layer, Usually, 5 nm-about 5 micrometers, Preferably it is 5-200 nm. This hole transport layer may have a single layer structure composed of one or more of the above materials. A hole transport layer having a high p property doped with impurities can also be used. Examples thereof include JP-A-4-297076, JP-A-2000-196140, JP-A-2001-102175, J.A. Appl. Phys. 95, 5773 (2004), and the like. It is preferable to use such a hole transport layer having a high p property because an organic EL element with lower power consumption can be produced.

  In the present invention, the light emitting layer refers to a blue light emitting layer, a green light emitting layer, and a red light emitting layer. There is no restriction | limiting in particular as a lamination order in the case of laminating | stacking a light emitting layer, You may have a nonluminous intermediate | middle layer between each light emitting layer. In the present invention, it is preferable that at least one blue light emitting layer is provided at a position closest to the anode in all the light emitting layers. Also, when four or more light emitting layers are provided, for example, blue light emitting layer / green light emitting layer / red light emitting layer / blue light emitting layer, blue light emitting layer / green light emitting layer / red light emitting layer / blue light emitting from the order close to the anode. Layered / green light emitting layer, blue light emitting layer / green light emitting layer / red light emitting layer / blue light emitting layer / green light emitting layer / red light emitting layer, etc. It is preferable for improving luminance stability. A white element can be manufactured by forming a light emitting layer in multiple layers.

  The total thickness of the light emitting layer is not particularly limited, but is usually selected in the range of 2 nm to 5 μm, preferably 2 to 200 nm in consideration of the uniformity of the film and the voltage required for light emission. Furthermore, it is preferable that it exists in the range of 10-20 nm. A film thickness of 20 nm or less is preferable because it has the effect of improving the stability of the emission color with respect to the driving current as well as the voltage surface. The film thickness of each light emitting layer is preferably selected in the range of 2 to 100 nm, and more preferably in the range of 2 to 20 nm. Although there is no restriction | limiting in particular about the film thickness relationship of each light emitting layer of blue, green, and red, It is preferable that the blue light emitting layer (the sum total when there are two or more layers) is the thickest among three light emitting layers.

  The light emitting layer includes at least three layers having different emission spectra, each having an emission maximum wavelength in the range of 430 to 480 nm, 510 to 550 nm, and 600 to 640 nm. If it is three or more layers, there will be no restriction | limiting in particular. When there are more than four layers, there may be a plurality of layers having the same emission spectrum. A layer having an emission maximum wavelength in the range of 430 to 480 nm is referred to as a blue light emitting layer, a layer in the range of 510 to 550 nm is referred to as a green light emitting layer, and a layer in the range of 600 to 640 nm is referred to as a red light emitting layer. Moreover, in the range which maintains the said maximum wavelength, you may mix a several luminescent compound in each light emitting layer. For example, the blue light emitting layer may be used by mixing a blue light emitting compound having a maximum wavelength of 430 to 480 nm and a green light emitting compound having the same wavelength of 510 to 550 nm.

  The organic light emitting material used as the material of the light emitting layer is (a) charge injection function, that is, holes can be injected from the anode or hole injection layer when an electric field is applied, and electrons are injected from the cathode or electron injection layer. (B) a transport function, that is, a function that moves injected holes and electrons by the force of an electric field, and (c) a light emission function, that is, a recombination field of electrons and holes. However, there is no particular limitation as long as it has the three functions of connecting these to light emission. For example, fluorescent whitening agents such as benzothiazole, benzimidazole, and benzoxazole, and styrylbenzene compounds can be used. Specific examples of the above-mentioned optical brightener include 2,5-bis (5,7-di-t-pentyl-2-benzoxazolyl) -1,3,4-thiadiazole in the benzoxazole series, 4 , 4′-bis (5,7-t-pentyl-2-benzoxazolyl) stilbene, 4,4′-bis [5,7-di- (2-methyl-2-butyl) -2-benzoxa Zoolyl] stilbene, 2,5-bis (5,7-di-t-pentyl-2-benzoxazolyl) thiophene, 2,5-bis [5-α, α-dimethylbenzyl-2-benzoxazoli Ru] thiophene, 2,5-bis [5,7-di- (2-methyl-2-butyl) -2-benzoxazolyl] -3,4-diphenylthiophene, 2,5-bis (5-methyl) -2-benzoxazolyl) thiophene, 4,4′-bis (2 -Benzoxazolyl) biphenyl, 5-methyl-2- [2- [4- (5-methyl-2-benzoxazolyl) phenyl] vinyl] benzoxazole, 2- [2- (4-chlorophenyl) vinyl Naphtho [1,2-d] oxazole and the like. Examples of the benzothiazole type include 2,2 ′-(p-phenylenedivinylene) -bisbenzothiazole, and examples of the benzimidazole type include 2- [2- [4- (2-benzimidazolyl) phenyl] vinyl] benzimidazole. 2- [2- (4-carboxyphenyl) vinyl] benzimidazole and the like. In addition, other useful compounds are listed in Chemistry of Synthetic Soybean (1971), pages 628-637 and 640.

  Specific examples of the styrylbenzene compound include 1,4-bis (2-methylstyryl) benzene, 1,4-bis (3-methylstyryl) benzene, 1,4-bis (4-methylstyryl). ) Benzene, distyrylbenzene, 1,4-bis (2-ethylstyryl) benzene, 1,4-bis (3-methylstyryl) benzene, 1,4-bis (2-methylstyryl) -2-methylbenzene, 1,4-bis (2-methylstyryl) -2-ethylbenzene and the like can be mentioned.

  Further, in addition to the above-described optical brightener and styrylbenzene compound, for example, 12-phthaloperinone, 1,4-diphenyl-1,3-butadiene, 1,1,4,4-tetraphenyl-1,3- Butadiene, naphthalimide derivatives, perylene derivatives, oxadiazole derivatives, aldazine derivatives, pyrazirine derivatives, cyclopentadiene derivatives, pyrrolopyrrole derivatives, styrylamine derivatives, coumarin compounds, international publications WO 90/13148 and Appl. Phys. Lett. , Vol 58, 18, P1982 (1991), and aromatic dimethylidin compounds. Specific examples of the aromatic dimethylidin compounds include 1,4-phenylene dimethylidin, 4,4′-phenylene dimethylidin, 2,5-xylylene dimethylidin, 2,6-naphthylene dimethylidin, 1,4-biphenylenedimethylidin, 1,4-p-terephenylenedimethylidin, 4,4′-bis (2,2-di-t-butylphenylvinyl) biphenyl, 4,4′-bis (2 , 2-diphenylvinyl) biphenyl and the like, and derivatives thereof. Specific examples of the compound represented by the general formula (I) include bis (2-methyl-8-quinolinolato) (p-phenylphenolate) aluminum (III), bis (2-methyl-8-quinolinolato). ) (1-naphtholate) aluminum (III) and the like.

In addition, a compound in which the above-described organic light-emitting material is used as a host and the host is doped with a strong fluorescent dye from blue to green, for example, coumarin-based or the same fluorescent dye as the host, is also suitable as the organic light-emitting material. When the above-described compound is used as the organic light-emitting material, blue to green light emission (the emission color varies depending on the type of dopant) can be obtained with high efficiency. Specific examples of the host that is the material of the compound include organic light-emitting materials having a distyrylarylene skeleton (particularly preferably, 4,4′-bis (2,2-diphenylvinyl) biphenyl). Specific examples of the dopant of the material are diphenylaminovinylarylene (particularly preferably, for example, N, N-diphenylaminobiphenylbenzene and 4,4′-bis [2- [4- (N, N-di- -P-tolyl) phenyl] vinyl] biphenyl).
The light emitting layer preferably contains a known host compound and a known phosphorescent compound (also referred to as a phosphorescent compound) in order to increase the light emission efficiency of the light emitting layer.

  The host compound is a compound contained in the light-emitting layer, the mass ratio in the layer is 20% or more, and the phosphorescence quantum yield of phosphorescence emission is 0.1 at room temperature (25 ° C.). Is defined as less than a compound. The phosphorescence quantum yield is preferably less than 0.01. A plurality of host compounds may be used in combination. By using a plurality of types of host compounds, it is possible to adjust the movement of charges, and the organic EL element can be made highly efficient. In addition, by using a plurality of phosphorescent compounds, it is possible to mix different light emission, thereby obtaining an arbitrary emission color. White light emission is possible by adjusting the kind of phosphorescent compound and the amount of doping, and can also be applied to illumination and backlight.

  As these host compounds, compounds having a hole transporting ability and an electron transporting ability, preventing emission light from being increased in wavelength, and having a high Tg (glass transition temperature) are preferable. Known host compounds include, for example, JP-A Nos. 2001-257076, 2002-308855, 2001-313179, 2002-319491, 2001-357777, and 2002-334786. Gazette, 2002-8860, 2002-334787, 2002-15871, 2002-334788, 2002-43056, 2002-334789, 2002-75645 2002-338579, 2002-105445, 2002-343568, 2002-141173, 2002-352957, 2002-203683, 2002-363227 2002-231453, 2003-3165, 2002-234888, 2003-27048, 2002-255934, 2002-260861, 2002-280183, Examples thereof include compounds described in 2002-299060, 2002-302516, 2002-305083, 2002-305084, 2002-308837 and the like.

  In the case of having a plurality of light emitting layers, it is preferable that 50% by mass or more of the host compound in each layer is the same compound because it is easy to obtain a uniform film property over the entire organic layer. It is more preferable that the light emission energy is 2.9 eV or more because it is advantageous in efficiently suppressing energy transfer from the dopant and obtaining high luminance. Phosphorescence emission energy means the peak energy of the 0-0 band of phosphorescence emission when the photoluminescence of a deposited film of 100 nm is measured on a substrate with a host compound.

  The host compound has a phosphorescence emission energy of 2.9 eV or more and a Tg of 90 ° C. or more in consideration of deterioration of the organic EL device over time (decrease in luminance and film properties), market needs as a light source, and the like. Preferably there is. That is, in order to satisfy both luminance and durability, it is preferable that phosphorescence emission energy is 2.9 eV or more and Tg is 90 ° C. or more. Tg is more preferably 100 ° C. or higher.

  A phosphorescent compound (phosphorescent compound) is a compound in which light emission from an excited triplet is observed, is a compound that emits phosphorescence at room temperature (25 ° C.), and has a phosphorescence quantum yield of 25. The compound is 0.01 or more at ° C. When used in combination with the host compound described above, an organic EL device with higher luminous efficiency can be obtained.

  The phosphorescent compound according to the present invention preferably has a phosphorescence quantum yield of 0.1 or more. The phosphorescent quantum yield can be measured by the method described in Spectroscopic II, page 398 (1992 version, Maruzen) of Experimental Chemistry Course 4 of the 4th edition. Although the phosphorescence quantum yield in a solution can be measured using various solvents, the phosphorescence quantum yield used in the present invention only needs to achieve the phosphorescence quantum yield in any solvent.

  There are two types of light emission of the phosphorescent compound in principle. One is the recombination of the carrier on the host compound to which the carrier is transported to generate an excited state of the host compound, and this energy is transferred to the phosphorescent compound. The energy transfer type, in which light emission from the phosphorescent compound is obtained by moving to the phosphorescent compound, and the other is that the phosphorescent compound becomes a carrier trap, resulting in recombination of the carriers on the phosphorescent compound and from the phosphorescent compound. Although it is a carrier trap type in which light emission can be obtained, in any case, it is a condition that the excited state energy of the phosphorescent compound is lower than the excited state energy of the host compound.

  The phosphorescent compound can be appropriately selected from known compounds used for the light emitting layer of the organic EL device. The phosphorescent compound is preferably a complex compound containing a group 8-10 metal in the periodic table of elements, more preferably an iridium compound, an osmium compound, or a platinum compound (platinum complex compound), rare earth Of these, iridium compounds are the most preferred.

  In the present invention, the phosphorescence emission maximum wavelength of the phosphorescent compound is not particularly limited, and can be obtained in principle by selecting a central metal, a ligand, a ligand substituent, and the like. The emission wavelength can be changed.

  The light emission color of the organic EL device of the present invention and the compound according to the present invention is shown in FIG. 4.16 on page 108 of “New Color Science Handbook” (edited by the Japan Color Society, University of Tokyo Press, 1985). It is determined by the color when the result measured with the total CS-1000 (manufactured by Konica Minolta Sensing) is applied to the CIE chromaticity coordinates.

The white element referred to in the present invention means that the chromaticity in the CIE1931 color system at 1000 cd / m ² is X = 0.33 ± 0.07 when the front luminance at 2 ° C. viewing angle is measured by the above method. It is in the region of Y = 0.33 ± 0.07.

  The electron injection layer is made of a material having a function of transporting electrons and is included in the electron transport layer in a broad sense. The electron injection layer is a layer provided between the electrode and the organic layer for lowering the driving voltage and improving the luminance of the light emission. “Organic EL element and its forefront of industrialization (NST 30, November 30, 1998) Issue) ”, Chapter 2, Chapter 2,“ Electrode Materials ”(pages 123-166). The details of the electron injection layer (cathode buffer layer) are also described in JP-A-6-325871, JP-A-9-17574, JP-A-10-74586, and the like. Specifically, strontium, aluminum, etc. Metal buffer layer typified by lithium, alkali metal compound buffer layer typified by lithium fluoride, alkaline earth metal compound buffer layer typified by magnesium fluoride, oxide buffer layer typified by aluminum oxide, etc. . The buffer layer (injection layer) is preferably a very thin film, and the film thickness is preferably in the range of 0.1 nm to 5 μm although it depends on the material.

  In addition, as an electron transport material (also serving as a hole blocking material) used for the electron transport layer adjacent to the light emitting layer side, it is sufficient if it has a function of transmitting electrons injected from the cathode to the light emitting layer. As a material, any one of conventionally known compounds can be selected and used. For example, nitro-substituted fluorene derivatives, diphenylquinone derivatives, thiopyran dioxide derivatives, carbodiimides, fluorenylidenemethane derivatives, anthraquinodisides. Examples include methane and anthrone derivatives, oxadiazole derivatives and the like. Furthermore, in the above oxadiazole derivatives, thiadiazole derivatives in which the oxygen atom of the oxadiazole ring is substituted with a sulfur atom, and quinoxaline derivatives having a quinoxaline ring known as an electron-withdrawing group can also be used as the electron transport material. Furthermore, a polymer material in which these materials are introduced into a polymer chain or these materials are used as a polymer main chain can also be used.

  Also, metal complexes of 8-quinolinol derivatives such as tris (8-quinolinol) aluminum (Alq), tris (5,7-dichloro-8-quinolinol) aluminum, tris (5,7-dibromo-8-quinolinol) aluminum. Tris (2-methyl-8-quinolinol) aluminum, tris (5-methyl-8-quinolinol) aluminum, bis (8-quinolinol) zinc (Znq), and the like, and the central metals of these metal complexes are In, Mg, Metal complexes replaced with Cu, Ca, Sn, Ga or Pb can also be used as the electron transport material. In addition, metal-free or metal phthalocyanine, or those having terminal ends substituted with an alkyl group or a sulfonic acid group can be preferably used as the electron transporting material. Distyrylpyrazine derivatives can also be used as electron transport materials, and inorganic semiconductors such as n-type-Si and n-type-SiC are also used as electron transport materials in the same manner as the hole injection layer and hole transport layer. I can do it. Although there is no restriction | limiting in particular about the film thickness of an electron carrying layer, Usually, 5 nm-about 5 micrometers, Preferably it is 5-200 nm. The electron transport layer may have a single layer structure composed of one or more of the above materials.

  An electron transport layer having a high n property doped with impurities can also be used. Examples thereof include JP-A-4-297076, JP-A-10-270172, JP-A-2000-196140, JP-A-2001-102175, J. Pat. Appl. Phys. 95, 5773 (2004), and the like. It is preferable to use such an electron transport layer having a high n property because an element with lower power consumption can be manufactured.

As the second electrode, a material having a work function (4 eV or less) metal (referred to as an electron injecting metal), an alloy, an electrically conductive compound, and a mixture thereof as an electrode material is used. Specific examples of such electrode materials include sodium, sodium-potassium alloy, magnesium, lithium, magnesium / copper mixture, magnesium / silver mixture, magnesium / aluminum mixture, magnesium / indium mixture, aluminum / aluminum oxide (Al ₂ O ₃ ) Mixtures, indium, lithium / aluminum mixtures, rare earth metals and the like. Among these, from the point of durability against electron injection and oxidation, etc., a mixture of an electron injecting metal and a second metal which is a stable metal having a larger work function than this, for example, a magnesium / silver mixture, Suitable are a magnesium / aluminum mixture, a magnesium / indium mixture, an aluminum / aluminum oxide (Al ₂ O ₃ ) mixture, a lithium / aluminum mixture, aluminum and the like. The cathode can be produced by forming a thin film of these electrode materials by a method such as vapor deposition or sputtering. The sheet resistance as the cathode is preferably several hundred Ω / □ or less, and the film thickness is usually selected in the range of 10 nm to 5 μm, preferably 50 to 200 nm. In order to transmit the emitted light, if either one of the first electrode (anode) or the second electrode (cathode) of the organic EL element is transparent or translucent, the emission luminance is advantageously improved.

Moreover, after producing the metal with a thickness of 1 to 20 nm on the second electrode, the conductive transparent material mentioned in the description of the first electrode is produced thereon, so that a transparent or translucent second electrode ( A cathode) can be manufactured, and by applying this, an element in which both the first electrode (anode) and the second electrode (cathode) are transmissive can be manufactured.

  The external extraction efficiency at room temperature of light emission of the organic EL device according to the present invention is preferably 1% or more, more preferably 5% or more. Here, the external extraction quantum efficiency (%) = the number of photons emitted to the outside of the organic EL element / the number of electrons sent to the organic EL element × 100.

  In addition, a hue improvement filter such as a color filter may be used in combination, or a color conversion filter that converts the emission color from the organic EL element into multiple colors using a phosphor may be used in combination. In the case of using a color conversion filter, the λmax of light emission of the organic EL element is preferably 480 nm or less.

  The organic EL device according to the present invention is preferably used in combination with the following method in order to efficiently extract light generated in the light emitting layer. The organic EL element emits light inside a layer having a refractive index higher than that of air (refractive index is about 1.7 to 2.1), and only about 15% to 20% of the light generated in the light emitting layer can be extracted. It is generally said that there is no. This is because the light incident on the interface (interface between the transparent substrate and air) at an angle θ greater than the critical angle causes total reflection and cannot be taken out of the element, or the transparent electrode or light emitting layer and the transparent substrate This is because the light undergoes total reflection between them, the light is guided through the transparent electrode or the light emitting layer, and as a result, the light escapes in the direction of the side of the device.

  As a method for improving the light extraction efficiency, for example, a method of forming irregularities on the surface of the transparent substrate to prevent total reflection at the interface between the transparent substrate and the air (US Pat. No. 4,774,435). A method for improving efficiency by providing a substrate with a light condensing property (JP-A-63-314795). A method of forming a reflective surface on the side surface of an element (Japanese Patent Laid-Open No. 1-220394). A method of forming an antireflection film by introducing a flat layer having an intermediate refractive index between a substrate and a light emitter (Japanese Patent Laid-Open No. 62-172691). A method of introducing a flat layer having a lower refractive index than the substrate between the substrate and the light emitter (Japanese Patent Laid-Open No. 2001-202827). There is a method of forming a diffraction grating between any one of the substrate, the transparent electrode layer, and the light emitting layer (including between the substrate and the outside) (Japanese Patent Laid-Open No. 11-283951).

  When a low refractive index medium is formed between the transparent electrode and the transparent substrate with a thickness longer than the wavelength of light, the light extracted from the transparent electrode has a higher extraction efficiency to the outside as the refractive index of the medium is lower. . Examples of the low refractive index layer include aerogel, porous silica, magnesium fluoride, and a fluorine-based polymer. Since the refractive index of the transparent substrate is generally about 1.5 to 1.7, the low refractive index layer preferably has a refractive index of about 1.5 or less. Further, it is preferably 1.35 or less. The thickness of the low refractive index medium is preferably at least twice the wavelength in the medium. This is because the effect of the low refractive index layer is diminished when the thickness of the low refractive index medium is about the wavelength of light and the electromagnetic wave that has exuded by evanescent enters the substrate. The method of introducing a diffraction grating into an interface or any medium that causes total reflection is characterized by a high effect of improving light extraction efficiency. This method is generated from the light emitting layer by utilizing the property that the diffraction grating can change the direction of light to a specific direction different from refraction by so-called Bragg diffraction such as first-order diffraction and second-order diffraction. Of the light, the light that cannot go out due to total reflection between layers, etc. is diffracted by introducing a diffraction grating into any layer or medium (inside a transparent substrate or transparent electrode) , Trying to extract light out. The introduced diffraction grating desirably has a two-dimensional periodic refractive index. This is because light emitted from the light-emitting layer is randomly generated in all directions, so in a general one-dimensional diffraction grating having a periodic refractive index distribution only in a certain direction, only light traveling in a specific direction is diffracted. The light extraction efficiency does not increase so much. However, by making the refractive index distribution a two-dimensional distribution, light traveling in all directions is diffracted, and light extraction efficiency is increased.

  As described above, the position where the diffraction grating is introduced may be in any of the layers or in the medium (in the transparent substrate or the transparent electrode), but is preferably in the vicinity of the organic light emitting layer where light is generated. At this time, the period of the diffraction grating is preferably about 1/2 to 3 times the wavelength of light in the medium. The arrangement of the diffraction grating is preferably two-dimensionally repeated, such as a square lattice, a triangular lattice, or a honeycomb lattice.

  Furthermore, the organic EL device according to the present invention can be processed to provide, for example, a structure on a microlens array on the light extraction side of the substrate in order to efficiently extract the light generated in the light emitting layer, or so-called collection. By combining with the light sheet, the luminance in the specific direction can be increased by condensing light in a specific direction, for example, the front direction with respect to the element light emitting surface. As an example of the microlens array, quadrangular pyramids having a side of 30 μm and an apex angle of 90 degrees are two-dimensionally arranged on the light extraction side of the substrate. One side is preferably 10 μm to 100 μm. If it becomes smaller than this, the effect of diffraction will generate | occur | produce and color, and if too large, thickness will become thick and is not preferable.

  As the condensing sheet, for example, a sheet that is put into practical use in an LED backlight of a liquid crystal display device can be used. As such a sheet, for example, a brightness enhancement film (BEF) manufactured by Sumitomo 3M Limited can be used. As the shape of the prism sheet, for example, the substrate may be formed with a triangle stripe having a vertex angle of 90 degrees and a pitch of 50 μm, or the vertex angle is rounded, and the pitch is randomly changed. The shape may be other shapes. Moreover, in order to control the light emission angle from a light emitting element, you may use a light-diffusion plate and a film together with a condensing sheet. For example, a diffusion film (light-up) manufactured by Kimoto Co., Ltd. can be used.

  Hereinafter, although an example is given and the concrete effect of the present invention is shown, the mode of the present invention is not limited to this.

Example 1
An organic EL element having a size of one dot of 2 mm × 2 mm and a total of 70 dots (light emitting region) of 7 dots × 10 dots is manufactured by using the manufacturing apparatus shown in FIG. Then, an organic EL device in which a light emitting layer, an electron transport layer, a second electrode, and a sealing layer were formed in this order on a substrate was produced.
(Preparation of substrate)
A soda-lime glass having a thickness of 1.1 mm, a width of 40 mm, and a length of 60 mm was prepared as a substrate. In addition, the surface of the soda-lime glass used was a silica-coated glass for protection from acid and alkali.

(Formation of the first electrode)
The prepared glass substrate was cleaned by irradiation at a distance of 12 mm with an irradiation intensity of 15 mW / cm ² using a low-pressure mercury lamp having a wavelength of 184.2 nm. Thereafter, using the first electrode forming vapor deposition apparatus shown in FIG. 4 and using indium tin oxide (ITO) under a vacuum of 5 × 10 ⁻⁴ Pa, the deposited film forming region ( In the first electrode formation region, a patterned first electrode having a width of 2 mm, a length of 50 mm, an interval of 2 mm, a thickness of 150 nm, and 7 rows was formed.

(Formation of hole transport layer)
N, N′-diphenyl-N is used as a material for forming a hole transport layer in a vapor transport layer forming vapor deposition apparatus under a vacuum of 5 × 10 ⁻⁴ Pa using a glass substrate on which a first electrode is formed. , N′-m-tolyl 4,4′-diamino-1,1′-biphenyl (hereinafter referred to as TPD), except for one end of the first electrode formed on the glass substrate. On top of this, vapor deposition (vapor deposition) was performed.

(Formation of light emitting layer)
Using each glass substrate hole transport layer is formed, on the hole transport layers were combined with the pattern of the first electrode, using Alq ₃ as a light-emitting layer forming material, 5 × 10 ^-4 Pa vacuum Below, it vapor-deposited with the light emitting layer formation vapor deposition apparatus.

(Formation of electron transport layer)
Using a glass substrate on which a light emitting layer is formed, using LiF as a material for forming an electron transport layer in a region where a hole transport layer is formed including the light emitting layer, under a vacuum of 5 × 10 ⁻⁴ Pa LiF was deposited using an electron transport layer forming vapor deposition apparatus.

(Formation of second electrode)
Using a glass substrate on which an electron transport layer is formed, using Al as the second electrode forming material in a direction perpendicular to the first electrode on the electron transport layer, and under a vacuum of 5 × 10 ⁻⁴ Pa The substrate A was deposited by vapor deposition using a second electrode forming vapor deposition apparatus. The formed second electrode had a width of 2 mm, a length of 35 mm, an interval of 2 mm, a thickness of 150 nm, and a 10-row pattern.

(Formation of sealing film)
A glass substrate A on which the second electrode is formed is used, and silicon oxide is used as a sealing film forming material in a region where the second electrode is formed except for an end portion of the second electrode, and 5 × 10 ^−4. Substrate B was obtained by depositing silicon oxide with a sealing film forming vapor deposition apparatus under a vacuum of Pa. The thickness of the protective layer was 300 nm.

(Coating with liquid sealant)
Using the prepared substrate A and substrate B, UV curing type ThreeBond 3124C manufactured by ThreeBond Co., Ltd. was used as the liquid sealing agent, and the coating location was changed as shown in Table 1 to apply the liquid sealing agent. A prefabricated glass substrate was prepared. 1-1 to 1-4. The viscosity of the liquid sealant was 270 Pa · s.

  Met.

(Preparation of flexible sealing member)
A flexible sealing member having a substrate / barrier layer configuration was prepared.

  Substrate: A PET film having a thickness of 100 μm was used.

  Barrier layer: Silicon oxide was used as a barrier material, and the thickness was set to 500 nm by vapor deposition.

The water vapor permeability measured according to JIS-Z-0208 was 0.01 g / m ² · 24 hrs · 90% RH. The Young's modulus was 6 GPa.
(Lamination of flexible sealing member)
A glass substrate No. prepared with a liquid sealant prepared with the prepared flexible sealing member. Using the flexible sealing member bonding apparatus shown in FIGS. 4 and 5 in 1-1 to 1-4, the flexible sealing member is bonded according to the flowchart shown in FIG. Sample No. 101-104.
The Young's modulus of the first pressure-bonding member of the flexible sealing member bonding apparatus was 1 × 10 ⁻² GPa, and the Young's modulus of the second pressure-bonding member was 70 GPa.
Moreover, the surface pressure of the 1st crimping | compression-bonding member at the time of pressure-bonding holding | maintenance of the diffusion prohibition area | region of a liquid sealing agent is 0.1 MPa, liquid sealing agent at the time of pasting using the flexible sealing member bonding apparatus shown in FIG. The surface pressure of the second crimping member when crimping the coated area was 0.05 MPa. When the flexible sealing member bonding apparatus shown in FIG. 5 is used to press and hold the diffusion prohibition region of the liquid sealing agent, the surface pressure of the first pressing member is 0.1 MPa, and the coating region of the liquid sealing agent is pressed. The surface pressure of the second crimping member was 0.05 MPa. The environment for pasting was performed in a vacuum chamber set to a reduced pressure condition of 1 × 10 ⁻² Pa.

(Evaluation)
Each prepared sample No. The test was carried out according to the test methods shown below for the light emission ratios of 101 to 104. The results of evaluation according to the evaluation rank shown below are shown in Table 2.

Test Method of Luminescence Ratio Using a constant voltage power source, DC 5V was applied to one dot of the organic EL element, and the presence or absence of light emission was visually observed. Measurement was performed for all 70 dots (light emitting area), and the light emission ratio was calculated from the number of dots emitted.

Evaluation rank of light emission ratio ◎: 90% or more emits uniformly ○: 80% or more emits uniformly △: 70% or more emits uniformly ×: less than 70% emits uniformly Not

  The effectiveness of the present invention was confirmed.

Example 2
Using the same material as in Example 1, an organic EL device having the same configuration was produced.

(Production of glass substrate on which up to the second electrode is formed)
Using the same material as in Example 1, a glass substrate on which up to the second electrode was formed under the same method conditions was produced.

(Coating with liquid sealant)
An ultraviolet curable liquid sealant (ThreeBond 3124C, manufactured by ThreeBond Co., Ltd.) is applied to the periphery of the light emitting region as shown in FIG. A coated glass substrate was prepared. The viscosity of the liquid sealant was 270 Pa · s. The liquid sealing agent was applied around the light emitting region so as to have a thickness of 300 μm and a width of 500 μm.

(Preparation of flexible sealing member)
A flexible sealing member having a substrate / barrier layer configuration was prepared.

  Substrate: A PET film having a thickness of 100 μm was used.

  Barrier layer: Silicon oxide was used as a barrier material, and the thickness was set to 500 nm by vapor deposition.

The water vapor permeability measured according to JIS-Z-0208 was 0.01 g / m ² · 24 hrs · 90% RH. The Young's modulus was 6 GPa.

(Lamination of flexible sealing member)
The Young's modulus of the first pressure-bonding member and the Young's of the second pressure-bonding member of the flexible sealing-member bonding apparatus shown in FIG. 4 on the glass substrate on which the prepared flexible sealing member is prepared. The rate was changed as shown in Table 3, and the flexible sealing member was bonded according to the flowchart shown in FIG. 201-210. Further, the surface pressure of the first pressure-bonding member when pressure-holding the diffusion-prohibited region of the liquid sealant during bonding is 0.1 MPa, and the surface pressure of the second pressure-bonding member when pressure-bonding the coating region of the liquid sealant Was 0.05 MPa. The environment for pasting was performed in a vacuum chamber set to a reduced pressure condition of 1 × 10 ⁻² Pa.

(Evaluation)
Each prepared sample No. Table 3 shows the results of evaluations according to the same evaluation rank as in Example 1, in which the light emission ratio was tested by the same test method as in Example 1.

  The effectiveness of the present invention was confirmed.

Example 3
Using the same material as in Example 1, an organic EL device having the same configuration was produced.

(Production of glass substrate on which up to the second electrode is formed)
Using the same material as in Example 1, a glass substrate on which up to the second electrode was formed under the same method conditions was produced.

(Coating with liquid sealant)
An ultraviolet curable liquid sealant (ThreeBond 3124C, manufactured by ThreeBond Co., Ltd.) is applied to the periphery of the light emitting region as shown in FIG. A coated glass substrate was prepared. The viscosity of the liquid sealant was 270 Pa · s. The liquid sealing agent was applied around the light emitting region so as to have a thickness of 300 μm and a width of 500 μm.

(Preparation of flexible sealing member)
A flexible sealing member having a substrate / barrier layer configuration was prepared.

  Substrate: A PET film having a thickness of 100 μm was used.

  Barrier layer: Silicon oxide was used as a barrier material, and the thickness was set to 500 nm by vapor deposition.

The water vapor permeability measured according to JIS-Z-0208 was 0.01 g / m ² · 24 hrs · 90% RH. The Young's modulus was 6 GPa.

(Lamination of flexible sealing member)
When the prepared flexible sealing member is used, the liquid sealing agent-coated glass substrate is used to apply the flexible sealing member, and the liquid when the flexible sealing member is bonded. As shown in Table 4, the surface pressure of the first pressure-bonding member when pressure-holding the diffusion-prohibited region of the sealing agent and the surface pressure of the second pressure-bonding member when pressure-bonding the coating region of the liquid sealant are changed as shown in Table 4 A flexible sealing member is bonded according to the flowchart shown in FIG. 301 to 310.
The Young's modulus of the first pressure-bonding member was 1 × 10 ⁻² GPa, and the Young's modulus of the second pressure-bonding member was 70 GPa. The environment for pasting was performed in a vacuum chamber set to a reduced pressure condition of 1 × 10 ⁻² Pa.

(Evaluation)
Each prepared sample No. Table 4 shows the results of the evaluation of non-uniform light emission according to the same test method as in Example 1 and evaluation according to the same evaluation rank as in Example 1.

  The effectiveness of the present invention was confirmed.

Example 4
Using the same material as in Example 1, an organic EL device having the same configuration was produced.

(Production of glass substrate on which up to the second electrode is formed)
Using the same material as in Example 1, a glass substrate on which up to the second electrode was formed under the same method conditions was produced.

(Coating with liquid sealant)
An ultraviolet curable liquid sealant (ThreeBond 3124C, manufactured by ThreeBond Co., Ltd.) is applied to the periphery of the light emitting region as shown in FIG. A coated glass substrate was prepared. The viscosity of the liquid sealant was 270 Pa · s. The liquid sealing agent was applied around the light emitting region so as to have a thickness of 300 μm and a width of 500 μm.

(Preparation of flexible sealing member)
As shown in Table 5, a flexible sealing member having a Young's modulus and a thickness was prepared. 4-1 to 4-10. The water vapor permeability measured according to JIS-Z-0208 was 0.01 g / m ² · 24 hrs · 90% RH.

  Substrate: A PET film having a thickness of 100 μm was used.

  Barrier layer: Silicon oxide was used as a barrier material and was formed by vapor deposition to a thickness of 500 nm.

(Lamination of flexible sealing member)
The prepared flexible sealing member No. The flexible sealing member bonding apparatus shown in FIG. 4 is used for the liquid sealing agent-coated glass substrate prepared in 4-1 to 4-10, and the flexible sealing member is formed according to the flow chart shown in FIG. Bonding is performed to obtain an organic EL element. 401-410. The Young's modulus of the first pressure-bonding member was 1 × 10 ⁻² GPa, and the Young's modulus of the second pressure-bonding member was 70 GPa. The surface pressure of the first pressure-bonding member when pressure-holding the diffusion-prohibited region of the liquid sealing agent when the flexible sealing member is bonded is 0.1 MPa, and when the liquid-sealing agent coating region is pressure-bonded The surface pressure of the second pressure-bonding member was set to 0.05 MPa. The environment for pasting was performed in a vacuum chamber set to a reduced pressure condition of 1 × 10 ⁻² Pa.
(Evaluation)
Each prepared sample No. Table 5 shows the results of the evaluation of the light emission ratio by the same test method as in Example 1 and evaluation according to the same evaluation rank as in Example 1.

The effectiveness of the present invention was confirmed.

Example 5
Using the same material as in Example 1, an organic EL device having the same configuration was produced.

(Production of glass substrate on which up to the second electrode is formed)
Using the same material as in Example 1, a glass substrate on which up to the second electrode was formed under the same method conditions was produced.

(Coating with liquid sealant)
An ultraviolet curable liquid sealant (ThreeBond 3124C, manufactured by ThreeBond Co., Ltd.) is applied to the periphery of the light emitting region as shown in FIG. A coated glass substrate was prepared. The viscosity of the liquid sealant was 270 Pa · s. The liquid sealing agent was applied around the light emitting region so as to have a thickness of 300 μm and a width of 500 μm.

(Preparation of flexible sealing member)
A flexible sealing member having a substrate / barrier layer configuration was prepared.

  Substrate: A 100 μm PET film was used.

Barrier layer: Silicon oxide was used as a barrier material, and the thickness was set to 500 nm by vapor deposition.
Incidentally, the water vapor permeability measured according to JIS-Z-0208 was ^{0.01g / m 2 · 24hrs · 90} % RH. The Young's modulus was 6 GPa.

(Lamination of flexible sealing member)
A flexible sealing member bonding apparatus shown in FIG. 4 is used for the liquid sealing agent-coated glass substrate prepared with the prepared flexible sealing member, and under reduced pressure conditions as shown in Table 6, FIG. In accordance with the flowchart shown in FIG. 501-510. The Young's modulus of the first pressure-bonding member was 1 × 10 ⁻² GPa, and the Young's modulus of the second pressure-bonding member was 70 GPa. The surface pressure of the first pressure-bonding member when pressure-holding the diffusion-prohibited region of the liquid sealing agent when the flexible sealing member is bonded is 0.1 MPa, and when the liquid-sealing agent coating region is pressure-bonded The surface pressure of the second pressure-bonding member was set to 0.05 MPa.
(Evaluation)
Each prepared sample No. Table 6 shows the results of 501 to 510, in which the emission ratio was tested by the same test method as in Example 1 and evaluated according to the same evaluation rank as in Example 1.

  The effectiveness of the present invention was confirmed.

It is a schematic diagram which shows an example of the process of producing the organic EL element at the time of using a strip | belt-shaped film for a base material. It is a schematic diagram of the manufacturing method of the organic EL element which uses a single-wafer sheet-like board | substrate. It is a schematic plan view which shows the state which coated the liquid sealing agent on the board | substrate in which even the 2nd electrode shown by FIG. 2 was formed. It is the schematic of the sealing member bonding apparatus used for the manufacturing apparatus shown in FIG. It is the schematic of the sealing member bonding apparatus of the other system currently used for the manufacturing apparatus shown in FIG. Using the sealing member bonding apparatus shown in FIG. 4, a flexible sealing member on the liquid sealing agent coated on the light emitting region of the single-wafer sheet-like substrate on which the second electrode shown in FIG. 3 is formed It is a general | schematic fragmentary sectional view which shows the state which bonds. Using the sealing member bonding apparatus shown in FIG. 4, a flexible seal is applied on the liquid sealing agent applied to the light emitting region of the single-wafer sheet-like substrate on which the second electrode shown in FIG. 3 is formed. It is a schematic flowchart until it bonds a stop member. It is a schematic sectional drawing which shows an example of the laminated constitution of an organic EL element.

Explanation of symbols

DESCRIPTION OF SYMBOLS 1 Organic EL element 101 Base material 102 Anode 103 Hole transport layer (hole injection layer)
104 Organic compound layer (light emitting layer)
DESCRIPTION OF SYMBOLS 105 Electron injection layer 106 Cathode 107 Adhesive layer 108,11 Flexible sealing member 2,8 Manufacturing apparatus 6,808 Flexible sealing member bonding process 601,808a Liquid sealing agent coating apparatus 602 Stacking apparatus 602a , 808b1 Single sheet flexible sealing member 603, 808c, 808'c Sealing member laminating device 808c1, 808'c1 First crimping member 808c2, 808'c2 Second crimping member 808c3, 808'c3 Upper mold 808c4, 808'c4 Guide post 808c5, 808'c5 Lower die 801f Single wafer sheet 801f1 First electrode 801f2 Second electrode 801f3 Light emitting region 801f4, 801f5 Liquid sealant

Claims (9)

A step of sequentially forming at least a first electrode layer, an organic compound layer including a light emitting layer, a cathode layer including a second electrode, and a sealing layer on a substrate is formed. In the manufacturing method of the organic electroluminescent element which manufactures an organic electroluminescent element by laminating and arrange | positioning a sealing property member around a light emission area | region through a liquid sealing agent,
After coating the liquid sealant on at least the flexible sealing member, the light emitting region formed on the substrate, or the periphery of the light emitting region,
Placing the flexible sealing member on the light emitting region formed on the substrate;
The liquid sealing agent diffusion prohibition region is pressure-bonded and retained by the first pressure-bonding member from above the flexible sealing member,
After primarily laminating the flexible sealing member by crimping the placement position of the liquid sealing agent with a second crimping member,
A method for producing an organic electroluminescent element, wherein the liquid sealing agent is cured, and the flexible sealing member is bonded. 2. The method of manufacturing an organic electroluminescence element according to claim 1, wherein a Young's modulus of the first pressure-bonding member in contact with the flexible sealing member is 1 × 10 ⁻³ GPa to 80 GPa. 3. The method of manufacturing an organic electroluminescence element according to claim 1, wherein a Young's modulus of a surface of the second pressure-bonding member that contacts the flexible sealing member is 1 × 10 ⁻³ GPa to 80 GPa. . The organic pressure according to any one of claims 1 to 3, wherein a surface pressure when pressure-bonding the diffusion prohibition region of the liquid sealant by the first pressure-bonding member is 1 × 10 ^-2 MPa to 10 MPa. Manufacturing method of electroluminescent element. 5. The organic electro according to claim 1, wherein a surface pressure when the liquid sealant is disposed by the second pressure-bonding member is 1 × 10 ⁻² MPa to 10 MPa. Manufacturing method of luminescence element. The method for manufacturing an organic electroluminescence element according to claim 1, wherein the diffusion prohibited region is a light emitting region. The method of manufacturing an organic electroluminescence element according to claim 1, wherein the diffusion prohibition region is an external electrode extraction region. 8. The organic electroluminescence according to claim 1, wherein the flexible sealing member has a Young's modulus of 1 × 10 ⁻³ GPa to 80 GPa and a thickness of 10 μm to 500 μm. Device manufacturing method. The organic electroluminescent element production according to any one of claims 1 to 8, wherein the bonding of the flexible sealing member is performed under a reduced pressure condition of 10 Pa to 1 x 10 ^-4 Pa. Method.

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