JP2006510918A5 - - Google Patents
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- Publication number
- JP2006510918A5 JP2006510918A5 JP2004568964A JP2004568964A JP2006510918A5 JP 2006510918 A5 JP2006510918 A5 JP 2006510918A5 JP 2004568964 A JP2004568964 A JP 2004568964A JP 2004568964 A JP2004568964 A JP 2004568964A JP 2006510918 A5 JP2006510918 A5 JP 2006510918A5
- Authority
- JP
- Japan
- Prior art keywords
- detector
- power supply
- voltage
- transducer
- semiconductor
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 claims 20
- 238000000034 method Methods 0.000 claims 11
- 238000005259 measurement Methods 0.000 claims 4
- 230000008878 coupling Effects 0.000 claims 2
- 238000010168 coupling process Methods 0.000 claims 2
- 238000005859 coupling reaction Methods 0.000 claims 2
Applications Claiming Priority (8)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US41275202P | 2002-09-23 | 2002-09-23 | |
| US46841403P | 2003-05-06 | 2003-05-06 | |
| US46841303P | 2003-05-06 | 2003-05-06 | |
| US46841203P | 2003-05-06 | 2003-05-06 | |
| US48698303P | 2003-07-14 | 2003-07-14 | |
| US48774503P | 2003-07-16 | 2003-07-16 | |
| PCT/US2003/030303 WO2004028003A2 (en) | 2002-09-23 | 2003-09-23 | A system and method for monitoring harmonic content of an rf signal |
| US10/668,398 US7345428B2 (en) | 2002-09-23 | 2003-09-23 | Transducer package for process control |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006510918A JP2006510918A (ja) | 2006-03-30 |
| JP2006510918A5 true JP2006510918A5 (https=) | 2007-10-25 |
Family
ID=32034539
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004568964A Pending JP2006510918A (ja) | 2002-09-23 | 2003-09-23 | プロセス制御のためのトランスデューサパッケージ |
Country Status (5)
| Country | Link |
|---|---|
| US (1) | US7345428B2 (https=) |
| EP (1) | EP1547117A4 (https=) |
| JP (1) | JP2006510918A (https=) |
| AU (1) | AU2003276946A1 (https=) |
| WO (1) | WO2004028003A2 (https=) |
Families Citing this family (28)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7049751B2 (en) * | 2003-07-16 | 2006-05-23 | Advanced Energy Industries, Inc | Termination of secondary frequencies in RF power delivery |
| US6983215B2 (en) * | 2003-12-02 | 2006-01-03 | Mks Instruments, Inc. | RF metrology characterization for field installation and serviceability for the plasma processing industry |
| WO2006019897A2 (en) * | 2004-08-04 | 2006-02-23 | Ng James K | Led lighting system |
| JP2008527378A (ja) * | 2005-01-11 | 2008-07-24 | イノベーション エンジニアリング、エルエルシー | 負荷に供給されたrf電力およびその負荷の複素インピーダンスを検出する方法 |
| US7602127B2 (en) * | 2005-04-18 | 2009-10-13 | Mks Instruments, Inc. | Phase and frequency control of a radio frequency generator from an external source |
| US20060263925A1 (en) * | 2005-05-10 | 2006-11-23 | Chandler David L | Ethernet-powered particle counting system |
| US7885774B2 (en) * | 2005-06-10 | 2011-02-08 | Bird Technologies Group Inc. | System and method for analyzing power flow in semiconductor plasma generation systems |
| CN100362619C (zh) * | 2005-08-05 | 2008-01-16 | 中微半导体设备(上海)有限公司 | 真空反应室的射频匹配耦合网络及其配置方法 |
| EP2264472B1 (de) * | 2005-10-19 | 2018-05-30 | b2 electronic GmbH | Einrichtung zur Messung des Verlustfaktors |
| WO2007124202A2 (en) * | 2006-04-20 | 2007-11-01 | Turner Enterprises & Associates, Lp | Ac coupled voltage transducer for an rf sensor |
| US7821250B2 (en) * | 2006-07-31 | 2010-10-26 | Inficon, Inc. | RF sensor clamp assembly |
| JP4897582B2 (ja) * | 2007-06-15 | 2012-03-14 | 中国電力株式会社 | マルチトランスデューサ及びその制御方法 |
| US8289029B2 (en) | 2008-02-14 | 2012-10-16 | Mks Instruments, Inc. | Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events |
| US7746057B2 (en) * | 2008-03-28 | 2010-06-29 | Cirrus Logic, Inc. | Power meter having complex quadrature output current and voltage filters |
| US8213885B2 (en) * | 2008-04-11 | 2012-07-03 | Nautel Limited | Impedance measurement in an active radio frequency transmitter |
| UY31825A (es) * | 2008-05-13 | 2010-01-05 | Res And Innovation Inc | Método de iniciación para descarga de plasma luminiscente anormal en un medio de fase líquida y dispositivo para su implementación |
| US8044594B2 (en) * | 2008-07-31 | 2011-10-25 | Advanced Energy Industries, Inc. | Power supply ignition system and method |
| US8667123B2 (en) * | 2008-09-29 | 2014-03-04 | Woodhead Industries, Inc. | Microcontroller network diagnostic system |
| US9103026B1 (en) * | 2010-10-21 | 2015-08-11 | Apollo Precision Beijing Limited | Filter circuit for a magnetron deposition source |
| KR101156569B1 (ko) | 2010-12-09 | 2012-06-20 | 국방과학연구소 | 표적 iemi 분석용 다층 도넛 형태의 광대역 소형 전계 프로브 |
| CN102495389B (zh) * | 2011-12-23 | 2014-09-24 | 安徽节源节能科技有限公司 | 电工测量仪器模型校准方法及系统 |
| JP2014066681A (ja) * | 2012-09-27 | 2014-04-17 | Daihen Corp | 高周波検出装置、および、当該高周波検出装置を備えた高周波測定装置 |
| US11120971B2 (en) | 2017-07-10 | 2021-09-14 | Reno Technologies, Inc. | Diagnostics for impedance matching network |
| US11422172B2 (en) * | 2018-09-17 | 2022-08-23 | Tegam, Inc. | RF coaxial thermal power sensor |
| JP7569858B2 (ja) | 2019-12-02 | 2024-10-18 | ラム リサーチ コーポレーション | 無線周波数支援プラズマ生成におけるインピーダンス変換 |
| US20240203711A1 (en) * | 2020-03-27 | 2024-06-20 | Lam Research Corporation | Rf signal parameter measurement in an integrated circuit fabrication chamber |
| EP4312032B1 (de) | 2022-07-27 | 2025-01-22 | Hochschule für Angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen | Messvorrichtung für wechselströme und -hochspannungen von physikalischen plasmen |
| WO2025212119A1 (en) * | 2024-04-03 | 2025-10-09 | Bird Technologies Group Inc. | System and method for detecting and inhibiting arcing in semiconductor plasma generation systems |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4263653A (en) * | 1979-06-04 | 1981-04-21 | Bird Electronic Corporation | Digital RF wattmeter |
| JPS5916572A (ja) * | 1982-07-21 | 1984-01-27 | 多賀電気株式会社 | 超音波変換器駆動装置の駆動周波数制御方法 |
| JPH0747820B2 (ja) * | 1989-09-22 | 1995-05-24 | 株式会社日立製作所 | 成膜装置 |
| US5314603A (en) * | 1991-07-24 | 1994-05-24 | Tokyo Electron Yamanashi Limited | Plasma processing apparatus capable of detecting and regulating actual RF power at electrode within chamber |
| US5325019A (en) * | 1992-08-21 | 1994-06-28 | Sematech, Inc. | Control of plasma process by use of harmonic frequency components of voltage and current |
| US5343404A (en) * | 1992-11-12 | 1994-08-30 | Maritec Corp. | Precision digital multimeter and waveform synthesizer for multi-signals with distorted waveforms embedded in noise |
| US5587630A (en) * | 1993-10-28 | 1996-12-24 | Pratt & Whitney Canada Inc. | Continuous plasma ignition system |
| US5467013A (en) * | 1993-12-07 | 1995-11-14 | Sematech, Inc. | Radio frequency monitor for semiconductor process control |
| US5474648A (en) * | 1994-07-29 | 1995-12-12 | Lsi Logic Corporation | Uniform and repeatable plasma processing |
| US5565737A (en) * | 1995-06-07 | 1996-10-15 | Eni - A Division Of Astec America, Inc. | Aliasing sampler for plasma probe detection |
| US5770922A (en) * | 1996-07-22 | 1998-06-23 | Eni Technologies, Inc. | Baseband V-I probe |
| JP2825084B2 (ja) * | 1996-08-29 | 1998-11-18 | 日本電気株式会社 | 半導体装置およびその製造方法 |
| US5834931A (en) * | 1996-10-31 | 1998-11-10 | Sematech, Inc. | RF current sensor |
| US5866985A (en) * | 1996-12-03 | 1999-02-02 | International Business Machines Corporation | Stable matching networks for plasma tools |
| US6046594A (en) * | 1997-02-11 | 2000-04-04 | Advanced Energy Voorhees, Inc. | Method and apparatus for monitoring parameters of an RF powered load in the presence of harmonics |
| US5808415A (en) * | 1997-03-19 | 1998-09-15 | Scientific Systems Research Limited | Apparatus for sensing RF current delivered to a plasma with two inductive loops |
| US6174450B1 (en) * | 1997-04-16 | 2001-01-16 | Lam Research Corporation | Methods and apparatus for controlling ion energy and plasma density in a plasma processing system |
| KR100560886B1 (ko) * | 1997-09-17 | 2006-03-13 | 동경 엘렉트론 주식회사 | 가스 플라즈마 프로세스를 감시 및 제어하기 위한 시스템및 방법 |
| US5971591A (en) * | 1997-10-20 | 1999-10-26 | Eni Technologies, Inc. | Process detection system for plasma process |
| WO2002054091A2 (en) * | 2001-01-08 | 2002-07-11 | Tokyo Electron Limited | Capacity coupled rf voltage probe |
| US6522121B2 (en) * | 2001-03-20 | 2003-02-18 | Eni Technology, Inc. | Broadband design of a probe analysis system |
| US6791274B1 (en) * | 2003-07-15 | 2004-09-14 | Advanced Energy Industries, Inc. | RF power control device for RF plasma applications |
-
2003
- 2003-09-23 EP EP03797932A patent/EP1547117A4/en not_active Withdrawn
- 2003-09-23 JP JP2004568964A patent/JP2006510918A/ja active Pending
- 2003-09-23 WO PCT/US2003/030303 patent/WO2004028003A2/en not_active Ceased
- 2003-09-23 AU AU2003276946A patent/AU2003276946A1/en not_active Abandoned
- 2003-09-23 US US10/668,398 patent/US7345428B2/en active Active
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