JP2006510918A - プロセス制御のためのトランスデューサパッケージ - Google Patents

プロセス制御のためのトランスデューサパッケージ Download PDF

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Publication number
JP2006510918A
JP2006510918A JP2004568964A JP2004568964A JP2006510918A JP 2006510918 A JP2006510918 A JP 2006510918A JP 2004568964 A JP2004568964 A JP 2004568964A JP 2004568964 A JP2004568964 A JP 2004568964A JP 2006510918 A JP2006510918 A JP 2006510918A
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JP
Japan
Prior art keywords
voltage
current
signal
transducer
detector
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Pending
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JP2004568964A
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Japanese (ja)
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JP2006510918A5 (https=
Inventor
テリー アール． ターナー，
Original Assignee
ターナー エンタープライジーズ アンド アソシエイツ
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Application filed by ターナー エンタープライジーズ アンド アソシエイツ filed Critical ターナー エンタープライジーズ アンド アソシエイツ
Publication of JP2006510918A publication Critical patent/JP2006510918A/ja
Publication of JP2006510918A5 publication Critical patent/JP2006510918A5/ja
Pending legal-status Critical Current

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    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0007—Frequency selective voltage or current level measuring
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0046—Arrangements for measuring currents or voltages or for indicating presence or sign thereof characterised by a specific application or detail not covered by any other subgroup of G01R19/00
    • G01R19/0061—Measuring currents of particle-beams, currents from electron multipliers, photocurrents, ion currents; Measuring in plasmas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32174—Circuits specially adapted for controlling the RF discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32917—Plasma diagnostics
    • H01J37/32935—Monitoring and controlling tubes by information coming from the object and/or discharge
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01R—MEASURING ELECTRIC VARIABLES; MEASURING MAGNETIC VARIABLES
    • G01R19/00—Arrangements for measuring currents or voltages or for indicating presence or sign thereof
    • G01R19/0046—Arrangements for measuring currents or voltages or for indicating presence or sign thereof characterised by a specific application or detail not covered by any other subgroup of G01R19/00
    • G01R19/0053—Noise discrimination; Analog sampling; Measuring transients

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Plasma Technology (AREA)
  • Measurement Of Resistance Or Impedance (AREA)
  • Drying Of Semiconductors (AREA)
JP2004568964A 2002-09-23 2003-09-23 プロセス制御のためのトランスデューサパッケージ Pending JP2006510918A (ja)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
US41275202P 2002-09-23 2002-09-23
US46841403P 2003-05-06 2003-05-06
US46841303P 2003-05-06 2003-05-06
US46841203P 2003-05-06 2003-05-06
US48698303P 2003-07-14 2003-07-14
US48774503P 2003-07-16 2003-07-16
PCT/US2003/030303 WO2004028003A2 (en) 2002-09-23 2003-09-23 A system and method for monitoring harmonic content of an rf signal
US10/668,398 US7345428B2 (en) 2002-09-23 2003-09-23 Transducer package for process control

Publications (2)

Publication Number Publication Date
JP2006510918A true JP2006510918A (ja) 2006-03-30
JP2006510918A5 JP2006510918A5 (https=) 2007-10-25

Family

ID=32034539

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004568964A Pending JP2006510918A (ja) 2002-09-23 2003-09-23 プロセス制御のためのトランスデューサパッケージ

Country Status (5)

Country Link
US (1) US7345428B2 (https=)
EP (1) EP1547117A4 (https=)
JP (1) JP2006510918A (https=)
AU (1) AU2003276946A1 (https=)
WO (1) WO2004028003A2 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008309715A (ja) * 2007-06-15 2008-12-25 Chugoku Electric Power Co Inc:The マルチトランスデューサ及びその制御方法
KR101156569B1 (ko) 2010-12-09 2012-06-20 국방과학연구소 표적 ｉｅｍｉ 분석용 다층 도넛 형태의 광대역 소형 전계 프로브
JP2014066681A (ja) * 2012-09-27 2014-04-17 Daihen Corp 高周波検出装置、および、当該高周波検出装置を備えた高周波測定装置

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US7049751B2 (en) * 2003-07-16 2006-05-23 Advanced Energy Industries, Inc Termination of secondary frequencies in RF power delivery
US6983215B2 (en) * 2003-12-02 2006-01-03 Mks Instruments, Inc. RF metrology characterization for field installation and serviceability for the plasma processing industry
WO2006019897A2 (en) * 2004-08-04 2006-02-23 Ng James K Led lighting system
JP2008527378A (ja) * 2005-01-11 2008-07-24 イノベーション エンジニアリング、エルエルシー 負荷に供給されたｒｆ電力およびその負荷の複素インピーダンスを検出する方法
US7602127B2 (en) * 2005-04-18 2009-10-13 Mks Instruments, Inc. Phase and frequency control of a radio frequency generator from an external source
US20060263925A1 (en) * 2005-05-10 2006-11-23 Chandler David L Ethernet-powered particle counting system
US7885774B2 (en) * 2005-06-10 2011-02-08 Bird Technologies Group Inc. System and method for analyzing power flow in semiconductor plasma generation systems
CN100362619C (zh) * 2005-08-05 2008-01-16 中微半导体设备(上海)有限公司 真空反应室的射频匹配耦合网络及其配置方法
EP2264472B1 (de) * 2005-10-19 2018-05-30 b2 electronic GmbH Einrichtung zur Messung des Verlustfaktors
WO2007124202A2 (en) * 2006-04-20 2007-11-01 Turner Enterprises & Associates, Lp Ac coupled voltage transducer for an rf sensor
US7821250B2 (en) * 2006-07-31 2010-10-26 Inficon, Inc. RF sensor clamp assembly
US8289029B2 (en) 2008-02-14 2012-10-16 Mks Instruments, Inc. Application of wideband sampling for arc detection with a probabilistic model for quantitatively measuring arc events
US7746057B2 (en) * 2008-03-28 2010-06-29 Cirrus Logic, Inc. Power meter having complex quadrature output current and voltage filters
US8213885B2 (en) * 2008-04-11 2012-07-03 Nautel Limited Impedance measurement in an active radio frequency transmitter
UY31825A (es) * 2008-05-13 2010-01-05 Res And Innovation Inc Método de iniciación para descarga de plasma luminiscente anormal en un medio de fase líquida y dispositivo para su implementación
US8044594B2 (en) * 2008-07-31 2011-10-25 Advanced Energy Industries, Inc. Power supply ignition system and method
US8667123B2 (en) * 2008-09-29 2014-03-04 Woodhead Industries, Inc. Microcontroller network diagnostic system
US9103026B1 (en) * 2010-10-21 2015-08-11 Apollo Precision Beijing Limited Filter circuit for a magnetron deposition source
CN102495389B (zh) * 2011-12-23 2014-09-24 安徽节源节能科技有限公司 电工测量仪器模型校准方法及系统
US11120971B2 (en) 2017-07-10 2021-09-14 Reno Technologies, Inc. Diagnostics for impedance matching network
US11422172B2 (en) * 2018-09-17 2022-08-23 Tegam, Inc. RF coaxial thermal power sensor
JP7569858B2 (ja) 2019-12-02 2024-10-18 ラム リサーチ コーポレーション 無線周波数支援プラズマ生成におけるインピーダンス変換
US20240203711A1 (en) * 2020-03-27 2024-06-20 Lam Research Corporation Rf signal parameter measurement in an integrated circuit fabrication chamber
EP4312032B1 (de) 2022-07-27 2025-01-22 Hochschule für Angewandte Wissenschaft und Kunst Hildesheim/Holzminden/Göttingen Messvorrichtung für wechselströme und -hochspannungen von physikalischen plasmen
WO2025212119A1 (en) * 2024-04-03 2025-10-09 Bird Technologies Group Inc. System and method for detecting and inhibiting arcing in semiconductor plasma generation systems

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US4263653A (en) * 1979-06-04 1981-04-21 Bird Electronic Corporation Digital RF wattmeter
JPS5916572A (ja) * 1982-07-21 1984-01-27 多賀電気株式会社 超音波変換器駆動装置の駆動周波数制御方法
JPH0747820B2 (ja) * 1989-09-22 1995-05-24 株式会社日立製作所 成膜装置
US5314603A (en) * 1991-07-24 1994-05-24 Tokyo Electron Yamanashi Limited Plasma processing apparatus capable of detecting and regulating actual RF power at electrode within chamber
US5325019A (en) * 1992-08-21 1994-06-28 Sematech, Inc. Control of plasma process by use of harmonic frequency components of voltage and current
US5343404A (en) * 1992-11-12 1994-08-30 Maritec Corp. Precision digital multimeter and waveform synthesizer for multi-signals with distorted waveforms embedded in noise
US5587630A (en) * 1993-10-28 1996-12-24 Pratt & Whitney Canada Inc. Continuous plasma ignition system
US5467013A (en) * 1993-12-07 1995-11-14 Sematech, Inc. Radio frequency monitor for semiconductor process control
US5474648A (en) * 1994-07-29 1995-12-12 Lsi Logic Corporation Uniform and repeatable plasma processing
US5565737A (en) * 1995-06-07 1996-10-15 Eni - A Division Of Astec America, Inc. Aliasing sampler for plasma probe detection
US5770922A (en) * 1996-07-22 1998-06-23 Eni Technologies, Inc. Baseband V-I probe
JP2825084B2 (ja) * 1996-08-29 1998-11-18 日本電気株式会社 半導体装置およびその製造方法
US5834931A (en) * 1996-10-31 1998-11-10 Sematech, Inc. RF current sensor
US5866985A (en) * 1996-12-03 1999-02-02 International Business Machines Corporation Stable matching networks for plasma tools
US6046594A (en) * 1997-02-11 2000-04-04 Advanced Energy Voorhees, Inc. Method and apparatus for monitoring parameters of an RF powered load in the presence of harmonics
US5808415A (en) * 1997-03-19 1998-09-15 Scientific Systems Research Limited Apparatus for sensing RF current delivered to a plasma with two inductive loops
US6174450B1 (en) * 1997-04-16 2001-01-16 Lam Research Corporation Methods and apparatus for controlling ion energy and plasma density in a plasma processing system
KR100560886B1 (ko) * 1997-09-17 2006-03-13 동경 엘렉트론 주식회사 가스 플라즈마 프로세스를 감시 및 제어하기 위한 시스템및 방법
US5971591A (en) * 1997-10-20 1999-10-26 Eni Technologies, Inc. Process detection system for plasma process
WO2002054091A2 (en) * 2001-01-08 2002-07-11 Tokyo Electron Limited Capacity coupled rf voltage probe
US6522121B2 (en) * 2001-03-20 2003-02-18 Eni Technology, Inc. Broadband design of a probe analysis system
US6791274B1 (en) * 2003-07-15 2004-09-14 Advanced Energy Industries, Inc. RF power control device for RF plasma applications

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008309715A (ja) * 2007-06-15 2008-12-25 Chugoku Electric Power Co Inc:The マルチトランスデューサ及びその制御方法
KR101156569B1 (ko) 2010-12-09 2012-06-20 국방과학연구소 표적 ｉｅｍｉ 분석용 다층 도넛 형태의 광대역 소형 전계 프로브
JP2014066681A (ja) * 2012-09-27 2014-04-17 Daihen Corp 高周波検出装置、および、当該高周波検出装置を備えた高周波測定装置

Also Published As

Publication number Publication date
US20040253921A1 (en) 2004-12-16
EP1547117A2 (en) 2005-06-29
WO2004028003A2 (en) 2004-04-01
EP1547117A4 (en) 2010-04-07
AU2003276946A8 (en) 2004-04-08
WO2004028003A3 (en) 2004-06-03
AU2003276946A1 (en) 2004-04-08
US7345428B2 (en) 2008-03-18

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