JP2006506533A - 抵抗加熱ボート及びその製造方法 - Google Patents
抵抗加熱ボート及びその製造方法 Download PDFInfo
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- JP2006506533A JP2006506533A JP2004562083A JP2004562083A JP2006506533A JP 2006506533 A JP2006506533 A JP 2006506533A JP 2004562083 A JP2004562083 A JP 2004562083A JP 2004562083 A JP2004562083 A JP 2004562083A JP 2006506533 A JP2006506533 A JP 2006506533A
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- 238000010438 heat treatment Methods 0.000 title claims abstract description 95
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 44
- 239000010410 layer Substances 0.000 claims abstract description 81
- 229910052782 aluminium Inorganic materials 0.000 claims abstract description 78
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims abstract description 78
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 52
- 229910002804 graphite Inorganic materials 0.000 claims abstract description 52
- 239000010439 graphite Substances 0.000 claims abstract description 52
- 238000000034 method Methods 0.000 claims abstract description 49
- 238000001704 evaporation Methods 0.000 claims abstract description 45
- 229910017464 nitrogen compound Inorganic materials 0.000 claims abstract description 45
- 150000002830 nitrogen compounds Chemical class 0.000 claims abstract description 45
- 239000011241 protective layer Substances 0.000 claims abstract description 38
- 230000008020 evaporation Effects 0.000 claims abstract description 36
- 238000000576 coating method Methods 0.000 claims abstract description 34
- 239000011248 coating agent Substances 0.000 claims abstract description 30
- 229910052751 metal Inorganic materials 0.000 claims abstract description 26
- 239000002184 metal Substances 0.000 claims abstract description 26
- 239000000126 substance Substances 0.000 claims abstract description 11
- 239000000758 substrate Substances 0.000 claims abstract description 10
- 238000012545 processing Methods 0.000 claims abstract description 7
- 238000001883 metal evaporation Methods 0.000 claims abstract description 4
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 claims description 29
- 229910052582 BN Inorganic materials 0.000 claims description 28
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 claims description 10
- 150000001639 boron compounds Chemical class 0.000 claims description 10
- 239000000463 material Substances 0.000 claims description 9
- 239000003054 catalyst Substances 0.000 claims description 7
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims description 6
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims description 6
- 239000007921 spray Substances 0.000 claims description 6
- 239000010936 titanium Substances 0.000 claims description 6
- 229910052719 titanium Inorganic materials 0.000 claims description 6
- 229910052720 vanadium Inorganic materials 0.000 claims description 6
- 239000003795 chemical substances by application Substances 0.000 claims description 5
- 229910052742 iron Inorganic materials 0.000 claims description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 4
- 239000013078 crystal Substances 0.000 claims description 4
- 229910052710 silicon Inorganic materials 0.000 claims description 4
- 239000010703 silicon Substances 0.000 claims description 4
- 239000003973 paint Substances 0.000 claims description 3
- 230000001737 promoting effect Effects 0.000 claims description 2
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 1
- 238000001771 vacuum deposition Methods 0.000 description 13
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 12
- 230000008569 process Effects 0.000 description 11
- 239000011247 coating layer Substances 0.000 description 8
- 239000000654 additive Substances 0.000 description 6
- 229910052786 argon Inorganic materials 0.000 description 6
- 150000001875 compounds Chemical class 0.000 description 6
- 238000011161 development Methods 0.000 description 6
- 239000010408 film Substances 0.000 description 6
- 239000007789 gas Substances 0.000 description 6
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 6
- 230000015572 biosynthetic process Effects 0.000 description 5
- 239000012535 impurity Substances 0.000 description 5
- 230000009257 reactivity Effects 0.000 description 5
- 229910052721 tungsten Inorganic materials 0.000 description 5
- 239000010937 tungsten Substances 0.000 description 5
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 5
- 238000007740 vapor deposition Methods 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- 230000000996 additive effect Effects 0.000 description 3
- 239000003990 capacitor Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 238000010894 electron beam technology Methods 0.000 description 3
- 230000006698 induction Effects 0.000 description 3
- 229910000765 intermetallic Inorganic materials 0.000 description 3
- 230000008018 melting Effects 0.000 description 3
- 238000002844 melting Methods 0.000 description 3
- 239000008188 pellet Substances 0.000 description 3
- 238000005240 physical vapour deposition Methods 0.000 description 3
- 238000004064 recycling Methods 0.000 description 3
- 239000003870 refractory metal Substances 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- JXOOCQBAIRXOGG-UHFFFAOYSA-N [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] Chemical compound [B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[B].[Al] JXOOCQBAIRXOGG-UHFFFAOYSA-N 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 238000010586 diagram Methods 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- 238000007733 ion plating Methods 0.000 description 2
- 238000004806 packaging method and process Methods 0.000 description 2
- 239000004033 plastic Substances 0.000 description 2
- 239000000843 powder Substances 0.000 description 2
- 239000011253 protective coating Substances 0.000 description 2
- 230000035484 reaction time Effects 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 238000004544 sputter deposition Methods 0.000 description 2
- 150000003609 titanium compounds Chemical class 0.000 description 2
- AUZMWGNTACEWDV-UHFFFAOYSA-L titanium(2+);dibromide Chemical compound Br[Ti]Br AUZMWGNTACEWDV-UHFFFAOYSA-L 0.000 description 2
- 238000007738 vacuum evaporation Methods 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- FGUJWQZQKHUJMW-UHFFFAOYSA-N [AlH3].[B] Chemical compound [AlH3].[B] FGUJWQZQKHUJMW-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- CAVCGVPGBKGDTG-UHFFFAOYSA-N alumanylidynemethyl(alumanylidynemethylalumanylidenemethylidene)alumane Chemical compound [Al]#C[Al]=C=[Al]C#[Al] CAVCGVPGBKGDTG-UHFFFAOYSA-N 0.000 description 1
- 229910003481 amorphous carbon Inorganic materials 0.000 description 1
- 150000001722 carbon compounds Chemical class 0.000 description 1
- 239000002131 composite material Substances 0.000 description 1
- 239000002537 cosmetic Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 238000007429 general method Methods 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 229910052737 gold Inorganic materials 0.000 description 1
- 239000010931 gold Substances 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000000696 magnetic material Substances 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 239000012785 packaging film Substances 0.000 description 1
- 229920006280 packaging film Polymers 0.000 description 1
- 239000005022 packaging material Substances 0.000 description 1
- 230000002093 peripheral effect Effects 0.000 description 1
- 238000007747 plating Methods 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 238000002310 reflectometry Methods 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 238000005245 sintering Methods 0.000 description 1
- -1 specifically Chemical compound 0.000 description 1
- 238000003892 spreading Methods 0.000 description 1
- 230000007480 spreading Effects 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 239000010409 thin film Substances 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 239000011135 tin Substances 0.000 description 1
- 238000012546 transfer Methods 0.000 description 1
- 238000005019 vapor deposition process Methods 0.000 description 1
- 238000009834 vaporization Methods 0.000 description 1
- 230000008016 vaporization Effects 0.000 description 1
- 238000009736 wetting Methods 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/243—Crucibles for source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
- C23C14/26—Vacuum evaporation by resistance or inductive heating of the source
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Abstract
前記抵抗加熱ボートの製造方法は、抵抗加熱方式で金属蒸発物を基板に真空蒸着させる抵抗加熱ボートの製造方法において、黒鉛層31を、蒸発させようとする物質を位置させ得るように表面に蒸発孔2を有するボート形状で加工する段階と、前記黒鉛層31の表面に窒素化合物をコーティングさせる段階と、前記黒鉛層31の蒸発孔2にアルミニウムを位置させた後、熱処理により前記窒素化合物とアルミニウムとを反応させて、黒鉛層31の表面に、前記黒鉛層31が前記金属蒸発物と反応しないようにする保護層30を形成させる段階とを備えることを特徴とする。
本発明によれば、アルミニウムを含む金属を安定的且つ連続的に蒸発させることができるようになる。
Description
保護層30を形成するのにあって 経済性が劣り、形成された保護層30も、熱損失が大きくなり、金属蒸発物の蒸発時に悪影響を及ぼす。従って、本発明に係る抵抗加熱ボート10の保護層30は、その厚さが20乃至200μmであることが好ましい。
2 蒸発孔
10 ボート
20 ボート製造装置
21 ホルダー支持台
23 水冷ブロック
24 ボートホルダー
Claims (10)
- 抵抗加熱方式で金属蒸発物を基板に真空蒸着させる抵抗加熱ボートにおいて、
前記抵抗加熱ボートは、
ボート形状で加工される黒鉛層31と、
前記黒鉛層31の表面に形成され、前記黒鉛層31が前記金属蒸発物と反応しないようにする保護層30とを備え、
前記保護層30は、アルミニウムリーチ層32と窒素化合物層33とを含むことを特徴とする抵抗加熱ボート。 - 前記保護層30は、塊状結晶の形態で分布するホウ素化合物層34をさらに含むことを特徴とする請求項1に記載の抵抗加熱ボート。
- 前記保護層30の厚さは、20乃至200μmであることを特徴とする請求項1又は2に記載の抵抗加熱ボート。
- 抵抗加熱方式で金属蒸発物を基板に真空蒸着させる抵抗加熱ボートの製造方法において、
黒鉛層31を、蒸発させようとする物質を位置させ得るように表面に蒸発孔2を有するボート形状で加工する段階と、
前記黒鉛層31の表面に窒素化合物をコーティングさせる段階と、
前記黒鉛層31の蒸発孔2にアルミニウムを位置させた後、熱処理により前記窒素化合物と前記アルミニウムとを反応させて、黒鉛層31の表面に、前記黒鉛層31が前記金属蒸発物と反応しないようにする保護層30を形成させる段階とを備えることを特徴とする抵抗加熱ボートの製造方法。 - 前記窒素化合物をコーティングさせる段階において、前記アルミニウムと前記窒素化合物との反応を促進させるための触媒剤を前記窒素化合物と一緒にコーティングさせることを特徴とする請求項4に記載の抵抗加熱ボートの製造方法。
- 前記窒素化合物をコーティングさせる段階において、前記窒素化合物は、窒化ホウ素であることを特徴とする請求項4又は5に記載の抵抗加熱ボートの製造方法。
- 前記触媒剤は、酸化アルミニウム、チタニウム、バナジウム、鉄及びシリコンよりなる群から選ばれた1種以上であることを特徴とする請求項5に記載の抵抗加熱ボートの製造方法。
- 前記コーティングさせる段階において、前記コーティングされた厚さが、0.005乃至0.4g/dm2となるように行われることを特徴とする請求項4又は5に記載の抵抗加熱ボートの製造方法。
- 前記コーティングさせる段階において、スプレイ方式でコーティングさせることを特徴とする請求項4又は5に記載の抵抗加熱ボートの製造方法。
- 前記コーティングさせる段階において、ペイント方式でコーティングさせることを特徴とする請求項4又は5に記載の抵抗加熱ボートの製造方法。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
KR10-2002-0082792A KR100489304B1 (ko) | 2002-12-23 | 2002-12-23 | 저항가열 보트 및 그 제조방법 |
PCT/KR2003/002620 WO2004057052A1 (en) | 2002-12-23 | 2003-12-01 | Resistance-heated boat and manufacturing method thereof |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2006506533A true JP2006506533A (ja) | 2006-02-23 |
JP4234681B2 JP4234681B2 (ja) | 2009-03-04 |
Family
ID=36567505
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004562083A Expired - Fee Related JP4234681B2 (ja) | 2002-12-23 | 2003-12-01 | 抵抗加熱ボートの製造方法 |
Country Status (7)
Country | Link |
---|---|
US (1) | US20060115243A1 (ja) |
JP (1) | JP4234681B2 (ja) |
KR (1) | KR100489304B1 (ja) |
CN (1) | CN100494476C (ja) |
DE (1) | DE10393947B4 (ja) |
GB (1) | GB2411408B (ja) |
WO (1) | WO2004057052A1 (ja) |
Families Citing this family (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE102005030862B4 (de) * | 2005-07-01 | 2009-12-24 | Sintec Keramik Gmbh | Erstbenetzungshilfsmaterial für einen Verdampferkörper, seine Verwendung zum Herrichten der Verdampferfläche eines Verdampferkörpers und ein elektrisch beheizbarer keramischer Verdampferkörper |
US7494616B2 (en) * | 2005-11-04 | 2009-02-24 | Momentive Performance Materials Inc. | Container for evaporation of metal and method to manufacture thereof |
JP2008176567A (ja) * | 2007-01-18 | 2008-07-31 | Fujitsu Ltd | プリント基板組立体、情報技術装置用筐体及び情報技術装置 |
DE102010052143B4 (de) * | 2010-11-10 | 2014-06-26 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Tiegel zur Aufnahme eines Werkstoffs, der mit einem CVD- oder PVD-Verfahren verdampft werden soll |
US10184168B2 (en) | 2015-01-20 | 2019-01-22 | Kennametal Inc. | IMC evaporator boat-thermal insulation cartridge assembly |
US20160208373A1 (en) | 2015-01-20 | 2016-07-21 | Kennametal Inc. | Imc evaporator boat assembly |
DE102019110950A1 (de) | 2019-04-29 | 2020-10-29 | Kennametal Inc. | Hartmetallzusammensetzungen und deren Anwendungen |
CN112144018A (zh) * | 2020-08-14 | 2020-12-29 | 浙江长宇新材料有限公司 | 一种带氧化物中间层的复合材料制备系统及方法 |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
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US3063865A (en) * | 1957-06-03 | 1962-11-13 | Nat Steel Corp | Process of treating a boron nitride crucible with molten aluminum |
DE1289712C2 (de) * | 1965-08-11 | 1973-12-13 | Kempten Elektroschmelz Gmbh | Verdampfer fuer das Vakuumaufdampfen von Metallschichten auf Werkstoffe |
US3553010A (en) * | 1967-07-26 | 1971-01-05 | Sigri Elektrographit Gmbh | Carbon or graphite formed body |
JPS59590B2 (ja) * | 1976-02-25 | 1984-01-07 | 株式会社日立製作所 | 抵抗加熱蒸着用ボ−ト |
US4264803A (en) * | 1978-01-10 | 1981-04-28 | Union Carbide Corporation | Resistance-heated pyrolytic boron nitride coated graphite boat for metal vaporization |
US4199480A (en) * | 1978-05-25 | 1980-04-22 | Gte Sylvania Incorporated | Electrically conductive boat for vacuum evaporation of metals |
US4446357A (en) * | 1981-10-30 | 1984-05-01 | Kennecott Corporation | Resistance-heated boat for metal vaporization |
US4847031A (en) * | 1987-12-16 | 1989-07-11 | Gte Products Corporation | Evaporating boats containing titanium diboride |
US5239612A (en) * | 1991-12-20 | 1993-08-24 | Praxair S.T. Technology, Inc. | Method for resistance heating of metal using a pyrolytic boron nitride coated graphite boat |
CN1047209C (zh) * | 1994-09-28 | 1999-12-08 | 先进陶瓷公司 | 高密度闪蒸器 |
DE19714433C2 (de) * | 1997-04-08 | 2002-08-01 | Celanese Ventures Gmbh | Verfahren zur Herstellung einer Beschichtung mit einem Titanborid-gehald von mindestens 80 Gew.-% |
-
2002
- 2002-12-23 KR KR10-2002-0082792A patent/KR100489304B1/ko not_active IP Right Cessation
-
2003
- 2003-12-01 CN CNB2003801038519A patent/CN100494476C/zh not_active Expired - Fee Related
- 2003-12-01 WO PCT/KR2003/002620 patent/WO2004057052A1/en active Application Filing
- 2003-12-01 DE DE10393947T patent/DE10393947B4/de not_active Expired - Fee Related
- 2003-12-01 JP JP2004562083A patent/JP4234681B2/ja not_active Expired - Fee Related
- 2003-12-01 GB GB0508575A patent/GB2411408B/en not_active Expired - Fee Related
- 2003-12-01 US US10/534,134 patent/US20060115243A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
KR20040056220A (ko) | 2004-06-30 |
JP4234681B2 (ja) | 2009-03-04 |
CN100494476C (zh) | 2009-06-03 |
US20060115243A1 (en) | 2006-06-01 |
DE10393947B4 (de) | 2012-12-13 |
GB2411408B (en) | 2006-03-15 |
GB0508575D0 (en) | 2005-06-01 |
KR100489304B1 (ko) | 2005-05-17 |
WO2004057052A1 (en) | 2004-07-08 |
CN1714167A (zh) | 2005-12-28 |
GB2411408A (en) | 2005-08-31 |
DE10393947T5 (de) | 2006-02-16 |
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