JP2006500232A - 形成方法及びマイクロメカニックスの構成要素 - Google Patents
形成方法及びマイクロメカニックスの構成要素 Download PDFInfo
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- JP2006500232A JP2006500232A JP2004538667A JP2004538667A JP2006500232A JP 2006500232 A JP2006500232 A JP 2006500232A JP 2004538667 A JP2004538667 A JP 2004538667A JP 2004538667 A JP2004538667 A JP 2004538667A JP 2006500232 A JP2006500232 A JP 2006500232A
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- porous
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C1/00—Manufacture or treatment of devices or systems in or on a substrate
- B81C1/00436—Shaping materials, i.e. techniques for structuring the substrate or the layers on the substrate
- B81C1/00444—Surface micromachining, i.e. structuring layers on the substrate
- B81C1/00468—Releasing structures
- B81C1/00476—Releasing structures removing a sacrificial layer
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2201/00—Specific applications of microelectromechanical systems
- B81B2201/12—STM or AFM microtips
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81B—MICROSTRUCTURAL DEVICES OR SYSTEMS, e.g. MICROMECHANICAL DEVICES
- B81B2203/00—Basic microelectromechanical structures
- B81B2203/01—Suspended structures, i.e. structures allowing a movement
- B81B2203/0118—Cantilevers
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0102—Surface micromachining
- B81C2201/0105—Sacrificial layer
- B81C2201/0109—Sacrificial layers not provided for in B81C2201/0107 - B81C2201/0108
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B81—MICROSTRUCTURAL TECHNOLOGY
- B81C—PROCESSES OR APPARATUS SPECIALLY ADAPTED FOR THE MANUFACTURE OR TREATMENT OF MICROSTRUCTURAL DEVICES OR SYSTEMS
- B81C2201/00—Manufacture or treatment of microstructural devices or systems
- B81C2201/01—Manufacture or treatment of microstructural devices or systems in or on a substrate
- B81C2201/0101—Shaping material; Structuring the bulk substrate or layers on the substrate; Film patterning
- B81C2201/0111—Bulk micromachining
- B81C2201/0115—Porous silicon
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- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Micromachines (AREA)
- Laminated Bodies (AREA)
Abstract
Description
図1は本発明に基づく第1の製造方法を示しており、
図2は本発明に基づく第2の製造方法を示しており、
図3は本発明に基づく第3の製造方法を示しており、
図4は図3の製造方法に基づくマイクロメカニックスの構成要素を示す図である。
Claims (9)
- 犠牲層によってマイクロメカニックスの構成要素を形成するための方法において、シリコン基板(100)にパターン形成された多孔性の領域(106)を形成し、かつ該多孔性の領域(106)の上に機能層(130)を形成し、次いで機能層(130)の下面を露出させ、この場合に多孔性の領域(106)を少なくとも部分的に犠牲層として用いることを特徴とする、マイクロメカニックスの構成要素を形成するための方法。
- まず多孔性の領域(106)を、次いで機能層(130)を形成する請求項1に記載の方法。
- 多孔性の領域(106)を次のようにパターン形成し、即ちドープされて多孔質化されることのない第1の領域(102)を基板(100)に形成し、次いで多孔性の領域を形成する請求項1又は2に記載の方法。
- 機能層(130)をパターン形成し、かつ多孔性の領域(106)の上に、前記機能層(130)と協働する別の層(140,142)を形成する、特にパターン形成する請求項1から3のいずれか1項に記載の方法。
- 機能層(130)の下側の多孔性の領域(106)をドライ化学エッチングによって除去する請求項1から4のいずれか1項に記載の方法。
- 多孔性の領域(106)が多孔性の第1の部分領域(103)と多孔性の第2の部分領域(104)とを含んでおり、熱処理により中空室(107)を多孔性の第2の部分領域(104)内に形成し、この場合に多孔性の第2の部分領域(103)内のカバー層(105)を保っている請求項1から5のいずれか1項に記載の方法。
- 機能層(130)の下面を露出させるために、少なくともカバー層(105)を少なくとも部分的にエッチングする請求項6に記載の方法。
- まず機能層(130)を形成し、次いで該機能層(130)の下側に多孔性の領域(106)を形成する請求項1から7のいずれか1項記載の方法。
- 請求項1から8のいずれか1項に記載の方法に基づき製造されたマイクロメカニックスの構成要素を特徴とする、マイクロメカニックスの構成要素。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10244785A DE10244785A1 (de) | 2002-09-26 | 2002-09-26 | Verfahren und mikromechanisches Bauelement |
PCT/DE2003/000630 WO2004028956A2 (de) | 2002-09-26 | 2003-02-27 | Verfahren und mikromechanisches bauelement |
Publications (1)
Publication Number | Publication Date |
---|---|
JP2006500232A true JP2006500232A (ja) | 2006-01-05 |
Family
ID=31984076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2004538667A Pending JP2006500232A (ja) | 2002-09-26 | 2003-02-27 | 形成方法及びマイクロメカニックスの構成要素 |
Country Status (5)
Country | Link |
---|---|
US (1) | US20060037932A1 (ja) |
EP (1) | EP1546027A2 (ja) |
JP (1) | JP2006500232A (ja) |
DE (1) | DE10244785A1 (ja) |
WO (1) | WO2004028956A2 (ja) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009537336A (ja) * | 2006-05-20 | 2009-10-29 | フラウンホファー ゲセルシャフトツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. | 材料付着法によるマイクログリッパの製造方法 |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10244786A1 (de) * | 2002-09-26 | 2004-04-08 | Robert Bosch Gmbh | Mikromechanisches Bauelement und Verfahren |
DE60320391D1 (de) * | 2003-07-04 | 2008-05-29 | St Microelectronics Srl | Herstellungsverfahren für eine Halbleitervorrichtung mit einem hängenden Mikrosystem und entsprechende Vorrichtung |
US20080277332A1 (en) * | 2007-05-11 | 2008-11-13 | Becton, Dickinson And Company | Micromachined membrane filter device for a glaucoma implant and method for making the same |
CN104766794A (zh) * | 2014-01-02 | 2015-07-08 | 中国科学院上海硅酸盐研究所 | 一种碲化铋基材料的干法刻蚀方法 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE4331798B4 (de) * | 1993-09-18 | 2004-08-26 | Robert Bosch Gmbh | Verfahren zur Herstellung von mikromechanischen Bauelementen |
JP3305516B2 (ja) * | 1994-10-31 | 2002-07-22 | 株式会社東海理化電機製作所 | 静電容量式加速度センサ及びその製造方法 |
DE69817518D1 (de) * | 1997-07-10 | 2003-10-02 | St Microelectronics Srl | Verfahren zur Herstellung einer integrieten Schaltungsstruktur durch Entfernung einer Opferschicht |
EP0895276A1 (en) * | 1997-07-31 | 1999-02-03 | STMicroelectronics S.r.l. | Process for manufacturing integrated microstructures of single-crystal semiconductor material |
EP1088785A1 (fr) * | 1999-09-10 | 2001-04-04 | Ecole Polytechnique Federale De Lausanne | Procédé de fabrication d'une microstructure intégrée suspendue tridimensionnelle, microstructure intégrée notamment obtenue par ce procédé et élément optique intégré réglable |
DE10064494A1 (de) * | 2000-12-22 | 2002-07-04 | Bosch Gmbh Robert | Verfahren zur Herstellung eines Halbleiterbauelements sowie ein nach dem Verfahren hergestelltes Halbleiterbauelement, wobei das Halbleiterbauelement insbesondere eine bewegliche Masse aufweist |
-
2002
- 2002-09-26 DE DE10244785A patent/DE10244785A1/de not_active Withdrawn
-
2003
- 2003-02-27 JP JP2004538667A patent/JP2006500232A/ja active Pending
- 2003-02-27 EP EP03717116A patent/EP1546027A2/de not_active Withdrawn
- 2003-02-27 WO PCT/DE2003/000630 patent/WO2004028956A2/de active Application Filing
- 2003-02-27 US US10/529,425 patent/US20060037932A1/en not_active Abandoned
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2009537336A (ja) * | 2006-05-20 | 2009-10-29 | フラウンホファー ゲセルシャフトツール フェールデルンク ダー アンゲヴァンテン フォルシュンク エー.ファオ. | 材料付着法によるマイクログリッパの製造方法 |
Also Published As
Publication number | Publication date |
---|---|
DE10244785A1 (de) | 2004-04-08 |
WO2004028956A3 (de) | 2004-12-23 |
US20060037932A1 (en) | 2006-02-23 |
WO2004028956A2 (de) | 2004-04-08 |
EP1546027A2 (de) | 2005-06-29 |
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