JP2006332100A5 - - Google Patents

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Publication number
JP2006332100A5
JP2006332100A5 JP2005149329A JP2005149329A JP2006332100A5 JP 2006332100 A5 JP2006332100 A5 JP 2006332100A5 JP 2005149329 A JP2005149329 A JP 2005149329A JP 2005149329 A JP2005149329 A JP 2005149329A JP 2006332100 A5 JP2006332100 A5 JP 2006332100A5
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JP
Japan
Prior art keywords
optical element
gas
exposure apparatus
wafer
final optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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Application number
JP2005149329A
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English (en)
Japanese (ja)
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JP2006332100A (ja
JP4708860B2 (ja
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Priority to JP2005149329A priority Critical patent/JP4708860B2/ja
Priority claimed from JP2005149329A external-priority patent/JP4708860B2/ja
Publication of JP2006332100A publication Critical patent/JP2006332100A/ja
Publication of JP2006332100A5 publication Critical patent/JP2006332100A5/ja
Application granted granted Critical
Publication of JP4708860B2 publication Critical patent/JP4708860B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2005149329A 2005-05-23 2005-05-23 液浸露光装置 Expired - Fee Related JP4708860B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2005149329A JP4708860B2 (ja) 2005-05-23 2005-05-23 液浸露光装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005149329A JP4708860B2 (ja) 2005-05-23 2005-05-23 液浸露光装置

Publications (3)

Publication Number Publication Date
JP2006332100A JP2006332100A (ja) 2006-12-07
JP2006332100A5 true JP2006332100A5 (cg-RX-API-DMAC7.html) 2008-07-03
JP4708860B2 JP4708860B2 (ja) 2011-06-22

Family

ID=37553519

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005149329A Expired - Fee Related JP4708860B2 (ja) 2005-05-23 2005-05-23 液浸露光装置

Country Status (1)

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JP (1) JP4708860B2 (cg-RX-API-DMAC7.html)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4899473B2 (ja) * 2005-12-28 2012-03-21 株式会社ニコン 結像光学系、露光装置及びデバイスの製造方法
US7866637B2 (en) 2007-01-26 2011-01-11 Asml Netherlands B.V. Humidifying apparatus, lithographic apparatus and humidifying method
JP5157637B2 (ja) * 2008-05-21 2013-03-06 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101181688B1 (ko) * 2003-03-25 2012-09-19 가부시키가이샤 니콘 노광 장치 및 디바이스 제조 방법
WO2004090634A2 (en) * 2003-04-10 2004-10-21 Nikon Corporation Environmental system including vaccum scavange for an immersion lithography apparatus
TWI515770B (zh) * 2003-06-19 2016-01-01 尼康股份有限公司 An exposure apparatus, an exposure method, and an element manufacturing method
JP2005064210A (ja) * 2003-08-12 2005-03-10 Nikon Corp 露光方法、該露光方法を利用した電子デバイスの製造方法及び露光装置

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