JP2006319320A - Gallium nitride light emitting diode element having perpendicular structure and manufacturing method thereof - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a gallium nitride based light emitting diode element of a perpendicular structure, which is excellent in the yield and the external quantum efficiency. <P>SOLUTION: This light emitting diode element is produced by a method comprising disposing a gallium nitride layer on the substrate; depositing a compound layer for an ELOG (Epitaxial Lateral Over Growth) process on the gallium nitride layer; patterning the compound layer in a predetermined shape; depositing an n-type gallium nitride layer 525 on the patterned compound layer by the ELOG process; depositing sequentially an active layer 530 and a p-type gallium nitride layer 535 on the n-type gallium nitride layer 525; depositing a p-type electrode 540 on the p-type gallium nitride layer 535; depositing a structure supporting layer 545; removing sequentially the substrate and the gallium nitride layer diposited on the substrate; removing the patterned compound layer which is exposed after the removal of the gallium nitride layer, to form an n-type gallium nitride layer 525b patterned in a concave shape; depositing a transparent conductive oxide layer 550 on the gallium nitride layer 525b; and depositing an n-type electrode 555 on the oxide layer 550. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

  The present invention relates to a vertical structure gallium nitride light emitting diode device and a method for manufacturing the same, and more particularly, to form a certain pattern on the upper surface of an n-type gallium nitride layer using an ELOG (Epitaxial Lateral Over Growth) process. The present invention relates to a vertical structure gallium nitride light-emitting diode device that can improve the external emission efficiency of photons and a method of manufacturing the same.

  In general, a gallium nitride light emitting diode is grown on a sapphire substrate, but the sapphire substrate is rigid, electrically non-conductive, and has poor heat conduction characteristics. There is a limit to shortening the manufacturing cost and improving the light output and chip characteristics. In particular, in order to increase the output of the light emitting diode, it is essential to apply a large current. Therefore, it is important to solve the heat emission problem of the light emitting diode. Therefore, conventionally, a gallium nitride light emitting diode having a vertical structure using a laser lift-off (hereinafter referred to as 'LLO') technique has been proposed.

  However, in such a conventional vertical structure GaN-based light emitting diode, the efficiency with which photons generated in the active layer are emitted to the outside of the light emitting diode (hereinafter referred to as “external quantum efficiency”) decreases. There was a problem.

Such a problem will be described in detail with reference to FIG. 1, which shows the refraction of light. Referring to FIG. 1, photons generated in the active layer, to escape into the air after passing through the gallium nitride GaN layer having a high refractive index N ₁ than the refractive index N ₂ of the air, gallium this nitride Each incident θ _{1 of} photons entering the air from the layer must be less than the critical angle θ _c .

Here, the critical angle θ _c when the escape angle θ ₂ at which the photon escapes into the air is 90 ° can be defined as θ _c = Sin ⁻¹ (N ₂ / N ₁ ), and from the gallium nitride layer, The critical angle when light travels in air with a refractive index of 1 is about 23.6 °.

If each incident θ ₁ is greater than the critical angle θ _c , the photon is totally reflected at the interface between the gallium nitride layer and air, returns again inside the light emitting diode, and is confined inside the light emitting diode. Will decrease.

In order to solve such a decrease in external quantum efficiency, in Patent Document 1, a hemispherical convex pattern is formed on the surface of an n-type gallium nitride layer, whereby photons that are incident on the air from the gallium nitride layer. Was able to reduce the incident angle θ ₁ to less than the critical angle θ _c .

  Hereinafter, a method for manufacturing the vertical structure gallium nitride light-emitting diode element disclosed in Patent Document 1 will be described.

  2A to 2C are process cross-sectional views of the vertical structure gallium nitride-based light-emitting diode device disclosed in Patent Document 1, and FIGS. 3A to 3C are FIGS. FIG. 4 is an enlarged cross-sectional view of the vertical structure gallium nitride light-emitting diode element shown in FIG. 2-c, and FIG. 4 is a cross-sectional view of the vertical-structure gallium nitride light-emitting diode element shown in FIG. is there.

  First, as shown in FIG. 2A, a light emitting diode (LED) structure 16 and a p-type electrode 18 containing gallium nitride are formed on a sapphire substrate 24, and then a first Pd layer 26 and a p-type electrode 18 are formed on the p-type electrode 18. An In layer 28 is formed. Then, the second Pd layer 30 is formed on the lower surface of the Si substrate 20.

  Thereafter, as shown in FIG. 2B, the Si substrate 20 on which the second Pd layer 30 is formed is bonded onto the p-type electrode 18 on which the first Pd layer 26 and the In layer 28 are formed.

  Subsequently, as shown in FIG. 2C, the sapphire substrate 24 is removed by an LLO process.

  Thereafter, as shown in FIG. 3A, a photoresist pattern is formed at a predetermined position on the surface of the light emitting diode structure 16 (specifically, the surface of the n-type gallium nitride layer) exposed after the sapphire substrate 24 is removed. 32 is formed.

  Thereafter, as shown in FIG. 3B, a photoresist pattern 32 is formed in a hemispherical shape by a re-flow process.

  Subsequently, as shown in FIG. 3C, the surface of the light emitting diode structure 16 is patterned into a hemispherical shape by etching the surface of the light emitting diode structure 16 by an anisotropic etching method.

  Finally, an n-type electrode 34 is formed on the light emitting diode structure 16 to complete a light emitting diode element in which the surface of the light emitting diode structure 16 is patterned as shown in FIG.

US Patent Application Publication No. 2003/0222263

  However, when the light emitting diode structure 16 is grown on the sapphire substrate 24 in the light emitting diode device manufactured by the method of manufacturing the vertical structure gallium nitride light emitting diode device disclosed in Patent Document 1, the sapphire substrate is used. There is a problem in that a line defect (threading dislocation) occurs in the light emitting diode structure 16 due to a difference in lattice constant and thermal expansion coefficient between the light emitting diode structure 16 and the light emitting diode structure 16, thereby causing a defect in the light emitting diode device.

  Further, when handling a light emitting diode structure 16 (Thin GaN) of 10 μm or less, even if a sub support base is used, it is difficult to form the photoresist pattern 32 and subsequent processes, and the yield is very low. Become.

  In addition, the pattern formed on the surface of the light emitting diode structure 16 is a hemispherical convex pattern, which causes a problem that the external emission path of photons generated in the active layer becomes long.

  The present invention is to solve the above problems, and its purpose is to increase the external quantum efficiency and to generate line defects by patterning the surface of the n-type gallium nitride layer in a new process. An object of the present invention is to provide a vertical structure gallium nitride light emitting diode device and a method for manufacturing the same.

  In order to achieve the above object, a method for manufacturing a vertical structure GaN-based light emitting diode device according to the present invention includes a step of forming a gallium nitride layer on a substrate, and an ELOG (Epitaxial Lateral Over Growth) on the gallium nitride layer. ) Forming a compound layer for performing the process, patterning the compound layer into a predetermined shape, and forming an n-type gallium nitride layer on the patterned compound layer by the ELOG process, A step of sequentially forming an active layer and a p-type gallium nitride layer thereon; a step of forming a structure support layer on the p-type gallium nitride layer; and after forming the structure support layer, the substrate and the substrate Removing the formed gallium nitride layer sequentially, and removing the patterned compound layer exposed after the gallium nitride layer is removed. Accordingly, characterized in that it comprises the steps of forming an n-type gallium nitride layer patterned into a concave shape, a step of forming an n-type electrode on the concave patterned n-type gallium nitride layer.

  The vertical structure gallium nitride light emitting diode device may be manufactured by forming a p-type electrode on the p-type gallium nitride layer after forming the p-type gallium nitride layer, or the structure. Preferably, the method further includes forming a p-type electrode on the structural support layer after forming the support layer.

  The structure support layer is preferably a structure support layer formed of any one selected from the group consisting of a substrate and a plating layer.

The compound layer is preferably formed of any one compound selected from a compound group consisting of SiO ₂ and SiN _x (silicon nitride series).

  The method of patterning the compound layer preferably includes a step of forming a pattern layer patterned in a predetermined shape on the compound layer, and a step of etching the compound layer using the pattern layer as a mask. .

  Here, the method of forming the pattern layer includes a step of forming a photoresist pattern in a predetermined shape on the compound layer, and re-flowing the photoresist pattern to form a hemispherical photoresist. Preferably, the method includes the step of forming a pattern.

  The method for etching the compound layer preferably includes patterning the compound layer into a hemispherical shape by etching both the reflowed photoresist pattern and the compound layer.

  The hemispherical shape is preferably formed to have a height of 0.1 to 5 μm, a diameter of 0.5 to 5 μm, and a pattern period of 0.5 to 5 μm.

  The manufacturing method of the vertical structure gallium nitride light-emitting diode device preferably further includes a step of removing the pattern layer after etching the compound layer.

  The method of forming the n-type gallium nitride layer includes forming an undoped gallium nitride layer on the patterned compound layer, and an n-type impurity doped gallium nitride layer on the undoped gallium nitride layer. It is preferable to provide the step of forming.

  Here, in the method of forming the n-type impurity doped gallium nitride layer, it is preferable to grow the gallium nitride layer on the undoped gallium nitride layer while gradually increasing the doping concentration of the n-type impurity.

  The thickness of the undoped gallium nitride layer is preferably 0.1 to 1 μm.

  Meanwhile, in order to achieve the above object, a vertical structure gallium nitride light emitting diode device according to the present invention includes a structure support layer, a p-type electrode formed on an upper surface or a lower surface of the structure support layer, and the p-type. A p-type gallium nitride layer formed on the structure support layer on which an electrode is formed; an active layer formed on the p-type gallium nitride layer; and an n-type impurity doped on the active layer. An n-type gallium nitride layer, an undoped gallium nitride layer formed on the n-type gallium nitride layer and having a plurality of recesses periodically formed on the upper surface, and an n-type formed on the undoped gallium nitride layer An electrode is included.

  Here, when the p-type electrode is formed on the lower surface of the structural support layer, the structural support layer is formed of any one selected from the group consisting of a conductive substrate and a plating layer. When the p-type electrode is formed on the top surface of the structure support layer, the structure support layer is formed of any one selected from the group consisting of a silicon (Si) substrate and a plating layer. A support layer is preferred.

  And the said recessed part has a hemispherical shape, and it is preferable that it is 0.1-5 micrometers in depth, 0.5-5 micrometers in diameter, and 0.5-5 micrometers in pattern period.

  The undoped gallium nitride layer preferably has a thickness of 0.1 to 1 μm.

  The vertical structure gallium nitride light emitting diode element preferably further includes a transparent conductive oxide (TCO) layer formed on the undoped gallium nitride layer.

  According to the vertical structure gallium nitride light-emitting diode device and the method of manufacturing the same according to the present invention, when forming the light-emitting diode device structure, no line defect occurs and a concave pattern is formed on the surface of the n-type gallium nitride layer. Thus, a light emitting diode device excellent in yield and external quantum efficiency can be obtained.

  In addition, since a concave pattern is formed on the surface of the n-type gallium nitride layer, it is possible to reduce the external emission path of photons generated in the active layer.

  DESCRIPTION OF EXEMPLARY EMBODIMENTS Hereinafter, exemplary embodiments of the invention will be described in detail with reference to the accompanying drawings. In the drawings, the same constituent elements are denoted by the same reference numerals as much as possible, and redundant description thereof will be omitted.

  FIGS. 5A to 5J are cross-sectional views and perspective views illustrating steps for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention.

  First, as shown in FIG. 5A, a first gallium nitride (GaN) layer 510 is grown on a substrate 505. The first gallium nitride layer 510 is not doped with impurities, that is, is an undoped gallium nitride layer, and is grown at a growth rate of 1 μm per hour for 0.5 to 1.5 hours.

  In this embodiment, a sapphire substrate is used as the substrate 505.

Thereafter, a compound layer 515 a for performing an ELOG (Epitaxial Lateral Over Growth) process is formed on the first gallium nitride layer 510. Since the yield of the ELOG process is highest when SiO ₂ or SiN _x (silicon nitride series) compound is used as a base, the compound layer 515a is preferably made of SiO ₂ or SiN _x (silicon nitride series) compound.

In this embodiment, a SiO ₂ layer is formed as the compound layer 515a by a chemical vapor deposition (CVD) method or a sputtering method (sputtering).

Thereafter, as shown in FIG. 5B, a photoreactive polymer is applied on the SiO ₂ layer 515a to a thickness of 1 to 5 μm by a photolithography process, and then photoreactive polymer is used using a photoreaction and a mask. Is patterned into a predetermined shape having an interval of 0.5 to 5 μm to form a photoresist pattern 520a. However, in consideration of the step of forming an n-type electrode among the steps described later, the photoresist pattern 520a may not be formed at a predetermined position of the SiO ₂ layer 515a.

  In this embodiment, by using a lattice-shaped mask, patterning is performed so that the photoreactive polymer has a rectangular parallelepiped shape with an interval of 0.5 to 5 μm.

  Thereafter, as shown in FIG. 5C, a hemispherical photoresist pattern 520b is formed by reflowing the rectangular parallelepiped photoresist pattern 520a at a temperature of 100 to 150 ° C. for about 1 to 5 minutes. To do.

Subsequently, the SiO ₂ layer 515a is etched using the hemispherical photoresist pattern 520b as a mask. At this time, the hemispherical photoresist pattern 520b and the SiO ₂ layer 515a are etched together by etching with BCl ₃ and HBr gas using an ICP-RIE equipment. As a result, as shown in FIG. The SiO ₂ layer 515a is etched into a hemispherical pattern 515b. FIG. 5E is a perspective view showing a state in which the SiO ₂ layer 515a is etched into the hemispherical pattern 515b.

Here, in the SiO ₂ layer 515b etched into a hemispherical pattern, the height of the hemisphere is 0.1 to 5 μm, the diameter is 0.5 to 5 μm, and the pattern period is 0.5 to 5 μm. Preferably there is. When a hemispherical pattern is formed out of the limited numerical range as described above, the surface of the n-type gallium nitride layer is patterned in accordance with the hemispherical pattern, as will be described later. However, it is difficult to expect improvement in external quantum efficiency on the surface of the n-type gallium nitride layer formed in such a pattern.

Thereafter, as shown in FIG. 5F, an n-type second gallium nitride layer 525 is formed on the SiO ₂ layer 515b patterned in a hemispherical shape by an ELOG process.

  In the n-type second gallium nitride layer 525 formed by this ELOG process, no line defect occurs. Therefore, a high-quality n-type second gallium nitride layer 525 can be formed.

  On the other hand, the n-type second gallium nitride layer 525 may be a single layer, but improves the current spreading phenomenon, and the current crowding phenomenon in which current flows only in the center of the device. In order to prevent this, the n-type second gallium nitride layer 525 is preferably formed into two layers.

That is, an n-type impurity is not doped by the ELOG process on the SiO ₂ layer 515b patterned in a hemispherical shape, that is, after an undoped gallium nitride layer 525a is formed to a predetermined thickness, an undoped nitridation is performed. An n-type gallium nitride layer 525b doped with an n-type impurity is formed on the gallium layer 525a. Since the undoped gallium nitride layer 525a has a higher resistance than the n-type impurity doped gallium nitride layer 525b, it functions as a current blocking film, so that the current is diffused throughout the device.

  Here, if the thickness of the undoped gallium nitride layer 525a is less than 0.1 μm, it is difficult to cause a current diffusion phenomenon, and if the thickness exceeds 1 μm, the amount of current flowing through the device may be too small. The thickness of the undoped gallium nitride layer 525a is preferably 0.1 to 1 μm.

  Further, when forming the n-type impurity doped gallium nitride layer 525b, the gallium nitride layer is gradually increased from the portion in contact with the undoped gallium nitride layer 525a while maintaining the doping concentration constant. The current diffusion phenomenon can be further improved by growing.

  Thereafter, an active layer 530 and a p-type third gallium nitride layer 535 are sequentially formed on the n-type second gallium nitride layer 525.

  Subsequently, a p-type electrode 540 is formed on the p-type third gallium nitride layer 535. The p-type electrode 540 may be formed on the structure support layer 545 as described later.

  Thereafter, a structural support layer 545 is formed on the p-type electrode 540. In particular, a formation method when the structural support layer 545 is a substrate (eg, a silicon substrate) will be described. First, a metal eutectic bonding layer (not shown) is formed on the p-type electrode 540. At this time, the eutectic bonding layer is formed in order to adhere the silicon substrate by a eutectic bonding method, and is a metal alloy layer composed of a first metal film and a second metal film. This metal alloy layer is deposited using a metal such as lead (Pb), indium (In), gold-tin (AuSn), tin (Sn), gold (Au). Then, after applying predetermined temperature and pressure to the eutectic bonding layer, the silicon substrate is bonded onto the eutectic bonding layer.

  In some cases, the structure support layer 545 may be a plating layer formed by using an electroplating method, or may be formed by bonding a metal substrate by a eutectic bonding method.

  Here, the structure support layer 545 plays a role of maintaining the shape of the device so that the device is not damaged by an external impact that may occur during the manufacturing process of the light emitting diode device and the final packaging process of the light emitting diode device.

  On the other hand, as described above, when the p-type electrode 540 is not formed on the p-type third gallium nitride layer 535, the p-type electrode 540 is formed on the structure support layer 545 at this stage. In this case, the structure support layer 545 must be formed of a conductive material such as a metal (for example, a conductive substrate or a plating layer) because current cannot be conducted unless it is a conductive material.

  Thereafter, as shown in FIG. 5G, the sapphire substrate 505 is removed by an LLO process.

Subsequently, as shown in FIG. 5H, the first gallium nitride layer 510 is completely removed using the ICP-RIE equipment, thereby exposing the hemispherical patterned SiO ₂ layer 515b.

Thereafter, as shown in FIG. 5-i, by removing the exposed SiO ₂ layer 515b using a BHF (Buffered Hydrofluoric acid) solution, an n-type second gallium nitride having a concave hemispherical pattern is obtained. The surface of layer 525 is formed.

  Subsequently, as shown in FIG. 5J, a transparent conductive oxide (TCO) layer 550 is selectively formed on the patterned n-type second gallium nitride layer 525 to improve the current diffusion phenomenon. May be.

  Finally, an n-type electrode 555 is formed on the n-type second gallium nitride layer 525 on which the transparent conductive oxide layer 550 is formed, and an element isolation process is performed to manufacture the light-emitting diode device according to the present embodiment. To complete.

  FIG. 5-j is a cross-sectional view of the light emitting diode device manufactured according to the present embodiment, and is generated in the active layer 530 by forming a concave hemispherical pattern on the n-type second gallium nitride layer 525. When the incident photon is incident on the recessed hemisphere formed in the n-type second gallium nitride layer 525, the probability that the incident angle is less than the critical angle is increased, thereby increasing the overall external quantum efficiency of the light emitting diode device. Can be made.

<Modification>
6A to 6E are partial process cross-sectional views illustrating a method for manufacturing a vertical structure GaN-based light emitting diode device according to a modification of the above embodiment.

First, as shown in FIG. 6A, an SiO ₂ layer 615a is formed by the same method as in the above embodiment.

Thereafter, as shown in FIG. 6-b, a photoreactive polymer is applied on the SiO ₂ layer 615a to a thickness of 1 to 5 μm by a photolithography process, and then the photoreactive polymer is subjected to 0 using a photoreaction and a mask. A photoresist pattern 620 is formed by patterning into a predetermined shape having an interval of 5 to 5 μm.

  In this modification, a lattice-shaped mask is used, and patterning is performed so that the photoreactive polymer has a rectangular parallelepiped shape with an interval of 0.5 to 5 μm, as shown in FIG.

Thereafter, as shown in FIG. 6-c, the SiO ₂ layer 615a is etched using the rectangular parallelepiped photoresist pattern 620a as a mask to form a patterned SiO ₂ layer 615b. At this time, unlike the above-described embodiment, only the SiO ₂ layer 615a is etched using the rectangular parallelepiped photoresist pattern 620 as a mask.

  Thereafter, as shown in FIG. 6-d, the photoresist pattern 620 is removed using an acetone solution or the like.

Finally, the same steps as in the above-described embodiment, such as an ELOG process, are performed on the patterned SiO ₂ layer 615b, thereby completing the manufacture of the light-emitting diode device according to this modification.

  FIG. 6E is a cross-sectional view of the light-emitting diode device manufactured according to the present modification. By forming a rectangular parallelepiped pattern on the n-type second gallium nitride layer 525b, the external quantum of the entire device is formed. Efficiency can be increased.

  In the above embodiments and modifications, the surface of the n-type second gallium nitride layer 525b having a hemispherical or rectangular parallelepiped pattern is formed for convenience of explanation, but various changes can be made by changing the photoresist pattern. An n-type second gallium nitride layer surface having a shape pattern can be formed.

  The present invention is not limited to the embodiments described above, and various modifications and changes can be made without departing from the spirit and scope of the present invention defined by the appended claims. Will be apparent to those skilled in the art.

  As described above, the vertical structure gallium nitride light-emitting diode device and the manufacturing method thereof according to the present invention are useful for general gallium nitride light-emitting diode applications, and particularly suitable for applications requiring high output. ing.

It is a principle figure which shows the refraction of the light for demonstrating the problem of a prior art. It is process sectional drawing of the gallium nitride type light emitting diode element of the perpendicular | vertical structure currently disclosed by patent document 1 (US Patent Publication No. 2003/0222263). It is process sectional drawing of the gallium nitride type light emitting diode element of the perpendicular | vertical structure currently disclosed by patent document 1 (US Patent Publication No. 2003/0222263). It is process sectional drawing of the gallium nitride type light emitting diode element of the perpendicular | vertical structure currently disclosed by patent document 1 (US Patent Publication No. 2003/0222263). FIG. 3 is an enlarged cross-sectional view of the vertical structure gallium nitride light-emitting diode device shown in FIG. 2. FIG. 3 is an enlarged cross-sectional view of the vertical structure gallium nitride light-emitting diode device shown in FIG. 2. FIG. 3 is an enlarged cross-sectional view of the vertical structure gallium nitride light-emitting diode device shown in FIG. 2. It is sectional drawing of the gallium nitride type light emitting diode element of the perpendicular | vertical structure shown to FIG. 2-a-FIG. 2-c. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a perspective view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a perspective view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 5 is a cross-sectional view of each step for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to an embodiment of the present invention. FIG. 10 is a partial process cross-sectional view for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to a modification of the embodiment of the present invention. FIG. 10 is a partial process cross-sectional view for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to a modification of the embodiment of the present invention. FIG. 10 is a partial process cross-sectional view for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to a modification of the embodiment of the present invention. FIG. 10 is a partial process cross-sectional view for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to a modification of the embodiment of the present invention. FIG. 10 is a partial process cross-sectional view for explaining a method of manufacturing a vertical structure GaN-based light emitting diode device according to a modification of the embodiment of the present invention.

Explanation of symbols

505 substrate (sapphire substrate)
510 First gallium nitride layer 515a, 615a Compound layer (SiO ₂ layer)
515b, 615b Patterned compound layer 520a, 520b, 620 Photoresist pattern 525 n-type second gallium nitride layer 530 active layer 535 p-type third gallium nitride layer 540 p-type electrode 545 structure support layer 550 transparent conductive oxide ( TCO) layer 555 n-type electrode

Claims (18)

Forming a gallium nitride layer on the substrate;
Forming a compound layer for performing an ELOG (Epitaxial Lateral Over Growth) process on the gallium nitride layer;
Patterning the compound layer into a predetermined shape;
Forming an n-type gallium nitride layer on the patterned compound layer by the ELOG process, and sequentially forming an active layer and a p-type gallium nitride layer thereon;
Forming a structural support layer on the p-type gallium nitride layer;
Removing the substrate and the gallium nitride layer formed on the substrate sequentially after forming the structural support layer;
Removing the patterned compound layer exposed after the gallium nitride layer is removed to form a concavely patterned n-type gallium nitride layer;
Forming a n-type electrode on the concave-patterned n-type gallium nitride layer;   The vertical structure GaN-based LED according to claim 1, further comprising a step of forming a p-type electrode on the p-type gallium nitride layer after forming the p-type gallium nitride layer. Manufacturing method.   The method of claim 1, further comprising forming a p-type electrode on the structure support layer after forming the structure support layer. The structural support layer is
The vertical structure gallium nitride based light-emitting according to any one of claims 1 to 3, wherein the gallium nitride-based light emitting device has a vertical structure according to any one of claims 1 to 3, wherein the structure-supporting layer is formed of any one selected from the group consisting of a substrate and a plating layer. Manufacturing method of diode element. The compound layer is
Characterized in that it is formed by any one of the compounds selected from the compound group consisting of SiO ₂ and SiN _x (silicon nitride series), nitride of a vertical structure according to any one of claims 1 to 4 A method for manufacturing a gallium-based light-emitting diode element. The method of patterning the compound layer includes:
Forming a pattern layer patterned into a predetermined shape on the compound layer;
The method of manufacturing a vertical gallium nitride light-emitting diode element according to claim 1, further comprising: etching the compound layer using the pattern layer as a mask. The method for forming the pattern layer includes:
Forming a photoresist pattern in a predetermined shape on the compound layer;
The method of claim 6, further comprising: forming a hemispherical photoresist pattern by re-flowing the photoresist pattern. Method. The method of etching the compound layer includes:
8. The method of claim 7, wherein the compound layer is patterned into a hemispherical shape by etching the reflowed photoresist pattern and the compound layer together. Method.   The vertical structure according to claim 7 or 8, wherein the hemispherical shape has a height of 0.1 to 5 µm, a diameter of 0.5 to 5 µm, and a pattern period of 0.5 to 5 µm. A method for manufacturing a gallium nitride based light-emitting diode element.   The method according to claim 6, further comprising the step of removing the pattern layer after etching the compound layer. The method for forming the n-type gallium nitride layer includes:
Forming an undoped gallium nitride layer on the patterned compound layer;
The vertical structure gallium nitride-based light emission according to claim 1, further comprising: forming an n-type impurity-doped gallium nitride layer on the undoped gallium nitride layer. Manufacturing method of diode element. The method of forming the n-type impurity doped gallium nitride layer includes:
12. The method of manufacturing a vertical gallium nitride light emitting diode device according to claim 11, wherein the gallium nitride layer is grown on the undoped gallium nitride layer while gradually increasing the doping concentration of the n-type impurity.   13. The method of manufacturing a vertical gallium nitride light emitting diode device according to claim 11, wherein the undoped gallium nitride layer has a thickness of 0.1 to 1 [mu] m. A structural support layer;
A p-type electrode formed on the upper or lower surface of the structural support layer;
A p-type gallium nitride layer formed on the structure support layer on which the p-type electrode is formed;
An active layer formed on the p-type gallium nitride layer;
An n-type gallium nitride layer formed on the active layer and doped with an n-type impurity;
An undoped gallium nitride layer formed on the n-type gallium nitride layer and having a plurality of recesses formed periodically on the upper surface;
A vertical structure gallium nitride light-emitting diode element including an n-type electrode formed on the undoped gallium nitride layer.   When the p-type electrode is formed on the lower surface of the structure support layer, the structure support layer is a structure support layer formed of any one selected from the group consisting of a conductive substrate and a plating layer, When the p-type electrode is formed on the top surface of the structural support layer, the structural support layer is a structural support layer formed of any one selected from the group consisting of a silicon (Si) substrate and a plating layer. The vertical structure gallium nitride light emitting diode device according to claim 14, wherein the device is a vertical structure gallium nitride light emitting diode device.   The vertical structure according to claim 14 or 15, wherein the concave portion has a hemispherical shape, has a depth of 0.1 to 5 µm, a diameter of 0.5 to 5 µm, and a pattern period of 0.5 to 5 µm. Gallium nitride-based light emitting diode device.   17. The vertical gallium nitride light emitting diode device according to claim 14, wherein the undoped gallium nitride layer has a thickness of 0.1 to 1 μm.   The vertical structure GaN-based light emitting diode device according to any one of claims 14 to 17, further comprising a transparent conductive oxide (TCO) layer formed on the undoped gallium nitride layer. .

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