JP2006314869A - 半導体プロセスチャンバからの排ガスを除害するためのシステム - Google Patents

半導体プロセスチャンバからの排ガスを除害するためのシステム Download PDF

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Publication number
JP2006314869A
JP2006314869A JP2005137558A JP2005137558A JP2006314869A JP 2006314869 A JP2006314869 A JP 2006314869A JP 2005137558 A JP2005137558 A JP 2005137558A JP 2005137558 A JP2005137558 A JP 2005137558A JP 2006314869 A JP2006314869 A JP 2006314869A
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Japan
Prior art keywords
exhaust gas
semiconductor process
discharge conduit
gas
valve
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Pending
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JP2005137558A
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English (en)
Japanese (ja)
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JP2006314869A5 (enExample
Inventor
Masahiro Tabata
真大 田畑
Misuzu Sato
美鈴 佐藤
Chun Hao Rii
ハオ リー・チュン
Masamitsu Watanabe
真充 渡辺
Yoshihiro Ibaraki
義浩 茨木
Kenji Nishimura
賢治 西村
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Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
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Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Priority to JP2005137558A priority Critical patent/JP2006314869A/ja
Publication of JP2006314869A publication Critical patent/JP2006314869A/ja
Publication of JP2006314869A5 publication Critical patent/JP2006314869A5/ja
Pending legal-status Critical Current

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    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02C—CAPTURE, STORAGE, SEQUESTRATION OR DISPOSAL OF GREENHOUSE GASES [GHG]
    • Y02C20/00—Capture or disposal of greenhouse gases
    • Y02C20/30—Capture or disposal of greenhouse gases of perfluorocarbons [PFC], hydrofluorocarbons [HFC] or sulfur hexafluoride [SF6]
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P70/00—Climate change mitigation technologies in the production process for final industrial or consumer products
    • Y02P70/50—Manufacturing or production processes characterised by the final manufactured product

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  • Treating Waste Gases (AREA)
  • Chemical Vapour Deposition (AREA)
JP2005137558A 2005-05-10 2005-05-10 半導体プロセスチャンバからの排ガスを除害するためのシステム Pending JP2006314869A (ja)

Priority Applications (1)

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JP2005137558A JP2006314869A (ja) 2005-05-10 2005-05-10 半導体プロセスチャンバからの排ガスを除害するためのシステム

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005137558A JP2006314869A (ja) 2005-05-10 2005-05-10 半導体プロセスチャンバからの排ガスを除害するためのシステム

Publications (2)

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JP2006314869A true JP2006314869A (ja) 2006-11-24
JP2006314869A5 JP2006314869A5 (enExample) 2008-01-31

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Cited By (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006326553A (ja) * 2005-05-30 2006-12-07 Taiyo Nippon Sanso Corp 排ガス処理装置
WO2008068917A1 (ja) * 2006-12-01 2008-06-12 Kanken Techno Co., Ltd. 半導体製造排ガスの除害装置
JP2010161150A (ja) * 2009-01-07 2010-07-22 Shimadzu Corp ガス排気ライン切り換え機構およびガス排気ライン切り換え方法
JP2015204461A (ja) * 2014-04-14 2015-11-16 アイクストロン、エスイー Ｃｖｄリアクタにおける排ガス洗浄装置および方法
CN106637131A (zh) * 2015-11-04 2017-05-10 株式会社神户制钢所 使用硅原料的成膜装置
JP2017515286A (ja) * 2014-03-06 2017-06-08 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ ホール効果が促進された容量結合プラズマ源、軽減システム、および真空処理システム
KR20180050212A (ko) * 2016-11-04 2018-05-14 레르 리키드 쏘시에떼 아노님 뿌르 레？드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 불순물 제거 장치 및 그 불순물 제거 장치를 구비하는 리사이클 가스 회수 정제 시스템
CN108389788A (zh) * 2018-04-25 2018-08-10 睿力集成电路有限公司 扩散炉管设备及处理废气的方法
KR20200027945A (ko) * 2017-07-06 2020-03-13 에드워즈 리미티드 펌핑 라인 배열체에서의 또는 그에 관한 개량

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0259001A (ja) * 1988-08-24 1990-02-28 Ebara Corp 排ガス除害装置
JPH11267443A (ja) * 1998-03-23 1999-10-05 Central Glass Co Ltd 乾式ガスの除害処理装置および除害方法
JP2002273169A (ja) * 2001-03-22 2002-09-24 Mitsubishi Electric Corp ハロゲン含有ガスの処理装置
JP2003305334A (ja) * 2002-04-18 2003-10-28 Hitachi Ltd プラズマ式ｐｆｃ分解システムおよびｐｆｃ分解方法

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0259001A (ja) * 1988-08-24 1990-02-28 Ebara Corp 排ガス除害装置
JPH11267443A (ja) * 1998-03-23 1999-10-05 Central Glass Co Ltd 乾式ガスの除害処理装置および除害方法
JP2002273169A (ja) * 2001-03-22 2002-09-24 Mitsubishi Electric Corp ハロゲン含有ガスの処理装置
JP2003305334A (ja) * 2002-04-18 2003-10-28 Hitachi Ltd プラズマ式ｐｆｃ分解システムおよびｐｆｃ分解方法

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006326553A (ja) * 2005-05-30 2006-12-07 Taiyo Nippon Sanso Corp 排ガス処理装置
WO2008068917A1 (ja) * 2006-12-01 2008-06-12 Kanken Techno Co., Ltd. 半導体製造排ガスの除害装置
JPWO2008068917A1 (ja) * 2006-12-01 2010-03-18 カンケンテクノ株式会社 半導体製造排ガスの除害装置
JP2010161150A (ja) * 2009-01-07 2010-07-22 Shimadzu Corp ガス排気ライン切り換え機構およびガス排気ライン切り換え方法
JP2017515286A (ja) * 2014-03-06 2017-06-08 アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ ホール効果が促進された容量結合プラズマ源、軽減システム、および真空処理システム
JP2015204461A (ja) * 2014-04-14 2015-11-16 アイクストロン、エスイー Ｃｖｄリアクタにおける排ガス洗浄装置および方法
KR101907753B1 (ko) * 2015-11-04 2018-12-07 가부시키가이샤 고베 세이코쇼 실리콘 원료를 사용하는 성막 장치
CN106637131A (zh) * 2015-11-04 2017-05-10 株式会社神户制钢所 使用硅原料的成膜装置
KR20180050212A (ko) * 2016-11-04 2018-05-14 레르 리키드 쏘시에떼 아노님 뿌르 레？드 에렉스뿔라따시옹 데 프로세데 조르즈 클로드 불순물 제거 장치 및 그 불순물 제거 장치를 구비하는 리사이클 가스 회수 정제 시스템
US11437248B2 (en) 2017-07-06 2022-09-06 Edwards Limited To pumping line arrangements
KR20200027945A (ko) * 2017-07-06 2020-03-13 에드워즈 리미티드 펌핑 라인 배열체에서의 또는 그에 관한 개량
JP2020525712A (ja) * 2017-07-06 2020-08-27 エドワーズ リミテッド ポンピングライン構成の改良又はポンピングライン構成に関連する改良
JP7217734B2 (ja) 2017-07-06 2023-02-03 エドワーズ リミテッド 真空ポンプシステム及び真空ポンプシステムを有する半導体製造アセンブリ
KR102519472B1 (ko) * 2017-07-06 2023-04-06 에드워즈 리미티드 펌핑 라인 배열체에서의 또는 그에 관한 개량
CN108389788A (zh) * 2018-04-25 2018-08-10 睿力集成电路有限公司 扩散炉管设备及处理废气的方法
CN108389788B (zh) * 2018-04-25 2023-08-25 长鑫存储技术有限公司 扩散炉管设备及处理废气的方法

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