JP2006310223A5 - - Google Patents

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Publication number
JP2006310223A5
JP2006310223A5 JP2005134136A JP2005134136A JP2006310223A5 JP 2006310223 A5 JP2006310223 A5 JP 2006310223A5 JP 2005134136 A JP2005134136 A JP 2005134136A JP 2005134136 A JP2005134136 A JP 2005134136A JP 2006310223 A5 JP2006310223 A5 JP 2006310223A5
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JP
Japan
Prior art keywords
zeb
sample
focus value
focus
inspection apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2005134136A
Other languages
English (en)
Japanese (ja)
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JP2006310223A (ja
JP4959149B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2005134136A external-priority patent/JP4959149B2/ja
Priority to JP2005134136A priority Critical patent/JP4959149B2/ja
Priority to KR1020077027719A priority patent/KR101213587B1/ko
Priority to PCT/JP2006/308843 priority patent/WO2006120917A1/ja
Priority to US11/913,387 priority patent/US7964844B2/en
Priority to TW095115198A priority patent/TWI390648B/zh
Publication of JP2006310223A publication Critical patent/JP2006310223A/ja
Publication of JP2006310223A5 publication Critical patent/JP2006310223A5/ja
Publication of JP4959149B2 publication Critical patent/JP4959149B2/ja
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2005134136A 2005-05-02 2005-05-02 試料検査装置 Expired - Lifetime JP4959149B2 (ja)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2005134136A JP4959149B2 (ja) 2005-05-02 2005-05-02 試料検査装置
KR1020077027719A KR101213587B1 (ko) 2005-05-02 2006-04-27 시료검사장치
PCT/JP2006/308843 WO2006120917A1 (ja) 2005-05-02 2006-04-27 試料検査装置
US11/913,387 US7964844B2 (en) 2005-05-02 2006-04-27 Sample inspection apparatus
TW095115198A TWI390648B (zh) 2005-05-02 2006-04-28 樣本檢查裝置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005134136A JP4959149B2 (ja) 2005-05-02 2005-05-02 試料検査装置

Publications (3)

Publication Number Publication Date
JP2006310223A JP2006310223A (ja) 2006-11-09
JP2006310223A5 true JP2006310223A5 (https=) 2008-05-29
JP4959149B2 JP4959149B2 (ja) 2012-06-20

Family

ID=37396426

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005134136A Expired - Lifetime JP4959149B2 (ja) 2005-05-02 2005-05-02 試料検査装置

Country Status (5)

Country Link
US (1) US7964844B2 (https=)
JP (1) JP4959149B2 (https=)
KR (1) KR101213587B1 (https=)
TW (1) TWI390648B (https=)
WO (1) WO2006120917A1 (https=)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010517233A (ja) * 2007-01-25 2010-05-20 エヌエフエイビー・リミテッド 改良された粒子ビーム発生装置
JP2008252070A (ja) * 2007-03-07 2008-10-16 Nuflare Technology Inc 荷電粒子ビームの焦点合わせ方法及び荷電粒子ビームの非点調整方法
JP5243912B2 (ja) * 2008-01-24 2013-07-24 日本電子株式会社 荷電粒子ビーム装置におけるビーム位置較正方法
JP5325802B2 (ja) * 2010-01-28 2013-10-23 株式会社日立ハイテクノロジーズ 観察方法および観察装置
US8519353B2 (en) * 2010-12-29 2013-08-27 Varian Semiconductor Equipment Associates, Inc. Method and apparatus for controlling an asymmetric electrostatic lens about a central ray trajectory of an ion beam
JP5331828B2 (ja) * 2011-01-14 2013-10-30 株式会社日立ハイテクノロジーズ 荷電粒子線装置
US8912488B2 (en) * 2012-11-15 2014-12-16 Fei Company Automated sample orientation
US9110039B2 (en) * 2013-07-25 2015-08-18 Kla-Tencor Corporation Auto-focus system and methods for die-to-die inspection
JP6309366B2 (ja) * 2014-06-30 2018-04-11 株式会社ホロン 荷電粒子線装置における高さ測定装置およびオートフォーカス装置
JP7455676B2 (ja) * 2020-06-05 2024-03-26 株式会社日立ハイテク 電子顕微鏡および電子顕微鏡のフォーカス調整方法
WO2021250733A1 (ja) * 2020-06-08 2021-12-16 株式会社日立ハイテク 荷電粒子線装置、およびそのフォーカス調整方法

Family Cites Families (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2542356C2 (de) * 1975-09-19 1977-10-20 Siemens AG, 1000 Berlin und 8000 München Verfahren zur Fokussierung der Objektivlinse eines Korpuskular-Durchstrahlungs-Rastermikroskops und Einrichtung zur selbsttätigen Durchführung des Verfahrens, sowie Anwendung
JPH053013A (ja) * 1991-06-24 1993-01-08 Shimadzu Corp 自動焦点調節装置
JPH07245075A (ja) * 1994-03-04 1995-09-19 Horon:Kk 自動焦点合わせ装置
JPH1048163A (ja) * 1996-08-07 1998-02-20 Shimadzu Corp 表面分析方法およびその装置
US6107637A (en) * 1997-08-11 2000-08-22 Hitachi, Ltd. Electron beam exposure or system inspection or measurement apparatus and its method and height detection apparatus
JPH11149895A (ja) * 1997-08-11 1999-06-02 Hitachi Ltd 電子線式検査または測定装置およびその方法、高さ検出装置並びに電子線式描画装置
JP2000228166A (ja) * 1999-02-05 2000-08-15 Horon:Kk 試料観察装置
JP4610798B2 (ja) * 2001-06-19 2011-01-12 エスアイアイ・ナノテクノロジー株式会社 レーザ欠陥検出機能を備えた走査型電子顕微鏡とそのオートフォーカス方法
WO2003007330A1 (fr) * 2001-07-12 2003-01-23 Hitachi, Ltd. Procede de mesure de l'electrisation d'un echantillon et dispositif a faisceau de particules chargees
JP4388270B2 (ja) * 2002-11-18 2009-12-24 株式会社日立ハイテクノロジーズ 表面検査方法及び表面検査装置
EP1630862B1 (en) * 2003-05-30 2016-01-13 Ebara Corporation Sample inspection device and method, and device manufacturing method using the sample inspection device and method
US7440086B2 (en) * 2005-09-21 2008-10-21 Kla-Tencor Technologies Corp. Methods and systems for creating a recipe for a defect review process

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