JP2006273570A - Walking beam type transport device - Google Patents

Walking beam type transport device Download PDF

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JP2006273570A
JP2006273570A JP2005099811A JP2005099811A JP2006273570A JP 2006273570 A JP2006273570 A JP 2006273570A JP 2005099811 A JP2005099811 A JP 2005099811A JP 2005099811 A JP2005099811 A JP 2005099811A JP 2006273570 A JP2006273570 A JP 2006273570A
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substrate
horizontal support
transported
fixed
movable
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JP4283242B2 (en
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Hiroyuki Mori
洋行 森
Kenichi Tanaka
健一 田中
Tomoyuki Ishigure
智之 石榑
Naoki Okawa
直樹 大川
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Noritake Co Ltd
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Noritake Co Ltd
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Priority to KR1020060027752A priority patent/KR101162517B1/en
Priority to CN200610066964A priority patent/CN100575221C/en
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    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67706Mechanical details, e.g. roller, belt
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/063Transporting devices for sheet glass
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B65CONVEYING; PACKING; STORING; HANDLING THIN OR FILAMENTARY MATERIAL
    • B65GTRANSPORT OR STORAGE DEVICES, e.g. CONVEYORS FOR LOADING OR TIPPING, SHOP CONVEYOR SYSTEMS OR PNEUMATIC TUBE CONVEYORS
    • B65G49/00Conveying systems characterised by their application for specified purposes not otherwise provided for
    • B65G49/05Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles
    • B65G49/06Conveying systems characterised by their application for specified purposes not otherwise provided for for fragile or damageable materials or articles for fragile sheets, e.g. glass
    • B65G49/067Sheet handling, means, e.g. manipulators, devices for turning or tilting sheet glass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/677Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations
    • H01L21/67703Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for conveying, e.g. between different workstations between different workstations
    • H01L21/67736Loading to or unloading from a conveyor
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L21/00Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
    • H01L21/67Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
    • H01L21/683Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
    • H01L21/687Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
    • H01L21/68714Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
    • H01L21/6875Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions

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  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Manufacturing & Machinery (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Tunnel Furnaces (AREA)
  • Reciprocating Conveyors (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a walking beam type transport device structured so that slipping off from the beam is unlikely even if a crack is generated in an object transported and capable of transporting the object as it is. <P>SOLUTION: The walking beam type transport device 18 is configured so that the tip of a horizontally supporting shaft 52 installed on a fixed beam 30 and the tip of the horizontally supporting shaft 52 installed on a movable beam 34 are overlapping each other in the transporting direction, so that the supporting range of the fixed beam 30 and the supporting range of the movable beam 34 adjoining to each other with respect to the bottom surface of a base board 16 overlap one over the other, and therefore, despite being divided in a plurality of sections owing to cracking etc., the base board 16 can be transported in favorable performance as it is. <P>COPYRIGHT: (C)2007,JPO&INPIT

Description

本発明は、半導体基板、ガラス基板などの薄板状の基板を搬送するためのウオーキングビーム式搬送装置に関するものである。   The present invention relates to a walking beam transfer device for transferring a thin plate substrate such as a semiconductor substrate or a glass substrate.

半導体基板、ガラス基板などの薄板状の基板に所定の処理を施すために、長手方向の相対移動と上下方向の相対移動とが交互に行われる長手状の第1ビームおよび第2ビームを備えて、その第1ビームと第2ビームとの間の受け渡しによって被搬送物を搬送するためのウオーキングビーム式搬送装置が知られている。たとえば、基板を熱処理する熱処理炉内でウオーキングビームを用いて搬送するためのウオーキングビーム式搬送装置を備えた熱処理装置がそれである。   In order to perform a predetermined treatment on a thin substrate such as a semiconductor substrate or a glass substrate, a longitudinal first beam and a second beam in which relative movement in the longitudinal direction and relative movement in the vertical direction are alternately performed are provided. In addition, a walking beam type conveying device for conveying an object to be conveyed by passing between the first beam and the second beam is known. For example, it is a heat treatment apparatus provided with a walking beam type conveying device for carrying a substrate using a walking beam in a heat treatment furnace for heat treating the substrate.

しかしながら、上記ウオーキングビーム式搬送装置によれば、第1ビームと第2ビームとに交互に支持されつつ搬送される途中において、熱衝撃、振動等の何らかの原因で基板に割れが発生して複数個に分割される場合がある。このように基板が複数個に割れると、上記第1ビームおよび第2ビームにより支持できなくなって脱落し、続いて逐次搬送される基板がそれに衝突して堆積するので、不良品を発生させるという問題があった。   However, according to the above walking beam type conveying apparatus, a plurality of cracks are generated in the substrate due to thermal shock, vibration or the like during the conveyance while being alternately supported by the first beam and the second beam. May be divided. If the substrate is broken into a plurality of pieces as described above, the substrate cannot be supported by the first beam and the second beam and falls off, and subsequently the substrate that is sequentially transported collides and accumulates thereon, resulting in a problem of generating defective products. was there.

これに対し、基板を専ら支持する複数の支持ピンの他に、その複数の支持ピンよりも低い複数のサブ支持ピンをビーム上に設け、基板が割れるとそのサブ支持ピンによっても支持するようにしたウオーキングビーム式搬送装置が提案されている。たとえば、特許文献1に記載された基板搬送用ウオーキングビームがそれである。これによれば、基板に割れが生じても、割れた基板を引き続き搬送することができるので、割れた基板に後から搬送された基板が衝突して堆積することが軽減される。
特開2004−18122号公報
On the other hand, in addition to a plurality of support pins that exclusively support the substrate, a plurality of sub support pins lower than the plurality of support pins are provided on the beam so that when the substrate is broken, the sub support pins are also supported. A walking beam type conveying apparatus has been proposed. For example, this is the walking beam for substrate transfer described in Patent Document 1. According to this, even if a crack occurs in the substrate, it is possible to continue to transport the cracked substrate, so that it is possible to reduce the collision and deposition of the substrate transported later on the cracked substrate.
JP 2004-18122 A

ところで、上記従来のウオーキングビーム式搬送装置によれば、基板の裏面に対して互いに隣接する第1ビームによる支持面積と第2ビームによる支持面積とが相互に異なるものであるため、分割された基板が特に第1ピームから第2ビームへの受け渡しに際して脱落することがあり、未だ十分な効果が得られがたいものであった。   By the way, according to the above-mentioned conventional walking beam type transfer device, the support area by the first beam and the support area by the second beam which are adjacent to each other with respect to the back surface of the substrate are different from each other. However, it may fall off when the first beam is transferred from the first beam to the second beam, and it is still difficult to obtain a sufficient effect.

本発明は以上の事情を背景として為されたものであり、その目的とするところは、被搬送物に割れが発生してもビームから脱落し難く、そのまま搬送可能なウオーキングビーム式搬送装置を提供することにある。   The present invention has been made against the background of the above circumstances, and an object of the present invention is to provide a walking beam type conveying apparatus that can be conveyed as it is without being easily dropped from the beam even if the object to be conveyed is cracked. There is to do.

本発明者等は、以上の事情を背景として種々の検討を重ねた結果、被搬送物の底面に対して互いに隣接する第1ビームによる支持範囲と第2ビームによる支持範囲とを重複させると、割れなどによって複数に分割された被搬送物であっても、そのまま好適に搬送されるという事実を見出した。本発明はそのような知見に基づいて為されたものである。   As a result of repeating various studies on the background of the above circumstances, the inventors have made the support range by the first beam and the support range by the second beam adjacent to each other to the bottom surface of the object to be transported overlap, The present inventors have found the fact that even an object to be transported divided into a plurality of parts by cracking or the like is transported suitably as it is. The present invention has been made based on such knowledge.

すなわち、前記目的を達成するための請求項1に係る発明の要旨とするところは、(a) 搬送方向の相対移動と上下方向の相対移動とが交互に行われる長手状の第1ビームおよび第2ビームを備え、その第1ビームと第2ビームとの間の受け渡しによって被搬送物を搬送するためのウオーキングビーム式搬送装置であって、(b) 前記第1ビームおよび第2ビームにそれぞれ設けられ、搬送方向に対して交差する水平な方向において互いに平行な、前記被搬送物の底面を支持するための複数本の長手状の水平支持部材を含み、(c) 前記第1ビームに設けられた長手状の水平支持部材の先端部と前記第2ビームに設けられた長手状の水平支持部材の先端部とは、前記搬送方向に交差する方向の寸法がその搬送方向において互いに重複していることを特徴とする。   That is, the gist of the invention according to claim 1 for achieving the above object is that: (a) a first beam having a longitudinal shape in which relative movement in the transport direction and relative movement in the vertical direction are alternately performed; A walking beam type transport device for transporting an object to be transported by passing between the first beam and the second beam, and (b) provided on each of the first beam and the second beam. A plurality of longitudinal horizontal support members for supporting the bottom surface of the object to be transported, which are parallel to each other in a horizontal direction intersecting the transport direction, and (c) provided on the first beam. The front end portion of the long horizontal support member and the front end portion of the long horizontal support member provided on the second beam overlap each other in the transport direction in the transport direction. That features To.

また、請求項2に係る発明の要旨とするところは、前記被搬送物を輻射加熱するための加熱体を有するトンネル状の加熱炉内を通して、その被搬送物を搬送するものである。   The gist of the invention according to claim 2 is that the object to be conveyed is conveyed through a tunnel-shaped heating furnace having a heating body for radiantly heating the object to be conveyed.

請求項1に係る発明のウオーキングビーム式搬送装置によれば、第1ビームおよび第2ビームにそれぞれ設けられ、搬送方向に対して交差する水平な方向において互いに平行な、前記被搬送物の底面を支持するための複数本の長手状の水平支持部材を含み、上記第1ビームに設けられた長手状の水平支持部材の先端部と上記第2ビームに設けられた長手状の水平支持部材の先端部とが上記搬送方向において互いに重複していることから、被搬送物の底面に対して互いに隣接する第1ビームによる支持範囲と第2ビームによる支持範囲とが搬送方向において互いに重複するので、割れなどによって複数に分割された被搬送物であっても好適にそのまま搬送される。したがって、被搬送物に割れが発生して複数に分割されても、後続の被搬送物がそれに衝突して堆積されることがなく、不良率が低下するとともに、被搬送物の処理設備の可動率が高められる。   According to the walking beam type conveyance device of the invention according to claim 1, the bottom surfaces of the objects to be conveyed are provided on the first beam and the second beam, respectively, and are parallel to each other in a horizontal direction intersecting the conveyance direction. A plurality of longitudinal horizontal support members for supporting, the distal end of the longitudinal horizontal support member provided on the first beam and the distal end of the longitudinal horizontal support member provided on the second beam; Since the portions overlap each other in the transport direction, the support range by the first beam and the support range by the second beam adjacent to each other with respect to the bottom surface of the object to be transported overlap each other in the transport direction. Even if the object is divided into a plurality of parts by, for example, it is preferably conveyed as it is. Therefore, even if the transported object is cracked and divided into a plurality of parts, the subsequent transported object does not collide and accumulate on it, the defect rate is reduced, and the processing equipment for the transported object is movable. The rate is increased.

また、請求項2に係る発明のウオーキングビーム式搬送装置によれば、前記被搬送物を輻射加熱するための加熱体を有するトンネル状の加熱炉内を通してその被搬送物を搬送することから、その加熱炉内において被搬送物に割れが発生して複数に分割されても、後続の被搬送物がそれに衝突して堆積されることがなく、不良率が低下するとともに、被搬送物に熱処理を施すための設備である加熱炉の可動率が高められる。   Further, according to the walking beam type conveying apparatus of the invention according to claim 2, since the object to be conveyed is conveyed through a tunnel-shaped heating furnace having a heating body for radiantly heating the object to be conveyed, Even if the transported object is cracked in the heating furnace and divided into a plurality of parts, the subsequent transported object does not collide with it and accumulate, reducing the defective rate, and subjecting the transported object to heat treatment. The moving rate of the heating furnace, which is a facility for applying, is increased.

ここで、好適には、前記被搬送物は、太陽電池セル、太陽電池用半導体ウエハ、LCD或いはPDP用のガラス基板などの薄板状の基板である。   Here, preferably, the object to be transported is a thin plate substrate such as a solar cell, a semiconductor wafer for solar cell, a glass substrate for LCD or PDP.

また、好適には、前記水平支持部材は、前記被搬送物の搬送方向の寸法の2分の1よりも短い間隔で配設されたものである。このようにすれば、搬送方向において、第1ビームによる支持状態および第2ビームによる支持状態のそれぞれにおいて複数本の水平支持部材によって支持されるので、比較的脆く割れやすい基板であっても好適に搬送が可能となる。たとえ被搬送物に割れが発生しても好適に搬送される。   Preferably, the horizontal support members are disposed at intervals shorter than one half of the dimension of the transported object in the transport direction. According to this configuration, the substrate is supported by the plurality of horizontal support members in each of the support state by the first beam and the support state by the second beam in the transport direction. Transport is possible. Even if a crack occurs in the object to be transported, it is transported suitably.

また、好適には、前記水平支持部材は、断面円形、断面矩形の中実或いは中空の長手状の棒材であり、好適には、多孔質セラミックスなどの被搬送物よりも熱伝導率が低い材質から構成される。これにより、被搬送物内の温度分布がより均一となる。   Preferably, the horizontal support member is a solid rod or a hollow longitudinal bar having a circular cross section, a rectangular cross section, and preferably has a thermal conductivity lower than that of a transported object such as porous ceramics. Consists of materials. Thereby, the temperature distribution in the conveyed object becomes more uniform.

また、好適には、前記水平支持部材は、搬送方向に対して必ずしも直交してなくてもよいし、必ずしも棒状でなく先端に向かうほど小径となるものであってもよい。   Preferably, the horizontal support member does not necessarily have to be orthogonal to the transport direction, and does not necessarily have a rod shape and may have a smaller diameter toward the tip.

また、好適には、前記水平支持部材は、好適には、上方へ突き出す複数の小突起を備え、その小突起を介して前記被搬送物を支持するものである。これにより、被搬送物内の温度分布が一層均一となる。   Preferably, the horizontal support member preferably includes a plurality of small protrusions protruding upward, and supports the object to be conveyed via the small protrusions. Thereby, the temperature distribution in the conveyed object becomes more uniform.

また、好適には、前記第1ビームおよび/または第2ビームは、その第1ビームおよび第2ビームから垂直方向に突設された垂直支持軸を介して前記水平支持部材を支持するものである。このようにすれば、熱処理のための炉壁を通して垂直支持軸が水平支持部材を支持するので、被搬送物内の温度分布が一層均一となる。   Preferably, the first beam and / or the second beam supports the horizontal support member via a vertical support shaft protruding in the vertical direction from the first beam and the second beam. . In this case, the vertical support shaft supports the horizontal support member through the furnace wall for heat treatment, so that the temperature distribution in the conveyed object becomes more uniform.

前記第1ビームおよび第2ビームは、一方が固定され且つ他方が搬送方向および上下方向において相対移動可能に設けられたものでもよいが、両方が搬送方向および上下方向において相対移動可能に設けられたものでもよい。   One of the first beam and the second beam may be fixed and the other may be provided to be relatively movable in the transport direction and the vertical direction, but both are provided to be relatively movable in the transport direction and the vertical direction. It may be a thing.

以下、本発明の一実施例を図面を参照して詳細に説明する。なお、以下の実施例において、発明の具体例を説明する目的の範囲で、図は適宜簡略化或いは変形されており、各部の寸法比および形状等は必ずしも正確に描かれていない。   Hereinafter, an embodiment of the present invention will be described in detail with reference to the drawings. In the following embodiments, the drawings are appropriately simplified or modified within the scope of the description of specific examples of the invention, and the dimensional ratios, shapes, and the like of the respective parts are not necessarily drawn accurately.

図1は、本発明の一実施例の熱処理装置10を示す要部断面図であり、図2は加熱炉14の炉体をきり欠いてその中を示す要部平面図である。図1および図2において、熱処理装置10は、フレーム(機枠)12によって所定の高さ位置に固定されたトンネル状の加熱炉14と、その加熱炉14内を通して被搬送物である基板16を加熱炉14の入口側から出口側へ順次搬送するためのウオーキングビーム式搬送装置18とを備えている。基板16は、たとえば大型液晶表示装置或いは大型プラズマ表示装置に用いられるガラス半導体基板であり、矩形たとえば100cm×120cm程度の長方形である。基板16は、たとえばその表面および裏面に印刷された電極材料ペーストなどの膜材料を熱処理により焼成し固着して電極層とするために上記熱処理装置10において熱処理される。   FIG. 1 is a cross-sectional view showing a main part of a heat treatment apparatus 10 according to an embodiment of the present invention. FIG. 2 is a plan view showing a main part of the heating furnace 14 cut out. 1 and 2, a heat treatment apparatus 10 includes a tunnel-shaped heating furnace 14 fixed at a predetermined height position by a frame (machine frame) 12, and a substrate 16 that is a transferred object through the heating furnace 14. A walking beam type conveying device 18 for sequentially conveying from the inlet side to the outlet side of the heating furnace 14 is provided. The substrate 16 is a glass semiconductor substrate used for, for example, a large liquid crystal display device or a large plasma display device, and has a rectangular shape, for example, a rectangle of about 100 cm × 120 cm. The substrate 16 is heat-treated in the heat treatment apparatus 10 in order to sinter and fix a film material such as an electrode material paste printed on the front and back surfaces thereof by heat treatment to form an electrode layer.

上記加熱炉14は、入口および出口において開口するトンネル状の炉壁から成る炉体20と、その加熱炉14内を一定の間隔の複数個の加熱室に区画するための隔壁22と、その炉体20内に設けられてたとえば3乃至4μm以上の波長の遠赤外線を放射する加熱パネル26とを備え、上記ウオーキングビーム式搬送装置18により各加熱室間で順次搬送される基板16に対して所定のヒートカーブで熱処理を施す。上記隔壁22は、上記各加熱室毎に基板16内を均一な温度に保持しつつ加熱するためのものであり、基板16および後述の梁状の可動ビーム34を通過させる必要かつ十分な断面積の貫通穴24を備えている。酸化性雰囲気での加熱の場合は、図示しない空気供給管および排気管により上記加熱室内の膜材料の燃焼排気が除去されて雰囲気が清浄に維持される。非酸化性雰囲気であれば、上記空気に換えて、窒素などの不活性ガスが用いられ、還元雰囲気であれば水素ガスが用いられる。   The heating furnace 14 includes a furnace body 20 composed of a tunnel-like furnace wall that opens at the entrance and the exit, a partition wall 22 for partitioning the inside of the heating furnace 14 into a plurality of heating chambers at regular intervals, and the furnace A heating panel 26 that is provided in the body 20 and emits far-infrared rays having a wavelength of 3 to 4 μm or more, for example, and is predetermined with respect to the substrate 16 that is sequentially transferred between the heating chambers by the walking beam transfer device 18. Heat treatment is performed with the heat curve. The partition wall 22 is for heating the substrate 16 while maintaining the inside of the substrate 16 at a uniform temperature for each of the heating chambers, and a necessary and sufficient cross-sectional area for allowing the substrate 16 and a beam-like movable beam 34 described later to pass therethrough. The through hole 24 is provided. In the case of heating in an oxidizing atmosphere, combustion exhaust of the film material in the heating chamber is removed by an air supply pipe and an exhaust pipe (not shown), and the atmosphere is kept clean. In the case of a non-oxidizing atmosphere, an inert gas such as nitrogen is used instead of the air, and in the case of a reducing atmosphere, hydrogen gas is used.

上記炉体20および隔壁22は、セラミック繊維がたとえばシリカゲルの含浸により固められて厚板のブロック状に成形されることにより断熱性に優れ且つ軽量なセラミックファイバーボードにより構成されており、そのセラミックファイバーボードの表面のうち少なくとも内壁面側にはシリカ系コーティングが施されたものである。このため、断熱性が得られるだけでなく、セラミックファイバーボードからの粉塵の発生が防止され、クリーン度が高められる。   The furnace body 20 and the partition wall 22 are made of a ceramic fiber board that is excellent in heat insulation and is lightweight by ceramic fibers being hardened by impregnation of silica gel, for example, and formed into a thick block shape. A silica-based coating is applied to at least the inner wall surface of the board surface. For this reason, not only heat insulation is obtained, but generation of dust from the ceramic fiber board is prevented, and the cleanliness is enhanced.

前記ウオーキングビーム式搬送装置18は、炉体20内の各加熱室内において搬送方向Aに平行且つ互いに平行にそれぞれ固定された比較的薄い梁状の複数本(本実施例では互いに平行かつ同じ長さの4本)の第1ビームである固定ビーム30と、炉体20の下側の炉壁を貫通する複数本の支柱32によって支持された炉長以上の長手状の第2ビームすなわち複数本の可動ビーム34と、その可動ビーム34に、固定ビーム30に対する炉長方向の相対移動と上下方向の相対移動とを交互に行わせるビーム駆動装置36とを備えている。本実施例では、互いに平行かつ炉体20よりも長い3本の可動ビーム34が、4本の固定ビーム30の間に配設されている。なお、可動ビーム34は、その長手方向において複数本に分割されたものであっても、相互に同期して駆動されれば問題ない。   The walking beam type conveying device 18 includes a plurality of relatively thin beam-like pieces (in this embodiment, parallel to each other and of the same length) fixed in parallel to each other in the conveying direction A in each heating chamber in the furnace body 20. 4) of the fixed beam 30 as the first beam and a plurality of longitudinal second beams longer than the furnace length supported by a plurality of support columns 32 penetrating the furnace wall on the lower side of the furnace body 20, that is, a plurality of beams. A movable beam 34 and a beam driving device 36 that causes the movable beam 34 to alternately perform relative movement in the furnace length direction and relative movement in the vertical direction with respect to the fixed beam 30 are provided. In the present embodiment, three movable beams 34 that are parallel to each other and longer than the furnace body 20 are disposed between the four fixed beams 30. Even if the movable beam 34 is divided into a plurality of pieces in the longitudinal direction, there is no problem as long as the movable beam 34 is driven in synchronization with each other.

ビーム駆動装置36は、一対の水平レール37により搬送方向Aに移動可能に設けられ、炉体20の下側において炉長方向の複数箇所に配置された複数の移動テーブル38と、その移動テーブル38を往復駆動する共通の往復駆動装置40と、複数個の上下カム42を有して各移動テーブル38上において回転可能に支持された共通のカム軸44と、移動テーブル38のうちの1つに配置されてそのカム軸44を回転駆動する回転駆動装置46と、移動テーブル38に設けられた上下ガイド装置48によって上下方向に案内され且つ上下カム42によって上下駆動される上下板50とを備え、その上下板50に立設された支柱32を介して可動ビーム34に、固定ビーム30に対する上昇運動、前進運動、下降運動、後退運動を順次且つ繰り返し行わせることにより、固定ビーム30と可動ビーム34との間の受け渡しを行って基板16を加熱炉14の出口へ向かって所定の搬送ストロークで順次搬送する。この搬送ストロークは、たとえば前記加熱室の配置ピッチに対応するものである。なお、図1の1点鎖線は、可動ビーム34に固設された水平支持軸52が下降させられた位置を示している。   The beam driving device 36 is provided so as to be movable in the transport direction A by a pair of horizontal rails 37, and a plurality of moving tables 38 disposed at a plurality of locations in the furnace length direction below the furnace body 20, and the moving table 38. A common reciprocating drive device 40 that reciprocally drives the same, a common cam shaft 44 that has a plurality of upper and lower cams 42 and is rotatably supported on each moving table 38, and one of the moving tables 38. A rotation driving device 46 disposed and rotationally driving the cam shaft 44; and an upper and lower plate 50 guided in the vertical direction by an upper and lower guide device 48 provided on the moving table 38 and driven up and down by the upper and lower cams 42; Ascending motion, forward motion, downward motion, and backward motion with respect to the fixed beam 30 are sequentially and repeatedly applied to the movable beam 34 through the support column 32 erected on the upper and lower plates 50. By then performed sequentially conveyed at a predetermined conveyance stroke toward the substrate 16 by performing a transfer between the fixed beam 30 and the movable beam 34 to the outlet of the heating furnace 14. This conveyance stroke corresponds to, for example, the arrangement pitch of the heating chambers. 1 indicates the position where the horizontal support shaft 52 fixed to the movable beam 34 is lowered.

上記固定ビーム30および可動ビーム34のそれぞれには、搬送方向Aに対して直角に交差し且つ水平な方向において互いに平行な複数本の水平支持軸52が一定の間隔で固定されている。この支持軸52の配置間隔は、基板16の搬送方向Aの寸法Bに対して8分の1に設定されているので、固定ビーム30による支持状態および可動ビーム34による支持状態において8本および9本の水平支持軸52によりそれぞれ支持されるようになっている。この支持軸52の配置間隔は、上記寸法Bに対して2分の1以下に設定されれば一応の効果が得られる。また、この支持軸52の配置ピッチは必ずしも一定でなくてもよい。上記水平支持軸52は、たとえば断面円形、断面矩形の中実或いは中空の棒材であり、多孔質セラミックスなどの基板16よりも熱伝導率が低い材質から構成される。   In each of the fixed beam 30 and the movable beam 34, a plurality of horizontal support shafts 52 that are perpendicular to the transport direction A and are parallel to each other in the horizontal direction are fixed at regular intervals. The arrangement interval of the support shafts 52 is set to 1/8 with respect to the dimension B in the transport direction A of the substrate 16, so that 8 and 9 are supported in the support state by the fixed beam 30 and the support state by the movable beam 34. Each is supported by a horizontal support shaft 52 of the book. If the arrangement interval of the support shafts 52 is set to ½ or less of the dimension B, a temporary effect can be obtained. Further, the arrangement pitch of the support shafts 52 is not necessarily constant. The horizontal support shaft 52 is, for example, a solid or hollow bar having a circular cross section, a rectangular cross section, and is made of a material having a lower thermal conductivity than the substrate 16 such as porous ceramics.

図1および図2に示すように、本実施例において、4本の固定ビーム30のうち、内側に位置する一対の固定ビーム30に固定された支持軸52は、外側に位置する一対の固定ビーム30に固定された支持軸52よりも長手寸法が大きい。また、3本の可動ビーム34のうちの内側に位置する1本の可動ビーム34に固定された支持軸52は、外側に位置する1対の可動ビーム34に固定された支持軸52よりも長手寸法が大きい。そして、上記固定ビーム30に設けられた水平支持軸52の先端部と可動ビーム34に設けられた水平支持軸52の先端部とが、前記搬送方向Aに直角な方向において互いに重複するように、水平支持軸52のの長さが設定されている。図2のd1、d2、d3、d4、d5、d6は、固定ビーム30に設けられた水平支持軸52の先端部と可動ビーム34に設けられた水平支持軸52の先端部との重複寸法をそれぞれ示している。それらの重複寸法d1、d2、d3、d4、d5、d6は可及的に大きくなるように、水平支持軸52が固定ビーム30および可動ビーム34の一方から他方へ向かってその他方に到達する直前位置まで突き出している。それら支持軸52は基板16を支持するための支持部材として機能している。   As shown in FIGS. 1 and 2, in this embodiment, of the four fixed beams 30, the support shaft 52 fixed to the pair of fixed beams 30 positioned inside is a pair of fixed beams positioned outside. The longitudinal dimension is larger than that of the support shaft 52 fixed to 30. Further, the support shaft 52 fixed to the one movable beam 34 located on the inner side of the three movable beams 34 is longer than the support shaft 52 fixed to the pair of movable beams 34 located on the outer side. The dimensions are large. The front end of the horizontal support shaft 52 provided on the fixed beam 30 and the front end of the horizontal support shaft 52 provided on the movable beam 34 overlap each other in a direction perpendicular to the transport direction A. The length of the horizontal support shaft 52 is set. 2, d1, d2, d3, d4, d5, and d6 are the overlapping dimensions of the tip of the horizontal support shaft 52 provided on the fixed beam 30 and the tip of the horizontal support shaft 52 provided on the movable beam 34. Each is shown. Immediately before the horizontal support shaft 52 reaches the other direction from one of the fixed beam 30 and the movable beam 34 so that their overlapping dimensions d1, d2, d3, d4, d5, d6 are as large as possible. Protruding to the position. The support shafts 52 function as support members for supporting the substrate 16.

以上のように構成されたウオーキングビーム式搬送装置18では、基板16が固定ビーム30に設けられた水平支持軸52によって支持された状態と、図3に示すように基板16が可動ビーム34に設けられた水平支持軸52によって支持された状態とが交互に行われることにより、基板16が搬送される。ここで、固定ビーム30に設けられた水平支持軸52の先端部と可動ビーム34に設けられた水平支持軸52の先端部とが重複されるように構成されていることから、所定の基板16について、上記固定ビーム30の複数本の水平支持軸52によって支持される支持面積(水平支持軸52との複数の接触点を包含する面積)と可動ビーム34の複数本の水平支持軸52によって支持される支持面積とが相互に重複しているので、搬送される過程基板16が分割されて分離したとしても、全体としてそのままの状態で搬送される。   In the walking beam type conveying apparatus 18 configured as described above, the substrate 16 is supported by the horizontal support shaft 52 provided on the fixed beam 30, and the substrate 16 is provided on the movable beam 34 as shown in FIG. The substrate 16 is transported by alternately performing the state supported by the horizontal support shaft 52 thus formed. Here, the tip of the horizontal support shaft 52 provided on the fixed beam 30 and the tip of the horizontal support shaft 52 provided on the movable beam 34 are configured to overlap each other. Are supported by a plurality of horizontal support shafts 52 of the movable beam 34 and a support area (an area including a plurality of contact points with the horizontal support shaft 52) supported by the plurality of horizontal support shafts 52 of the fixed beam 30. Since the support areas to be overlapped with each other, even if the process substrate 16 to be transported is divided and separated, it is transported as it is as a whole.

上述のように、本実施例の熱処理装置10のウオーキングビーム式搬送装置によれば、固定ビーム(第1ビーム)30および可動ビーム(第2ビーム)34にそれぞれ設けられ、搬送方向Aに対して直交する水平な方向において互いに平行な、基板(被搬送物)16の底面を支持するための複数本の水平支持軸52を含み、上記固定ビーム30に設けられた水平支持軸52の先端部と上記可動ビーム34に設けられた水平支持軸52の先端部とが上記搬送方向Aにおいて互いに重複していることから、基板16の底面に対して互いに隣接する固定ビーム30による支持範囲と可動ビーム34による支持範囲とが搬送方向において互いに重複するので、割れなどによって複数に分割された基板16であっても好適にそのまま搬送される。したがって、基板16に割れが発生して複数に分割されても、後続の基板16がそれに衝突して堆積されることがなく、不良率が低下するとともに、基板16の処理設備の可動率が高められる。   As described above, according to the walking beam type transfer device of the heat treatment apparatus 10 of the present embodiment, the fixed beam (first beam) 30 and the movable beam (second beam) 34 are provided respectively, and the transfer direction A is A plurality of horizontal support shafts 52 for supporting the bottom surface of the substrate (conveyed object) 16, which are parallel to each other in a horizontal direction perpendicular to each other, and a front end portion of the horizontal support shaft 52 provided on the fixed beam 30; Since the front end portion of the horizontal support shaft 52 provided in the movable beam 34 overlaps with each other in the transport direction A, the support range by the fixed beam 30 adjacent to the bottom surface of the substrate 16 and the movable beam 34. Therefore, even if the substrate 16 is divided into a plurality of parts by cracking or the like, it is preferably conveyed as it is. Therefore, even when the substrate 16 is cracked and divided into a plurality of substrates, the subsequent substrate 16 does not collide with it and is deposited, the defect rate is reduced, and the mobility of the processing equipment for the substrate 16 is increased. It is done.

また、本実施例のウオーキングビーム式搬送装置18によれば、基板16を輻射加熱するための加熱パネル(加熱体)26を有するトンネル状の加熱炉14内を通してその基板16を搬送することから、その加熱炉14内において基板16に割れが発生して複数に分割されても、後続の基板16がそれに衝突して堆積されることがなく、不良率が低下するとともに、基板16に熱処理を施すための設備である加熱炉14の可動率が高められる。   Further, according to the walking beam type transfer device 18 of the present embodiment, since the substrate 16 is transferred through the tunnel-shaped heating furnace 14 having the heating panel (heating body) 26 for radiantly heating the substrate 16, Even if a crack occurs in the substrate 16 in the heating furnace 14 and the substrate 16 is divided into a plurality of substrates, the subsequent substrate 16 does not collide with it and is deposited, the defect rate is reduced, and the substrate 16 is subjected to heat treatment. Therefore, the movable rate of the heating furnace 14, which is a facility for the purpose, is increased.

また、本実施例では、水平支持軸52は、基板16の搬送方向の寸法の2分の1よりも短い間隔で配設されたものであることから、搬送方向Aにおいて、固定ビーム30による支持状態および可動ビーム34による支持状態のそれぞれにおいて複数個の水平支持軸52によって支持されるので、比較的脆く割れやすい基板16であっても好適に搬送が可能となる。   In the present embodiment, the horizontal support shafts 52 are disposed at intervals shorter than one-half of the dimension of the substrate 16 in the transport direction, and thus are supported by the fixed beam 30 in the transport direction A. Since the substrate 16 is supported by the plurality of horizontal support shafts 52 in each of the state and the support state by the movable beam 34, even the substrate 16 which is relatively brittle and easily broken can be suitably transported.

また、本実施例では、水平支持軸52は、断面円形、断面矩形の中実或いは中空の棒材であり、多孔質セラミックスなどの基板16よりも熱伝導率が低い材質から構成されるので、基板16の温度分布がより均一となる。   In the present embodiment, the horizontal support shaft 52 is a solid or hollow bar having a circular cross section, a rectangular cross section, and is made of a material having a lower thermal conductivity than the substrate 16 such as porous ceramics. The temperature distribution of the substrate 16 becomes more uniform.

次に、本発明の他の実施例を説明する。なお、以下の説明において前述の実施例と共通する部分には同一の符号を付して説明を省略する。   Next, another embodiment of the present invention will be described. In the following description, the same reference numerals are given to portions common to the above-described embodiment, and the description is omitted.

図4の実施例において、可動ビーム34では、垂直支持軸54が水平支持軸52を介して可動ビーム34に取付られている。すなわち、可動ビーム34は、それらから垂直方向に突設された垂直支持軸54を介して水平支持軸52を支持している。垂直支持軸54は水平支持軸52と同様の材質から構成される。本実施例によれば、熱処理のための炉体(炉壁)20を通して垂直支持軸54が水平支持軸52を支持するので、基板16の温度分布がより均一となる。なお、上記垂直支持軸54は、固定ビーム30に設けられてもよい。   In the embodiment of FIG. 4, in the movable beam 34, a vertical support shaft 54 is attached to the movable beam 34 via a horizontal support shaft 52. That is, the movable beam 34 supports the horizontal support shaft 52 via the vertical support shaft 54 that protrudes vertically from them. The vertical support shaft 54 is made of the same material as the horizontal support shaft 52. According to the present embodiment, since the vertical support shaft 54 supports the horizontal support shaft 52 through the furnace body (furnace wall) 20 for heat treatment, the temperature distribution of the substrate 16 becomes more uniform. The vertical support shaft 54 may be provided on the fixed beam 30.

図5の実施例において、固定ビーム30および可動ビーム34に設けられた水平支持軸52には、上方に突き出す複数の小突起56が備えられている。この小突起56は、可及的に小接触面積で基板16を支持するためのものであり、水平支持軸52と同様の材質で構成されている。本実施例では、水平支持軸52は、上方へ突き出す複数の小突起56を備え、その小突起56を介して基板16を支持するものであるので、基板16内の温度分布が一層均一となる。   In the embodiment of FIG. 5, the horizontal support shaft 52 provided on the fixed beam 30 and the movable beam 34 is provided with a plurality of small protrusions 56 protruding upward. The small protrusions 56 are for supporting the substrate 16 with as small a contact area as possible, and are made of the same material as the horizontal support shaft 52. In the present embodiment, the horizontal support shaft 52 includes a plurality of small protrusions 56 protruding upward, and supports the substrate 16 via the small protrusions 56, so that the temperature distribution in the substrate 16 becomes more uniform. .

図6は、本発明の他の実施例のウオーキングビーム式搬送装置58を示すための熱処理装置の水平断面図である。図6のウオーキングビーム式搬送装置58では、固定ビーム60および可動ビーム64は前述の固定ビーム30および可動ビーム34と同様であるが、それら固定ビーム60および可動ビーム64に設けられた水平支持部材66の形状が前述の水平支持軸52と相違する。すなわち、本実施例において、可動ビーム64に固定された水平支持部材66は、断面矩形の板状であり、両端部からその可動ビーム64へ向かうほど搬送方向Aとは反対の方向へ向かうように、可動ビーム64に対して左右対象であるが可動ビーム64に対して直角よりも小さい角度で交差するように形成されており、3本の可動ビーム64にそれぞれ設けられて搬送方向Aに直角な方向において互いに重複する部分の水平支持部材66は互いに平行とされている。また、4本の固定ビーム60に固定された水平支持部材66は、両端部からその固定ビーム60へ向かうほど搬送方向Aへ向かうように、固定ビーム60に対して略左右対象であるが固定ビーム60に対して直角よりも小さい角度で交差するように形成され、上記固定ビーム60に固定された水平支持部材66と平行とされている。なお、4本の固定ビーム60のうちの外側に位置する一対の固定ビーム60に固定された水平支持部材66のうちその一対の固定ビーム60から外側に突き出す部分には、その固定ビーム60から内側へ突き出す部分に対して直線上に位置する分岐突起66bが設けられている。本実施例によれば、前述の実施例の支持軸52に比較して水平支持部材66の長さが長くなるとともに上記分岐突起66bが設けられていることから、基板16に対する水平支持部材66の支持長さが長くなるので、割れなどによって複数に分割された基板16であっても一層好適にそのまま搬送される。   FIG. 6 is a horizontal sectional view of a heat treatment apparatus for showing a walking beam type conveying apparatus 58 according to another embodiment of the present invention. 6, the fixed beam 60 and the movable beam 64 are the same as the above-described fixed beam 30 and the movable beam 34, but a horizontal support member 66 provided on the fixed beam 60 and the movable beam 64 is used. Is different from the horizontal support shaft 52 described above. That is, in this embodiment, the horizontal support member 66 fixed to the movable beam 64 is a plate having a rectangular cross section, and the direction from the both ends toward the movable beam 64 is opposite to the transport direction A. The movable beam 64 is a right and left object, but is formed so as to intersect with the movable beam 64 at an angle smaller than a right angle, and is provided on each of the three movable beams 64 and perpendicular to the transport direction A. The horizontal support members 66 that overlap each other in the direction are parallel to each other. Further, the horizontal support member 66 fixed to the four fixed beams 60 is a substantially right and left object with respect to the fixed beam 60 so as to go in the transport direction A toward the fixed beam 60 from both ends. It is formed so as to intersect with 60 at an angle smaller than a right angle, and is parallel to the horizontal support member 66 fixed to the fixed beam 60. A portion of the horizontal support member 66 fixed to the pair of fixed beams 60 located outside of the four fixed beams 60 projects outward from the pair of fixed beams 60. A branching protrusion 66b is provided that is positioned on a straight line with respect to the portion protruding to the front. According to the present embodiment, since the horizontal support member 66 is longer than the support shaft 52 of the above-described embodiment and the branching protrusion 66b is provided, the horizontal support member 66 with respect to the substrate 16 is provided. Since the support length is increased, even the substrate 16 divided into a plurality of parts by cracking or the like is more preferably conveyed as it is.

以上、本発明を図面を参照して詳細に説明したが、本発明は更に別の態様でも実施でき、その主旨を逸脱しない範囲で種々変更を加え得るものである。   As mentioned above, although this invention was demonstrated in detail with reference to drawings, this invention can be implemented also in another aspect, and various changes can be added in the range which does not deviate from the main point.

本発明の一実施例のウオーキングビーム式搬送装置を備えた熱処理装置を示す正面視断面図である。It is front view sectional drawing which shows the heat processing apparatus provided with the walking beam type conveying apparatus of one Example of this invention. 図1の実施例のウオーキングビーム式搬送装置を示すための熱処理装置の水平断面図である。It is a horizontal sectional view of the heat processing apparatus for showing the walking beam type conveying apparatus of the Example of FIG. 図1の実施例のウオーキングビーム式搬送装置によって基板が支持された状態を説明する図である。It is a figure explaining the state by which the board | substrate was supported by the walking beam type conveying apparatus of the Example of FIG. 本発明の他の実施例のウオーキングビーム式搬送装置によって基板が支持された状態を説明する図であって、図3に対応する図である。It is a figure explaining the state by which the board | substrate was supported by the walking beam type conveying apparatus of the other Example of this invention, Comprising: It is a figure corresponding to FIG. 本発明の他の実施例のウオーキングビーム式搬送装置によって基板が支持された状態を説明する図であって、図3に対応する図である。It is a figure explaining the state by which the board | substrate was supported by the walking beam type conveying apparatus of the other Example of this invention, Comprising: It is a figure corresponding to FIG. 本発明の他の実施例のウオーキングビーム式搬送装置を示すための熱処理装置の水平断面図であって、図2に相当する図である。It is a horizontal sectional view of the heat processing apparatus for showing the walking beam type conveying apparatus of the other Example of this invention, Comprising: It is a figure corresponded in FIG.

符号の説明Explanation of symbols

10:熱処理装置
14:加熱炉
16:基板(被搬送物)
18、58:ウオーキングビーム式搬送装置
30:固定ビーム(第1ビーム)
34:可動ビーム(第2ビーム)
52:水平支持軸(水平支持部材)
60:固定ビーム
64:可動ビーム
66:水平支持部材
10: Heat treatment apparatus 14: Heating furnace 16: Substrate (conveyed object)
18, 58: Walking beam type transfer device 30: Fixed beam (first beam)
34: Movable beam (second beam)
52: Horizontal support shaft (horizontal support member)
60: Fixed beam 64: Movable beam 66: Horizontal support member

Claims (2)

搬送方向の相対移動と上下方向の相対移動とが交互に行われる長手状の第1ビームおよび第2ビームを備え、該第1ビームと第2ビームとの間の受け渡しによって被搬送物を搬送するためのウオーキングビーム式搬送装置であって、
前記第1ビームおよび第2ビームにそれぞれ設けられ、搬送方向に対して交差する水平な方向において互いに平行な、前記被搬送物の底面を支持するための複数本の長手状の水平支持部材を含み、
前記第1ビームに設けられた長手状の水平支持部材の先端部と前記第2ビームに設けられた長手状の水平支持部材の先端部とは、前記搬送方向に交差する方向の寸法が該搬送方向において互いに重複していることを特徴とするウオーキングビーム式搬送装置。
A longitudinal first beam and a second beam in which relative movement in the transport direction and relative movement in the vertical direction are alternately performed are provided, and the object to be transported is transported by delivery between the first beam and the second beam. A walking beam type conveying device for
A plurality of longitudinal horizontal support members provided on the first beam and the second beam, respectively, for supporting the bottom surface of the object to be transported, which are parallel to each other in a horizontal direction intersecting the transport direction; ,
The tip of the longitudinal horizontal support member provided on the first beam and the tip of the longitudinal horizontal support member provided on the second beam have dimensions in a direction intersecting the transport direction. A walking beam type conveying apparatus characterized by overlapping in a direction.
前記被搬送物を輻射加熱するための加熱体を有するトンネル状の加熱炉内を通して、該被搬送物を搬送するものである請求項1のウオーキングビーム式搬送装置。
2. The walking beam type conveying apparatus according to claim 1, wherein the object to be conveyed is conveyed through a tunnel-shaped heating furnace having a heating body for radiantly heating the object to be conveyed.
JP2005099811A 2005-03-30 2005-03-30 Walking beam type conveyor Expired - Fee Related JP4283242B2 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP2005099811A JP4283242B2 (en) 2005-03-30 2005-03-30 Walking beam type conveyor
KR1020060027752A KR101162517B1 (en) 2005-03-30 2006-03-28 Walking beam type transportation device
CN200610066964A CN100575221C (en) 2005-03-30 2006-03-30 Movable-beam transportation device

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Application Number Priority Date Filing Date Title
JP2005099811A JP4283242B2 (en) 2005-03-30 2005-03-30 Walking beam type conveyor

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JP2009136964A (en) * 2007-12-06 2009-06-25 Ngk Spark Plug Co Ltd Positioning table, wiring board manufacturing device, and method of manufacturing wiring board
JP2012156236A (en) * 2011-01-25 2012-08-16 Murata Mach Ltd Substrate transfer device
US8428448B2 (en) 2007-04-03 2013-04-23 Noritake Co., Limited Walking beam type heat treatment apparatus
CN109564064A (en) * 2016-07-28 2019-04-02 自动工程公司 Transport through furnace
CN114506683A (en) * 2022-02-16 2022-05-17 广西腾智投资有限公司 Rail mounted erection equipment

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8428448B2 (en) 2007-04-03 2013-04-23 Noritake Co., Limited Walking beam type heat treatment apparatus
JP2009136964A (en) * 2007-12-06 2009-06-25 Ngk Spark Plug Co Ltd Positioning table, wiring board manufacturing device, and method of manufacturing wiring board
JP2012156236A (en) * 2011-01-25 2012-08-16 Murata Mach Ltd Substrate transfer device
CN109564064A (en) * 2016-07-28 2019-04-02 自动工程公司 Transport through furnace
CN109564064B (en) * 2016-07-28 2020-12-25 自动工程有限公司 Conveyed through the furnace
CN114506683A (en) * 2022-02-16 2022-05-17 广西腾智投资有限公司 Rail mounted erection equipment
CN114506683B (en) * 2022-02-16 2023-12-01 广西腾智投资有限公司 Rail type mounting equipment

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JP4283242B2 (en) 2009-06-24
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CN100575221C (en) 2009-12-30
CN1854658A (en) 2006-11-01

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