CN100519369C - Step forward heat treatment device - Google Patents
Step forward heat treatment device Download PDFInfo
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- CN100519369C CN100519369C CNB2006100030500A CN200610003050A CN100519369C CN 100519369 C CN100519369 C CN 100519369C CN B2006100030500 A CNB2006100030500 A CN B2006100030500A CN 200610003050 A CN200610003050 A CN 200610003050A CN 100519369 C CN100519369 C CN 100519369C
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Abstract
To provide a walking beam type heat treatment device capable of shortening the rising time in heating as much as practicable or shortening the time for the heating process. The walking beam type heat treatment device 10 includes a stationary beam 20 and a movable beam 22 formed from a transparent quartz tube, and the radiation energy from a halogen heater (heating body) 78 can reach the reverse surface of a base board through the transparent quartz tubes, so that it is easy to make quick heating uniformly, compared with a conventional arrangement, which allows shortening the rising time or the time for heating process. As a result, the risk of the heat treatment affecting the characteristics of the base board is lessened as much as practicable.
Description
Technical field
The present invention relates to be used for the step-by-step heat treating apparatus of substrates such as heat treatment semiconductor substrate.
Background technology
Known a kind of possess be used in the heat treatment furnace of substrates such as heat treatment semiconductor substrate, utilize step rate to carry the annealing device of the step wise base board delivery device of this substrate.In such annealing device, substrate is carried in the heat treatment furnace that carries out drying or burn till, and implemented to be used for the membrane material set is formed on the heat treatment of the surface (top) of substrate and/or the processing on the back side (following) etc.What for example, patent documentation 1 or patent documentation 2 were put down in writing is exactly this device.
Patent documentation 1: the spy opens the 2003-176011 communique
Patent documentation 2: the spy opens the 2004-18122 communique
In the annealing device that possesses above-mentioned step wise base board delivery device, usually possess the furnace superintendent direction that hockets relatively move and the 1st beam that relatively moves of above-below direction and the 2nd beam and in order to support this substrate with substrate contacts from the 1st beam and the upwards prominent a plurality of supporting pins established of the 2nd beam, come conveying substrate by handing-over between the 1st beam and the 2nd beam.
, when being used for that the membrane material set is formed on the heat treatment of the surface of substrate and/or back side brand-name substrate, thereby sometimes wish to heat up the shortening heat processing time as far as possible apace, and the not influence of remaining heat in substrate.For example, when on the surface of solar cell substrate and/or the back side when forming electrode with membrane materials such as electrode pastes, when its heating is burnt till, wish to heat up as far as possible apace, cooling apace after having guaranteed to be used for the holding time that electrode forms, pay the surface being used for the temperature that electrode forms, but finish heat treatment before impacting for its characteristic being delivered to substrate in-to-in heat.
But, in annealing device in the past, even if carry out radiation heating for fast speed heat treatment, the also inevitable situation of beam below substrate and between the heating plate, owing to blocked by this beam from the radianies such as far-infrared rays of heating plate radiation, therefore be difficult to realize equably heating rapidly, build up time to a certain degree must be arranged, for example about 20 to 30 seconds.Therefore, exist the characteristic of substrate to change because of the influence that is subjected to heat, characteristic is uneven, and perhaps quality is damaged and the undesirable condition of qualification rate decline.For example, when the table back at solar cell substrate is used to form the heat treatment of comb poles, the problem that exists the characteristic of solar cell to be changed.
Summary of the invention
The present invention is developed into above thing as a setting, and its purpose is to provide and can shortens the heating build up time as much as possible, perhaps can shorten the step-by-step heat treating apparatus of furnace run time.
Be used to reach the application's of above-mentioned purpose the 1st main idea, be to possess relatively moving and the 1st beam that relatively moves and the 2nd beam of above-below direction and have the heating furnace that is used for the substrate that the cooperation by these the 1st beams and the 2nd beam is transferred is carried out the calandria of radiation heating of the furnace superintendent direction that hockets, utilize handing-over between the 1st beam and the 2nd beam make aforesaid substrate in aforementioned heating furnace by and with the step-by-step heat treating apparatus of its conveying, at least a portion in aforementioned the 1st beam and/or the 2nd beam is made of transparent pottery.
In addition, the application's the 2nd main idea be, in the 1st described invention, aforementioned the 1st beam and/or the 2nd beam are made of respectively a pair of tubular part that is parallel to each other, this a pair of tubular part vertically in, at least a portion is to be made of transparent quartz tube.
In addition, the application's the 3rd main idea be, the 1st or 2 described inventions in, aforementioned the 1st beam is the fixed beam that is provided with by stationkeeping ground with respect to aforementioned heating furnace, aforementioned the 2nd beam is the movable beam that can be provided with respect to aforementioned heating furnace with relatively moving.
In addition, the application's the 4th main idea is in any described invention arbitrarily of the 1st to 3, in order to support aforesaid base plate below it, the side-prominent a plurality of supporting projections that make progress to be set at least one side of aforementioned the 1st beam and the 2nd beam.
In addition, the application's the 5th main idea is, in the 1st to 4 described invention, in order on throughput direction, aforesaid base plate to be located, on at least one side of aforementioned the 1st beam and the 2nd beam, be provided be provided with the leading edge that can be fastened on this substrate and the interval on the trailing edge and the closer to front end more to away from a pair of throughput direction guide projections of the direction bevelled of this substrate.
In addition, the application's the 6th main idea is, in any described invention arbitrarily of the 1st～5, be positioned at the beam in the outside at aforementioned the 1st beam that is used for conveying substrate collaboratively and the 2nd beam, possess with the closer to the outside just the mode the closer to upside tilt, guide the lateral steering projection of the lateral margin of aforesaid base plate.
In addition, the application's the 7th main idea is, in any described invention arbitrarily of the 1st to 6, aforementioned heating furnace, on the position that upside and downside from this substrate separate predetermined distance, possess a plurality of heating plates respectively, this heating plate has the emissive surface that the far-infrared emitter layer is arranged with the top and following relative set of the aforesaid base plate of being carried.
In addition, the application's the 8th main idea be, in the 7th described invention, aforementioned heating furnace possesses by the freeing pipe on the part on the top of a plurality of heating chambers of cutting apart from outstanding downwards next door, the top of furnace wall and this heating chamber of formation of being connected aforementioned furnace wall.
In addition, the application's the 9th main idea is, in the 8th described invention, in aforementioned heating chamber, dispose preheating pipe on the side of the downside of substrate conveying and upside, provide by the air supply pipe of the fore-warming gas of this preheating pipe disposing on the opposing party in this heating chamber.
In addition, the application's the 10th main idea be, the 7th or 8 described inventions in, the furnace wall of aforementioned heating furnace is made of the ceramic beaverboard that ceramic-fibre is configured as thick plate-like, has implemented the silicon dioxide type coating on the internal face of this ceramic beaverboard.
Step-by-step heat treating apparatus according to the 1st aspect of the present invention, because at least a portion in the 1st beam and/or the 2nd beam, be to constitute by transparent pottery, therefore the emittance that comes from calandria can arrive the back side of substrate by transparent pottery, therefore compare with step-by-step heat treating apparatus in the past, just be easy to heat rapidly equably, can shorten build up time or furnace run time.Its result can reduce the situation that heat treatment impacts for the characteristic of substrate as much as possible.
In addition, the application the 2nd aspect in, because aforementioned the 1st beam and/or the 2nd beam, constitute respectively by a pair of tubular part that is parallel to each other, and vertically middle at least a portion of this a pair of tubular part is to be made of transparent quartz tube, therefore have light weight and rigidity is higher, and can use the advantage of cheap tubular part.In addition,, for example in heating furnace, relatively realize hi-heat part in the total length in the part of above-mentioned a pair of tubular part, i.e. the heating part that is undertaken by the emittance in the heating furnace is under the situation about being made of transparent quartz tube, then more cheap.
In addition, the application the 3rd aspect in because aforementioned the 1st beam, it is the fixed beam that is provided with by stationkeeping ground with respect to aforementioned heating furnace, aforementioned the 2nd beam be the movable beam that can be provided with respect to aforementioned heating furnace, so the beam driver train of step-by-step heat treating apparatus becomes simple with relatively moving.
In addition, the application the 4th aspect in, because in order below it, to support aforesaid base plate, the side-prominent a plurality of supporting projections that make progress are set at least one side of aforementioned the 1st beam and the 2nd beam, therefore can be below the small size supporting substrate via supporting projections, thereby tail off with the interference of the following electrode pattern that is located at substrate etc., can prevent well simultaneously by in furnace run with the generation of the contact trace (shade) that contacts the substrate that causes and produce of support component.
In addition, the application the 5th aspect in, because in order on throughput direction, aforesaid base plate to be located, on at least one side of aforementioned the 1st beam and the 2nd beam, be provided be provided with the leading edge that can be fastened on this substrate and the interval on the trailing edge and the closer to front end more to away from a pair of throughput direction guide projections of the direction bevelled of this substrate, therefore the mutual alignment on the mutual throughput direction of substrate is fixed, and can prevent the skew on the throughput direction of substrate, mutual interference well.
In addition, the application the 6th aspect in, owing to be positioned at the beam in the outside at aforementioned the 1st beam that is used for conveying substrate collaboratively and the 2nd beam, possess with the closer to the outside just the mode the closer to upside tilt, guide the lateral steering projection of the lateral margin of aforesaid base plate, the substrate in therefore can preventing from well to carry is with respect to throughput direction coming off to side (laterally) out-of-position situation, substrate.
In addition, the application the 7th aspect in, because aforementioned heating furnace, possess be configured in above the aforesaid base plate carried and below separate locational a plurality of near infrared rays radiation bodies of predetermined distance, therefore see through aforementioned crystalline ceramics by near infrared ray from this near infrared ray radiation body radiation, equably heated substrates top and below.In addition, owing to come from the back side that the near infrared radiation energy of near infrared ray radiation body can arrive substrate by transparent pottery, therefore heated substrates apace.
In addition, the application the 8th aspect in, because aforementioned heating furnace, possess a plurality of heating chambers of cutting apart by from outstanding next door, the top of furnace wall downwards, with the freeing pipe on the part on the top of this heating chamber of formation that is connected aforementioned furnace wall, therefore can suppress to be trapped in situation between near infrared ray radiation body and the substrate, and can improve the efficiency of heating surface by the waste gas that the lip-deep membrane material that is coated on substrate produces.
In addition, the application the 9th aspect in, owing in aforementioned heating chamber, dispose preheating pipe on the side of the downside of substrate conveying and upside, in this heating chamber, provide by the air supply pipe of the fore-warming gas of this preheating pipe disposing on the opposing party, therefore have by fore-warming gas is provided in heating chamber, can remove the advantage of the waste gas that produces by the lip-deep membrane material that is coated on substrate more quickly.In addition, the application the 10th aspect in, because the furnace wall of aforementioned heating furnace is made of the ceramic beaverboard that ceramic-fibre is configured as thick plate-like, in the surface of this ceramic beaverboard, implemented the silicon dioxide type coating on the internal face side at least, therefore have the generation of the dust that can prevent to come from ceramic beaverboard, and can improve the advantage of cleanliness level.
Description of drawings
Fig. 1 is the elevation cross-sectional view of showing the step-by-step heat treating apparatus of one embodiment of the present of invention.
Fig. 2 is in the embodiment in figure 1, is used to amplify the figure of mechanism of entrance side that explanation is used for the feedway of conveying substrate.
Fig. 3 is in the embodiment in figure 1, is used to amplify the figure of mechanism of outlet side that explanation is used for the feedway of conveying substrate.
Fig. 4 is in the embodiment in figure 1, is used to amplify the figure of mechanism of entrance side that explanation is used for the feedway of conveying substrate, is the IV-IV pseudosection of seeing Fig. 1 of outlet side from entrance side.
Fig. 5 is the section-drawing that is used to show the process of fixed beam and movable beam conveying substrate, is to show that movable beam is positioned at the figure of the state of lowering position.
Fig. 6 is the section-drawing that is used to show the process of fixed beam and movable beam conveying substrate, is to show that movable beam is positioned at the figure of the state of hoisting position.
Fig. 7 is the figure that explanation is located at the relation of throughput direction guide projections on the movable beam and substrate.
Fig. 8 is the VIII-VIII pseudosection that amplifies the formation in the body of heater of embodiment of instruction diagram 1.
Fig. 9 is in the embodiment in figure 1, and the figure of the radiation heating state of substrate is described.
Figure 10 is in annealing device in the past, and the figure of the radiation heating state of substrate is described.
Figure 11 is in the embodiment in figure 1, for the heating rapidly of display base plate, shows the figure of the temperature traverse of this substrate.
Figure 12 is the substrate of showing Figure 11 when being solar battery cell, furnace run temperature and time and is subjected to this furnace run temperature and the figure of the relation of the power generation performance (generating efficiency) of the influence of time and deterioration.
Figure 13 be show of the present invention other the fixed beam of embodiment and the section-drawing of movable beam.
Figure 14 be show of the present invention other the fixed beam of embodiment and the section-drawing of movable beam.
Figure 15 be show of the present invention other the fixed beam of embodiment and the section-drawing of movable beam.
Figure 16 be show of the present invention other the fixed beam of embodiment and the section-drawing of movable beam.
Figure 17 be show of the present invention other the fixed beam of embodiment and the section-drawing of movable beam.
Figure 18 be show of the present invention other the fixed beam of embodiment and the section-drawing of movable beam.
Figure 19 be show of the present invention other the fixed beam of embodiment and the section-drawing of movable beam.
Label declaration
10 step-by-step heat treating apparatus, 16 substrates
20 fixed beams (the 1st beam), 22 movable beam (the 2nd beam)
74 lateral steering projections, 76 throughput direction guide projections
78 halogen heaters (near infrared ray radiation body, calandria)
88 next doors, 90 heating chambers
94 supporting projections
The specific embodiment
At this, preferably, in the transparent pottery of at least a portion in constituting the 1st beam and/or the 2nd beam, so-called transparent, be meant the emittance that can help to come from calandria below this transparent pottery back arrival substrate, the transmitance of the degree that realize the even heating of this substrate, heats rapidly.For example, when near infrared calandria is sent in use, mean and to realize the transparency that the even heating of substrate, the degree that heats rapidly see through can help this near infrared ray to arrive the following of substrate, therefore in for example being not used in other the visible light of wavelength of heating, even if gonorrhoea (opaque) is also out of question.Since be that benchmark determines from the radiation wavelength of the calandria that is used for the radiation heating substrate.
In addition, preferably be used for the calandria of radiation heating aforesaid base plate, be not limited near infrared ray, need only the radiant rays that emitting far infrared ray, visible rays etc. can carry out the wavelength of radiation heating.
In addition, preferably, in aforementioned transparent pottery, so-called pottery, be the solid material of the non-metal inanimate matter made through bakingout process, comprise with silicate mineral or various metallic oxide, non-oxidized substance be raw material new ceramics such as pyroceram, for example aluminium oxide, titanium dioxide, the crystallization quartz of gonorrhoea under the visible light, under visible light transparent quartz etc.
As above-mentioned transparent pottery, for example, be see through 5 μ m or it is following, be preferably 4 μ m or it is following, more preferably 3 μ m or its following wavelength near infrared ray to visual light wavelength, and preferably see through 50% or it is above, more preferably see through 70% or its above oxide, under common differentiation, be the oxide more transparent in visible light zone, for example have 60% or it is above, preferred 80% or its above oxide that sees through characteristic.As these oxides, for example, preferably transparent fused silica glass, be the SiO of representative with " vycor glass " (trade name) No.7900, the No.7940 of コ-ニ Application グ company
2800 ℃ of following fracture resistence force 300kg/cm such as amount 95% or its above high silicate glasses, transparent alumina
2Or its above material, can also be the transparent fused quartz that obtains easily, roughness of surface is good.
In addition, the 1st beam of best aforementioned step wise heat treatment furnace and the 2nd beam both can be a side is fixing and form that the opposing party is moved also can be the form that makes two sides mobile.In the form that two sides are moved, if the rising end of the mobile stroke of above-below direction is made as sustained height, and holds in this risings and to carry out the handing-over of substrate, the upper limit that has then suppressed substrate moves, thereby more satisfactory.
In addition, constitute the tubular part of aforementioned the 1st beam and/or the 2nd beam, section circle just not both can be polygons such as oval or oval, triangle, quadrangle or rectangle, also can be the inverted T-shape shape.In addition, aforementioned the 1st beam and/or the 2nd beam are not the tubular part of hollow, can be by solid strip component set-up yet.
In addition, the part of so-called aforementioned the 1st beam and/or the 2nd beam or tubular part, expression be in its total length, in heating furnace, relatively to become hi-heat part by radiation heating, perhaps, carry out the part of set point of temperature or its above furnace run by the radiation heating of the emittance in heating furnace.In a side or two sides of the 1st beam and the 2nd beam, for example needing only in its total length relatively becomes hi-heat part by radiation heating in heating furnace, is made of transparent pottery to get final product.In addition, even if having only the 1st beam or the 2nd beam to constitute, also can obtain same effect by transparent pottery.
In addition, best aforementioned calandria uses the near infrared halogen heater of main radiation, but also can be that radiation comprises its wavelength or wavelength in addition, for example calandria of far-infrared rays, visible light.
(embodiment)
Below, explain one embodiment of the present of invention with reference to accompanying drawing.Moreover, in following embodiment, in the scope of the purpose that the concrete example of inventing is described, will scheme suitably to oversimplify or distortion not necessarily descriptions correctly such as the size ratio of each one and shape.
Fig. 1 is a lateral plan of showing the step-by-step heat treating apparatus 10 of one embodiment of the present of invention.In Fig. 1, step-by-step heat treating apparatus 10, possess by framework (machine frame) 12 and be fixed on the tunnel-shaped heating furnace 14 of specified height position and in this heating furnace 14, pass and be used for from the entrance side of heating furnace 14 to the outlet side feedway 18 of conveying substrate 16 in turn.Substrate 16 for example is to be used to constitute semiconductor substrates such as the monocrystalline of solar cell or polysilicon chip, is rectangle, for example is 150 to 200mm square.Substrate 16 for example burns till set and makes electrode layer in order to be printed on membrane materials such as electrode paste on its surface and the back side by heat treatment, heat-treats.
Said fixing beam 20 and movable beam 22, for the following radiant rays that is used in heated substrates 16 sees through, its total length is made of transparent quartz tube.But also only the part that the radiation heating of substrate 16 is required is made as transparent quartz tube, and constituting with metal pipe materials such as corrosion-resistant steels other.In short, can have only the part longitudinally in this fixed beam 20 and the movable beam 22 exactly, for example in heating furnace 14, be subjected to the part of radiation heating, promptly be positioned at this body of heater and be subjected to the part of 400 degree or its above radiation heating, constitute by transparent quartz tube.
Fig. 2, Fig. 3 and Fig. 4 are the figure that wants portion that at length shows feedway 18, and Fig. 2 is the side-looking longitudinal diagram of entrance side, and Fig. 3 is the side-looking longitudinal diagram of outlet side part, and Fig. 4 is the drawing in side sectional elevation of entrance side part.
Aforementioned feedway 18 possesses: at the entrance side and the outlet side of heating furnace 14, by possessing many (being 4 in the present embodiment) guide bars 26 that a plurality of (being 4 in the present embodiment) guide bushings 24 of being installed on the framework 12 is guided along the vertical direction, thereby be set to distinguish the entrance side lifter plate 28 and the outlet side lifter plate 30 of lifting; By being located at entrance side guide rail 32 on these entrance side lifter plates 28 and the outlet side lifter plate 30 and outlet side guide rail 34 respectively by respectively along heating furnace 14 vertically be substrate 16 throughput direction (furnace superintendent direction) guiding, support the entrance side movable member 36 and the outlet side movable member 38 at the both ends of movable beam 22; Be fixed on via cam up and down 48 and front and back cam 50 on the camshaft 46 that is driven by motor 44 rotations of band reductor with 42 synchronously; Thereby by set firmly with the cam follower 52 that contact as the camming surface of the outer peripheral face of cam 48 up and down along with this lever 54 about entrance side of back and forth rotating of cam curve of cam 48 up and down; For be transmitted into oral-lateral up and down lever 54 up-and-down movement and with this entrance side connecting rod 56 of linking up of lever 54 and entrance side lifter plate 28 up and down; The outlet side that links together with outlet side lifter plate 30 via connecting rod 58 is lever 60 up and down; For to this up and down lever 60 be transmitted into oral-lateral up and down lever 54 rotational motion, be attached at the entrance side turning cylinder of lever 54 and outlet side the 1st connecting rod the 62, the 2nd connecting rod 64 and the 3rd connecting rod 66 between the turning cylinder of lever 60 up and down up and down; The front and back lever 70 that back and forth rotates along with the cam curve of this front and back cam 50 by setting firmly the cam follower 68 that contacts with camming surface as the outer peripheral face of aforementioned front and back cam 50; With the connecting rod 72 that will this front and back lever 70 for the motion of the fore-and-aft direction of lever 70 before and after transmitting be connected with entrance side movable member 36.
In above-mentioned feedway 18, from the motor 44 of band reductor to the part number of camshaft 46, have only and be with 42 synchronously, reduce as far as possible, in order to drive outlet side lever 60 up and down, with entrance side the 1st connecting rod 62 that rotates simultaneously of lever 54 up and down, the 3rd connecting rod 66 that rotates simultaneously with lever up and down 60 with outlet side, the 2nd connecting rod 64 by the strip also longer than the total length of body of heater 80 links, because the entrance side rotation of lever 54 up and down is directly passed to outlet side lever 60 up and down, therefore with use gear case, the situation that has changed the axial outlet side transmission of drive force of rotation direction is thus compared, and prevents from preferably to shake on movable beam 22, vibration.
As Fig. 5 and shown in Figure 6, in the present embodiment,, between a pair of fixed beam 20, dispose a pair of movable beam 22, just substrate 16 is supported by this a pair of fixed beam 20 or a pair of movable beam 22 in order to carry common substrate 16 collaboratively.The center axle base of a pair of fixed beam 20 is set at and equates with the horizontal size (limit) of substrate 16 or below it, the center axle base of a pair of movable beam 22 be set at a pair of fixed beam 20 the center axle base about 1/3.And, in the present embodiment, horizontal position for the substrate 16 in keeping carrying, on above-mentioned a pair of fixed beam 20, with the interval that has at least 1 can be fastened on the lateral margin of substrate 16, along the vertically prominent lateral steering projection 74 of establishing a plurality of pin shapes of substrate 16, the lateral steering projection 74 of this pin shape is to tilt by last mode more more in the outer part.Above-mentioned lateral steering projection 74, being provided with in couples on a pair of fixed beam 20 in the mode that increases more with the space transversely of throughput direction quadrature the closer to front end, the space of cardinal extremity is set at and equates with the horizontal size (limit) of aforesaid substrate 16 or more than it.Moreover above-mentioned lateral steering projection 74 and throughput direction guide projections 76 are omitted in Fig. 1 to Fig. 3.
In addition, as shown in Figure 7, in the present embodiment, space for the throughput direction (furnace superintendent direction) of the substrate 16 in keeping carrying, on a pair of movable beam 22, equating with the size (limit) of front and back (conveying) direction of substrate 16 or interval more than it, establish a plurality of throughput direction guide projections 76 with the double-type pin shape of mode bevelled big more the closer to the front end space along movable beam 22 vertically prominent.A pair of throughput direction guide projections 76 and another are set at the little size that manys of size than front and back (conveying) direction of substrate 16 to throughput direction guide projections 76.Promptly, above-mentioned a pair of throughput direction guide projections 76, in order on throughput direction, substrate 16 to be located, be provided with the leading edge and the interval on the trailing edge that can be fastened on this substrate 16, and to be provided with to the direction bevelled mode of leaving from this substrate 16 more the closer to front end.
In the feedway 18 that constitutes by this way, when by motor 44 rotating drive of band reductor up and down when cam 48 and front and back cam 50, entrance side up and down lever 54 and outlet side up and down lever 60 synchronously back and forth rotate along with the curve of the camming surface of cam 48 up and down, and when the entrance side lifter plate 28 that is attached thereto knot and outlet side lifter plate 30 during simultaneously by lifting, the movable beam 22 that both ends are supported indirectly by these entrance side lifter plates 28 and outlet side lifter plate 30 is by dipping and heaving.Simultaneously, before and after lever 70 back and forth rotate along with the curve of the camming surface of front and back cam 50, the outlet side movable member 38 of the other end of be attached thereto the entrance side movable member 36 of knot and movable beam 22 that an end is supported by its, supporting this movable beam is along furnace superintendent (front and back) direction crank motion.Reciprocating combination by these dipping and heaving and furnace superintendent direction, in turn and carry out upward movement, forward movement, descending motion, the setback of movable beam 22 repeatedly, therefore movable beam 22 is taken over the substrate 16 that is supported on the fixed beam 20 and is forwards moved repeatedly with the regulation stroke, by the cooperation of fixed beam 20 and movable beam 22, substrate 16 is carried to the outlet of heating furnace 14 in turn.
Fig. 5 is to make movable beam 22 with respect to the state that fixed beam 20 descends, and movable beam 22 is retreated in this last transition.Fig. 6 is to make movable beam 22 with respect to the state that fixed beam 20 rises, and makes movable beam 22 preceding and then conveying substrate 16 in this first transition.As shown in Figure 5, when substrate 16 and movable beam 22 are descended simultaneously, at substrate 16 under the out-of-position situation of side, the lateral margin of substrate 16 is fastened on the lateral steering projection 74, by the guide function that produces by the inclination of this lateral steering projection 74, along with decline turns back to the center side position, just prevented coming off of substrate 16.In addition, Fig. 7 is the state that movable beam 22 is risen, and has showed by fixed beam 20 substrate supported 16 to be transferred direction guiding projection 76 location, and has kept the state of space.
Get back to Fig. 1, aforementioned heating furnace 14 possesses: to form the body of heater 80 of rectangular-shaped heating space that be closed, rectangular and be connected the tunnel-shaped cooling mechanism 40 of the outlet side of this body of heater 80 in order cooling off apace from the substrate 16 that the outlet of this body of heater 80 is exported in turn except inlet and outlet and deflation hole 24.
As the bench section of Fig. 8 at length shown in, in above-mentioned body of heater 80, as the radiation near infrared bar-shaped calandria of wavelength about 1.80 μ m to 1.31 μ m for example, the halogen heater 78 of strip, separating up and down on the position of predetermined distance with substrate 16, set many side by side with state with the throughput direction quadrature, by these halogen heaters 78 along the vertical direction in the space of clamping, by movable beam 22 and fixed beam 20 conveying substrates 16, in this course of conveying, from the near infrared ray of halogen heater 78 radiation above substrate 16 and below irradiation, thereby with substrate 16 heating.In body of heater 80, because movable beam 22 and fixed beam 20 are made of transparent quartz tube, therefore the near infrared ray below the halogen heater 78 directive substrates 16 that are positioned at downside can be by movable beam 22 and fixed beam 20 shadings, see through to constitute their transparent quartz tube and arrive substrate 16 below, therefore can realize rapidly and uniform heating.
The furnace wall of body of heater 80, constitute by ceramic beaverboard, this ceramic beaverboard, owing to be thereby that impregnation by for example silica gel makes ceramic-fibre solidify the bulk that is configured as slab, so good adiabatic function and light weight have been implemented the silicon dioxide type coating at least on internal face in the surface of this ceramic beaverboard.Therefore, can not only obtain adiathermancy, can also prevent to come from the generation of the dust of ceramic beaverboard, and improve cleanliness level.
In addition, as shown in Figure 8, between the furnace wall of the halogen heater 78 of the conveying road of substrate 16 downside and downside, be provided with preheating pipe 82, simultaneously and the air supply pipe 84 that is connected in series of this preheating pipe 82, be located between the furnace wall of the halogen heater 78 of conveying road upside of the substrate 16 in the halogen heater 78 and upside.On above-mentioned air supply pipe 84, be provided with a plurality of squit holes 86, in the heating space of body of heater 80, provide with the squit hole 86 of preheating pipe 82 fore-warming gases from air supply pipe 84.In the present embodiment, owing to be the oxidisability atmosphere, so this supply gas is an air.But, if non-oxidizable atmosphere is just used unreactable gass such as nitrogen, if the reducibility atmosphere is just used hydrogen.
And, as shown in Figure 1, in heating furnace 14, the heating space that surrounds with body of heater 80, possesses the freeing pipe 92 on a plurality of (being 2 the present embodiment) heating chambers 90 cut apart by the next door 88 that is provided with in the mode of giving prominence to from its end face and give prominence to upward and the part that is connected the end face that constitutes this heating chamber 90 downwards from the bottom surface.Thus, when passing through furnace run, be coated in composition in the membrane material of table back of substrate 16 when body of heater 80 internal combustion, the tempered air that these burning gases provide with the squit hole 86 from air supply pipe 84 is promptly discharged by above-mentioned freeing pipe 92 in each heating chamber 90.
As above-mentioned, step-by-step heat treating apparatus 10 according to present embodiment, because fixed beam 20 and movable beam 22 are to be made of transparent quartz tube, therefore the emittance that comes from halogen heater (calandria) 78 can be by arriving the back side of substrate behind this transparent quartz tube, therefore compare with step-by-step heat treating apparatus in the past, just be heated to even temperature rapidly with the short time easily, shortened build up time or furnace run time.Its result has reduced the situation that heat treatment impacts for the characteristic of substrate as much as possible.
Fig. 9 has showed the radiation heating state of the substrate 16 of present embodiment, and Figure 10 has showed the radiation heating state of substrate in annealing device in the past.In the present embodiment, because being used for the fixed beam 20 and the movable beam 22 of the following and conveying substrate of supporting substrate 16 is to be made of transparent quartz tube, therefore shown in the arrow of the dotted line of Fig. 9, the emittance that comes from halogen heater (calandria) 78 can arrive the back side of substrate 16 by this transparent quartz tube, therefore can hastily substrate 16 be heated to uniform temperature.With respect to this, in the past, because fixed beam 20 and movable beam 22 be made of stainless steel and other metal materials, therefore shown in the arrow of the dotted line of Figure 10, the following emittance that arrives substrate 16 after beam 20 and movable beam 22 shadings that is fixed tails off, and the time that reaches uniform temperature is elongated.To showing that recently solid line is represented the temperature of the substrate 16 of present embodiment, the temperature of the substrate 16 of annealing device is in the past represented in the single-point line to Figure 11 with such temperature traverse.In the present embodiment, top (surface) of substrate 16 and the heal differential at following (back side) are less, and promptly reach uniform temperature, with respect to this, in the past, the temperature at following (back side) of substrate 16 rises slower, reach till the uniform temperature, expend time in.Therefore, to compare cost longer for the time till finishing to the processing time after reaching uniform temperature and present embodiment.When substrate 16 is solar battery cell, as shown in figure 12,,, can suitably prevent the deterioration of solar battery cell therefore according to the annealing device 10 of present embodiment because the furnace run time (exposure time) is got over long hair electrical property (generating efficiency) deterioration more.Attach and say one, experiment according to present inventor etc., if the temperature rise time of heat treatment temperature to about 800 degree is about 8 seconds, compare with the temperature rise time (about 20 seconds to 30 seconds) that annealing device in the past that fixed beam 20 and movable beam 22 are made of corrosion-resistant steel obtains, be its 1/2 to 1/3 or below it.
In addition, in the present embodiment, because fixed beam 20 and movable beam 22, constitute respectively by a pair of tubular part that is parallel to each other, therefore and this a pair of tubular part is to be made of transparent quartz tube, has light weight and rigidity is higher, and can use the advantage of cheap tubular part.
In addition, in the present embodiment, fixed beam 20 as the side in the beam of carrying common substrate 16 collaboratively, support by framework 12 is provided with by stationkeeping ground with respect to heating furnace 14, movable beam 22 as the opposing party can be provided with respect to heating furnace 14 with relatively moving, therefore be made as movable situation with beam with two sides and compare, the beam driver train of step-by-step heat treating apparatus 10 is simpler.
In addition, in the present embodiment, because on movable beam 22, be provided with a pair of throughput direction guide projections 76, this a pair of throughput direction guide projections 76, be on the throughput direction with substrate 16 location and with the leading edge that can be fastened on this substrate 16 and the interval on the trailing edge is provided with and with the closer to front end more to away from a pair of throughput direction guide projections 76 of the direction bevelled of this substrate 16, therefore the mutual alignment on the throughput direction of substrate 16 is fixed, and can prevent the skew on the throughput direction of substrate 16, mutual interference well.Moreover this throughput direction guide projections 76 both can be located on the fixed beam 20, also can be located on two sides.
In addition, in the present embodiment, carry collaboratively in the fixed beam 20 and movable beam 22 of common substrate 16, on the fixed beam 20 that is positioned at the outside, possess so that the mode the closer to upside tilts, guides the lateral steering projection 74 of the lateral margin of aforesaid base plate the closer to the outside, the substrate 16 in therefore can preventing from well to carry is with respect to throughput direction coming off to side (laterally) out-of-position situation, substrate 16.
In addition, in the present embodiment, because heating furnace 14, possess be configured in above institute's substrate conveying 16 and below separate locational a plurality of halogen heaters (near infrared ray radiation body) 78 of predetermined distance, therefore see through fixed beam 20 and the movable beam 22 that constitutes by transparent quartz tube by near infrared ray from these halogen heater 78 radiation, can be with the top and following heating equably of substrate 16.In addition, owing to can arrive the back side of substrate 16 by transparent quartz tube from the near infrared radiation energy of halogen heater 78 radiation, therefore heated substrates 16 promptly.
In addition, according to present embodiment, because heating furnace 14, possess a plurality of heating chambers 90 of cutting apart by from outstanding next door 88, the top of furnace wall downwards, with the freeing pipe 92 on the part that is connected the top that constitutes heating chamber 90 in the furnace wall, therefore can suppress to be trapped between halogen heater 78 and the substrate 16, and can improve the efficiency of heating surface from the waste gas that the lip-deep membrane material that is coated on substrate 16 produces.
In addition, according to present embodiment, because the furnace wall of heating furnace 14 is by containing silica gel and form high adiathermancy and the weight-saving ceramic beaverboard that shape is a thick plate-like and constitute by ceramic-fibre being soaked, and implemented the silicon dioxide type coating in the internal face side at least in the surface of this ceramic beaverboard, therefore have the generation of the dust that can prevent to come from ceramic beaverboard, and improve the advantage of cleanliness level.
Secondly, other embodiment of the present invention is described.Moreover, in the following description, to being marked with same label and omitting explanation with the common part of aforesaid embodiment.
Figure 13 to Figure 19 has showed movable beam 22 and fixed beam 20 among other the embodiment of the present invention.In the embodiment of Figure 13, on movable beam 22 and fixed beam 20, any projection is not set, substrate 16 is directly supported by movable beam 22 and fixed beam 20.
In the embodiment of Figure 14, being positioned on the inboard a pair of movable beam 22 in movable beam 22 of carrying common substrate 16 collaboratively and fixed beam 20 for supporting substrate below it, is provided with the side-prominent a plurality of supporting projections 94 that make progress.In the present embodiment, since via supporting projections 94 below minimum area supporting substrate 16, therefore the interference with the following electrode pattern that is located at substrate 16 etc. tails off, and can prevent the generation of the contact trace (shade) that produces on substrate 16 owing to cause with contacting of support component in furnace run simultaneously well.Above-mentioned supporting projections 94 is with the interval than the size much shorter of the furnace superintendent direction of substrate 16, for example than 1/2 also short interval assortment.
In the embodiment of Figure 15, being positioned on the inboard a pair of movable beam 22 in movable beam 22 of carrying common substrate 16 collaboratively and fixed beam 20, for supporting substrate below it, be provided with the side-prominent a plurality of supporting projections 94 that make progress, and to make this supporting projections 94 be that fixed beam 20 inclinations are oblique laterally.In the embodiment of Figure 16, on a pair of movable beam 22, be provided with a plurality of supporting projections 94 of bevelled as shown in Figure 15, and then, on a pair of fixed beam 20, similarly also be provided with bevelled supporting projections 94 laterally.In the embodiment of Figure 17, making the supporting projections 94 on the movable beam 22 that is located at Figure 16 is that movable beam 22 inclinations are oblique to the inside.According to the embodiment of Figure 15, because supporting projections 94 is to the side bevelled, therefore can be not set with the mode of the following interference such as electrode pattern that are provided in substrate.In the embodiment of Figure 16 and Figure 17, owing on fixed beam 20, also be provided with supporting projections 94, therefore the interference with the following electrode pattern that is located at substrate 16 etc. becomes still less, can prevent the generation of the contact trace (shade) that produces on substrate 16 by causing with contacting of support component in furnace run simultaneously better.
In the embodiment of Figure 18, on a pair of movable beam 22, be provided with the make progress side-prominent a plurality of supporting projections 94 same, simultaneously on fixed beam 20, from being provided with aforementioned lateral guide projections 74 with Figure 14 with making progress side-prominent supporting projections 94 branches.In the embodiment of Figure 19, making the supporting projections 94 on the fixed beam 20 that is located at Figure 18 is that movable beam 22 inclinations are oblique to the inside.According to the embodiment of Figure 18 and Figure 19, except the effect of the embodiment of Figure 16 and Figure 17, has the horizontal out-of-position advantage that to revise substrate 16.In addition, because lateral steering projection 74,94 branches come out from supporting projections, and the mounting structure with respect to beam that therefore has supporting projections and lateral steering projection 74 is this common advantage.
More than, understand the present invention in detail with reference to accompanying drawing, but the present invention can implement also with other sample attitude, be in the scope that does not break away from its aim, can add various changes.
Claims (10)
1. step-by-step heat treating apparatus, it be possess the furnace superintendent direction that hockets relatively move and the 1st beam that relatively moves and the 2nd beam of above-below direction and having is used for the heating furnace of the calandria of the substrate that the cooperation of radiation heating by the 1st beam and the 2nd beam be transferred, utilize the handing-over between the 1st beam and the 2nd beam to carry the step-by-step heat treating apparatus of aforesaid base plate, it is characterized in that by aforementioned heating furnace:
At least a portion in aforementioned the 1st beam and/or the 2nd beam is made of transparent pottery.
2. step wise heating arrangement as claimed in claim 1, wherein, aforementioned the 1st beam and/or the 2nd beam are made of respectively a pair of tubular part that is parallel to each other;
This a pair of tubular part vertically in, at least a portion is to be made of transparent quartz tube.
3. step-by-step heat treating apparatus as claimed in claim 1 or 2, wherein, aforementioned the 1st beam is the fixed beam that is provided with by stationkeeping ground with respect to aforementioned heating furnace;
Aforementioned the 2nd beam is the movable beam that can be provided with respect to aforementioned heating furnace with relatively moving.
4. step-by-step heat treating apparatus as claimed in claim 1 or 2 wherein, for from following support aforesaid base plate, is provided with the side-prominent a plurality of supporting projections that make progress at least one side of aforementioned the 1st beam and the 2nd beam.
5. step-by-step heat treating apparatus as claimed in claim 1 or 2, wherein, in order on throughput direction, aforesaid base plate to be located, on at least one side of aforementioned the 1st beam and the 2nd beam, be provided with the leading edge that can be fastened on this substrate and the interval on the trailing edge be provided with and the closer to front end more to away from a pair of throughput direction guide projections of the direction bevelled of this substrate.
6. step-by-step heat treating apparatus as claimed in claim 1 or 2, wherein, at the beam that is positioned at the outside of aforementioned the 1st beam that is used for conveying substrate collaboratively and the 2nd beam, possess with the closer to the outside just the mode the closer to upside tilt, guide the lateral steering projection of the lateral margin of aforesaid base plate.
7. step-by-step heat treating apparatus as claimed in claim 1 or 2, wherein, aforementioned heating furnace, possess be configured in apart from the top of the aforesaid base plate carried and below leave locational a plurality of near infrared rays radiation bodies of predetermined distance.
8. step-by-step heat treating apparatus as claimed in claim 7, wherein, aforementioned heating furnace possesses by the freeing pipe on the part of the roof of a plurality of heating chambers that are partitioned into from the outstanding downwards next door of the end face of furnace wall and this heating chamber of formation of being connected aforementioned furnace wall.
9. step-by-step heat treating apparatus as claimed in claim 8, wherein, in aforementioned heating chamber, dispose preheating pipe on the side of the downside of substrate conveying and upside, provide by the air supply pipe of the fore-warming gas of this preheating pipe disposing on the opposing party in this heating chamber.
10. step-by-step heat treating apparatus as claimed in claim 1 or 2, wherein, the furnace wall of aforementioned heating furnace is made of the ceramic beaverboard that ceramic-fibre is configured as thick plate-like, is provided with silica dioxide coating on the internal face of this ceramic beaverboard.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005023461A JP4335825B2 (en) | 2005-01-31 | 2005-01-31 | Walking beam heat treatment equipment |
| JP023461/2005 | 2005-01-31 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1815119A CN1815119A (en) | 2006-08-09 |
| CN100519369C true CN100519369C (en) | 2009-07-29 |
Family
ID=36907421
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CNB2006100030500A Expired - Fee Related CN100519369C (en) | 2005-01-31 | 2006-01-26 | Step forward heat treatment device |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP4335825B2 (en) |
| CN (1) | CN100519369C (en) |
| TW (1) | TWI445088B (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI492329B (en) * | 2012-06-19 | 2015-07-11 | Screen Holdings Co Ltd | Heat treatment apparatus and heat treatment method |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4738372B2 (en) | 2007-04-03 | 2011-08-03 | 株式会社ノリタケカンパニーリミテド | Walking beam heat treatment equipment |
| JP5567869B2 (en) * | 2010-03-19 | 2014-08-06 | 光洋サーモシステム株式会社 | Continuous heat treatment equipment |
| CN102851462B (en) * | 2012-08-14 | 2013-09-04 | 苏州汇科机电设备有限公司 | Heat treatment furnace |
| CN103173823B (en) * | 2013-04-09 | 2015-09-30 | 上海华力微电子有限公司 | A kind of anneal chamber be applied in copper electroplating machine |
| CN105684133B (en) * | 2013-11-06 | 2020-05-15 | 应用材料公司 | Sol-gel coated support ring |
| CN106697804B (en) * | 2016-11-23 | 2019-02-12 | 重庆市大足区其林机械制造厂 | Step-by-step movement transmission device |
| CN106766879A (en) * | 2016-12-25 | 2017-05-31 | 淄博焱德窑炉设备技术有限公司 | Powder shakes kiln |
| CN108584295B (en) * | 2018-05-23 | 2023-07-14 | 苏州优王电子科技有限公司 | Energy-saving noise-reducing circulation transmission device |
| CN108981395B (en) * | 2018-06-12 | 2020-02-07 | 京东方科技集团股份有限公司 | Furnace body package assembly and equipment for heat treatment |
| CN111689147A (en) * | 2020-05-21 | 2020-09-22 | 陈善兰 | Distribution line for mounting single-side colloidal particles of electric heating pipe |
-
2005
- 2005-01-31 JP JP2005023461A patent/JP4335825B2/en not_active Expired - Fee Related
- 2005-12-23 TW TW94146138A patent/TWI445088B/en not_active IP Right Cessation
-
2006
- 2006-01-26 CN CNB2006100030500A patent/CN100519369C/en not_active Expired - Fee Related
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI492329B (en) * | 2012-06-19 | 2015-07-11 | Screen Holdings Co Ltd | Heat treatment apparatus and heat treatment method |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2006206299A (en) | 2006-08-10 |
| JP4335825B2 (en) | 2009-09-30 |
| TWI445088B (en) | 2014-07-11 |
| TW200633070A (en) | 2006-09-16 |
| CN1815119A (en) | 2006-08-09 |
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