JP2006245157A5 - - Google Patents

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Publication number
JP2006245157A5
JP2006245157A5 JP2005056815A JP2005056815A JP2006245157A5 JP 2006245157 A5 JP2006245157 A5 JP 2006245157A5 JP 2005056815 A JP2005056815 A JP 2005056815A JP 2005056815 A JP2005056815 A JP 2005056815A JP 2006245157 A5 JP2006245157 A5 JP 2006245157A5
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JP
Japan
Prior art keywords
exposure
exposed
optical system
liquid
light
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005056815A
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English (en)
Japanese (ja)
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JP2006245157A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2005056815A priority Critical patent/JP2006245157A/ja
Priority claimed from JP2005056815A external-priority patent/JP2006245157A/ja
Priority to US11/365,491 priority patent/US20060197930A1/en
Publication of JP2006245157A publication Critical patent/JP2006245157A/ja
Publication of JP2006245157A5 publication Critical patent/JP2006245157A5/ja
Withdrawn legal-status Critical Current

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JP2005056815A 2005-03-02 2005-03-02 露光方法及び露光装置 Withdrawn JP2006245157A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005056815A JP2006245157A (ja) 2005-03-02 2005-03-02 露光方法及び露光装置
US11/365,491 US20060197930A1 (en) 2005-03-02 2006-03-02 Exposure method and apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005056815A JP2006245157A (ja) 2005-03-02 2005-03-02 露光方法及び露光装置

Publications (2)

Publication Number Publication Date
JP2006245157A JP2006245157A (ja) 2006-09-14
JP2006245157A5 true JP2006245157A5 (https=) 2008-04-17

Family

ID=36943797

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005056815A Withdrawn JP2006245157A (ja) 2005-03-02 2005-03-02 露光方法及び露光装置

Country Status (2)

Country Link
US (1) US20060197930A1 (https=)
JP (1) JP2006245157A (https=)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10257766A1 (de) * 2002-12-10 2004-07-15 Carl Zeiss Smt Ag Verfahren zur Einstellung einer gewünschten optischen Eigenschaft eines Projektionsobjektivs sowie mikrolithografische Projektionsbelichtungsanlage
WO2004107417A1 (ja) 2003-05-28 2004-12-09 Nikon Corporation 露光方法及び露光装置、並びにデバイス製造方法
EP1780773A4 (en) * 2004-07-12 2008-03-05 Nikon Corp METHOD FOR DETERMINING EXPOSURE CONDITIONS, EXPOSURE METHOD, EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD
JP2006245270A (ja) * 2005-03-03 2006-09-14 Canon Inc 露光装置及び露光方法
US7995185B2 (en) * 2006-12-07 2011-08-09 Asml Holding N.V. Systems and methods for thermally-induced aberration correction in immersion lithography
DE102007025340B4 (de) * 2007-05-31 2019-12-05 Globalfoundries Inc. Immersionslithograpieprozess unter Anwendung einer variablen Abtastgeschwindigkeit und Lithographiesystem
US8001495B2 (en) * 2008-04-17 2011-08-16 International Business Machines Corporation System and method of predicting problematic areas for lithography in a circuit design
DE102008042356A1 (de) 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projektionsbelichtungsanlage mit optimierter Justagemöglichkeit
EP2221669A3 (en) * 2009-02-19 2011-02-09 ASML Netherlands B.V. A lithographic apparatus, a method of controlling the apparatus and a device manufacturing method
EP2264529A3 (en) * 2009-06-16 2011-02-09 ASML Netherlands B.V. A lithographic apparatus, a method of controlling the apparatus and a method of manufacturing a device using a lithographic apparatus
TWI520839B (zh) * 2010-07-20 2016-02-11 國立成功大學 可撓性光學板的製造方法、其方法製成的可撓性光學板，及背光模組
JP6216460B2 (ja) * 2013-08-30 2017-10-18 エーエスエムエル ネザーランズ ビー．ブイ． 液浸リソグラフィ装置

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4383757A (en) * 1979-04-02 1983-05-17 Optimetrix Corporation Optical focusing system
JP2748127B2 (ja) * 1988-09-02 1998-05-06 キヤノン株式会社 ウエハ保持方法
DE68921687T2 (de) * 1988-09-02 1995-08-03 Canon K.K., Tokio/Tokyo Belichtungseinrichtung.
JPH0276212A (ja) * 1988-09-13 1990-03-15 Canon Inc 多重露光方法
JP2731950B2 (ja) * 1989-07-13 1998-03-25 キヤノン株式会社 露光方法
US5231291A (en) * 1989-08-01 1993-07-27 Canon Kabushiki Kaisha Wafer table and exposure apparatus with the same
US5138643A (en) * 1989-10-02 1992-08-11 Canon Kabushiki Kaisha Exposure apparatus
US5841520A (en) * 1995-08-09 1998-11-24 Nikon Corporatioin Exposure apparatus and method that use mark patterns to determine image formation characteristics of the apparatus prior to exposure
SG103303A1 (en) * 2000-07-07 2004-04-29 Nikon Corp Exposure apparatus, surface position adjustment unit, mask, and device manufacturing method
JP2002198277A (ja) * 2000-12-22 2002-07-12 Canon Inc 補正装置、露光装置、デバイス製造方法及びデバイス

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