JP2006245147A5 - - Google Patents

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Publication number
JP2006245147A5
JP2006245147A5 JP2005056701A JP2005056701A JP2006245147A5 JP 2006245147 A5 JP2006245147 A5 JP 2006245147A5 JP 2005056701 A JP2005056701 A JP 2005056701A JP 2005056701 A JP2005056701 A JP 2005056701A JP 2006245147 A5 JP2006245147 A5 JP 2006245147A5
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JP
Japan
Prior art keywords
reflecting
reflecting surface
optical system
plane
projection optical
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2005056701A
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English (en)
Japanese (ja)
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JP2006245147A (ja
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Publication date
Application filed filed Critical
Priority to JP2005056701A priority Critical patent/JP2006245147A/ja
Priority claimed from JP2005056701A external-priority patent/JP2006245147A/ja
Priority to US11/365,046 priority patent/US7224441B2/en
Publication of JP2006245147A publication Critical patent/JP2006245147A/ja
Publication of JP2006245147A5 publication Critical patent/JP2006245147A5/ja
Withdrawn legal-status Critical Current

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JP2005056701A 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法 Withdrawn JP2006245147A (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2005056701A JP2006245147A (ja) 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法
US11/365,046 US7224441B2 (en) 2005-03-01 2006-02-28 Projection optical system, exposure apparatus, and device manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005056701A JP2006245147A (ja) 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法

Publications (2)

Publication Number Publication Date
JP2006245147A JP2006245147A (ja) 2006-09-14
JP2006245147A5 true JP2006245147A5 (enExample) 2008-04-17

Family

ID=37009953

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2005056701A Withdrawn JP2006245147A (ja) 2005-03-01 2005-03-01 投影光学系、露光装置及びデバイスの製造方法

Country Status (2)

Country Link
US (1) US7224441B2 (enExample)
JP (1) JP2006245147A (enExample)

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR100962911B1 (ko) 2005-09-13 2010-06-10 칼 짜이스 에스엠테 아게 마이크로리소그라피 투영 광학 시스템, 디바이스 제작 방법 및 광학 표면을 설계하기 위한 방법
EP1938150B1 (de) * 2005-10-18 2011-03-23 Carl Zeiss SMT GmbH Kollektor für beleuchtungssysteme mit einer wellenlänge </= 193 nm
DE102006014380A1 (de) * 2006-03-27 2007-10-11 Carl Zeiss Smt Ag Projektionsobjektiv und Projektionsbelichtungsanlage mit negativer Schnittweite der Eintrittspupille
JP5479890B2 (ja) 2006-04-07 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影光学システム、装置、及び製造方法
KR101656534B1 (ko) * 2008-03-20 2016-09-09 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 투영 대물렌즈
DE102008000800A1 (de) * 2008-03-20 2009-09-24 Carl Zeiss Smt Ag Projektionsobjektiv für die Mikrolithographie
WO2010052961A1 (ja) * 2008-11-10 2010-05-14 株式会社ニコン 結像光学系、露光装置、およびデバイス製造方法
JP5525550B2 (ja) 2009-03-06 2014-06-18 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ用の照明光学系及び光学系
JP5676856B2 (ja) * 2009-05-08 2015-02-25 キヤノン株式会社 補償光学系を備えた画像取得装置
US9007497B2 (en) * 2010-08-11 2015-04-14 Media Lario S.R.L. Three-mirror anastigmat with at least one non-rotationally symmetric mirror
CN102402135B (zh) 2011-12-07 2013-06-05 北京理工大学 一种极紫外光刻投影物镜设计方法

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6199991B1 (en) * 1997-11-13 2001-03-13 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6255661B1 (en) * 1998-05-06 2001-07-03 U.S. Philips Corporation Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
US6600552B2 (en) * 1999-02-15 2003-07-29 Carl-Zeiss Smt Ag Microlithography reduction objective and projection exposure apparatus
EP1035445B1 (de) * 1999-02-15 2007-01-31 Carl Zeiss SMT AG Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
US7151592B2 (en) * 1999-02-15 2006-12-19 Carl Zeiss Smt Ag Projection system for EUV lithography
US6033079A (en) * 1999-03-15 2000-03-07 Hudyma; Russell High numerical aperture ring field projection system for extreme ultraviolet lithography
EP1093021A3 (en) * 1999-10-15 2004-06-30 Nikon Corporation Projection optical system as well as equipment and methods making use of said system
JP2001185480A (ja) 1999-10-15 2001-07-06 Nikon Corp 投影光学系及び該光学系を備える投影露光装置
JP2003015040A (ja) 2001-07-04 2003-01-15 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004022722A (ja) 2002-06-14 2004-01-22 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004031808A (ja) 2002-06-27 2004-01-29 Nikon Corp 露光装置の投影光学系、該投影光学系を備えた露光装置及び該露光装置を用いた露光方法
JP2004138926A (ja) 2002-10-21 2004-05-13 Nikon Corp 投影光学系および該投影光学系を備えた露光装置
JP2004170869A (ja) 2002-11-22 2004-06-17 Nikon Corp 結像光学系、露光装置および露光方法
JP2004258178A (ja) 2003-02-25 2004-09-16 Nikon Corp 投影光学系および該投影光学系を備えた露光装置

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