JP2006237593A - 記憶装置および半導体装置 - Google Patents

記憶装置および半導体装置 Download PDF

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Publication number
JP2006237593A
JP2006237593A JP2006020105A JP2006020105A JP2006237593A JP 2006237593 A JP2006237593 A JP 2006237593A JP 2006020105 A JP2006020105 A JP 2006020105A JP 2006020105 A JP2006020105 A JP 2006020105A JP 2006237593 A JP2006237593 A JP 2006237593A
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Japan
Prior art keywords
conductive layer
memory
semiconductor device
layer
transistor
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Withdrawn
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JP2006020105A
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English (en)
Japanese (ja)
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JP2006237593A5 (enExample
Inventor
Mikio Yugawa
幹央 湯川
Hiroko Abe
寛子 安部
Shunpei Yamazaki
舜平 山崎
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Semiconductor Energy Laboratory Co Ltd
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Semiconductor Energy Laboratory Co Ltd
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Application filed by Semiconductor Energy Laboratory Co Ltd filed Critical Semiconductor Energy Laboratory Co Ltd
Priority to JP2006020105A priority Critical patent/JP2006237593A/ja
Publication of JP2006237593A publication Critical patent/JP2006237593A/ja
Publication of JP2006237593A5 publication Critical patent/JP2006237593A5/ja
Withdrawn legal-status Critical Current

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  • Read Only Memory (AREA)
  • Semiconductor Memories (AREA)
  • Thin Film Transistor (AREA)
  • Dram (AREA)
JP2006020105A 2005-01-31 2006-01-30 記憶装置および半導体装置 Withdrawn JP2006237593A (ja)

Priority Applications (1)

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JP2006020105A JP2006237593A (ja) 2005-01-31 2006-01-30 記憶装置および半導体装置

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2005024596 2005-01-31
JP2006020105A JP2006237593A (ja) 2005-01-31 2006-01-30 記憶装置および半導体装置

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JP2006237593A true JP2006237593A (ja) 2006-09-07
JP2006237593A5 JP2006237593A5 (enExample) 2009-01-29

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Cited By (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008103717A (ja) * 2006-10-18 2008-05-01 Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi P―n接合素子及びその製造方法、p−n接合素子を利用するトランジスタ
WO2008059940A1 (en) * 2006-11-17 2008-05-22 Semiconductor Energy Laboratory Co., Ltd. Memory element and method for manufacturing the same, and semiconductor device
JP2009016368A (ja) * 2007-06-29 2009-01-22 Ricoh Co Ltd メモリーデバイス
JP2010251630A (ja) * 2009-04-20 2010-11-04 Toppan Printing Co Ltd 情報記録素子及び情報記録装置並びにその製造方法
US8283724B2 (en) 2007-02-26 2012-10-09 Semiconductor Energy Laboratory Co., Ltd. Memory element and semiconductor device, and method for manufacturing the same
US8451651B2 (en) 2010-02-19 2013-05-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP2016507905A (ja) * 2013-02-19 2016-03-10 京東方科技集團股▲ふん▼有限公司 薄膜トランジスター及びその製作方法、表示装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0442960A (ja) * 1990-06-06 1992-02-13 Matsushita Electron Corp 半導体集積回路のプログラマブル素子
JP2001189431A (ja) * 1999-12-28 2001-07-10 Seiko Epson Corp メモリのセル構造及びメモリデバイス
JP2003068854A (ja) * 2001-08-23 2003-03-07 Seiko Epson Corp 配線間接続方法、配線間接続部材及びその製造方法
WO2004017436A2 (de) * 2002-07-26 2004-02-26 Infineon Technologies Ag Nichtflüchtiges speicherelement sowie zugehörige herstellungsverfahren und speicherelementanordnungen
JP2004509458A (ja) * 2000-09-13 2004-03-25 シーメンス アクチエンゲゼルシヤフト 有機データメモリ、有機データメモリによるidタグ(rfidタグ)、および有機データメモリの使用法
JP2004220591A (ja) * 2002-12-27 2004-08-05 Semiconductor Energy Lab Co Ltd カード及び前記カードを用いた記帳システム

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0442960A (ja) * 1990-06-06 1992-02-13 Matsushita Electron Corp 半導体集積回路のプログラマブル素子
JP2001189431A (ja) * 1999-12-28 2001-07-10 Seiko Epson Corp メモリのセル構造及びメモリデバイス
JP2004509458A (ja) * 2000-09-13 2004-03-25 シーメンス アクチエンゲゼルシヤフト 有機データメモリ、有機データメモリによるidタグ(rfidタグ)、および有機データメモリの使用法
JP2003068854A (ja) * 2001-08-23 2003-03-07 Seiko Epson Corp 配線間接続方法、配線間接続部材及びその製造方法
WO2004017436A2 (de) * 2002-07-26 2004-02-26 Infineon Technologies Ag Nichtflüchtiges speicherelement sowie zugehörige herstellungsverfahren und speicherelementanordnungen
JP2004220591A (ja) * 2002-12-27 2004-08-05 Semiconductor Energy Lab Co Ltd カード及び前記カードを用いた記帳システム

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008103717A (ja) * 2006-10-18 2008-05-01 Kofukin Seimitsu Kogyo (Shenzhen) Yugenkoshi P―n接合素子及びその製造方法、p−n接合素子を利用するトランジスタ
WO2008059940A1 (en) * 2006-11-17 2008-05-22 Semiconductor Energy Laboratory Co., Ltd. Memory element and method for manufacturing the same, and semiconductor device
JP2008182193A (ja) * 2006-11-17 2008-08-07 Semiconductor Energy Lab Co Ltd 記憶素子及びその作製方法、半導体装置
US8841642B2 (en) 2006-11-17 2014-09-23 Semiconductor Energy Laboratory Co., Ltd. Memory element and method for manufacturing the same, and semiconductor device
US8431997B2 (en) 2007-02-26 2013-04-30 Semiconductor Energy Laboratory Co., Ltd. Memory element and semiconductor device and method for manufacturing the same
US8283724B2 (en) 2007-02-26 2012-10-09 Semiconductor Energy Laboratory Co., Ltd. Memory element and semiconductor device, and method for manufacturing the same
US8753967B2 (en) 2007-02-26 2014-06-17 Semiconductor Energy Laboratory Co., Ltd. Memory element and semiconductor device, and method for manufacturing the same
JP2009016368A (ja) * 2007-06-29 2009-01-22 Ricoh Co Ltd メモリーデバイス
JP2010251630A (ja) * 2009-04-20 2010-11-04 Toppan Printing Co Ltd 情報記録素子及び情報記録装置並びにその製造方法
US8451651B2 (en) 2010-02-19 2013-05-28 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device
JP2022145763A (ja) * 2010-02-19 2022-10-04 株式会社半導体エネルギー研究所 半導体装置
JP7293470B2 (ja) 2010-02-19 2023-06-19 株式会社半導体エネルギー研究所 半導体装置
JP2016507905A (ja) * 2013-02-19 2016-03-10 京東方科技集團股▲ふん▼有限公司 薄膜トランジスター及びその製作方法、表示装置

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