JP2006186403A5 - - Google Patents
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- Publication number
- JP2006186403A5 JP2006186403A5 JP2006099577A JP2006099577A JP2006186403A5 JP 2006186403 A5 JP2006186403 A5 JP 2006186403A5 JP 2006099577 A JP2006099577 A JP 2006099577A JP 2006099577 A JP2006099577 A JP 2006099577A JP 2006186403 A5 JP2006186403 A5 JP 2006186403A5
- Authority
- JP
- Japan
- Prior art keywords
- region
- semiconductor substrate
- forming
- element active
- conductive film
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000004065 semiconductor Substances 0.000 claims 40
- 239000000758 substrate Substances 0.000 claims 31
- 238000009792 diffusion process Methods 0.000 claims 18
- 239000012535 impurity Substances 0.000 claims 10
- 238000002955 isolation Methods 0.000 claims 3
- 238000000034 method Methods 0.000 claims 3
- 239000000463 material Substances 0.000 claims 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 claims 2
- 239000003989 dielectric material Substances 0.000 claims 1
- 238000004519 manufacturing process Methods 0.000 claims 1
- 238000000059 patterning Methods 0.000 claims 1
- 229910052697 platinum Inorganic materials 0.000 claims 1
- 238000005498 polishing Methods 0.000 claims 1
- 150000003304 ruthenium compounds Chemical class 0.000 claims 1
- 150000003609 titanium compounds Chemical class 0.000 claims 1
- 150000003658 tungsten compounds Chemical class 0.000 claims 1
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006099577A JP4659662B2 (ja) | 1997-04-28 | 2006-03-31 | 半導体装置及びその製造方法 |
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP12494397 | 1997-04-28 | ||
JP20245297 | 1997-07-11 | ||
JP2006099577A JP4659662B2 (ja) | 1997-04-28 | 2006-03-31 | 半導体装置及びその製造方法 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10045692A Division JPH1187664A (ja) | 1997-04-28 | 1998-02-26 | 半導体装置及びその製造方法 |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2006186403A JP2006186403A (ja) | 2006-07-13 |
JP2006186403A5 true JP2006186403A5 (enrdf_load_stackoverflow) | 2006-08-24 |
JP4659662B2 JP4659662B2 (ja) | 2011-03-30 |
Family
ID=36739214
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2006099577A Expired - Fee Related JP4659662B2 (ja) | 1997-04-28 | 2006-03-31 | 半導体装置及びその製造方法 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP4659662B2 (enrdf_load_stackoverflow) |
Families Citing this family (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP5579577B2 (ja) * | 2010-11-09 | 2014-08-27 | ラピスセミコンダクタ株式会社 | 半導体装置の製造方法 |
US9847133B2 (en) | 2016-01-19 | 2017-12-19 | Ememory Technology Inc. | Memory array capable of performing byte erase operation |
US11177180B2 (en) * | 2020-02-11 | 2021-11-16 | Taiwan Semiconductor Manufacturing Co., Ltd. | Profile control of a gap fill structure |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS59155968A (ja) * | 1983-02-25 | 1984-09-05 | Toshiba Corp | 半導体記憶装置 |
JPS6079768A (ja) * | 1983-10-07 | 1985-05-07 | Hitachi Ltd | 半導体集積回路装置 |
JPS61281558A (ja) * | 1985-06-07 | 1986-12-11 | Toshiba Corp | Mos型半導体装置 |
JPH02125470A (ja) * | 1988-06-15 | 1990-05-14 | Seiko Instr Inc | 半導体不揮発性メモリ |
JPH03253072A (ja) * | 1990-03-02 | 1991-11-12 | Hitachi Ltd | 半導体装置 |
JPH05267619A (ja) * | 1992-01-23 | 1993-10-15 | Toshiba Corp | 半導体装置および半導体装置の製造方法 |
JP3344598B2 (ja) * | 1993-11-25 | 2002-11-11 | 株式会社デンソー | 半導体不揮発メモリ装置 |
JPH08130295A (ja) * | 1994-09-08 | 1996-05-21 | Mitsubishi Electric Corp | 半導体記憶装置および半導体装置 |
JPH08222710A (ja) * | 1995-02-17 | 1996-08-30 | Mitsubishi Electric Corp | 半導体装置 |
JPH08288379A (ja) * | 1995-02-17 | 1996-11-01 | Nippon Steel Corp | 半導体装置及びその製造方法 |
JPH0955483A (ja) * | 1995-06-09 | 1997-02-25 | Mitsubishi Electric Corp | 半導体記憶装置 |
JP4053647B2 (ja) * | 1997-02-27 | 2008-02-27 | 株式会社東芝 | 半導体記憶装置及びその製造方法 |
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2006
- 2006-03-31 JP JP2006099577A patent/JP4659662B2/ja not_active Expired - Fee Related