JP2006178447A5 - - Google Patents

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Publication number
JP2006178447A5
JP2006178447A5 JP2005353848A JP2005353848A JP2006178447A5 JP 2006178447 A5 JP2006178447 A5 JP 2006178447A5 JP 2005353848 A JP2005353848 A JP 2005353848A JP 2005353848 A JP2005353848 A JP 2005353848A JP 2006178447 A5 JP2006178447 A5 JP 2006178447A5
Authority
JP
Japan
Prior art keywords
micromirror
light
state
viewed
sides
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2005353848A
Other languages
English (en)
Japanese (ja)
Other versions
JP2006178447A (ja
Filing date
Publication date
Priority claimed from US09/631,536 external-priority patent/US6529310B1/en
Priority claimed from US09/732,445 external-priority patent/US6523961B2/en
Application filed filed Critical
Publication of JP2006178447A publication Critical patent/JP2006178447A/ja
Publication of JP2006178447A5 publication Critical patent/JP2006178447A5/ja
Abandoned legal-status Critical Current

Links

JP2005353848A 2000-08-03 2005-12-07 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム Abandoned JP2006178447A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US09/631,536 US6529310B1 (en) 1998-09-24 2000-08-03 Deflectable spatial light modulator having superimposed hinge and deflectable element
US22924600P 2000-08-30 2000-08-30
US09/732,445 US6523961B2 (en) 2000-08-30 2000-12-07 Projection system and mirror elements for improved contrast ratio in spatial light modulators

Related Parent Applications (1)

Application Number Title Priority Date Filing Date
JP2002517555A Division JP3889705B2 (ja) 2000-08-03 2001-08-03 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム

Publications (2)

Publication Number Publication Date
JP2006178447A JP2006178447A (ja) 2006-07-06
JP2006178447A5 true JP2006178447A5 (enExample) 2008-09-18

Family

ID=27397927

Family Applications (5)

Application Number Title Priority Date Filing Date
JP2002517555A Expired - Fee Related JP3889705B2 (ja) 2000-08-03 2001-08-03 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2004257715A Expired - Fee Related JP3889757B2 (ja) 2000-08-03 2004-09-03 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2004272332A Expired - Fee Related JP3768514B2 (ja) 2000-08-03 2004-09-17 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2004272333A Expired - Fee Related JP3889759B2 (ja) 2000-08-03 2004-09-17 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2005353848A Abandoned JP2006178447A (ja) 2000-08-03 2005-12-07 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム

Family Applications Before (4)

Application Number Title Priority Date Filing Date
JP2002517555A Expired - Fee Related JP3889705B2 (ja) 2000-08-03 2001-08-03 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2004257715A Expired - Fee Related JP3889757B2 (ja) 2000-08-03 2004-09-03 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2004272332A Expired - Fee Related JP3768514B2 (ja) 2000-08-03 2004-09-17 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム
JP2004272333A Expired - Fee Related JP3889759B2 (ja) 2000-08-03 2004-09-17 マイクロミラー素子、マイクロミラー素子用のパッケージ、およびそのための投射システム

Country Status (8)

Country Link
EP (1) EP1315993A4 (enExample)
JP (5) JP3889705B2 (enExample)
KR (1) KR100724081B1 (enExample)
CN (5) CN100412604C (enExample)
AT (1) ATE354814T1 (enExample)
AU (1) AU2001281019A1 (enExample)
DE (10) DE20122371U1 (enExample)
WO (1) WO2002012925A2 (enExample)

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US7307775B2 (en) * 2000-12-07 2007-12-11 Texas Instruments Incorporated Methods for depositing, releasing and packaging micro-electromechanical devices on wafer substrates
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US7042622B2 (en) 2003-10-30 2006-05-09 Reflectivity, Inc Micromirror and post arrangements on substrates
US7397517B2 (en) * 2003-05-30 2008-07-08 Kazuhiro Ohara Display system and signal processing using diamond-shaped DMDs
US7012669B2 (en) 2003-08-18 2006-03-14 Evans & Sutherland Computer Corporation Reflection barrier for panoramic display
US7334902B2 (en) 2003-08-18 2008-02-26 Evans & Sutherland Computer Corporation Wide angle scanner for panoramic display
US6871958B2 (en) 2003-08-18 2005-03-29 Evans & Sutherland Computer Corporation Wide angle scanner for panoramic display
US6861277B1 (en) * 2003-10-02 2005-03-01 Hewlett-Packard Development Company, L.P. Method of forming MEMS device
US6995830B2 (en) * 2003-12-22 2006-02-07 Asml Netherlands B.V. Lithographic projection apparatus and device manufacturing method
US7057794B2 (en) * 2004-05-19 2006-06-06 Taiwan Semiconductor Manufacturing Company, Ltd. Micromirror for MEMS device
US7273693B2 (en) * 2004-07-30 2007-09-25 Hewlett-Packard Development Company, L.P. Method for forming a planar mirror using a sacrificial oxide
US7038831B2 (en) * 2004-09-30 2006-05-02 Lucent Technologies, Inc. Micromirror apparatus with improved in-plane rotation tolerance
KR100815358B1 (ko) * 2004-10-08 2008-03-19 삼성전기주식회사 경사진 광투과성 덮개를 가진 광변조기 패키지
JP4568579B2 (ja) 2004-10-29 2010-10-27 富士通株式会社 光スイッチ
IL165212A (en) 2004-11-15 2012-05-31 Elbit Systems Electro Optics Elop Ltd Device for scanning light
US7372617B2 (en) * 2005-07-06 2008-05-13 Peter Enoksson Hidden hinge MEMS device
GB2453104B (en) 2007-09-19 2012-04-25 Wolfson Microelectronics Plc Mems device and process
US11157977B1 (en) 2007-10-26 2021-10-26 Zazzle Inc. Sales system using apparel modeling system and method
TWI418850B (zh) 2007-11-09 2013-12-11 尼康股份有限公司 微致動器、光學設備、顯示裝置、曝光裝置及設備製造方法
JP2009233836A (ja) * 2008-03-28 2009-10-15 Yamaha Corp Ｍｅｍｓおよびｍｅｍｓ製造方法
US8537446B2 (en) * 2008-04-08 2013-09-17 Cornell University Multi-axis, large tilt angle, wafer level micromirror array for large scale beam steering applications
DE102008001038B4 (de) 2008-04-08 2016-08-11 Robert Bosch Gmbh Mikromechanisches Bauelement mit Schrägstruktur und entsprechendes Herstellungsverfahren
US8096182B2 (en) * 2008-05-29 2012-01-17 Freescale Semiconductor, Inc. Capacitive sensor with stress relief that compensates for package stress
JP5151756B2 (ja) * 2008-07-16 2013-02-27 株式会社豊田中央研究所 光学装置
US10719862B2 (en) 2008-07-29 2020-07-21 Zazzle Inc. System and method for intake of manufacturing patterns and applying them to the automated production of interactive, customizable product
WO2011006522A1 (en) * 2009-07-17 2011-01-20 Carl Zeiss Smt Gmbh Microlithographic projection exposure apparatus and method of measuring a parameter related to an optical surface contained therein
KR101912092B1 (ko) 2010-10-05 2018-10-26 삼성전자 주식회사 액체 렌즈
KR101912093B1 (ko) * 2010-10-29 2018-10-26 삼성전자 주식회사 광학 장치
CN102087414B (zh) * 2010-11-03 2012-12-26 凝辉(天津)科技有限责任公司 一种阵列式分区投影方法
CN102683474B (zh) * 2011-03-18 2014-11-05 浙江大立科技股份有限公司 一种基于复合牺牲层的红外探测器制作方法
US9641826B1 (en) 2011-10-06 2017-05-02 Evans & Sutherland Computer Corporation System and method for displaying distant 3-D stereo on a dome surface
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DE102013213842A1 (de) * 2013-07-16 2015-01-22 Carl Zeiss Smt Gmbh Optisches Bauelement
DE102013217269A1 (de) * 2013-08-29 2015-03-05 Carl Zeiss Smt Gmbh Mikrospiegel-Array
CN103777445B (zh) * 2014-01-06 2018-12-25 杨毅 投影显示装置
CN103777450A (zh) * 2014-01-06 2014-05-07 吴震 发光装置、投影显示装置和发光系统
JP2016029430A (ja) * 2014-07-25 2016-03-03 セイコーエプソン株式会社 電気光学装置、電気光学装置の製造方法、及び電子機器
DE102015200626B3 (de) * 2015-01-16 2016-07-21 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. MEMS Aktuator, System mit einer Mehrzahl vom MEMS Aktuatoren und Verfahren zum Herstellen eines MEMS Aktuators
CN104835908A (zh) * 2015-04-17 2015-08-12 上海华虹宏力半导体制造有限公司 用于3d amr的氮化钽刻蚀方法
US10589980B2 (en) * 2017-04-07 2020-03-17 Texas Instruments Incorporated Isolated protrusion/recession features in a micro electro mechanical system
DE102018207783B4 (de) * 2018-05-17 2022-11-10 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. MEMS-Array aus MEMS mit jeweils einem beweglichen Strukturelement
CN111246187B (zh) * 2018-11-29 2022-07-29 青岛海信激光显示股份有限公司 光阀驱动控制方法及投影设备
KR102211618B1 (ko) * 2019-07-26 2021-02-02 인하대학교 산학협력단 3차원 플로팅 이미지 구현 장치용 역반사 마이크로 미러 어레이
CN113675722B (zh) * 2021-07-14 2024-10-29 威科赛乐微电子股份有限公司 一种Cap layer层蚀刻优化方法
WO2025127562A1 (ko) * 2023-12-14 2025-06-19 엘지이노텍 주식회사 프로젝트 장치 및 이를 포함하는 전자 디바이스

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