JP2006162907A - 窒化珪素質粉末、その製造方法及びトナー外添材 - Google Patents
窒化珪素質粉末、その製造方法及びトナー外添材 Download PDFInfo
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- JP2006162907A JP2006162907A JP2004353497A JP2004353497A JP2006162907A JP 2006162907 A JP2006162907 A JP 2006162907A JP 2004353497 A JP2004353497 A JP 2004353497A JP 2004353497 A JP2004353497 A JP 2004353497A JP 2006162907 A JP2006162907 A JP 2006162907A
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- silicon nitride
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- 239000000843 powder Substances 0.000 title claims abstract description 82
- 229910052581 Si3N4 Inorganic materials 0.000 title claims abstract description 69
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 title claims abstract description 69
- 239000000654 additive Substances 0.000 title claims abstract description 17
- 230000000996 additive effect Effects 0.000 title claims abstract description 14
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 11
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 claims abstract description 30
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims abstract description 20
- 239000001301 oxygen Substances 0.000 claims abstract description 20
- 229910052760 oxygen Inorganic materials 0.000 claims abstract description 20
- 239000002245 particle Substances 0.000 claims abstract description 20
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- 239000012756 surface treatment agent Substances 0.000 claims abstract description 15
- 229920002545 silicone oil Polymers 0.000 claims abstract description 12
- 238000010438 heat treatment Methods 0.000 claims abstract description 11
- -1 ammonium ions Chemical class 0.000 claims abstract description 10
- 238000010828 elution Methods 0.000 claims abstract description 10
- 239000006087 Silane Coupling Agent Substances 0.000 claims abstract description 9
- 238000004448 titration Methods 0.000 claims abstract description 7
- 238000000605 extraction Methods 0.000 claims abstract description 5
- 238000011049 filling Methods 0.000 claims description 12
- 230000001590 oxidative effect Effects 0.000 claims description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 abstract description 10
- 230000007062 hydrolysis Effects 0.000 abstract description 8
- 238000006460 hydrolysis reaction Methods 0.000 abstract description 8
- 229910021529 ammonia Inorganic materials 0.000 abstract description 5
- 238000007639 printing Methods 0.000 description 8
- 238000000034 method Methods 0.000 description 7
- 238000010298 pulverizing process Methods 0.000 description 7
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 230000002829 reductive effect Effects 0.000 description 5
- 238000004381 surface treatment Methods 0.000 description 5
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- 239000012530 fluid Substances 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000012856 packing Methods 0.000 description 4
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 3
- 230000002776 aggregation Effects 0.000 description 3
- 239000007822 coupling agent Substances 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 239000010419 fine particle Substances 0.000 description 3
- 238000012545 processing Methods 0.000 description 3
- 239000000377 silicon dioxide Substances 0.000 description 3
- QGZKDVFQNNGYKY-UHFFFAOYSA-O Ammonium Chemical compound [NH4+] QGZKDVFQNNGYKY-UHFFFAOYSA-O 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000005054 agglomeration Methods 0.000 description 2
- 239000012153 distilled water Substances 0.000 description 2
- 239000000945 filler Substances 0.000 description 2
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 2
- MSRJTTSHWYDFIU-UHFFFAOYSA-N octyltriethoxysilane Chemical compound CCCCCCCC[Si](OCC)(OCC)OCC MSRJTTSHWYDFIU-UHFFFAOYSA-N 0.000 description 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 2
- 239000002994 raw material Substances 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- 239000011550 stock solution Substances 0.000 description 2
- WYTZZXDRDKSJID-UHFFFAOYSA-N (3-aminopropyl)triethoxysilane Chemical compound CCO[Si](OCC)(OCC)CCCN WYTZZXDRDKSJID-UHFFFAOYSA-N 0.000 description 1
- HNSDLXPSAYFUHK-UHFFFAOYSA-N 1,4-bis(2-ethylhexyl) sulfosuccinate Chemical compound CCCCC(CC)COC(=O)CC(S(O)(=O)=O)C(=O)OCC(CC)CCCC HNSDLXPSAYFUHK-UHFFFAOYSA-N 0.000 description 1
- 125000000022 2-aminoethyl group Chemical group [H]C([*])([H])C([H])([H])N([H])[H] 0.000 description 1
- SJECZPVISLOESU-UHFFFAOYSA-N 3-trimethoxysilylpropan-1-amine Chemical compound CO[Si](OC)(OC)CCCN SJECZPVISLOESU-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- 230000002411 adverse Effects 0.000 description 1
- 238000004220 aggregation Methods 0.000 description 1
- 125000003545 alkoxy group Chemical group 0.000 description 1
- 125000003277 amino group Chemical group 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000002775 capsule Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- BAAAEEDPKUHLID-UHFFFAOYSA-N decyl(triethoxy)silane Chemical compound CCCCCCCCCC[Si](OCC)(OCC)OCC BAAAEEDPKUHLID-UHFFFAOYSA-N 0.000 description 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 description 1
- 239000002270 dispersing agent Substances 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 238000009826 distribution Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 239000000796 flavoring agent Substances 0.000 description 1
- 230000005484 gravity Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- CZWLNMOIEMTDJY-UHFFFAOYSA-N hexyl(trimethoxy)silane Chemical compound CCCCCC[Si](OC)(OC)OC CZWLNMOIEMTDJY-UHFFFAOYSA-N 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 230000002209 hydrophobic effect Effects 0.000 description 1
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 1
- 238000002347 injection Methods 0.000 description 1
- 239000007924 injection Substances 0.000 description 1
- 238000011835 investigation Methods 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- GBMDVOWEEQVZKZ-UHFFFAOYSA-N methanol;hydrate Chemical compound O.OC GBMDVOWEEQVZKZ-UHFFFAOYSA-N 0.000 description 1
- BFXIKLCIZHOAAZ-UHFFFAOYSA-N methyltrimethoxysilane Chemical compound CO[Si](C)(OC)OC BFXIKLCIZHOAAZ-UHFFFAOYSA-N 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- PHQOGHDTIVQXHL-UHFFFAOYSA-N n'-(3-trimethoxysilylpropyl)ethane-1,2-diamine Chemical compound CO[Si](OC)(OC)CCCNCCN PHQOGHDTIVQXHL-UHFFFAOYSA-N 0.000 description 1
- MQWFLKHKWJMCEN-UHFFFAOYSA-N n'-[3-[dimethoxy(methyl)silyl]propyl]ethane-1,2-diamine Chemical compound CO[Si](C)(OC)CCCNCCN MQWFLKHKWJMCEN-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 108091008695 photoreceptors Proteins 0.000 description 1
- 229920005989 resin Polymers 0.000 description 1
- 239000011347 resin Substances 0.000 description 1
- 238000004904 shortening Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- GCLGEJMYGQKIIW-UHFFFAOYSA-H sodium hexametaphosphate Chemical compound [Na]OP1(=O)OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])OP(=O)(O[Na])O1 GCLGEJMYGQKIIW-UHFFFAOYSA-H 0.000 description 1
- 235000019982 sodium hexametaphosphate Nutrition 0.000 description 1
- 239000000243 solution Substances 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 239000001577 tetrasodium phosphonato phosphate Substances 0.000 description 1
- WUMSTCDLAYQDNO-UHFFFAOYSA-N triethoxy(hexyl)silane Chemical compound CCCCCC[Si](OCC)(OCC)OCC WUMSTCDLAYQDNO-UHFFFAOYSA-N 0.000 description 1
- CPUDPFPXCZDNGI-UHFFFAOYSA-N triethoxy(methyl)silane Chemical compound CCO[Si](C)(OCC)OCC CPUDPFPXCZDNGI-UHFFFAOYSA-N 0.000 description 1
- 239000012808 vapor phase Substances 0.000 description 1
- 238000009279 wet oxidation reaction Methods 0.000 description 1
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- Developing Agents For Electrophotography (AREA)
Abstract
【課題】 耐加水分解性に優れ、アンモニア臭の発生が少なく、粗粒の含有量が少ない、窒化珪素粉末とその製造方法、及びそれを用いたトナー外添材を提供する。
【解決手段】 酸化膜を有する酸素含有量が5〜20質量%の窒化珪素粉末が、シランカップリング剤及び/又はシリコーンオイルからなる表面処理剤で処理されているものであって、平均粒子径が2μm以下、25μm以上の粗粒の含有量が50μg/g以下、メタノール滴定法による疎水化度が65%以上、80℃で15日間加熱抽出後のアンモニウムイオンの溶出量が窒化珪素質粉末1g当たり10μg未満であることを特徴とする窒化珪素質粉末、及びその製造方法。この窒化珪素質粉末からなるトナー外添材。
【選択図】 なし
Description
市販の窒化珪素粉末を分級機を用いて表1のように粒度調整し、それを炭化珪素製容器に充填密度0.8g/cm3、充填厚み40mmで充填し、大気中、昇温速度250℃/hで、表1に示される熱処理温度まで昇温し、その温度で20時間保持してから冷却して、窒化珪素粉末に酸化膜を形成させ凝集粉を製造した。凝集粉の平均粒子径は表1に示すとおりであった。
熱処理前の窒化珪素粉末の粒度を変えたこと以外は、実施例2と同様にして窒化珪素粉末を製造した。
表面処理剤をN−2(アミノエチル)3−アミノプロピルメチルジメトキシシラン(チッソ社製「サイラエースS320」)又はアミノ変性シリコーンオイル(信越化学社製「KF−859」)としたこと以外は、実施例2と同様にして窒化珪素質粉末を製造した。
Claims (5)
- 酸化膜を有する酸素含有量が5〜20質量%の窒化珪素粉末が、シランカップリング剤及び/又はシリコーンオイルからなる表面処理剤で処理されているものであって、平均粒子径が2μm以下、25μm以上の粗粒の含有量が50μg/g以下、メタノール滴定法による疎水化度が65%以上、80℃で15日間加熱抽出後のアンモニウムイオンの溶出量が窒化珪素質粉末1g当たり10μg未満であることを特徴とする窒化珪素質粉末。
- 窒化珪素粉末を酸化雰囲気中で熱処理して酸素含有量が5〜20%の凝集粉とした後、シランカップリング剤及び/又はシリコーンオイルの存在下、解砕及び/又は粉砕することを特徴とする窒化珪素質粉末の製造方法。
- 窒化珪素粉末を、充填密度を1g/cm3以下、充填厚みを50mm以下にして容器に充填してから熱処理することを特徴とする請求項2に記載の製造方法。
- 凝集粉の平均粒子径が、3μm以下であることを特徴とする請求項2又は請求項3に記載の製造方法。
- 請求項1に記載の窒化珪素質粉末からなることを特徴とするトナー外添材。
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Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
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WO2021210507A1 (ja) | 2020-04-13 | 2021-10-21 | 株式会社トクヤマ | 焼結用窒化ケイ素粉末 |
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Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2021210507A1 (ja) | 2020-04-13 | 2021-10-21 | 株式会社トクヤマ | 焼結用窒化ケイ素粉末 |
CN115443258A (zh) * | 2020-04-13 | 2022-12-06 | 株式会社德山 | 烧结用氮化硅粉末 |
KR20220166805A (ko) | 2020-04-13 | 2022-12-19 | 가부시끼가이샤 도꾸야마 | 소결용 질화규소 분말 |
CN115443258B (zh) * | 2020-04-13 | 2023-09-22 | 株式会社德山 | 烧结用氮化硅粉末 |
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