JP2006159579A - Method for manufacturing metal mask plate for printing and metal mask plate for printing - Google Patents

Method for manufacturing metal mask plate for printing and metal mask plate for printing Download PDF

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JP2006159579A
JP2006159579A JP2004353390A JP2004353390A JP2006159579A JP 2006159579 A JP2006159579 A JP 2006159579A JP 2004353390 A JP2004353390 A JP 2004353390A JP 2004353390 A JP2004353390 A JP 2004353390A JP 2006159579 A JP2006159579 A JP 2006159579A
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layer
printing
electroforming
primary
electrodeposition layer
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JP4808954B2 (en
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Yoshihiro Kobayashi
良弘 小林
Kenichi Takashima
健一 高嶋
Takashi Nakajima
貴士 中島
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Kyushu Hitachi Maxell Ltd
Maxell Holdings Ltd
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Kyushu Hitachi Maxell Ltd
Hitachi Maxell Ltd
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Abstract

<P>PROBLEM TO BE SOLVED: To manufacture, with high precision, a metal mask plate for printing with holes opened in a desired printing pattern by a patterning process and a recessed part for the relief of a mounted component, formed on a substrate and besides, and to arrange that the change of a design for the position/size of the recessed part can be dealt with easily and at a low cost. <P>SOLUTION: In this method for manufacturing the metal mask plate for printing, high precision printing can be achieved since the metal mask plate for printing can be electroformed with high precision. It is possible to form the recessed parts 5 of various depth dimensions simply and certainly in compliance with the height dimension of a primary mounted component 9 only by adjusting the thickness dimension of a primary and a secondary electro-deposit layer 20 and 26. Thus the change of the position/depth dimension of the recessed part 5 in a substrate 2 following the change in design of a printed wiring board 7 as printed matter, can be dealt with easily and at a low cost. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

本発明は、たとえば、プリント配線板上への実装工程において、プリント配線板上に各種の一次実装部品を搭載したのち、更に二次実装部品を搭載するためのクリーム半田印刷などを行うときに用いられる、印刷用メタルマスク版およびその製造方法に関する。   The present invention is used, for example, when performing solder paste printing for mounting secondary mounting components after mounting various primary mounting components on the printed wiring board in a mounting process on the printed wiring board. The present invention relates to a printed metal mask plate and a method for manufacturing the same.

この種の印刷用メタルマスク版の分野において、プリント配線板上の一次実装部品を逃がすために、当該部品の厚みや高さに応じた形の凹部を設けることは公知であり、例えば特許文献1では、印刷用メタルマスク版の版厚内で、エッチングにより凹部を形成している。   In the field of this type of printing metal mask plate, it is known to provide a concave portion having a shape corresponding to the thickness and height of the component in order to escape the primary mounting component on the printed wiring board. Then, the recess is formed by etching within the plate thickness of the printing metal mask plate.

しかし、特許文献1のようにエッチングにより凹部を形成する方法では、精度良く凹部を形成することができない。また、レーザーのよる場合には、形成する凹部の数が多いと製造コストが高くつき、また、形成時に熱の影響を受けて凹部の周りの熱反応による反り、すなわちうねりが生じやすい。各開口の垂直断面性が低下しやすい点でも不利がある。   However, the method of forming a recess by etching as in Patent Document 1 cannot form the recess with high accuracy. In the case of using a laser, if the number of concave portions to be formed is large, the manufacturing cost is high, and warping due to a thermal reaction around the concave portions, that is, undulation is likely to occur due to the influence of heat during formation. There is also a disadvantage in that the vertical cross-section of each opening tends to deteriorate.

以上のような不具合を解決するものとして、本発明者等による特許文献2や特許文献3がある。それらにおいては、電鋳母型の表面に、一次実装部品の逃げ用の凹部に対応する凹みを形成したうえで、該電鋳母型上に電着層を電鋳形成することにより、基板上に凹部を備える印刷用メタルマスク版を作製している。   As a solution to the above problems, there are Patent Documents 2 and 3 by the present inventors. In those, after forming a recess corresponding to the recess for escaping the primary mounting component on the surface of the electroformed mother mold, an electrodeposition layer is formed on the electroformed mother mold by electroforming. A metal mask plate for printing provided with a recess is prepared.

実開昭61−98070号公報Japanese Utility Model Publication No. 61-98070 特開平5−220920号公報Japanese Patent Laid-Open No. 5-220920 特開平5−220921号公報Japanese Patent Application Laid-Open No. 5-220921

上記の特許文献2および3によれば、電鋳法により基板を形成しているため、エッチングやレーザーによる方法に比べて、高精度に印刷用メタルマスク版を作製することが可能であり、その点で有用なものではある。問題は、凹部の外形形状や凹み寸法等の設定が、予め電鋳母型の表面に形成した凹みで規定されるため、プリント配線板の設計変更に伴って凹部の位置や深さ寸法等を変更することが容易でないことにある。また、印刷用メタルマスク版の製造コストが多大にかかる点でも不利がある。   According to the above Patent Documents 2 and 3, since the substrate is formed by the electroforming method, it is possible to produce a printing metal mask plate with higher accuracy than the etching and laser methods. It is useful in terms. The problem is that the setting of the external shape and the size of the recess is defined by the recess formed in advance on the surface of the electroforming mother mold. It is not easy to change. Moreover, there is a disadvantage in that the manufacturing cost of the metal mask plate for printing is very high.

本発明の目的は、電鋳法により高精度の印刷用メタルマスク版を得ることにある。そのうえで本発明の目的は、凹部の位置や深さ寸法等の設計変更に容易且つ安価に対応できる印刷用メタルマスク版の製造方法を提供することにある。   An object of the present invention is to obtain a highly accurate printing metal mask plate by electroforming. In addition, an object of the present invention is to provide a method for producing a printing metal mask plate that can easily and inexpensively cope with a design change such as a position of a recess and a depth dimension.

本発明は、図1に示すごとく、基板2に、所望の印刷パターンにパターニングされた開孔3と、実装部品逃げ用の凹部5とを有する印刷用メタルマスク版の製造方法において、図3(b)に示すごとく、平板状の電鋳母型13の所定位置に、前記凹部5の形成箇所に対応するレジスト体19aを形成する工程と、図3(c)に示すごとく、電鋳母型13上のレジスト体19aで覆われていない表面に、電鋳により前記凹部5の上方を塞ぐ天板6となる一次電着層20を電鋳により形成する工程と、図4(b)に示すごとく、一次電着層20上に凹部5の凹みパターンに対応するレジスト体25aを形成するとともに、電鋳母型13上に開孔3の開孔パターンに対応するレジスト体25bを形成する工程と、図4(c)に示すごとく、電鋳母型13および一次電着層20上のレジスト体25a・25bで覆われていない表面に、電鋳により基板2となる二次電着層26を形成する工程と、図4(d)に示すごとく、電鋳母型13から一次および二次電着層20・26を剥離する工程とを含むことを特徴とする。これにて、図1に示すごとく、スキージ面側(電鋳母型13側すなわち、図1における上方側)が平面で、被印刷物面側(電鋳面側、すなわち図1における下方側)に段差がある印刷用メタルマスク版を得ることができる。また、図1に示すごとく、開孔(3)の深さ寸法と凹部(5)の深さ寸法とが、同寸法に設定された印刷用メタルマスク版を得ることができる。   As shown in FIG. 1, the present invention relates to a method for manufacturing a printing metal mask plate having openings 3 patterned in a desired printing pattern on a substrate 2 and recesses 5 for escaping mounting parts, as shown in FIG. As shown in FIG. 3B, a step of forming a resist body 19a corresponding to the position where the concave portion 5 is formed at a predetermined position of the flat plate-shaped electroformed mother die 13, and as shown in FIG. FIG. 4B shows a step of forming, by electroforming, a primary electrodeposition layer 20 to be a top plate 6 that closes the upper portion of the recess 5 by electroforming on the surface not covered with the resist body 19a on FIG. Thus, a step of forming a resist body 25a corresponding to the recess pattern of the recess 5 on the primary electrodeposition layer 20 and forming a resist body 25b corresponding to the opening pattern of the opening 3 on the electroforming mother die 13; As shown in FIG. 4 (c), the electroformed mother mold 3 and a step of forming a secondary electrodeposition layer 26 to be the substrate 2 by electroforming on the surface not covered with the resist bodies 25a and 25b on the primary electrodeposition layer 20, as shown in FIG. And a step of peeling the primary and secondary electrodeposition layers 20 and 26 from the electroforming mother die 13. Thus, as shown in FIG. 1, the squeegee surface side (electrocasting mother die 13 side, ie, the upper side in FIG. 1) is flat, and the substrate surface side (electroformed surface side, ie, the lower side in FIG. 1). A metal mask plate for printing with a step can be obtained. Moreover, as shown in FIG. 1, the metal mask plate for printing by which the depth dimension of the opening (3) and the depth dimension of the recessed part (5) were set to the same dimension can be obtained.

また、本発明は、図5に示すごとく、基板2に、所望の印刷パターンにパターニングされた開孔3と、実装部品逃げ用の凹部5とを有する印刷用メタルマスク版の製造方法において、図6(b)に示すごとく、平板状の電鋳母型13の所定位置に、前記凹部5の形成箇所に対応するレジスト体19aを形成する工程と、図6(c)に示すごとく、電鋳母型13上のレジスト体19aで覆われていない表面に、電鋳により前記凹部5の上方を塞ぐ天板6となる一次電着層20を電鋳により形成する工程と、図7(b)に示すごとく、一次電着層20上に凹部5の凹みパターンに対応するレジスト体35aを形成するとともに、一次電着層20の無い電鋳母型13の全面を覆うレジスト体35bを形成する工程と、図7(c)に示すごとく、レジスト体35a・35bの無い一次電着層20の表面に、電鋳により所定の高さ寸法を有する二次電着層36を形成する工程と、図8(a)に示すごとく、レジスト体35a・35bを除去したのち、一次電着層20上に凹部5の凹みパターンに対応するレジスト体40aを形成するとともに、電鋳母型13上に開孔3の開孔パターンに対応するレジスト体40bを形成する工程と、図8(b)に示すごとく、電鋳母型13上のレジスト体40a・40bで覆われていない表面、および二次電着層36の表面に、電鋳により基板2となる三次電着層41を形成する工程と、図8(d)に示すごとく、電鋳母型13から一次、二次および三次電着層20・36・41を剥離する工程とを含むことを特徴とする。   Further, as shown in FIG. 5, the present invention relates to a method for producing a printing metal mask plate having openings 3 patterned in a desired printing pattern on a substrate 2 and recesses 5 for escaping mounting parts. 6 (b), a step of forming a resist body 19a corresponding to the position where the recess 5 is formed at a predetermined position of the flat electroforming mother die 13, and an electroforming as shown in FIG. 6 (c). A step of forming, by electroforming, a primary electrodeposition layer 20 to be a top plate 6 that covers the upper portion of the recess 5 by electroforming on the surface of the matrix 13 that is not covered with the resist body 19a; and FIG. As shown in FIG. 4, a step of forming a resist body 35a corresponding to the recess pattern of the recess 5 on the primary electrodeposition layer 20 and forming a resist body 35b covering the entire surface of the electroformed mother die 13 without the primary electrodeposition layer 20 is formed. As shown in FIG. A step of forming a secondary electrodeposition layer 36 having a predetermined height dimension by electroforming on the surface of the primary electrodeposition layer 20 without the cores 35a and 35b, and a resist body 35a as shown in FIG. After removing 35b, a resist body 40a corresponding to the recess pattern of the recess 5 is formed on the primary electrodeposition layer 20, and a resist body 40b corresponding to the opening pattern of the opening 3 is formed on the electroforming mother die 13. 8B, as shown in FIG. 8B, the surface of the electroforming mother die 13 that is not covered with the resist bodies 40a and 40b and the surface of the secondary electrodeposition layer 36 are electroformed by electroforming. And a step of peeling the primary, secondary and tertiary electrodeposition layers 20, 36 and 41 from the electroforming mother mold 13 as shown in FIG. 8D. It is characterized by.

また本発明は、図9に示すごとく、スキージ面となる第1層45と印刷対象物との接触面となる第2層46とからなる二層構造の基板2に、所望の印刷パターンにパターニングされた開孔3と、実装部品逃げ用の凹部5とを有する印刷用メタルマスク版の製造方法において、図10(b)に示すごとく、平板状の電鋳母型13の所定位置に、開孔3の開孔パターンに対応するレジスト体50aを形成する工程と、図10(c)に示すごとく、電鋳母型13上のレジスト体50aで覆われていない表面に、電鋳により第1層45となる一次電着層51を形成する工程と、図11(b)に示すごとく、一次電着層51上に、凹部5の凹みパターンに対応するレジスト体55aを形成する工程と、図11(b)に示すごとく、一次電着層51上のレジスト体55aで覆われていない表面に、電鋳により第2層46となる二次電着層56を形成する工程と、図11(c)に示すごとく、電鋳母型13から一次および二次電着層51・56を剥離する工程とを含むことを特徴とする。   Further, as shown in FIG. 9, the present invention patterns a desired printing pattern on a substrate 2 having a two-layer structure including a first layer 45 serving as a squeegee surface and a second layer 46 serving as a contact surface with a printing object. In the manufacturing method of the printing metal mask plate having the opened hole 3 and the recessed part 5 for escaping the mounted component, as shown in FIG. 10B, the plate-shaped electroforming mother die 13 is opened at a predetermined position. A step of forming a resist body 50a corresponding to the opening pattern of the holes 3 and a surface not covered with the resist body 50a on the electroforming mother die 13 by electroforming as shown in FIG. A step of forming a primary electrodeposition layer 51 to be the layer 45, a step of forming a resist body 55a corresponding to the recess pattern of the recess 5 on the primary electrodeposition layer 51, as shown in FIG. 11 (b), the label on the primary electrodeposition layer 51 A step of forming a secondary electrodeposition layer 56 to be the second layer 46 by electroforming on the surface not covered with the strike body 55a, as shown in FIG. And a step of peeling off the next electrodeposition layers 51 and 56.

上記の製造方法においては、第1層45である一次電着層51がニッケル−コバルトを電鋳してなるものであり、第2層46である二次電着層56がニッケルを電鋳してなるものとすることができる。   In the above manufacturing method, the primary electrodeposition layer 51 as the first layer 45 is formed by electroforming nickel-cobalt, and the secondary electrodeposition layer 56 as the second layer 46 is electroformed with nickel. Can be.

また、本発明は、図1に示すごとく、基板2に、所望の印刷パターンにパターニングされた開孔3と、実装部品逃げ用の凹部5とを有する印刷用メタルマスク版であって、スキージ面側が平面で、被印刷物面側に段差があることを特徴とする。   In addition, as shown in FIG. 1, the present invention is a printing metal mask plate having a hole 2 patterned in a desired printing pattern on a substrate 2 and a recess 5 for escaping a mounted component, and a squeegee surface. The side is a flat surface, and there is a step on the substrate surface side.

本発明に係る印刷用メタルマスク版の製造方法によれば、電鋳で高精度に印刷用メタルマスク版を作製できるので、精密な印刷が可能となる。なによりも、電着層の厚み寸法を調整するだけで、実装部品9(図1参照)の高さ寸法に合わせた各種深さ寸法の凹部5を簡単確実に形成することができるので、従来の特許文献2および3のように、電鋳母型に形成された凹みの深さ寸法により、実装部品の逃げ用の凹部の大きさや深さ寸法が決定される形態に比べて、被印刷物であるプリント配線板7(図1参照)の設計変更に伴う基板2上の凹部5の位置や深さ寸法等の変更に、容易且つ低コストに対応できる点で優れている。   According to the method for producing a printing metal mask plate according to the present invention, a printing metal mask plate can be produced with high accuracy by electroforming, so that precise printing is possible. Above all, it is possible to easily and reliably form the recesses 5 having various depth dimensions according to the height dimension of the mounting component 9 (see FIG. 1) simply by adjusting the thickness dimension of the electrodeposition layer. As in Patent Documents 2 and 3, the depth dimension of the recess formed in the electroformed mother die is compared with the form in which the size and depth dimension of the recess for escaping the mounted component are determined. This is excellent in that it can easily and cost-effectively change the position, depth, etc. of the recess 5 on the substrate 2 due to the design change of a certain printed wiring board 7 (see FIG. 1).

すなわち請求項1記載の本発明に係る製造方法によれば、一次電着層20および二次電着層26の厚み寸法を調整するだけで、開孔3や凹部5の深さ寸法や、基板2とプリント配線板7との対向間隔寸法などを簡単容易に変更することが可能である。   That is, according to the manufacturing method according to the first aspect of the present invention, the depth dimension of the opening 3 and the recess 5, the substrate, and the substrate can be adjusted only by adjusting the thickness dimension of the primary electrodeposition layer 20 and the secondary electrodeposition layer 26. 2 can be easily and easily changed.

請求項2記載の本発明に係る製造方法においては、図8(b)の電鋳工程において、三次電着層41を構成する電着金属は、二次電着層36および電鋳母型13の表面から同時的に成長していく。このため、一次および二次電着層20・36の厚み寸法の和ぶんだけ、該二次電着層36上に形成される三次電着層41の高さ位置は、電鋳母型13上に形成される三次電着層41のそれよりも高い位置となる。したがって凹部5の深さ寸法を大きく採ることが容易である。しかるに、当該製造方法によって作製される印刷用メタルマスク版1は、凹部5の深さ寸法を開孔3のそれよりも大きく設定したい場合に好適に適用でき、換言すれば、一次実装部品9(図1参照)の高さ寸法が大きい場合に好適に適用できる。また、一次電着層20および二次電着層36の厚み寸法を調整するだけで、開孔3や凹部5の深さ寸法や、基板2とプリント配線板7との対向間隔寸法などを簡単容易に変更することが可能である点でも優れている。   In the manufacturing method according to the second aspect of the present invention, in the electroforming step of FIG. 8B, the electrodeposited metal constituting the tertiary electrodeposition layer 41 is the secondary electrodeposition layer 36 and the electroforming mother mold 13. Growing simultaneously from the surface of the. For this reason, the height position of the tertiary electrodeposition layer 41 formed on the secondary electrodeposition layer 36 is the same as that on the electroforming mother mold 13 by the sum of the thickness dimensions of the primary and secondary electrodeposition layers 20 and 36. It becomes a position higher than that of the tertiary electrodeposition layer 41 formed in this. Therefore, it is easy to increase the depth of the recess 5. However, the printing metal mask plate 1 produced by the manufacturing method can be suitably applied when it is desired to set the depth dimension of the recess 5 to be larger than that of the opening 3. In other words, the primary mounting component 9 ( It can be suitably applied when the height dimension of FIG. 1) is large. Moreover, the depth dimension of the opening 3 and the recessed part 5 and the opposing distance dimension between the substrate 2 and the printed wiring board 7 can be simply adjusted only by adjusting the thickness dimension of the primary electrodeposition layer 20 and the secondary electrodeposition layer 36. It is also excellent in that it can be easily changed.

請求項3記載の本発明に係る製造方法においては、電鋳母型13上に形成されたレジスト体50aを用いて一次電着層51を形成したうえで、該レジスト体50aと、一次電着層51上に形成されたレジスト体55aを用いて二次電着層56を形成している。しかるに、レジスト体50aの除去により形成される開孔3の深さ寸法は、レジスト体55aの除去により形成される凹部5の深さ寸法よりも、一次電着層51の厚み寸法ぶんだけ大きなものとなる。しかるに、当該製造方法によって作製される印刷用メタルマスク版1は、開孔3の深さ寸法を凹部5のそれよりも大きく設定したい場合に工程に適用でき、換言すれば、実装部品9(図1参照)の高さ寸法が小さい場合に好適に適用できる。一次電着層51および二次電着層56の厚み寸法を調整するだけで、開孔3や凹部5の深さ寸法を簡単容易に変更することが可能である点でも優れている。   In the manufacturing method according to the third aspect of the present invention, the primary electrodeposition layer 51 is formed using the resist body 50a formed on the electroforming mother die 13, and then the resist body 50a and the primary electrodeposition are formed. A secondary electrodeposition layer 56 is formed using a resist body 55 a formed on the layer 51. However, the depth dimension of the opening 3 formed by removing the resist body 50a is larger by the thickness dimension of the primary electrodeposition layer 51 than the depth dimension of the recess 5 formed by removing the resist body 55a. It becomes. However, the printing metal mask plate 1 produced by the manufacturing method can be applied to the process when the depth dimension of the opening 3 is desired to be set larger than that of the recess 5, in other words, the mounting component 9 (FIG. 1) is suitably applicable when the height dimension is small. It is also excellent in that the depth dimensions of the opening 3 and the recess 5 can be easily changed simply by adjusting the thickness dimensions of the primary electrodeposition layer 51 and the secondary electrodeposition layer 56.

請求項3記載の本発明に係る製造により得られる印刷用メタルマスク版は、図9に示すごとく、スキージ面となる第1層45と印刷対象物との接触面となる第2層46とからなる二層構造の基板2を備えるものとなる。この場合において、請求項4のように、第1層45である一次電着層51をニッケル−コバルトで電鋳形成し、第2層46である二次電着層56をニッケルで電鋳形成してあると、二次電着層56を軟らかいニッケルで形成したことにより、被印刷物であるプリント配線板7(図1参照)との密着度を良好に確保でき、しかも一次電着層51をニッケルよりも硬度の大きなニッケル−コバルトで形成したことにより、印圧が加わるスキージ面、すなわちスキージ10(図1参照)が接触するスキージ面の強度を良好に担保することができる。   As shown in FIG. 9, the printing metal mask plate obtained by the production according to the third aspect of the present invention includes a first layer 45 serving as a squeegee surface and a second layer 46 serving as a contact surface with a printing object. The substrate 2 having the two-layer structure is provided. In this case, as in claim 4, the primary electrodeposition layer 51, which is the first layer 45, is electroformed by nickel-cobalt, and the secondary electrodeposition layer 56, which is the second layer 46, is electroformed by nickel. Then, by forming the secondary electrodeposition layer 56 with soft nickel, it is possible to ensure good adhesion to the printed wiring board 7 (see FIG. 1), which is the substrate, and the primary electrodeposition layer 51 is By forming it with nickel-cobalt having a hardness higher than that of nickel, the strength of the squeegee surface to which the printing pressure is applied, that is, the squeegee surface with which the squeegee 10 (see FIG. 1) comes into contact can be favorably secured.

請求項5記載の本発明に係る印刷用メタルマスク版によれば、スキージ (母型)面側が平面なのでスキージしやすく、被印刷物(電鋳)面側に段差があるのでスキージ終了後にメタルマスク版を被印刷物から離しやすいという効果がある。また、開孔3の深さ寸法と実装部品逃げ用の凹部5の深さ寸法とを同寸法に設定するようにしてあると、実装部品と略同じ厚みの印刷が可能となる。   According to the metal mask plate for printing according to the present invention described in claim 5, since the squeegee (mother mold) surface side is flat, the squeegee is easy to squeegee, and there is a step on the printed material (electroformed) surface side, so the metal mask plate after the squeegee finishes Is easily separated from the substrate. Further, if the depth dimension of the opening 3 and the depth dimension of the recessed part 5 for escaping the mounted part are set to the same dimension, printing with substantially the same thickness as the mounted part can be performed.

(第1実施形態)
本発明の第1実施形態を図面に基づき説明する。図1に、本発明の対象とする印刷用メタルマスク版の使用態様例を、図2に、該メタルマスク版の外観斜視図を示す。図1および図2に示すように、印刷用メタルマスク版1は、平板状の基板2にインキ・ペースト吐出し用の開孔3と、一次実装部品(実装部品)の逃げ用の凹部5とを備えている。図1および図2において符号6は、逃げ用の凹部5の上方を塞ぐように、基板2と不離一体的に接合された天板を示す。凹部5を有する部分の厚み寸法は、基板2の厚み寸法よりも若干大きくなっている。なお、ここで言う「インキ・ペースト」とは、はんだペースト、クリームはんだ、液状はんだ、導電性インキ等を含む概念である。
(First embodiment)
A first embodiment of the present invention will be described with reference to the drawings. FIG. 1 shows an example of how the printing metal mask plate of the present invention is used, and FIG. 2 shows an external perspective view of the metal mask plate. As shown in FIG. 1 and FIG. 2, a printing metal mask plate 1 includes a flat substrate 2 having an opening 3 for discharging ink and paste, and a recess 5 for escaping a primary mounting component (mounting component). It has. In FIG. 1 and FIG. 2, reference numeral 6 indicates a top plate that is integrally and integrally joined to the substrate 2 so as to close the upper part of the escape recess 5. The thickness dimension of the portion having the recess 5 is slightly larger than the thickness dimension of the substrate 2. The “ink / paste” mentioned here is a concept including solder paste, cream solder, liquid solder, conductive ink, and the like.

符号7は、既に一次実装部品9を搭載したプリント配線板を、10はスキージを示す。スキージ10は、二次実装工程で印刷用メタルマスク版1上にのせたインキ・ペースト11を掻くためのものである。図1においては、印刷用メタルマスク版1の上面をスキージ面、下面をプリント配線板7との接触面として、スキージングを行っている。なお、図示例では、開孔3および凹部5を四角形状に形成したが、これら開孔3および凹部5の外形形状は四角形状に限られない。   Reference numeral 7 denotes a printed wiring board on which the primary mounting component 9 has already been mounted, and 10 denotes a squeegee. The squeegee 10 is for scraping the ink paste 11 placed on the printing metal mask plate 1 in the secondary mounting process. In FIG. 1, squeezing is performed using the upper surface of the printing metal mask plate 1 as the squeegee surface and the lower surface as the contact surface with the printed wiring board 7. In the illustrated example, the opening 3 and the recess 5 are formed in a square shape. However, the outer shape of the opening 3 and the recess 5 is not limited to a square shape.

図3および図4に、上記の印刷用メタルマスク版1の製造方法を示す。まず、図3(a)に示すごとく、導電性を有するステンレス製の電鋳母型13の表面にフォトレジスト層15を形成したうえで、該フォトレジスト層15の上に、天板6に対応する透光孔16aを有するパターンフィルム16(ガラスマスク)を密着させたのち、紫外光ランプ17で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、図3(b)に示すごとく、天板6に対応するレジスト体19aを有する一次パターンレジスト19を電鋳母型13上に形成した。より詳しくは、天板6の形成箇所を囲むような一次パターンレジスト19を形成した。なおフォトレジスト層15は、ネガタイプの感光性ドライフィルムレジストを、所定の高さに合わせて一枚ないし数枚ラミネートして熱圧着により形成したものを用いた。   3 and 4 show a method for manufacturing the printing metal mask plate 1 described above. First, as shown in FIG. 3A, a photoresist layer 15 is formed on the surface of a stainless steel electroforming mother die 13 having conductivity, and then the top plate 6 is formed on the photoresist layer 15. After the pattern film 16 (glass mask) having the translucent hole 16a to be in close contact, exposure is performed by irradiating with ultraviolet light with an ultraviolet lamp 17, and development and drying are performed to dissolve unexposed portions. By removing, a primary pattern resist 19 having a resist body 19a corresponding to the top plate 6 was formed on the electroformed mother die 13 as shown in FIG. More specifically, a primary pattern resist 19 is formed so as to surround the place where the top plate 6 is formed. The photoresist layer 15 was formed by laminating one or several negative photosensitive dry film resists at a predetermined height and then thermocompression bonding.

次に、図3(c)に示すごとく、レジスト体19aの無い電鋳母型13上に、電着金属としてのニッケル−コバルトを電着させることにより、天板6となる一次電着層20を電鋳形成した。なお、図3(c)において符号21は、レジスト体19aを挟んで一次電着層20を囲むように形成された一次電着層を示しており、かかる一次電着層21は、次の図3(d)の工程において、レジスト体19aの除去後に剥離除去した。   Next, as shown in FIG. 3C, the primary electrodeposition layer 20 to be the top plate 6 is formed by electrodepositing nickel-cobalt as an electrodeposition metal on the electroforming mother mold 13 without the resist body 19a. Was formed by electroforming. In FIG. 3 (c), reference numeral 21 denotes a primary electrodeposition layer formed so as to surround the primary electrodeposition layer 20 with the resist body 19a interposed therebetween. In the step 3 (d), the resist body 19a was removed and removed.

図3(d)に示すようにレジスト体19aおよび一次電着層21を除去したのち、図4(a)に示すごとく、一次電着層20および電鋳母型13の全面に、フォトレジスト層22を形成したうえで、該フォトレジスト層22の上に、凹部5および開孔3に対応する透光孔23aを有するパターンフィルム23(ガラスマスク)を密着させたのち、紫外光ランプ17で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、図4(b)に示すごとく、一次電着層20上に凹部5の凹みパターンに対応するレジスト体25aを有するとともに、電鋳母型13上に所定の開孔3の開口パターンに対応するレジスト体25bを有する二次パターンレジスト25を形成した。   After removing the resist body 19a and the primary electrodeposition layer 21 as shown in FIG. 3D, a photoresist layer is formed on the entire surface of the primary electrodeposition layer 20 and the electroforming mother mold 13 as shown in FIG. After forming 22, a pattern film 23 (glass mask) having a light transmitting hole 23 a corresponding to the recess 5 and the opening 3 is brought into intimate contact with the photoresist layer 22, and then ultraviolet light is applied by the ultraviolet light lamp 17. By exposing to light, performing development, drying, and dissolving and removing unexposed portions, as shown in FIG. 4B, the concave pattern of the concave portions 5 on the primary electrodeposition layer 20 is obtained. And a secondary pattern resist 25 having a resist body 25b corresponding to the opening pattern of the predetermined opening 3 is formed on the electroforming mother die 13.

次に、図4(c)に示すごとく、レジスト体25a・25bの無い一次電着層20および電鋳母型13の表面に、電鋳により電着金属を電着させて、基板2となる二次電着層26を形成した。ここでは、ニッケル−コバルトを電着金属として、二次電着層26を形成した。   Next, as shown in FIG. 4C, an electrodeposited metal is electrodeposited by electroforming on the surface of the primary electrodeposition layer 20 and the electroforming mother mold 13 without the resist bodies 25a and 25b to form the substrate 2. A secondary electrodeposition layer 26 was formed. Here, the secondary electrodeposition layer 26 was formed using nickel-cobalt as an electrodeposition metal.

二次電着層26は、一次電着層20および電鋳母型13の表面から同時的に成長していく。このため、一次電着層20の厚み寸法ぶんだけ、該一次電着層20上に形成される二次電着層26の高さ位置を、電鋳母型13上に形成される二次電着層26のそれよりも高い位置とすることができた。   The secondary electrodeposition layer 26 grows simultaneously from the surfaces of the primary electrodeposition layer 20 and the electroforming mother mold 13. Therefore, the height of the secondary electrodeposition layer 26 formed on the primary electrodeposition layer 20 is set to the height of the primary electrodeposition layer 20 by the thickness of the secondary electrodeposition layer 20. The position could be higher than that of the layer 26.

開孔3となる部分および凹部5となる部分のそれぞれに係る二次電着層26の表面に対して、各部分が所定の厚み寸法を有するように研磨処理を施したうえで、レジスト体25a・25bを除去した。かかるレジスト体25aの除去により凹部5が形成され、レジスト体25bの除去により開孔3が形成された。最後に電鋳母型13から一次および二次電着層20・26を剥離した。これにて、図4(d)に示すごとく、二次電着層26である基板2内に、開孔3と凹部5とを有する印刷用メタルマスク版1を得た。   The surface of the secondary electrodeposition layer 26 relating to each of the portion to be the opening 3 and the portion to be the recess 5 is subjected to a polishing treatment so that each portion has a predetermined thickness dimension, and then the resist body 25a. -25b was removed. The recess 5 was formed by removing the resist body 25a, and the opening 3 was formed by removing the resist body 25b. Finally, the primary and secondary electrodeposition layers 20 and 26 were peeled from the electroformed mother die 13. As a result, as shown in FIG. 4D, a printing metal mask plate 1 having openings 3 and recesses 5 in the substrate 2 as the secondary electrodeposition layer 26 was obtained.

(第2実施形態)
図5に、本発明の第2実施形態に係る印刷用メタルマスク版を示す。この印刷用メタルマスク版1は、平板状の基板2にインキ・ペースト吐出し用の開孔3と、一次実装部品の逃げ用の凹部5とを備えている。図5に示すように、各凹部5は、その内周面が基板2と、該基板2に埋設状に形成された下地層30とで区画されており、その上方部分は、基板2の上面と面一状に形成された天板6で区画されている。すなわち、凹部5の上方は、天板6で塞がれている。開孔3および凹部5の内周面は、ストレート状に形成されている。ここでは、凹部5の深さ寸法が、開孔3のそれよりも大きく設定されている点が着目される。なお、ここで言う「インキ・ペースト」とは、はんだペースト、クリームはんだ、液状はんだ、導電性インキ等を含む概念である。
(Second Embodiment)
FIG. 5 shows a printing metal mask plate according to the second embodiment of the present invention. The printing metal mask plate 1 includes an opening 3 for discharging ink and paste on a flat substrate 2 and a recess 5 for escaping the primary mounting component. As shown in FIG. 5, each concave portion 5 has an inner peripheral surface partitioned by a substrate 2 and a base layer 30 formed in an embedded state on the substrate 2, and an upper portion thereof is an upper surface of the substrate 2. And a top plate 6 formed in a flush manner. That is, the top of the recess 5 is blocked by the top plate 6. The inner peripheral surfaces of the opening 3 and the recess 5 are formed in a straight shape. Here, it is noted that the depth dimension of the recess 5 is set larger than that of the opening 3. The “ink / paste” mentioned here is a concept including solder paste, cream solder, liquid solder, conductive ink, and the like.

図6ないし図8に、上記の印刷用メタルマスク版1の製造方法を示す。まず、図6(a)に示すごとく、導電性を有するステンレス製の電鋳母型13の表面にフォトレジスト層15を形成したうえで、該フォトレジスト層15の上に、天板6に対応する透光孔16aを有するパターンフィルム16(ガラスマスク)を密着させたのち、紫外光ランプ17で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、図6(b)に示すごとく、天板6に対応するレジスト体19aを有する一次パターンレジスト19を電鋳母型13上に形成した。すなわち、天板6の形成箇所を囲むような一次パターンレジスト19を形成した。なおフォトレジスト層15は、ネガタイプの感光性ドライフィルムレジストを、所定の高さに合わせて一枚ないし数枚ラミネートして熱圧着により形成したものを用いた。   6 to 8 show a method for manufacturing the printing metal mask plate 1 described above. First, as shown in FIG. 6A, a photoresist layer 15 is formed on the surface of a stainless steel electroforming mother die 13 having conductivity, and then the top plate 6 is formed on the photoresist layer 15. After the pattern film 16 (glass mask) having the translucent hole 16a to be in close contact, exposure is performed by irradiating with ultraviolet light with an ultraviolet lamp 17, and development and drying are performed to dissolve unexposed portions. By removing, a primary pattern resist 19 having a resist body 19a corresponding to the top plate 6 was formed on the electroformed mother die 13 as shown in FIG. That is, the primary pattern resist 19 surrounding the place where the top plate 6 was formed was formed. The photoresist layer 15 was formed by laminating one or several negative photosensitive dry film resists at a predetermined height and then thermocompression bonding.

次に、図6(c)に示すごとく、レジスト体19aの無い電鋳母型13上に、電着金属としてのニッケル−コバルトを電着させることにより、天板6となる一次電着層20を電鋳形成した。なお、図6(c)において符号21は、レジスト体19aを挟んで一次電着層20を囲むように形成された一次電着層を示しており、かかる一次電着層21は、次の図6(d)の工程において、レジスト体19aの除去後に剥離除去した。   Next, as shown in FIG. 6C, the primary electrodeposition layer 20 to be the top plate 6 is formed by electrodepositing nickel-cobalt as an electrodeposition metal on the electroforming mother mold 13 without the resist body 19a. Was formed by electroforming. In FIG. 6 (c), reference numeral 21 indicates a primary electrodeposition layer formed so as to surround the primary electrodeposition layer 20 with the resist body 19a interposed therebetween. In step 6 (d), the resist body 19a was removed and removed.

図6(d)に示すようにレジスト体19aおよび一次電着層21を除去したのち、図7(a)に示すごとく、一次電着層20および電鋳母型13の全面に、フォトレジスト層32を形成したうえで、該フォトレジスト層32の上に、凹部5および基板2に対応する透光孔33aを有するパターンフィルム33(ガラスマスク)を密着させたのち、紫外光ランプ17で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、図7(b)に示すごとく、一次電着層20上に凹部5の凹みパターンに対応するレジスト体35aを有するとともに、一次電着層20の無い電鋳母型13の全面を覆うレジスト体35bを有する二次パターンレジスト35を形成した。   After removing the resist body 19a and the primary electrodeposition layer 21 as shown in FIG. 6 (d), a photoresist layer is formed on the entire surface of the primary electrodeposition layer 20 and the electroforming mother mold 13 as shown in FIG. 7 (a). 32 is formed, and a pattern film 33 (glass mask) having a light transmitting hole 33a corresponding to the concave portion 5 and the substrate 2 is brought into close contact with the photoresist layer 32, and then ultraviolet light is irradiated by the ultraviolet light lamp 17. Is exposed to light, developed and dried to dissolve and remove the unexposed portions, thereby forming a concave pattern of the concave portions 5 on the primary electrodeposition layer 20 as shown in FIG. A secondary pattern resist 35 having a corresponding resist body 35a and having a resist body 35b covering the entire surface of the electroformed mother die 13 without the primary electrodeposition layer 20 was formed.

次に、図7(c)に示すごとく、レジスト体35a・35bの無い一次電着層20の表面に、電鋳により電着金属を電着させて、下地層30となる二次電着層36を形成した。ここでは、ニッケル−コバルトを電着金属として、二次電着層36を形成した。二次電着層36の高さ寸法は、レジスト体35a・35bの高さ寸法を超えない程度とした。   Next, as shown in FIG. 7C, a secondary electrodeposition layer that becomes an underlayer 30 by electrodepositing an electrodeposited metal on the surface of the primary electrodeposition layer 20 without the resist bodies 35 a and 35 b by electroforming. 36 was formed. Here, the secondary electrodeposition layer 36 was formed using nickel-cobalt as an electrodeposition metal. The height of the secondary electrodeposition layer 36 was set so as not to exceed the height of the resist bodies 35a and 35b.

次に、図7(d)に示すごとく、レジスト体35a・35bを除去したうえで、図7(e)に示すごとく、一次・二次電着層20・36および電鋳母型13の全面を覆うように、フォトレジスト層37を形成した。そして、該フォトレジスト層37の上に、凹部5および開孔3に対応する透光孔39aを有するパターンフィルム39(ガラスマスク)を密着させたのち、紫外光ランプ17で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、図8(a)に示すごとく、一次電着層20上に凹部5の凹みパターンに対応するレジスト体40aを有するとともに、電鋳母型13上に所定の開孔3の開孔パターンに対応するレジスト体40bを有する三次パターンレジスト40を形成した。   Next, as shown in FIG. 7 (d), after removing the resist bodies 35a and 35b, as shown in FIG. 7 (e), the entire surfaces of the primary and secondary electrodeposition layers 20 and 36 and the electroforming mother mold 13 are formed. A photoresist layer 37 was formed so as to cover. Then, after a pattern film 39 (glass mask) having a light transmitting hole 39 a corresponding to the recess 5 and the opening 3 is brought into close contact with the photoresist layer 37, ultraviolet light is irradiated by the ultraviolet lamp 17. Resist body corresponding to the concave pattern of the concave portion 5 on the primary electrodeposition layer 20 as shown in FIG. 8A by exposing, developing and drying, and dissolving and removing the unexposed portion. A tertiary pattern resist 40 having a resist body 40b corresponding to the opening pattern of the predetermined opening 3 was formed on the electroforming mother die 13 while having 40a.

次に、図8(b)に示すごとく、レジスト体40a・40bの無い二次電着層36および電鋳母型13の表面に、電鋳により電着金属を電着させて、基板2となる三次電着層41を形成した。ここでは、ニッケル−コバルトを電着金属として、三次電着層41を形成した。   Next, as shown in FIG. 8B, an electrodeposited metal is electrodeposited by electroforming on the surface of the secondary electrodeposition layer 36 and the electroforming mother mold 13 without the resist bodies 40a and 40b, and the substrate 2 and A tertiary electrodeposition layer 41 was formed. Here, the tertiary electrodeposition layer 41 was formed using nickel-cobalt as an electrodeposition metal.

三次電着層41は、二次電着層36の上端面および電鋳母型13の表面から同時的に成長していく。このため、一次電着層20と二次電着層36の厚み寸法の和ぶんだけ、該二次電着層36上に形成される三次電着層41の高さ位置を、電鋳母型13上に形成される三次電着層41のそれよりも高い位置とすることができた。   The tertiary electrodeposition layer 41 grows simultaneously from the upper end surface of the secondary electrodeposition layer 36 and the surface of the electroforming mother mold 13. For this reason, the height position of the tertiary electrodeposition layer 41 formed on the secondary electrodeposition layer 36 is set so as to be equal to the sum of the thickness dimensions of the primary electrodeposition layer 20 and the secondary electrodeposition layer 36. 13 and higher than that of the tertiary electrodeposition layer 41 formed on the substrate 13.

次に、図8(c)に示すごとく、開孔3となる部分、および凹部5となる部分、すなわち一次および二次電着層20・36から成長した三次電着層41の表面に対して、所定の高さ寸法となるように、研磨処理を施したのち、図8(d)に示すごとく、レジスト体40a・40bを除去した。かかるレジスト体40aの除去により凹部5が形成され、レジスト体40bの除去により開孔3が形成された。最後に電鋳母型13から一次、二次、三次電着層20・36・41を剥離した。これにて、図8(d)および図5に示すごとく、三次電着層41である基板2内に、開孔3と凹部5とを有する印刷用メタルマスク版1を得た。   Next, as shown in FIG. 8 (c), with respect to the portion to be the opening 3 and the portion to be the recess 5, that is, the surface of the tertiary electrodeposition layer 41 grown from the primary and secondary electrodeposition layers 20 and 36. After performing a polishing process so as to obtain a predetermined height, the resist bodies 40a and 40b were removed as shown in FIG. 8 (d). The recess 5 was formed by removing the resist body 40a, and the opening 3 was formed by removing the resist body 40b. Finally, the primary, secondary, and tertiary electrodeposition layers 20, 36, and 41 were peeled from the electroformed mother mold 13. Thus, as shown in FIGS. 8D and 5, the printing metal mask plate 1 having the openings 3 and the recesses 5 in the substrate 2 as the tertiary electrodeposition layer 41 was obtained.

(第3実施形態)
図9に、本発明の第3実施形態に係る印刷用メタルマスク版を示す。この印刷用メタルマスク版1は、平板状の基板2にインキ・ペースト吐出し用の開孔3と、一次実装部品の逃げ用の凹部5とを備えている。図9に示すように、基板2は、スキージ面となる上側の第1層45と、印刷対象物(プリント配線板7:図1参照)との接触面となる下側の第2層46とからなる二層構造を呈している。各凹部5は、その内周面が第2層46で区画されており、その上方部分は、第1層45で区画されている。開孔3および凹部5の内周面は、ストレート状に形成されている。ここでは、凹部5の深さ寸法が、開孔3のそれよりも、第1層45の厚み寸法ぶんだけ小さくなっている点が着目される。なお、ここで言う「インキ・ペースト」とは、はんだペースト、クリームはんだ、液状はんだ、導電性インキ等を含む概念である。
(Third embodiment)
FIG. 9 shows a printing metal mask plate according to the third embodiment of the present invention. The printing metal mask plate 1 includes an opening 3 for discharging ink and paste on a flat substrate 2 and a recess 5 for escaping the primary mounting component. As shown in FIG. 9, the substrate 2 includes an upper first layer 45 serving as a squeegee surface, and a lower second layer 46 serving as a contact surface with a printing object (printed wiring board 7: see FIG. 1). It has a two-layer structure consisting of Each concave portion 5 has an inner peripheral surface partitioned by a second layer 46, and an upper portion thereof is partitioned by a first layer 45. The inner peripheral surfaces of the opening 3 and the recess 5 are formed in a straight shape. Here, it is noted that the depth dimension of the recess 5 is smaller than that of the opening 3 by the thickness dimension of the first layer 45. The “ink / paste” mentioned here is a concept including solder paste, cream solder, liquid solder, conductive ink, and the like.

図10および図11に、上記の印刷用メタルマスク版1の製造方法を示す。まず、図10(a)に示すごとく、導電性を有するステンレス製の電鋳母型13の表面にフォトレジスト層47を形成したうえで、該フォトレジスト層47の上に、開孔3に対応する透光孔49aを有するパターンフィルム49(ガラスマスク)を密着させたのち、紫外光ランプ17で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を溶解除去することにより、図10(b)に示すごとく、開孔3に対応するレジスト体50aを有する一次パターンレジスト50を電鋳母型13上に形成した。なお、フォトレジスト層47は、ネガタイプの感光性ドライフィルムレジストを、所定の高さに合わせて一枚ないし数枚ラミネートして熱圧着により形成したものを用いた。   10 and 11 show a method for manufacturing the printing metal mask plate 1 described above. First, as shown in FIG. 10A, a photoresist layer 47 is formed on the surface of a stainless steel electroforming mother die 13 having conductivity, and then the hole 3 is formed on the photoresist layer 47. After the pattern film 49 (glass mask) having the translucent hole 49a is adhered, exposure is performed by irradiating with ultraviolet light with the ultraviolet lamp 17, and development and drying are performed to dissolve unexposed portions. By removing, a primary pattern resist 50 having a resist body 50a corresponding to the opening 3 was formed on the electroformed mother die 13 as shown in FIG. The photoresist layer 47 was formed by laminating one or several negative photosensitive dry film resists according to a predetermined height and then thermocompression bonding.

次に、図10(c)に示すごとく、レジスト体50aの無い電鋳母型13上に、電着金属としてのニッケル−コバルトを電着させることにより、第1層45となる一次電着層51を電鋳形成した。   Next, as shown in FIG. 10C, a primary electrodeposition layer to be the first layer 45 is formed by electrodepositing nickel-cobalt as an electrodeposition metal on the electroforming mother die 13 without the resist body 50a. 51 was electroformed.

図11(a)に示すごとく、レジスト体50aの無い一次電着層51の全面に、フォトレジスト層52を形成したうえで、該フォトレジスト層52の上に、凹部5に対応する透光孔53aを有するパターンフィルム53(ガラスマスク)を密着させたのち、紫外光ランプ17で紫外線光を照射して露光を行い、現像、乾燥の各処理を行って、未露光部分を除去することにより、図11(b)に示すごとく、一次電着層51上の所定位置に、凹部5の凹みパターンに対応するレジスト体55aを有する二次パターンレジスト55を形成した。   As shown in FIG. 11A, a photoresist layer 52 is formed on the entire surface of the primary electrodeposition layer 51 without the resist body 50a, and then a light transmitting hole corresponding to the recess 5 is formed on the photoresist layer 52. After closely adhering the pattern film 53 (glass mask) having 53a, exposure is performed by irradiating ultraviolet light with the ultraviolet light lamp 17, development and drying are performed, and unexposed portions are removed, As shown in FIG. 11B, a secondary pattern resist 55 having a resist body 55 a corresponding to the recess pattern of the recess 5 was formed at a predetermined position on the primary electrodeposition layer 51.

次に、図11(c)に示すごとく、レジスト体50a・55aの無い一次電着層51の表面に、電鋳により電着金属を電着させて、第2層46となる二次電着層56を形成した。ここでは、ニッケルを電着金属として、二次電着層56を形成した。   Next, as shown in FIG. 11 (c), the electrodeposition metal is electrodeposited by electroforming on the surface of the primary electrodeposition layer 51 without the resist bodies 50a and 55a, so that the second electrode 46 is formed. Layer 56 was formed. Here, the secondary electrodeposition layer 56 was formed using nickel as an electrodeposition metal.

二次電着層56の表面に対して研磨処理を施して、その高さ寸法を揃えたうえで、図11(d)に示すごとく、レジスト体50a・55aを除去した。かかるレジスト体50aの除去により開孔3が形成され、レジスト体55aの除去により凹部5が形成された。最後に電鋳母型13から一次および二次電着層51・56を剥離した。これにて、図11(d)および図9に示すごとく、一次および二次電着層51・56である第1および第2層45・46からなる二層構造の基板2内に、開孔3と凹部5とを有する印刷用メタルマスク版1を得た。   The surface of the secondary electrodeposition layer 56 was subjected to a polishing process, and the heights were made uniform, and then the resist bodies 50a and 55a were removed as shown in FIG. 11 (d). The opening 3 was formed by removing the resist body 50a, and the recess 5 was formed by removing the resist body 55a. Finally, the primary and secondary electrodeposition layers 51 and 56 were peeled from the electroformed mother die 13. Thus, as shown in FIG. 11 (d) and FIG. 9, an opening is formed in the substrate 2 having a two-layer structure composed of the first and second layers 45 and 46 as the primary and secondary electrodeposition layers 51 and 56. The metal mask plate 1 for printing which has 3 and the recessed part 5 was obtained.

上記各実施形態においては、ニッケル−コバルトやニッケルなどを電着金属として、各電着層を形成していたが、本発明において使用できる電着金属はこれに限られない。   In each of the above embodiments, each electrodeposition layer is formed using nickel-cobalt, nickel, or the like as an electrodeposition metal, but the electrodeposition metal that can be used in the present invention is not limited thereto.

本発明の第1実施形態に係る印刷用メタルマスク版の使用態様例を示す縦断側面図1 is a longitudinal side view showing an example of how the printing metal mask plate according to the first embodiment of the present invention is used. 印刷用メタルマスク版の全体斜視図Overall perspective view of metal mask plate for printing 本発明の第1実施形態に係る印刷用メタルマスク版の製造方法の工程説明図Process explanatory drawing of the manufacturing method of the metal mask plate for printing concerning a 1st embodiment of the present invention. 本発明の第1実施形態に係る印刷用メタルマスク版の製造方法の工程説明図Process explanatory drawing of the manufacturing method of the metal mask plate for printing concerning a 1st embodiment of the present invention. 本発明の第2実施形態に係る印刷用メタルマスク版の縦断側面図Vertical side view of a printing metal mask plate according to a second embodiment of the present invention 本発明の第2実施形態に係る印刷用メタルマスク版の製造方法の工程説明図Process explanatory drawing of the manufacturing method of the metal mask plate for printing which concerns on 2nd Embodiment of this invention. 本発明の第2実施形態に係る印刷用メタルマスク版の製造方法の工程説明図Process explanatory drawing of the manufacturing method of the metal mask plate for printing which concerns on 2nd Embodiment of this invention. 本発明の第2実施形態に係る印刷用メタルマスク版の製造方法の工程説明図Process explanatory drawing of the manufacturing method of the metal mask plate for printing which concerns on 2nd Embodiment of this invention. 本発明の第3実施形態に係る印刷用メタルマスク版の縦断側面図Vertical sectional side view of a printing metal mask plate according to a third embodiment of the present invention 本発明の第3実施形態に係る印刷用メタルマスク版の製造方法の工程説明図Process explanatory drawing of the manufacturing method of the metal mask plate for printing concerning a 3rd embodiment of the present invention. 本発明の第3実施形態に係る印刷用メタルマスク版の製造方法の工程説明図Process explanatory drawing of the manufacturing method of the metal mask plate for printing concerning a 3rd embodiment of the present invention.

符号の説明Explanation of symbols

1 印刷用メタルマスク版
2 基板
3 開孔
5 実装部品の逃げ用の凹部
6 天板
13 電鋳母型
19a レジスト体
20 一次電着層
25a レジスト体
25b レジスト体
26 二次電着層
35a レジスト体
35b レジスト体
36 二次電着層
40a レジスト体
40b レジスト体
41 三次電着層
45 第1層
46 第2層
50a レジスト体
51 一次電着層
55a レジスト体
56二次電着層
DESCRIPTION OF SYMBOLS 1 Metal mask plate 2 for printing 2 Board | substrate 3 Opening 5 Recess 6 for escape of mounting components Top plate 13 Electroforming mother die 19a Resist body 20 Primary electrodeposition layer 25a Resist body 25b Resist body 26 Secondary electrodeposition layer 35a Resist body 35b resist body 36 secondary electrodeposition layer 40a resist body 40b resist body 41 tertiary electrodeposition layer 45 first layer 46 second layer 50a resist body 51 primary electrodeposition layer 55a resist body 56 secondary electrodeposition layer

Claims (5)

基板(2)に、所望の印刷パターンにパターニングされた開孔(3)と、実装部品逃げ用の凹部(5)とを有する印刷用メタルマスク版の製造方法において、
平板状の電鋳母型(13)の所定位置に、前記凹部(5)の形成箇所に対応するレジスト体(19a)を形成する工程と、
電鋳母型(13)上のレジスト体(19a)で覆われていない表面に、電鋳により前記凹部(5)の上方を塞ぐ天板(6)となる一次電着層(20)を電鋳により形成する工程と、
一次電着層(20)上に凹部(5)の凹みパターンに対応するレジスト体(25a)を形成するとともに、電鋳母型(13)上に開孔(3)の開孔パターンに対応するレジスト体(25b)を形成する工程と、
電鋳母型(13)および一次電着層(20)上のレジスト体(25a・25b)で覆われていない表面に、電鋳により基板(2)となる二次電着層(26)を形成する工程と、
電鋳母型(13)から一次および二次電着層(20・26)を剥離する工程とを含むことを特徴とする印刷用メタルマスク版の製造方法。
In the manufacturing method of the metal mask plate for printing which has the opening (3) patterned by the desired printing pattern in the board | substrate (2), and the recessed part (5) for escape of mounting components,
Forming a resist body (19a) corresponding to a position where the concave portion (5) is formed at a predetermined position of the plate-shaped electroformed mother die (13);
A primary electrodeposition layer (20) serving as a top plate (6) that covers the upper part of the recess (5) by electroforming is applied to the surface of the electroforming mold (13) that is not covered with the resist body (19a). Forming by casting;
A resist body (25a) corresponding to the recess pattern of the recesses (5) is formed on the primary electrodeposition layer (20) and also corresponds to the opening pattern of the openings (3) on the electroforming mother die (13). Forming a resist body (25b);
A secondary electrodeposition layer (26) that becomes a substrate (2) by electroforming is formed on the surface of the electroforming mold (13) and the primary electrodeposition layer (20) not covered with the resist bodies (25a, 25b). Forming, and
And a step of peeling the primary and secondary electrodeposition layers (20, 26) from the electroforming mold (13).
基板(2)に、所望の印刷パターンにパターニングされた開孔(3)と、実装部品逃げ用の凹部(5)とを有する印刷用メタルマスク版の製造方法において、
平板状の電鋳母型(13)の所定位置に、前記凹部(5)の形成箇所に対応するレジスト体(19a)を形成する工程と、
電鋳母型(13)上のレジスト体(19a)で覆われていない表面に、電鋳により前記凹部(5)の上方を塞ぐ天板(6)となる一次電着層(20)を電鋳により形成する工程と、
一次電着層(20)上に凹部(5)の凹みパターンに対応するレジスト体(35a)を形成するとともに、一次電着層(20)の無い電鋳母型(13)の全面を覆うレジスト体(35b)を形成する工程と、
レジスト体(35a・35b)の無い一次電着層(20)の表面に、電鋳により所定の高さ寸法を有する二次電着層(36)を形成する工程と、
レジスト体(35a・35b)を除去したのち、一次電着層(20)上に凹部(5)の凹みパターンに対応するレジスト体(40a)を形成するとともに、電鋳母型(13)上に開孔(3)の開孔パターンに対応するレジスト体(40b)を形成する工程と、
電鋳母型(13)上のレジスト体(40a・40b)で覆われていない表面、および二次電着層(36)の表面に、電鋳により基板(2)となる三次電着層(41)を形成する工程と、
電鋳母型(13)から一次、二次および三次電着層(20・36・41)を剥離する工程とを含むことを特徴とする印刷用メタルマスク版の製造方法。
In the manufacturing method of the metal mask plate for printing which has the opening (3) patterned by the desired printing pattern in the board | substrate (2), and the recessed part (5) for escape of mounting components,
Forming a resist body (19a) corresponding to a position where the concave portion (5) is formed at a predetermined position of the plate-shaped electroformed mother die (13);
A primary electrodeposition layer (20) serving as a top plate (6) that covers the upper part of the recess (5) by electroforming is applied to the surface of the electroforming mold (13) that is not covered with the resist body (19a). Forming by casting;
A resist body (35a) corresponding to the recess pattern of the recesses (5) is formed on the primary electrodeposition layer (20), and the resist covers the entire surface of the electroformed mother die (13) without the primary electrodeposition layer (20). Forming a body (35b);
Forming a secondary electrodeposition layer (36) having a predetermined height dimension by electroforming on the surface of the primary electrodeposition layer (20) without the resist bodies (35a, 35b);
After removing the resist bodies (35a and 35b), a resist body (40a) corresponding to the recess pattern of the recesses (5) is formed on the primary electrodeposition layer (20), and on the electroforming mother mold (13). Forming a resist body (40b) corresponding to the opening pattern of the opening (3);
On the surface of the electroforming mold (13) that is not covered with the resist body (40a, 40b) and the surface of the secondary electrodeposition layer (36), a third electrodeposition layer ( 41),
And a step of peeling the primary, secondary and tertiary electrodeposition layers (20, 36, 41) from the electroforming mold (13).
スキージ面となる第1層(45)と印刷対象物との接触面となる第2層(46)とからなる二層構造の基板(2)に、所望の印刷パターンにパターニングされた開孔(3)と、実装部品逃げ用の凹部(5)とを有する印刷用メタルマスク版の製造方法において、
平板状の電鋳母型(13)の所定位置に、開孔(3)の開孔パターンに対応するレジスト体(50a)を形成する工程と、
電鋳母型(13)上のレジスト体(50a)で覆われていない表面に、電鋳により第1層(45)となる一次電着層(51)を形成する工程と、
一次電着層(51)上に、凹部(5)の凹みパターンに対応するレジスト体(55a)を形成する工程と、
一次電着層(51)上のレジスト体(55a)で覆われていない表面に、電鋳により第2層(46)となる二次電着層(56)を形成する工程と、
電鋳母型(13)から一次および二次電着層(51・56)を剥離する工程とを含むことを特徴とする印刷用メタルマスク版の製造方法。
Openings (patterned in a desired printing pattern) on a substrate (2) having a two-layer structure comprising a first layer (45) serving as a squeegee surface and a second layer (46) serving as a contact surface between the printing object. 3) and a manufacturing method of a printing metal mask plate having a recess (5) for escaping the mounted component,
Forming a resist body (50a) corresponding to the opening pattern of the openings (3) at a predetermined position of the flat-plate electroformed mother mold (13);
Forming a primary electrodeposition layer (51) to be a first layer (45) by electroforming on the surface of the electroforming mold (13) not covered with the resist body (50a);
Forming a resist body (55a) corresponding to the recess pattern of the recess (5) on the primary electrodeposition layer (51);
Forming a secondary electrodeposition layer (56) to be a second layer (46) by electroforming on the surface of the primary electrodeposition layer (51) not covered with the resist body (55a);
And a step of peeling the primary and secondary electrodeposition layers (51, 56) from the electroforming mother mold (13).
第1層(45)である一次電着層(51)がニッケル−コバルトを電鋳してなるものであり、第2層(46)である二次電着層(56)がニッケルを電鋳してなるものである請求項3記載の印刷用メタルマスク版の製造方法。   The primary electrodeposition layer (51) as the first layer (45) is formed by electroforming nickel-cobalt, and the secondary electrodeposition layer (56) as the second layer (46) is electroformed with nickel. The method for producing a metal mask plate for printing according to claim 3. 基板(2)に、所望の印刷パターンにパターニングされた開孔(3)と、実装部品逃げ用の凹部(5)とを有する印刷用メタルマスク版であって、
スキージ面側が平面で、被印刷物面側に段差があることを特徴とする印刷用メタルマスク版。
A printing metal mask plate having an opening (3) patterned in a desired printing pattern on a substrate (2) and a recess (5) for escape of a mounted component,
A metal mask plate for printing, characterized in that the squeegee surface side is flat and the substrate surface side has a step.
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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010247500A (en) * 2009-04-20 2010-11-04 Sonocom Co Ltd Mask and method of manufacturing the same
CN103203955A (en) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 A hybrid production process for a step stencil
KR101775375B1 (en) * 2011-03-29 2017-09-06 삼성전자주식회사 Manufacturing method of semiconductor light emitting device and mask for paste application used for the same
CN114193911A (en) * 2021-12-14 2022-03-18 江苏盛矽电子科技有限公司 Screen printing plate with strong bonding property and manufacturing process thereof
CN115802633A (en) * 2022-11-28 2023-03-14 福莱盈电子股份有限公司 Electroplating uniformity method of circuit board

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JPH0642204U (en) * 1992-11-20 1994-06-03 日本ケミコン株式会社 Solder mask with solder adhesion prevention function
JP2000141934A (en) * 1998-11-10 2000-05-23 Noritake Co Ltd Screen plate for printing thick film

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JPS51118059U (en) * 1975-03-19 1976-09-25
JPH05208571A (en) * 1992-01-31 1993-08-20 Fujitsu Isotec Ltd Multi-layer metal mask
JPH0642204U (en) * 1992-11-20 1994-06-03 日本ケミコン株式会社 Solder mask with solder adhesion prevention function
JP2000141934A (en) * 1998-11-10 2000-05-23 Noritake Co Ltd Screen plate for printing thick film

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010247500A (en) * 2009-04-20 2010-11-04 Sonocom Co Ltd Mask and method of manufacturing the same
KR101775375B1 (en) * 2011-03-29 2017-09-06 삼성전자주식회사 Manufacturing method of semiconductor light emitting device and mask for paste application used for the same
CN103203955A (en) * 2012-01-16 2013-07-17 昆山允升吉光电科技有限公司 A hybrid production process for a step stencil
CN114193911A (en) * 2021-12-14 2022-03-18 江苏盛矽电子科技有限公司 Screen printing plate with strong bonding property and manufacturing process thereof
CN115802633A (en) * 2022-11-28 2023-03-14 福莱盈电子股份有限公司 Electroplating uniformity method of circuit board
CN115802633B (en) * 2022-11-28 2023-12-26 福莱盈电子股份有限公司 Electroplating uniformity method of circuit board

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