JP2018099897A - Metal mask for screen printing - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a metal mask for screen printing capable of forming precisely a printed layer of a desired printing pattern with a proper amount of a printing paste, by optimizing the shape of an adjustment opening to a pattern opening.SOLUTION: In a metal mask for screen printing including a mask plate 5 having a group of pattern openings 1, and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1, an adjustment rib 9 for connecting each opening inner surface is formed in the adjustment opening 3, and the ratio of a thickness dimension between the squeegee plate 6 and the mask plate 5 is set at 1:1.5 to 1:5.SELECTED DRAWING: Figure 1

Description

  The present invention comprises a metal mask used for forming a fine printed pattern such as an internal electrode of a ceramic capacitor by a screen printing method, in particular a mask plate and a squeegee plate, both plates being formed of a metal material. The present invention relates to a metal mask and a manufacturing method thereof.

  This type of metal mask for screen printing includes a mask plate in which a pattern opening is formed in a desired print pattern, and a squeegee plate that is formed integrally with the mask plate and forms a squeegee surface. In the squeegee plate, an adjustment opening for adjusting the supply amount of a printing paste such as a solder paste or conductive ink supplied to the pattern opening is formed for each pattern opening. A metal mask having such a mask plate and a squeegee plate has a form in which the mask plate is formed from a resin material such as polyimide, and the squeegee plate is formed from a metal material such as nickel. It is known that both plates are formed using a metal material as a raw material. The former metal mask can be seen in Patent Document 1 and the latter metal mask can be seen in Patent Document 2.

Japanese Patent Laid-Open No. 11-042867 JP 05-085077 A

  When screen printing is performed, a metal mask is placed on the surface of the print target, and the print paste placed on one side of the metal mask is pushed out to the print target side while moving with a squeegee, and printing that matches the print pattern Form a layer. At this time, the supply amount of the printing paste to the pattern opening is adjusted by the adjustment opening, and the printing layer is formed with the optimum amount of the printing paste for the printing pattern. During screen printing, the metal mask is repeatedly placed on and peeled from the surface to be printed. Therefore, in the mask for screen printing of Patent Document 1 in which the mask plate is formed of a resin material such as polyimide, the surface of the mask plate is easily worn during friction between the printing object and the mask during printing or during mask cleaning. There was a problem with durability.

  In that respect, the screen printing plate of Patent Document 2 in which the mask plate is formed of a metal material can reduce wear on the surface of the mask plate and can exhibit sufficient durability. However, in the screen printing plate according to Patent Document 2, as shown in FIGS. 21 and 22, a pattern opening 102 that matches the print pattern is formed in the first metal film 101, and the second metal film 103 has a pattern opening 102. An adjustment opening 104 that fits within the outer shape of the pattern opening 102 is formed. In such an opening structure, the second metal film 103 protrudes to the upper side of the opening peripheral portion of the pattern opening 102. Therefore, when the printing paste is pushed out to the printing target W side with a squeegee during screen printing, a ring-shaped gap 105 is formed around the printing paste supplied from above as shown in FIG. Air may remain and the printed layer may not be formed according to the printed pattern.

  Even when the printing paste is properly filled in the pattern openings 102, as shown in FIG. 22, when the screen printing plate is peeled from the printing object W, a part of the printing paste is peeled off together with the screen printing plate. The printed layer may not be formed properly. This is because the printing paste adheres to the corners 106 formed in the adjacent portions of the first metal film 101 and the second metal film 103 with the surface tension of the paste itself. Accordingly, the shape of the printing layer becomes distorted, resulting in a decrease in printing quality. When the print quality is deteriorated, when the final product is, for example, a ceramic capacitor, the capacity as designed cannot be exhibited. In addition, when the printing paste is adsorbed on the screen printing plate, it is necessary to clean the screen printing plate to remove the printing paste, which reduces printing efficiency.

An object of the present invention is to provide a metal mask for screen printing capable of optimizing the shape of the adjustment opening with respect to the pattern opening and accurately forming a printing layer having a desired printing pattern with an appropriate amount of printing paste. is there.
The objective of this invention is providing the manufacturing method of the metal mask for screen printing which can reduce the manufacturing defect rate at the time of manufacturing a metal mask, and can reduce the manufacturing cost of a metal mask.

  The metal mask for screen printing according to the present invention includes a mask plate 5 having a group of pattern openings 1 and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1. -Each of 6 is formed of a metal material. The adjustment opening 3 is formed with adjustment ribs 9 that connect the inner surfaces of the openings. The opening shape of the adjustment opening 3 is the same as the opening shape of the pattern opening 1 or slightly larger than the opening shape of the pattern opening 1.

  The opening shape of the adjustment opening 3 is formed to be similar to the opening shape of the pattern opening 1, and the stepped portion 8 is formed between the opening inner surface of the adjustment opening 3 and the opening peripheral wall of the pattern opening 1. . The width dimension w1 of the stepped portion 8 is set to 1 μm or more and 15 μm or less.

  The opening shape of the adjustment opening 3 is formed to be the same as the opening shape of the pattern opening 1. An adjustment opening peripheral edge portion 49 that enters the adjustment opening 3 and constitutes the opening inner surface of the adjustment opening 3 is integrally formed on the mask plate 5, and the opening inner surfaces of both openings 1 and 3 are formed to be flush with each other.

  The adjustment rib 9 is composed of a first rib 9a and a second rib 9b formed in a straight line. The first rib 9a and the second rib 9b are arranged so as to cross each other.

  As shown in FIG. 1, the present invention includes a mask plate 5 having a group of pattern openings 1 and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1. 6 is a method for manufacturing a metal mask for screen printing in which each of 6 is formed of a metal material, and the opening shape of the adjustment opening 3 is formed to be similar to the opening shape of the pattern opening 1; The metal mask is formed through a primary electroforming process for forming the first electroformed layer 24, a secondary electroforming process for forming the second electroformed layer 34, and a peeling process. In the primary electroforming process, a first photoresist layer 21 is formed on the upper surface of a flat electroforming mold 20, and a first pattern film 22 having a light transmitting hole corresponding to the adjustment opening 3 is formed on the first photoresist film 21. A step of exposing the first photoresist layer 21 after being placed on the upper surface of the layer 21 to form a first resist body 23 corresponding to the opening shape of the adjustment opening 3, and a first resist on the electroforming mother die 20; Forming a first electroformed layer 24 to be the squeegee plate 6 in which the group of adjustment openings 3 are formed on the surface not covered with the body 23 by an electroforming method. In the secondary electroforming process, a second photoresist layer 31 is formed on the upper surfaces of the first electroformed layer 24 and the first resist body 23, and a second pattern film 32 having a light transmitting hole corresponding to the pattern opening 1 is formed. After placing the second photoresist layer 31 on the upper surface, the second photoresist layer 31 is exposed to form a second resist body 33 corresponding to the opening shape of the pattern opening 1, and the first electroformed layer 24 Forming a second electroformed layer 34 to be a mask plate 5 in which a group of pattern openings 1 are formed on the surface of the first resist body 23 not covered with the second resist body 33 by electroforming. including. The peeling step includes a step of peeling the first and second electroformed layers 24 and 34 from the electroformed mother die 20. Thus, as shown in FIG. 1, a screen printing metal mask in which a stepped portion 8 is formed between the inner surface of the adjustment opening 3 and the opening peripheral wall of the pattern opening 1 can be obtained.

  In addition, as shown in FIG. 9, the present invention includes a mask plate 5 having a group of pattern openings 1 and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1. Each of the plates 5 and 6 is a method of manufacturing a metal mask for screen printing in which each of the plates 5 and 6 is formed of a metal material and formed so that the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide with each other. The metal mask is formed through a primary electroforming process for forming the first electroformed layer 24, an intermediate treatment process, a secondary electroforming process for forming the second electroformed layer 34, and a peeling process. The In the primary electroforming process, a first photoresist layer 21 is formed on the upper surface of the plate-shaped electroforming mold 20, and a first pattern film 22 having a light transmitting hole corresponding to the opening shape of the adjustment opening 3 is formed on the first pattern film 22. A step of exposing the first photoresist layer 21 after being placed on the upper surface of the first photoresist layer 21 to form a first resist body 23 corresponding to the opening shape of the adjustment opening 3; Forming a first electroformed layer 24 to be a squeegee plate 6 in which a group of adjustment openings 3 are formed on a surface not covered with the first resist body 23 by an electroforming method. The intermediate processing step includes a step of removing the first resist body 23 on the electroforming mother die 20 and a step of filling the adjustment opening 3 exposed by removing the first resist body 23 with the photoresist 41. In the secondary electroforming process, a second photoresist layer 31 is formed on the upper surface of the first electroforming layer 24 and the photoresist 41 filled in the adjustment opening 3, and a second pattern having a light transmitting hole corresponding to the pattern opening 1 is formed. After the film 32 is placed on the upper surface of the second photoresist layer 31, the second photoresist layer 31 and the photoresist 41 are simultaneously exposed to form a second resist body corresponding to the opening shapes of the pattern opening 1 and the adjustment opening 3. 33 and a third resist body 43, and a second mask plate 5 in which a group of pattern openings 1 are formed on the surface of the first electroformed layer 24 not covered with the second resist body 33. Forming the electroformed layer 34 by electroforming. The peeling step includes a step of peeling the first and second electroformed layers 24 and 34 from the electroformed mother die 20. As a result, as shown in FIG. 9, a metal mask for screen printing in which the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide can be obtained.

  In addition, as shown in FIG. 12, the present invention includes a mask plate 5 having a group of pattern openings 1 and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1. Each of the plates 5 and 6 is a method of manufacturing a metal mask for screen printing in which each of the plates 5 and 6 is formed of a metal material and formed so that the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide with each other. The metal mask is formed through a primary electroforming process for forming the first electroformed layer 24, an intermediate treatment process, a secondary electroforming process for forming the second electroformed layer 34, and a peeling process. The In the primary electroforming process, the first photoresist layer 21 is formed on the upper surface of the flat electroforming mold 20, and the transparent opening corresponding to the opening shape of the dummy opening 45 larger than the opening shape of the adjustment opening 3 by a predetermined dimension. A dummy pattern film 46 having light holes is placed on the upper surface of the first photoresist layer 21, and then the first photoresist layer 21 is exposed to form a dummy resist body 47 corresponding to the opening shape of the dummy opening 45. A step of forming a first electroformed layer 24 to be a squeegee plate 6 in which a group of dummy openings 45 are formed on the surface of the electroformed mother die 20 not covered with the dummy resist body 47 by electroforming. Including. The intermediate processing step includes a step of removing the dummy resist body 47 of the electroformed mother die 20 and a step of filling the photoresist 41 in the dummy opening 45 exposed by removing the dummy resist body 47. In the secondary electroforming process, a second photoresist layer 31 is formed on the upper surface of the photoresist 41 filled in the first electroformed layer 24 and the dummy opening 45, and a second pattern having a light transmitting hole corresponding to the pattern opening 1 is formed. After the film 32 is placed on the upper surface of the second photoresist layer 31, the second photoresist layer 31 and the photoresist 41 are simultaneously exposed to form a second resist body corresponding to the opening shapes of the pattern opening 1 and the adjustment opening 3. 33 and the third resist body 43, and a group of pattern openings 1 on the surface of the electroforming mother die 20 and the first electroforming layer 24 that are not covered with the second and third resist bodies 33 and 43. And a step of forming the second electroformed layer 34 that penetrates into the dummy opening 45 and forms the adjustment opening peripheral edge portion 49 by electroforming. Thus, as shown in FIG. 12, the metal mask for screen printing in which the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide and the peripheral edge portion 49 of the adjustment opening enters the dummy opening 45 is removed. Can be obtained.

  The photoresist 41 can take a form that is a liquid photoresist having fluidity.

  The metal mask for screen printing according to the present invention includes a mask plate 5 having a group of pattern openings 1 each formed of a metal material, and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1. The opening shape of the adjustment opening 3 is the same as the opening shape of the pattern opening 1 or slightly larger than the opening shape of the pattern opening 1. According to this, since the squeegee plate 6 does not protrude toward the upper side of the opening peripheral portion of the pattern opening 1, when the metal mask is placed on the printing object W, a ring that cannot be avoided in the conventional metal mask. It is possible to eliminate the formation of the gaps and the corners in the shape. Therefore, it is possible to accurately form a print layer having a desired print pattern with an appropriate amount of print paste without causing air to remain in the gap or peeling of the print paste at the corners.

  The opening shape of the adjustment opening 3 was formed to be similar to the opening shape of the pattern opening 1 to form a stepped portion 8 between the opening inner surface of the adjustment opening 3 and the opening peripheral wall of the pattern opening 1. According to this, for example, when a metal mask having a two-layer structure is manufactured integrally by electroforming, even if the relative positions of the resist bodies forming the pattern openings 1 and the adjustment openings 3 are slightly shifted, As long as the deviation amount does not exceed the width dimension w <b> 1 of the stepped-down portion 8, it is possible to eliminate the squeegee plate 6 being pushed out to the upper side of the opening peripheral portion of the pattern opening 1. Further, when the mask plate 5 and the squeegee plate 6 are separately manufactured and integrated with an adhesive or the like, the position accuracy when the plates 5 and 6 are bonded together is only the width dimension w1 of the stepped portion 8. Since there is a margin, bonding can be performed without strictly defining the alignment. The width dimension w1 of the stepped portion 8 is preferably set to 1 μm or more and 15 μm or less. If the thickness is less than 1 μm, the stepped portion 8 is hardly formed, and if it exceeds 15 μm, the printing paste may adhere to the stepped portion 8 during printing, and the printing paste adheres to the stepped portion 8. In this case, the amount of print paste that is wasted is increased.

  The opening shape of the adjustment opening 3 is formed to be the same as the opening shape of the pattern opening 1, and an adjustment opening peripheral portion 49 that enters the adjustment opening 3 and constitutes the opening inner surface of the adjustment opening 3 is integrally formed in the mask plate 5. The inner surfaces of the openings 1 and 3 were flush with each other. According to this, since both the inner surfaces of the openings 1 and 2 are formed by the mask plate 5, no step is formed at the boundary between the inner surfaces of the openings 1 and 3, and both the openings 1 and 3 are formed. The inner surface can be smoothly and continuously made.

  If the first rib 9a and the second rib 9b are arranged so as to cross each other, the ribs 9a and 9b can support each other and the structural strength of the adjusting rib 9 can be improved. Therefore, when the squeegee S passes over the adjustment rib 9 during printing, the adjustment rib 9 and the opening edge of the adjustment opening 3 are prevented from being bent and deformed toward the pattern opening 1, thereby preventing the adjustment rib 9 from being damaged. .

  In the manufacturing method of the metal mask for screen printing in which the opening shape of the adjustment opening 3 of the present invention according to claim 5 is formed to be similar to the opening shape of the pattern opening 1, the pattern is formed in the primary electroforming process. After forming the squeegee plate in which the adjustment opening 3 formed to be similar to the opening shape of the opening 1 is formed, the mask plate 5 in which the pattern opening 1 is formed in the secondary electroforming process. According to this, even when the placement position of the second pattern film 32 with respect to the first resist body 23 is slightly shifted when placing the second pattern film 32 on the upper surface of the second photoresist layer 31, both As long as the dimensional difference between the openings 1 and 2 does not exceed half, the squeegee plate 6 does not protrude to the upper side of the peripheral edge of the pattern opening 1, so that the positioning accuracy of the second pattern film 32 can be afforded. Therefore, it is possible to reduce the processing defect occurrence rate when manufacturing the metal mask and reduce the manufacturing cost of the metal mask. In addition, since the formation position of the second resist body 33 relative to the first resist body 23 can be confirmed from above after the formation of the second resist body 33, the formation position of the second resist body 33 is greatly displaced. In some cases, the subsequent electrodeposition process can be omitted by treating it as a defective product.

  In the manufacturing method of the metal mask for screen printing formed so that the opening shape of the adjustment opening 3 of the present invention according to claim 6 and the opening shape of the pattern opening 1 may coincide with each other, A metal mask is formed through an intermediate processing step, a secondary electroforming step, and a peeling step. Then, in the intermediate processing step, a step of removing the first resist body 23 of the electroformed mother die 20 and a step of filling the photoresist 41 in the adjustment opening 3 exposed by removing the first resist body 23 are performed. I did it. According to this, peeling of the 2nd resist body 33 at the time of forming the 2nd electroformed layer 34 can be prevented, and the 2nd electroformed layer 34 of a desired shape can be formed.

  Specifically, when a metal mask is manufactured by electroforming, the first electroforming step for forming the first electroformed layer 24 is followed by the first step for smoothing the upper surface of the first electroformed layer 24. There is a case where a polishing process for polishing the upper surfaces of the electroformed layer 24 and the first resist body 23 is performed. During the polishing step, a defect portion such as a crack or a defect may occur in the first resist body 23. When the second photoresist layer 31 is formed by the secondary electroforming process on the first resist body 23 in a state where the defect portion is generated, air is sealed between the first resist body 23 and the second photoresist layer 31. End up. In this state, when the second electroformed layer 34 is formed after forming the second resist body 33, the electroforming plating solution in the electroforming bath is kept at a high temperature in the electroforming method. The air enclosed between the first resist body 23 and the second resist body 33 expands, and the second resist body 33 is peeled off from the first resist body 23 to form the second electroformed layer 34 in a desired shape. Can not do it. However, even when cracks or defects occur in the first resist body 23 in the polishing process, the first resist body 23 is removed by performing an intermediate processing step, and then the photoresist 41 is newly filled into the adjustment opening 3. The air can be prevented from being enclosed between the first and second resist bodies 23 and 33, and the second electroformed layer 34 can be reliably formed in a desired shape. In addition, since the metal mask can be manufactured by the same manufacturing method regardless of the presence or absence of the polishing step, the manufacturing cost can be reduced by unifying the manufacturing line.

  In the manufacturing method of the metal mask for screen printing formed so that the opening shape of the adjustment opening 3 of the present invention according to claim 7 and the opening shape of the pattern opening 1 may coincide with each other, A metal mask is formed through an intermediate processing step, a secondary electroforming step, and a peeling step. In the primary electroforming process, a dummy opening 45 larger than the opening shape of the adjustment opening 3 by a predetermined dimension was formed. Further, in the secondary electroforming process, the photoresist 41 and the second photoresist layer 31 in the dummy opening 45 are exposed at the same time, and the second resist body 33 corresponding to the opening shapes of the pattern opening 1 and the adjustment opening 3 and After forming the third resist body 43, the second electroformed layer 34 that penetrates into the mask plate 5 and the dummy opening and becomes the adjustment opening peripheral portion 49 was formed by electroforming.

  According to the manufacturing method as described above, since the photoresist 41 and the second photoresist layer 31 in the dummy opening 45 are exposed simultaneously, the outer shape of the second resist body 33 and the outer shape of the third resist body 43 are changed. Can be matched perfectly. Thereby, the formation position and opening shape of the adjustment opening 3 and the pattern opening 1 are completely matched by forming the mask plate 5 and the second electroformed layer 34 to be the adjustment opening peripheral edge portion 49 by electroforming. Can do. In addition, since both the peripheral edge of the adjustment opening 49 and the peripheral edge of the pattern opening 1 are formed of the second electroformed layer 34, no step is formed at the boundary between the openings 1 and 3. Further, since the dummy opening 45 is formed larger than the pattern opening 1, the mounting position of the second pattern film 32 is such that the position of the light transmitting hole corresponding to the pattern opening 1 does not exceed the outer peripheral edge of the dummy opening 45. Even if there is a margin in the range and the mounting position of the second pattern film 32 is slightly shifted, no step is formed at the boundary between the openings 1 and 2, and the rate of processing defects during manufacturing is reduced. Thus, the manufacturing cost of the metal mask can be reduced. In addition, since the dummy resist body 47 is removed and the photoresist 41 is filled in the dummy opening 45 by performing an intermediate processing step, the second electroformed layer 34 caused by the defective portion of the dummy resist body 47 is formed. The second resist body 33 can be prevented from being peeled off, and the second electroformed layer 34 having a desired shape can be formed.

  When the photoresist 41 is a liquid photoresist having fluidity, the exposed adjustment opening 3 can be easily filled as compared with the case where a solid photoresist is used. Therefore, the filling operation of the photoresist 41 into the adjustment opening 3 during the intermediate processing can be easily performed, and the manufacturing time can be shortened.

It is a vertical side view which shows the usage example of the metal mask for screen printing which concerns on 1st Embodiment of this invention. It is the whole metal mask top view, and the enlarged view of pattern opening and adjustment opening. It is a perspective view of a metal mask. It is a vertical side view which shows the state in which the printing layer was formed in the printing object. It is explanatory drawing which shows the primary electroforming process of the metal mask for screen printing which concerns on 1st Embodiment of this invention. It is explanatory drawing which shows the secondary electroforming process and peeling process of the metal mask for screen printing which concerns on 1st Embodiment of this invention. It is a partial enlarged plan view of a metal mask. It is a top view which shows a cut mark opening. It is a vertical side view which shows the usage example of the metal mask for screen printing which concerns on 2nd Embodiment of this invention. It is explanatory drawing which shows the primary electroforming process and intermediate treatment process of the metal mask for screen printing which concern on 2nd Embodiment of this invention. It is explanatory drawing which shows the secondary electroforming process and peeling process of the metal mask for screen printing which concerns on 2nd Embodiment of this invention. It is a vertical side view which shows the usage example of the metal mask for screen printing which concerns on 3rd Embodiment of this invention. It is explanatory drawing which shows the primary electroforming process and intermediate treatment process of the metal mask for screen printing concerning 3rd Embodiment of this invention. It is explanatory drawing which shows the secondary electroforming process and peeling process of the metal mask for screen printing which concerns on 3rd Embodiment of this invention. It is a top view of the pattern opening and adjustment opening which concern on 4th Embodiment of this invention. It is a perspective view of the metal mask which concerns on 4th Embodiment of this invention. It is a vertical side view which shows the metal mask for screen printing which concerns on 5th Embodiment of this invention. It is a top view of the pattern opening which concerns on 5th Embodiment of this invention. It is explanatory drawing which shows the secondary electroforming process and peeling process of the metal mask for screen printing which concerns on 5th Embodiment of this invention. It is a top view which shows the cut mark opening which concerns on 6th Embodiment of this invention. It is a vertical side view which shows the formation aspect of the printing layer in the conventional metal mask for screen printing. It is a vertical side view which shows the formation aspect of the printing layer in the conventional metal mask for screen printing.

First Embodiment FIGS. 1 to 8 show a first embodiment of a screen printing metal mask (hereinafter simply referred to as a metal mask) according to the present invention. In the present invention, “front / rear”, “left / right”, and “upper / lower” refer to the cross arrows shown in FIGS. The metal mask of this embodiment is used to print and form the internal electrodes constituting the multilayer ceramic capacitor on the surface of the ceramic film to be printed W by screen printing. In FIG. 2, the metal mask is formed in a square shape with a side of 250 mm, and when the mask is divided into four quadrants, pattern formation regions M are divided into the respective quadrants. Pattern opening 1 is formed. In addition, the metal mask has a group of cut mark openings for printing a cut mark used to cut the print target W into a predetermined shape in a process after screen printing so as to surround the pattern formation region M. A cut mark forming region C in which 2 is formed is partitioned. The metal mask is attached to the mask fixing portion of the screen printing apparatus with the mask alone or with the frame bonded to the four peripheral edges of the mask.

  As shown in FIG. 1, the metal mask includes a mask plate 5 having a group of pattern openings 1 and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1. The squeegee plate 6 constitutes a squeegee surface 7. When printing, the print paste placed on the squeegee surface 7 is squeezed with the squeegee S so that the print paste passes through the adjustment opening 3 and the pattern opening 1 and the cut mark opening. 2, the printing layer PP and the cut mark CM that match the pattern opening 1 and the cut mark opening 2 are formed on the surface of the print target W (see FIG. 7). The squeegee S forms a printing layer while moving from the front side to the rear side of the metal mask in a state where the tip of the squeegee S is in contact with the squeegee surface 7. The “printing paste” here is a concept including solder paste, cream solder, liquid solder, conductive ink, and the like.

  The thickness dimension t1 of the mask plate 5 is preferably set to 6 μm or more and 100 μm or less, and the thickness dimension t2 of the squeegee plate 6 is preferably set to 3 μm or more and 20 μm or less. If the thickness dimension t1 of the mask plate 5 is less than 6 μm, the thickness of the printed layer PP to be printed becomes too thin, and if it exceeds 100 μm, the thickness dimension of the metal mask becomes too thick. Further, if the thickness dimension t2 of the squeegee plate 6 is less than 3 μm, the thickness dimension of the adjusting rib 9 described later is thin and the strength cannot be ensured. It is because it becomes difficult to get it. The ratio of the thickness dimension between the squeegee plate 6 and the mask plate 5 is preferably set from 1: 1.5 to 1: 5. In the present embodiment, the thickness dimension t1 of the mask plate 5 is set to 9 μm, and the thickness dimension t2 of the squeegee plate 6 is set to 6 μm.

As shown in FIG. 2, the opening shape of the pattern opening 1 formed in the mask plate 5 is formed in a horizontally long rectangular shape with rounded corners, and is arranged in a lattice shape in the pattern forming region M. ing. The opening shape of the adjustment opening 3 formed in the squeegee plate 6 above the pattern opening 1 is
It is set slightly larger than the opening shape of the pattern opening 1. Specifically, the opening shape of the adjustment opening 3 is formed to be similar to the opening shape of the pattern opening 1. Thereby, as shown in FIG. 1, a stepped portion 8 is formed between the inner surface of the adjustment opening 3 and the opening peripheral wall of the pattern opening 1. When the opening shape of the adjustment opening 3 is formed so that the centers of the pattern opening 1 and the adjustment opening 3 coincide with each other, the width dimension w1 of the stepped portion 8 is preferably set to 1 μm or more and 15 μm or less. If the width dimension w1 of the stepped portion 8 is less than 1 μm, the stepped portion 8 is hardly formed, and the relative position shift between the first pattern film 22 and the second pattern film 32 at the time of manufacturing a metal mask to be described later. This is because the dimensional accuracy at the time of manufacture needs to be highly controlled because the allowable value of the value becomes small. If the thickness exceeds 15 μm, the printing paste may adhere to the stepped portion 8 at the time of printing. If the printing paste adheres to the stepped portion 8, the amount of printing paste that is wasted is increased. is there. More preferably, it may be set to 2 μm or more and 12 μm or less. In the present embodiment, the width dimension w1 of the stepped portion 8 is set to 10 μm. The pattern opening 1 has a long side dimension of 0.25 mm and a short side dimension of 0.05 mm. The upper and lower formation pitch dimensions are 0.10 mm, and the left and right formation pitches are 0.2 mm. Set to 30 mm.

  In order to adjust the amount of printing paste supplied to the pattern opening 1, an adjustment opening 3 is formed in the squeegee plate 6 above the pattern opening 1. As shown in FIGS. 2 and 3, the adjustment opening 3 is formed with an adjustment rib 9 that extends from the inner wall surface of the opening periphery of the adjustment opening 3 and partially covers the upper surface of the pattern opening 1. The adjustment ribs 9 are formed so as to bridge the opening peripheral edges of the opposing long sides, so that the four linear adjustment ribs 9 have different extending directions between adjacent adjustment ribs 9. Is formed. That is, the adjustment ribs 9 adjacent to each other are formed so as to be inclined in opposite directions. The connecting portion between the base end of the adjustment rib 9 and the inner surface of the adjustment opening 3 is rounded, and the tensile stress generated in the front-rear direction of the metal mask due to friction between the squeegee S and the squeegee surface 7 during squeezing. The metal mask is prevented from being concentrated on the connecting portion. The adjustment rib 9 covers the upper portion of the pattern opening 1 to reduce the opening ratio, thereby adjusting the amount of the printing paste pushed out to the pattern opening 1. In the present embodiment, when the opening ratio of the pattern opening 1 is 100, the opening ratio of the adjustment opening 3 is set to 60.

  The width w2 of the adjusting rib 9 is preferably set to 8 μm or more and 20 μm or less. If it is less than 8 μm, it is difficult to ensure the strength of the adjustment rib 9. If it exceeds 20 μm, the area of the pattern opening 1 covered with one adjustment rib 9 is too large, and the printing paste is applied to the pattern opening 1. This is because it becomes difficult to charge evenly. Moreover, it is preferable to set the angle with respect to the long side direction of the pattern opening 1 of the adjusting rib 9 which inclines to 20 to 70 degree | times. This is because if the angle is less than 20 degrees, the formation length of the adjustment rib 9 becomes long, so that the strength is reduced and the metal mask may be damaged. If the angle exceeds 70 degrees, the opening ratio of the pattern opening 1 When the width dimension w2 of the adjustment rib 9 is the same, it is necessary to form more adjustment ribs 9 as compared with the case where the angle is small. This is because processing defects are likely to occur during manufacturing. In this embodiment, the width w2 of the adjustment rib 9 is set to 8 μm, and the angle of the pattern opening 1 with respect to the long side direction is set to 60 degrees.

  As shown in FIG. 8, the opening shape of the cut mark opening 2 formed in the mask plate 5 is formed in a horizontally long rectangular shape with rounded corners, and a notch 11 is formed on one side portion thereof. Is formed. The group of cut mark openings 2 are formed in parallel along the longitudinal direction of the cut mark formation region C. The cut mark opening 2 is oriented to the left and right in the cut mark formation region C that is long in the front and back direction, with one side where the notch 11 is formed positioned on the left side, and in the cut mark formation region C that is long in the left and right The one side on which 11 is formed is oriented in the front-rear direction in a state of being located on the rear side.

  In the squeegee plate 6 above the cut mark opening 2, a cut mark adjustment opening 12 is formed as shown in FIG. The opening shape of the cut mark adjustment opening 12 is set to be slightly larger than the opening shape of the cut mark opening 2 similarly to the adjustment opening 3. Specifically, the opening shape of the cut mark adjustment opening 12 is formed to be similar to the opening shape of the cut mark opening 2. As a result, a stepped portion 13 is formed between the opening inner surface of the cut mark adjustment opening 12 and the opening peripheral wall of the cut mark opening 2. When the opening shape of the cut mark adjustment opening 12 is formed so that the centers of the pattern opening 1 and the adjustment opening 3 coincide, it is preferable that the width dimension w3 of the stepped portion 13 is set to 1 μm or more and 15 μm or less. More preferably, the width dimension w3 of the stepped portion 13 is set to 2 μm or more and 12 μm or less. In the present embodiment, the width dimension w3 of the stepped portion 13 is set to 10 μm. The cut mark opening 2 has a long side dimension of 2.0 mm and a short side dimension of 0.07 mm, and the dimension of the adjacent pitch p1 is set to 2.8 mm.

  Similar to the adjustment opening 3 of the pattern opening 1, an adjustment rib 15 is formed on the squeegee plate 6 above the cut mark adjustment opening 12, and the adjustment rib 15 for the cut mark adjustment opening 12 is formed in a rhombus mesh shape. Has been. The connecting portion between the base end of the adjustment rib 15 and the inner surface of the cut mark adjustment opening 12 is rounded, and the tension generated in the front-rear direction of the metal mask due to friction between the squeegee S and the squeegee surface 7 during squeezing. The stress is prevented from concentrating on the connecting portion and damaging the metal mask. The width dimension of the adjustment rib 15 is preferably formed in the same dimension as the adjustment rib 9 formed in the adjustment opening 3 of the pattern opening 1.

  Further, the connection side portion 14 that connects the bottom side portion of the notch 11 and the long side portion of the cut mark adjustment opening 12 is formed so as to gently connect the bottom side portion and the long side portion. In this way, by forming the connection side portion 14 so as to be gently connected, the tensile stress generated in the front-rear direction of the metal mask due to the friction between the squeegee S and the squeegee surface 7 during squeezing is applied to the connection side portion. It is possible to prevent the metal mask from concentrating on 14 and being damaged. In the present embodiment, the connection angle θ1 formed by the bottom side of the notch and the connection side 14 is 45 degrees. The connection angle θ1 is preferably set to 10 degrees or more and 90 degrees or less. If the connection angle θ1 is less than 10 degrees, the shape of the printed layer by the notch portion serving as a reference position at the time of cutting becomes unclear, and it becomes difficult to perform a cutting operation in a later process. This is because if the angle exceeds 90 degrees, the squeegee S may be caught on the connection side 14 when the squeegee S passes, and the metal mask may be damaged. More preferably, the connection angle θ1 is set to 30 degrees or more and 60 degrees or less.

  5 and 6 show a method for manufacturing the metal mask of this embodiment. The metal mask includes a primary electroforming process shown in FIGS. 5A to 5D, a secondary electroforming process shown in FIGS. 6A to 6C, and a peeling process shown in FIG. 6D. Formed through. In the primary electroforming process, as shown in FIG. 5 (a), a first photoresist layer 21 is formed on the upper surface of a conductive plate-shaped stainless steel electroforming mold 20, and then the first electroforming process is performed. A first pattern film 22 having a light transmitting hole corresponding to the adjustment opening 3 is placed on and adhered to the upper surface of one photoresist layer 21. Next, exposure is performed by irradiating ultraviolet light with an ultraviolet light lamp 19, development and drying are performed, and unexposed portions are dissolved and removed, thereby adjusting the opening 3 as shown in FIG. A first resist body 23 corresponding to the above was formed on the electroformed mother die 20. The first photoresist layer 21 was formed by laminating one or several negative photosensitive dry film resists according to a predetermined height and then thermocompression bonding.

  Next, as shown in FIG. 5C, the squeegee plate 6 is formed by electrodepositing nickel-cobalt as an electroforming metal on the electroforming mother mold 20 other than the first resist body 23 by electroforming. The first electroformed layer 24 was formed by electroforming. After the first electroformed layer 24 is formed by electroforming, the surfaces of the first resist body 23 and the first electroformed layer 24 are polished, whereby the first resist body 23 and the first resist body 23 and the first electroformed layer 24 are polished as shown in FIG. The surface of the electroformed layer 24 was smoothed.

  In the secondary electroforming process, as shown in FIG. 6A, after the second photoresist layer 31 is formed on the upper surfaces of the first resist body 23 and the first electroformed layer 24, the second photoresist is formed. A second pattern film 32 having a light transmitting hole corresponding to the pattern opening 1 is placed on and adhered to the upper surface of the layer 31. Next, exposure is performed by irradiating ultraviolet light with an ultraviolet light lamp 19, development and drying are performed, and the unexposed portions are dissolved and removed, thereby removing the pattern openings 1 as shown in FIG. A second resist body 33 corresponding to the above was formed on the first resist body 23 and the first electroformed layer 24. As with the first photoresist layer 21, the second photoresist layer 31 is formed by laminating one or several negative photosensitive dry film resists according to a predetermined height by thermocompression bonding. Was used.

  Next, as shown in FIG. 6C, nickel-cobalt as an electroformed metal is electrodeposited on the first resist body 23 and the first electroformed layer 24 other than the second resist body 33 by electroforming. Thus, the second electroformed layer 34 to be the mask plate 5 was formed by electroforming. Finally, after the surfaces of the second resist body 33 and the second electroformed layer 34 are polished, the first and second electroformed layers 24 and 34 are peeled off from the electroformed mother die 20 to obtain the first and second resists. By removing the bodies 23 and 33, a metal mask shown in FIG. 6D was obtained.

  As described above, in the metal mask of the present embodiment, the opening shape of the adjustment opening 3 of the squeegee plate 6 is slightly larger than the opening shape of the pattern opening 1 of the mask plate 5 as shown in FIG. Therefore, the squeegee plate 6 does not protrude to the upper side of the opening peripheral portion of the pattern opening 1, and when the metal mask is placed on the printing object W, the ring-shaped gap or the like that cannot be avoided in the conventional metal mask The formation of the corners can be eliminated. Accordingly, it is possible to eliminate the residual air in the gaps and the peeling of the print paste at the corners, and to accurately form a print layer having a desired print pattern with an appropriate amount of print paste.

  In the metal mask manufacturing method of the present embodiment, when the second pattern film 32 is placed on the upper surface of the second photoresist layer 31, the placement position of the second pattern film 32 with respect to the first resist body 23. Even if the position is slightly shifted, the squeegee plate 6 does not protrude above the peripheral edge of the pattern opening 1 as long as it does not exceed half of the dimensional difference between the openings 1 and 3, and the second pattern film 32 is positioned. There is room for accuracy. Therefore, it is possible to reduce the processing defect occurrence rate when manufacturing the metal mask and reduce the manufacturing cost of the metal mask. In addition, since the formation position of the second resist body 33 relative to the first resist body 23 can be confirmed from above after the formation of the second resist body 33, the formation position of the second resist body 33 is greatly displaced. In some cases, the subsequent electrodeposition process can be omitted by treating it as a defective product.

Second Embodiment FIGS. 9 to 11 show a second embodiment of a metal mask for screen printing according to the present invention. This embodiment is different from the first embodiment in that the opening shape of the pattern opening 1 and the opening shape of the adjustment opening 3 are formed the same. If the opening shape of the pattern opening 1 and the opening shape of the adjustment opening 3 are formed to be the same, no step is formed at the boundary between the pattern opening 1 and the adjustment opening 3 as shown in FIG. As a result, the squeegee plate 6 does not protrude to the upper side of the opening peripheral portion of the pattern opening 1, and when the metal mask is placed on the printing object W, a ring-shaped gap that is unavoidable in the conventional metal mask. And the formation of corners can be eliminated. Accordingly, it is possible to eliminate the residual air in the gaps and the peeling of the print paste at the corners, and to accurately form a print layer having a desired print pattern with an appropriate amount of print paste. Since others are the same as 1st Embodiment, the same code | symbol is attached | subjected to the same member and the description is abbreviate | omitted. The same applies to the following embodiments.

  10 and 11 show a method for manufacturing the metal mask of this embodiment. The metal mask includes a primary electroforming process shown in FIGS. 10 (a) to 10 (c), an intermediate treatment process shown in FIGS. 10 (d) to 10 (f), and a secondary process shown in FIGS. 11 (a) to 11 (c). It forms through an electroforming process and the peeling process shown in FIG.11 (d). In the primary electroforming process, as shown in FIG. 10 (a), a first photoresist layer 21 is formed on the upper surface of a conductive plate-shaped stainless steel electroforming mold 20, and then the first electroforming process is performed. A first pattern film 22 having a light transmitting hole corresponding to the adjustment opening 3 is placed on and adhered to the upper surface of one photoresist layer 21. Next, exposure is performed by irradiating ultraviolet light with an ultraviolet lamp 19, development and drying are performed, and unexposed portions are dissolved and removed, thereby adjusting the opening 3 as shown in FIG. A first resist body 23 corresponding to the above was formed on the electroformed mother die 20. The first photoresist layer 21 was formed by laminating one or several negative photosensitive dry film resists according to a predetermined height and then thermocompression bonding.

  Next, as shown in FIG. 10C, the squeegee plate 6 is formed by electrodepositing nickel-cobalt as an electroforming metal on the electroforming mother mold 20 other than the first resist body 23 by electroforming. The first electroformed layer 24 was formed by electroforming. After electroforming the first electroformed layer 24, the surfaces of the first resist body 23 and the first electroformed layer 24 were polished to smooth the surfaces of the first resist body 23 and the first electroformed layer 24. In addition, when the surface state of the first electroformed layer 24 does not require polishing, the polishing step can be omitted.

  In the intermediate processing step, as shown in FIG. 10 (d), after removing the first resist body 23 on the electroforming mother die 20 and exposing the adjustment opening 3, as shown in FIG. 10 (e), A liquid photoresist (photoresist) 41 was applied to the upper surfaces of the electroforming mother die 20 and the first resist body 23. Next, as shown in FIG. 10 (f), the unnecessary liquid photoresist 41 on the upper surface of the first resist body 23 was removed, and the liquid photoresist 41 was filled only into the adjustment opening 3.

  In the secondary electroforming process, as shown in FIG. 11A, the second photoresist layer 31 is formed on the upper surfaces of the liquid photoresist 41 and the first electroformed layer 24, and then the second photoresist layer. A second pattern film 32 having a light transmitting hole corresponding to the pattern opening 1 is placed on and adhered to the upper surface of 31. Next, the liquid photoresist 41 and the second photoresist layer 31 are exposed at the same time by irradiating with ultraviolet light from the ultraviolet light lamp 19, and development and drying are performed to dissolve and remove unexposed portions. 11B, the second resist body 33 and the third resist body 43 corresponding to the pattern opening 1 were formed on the electroforming mother die 20 and the first electroforming layer 24. As shown in FIG. As with the first photoresist layer 21, the second photoresist layer 31 is formed by laminating one or several negative photosensitive dry film resists according to a predetermined height by thermocompression bonding. Was used.

  Next, as shown in FIG. 11 (c), nickel-cobalt as an electroformed metal is electrodeposited on the first electroformed layer 24 other than the second resist body 33 by an electroforming method, thereby producing a mask plate. The second electroformed layer 34 to be 5 was formed by electroforming. Finally, after the surfaces of the second resist body and the second electroformed layer 34 are polished, the first and second electroformed layers 24 and 34 are peeled off from the electroforming mold 20, and the second and third resist bodies are removed. By removing 33 and 43, a metal mask shown in FIG. 11D was obtained.

  As described above, in the metal mask manufacturing method of the present embodiment, even if cracks or defects occur in the first resist body 23 in the polishing process, the first resist body 23 is removed by performing the intermediate treatment process. By newly filling the adjustment opening 3 with the liquid photoresist 41, air can be prevented from being sealed between the first and second resist bodies 23 and 33, and the second electroformed layer 34 can be securely formed. It can be formed into a desired shape. In addition, since the metal mask can be manufactured by the same manufacturing method regardless of the presence or absence of the polishing step, the manufacturing cost can be reduced by unifying the manufacturing line. Further, the photoresist filled in the exposed adjustment opening 3 can be easily filled into the adjustment opening 3 by using the liquid photoresist 41 as compared with the case where a solid photoresist is used.

(Third Embodiment) FIGS. 12 to 14 show a fourth embodiment of a metal mask for screen printing according to the present invention. In the present embodiment, the opening shape of the pattern opening 1 and the opening shape of the adjustment opening 3 are formed to be the same, and the mask plate 5 is formed to the squeegee plate 6 side, and the opening peripheral portion of the adjustment opening 3 is The point which formed with a part of 2 electroformed layer 34 differs from 1st Embodiment. As shown in FIG. 12, the mask plate 5 is integrally formed with an adjustment opening peripheral portion 49 that enters the adjustment opening 3 and constitutes the opening inner surface of the adjustment opening 3, and the openings of both openings 1 and 3 are formed. The inner surfaces are formed to be flush with each other. Thereby, the opening inner surfaces of the pattern opening 1 and the adjustment opening 3 can be smoothly continued without a boundary. Therefore, the squeegee plate 6 does not protrude to the upper side of the opening peripheral portion of the pattern opening 1, and when the metal mask is placed on the printing target W, the ring-shaped gap or the like that cannot be avoided in the conventional metal mask The formation of the corners can be eliminated. Accordingly, it is possible to eliminate the residual air in the gaps and the peeling of the print paste at the corners, and to accurately form a print layer having a desired print pattern with an appropriate amount of print paste.

  13 and 14 show a method for manufacturing the metal mask of this embodiment. The metal mask includes a primary electroforming process shown in FIGS. 13A to 13C, an intermediate processing process shown in FIGS. 13D to 13F, and a secondary process shown in FIGS. 14A to 14C. It forms through an electroforming process and the peeling process shown in FIG.14 (d). In the primary electroforming process, as shown in FIG. 13A, a first photoresist layer 21 is formed on the upper surface of a conductive plate-shaped stainless steel electroforming mold 20, and then the first electroforming process is performed. A dummy pattern film 46 having a light transmitting hole corresponding to the dummy opening 45 is placed on and adhered to the upper surface of the one photoresist layer 21. Next, exposure is performed by irradiating ultraviolet light with an ultraviolet lamp 19, development and drying are performed, and unexposed portions are dissolved and removed, as shown in FIG. A dummy resist body 47 corresponding to the above was formed on the electroformed mother die 20. The first photoresist layer 21 was formed by laminating one or several negative photosensitive dry film resists according to a predetermined height and then thermocompression bonding.

  Next, as shown in FIG. 13 (c), the squeegee plate 6 and the electroforming metal nickel-cobalt are electro-deposited on the electroforming mother mold 20 other than the dummy resist body 47 by electroforming. The first electroformed layer 24 was formed by electroforming. After electroforming the first electroformed layer 24, the surfaces of the dummy resist body 47 and the first electroformed layer 24 were polished to smooth the surfaces of the dummy resist body 47 and the first electroformed layer 24. In addition, when the surface state of the first electroformed layer 24 does not require polishing, the polishing step can be omitted.

  In the intermediate processing step, as shown in FIG. 13 (d), the dummy resist body 47 is removed on the electroforming mother die 20 to expose the dummy openings 45, and then the liquid is formed as shown in FIG. 13 (e). Photoresist 41 was applied to the upper surfaces of the electroforming mother mold 20 and the first electroforming layer 24. Next, unnecessary liquid photoresist 41 on the upper surfaces of the electroforming mother die 20 and the first electroforming layer 24 was removed, and the liquid photoresist 41 was filled only into the dummy openings 45.

  In the secondary electroforming process, as shown in FIG. 14A, the second photoresist layer 31 is formed on the upper surfaces of the liquid photoresist 41 and the first electroformed layer 24, and then the second photoresist layer. A second pattern film 32 having a light transmitting hole corresponding to the pattern opening 1 is placed on and adhered to the upper surface of 31. Next, the liquid photoresist 41 and the second photoresist layer 31 are exposed at the same time by irradiating with ultraviolet light from the ultraviolet light lamp 19, and development and drying are performed to dissolve and remove unexposed portions. As shown in FIG. 14B, the second resist body 33 and the third resist body 43 corresponding to the pattern opening 1 and the adjustment opening 3 were formed on the electroforming mother die 20 and the first electroforming layer 24. As with the first photoresist layer 21, the second photoresist layer 31 is formed by laminating one or several negative photosensitive dry film resists according to a predetermined height by thermocompression bonding. Was used.

  Next, as shown in FIG. 14C, a mask plate is obtained by electrodepositing nickel-cobalt as an electroformed metal on the first electroformed layer 24 other than the second resist body 33 by an electroforming method. 5 and the second electroformed layer 34 to be the adjustment opening peripheral portion 49 were formed by electroforming. The adjustment opening peripheral edge 49 in this state enters the dummy opening 45 as shown in FIG. Finally, after the surfaces of the second resist body 33 and the second electroformed layer 34 are polished, the first and second electroformed layers 24 and 34 are peeled off from the electroforming mother die 20 to obtain the second and third resists. The metal mask shown in FIG. 14D was obtained by removing the bodies 33 and 43.

  As described above, in the metal mask manufacturing method of the present embodiment, the liquid photoresist 41 and the second photoresist layer 31 in the dummy opening 45 are exposed at the same time. The outer shape of the three resist bodies 43 can be made to completely coincide with each other, and the adjustment opening 3 and the pattern opening 1 can be formed by forming the mask plate 5 and the second electroformed layer 34 to be the adjustment opening peripheral portion 49 by electroforming. And the opening position and the opening shape can be completely matched. Further, since the peripheral edge portion of the adjustment opening 49 and the peripheral edge portion of the pattern opening 1 are both formed by the second electroformed layer 34, no step is formed at the boundary portion between the two openings 1 and 2, and both the openings 1 and 2 are formed. The inner surface of 3 can be smoothly continued. Further, since the dummy opening 45 is formed larger than the pattern opening 1, the mounting position of the second pattern film 32 is such that the position of the light transmitting hole corresponding to the pattern opening 1 does not exceed the outer peripheral edge of the dummy opening 45. Even if there is a margin in the range and the mounting position of the second pattern film 32 is slightly shifted, no step is formed at the boundary between the openings 1 and 3, and the processing defect occurrence rate at the time of manufacture is reduced. Thus, the manufacturing cost of the metal mask can be reduced.

(Fourth Embodiment) FIGS. 15 and 16 show a fourth embodiment of a metal mask for screen printing according to the present invention. This embodiment is different from the first embodiment in that the shape of the adjustment rib 9 of the adjustment opening 3 is changed. The adjustment rib 9 includes a first rib 9a and a second rib 9b that are formed in a straight line. The first and second ribs 9a and 9b are arranged so as to cross each other, and are formed so as to connect the long sides facing each other of the adjustment opening 3. The connecting portion between the base end portion of each rib 9a and 9b and the inner surface of the adjustment opening 3 is rounded, and the tension generated in the front-rear direction of the metal mask due to friction between the squeegee S and the squeegee surface 7 during squeezing. The stress is prevented from concentrating on the connecting portion and damaging the metal mask.

  The first rib 9 a is formed in a state of being inclined counterclockwise by an inclination angle θ 2 with respect to the extending direction of the adjustment opening 3, and the second rib 9 b is clockwise with respect to the extending direction of the adjustment opening 3. The first rib 9a and the second rib 9b are disposed so that the ribs 9a and 9b intersect at the center of the first rib 9a and the second rib 9b. The inclination angle θ2 and the inclination angle θ3 are preferably set to be the same, and the angle is preferably set to 20 degrees or more and 70 degrees or less. This is because when the inclination angles θ2 and θ3 are less than 20 degrees, the formation length of the first and second ribs 9a and 9b becomes long, so that the strength is lowered and the metal mask may be damaged. This is because it is difficult to dispose the first and second ribs 9a and 9b so as to cross each other. In this embodiment, the inclination angles θ2 and θ3 are set to 30 degrees.

  As described above, when the first and second ribs 9a and 9b are arranged so as to cross each other, the ribs 9a and 9b can support each other to improve the structural strength of the adjusting rib 9, and can be adjusted during printing. When the squeegee S passes over the rib 9, it is possible to prevent the adjustment rib 9 and the opening edge of the adjustment opening 3 from being bent and deformed toward the pattern opening 1, thereby preventing the adjustment rib 9 from being damaged.

Fifth Embodiment FIGS. 17 to 19 show a fifth embodiment of a metal mask for screen printing according to the present invention. In this embodiment, the point which formed the support post 50 in the adjustment rib 9 differs from 1st Embodiment. As shown in FIGS. 17 and 18, the support post 50 is formed in a columnar shape and is integrally provided on the lower surface of the central portion in the longitudinal direction of the adjustment rib 9, and the lower surface portion is in contact with the printing object W. The adjustment rib 9 is supported from below during printing. Thereby, the deformation deformation of the adjustment rib 9 when the squeegee S passes over the adjustment opening 3 can be prevented, and the metal mask can be prevented from being damaged due to the deformation deformation of the adjustment rib 9. As shown in FIG. 19, the support post 50 is formed in the secondary electroforming process without exposing the portion of the second photoresist layer 31 corresponding to the support post 50 to the opening shape of the pattern opening 1 and the support post 50. After the corresponding second resist body 33 is formed, the second electroformed layer 34 to be the mask plate 5 can be formed by electroforming.

Sixth Embodiment FIG. 20 shows a sixth embodiment of a screen printing metal mask according to the present invention. In the present embodiment, the connection rib θ1 is formed so that the connection angle θ1 of the connection side portion 14 of the cut mark adjustment opening 12 is 90 degrees, and the adjustment rib 15 is connected to the long side portion and the connection side portion 14 of the cut mark adjustment opening 12. The point which extended from the connection position of this is different from the first embodiment. As the connection angle θ1 approaches 90 degrees, when the squeegee S passes, there is an increased risk that the squeegee S will be caught by the connection side portion 14. By setting the connection position with the portion 14, the connection side portion 14 can be reinforced by the adjustment rib 15, and the metal mask can be prevented from being damaged due to the squeegee S being caught on the connection side portion 14.

  In addition to the above embodiments, the inner surface of the pattern opening 1 is formed in a tapered shape so that the peelability between the printed layer and the inner surface of the pattern opening 1 when the metal mask is peeled after printing is improved. Can be improved. In this case, when the second pattern film 32 is placed and the second photoresist layer 31 is exposed, the light from the light source that has passed through the light transmission holes of the second pattern film 32 converges as it goes downward. The light source may be arranged to expose the second photoresist layer 31. The photoresist 41 may be filled in the adjustment opening 3 or the dummy opening 45 in the manufacturing process using a solid photoresist such as a photosensitive dry film resist.

DESCRIPTION OF SYMBOLS 1 Pattern opening 3 Adjustment opening 5 Mask plate 6 Squeegee plate 8 Step drop part 9 Adjustment rib 20 Electroforming mother mold 21 1st photoresist layer 22 1st pattern film 23 1st resist body 24 1st electroforming layer 31 2nd photo Resist layer 32 Second pattern film 33 Second resist body 34 Second electroformed layer 41 Liquid photoresist 43 Third resist body 45 Dummy opening 46 Dummy pattern film 47 Dummy resist body 49 Adjusting opening peripheral edge

The present invention relates to fine printed pattern such as internal electrodes of ceramic capacitors metal mask used for forming a screen printing method, a metal mask to obtain Bei and among them mask plate and the squeegee plate.

An object of the present invention is to provide a metal mask for screen printing capable of optimizing the shape of the adjustment opening with respect to the pattern opening and accurately forming a printing layer having a desired printing pattern with an appropriate amount of printing paste. There is .

Screen printing metal mask according to the present invention includes a mask plate 5 provided with a set of pattern opening 1, Ru Tei and a squeegee plate 6 provided with a set of adjustment apertures 3 corresponding to the pattern opening 1. The adjustment opening 3, the adjustment rib 9 that connects the open mouth faces are formed. The ratio of the thickness dimension between the squeegee plate 6 and the mask plate 5 is set from 1: 1.5 to 1: 5 . The thickness dimension t2 of the squeegee plate 6 is set to 3 μm or more and 20 μm or less. Further, the thickness dimension t1 of the mask plate 5 is set to 6 μm or more and 100 μm or less. Further, the opening shape of the adjustment opening 3 is formed larger than the opening shape of the pattern opening 1.

In addition, in the metal mask for screen printing according to the present invention, the opening shape of the adjustment opening 3 is formed to be similar to the opening shape of the pattern opening 1, and the inner surface of the adjustment opening 3 and the opening of the pattern opening 1 are formed. A stepped portion 8 is formed between the peripheral wall and the peripheral wall. According to this, when the mask plate 5 and the squeegee plate 6 are separately manufactured and integrated with an adhesive or the like, the width dimension of the stepped portion 8 is added to the positional accuracy when the plates 5 and 6 are bonded together. Since there is a margin of w1 minutes, the bonding can be performed without strictly defining the alignment. In addition, for example, when a metal mask having a two-layer structure is manufactured integrally by an electroforming method, even if the relative positions of the resist bodies forming the pattern openings 1 and the adjustment openings 3 are slightly shifted, the positional shift amount is small. As long as the width dimension w1 of the stepped portion 8 is not exceeded, the squeegee plate 6 can be prevented from protruding to the upper side of the peripheral edge of the pattern opening 1. The width dimension w1 of the stepped portion 8 is preferably set to 1 μm or more and 15 μm or less. If the thickness is less than 1 μm, the stepped portion 8 is hardly formed, and if it exceeds 15 μm, the printing paste may adhere to the stepped portion 8 during printing, and the printing paste adheres to the stepped portion 8. In this case, the amount of print paste that is wasted is increased.

Further, the opening shape of the adjustment opening 3 is formed to be the same as the opening shape of the pattern opening 1. Specifically, the adjustment opening peripheral edge 49 constituting the opening inner surface of the adjustment opening 3 is formed integrally with the mask plate 5, and the opening inner surfaces of both the openings 1 and 3 are formed to be flush with each other. According to this, since the inner surfaces of both openings 1 and 3 are both formed by the mask plate 5, no step is formed at the boundary between the inner surfaces of both openings 1 and 3, and both openings 1 and 3 are formed. The inner surface can be smoothly and continuously made.

The adjustment rib 9 is composed of a first rib 9a and a second rib 9b formed in a straight line. The first rib 9a and the second rib 9b are arranged so as to cross each other. According to this, both ribs 9a and 9b can support each other to improve the structural strength of the adjustment rib 9, and when the squeegee S passes over the adjustment rib 9 during printing, the adjustment rib 9 and the adjustment opening It is possible to prevent the opening edge of 3 from being bent and deformed toward the pattern opening 1, thereby preventing the adjustment rib 9 from being damaged.

In addition, as shown in FIG. 1, the method for manufacturing a metal mask for screen printing according to the present invention includes a mask plate 5 having a group of pattern openings 1 and a group of adjustment openings 3 corresponding to the pattern openings 1. The squeegee plate 6 is provided, each of the plates 5 and 6 is formed of a metal material, and the opening shape of the adjustment opening 3 is formed to be similar to the opening shape of the pattern opening 1. A metal mask manufacturing method for screen printing, wherein the metal mask includes a primary electroforming process for forming the first electroformed layer 24, a secondary electroforming process for forming the second electroformed layer 34, and a peeling process. And formed through. In the primary electroforming process, a first photoresist layer 21 is formed on the upper surface of a flat electroforming mold 20, and a first pattern film 22 having a light transmitting hole corresponding to the adjustment opening 3 is formed on the first photoresist film 21. A step of exposing the first photoresist layer 21 after being placed on the upper surface of the layer 21 to form a first resist body 23 corresponding to the opening shape of the adjustment opening 3, and a first resist on the electroforming mother die 20; Forming a first electroformed layer 24 to be the squeegee plate 6 in which the group of adjustment openings 3 are formed on the surface not covered with the body 23 by an electroforming method. In the secondary electroforming process, a second photoresist layer 31 is formed on the upper surfaces of the first electroformed layer 24 and the first resist body 23, and a second pattern film 32 having a light transmitting hole corresponding to the pattern opening 1 is formed. After placing the second photoresist layer 31 on the upper surface, the second photoresist layer 31 is exposed to form a second resist body 33 corresponding to the opening shape of the pattern opening 1, and the first electroformed layer 24 Forming a second electroformed layer 34 to be a mask plate 5 in which a group of pattern openings 1 are formed on the surface of the first resist body 23 not covered with the second resist body 33 by electroforming. including. The peeling step includes a step of peeling the first and second electroformed layers 24 and 34 from the electroformed mother die 20. Thus, as shown in FIG. 1, a screen printing metal mask in which a stepped portion 8 is formed between the inner surface of the adjustment opening 3 and the opening peripheral wall of the pattern opening 1 can be obtained. Thus, in the manufacturing method of the metal mask for screen printing in which the opening shape of the adjustment opening 3 is formed to be similar to the opening shape of the pattern opening 1, the opening of the pattern opening 1 is performed in the primary electroforming process. After forming the squeegee plate in which the adjustment opening 3 formed to be larger than the shape was formed, the mask plate 5 in which the pattern opening 1 was formed in the secondary electroforming process was formed. According to this, even when the placement position of the second pattern film 32 with respect to the first resist body 23 is slightly shifted when placing the second pattern film 32 on the upper surface of the second photoresist layer 31, both As long as the dimensional difference between the openings 1 and 2 does not exceed half, the squeegee plate 6 does not protrude to the upper side of the peripheral edge of the pattern opening 1, so that the positioning accuracy of the second pattern film 32 can be afforded. Therefore, it is possible to reduce the processing defect occurrence rate when manufacturing the metal mask and reduce the manufacturing cost of the metal mask. In addition, since the formation position of the second resist body 33 relative to the first resist body 23 can be confirmed from above after the formation of the second resist body 33, the formation position of the second resist body 33 is greatly displaced. In some cases, the subsequent electrodeposition process can be omitted by treating it as a defective product.

Further , as shown in FIG. 9, a mask plate 5 having a group of pattern openings 1 and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1 are provided. Each of which is made of a metal material, and is a method of manufacturing a metal mask for screen printing in which the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide with each other. Is formed through a primary electroforming process for forming the first electroformed layer 24, an intermediate treatment process, a secondary electroforming process for forming the second electroformed layer 34, and a peeling process. In the primary electroforming process, a first photoresist layer 21 is formed on the upper surface of the plate-shaped electroforming mold 20, and a first pattern film 22 having a light transmitting hole corresponding to the opening shape of the adjustment opening 3 is formed on the first pattern film 22. A step of exposing the first photoresist layer 21 after being placed on the upper surface of the first photoresist layer 21 to form a first resist body 23 corresponding to the opening shape of the adjustment opening 3; Forming a first electroformed layer 24 to be a squeegee plate 6 in which a group of adjustment openings 3 are formed on a surface not covered with the first resist body 23 by an electroforming method. The intermediate processing step includes a step of removing the first resist body 23 on the electroforming mother die 20 and a step of filling the adjustment opening 3 exposed by removing the first resist body 23 with the photoresist 41. In the secondary electroforming process, a second photoresist layer 31 is formed on the upper surface of the first electroforming layer 24 and the photoresist 41 filled in the adjustment opening 3, and a second pattern having a light transmitting hole corresponding to the pattern opening 1 is formed. After the film 32 is placed on the upper surface of the second photoresist layer 31, the second photoresist layer 31 and the photoresist 41 are simultaneously exposed to form a second resist body corresponding to the opening shapes of the pattern opening 1 and the adjustment opening 3. 33 and a third resist body 43, and a second mask plate 5 in which a group of pattern openings 1 are formed on the surface of the first electroformed layer 24 not covered with the second resist body 33. Forming the electroformed layer 34 by electroforming. The peeling step includes a step of peeling the first and second electroformed layers 24 and 34 from the electroformed mother die 20. As a result, as shown in FIG. 9, a metal mask for screen printing in which the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide can be obtained. Thus, in the manufacturing method of the metal mask for screen printing formed so that the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 may correspond, a primary electroforming process, an intermediate process process, A metal mask is formed through a secondary electroforming process and a peeling process. Then, in the intermediate processing step, a step of removing the first resist body 23 of the electroformed mother die 20 and a step of filling the photoresist 41 in the adjustment opening 3 exposed by removing the first resist body 23 are performed. I did it. According to this, peeling of the 2nd resist body 33 at the time of forming the 2nd electroformed layer 34 can be prevented, and the 2nd electroformed layer 34 of a desired shape can be formed. Specifically, when a metal mask is manufactured by electroforming, the first electroforming step for forming the first electroformed layer 24 is followed by the first step for smoothing the upper surface of the first electroformed layer 24. There is a case where a polishing process for polishing the upper surfaces of the electroformed layer 24 and the first resist body 23 is performed. During the polishing step, a defect portion such as a crack or a defect may occur in the first resist body 23. When the second photoresist layer 31 is formed by the secondary electroforming process on the first resist body 23 in a state where the defect portion is generated, air is sealed between the first resist body 23 and the second photoresist layer 31. End up. In this state, when the second electroformed layer 34 is formed after forming the second resist body 33, the electroforming plating solution in the electroforming bath is kept at a high temperature in the electroforming method. The air enclosed between the first resist body 23 and the second resist body 33 expands, and the second resist body 33 is peeled off from the first resist body 23 to form the second electroformed layer 34 in a desired shape. Can not do it. However, even when cracks or defects occur in the first resist body 23 in the polishing process, the first resist body 23 is removed by performing an intermediate processing step, and then the photoresist 41 is newly filled into the adjustment opening 3. The air can be prevented from being enclosed between the first and second resist bodies 23 and 33, and the second electroformed layer 34 can be reliably formed in a desired shape. In addition, since the metal mask can be manufactured by the same manufacturing method regardless of the presence or absence of the polishing step, the manufacturing cost can be reduced by unifying the manufacturing line.

As shown in FIG. 12, a mask plate 5 having a group of pattern openings 1 and a squeegee plate 6 having a group of adjustment openings 3 corresponding to the pattern openings 1 are provided. Each of which is made of a metal material, and is a method of manufacturing a metal mask for screen printing in which the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide with each other. Is formed through a primary electroforming process for forming the first electroformed layer 24, an intermediate treatment process, a secondary electroforming process for forming the second electroformed layer 34, and a peeling process. In the primary electroforming process, the first photoresist layer 21 is formed on the upper surface of the flat electroforming mold 20, and the transparent opening corresponding to the opening shape of the dummy opening 45 larger than the opening shape of the adjustment opening 3 by a predetermined dimension. A dummy pattern film 46 having light holes is placed on the upper surface of the first photoresist layer 21, and then the first photoresist layer 21 is exposed to form a dummy resist body 47 corresponding to the opening shape of the dummy opening 45. A step of forming a first electroformed layer 24 to be a squeegee plate 6 in which a group of dummy openings 45 are formed on the surface of the electroformed mother die 20 not covered with the dummy resist body 47 by electroforming. Including. The intermediate processing step includes a step of removing the dummy resist body 47 of the electroformed mother die 20 and a step of filling the photoresist 41 in the dummy opening 45 exposed by removing the dummy resist body 47. In the secondary electroforming process, a second photoresist layer 31 is formed on the upper surface of the photoresist 41 filled in the first electroformed layer 24 and the dummy opening 45, and a second pattern having a light transmitting hole corresponding to the pattern opening 1 is formed. After the film 32 is placed on the upper surface of the second photoresist layer 31, the second photoresist layer 31 and the photoresist 41 are simultaneously exposed to form a second resist body corresponding to the opening shapes of the pattern opening 1 and the adjustment opening 3. 33 and the third resist body 43, and a group of pattern openings 1 on the surface of the electroforming mother die 20 and the first electroforming layer 24 that are not covered with the second and third resist bodies 33 and 43. And a step of forming the second electroformed layer 34 that penetrates into the dummy opening 45 and forms the adjustment opening peripheral edge portion 49 by electroforming. Thus, as shown in FIG. 12, the metal mask for screen printing in which the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 coincide and the peripheral edge portion 49 of the adjustment opening enters the dummy opening 45 is removed. Can be obtained. Thus, in the manufacturing method of the metal mask for screen printing formed so that the opening shape of the adjustment opening 3 and the opening shape of the pattern opening 1 may correspond, a primary electroforming process, an intermediate process process, A metal mask is formed through a secondary electroforming process and a peeling process. In the primary electroforming process, a dummy opening 45 larger than the opening shape of the adjustment opening 3 by a predetermined dimension was formed. Further, in the secondary electroforming process, the photoresist 41 and the second photoresist layer 31 in the dummy opening 45 are exposed at the same time, and the second resist body 33 corresponding to the opening shapes of the pattern opening 1 and the adjustment opening 3 and After forming the third resist body 43, the second electroformed layer 34 that penetrates into the mask plate 5 and the dummy opening and becomes the adjustment opening peripheral portion 49 was formed by electroforming. According to this, since the photoresist 41 and the second photoresist layer 31 in the dummy opening 45 are exposed simultaneously, the outer shape of the second resist body 33 and the outer shape of the third resist body 43 are completely matched. Can do. Thereby, the formation position and opening shape of the adjustment opening 3 and the pattern opening 1 are completely matched by forming the mask plate 5 and the second electroformed layer 34 to be the adjustment opening peripheral edge portion 49 by electroforming. Can do. In addition, since both the peripheral edge of the adjustment opening 49 and the peripheral edge of the pattern opening 1 are formed of the second electroformed layer 34, no step is formed at the boundary between the openings 1 and 3. Further, since the dummy opening 45 is formed larger than the pattern opening 1, the mounting position of the second pattern film 32 is such that the position of the light transmitting hole corresponding to the pattern opening 1 does not exceed the outer peripheral edge of the dummy opening 45. Even if there is a margin in the range and the mounting position of the second pattern film 32 is slightly shifted, no step is formed at the boundary between the openings 1 and 2, and the rate of processing defects during manufacturing is reduced. Thus, the manufacturing cost of the metal mask can be reduced. In addition, since the dummy resist body 47 is removed and the photoresist 41 is filled in the dummy opening 45 by performing an intermediate processing step, the second electroformed layer 34 caused by the defective portion of the dummy resist body 47 is formed. The second resist body 33 can be prevented from being peeled off, and the second electroformed layer 34 having a desired shape can be formed.

In addition, the photoresist 41 can take the form of a liquid photoresist having fluidity. According to this, compared with the case where a solid photoresist is used, the exposed adjustment opening 3 can be easily filled, and the filling operation of the photoresist 41 into the adjustment opening 3 during the intermediate processing can be performed easily. This can be done and the manufacturing time can be shortened.

In screen printing metal mask of the present invention, the mask plate 5 having a pattern opening 1 of first group, and a squeegee plate 6 provided with a set of adjustment apertures 3 corresponding to the pattern opening 1, a squeegee plate 6 The ratio of the thickness dimension with respect to the mask plate 5 was set from 1: 1.5 to 1: 5 . According to this, it is possible to accurately form a printed layer of a desired print pattern with a suitable positive amount of printing paste.

Claims (1)

A mask plate (5) having a group of pattern openings (1) and a squeegee plate (6) having a group of adjustment openings (3) corresponding to the pattern openings (1) are provided. -Each of 6) is a metal mask for screen printing formed of a metal material,
The adjustment opening (3) is formed with adjustment ribs (9) that connect the inner surfaces of the openings facing each other.
A metal mask for screen printing, wherein the opening shape of the adjustment opening (3) is the same as the opening shape of the pattern opening (1) or slightly larger than the opening shape of the pattern opening (1).

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