JP2006133713A - Light guide plate pattern processing method and machine - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a light guide pattern processing method and machine to efficiently manufacture a light guide plate of various patterns and sizes in a short time by directly impacting the surface with chips. <P>SOLUTION: It includes a step of forming a pattern by inputting the position and size data of the designed pattern and impacting power data for them into an impacting machine having chips and punching the processing surface, and a step of checking the processing surface with a microscope and grinding the surface with a grinder if defective then processing the surface after adjusting the processing conditions. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a pattern processing method and an apparatus for a light guide plate by a striking method, and in particular, a guide that can be used to efficiently produce various patterns in a short time by directly striking a processed surface using a chip. The present invention relates to an optical plate pattern processing method and apparatus.

  Examples of generally known pattern realization methods include the following.

  1) An etching method in which a core of a mold for emitting a light guide plate is etched into a desired pattern shape to complete the core.

  2) A stamper method in which a pattern shape is engraved on a thin metal plate that has been plated, and this is attached to a mold for injection.

  3) A cutting method that creates a V-shaped group pattern on the surface of the light guide plate using a diamond tool.

  4) A laser method in which a laser is emitted on the surface of a light guide plate to engrave a pattern.

  However, the etching method has a limit in controlling the uniform etching depth and shape, and there is a problem that it takes a lot of time to correct and complement the pattern after injection. The stamper method uses a soft core material, shortens the life of the stamper, requires special care in handling the stamper, increases the production cost due to the expensive stamper, and corrects and complements the pattern after injection. Had the problem of taking a lot of time.

  In addition, the cutting method using a diamond tool has a problem that the defect rate is high, the handling is difficult, and the productivity is lowered. The laser processing method has a problem that the production cost is high and the productivity and the yield are reduced due to the deformation of the product due to high heat.

  Therefore, an object of the present invention is to provide a pattern processing method for a light guide plate, which can efficiently manufacture a light guide plate in various shapes and sizes in a short time by directly hitting a processing surface using a chip and its To provide an apparatus.

  The object is to input a designed pattern position, pattern size data and corresponding striking force data to a striking device with a diamond tip and strike the work surface to form a pattern, If there is an abnormality, the processing surface is extruded with a polishing machine, the processing conditions are adjusted, and the reworking step is included. This is achieved by a processing apparatus having a chip having a different shape.

  The present invention uses a chip to strike a processed surface that has been precisely mirror-finished by grinding with a striking force that has been converted into data on a designed pattern, so that a pattern with excellent light efficiency can be obtained in a short time. By enabling processing, the following effects are provided.

  1) Since the core processing surface is directly struck using a chip, the processing surface of the pattern is processed so as to have a roughness close to that of a mirror surface, suppressing irregular reflection to the maximum, reducing loss, and achieving the highest light efficiency. Can be obtained.

  2) Since patterns of various shapes and sizes can be processed according to the shape of the chip to be hit, various pattern designs can be attempted accordingly.

  3) By directly processing the pattern on the heat-treated high-strength light guide plate or injection core, the durability is improved and the production cost is also greatly reduced.

  4) With the same chip, the same pattern can always be processed by hitting using already input data, and the processing time can be reduced and the processing time can be shortened.

  5) Since the depth, size and density of the pattern can be easily adjusted simply by adjusting the striking force, the light guide plate closest to the result of the design and simulation can be manufactured in a short time.

  Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. FIG. 1 is a flowchart for explaining a pattern processing method of a light guide plate according to the present invention.

  The present invention includes a step of forming a pattern by inputting a designed pattern position, pattern size data, and corresponding hitting force data into a hitting device with a chip and hitting the processing surface, and a processing surface. The present invention relates to a pattern processing method for a light guide plate, which includes a step of confirming with a microscope and, if there is an abnormality, extruding a processed surface with a polishing machine, adjusting a processing condition, and reprocessing.

  A single crystal diamond or a super light alloy is used as the material of the tip of the hitting device that hits the machined surface.

  In the method in which the pattern is formed on the light guide plate by the engraving, the processing surface on which the chip is struck is the injection core, and in the method in which the pattern is formed on the light guide plate by the inscription, the processing surface on which the chip is struck is the light guide plate itself. .

  The light guide plate and the injection core are made of heat-treated high-strength Stavax material, and the processed surface of the light guide plate or the injection core suppresses irregular reflection as much as possible to reduce loss and obtain the best light efficiency. Then, the mirror surface treatment is performed so that the shape accuracy (PV) is 2 μm or less.

  The accuracy of the processed surface is directly related to the brightness and uniformity of the light guide plate. Polishing the processed surface to make a mirror surface is ultimately a basic condition for obtaining a product closest to the designed pattern.

  FIG. 2 is a view showing a pattern processing depth by a striking force of a chip mounted on the light guide plate pattern processing apparatus of the present invention. As shown in FIG. 2, the hitting force of the chip is proportional to the processing depth, and the hitting processing apparatus has data on the processing depth and the pattern size corresponding to the hitting force of the chip.

  3 shows a state in which the size of the pattern varies depending on the angle even if the shape of the chip is V-shaped as in FIG. 2, and FIG. 4 shows various shapes such as a circle, rhombus, pentagon, and hexagon. It is a figure which shows the state comprised in various forms.

  The fact that patterns of various shapes can be realized just by changing the chip in this way means that the pattern shape is limited to a circle or rhombus due to processing conditions, and this has an influence on the pattern design. In contrast, the present invention is not limited by the shape of the pattern when designing the pattern.

  Even when the tip of the tip is spherical, it is possible to realize patterns with different processing depths and sizes by simply changing the curvature.

  As described above, the present invention can greatly contribute to the manufacture of a light guide plate having an optimal light efficiency by allowing various patterns to be designed and tried simply by changing the chip. Be expected.

  In the present invention, when the light efficiency of the designed pattern is not as expected as a result of confirmation by a microscope, the processed surface is extruded with a polishing machine and mirror-finished, and then the impact force of the impact device is adjusted or the angle of the tip Since the depth, size and density of the pattern can be easily adjusted by adjusting the hitting interval and the like, the light guide plate closest to the result of the design and simulation can be manufactured in a short time.

  In the present invention, since the pattern is processed under the same conditions based on the already input pattern data and the hitting force data of the chip, the same pattern can be processed at all times. As a result, in the case of a 2.0 ″ small core, the pattern work could be completed within one hour.

  The table below is a comparison table of optical characteristics measured by injecting a light guide plate with a core produced by etching and a striking method according to the present invention for a pattern designed with the same design.

比較例２）

前記比較例１、２から確認されるように、本発明の打撃方式は、従来のエッチング方式と比較するとき、均一度において８〜１０％の向上した結果を得ることができる。 Comparative Example 1)

Comparative Example 2)

As can be seen from Comparative Examples 1 and 2, the hitting method of the present invention can obtain an 8 to 10% improvement in uniformity when compared with the conventional etching method.

  Although the present invention has been described by limiting it to a preferred embodiment, the present invention is not limited thereto, and various modifications can be made without departing from the technical idea of the present invention. That is.

It is a flowchart for demonstrating the pattern processing method of this invention. It is a figure which shows the change of the processing depth and size of the pattern by the striking force in this invention. It is a figure which shows the change of the pattern by the angle of the chip | tip in this invention. It is a figure which shows the change of the pattern shape by the shape of the chip | tip in this invention.

Claims (11)

By inputting the designed pattern position, pattern size data and corresponding impact force data into the impact device with a chip and hitting the machined surface, the pattern is formed and the machined surface is confirmed with a microscope. If there is an abnormality, the patterning method for the light guide plate includes a step of extruding the processed surface with a polishing machine, adjusting the processing conditions, and then reprocessing. 2. The light guide plate pattern processing method according to claim 1, wherein the processing surface is an injection core of the light guide plate. 2. The light guide plate pattern processing method according to claim 1, wherein the processing surface is a light guide plate. 2. The pattern processing method for a light guide plate according to claim 1, wherein the tip shape of the chip is the same polygon as the shape of the designed pattern. 2. The light guide plate pattern processing method according to claim 1, wherein the tip of the chip has the same spherical shape as the designed pattern shape and has the same curvature as the curvature of the spherical shape. 2. The light guide plate pattern processing method according to claim 1, wherein the processed surface is a mirror surface that is polished and has a shape accuracy (PV) of 2 [mu] m or less. A light guide plate pattern processing apparatus including a chip that strikes a processing surface by a designed pattern position, pattern size data, and corresponding hitting force data. The light guide plate pattern processing apparatus according to claim 7, wherein the chip is made of single crystal diamond. The light guide plate pattern processing apparatus according to claim 7, wherein the chip is made of cemented carbide. 8. The pattern processing apparatus for a light guide plate according to claim 7, wherein the tip shape of the chip is the same polygon as the shape of the designed pattern. 8. The pattern processing apparatus for a light guide plate according to claim 7, wherein the tip of the chip has the same spherical shape as the designed pattern shape and has the same curvature as the curvature of the spherical shape.

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