JP2006086442A - Stage device and exposure device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a stage device capable of preventing degradation of controllability, even when a substrate is enlarged and moving the substrate in a desired state. <P>SOLUTION: The stage device PST comprises a first stage 100 for moving a substrate holder PH for holding the substrate P in XY directions; a second stage 200 provided separately from the first stage 100 and moving in the XY directions, accompanying the movement of the first stage 100 and support force acting in the Z direction of the substrate holder PH; and a connection part C for connecting the first stage 100 and the substrate holder PH, relatively movably, regarding the Z direction. <P>COPYRIGHT: (C)2006,JPO&NCIPI

Description

  The present invention relates to a stage apparatus and an exposure apparatus that movably supports a substrate holder that holds a substrate.

Liquid crystal display devices and semiconductor devices are manufactured by a so-called photolithography technique in which a pattern formed on a mask is transferred onto a photosensitive substrate. An exposure apparatus used in this photolithography process includes a substrate stage that supports a substrate and moves two-dimensionally, and a mask stage that supports a mask having a pattern and moves two-dimensionally, and a pattern formed on the mask. Is transferred to the substrate via the projection optical system while sequentially moving the mask stage and the substrate stage. The exposure apparatus includes a batch exposure apparatus that simultaneously transfers the entire mask pattern onto the substrate, and a scanning exposure apparatus that continuously transfers the mask pattern onto the substrate while synchronously scanning the mask stage and the substrate stage. The two types are mainly known. Among these, when manufacturing a liquid crystal display device, a scanning exposure apparatus is mainly used from the request | requirement of the enlargement of a display area (refer patent document 1).
JP 2001-296667 A

  By the way, along with the recent demand for larger liquid crystal display devices, the exposure apparatus also becomes larger. However, as the substrate stage that moves while supporting the substrate becomes larger, the movement speed of the substrate stage increases and the positioning accuracy increases. The controllability deteriorates, for example, it becomes difficult to increase the accuracy of the. In order to reduce the influence of disturbance such as drive reaction force generated by vibration and movement of the substrate stage, it is conceivable to increase the rigidity of the substrate stage to improve controllability, but the entire apparatus including the substrate stage This leads to an increase in size. In addition, in the case where the substrate stage is configured to move two-dimensionally on the base member, when the substrate stage is increased in size, an uneven load accompanying the movement of the substrate stage is likely to act on the base member. For example, when the base member is integrated with a mask stage that supports the mask or a column that supports the projection optical system, the position of the mask stage or projection optical system supported by the column is also displaced by the bias load. Therefore, the exposure accuracy is deteriorated.

  The present invention has been made in view of such circumstances, and a stage device capable of preventing deterioration of controllability and moving the substrate in a desired state even when the substrate is enlarged, and a substrate using the stage device. It is an object of the present invention to provide an exposure apparatus that can expose the film with high accuracy.

  In order to solve the above-described problems, the present invention employs the following configuration corresponding to FIGS. 1 to 21 shown in the embodiment. However, the reference numerals with parentheses attached to each element are merely examples of the element and do not limit each element.

  The stage apparatus (PST) of the present invention is a stage apparatus that movably supports a substrate holder (PH) that holds a substrate (P), and the substrate holder (PH) is at least one direction in the horizontal plane (direction in the XY plane). The first stage (100) to be moved to) and the first stage (100) are provided separately, and move in at least one direction in the horizontal plane (direction in the XY plane) as the first stage (100) moves. In addition, a second stage (200) that supports a force acting in a direction (Z direction) intersecting the horizontal plane of the substrate holder (PH), a first stage (100), a substrate holder (PH), or a second stage ( 200) is connected to the horizontal plane (Z direction) so as to be movable relative to each other (C, 18).

  An exposure apparatus (EX) of the present invention includes a substrate holder (PH) that holds a substrate (P) in an exposure apparatus that exposes a pattern of a mask (M) onto a substrate (P) via a projection optical system (PL). A stage device that is movably supported is provided, and the stage device includes the stage device (PST) described above.

  According to the present invention, the second stage that supports the substrate holder that holds the substrate is provided separately from the first stage, and the force acting in the direction intersecting the horizontal plane of the substrate holder is supported by the second stage. Since the holder (or the second stage) is moved in the horizontal direction as the first stage is moved in the horizontal direction, the first stage for moving and positioning in the horizontal direction is downsized. The substrate holder (second stage) can be moved in the horizontal direction. Therefore, even if the first stage is configured to move on the base member, a large offset load does not act on the base member. In addition, by reducing the size of the first stage, it is possible to increase the accuracy of stage positioning in the horizontal direction and increase the moving speed, thereby improving controllability. Therefore, the substrate on the stage apparatus can be exposed with high accuracy. In addition, since the substrate holder (second stage) is connected to the first stage moving in the horizontal direction via the connecting portion, the first holder is prevented without obstructing the movement of the substrate holder in the direction intersecting the horizontal plane. As the stage moves in the horizontal direction, the substrate holder (second stage) can be moved in the horizontal direction.

  According to the present invention, it is possible to prevent deterioration of controllability even when the substrate is enlarged, and to move the substrate in a desired state, so that the substrate can be exposed with high accuracy.

<Description of schematic configuration of apparatus>
The stage apparatus and exposure apparatus of the present invention will be described below with reference to the drawings. First, the schematic configuration of the stage apparatus according to the present invention will be described with reference to the schematic diagrams of FIGS. FIGS. 1 and 2 are views schematically showing an example of a conventional configuration of an exposure apparatus provided with a stage apparatus, and FIGS. 3 and 4 schematically show an exposure apparatus provided with a stage apparatus according to the present invention. It is a figure.

  In the following description, the first direction in the horizontal plane is the X-axis direction, the second direction orthogonal to the first direction in the horizontal plane is the Y-axis direction, and the third direction orthogonal to the first and second directions. (That is, the vertical direction) is defined as the Z-axis direction. Further, the rotation (inclination) directions around the X axis, Y axis, and Z axis are the θX, θY, and θZ directions, respectively.

  In FIG. 1, an exposure apparatus EX1 includes a mask stage MST that supports a mask M, a substrate stage PST that supports a substrate P, and an illumination optical system IL that illuminates the mask M supported by the mask stage MST with exposure light EL. And a projection optical system PL for projecting and exposing the pattern image of the mask M illuminated with the exposure light EL onto the substrate P supported by the substrate stage PST (main stage 100). The substrate stage PST includes a main stage 100 and a substage 200.

  Here, in the present embodiment, as an example, a case where a scanning type exposure apparatus that exposes the pattern formed on the mask M onto the substrate P while synchronously moving the mask M and the substrate P in a predetermined direction is used as the exposure apparatus. explain. In the following description, the X-axis direction is a synchronous movement direction (scanning direction) between the mask M and the substrate P, and the Y-axis direction is a non-scanning direction.

  The exposure apparatus EX1 has a substrate holder PH that holds the substrate P, and the substrate holder PH is provided on the main stage 100 of the substrate stage PST. The main stage 100 is provided on the main base PB1. Between the main stage 100 and the main base PB1, a gas bearing PA1 which is a slider or a non-contact bearing for movably supporting the main stage 100 with respect to the main base PB1 is interposed. It can move in the horizontal direction (XY direction) on the main base PB1. The main stage 100 also includes a drive mechanism that drives the substrate holder PH holding the substrate P in the Z-axis direction and the θX and θY directions.

  The main base PB1 is integrally coupled to the column 10 that supports the mask stage MST and the projection optical system PL. The main base PB1 is disposed on the floor surface D via a vibration isolating unit 11 that reduces vibration. The column 10 has an upper support portion 10A and a leg portion 10B, and a mask stage surface plate MB for movably supporting the mask stage MST is provided on the upper support portion 10A. Mask stage MST is supported by upper support portion 10A of column 10 via surface plate MB. Between the mask stage MST and the surface plate MB is interposed a slider or a non-contact bearing gas bearing MA for movably supporting the mask stage MST with respect to the surface plate MB, and includes a linear motor or the like. The mask stage MST moves on the surface plate MB in the horizontal direction (XY direction) by driving of the driving device. The projection optical system PL is supported by the upper support portion 10A of the column 10. Here, examples of the slider include a contact type sliding bearing and a rolling bearing.

  The substage 200 is provided on a subbase PB2 different from the main base PB1. Between the sub-stage 200 and the sub-base PB2, there is a gas bearing PA2 that is a non-contact bearing or a slider for supporting the sub-stage 200 movably with respect to the sub-base PB2. It is movable on the base PB2 only in the X-axis direction. Further, the substage 200 has a driving device 20 including a linear motor and the like, and is provided so as to move in the X-axis direction as the main stage 100 moves.

  The main stage 100 moves on the main base PB1 in the Y-axis direction by driving the linear motor 800. The main stage 100 is provided with a driving device 30 including a linear motor that moves the main stage 100 in the X-axis direction. For example, when the main stage 100 moves in the X-axis direction, the sub-stage 200 moves in the X-axis direction along with the movement of the main stage 100 by driving of the driving device 20. Of the linear motor 800, a mover 801 is attached to the main stage 100, and a stator 802 is provided on the substage 200. When the main stage 100 is moved in the Y-axis direction, the linear motor 800 including the mover 801 and the stator 802 is driven, and the mover 801 moves with respect to the stator 802, resulting in the main stage. 100 moves in the Y-axis direction with respect to the sub-stage 200.

  At a position different from the main base PB 1 and the sub base PB 2, a power supply unit 900 that supplies power to the main stage 100 and the sub stage 200 via the power supply members 901 and 902 is provided. The utility power from the utility power supply unit 900 is supplied to the substage 200 via the utility power supply member 902 and is supplied to the main stage 100 via the utility power supply member 901 via the substage 200. Here, the utility includes electric power for driving the driving device, gas for operating the gas bearing, or a refrigerant for cooling the driving device, and the utility supply member is an electric cable or pneumatic pressure. Includes tubes or cooling tubes.

  In the exposure apparatus EX2 shown in FIG. 2, a column 10 that supports the mask stage MST and the projection optical system PL is fixed on the main base PB1, and the substrate holder PH is movably supported on the sub-base PB2. A main stage 100 is provided. The exposure apparatus EX2 shown in FIG. The main stage 100 can move in the horizontal direction (XY direction) on the sub-base PB2, and can move the substrate holder PH holding the substrate P in the Z-axis direction, and in the θX and θY directions.

  In the exposure apparatus EX1 described above, the main stage 100 moves in the XY direction while supporting the substrate holder PH holding the substrate P, and also moves the substrate holder PH in the Z-axis direction. Therefore, for example, when the substrate P is enlarged, the main stage 100 is also enlarged accordingly, and when the main stage PB1 is two-dimensionally moved in the XY direction, an unbalanced load is applied to the main base PB1 as the main stage 100 moves. Works. Since the main base PB1 is integrally coupled to the mask stage MST that supports the mask M and the column 10 that supports the projection optical system PL, the mask stage MST and the projection optical system that are supported on the column 10 by the bias load. Since the position of the system PL is also displaced, the exposure accuracy is deteriorated.

  In addition, in the exposure apparatus EX2 described above, the column 10 is not deformed, but the relative position between the column 10 and the main stage 100 is displaced by the independent deformation of the sub-base PB2, so that exposure is performed in the same manner as the exposure apparatus EX1. Incurs accuracy degradation.

  FIG. 3 is a view schematically showing the exposure apparatus EX according to the present invention. In the following description, the same or equivalent components as those of the exposure apparatuses EX1 and EX2 described with reference to FIGS. 1 and 2 are denoted by the same reference numerals, and description thereof is simplified or omitted.

  The exposure apparatus EX includes a substrate stage PST that movably supports a substrate holder PH that holds the substrate P, an illumination optical system IL that illuminates the mask M supported by the mask stage MST with the exposure light EL, and an exposure light EL. And a projection optical system PL for projecting and exposing the pattern image of the mask M illuminated by (1) onto the substrate P.

  The substrate stage PST includes a main stage (first stage) 100 and a sub stage (second stage) 200 provided separately from the main stage 100. The substrate holder PH that holds the substrate P is provided on the substage 200 of the substrate stage PST.

  The main stage 100 is provided on the main base (first base) PB1. Between the main stage 100 and the main base PB1, there is a gas bearing PA1 that is a slider or a non-contact bearing for movably supporting the main stage 100 with respect to the main base PB1, and the main stage 100 is It can move in the horizontal direction (XY direction) on the main base PB1.

  The main base PB1 that movably supports the main stage 100 is integrally coupled to the column 10 that supports the mask stage MST that supports the mask M and the projection optical system PL. The main base PB1 is disposed on the floor surface D via a vibration isolating unit 11 that reduces vibration.

  The column 10 has an upper support portion 10A and a leg portion 10B, and a mask stage surface plate MB for movably supporting the mask stage MST is provided on the upper support portion 10A. Mask stage MST is supported by upper support portion 10A of column 10 via surface plate MB. Between the mask stage MST and the surface plate MB is interposed a slider or a non-contact bearing gas bearing MA for movably supporting the mask stage MST with respect to the surface plate MB, and includes a linear motor or the like. The mask stage MST moves on the surface plate MB in the horizontal direction (XY direction) by driving of the driving device. The projection optical system PL is supported by the upper support portion 10A of the column 10.

  The substage 200 is provided on a subbase (second base) PB2 different from the main base PB1. The sub-base PB2 is disposed on the floor surface D via the support PBT. The sub-base PB2 may be disposed on the floor surface D via a vibration isolating unit (11) that reduces vibration.

  Between the substage 200 and the subbase PB2, a gas bearing PA2 that is a slider or a non-contact bearing for supporting the substage 200 so as to be movable with respect to the subbase PB2 is interposed. It can move in the horizontal direction (XY direction) on the sub-base PB2. The sub-stage 200 is movable in the horizontal direction on the sub-base PB2 together with the substrate holder PH while supporting the substrate holder PH.

  Between the substrate holder PH and the substage 200, there is provided a holder driving device 60 that drives the substrate holder PH at least in the Z-axis direction (direction intersecting the horizontal plane) with respect to the substage 200.

  In addition, the substage 200 includes a self-weight canceling mechanism 70 that cancels the self-weight that acts in the Z-axis direction of the substrate holder PH. The substage 200 supports a force acting in the Z-axis direction intersecting with the XY direction (horizontal direction) of the substrate holder.

  The main stage 100 on the main base PB1 and the substrate holder PH supported by the substage 200 provided on the sub base PB2 are connected via a connecting portion C. In the example shown in FIG. 3, a connecting member Cb extending toward the substage 200 is fixed to the main stage 100, and the tip of the connecting member Cb and the substrate holder PH are connected via the connecting part C. Yes. The connecting portion C is provided such that the main stage 100 and the substrate holder PH can be moved relative to each other in the Z-axis direction. Accordingly, the movement of the substrate holder PH connected to the main stage 100 via the connecting portion C in the Z-axis direction is not hindered.

  Further, a slider or a gas bearing PA3 which is a non-contact bearing is interposed between the substrate holder PH and the substage 200 so as to support the substrate holder PH so as to be movable with respect to the substage 200.

  The sub-stage 200 that supports the substrate holder PH can be moved in the horizontal direction together with the main stage 100 by driving of the driving device 20. At this time, the main stage 100 moves in the horizontal direction on the main base PB1, and the substage 200 moves in the horizontal direction on the subbase PB2 as the main stage 100 moves.

  Furthermore, the main stage 100 can be moved in the horizontal direction by driving the driving device 30, and the substrate holder PH connected to the main stage 100 via the connecting portion C is accompanied by the movement of the main stage 100. The substage 200 is movable in the horizontal direction.

  Here, the connecting portion C enables relative movement in the Z-axis direction between the main stage 100 and the substrate holder PH, but restricts relative movement in the XY directions. Therefore, as the main stage 100 moves, the substrate holder can move in the XY directions.

  The driving device 30 that drives the main stage 100 in the horizontal direction and the holder driving device 60 that drives the substrate holder PH in the Z-axis direction intersecting the horizontal plane are provided independently.

  So far, it has been described that the substage 200 moves horizontally on the subbase PB2 as the main stage 100 moves. However, the mainstage 100 moves horizontally on the main base PB1 by driving the substage 200. You can move. FIG. 4 shows this in a schematic diagram.

  In FIG. 4, the main stage 100 has the same configuration as the conventional one in which the Y stage 102 that moves in the Y axis direction is disposed on the X stage 101 that moves in the X axis direction. Here, the X stage 101 can be moved in the X axis direction by driving the driving device 30 together with the Y stage 102, but the Y stage 102 moving in the Y axis direction on the X stage 101 is moved in the Y axis direction. Does not have its own drive source.

  On the other hand, the sub-stage 200 is configured such that the sub-Y stage 202 moving in the Y-axis direction is placed on the sub-X stage 201 moving in the X-axis direction. Here, the sub-X stage 201 can be moved in the X-axis direction together with the sub-Y stage 202 by driving the driving device 20, and the sub-Y stage 202 is further moved on the sub-X stage 201 by the driving device 20b. Can be moved in the Y-axis direction. Further, the exposure apparatus EX includes a drive unit 20c that drives the Y stage 102 on the main stage 100 including the substrate holder PH in the Y-axis direction with respect to the sub Y stage 202.

  Here, the drive device 20b serves as a coarse motion drive device, and the drive device 20c serves as a fine motion drive device. The Y stage 102 on the main stage 100 including the substrate holder PH is also moved to the Y axis by driving the drive device 20b. It is possible to drive in the direction. This is because the substrate holder PH on the sub Y stage 202 and the Y stage 102 on the main stage 100 in FIG. 4 are connected to the driving device 20b by the connecting portion C.

  Here, the connecting portion C that connects the main stage 100 and the substage 200 corresponding to FIG. 3 includes a function in the Y stage 102 of the main stage 100, and the Y between the main stage 100 and the substrate holder PH. Although the relative movement in the axial direction and the Z-axis direction is possible, the relative movement in the X-axis direction is restricted. Therefore, as the main stage 100 moves in the X-axis direction, the substrate holder PH can move in the X-axis direction, and as the substage 200 moves in the Y-axis direction, the substrate holder PH moves in the Y-axis direction. It is movable. However, even in that case, the substrate holder PH is structured to move along the Y-axis direction of the main stage 100.

  Further, the exposure apparatus EX includes a driving device 60 that drives the Y stage 102 on the main stage 100 including the substrate holder PH in the Z-axis direction with respect to the sub Y stage 202. Then, the Z-axis direction force (weight, etc.) of the substrate holder PH including the Y stage 102 on the main stage 100 is supported by the substage 200 through the self-weight canceling mechanism 70.

  In this way, the substage 200 that supports the substrate holder PH that holds the substrate P is provided separately from the main stage 100, and the force acting in the Z-axis direction of the substrate holder PH is supported by the substage 200. Since the movement of the PH or the substage 200 in the horizontal direction (XY direction) is performed in accordance with the movement of the main stage 100 in the horizontal direction, the main stage 100 for performing movement and positioning in the horizontal direction is reduced in size. And the substrate holder PH (substage 200) can be moved in the horizontal direction. Therefore, even if the main stage 100 moves on the main base PB1 integrally coupled with the column 10, it is possible to suppress the influence of the unbalanced load acting on the main base PB1, and to prevent deterioration of the exposure accuracy. . In addition, since the main stage 100 is reduced in size, it is possible to increase the accuracy of stage positioning in the horizontal direction and increase the moving speed, thereby improving controllability. Therefore, the substrate P can be exposed with high accuracy. Since the substrate holder PH is connected to the main stage 100 moving in the horizontal direction via the connecting portion C, the substrate holder PH can move in the horizontal direction as the main stage 100 moves, The movement of the substrate holder PH in the Z-axis direction is not hindered. Furthermore, since the main stage 100 is downsized, the driving force (thrust) for driving the main stage 100 can be reduced, and heat generation and energy loss of the driving device can be suppressed.

  Also, as described with reference to FIGS. 1 and 2, in the conventional configuration, a Y stage driven in the Y axis direction is provided on the X stage driven in the X axis direction, for example, of the substrate stage PST, and Since the Z drive mechanism (Z stage) for driving the substrate holder in the Z-axis direction is provided on the Y stage, it is necessary to enlarge the X stage, for example, in order to maintain the strength of the lowermost X stage. This increases the size of the entire substrate stage. In this case, a large amount of energy is required, for example, at the time of acceleration / deceleration of the substrate stage PST, and it becomes an obstacle to high positioning accuracy, resulting in deterioration of controllability. However, according to the stage apparatus according to the present invention described with reference to FIGS. 3 and 4, the substrate holder PH is on a substage 200 different from the main stage 100 for moving and positioning in the XY directions. Therefore, further weight reduction of the main stage 100 can be realized, and the controllability during acceleration / deceleration of the main stage 100 can be further improved.

  Further, by providing the main stage 100 on the main base PB1 integrally coupled to the column 10, the positioning accuracy of the main stage 100 with respect to the mask stage MST and the projection optical system PL can be improved. For example, when the position of the substrate holder PH in the X and Y directions is measured by a laser interferometer using a moving mirror provided on the substrate holder PH, the laser interferometer is attached to the column 10 and the reference mirror is attached to the projection optical system PL ( By attaching to the lens barrel), it is possible to improve the positioning accuracy of the substrate holder PH by the main stage 100 based on the position of the projection optical system PL.

  In the embodiment described with reference to FIG. 3, the holder driving device 60 that is a Z leveling driving mechanism is provided between the substage 200 and the substrate holder PH, and the substrate holder PH is attached to the substage 200. Although driven, the substrate holder PH may be driven together with the substage 200 in the Z-axis direction, and in the θX and θY directions using a Z leveling drive mechanism (holder drive device). In this case, the main stage 100 and the substage 200 are connected via the connecting portion C so as to be relatively movable with respect to the Z-axis direction.

  A gap sensor capable of detecting at least a distance (interval) in the horizontal direction is provided between the main stage 100 and the substage 200, and the interval between the main stage 100 and the substage 200 is determined based on the detection result of the sensor. The substage 200 may be moved together with the main stage 100 while maintaining the above.

<First Embodiment>
Hereinafter, a first embodiment of an exposure apparatus provided with the stage apparatus of the present invention will be described with reference to FIGS. 5 is a side view showing the entire exposure apparatus EX, FIG. 6 is a front view, FIG. 7 is a view showing the substrate stage PST in FIG. 5, and FIG. 8 is a rear view in which a part of the substrate stage is extracted.
5 and 6, the exposure apparatus EX illuminates the mask stage MST for supporting the mask M, the substrate stage PST for supporting the substrate P, and the mask M supported by the mask stage MST with the exposure light EL. An optical system IL and a projection optical system PL that projects the pattern of the mask M illuminated by the exposure light EL onto the substrate P supported by the substrate stage PST are provided. The projection optical system PL is composed of a plurality of projection optical modules, and the exposure apparatus EX according to the present embodiment moves the mask M and the substrate P synchronously in the X-axis direction with respect to the projection optical system PL. This is a so-called multi-lens scan type exposure apparatus that illuminates with exposure light EL and exposes the pattern of the mask M onto the substrate P.

The illumination optical system IL is provided with a plurality of light sources, a light guide that once collects the light beams emitted from the plurality of light sources, and then uniformly distributes and emits the light. The illumination optical system IL is capable of moving forward and backward along the optical path of the exposure light EL. A filter for adjusting the illuminance of the exposure light EL, an optical integrator for converting the light beam from the light guide into a light beam (exposure light) having a uniform illuminance distribution, and an opening for shaping the exposure light EL from the optical integrator into a slit shape And a condenser lens that forms an image of the exposure light EL that has passed through the blind on the mask M. The exposure light EL from the condenser lens illuminates the mask M with a plurality of slit-shaped illumination areas. A mercury lamp is used as the light source in the present embodiment, and the exposure light EL is a wavelength required for exposure using a wavelength selection filter (not shown), g-line (436 nm), h-line (405 nm), i-line (365 nm). ) Etc. are used. The exposure light EL includes far ultraviolet light (DUV light) such as KrF excimer laser light (wavelength 248 nm) in addition to the ultraviolet emission lines (g line, h line, i line) emitted from the mercury lamp. Alternatively, vacuum ultraviolet light (VUV light) such as ArF excimer laser light (wavelength 193 nm) and F ₂ laser light (wavelength 157 nm) may be used.

  The mask stage MST is provided on the upper support portion 10A of the column 10 and includes a mask holder that holds the mask M by vacuum suction, for example. An opening K1 through which the pattern image of the mask M passes is formed at the center of the mask stage MST. An opening K2 continuous with the opening K1 of the mask stage MST is also formed in the upper support portion 10A of the column 10. The mask stage MST is supported in a non-contact manner on the mask stage surface plate MB via the gas bearing MA, and is provided so as to be movable on the mask stage surface plate MB. The mask stage surface plate MB also has openings corresponding to the openings K1 and K2. Mask stage MST is driven by a driving device that is driven by a Lorentz force such as a linear motor.

  A movable mirror 12 is provided at one end of each of the mask stage MST in the X-axis direction and the Y-axis direction, and a laser interferometer 13 is provided at a position facing the movable mirror 12. The laser interferometer 13 is provided on the column 10. A reference mirror (not shown) is provided on the column 10. The laser interferometer 13 irradiates the movable mirror 12 with a laser beam (length measuring beam) and irradiates the reference mirror with a laser beam (reference beam). Reflected light from each of the movable mirror 12 and the reference mirror based on the irradiated length measurement beam and reference beam is received by the light receiving unit of the laser interferometer 13, and the laser interferometer 13 interferes with these lights, and determines the optical path length of the reference beam. The change amount of the optical path length of the length measuring beam as a reference, and the position (coordinates) of the movable mirror 12 with reference to the reference mirror is detected. By detecting the position of the movable mirror 12, the position of the mask stage MST in the XY directions is detected. Then, based on the detection result of the laser interferometer 13, the position of the mask stage MST is controlled via the driving device.

  The projection optical system PL includes a plurality of (for example, seven) projection optical modules arranged on the surface plate 14. The surface plate 14 supporting the projection optical system PL is supported by the upper support portion 10 </ b> A of the column 10 via the support portion 15. Of the upper support 10A, the peripheral edge of the opening K2 is a step (concave). The support portion 15 is provided at the peripheral portion of the opening K2, and the surface plate 14 is supported on the peripheral portion of the opening K2 in the upper support portion 10A. In addition, an opening is formed in the center of the surface plate 14, and the optical path of the exposure light EL of the projection optical system PL is secured by this opening.

  The surface plate 14 is kinematically supported by the upper support portion 10 </ b> A of the column 10 via the support portion 15. The support portions 15 are provided at three predetermined positions on the surface plate 14, respectively. The support portion 15 is provided, for example, on the upper support portion 10A of the column 10, and includes a V-groove member having a V-shaped inner surface and a spherical member having a spherical surface in contact with the V-shaped inner surface of the V-groove member. Here, a spherical concave portion in which the spherical member can be arranged is formed on the lower surface of the surface plate 14, and the inner surface of the spherical concave portion of the surface plate 14 is in contact with the spherical surface of the spherical member. Since these surfaces are slidable, for example, when the column 10 is slightly deformed, the influence of the deformation of the column 10 on the surface plate 14 is suppressed by sliding these surfaces.

  As shown in FIGS. 5 and 7, the substrate stage PST includes a main stage (first stage) 100 and a substage (second stage) 200 provided separately from the main stage 100. . The main stage 100 is provided on the main base (first base) PB1 so as to be movable in the horizontal direction (XY direction). The main stage 100 includes an X main carriage 101 that moves in the X-axis direction along the X guide 2 provided on the main base PB1, and a Y-axis direction that follows the Y guide 4 provided on the X main carriage 101. And a moving Y main carriage 102. A substrate holder PH for holding the substrate P is provided on the Y main carriage 102.

  In this embodiment, the Y main carriage 102 and the substrate holder PH that holds the substrate P are integrally provided, and the positions (postures) of the Y main carriage 102 and the substrate holder PH are controlled objects in the present embodiment. It is.

  The X main carriage 101 is formed in a downward U-shape and is provided so as to straddle the X guide 2 (see FIG. 6). A plurality of air bearings (pitch air pads) 5 that are non-contact bearings are provided between the X main carriage 101 and the upper surface of the X guide 2, and non-contact bearings are also provided between the X main carriage 101 and the side surfaces of the X guide 2. A plurality of air bearings (yaw air pads) 6 are provided. By these air pads 5 and 6, the X main carriage 101 is supported in a non-contact manner with respect to the X guide 2 provided on the main base PB1. The X main carriage 101 is movable in the X-axis direction while being guided by the X guide 2 together with the Y guide 4 and the Y main carriage 102. The air pads 5 and 6 are swingably attached to the X main carriage 101 via a swing mechanism including a ball joint or the like, and move together with the X main carriage 101. Here, the air pads 5 and 6 correspond to the gas bearing PA1 described with reference to FIG.

  A main base PB1 mounted with an X guide 2 that movably supports the main stage 100 (X main carriage 101) is integrated with a column 10 that supports the mask stage MST that supports the mask M and the projection optical system PL. Are combined. The main base PB1 is disposed on the floor surface D via a vibration isolating unit 11 that reduces vibration.

  On the floor surface D, a base frame 1 is provided via a plurality of height adjusting mechanisms 1A. A plurality of support columns PBT are attached to the upper surface of the base frame 1 so as not to touch the main base PB1. A plurality of sub-guide frames PB2 as sub-bases (second bases) are provided on the upper surface of the support pillar PBT. That is, the sub stage 200 is provided on the sub guide frame (second base) PB2 independent of the main base PB1. The sub guide frame PB2 may be disposed on the floor surface D via a vibration isolating unit (11) that reduces vibration.

  The sub stage 200 is provided so as to be movable in the horizontal direction (XY direction) on the sub guide frame PB2. The sub-stage 200 includes an X sub-carriage 201 that moves in the X-axis direction along the X sub-guide 3 provided on the sub-guide frame PB2, and a Y sub-guide 7 that is provided on the X sub-carriage 201. And a Y sub-carriage 202 that moves in the axial direction. The X sub-carriage 201 is provided with a slider 9 as a guided member for supporting the X sub-carriage 201 movably in the X-axis direction with respect to the X sub-guide 3 provided on the sub-guide frame PB2. The X sub-carriage 201 is movable in the X-axis direction while being guided by the X sub-guide 3 provided on the sub-guide frame PB2. As the configuration of the slider 9 and the X sub-guide 3, a linear motion guide (LM guide) based on a ball or roller-circulating rolling contact can be adopted. The slider 9 corresponds to the slider PA2 described with reference to FIG. The X sub-carriage 201 may be movably supported with respect to the X sub-guide 3 using a gas bearing instead of the slider 9. The X sub-carriage 201 can move in the X-axis direction while being guided by the X sub-guide 3 together with the Y sub-guide 7 and the Y sub-carriage 202.

  On the lower surface of the Y sub-carriage 202, a slider 8 as a guided member corresponding to the Y sub-guide 7 provided on the X sub-carriage 201 is provided. The Y sub-carriage 202 is movable in the Y-axis direction while being guided by a Y sub-guide 7 provided on the X sub-carriage 201. As the configuration of the slider 8 and the Y sub guide 7, a linear motion guide (LM guide) using a ball or roller circulation type rolling contact can be employed. The slider 8 also corresponds to the slider PA2 described with reference to FIG. The Y sub-carriage 202 may be movably supported with respect to the Y sub-guide 7 using a gas bearing instead of the slider 8.

  The Y sub-carriage 202 is connected to a coarse motion drive device 20 for driving the Y sub-carriage 202 in the Y-axis direction. The coarse motion drive device 20 has a configuration in which, for example, a rotary motor and a feed screw are combined, and is disposed between the X sub-carriage 201 and the Y sub-carriage 202. By driving the coarse driving device 20, the Y sub-carriage 202 moves in the Y-axis direction on the X sub-carriage 201. Further, when the Y sub-carriage 202 moves in the Y-axis direction, the Y main carriage 102 disposed thereon also moves in the Y-axis direction together with the Y sub-carriage 202.

  In the present embodiment, the coarse drive device 20 is provided on both sides of the Y guide 4, but may be one.

  Between the substrate holder PH and the substage 200 (Y subcarriage 202), there is provided a holder driving device 60 that drives the substrate holder PH at least in the Z-axis direction (direction intersecting the horizontal direction) with respect to the substage 200. It has been. The holder driving device 60 is configured by a driving device that is driven by a Lorentz force, such as a voice coil motor or a linear motor, and is provided in at least three places. In the present embodiment, the holder driving device 60 is constituted by a linear motor, and the stator 61 of the linear motor is provided at three positions on the upper surface of the Y sub-carriage 202, and the movable element 62 corresponding to the stator 61 is the Y main. It is attached to three places on the lower surface of the carriage 102. Then, by appropriately driving each of these three holder driving devices 60, the Y main carriage 102 supporting the substrate holder PH is driven in the Z-axis direction, and in the θX and θY directions. Driven in the Z-axis direction and in the θX and θY directions.

  In addition, a self-weight canceling mechanism 70 that cancels the self-weight acting in the Z-axis direction of the substrate holder PH is interposed between the Y main carriage 102 that supports the substrate holder PH and the substage 200 (Y sub-carriage 202). Yes. The self-weight canceling mechanism 70 has a support portion 71 that supports the Y main carriage 102 (substrate holder PH) so as to be swingable in a tilting direction in a non-contact state. The support portion 71 includes an elastic body 72 and a non-contact support portion 73 that is connected to the elastic body 72 and supports the Y main carriage 102 including the substrate holder PH in a non-contact manner. The elastic body 72 is configured by, for example, a coil spring, and the non-contact support portion 73 is configured to include, for example, a gas bearing (air pad). The elastic body 72 may be a low-rigid elastic body and may be an elastic body other than a coil spring. The lower end portion of the elastic body 72 is connected to the Y sub-carriage 202, and the non-contact support portion 73 is connected to the upper end portion of the elastic body 72 via the swinging portion 74. The oscillating portion 74 includes, for example, a ball joint having a spherical member having a spherical surface and a conical member having a conical inner surface in contact with the spherical surface, and the non-contact support portion 73 with respect to the elastic body 72. Is supported in a swingable manner. Accordingly, the self-weight canceling mechanism 70 supports the Y main carriage 102 (substrate holder PH) so as to be swingable in the tilt direction in a non-contact state.

  The self-weight canceling mechanisms 70 are provided at a plurality (three in this embodiment) so as to correspond to the vicinity of the holder driving device 60. Note that the self-weight canceling mechanism 70 may include a damping member such as an oil damper.

  A force acting in the Z-axis direction of the substrate holder PH is supported by the substage 200 including the holder driving device 60 and the self-weight canceling mechanism 70. Since the substrate holder PH (Y main carriage 102) is supported by the self-weight canceling mechanism 70 including the elastic body 72, even if vibration is transmitted from the floor surface D through the column PBT, the sub base frame PB2, and the like, the substrate holder PH. The high frequency component of vibration transmitted to the (Y main carriage 102) is absorbed by the elastic body 72. The substrate holder PH (Y main carriage 102) is supported by a holder driving device 60 that is driven by a Lorentz force, such as a linear motor or a voice coil motor, and the stator 61 and the mover 62 are not in contact with each other. State. Therefore, it is possible to suppress the vibration from the floor surface D and the like from being transmitted to the substrate holder PH (Y main carriage 102) via the holder driving device 60. Furthermore, by moving the holder driving device 60 according to the vibration, it is possible to prevent the vibration from being transmitted to the substrate holder PH. In other words, the holder driving device 60 has a function as an active vibration isolating device that reduces vibration transmitted to the substrate holder PH, and the elastic body 72 has a function as a passive vibration isolating device.

  As shown in FIG. 6, an X driving device for moving the Y guide 4 and the X main carriage 101 connected to the Y guide 4 in the X-axis direction is provided at both ends in the longitudinal direction of the Y guide 4. 31 is provided. The X driving device 31 is composed of a linear motor driven by a Lorentz force, and a mover 31A is attached to both ends of the Y guide 4, and a stator 31B is supported by a support mechanism (not shown) so as to correspond to the mover 31A. Is supported by. When the X driving device 31 is driven, the X main carriage 101 and the Y guide 4 that are supported in a non-contact manner by the air pads 5 and 6 with respect to the X guide 2 are guided to the X guide 2 together with the Y main carriage 102. While moving, it moves in the X-axis direction. Further, as the main stage 100 including the X main carriage 101 and the Y main carriage 102 moves in the X axis direction, the sub stage 200 including the X sub carriage 201 and the Y sub carriage 202 also moves together in the X axis direction. It is like that.

  As shown in FIGS. 5 and 7, on the lower surface of the Y main carriage 102, a guided portion that is formed in a downward U-shape and is provided so as to straddle the Y guide 4 is provided. A plurality of air bearings (side air pads) 18 that are non-contact bearings are provided between the Y main carriage 102 and the side surface of the Y guide 4. The Y main carriage 102 supporting the substrate holder PH is supported by the air pad 18 in a non-contact manner with respect to the Y guide 4 provided on the X main carriage 101. The force acting in the Z-axis direction of the Y main carriage 102 (substrate holder PH) is supported (non-contact supported) by the self-weight canceling mechanism 70 having the non-contact support portion 73 as described above. The Y main carriage 102 supporting the substrate holder PH is movable in the Y axis direction while being guided by the Y guide 4. The air pad 18 is swingably attached to the Y main carriage 102 via a swing mechanism including a ball joint or the like, and moves together with the Y main carriage 102. The air pad 18 also corresponds to the gas bearing PA1 described with reference to FIG.

  The air pads 18, 73 and the like correspond to the slider PA3 described with reference to FIG.

  A Y driving device 30 for moving the Y main carriage 102 in the Y-axis direction is provided at both ends of the Y main carriage 102 supporting the substrate holder PH in the X-axis direction. The Y driving device 30 is constituted by a linear motor driven by a Lorentz force. A mover 30A is attached to both ends of the Y main carriage 102, and a stator 30B is attached to the Y sub-carriage 202 so as to correspond to the mover 30A. Supported on top. When the Y driving device 30 is driven, the Y main carriage 102 (substrate holder PH) supported in a non-contact manner by the air pad 18 (and the non-contact support portion 73) with respect to the Y guide 4 is guided to the Y guide 4. While moving in the Y-axis direction. Here, when the Y main carriage 102 (main stage 100) moves in the Y-axis direction by driving the Y driving device 30, the substage 200 does not move. That is, the Y driving device 30 corresponds to the fine movement driving device 30 described with reference to FIG.

  As shown in FIG. 7 and FIG. 8 and the like, on both side surfaces of the Y guide 4, a guide portion 50 extending in the Y-axis direction and a second carriage provided so as to be movable along the guide portion 50 in the Y-axis direction. 51 are provided. The second carriage 51 is L-shaped in a side view, and a gas bearing (air pad) 52 is attached to the upper end of the second carriage 51 via a swing mechanism including a ball joint or the like. The Y main carriage 102 is provided with two plate members 102 </ b> A so as to protrude outward so as to correspond to the guide portion 50.

  As shown in FIG. 8, air pads 52 are disposed on both sides of the plate member 102A in the Y-axis direction, and the air pads 52 are not in contact with the plate member 102A. The air pads 52 are supported by the second carriage 51 so as to be swingable via a swinging part 51A. When the Y main carriage 102 is moved in the Y-axis direction by driving the Y drive device 30 or the coarse drive device 20, the second carriage 51 attached in a non-contact state to the plate member 102A via the air pad 52 is provided. It moves in the Y-axis direction together with the movement of the Y main carriage 102. Since the air pad 52 is provided on both sides of the plate member 102A, the second carriage 51 is moved by the Y main carriage 102 even when the Y main carriage 102 moves in both the + Y direction and the -Y direction. Can follow.

  The second carriage 51 is provided to be movable only in the Y-axis direction with respect to the Y guide 4 fixed on the main stage 100 (X main carriage 101), and the Y main carriage 102 (and thus the substrate holder PH). The air pad 52 is attached in a non-contact state, and relative movement in the Y-axis direction of the Y main carriage 102 (plate member 102A) is restricted by the air pad 52. On the other hand, the second carriage 51 can be moved relative to the Y main carriage 102 (plate member 102A) in the X-axis direction and the Z-axis direction. As a result, even if the Y main carriage 102 (substrate holder PH) moves in the Z-axis direction or inclines in the θX and θY directions, the second carriage 51 and the air pad 52 are prevented from hitting the Y main carriage 102 and the like. The movement of the Y main carriage 102 (substrate holder PH) is not hindered.

  The second carriage 51 is attached to the Y main carriage 102 (substrate holder PH), the Y guide 4 (main stage 100) is provided with an equivalent to the plate member 102A, and one end thereof is attached to the Y main carriage 102. An air pad 52 may be provided on the other end portion of the second carriage 51.

  As shown in FIG. 7 and the like, the second carriage 51 includes a head that constitutes a part of a linear encoder (position detection device) 40 that detects the position of the substrate holder PH with respect to the Y guide 4 (main stage 100) in the Z-axis direction. 41 is provided. As described above, a plurality of the second carriages 51 are provided, and the heads 41 are provided at at least three locations of the second carriage 51. On the other hand, a scale 42 corresponding to the head 41 is attached to the Y main carriage 102 (substrate holder PH). The linear encoder 40 configured to include the head 41 and the scale 42 is provided in the vicinity of each holder driving device 60. By providing the linear encoder 40 in at least three locations, the position of the substrate holder PH with respect to the main stage 100 in the Z-axis direction and the position (posture) in the θX and θY directions with respect to the main stage 100 are obtained. It is done.

  Here, relative movement in the horizontal direction (X-axis direction) of the substrate holder PH with respect to the main stage 100 is restricted by the air pad 18. On the other hand, the movement of the substrate holder PH in the Z-axis direction with respect to the main stage 100 is possible. Therefore, the air pad 18 and the holder driving device 60 correspond to the connecting portion C described with reference to FIG.

  A movable mirror 16 is provided at one end in each of the X-axis direction and the Y-axis direction of the Y main carriage 102 that supports the substrate holder PH, and a laser interferometer 19 is provided at a position facing the movable mirror 16. ing. The laser interferometer 19 is provided on the column 10. Further, a reference mirror (not shown) is provided in the lens barrel that holds the optical elements constituting the projection optical system PL. The laser interferometer 19 irradiates the movable mirror 16 with a laser beam (length measuring beam) and irradiates the reference mirror with a laser beam (reference beam). Reflected light from each of the movable mirror 16 and the reference mirror based on the irradiated length measurement beam and reference beam is received by the light receiving unit of the laser interferometer 19, and the laser interferometer 19 interferes with these lights to reduce the optical path length of the reference beam. The amount of change in the optical path length of the length measuring beam as a reference, and hence the position (coordinates) of the movable mirror 16 with respect to the reference mirror is detected. By detecting the position of the movable mirror 16, the position of the substrate holder PH in the XY direction is detected. Then, based on the detection result of the laser interferometer 19, the substrate holder PH (Y main carriage) holding the substrate P via the Y drive device (fine drive device) 30, the coarse drive device 20, and the X drive device 31. 102) in the XY direction is controlled.

  A head 41 that is a part of the linear encoder 40 is connected to a second carriage 51 that is restricted in relative movement in the Y-axis direction with respect to the Y main carriage 102 (substrate holder PH) and can move in the X-axis direction and the Z-axis direction. And the scale 42 is attached to the Y main carriage 102 (substrate holder PH), so that the linear encoder 40 is used as a reference for the main stage 100, and thus the column 10 for supporting the main stage 100 and this column. 10, the position of the substrate holder PH in the Z-axis direction can be detected with reference to the projection optical system PL supported by 10.

  The position detection device that detects the position of the substrate holder PH with respect to the main stage 100 in the Z-axis direction is not limited to a linear encoder, and for example, a laser interferometer or the like for detecting the position in the Z-axis direction may be used. .

  For example, a focus detection system that detects the position in the Z-axis direction of the surface (exposed surface) of the substrate P supported by the substrate holder PH can be provided on the lower surface of the upper support portion 10A of the column 10 or the like. In this case, by providing a plurality of focus detection systems, the position in the Z-axis direction at a plurality of points on the surface of the substrate P can be detected. Thereby, the focus detection system can detect the position of the substrate P in the Z-axis direction and the position (posture) in the θX and θY directions. Based on the detection result of the focus detection system, the position of the substrate holder PH (Y main carriage 102) holding the substrate P via the holder driving device 60 in the Z-axis direction and the θX and θY directions is controlled.

  When exposing the substrate P, first, the substrate P to be exposed is loaded into the substrate holder PH. The substrate holder PH holds the loaded substrate P using, for example, a vacuum suction holding mechanism. Then, the illumination optical system IL illuminates the mask M supported by the mask stage MST with the exposure light EL. The pattern image of the mask M illuminated with the exposure light EL is projected onto the substrate P held by the substrate holder PH via the projection optical system PL.

  The exposure apparatus EX in the present embodiment is a scanning exposure apparatus whose scanning direction is the X-axis direction. When the exposure light EL is irradiated onto the substrate P, the X driving device 31 moves the X main carriage 101 to the Y main carriage 102. And the substrate holder PH holding the substrate P is moved in the X-axis direction. At this time, the force acting in the Z-axis direction of the Y main carriage 102 (substrate holder PH) is supported by the substage 200. Further, when the exposure light EL is irradiated on the substrate P, the holder driving device 60 holds the substrate P so that the image plane of the projection optical system PL and the surface of the substrate P (exposed surface) are aligned. The position of the substrate holder PH (Y sub-carriage 102) in the Z-axis direction and the θX and θY directions is adjusted.

  Further, after scanning exposure of one shot area on the substrate P, when the substrate P is stepped in the Y-axis direction in order to expose another shot area, the coarse movement driving device 20 is used depending on the case. The sub-stage 200 (Y sub-carriage 202) and the Y main carriage 102 (substrate holder PH) on the sub-stage 200 are moved in the Y-axis direction together with the fine movement driving device 30. Then, after the other shot area on the substrate P and the projection area of the projection optical system PL are aligned using the X driving device 31 and the Y driving device 30, scanning exposure is performed on the other shot region.

  When the substrate P is irradiated with the exposure light EL while moving the substrate P in the X-axis direction, the next projected pattern is aligned with the pattern previously formed on the substrate P. Therefore, it is also possible to expose the substrate P while finely moving the substrate P in the Y-axis direction using the fine movement driving device 30.

  The Y main carriage 102 is movable in the X-axis direction together with the X main carriage 101, but since the force acting in the Z-axis direction is supported by the substage 200, the Y main carriage 102 (main stage 100) is supported. ) And the sub-stage 200 need to move together. For this reason, a gap sensor capable of detecting at least a relative distance (interval) in the horizontal direction is provided between the main stage 100 and the substage 200, and the distance between the main stage 100 and the substage 200 is maintained at a predetermined distance. However, the substage 200 may be caused to follow the movement of the main stage 100. Of course, position detection devices that detect the positions of the main stage 100 and the substage 200 in the horizontal direction are provided independently, and the positions of the main stage 100 and the substage 200 in the horizontal direction are based on the detection results of these position detection devices. May be controlled independently. Even if a slight shift occurs in the follow-up movement of the substage 200 with respect to the movement of the main stage 100, the Y main carriage 102 (substrate holder PH) is supported in a non-contact manner via the non-contact support portion 73 of the self-weight canceling mechanism 70. Therefore, inconveniences such as distortion in the main stage 100 and the substage 200 do not occur when the support position varies.

  As described above, the force acting in the Z-axis direction of the substrate holder P holding the substrate P is supported by the substage 200 different from the main stage 100, and the movement of the substrate holder PH in the horizontal direction is Since the driving force of the main stage 100 is used, the main stage 100 can be downsized and the substrate holder PH can be moved in the horizontal direction. Therefore, even if the main stage 100 is configured to move on the main base PB1, a large offset load is not applied to the main base PB1. Further, since the main stage 100 is reduced in size, it is possible to improve the stage positioning accuracy in the horizontal direction and increase the moving speed, thereby improving controllability. Therefore, the substrate P can be exposed with high accuracy. Further, since the substrate holder PH is connected to the main stage 100 moving in the horizontal direction via the air pad 18 or the like, the movement of the substrate holder PH in the Z-axis direction is not hindered.

  In the present embodiment, the Y main carriage 102 and the substrate holder PH that holds the substrate P are integrally provided, and the positions (orientations) of the Y main carriage 102 and the substrate holder PH are the same as those in the present embodiment. Since it is a control object and this control object is also reduced in weight, controllability can be improved.

  In addition, since the Y driving device (fine movement driving device) 30 is provided at substantially the same height as or above the holder driving device 60 and the self-weight canceling mechanism 70 constituting the Z leveling driving mechanism of the substrate holder PH, the movable mirror 16 and Since the position in the Z-axis direction with the Y drive device 30 is closer, controllability is also improved in this respect. When the positions of the movable mirror 16 and the Y drive device 30 in the Z-axis direction are far from each other, the laser interference system including the movable mirror 16 and the laser interferometer 19 that measures the position of the substrate holder PH is improved in order to improve controllability. The stage position detection sensor and the movable mirror are provided in the vicinity of the mover 30A of the Y drive device, for example, and the horizontal position control of the substrate holder PH (Y main carriage 102) is performed based on the detection result of the detection sensor. Although the configuration is conceivable, in the present invention, since the positions of the movable mirror 16 and the Y drive device 30 in the Z-axis direction are close to each other, the detection sensor is unnecessary, and the manufacturing cost of the entire device can be suppressed.

  In the above-described embodiment, only the force in the X-axis direction acts on the Y guide 4, so that the Y guide 4 can be reduced in weight and size. Further, since the Y guide 4 can be made light and the weight of the Y main carriage 102 does not act on the Y guide 4, the X main carriage 101 that supports the Y guide 4 can also be reduced in weight and size. And since the uneven load in the Y-axis direction is reduced, the X guide 2 and the X main carriage 101 can also be reduced in weight and size. Accordingly, the thrust of the X drive device 31 can be reduced.

  Moreover, since the load capacity with respect to the pitch air pad 5 can be reduced and the moment is not applied to the pitch air pad 5, the pad interval for suppressing the moment can be shortened. Furthermore, since the interval between the pitch air pads 5 can be shortened, the length of the X guide 2 can be shortened. Further, since the load applied to the main base PB1 is small and the load fluctuation is small, the main base PB1 can be made light and compact.

  Further, since the holder driving device 60 and the self-weight canceling mechanism 70 constituting the Z leveling driving mechanism for adjusting the position of the substrate P in the Z-axis direction and the tilt direction are arranged on the substage 200, these are, for example, the substrate When provided at three positions below the holder PH, the leveling mechanisms can be provided at positions apart from each other, and the flatness of the substrate holder PH can be prevented from being deteriorated.

  Moreover, since the whole substrate stage PST can be reduced in weight and size, it can be transported easily. For example, when the exposure apparatus EX is divided into a plurality of partial elements and transported, and then the exposure apparatus EX is constructed by assembling the partial elements at the transport destination, the entire apparatus is reduced in weight and size. Therefore, the assembling work can be easily performed.

  In addition, since the entire apparatus is reduced in weight and size, the load acting on the vibration isolation unit 11 is also small. Therefore, the vibration isolation unit 11 can be reduced in weight and size, and the apparatus cost can be reduced. Furthermore, since the main stage 100 is reduced in weight and size, deformation and displacement of the column 10 due to movement can be suppressed. Therefore, inconveniences such as displacement of the projection optical system PL supported by the column 10 can be prevented, and deterioration of exposure accuracy can be prevented. Since the shaking generated when the main stage 100 moves can be reduced, the waiting time for waiting for the shaking to be reduced can be shortened, and the throughput can be improved.

Second Embodiment
Hereinafter, another embodiment of the present invention will be described. In the following description, the same or equivalent components as those in the above-described embodiment are denoted by the same reference numerals, and the description thereof is simplified or omitted.
In the case where the self-weight canceling mechanism 70 is provided at each of a plurality of positions as in the above-described embodiment, for example, when a position control error of the substrate holder PH in the Z-axis direction occurs, the substrate holder PH is caused accordingly. May cause inconvenience of rocking (vibrating). When the rotation center (rotation center) of the swing of the substrate holder PH is lower than the movable mirror 16 in the Z-axis direction, a position measurement error in the X-axis direction and the Y-axis direction of the substrate holder PH (substrate P) is caused. .

For example, as shown in FIG. 9, since the rotation center of the substrate holder PH supported at a plurality of positions by the self-weight canceling mechanism 70 is between the two air pads 18, the substrate holder PH is caused by a control error of the holder driving device 60. When swinging and tilting in the θY direction, the substrate holder PH is displaced by a distance x in the X-axis direction. In this case, assuming that the distance between the rotation center of the substrate holder PH in the θY direction and the surface of the substrate P is A, the length of the substrate P in the X-axis direction is L, and the rotation angle in the θY direction is θ, the angle θ is small. A-A cos θ = b can be regarded as zero, and when a = A sin θ, the distance x displaced in the X-axis direction at the end of the substrate P is
x = (L / 2 · cos θ + a) −L / 2 (1)
It becomes.

  When the distance A is large, if the positioning error in the tilt direction (θX and θY directions) of the substrate P increases, it appears as a displacement in the horizontal direction (XY direction), which causes a position measurement error in the XY direction of the substrate P. .

  Therefore, the self-weight canceling mechanism 70 is provided only at one location, and the self-weight canceling mechanism 70 supports the rotation center of the substrate holder PH, thereby measuring the position of the substrate holder PH in the XY directions due to the swinging of the substrate holder PH. The generation of errors can be reduced.

  In the example shown in FIG. 10, the Y sub-carriage 202 and the Y main carriage 102 are provided so as to intersect with each other, and the self-weight canceling mechanism 70 is disposed at one central portion of the substrate holder PH.

  In the example shown in FIG. 11, the Y guide 4 is divided into two parts, and a self-weight canceling mechanism 70 is arranged at one location between the two Y guides 4 having the two-part structure.

  In the example shown in FIG. 12, the Y guide 4 is provided at a position shifted in the horizontal direction with respect to the position of the center of gravity of the Y main carriage 102, and the self-weight canceling mechanism 70 is provided at one place.

  Note that the angle θ is a value determined by the mutual difference between the two self-weight canceling mechanisms 70 provided side by side in the X-axis direction with respect to the Z-axis direction. The distance (displacement) x can be suppressed by widening the interval between the cancel mechanisms 70.

<Third Embodiment>
By the way, the distance (displacement) x can be further reduced by providing the rotation center of the substrate holder PH at substantially the same height as the surface of the substrate P as shown in the schematic diagram of FIG. In FIG. 13, when the length of the substrate P in the X-axis direction is L and the rotation angle in the θY direction is θ, the distance x displaced in the X-axis direction at the end of the substrate holder PH is
x = L / 2 (1-cos θ) (2)
It becomes. In a range where the angle θ is small, the distance (displacement) x is a very small value.

  FIG. 14 is a side view showing an example of an exposure apparatus EX in which the position of the rotation center of the substrate holder PH in the Z-axis direction and the position of the surface of the substrate P are substantially the same, and FIG. 15 is a front view. 14 and 15, the Y guide 4 is disposed beside the substrate holder PH. By doing so, the center of rotation of the substrate holder PH is close to the surface of the substrate P, so that the displacement error in the X-axis direction can be reduced as described with reference to FIG.

  In this case as well, the angle θ is a value determined by the mutual difference in the Z-axis direction between the two self-weight canceling mechanisms 70 arranged side by side in the X-axis direction. The distance (displacement) x can be suppressed by widening the interval between the self-weight canceling mechanisms 70.

<Fourth embodiment>
FIG. 16 is a side view showing another embodiment of the present invention. In FIG. 16, the Y guide 4 is provided on the side of the substrate holder PH, and the positional deviation error in the X-axis direction due to the inclination of the substrate holder PH in the θY direction is reduced. In the example shown in FIG. 16, the Y main carriage 102 is not provided under the substrate holder PH, and the substrate holder PH is directly supported by the non-contact support portion 73 of the self-weight canceling mechanism 70. By adopting a configuration in which the Y main carriage 102 under the substrate holder PH is omitted, the apparatus configuration can be made inexpensive and compact (lightweight).

<Fifth Embodiment>
FIG. 17 is a side view showing another embodiment of the present invention. In FIG. 17, the substrate stage PST includes a second X carriage 101A that can move along the X guide 2 together with the X main carriage 101, a second pitch air pad 5A, and a second Y guide 4A provided on the second X carriage 101A. The second carriage 51 is moved in the Y-axis direction along the second Y guide 4A. By doing so, the apparatus configuration can be simplified.

  In the embodiment described with reference to FIG. 17, the second X carriage 101A and the second Y guide 4A are configured by different members. However, the second X carriage 101A is not provided, and the second Y guide 4A is provided with the second X guide. The 2-pitch air pad 5A may be directly attached.

<Sixth Embodiment>
FIG. 18 is a side view showing another embodiment of the present invention. In the substrate stage PST shown in FIG. 18, neither the second X carriage 101A nor the second pitch air pad 5A is provided, and the second Y guide 4A is directly attached to the X main carriage 101. By doing so, the apparatus configuration can be further simplified.

<Seventh embodiment>
FIG. 19 is a side view showing another embodiment of the present invention. In FIG. 19, a recess 401 is formed in the lower surface of the substrate holder PH, and a cylindrical member 400 is disposed in the recess. A self-weight canceling mechanism 70 is disposed inside the cylindrical member 401. In the present embodiment, the self-weight canceling mechanism 70 has a damping device 75 that includes an oil damper. The self-weight canceling mechanism 70 supports one place of the substrate holder PH. A spherical surface (spherical surface) 402 is formed outside the recess 401 in the lower surface of the substrate holder PH. A support portion 404 having an air pad (non-contact support portion) 403 for supporting the spherical seat 402 in a non-contact manner is provided on the outside of the cylindrical member 400. A movable element 62 constituting a voice coil motor (holder driving device) that is driven by a Lorentz force for driving the substrate holder PH in the Z-axis direction is attached to the cylindrical member 400, and the Y sub-carriage 202 is attached to the Y sub-carriage 202. A stator 61 corresponding to the mover 62 is attached.

  A Y main carriage 102 formed in a cylindrical shape extending in the Y-axis direction is disposed beside the cylindrical member 400, and a Y guide 4 is provided inside the Y main carriage 102. A Z guide 405 is provided between the cylindrical member 400 and the Y main carriage 102 to guide the movement of the cylindrical member 400 in the Z-axis direction with respect to the Y main carriage 102.

  An air pad (non-contact bearing) 18 is attached to the inside of the Y main carriage 102 and is supported in a non-contact manner with respect to the Y guide 4. Accordingly, the Y main carriage 102 is provided so as to be movable in the Y axis direction together with the cylindrical member 400 and the substrate holder PH with respect to the Y guide 4. A head 41 constituting the linear encoder 40 is provided above the Y main carriage 102, and a scale 42 corresponding to the head 41 is provided below the substrate holder PH. Further, in the vicinity of the linear encoder 40, a mover 62 constituting a voice coil motor (holder drive device) 60 is provided under the substrate holder PH, and a stator 61 is provided in the substage 200 (Y substage 201). Is provided.

  The cylindrical member 400 incorporating the self-weight canceling mechanism 70 is driven in the Z-axis direction while being guided by the Z guide by the drive of the voice coil motor (holder driving device) 60. Along with the movement of the cylindrical member 400 in the Z-axis direction, the substrate holder PH moves in the Z-axis direction. Further, by providing a support portion 404 having a non-contact support portion 403 outside the cylindrical member 400 and supporting the spherical seat 402 provided on the lower surface side of the substrate holder PH with the support portion 404, the self-weight cancellation is performed. The substrate holder PH with respect to the cylindrical member 400 containing the mechanism 70 can be supported so as to be movable in the Z-axis direction and the θX and θY directions. Since the rotation center of the substrate holder PH is substantially the same position as the surface of the substrate P held on the substrate holder PH, the distance (displacement) x can be reduced and the substrate P is held. It is possible to reduce a position measurement error in the horizontal direction (XY direction) of the substrate holder PH that is caused by the movement of the substrate holder PH in the tilt direction.

  In the embodiment described with reference to FIG. 19, the spherical seat 402 is provided under the substrate holder PH, and the spherical seat 402 is supported in a non-contact manner via the non-contact support portion 403. As shown in FIG. 20, a swing mechanism 406 including a ball joint or the like for swingably supporting the substrate holder PH may be provided between the non-contact support portion 403 and the support portion 404. By doing so, the substrate holder PH can be swingably supported with respect to the cylindrical member 400 with a simple configuration without providing the spherical seat 402 on the lower surface of the substrate holder PH.

  The exposure apparatus EX in each of the embodiments described above is not limited to a scanning type exposure apparatus that exposes the pattern of the mask M by moving the mask M and the substrate P synchronously, and the mask M and the substrate P are stationary. The present invention can also be applied to a step-and-repeat type exposure apparatus that exposes the pattern of the mask M in the state and sequentially moves the substrate P stepwise.

  Note that the exposure apparatus EX of the above-described embodiment can also be applied to a proximity exposure apparatus that exposes the pattern of the mask M by bringing the mask M and the substrate P into close contact with each other without using the projection optical system PL.

  The use of the exposure apparatus EX is not limited to a liquid crystal exposure apparatus that exposes a liquid crystal display element pattern on a square glass plate, but for example, an exposure apparatus for manufacturing a semiconductor or an exposure for manufacturing a thin film magnetic head. Widely applicable to devices.

In the above-described embodiment, the magnification of the projection optical system PL may be not only a reduction system but also an equal magnification or an enlargement system. Further, as the projection optical system PL, when using far ultraviolet rays such as an excimer laser, a material that transmits far ultraviolet rays such as quartz or fluorite is used as a glass material, and when using an F ₂ laser or X-ray, a catadioptric system or Use a refractive optical system.

  When a linear motor is used for the substrate stage PST and the mask stage MST, either an air levitation type using an air bearing or a magnetic levitation type using a Lorentz force or a reactance force may be used. The stage may be a type that moves along a guide, or may be a guideless type that does not have a guide.

  When a flat motor is used as the stage drive device, either the magnet unit (permanent magnet) or the armature unit is connected to the stage, and the other of the magnet unit and armature unit is connected to the moving surface side (base) of the stage. Should be provided.

The reaction force generated by the movement of the substrate stage PST may be released mechanically to the floor (ground) using a frame member as described in JP-A-8-166475. The present invention can also be applied to an exposure apparatus having such a structure.
The reaction force generated by the movement of the mask stage MST may be released mechanically to the floor (ground) using a frame member as described in JP-A-8-330224. The present invention can also be applied to an exposure apparatus having such a structure.

  The exposure apparatus according to the present embodiment is manufactured by assembling various subsystems including the constituent elements recited in the claims of the present application so as to maintain predetermined mechanical accuracy, electrical accuracy, and optical accuracy. The In order to ensure these various accuracies, before and after assembly, various optical systems are adjusted to achieve optical accuracy, various mechanical systems are adjusted to achieve mechanical accuracy, and various electrical systems are Adjustments are made to achieve electrical accuracy. The assembly process from the various subsystems to the exposure apparatus includes mechanical connection, electrical circuit wiring connection, pneumatic circuit piping connection and the like between the various subsystems. Needless to say, there is an assembly process for each subsystem before the assembly process from the various subsystems to the exposure apparatus. When the assembly process of the various subsystems to the exposure apparatus is completed, comprehensive adjustment is performed to ensure various accuracies as the entire exposure apparatus. The exposure apparatus is preferably manufactured in a clean room where the temperature, cleanliness, etc. are controlled.

  As shown in FIG. 21, the semiconductor device has a step 301 for designing the function and performance of the device, a step 302 for producing a mask based on this design step, a step 303 for producing a substrate which is a substrate of the device, and the above-described steps. The substrate is manufactured through a substrate processing step 304 for exposing a mask pattern onto the substrate by the exposure apparatus of the embodiment, a device assembly step (including a dicing process, a bonding process, and a packaging process) 305, an inspection step 306, and the like.

It is a schematic diagram which shows the comparative example (conventional example) with respect to the exposure apparatus of this invention. It is a schematic diagram which shows the comparative example (conventional example) with respect to the exposure apparatus of this invention. It is a schematic diagram which shows schematic structure for demonstrating the exposure apparatus of this invention. It is a schematic diagram which shows schematic structure for demonstrating the exposure apparatus of this invention. It is a side view which shows one Embodiment of the exposure apparatus of this invention. It is a front view which shows one Embodiment of the exposure apparatus of this invention. It is a side view which shows one Embodiment of the stage apparatus of this invention. It is the figure which extracted a part of stage device of the present invention. It is a schematic diagram which shows the state which the board | substrate holder inclined. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a schematic diagram which shows the state which the board | substrate holder inclined. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a side view which shows another embodiment of the stage apparatus of this invention. It is a flowchart figure which shows an example of the manufacturing process of a semiconductor device.

Explanation of symbols

DESCRIPTION OF SYMBOLS 10 ... Column, 11 ... Anti-vibration unit, 18 ... Non-contact bearing (connection part), 20 ... Coarse drive device (1st drive device, 2nd drive device), 30 ... Y drive device (1st drive device, fine motion) Drive device), 31 ... X drive device (first drive device), 40 ... linear encoder (position detection device), 52 ... non-contact bearing (connecting portion), 60 ... holder drive device (second drive device), 51 ... second carriage (support member), 70 ... self-weight canceling mechanism, 71 ... support section, 72 ... elastic body, 73 ... non-contact support section, 100 ... main stage (first stage), 200 ... sub stage (second stage) , C ... connecting portion, EX ... exposure apparatus, M ... mask, P ... substrate, PB1 ... main base (first base), PB2 ... sub-base (second base), PH ... substrate holder, PL ... projection optical system, PST ... Substrate Di (stage apparatus)

Claims (17)

In a stage device that movably supports a substrate holder that holds a substrate,
A first stage for moving the substrate holder in at least one direction within a horizontal plane;
The second stage is provided separately from the first stage, and moves in at least one direction in the horizontal plane as the first stage moves, and supports a force acting in a direction intersecting the horizontal plane of the substrate holder. Stage,
A stage apparatus comprising: a connecting portion that connects the first stage and the substrate holder or the second stage so as to be relatively movable in a direction intersecting the horizontal plane.   The stage device according to claim 1, wherein the second stage includes a holder driving device that drives the substrate holder in a direction intersecting the horizontal plane.   3. An exposure apparatus according to claim 1, wherein a first driving device for driving the first stage and a second driving device for driving the second stage are provided independently.   The stage device according to claim 1 or 2, wherein a part of the first driving device for driving the first stage and the second driving device for driving the second stage are also used.   5. The stage device according to claim 2, wherein at least a part of each of the holder driving device, the first driving device, and the second driving device is driven by a Lorentz force.   A coarse motion drive device that moves the first stage together with the second stage in at least one direction in the horizontal plane; and a fine motion drive device that moves the first stage in at least one direction in the horizontal plane. The stage apparatus according to claim 1, wherein:   The stage apparatus according to claim 1, further comprising a position detection device that detects a relative position of the substrate holder with respect to a direction intersecting the horizontal plane with respect to the first stage.   A part of the position detection device is attached to one of the first stage and the substrate holder in a non-contact state with respect to the other, and is restricted to relative movement in one direction in a horizontal plane. The stage apparatus according to claim 7, wherein the stage apparatus is provided. The first stage moves on a first base;
The stage apparatus according to claim 1, wherein the second stage moves on a second base different from the first base.   The stage apparatus according to claim 9, wherein the first base and the second base are arranged via a vibration isolation unit that reduces vibration.   The stage apparatus according to any one of claims 1 to 10, further comprising a self-weight canceling mechanism that cancels a self-weight that acts in a direction intersecting the horizontal plane of the substrate holder.   The stage apparatus according to claim 11, wherein the self-weight canceling mechanism is interposed between the second stage and the substrate holder.   The stage apparatus according to claim 11 or 12, wherein the self-weight canceling mechanism supports the substrate holder in a non-contact manner.   The stage device according to claim 11, wherein the self-weight canceling mechanism includes a support portion that supports the substrate holder so as to be swingable in an inclined direction in a non-contact state.   15. The stage apparatus according to claim 14, wherein the support portion includes an elastic body and a non-contact support portion that is connected to the elastic body and supports the substrate holder in a non-contact manner. In an exposure apparatus that exposes a mask pattern onto a substrate via a projection optical system,
A stage device that movably supports a substrate holder that holds the substrate;
An exposure apparatus comprising the stage apparatus according to any one of claims 1 to 15. 17. The first base that movably supports the first stage is integrally coupled to a mask stage that supports the mask and a column that supports each of the projection optical systems. Exposure equipment.

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