JP2011249555A - Stage apparatus, exposure apparatus, and device manufacturing method - Google Patents

Abstract

PROBLEM TO BE SOLVED: To provide a stage apparatus with which it becomes possible to suppress vibration of a moving body due to a reaction force generated at the time of driving of the moving body in two axial directions intersecting each other.SOLUTION: A stage apparatus includes: a stage main body that includes a Y moving body 202 driven by driving means 212 in a Y direction, an X moving body 209 driven by driving means 213 in an X direction, and a substrate stage base 203 installed over an installation surface 60 with anti-vibration means 208 in-between; and an auxiliary stage that followingly moves in synchronization with the driving in the Y direction under a state where a predetermined space from the main body is maintained. A reaction force generated by the driving of the main body in the Y direction is released to the installation surface 60, and the auxiliary stage releases a reaction force generated by the driving of the main body in the X direction to the installation surface 60 through guide means 216 and support means 217.

Description

  The present invention relates to a stage apparatus, an exposure apparatus including the stage apparatus, and a device manufacturing method.

  In a stage apparatus that needs to hold a workpiece and perform high-precision positioning, it is necessary to suppress vibration. In particular, when the main body of the stage device is configured by a moving body that holds the workpiece and a stage surface plate, and the machining is performed by driving the moving body, a reaction force is generated by the thrust applied by the driving. . When this reaction force is transmitted to the main body, the main body is vibrated, so a mechanism for canceling the reaction force is required. As an apparatus provided with such a stage apparatus, for example, there is an exposure apparatus that projects a mask pattern onto a substrate held on a moving body. Hereinafter, an exposure apparatus will be described as an example.

  Examples of the exposure apparatus include a step-and-repeat type exposure apparatus and a step-and-scan type exposure apparatus. In the former, the moving body repeatedly moves and stops at a predetermined distance, and the exposure light is collectively irradiated during the stop to transfer the pattern drawn on the mask onto the substrate. The latter is a method in which a pattern drawn on a mask is transferred onto a substrate by synchronously scanning a moving body composed of a mask stage and a substrate stage while irradiating exposure light only in a slit-shaped exposure region.

  In any exposure apparatus, for example, when an electromagnetic linear drive unit is employed as the drive unit for the moving body, a reaction force corresponding to the thrust applied to the mover is transmitted to the stator. When the stator is installed on the same installation surface on which the stage device is installed, the reaction force is transmitted to the stage device via this installation surface, and finally acts to vibrate the main body of the stage device. When the main body is subjected to such a vibration action, there is a disadvantage in that the imaging characteristics are deteriorated due to the deviation of the optical axis.

  For example, in the case of a step-and-scan exposure apparatus, the reaction force is generated simultaneously by synchronous scanning of the mask stage and the substrate stage. Therefore, conventionally, a stage device has been proposed in which each reaction force is transmitted to a rigid member installed at a position separated from the moving body via a transmission means (see, for example, Patent Document 1). The reaction forces transmitted to the rigid member by the respective transmission means are canceled out each other, and the vibration of the main body is suppressed. That is, a reaction force receiving structure for canceling the reaction force is provided to compensate for the suppression of the vibration. Further, for example, compensation by a counter mass that cancels the reaction force by providing a variable moving mass body and driving the moving body in a direction opposite to that of the moving body has been performed.

JP 2000-216084 A

  By the way, the above prior art has been proposed as canceling out the reaction force generated by the driving in the scanning direction. However, since the stage device is driven not only in the scanning direction (scanning direction) but also in a non-scanning direction (step direction) orthogonal to the scanning direction, a reaction force is also generated in this case. When the main body vibrates due to the reaction force generated by the driving in the step direction, it takes time to ensure the settling time, resulting in a disadvantage that the throughput is deteriorated. That is, in the case of the step-and-repeat type exposure apparatus, the exposure operation cannot be started until the moving body is positioned at a desired position. Further, in the case of a step-and-scan exposure apparatus, the next scanning process cannot be performed unless the synchronous setting of the mask stage and the substrate stage is sufficiently ensured.

  In addition, in order to cancel the reaction force generated by the driving in the step direction, it is possible to suppress the vibration by providing another structure such as a reaction force receiving structure and a counter mass as in the scanning direction. is there. However, if it is provided in both the scanning direction and the step direction, there is a disadvantage that the structure of the entire stage apparatus is complicated. Further, in recent years, the reaction force has increased with the increase in size and acceleration of the apparatus, so that a large-scale actuator is required, resulting in an increase in cost.

  Accordingly, an object of the present invention is to provide a stage device that can suppress vibration of a main body including a moving body due to a reaction force generated when the moving body is driven in two intersecting axial directions. .

In order to solve the above-mentioned problem, the present invention comprises a main body including a movable body that can move in a first axial direction and a second axial direction that intersect, and a stage surface platen on which the movable body is placed, A stage device having a driving means configured by a first driving means for driving the movable body in the first axial direction and a second driving means for driving in the second axial direction;
And a vibration isolating unit interposed between the main body and the installation surface of the main body, and an auxiliary stage on which the second driving unit is installed, and the auxiliary stage maintains a predetermined interval with respect to the moving body. In the state, the first driving means follows and moves in synchronization with the movement of the moving body in the first axial direction,
The main body and the auxiliary stage are insulated from vibration caused by a reaction force generated by the driving means when moved by the driving means.

  According to the present invention, there is an effect of suppressing the vibration of the main body due to the reaction force generated when the moving body is driven in the biaxial direction intersecting by the driving means.

It is a figure which shows schematic structure of the exposure apparatus which concerns on embodiment of this invention. It is a figure which shows the perspective view of the stage apparatus which concerns on embodiment of this invention. It is a figure which shows the side view seen from the scanning direction of the stage apparatus which concerns on embodiment of this invention. It is a figure which shows the side view seen from the non-scanning direction of the stage apparatus which concerns on embodiment of this invention.

  The best mode for carrying out the present invention will be described below with reference to the accompanying drawings. In the following description, a specific configuration, operation, and the like are shown and described, but these can be changed as appropriate.

  In the following embodiments, an example in which the stage apparatus according to the present invention is provided in a step-and-scan exposure apparatus will be described, but the present invention is not limited to this. Accordingly, a stage apparatus provided in a step-and-repeat type exposure apparatus may be used, and any stage apparatus may be used as long as it is driven in two intersecting axial directions, and is not limited to the substrate stage.

  FIG. 1 is a schematic view showing a configuration of a step-and-scan exposure apparatus including a stage apparatus according to an embodiment of the present invention.

  The exposure apparatus according to FIG. 1 is mainly configured by disposing an illumination optical system 40, a mask stage 30, a projection optical system 10, a stage apparatus 20 for holding a substrate W, and an interferometer 50 on a main body base 60. The exposure apparatus reduces and projects the pattern of the mask M held on the mask stage 30 onto the substrate W held on the stage apparatus 20 with the projection optical system 10 interposed therebetween. This reduction projection is performed by diffracted light emitted from the mask M using light from the light source of the illumination optical system 40 that irradiates the mask M. An observation optical system 41 is disposed between the illumination optical system 40 and the mask M. The observation optical system 41 can observe an image formed on the substrate W by the mask M and the projection optical system 10.

  The mask stage 30 has a mask stage surface plate 31 and a movement stage 32. The movement stage 32 is disposed on the mask stage surface plate 31, and the mask M is held thereon. The moving stage 32 allows the mask M to move in two axial directions (hereinafter referred to as “X and Y directions”) orthogonal to the horizontal direction with respect to the installation surface of the exposure apparatus. It can also move in the direction of rotation that rotates in the XY plane formed by two axes in the X and Y directions.

  By the reduction projection, the transfer of the pattern from the mask M to the substrate W is performed by synchronous scanning at the same speed ratio as the reduction magnification ratio of the mask M and the substrate W. Each area on the substrate W to which the pattern to be transferred of the mask M is transferred is called a shot. On the substrate W, alignment marks used for alignment with each shot are formed (not shown). This alignment mark can be observed with the observation optical system 41.

  The stage device 20 uses an electromagnetic linear drive means (linear motor), and is movable in the X direction, the Y direction, the rotation direction, and the Z direction parallel to the axis orthogonal to the XY plane, and is connected to the substrate via a chuck (not shown). A moving body that moves while holding W is provided.

  The interferometer 50 measures the respective positions of the mask stage 30 and the stage apparatus 20. The interferometer 50 includes a laser head 51 serving as a light source of detection light, a beam splitter 52, a bending mirror 53, and bar mirrors 54 and 55 that reflect detection light.

  Next, the stage apparatus 20 according to the present invention will be described with reference to FIGS. As described above, in this embodiment, a stage apparatus mounted on a step-and-scan exposure apparatus will be described as an example, but the present invention is not limited to this. Accordingly, in FIG. 2 to FIG. 4, the two axes in the X and Y directions are described, but the first and second axis directions that intersect each other may be used, and are limited to the X and Y directions. is not. 2 to 4 is a step direction (non-scanning direction), and a Y direction is a scanning direction (scanning direction). 2 is a perspective view of the stage apparatus 20, FIG. 3 is a side view of the stage apparatus 20 viewed from the Y direction, and FIG. 4 is a side view of the stage apparatus 20 viewed from the X direction. Further, in FIGS. 2 to 4, for convenience of explaining the operations in the X and Y directions, the mechanism relating to the rotation direction and Z direction operation of the stage device 20 is omitted.

  The stage apparatus 20 holds the substrate W with the substrate holder 201. The substrate holder 201 is installed on a movable body that is movable in the X direction and the Y direction, and the movable body is placed on the substrate stage surface plate 203. This moving body includes a Y moving body 202 that moves in the Y direction and an X moving body 209 that moves in the X direction. The main body of the stage apparatus 20 includes the moving body and the substrate stage surface plate 203.

  The Y moving body 202 is guided by the Y guide 205 provided on the substrate stage surface plate 203 via the air bearing 204 and moves in the Y direction. In this embodiment, two Y guides 205 are provided, but the present invention is not limited to this. The substrate stage surface plate 203 is provided with a yaw guide 206 in parallel with the Y guide 205 in order to restrict yawing of the Y moving body 202. Note that the yaw guide 206 also guides the Y moving body 202 via the air bearing 207, similarly to the Y guide 205. The yaw guide 206 is installed in the middle of the two Y guides 205 on the substrate stage surface plate 203. Substrate stage surface plate 203 is installed on installation surface 60 (main body base 60 in the above exposure apparatus) with vibration-proof means 208 interposed. The anti-vibration means 208 may be, for example, a mount that has a spring element and a damping element and blocks transmission of vibration from the installation surface. In addition to the passive type, the mount may be actively controlled, and the number of supporting points to the substrate stage surface plate 203 is not particularly limited.

  The X moving body 209 is provided on the Y moving body 202 and is guided by an X guide 210 provided on the Y moving body 202 via the air bearing 211 and moves in the X direction.

  In this embodiment, the driving means for driving the Y moving body 202 and the X moving body 209 in the respective axial directions will be described using electromagnetic linear driving means (linear motor) including a mover and a stator. . In this case, preferably, a permanent magnet is used as the mover and a coil is used as the stator. In the present embodiment, a pair of electromagnetic linear drive means is provided in each axial direction with the main body interposed therebetween, but the number of installation is not limited to this. Further, the driving means is not limited to the electromagnetic linear driving means, and may be other driving means such as a ball screw method.

  The driving means 212 (first driving means) for driving the Y moving body 202 in the Y direction is composed of a movable element 212a formed in a plate shape and a stator 212b in which a movable range of the movable element 212a is formed by a concave groove. The In the present embodiment, two driving means 212 including the movable element 212 a and the stator 212 b are installed on the Y moving body 202 and the main body base 60. The mover 212a extends from the both ends of the bottom surface of the Y moving body 202 toward the installation surface 60 as viewed from the Y direction. The stator 212b is installed on the installation surface 60 at a position separated from the main body with the substrate stage surface plate 203 interposed therebetween so as to be parallel to the Y guide 205 in the short direction. The mover 212a is installed so as not to contact the concave groove of the stator 212b through a slight gap.

  Similarly to the driving unit 212, the driving unit 213 (second driving unit) that drives the X moving body 209 in the X direction includes a mover 213a and a stator 213b. In the present embodiment, two driving means 213 including the movable element 213 a and the stator 213 b are installed on the X moving body 209 and the auxiliary stage 214. The mover 213a extends from both end portions of the bottom surface of the X moving body 209 toward the substrate stage surface plate 203 as viewed from the X direction. The stator 213b is installed in non-contact with the moving body so as to be parallel to the X guide 210 in the lateral direction. The mover 213a is installed so as not to contact the concave groove of the stator 213b through a slight gap.

  As described above, in order to install the stator 213b in a non-contact manner from the moving body, the stator 213b is synchronized with the movement of the moving body in the Y direction while maintaining a predetermined distance from the moving body. Installed on the auxiliary stage 214 that moves following the movement. In the present embodiment, the auxiliary stage 214 includes a pair of plate-like bodies 214a and 214b arranged to face each other with the moving body sandwiched in a non-contact manner. The pair of plate-like bodies 214a and 214b are connected by connecting members 214c and 214d installed at both ends of each facing surface. In the auxiliary stage 214 according to the present embodiment, the stator 213b is installed on each of the plate-like bodies 214a and 214b. A driving unit 218 (third driving unit) is provided to cause the auxiliary stage 214 to follow and move in synchronization with the movement of the moving body in the Y direction. Similarly to the first driving means and the second driving means, the driving means 218 includes a mover 218a and a stator 218b. The mover 218a is installed at both ends of the plate-like body 214a and the plate-like body 214b as viewed from the Y direction. The stator 218b is installed in parallel with each stator 212b of the first driving means at a position separated from the main body. Note that the auxiliary stage 214 may follow and move in synchronization with the movement of the main body in the Y direction. Therefore, in order to reduce the number of parts, the auxiliary stage 214 may be driven by the first driving means without providing the third driving means.

  The following movement guidance is performed by the guidance means 216. The guide means 216 is arranged in parallel with the stator 218 b and is supported by a plurality of support means 217 installed on the installation surface 60. Plate-like bodies 214 a and 214 b are placed on the guide means 216 via linear guide nuts 215. In the present embodiment, the support means 217 is installed between the stator 212b and the stator 218b, but is not limited to these positional relationships. Further, the support means 217, the stator 212b, and the stator 218b are all installed on the installation plane 60 on the same plane, but need not be in direct contact with the main body, and should be installed on the same plane. It is not limited to. Therefore, for example, the stator 218b may be installed on the side wall surface. Further, in the present embodiment, the support means 217 is directly installed on the installation surface 60, but the vibration isolation means is different from the vibration isolation means 208 interposed between the substrate stage surface plate 203 and the installation surface 60. You may install it through a means.

  The clearance between the mover 213a and the stator 213b is determined by the positional relationship between the main body and the auxiliary stage 214. When the distance between the main body and the auxiliary stage 214 varies, the mover 213a and the stator 213b may come into contact with each other. Therefore, it is only necessary to provide a measurement means for measuring the distance and to provide a feedback control means for controlling the position of the auxiliary stage 214 in order to maintain the measured distance at a predetermined distance (not shown). For example, an interferometer may be used as the measuring means.

  Next, with reference to FIG. 2 and FIG. 3, the operation when the stage device 20 is driven by the driving means 212 and the driving means 213 will be described. First, when driving in the Y direction, that is, in the scanning direction (scanning direction), a current is passed through the stator 212b of the driving unit 212 at a predetermined phase. With this current, Lorentz force acts on the magnet included in the mover 212a, and thrust is generated in the mover 212a. This thrust drives the Y moving body 202 in a predetermined direction, but at the same time, a reaction force is generated in the stator 212b. Since the stator 212 b is installed on the installation surface 60, this reaction force is transmitted to the installation surface 60. The installation surface 60 vibrates due to this reaction force. However, the substrate stage surface plate 203 on which the Y moving body 202 is placed is insulated from the vibration because the vibration isolating means 208 is interposed between the substrate stage surface plate 203 and the installation surface 60. Accordingly, the energy due to the vibration is attenuated, and the influence of the vibration hardly reaches the Y moving body 202 and the stage surface plate 203.

  When the auxiliary stage 214 is moved in synchronization with the Y-direction drive, a current is passed through the stator 218b of the drive unit 218 at a predetermined phase. With this current, a thrust is generated in the mover 218a as described above, and the auxiliary stage 214 can be moved following. At this time, the reaction force generated in the stator 218b is also transmitted to the installation surface 60 to vibrate the installation surface 60. As described above, the Y moving body 202, the stage surface plate 203, and the auxiliary stage 214 are moved by the vibration isolating means 208. Insulated against vibration. Therefore, this vibration hardly reaches the Y moving body 202, the stage surface plate 203, and the auxiliary stage 214.

Next, when the stage device 20 is driven in the X direction, that is, in the step direction (non-scanning direction), first, a current is passed through the stator 213b of the driving unit 213 at a predetermined phase. With this current, Lorentz force acts on the magnet included in the mover 213a, and thrust is generated in the mover 213a. With reference to FIG. 3, arrow T indicates the direction in which the thrust acts. The thrust T drives the X moving body 209 in a predetermined direction, but at the same time, a reaction force is generated in the stator 213b. 3 indicates the direction in which the reaction force R works. The reaction force R is transmitted to the installation surface 60 through the plate-like body 214a of the auxiliary stage 214, the guide means 216, and the support means 217, as shown in FIG. The installation surface 60 vibrates due to this reaction force, but the energy due to this vibration is almost damped by the vibration isolating means 208 as in the case of the Y direction. Therefore, even in the case of driving in the step direction, the X moving body 209 and the stage surface plate 203 are insulated and this vibration hardly reaches the X moving body 209 and the stage surface plate 203.
From the above, the vibration hardly affects the X moving body 209, the Y moving body 202, the stage apparatus 20 main body of the stage surface plate 203, and the auxiliary stage 214.

  As described above, the support means 217 is also provided with another vibration isolating means between the installation surface 60 and the energy is attenuated before the reaction force R is transmitted to the installation surface 60. In combination with the vibration isolating means 208, a better effect can be obtained.

  Next, a method for manufacturing a device (semiconductor device, liquid crystal display device, etc.) according to an embodiment of the present invention will be described. A semiconductor device is manufactured through a pre-process for producing an integrated circuit on a wafer and a post-process for completing an integrated circuit chip on the wafer produced in the pre-process as a product. The pre-process includes a step of exposing a wafer coated with a photosensitive agent using the above-described exposure apparatus, and a step of developing the wafer. The post-process includes an assembly process (dicing and bonding) and a packaging process (encapsulation). A liquid crystal display device is manufactured through a process of forming a transparent electrode. The step of forming the transparent electrode includes a step of applying a photosensitive agent to a glass substrate on which a transparent conductive film is deposited, a step of exposing the glass substrate on which the photosensitive agent is applied using the above-described exposure apparatus, and a glass substrate. The process of developing is included. According to the device manufacturing method of the present embodiment, it is possible to manufacture a higher quality device than before.

20: Stage device 60: Installation surface 201: Substrate holder 202: Y moving body 203: Substrate stage surface plate 204: Air bearing 205: Y guide 206: Yaw guide 207: Air bearing 208: Anti-vibration means 209: X moving body 210: X guide 211: Air bearing 212: Driving means (first driving means)
213: Driving means (second driving means)
214: Auxiliary stage 215: Linear guide nut 216: Guide means 217: Support means 218: Drive means (third drive means)

Claims (8)

A main body composed of a movable body movable in the intersecting first and second axial directions, and a stage surface platen on which the movable body is placed, and the movable body is driven in the first axial direction. A stage device having a driving means composed of a first driving means and a second driving means for driving in a second axial direction,
And a vibration isolating unit interposed between the main body and the installation surface of the main body, and an auxiliary stage on which the second driving unit is installed, and the auxiliary stage maintains a predetermined interval with respect to the moving body. In the state, the first driving means follows and moves in synchronization with the movement of the moving body in the first axial direction,
The stage apparatus, wherein the main body and the auxiliary stage are insulated from vibration caused by a reaction force generated by the driving means when moved by the driving means.   The auxiliary stage includes guide means for guiding movement in the first axial direction, and support means for supporting the guide means. The support means is provided on the installation surface separately from the vibration isolation means. The stage apparatus according to claim 1, wherein the stage apparatus is installed with a vibration isolating means interposed therebetween.   The drive means has third drive means for following and moving the auxiliary stage instead of the first drive means, and the main body and the auxiliary stage are when the auxiliary stage moves by the third drive means. The stage apparatus according to claim 1, wherein the stage apparatus is insulated from vibration caused by a reaction force generated by the third driving means.   The drive means is constituted by a pair of electromagnetic linear drive means sandwiching the main body in parallel with the first axial direction or the second axial direction for driving the movable body or the auxiliary stage. The stage apparatus according to any one of claims 1 to 3, wherein   The auxiliary stage is composed of a pair of plate-like bodies arranged to face each other with the moving body sandwiched in a non-contact manner, and a connecting member that connects both ends of the opposed surfaces of the pair of plate-like bodies, 5. A stage apparatus according to claim 4, wherein a pair of electromagnetic linear drive means for driving the movable body in the second axial direction are respectively installed on a pair of plate-like bodies.   In order to maintain the distance between the main body and the auxiliary stage at a predetermined distance from the measuring means for measuring the distance between the main body and the auxiliary stage, and the distance measured by the measuring means, 6. The stage apparatus according to claim 1, further comprising feedback control means for controlling the position. An exposure apparatus that projects a mask pattern onto a substrate held on the movable body,
The exposure comprising the stage device according to any one of claims 1 to 6, wherein the first axial direction is a scanning direction, and the second axial direction is a non-scanning direction. apparatus.   8. A device manufacturing method comprising: exposing a substrate using the exposure apparatus according to claim 7; and developing the substrate.

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