CN117631466A - Stage device, substrate processing device, exposure device, and method for manufacturing article - Google Patents
Stage device, substrate processing device, exposure device, and method for manufacturing article Download PDFInfo
- Publication number
- CN117631466A CN117631466A CN202311061343.4A CN202311061343A CN117631466A CN 117631466 A CN117631466 A CN 117631466A CN 202311061343 A CN202311061343 A CN 202311061343A CN 117631466 A CN117631466 A CN 117631466A
- Authority
- CN
- China
- Prior art keywords
- mounting table
- stage
- substrate
- actuator
- measurement data
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000758 substrate Substances 0.000 title claims abstract description 70
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 18
- 238000000034 method Methods 0.000 title claims abstract description 18
- 238000012545 processing Methods 0.000 title claims abstract description 9
- 230000007246 mechanism Effects 0.000 claims abstract description 75
- 238000005259 measurement Methods 0.000 claims abstract description 42
- 238000006073 displacement reaction Methods 0.000 claims abstract description 15
- 230000003287 optical effect Effects 0.000 claims description 20
- 230000009467 reduction Effects 0.000 claims description 10
- 230000008569 process Effects 0.000 claims description 5
- 125000002030 1,2-phenylene group Chemical group [H]C1=C([H])C([*:1])=C([*:2])C([H])=C1[H] 0.000 claims description 3
- 210000003205 muscle Anatomy 0.000 claims description 3
- 230000001133 acceleration Effects 0.000 description 6
- 230000008859 change Effects 0.000 description 6
- 238000010586 diagram Methods 0.000 description 5
- 238000013016 damping Methods 0.000 description 4
- 238000005286 illumination Methods 0.000 description 4
- 238000004556 laser interferometry Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 239000011521 glass Substances 0.000 description 2
- 230000004048 modification Effects 0.000 description 2
- 238000012986 modification Methods 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- 238000000137 annealing Methods 0.000 description 1
- 238000005452 bending Methods 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 239000003795 chemical substances by application Substances 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005611 electricity Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 230000006870 function Effects 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 238000010801 machine learning Methods 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000004806 packaging method and process Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 230000001629 suppression Effects 0.000 description 1
- 230000001360 synchronised effect Effects 0.000 description 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
- G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
Abstract
The present invention relates to a stage device, a substrate processing device, an exposure device, and a method for manufacturing an article. Has a carrying table; a movable cable connected to the mounting table and following the mounting table in response to driving of the mounting table; a reducing mechanism that reduces vibration transmitted from the movable cable; an actuator that applies a force to the lowering mechanism; a 1 st measurement unit that obtains 1 st measurement data concerning displacement of at least one of the lowering mechanism and the movable cable; and a control section that controls the actuator based on the 1 st measurement data, the lowering mechanism being configured to be rotatable.
Description
Technical Field
The present invention relates to a stage device, a substrate processing device, an exposure device, and a method for manufacturing an article.
Background
In the production of liquid crystal panels, organic EL displays, and the like, exposure devices that expose a substrate (glass substrate) coated with a sensitizer through a projection optical system are used for a pattern of a master (mask). In recent years, the demands for higher definition of exposure apparatuses have increased, and it has been demanded to reduce the influence of vibrations caused by a substrate stage and a mask stage (hereinafter, both are collectively referred to as a stage).
Further, since a plurality of pipes for supplying electricity, air, liquid, and the like are connected to the mounting table, a movable cable, i.e., a so-called cable tow chain (registered trademark), which guides the plurality of pipes so as to follow the driving of the mounting table in a state where the plurality of pipes are held in a concentrated manner, may be used. The shape of the movable cable changes with the driving of the mounting table, and thus vibration can be generated, and thus vibration may be transmitted to the mounting table.
Patent document 1 discloses a vibration damping mechanism that detects vibration transmitted to a movable cable by an acceleration sensor and damps vibration of a mounting table.
Patent literature
Patent document 1: japanese patent application laid-open No. 2015-081993
Disclosure of Invention
Problems to be solved by the invention
However, with the increase in the speed of the drive of the stage required for the improvement of productivity, a technique for suppressing vibration more effectively than the vibration reduction method described in patent document 1 is demanded. In patent document 1, since the avoidance mechanism is not provided between the movable cable and the mounting table, there is a possibility that the avoidance mechanism is greatly affected by vibration from the movable cable to the mounting table.
Accordingly, an object of the present invention is to provide a mounting table device advantageous in suppressing vibration of a mounting table accompanying vibration of a movable cable.
In order to achieve the above object, a stage device according to an aspect of the present invention includes: a mounting table; a movable cable connected to the mounting table and following the mounting table in accordance with driving of the mounting table; a lowering mechanism that lowers vibration transmitted from the movable cable; an actuator that applies a force to the lowering mechanism; a 1 st measurement unit that obtains 1 st measurement data concerning displacement of at least one of the lowering mechanism and the movable cable; and a control unit configured to control the actuator based on the 1 st measurement data, the lowering mechanism being rotatable.
Further features of the invention will become apparent from the following description of exemplary embodiments (with reference to the accompanying drawings).
Drawings
Fig. 1 is a schematic diagram showing the overall configuration of an exposure apparatus.
Fig. 2 is a diagram showing a structure of the substrate mounting table mechanism.
Fig. 3 is a flowchart showing a process of vibration reduction in the substrate stage mechanism.
Fig. 4 is a diagram for explaining a state in which vibration is generated in the movable cable.
Fig. 5 is a flow chart illustrating a process of a method of manufacturing an article.
(description of the reference numerals)
3: a movable cable; 4: a avoidance mechanism; 9: an actuator; 12: a displacement meter (1 st measuring section); 30: a mounting table mechanism; 32: a Y-stage; 33: an X-stage; 60: and a control unit.
Detailed Description
Hereinafter, preferred embodiments of the present invention will be described in detail with reference to the accompanying drawings. In the drawings, the same members are denoted by the same reference numerals, and overlapping description thereof is omitted.
< embodiment 1 >
The configuration of the exposure apparatus having the stage mechanism mounted thereon in this embodiment will be described. The exposure apparatus in the present embodiment is an apparatus used in a photolithography process in manufacturing a device such as a semiconductor device or a Flat Panel Display (FPD). The exposure device transfers the pattern of the original plate (mask) to the substrate coated with the photosensitive agent via the projection optical system, thereby forming a latent image pattern in a pattern region of the substrate. The exposure apparatus in the present embodiment may be a so-called step-and-scan type exposure apparatus that scans and exposes a pattern of an original plate to a plurality of pattern areas in a substrate via a projection optical system, but may be a step-and-repeat type exposure apparatus.
Fig. 1 is a schematic diagram showing the overall configuration of an exposure apparatus 1 in the present embodiment. In the present embodiment, the coordinate system is defined by using the surface on which the original plate 23 and the substrate 36 are placed as the XY plane and the direction perpendicular to the XY plane as the Z direction. The exposure apparatus 1 may include an illumination optical system 41, an alignment measuring section 40, a master stage 20, a projection optical system 10, a substrate stage mechanism 30, a main body base 31, a laser interference length measuring device 50, and a control section 60.
The light emitted from the light source illuminates the master 23 via an optical system in the illumination optical system 41.
The illumination optical system 41 includes a member that defines an area for illuminating the original plate 23, and illuminates the original plate 23 with light in a band shape or an arc shape, for example.
The original plate 23 and the substrate 36 (e.g., glass substrate, wafer) are held by the original mount 20 and the substrate mount 35, respectively, and are disposed at positions (object plane and image plane of the projection optical system 10) substantially optically conjugate via the projection optical system 10. The master stage 20 and the substrate stage 35 are individually movable, and the movement positions thereof are controlled by measurement by the laser interferometry 50. In the present embodiment, the original mount 20 and the substrate mount 35 are synchronized with each other in a direction (Y direction in the present embodiment) orthogonal to the optical axis direction (Z direction) of the projection optical system 10, and are scanned at a speed ratio corresponding to the projection magnification of the projection optical system 10.
The projection optical system 10 is, for example, a mirror projection type projection optical system composed of a plurality of mirrors, and has a predetermined projection magnification (for example, equal magnification, 1/2 magnification, etc.), and projects the pattern formed on the original plate 23 onto the substrate 36.
The exposure apparatus 1 can complete exposure processing of 1 substrate by sequentially repeating each of the plurality of pattern areas on the substrate P while moving the substrate stage 35 stepwise. When the pattern of the original plate 23 is transferred to each pattern region on the substrate 36 in this way, the pattern region and the original plate 23 may be aligned.
The exposure apparatus 1 has an alignment measurement section 40 between the illumination optical system 41 and the master 23, and the alignment measurement section 40 includes at least 1 alignment observer. The alignment measuring section 40 in the present embodiment has 2 alignment observers arranged at a predetermined distance in the X direction. In addition, each alignment observer is configured in the exposure apparatus 1 so as to be drivable in the XY plane. Accordingly, the alignment measuring section 40 can observe the respective alignment marks of the pattern region formed on the substrate 36 and the respective alignment marks formed on the master 23 via the projection optical system 10.
The substrate stage mechanism 30 (stage device) includes a Y stage 32, an X stage 33, a θz stage 34, and a substrate stage 35. A Y stage 32 that can be driven in the Y direction may be disposed above the main body base 31. An X stage 33 that can be driven in the X direction can be disposed on the Y stage 32. A θz stage 34 that is drivable in a rotation direction around the Z axis and in the Z direction may be arranged above the X stage 33. The substrate stage 35 holding the substrate 36 may be disposed on the θz stage 34. The Z drive in the θz stage 34 functions to align the surface of the substrate 36 with the focal plane of the projection optical system 10 at the time of exposure.
The substrate stage 35 is also called a substrate chuck. The substrate stage mechanism 30 drives the Y stage 32, the X stage 33, and the θz stage 34, thereby controlling the XYZ position of the substrate 36 and the rotational position about the Z axis.
The original mount 20 and the substrate mount mechanism 30 each perform position measurement by the laser interference length measuring device 50. The laser interference length measuring device 50 includes a laser head 51, a beam splitter 52, an interference mirror 53, a 1 st mirror 54 attached to the θz stage 34, and a 2 nd mirror 55 attached to the original stage 20. The control unit 60 controls each part of the exposure apparatus 1.
Next, a detailed configuration of the substrate mounting table mechanism 30 in the present embodiment will be described. Fig. 2 is a view showing a +y arrow view (fig. 2 (a)) and a +z arrow view (fig. 2 (b)) of the stage mechanism. The movable cable 3 is fixed by the clamp 8 of the cable terminal so as to follow the X-stage 33. On the other hand, the clamping portion 11 on the X stage 33 side serves as a avoiding mechanism that can slide freely in the Y direction and the Z axis rotation direction. The avoidance mechanism 4 (lowering mechanism) has a bearing 5, an intermediate member 6, a linear guide 7, and a clamp portion 11. The avoidance mechanism 4 can change the displacement of the movable cable 3 to a predetermined direction (for example, the Y direction and the rotation direction around the Z axis). For example, the avoidance mechanism 4 can change the vibration of the movable cable 3 to a predetermined direction. The avoidance mechanism 4 is rotatable in accordance with the force transmitted from the movable cable 3.
Here, it is assumed that the clamp unit 11 is not provided with a avoidance mechanism, and the X-stage 33 is directly fixed to the clamp unit 11. If the clamping portion 11 of the X-stage 33 is directly fixed, an impact (vibration) generated when the bending position of the movable cable 3 moves with the movement of the X-stage 33 is directly transmitted to the X-stage 33. Since a very high positioning accuracy is required for a stage of an exposure apparatus, such vibration, which is not very problematic in general machine tools and conveying machines, may cause deterioration of the positioning accuracy of the stage and a long period of time for the stage to be positioned still.
Therefore, in the present embodiment, the vibration from the movable cable 3 is changed to the free sliding direction (Y direction and the rotation direction around the Z axis) by the avoidance mechanism 4, whereby the suppression of the vibration can be effectively performed.
Further, the substrate mounting table mechanism 30 includes a cylinder actuator 9 that applies a force to the avoidance mechanism 4 in accordance with the free sliding direction of the clamp portion 11. As shown in fig. 2 (b), for example, the substrate mounting table mechanism 30 includes a plurality of actuators 9a to 9d. By independently controlling the actuators 9a to 9d, an arbitrary force can be applied to the avoidance mechanism 4 in the XY plane direction. The number of actuators is not limited to 4, but may be only 2 of the actuators 9a and 9b, or may be only 1 actuator if the actuator is configured to be capable of applying a force in the rotational direction. The driving of the actuator 9 is controlled by the control unit 60.
In the present embodiment, since the avoiding mechanism 4 is provided in the clamp portion 11, the mount table can be damped if vibration is of a certain degree. However, when the vibration of the movable cable is large, the vibration of the movable cable 3, which cannot be damped only by the avoidance mechanism 4, can be damped by actively driving the actuator 9.
As shown in fig. 2 (a), the substrate mounting table mechanism 30 further includes a displacement meter 12 (1 st measuring unit) such as a rotary encoder or a linear encoder, and a computer 13. The displacement meter 12 can acquire information (information such as displacement, velocity, acceleration, etc., hereinafter also referred to as 1 st measurement data) related to the displacement of at least one of the movable cable 3 and the avoidance mechanism 4. The displacement meter 12 may be provided on the movable cable 3 and the avoidance mechanism 4.
The computer 13 acquires the 1 st measurement data acquired by the displacement meter 12. The computer 13 calculates the driving amounts of the actuators 9a to 9d based on the 1 st measurement data. The computer 13 may acquire positional information (2 nd measurement data) of a stage (for example, the X stage 33) measured by the laser interferometry length measuring device 50 (2 nd measurement unit). The computer 13 may calculate the driving amounts of the actuators 9a to 9d based on the 1 st measurement data and the 2 nd measurement data.
The actuators 9a to 9d acquire information on the drive amounts of the actuators calculated by the computer 13. By driving the actuator based on the obtained driving amount, a force can be applied to the avoidance mechanism 4.
Next, a control method of the substrate mounting table mechanism 30 configured as described above will be described. Fig. 3 is a flowchart showing a procedure of the vibration reduction method in the substrate mounting table mechanism 30. The flowchart of fig. 3 is executed by the control unit 60 controlling each section.
At the beginning of the flow chart, the substrate stage mechanism 30 is stationary. The clamping portion 11 on the X-stage 33 side of the movable cable 3 is preloaded by the actuators 9a to 9d to be in an equilibrium state.
In step S101, the substrate mounting table mechanism 30 is driven in the horizontal direction. By driving the Y stage 32 and the X stage 33, the movable cable 3 deforms due to inertial force, and vibration is generated. Fig. 4 is a diagram showing an example of the states of the movable cable 3 and the substrate stage mechanism 30 when the Y stage 32 and the X stage 33 are driven in S101. The movable cable 3 is twisted and changed in shape by driving the Y stage 32 and the X stage 33, and is in a state in which vibration is generated.
In step S102, the 1 st measurement data is measured by the displacement meter 12. In addition, the 2 nd measurement data is measured by the laser interferometry length meter 50. Then, the 1 st measurement data and the 2 nd measurement data are input into the computer. Based on the 1 st measurement data and the 2 nd measurement data, the speeds and accelerations of the clamp unit 11 and the substrate stage mechanism 30 are calculated. The position, speed, and acceleration of the substrate stage mechanism are obtained because the shape change of the movable cable 3 depends on the position, speed, and acceleration of the substrate stage mechanism. In addition, when the shape change of the movable cable 3 can be estimated using only the 1 st measurement data, the 2 nd measurement data does not need to be acquired.
In step S103, the damping force required for vibration damping is calculated by a computer based on the speeds and accelerations of the clamp unit 11 and the substrate mounting table mechanism 30 calculated in step S102.
In step S104, the driving amount of the actuator 9 is determined based on the damping force calculated in step S103. In the example of fig. 4, the actuators 9b and 9d are driven by a larger amount than the actuators 9a and 9c, so that the position of the avoidance mechanism 4 can be returned to the initial position where it was originally arranged.
In step S105, based on the driving amount determined in step S104, the actuator 9 is driven to suppress vibration of the movable cable 3, and vibration of the X-stage 33 and the Y-stage 32 is reduced.
In step S106, it is determined whether or not the vibration reduction process is completed. If not, the routine returns to step S102, and feedback control is performed to circulate the measurement and the driving of the actuator.
As described above, the avoidance mechanism 4 converts the vibration generated in the movable cable 3 into the movement in the Y direction and the rotation direction, thereby reducing the vibration. Further, by controlling and suppressing excessive vibration by the actuator 9, vibration of the movable cable 3 can be suppressed and vibration to the X-stage 33 and the Y-stage 32 can be reduced.
In the present embodiment, since vibration can be suppressed even when the driving speed of the substrate stage mechanism is increased, it is also advantageous to improve productivity. In the present embodiment, the avoidance mechanism is applied to only one clamping portion of the movable cable subject to the driving of the X-stage 33, but may be applied to the clamping portion of the movable cable at the other end. In the present embodiment, the example of application to the substrate stage mechanism has been described, but the present invention can also be applied to a stage mechanism of a master stage.
(modification)
In the above, the example of vibration reduction by feedback control is described, but vibration reduction may be performed by combining feedback control and feedforward control. In order to perform feedforward control, it is necessary to collect in advance the relationship between the table drive and the vibration of the movable cable, and the like. Further, information on vibration reduction in the past may be stored, and the driving amount of the actuator 9 required for vibration reduction may be predicted by machine learning or the like.
In addition, the degree of freedom of the avoidance mechanism may be changed. For example, a 6-axis (each translational direction in XYZ direction and each rotational direction about XY Z axis) avoidance mechanism combining a ball joint and a linear guide may be used. In addition, the high vibration reduction structure can be realized by adding an actuator in cooperation with the free sliding direction.
In addition, the actuator 9 may be a rotary actuator instead of a cylinder type actuator. By using the rotary actuator, the plurality of cylinder actuators 9 for controlling the rotation direction in fig. 2 (b) and the bearing 5 configured in the avoidance mechanism 4 can be eliminated, and therefore space saving can be achieved.
In addition to the mechanism for controlling the vibration of the clamp unit 11 by the actuator 9, the movable cable 3 may include a tube containing o-phenylene and artificial muscles. The o-phenylene group can change the rigidity of the movable cable 3 according to the current and voltage with respect to the shape change of the movable cable 3. The artificial muscle is capable of varying the rigidity of the movable cable 3 according to the air pressure. In driving the stage mechanism, the rigidity of the movable cable 3 is increased (that is, the deformation amount of the movable cable 3 is suppressed) at a timing before the influence of the vibration on the stage is increased, whereby the influence on the vibration of the stage mechanism can be reduced.
< embodiment of method for producing article >
The method for manufacturing an article according to an embodiment of the present invention is suitable for manufacturing articles such as Flat Panel Displays (FPDs), semiconductor devices, sensors, and optical elements, for example. Fig. 5 is a flow chart illustrating a process of a method of manufacturing an article. The method for manufacturing an article according to the present embodiment includes: a step of forming a latent image pattern on a photosensitive material coated on a substrate by exposure by the above-described exposure apparatus 1, and obtaining an exposed substrate (exposure step, step S201). In addition, the method comprises the steps of: and a step of developing the exposed substrate on which the latent image pattern is formed in the step (developing step, step S202) to obtain a developed substrate. Further, the manufacturing method includes other known steps (oxidation, film formation, vapor deposition, doping, planarization, etching, resist stripping, dicing, bonding, packaging, and the like) (processing step, step S203). The method for producing an article according to the present embodiment is advantageous in at least one of performance, quality, productivity, and production cost of the article as compared with conventional methods.
While the preferred embodiments of the present invention have been described above, the present invention is not limited to these embodiments, and various modifications and changes can be made within the scope of the gist thereof. The present invention can be applied to, for example, a substrate mounting table mechanism of a substrate processing apparatus such as a semiconductor manufacturing apparatus (film forming apparatus, sputtering apparatus, annealing apparatus, etc.), an organic EL vapor deposition apparatus, or a nanoimprint apparatus.
According to the present invention, it is possible to provide a mounting table device advantageous in suppressing vibration of the mounting table accompanying vibration of the movable cable.
Claims (18)
1. A mounting table device is characterized by comprising:
a mounting table;
a movable cable connected to the mounting table and following the mounting table in response to driving of the mounting table;
a lowering mechanism that lowers vibration transmitted from the movable cable;
an actuator that applies a force to the lowering mechanism;
a 1 st measurement unit that obtains 1 st measurement data concerning displacement of at least one of the lowering mechanism and the movable cable; and
a control unit configured to control the actuator based on the 1 st measurement data,
the lowering mechanism is configured to be rotatable.
2. The mounting table device according to claim 1, further comprising:
a 2 nd measurement unit for acquiring 2 nd measurement data concerning the displacement of the stage,
the control unit drives the actuator to damp vibration of the mounting table based on the 1 st measurement data and the 2 nd measurement data.
3. The stage device according to claim 1, wherein,
the control unit controls the actuator so as to damp vibrations from the movable cable.
4. The stage device according to claim 1, wherein,
the lowering mechanism includes a bearing and a linear guide.
5. The mounting table device according to claim 1, further comprising:
and a computer configured to calculate an attenuation force required for vibration reduction of the mounting table based on the 1 st measurement data, and determine a driving amount of the actuator.
6. The mounting table device according to claim 2, further comprising:
and a computer configured to calculate an attenuation force required for vibration reduction of the mounting table based on the 1 st measurement data and the 2 nd measurement data, and determine a driving amount of the actuator.
7. The stage device according to claim 1, wherein,
the movable cable is connected to the mounting table and a mounting table different from the mounting table, and a lowering mechanism is provided on at least one of the mounting table and the different mounting table.
8. The stage device according to claim 1, wherein,
the control unit drives the actuator so as to return the position of the lowering mechanism to the initial position where the actuator is initially disposed.
9. The stage device according to claim 1, wherein,
the control unit damps the vibration of the mounting table by feedback control.
10. The stage device according to claim 1, wherein,
the control unit damps the vibration of the mounting table by feedback control and feedforward control.
11. The stage device according to claim 1, wherein,
the lowering mechanism is a lowering mechanism having degrees of freedom in 6 axes.
12. The stage device according to claim 1, wherein,
the actuator is a rotary actuator.
13. The stage device according to claim 1, wherein,
the movable cable comprises an o-phenylene or artificial muscle.
14. The stage device according to claim 1, wherein,
the lowering mechanism is rotatable and is configured to be directly movable.
15. A mounting table device is characterized by comprising:
a mounting table;
a movable cable connected to the mounting table and following the mounting table in response to driving of the mounting table;
a lowering mechanism that lowers vibration transmitted from the movable cable;
an actuator that applies a force to the lowering mechanism;
a 1 st measurement unit that obtains 1 st measurement data concerning displacement of at least one of the lowering mechanism and the movable cable;
a 2 nd measurement unit configured to acquire 2 nd measurement data concerning a displacement of the stage; and
and a control unit that controls the actuator based on the 1 st measurement data and the 2 nd measurement data.
16. A substrate processing apparatus, comprising:
a substrate mounting table for holding a substrate by the mounting table device according to any one of claims 1 to 15,
the substrate processing apparatus processes a substrate held by the substrate stage.
17. An exposure apparatus, comprising:
a substrate stage for holding a substrate by the stage device according to any one of claims 1 to 15; and
a projection optical system for projecting the original pattern onto the substrate,
the exposure device exposes the substrate held by the substrate stage.
18. A method for manufacturing an article, comprising:
a step of exposing a substrate using the exposure apparatus according to claim 17;
developing the exposed substrate; and
and a step of manufacturing an article from the developed substrate.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2022135295A JP2024031628A (en) | 2022-08-26 | 2022-08-26 | Stage mechanism, substrate processing equipment, exposure equipment, and article manufacturing method |
| JP2022-135295 | 2022-08-26 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| CN117631466A true CN117631466A (en) | 2024-03-01 |
Family
ID=90017105
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN202311061343.4A Pending CN117631466A (en) | 2022-08-26 | 2023-08-22 | Stage device, substrate processing device, exposure device, and method for manufacturing article |
Country Status (3)
| Country | Link |
|---|---|
| JP (1) | JP2024031628A (en) |
| KR (1) | KR20240029512A (en) |
| CN (1) | CN117631466A (en) |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2015081993A (en) | 2013-10-22 | 2015-04-27 | キヤノン株式会社 | Stage device, exposure apparatus and device production method |
-
2022
- 2022-08-26 JP JP2022135295A patent/JP2024031628A/en active Pending
-
2023
- 2023-08-08 KR KR1020230103268A patent/KR20240029512A/en unknown
- 2023-08-22 CN CN202311061343.4A patent/CN117631466A/en active Pending
Also Published As
| Publication number | Publication date |
|---|---|
| KR20240029512A (en) | 2024-03-05 |
| JP2024031628A (en) | 2024-03-07 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| KR100570252B1 (en) | Balanced positioning system for use in lithographic apparatus | |
| US6359679B1 (en) | Positioning device, exposure device, and device manufacturing method | |
| US6396566B2 (en) | Stage system for exposure apparatus and device manufacturing method in which a stage supporting member and a countermass supporting member provide vibration isolation | |
| KR102437205B1 (en) | Mobile body apparatus, exposure apparatus, production method for flat panel display, production method for device, and drive method for mobile body | |
| US11392048B2 (en) | Exposure apparatus, flat panel display manufacturing method, and device manufacturing method | |
| US20110085152A1 (en) | Vibration control apparatus, vibration control method, exposure apparatus, and device manufacturing method | |
| US11187987B2 (en) | Exposure apparatus and exposure method, and flat panel display manufacturing method | |
| US20200057391A1 (en) | Exposure apparatus, manufacturing method of flat-panel display, device manufacturing method, and exposure method | |
| US11086236B2 (en) | Exposure apparatus and exposure method, and flat panel display manufacturing method | |
| KR20100072015A (en) | Drive control method, drive control apparatus, stage control method, stage control apparatus, exposure method, exposure apparatus and measuring apparatus | |
| EP1357432B1 (en) | Driving apparatus | |
| KR20140007911A (en) | Holding device, exposure device and production method for device | |
| KR20070027704A (en) | Aligning apparatus, aligning method, exposure apparatus, exposure method and device manufacturing method | |
| JP5495948B2 (en) | Stage apparatus, exposure apparatus, and device manufacturing method | |
| CN117631466A (en) | Stage device, substrate processing device, exposure device, and method for manufacturing article | |
| KR102549056B1 (en) | Exposure device, method for producing flat panel display, method for producing device, and exposure method | |
| EP1111470A2 (en) | Lithographic apparatus with a balanced positioning system | |
| JP2015081993A (en) | Stage device, exposure apparatus and device production method | |
| JP6744588B2 (en) | Exposure apparatus, flat panel display manufacturing method, device manufacturing method, and exposure method | |
| TW201837614A (en) | Lithographic apparatus, lithographic projection apparatus and device manufacturing method | |
| JP2014085504A (en) | Stage device, exposure device and method for producing article | |
| JP7422524B2 (en) | Stage device, exposure device, and article manufacturing method | |
| JP5158464B2 (en) | Exposure apparatus and exposure method | |
| JP2023179277A (en) | Positioning device, lithography device and method for manufacturing article | |
| JP4035200B2 (en) | Positioning apparatus and exposure apparatus |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| PB01 | Publication | ||
| PB01 | Publication |