KR20190102087A - Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

In the substrate stage PST, when the Y rough stage 23Y moves in the Y-axis direction, the X rough stage 23X, the weight erasing device 40, and the X guide 102 are Y rough in the Y-axis direction. In the case of moving integrally with the stage 23Y and the X coarse motion stage 23X moves in the X-axis direction on the Y coarse motion stage 23Y, the weight erasing device 40 moves on the X guide 102 in the X-axis. Direction and move integrally with the X coarse motion stage 23X. Since the X guide 102 extending in the X-axis direction is provided while covering the moving direction of the weight erasing device 40 in the X-axis direction, the weight erasing device 40 is independent of its position. 102) on a continuous basis.

Description

Exposure apparatus, mobile apparatus, flat panel display manufacturing method and device manufacturing method {EXPOSURE APPARATUS, MOVABLE BODY APPARATUS, FLAT-PANEL DISPLAY MANUFACTURING METHOD, AND DEVICE MANUFACTURING METHOD}

FIELD OF THE INVENTION The present invention relates to exposure apparatuses, mobile apparatuses, flat panel display manufacturing methods, and device manufacturing methods, and more particularly, exposures used in lithographic processes when semiconductor devices, liquid crystal display devices, and the like are manufactured. An apparatus, a flat panel display manufacturing method using an exposure apparatus, and a device manufacturing method using an exposure apparatus which are suitable as a device which moves and hold | maintains the apparatus and the object exposed by the exposure apparatus.

Generally, in lithographic processes for manufacturing electronic devices (microdevices), such as liquid crystal display devices and semiconductor devices (such as integrated circuits), masks or reticles (hereinafter generally referred to as "masks") and glass A step-and-scan method (so-called scanning stepper (hereinafter referred to as "scanning stepper") that transfers a pattern formed on a mask onto a substrate using an energy beam while synchronously moving a plate or wafer (hereinafter generally referred to as a "substrate") in a predetermined scanning direction. Devices, such as exposure devices), are also used.

In this type of exposure apparatus, a stack type (gantry type) having a Y coarse stage movable in a cross scan direction (direction perpendicular to the scan direction) disposed in the X coarse stage movable in long strokes in the scanning direction An apparatus having a stage is known, and as the stage device, a stage device having a configuration in which the weight erasing device moves along a horizontal plane on, for example, a surface plate formed of stone material is known (for example, PTL1). Reference).

However, in the exposure apparatus according to PTL1 described above, since the weight erasing device moves within a wide range corresponding to the step and scan movement, the flatness of the top surface of the surface plate (movement guide surface of the weight erasing device) is very high. It should be finished in a wide range. However, in recent years, the substrates exposed by the exposure apparatus have tended to increase in size, and at the same time, the size of the surface plates has also increased, which is accompanied by an increase in cost, in terms of transportation capacity and assembly time of the exposure apparatus. It brings a decrease in the working ability and so on.

However, in the exposure apparatus according to the PTL1 described above, in order to finely drive the microscopic movement stage and the XY biaxial stage between the surface plate (stage base) and the fine movement stage by placing an actuator or the like, a large space was required. Therefore, the weight erasing device must be large (long in length), and a large driving force is required to drive the weight erasing device along the horizontal plane.

Usually, the core linear motor which produces | generates a large drive force (thrust) when driving a large-capacity board | substrate stage was employ | adopted. In this core linear motor, a magnetic attraction force (suction force), which is several times the thrust, is generated between the magnet unit included in the mover (or stator) and the coil unit having the core (iron core) included in the stator (or mover). do. Specifically, a suction force of 10000 to 20000 N is generated for a thrust of 4000 N.

Thus, in the case of a conventional substrate stage device structured in the above-described manner, not only the attraction generated especially from the core linear motor constituting the pair of single-axis drive units described above, but also the Y coarse stage, X coarse stage, etc. The same large weight load (and inertial force resulting from the movement of the X coarse stage) also acts on a pair of single-axis drive units located between the X coarse stage and the stage base. Therefore, the linear motor and the guide device constituting a single axis drive unit, in particular a pair of single axis drive unit, need to have a large load capacity (capacity), and the movable member and the stationary member can also withstand the attraction from the linear motor. It must be strongly configured.

On the other hand, since a large frictional resistance acts between the slider constituting the guide device (single shaft guide) and the linear guide (rail) to increase the driving resistance, a linear motor for generating a larger driving force is required. In addition, additional problems appear, such as an increase in the size of the substrate stage device, the generation of frictional heat in the guide device, and the generation of joule heat in the linear motor, mechanical damage by adsorbates.

Citation List

Patent Literature

[PTL 1] US Patent Application Publication No. 2010/0018950

According to one aspect of the present invention, there is provided a scanning first exposure apparatus for moving an object to be exposed in a first direction parallel to a horizontal plane with a predetermined first stroke with respect to an energy beam for exposure in an exposure process. The apparatus includes a first movable body movable in at least a predetermined first stroke in a first direction; A second movable body guiding movement of the first movable body in a first direction and movable in a second stroke along the first movable body in a second direction orthogonal to the first direction in a horizontal plane; An object holding member that is movable in at least parallel to the horizontal plane of the first movable body and holds the object; A weight erasing device which supports the object holding member from below and erases the weight of the object holding member; And a support member extending in the first direction and supporting the weight erasing device from below, and movable in the second direction in a second stroke while supporting the weight erasing device from below.

According to this apparatus, at the time of exposing the object, the object holding member for holding the object together with the first moving body is driven in a direction parallel to the first direction (scanning direction).

In addition, the object moves in the second direction by the second moving body moving in the second direction orthogonal to the first direction. Thus, the object may be moved in two dimensions along a plane parallel to the horizontal plane. At this time, in order to move the object in the first direction, only the first moving body (and the object holding member) should be driven, and therefore, only the moving body (only the first moving body, the object holding member, and the weight erasing device) driven during the scanning exposure is ) Is smaller than the case where the other moving body moving in the second direction is disposed on the moving body moving in the first direction. Thus, the size of the actuators used to move the object can be reduced. Further, since the support member for supporting the weight erasing device from below is constituted by a member extending in the first direction, and the weight erasing devices are movable in the second direction while supporting the weight erasing device from below, the weight erasing devices are in the horizontal plane. It is continuously supported from below by the support member irrespective of its position in.

Therefore, the weight and size of the entire device can be reduced as compared with the case where a large member having a guide face large enough to cover the moving range of the weight erasing device is provided.

According to a second aspect of the present invention there is provided a movable body apparatus, the apparatus comprising: a movable body moving in at least a first direction parallel to the first axis in a plane parallel to the horizontal plane; A base supporting the movable body; And on the base opposing the first mover and the second mover, and the first mover and the second mover provided on the movable body in a predetermined first direction and in a predetermined second direction intersecting the predetermined second direction. A first stator and a second stator, each extending in a first direction, the stator being provided to the base using driving forces generated between the first mover and the first stator and between the second mover and the second stator, respectively. A driving device for driving a moving body in a first direction with respect to the first direction, wherein at least one of the predetermined first direction and the predetermined second direction is a second axis perpendicular to the first axis in the horizontal plane, and a third axis perpendicular to the horizontal plane; In an intersecting direction, at least when the movable body is driven in the first direction, forces in the predetermined first direction and the predetermined second direction are applied between the first mover and the first stator and between the second mover and the second stator; And a driving device of each acting between.

In this case, a force in a predetermined first direction (counter direction) acting between the first mover and the first stator and a predetermined second direction (counter direction) acting between the second mover and the second stator. The force acting on is a repulsive force or a suction force in the opposite direction. For example, a magnetic force may be given representatively, but this force is not limited thereto, and may also be a pressure or vacuum suction force by a static pressure such as gas.

According to this apparatus, the load, including its own weight of the movable body, is applied to the base such that the force and the second in a predetermined first direction acting between the first mover and the first stator when the movable body is driven in the first direction. Reduced by using a force in a predetermined second direction acting between the mover and the second stator, the movable body can be driven with high accuracy without disturbing the driving performance.

According to a third aspect of the present invention, there is provided a second exposure apparatus for irradiating an energy beam and forming a pattern on an object, wherein the second exposure apparatus includes the movable body apparatus of the present invention in which the object is held on another movable body. .

According to this apparatus, since the moving object holding the object can be driven with high accuracy, this allows high precision exposure to the object.

According to a fourth aspect of the present invention, there is provided a third exposure apparatus, the third exposure apparatus comprising: a movable body for holding an object and moving in a first direction parallel to at least a first axis in a plane parallel to the horizontal plane; A base supporting the movable body; The first mover and the second mover and the first mover and the second mover provided in the movable body in a predetermined first direction and in a predetermined second direction that intersects the predetermined first direction and face the first mover on the base; A first stator and a second stator provided extending in a direction and driving the movable body in the first direction with respect to the base, and when driven, as a floating force of the movable body, between the first mover and the first stator and in a second manner. A drive device utilizing a force in a predetermined first direction and a force in a predetermined second direction, respectively, between the mover and the second stator; And a pattern generation device for irradiating an energy beam on the object to generate a pattern on the object.

According to this apparatus, the drive device acts between the second mover and the second stator and a force in a predetermined first direction that acts between the first mover and the first stator when the movable body is driven as a floating force of the movable body. By using the force in the predetermined second direction, the load including the weight of the movable body, which is applied to the base, is reduced, and the movable body can be driven with high precision without disturbing the driving performance.

According to a fifth aspect of the present invention, there is provided a method of manufacturing a flat panel display, the method comprising exposing a substrate using one of the first to third exposure apparatuses of the present invention; And developing the exposed substrate.

According to a sixth aspect of the present invention, there is provided a device manufacturing method, comprising: exposing an object using one of the first to third exposure apparatuses of the present invention; And developing the exposed object.

1 is a diagram schematically showing a configuration of an exposure apparatus according to a first embodiment.
FIG. 2 is a plan view of the substrate stage included in the exposure apparatus in FIG. 1. FIG.
FIG. 3A is a side view (sectional view of the line AA in FIG. 2) in FIG. 2 when viewed from the -Y direction, and FIG. 3B is an enlarged view of the periphery of the weight erasing device of the substrate stage. 3C is an enlarged view of the periphery of the base frame (-X side).
FIG. 4 is a plan view (sectional view of the line BB of FIG. 3) except for the fine movement stage of FIG. 3A.
5 is a cross-sectional view of the line CC of FIG. 2.
6 is a perspective view of the substrate stage of FIG. 2 partially omitted.
Fig. 7 is a block diagram showing the input / output relationship of the main controller which constituted the control system of the exposure apparatus according to the first embodiment in the center.
8 is a diagram schematically showing a configuration of an exposure apparatus according to a second embodiment.
FIG. 9 is a plan view of the substrate stage included in the exposure apparatus in FIG. 8. FIG.
10 is a cross-sectional view of the line DD in FIG. 9.
11 is a plan view of the substrate stage except for the fine motion stage (sectional view of the line EE in FIG. 10).
12 is a cross-sectional view of the line FF in FIG. 9.
13 is a cross-sectional view of the weight erasing device with the substrate stage device in FIG. 9.
14 is a plan view of the substrate stage according to the third embodiment.
15 is a cross-sectional view of the line GG in FIG. 14.
16 is a cross-sectional view of the weight erasing device of the substrate stage device of FIG. 14.
17 is a plan view of the substrate stage according to the fourth embodiment.
18 is a sectional view of a leveling device and a weight erasing device with the substrate stage apparatus for the first modification.
19 is a cross-sectional view of the weight erasing device and leveling device of the substrate stage device for the second modification.
20 is a cross-sectional view of the weight erasing device and leveling device of the substrate stage device for the third modification.
21A is a variation of the X guide, and FIGS. 21B and 21C show substrate stage devices for other variations.
22 is a diagram illustrating other modifications of the substrate stage.
It is a side view which shows schematic structure of the stage device arrange | positioned at the exposure apparatus which concerns on 5th Embodiment.
24 is a cross-sectional view of the line HH in FIG. 23.
FIG. 25 is a block diagram illustrating an input / output relationship of the main controller arranged in the exposure apparatus of the fifth embodiment. FIG.
It is sectional drawing which shows schematic structure of the single axis drive unit which comprises a stage drive system.
27 is a view used to explain the balance of forces acting on each part of the single axis drive unit.
28 is a view used to explain the assembly method of a single axis drive unit.
29 is a diagram showing a modification (part 1) of the single shaft drive unit.
It is a figure which shows the modification (part 2) of a single-axis drive unit.

-First embodiment

1 to 7, the first embodiment is described below.

1 schematically shows a configuration of an exposure apparatus 10 according to the first embodiment. The exposure apparatus 10 is a projection type exposure apparatus in which a rectangular glass substrate P (hereinafter simply referred to as substrate P) used in a liquid crystal display device (flat panel display) serves as an exposure target, that is, step-and-end Scan method or so-called scanner.

As shown in FIG. 1, the exposure apparatus 10 includes an irradiation system IOP, a mask stage MST holding the mask M, a projection optical system PL, a pair of substrate stage mountings 19, a horizontal plane The board | substrate stage PST which hold | maintains the board | substrate P which can move along, the control system, etc. are provided. In the following description, the direction in the horizontal plane in which the mask M and the substrate P are respectively scanned with respect to the projection optical system PL during exposure is in the X-axis direction, and the direction orthogonal to the X-axis direction in the horizontal plane is Y. X-axis, Y-axis, and Z-axis which are in the -axis direction, and which are orthogonal to the X-axis and Y-axis directions, are in the Z-axis direction, and are centered on the X-axis, Y-axis, and Z-axis The rotation (tilt) directions are in the θx, θy and θz directions, respectively.

Irradiation system (IOP) is constructed similarly to the irradiation system disclosed, for example, in US Pat. No. 6,552,775 and the like.

More specifically, the irradiation system IOP irradiates a plurality of, for example, five irradiation regions arranged in a zigzag shape on the mask M, and reflects, not shown, as exposure irradiation light (irradiation light) IL for exposure. A plurality of, for example, 5 illuminating the mask M with light emitted from a light source (e.g., mercury lamp) irradiated through a mirror, a decoroak mirror, a shutter, a wavelength selective filter, various types of lenses, and the like. It has two survey systems. As the irradiation light IL, for example, i-line (wavelength of 365 nm), g-line (wavelength of 436 nm) or h-line (wavelength of 405 nm) (or i-line, g-described above) Light such as synthetic light of lines and h-lines). In addition, the wavelength of the irradiation light IL can be appropriately switched by, for example, a wavelength selective filter according to the desired resolution.

On the mask stage MST, the mask M having a pattern surface (lower surface in FIG. 1) in which a circuit pattern or the like is formed is fixed by, for example, vacuum suction. The mask stage MST is disposed on a guide member, not shown in the non-contact state, and finely driven, for example, in the Y-axis direction and θz direction, as well as a mask stage drive system MSD including a linear motor (FIG. 1). Not shown, see FIG. 7) in the scanning direction (X-axis direction) with predetermined strokes.

The positional information of the mask stage MST in the XY plane is a laser that projects a laser beam (measurement beam) with a resolution of, for example, about 0.5 to lnm on a reflecting surface disposed (or formed) on the mask M. It is continuously measured by an interferometer (hereinafter referred to as a "mask interferometer") 16. The measurement results are provided to the master controller 50 (see FIG. 7).

The master controller 50 drives and controls the mask stage MST via the mask stage drive system MSD (not shown in FIG. 1, see FIG. 4) based on the measurement results obtained by the mask interferometer 16. do. Additionally, an encoder (or an encoder system consisting of a plurality of encoders) may be used instead of or in conjunction with mask interferometer 16.

The projection optical system PL is located below the mask stage MST in FIG. 1. The projection optical system PL has a configuration similar to the projection optical system disclosed, for example, in US Pat. No. 6,552,775. More specifically, the projection optical system PL comprises a plurality of, for example, five projection optical systems (multi-lens projection optical systems), wherein the projection area of the pattern image of the mask M is arranged in the plurality of irradiation areas. It functions equivalently to projection optics having a single image field arranged in a corresponding zigzag shape and having a rectangular shape in the longitudinal direction in the Y-axis direction. In embodiments of each of such a plurality of projection optical systems, a standing image is composed of a prism disposed along an optical axis, a group of optical elements (lens group), and a two stage non-mirror lens optical system each of which is disposed in two sets. A double-sided telecentric equal magnification system to form is used.

Therefore, when the irradiation area on the mask M is irradiated with the irradiation light IL from the irradiation system IOP, the mask in which the pattern surface is disposed substantially coincident with the first plane (object plane) of the projection optical system PL By the irradiation light IL penetrating M, the projected image (partial upright image) of the circuit pattern of the mask M in the irradiation area is, via the projection optical system PL, the second plane of the projection optical system PL. The surface is formed on the irradiation region (exposure region) of the irradiation light IL, which is disposed on the (image plane) and whose surface is conjugated with the irradiation region, on the substrate P coated with a resist (photosensitive agent). Thereafter, the mask is applied to the irradiation area (irradiation light IL) by synchronous driving of the mask stage MST and the fine motion stage 21 (these configurations constitute part of the substrate stage PST and are described below). By moving (M) in the scanning direction (X-axis direction) and moving the substrate P in the scanning direction (X-axis direction) with respect to the exposure area (irradiation light IL), Scanning exposure of one shot region (divided region) is performed, and the pattern (mask pattern) of the mask M is transferred onto the one shot region. More specifically, in this embodiment, the pattern of the mask M is generated on the substrate P by the irradiation system IOP and the projection optical system PL, and the pattern is the substrate P using the irradiation light IL. It is formed on the substrate P by exposure of the photosensitive layer (resist layer) on the phase.

Each of the pair of substrate stage mountings 19 is composed of a member extending in the Y-axis direction (see FIG. 5) and disposed on a floor (floor face) on both ends in the longitudinal direction 13. ) Is supported from below. The pair of substrate stage mountings 19 are arranged at a predetermined distance in parallel with the X-axis direction. The pair of substrate stage mountings 19 constitutes a body portion (body portion) of the exposure apparatus 10, and the projection optical system PL, mask stage MST, and the like are disposed on the body portion.

The substrate stage PST shown in FIG. 1 includes a pair of beds 12, a pair of base frames 14, a coarse motion stage 23, a fine motion stage 21, a weight erasing device 40, a weight The X guide 102 etc. which support the erase device 40 from below are arrange | positioned.

Each of the pair of beds 12 is composed of a rectangular box-like member (cuboid member) whose longitudinal direction is in the Y-axis direction (as seen from the + Z side) in the plan view. The pair of beds 12 are arranged at a predetermined distance parallel to the X-axis direction. As shown in FIG. 1. The bed 12 on the + X side is disposed on the substrate stage mountings 19 on the + X side and the bed 12 on the -X side is disposed on the substrate stage mountings 19 on the -X side. Each position in the Z-axis direction (hereinafter referred to as Z position) of the top surface of the pair of beds 12 is adjusted substantially the same.

As can be seen from FIGS. 1 and 2, the vicinity of both ends in the longitudinal direction of the pair of beds 12 are connected by two interlink members 79. As shown in FIG. 3 (A), each of the pair of beds 12 is composed of a member which is hollow between the upper and lower surface portions of the bed 12 and is made of a plate-shaped member parallel to the YZ plane. A plurality of configured ribs are provided at a predetermined distance in the X-axis direction to ensure rigidity and strength. In addition, although not shown, between the upper end surface part and the lower surface part of the bed 12, the rib comprised from the plate-shaped member parallel to the XZ plane is also provided in plurality in the Y-axis direction at a predetermined distance. At the side of the bed 12 and in the center of each of the plurality of ribs are formed circular holes for reducing weight and for molding (see FIG. 5). In addition, in this case, the interlink member 79 does not need to be provided, for example, if a sufficient exposure accuracy can be ensured even if the interlink member 79 is not provided.

As shown in FIG. 2, on each top surface of the pair of beds 12, a plurality of Y linear guides 71A (eg, one bed in the embodiment), which are elements of a mechanical single axis guide. 4 pieces) are fixed parallel to each other at a predetermined distance in the X-axis direction.

As shown in Figs. 1 and 3 (A), of a pair of base frames 14, one frame is located on the + X side of the bed 12 on the + X side, and the other frame is − It is located on the -X side of the bed 12 on the X side. Since the pair of base frames 14 have the same structure, the base frame 14 on the -X side is described below. As shown in Fig. 3C, the base frame 14 extends in the Y-axis direction and consists of a main body portion 14a composed of a plate-shaped member having one side and the other side parallel to the YZ plane, and the main body portion 14a. A plurality of leg portions 14b (not shown in Figs. 2 and 4) which support from below. The length (dimensions in the length direction (Y-axis direction)) of the main body portion 14a is set longer than the length of each of the pair of beds 12 in the Y-axis direction. As the leg portion 14b, for example, three leg portions are provided at a predetermined distance in the Y-axis direction. At the lower ends of the leg portions 14b, a plurality of adjusters 14c are disposed so that the Z position of the main body portion 14a may be adjusted.

On both sides of the main body portion 14a, the Y stator 73, which is an element of the linear motor, is respectively fixed. The Y stator 73 has a magnet unit including a plurality of permanent magnets arranged at a predetermined distance in the Y-axis direction. In addition, on both sides (bottom of the Y stator 73 described above) and the upper surface of the main body portion 14a, the Y linear guide 74A, which is an element of the mechanical single axis guide, is respectively fixed.

Referring again to FIG. 1, the coarse motion stage 23 includes a Y coarse motion stage 23Y and an X coarse motion stage 23X disposed in the Y coarse motion stage 23Y. The coarse motion stage 23 is located above the pair of beds 12 (on the + Z side).

As shown in FIG. 2, the Y coarse motion stage 23Y has a pair of X beams 101. The pair of X beams 101 each consist of members extending in the X-axis direction, each having a YZ cross section of a rectangular shape, and are positioned parallel to each other at a predetermined distance in the Y-axis direction. Additionally, since the shape in the YZ cross section of each X beam 101 is not required to be rigid in the Y-axis direction compared to the rigidity in the Z-axis direction (gravity direction), for example, I It may be shaped.

With respect to the bottom surface of each of the pair of X beams 101 near both ends in the longitudinal direction, as shown in FIG. 6, a member called a Y carriage 75 is fixed through the plate 76. That is, for example, a total of four Y carriages 75 are attached to the lower surface of the Y coarse motion stage 23Y. The plate 76 consists of a plate-shaped member extending in the Y-axis direction, parallel to the XY plane, and mechanically connects the pair of X beams 101 to each other. For example, since all four Y carriages 75 each have the same structure, in the following description, one Y carriage 75 corresponding to the base frame 14 on the -X side is described.

As shown in Fig. 3C, the Y carriage 75 is composed of a member whose XZ cross section is an inverted U-shape, and the main body portion 14a of the base frame 14 is inserted between a pair of opposing surfaces. . On each of the pair of opposing surfaces of the Y carriage 72, each of the pair of Y movers 72 mounts each of the pair of Y stators 73 via a predetermined clearance (space / gap). To be fixed. The Y mover 72 includes an unillustrated coil unit and drives the Y coarse motion stage 23Y (see FIG. 1) with predetermined strokes together with the Y stator 73 in the Y-axis direction. (YDM) (see FIG. 7). In this embodiment, for example, since a total of four Y carriages 75 are provided as described above, the Y coarse motion stage 23Y is Y-axis direction by a total of eight Y linear motors YDM. Driven by.

On each of the ceiling surfaces and the pair of opposing surfaces of the Y carriage 75, a slider 74B is fixed to include a rolling body (eg, a plurality of balls) and slidably engaged with the Y linear guide 74A. All. Incidentally, for each of the ceiling surface and the pair of opposing surfaces of the Y carriage 75, for example, the sliders immediately below are hidden in the depth direction of the ground of FIG. 3 (C), but the sliders 74B 2 Each dog is attached at a predetermined distance in the depth direction (Y-axis direction) of the ground (see Fig. 5). The Y coarse motion stage 23Y (see FIG. 1) is guided to go straight in the Y-axis direction by a plurality of Y linear guide devices including the Y linear guides 74A and the sliders 74B. . Additionally, although not shown, the Y scale in which the periodic direction is in the Y-axis direction is fixed to the main body portion 14a of the base frame 14, and the Y-axis direction of the Y coarse motion stage 23Y together with the Y scale. The encoder header constituting the Y linear encoder system EY (see FIG. 7) for obtaining positional information on the Y is fixed to the Y carriage 75. The position in the Y-axis direction of the Y coarse motion stage 23Y is controlled by the main controller 50 (see FIG. 7) based on the output of the encoder head described above.

Hereinafter, as shown in FIG. 1, the auxiliary guide frame 103 is located between the pair of beds 12. The auxiliary guide frame 103 is composed of a member extending in the Y-axis direction, and is installed on the floor (floor face) F through a plurality of adjusters. On the upper surface (end surface on the + Z side) of the auxiliary guide frame 103, a Y linear guide 77A, which is an element of a mechanical single-axis guide extending in the Y-axis direction, is fixed. The Z position of the upper end of the auxiliary guide frame 103 is set substantially the same as the upper surface of the pair of beds 12. In addition, the auxiliary guide frame 103 is separated in vibration from each of the pair of beds 12 and the pair of stage mountings 19. In addition, because the pair of beds 12 are mechanically connected by the interlink member 79, an unshown through hole penetrating the interlink member 79 is formed in the auxiliary guide frame 103. do.

For the bottom face of each of the pair of X beams 101 around the center in the longitudinal direction, the auxiliary carriage 78 (see FIG. 6) is fixed. The secondary carriage 78 is composed of a rectangular parallelepiped member, and as shown in FIG. 1, on the lower surface of the secondary carriage 78, a slider 77B includes a rolling body (eg, a plurality of balls) to be fixed. And slidably engage the Y linear guide 77A. In addition, for one secondary carriage 78, for example, the sliders directly below are hidden in the depth direction of the ground of FIG. 1, but each of the two sliders 77B has a depth direction (Y-axis) of the ground. Direction) in a predetermined distance. As described, the Y coarse motion stage 23Y is supported from below about the center in the longitudinal direction by the auxiliary guide frame 103 via the auxiliary carriage 78 which suppresses warping caused by its own weight.

Referring back to FIG. 2, on the top surface of each of the pair of X beams 101, one X beam, which is an element of a mechanical single axis guide extending in the X-axis direction, for example Two) X linear guides 80A per 101 are fixed parallel to each other at a predetermined distance in the Y-axis direction. In addition, on the top surface of each of the pair of X beams 101 in the area between the pair of X linear guides 80A, the X stator 81A is fixed. The X stator 81A has a magnet unit including a plurality of permanent magnets arranged at a predetermined distance in the X-axis direction.

As described above, the Y coarse motion stage 23Y is supported from below by a pair of base frames 14 and an auxiliary guide frame 103 and has a pair of beds 12 and substrate stage mountings 19. ) Is separated from the vibration.

The X coarse motion stage 23X is composed of a plate-shaped member having a rectangular shape in plan view and as shown in Fig. 4, the opening is formed in the center portion. On the bottom surface of the X coarse motion stage 23X, as shown in FIG. 5, a pair of X movers 81B respectively facing the X stator 81A is provided to each of the pair of X beams 101. It is fixed through clearance (space / gap). Each of the X movers 81B includes a coil unit, not shown, and an X linear motor for driving the X coarse motion stage 23X with the X stator 81A described above with a predetermined stroke in the X-axis direction. DM) (see FIG. 7). In an embodiment, for example, the X coarse motion stage 23X driven in the X-axis direction by a pair of (two) X linear motors (XDM) is connected to the pair of beams 101, for example. Provided correspondingly.

In addition, as shown in FIG. 1, on the lower surface of the X coarse motion stage 23X, a plurality of sliders 80B are fixed including a rolling body portion (eg, a plurality of balls) and an X linear guide. And slidably engage with field 80A. For example, four sliders 80B are provided at a predetermined distance in the X-axis direction with respect to one X linear guide 80A. For example, a total of 16 sliders 80B are provided with the X coarse stage ( 23X) is fixed to the bottom surface. The X coarse motion stage 23 is guided to go straight in the X-axis direction by a plurality of X linear guide devices including each of the X linear guides 80A and the sliders 80B. In addition, the relative movement of the X coarse motion stage 23X in the Y-axis direction with respect to the Y coarse motion stage 23Y is limited by the plurality of sliders 80B, and the X coarse motion stage 23X is a Y coarse light stage ( 23Y) integrally moves in the Y-axis direction.

In addition, although not shown, the X scale in which the periodic direction is in the X-axis direction is fixed to at least one of the pair of X beams 101, and the position information in the X-axis direction of the X coarse motion stage 23X is obtained. The encoder header constituting the X linear encoder system EX (see FIG. 7) to be obtained is fixed to the X coordination stage 23X. The position in the X-axis direction of the coarse motion stage 23X is controlled by the main controller 50 (see FIG. 7) based on the output of the encoder head described above. In an embodiment, the encoder system 20 (see FIG. 7) for detecting positional information (including rotation in the θz direction) in the XY plane of the coarse motion stage (X coarse stage 23X) is described above. It comprises a linear encoder system (EX) and the Y linear encoder system (EY) described previously.

In addition, although not shown, the stopper member which mechanically sets the movable amount of the fine movement stage 21 with respect to the X crude stage 23X, or the fine movement with respect to the X crude stage 23X in the X-axis and Y-axis directions. A gap sensor or the like for measuring the relative amount of movement of the stage 21 is attached to the X coarse motion stage 23X.

As can be seen from FIGS. 1 and 2, the fine motion stage 21 is composed of a plate-shaped member (or a box-shaped (hollow cuboid) member) that is substantially square in plan view, for example, vacuum adsorption (or electrostatic adsorption). The substrate P is held through the substrate holder PH at its upper surface by adsorption such as).

The fine stage 21 is a fine stage drive including a plurality of voice coil motors (or linear motors) each configured to include stators fixed to the X coarse stage 23X and movers fixed to the fine stage 21. The system 26 (see FIG. 7) is finely driven on the X coarse stage 23X in the direction of three degrees of freedom (X-axis, Y-axis, and θz directions). As the plurality of voice coil motors, as shown in FIG. 2, a pair of X voice coil motors 18X for finely driving the fine motion stage 21 in the X-axis direction are provided spaced apart in the Y-axis direction. And a pair of Y voice coil motors 18Y for finely driving the fine motion stage 21 in the Y-axis direction are provided spaced apart in the X-axis direction. The fine motion stage 21 is driven in synchronism with the X coarse motion stage 23X by using the X voice coil motor 18X and / or the Y voice coil motor 18Y described above (the same speed as the X coarse stage 23X). By being driven in the same direction in the X-axis direction with the X coarse motion stage 23X, and / or in a predetermined stroke in the Y-axis direction. Thus, the fine motion stage 21 can be moved (approximately moved) in long strokes in the X, Y, two axial directions with respect to the projection optical system PL (see FIG. 1) and is also in the X, Y, and θz directions. It can be moved finely in the direction of three degrees of freedom.

In addition, as shown in FIG. 3B, the fine motion stage driving system 26 includes a plurality of Z to finely move the stage 21 in the directions of three degrees of freedom in the θx, θy and Z-axis directions. Voice coil motors 18Z. The plurality of Z voice coil motors 18Z are disposed at positions corresponding to four corners on the lower surface of the fine motion stage 21 (only two of the four Z voice coil motors 18) are shown in FIG. Shown in B) and the other two are omitted). The configuration of a fine stage drive system comprising a plurality of voice coil motors is disclosed, for example, in US Patent Application Publication No. 2010/0018950.

In an embodiment, the substrate stage drive system PSD is a coarse stage drive system 26 and a coarse stage drive consisting of a plurality of Y linear motors YDM and a pair of X linear motors XDM previously described. It consists of including the system (see FIG. 7).

With respect to the side on the -X side of the fine movement stage 21, as shown in Fig. 3A, an X movable mirror (bar mirror) 22X having a reflective surface orthogonal to the X-axis is mirror base 24X. It is fixed through). In addition, with respect to the side of the -Y side of the fine motion stage 21, as shown in FIG. 5, a Y movable mirror 22Y having a reflective surface orthogonal to the Y-axis is fixed through the mirror base 24Y. It is. Position information in the XY plane of the fine motion stage 21 is transmitted to a laser interferometer (hereinafter referred to as a substrate interferometer system) 92 using an X movable mirror 22X and a Y movable mirror 22Y (see FIG. 1). Is continuously detected at a resolution of about 0.5-lnm. Additionally, the substrate interferometer system 92 is actually equipped with a plurality of X laser interferometers and Y laser interferometers corresponding to each of the X movable mirror 22X and the Y movable mirror 22Y, but only the X laser interferometer Representatively in FIG. The plurality of laser interferometers are fixed to the main section of the device. In addition, the positional information of the fine motion stage 21 in the θx, θy and Z-axis directions is, for example, applied to the lower surface of the fine motion stage 21 using a target fixed to the weight erasing device 40 to be described later. Acquired by a sensor, not shown. The configuration of the position measuring system of the fine motion stage 21 described above is disclosed, for example, in US Patent Application Publication No. 2010/0018950.

The weight erasing device 40 is composed of a column member extending in the Z-axis direction as shown in Fig. 3A, and is also referred to as a center column. The weight erasing device 40 is mounted on the X guide 102 to be described later, and supports the fine motion stage 21 from below through the leveling device 57 to be described later. The upper half of the weight erasing device 40 is inserted into the opening of the X coarse motion stage 23X and the lower half is inserted between the pair of X beams 101 (see FIG. 4).

As shown in FIG. 3B, the weight erasing device 40 includes a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is composed of a cylindrical member having a lower portion and whose surface is open on the + Z side. To the lower surface of the housing 41, a plurality of air bearings (hereinafter referred to as base pads) 44 with a bearing surface facing the -Z side are attached. The air spring 42 is housed inside the housing 41. For the air spring 42, compressed gas is supplied from the outside. The Z slider 43 is composed of a cylindrical member extending in the Z-axis direction and is inserted into the housing 41 and mounted on the air spring 42. To the edge portion on the + Z side of the Z slider 43, an air bearing whose bearing surface faces the + Z side is attached.

The leveling device 57 is a device that supports the fine motion stage 21 in a tiltable manner (swivelably in the θx, θy directions with respect to the XY plane) and is attached to the air bearing described above, which is attached to the Z slider 43. It is supported from below in a non-contact manner. The weight erasing device 40 uses the Z slider 43 and the leveling device 57 to determine the weight of the system including the fine motion stage 21 (the force whose gravity is downward) by the air spring 42. It is invalidated (erased) by the upwardly generated force, which reduces the load of the plurality of Z voice coil motors 18Z described above.

The weight erasing device 40 is mechanically connected to the X coarse motion stage 23X via the plurality of interlink devices 45. The Z position of the plurality of crosslink devices 45 approximately coincides with the position of the center of gravity in the Z-axis direction of the weight erasing device 40. The interlink device 45 comprises a thin steel plate parallel to the XY plane, also called a flexure device. Interlink device 45 (interlink devices 45 on the + Y side and the -Y side are not shown in FIG. 3 (B), see FIG. 4) on the + X side of the weight erasing device 40, The X coarse stage 23X and the housing 41 of the weight erasing device 40 are connected on the -X side, the + Y side, and the -Y side. Thus, with the X steering stage 23X pulling the weight erasing device 40 through any of the plurality of interlink devices 45, the weight erasing device 40 is integral with the X steering stage 23X. In general, it moves in the X-axis direction or the Y-axis direction. Thereby, since the attractive force acts on the weight erasing device 40 in a plane parallel to the XY plane including the center position of gravity in the Z-axis direction, the moment (pitching moment) about the axis orthogonal to the moving direction is applied. I never do that.

Additionally, details of the weight erasing device 40 of the leveling device 57 and the interlink device 45 are disclosed in US Patent Application Publication No. 2010/0018950.

As shown in Fig. 3A, the X guide 102 is composed of a member (see Fig. 5) and a plurality of ribs 102b whose YZ cross section is inverted U-shaped and the longitudinal direction is in the X-axis direction. And a guide main body portion 102a. The X guide 102 is disposed above the pair of beds 12 described above (+ Z side) and traverses the pair of beds 12. The length (dimensions in the length direction (X-axis direction)) of the X guide 102 is the dimension in the X-axis direction of the gap between the pair of beds 12 and a predetermined distance in the X-axis direction. It is set somewhat larger than the sum of the X-axis dimensions of each of the pair of beds 12 disposed in the. Thus, as shown in FIG. 2, the edge portion on the + X side of the X guide 102 is more on the + X side (outside of the bed 12) than on the edge portion on the + X side of the bed 12 on the + X side. It protrudes a lot, and the edge portion of the X guide 102 -X side protrudes more to the -X side (outside of the bed 12) than the edge portion of the -X side of the bed 12 on the -X side.

The upper surface (surface on the side of + Z) of the guide main body portion 102a is parallel to the XY plane and its flatness is very high. On the upper surface of the guide main body portion 102a, the weight erasing device 40 is mounted in a non-contact state via the plurality of base pads 44. The upper surface of the guide body portion 102a is adjusted with good accuracy so that the surface is parallel to the horizontal surface and functions as a guide surface when the weight erasing device 40 moves. The length (dimensions in the longitudinal direction) of the guide main body portion 102a is set somewhat longer than the movable amount of the weight erasing device 40 (ie, the X coarse motion stage 23X) in the X-axis direction. The width (dimensions in the Y-axis direction) of the guide body portion 102a is set to a dimension such that the guide body portion 102a can face the bearing surfaces of all of the plurality of base pads 44. In addition, both ends in the longitudinal direction of the guide main body portion 102a are blocked by plate-shaped members parallel to the YZ plane.

Each of the plurality of ribs 102b is composed of a plate-like member parallel to the YZ plane and provided at a predetermined distance in the X-axis direction. The plurality of ribs 102b are connected to the pair of opposing surfaces and the ceiling surface of the guide body portion 102a, respectively. In this case, the material and manufacturing method including the X guide 102 including the plurality of ribs 102b are not particularly limited, but, for example, when the X guide 102 is cast formed using iron or the like , When the X guide 102 is formed of stone (eg, gabbro), or when the X guide 102 is formed of ceramic or Carbon Fiber Reinforced Plastics (CFRP) material, 102a) and the plurality of ribs 102b are integrally formed. However, the guide body portion 102a and the plurality of ribs 102b may be separate members, and the plurality of ribs 102b may be connected to the guide body portion 102a by welding. In addition, the X guide 102 may be configured in a box shape in which the solid member or the lower surface side thereof is closed.

At the lower end of each of the plurality of ribs 102b, a Y slider 71B comprising a rolling body (eg, a plurality of balls) is fixed to the top surface of each of the pair of beds 12 described above. It is slidably fixed to the Y linear guide 71A. Additionally, as shown in FIG. 4, a plurality of (in one embodiment, for example, two per one Y linear guide 71A) Y sliders 71B in the Y axis direction at a predetermined distance. It is fixed. The flatness adjustment of the upper surface of the guide body portion 102a should be performed by appropriately inserting a shim between the plurality of ribs 102b and the Y sliders 71B.

As shown in FIG. 2, with respect to the plate-shaped members described above provided at both ends in the longitudinal direction of the X guide 102, each of the X guides 102 is driven at a predetermined stroke in the Y-axis direction. The Y movers 72A, which are the elements of the Y linear motor 82 (see FIG. 7), which are allowed to be fixed, are fixed (see FIG. 4). Additionally, for the sake of clarity, the plate 76 facing each of the pair of Y stators 73 described above (see FIG. 3 (C)) via a given clearance (space / gap) is It is not shown in FIG. Each Y mover 72A has a coil unit not shown. The X guide 102 is driven at a predetermined stroke in the Y-axis direction by a pair of Y linear motors 82 each including a Y stator 73 and a Y mover 72A. That is, in this embodiment, the Y linear motor YDM for driving the pair of Y linear motors 82 and the Y coarse motion stage 23Y in the Y-axis direction to drive the X guide 102 in the Y-axis direction Respectively use the stator 73 jointly.

In addition, although not shown, in one of the pair of beds 12 described above, the Y guide with a Y scale relative to the X guide 102 is fixed with a Y scale whose periodic direction is the Y-axis direction. The encoder head constituting the Y linear encoder system 104 (see FIG. 7) for obtaining positional information in the Y-axis direction of is fixed. The X guide 102 and the Y coarse motion stage 23Y are synchronously driven in the Y-axis direction by the main controller 50 (see FIG. 7) based on the output of the encoder head described above (however, the Y position is Can be individually controlled as required).

In addition to the above description, a rectangular flat panel shaped mark plate (not shown) is fixed to the upper surface of the substrate holder PH in the longitudinal direction in the Y-axis direction. The height of this mark plate is set so that its surface is substantially coplanar with the surface of the substrate P disposed in the substrate holder PH. And on the surface of the mark plate, a plurality, in this case six reference marks (not shown), are formed in parallel in the Y axis direction.

In addition, inside the substrate holder PH (microscopic stage 21) under each of the six reference marks (-Z side), six mark image detection systems MD ₁ to MD ₆ (FIG. 7) are shown. This includes the imaging device (such as CCD) and the lens system. These mark image detection systems MD1 to MD6 are projected images of alignment marks on the mask M made by the five projection optics and the lens systems, respectively, and reference marks formed by the lens system (not shown). Are simultaneously detected and the position of the images of the alignment marks is measured using the position of the images of the reference marks as a reference. The measurement results are provided to the main controller 50 and used for alignment of the mask M (mask alignment) and the like.

In addition, in the exposure apparatus 10, six alignment detection systems AL ₁ to AL ₆ of the off-axis method for detecting alignment marks and six reference marks on the substrate P (FIG. 7). Are provided. Six alignment detection systems are arranged sequentially along the Y-axis on the + X side of the projection optical system PL.

As each alignment detection system, an image processing type sensor of a field image alignment (FIA) system is used. The FIA system sensor, for example, irradiates broadband detection light that does not expose the resist on the substrate P to the target mark, and is formed on the light receiving surface by light reflected from the target mark using an imaging capture device (CCD) or the like. Capture the image of the target mark and the image of the index (not shown). The detection results of the alignment detection systems AL ₁ to AL ₆ are transmitted to the master controller 50 via the alignment signal processing system (not shown).

Additionally, in addition to the FIA system, two diffracted lights (e.g., the same order) are irradiated with a coherent detection light on the target mark and detect scattered or diffracted light generated from the target mark or generated from the target mark interference. Alignment sensors that form and detect interference light can be used independently or in combination as needed.

FIG. 7 shows a block diagram showing the input / output relationships of the master controller 50 which is composed of the control system of the exposure apparatus 10 as a central component and performs overall control of the respective components. The master controller 50 includes a workstation (or microcomputer) and the like and has overall control over the respective parts of the exposure apparatus 10.

Next, the lot processing of the substrate P in the exposure apparatus 10 will be briefly described.

A coater developer (hereinafter referred to as " C / D ") connected in line to the exposure apparatus 10 is subjected to a processing lot consisting of a plurality of substrates P (e.g., 50 pieces or 100 pieces). (Not shown), the substrate in the lot is sequentially coated with a resist and conveyed to the exposure apparatus 10 by a carrier system (not shown). In addition, under the control of the master controller 50, the mask M is loaded on the mask stage MST by a mask carrier device (mask loader) not shown, and then the mask alignment described previously is performed.

Then, when the resist-coated substrate P is loaded onto the substrate holder PH, the master controller 50 uses the alignment detection system AL ₁ to AL ₆ as a reference to the substrate holder PH. Detect marks and perform baseline measurements.

Subsequently, the master controller 50 detects the plurality of alignment marks formed by being transferred together with the pattern on the substrate P upon exposure of the previous previous layer or layers, using the alignment detection system AL ₁ to AL ₆ . And alignment of the substrate P is performed.

After the alignment of the substrate P is completed, the main controller 50 sequentially transfers the pattern of the mask M onto the plurality of shot regions on the substrate P by the previously described scanning exposure. The exposure operation is performed by the method. Since this exposure operation is similar to the normal exposure operation by the step-and-scan method, the description thereof is omitted.

Hereinafter, in the exposure operation by the step-and-scan method described above, the exposure processing is sequentially performed on the plurality of shot regions provided on the substrate P. FIG. The substrate P is driven at a constant speed (hereinafter referred to as the X scanning operation) at a predetermined stroke in the X-axis direction during the scanning operation and suitably driven in the X-axis direction and / or the Y-axis direction during the step operation ( Hereinafter referred to as X step operation and Y step operation).

When the substrate P is moved in the X-axis direction during the X scan operation and the X step operation, in the substrate stage PST, the X coarse stage 23X is the main control based on the measured values of the X linear encoder system EX. Driven in the X-axis direction on the Y coarse motion stage 23Y according to the command from the instrument 50, the fine motion stage 21 is commanded from the master controller 50 based on the measured values of the substrate interferometer system 92 According to this, the plurality of X voice coil motors 18X are synchronously driven with respect to the X coarse motion stage 23X. In addition, when the X coarse motion stage 23X moves in the X-axis direction, the X coarse motion stage 23X pulls the weight erasing device 40, together with the X coarse motion stage 23X, to remove the heavy weight device 40. Move in the X-axis direction. Thereby, the weight erasing device 40 moves on the X guide 102. In addition, in the above-described X scanning operation and X step operation, there may be a case where the fine motion stage 21 is finely driven in the Y-axis direction and / or in the θz direction with respect to the X coarse motion stage 23X, Since the Y position of the weight erasing device 40 does not change, the weight erasing device 40 always moves only on the X guide 102.

On the contrary, in the Y step operation, in the substrate stage PST, the Y coarse motion stage 23Y is subjected to a plurality of Y linear in accordance with an instruction from the main controller 50 based on the measured values of the Y linear encoder system EY. Driven by the motors YDM on the pair of base frames 14 in a predetermined stroke in the Y-axis direction, the X coarse stage 23X integrally with this Y coarse stage 23Y Y-axis Direction at a predetermined stroke. In addition, the weight erasing device 40 moves in a predetermined stroke in the Y-axis direction integrally with the X coarse motion stage 23X. Thereby, the X guide 102 which supports the weight erasing device 40 from below is synchronously driven with the Y coarse motion stage 23Y. Thus, the weight erasing device 40 is continuously supported from below by the X guide 102.

As explained so far, according to the exposure apparatus 10 of the present embodiment, the weight erasing device 40 is continuously supported from below by the X guide 102 regardless of the position in the XY plane. Since the X guide 102 is composed of a plate-shaped member extending in the scanning direction and having a narrow width, the weight of the substrate stage device PST is wide, for example, to cover the entire moving range of the weight erasing device 40. A guide member having a guide face (for example, a surface plate formed by the stone member) can be reduced as compared with the case where it is used. In addition, the carriage and processing of the guide member having a wide guide face becomes difficult when the substrate is large, but with a narrow width plate-shaped member having a band-shaped guide face in which the X guide 102 extends in the X-axis direction. Because of the configuration, processing and carriage becomes easy with respect to the X guide 102 of the present embodiment.

In addition, since the X guide 102, which is a member extending in the X-axis direction, is supported from below at a plurality of points by the pair of beds 12, this is because of the self weight or weight loss of the X guide 102. Suppression caused by the load of the device 40 is suppressed. In addition, since two beds 12 are used, the size and weight of each of the beds 12 can be reduced compared to the case where one bed 12 is used. Thus, the carriage and processing of the bed 12 is facilitated and workability is also improved upon assembly of the substrate stage device PST.

In addition, since the X guide 102 and the pair of beds 12 that guide the X guide 102 in the Y-axis direction have a rib structure, the X guide 102 and the pair of beds 12 ) Is light and the rigidity in the Z-axis direction can also be easily ensured. Therefore, the workability of the operation of assembling the substrate stage device PST is better than when the guide member having a wide guide face is used.

In addition, since the weight erasing device 40 is supported in a non-contact manner on the X guide 102, the vibration generated when moving the weight erasing device 40 does not proceed to the X guide 102. Thus, vibration does not proceed to the projection optical system PL, for example, through the X guide 102, the pair of substrate stages 12, the substrate stage mounting 19, etc., so that the exposure operation is performed with high precision. Allow. In addition, the X guide 102 is driven near the center of gravity in the Z-axis direction by a pair of Y linear motors 82 including a Y stator 73 fixed to a pair of base frames 14. Therefore, no moment (pitching moment) around the X-axis is generated and the driving force does not proceed to the substrate stage mounting 19. Therefore, the exposure operation can be performed with high precision.

In addition, since the movement in the Y-axis direction of the X guide 102 is performed during the Y step operation described above where high-precision positioning accuracy is unnecessary, the moment due to frictional resistance or driving of the linear guide device is eliminated by weight. Even when acting on the device 40 or the X guide 102, the vibration generated due to the moment described above can converge from the Y step operation to the X scanning operation. In addition, the driving force difference of the pair of Y linear motors 82 in which the yawing movement (the moment around the Z-axis) is driven by the driving of the X guide 102 in the Y-direction is used to drive the X guide 102. Can be strictly controlled and suppressed.

Furthermore, since the coarse motion stage 23 (XY stage device) of this embodiment is comprised by the X coarse motion stage 32X arrange | positioned at the Y coarse motion stage 23Y, it is long in the X-axis direction which serves as a scanning direction. The inertial mass of the X coarse motion stage 23X moving in the stroke is smaller than a conventional XY stage device having, for example, a configuration in which the Y coarse motion stage is disposed in the X coarse motion stage. Therefore, the driving force which the floor (floor surface) F accommodates through the coarse motion stage 23 at the time of X scan operation becomes small. As a result, in the X scan operation, the floor vibration affecting the entire system can be suppressed. In contrast, the driving mass and driving force when the Y coarse motion stage 23Y moves in the Y-axis direction are larger than those of the conventional XY stage device described above, but the movement does not require high precision positioning accuracy. Since the Y step operation is not performed, the exposure operation is less affected by the floor vibration.

In addition, in the coarse motion stage 23, the intermediate portion in the X direction of each of the pair of X beams 101 of the Y coarse motion stage 23Y is located between the auxiliary guide frames located between the pair of beds 12. Supported by 103, this suppresses warpage caused by the load or the weight of the X coarse motion stage 23X. Thus, the straightness accuracy of the X linear guides 80A fixed on the pair of X beams 101 can be improved, which proceeds with the X coarse motion stage 23X going straight in the X-axis direction with high precision. Allow to be guided by In addition, each of the pair of X beams 101 does not require a firm structure (preferably an elaborate member) that ensures rigidity against bending as compared to the case where only both ends are supported.

Second embodiment

Next, 2nd Embodiment of this invention is described with reference to FIGS. Here, the same or similar reference numerals are used for the same or similar components as those in the first embodiment described previously, and are omitted or simplified throughout the detailed description.

8 schematically shows a configuration of the exposure apparatus 110 according to the second embodiment. The exposure apparatus 110 is a projection exposure apparatus by a step-and-scan method or a so-called scanner in which the substrate P used in the liquid crystal display device (flat panel display) serves as an exposure target.

9 is a plan view of the substrate stage device PST included in the exposure apparatus 110 of FIG. 8, and FIG. 10 is a cross-sectional view of the line D-D of FIG. 9. In addition, FIG. 11 shows a plan view (sectional view of the line E-E of FIG. 10) except for the fine motion stage, and FIG. 12 shows the sectional view of the line F-F in FIG. In addition, FIG. 13 shows a cross-sectional view of the weight erasing device of the substrate stage device PST.

As can be seen when comparing FIGS. 8 to 13 with FIGS. 1 to 6 for the first embodiment described above, in the exposure apparatus 110 for the second embodiment, the substrate stage device PSTa is used. Is different from the exposure apparatus 10 in that is provided instead of the substrate stage device PST.

Although the overall configuration of the substrate stage device PSTa is similar to the substrate stage device PST, the weight erasing device 40 'is provided in place of the weight erasing device 40, and the configuration of the drive system of the X guide 102 is different. Some features are different from substrate stage device PST, such as some being different from substrate stage device PST. The following description focuses primarily on the differences.

In the substrate stage device PSTa, as can be seen from FIGS. 8 and 10, the positions (height positions) of the Y coarse motion stage 23Y and the X-axis direction (vertical direction) of the X guide 102 are mutually different. Partially overlap.

Specifically, in the substrate stage device PSTa, as shown in FIGS. 8 and 10, on both sides in the longitudinal direction of each of the pair of X beams 101 (but not on the bottom surface near the both ends), The Y carriage 75 described previously is fixed. That is, the Y coarse motion stage 23Y has, for example, a total of four Y carriages 75. In addition, the upper surfaces of the two Y carriages 75 on the + X side are mechanically connected by the plate 76, and the upper surfaces of the two Y carriages 75 on the −X side are connected to the plate 76. By a similar mechanical connection. In addition, for clarity, the plate 76 is not shown in FIG. 11.

In addition, for the weight erasing device 40 ', a type of device in which the Z slider 43 and the leveling device 57 are integrally fixed, for example, as shown in FIG. 10 is used. The weight erasing device 40 'is disposed in the X guide 102 and the lower half thereof is inserted into the opening of the X coarse motion stage 23X. In addition, in view of avoiding the complexity of the drawings, in Figs. 8 and 10 to 12, the weight erasing device 40 ', the leveling device 57 and the like to be described below are generally shown (detailed configuration). See FIG. 13).

As shown in FIG. 13, the weight erasing device 40 ′ has a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is composed of a cylindrical member having a bottom and whose surface is open on the + Z side. To the bottom face of the housing 41, a plurality of base pads 44 with faces facing the -Z side are attached. On the outer wall surface of the housing 41, a plurality of arm members 47 are fixed to support the targets 46 of the plurality of Z sensors 52 fixed to the lower surface of the fine motion stage 21. The air spring 42 is housed in the housing 41. For the air spring 42, compressed gas is supplied from the outside. The Z slider 43 is composed of a cylinder member extending in the Z-axis direction (shorter) whose height is below the Z slider used in the first embodiment described previously. The Z slider 43 is inserted into the housing 41 and disposed in the air spring 42. The Z slider 43 is connected to the inner wall surface of the housing 41 by a parallel plate spring device 48 comprising a pair of flat springs parallel to the XY plane disposed spaced apart in the Z-axis direction. A plurality of (eg three or four) parallel plate spring devices 48 are provided, for example, around the outer periphery (θz direction) of the approximately equally spaced Z slider 43. The Z slider 43 moves along the XY plane integrally with the housing 41 by rigidity (tensile rigidity) in a direction parallel to the horizontal plane of the plurality of plate springs. On the contrary, due to the flexibility (flexibility) of the plate springs, the Z slider 43 is finely movable in the Z-axis direction with respect to the housing 41. Since the pair of flat springs of the parallel plate spring device 48 are spaced in the Z-axis direction, the inclination (rotation in the θx and θy directions) of the Z slider 43 is suppressed and the Z slider 43 is It is only movable in the Z-axis direction substantially in a fine stroke with respect to the housing 41.

The leveling device 57 is a device (swivelable in the θx and θy directions with respect to the XY plane) that supports the fine movement stage 21 in an inclined manner, and the upper half of the leveling device 57 has an opening 21 formed in the lower surface of the fine movement stage 21. It is inserted into the fine motion stage 21 through. The weight erasing device 40 'measures the weight of the system including the fine motion stage 21 (force in the direction of gravity downward) through the Z slider 43 and the leveling device 57, and the direction of gravity in the air spring ( It is invalidated (erased) by the force generated upward by 42), which reduces the load of the plurality of Z voice coil motors 18Z.

The leveling device 57 is a leveling cup 49 composed of a cup-shaped member having an open surface on the + Z side, a polyhedral member 64 to be inserted into the inner diameter side, and a plurality of air attached to the inner wall surface of the leveling cup 49. Bearings 65. The lower surface of the leveling cup 49 is integrally fixed to the upper surface of the Z slider 43 via the plate 68. In addition, a plurality of anti-missing devices 200 are attached to the ceiling surface of the fine motion stage 21 to prevent the leveling cup 49 from dropping. The polyhedral member 64 is composed of a triangular pyramidal shaped member and a tip is inserted into the leveling cup 49. The lower surface (surface facing the + Z side) of the polyhedral member 64 is fixed to the ceiling surface of the fine movement stage 21 via the spacer 51. For example, three air bearings 65 are provided on the inner wall surface of the leveling cup 49 approximately equally spaced about θz. The leveling device 57 comprises a center of gravity CG which serves as the center of rotation of the system comprising the fine movement stage 21 by blowing compressed gas from the plurality of air bearings 65 to the side of the polyhedral member 64. The fine motion stage 21 is tiltedly supported by an extremely small clearance (space / gap) in a non-contact manner. In addition, in FIG. 13, for the sake of clarity, for example, two air bearings of three air bearings 65 are shown in cross section (ie with respect to the leveling device 57), FIG. Cross section parallel to the plane).

Hereinafter, when the fine motion stage 21 moves in the direction parallel to an XY plane, the polyhedral member 64 moves integrally with the fine motion stage 21 in the direction parallel to an XY plane. By doing so, the air bearing 65 is pushed by the polyhedral member 64 by the rigidity (static pressure) of the gas film formed between the bearing face of the air bearing 65 and the polyhedral member 64, and the leveling cup 49 Makes the fine movement stage 21 integrated so as to move in the same direction as the fine movement stage 21. And since the leveling cup 49 and the Z slider 43 are fixed through the plate 68, the fine motion stage 21 and the Z slider 43 move integrally in the direction parallel to a horizontal plane. In addition, since the Z slider 43 and the housing 41 are connected by a plurality of parallel plate spring devices 48 as described above, the fine motion stage 21 and the housing 41 are parallel to the horizontal plane. Move in the direction of As described above, the fine motion stage 21 and the weight erasing device, including the case where the fine motion stage 21 and the weight erasing device 40 'are finely driven by the plurality of voice coil motors 18X and 18Y. 40 'always moves integrally in the direction parallel to the XY plane. Thus, in the second embodiment, the previously described interlink device 45 is not provided to the weight erasing device 40 'and the X coarse motion stage 23X.

In addition, in the second embodiment, the size of the guide main body portion 102a in the Z-axis direction is set equal to the size of the X beam 101 in the Z-axis direction. And, as can be seen from Figs. 9, 10 and 12, the guide body portion 102a is inserted between the pair of X beams 101. That is, the Z direction position (position in the vertical direction) of the X guide 102 and the Z position of the Y coarse motion stage 23Y partially overlap each other.

The configuration of the other part of the substrate stage device PSTa is similar to the substrate stage device PST described previously.

In the exposure apparatus 110 configured in the above manner, when the substrate P is moved in the X-axis direction during the X scanning operation and the X step operation in the substrate stage PSTa, the X on the Y coarse motion stage 23Y The drive of the coarse motion stage 23X and the synchronous drive of the fine motion stage 21 with respect to the X coarse motion stage 23X are basically performed as in the first embodiment according to the instructions from the main controller 50. However, in the substrate stage device PSTa, the weight erasing device 40 'is not pulled by the X coarse motion stage 23X, and the weight erasing device 40' together with the fine motion stage 21 in the X-axis direction. Move. In addition, in the above-described X scanning operation and X step operation, there may be a case where the fine motion stage 21 is finely driven in the Y-axis direction and the Y position of the weight erasing device 40 'is slightly changed. However, the dimension in the width direction of the X guide 102 is set so that the base pads 44 do not fall from above the X guide 102 even when the weight erasing device 40 'is finely driven in the Y-axis direction. .

Furthermore, in the substrate stage device PSTa, the drive in the Y coarse motion stage 23Y and the X coarse motion stage 23X in the Y-axis direction during the Y step operation, and the fine motion with respect to the X coarse motion stage 23X Synchronous driving of the stage 21 is basically performed as in the first embodiment in accordance with an instruction from the main controller 50. However, in the substrate stage device PSTa, the weight erasing device 40 'moves in the Y-axis direction together with the fine movement stage 21. By doing so, the X guide 102 supporting the weight erasing device 40 'from below is synchronously driven with the Y coarse motion stage 23Y. Thus, the weight erasing device 40 'is always supported from below by the X guide 102.

According to the exposure apparatus 110 of the second embodiment described so far, the same effect as in the exposure apparatus 10 for the first embodiment described previously can be obtained. Further, according to the exposure apparatus 110, since the Z position (position in the vertical direction) of the X guide 102 and the Z position of the Y coarse motion stage 23Y partially overlap each other, the weight erasing device 40 ' The dimension in the Z-axis direction of can be formed short when compared to the case where the weight erasing device 40 'is mounted on a guide member having a wide guide surface. In this case, since the dimensions in the Z-axis direction of the housing 41 and the Z slider 43 can be shortened, the weight of the weight erasing device 40 'can be reduced. In addition, since the weight of the weight erasing device 40 'is reduced, the size of the actuators (plural linear motors and the plurality of voice coil motors) used to drive the fine motion stage 21 can also be reduced. have.

In addition, since the weight erasing device 40 'is separated into vibrations from the coarse motion stage 23, vibrations propagated from the coarse motion stage 23 can be entirely eliminated, which improves the control performance. In addition, by incorporating the weight erasing device 40 'and the fine motion stage 21, the structure is simplified, which can further reduce the weight of the device as well as reduce the possibility of breakdown. In addition, since the center of gravity CG of the fine movement stage 21 becomes lower due to the integration of the weight erasing device 40 'and the fine movement stage 21, even when the size of the substrate holder PH increases. It is possible to prevent the center of gravity from rising.

In addition, according to the exposure apparatus 110, since the X guide 102, which is a member extending in the X-axis direction, is supported from below by a pair of beds 12 at a plurality of points, this is because the X guide ( Suppression caused by the self weight of the 102 or the load of the weight erasing device 40 is suppressed.

In addition, since the weight erasing device 40 'is separated from the coarse motion stage 23, the vibration generated when moving the weight erasing device 40 does not proceed to the X guide 102. Thus, vibration does not proceed to the projection optics, for example, via X guide 102, a pair of substrate stages 12, substrate stage mountings 19, etc., which allows the exposure operation to be performed with high precision. do.

Third embodiment

Next, a third embodiment will be described with reference to FIGS. 14 to 16. The substrate stage PSTb for the third embodiment is substantially the same as the substrate stage PSTa (see FIG. 9 and the like) of the second embodiment described above except that the driving method of the X guide 102 is different. Because of the same configuration, the same or similar reference numerals will be used for the same or similar parts as in the second embodiment, and the general description is simplified or omitted.

Although the Y carriage 75 is fixed to both sides of the X beam 101 in the second embodiment described above, in the third embodiment, as shown in FIG. 15, the Y carriage 75 is described previously. Similar to the exposed exposure apparatus 10, it is fixed to the lower surface of the X beam 101. Therefore, the height of the base frame 14 (the same drawing code is used for convenience) is lowered in comparison with the second embodiment. This allows the substrate stage PSTb to be arranged compactly.

In addition, although the X guide 102 was electromagnetically driven by the pair of Y linear motors 82 in the first and second embodiments described above, in the third embodiment, the X guide 102 is 14 is mechanically connected to the X beam 101 by a device called a pair of flexure devices 107 via a connecting member 199 in the vicinity of both ends in the vertical direction. Additionally, for the sake of clarity, the pair of plates 76 (see FIG. 9) connecting the pair of X beams 101 and the fine motion stage 21 (see FIG. 8) is not shown in FIG. 14. .

Each flexure device 107 includes a thin steel sheet (eg, a flat spring) extending in the Y-axis direction located parallel to the XY plane and between the X beam 101 and the X guide 102. It is configured via a non-frictional joint device such as a ball joint. The flexure device 107 connects the X beam 101 and the X guide 102 in the Y-axis direction with high rigidity by the rigidity of the steel sheet in the Y-axis direction. Accordingly, the X guide 102 is pulled by any one of the pair of X beams 101 through the flexure device 107 to move integrally with the Y coarse motion stage 23Y in the Y-axis direction. In contrast, each flexure device 107 is directed to the X beam 101 in five degrees of freedom excluding the Y-axis direction due to the flexibility (or flexibility) of the steel plate and the operation of the non-frictional joint device. Since the X guide 102 is not limited to, the vibration hardly progresses through the X beam 101 to the X guide 102. In addition, the plurality of flexure devices 107 connect the pair of X beams 101 and the X guide 102 in the plane of the X guide 102 including the position of the center of gravity and parallel to the XY plane. . Therefore, because the X guide 102 is pulled, the moment in the θx direction does not act on the X guide 102.

In the substrate stage PSTb in the third embodiment, since the configuration of the X beam 101 that pulls the X guide 102 through the flexure device 107 is adopted, the substrate stage P in the second embodiment ( In addition to the effect that can be obtained with PSTa), the cost is lower than when an actuator is provided for driving the X guide 102. In addition, metrology systems (eg, linear encoder, etc.) are not required to obtain positional information of the X guide 102. In addition, since the dimension in the X-axis direction of the X guide 102 can be shorter as compared with the second embodiment, the cost can be reduced. Also, since the pair of base frames 14 are located inside on both sides in the X-direction, the device becomes compact when compared with the second embodiment.

In addition, since the flexure device 107 has an extremely low rigidity structure (shape and material) except in the Y-direction, the vibration caused by the force for traveling in directions other than the Y-direction is X-guided. It rarely proceeds to 102, which gives fine control stage 21 good control. Even when the vibration in the Y-direction penetrates the X guide 102, the connection of the force in the horizontal direction is the base pad 44, which is the static gas gas bearing members disposed on the lower surface of the weight erasing device 40 '. The vibration does not affect the fine motion stage 21 because the cutoff is performed between the X guide 102 and the weight erasing device 40 '. In addition, since the connection of the force in the Y direction between the X guide 102 and the bed 12 is suppressed by the Y linear guide 71A (since the force in the Y direction is released), the force is (12) It does not affect the main body of the device. Similarly, the pair of X beams 101 and the X guide 102 of the substrate stage device PST of the first embodiment described previously can be connected using the pair of flexure devices 107. Of course.

Fourth embodiment

Next, with reference to FIG. 17, 4th Embodiment is described. The substrate stage PSTc for the fourth embodiment is substantially the same as the substrate stage PSTa (see FIG. 9, etc.) of the second embodiment described above except that the driving method of the X guide 102 is different. Since they have the same structure, the same or similar reference numerals will be used for the same or similar parts as in the second embodiment, and the general description is simplified or omitted.

As shown in FIG. 17, in the substrate stage PSTc, each of the pair of X beams 101 has two pusher devices 108 spaced apart in the X-axis direction on opposite surfaces facing each other. That is, a total of four pusher devices 108 is provided. Each pusher device 108 has a steel ball facing the side on the + Y side or the side on the -Y side of the X guide 102. Although the steel ball is normally spaced from the X guide 102, in the substrate stage PSTc, when the Y coarse motion stage 23Y is driven in the Y-axis direction, the pusher device 108 is pushed, and the X guide ( Push 102, which causes the Y coarse motion stage 23Y to move integrally with the X guide 102 in the Y-axis direction. Additionally, each push device 108 does not necessarily need to be provided to the X beam 101, for example, inside the Y-axis direction of the Y carriage 75 to push the X guide 102. It can be arranged on the side and the inner side in the X-axis direction.

Furthermore, in the substrate stage PSTc, after the Y coarse motion stage 23Y performs the Y step movement of the X guide 102 to a predetermined position, the Y coarse motion stage 23Y is moved away from the X guide 102. It is driven in the direction to suppress the progression, which separates the Y coarse motion stage 23Y and the X guide 102 into vibrations. As a method of vibrating the Y coarse motion stage 23Y and the X guide 102, for example, the X beam 101 can be appropriately finely driven or finely driven steel balls in the Y-axis direction. Actuators, such as air cylinders, may be provided to the pusher device 108. In addition, the pusher device may be provided with a spheroid that is rotatable 90 degrees around the Z-axis or the X-axis, instead of the cyl ball, and by appropriately rotating the spheroid, the X guide 102 and Y The gap in the Y-axis direction between the stages 23Y can be changed (switching between contact state and non-contact state depending on the amount of rotation of the spheroid).

In the fourth embodiment, during the exposure operation except for the time that the X guide 102 moves in the cross scanning direction, the mechanical connection between the X beam 101 and the X guide 102 is removed, which causes disturbances to the X guide ( 102 can be completely prevented from entering. Similarly, the pusher device 108 may be provided to one of the pair of X beams 10 and the X guide 102 in the substrate stage device PST for the first embodiment described previously. Of course.

In addition, the configuration of the substrate stage device disposed in the exposure apparatus of the first to fourth embodiments described above are merely examples, and the configuration is not limited thereto. Modifications of the weight erasing device and the leveling device possessed by the substrate stage device are described below. In addition, in the following description, for the sake of clarity and convenience in description, only the leveling device and the weight erasing device will be described, and the second embodiment described above for the section having a configuration similar to that of the second embodiment described above. The same reference numerals are used as in the form and will be omitted throughout the description.

-First modification

18 shows the weight erasing device 40A and the leveling device 57A which the substrate stage device related to the first modification has. In the first variant, the leveling device 57A and the weight erasing device 40A have a configuration similar to the second embodiment, but the leveling device 57A is arranged to support the weight erasing device 40A from below (ie The arrangement of the leveling device 57 and the weight erasing device 40 'of the second embodiment takes the form of switching in the vertical direction). For clarity, the bottom face of the housing 41 is connected to the top face of the polyhedral member 64. In addition, although omitted in FIG. 18, the upper surface of the Z slider 43 of the weight erasing device 40A is fixed to the fine movement stage 21 via the spacer 51.

In the substrate stage device for the first variant, the components between the polyhedral member 64 and the base pad 44 are reduced and the weight is reduced and the polyhedral member 64 (from the polyhedral member 64 to the base pad 44) Θx and θy directions from below the position of the center of gravity near the drive point (the point at which the polyhedral member 64 and the air bearing 65 come into contact), so that the lower inertial mass decreases during horizontal movement, as in scanning In order to increase the stiffness in the field (being stronger against vibration), the controllability is improved in comparison with each of the embodiments described above by providing the leveling device 57A above the weight erasing device 40A.

-Second modification

19 shows the weight erasing device 40B and the leveling device 57B with the substrate stage device for the second modification. The second modification is based on the first modification (see FIG. 18) except that the positions of the air spring 42 and the Z slider 43 are switched vertically (by the parallel plate spring device 48). Similarly constructed. In the weight erasing device 40B, the housing 41B has a bottom surface of the housing 41B open and a bottom portion and the top surface of the housing 41B is integral to the fine motion stage 21 (not shown in FIG. 19). It is composed of a cylindrical member fixed by.

In the substrate stage device for the second variant, in addition to the effect obtained in the first variant, the position of the parallel plate string device 48 is lowered and arranged at a position closer to the center of gravity of the weight erasing device 40B. Therefore, stability of the exposure operation is improved.

Third modification

20 shows the weight erasing device 40c of the substrate stage device related to the third modification. The weight erasing device 40c is connected to a body 41C which is a cylindrical member having an upper surface and having a bottom surface, an air spring 42 housed in the body 41C, and an upper surface of the air spring 42. It consists of the leveling cup 49, the some air bearing 64, the polyhedron member 64 fixed to the fine motion stage 21 which is not shown, etc. In a third variant, a configuration is adopted in which the Z slider is removed and the lower surface of the leveling cup 49 is pushed directly in the Z-axis direction by the air spring 42. The outer wall surfaces of the plurality of arm members 47 are fixed to the body 41C to support the target 46.

In addition to the roles similar to those described in the second embodiment described above, the leveling cup 49 also plays the same role as the Z slider 43 (see FIG. 13) in the second embodiment and the like described above. . Thus, on the upper and lower surfaces of the outer periphery of the leveling cup 49, a plurality of parallel plate strings 67e (e.g., four for each of the upper and lower surfaces and uniform in the circumferential direction) are provided. ) Is connected (but the parallel plate string 67e disposed on the X side is not shown to avoid the complexity of the drawing). This limits the relative movement of the leveling cup 49 in the horizontal direction with respect to the body 41C and only vertical slide is possible.

In the substrate stage device for the third variant, the configuration of the weight erasing device 40c is simpler since the Z slider is not necessarily necessary, which makes the substrate stage device lighter and comparable to each of the embodiments described above. Allow to be manufactured at lower cost.

In addition, near the top and bottom surfaces of the leveling cup 49, which are relatively large in dimensions and dimensioned in the Z-axis direction and which are large and oscillate (vibrate) in operation, among the components disposed below the polyhedral member 64. Of the lower section in the [theta] x and [theta] y directions of the polyhedral member 64 because the leveling cup 49 cannot move in the horizontal direction relative to the body 41C by being connected by parallel plate strings 67e). The stiffness is higher, which suppresses the shaking of the components disposed below the polyhedral member 64 caused by the inertia in the horizontal movement and improves the controllability.

In addition, since the leveling cup 49 maintains high straightness with respect to the body 41C by the operation of the parallel plate string 67e while moving only in the Z direction, the lower surface of the leveling cup 49 is made of an air spring ( It does not need to be fixed to the upper surface (metal plate) of 42), which facilitates assembly and assembly disassembly and improves workability.

In addition, since the Z-axis drive by the air spring 42 and the leveling drive θx and θy by the polyhedral member 64 can be controlled independently (no interference), controllability is good.

In addition, the weight erasing devices 40A to 40C for each of the variants described above are not limited to XY biaxial stages and also the X-axis (or Y-axis) single axis stage or Y coarse stage is X coarse. It may be applied to a normal XY biaxial stage disposed on the stage.

In addition, in the second to fourth embodiments described above (and respective variations described above), the Z slider 43 or the leveling cup 49 of the weight erasing device comprises a plurality of parallel plate string devices ( It was only movable in the Z-axis direction by positioning 48, but besides, air bearings or rolling guides can also be used, for example.

In addition, in the second to fourth embodiments (and each of the modifications described above), a configuration in which the X coarse stage 23X is disposed in the Y coarse stage 23Y has been employed, but not only this, but also the weight erasure. When reducing the size of the device 40 and focusing only on integrating the weight erasing device 40 with the fine motion stage 21, the coarse motion stage 23Y is applied to the X coarse motion stage 23X as in a normal device. Can be deployed. In this case, the weight erasing device 40 performs the step movement in the Y-axis direction on the member (temporarily referred to as the Y guide) which is the X guide 102 used in this embodiment, but the longitudinal direction is Y-axis direction. In the X-axis direction, which is further in the scanning direction, and arranged to move the entire Y guide.

 In addition, in the second to fourth embodiments described above (and respective variants described above), the X guide 102 allows the body portion (body portion) of the device to pass through the pair of beds 12. Is disposed on the substrate stage mountings 19 which are part of the < RTI ID = 0.0 >), but not only this, but also a plurality of Y linear guides 71A on the substrate stage mountings 19, as in the substrate stage PSTd shown in FIG. Can be fixed directly. This allows the bed 12 (see FIG. 8) to be omitted which further reduces the weight of the overall exposure apparatus and further reduces the overall height (dimension in the Z-axis direction). The same applies to the first embodiment described above.

In addition, in each of the first or fourth embodiments described above (and respective variants described above), the X guide 102 was supported from below by two beds 12, In addition, the number of beds 12 may be three or more. In this case, the auxiliary guide frame 103 arranged between the adjacent beds 12 can be increased. In addition, when the amount of movement in the X-axis direction of the substrate P is small (or when the substrate P itself is small), the number of beds 12 may be one. In addition, with regard to the shape of the bed 12, although the length in the Y-axis direction has been set longer than the length in the X-axis direction for a long time, the length in the X-direction may be set longer without this limitation. In addition, a plurality of beds may be arranged separately in the X-axis and / or Y-axis directions.

In addition, when the bending of the X guide 102 is negligibly small, the auxiliary guide frame 103 does not need to be disposed.

In addition, in the embodiment described above, a plurality of Y linear guides 71A are fixed on the pair of beds 12 and the X guide 102 is Y linear guide 71A in the Y-direction thereon. Is employed, but not only this, for example, a plurality of static gas bearings or rollers can be provided on the lower surface of the X guide 102, so that the X guide 102 has a low frictional force. Can move on the beds 12. However, in order to maintain a constant distance between the Y mover 72A and the Y stator 73, some kind of restricting the movement of the X guide 102 in the X-axis direction with respect to the pair of beds 12 is provided. It is desirable to have a device of. For devices that limit the movement of the X guide 102 in the X-axis direction, for example, a static gas bearing or a mechanical single axis guide can be used. This arrangement eliminates the need for a positioning operation of positioning the plurality of Y linear guides 71A in parallel with each other, which facilitates the assembly of the substrate stage device.

In addition, a device (clearance device) which enables each of the X guide 102 and the Y slider 71B to be movable in the X-axis direction at a minimum distance, for example, between the X guide 102 and the Y slider 71B. May be provided. In this case, even when the plurality of Y linear guides 71A are not arranged in parallel with each other, the X guide 102 can travel straight in the Y-axis direction smoothly on the plurality of Y linear guides 71A. As a device for allowing each of the X guide 102 and the Y slider 71B to be movable in the X-direction, for example, a hinge device can be used. Similar clearance devices may also be provided for other linear guide devices. In addition, in a similar manner, a device may be provided in which the pair of X beams 101 and the Y carriage 75 are movable relative to the minimum distance in the X-axis direction. In this case, even if the pair of base frames 14 are not collimated, the pair of X beams 101 can go straight smoothly in the Y-axis direction.

In addition, as shown in Fig. 21A, in the first and second embodiments described above, a pair of Y carriages 83 each having a J-shape and an inverted J-shape in the XZ cross section are each X guide. It may be attached to both ends of the 102, and the Y mover 72A may be further secured to each of the Y carriages 83. In this case, the magnetic attraction acts equally on the base frame 14 between the magnet unit with the Y stator 73 (see FIGS. 1 and 8) and the coil unit with the Y mover 72A. The inclination of the base frame 14 is prevented. In addition, the thrust for driving the X guide 102 is also improved.

In addition, in the first and second embodiments described above, although the plurality of linear motors are all motors using the movable coil method, not only this, but also motors using the movable magnet method may also be used. In addition, in embodiments other than the second embodiment described above, the drive device used to drive the Y carriage 75 in the Y-axis direction is not limited to the linear motor, but is a ball screw type drive device, a belt type. Drive devices or rack and pinion type drive devices may also be used.

In addition, in the above first and second embodiments, the Y stator 73 (see FIGS. 1 and 8) fixed to the base frame 14 is used to drive the Y linear 102 and Although jointly used by the Y linear motor used to drive the Y coarse motion stage 23Y, each Y linear motor can be configured individually. In addition, the Y stator of the Y linear motor used to drive the Y coarse motion stage 23Y can be fixed to the auxiliary guide frame 103, and the Y mover can be attached to the auxiliary carriage 78.

In addition, in the first and second embodiments described above, both ends of the pair of X beams 101 in the X-direction are mechanically connected by, for example, the plate 76, but this Furthermore, for example, the ends may be connected by a member having approximately the same cross section as the X beam 101. In addition, the Z-axis dimension of the X guide 102 (guide body portion 102a) may be longer than the respective Z-axis dimension of the pair of X beams 101. In this case, the Z-axis dimension of the weight erasing device 40 can be made shorter.

In addition, in the first and second embodiments described above, for example, two (four total) Y carriages 75 are provided on the + X side and the -X side of the Y coarse motion stage 23Y, respectively. Although not only this, but for example, one Y carriage 75 may be provided on the + X side and the -X side of the Y coarse motion stage 23Y, respectively. In this case, when the length of the Y carriage 75 is equal to the plate 76, the plate 76 is unnecessary. In addition, in the Y carriage in this case, a notch is formed in which the Y mover 72A attached to both ends of the X guide 102 in the X-axis direction is inserted.

In addition, in each of the embodiments described above, although the pair of X beams 101 are mechanically connected, not only this but also the pair of X beams 101 may be mechanically separated. In this case too, each pair of X beams 101 can be synchronously controlled.

In addition, in the fourth embodiment described above, the X guide 102 was pushed in contact with the X beam 101 through the pusher device 108, but not only this, but also the X guide 102 is the X beam. A configuration may be employed in which 101 is pushed in a non-contact state. For example, as shown in FIG. 21B, the thrust type air bearing 109 (air pad) should be attached to the X beam 101 (or X guide 102), or the X guide 102 Must be pushed in a non-contact manner by the static pressure of the gas blown from the bearing face. Also, as shown in Fig. 21C, permanent magnets 100a and 100b (a pair of permanent magnets 100) can be attached to the X beam 101 and the X guide 102, respectively, The magnetic poles of the parts facing each other become equal and the X guide 102 can be pushed in a non-contact manner by the repulsive force (repulsive force) generated between the opposing magnets. In the case of using such a pair of permanent magnets 100, since no compressed gas, electricity or the like is provided, the configuration of the device is simplified. Both the plurality of (e.g., two) thrust type air bearings 109 and the pair of permanent magnets 100 described above are combined with the X beam 101 and the X guide 102 on the + Y side; It should be provided spaced apart in the X-axis direction from each other between the X beam 101 and the X guide 102 on the Y side.

-Fifth embodiment

Next, a fifth embodiment will be described with reference to FIGS. 23 to 28.

The exposure apparatus is configured similarly to the exposure apparatus 10 of the first embodiment, except that in the exposure apparatus according to the fifth embodiment, the substrate stage device PSTe is provided instead of the substrate stage device PST. do.

The description below focuses primarily on the substrate stage device PSTe. The same or similar reference numerals are used here for the same or similar components as in the exposure apparatus 10 according to the first embodiment, and the general description is simplified or omitted.

In the exposure apparatus for the fifth embodiment, instead of the substrate stage having the previously described coarse / coarse configuration, the substrate stage device PSTe is used, as shown in FIGS. 23 and 24, in which the longitudinal direction is used. Y which holds the joist (beam) shape X stage STX and the substrate (plate) P moving in the X-axis direction in this Y-axis direction on the X stage STX and move in the Y-axis direction. A so-called gantry type two-axis stage (substrate stage) ST having a stage STY is disposed. Although not shown, the substrate stage device PSTe has the projection optical system PL (not shown in FIGS. 23 and 24, see FIG. 1) as in the substrate stage device PST described previously (on the -Z side image). Is located).

The substrate stage device PSTe is disposed with the substrate stage ST and the substrate stage driving system PSD (not shown in FIGS. 23 and 24, see FIG. 25) for driving the substrate stage ST. As shown in Figs. 24 and 25, the substrate stage driving system PSD includes a pair of X-axis driving units XD1 and XD2 and an X stage for driving the X stage STX in the X-axis direction. On the STX, a Y-axis drive unit YD for driving the Y stage STY in the Y-axis direction is disposed. The Y stage STY holding the substrate P is driven by the substrate stage drive system PSD in the X-axis direction and the Y-axis direction with a predetermined stroke.

Specifically, as shown in FIGS. 23 and 24, a total of six substrate stage devices PSTe are arranged along the side surfaces in the XY two-dimensional direction on the floor surface F in the clean room in which the exposure apparatus is disposed. Provided on the leg portions 61a to 61f, the two base blocks 62a and 62b and the two base blocks 62a and 62b respectively supported by the three leg portions 61a to 61c and 61d to 61f, respectively. X stage (STX), X stage driven in the X-axis direction by a pair of (two) X-axis drive units XD1 and XD2, two X-axis drive units XD1 and XD2 The Y stage STY and the like driven in the Y-axis direction are arranged by the Y-axis drive unit YD and the Y-axis drive unit YD provided on the STX.

As shown in Fig. 23, the leg portions 61a to 61c are disposed at a predetermined distance in the X-axis direction. Similarly, the leg portions 61d to 61f are respectively positioned at predetermined distances in the X-axis direction (in the depth direction of the ground in FIG. 23) on the + Y side of the respective leg portions 61a to 61c. In each of the lower sections of the leg portions 61a to 61f, four adjustment tools 61a ₀ to 61f ₀ are respectively provided. As can be seen from FIGS. 23 and 24, for example, in the leg portion 61b, two adjustment tools 61b ₀ are each provided in the lower section on the ± Y side.

The leg portions 61a to 61c and 61d to 61f support the base blocks 62a and 62b which are located in parallel with each other at a predetermined distance in the Y-axis direction, respectively, and the X-axis direction serves as the longitudinal direction. The base blocks 62a and 62b are orthogonal to the earth's axis (gravity direction), for example, by being properly adjusted by the adjustment tools 61a ₀ to 61f ₀ provided to each of the leg portions 61a to 61f using the level. It is supported at the same height from the floor surface F and in parallel with the plane.

As shown in FIG. 24, the X-axis drive units XD1 and XD2 are provided to the base blocks 62a and 62b, respectively. The X-axis drive units XD1 and XD2 support the -Y and + Y ends of the X stage STX from below, respectively, and drive the X stage STX in the X-axis direction.

As shown in Figs. 23 and 24, one of the X-axis drive units XD1 (on the -Y side) has a plurality of fixed members 63 and one movable member 84, a driving force in the X-axis direction. A pair of linear motors XDM1 and XDM2 for generating a force, a pair of guide devices XG1 and XG2 for limiting the movement of the X stage STX in directions other than the X-axis direction, and a fixing member ( 63 (see FIG. 25), which includes a linear encoder EX1 that measures the position of the movable member (X stage STX) in the X-axis direction with respect to the base block 62a (base block 62a).

As shown in Figs. 23 and 24, at the edge portion on the ± Y side of the base block 62a, a plurality of (10 each in this embodiment) fixing members 63 laterally in the X-axis direction. Are fixed accordingly. In addition, for the sake of clarity, in FIG. 23, a part of the plurality of fastening members 63 (including the stator XD12 to be described later) on the -Y side is not shown or shown in partial cutaway. Each fixing member 63 of the edge portion using a -Z fastening Mrs. fixing (bolt) (63 ₀₎ and is fixed to the side of the base block (62a). In this case, the inner surface of each fixing member 63 is inclined inwardly by an angle π / 2-θ with respect to the XZ plane, as shown in FIG. 26 (to form an angle with respect to the XY plane). As a result, the YZ cross-sectional shape of the member, which is a combination of the base block 62a and the fixing member 63, is approximately U-shaped (however, the distance between the pair of opposing surfaces is + Z side (opening side) rather than the -Z side). Smaller in the).

As shown in Fig. 24, the movable member 84 is composed of a square columnar member having a YZ cross-section having a bilateral trapezoidal shape, the upper surface and the lower surface of which are horizontal planes (parallel to the XY plane), and the longitudinal direction is moved It is positioned to be in the possible direction (X-axis direction). The movable member 84 and through the riser (rising) block 85 fixed to the upper surface of the movable member has a rectangular YZ section 84, section (volts) (66 ₀₎ in the vicinity of the -Y edge by It is attached to the stop plate 66 fixed to the lower surface (-Z surface) of the X stage STX.

The movable member 84 is disposed in the space formed by the base block 62a and the fixing member 63. In this case, the Y side surface of the movable member 84 is inclined by an angle π / 2-θ with respect to the XZ plane (forms a predetermined angle θ with respect to the XY plane). That is, the surface on the + Y side of the movable member 84 is parallel and opposed to the surface on the -Y side of the fixing member 63 on the + Y side at a predetermined distance, and on the -Y side of the movable member 84. The surface opposes in parallel with the surface on the + Y side of the fixing member 63 on the -Y side at a predetermined distance. The movable member 84 reduces its weight and has a hollow structure. In addition, the ± X ends of the movable member 84 need not necessarily be parallel. In addition, the YZ cross section does not necessarily need to be trapezoidal in shape. In addition, when the surfaces on which the movable members XD11 and (XD21) to be described below are fixed are inclined at an angle π / 2-θ with respect to the XZ plane (Z-axis), the corners of the movable member 84 may be rounded. Can be.

As shown in Fig. 24, the linear motor XDM1 is composed of the mover XD11 and the stator XD12 and the linear motor XDM2 is composed of the mover XD21 and the stator XD22.

As shown in FIG. 24, the pair of stators XD12 and XD22 described above are respectively fixed to the inner side of the fixing member 63 at the ± Y side, and as shown in FIG. 23, the X-axis direction. (Not shown stator XD12 in Fig. 23) Additionally, as shown in Fig. 23, stators XD12 and (XD22) (stator XD12 is not shown in Fig. 23). Is not fixed to the fixing member 63 located at the outermost sides on the + X side and the -X side.The pair of movable members XDll and XD21 described above are both on the Y side of the movable member 84. The movable members XDll and XD21, respectively fixed to the sides, have a slight gap in the direction of the angles θ and the stators XD12 and (XD22) fixed to the fixing member 63 facing both sides. Opposite the axis (XZ plane).

In addition, although not shown, inside each of the movers XDll and XD21, a plurality of coil units (including a plurality of coils each wound around a core (iron core)) are arranged in the X-axis direction. Inside each of the stators XD12 and XD22, a plurality of magnet units (each comprising a plurality of permanent magnets) are arranged in the X-axis direction. In the fifth embodiment, the mover XDll and The stator XD12 constitutes a movable coil type linear motor XDM1, and the mover XD21 and the stator XD22 constitute a movable coil type linear motor XDM2.

As shown in FIGS. 23 and 24, the guide device XG1 includes an X-axis linear guide (rail) XGR1 and two sliders XGS1. Similarly, the guide device XG2 comprises an X-axis linear guide (rail) XGR2 and two sliders XGS2.

Specifically, the Y-axis of the inner bottom surface of the groove cross section at a position where a groove of a predetermined depth is provided extending in the X-axis direction on the upper surface of the base block 62a and spaced apart at substantially the same distance on the ± Y side. From the center in the direction, the X-axis linear guides XGRl and XGR2 extending in the X-axis direction are fixed in parallel to each other. Each of the two sliders XGS1 and XGS2 is fixed to the lower surface of the movable member 84 at positions opposite the X-axis linear guides XGRl and XGR2, respectively. In this case, the sliders XGS1 and XGS2 have an inverted U-shaped cross section, but the two sliders XGS1 on the -Y side are engaged with the X-axis linear guide XGRl and the two sliders on the + Y side. Are engaged with the X-axis linear guides XGR2. Near the ± X ends of each of the X-axis linear guides XGRl and XGR2, as shown in FIG. 23, stop devices 88 and 89 are provided to prevent overrun of the X stage STX. .

As shown in FIG. 24, the linear encoder EX1 includes a head EXhl and a scale EXsl. On the surface of the scale EXsl, a reflection diffraction grating is formed in which the periodic direction is the X-axis direction, and the X-axis linear guides XGRl and at the center of the Y-axis direction of the inner bottom surface of the groove of the base block 62a. It extends in parallel with XGR2). The head EXhl is provided on the lower surface (or side on the + X side (or -X side)) of the movable member 84. The head EXhl opposes the scale EXsl in the movement stroke of the movable member 84 (X stage STX) in the X-axis direction, irradiates the measurement light on the scale EXsl, and By receiving the reflected diffracted light from EXsl, the positional information in the X-axis direction (-Y end of the X stage STX) of the movable member 84 with respect to the base block 62a is measured. The measurement results are sent to the master controller 50 (see FIG. 25).

The other (on the + Y side) X-axis drive unit XD2 is configured almost the same as the X-axis drive unit XD1 described above. However, X- axis of the movable member 84 includes a driving unit (XD2) using a fixing (66 ₀₎ in the X stage (STX) of the + Y end of the lower surface (-Z side) in the vicinity of the riser ( Instead of a block 85, which is attached to the stop plate 66 via a parallel plate string 86 provided. The parallel plate string 86 is constituted by a pair of plate springs arranged at a predetermined distance spaced from the Y-axis direction in the X-axis direction parallel to the XZ plane. Parallel plate string 86 allows fine relative movement of stop plate 66 and movable member 84 in a predetermined stroke in the Y-axis direction. Therefore, even when the parallel relationship between the base block 62a and the base block 62b is reduced, the guide device XG3 to be described later (configured by the slider XGS3 and the X-axis linear guide (rail) XGR3) ) Is reduced by the operation of parallel plate string 86.

In addition, on the upper surface of the fixing member 63, as described above, the parallel plate string 86 in which the relative movement of the stop plate 66 and the movable member 84 is minutely generated in a predetermined stroke in the Y axis direction. A cover 87 is attached to allow distortion of the cover and to cover the opening of the upper surface. Similarly, on the upper surface of the fixing member 63 on the X-axis drive unit XD1 side described previously, the riser block in the Y-axis direction that occurs due to the distortion of the parallel plate string 86 ( A cover 87 is attached that allows movement of the 85 and also covers the opening of the upper surface. By these covers 87, the X-axis drive units XD2 and the heat generated by the coil unit inside the pair of movers XD11 and XD21 which the X-axis drive units XD2 and XD1 have; Diffusion to the outside of XD1) can be prevented.

In the X-axis drive unit XD2, only one guide device XG3 is provided, as shown in FIG. 24, and the guide device XG3 is one, as in the guide devices XG1 and XG2. It consists of an X-axis linear guide (XGR3) and two sliders (XGS3) that mesh with the X-axis linear guide. In the X-axis drive unit XD2, a linear encoder EX2 composed of a head EXh2 and a scale EXs2 is provided as in the linear encoder EX1 described above. The linear encoder EX2 measures positional information in the X-axis direction of the movable member 84 with respect to the base block 62b. The measurement result is sent to the master controller 50 (see FIG. 25).

Further, each of the X-axis drive units XD1 and XD2 has a fan 70A and a fan 70B at the edge portion on the −X side and at the edge portion on the + X side as shown in FIG. 23. The fan 70A is an intake fan that intakes outside air (air) into the inner space (the space between the base block 62a or 62b and the pair of fixing members 63 of the X-axis drive unit) and the fan 70B Is an exhaust fan for discharging air passing through the internal space of the X-axis drive unit to the outside. By these fans 70A and 70B, the coil unit inside the pair of movers XD11 and XD21 provided in the inner space of each of the X-axis drive units XD1 and XD2 can be effectively cooled.

In this case, the loads (and inertial forces accompanying the movement of the loads) of the X stage STX and the Y stage STY supported at the top are applied to the X-axis drive units XD1 and XD2. In addition, in the linear motors XDM1 and XDM2 included in the X-axis drive units XD1 and XD2, magnetic attraction, which is several times the driving force, is generated between the respective movers and the stators. In this case, the magnetic attraction acting on the mover relative to the stator acts as a buoyancy force (force in the antigravity direction) on the movable member 84. The X-axis drive units XD1 and XD2 use magnetic attraction (buoyancy) to substantially cancel the load described above and without large loads (and inertial forces) being applied to the guide devices XG1 to XG3. Support and drive X stage STX Additionally, X-axis drive units XD1 and XD2 between a load such as X stage STX and magnetic attraction (buoyancy) from linear motors XDM1 and XDM2. Offset (balance) will be described later in detail.

As shown in FIG. 23, the Y stage STY is supported by the X stage STX through the guide device YG constituting a part of the Y-axis drive unit YD. The substrate P is held in the Y stage STY.

As shown in Fig. 23, the Y-axis drive unit YD restricts the movement of the linear motor YDM, which generates the driving force in the Y-axis direction, and the Y stage STY in a direction other than the Y-axis direction. And a linear encoder EY (see FIG. 25) for measuring the position of the Y stage STY in the Y-axis direction with respect to the guide device YG and the X stage STX.

The linear motor motor YDM includes the mover YD1 and the stator YD2, as shown in FIG. The stator YD2 is provided extending in the Y-axis direction at the center of the X-axis direction at the upper surface of the X stage STX. The mover YD1 is fixed to the center of the X-axis direction at the bottom surface of the Y stage STY opposite the stator YD2 to the Z-axis direction.

The guide device YG comprises a pair of Y-axis linear guides (rails) YGR and four sliders YGS (not partially shown in FIG. 23). Each pair of Y linear guides YGR is provided extending in the Y-axis direction parallel to each other in the vicinity of the edge portion toward the -X side and the + X side at the upper surface of the X stage STX. Four sliders YGS are fixed near four corners at the bottom surface of the Y stage STY, respectively. In this case, the four sliders YGS have an inverted U-shaped XZ cross section, and among the four sliders, the two sliders YGS located on the -X side are Y on the -X side of the X stage STX. Engaging with the -axis linear guide YGR, the two sliders YGS located on the + X side engage with the Y-axis linear guide YGR on the + X side of the X stage STX (see Figure 24). ).

The linear encoder EY (see FIG. 25) consists of a head and a scale. The scale (not shown) has a reflective diffraction grating formed on the surface whose periodic direction is in the Y-axis direction and is provided extending in parallel to the Y-axis linear guide YGR on the X stage STX. A head (not shown) is provided on the bottom surface of the Y stage STY (or on the side of the + Y side (or -Y side)). The head is opposed to the scale in the movement stroke in the Y axis direction of the Y stage STY, irradiates the measurement light on the scale, and receives the reflected diffracted light from the scale, thereby receiving the Y stage STY for the X stage STX. Position information in the Y-axis direction. The measurement result is transmitted to the main controller 50 (see FIG. 25).

The positional information of the substrate stage ST (Y stage STY) in the XY plane (including yawing (rotation θz in the z direction)) is described above with respect to the X-axis drive units XD1 and XD2. It is continuously measured by the encoder system 20 (see FIG. 25) composed of the linear encoders EXl and EX2 included in each and the linear encoder EY included in the Y-axis drive unit YD.

In addition, independent of the encoder system 20, the substrate interferometer system 92 is connected to the Y stage STY (substrate stage ST) through a reflective surface (not shown) provided (or formed) on the Y stage STY. ) Information about the positional information (including θz) in the XY plane and the amount of inclination (pitching (rotation in θx direction) and rolling (rotation in θy direction)) with respect to the Z-axis. The measurement results of the substrate interferometer system 92 are provided to the master controller 50 (see FIG. 25).

The master controller 50 is based on the measurement results of the encoder system 20 and / or the substrate interferometer system 92, through the substrate stage drive system PSD (see FIG. 25), or more precisely, in the X-axis. Substrate stage ST (Y stage STY and X stage) via linear motors XDM1, XDM2, and YDM constituting part of the drive units XD1, XD2 and the Y-axis drive unit YD, respectively. (STX)) to drive and control.

FIG. 25 is a block diagram showing the input / output relationship of the master controller 50 which centrally configures the control system of the exposure apparatus for the fifth embodiment and has overall control over each part. The master controller 50 includes a workstation (or microcomputer) and the like, and has overall control over each part of the exposure apparatus.

Next, the balance in the X-axis drive unit XD1 (XD2) between the load such as the X stage STX and the magnetic attraction (buoyancy) from the linear motors XDM1 and XDM2 described above will be described. In addition, since the balance of buoyancy and load described above is the same in the X-axis drive unit XD1 and the X-axis drive unit XD2, in the following description, the X-axis drive unit XD1 is described. .

As shown in FIG. 26, in the state where the X stage STX (see FIG. 24) is stopped, the load W that is half of the total weight of the X stage STX, the Y stage STY, or the like is X-axis. It acts downward in the vertical direction (direction indicated by the outline arrow) on the movable member 84 of the drive unit XDl. At the same time, with respect to the movable member 84, the magnetic attraction force Fl generated between the mover XD11 and the stator XD12 constituting the linear motor XDM1 in the direction of forming the angle θ with respect to the Z-axis. And the magnetic attraction force F2 generated between the mover XD21 and the stator XD21 constituting the linear motor XDM2 act in the direction of forming the angle -θ with respect to the Z-axis. Additionally, for example, when the Y stage STY is located at the center of the movable range, the load W that is half of the total weight of the X stage STX is X-axis drive unit XD1 and X-. Acting about the same on the movable member 84 of the axial drive unit XD2, or more precisely, the load in the downward direction in the vertical direction acting on the movable member 84 is at the position of the Y stage STY. Change accordingly.

Hereinafter, it is assumed that the magnetic attraction forces Fl and F2 generated in each of the linear motors XDM1 and XDM2 are the same (ie, F1 = F2 = F). Thereafter, the resulting force P = Fzl + Fz2 (= 2Fcosθ) of the vertical component of the magnetic attraction force Fl and F2 by the linear motors XDM1 and XDM2 is moved in the upward vertical direction (direction indicated by the black arrow). Act on the member 84. The angle θ is set such that the resulting force P is approximately equal to the load W. Therefore, the load (remaining force) much smaller than the load (W) | W-P | Act on these guide devices XGl and XG2. In addition, in the horizontal direction (Y-axis direction), the horizontal components Fyl and Fy2 of the magnetic attraction force Fl and F2 are erased, and the resulting force does not act on the movable member 84 ( Force acts as a result of invalidity). In addition, since the relative movement of the fixing member 63 and the movable member 84 is limited in the Z-axis direction (+ Z direction and -Z direction) by the guide devices XGl and XG2, The relationship between the resulting force P and the load W may be P <W, or P> W.

In the above-described X-axis drive unit XD1 (XD2), the inclination (tilt angle θ) of the sides of the movable member 84 and the fixing member 63 opposing each other according to the load capacities of the guide devices XGl and XG2. By appropriately setting), the load W acting in the vertical direction uses the magnetic attraction forces Fl and F2 of the linear motors XDM1 and XDM2 to provide the movable member 84 with the force in the vertical direction. Can be erased without

On the other hand, the magnetic attraction force -F1 generated by the linear motor XDMl in the? Direction with respect to the Z-axis acts on the fixing member 63 fixed to the -Y side of the base block 62a. This attraction provides the shear force and the bending moment for the stationary member 63. Similarly, the magnetic attraction force -F2 generated by the linear motor XDM2 in the -θ direction with respect to the Z-axis acts on the fixing member 63 fixed to the + Y side of the base block 62a. This attraction provides the shear member and the shear moment to the stationary member 63. Therefore, both fixing members 63 are bent inward to the fixing end with the base block 62a, so that the size of the gap between both surfaces of the fixing member 63 and the movable member 84 opposite to each other is reduced. Can change.

The size variation of the gap due to the bending of the fixing member 63 can be suppressed by optimizing the thickness (width in the Y-axis direction) of the fixing member 63.

For example, the driving force (thrust force) of the X stage STX is small and the load W (more precisely, the resultant force P = 2Fcosθ above the magnetic attraction force F1 and F2) becomes large (W> P ), The inclination angle θ becomes small. This increases the resulting force P, ie the buoyancy force applied to the movable member 84, thereby reducing the load (remaining force) | WP | acting on the guide devices XG1 and XG2. . In this case, since the magnetic attraction is small, the shear force and the bending moment acting on the fixing member 63 also become small. Therefore, the thickness of the fixing member 63 can be set small.

On the contrary, when the driving force (thrust force) of the X stage STX is large and the load W on the magnetic attraction force Fl and F2 (the resulting upward force P = 2Fcosθ) is small (W <P), the inclination angle ( (theta) is set large. This balances the resulting force P and load W. In this case, since the magnetic attraction becomes large with respect to the large inclination angle θ, the shear force and the bending moment acting on the fixing member 63 become large. Therefore, the thickness of the fixing member 63 needs to be large.

Next, a method of obtaining the thickness (width in the Y-axis direction) h of the fixing member 63 will be described with reference to FIG. 27. As shown in FIG. 27, the widths of the movable members XDll and XD21 and the stators XD12 and XD22 are expressed as s (projection length a = scosθ in the Y-axis direction) and are opposed to each other. The size of the gap between the sides of the 63 and the movable member 84 is represented by c (projection length d = csinθ in the Y-axis direction), and the length of the fixing member 63 in the X-axis direction is b. The height (distance in the Z-axis direction) from the fixed end of the fastening member 63 to the center of the inner side (the center of the fasteners XD12 and XD22) is L = (s / 2) sinθ + It is expressed as α. However, α is an acceptable dimension. In addition, the magnetic attraction is Fl = F2 = F, that is, the buoyancy force acting on the movable member 84 is represented by P = 2 (Fcosθ). The Young's modulus (length elastic modulus) and flexure of the fixing member 63 are represented by E and w, respectively, and the thickness h of the fixing member 63 uses the relational expression of bending when a normal force is applied to the simple cantilever. Can be obtained as in the following formula (1).

...(1)

...(One)

In addition, in order to reduce the size of the X-axis drive unit XD1 (in particular, to shorten the width dimension in the Y-axis direction of the X-axis drive unit XDl), a + d + h is The hardness angle θ must be set to be small.

However, as previously described, between the fixing member 63 and the movable member 84, the linearity error (Y transition error and Z transition error) and rotation / tilt error of the movable member 84, and the Y stage ( Guide devices XG1 and XG2 are provided to suppress the repulsive force and the like accompanying the movement of the STY. Therefore, the load applied to the movable member 84 does not need to completely eliminate only the buoyancy force P from the linear motors XDM1 and XDM2.

For example, if s = 100 mm, b = 500 mm, c = 50 mm, E = 16000 kgf / mm ² , α = 100 mm, F = 2000 kgf, w = 0.1 mm, and W = 800 kg, The relationship between a, d, h, a + d + h, and buoyancy (P (= 2 Fcosθ)) can be obtained as described in Table 1 below.

From Table 1 above, the angle θ should be set to θ = 70-85 degrees. That is, for load (W) = 800 kgf, buoyancy (P) = 1368.1 to 348.6 kgf, the remaining force acting on the guide devices XG1 and XG2 is -568.1 to +451.4 kgf, which results in a load (W) Can be substantially erased. In addition, since the remaining force can be adjusted very small, the size of the guide devices XG1 and XG2 can be reduced. This reduces the frictional resistance between the X-axis linear guides and the sliders constituting the guide devices XG1 and XG2. That is, the thrust required to drive the movable member 84 (X stage STX) becomes small, which causes, for example, the movable member 84 to be moved manually, and also with the maintenance of the X stage STX. The same work efficiency can be improved. In addition, by setting the inclination angle θ large, the size of the fixing member 63, that is, the X-axis drive unit XD1 can be reduced.

In addition, in the X-axis drive units XD1 and XD2 having the above-described configuration, the gap between the movers XD11 and XD21 and the stators XD12 and XD22 is provided with an adjustment plate such as spacers and the like. It can be easily adjusted without using. The adjustment procedure is described below based on FIG. First, in the adjustment, the worker fixes the movable member 84 to the base block 62a by using an appropriate fastening portion. Next, the worker attaches, on both sides of the movable member 84, a non-magnetic material block 69 having a thickness larger by an appropriate gap amount than the movable members XD11 and XD21. Next, if the the stator fixed to the inner surface of the fixing member (63) (XD12 and XD22) in contact with the non-magnetic material block (69), the operator holding member by using a fastening part (bolt) (63 ₀₎ The 63 is fixed to the base block 62a. In this case, since the fixing surface (plane parallel to the XZ plane) is not parallel to the inner surface of the fixing member 63 (the surface inclined by an angle ± θ with respect to the Z-axis), the outline arrow in FIG. By adjusting the fixed position (height) by sliding the fixing member 63 in the vertical direction indicated by, the size of the gap can be adjusted. In this case, in order to enable the adjustment, the fastening member 63 has an elongated XZ cross section longer in the Z-axis direction than the circle, in which the fastening portion (bolts) 6 ₀ can slide in the vertical direction. Slots are formed.

Subsequently, the operator similarly bases all the fastening members 63 (except the fastening members 63 closest to the + X edge portion and the -X edge portion) while changing the X position of the movable member 84. To the block 62a. Finally, after the operator exchanges the non-magnetic material block 69 with the movers XDll and XD21, with the movable member 84 retracted to the + X edge portion (or -X edge portion), ± The fixing member 63 on the X ends is fixed to the base block 62a.

This allows the stators XD12 and XD22 to be firmly fixed to a wide range on the inner side of the fixing member 63 and also to allow the gap formed by the movers XDll and XD21 to be easily adjusted. In addition, since the processing accuracy in the structure of the X-axis drive units XD1 and XD2 becomes low, the arrangement is economical. As a result, it becomes possible to construct the substrate stage device PSTe having a high driving accuracy at a relatively low cost. In addition, since the stators XD12 and XD22 (magnet units) are fixed to the inner surface of the X-axis drive units XD1 and XD2 (inner surface of the fixing member 63), the magnet body is fixed to the fixing member. The stators are not attracted even if they are close to the outer surface of (63).

In the exposure apparatus according to the fifth embodiment configured in the manner described above, detailed processing is omitted, but lot processing is performed by a procedure similar to the exposure apparatus 10 for the first embodiment described previously.

As described above, according to the exposure apparatus for the fifth embodiment, a pair of X-axis driving units XD1 and XD2 for driving the substrate stage ST (X stage STX) in the X-axis direction Of the orthogonal component acting as buoyancy force between the first mover (XD11) and the first stator (XD12) and the second mover (XD21) and the second stator (XD22) disposed on By using the resultant force P of the force Fz2, the load acting on the base blocks 62a and 62b including the self-gravity of the substrate stage can be reduced, and the substrate stage ST (X stage STX Highly accurate drive control is possible without disturbing drive performance.

Further, according to the exposure apparatus according to the fifth embodiment, the X stage STX holding the substrate P through the Y stage STY (to be more precise, the substrate stage ST holding the substrate P). ) Can be driven with high accuracy at the time of scanning exposure of the substrate P, so that high-precision exposure of the substrate P becomes possible.

Additionally, in the fifth embodiment described above, the X-axis drive unit XD1 (XD2) is constructed using the movable member 84 whose plane of cross section is an isosceles trapezoidal shape, but instead, the description below. As in the first and second modifications described above, it is possible to construct the X-axis drive unit XD1 (XD2) using the movable member 84 having a plane of cross section that is not isosceles trapezoidal in shape.

FIG. 29 shows the configuration of the X-axis drive unit XD1 (XD2) according to the first modification (However, for the base block 62a, the fixing member, and the movable member 84, for convenience, The same reference numerals as in the fifth embodiment described above are used). In the configuration of FIG. 29, the inclinations of the ± Y side surfaces of the movable member 84 are different from each other (θ 1> θ 2). Thus, the horizontal components of the magnetic attraction forces Fl and F2 of the linear motors XDM1 and XDM2 are not canceled and the resulting force Py in the -Y direction acts on the movable member 84.

In FIG. 29, in the configuration of the X-axis drive unit XD1 (XD2), thrust type static gas bearing devices XG3a and XG4 are used as the guide device. On both sides and the inner bottom surface of the groove in the base block 62a, the guide faces XGG3 and XGG4 are formed with high flatness (each of the guide faces XGG3 and XGG4 is a bottom face orthogonal to the side of the groove). Two guide faces). On the bottom surface of the movable member 84, a plurality of static gas bearings, air pads XGP3 and XGP4, which have bearing surfaces opposing the guide surfaces XGG3 and XGG4, respectively, are attached. The air pads XGP3 and XGP4 blow high pressure air through the stop (compensation element) with a slight gap (bearing gap) between the guide surfaces XGG3 and XGG4 and the bearing surfaces. In this case, each of the air pads XGP3 and XGP4 has two functions of an air pad which limits the pitching motion and the yawing motion of the movable member 84.

In the thrust type static gas bearing devices XG3a and XG4, a gap is applied by pushing an external force to the movable member 84 by pushing the bearing surface of the air pads XGP3 and XGP4 against the guide surfaces XGG3 and XGG4. The rigidity of the air film (air pad) in the inside can be increased. Accordingly, the inclination angles θ1 and θ2 of the ± Y side surfaces of the movable member 84 are appropriately set, and the resulting force Pz of the vertical component of the magnetic attraction forces Fl and F2 of the linear motors XDMl and XDM2 By adjusting the resulting force P y of the horizontal component and the load in the vertical direction and the load in the horizontal direction applied to the air pads XGP3 and XGP4, the rigidity of each air pad can be optimally adjusted. Can be.

In addition, by adjusting the resulting force Py to appropriately set the inclination angles θ1 and θ2 of the ± Y sides of the movable member 84 and by adjusting the load in the horizontal direction applied to the air pads XGP3 and XGP4. In other words, the stiffness of one of the air pads XGP3 and XGP4 may be higher than that of the other air pads. This allows the movable member 84 to move along one of the guide faces. Thus, when the parallel relationship of the guide surfaces XGG3 and XGG4 formed by both sides of the groove is degraded, the movable member 84 can be formed so that the air pad having high rigidity moves along the opposing guide surface. . In addition, when the straightness of one of the guide faces XGG3 and XGG4 formed by both sides of the groove is deteriorated, by increasing the rigidity of the air pad facing the other guide face of the guide faces XGG3 and XGG4, The member 84 may be formed to move along a guide surface having good straightness opposite to the air pad having high rigidity.

30 shows the configuration of the X-axis drive unit XD1 (XD2) of the second modification (However, for the base block 62a, the fixing member and the movable member 84, the fifth described above for convenience. The same reference numerals are used as in the embodiment). In the configuration of Fig. 30, the guide face XGG3 described previously is formed on the -Y side of the groove of the bottom face and the side face is formed on the + Y side of the groove, but the guide face XGG4 'is formed only on the bottom face. do. Then, air pads XGP3 and XGP4 'having bearing surfaces opposing these guide surfaces XGG3 and XGG4', respectively, are attached to the bottom surface of the movable member 84. Also in this case, the movable member 84 can be moved along the guide surface XGG3 opposite the air pad XGP3 as in the first modification described above.

Additionally, since it is generally difficult to form guide surfaces with high flatness on both sides of the groove of the base block 62a, the guide face can be provided on both sides of the groove, 62a is constructed using a plurality of dividing members.

Additionally, in the fifth embodiment described above, the stators XDll, XD21 in the respective linear motors XDMl and XDM2 in which magnetic attraction is disposed in the two X-axis drive units XD1 and XD2. ) And a case in which the vertical component of the attraction force is in the direction of lifting the mover from the stator side. However, not only this, but the configuration in which the positions of the stators XD11 and XD21 and the movers XD12 and XD22 in each of the linear motors XDM1 and XDM2 in the fifth embodiment are switched, for example, Can be employed. In this case, when the X stage STX is driven in the X-axis direction, the magnetic repulsive force (repulsive force) must act between the stators XD11 and XD21 and the movers XD12 and XD22 and the repulsive force component (repulsive force) The vertical component should be in the direction from which it is pulled from the stator side. Even in this case, the repulsive force of the vertical component of the force acting between the stators XD11 and XD21 and the movers XD12 and XD22 can be used as buoyancy, and the same effect as in the fifth embodiment can be obtained. have. In addition to this, in addition to or instead of the magnetic force between the stator XD11, XD21 and the movers XD12, XD22, other attractive forces (e.g., vacuum suction force) or repulsive force (e.g., static pressure of the gas) This may work when at least the X stage STX is driven in the X-axis direction. Even in this case, the vertical component of suction or repulsive force can be used as buoyancy.

Additionally, in the fifth embodiment described above, the substrate P is disposed on the Y stage STY, but for example, in the stage device disclosed in US Patent Application Publication No. 2010/0018950, the Y stage ( A fine motion stage driven in six degrees of freedom with respect to STY can be provided, and the substrate P can be arranged in the fine motion stage. In this case, a weight erasing device as disclosed in US Patent Application Publication No. 2010/0018950 can be provided and can support the fine motion stage described above from below.

In addition, in the exposure apparatus for each of the embodiments described above, the illumination apparatus comprises ultraviolet light, such as ArF excimer laser light (with a wavelength of 193 nm) and KrF excimer laser light (with a wavelength of 248 nm), Or vacuum ultraviolet light, such as F2 laser light (having a wavelength of 157 nm). Additionally, as illumination light, wavelengths can be amplified by using a nonlinear optical crystal and by amplifying a short wavelength laser light in an infrared or visible range emitted by a DFB semiconductor laser or a fiber laser with an erbium (or both erbium and ytterbium). Harmonics can also be used by converting to ultraviolet light. In addition, solid state lasers (having wavelengths of 355 nm, 266 nm) and the like can also be used.

In addition, in each of the embodiments described above, the case where the projection optical system PL is a projection optical system by the multi-lens method provided with a plurality of projection optical units has been described, but the number of projection optical units is not limited thereto, one Should be the projection optical units. In addition, the projection optical system is not limited to the projection optical system by the multi-lens method, but may be, for example, a projection optical system using an opener-type large mirror or the like.

In addition, in the exposure apparatus for each of the embodiments described above, the projection optical system is not limited to an equal magnification system, but may also be a reduction system or a magnification system, and may also be a reflective refractive optical system, a reflective optical system or a refractive optical system. In addition, the projected image may be reversed or upright.

In addition, in the embodiment described above, a light transmissive type mask obtained by forming a predetermined light shielding pattern (or face pattern or light attenuation pattern) on a light transmissive mask substrate is used. However, instead of this mask, for example, in US Pat. No. 6,778,257, an electronic mask (variable mask) formed according to the electronic data of the light transmission pattern, the reflection pattern, or the pattern to which the radiation pattern is to be exposed, eg For example, a variable shape mask using DMD (Digital Micromirror Device), which is a type of non-radiative image display element (also called a spatial light modulator), may also be used.

Additionally, the exposure apparatus for each of the embodiments described above may be of the same size (including at least one of an outer diameter, a diagonal, and one side) as a large substrate of a flat panel display (FPD), such as, for example, a liquid crystal display. It is especially effective to apply to the exposure apparatus which exposes the board | substrate which is 500 mm or more.

In addition, each of the embodiments described above may be applied to an exposure apparatus by a step and stitch method. In addition, the fifth embodiment described above in particular can be applied to, for example, a static type exposure apparatus.

In addition, the application of the exposure apparatus is not limited to the exposure apparatus for the liquid crystal display elements in which the pattern of the liquid crystal display element is transferred onto the rectangular glass plate, and each of the above embodiments may also be, for example, an exposure apparatus for manufacturing a semiconductor, And an exposure apparatus for manufacturing thin film magnetic heads, micromachines, DNA chips, and the like. In addition, the present invention can be applied to an exposure apparatus for manufacturing microdevices such as semiconductor devices, as well as an exposure apparatus for transferring a circuit pattern onto a glass plate or silicon wafer to manufacture a mask or reticle used in the exposure apparatus, It can also be applied to EUV exposure apparatus, X-ray exposure apparatus, electron beam exposure apparatus and the like. In addition, the object to be exposed is not limited to the glass plate and may be another object such as, for example, a wafer, a ceramic substrate, a film member, or a mask blank. In addition, when the exposure target is a substrate for a flat panel display, the substrate thickness is not particularly limited and, for example, a film member (a sheet member having flexibility) is also included.

In addition, all of the above publications, the PCT international publication descriptions, US patent application publications, and US patent descriptions of exposure apparatuses and the like, are incorporated herein by reference.

Device manufacturing method

Next, a method of manufacturing a microdevice using the exposure apparatus for each of the above embodiments in the lithography process will be described. In the exposure apparatus for each embodiment described above, a liquid crystal display such as a microdevice can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern) on a plate (glass substrate).

-Pattern formation process

First of all, a so-called optical lithography process in which a pattern image is formed on a photosensitive substrate (such as an organic substrate coated with a photosensitive resist) is carried out using the exposure apparatus according to each of the embodiments described above. In this optical lithography process, a predetermined pattern comprising a plurality of electrodes or the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is subjected to respective processes such as a developing process, an etching process and a resist removing process, whereby a predetermined pattern is formed on the substrate.

-Color filter formation process

Next, a plurality of sets of color filters in which a plurality of sets of three dots corresponding to R (Red), G (Green) and B (Blue) are arranged in a matrix shape, or filters of three strips of R, G and B A color filter is formed in which the set is arranged in the horizontal scan line directions.

Cell assembly process

Next, a liquid crystal panel (liquid crystal cell) is assembled using the board | substrate which has a predetermined | prescribed pattern obtained by the pattern formation process, the color filter obtained by the color filter formation process, etc. For example, a liquid crystal panel (liquid crystal cell) is manufactured by inject | pouring a liquid crystal between the board | substrate which has a predetermined | prescribed pattern obtained by the pattern formation process, and the color filter obtained by the color filter formation process.

Module assembly process

Thereafter, the liquid crystal display element is completed by attaching individual components such as an electronic circuit and a backlight to cause the display operation of the assembled liquid crystal panel (liquid crystal cell) to be performed. In this case, since the exposure of the substrate is performed with high throughput and high precision using the exposure apparatus for each of the embodiments described above in the pattern forming process, the reproducibility of the liquid crystal display elements can be improved as a result.

Industrial availability

As described above, the exposure apparatus of the present invention is suitable for moving the object to be exposed in the scanning direction with a predetermined stroke with respect to the energy beam for exposure in the exposure process. In addition, the mobile device of the present invention is suitable for driving the mobile device. In addition, the flat panel display manufacturing method of the present invention is suitable for manufacturing flat panel displays. In addition, the device manufacturing method of the present invention is suitable for manufacturing microdevices.

Claims (1)

Exposure apparatus as described in description of invention.

Images