TW202026776A - Exposure apparatus, movable body apparatus, flat-panel display manufacturing method, and device manufacturing method - Google Patents

Abstract

In a substrate stage (PST), when a Y coarse movement stage (23Y) moves in the Y-axis direction, an X coarse movement stage (23X), a weight cancellation device (40), and an X guide (102) move integrally in the Y-axis direction with the Y coarse movement stage (23Y), and when the X coarse movement stage (23X) moves in the X-axis direction on the Y coarse movement stage (23Y), the weight cancellation device (40) moves on the X guide (102) in the X-axis direction integrally with the X coarse movement stage (23X). Because the X guide (102) is provided extending in the X-axis direction while covering the movement range of the weight cancellation device (40) in the X-axis direction, the weight cancellation device (40) is constantly supported by the X guide (102), regardless of its position.

Description

Exposure device, exposure method, manufacturing method of flat panel display, and device manufacturing method

The present invention relates to an exposure device, a mobile device, a method of manufacturing a flat panel display, and a method of manufacturing a device. In more detail, it relates to an exposure device used in the lithography process for manufacturing semiconductor devices, liquid crystal display devices, etc., suitable for A moving body device which is a device that the exposure device moves while holding an object to be exposed, a method of manufacturing a flat panel display using the exposure device, and a method of manufacturing a device using the exposure device.

In the conventional lithography process used to manufacture electronic components (microcomponents) such as liquid crystal display components and semiconductor components (integrated circuit, etc.), one side mask or reticle (hereinafter, collectively referred to as "mask") is used. ”) It moves synchronously with the glass plate or wafer (hereinafter collectively referred to as the “substrate”) along the predetermined scanning direction (scanning direction), while transferring the pattern formed on the mask to the substrate using an energy beam. & scan) exposure device (so-called scanning stepper (also known as scanning machine)) and so on.

This type of exposure apparatus has an overlapping type (gantry type) with an X coarse movement stage that can move with a long stroke in the scanning direction and a Y coarse movement stage that can move in the scanning cross direction (direction orthogonal to the scanning direction). ) Stage devices are widely known, and as the stage device, for example, a structure in which a weight cancel device moves along a horizontal plane on a platform formed of stone is known (for example, refer to Patent Document 1).

However, in the exposure device described in Patent Document 1, since the weight reduction device moves in a wide range corresponding to step & scan operations, it is necessary to move the platform over a wide range (the movement guide of the weight reduction device) The flatness of the surface is very high. In addition, in recent years, the exposure target substrate of exposure equipment has become increasingly large, and the accompanying platform has also become large. Therefore, in addition to the increase in cost, the transportability of the exposure equipment and the deterioration of the workability during assembly have also received great attention. .

In addition, the exposure apparatus described in Patent Document 1 mentioned above is designed to accommodate an XY two-axis stage, an actuator for micro-driving the micro-motion stage, etc. between the stage (stage base) and the micro-motion stage. A very large space is required in the height direction. For this reason, the weight elimination device has to become larger (higher), and in order to drive the weight elimination device along a horizontal plane, a large driving force is also necessary.

For a long time, when driving a large-mass substrate stage, a linear motor with an iron core that can generate a large driving force (thrust) is used. This linear motor with iron core can generate magnetic attraction force several times the thrust between the magnet unit contained in the mover (or fixed piece) and the coil unit with iron core contained in the fixed piece (or mover) (Attraction). Specifically, relative to the thrust of 4000N, an attractive force of 10,000 to 20,000N can be generated.

Therefore, in the conventional substrate stage device with the above structure, a pair of single-axis drive units are arranged between the X coarse motion stage and the stage base to generate substrates, Y coarse motion stages, X coarse motion stages, etc. The heavy load (and the inertial force accompanying the movement of the X coarse motion stage), and especially the large attractive force generated by the iron-core linear motor constituting the pair of single-axis drive units will also act here. Therefore, the single-axis drive unit, especially the linear motor and the guiding device that constitute a part of the single-axis drive unit, must have a large load capacity (capacity). In addition, the movable member and the fixed member must be firmly structured to withstand The attraction from linear motors.

On the other hand, due to the large frictional resistance acting between the linear guide (rail) and the slider constituting the guiding device (single-axis guide), the driving resistance increases, so it is necessary to generate a greater driving force. Linear motor. In addition, incidental problems such as the enlargement of the substrate stage device, the generation of frictional heat in the guiding device, the generation of Joule heat in the linear motor, and the mechanical damage caused by the adsorbent have become increasingly obvious. Advanced technical literature

[Patent Document 1] Specification of US Patent Application Publication No. 2010/0018950

The first scanning type exposure apparatus of the first aspect of the present invention moves the object of the exposure target in a first direction parallel to the horizontal plane with a predetermined first stroke relative to the energy beam for exposure during exposure processing, and it has: The moving body can move in the first direction with at least the predetermined first stroke; the second moving body guides the movement of the first moving body in the first direction and can be orthogonal to the first direction in the horizontal plane The second direction moves with the first moving body in a second stroke; the object holding member can hold the object and move together with the first moving body at least in a direction parallel to the horizontal plane; the weight reduction device supports from below The object holding member eliminates the weight of the object holding member; and the supporting member extends in the first direction, supports the weight elimination device from below and can support the weight elimination device from below in the first direction Move in the 2 direction by this second stroke.

According to this device, during exposure processing of an object, the object holding member holding the object is driven in a direction parallel to the first direction (scanning direction) together with the first moving body. In addition, the object is driven in a second direction orthogonal to the first direction by the second moving body to move in the second direction. Therefore, the object can be moved in two dimensions along a plane parallel to the horizontal plane. Here, it is only necessary to drive the first moving body (and the object holding member) to move the object in the first direction. Therefore, it is assumed that the other moving in the second direction is mounted on the moving body moving in the first direction. Compared with the case of the moving body, the moving body (only the first moving body, the object holding member, and the weight removing device) that are driven during the scanning exposure has a lower mass. Therefore, it is possible to use actuators for moving objects and the like to be downsized. In addition, since the support member supporting the weight elimination device from below is composed of a member extending in the first direction and can move to the second direction while supporting the weight elimination device from below, it has nothing to do with the position in the horizontal plane. The weight elimination device is always supported by the supporting member from below. Therefore, compared with the case where a large member having a large guide surface that can cover the moving range of the weight elimination device is provided, the weight and size of the entire device can be reduced.

A moving body device according to a second aspect of the present invention includes: a moving body that moves at least in a first direction parallel to the first axis in a plane parallel to the horizontal plane; a base for supporting the moving body; and a driving device, Including the first and second movable elements respectively facing the first predetermined direction and the second predetermined direction intersecting with the first and second movable elements provided on the moving body, and each of the first and second movable elements facing each other on the base The first and second stators respectively extending in the first direction are used between the first movable component and the first stator and between the second movable component and the second stator. The driving force in the first direction drives the moving body relative to the base in the first direction; at least one of the first predetermined direction and the second predetermined direction is the first direction orthogonal to the first axis in the horizontal plane 2 axis and the direction intersecting the third axis orthogonal to the horizontal plane; at least when the movable body is driven in the first direction, between the first movable element and the first fixed element, and the second movable The force in the first predetermined direction and the second predetermined direction act between the element and the second fixed element.

Here, the force acting in the first predetermined direction (opposing direction) between the first movable element and the first stator, and the second predetermined direction (opposing direction) acting between the second movable element and the second stator The force of the direction) is any of the attraction or repulsion in the opposite direction. For example, magnetic force can be representatively mentioned, but it is not limited to this. It can also be vacuum attraction, pressure caused by gas static pressure, etc.

According to this device, the force in the first predetermined direction acting between the first movable element and the first fixed element when the moving body is driven in the first direction, and the force acting between the second movable element and the second fixed element can be utilized The force in the second predetermined direction reduces the load on the base including the self-weight of the movable body, and drives the movable body with high precision without compromising the driving performance.

The second exposure device of the third aspect of the present invention irradiates an energy beam to form a pattern on an object, and includes the moving body device of the present invention in which the object is held by the other moving body.

According to this device, since the moving body holding the object can be driven with high precision, it is possible to perform high-precision exposure of the object.

A third exposure apparatus according to a fourth aspect of the present invention includes: a movable body for holding the object to move at least in a first direction parallel to the first axis in a plane parallel to the horizontal plane; a base for supporting the movable body; The device includes first and second movable elements provided on the movable body respectively facing a first predetermined direction and a second predetermined direction intersecting this, and each opposed to the first and second movable elements on the base The first and second fixed elements extending in the first direction are respectively arranged on the seat, the movable body is driven in the first direction relative to the base, and during the driving, the first movable element and the second fixed element The forces in the first predetermined direction and the second predetermined direction between the first fixed member, the second movable member and the second fixed member are used as the buoyancy of the moving body; and a pattern generating device for the object The energy beam is irradiated to generate a pattern on the object.

According to this device, when the moving body is driven by the driving device, the first predetermined direction that acts between the first movable element and the first stator, and between the second movable element and the second stator, respectively And the force in the second predetermined direction is used as the buoyancy of the aforementioned moving body, which reduces the load on the base including the dead weight of the moving body, and enables high-precision driving of the moving body without compromising the driving performance.

A fifth aspect of the present invention provides a method for manufacturing a flat panel display, which includes: exposing the substrate using any one of the first to third exposure devices; and developing the substrate after the exposure.

A sixth aspect of the present invention provides a device manufacturing method, which includes: exposing the object using any one of the first to third exposure devices; and developing the object after the exposure.

"First Embodiment"

Hereinafter, the first embodiment will be described based on FIGS. 1 to 7.

FIG. 1 schematically shows the structure of the exposure apparatus 10 of the first embodiment. The exposure device 10 is a projection exposure device of a step-and-scan method using a rectangular glass substrate P (hereinafter, simply referred to as substrate P) used in a liquid crystal display device (flat panel display) as an exposure target, a so-called scanner.

The exposure apparatus 10, as shown in FIG. 1, includes an illumination system IOP, a mask stage MST holding a mask M, a projection optical system PL, a pair of substrate stage stages 19, and a substrate that holds the substrate P to be movable along a horizontal plane. The stage device PST, and the control system of these, etc. In the following description, it is assumed that during exposure, one of the horizontal planes in which the mask M and the substrate P are scanned relative to the projection optical system PL is the X-axis direction, and the direction orthogonal to this in the horizontal plane is the Y-axis direction and X The direction perpendicular to the axis and the Y axis direction is the Z axis direction, and the rotation (tilt) directions around the X axis, Y axis, and Z axis are respectively the θx, θy, and θz directions.

The lighting system IOP has the same configuration as the lighting system disclosed in the specification of US Patent No. 6,552,775. That is, the illuminating system IOP has a plurality of illuminating masks M arranged in a zigzag shape, for example, a plurality of illuminating areas, for example, 5 illuminating systems, and each illuminating system uses a light source (such as a mercury lamp) not shown in the figure. ) The emitted light is irradiated to the mask M as exposure illumination light (illumination light) IL via a mirror, a dichroic mirror, a blind, a wavelength selection filter, various lenses, etc., not shown. The illumination light IL uses, for example, i-line (wavelength 365nm), g-line (wavelength 436nm), h-line (wavelength 405nm), etc. (or the aforementioned i-line, g-line, and h-line combined light). Moreover, the wavelength of the illumination light IL can be appropriately switched by a wavelength selection filter, for example, depending on the required resolution.

On the mask stage MST, for example, a mask M having a pattern surface (lower surface in FIG. 1) formed with a circuit pattern and the like is fixed by vacuum suction. The mask stage MST is mounted on a guide not shown in a non-contact state, and is driven with a predetermined stroke by, for example, a mask stage drive system MSD (not shown in FIG. 1, refer to FIG. 7) including a linear motor In the scanning direction (X-axis direction), it is appropriately micro-driven in the Y-axis direction and the θz direction.

The position information of the mask stage MST in the XY plane is achieved by a laser interferometer (hereinafter referred to as "mask interference") that irradiates a laser beam (length measuring beam) fixed (or formed) on the reflective surface of the mask M "Meter") 16, can be measured at any time, for example, with a resolution of about 0.5 to 1 nm. This measurement result is supplied to the main control device 50 (refer to FIG. 7).

The main control device 50 performs drive control of the mask stage MST through the mask stage drive system MSD (not shown in FIG. 1, refer to FIG. 4) based on the above measurement result of the mask interferometer 16. In addition, an encoder (or an encoder system composed of a plurality of encoders) may be used instead of the reticle interferometer 16, or together with the reticle interferometer 16.

The projection optical system PL is arranged below the mask stage MST in FIG. 1. The projection optical system PL has the same configuration as the projection optical system disclosed in the specification of US Patent No. 6,552,775, for example. That is, the projection optical system PL corresponds to the aforementioned plurality of illumination regions, and the projection regions including the pattern image of the mask M are arranged in a staggered pattern, for example, five projection optical systems (multi-lens projection optical systems), and have Y The projection optical system of a rectangular single image field whose axis direction is the long side direction has the same function. In this embodiment, each of the plurality of projection optical systems is composed of, for example, a two-stage lens with two groups of optical elements (lens group) arranged along the optical axis, an optical element group (lens group), and a mirror. System configuration, for example, using the equal magnification system of both sides telecentric, forming an erect image.

Therefore, when the illumination area on the mask M is illuminated with the illumination light IL from the illumination system IOP, the first surface (object surface) and the pattern surface of the projection optical system PL are arranged so that the first surface (object surface) of the projection optical system PL substantially coincides with the pattern surface. The illuminating light IL passes through the projection optical system PL to form the projected image (partial erect image) of the circuit pattern of the mask M in the illumination area on the second surface (image surface) side of the projection optical system PL , The illumination area (exposure area) of the illumination light IL conjugated to the illumination area on the substrate P coated with photoresist (sensor). And by the synchronous driving of the mask stage MST and the micro-movement stage 21 that constitutes a part of the substrate stage device PST, the mask M is moved in the scanning direction (X-axis direction) relative to the illuminating area (illumination light IL) and facing each other. The exposure area (illumination light IL) moves the substrate P in the scanning direction (X-axis direction) to perform scanning exposure of an illuminated area (zoned area) on the substrate P, and transfer the pattern (light Mask pattern). That is, in this embodiment, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the sensing layer (photoresist layer) on the substrate P using the illumination light IL is exposed to This pattern is formed on the substrate P.

The pair of substrate stage stands 19 are each composed of members extending in the Y-axis direction (refer to FIG. 5), and both ends in the longitudinal direction are supported from below by vibration-proof devices 13 provided on the floor F. The pair of substrate stages 19 are arranged in parallel at a predetermined interval in the X-axis direction. A pair of substrate stage stages 19 constitute the main body (machine body) of the exposure apparatus 10, and the projection optical system PL, the mask stage MST, etc. are mounted on the main body.

The substrate stage device PST, as shown in FIG. 1, includes a pair of beds 12, a pair of base frames 14, a coarse motion stage 23, a fine motion stage 21, a weight elimination device 40, and weight support from below Eliminate the X guide 102 of the device 40 and so on.

As shown in FIG. 2, the pair of bottom beds 12 are each composed of rectangular box-shaped members (cube-shaped members) whose longitudinal direction is the Y-axis direction in a plan view (viewed from the +Z side). The pair of bottom beds 12 are arranged in parallel at a predetermined interval in the X-axis direction. The bed 12 on the +X side, as shown in Fig. 1, is mounted on the substrate stage 19 on the +X side, and the bed 12 on the -X side is mounted on the substrate stage 19 on the -X side. The positions of the upper surfaces of the pair of bottom beds 12 in the Z-axis direction (hereinafter referred to as Z positions) are adjusted to be substantially the same.

As can be seen from FIGS. 1 and 2, the pair of bottom beds 12 are mechanically connected near both ends in the longitudinal direction by two connecting members 79. A pair of bottom beds 12, as shown in FIG. 3(A), are each composed of hollow members, and a plurality of plate-shaped members parallel to the YZ plane are provided at predetermined intervals in the X-axis direction between the upper face and the lower face. The ribs to ensure rigidity and strength. In addition, although not shown, a plurality of ribs composed of plate-shaped members parallel to the XZ plane are also provided at predetermined intervals in the Y-axis direction between the upper surface and the lower surface of the bed 12. In the center part of each of the plurality of ribs and the side part of the bottom bed 12, circular holes for weight reduction and shaping are formed (refer to FIG. 5). In addition, for example, when the exposure accuracy can be sufficiently ensured without providing the connecting member 79, the connecting member 79 may not be provided.

On each of the pair of bottom beds 12, as shown in Fig. 2, a plurality of Y linear guides 71A (this is the main part of the mechanical uniaxial guide) are fixed in the X-axis direction at predetermined intervals and parallel to each other. In the embodiment, one bottom bed is provided with, for example, four branches).

One of the pair of base frames 14 is arranged on the +X side of the +X side bed 12, as shown in FIGS. 1 and 3(A), and the other is arranged on the -X side of the -X side bed 12. Since the pair of base frames 14 have the same structure, only the base frame 14 on the -X side will be described below. The base frame 14, as shown in FIG. 3(C), includes a body portion 14a having a surface parallel to the YZ plane and the other surface, a plate-shaped member extending in the Y-axis direction, and a body portion 14a supporting the body portion 14a from below A plurality of feet 14b (not shown in FIGS. 2 and 4). The length (the dimension in the longitudinal direction (Y-axis direction)) of the main body portion 14a is set to be longer than the length of the pair of bottom beds 12 in the Y-axis direction. The leg portions 14b are provided, for example, three at predetermined intervals in the Y-axis direction. A plurality of adjusters 14c are provided at the lower end of the foot 14b to adjust the Z position of the main body 14a.

Y fixers 73, which are elements of linear motors, are fixed to both side surfaces of the main body 14a. The Y stator 73 has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction. In addition, Y linear guides 74A, which are components of the mechanical uniaxial guide device, are fixed to the upper surface and both side surfaces of the main body 14a (below the above-mentioned Y stator 73).

Returning to FIG. 1, the coarse motion stage 23 includes a Y coarse motion stage 23Y and an X coarse motion stage 23X mounted on the Y coarse motion stage 23Y. The coarse motion stage 23 is located above the pair of bottom beds 12 (+Z side).

The Y coarse motion stage 23Y has a pair of X columns 101 as shown in FIG. 2. The pair of X pillars 101 are respectively composed of members extending in the X-axis direction and having a rectangular YZ cross-section, and are arranged parallel to each other at a predetermined interval in the Y-axis direction. In addition, since each X column 101 does not require rigidity in the Y-axis direction compared with the rigidity in the Z-axis direction (gravity direction), the shape of the YZ cross-section may be, for example, an I-shape.

Below each of the long side ends of the pair of X-pillars 101, as shown in FIG. 6, a member called a Y carriage 75 is fixed through a plate 76. That is, under the Y coarse motion stage 23Y, for example, four Y brackets 75 in total are attached. The plate 76 is composed of a plate-shaped member extending in the Y-axis direction parallel to the XY plane, and mechanically connects a pair of X-pillars 101 to each other. For example, each of the four Y brackets 75 in total has the same structure. Therefore, only one Y bracket 75 corresponding to the -X-side base frame 14 will be described below.

The Y bracket 75, as shown in FIG. 3(C), is composed of an inverted U-shaped member in the XZ section, and the main body portion 14a of the base frame 14 is inserted between a pair of opposed surfaces. A pair of Y movable members 72 facing each other is fixed to each of a pair of opposite surfaces of the Y bracket 75 and each of a pair of Y stators 73 through a predetermined gap. Each Y movable element 72 includes a coil unit not shown in the figure, and forms a Y linear motor YDM (see reference) that drives the Y coarse motion stage 23Y (see FIG. 1) in the Y axis direction with a predetermined stroke together with the opposite Y stator 73 Figure 7). In this embodiment, as described above, since a total of four Y brackets 75 are provided, for example, the Y coarse motion stage 23Y is driven in the Y-axis direction by, for example, eight Y linear motors YDM in total.

A sliding member 74B including a rotating body (for example, a plurality of balls, etc.) that can be slidably engaged with the Y linear guide 74A is fixed to an opposite surface and the top surface of the Y bracket 75, respectively. In addition, although FIG. 3(C) overlaps in the depth direction of the paper surface and is shielded, in each of the opposite surface and the top surface of the Y bracket 75, the slider 74B is fixed in the depth direction of the paper surface (Y-axis direction). For example, two intervals are installed each (refer to FIG. 5). The Y coarse-movement stage 23Y (refer to FIG. 1) is guided linearly in the Y-axis direction by a plurality of Y linear guides including a Y linear guide 74A and a slider 74B. In addition, although not shown, a Y scale with the Y-axis direction as the periodic direction is fixed to the body portion 14a of the base frame 14, and an encoder read head is fixed to the Y bracket 75. This encoder read head is used for composition The Y linear encoder system EY (refer to FIG. 7) that obtains the position information of the Y coarse motion stage 23Y in the Y axis direction together with the Y scale. The position of the Y coarse motion stage 23Y in the Y-axis direction is controlled by the main control device 50 (refer to FIG. 7) based on the output of the encoder head.

Here, as shown in FIG. 1, an auxiliary guide frame 103 is arranged between the pair of bottom beds 12. The auxiliary guide frame 103 is composed of a member extending in the Y-axis direction, and is set on the ground F through a plurality of adjusters. On the upper end surface (+Z side end surface) of the auxiliary guide frame 103 is fixed a Y linear guide 77A, which is an essential part of the mechanical uniaxial guide device extending in the Y axis direction. The Z position of the upper end of the auxiliary guide frame 103 is set to be substantially the same as the upper surface of the pair of bottom beds 12. In addition, the auxiliary guide frame 103 is separated in vibration from the pair of bottom beds 12 and the pair of substrate stage tables 19, respectively. In addition, since the pair of bottom beds 12 are mechanically connected by the connecting member 79, the auxiliary guide frame 103 is formed with a through hole, not shown, through which the connecting member 79 can pass.

An auxiliary bracket 78 is fixed to the lower surface of the center portion in the longitudinal direction of each of the pair of X-pillars 101 (refer to FIG. 6). The auxiliary bracket 78 is composed of a rectangular parallelepiped member. As shown in FIG. 1, a sliding member 77B including a rotating body (for example, a plurality of balls) and slidably engaged with the Y linear guide 77A is fixed on the bottom thereof. In addition, although FIG. 1 is not visible due to overlapping in the depth direction of the paper surface, for one auxiliary bracket 78, two sliders 77B are attached at a predetermined interval in the depth direction of the paper surface (Y-axis direction), for example. In this way, the center part in the longitudinal direction of the Y coarse motion stage 23Y is supported by the auxiliary guide frame 103 from below through the auxiliary bracket 78 to suppress bending due to its own weight.

Returning to Fig. 2, on each of the pair of X-pillars 101, a plurality of branches (in this embodiment, for one X-pillar 101, for example, two branches) are fixed in parallel with each other at predetermined intervals in the Y-axis direction. The X linear guide 80A, which is the essential part of the mechanical single-axis guiding device in the X-axis direction. In addition, in the area between the pair of X linear guides 80A on the upper surface of each of the pair of X pillars 101, an X stator 81A is fixed. The X stator 81A has a magnet unit, and the magnet unit includes a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction.

As described above, the Y coarse motion stage 23Y is supported from below by the pair of base frames 14 and the auxiliary guide frame 103, and is separated from the pair of bed 12 and the substrate stage 19 in terms of vibration.

The X coarse motion stage 23X is composed of a rectangular plate-shaped member in a plan view, and as shown in FIG. 4, an opening is formed in the center. Under the X coarse motion stage 23X, as shown in FIG. 5, a pair of X movable elements 81B are fixed. This pair of X movable elements 81B respectively align with the X fixed elements 81A fixed to each of the pair of X pillars 101 through a predetermined gap. to. Each X movable element 81B includes a coil unit not shown, and forms an X linear motor XDM (see FIG. 7) that drives the X coarse motion stage 23X in the X-axis direction with a predetermined stroke together with the opposite X stator 81A. In this embodiment, the X coarse motion stage 23X is driven in the X-axis direction by, for example, a pair (two) of X linear motors XDM provided corresponding to the pair of X columns 101.

In addition, under the X coarse motion stage 23X, as shown in FIG. 1, there are fixed a plurality of sliding members 80B including rotating bodies (such as a plurality of balls) and slidably engaged with the X linear guide 80A. . For example, four sliders 80B are arranged at predetermined intervals in the X-axis direction with respect to one X linear guide 80A. For example, a total of 16 sliders 80B are fixed under the X coarse motion stage 23X. The X coarse-movement stage 23X is linearly guided in the X-axis direction by a plurality of X linear guides each including an X linear guide 80A and a slider 80B. In addition, the X coarse motion stage 23X is restricted from moving in the Y axis direction relative to the Y coarse motion stage 23Y by a plurality of sliders 80B, and moves in the Y axis direction integrally with the Y coarse motion stage 23Y.

Also, although not shown, an X scale with the X axis direction as the periodic direction is fixed to at least one of the pair of X columns 101, and an encoder read head is fixed to the X coarse motion stage 23X. This encoder read head Together with the X scale, an X linear encoder system EX (refer to FIG. 7) for obtaining position information of the X coarse motion stage 23X in the X axis direction is constructed. The position of the X coarse motion stage 23X in the X-axis direction is controlled by the main control device 50 (refer to FIG. 7) based on the output of the encoder head. In this embodiment, the aforementioned X linear encoder system EX and the aforementioned Y linear encoder system EY are configured to detect the position information of the coarse motion stage (X coarse motion stage 23X) in the XY plane (including the θz direction) Rotating) encoder system 20 (refer to Fig. 7).

Also, although not shown, the X coarse motion stage 23X is equipped with a stopper member that mechanically restricts the movable amount of the fine motion stage 21 relative to the X coarse motion stage 23X, or is used to measure the X axis And a gap sensor for the amount of movement of the micro-movement stage 21 in the Y-axis direction relative to the X coarse-movement stage 23X.

The micro-motion stage 21, as can be seen from FIGS. 1 and 2, is composed of a substantially square plate-shaped member (or box-shaped (hollow rectangular parallelepiped) member) in a plan view, and the substrate P is vacuum-attached (or electrostatically attached) through the substrate holder PH. ) Way to adsorb on it.

The micro-motion stage 21 is micro-driven on the X-coarse-motion stage 23X by the micro-motion stage drive system 26 in the 3 degrees of freedom direction (X-axis, Y-axis, and θz directions) in the XY plane. The micro-motion stage The driving system 26 (refer to FIG. 7) includes a plurality of voice coil motors (or linear motors) composed of a stator fixed to the X coarse motion stage 23X and a movable member fixed to the fine motion stage 21, respectively. A plurality of voice coil motors, as shown in FIG. 2, micro-drive the micro-movement stage 21 in the X-axis direction X voice coil motor 18X is separated in the Y-axis direction, and the micro-movement stage 21 is micro-driven on the Y-axis A pair of Y voice coil motors 18Y are arranged separately in the X axis direction. The fine motion stage 21 is driven synchronously with the X voice coil motor 18X and/or Y voice coil motor 18Y and the X coarse motion stage 23X (at the same speed and driven in the same direction as the X coarse motion stage 23X), and Together with the X coarse motion stage 23X, it moves in the X-axis direction and/or the Y-axis direction with a predetermined stroke. Therefore, the fine movement stage 21 can move with a long stroke (coarse movement) in the XY two-axis directions with respect to the projection optical system PL (refer to FIG. 1), and can be finely moved in the three degrees of freedom of the X, Y, and θz directions.

In addition, the micro-motion stage drive system 26, as shown in FIG. 3(B), has a plurality of Z voice coil motors 18Z for micro-driving the micro-motion stage 21 in the θx, θy, and 3-degree-of-freedom directions of the Z axis. A plurality of Z voice coil motors 18Z are arranged at the four corners of the bottom surface of the micro-movement stage 21 (Figure 3(B) only shows two of the four Z voice coil motors 18Z, and the other two are not shown). Regarding the structure including a plurality of voice coil motors and a micro-motion stage drive system, for example, it has been disclosed in the specification of US Patent Application Publication No. 2010/0018950.

In this embodiment, a micro-motion stage drive system 26 and a coarse-motion stage drive system composed of the aforementioned plural Y linear motors YDM and a pair of X linear motors XDM constitute a substrate stage drive system PSD (refer to Figure 7) .

On the -X side of the micro-movement stage 21, as shown in FIG. 3(A), an X moving mirror (rod-shaped mirror (rod-shaped mirror) having a reflecting surface orthogonal to the X axis is fixed through a mirror base 24X bar mirror)) 22X. In addition, on the -Y side surface of the micro-movement stage 21, as shown in FIG. 5, a Y movable mirror 22Y having a reflection surface orthogonal to the Y axis is fixed to a transmission mirror base 24Y. The position information of the micro-movement stage 21 in the XY plane is based on the laser interferometer system (hereinafter referred to as the substrate interferometer system) 92 (refer to FIG. 1) using the X-moving mirror 22X and the Y-moving mirror 22Y, such as 0.5-1nm The degree of analytical ability can be tested at any time. In addition, actually, the substrate interferometer system 92 includes a plurality of X laser interferometers corresponding to the X moving mirror 22X and Y laser interferometers corresponding to the Y moving mirror 22Y, but only the representative X is shown in FIG. 1 Laser interferometer. A plurality of laser interferometers are respectively fixed to the device body. In addition, the position information of the micro-movement stage 21 in the θx, θy, and Z-axis directions is obtained by a sensor (not shown) fixed under the micro-movement stage 21, using, for example, a target fixed to the weight elimination device 40 described later. The structure of the position measurement system of the micro-movement stage 21 has been disclosed in, for example, the specification of US Patent Application Publication No. 2010/0018950.

The weight elimination device 40, as shown in FIG. 3(A), is composed of a columnar member extending in the Z-axis direction, which is also called a stem. The weight elimination device 40 is mounted on the X guide 102 described later, and supports the fine movement stage 21 from below through a leveling device 57 described later. The upper half of the weight elimination device 40 is inserted into the opening of the X coarse motion stage 23X, and the lower half is inserted between a pair of X columns 101 (refer to FIG. 4).

The weight elimination device 40, as shown in FIG. 3(B), has a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is composed of a bottomed cylindrical member whose +Z side surface is open. A plurality of air bearings (hereinafter referred to as base pads) 44 whose bearing surfaces face the -Z side are mounted on the lower surface of the housing 41. The air spring 42 is housed in the housing 41. The air spring 42 is supplied with pressurized gas from the outside. The Z slider 43 is constituted by a cylindrical member extending in the Z-axis direction, inserted into the housing 41 and mounted on the air spring 42. An air bearing (not shown) whose bearing surface faces the +Z side is attached to the +Z side end of the Z slider 43.

The leveling device 57 is a device for supporting the micro-motion stage 21 to be tiltable (swing freely in the θx and θy directions with respect to the XY plane), and is supported by the air bearing mounted on the Z slider 43 in a non-contact manner from below. The weight elimination device 40 is lifted by the force of the gravity direction generated by the air spring 42, and the weight of the system including the micro-motion stage 21 (the downward force of the gravity direction) is offset (eliminated) by the Z slide 43 and the leveling device 57, Accordingly, the load on the plurality of Z voice coil motors 18Z is reduced.

The weight elimination device 40 is mechanically connected to the X coarse motion stage 23X through a plurality of connecting devices 45. The Z position of the plurality of connecting devices 45 is substantially the same as the center of gravity position of the weight elimination device 40 in the Z axis direction. The connecting device 45 includes a thin steel plate parallel to the XY plane, etc., and is also called a flexure device. The connecting device 45 connects the housing 41 of the weight eliminating device 40 and the X coarse motion stage 23X on the +X side, -X side, +Y side, and -Y side of the weight eliminating device 40 (+Y side in FIG. 3(B)) ,-The connecting device 45 on the Y side is not shown. Refer to Fig. 4). Therefore, the weight elimination device 40 is pulled by the X coarse motion stage 23X through any one of the plurality of connecting devices 45, and moves in the X-axis direction or the Y-axis direction integrally with the X coarse motion stage 23X. At this time, the weight elimination device 40 acts on a traction force in a plane parallel to the XY plane including its center of gravity position in the Z-axis direction, and therefore does not generate (act) a moment (pitch) around an axis orthogonal to the moving direction. Moment). In addition, the detailed structure of the weight reduction device 40 of this embodiment including the leveling device 57 and the connecting device 45 has been disclosed in, for example, the specification of US Patent Application Publication No. 2010/0018950.

The X guide 102, as shown in FIG. 3(A), includes a guide body 102a composed of an inverted U-shaped member (see FIG. 5) with a YZ cross-section with the X axis as the longitudinal direction, and a plurality of ribs 102b. The X guide 102 is above the pair of bottom beds 12 (+Z side), and is arranged so as to cross the pair of bottom beds 12. The length of the X guide 102 (long side direction (X axis direction) dimension) is set to be relatively

The sum of the dimension in the X-axis direction of a pair of bed beds 12 and the gap between the pair of bed beds 12 in the X-axis direction is arranged at a predetermined interval in the X-axis direction. Therefore, as shown in Figure 2, the +X side end of the X guide 102 protrudes from the +X side (outside the bottom 12) of the +X side bed 12, and the -X side end of the X guide 102 Then, the -X side end of the -X side bed 12 protrudes from the -X side (outside the bed 12).

The upper surface (+Z side surface) of the guide body 102a is parallel to the XY plane and has a very high flatness. On the upper surface of the guide body 102a, a weight reduction device 40 is mounted through a plurality of base pads 44 in a non-contact state. The upper surface of the guide body 102a is adjusted to be parallel to the horizontal plane with good accuracy, and has a function as a guide surface when the weight reduction device 40 moves. The length of the guide body 102a (the dimension in the longitudinal direction) is set to be slightly longer than the movable amount of the weight elimination device 40 (that is, the X coarse motion stage 23X) in the X axis direction. The width of the upper surface of the guide body 102a (the dimension in the Y-axis direction) is set to a dimension that can face all the bearing surfaces of the plurality of base pads 44 (refer to FIG. 4). In addition, both ends in the longitudinal direction of the guide body 102a are closed by plate-shaped members parallel to the YZ plane.

The plurality of ribs 102b are composed of plate-shaped members parallel to the YZ plane, and are provided at predetermined intervals in the X-axis direction. Each of the plurality of ribs 102b is connected to a pair of facing surfaces and top surfaces of the guide body 102a. Here, a plurality of ribs 102b are included. Although the material and manufacturing method of the X guide 102 are not particularly limited, for example, it is formed by casting using iron, etc., formed by stone (for example, gabbro), or formed by ceramics. Or in the case of CFRP (Carbon Fiber Reinforced Plastics) material, etc., the guide body 102a and the plurality of ribs 102b are integrally formed. However, the guide body 102a and the plurality of ribs 102b may be made into different components, and the plurality of ribs 102b may be connected to the guide body 102a by, for example, welding. In addition, the X guide 102 may be formed of a solid member or a box-shaped member with the lower side closed.

At the lower end of each of the plurality of ribs 102b, a Y sliding member 71B including a rotating body (for example, a plurality of balls, etc.), which can slide on the Y linear guide 71A fixed on each of the above-mentioned pair of bottom beds 12, is fixed. Furthermore, as shown in FIG. 4, a plurality of Y sliders 71B are fixed at predetermined intervals in the Y-axis direction (in this embodiment, for example, two Y linear guides 71A are fixed). The flatness adjustment of the upper surface of the guide body 102a can be carried out by appropriately inserting spacers or the like between the plurality of ribs 102b and the Y slide 71B.

As shown in FIG. 2, the plate-shaped members provided at both ends of the X guide 102 in the longitudinal direction are separated from the pair of Y stators 73 (refer to FIG. 3(C)) by a predetermined gap, respectively. The Y movable element 72A (refer to Fig. 4) is the essential element of the Y linear motor 82 (refer to Fig. 7) that drives the X guide 102 in the Y axis direction with a predetermined stroke. For ease of understanding, the plate 76 in Fig. 4 Not shown). Each Y movable element 72A has a coil unit not shown. The X guide 102 is respectively composed of a Y fixed element 73 and a Y movable element 72A, and a pair of Y linear motors 82 are driven in the Y axis direction with a predetermined stroke. That is, in this embodiment, a pair of Y linear motors 82 for driving the X guide 102 in the Y-axis direction and a Y linear motor YDM for driving the Y coarse motion stage 23Y in the Y-axis direction are respectively Use the common fixator 73.

Also, although not shown, a Y scale with the Y-axis direction as the periodic direction is fixed to one of the pair of beds 12, and a Y scale is fixed to the X guide 102 to obtain the X guide 102 The encoder read head of the Y linear encoder system 104 (refer to FIG. 7) for position information in the Y axis direction. The X guide 102 and the Y coarse motion stage 23Y are synchronously driven in the Y-axis direction by the main control device 50 (refer to FIG. 7) according to the output of the encoder reading head (but, if necessary, the Y position can be controlled individually ).

In addition, a rectangular marking plate (not shown) with the Y-axis direction as the longitudinal direction is fixed on the upper surface of the substrate holder PH. The height of the marking plate is set so that its surface is approximately the same height as the surface of the substrate P loaded on the substrate holder PH. In addition, a plurality of fiducial marks (not shown) arranged in the Y-axis direction are formed on the surface of the marking plate.

In addition, inside the substrate holder PH (fine movement stage 21), under each of the six reference marks (-Z side), six mark image detection systems MD ₁ ～ including a lens system and imaging elements (CCD etc.) are arranged. MD ₆ (refer to Figure 7). These mark image detection systems MD ₁ to MD ₆ simultaneously detect the projection images of the alignment marks on the mask M formed by each of the five projection optical systems and the lens system, and the fiducial marks formed by the lens system (not shown) ) Image, measure the position of the alignment mark image based on the position of the fiducial mark image. The measurement result is supplied to the main control device 50 and used for position alignment of the mask M (mask alignment) and so on.

Further, in the exposure device 10, in order to detect the six fiducial marks and the alignment marks on the substrate P, six off-axis alignment detection systems AL ₁ to AL _{6 are provided} (refer to FIG. 7). The six alignment detection systems are arranged in sequence along the Y axis on the +X side of the projection optical system PL.

Each alignment detection system adopts FIA (Field Image Alignment) sensor based on image processing method. FIA is a sensor. For example, it irradiates the target mark with broadband detection light that does not sensitize the photoresist on the substrate P, and uses a photographic device (CCD) to photograph the object that is imaged by the reflected light from the target mark on the light-receiving surface The image of the mark and the image of the indicator (not shown). The detection results of the alignment detection systems AL ₁ to AL _{6 are} sent to the main control device 50 through the alignment signal processing system (not shown).

In addition, it can also be used alone or in an appropriate combination. The coherent detection light can be irradiated to the target mark to detect scattered light or diffracted light generated from the target mark, or two diffracted lights generated from the target mark (for example, the same order) Interference to detect the alignment sensor.

In FIG. 7, the control system of the exposure device 10 is a block diagram showing the relationship between the input and output of the main control device 50 that collectively controls the components of the exposure device 10. The main control device 50 includes a workstation (or a microcomputer), etc., and overall controls the components of the exposure device 10.

Next, the batch processing of the substrate P in the exposure apparatus 10 will be briefly described.

After a batch of processing objects consisting of a plurality of (for example, 50 or 100) substrates P is broken into the coating and developing machine (hereinafter, referred to as "C/D") (not shown) (not shown) connected to the exposure device 10, the batch is The substrates are sequentially coated with photoresist by a coater (photoresist coating device) in the C/D, and are transported to the exposure device 10 by a transport system (not shown). In addition, under the management of the main control device 50, the photomask M is loaded onto the photomask stage MST by a photomask transport device (mask loader) not shown, and then the aforementioned photomask alignment is performed.

After the substrate P coated with photoresist is loaded on the substrate holder PH, the main control device 50 uses the alignment detection systems AL ₁ to AL _{6 to} detect the fiducial marks on the substrate holder PH, and perform baseline measurement.

Next, the main control device 50 uses the alignment detection systems AL ₁ to AL _{6 to} detect a plurality of alignment marks transferred and formed on the substrate P together with the pattern during the exposure before the front layer to perform alignment of the substrate P.

After the alignment of the substrate P is completed, the main control device 50 is controlled by the main control device 50 to perform a step-and-scan exposure operation in which the pattern of the mask M is sequentially transferred by the aforementioned scanning exposure to a plurality of irradiation areas on the substrate P . Since this exposure operation is the same as the exposure operation of the conventional step-and-scan method, its detailed description is omitted.

At this time, the exposure operation of the step-and-scan method is to sequentially perform exposure processing on a plurality of irradiation regions provided on the substrate P. The substrate P is driven at a constant speed with a predetermined stroke in the X-axis direction during the scanning operation (hereinafter referred to as X-scanning operation), and is appropriately driven in the X-axis direction during the stepping operation (when moving between irradiation areas) and/ Or Y-axis direction (hereinafter referred to as X stepping action and Y stepping action respectively).

When the substrate P is moved in the X-axis direction during the above-mentioned X scanning operation and X stepping operation, the substrate stage device PST is based on the instruction of the measurement value from the X linear encoder system EX of the main control device 50 , On the Y coarse motion stage 23Y, the X coarse motion stage 23X is driven in the X-axis direction by a pair (two) X linear motors XDM, and according to the measurement value of the substrate interferometer system 92 from the main control device 50 According to the instructions, the fine motion stage 21 is driven in synchronization with the X voice coil motors 18X and the X coarse motion stage 23X. In addition, when the X coarse motion stage 23X moves in the X axis direction, the weight elimination device 40 moves in the X axis direction together with the X coarse motion stage 23X due to being pulled by the X coarse motion stage 23X. At this time, the weight elimination device 40 moves on the X guide 102. In addition, in the above-mentioned X scanning operation and X stepping operation, although the fine movement stage 21 is finely driven in the Y axis direction and/or the θz direction relative to the X coarse movement stage 23X, the Y position of the weight reduction device 40 There is no change, so the weight elimination device 40 always moves only on the X guide 102.

On the other hand, during the above Y stepping operation, the substrate stage device PST is based on the instruction of the measurement value of the Y linear encoder system EY from the main control device 50 to divide the Y coarse motion stage 23Y into plural Y The linear motor YDM is driven in the Y-axis direction with a predetermined stroke on the pair of base frames 14, and the X coarse motion stage 23X and the Y coarse motion stage 23Y move in the Y-axis direction integrally with a predetermined stroke. In addition, the weight elimination device 40 is integrated with the X coarse motion stage 23X to move in the Y-axis direction with a predetermined stroke. At this time, the X guide 102 supported by the weight elimination device 40 from below is driven in synchronization with the Y coarse motion stage 23Y. Therefore, the weight elimination device 40 is constantly supported by the X guide 102 from below.

As described above, according to the exposure apparatus 10 of this embodiment, the weight reduction apparatus 40 is always supported by the X guide 102 from below regardless of the position of the XY plane. Since the X guide 102 is composed of a narrow plate-shaped member extending in the scanning direction, it can be used with a guide having a large guide surface (such as a platform formed of stone) that can cover the full range of movement of the weight eliminating device 40 Compared with the case of ), the substrate stage device PST can be reduced in weight. In addition, the above-mentioned guide with a large guide surface will be difficult to process and transport in the case of a large substrate. However, the X guide 102 of this embodiment is composed of a belt-shaped guide surface extending in the X-axis direction. Since it is constructed with a narrow plate-shaped member, it is easy to process and transport.

In addition, since the X guide 102 of the member extending in the X-axis direction is supported by a pair of bottom beds 12 from below in plural places, it is possible to suppress bending caused by the dead weight of the X guide 102 or the load of the weight removing device 40 . In addition, since the number of bottom beds 12 is two, compared with the case of one bottom bed 12, the size and weight of each of the two bottom beds 12 can be reduced. Therefore, the processing and transportation of the bed 12 are easy and the workability during assembly of the substrate stage device PST can be improved.

In addition, since the X guide 102 and the pair of bed 12 guiding the X guide 102 in the Y-axis direction are both ribbed structures, they are lightweight and easy to ensure rigidity in the Z-axis direction. Therefore, the assembly operation of the substrate stage device PST is also better than the above-mentioned case of using a guide with a large guide surface.

In addition, since the weight reduction device 40 is supported on the X guide 102 in a non-contact manner, the vibration generated by the movement of the weight reduction device 40 is not transmitted to the X guide 102. Therefore, the vibration is not transmitted to, for example, the projection optical system PL through the X guide 102, the pair of bed 12, the substrate stage 19, etc., and the exposure operation can be performed with high accuracy. In addition, since the X guide 102 is driven near the center of gravity in the Z-axis direction by the pair of Y linear motors 82 that include the Y-fixers 73 fixed to the pair of base frames 14, no moment about the X-axis ( The pitching moment), in addition, the reaction force of the driving force will not be transmitted to the substrate stage 19. Therefore, the exposure operation can be performed with high accuracy.

Since the movement of the X guide 102 in the Y-axis direction is performed during the above-mentioned Y stepping motion that does not require high positioning accuracy, even if the frictional resistance of the linear guide device or the torque generated by the drive acts on the weight reduction device 40 or X The guide 102 can also converge the vibration caused by the above-mentioned moment before the X scanning operation after the Y stepping operation. In addition, the yaw movement (torque around the Z axis, yawing) caused by the Y-axis direction drive of the X guide 102 can be tightly controlled by the driving force difference between one of the X guides 102 and the Y linear motor 82 Control and restrain.

Furthermore, since the coarse motion stage 23 (XY stage device) of this embodiment is configured to mount the X coarse motion stage 23X on the Y coarse motion stage 23Y, it is different from, for example, the Y coarse motion stage mounted on the X coarse motion stage. Compared with the conventional XY stage device of the coarse motion stage, the inertial mass of the X coarse motion stage 23X that moves with a long stroke in the X-axis direction of the scanning direction is smaller. Therefore, the driving reaction force received by the ground surface F through the coarse motion stage 23 during the X scanning operation is small. As a result, it is possible to suppress floor vibration that affects the entire device during the X-scan operation. In contrast, the driving mass and driving reaction force when the Y coarse motion stage 23Y moves in the Y axis direction are larger than those of the above-mentioned conventional XY stage device, but because it is a Y stepping motion that does not require high-precision positioning, Therefore, ground vibration has little effect on the exposure action.

Moreover, in the coarse motion stage 23, the Y coarse motion stage 23Y has a pair of X-pillars 101. The auxiliary guide frame 103 is arranged between the pair of beds 12 to support the middle part in the X direction. Or the bending caused by the load of the X coarse motion stage 23X. Therefore, the straightness accuracy of the X linear guide 80A fixed on the pair of X columns 101 can be improved, and the X coarse motion stage 23X can be guided in the X axis direction with high precision. In addition, compared with the case where only the two ends are supported, the pair of X-pillars 101 need not be each made into a strong structure (a thin member) in order to ensure bending rigidity, and the weight can be reduced. "Second Embodiment"

Next, the second embodiment will be described based on FIGS. 8 to 13. Here, the same or similar symbols are used for the same or similar components as those of the aforementioned first embodiment, and the description thereof is simplified or omitted.

FIG. 8 schematically shows the structure of the exposure apparatus 110 of the second embodiment. The exposure device 110 is a projection exposure device of a step-and-scan method using a substrate P used for a liquid crystal display device (flat panel display) as an exposure target, that is, a so-called scanner.

9 is a plan view showing the substrate stage device PSTa included in the exposure apparatus 110 of FIG. 8, and FIG. 10 is a cross-sectional view taken along the line D-D of FIG. 9. In addition, FIG. 11 is a plan view of the substrate stage device with the micro-movement stage removed (E-E line cross-sectional view of FIG. 10), and FIG. 12 is a cross-sectional view of F-F line in FIG. In addition, FIG. 13 is a cross-sectional view of the weight reduction device included in the substrate stage device PSTa.

Comparing FIGS. 8 to 13 and FIGS. 1 to 6 of the foregoing first embodiment, it can be seen that the exposure device 110 of the second embodiment replaces the foregoing substrate stage device PST with a substrate stage device PSTa, which is similar to the exposure The device 10 is different.

Although the overall structure of the substrate stage device PSTa is the same as that of the substrate stage device PST, the point where the weight reduction device 40' is installed instead of the weight reduction device 40 and the structure of the drive system of the X guide 102 are partly different from the substrate stage device PST It is different from the substrate stage device PST in several places. The following description focuses on the differences.

In the substrate stage device PSTa, as can be seen from FIGS. 8 and 10, the position (height position) of the Y coarse motion stage 23Y and the X guide 102 in the Z-axis direction (vertical direction) partially overlaps.

Specifically, as shown in FIG. 8 and FIG. 10, the substrate stage device PSTa has the aforementioned Y brackets 75 fixed to both sides (not the lower sides near both ends) in the longitudinal direction of each of the pair of X pillars 101. That is, the Y coarse motion stage 23Y has, for example, four Y brackets 75 in total. In addition, the upper surfaces of the two Y brackets 75 on the +X side are mechanically connected by the plates 76, and the upper surfaces of the two Y brackets 75 on the -X side are also mechanically connected by the plates 76. In addition, for ease of understanding, the plate 76 is not shown in FIG. 11.

In addition, as the weight elimination device 40', as shown in Fig. 10, for example, a device in which the Z slider 43 and the leveling device 57 are integrally fixed is used. The weight elimination device 40' is mounted on the X guide 102, and its lower half is inserted into the opening of the X coarse motion stage 23X. In addition, in Figs. 8, 10 to 12, in order to avoid the intricacies of the drawings, the weight removing device 40' and the leveling device 57 are shown schematically (see Fig. 13 for the detailed structure).

The weight elimination device 40', as shown in Fig. 13, has a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is composed of a bottomed cylindrical member with an open surface on the +Z side. A plurality of base pads 44 whose bearing surfaces face the -Z side are mounted on the lower surface of the housing 41. A plurality of arm members 47 are fixed on the outer wall surface of the housing 41 to support the target 46 of the plurality of Z sensors 52 fixed under the micro-motion stage 21. The air spring 42 is housed in the housing 41. The air spring 42 is supplied with pressurized gas from the outside. The Z slider 43 is composed of a cylindrical member extending in the Z-axis direction that is lower in height than the Z slider used in the first embodiment. The Z slider 43 is inserted into the housing 41 and mounted on the air spring 42. The Z slider 43 is connected to the inner wall surface of the housing 41 by a pair of parallel leaf spring devices 48 including leaf springs parallel to the XY plane due to a separate arrangement in the Z axis direction. For example, a plurality of parallel plate spring devices 48 (for example, three or four) are provided at substantially equal intervals around the outer periphery of the Z slider 43 (thetaz direction). The Z slider 43 moves along the XY plane integrally with the housing 41 by the rigidity (tensile rigidity) parallel to the horizontal plane of a plurality of leaf springs. In contrast, the Z slider 43 can be slightly moved in the Z-axis direction relative to the housing 41 by the flexibility (flexibility) of the leaf spring. The parallel leaf spring device 48 has a pair of leaf springs separated in the Z-axis direction. Therefore, the Z slider 43 is suppressed from falling (rotation in the θx or θy direction), and can essentially only be opposed to the housing with a small stroke in the Z-axis direction. 41 moves.

The leveling device 57 is a device that supports the micro-movement stage 21 to be tiltable (swing freely in the θx and θy directions relative to the XY plane), through the opening 21a formed under the micro-movement stage 21, the upper half is inserted into the micro-movement stage 21 Inside. The weight elimination device 40' uses the upward force of the gravity direction generated by the air spring 42 to offset (eliminate) the weight of the system including the micro-motion stage 21 (the downward force of the gravity direction through the Z slider 43 and the leveling device 57) ), so as to reduce the load of the plurality of Z voice coil motors 18Z.

The leveling device 57 includes a leveling cup 49 composed of a cup-shaped member with an opening on the +Z side, a polyhedron member 64 inserted into the inner diameter side of the leveling cup 49, and a plurality of air bearings 65 installed on the inner wall of the leveling cup 49. The lower surface of the leveling cup 49 is integrally fixed to the upper surface of the Z sliding member 43 through the plate 68. In addition, a plurality of fall-off prevention devices 200 for preventing the leveling cup 49 from falling off are installed on the top surface of the micro-motion stage 21. The polyhedral member 64 is composed of a triangular pyramid-shaped member, and the front end of the member is inserted into the leveling cup 49. The bottom surface (the surface facing the +Z side) of the polyhedral member 64 is fixed to the top surface of the micro-movement stage 21 through the spacer 51. The air bearings 65 are provided on the inner wall surface of the leveling cup 49 at approximately equal intervals around θz, for example, three. The leveling device 57 sprays pressurized gas from a plurality of air bearings 65 to the side surface of the polyhedral member 64, and uses the center of gravity position CG of the system including the micro-motion stage 21 as the center of rotation, with a small gap (clearance) interposed in a non-contact manner. The micro-movement stage 21 is supported to be tiltable. Moreover, for ease of understanding, FIG. 13 shows, for example, the cross-section of two of the three air bearings 65 (that is, as far as the leveling device 57 is concerned, FIG. 13 is not a cross-sectional view of a cross-section parallel to the YZ plane).

Here, when the fine movement stage 21 moves in a direction parallel to the XY plane, the polyhedron member 64 is integrated with the fine movement stage 21 in a direction parallel to the XY plane. At this time, due to the rigidity (static pressure) of the gas film formed between the bearing surface of the air bearing 65 and the polyhedral member 64, the air bearing 65 is pressed against the polyhedral member 64. Accordingly, the fine movement stage 21 and the leveling cup 49 are The unit moves in the same direction as the micro-movement stage 21. Since the leveling cup 49 and the Z slider 43 are fixed through the plate 68, the micro-movement stage 21 and the Z slider 43 move in a direction parallel to the horizontal plane as a whole. In addition, as described above, since the Z slider 43 and the housing 41 are connected by a plurality of parallel plate spring devices 48, the micro-movement stage 21 and the housing 41 move integrally in a direction parallel to the horizontal plane. In this way, the micro-movement stage 21 and the weight elimination device 40', including the case where they are micro-driven by a plurality of voice coil motors 18X, 18Y, move in a direction parallel to the XY plane. Therefore, in the second embodiment, the aforementioned coupling device 45 is not provided between the weight elimination device 40' and the X coarse motion stage 23X.

In the second embodiment, the dimension in the Z axis direction of the guide body 102a is set to be equal to the dimension in the Z axis direction of the X column 101. In addition, it can be seen from FIGS. 9, 10 and 12 that the guide body 102a is inserted between the pair of X-pillars 101. That is, the position of the X guide 102 (position in the vertical direction) and the Z position of the Y coarse motion stage 23Y partially overlap.

The structure of the other parts of the substrate stage device PSTa is the same as the aforementioned substrate stage device PST.

In the exposure device 110 configured as described above, when the substrate P is moved in the X-axis direction during the exposure operation of the step-and-scan method, the X-scan operation, and the X-step operation, the substrate stage device PSTa basically, The driving of the X coarse motion stage 23X on the Y coarse motion stage 23Y and the synchronous driving of the fine motion stage 21 and the X coarse motion stage 23X, which are the same as the first embodiment described above, are based on instructions from the main control device 50 get on. However, in the substrate stage device PSTa, the weight elimination device 40' is not pulled by the X coarse motion stage 23X, but moves together with the fine motion stage 21 in the X axis direction. In addition, during the aforementioned X scanning operation and X stepping operation, although the fine movement stage 21 is slightly driven in the Y-axis direction relative to the X coarse movement stage 23X, the Y position of the weight removing device 40' may slightly change. However, the width direction dimension of the X guide 102 is set so that even if the weight elimination device 40' is micro-driven in the Y axis direction, the base pad 44 will not fall off the X guide 102.

Also, during the Y stepping operation, the substrate stage device PSTa is basically the same as the Y-axis direction driving of the Y coarse motion stage 23Y and the X coarse motion stage 23X and the X coarse motion stage which are the same as those of the first embodiment described above The synchronous driving of the 23X and the micro-motion stage 21 is based on the instruction from the main control device 50. However, in the substrate stage device PSTa, the weight reduction device 40' moves together with the fine movement stage 21 in the Y-axis direction. At this time, the X guide 102 supporting the weight elimination device 40' from below is driven in synchronization with the Y coarse motion stage 23Y. Therefore, the weight eliminating device 40' is constantly supported by the X guide 102 from below.

According to the exposure apparatus 110 of the second embodiment described above, the same effect as the exposure apparatus 10 of the aforementioned first embodiment can be obtained. In addition, according to the exposure apparatus 110, since the Z position (vertical position) of the X guide 102 and the Z position of the Y coarse motion stage 23Y partially overlap, it is similar to mounting on a guide with a large guide surface. Compared with the case of the weight elimination device 40', the Z-axis dimension of the weight elimination device 40' can be shortened. In this case, since the dimensions in the Z axis direction of the housing 41 and the Z slider 43 can be shortened, the weight reduction device 40' can be reduced in weight. In addition, when the weight reduction device 40' is reduced in weight, the actuators (a plurality of linear motors and a plurality of voice coil motors) used for the micro-movement stage 21 are also reduced in size.

In addition, since the weight elimination device 40' separates the coarse motion stage 23 in vibration, it can completely eliminate the transmission of vibration from the coarse motion stage 23 and improve the control performance. Furthermore, since the weight elimination device 40' is integrated with the micro-motion stage 21 to simplify the structure, it is possible to further reduce the weight and reduce the manufacturing cost, and the failure rate is also reduced. In addition, since the integration of the weight elimination device 40' and the micro-movement stage 21 reduces the center of gravity position CG of the micro-movement stage 21, even if the substrate holder PH is enlarged, the increase in the center of gravity position can be suppressed.

In addition, according to the exposure apparatus 110, since the X guide 102, which is a member extending in the X-axis direction, is supported from below in plural places by the pair of beds 12, the self-weight of the X guide 102 can be suppressed or the weight reduction device 40 can be included. The bend caused by the load of the micro-motion stage 21.

In addition, since the weight elimination device 40' is separated from the coarse motion stage 23, the vibration caused by the movement of the weight elimination device 40 will not be transmitted to the X guide 102. Therefore, the vibration is not transmitted to, for example, the projection optical system through the X guide 102, the pair of bottom beds 12, the substrate stage 19, etc., and the exposure operation can be performed with high accuracy. "The third embodiment"

Next, the third embodiment will be described based on FIGS. 14 to 16. The substrate stage device PSTb of the third embodiment has substantially the same structure as the substrate stage device PSTa (see FIG. 9 etc.) of the second embodiment, except for the difference in the driving method of the X guide 102, and is therefore similar to the second embodiment. The same or similar components in the embodiment are given the same or similar symbols, and their description is simplified or omitted.

In contrast to the above-mentioned second embodiment, the Y bracket 75 is fixed on both sides of the X column 101. In the third embodiment, as shown in FIG. 15, the Y bracket 75 is fixed to the X Below column 101. Therefore, the base frame 14 (for convenience, the same symbols are used) has a lower height than the second embodiment described above. According to this, the structure of the substrate stage device PSTb can be simplified.

In addition, compared to the above-mentioned first and second embodiments, the X guide 102 is electromagnetically driven by a pair of Y linear motors 82. In the third embodiment, the X guide 102 is shown in FIG. 14 In the vicinity of both ends in the longitudinal direction, a pair of devices called flexure devices 107 is mechanically connected to the X-pillar 101 through the connecting member 199, respectively. In addition, for ease of understanding, one pair of plates 76 (refer to FIG. 9) and the micro-movement stage 21 (refer to FIG. 8) connecting a pair of X pillars 101 are not shown in FIG.

Each flexure device 107 includes a thin steel plate (such as a leaf spring) arranged parallel to the XY plane and extending in the Y axis direction, and is erected between the X column 101 and the X guide 102 through a hinge device such as a ball joint. Each flexure device 107 connects the X column 101 and the X guide 102 with high rigidity in the Y axis direction by the rigidity of the steel plate in the Y axis direction. Therefore, the X guide 102 is pulled by one of the pair of X columns 101 through the flexure device 107, and is integrated with the Y coarse motion stage 23Y in the Y axis direction. In contrast to this, each flexure device 107 uses the softness (or flexibility) of the steel plate and the action of the hinge device to allow the X guide 102 to be unconstrained relative to the X column 101 in the direction of 5 degrees of freedom except the Y axis direction. Therefore, the vibration is not easily transmitted to the X guide 102 through the X column 101. In addition, a plurality of flexure devices 107 connect a pair of X columns 101 and X guide 102 in a plane parallel to the XY plane including the position of the center of gravity of the X guide 102. Therefore, when the X guide 102 is pulled, no moment in the θx direction will act on the X guide 102.

The substrate stage device PSTb of the third embodiment, in addition to the effects that can be obtained by the substrate stage device PSTa of the second embodiment, is configured to pull the X guide 102 by the X column 101 through the flexure device 107, so For example, compared with the case where an actuator for driving the X guide 102 is provided, the cost is lower. In addition, there is no need for a measurement system (such as a linear encoder, etc.) for obtaining the position information of the X-guide 102. In addition, compared with the second embodiment, the size of the X guide 102 in the X axis direction can be shortened, so that the cost can be reduced. Furthermore, the pair of base frames 14 are arranged on both inner sides in the X-axis direction compared with the second embodiment, so the device can be simplified.

In addition, since the flexure device 107 has a structure (shape and material) with extremely low rigidity other than the Y-axis direction, the vibration caused by the transmission of the force other than the Y-axis direction is not easily transmitted to the X guide 102, so the micro-movement stage 21 Good controllability. Even if the vibration in the Y-axis direction penetrates the X guide 102, the force of the X guide 102 and the weight reduction device 40' in the horizontal direction is caused by the base pad 44 of the aerostatic bearing provided under the weight reduction device 40'. The transmission is disconnected, so it will not affect the micro-motion stage 21. In addition, since the X guide 102 and the bed 12 are suppressed by the Y linear guide 71A from the continuity of the force in the Y-axis direction (the force in the Y-axis direction is released), the bed 12 (device body) is not affected. Make an impact. Similarly, of course, a pair of flexure devices 107 can also be used to connect the X column 101 and the X guide 102, one of the substrate stage devices PST of the first embodiment. "Fourth Embodiment"

Next, the fourth embodiment will be described based on FIG. 17. The substrate stage device PSTc of the fourth embodiment has almost the same structure as the substrate stage device PSTa (see FIG. 9 etc.) of the second embodiment except for the difference in the driving method of the X guide 102. The same or similar components in the second embodiment are given the same or similar symbols, and their descriptions are simplified or omitted.

As shown in FIG. 17, in the substrate stage device PSTc, a pair of X-pillars 101 respectively have two pushers 108 separated in the X-axis direction on opposing surfaces facing each other. That is, there are four propulsion devices 108 in total. Each propulsion device 108 has a steel ball facing the +Y side or -Y side of the X guide 102. In general, the steel ball is separated from the X guide 102. When the Y coarse motion stage 23Y is driven in the Y axis direction in the substrate stage device PSTc, it is pressed by the pushing device 108 and the X guide 102 is pressed. Therefore, the Y coarse motion stage 23Y and the X guide 102 move in the Y-axis direction integrally. In addition, each propulsion device 108 does not necessarily have to be provided on the X column 101, and may be provided, for example, on the X-axis direction inner side and the Y-axis direction inner side of the Y bracket 75 to press the X guide 102.

In addition, in the substrate stage device PSTc, the Y coarse movement stage 23Y moves the X guide 102Y step by step to a predetermined position, and is driven in a direction away from the X guide 102 in order to prevent the transmission of vibration. Accordingly, Y coarse movement The carrier 23Y and the X guide 102 are separated in vibration. As a method of separating the Y coarse motion stage 23Y from the X guide 102 in vibration, for example, the X column 101 can be appropriately micro-driven, or the propulsion device 108 can be installed to micro-drive the steel ball in the Y-axis direction (not shown) The cylinder and other actuators. In addition, as a propulsion device, instead of a steel ball, a spheroid that can rotate about 90° around the Z axis or the X axis can be provided. By rotating the ellipsoid appropriately, the X guide 102 and the Y can be moved coarsely. The Y-axis direction gap of the stage 23Y is variable (the contact state and the non-contact state are switched by the amount of rotation of the spheroid).

In the fourth embodiment, during exposure operations other than when the X guide 102 is moved in the scanning cross direction, the mechanical connection between the X column 101 and the X guide 102 does not exist, which can completely prevent interference from entering the X guide 102 . Similarly, in the substrate stage device PST of the aforementioned first embodiment, it is of course also possible to provide the propulsion device 108 on any one of the pair of X pillars 101 and the X guide 102.

In addition, the structure of the substrate stage device included in the exposure apparatus of the above-mentioned first to fourth embodiments is only an example, and the structure is not limited to this. Hereinafter, modified examples of the weight reduction device and the leveling device included in the substrate stage device will be described. In addition, in the following description, for the sake of simplification of the description and convenience of the illustration, only the leveling device and the weight elimination device are described, and those having the same configuration as the second embodiment described above are given the same as those of the second embodiment described above. Symbol and its description is omitted. "First Modification"

FIG. 18 shows the weight reduction device 40A and the leveling device 57A included in the substrate stage device of the first modification. In the first modification, the leveling device 57A and the weight reduction device 40A have the same configuration as the second embodiment, but the leveling device 57A supports the weight reduction device 40A from below (that is, the second embodiment The arrangement of the leveling device 57 and the weight elimination device 40' in the middle is interchangeable in the vertical direction). Specifically, the upper surface of the polyhedral member 64 is connected to the lower surface of the housing 41. In addition, although omitted in FIG. 18, the micro-motion stage 21 is fixed to the upper surface of the Z slider 43 of the weight reduction device 40A through the spacer 51.

Compared with the above-mentioned embodiments, the substrate stage device of the first modification example has the weight elimination device 40A installed above the leveling device 57A, so that the parts between the polyhedral member 64 and the base pad 44 are reduced and the weight is reduced. The inertial mass of the polyhedral member 64 or less (from the polyhedral member 64 to the base pad 44) during horizontal movement of the time and the like becomes smaller, and its center of gravity is close to the driving point (the contact point between the polyhedral member 64 and the air bearing 65), so θx, The rigidity in the θy direction becomes higher (not easy to swing), and the controllability is improved. "Second Modification"

FIG. 19 shows the weight reduction device 40B and the leveling device 57B included in the substrate stage device of the second modification. In the second modification, except that the positions of the air spring 42 and the Z slider 43 (including the parallel plate spring device 48) are interchanged in the vertical direction, the configuration is the same as the first modification (see FIG. 18). In the weight elimination device 40B, the housing 41B is composed of a bottomed cylindrical member with a bottom opening, and the upper surface is fixed to a micro-movement stage 21 (not shown in FIG. 19) to form an integral body.

In addition to the effects obtained by the substrate stage device of the first modification example, the substrate stage device of the second modification example has a lower position of the parallel plate spring device 48 and is arranged closer to the center of gravity of the weight reduction device 40B. Therefore, the stability of the exposure action is improved. "The third modification"

FIG. 20 shows a weight reduction device 40C included in the substrate stage device of the third modification. The weight reduction device 40C is composed of a main body 41C of a bottomed cylindrical member with an upper opening, an air spring 42 housed in the main body 41C, a leveling cup 49 connected to the air spring 42, a plurality of air bearings 65, and a The illustrated micro-movement stage 21 includes a polyhedral member 64 and the like. In the third modification, the Z slider is eliminated, and the air spring 42 directly presses the lower surface of the leveling cup 49 in the Z-axis direction. A plurality of arm members 47 for supporting the target 46 are fixed to the outer wall surface of the main body 41C.

The leveling cup 49 has the same function as the above-mentioned second embodiment and the like, but also has the function of the Z slider 43 (see FIG. 13) in the above-mentioned second embodiment and the like. Therefore, a plurality of parallel plate springs 67e are connected to the upper end surface and the lower end surface of the outer peripheral portion of the leveling cup 49 (for example, the upper end surface and the lower end surface have four equal in the circumferential direction) parallel plate spring 67e (however, to avoid the Intricately, the parallel plate spring 67e arranged on the ±X side is not shown). In this way, the relative horizontal direction of the leveling cup 49 with respect to the main body 41C is restricted, and can only slide up and down.

Compared with the above-described embodiments, the substrate stage device of the third modification does not require a Z slider, so the structure of the weight reduction device 40C becomes simple, lightweight, and inexpensive.

In addition, since it will be installed at the lower part of the polyhedral member 64, the larger part that will swing (vibrate) during operation and the larger dimension in the Z-axis direction is near the upper and lower end surfaces of the leveling cup 49, which is connected to the opposite main body by a parallel plate spring 67e 41C cannot move in the horizontal direction, so the rigidity in the θx and θy directions of the lower part of the polyhedron member 64 becomes higher. By suppressing the vibration of the lower part of the polyhedron member 64 caused by the inertia during horizontal movement, the controllability is improved.

In addition, due to the action of the parallel plate spring 67e, the leveling cup 49 moves only in the Z direction while maintaining a high degree of straightness relative to the main body 41C. Therefore, the bottom surface of the leveling cup 49 and the upper surface of the air spring 42 (metal plate) Can not be fixed, but can be easily assembled and disassembled, and the workability can be improved.

In addition, since the Z-axis driving by the air spring 42 and the leveling driving (θx, θy) by the polyhedral member 64 can be independently controlled (without interference), the controllability is good.

In addition, the weight elimination devices 40A-40C of the above-mentioned modification examples are not limited to XY dual-axis stages, and can also be applied to X-axis (or Y-axis) unidirectional single-axis stages, or to mount Y on the X coarse motion stage. The conventional XY dual-axis stage device for coarse motion stage.

In addition, in the above-mentioned second to fourth embodiments (and the above-mentioned modifications), although the Z slider 43 or the leveling cup 49 of the weight reduction device is arranged with a plurality of parallel plate spring devices 48, it can only move on the Z axis. The direction, but not limited to this, can also use, for example, air bearings or rolling guides.

In addition, in the above-mentioned second to fourth embodiments (and each of the above-mentioned modifications), although the X coarse-movement stage 23X is mounted on the Y coarse-movement stage 23Y, it is not limited to this. If the weight reduction device 40 is miniaturized and integrated with the fine movement stage 21, the coarse movement stage 23 can be the same as the conventional device, and the Y coarse movement stage 23Y can be mounted on the X coarse movement stage 23X. At this time, the X guide 102 used in this embodiment is arranged with the Y-axis direction as the longitudinal direction of the member (assumed as the Y guide), and the weight reduction device 40 moves stepwise in the Y-axis direction. Or the X-axis in the scanning direction moves with the Y guide.

In addition, in the above-mentioned second to fourth embodiments (and the above-mentioned modification examples), the X guide 102 is provided on the substrate stage 19 of a part of the apparatus body (main body) through a pair of bottom beds 12, but it is not limited to Therefore, the substrate stage device PSTd as shown in FIG. 22 can also directly fix a plurality of Y linear guides 71A on the substrate stage 19. In this way, the bottom bed 12 (refer to FIG. 8) can be omitted, the weight of the entire exposure apparatus can be reduced, and the overall height (dimension in the Z-axis direction) can be reduced. The same applies to the first embodiment described above.

In addition, in each of the above-mentioned first to fourth embodiments (hereinafter referred to as each embodiment), the X guide 102 is supported from below by two bottom beds 12, but it is not limited to this. The number of bottom beds 12 may also be More than three. In this case, the auxiliary guide frame 103 arranged between the adjacent bottom beds 12 can also be added. In addition, when the amount of movement of the substrate P in the X-axis direction is small (or when the substrate P itself is small), there may be one bed 12. Moreover, although the shape of the bed 12 is set so that the length in the Y-axis direction is longer than the length in the X-axis direction, it is not limited to this, and the length in the X direction may be made longer. Furthermore, a plurality of beds can be separated in the X-axis and/or Y-axis directions.

In addition, when the bending of the X guide 102 is so small that it can be ignored, the auxiliary guide frame 103 may not be provided.

In addition, in each of the above embodiments, although a plurality of Y linear guides 71A are fixed on a pair of bed 12, the X guide 102 moves in the Y axis direction along the plurality of Y linear guides 71A, but it is not limited to Therefore, for example, a plurality of rotating bodies such as aerostatic bearings or rollers can be arranged under the X guide 102 to move on the bed 12 with low friction. However, in order to keep the interval between the Y movable element 72A and the Y stator 73 constant, it is preferable to provide a device that restricts the X guide 102 from moving in the X axis direction relative to the pair of beds 12. As a device for restricting the movement of the X guide 102 in the X-axis direction, for example, a gas static pressure bearing or a mechanical uniaxial guide device can be used. In this way, there is no need to adjust the position of the plurality of Y linear guides 71A parallel to each other, and the assembly of the substrate stage device becomes easy.

In addition, a device (relief device) that enables the X guide 102 and the Y slider 71B to be relatively movable in the X-axis direction by a small distance (relief device) may be provided, for example, between the X guide 102 and the Y slider 71B. In this case, even if the plurality of Y linear guides 71A are not arranged parallel to each other, the X guide 102 can smoothly move straight in the Y axis direction on the plurality of Y linear guides 71A. As a device capable of relatively moving the X guide 102 and the Y slider 71B in the X-axis direction, for example, a hinge device can be used. The same relief device can be installed in other linear guide devices. In addition, a device for relatively moving a pair of X pillars 101 and Y bracket 75 in the X-axis direction by a small distance can also be installed in the same manner. In this case, even if the pair of base frames 14 are not arranged in parallel, the pair of X-pillars 101 can be smoothly guided in the Y-axis direction.

In addition, as shown in FIG. 21(A), in the above-mentioned first or second embodiment, a pair of Y brackets 83 with a J-shape and an inverted J-shape in the XZ cross-section can also be installed on both ends of the X guide 102. Then, the Y movable element 72A is fixed to each of the Y brackets 83. In this case, the magnetic attraction force between the magnet unit of the Y stator 73 (FIG. 1, refer to FIG. 8) and the coil unit of the Y movable member 72A is equally applied to the base frame 14, which prevents the base frame 14 The dumping. In addition, the thrust used to drive the X guide 102 is also increased. In addition, in the above-mentioned first and second embodiments, the plural linear motors are all of the moving coil type, but it is not limited to this, and it may be a moving magnet type. In addition, in embodiments other than the above-mentioned second embodiment, the drive device for driving the Y bracket 75 in the Y axis direction is not limited to a linear motor. For example, a ball screw drive device, a belt drive device, or a rack and pinion can be used. Pinion type driving device, etc.

In addition, in the above-mentioned first and second embodiments, the Y stator 73 (FIG. 1, refer to FIG. 8) fixed to the base frame 14 is commonly used to drive the Y linear motor of the X guide 102 and to The Y linear motor that drives the Y coarse motion stage 23Y, but each Y linear motor can also be configured separately. In addition, the Y stator used to drive the Y linear motor of the Y coarse motion stage 23Y can be fixed to the auxiliary guide frame 103, and the Y movable element can be installed on the auxiliary bracket 78.

In addition, in the above-mentioned first and second embodiments, although the pair of X-pillars 101 are mechanically connected at both ends in the X-direction, for example, by the plate 76, it is not limited to this, but for example, it may be connected with X The members with the same cross-sectional area of the column 101 are connected. In addition, the Z-axis size of the X guide 102 (the guide body 102a) may be larger than the Z-axis size of the pair of X-pillars 101. In this case, the Z axis size of the weight reduction device 40 can be further shortened.

In addition, in the first and second embodiments described above, for example, two (four in total) Y brackets 75 are provided on the +X side and −X side of the Y coarse motion stage 23Y, respectively, but it is not limited to this. For example, one may be provided on the +X side and -X side of the Y coarse motion stage 23Y. In this case, if the length of the Y bracket 75 is set to be the same as that of the plate 76, the plate 76 is unnecessary. In addition, the Y bracket in this case is formed with notches for insertion of the Y movable elements 72A mounted on both end surfaces of the X guide 102 in the X axis direction.

In addition, although the pair of X-pillars 101 are mechanically connected in each of the above embodiments, it is not limited to this, and may be mechanically separated. In this case, it is only necessary to synchronously control a pair of X-pillars 101 respectively.

In addition, in the above-mentioned fourth embodiment, the X guide 102 is pressed against the X column 101 in a contact state through the pusher 108, but it is not limited to this. The X guide 10 may also be pressed against the X column 101 in a non-contact state. 101. For example, as shown in Figure 21(B), a thrust type air bearing 109 (air cushion) can be installed on the X column 101 (or X guide 102), and the static pressure of the gas ejected from the bearing surface , Just press the X guide 102 in a non-contact manner. Alternatively, as shown in FIG. 21(C), permanent magnets 100a, 100b (a set of permanent magnets 100) can be installed on the X-pillar 101 and the X-guide 102, respectively, with the same magnetic poles of the parts facing each other. The repulsive force (repulsive force) generated between the opposing permanent magnets 100a and 100b presses the X guide 102 in a non-contact manner. In this case of using a set of permanent magnets 100, since there is no need to supply pressurized gas, electricity, etc., the structure of the device is simple. The above-mentioned thrust air bearing 109 and a set of permanent magnets 100 can be respectively located between the X column 101 and the X guide 102 on the +Y side, and between the X column 101 and the X guide 102 on the -Y side, on the X axis A plurality of directions (for example, two) are set separately. "Fifth Embodiment"

Next, the fifth embodiment will be described with reference to Figs. 23 to 28.

The exposure apparatus of the fifth embodiment has the same configuration as the exposure apparatus 10 of the first embodiment, except that a substrate stage device PSTe is provided instead of the substrate stage device PST.

Hereinafter, the description will be focused on the substrate stage device PSTe. Here, the same or similar reference numerals are used for the same or equivalent components as those of the exposure apparatus 10 of the first embodiment, and the description thereof is simplified or omitted.

The exposure apparatus of this fifth embodiment replaces the substrate stage with the aforementioned coarse and fine motion structure. As shown in FIGS. 23 and 24, a substrate equipped with a so-called gantry-type biaxial stage (substrate stage) ST is used. The stage device PSTe. This bracket type two-axis stage (substrate stage) ST has a beam-shaped X stage STX that moves in the X-axis direction with the Y-axis direction as the long side, and the X stage STX The upper holding substrate (plate) P moves on the Y stage STY in the Y axis direction. The substrate stage device PSTe, although not shown, is arranged under the projection optical system PL (in FIGS. 23 and 24, refer to FIG. 1) (-Z side) like the aforementioned substrate stage device PST.

The substrate stage device PSTe includes a substrate stage ST and a substrate stage drive system PSD that drives the substrate stage ST (not shown in FIGS. 23 and 24, see FIG. 25). The substrate stage drive system PSD, as shown in Figure 24 and Figure 25, is equipped with a pair of X-axis drive units XD1 and XD2 that drive the X stage STX in the X-axis direction and drive the Y stage STY on the X stage STX Y-axis drive unit YD in the Y-axis direction. With the substrate stage driving system PSD, the Y stage STY holding the substrate P is driven in the X-axis direction and the Y-axis direction with a predetermined stroke.

In detail, the substrate stage device PSTe, as shown in FIGS. 23 and 24, has a total of six feet 61a to 61f arranged in two-dimensional XY directions on the floor F of the clean room where the exposure device is installed. Each of the three legs 61a-61c and 61d-61f supports two base piers 62a, 62b, and a pair (two) of X-axis drive units XD1, XD2, and a pair of X-axis drive units XD1, XD2, respectively supported by the two base piers 62a, 62b. Two X-axis drive units XD1 and XD2 drive the X stage STX in the X-axis direction, the Y-axis drive unit YD installed on the X-stage STX, and the Y stage that is driven in the Y-axis direction by the Y-axis drive unit YD STY etc.

The legs 61a to 61c are arranged at a predetermined interval in the X-axis direction as shown in FIG. 23. Similarly, the feet 61d to 61f are arranged on the +Y side (inner side of the paper surface in FIG. 23) of the feet 61a to 61c, respectively, at a predetermined interval in the X-axis direction. Four adjusting tools 61a ₀ to 61f _{0 are} provided on the skirts of each of the legs 61a to 61f. It can be seen from Fig. 23 and Fig. 24 that, for example, the foot 61b has two adjusting tools 61b _{0 on} the skirt of the ±Y side.

The legs 61a to 61c and 61d to 61f respectively support the base piers 62a and 62b arranged in parallel with each other at a predetermined distance in the Y axis direction with the longitudinal direction as the X axis direction. For example, use a level to properly adjust the adjustment tools 61a ₀ to 61f ₀ provided on each leg 61a to 61f, so that the foundation piers 62a, 62b are supported parallel to the plane orthogonal to the earth axis (direction of gravity) (parallel to the horizontal plane ), and the same height from the ground F.

On the foundation piers 62a and 62b, as shown in FIG. 24, X-axis drive units XD1 and XD2 are separately provided. The X-axis drive units XD1 and XD2 respectively support the -Y-side end and the +Y-side end of the X stage STX from below, and drive the X stage STX in the X-axis direction.

The X-axis drive unit XD1 on one side (-Y side), as shown in Figs. 23 and 24, includes a plurality of fixed members 63 and a movable member 84, a pair of linear motors XDM1, XDM2, and a pair of linear motors XDM1, XDM2 that generate driving force in the X-axis direction A pair of guide devices XG1, XG2, which restrict the movement of the X stage STX in the direction other than the X axis, measure the linear encoding of the position of the movable member (X stage STX) relative to the fixed member 63 (foundation 62a) in the X axis direction器EX1 (refer to Figure 25).

On the ±Y side end of the base pier 62a, as shown in FIGS. 23 and 24, a plurality of fixing members 63 (ten in each of the present embodiment) arranged in the X-axis direction are fixed. In addition, for ease of understanding, part of the plurality of fixing members 63 (including the fixing member XD12 described later) on the -Y side is not shown in FIG. Each fixing member 63, having a fixed line (screw) ₆₃₀ is fixed to the -Z side of the base end portion 62a of the pier. Here, as shown in FIG. 26, the inner surface of each fixing member 63 is inclined inwardly by an angle of π/2-θ with respect to the XZ plane (an angle θ is formed with respect to the XY plane). As a result, the YZ cross-sectional shape of the member formed by combining the base pier 62a and the fixing member 63 has a substantially U-shape with an opening on the +Z side (however, the distance between a pair of opposed surfaces is shorter on the +Z side (opening side)- The Z side is narrow).

The movable member 84, as shown in FIG. 24, is composed of a corner post member with an equilateral trapezoid YZ section, and is arranged such that the upper and lower sides are horizontal (parallel to the XY plane) and the longitudinal direction is the movable direction (X Axis direction). The movable member 84 is fixed to the lower side (-Z surface) near the -Y end of the X stage STX with a fixture (bolt) 66 ₀ through a bumper 85 with a rectangular YZ cross-section fixed on it.板66.

The movable member 84 is arranged in a space formed by the base pier 62a and the fixed member 63. Here, the ±Y side surface of the movable member 84 is inclined at an angle of π/2-θ to the XZ plane (forms an angle θ to the XY plane). That is, the +Y side surface of the movable member 84 is parallel to and opposed to the -Y side surface of the +Y side fixed member 63 with a predetermined gap, while the -Y side surface of the movable member 84 is opposite to the -Y side surface The surface on the +Y side of the fixing member 63 is parallel and opposed to each other with a predetermined gap. The movable member 84 has a hollow structure in order to achieve weight reduction. In addition, the ±X end faces of the movable member 84 do not necessarily have to be parallel. In addition, the YZ section does not necessarily have to be trapezoidal. In addition, if the surfaces of the movable members XD11 and XD21 described later are fixed to the XZ plane (Z axis) at an inclination angle of π/2-θ, the corners of the movable member 84 can be chamfered.

As shown in Fig. 24, the linear motor XDM1 is composed of a movable element XD11 and a fixed element XD12, and the linear motor XDM2 is composed of a movable element XD21 and a fixed element XD22.

The above-mentioned pair of holders XD12 and XD22, as shown in FIG. 24, are respectively fixed on the inner surface of the fixing member 63 on the ±Y side, as shown in FIG. 23, extending in the X-axis direction (in FIG. 23, the holder XD12 is not Icon). In addition, as shown in FIG. 23, the fixing members 63 on the most +X side and the most -X side are not fixed with the fixers XD12 and XD22 (the fixers XD12 are not shown in FIG. 23). The above-mentioned pair of movable elements XD11 and XD21 are respectively fixed on the two sides of the movable member 84 on the ±Y side, and form an angle θ with the fixed elements XD12 and XD22 of the fixed member 63 that are fixed on the two side surfaces respectively opposite to the Z axis (XZ plane). Direction, facing each other with a slight gap.

Also, although not shown, inside each of the movers XD11 and XD21, a plurality of coil units (respectively including a plurality of coils in which a coil is wound on an iron core) are arranged in the X-axis direction. Inside each of the stators XD12 and XD22, a plurality of magnet units (each including a plurality of permanent magnets) are arranged in the X-axis direction. In the fifth embodiment, the movable element XD11 and the fixed element XD12 constitute the linear motor XDM1 of the moving coil system, and the movable element XD21 and the fixed element XD22 constitute the moving coil system XDM2.

The guide device XG1, as shown in Figs. 23 and 24, includes an X-axis linear guide (track) XGR1 and two sliding members XGS1. Similarly, the guiding device XG2 also includes an X-axis linear guide (track) XGR2 and two sliding pieces XGS2.

In detail, a groove extending to a predetermined depth in the X-axis direction is set on the upper surface of the base pier 62a, and at a position approximately the same distance from the center of the Y-axis direction of the inner bottom surface of the groove on the ±Y side, they are fixed parallel to each other. X-axis linear guides XGR1 and XGR2 extending in the X-axis direction. Each of the two sliders XGS1 and XGS2 are respectively fixed at positions opposite to the X-axis linear guides XGR1 and XGR2 under the movable member 84. Here, the sliders XGS1 and XGS2 have an inverted U-shaped cross-section. The two sliders XGS1 on the -Y side are engaged with the X-axis linear guide XGR1, and the two sliders XGS2 on the +Y side are engaged with the X-axis linear guide. XGR2. Near the ±X ends of the X-axis linear guides XGR1 and XGR2, as shown in FIG. 23, stop devices 88 and 89 are provided to prevent overrun of the X stage STX.

The linear encoder EX1, as shown in Figure 4, includes a read head EXh1 and a scale EXs1. The scale EXs1 has a reflection-type diffraction grating with the X-axis direction as the periodic direction formed on its surface, and extends in the center of the Y-axis direction on the inner bottom surface of the groove of the base pier 62a parallel to the X-axis linear guides XGR1 and XGR2. The reading head EXh1 is provided under the movable member 84 (or the side surface of the +X side (or -X side)). The reading head EXh1 is opposed to the scale EXs1 within the X-axis direction of the movable member 84 (X stage STX), and measures the movable member by irradiating the measuring light to the scale EXs1 and receiving the reflected diffracted light from the scale EXs1 84 (-Y end of X stage STX) relative to the position information of the base pier 62a in the X-axis direction. The measurement result is sent to the main control device 50 (refer to FIG. 25).

The X-axis drive unit XD2 on the other side (+Y side) has substantially the same structure as the above-mentioned X-axis drive unit XD1. However, the movable member 84 contained in the X-axis drive unit XD2 is installed under the +Y end of the X stage STX with a fixture 66 ₀ through the parallel plate spring 86 provided in place of the aforementioned bumper 85. (-Z side) of the fixed plate 66. The parallel leaf spring 86 is composed of a pair of leaf springs with the X-axis direction parallel to the XZ plane as the longitudinal direction and a predetermined distance in the Y-axis direction. With this parallel plate spring 86, the fixed plate 66 and the movable member 84 allow relative movement with a small stroke in the Y-axis direction. Therefore, even if the parallelism between the foundation pier 62a and the foundation pier 62b is reduced, the effect of the parallel plate spring 86 can reduce the resistance to the guide device XG3 (consisting of the slider XGS3 and the X-axis linear guide (track) XGR3) described later. load.

In addition, on the upper surface of the fixed member 63, as described above, a cover 87 that allows deformation of the parallel plate spring 86 generated when the fixed plate 66 and the movable member 84 move relative to each other in the Y-axis direction with a small stroke and covers the upper opening is attached. . Similarly, on the above-mentioned fixing member 63 on the X-axis drive unit XD1 side, a cover 87 that allows the bumper 85 generated by the deformation of the parallel plate spring 86 to move in the Y-axis direction and covers the upper opening is mounted. With this cover 87, the heat generated from the coil unit in the pair of movable elements XD11 and XD21 of each of the X-axis drive units XD2 and XD1 can be prevented from spreading to the outside of the X-axis drive units XD2 and XD1.

In the X-axis drive unit XD2, as shown in Figure 24, there is only one guide, which is the same as the guide XG1 and XG2, composed of an X-axis linear guide XGR3 and two sliders XGS3 engaged with this Device XG3. The X-axis drive unit XD2 is provided with a linear encoder EX2, which is the same as the aforementioned linear encoder EX1, composed of a read head EXh2 and a scale EXs2. The linear encoder EX2 measures the position information of the movable member 84 relative to the base pier 62b in the X-axis direction. The measurement result is sent to the main control device 50 (refer to FIG. 25).

Furthermore, each of the X-axis drive units XD1 and XD2, as shown in FIG. 23, has a fan 70A and a fan 70B at the end on the -X side and the end on the +X side, respectively. The fan 70A is a fan for air supply that sends outside air (air) to the internal space of the X-axis drive unit (the space between the base (62a or 62b) and the pair of fixed members 63), and the fan 70B passes through the X-axis A fan for exhausting air from the internal space of the drive unit to the outside. With such fans 70A and 70B, the coil units in the pair of movable elements XD11 and XD21 provided in the internal spaces of the X-axis drive units XD1 and XD2 can be cooled efficiently.

Here, the load of the X stage STX and the Y stage STY supported on it (and the inertial force accompanying the movement) is applied to the X-axis drive units XD1 and XD2. In addition, the linear motors XDM1 and XDM2 contained in the X-axis drive units XD1 and XD2 will have a magnetic attraction force that is several times larger than the driving force between the respective movable members and fixed members. Here, the magnetic attraction force acting on the mover with respect to the stator acts as a buoyancy force (force against the direction of gravity) for the moveable member 84. The X-axis drive units XD1 and XD2 use the magnetic attraction (buoyancy) to substantially offset the above-mentioned load, and support and drive the X stage STX without applying a large load (and inertial force) to the guiding devices XG1 to XG3. In addition, the offset (balance) between the load on the X stage STX of the X-axis drive unit XD1 (XD2) and the magnetic attraction (buoyancy) from the linear motors XDM1 and XDM2 will be described in detail later.

On the X stage STX, as shown in FIG. 23, the Y stage STY is supported through a guide device YG constituting a part of the Y-axis drive unit YD. The substrate P is held on the Y stage STY.

The Y-axis drive unit YD, as shown in Figure 23, includes a linear motor YDM that generates a driving force in the Y-axis direction, a guide device YG that restricts the movement of the Y stage STY out of the Y-axis direction, and a measurement Y stage STY relative to Linear encoder EY at the position of the X stage STX in the Y axis direction (refer to Figure 25).

The linear motor YDM, as shown in Fig. 23, includes a movable element YD1 and a fixed element YD2. The holder YD2 is extended in the Y-axis direction at the center of the X-axis direction on the upper surface of the X stage STX. The movable element YD1 is opposed to the fixed element YD2 in the Z-axis direction, and is fixed at the center of the X-axis direction on the bottom surface of the Y stage STY.

The guiding device YG includes a pair of Y-axis linear guides (tracks) YGR and four sliding members YGS (in FIG. 23, some are not shown). Each of the pair of Y-axis linear guides YGR is located near the ends of the X stage STX on the -X side and +X side, and extends parallel to each other in the Y-axis direction. The four sliding pieces YGS are respectively fixed near the four corners under the Y stage STY. Here, the four sliders YGS have an inverted U-shaped XZ section, and two of the four sliders YGS located on the -X side are engaged with the X stage STX on the -X side Y axis linear guide YGR, located at +X The two sliders YGS on the side are engaged with the Y-axis linear guide YGR on the +X side (refer to Figure 24).

The linear encoder EY (refer to Figure 25) consists of a read head and a scale. The scale (not shown) has a reflection type diffraction grating with the Y-axis direction as the periodic direction formed on its surface, and extends parallel to the Y-axis linear guide YGR on the X stage STX. The reading head (not shown) is located under the Y stage STY (or the side of the +Y side (or -Y side)). The reading head is opposed to the scale within the Y-axis movement stroke of the Y stage STY. By irradiating the measuring light to the scale and receiving the reflected diffracted light from the scale, the Y stage STY is measured relative to the X stage STX in the Y The position information of the axis direction. The measurement result is sent to the main control device 50 (refer to FIG. 25).

The position information of the substrate stage ST (Y stage STY) in the XY plane (including deflection (yawing, the amount of rotation in the θz direction)) is based on the linear encoder EX1 contained in each of the above-mentioned X-axis drive units XD1 and XD2 , EX2 and the encoder system 20 (refer to Figure 25) composed of the linear encoder EY contained in the Y-axis drive unit YD, can be measured at any time.

In addition, independent of the encoder system 20, the Y stage STY (substrate stage ST) is measured through the reflective surface (not shown) provided on (or formed on) the Y stage STY by the aforementioned substrate interferometer system 92 Position information in the XY plane (including θz) and tilt information relative to the Z axis (pitching (rotation in the θx direction) and rolling (rotation in the θy direction)). The measurement result of the substrate interferometer system 92 is supplied to the main control device 50 (refer to FIG. 25).

According to the measurement result of the encoder system 20 and/or the substrate interferometer system 92, the main control device 50 transmits the substrate stage drive system PSD (refer to FIG. 25), more accurately, constitutes the X-axis drive units XD1, XD2, and Y The linear motors XDM1, XDM2, and YDM of each part of the axis drive unit YD drive and control the substrate stage ST (Y stage STY and X stage STX).

FIG. 25 is a block diagram showing the relationship between the input and output of the main control device 50, which is composed mainly of the control system of the exposure apparatus of the fifth embodiment, and which controls the components of the main control device 50. The main control device 50 includes a workstation (or a microcomputer), etc., and overall controls the constituent parts of the exposure device.

Next, the balance between the load on the X stage STX of the X-axis drive unit XD1 (XD2) and the magnetic attraction (buoyancy) from the linear motors XDM1 and XDM2 will be described. In addition, since the balance between the load and buoyancy described above is the same as the X-axis drive unit XD1 and the X-axis drive unit XD2, the X-axis drive unit XD1 will be described below.

As shown in Figure 26, when the X stage STX (refer to Figure 24) is at rest, the total weight of the X stage STX and Y stage STY with the vertical direction down (in the direction indicated by the painted white arrow) is approximately 1/2 of the load W will act on the movable member 84 of the X-axis drive unit XD1. At the same time, the magnetic attraction F1 generated between the movable element XD11 and the fixed element XD12 of the linear motor XDM1 will be in the direction of the angle θ to the Z axis, and the magnetic attraction generated between the movable element XD21 and the fixed element XD22 of the linear motor XDM2 F2 will act on the movable member 84 in the direction of the angle -θ to the Z axis. In addition, when the Y stage STY is located in the center of its movable range, for example, the X stage STX, Y stage STY, etc., which are approximately half of the total weight of the load W, will act on the X-axis drive units XD1 and XD1 and The movable member 84 of the X-axis drive unit XD2, strictly speaking, the vertical downward load (load) acting on the movable member 84 changes with the position of the Y stage STY.

Here, it is assumed that the magnetic attraction forces F1 and F2 generated by each of the linear motors XDM1 and XDM2 are equal to each other (that is, F1=F2=F). Therefore, the resultant force P=Fz1+Fz2 (=2Fcosθ) of the magnetic attraction forces F1 and F2 generated by the linear motors XDM1 and XDM2 in the vertical direction will act on the movable member 84 in the vertical direction upwards (the direction indicated by the painted black arrow). The resultant force P is to set its angle θ approximately equal to the load W. Therefore, a load (residual force) that is much smaller than the load W |W-P| will act on the guiding devices XG1 and XG2. Moreover, in the horizontal direction (Y-axis direction), since the horizontal components Fy1 and Fy2 of the magnetic attraction forces F1 and F2 are cancelled out, the resultant force does not act on the movable member 84 (zero resultant force action). In addition, since the relative movement of the fixed member 63 and the movable member 84 in the Z-axis direction (+Z direction and -Z direction) is restricted by the guide devices XG1 and XG2, the relationship between the above-mentioned resultant force P and the load W may be P<W, It can also be P>W.

The X-axis drive unit XD1 (XD2) of the above-mentioned structure determines the inclination (inclination angle θ) of the side surfaces facing each other of the movable member 84 and the fixed member 63 appropriately depending on the load capacity of the guide devices XG1 and XG2, and can utilize linearity The magnetic attraction forces F1 and F2 of the motors XDM1 and XDM2 cancel out the load W acting in the vertical direction without applying a horizontal force to the movable member 84.

On the other hand, the fixing member 63 fixed to the -Y side of the base pier 62a acts on the magnetic attraction force (-F1) generated by the linear motor XDM1 in the θ direction with respect to the Z axis. This attractive force imparts shear force and bending moment to the fixing member 63. Similarly, the fixing member 63 fixed on the +Y side of the base pier 62a will act on the magnetic attraction force (-F2) generated by the linear motor XDM2 in the -θ direction with respect to the Z axis. This attractive force imparts shear force and bending moment to the fixing member 63. Therefore, the two fixed members 63 are bent inwardly with respect to the fixed ends of the base pier 62a. As a result, the size of the gap between the fixed member 63 and the movable member 84 facing each other can be changed.

The change in the gap size due to the bending of the fixing member 63 can be suppressed by optimizing the thickness of the fixing member 63 (the width in the Y-axis direction).

For example, when the driving force (thrust) of the X stage STX is small and the relative magnetic attraction force F1, F2 (correctly speaking, the vertical upward force P=2Fcosθ) and the load W is large (W>P), then The tilt angle θ is set small. In this way, the resultant force P, that is, the buoyancy force applied to the movable member 84 increases, and the load (residual force) |W-P| acting on the guide devices XG1 and XG2 decreases. In this case, since the magnetic attraction force is small, the shearing force and the bending moment acting on the fixing member 63 are also small. Therefore, the thickness of the fixing member 63 can be set small.

Conversely, when the driving force (thrust) of the X stage STX is large, and the relative magnetic attraction F1, F2 (the resultant force of the vertical upward P=2Fcosθ) load W is small (W<P), the inclination angle θ is fixed Got bigger. In this way, the balance between the resultant force P and the load W can be achieved. In this case, the magnetic attraction force is large relative to the large inclination angle θ, and therefore the shearing force and the bending moment acting on the fixing member 63 also increase. Therefore, the thickness of the fixing member 63 must be set larger.

Next, referring to FIG. 27, a method of obtaining the thickness (width in the Y-axis direction) h of the fixing member 63 will be described. As shown in Figure 27, the width of the movable elements XD11, XD21 and the fixed elements XD12, XD22 is s (the projection length in the Y-axis direction a=scosθ), and the gap size between the side surfaces of the movable member 84 and the fixed member 63 facing each other is c (the projection length in the Y-axis direction d=csinθ), the length of the fixing member 63 in the X-axis direction is b, the height of the fixing member 63 from the fixed end to the center of the inner surface (the center of the fixed sub XD12, XD22) (Z-axis direction The distance) is L=(s/2)sinθ+α. Among them, α is the size margin. Furthermore, it is assumed that the magnetic attraction force is F1=F2=F, that is, the buoyancy force acting on the movable member 84 is P=2 (Fcosθ). When the Young’s coefficient (longitudinal elastic coefficient) and the deflection of the fixed member 63 are denoted as E and W, respectively, the thickness h of the fixed member 63 can be expressed by the deflection when a right-angle force is applied to the front end of a simple cantilever beam. It can be calculated as the following formula (1).

In addition, when the X-axis drive unit XD1 is to be miniaturized (specifically, the Y-axis direction width dimension of the X-axis drive unit XD1 is shortened), an inclination angle θ that makes a+d+h small can be selected.

However, as mentioned above, between the fixed member 63 and the movable member 84, in order to suppress the straightness error (Y parallel error and Z parallel error) of the movable member 84, rotation and tilt errors, which occur with the movement of the Y stage STY The reaction force, etc., are equipped with guiding devices XG1 and XG2. Therefore, the load W applied to the movable member 84 may not be completely offset by the buoyancy P from the linear motors XDM1 and XDM2.

For example, relative to s=100mm, b=500mm, c=50mm, E=16000Kgf/mm ² , α=100mm, F=2000Kgf, W=0.1mm, W=800Kgf, θ, a, d, h, a+d+h, The relationship of the buoyancy P (=2Fcosθ) can be obtained as shown in Table 1 below.

[Table 1] θ (degree) a(mm) d(mm) h(mm) a＋d＋h (mm) 2Fcosθ(Kgf) 10 98.5 8.7 13.1 120.3 3939.2 20 94.0 17.1 17.6 128.7 3758.8 30 86.6 25.0 21.4 133.0 3,464.1 40 76.6 32.1 24.6 133.3 3064.2 50 64.3 38.3 27.3 129.9 2571.2 60 50.0 43.3 29.4 122.7 2000.0 70 34.2 47.0 31.0 112.2 1368.1 80 17.4 49.2 32.0 98.6 694.6 85 8.7 49.8 32.2 90.7 348.6 88 3.5 50.0 32.3 85.8 139.6

According to Table 1, the angle θ is preferably set at θ=70 to 85 degrees. Relative to the load W=800Kgf, the buoyancy P=1368.1～348.6Kgf, that is, the residual force acting on the guiding devices XG1 and XG2 is -568.1～+451.4Kgf, which can roughly offset the load W. In addition, since the residual force can be adjusted extremely small, the guide devices XG1 and XG2 can be miniaturized. According to this, the frictional resistance between the X-axis linear guides and the sliders constituting the guide devices XG1 and XG2 is also reduced. That is, the thrust required to drive the movable member 84 (X stage STX) is also small. For example, the movable member 84 can be moved manually, and the work efficiency of the maintenance of the X stage STX becomes better. Furthermore, by setting the inclination angle θ to be larger, the fixing member 63 and even the X-axis drive unit XD1 can be miniaturized.

In addition, the X-axis drive units XD1 and XD2 of the above-mentioned structure can easily adjust the gap between the movable elements XD11 and XD21 and the fixed elements XD12 and XD22 without using adjustment plates such as spacers. Hereinafter, the adjustment procedure will be explained based on FIG. 28. When adjusting, the operator first fixes the movable member 84 to the base pier 62a using an appropriate fixture. Next, the operator installs a non-magnetic body block 69 having a thickness of g that is larger than the movable members XD11 and XD21 by an appropriate gap amount g to both sides of the movable member 84. Next, the operator uses a fixture (bolt) 63 ₀ to fix the fixing member 63 to the base pier 62a in a state where the fixing members XD12 and XD22 fixed to the inner surface of the fixing member 63 are in contact with the non-magnetic block 69. Here, since the fixed surface (a surface parallel to the XZ plane) relative to the inner surface of the fixed member 63 (a surface inclined by ± angle θ with respect to the Z axis) is not parallel, the fixed member 63 can be painted white in FIG. 28 Slide up and down as indicated by the arrow to adjust the fixed position (height) and adjust the size of the gap accordingly. Here, in order to be able to perform this adjustment, a fixing tool (bolt) 63 ₀ is formed with an elongated hole that is slidable up and down and whose XZ cross section and circle are longer in the Z axis direction than the Z axis.

Next, while changing the X position of the movable member 84, the operator similarly fixes all the fixing members 63 (except the fixing members 63 at the +X end and the -X end) to the base pier 62a. Finally, the operator retreats the movable member 84 to the +X end (or -X end), replaces the non-magnetic block 69 with the movable elements XD11, XD21, and fixes the ±X end fixing member 63 to the base pier. 62a.

According to this, the fixed elements XD12 and XD22 can be firmly fixed to the wide range of the inner surface of the fixed member 63, and the gap between the volume and the movable elements XD11 and XD21 can also be adjusted. In addition, since the processing accuracy of the structures of the X-axis drive units XD1 and XD2 can be less precise, it is more economical. As a result, the substrate stage device PSTe with high driving accuracy can be constructed at low cost. In addition, since the stators XD12 and XD22 (magnet units) are fixed on the inner side of the X-axis drive units XD1 and XD2 (the inner side of the fixing member 63), even if the magnetic body approaches the outer side of the fixing member 63, it will not be attracted.

Although the detailed description of the exposure apparatus of the fifth embodiment constructed as described above is omitted, batch processing is performed in the same procedure as the exposure apparatus 10 of the aforementioned first embodiment.

As described above, according to the exposure apparatus of the fifth embodiment, the substrate stage ST (X stage STX) can be driven in the X-axis direction. The first pair of X-axis drive units XD1 and XD2 are provided. The resultant force P of the vertical component of the gravitational force Fz1 generated between the movable member XD11 and the first stator XD12 and the gravitational force Fz2 generated between the second movable member XD21 and the second stator XD22 is used as buoyancy to reduce The substrate stage ST's own weight exerts a load on the base piers 62a, 62b, and can perform high-precision drive control of the substrate stage ST (X stage STX) without compromising the driving performance.

In addition, according to the exposure apparatus of the fifth embodiment, the substrate stage ST that holds the substrate P can be driven with high precision during scanning exposure of the substrate P (to be precise, the X stage that holds the substrate P through the Y stage STY Stage STX), so high-precision exposure of the substrate P can be performed.

In addition, in the above-mentioned fifth embodiment, although the X-axis drive unit XD1 (XD2) is constituted by the movable member 84 having an equilateral trapezoidal cross-section, it may be replaced by the following first and second modification examples. The movable member 84 with a trapezoidal cross-section of a non-equlateral trapezoid forms an X-axis drive unit XD1 (XD2).

Fig. 29 shows the configuration of the X-axis drive unit XD1 (XD2) of the first modification (However, for the base pier 62a, the fixed member 63, and the movable member 84, for convenience, the same as the fifth embodiment described above is given The symbol). In the configuration of Fig. 29, the inclination angles of the ±Y side of the movable member 84 are different from each other (θ ₁ >θ ₂ ). Therefore, the horizontal direction components of the magnetic attraction forces F1 and F2 of the linear motors XDM1 and XDM2 will not cancel each other, and the resultant force Py in the -Y direction will act on the movable member 84.

In the structure of the X-axis drive unit XD1 (XD2) in Fig. 29, thrust-type static pressure gas bearing devices XG3a, XG4 are used as guide devices. Highly flat guide surfaces XGG3 and XGG4 are formed on the inner bottom surface and both side surfaces of the recess 62a of the base pier 62a (the guide surfaces XGG3, XGG4 have two guide surfaces perpendicular to the bottom surface and the side surface of the recess respectively). On the bottom surface of the movable member 84, air cushions XGP3 and XGP4 of a plurality of static pressure gas bearings having bearing surfaces opposite to the guide surfaces XGG3 and XGG4 are installed. The air cushions XGP3, XGP4 spray high-pressure air into the slight gaps (bearing gaps) between the bearing surfaces and the guide surfaces XGG3, XGG4 through the valve (compensation element). Here, each of the air cushions XGP3 and XGP4 has the function of restricting the pitching movement and the yawing movement of the movable member 84.

In thrust-type static pressure gas bearing devices XG3a, XG4, by applying external force to the movable member 84 to press the bearing surfaces of the air cushions XGP3, XGP4 against the guide surfaces XGG3, XGG4, the air film (air cushion) in the gap can be lifted The rigidity. Therefore, appropriately determine the inclination angles θ ₁ and θ ₂ of the ±Y side of the movable member 84, and adjust the resultant force Pz of the vertical component of the magnetic attraction force F1, F2 of the linear motor XDM1, XDM2 and the resultant force Py of the horizontal component of the horizontal component to adjust The vertical load and horizontal load applied to the air cushions XGP3 and XGP4 can adjust the rigidity of each air cushion at will.

In addition, the inclination angle θ ₁ and θ ₂ of the ±Y side of the movable member 84 are appropriately determined to adjust the resultant force Py, and the horizontal load applied to the air cushions XGP3 and XGP4 is adjusted, which can make one of the air cushions XGP3 and XGP4 extremely The rigidity is higher than the rigidity of the other party. In this way, the movable member 84 can be moved along one guide surface. Therefore, when the guide surfaces XGG3 and XGG4 formed on the two sides of the groove are not well parallel, the movable member 84 can be moved along the guide surface facing the air cushion with the higher rigidity. In addition, when the straightness of one of the guide surfaces XGG3, XGG4 formed on both sides of the groove is not good, the rigidity of the air cushion facing the other of the guide surfaces XGG3, XGG4 can be increased to make the movable member 84 moves along the guiding surface with the better straightness facing the air cushion with the higher rigidity.

Fig. 30 shows the second modified configuration of the X-axis drive unit XD1 (XD2) (However, for the base pier 62a, the fixed member 63, and the movable member 84, for convenience, the same symbols as in the above-mentioned fifth embodiment are given ). In the structure of Fig. 30, on the -Y side of the groove, the aforementioned guide surface XGG3 is formed on the bottom and side surfaces, but on the +Y side of the groove, only the guide surface XGG4' is formed on the bottom surface. On the bottom surface of the movable member 84, air cushions XGP3 and XGP4' having bearing surfaces facing these guide surfaces XGG3 and XGG4', respectively. In this case, as in the first modification described above, the movable member 84 can be moved along the guide surface XGG3 facing the air cushion XGP3.

Moreover, since it is generally not easy to form high-flatness guide surfaces on both sides of the groove of the base pier 62a, it is also possible to use a plurality of divided members to form the pier 62a, and guides are provided on both sides of the groove. surface.

In addition, the above-mentioned fifth embodiment is directed to each of the linear motors XDM1 and XDM2 provided in the two X-axis drive units XD1 and XD2, which are generated between the fixed element (XD11, XD21) and the movable element (XD12, XD22) The magnetic attraction force, the vertical direction component of the attraction force is explained in the direction in which the movable element is pulled up from the fixed element side. However, it is not limited to this. For example, in each of the linear motors XDM1 and XDM2 of the fifth embodiment, the position of the fixed element (XD11, XD21) and the movable element (XD12, XD22) may be interchanged. In this case, it can be made to generate magnetic repulsion force between the fixed element (XD11, XD21) and the movable element (XD12, XD22) when the X stage STX is driven in the X-axis direction, and the vertical component of the repulsion force is from the fixed The direction in which the child side pushes the movable child up. In this case, the resultant force of the vertical component of the force generated between the fixed element (XD11, XD21) and the movable element (XD12, XD22) can also be used as buoyancy, and the same effect as the above-mentioned fifth embodiment can be obtained. In addition, it can also replace or add other attraction (such as vacuum suction, etc.) or repulsion (such as gas static pressure, etc.) to the magnetic force between the fixed element (XD11, XD21) and the movable element (XD12, XD22), It works at least when the X stage STX is driven in the X axis direction. In this case, the vertical component of the aforementioned attraction or repulsion can also be used as buoyancy.

In addition, in the above-mentioned fifth embodiment, although the substrate P is mounted on the Y stage STY, for example, the stage device disclosed in the US Patent Application Publication No. 2010/0018950 may be provided with a relative Y stage STY. A micro-motion stage that can be micro-driven in a 6-degree-of-freedom direction, and a substrate P is mounted on the micro-motion stage. In this case, a weight reduction device as disclosed in the specification of the aforementioned US Patent Application Publication No. 2010/0018950 can also be installed to support the aforementioned micro-movement stage from below.

Further, the above-described exposure apparatus of various embodiments, the illumination light may be ArF excimer laser light (wavelength 193nm), KrF excimer laser light (wavelength of 248 nm) of ultraviolet light and the like, or F ₂ laser beam (wavelength 157 nm), etc. Vacuum ultraviolet light. In addition, as the illuminating light, for example, single-wavelength laser light in the infrared band or visible light band emitted from a DFB semiconductor laser or fiber laser can be used, for example, a fiber amplifier doped with erbium (or both erbium and ytterbium). Amplification, using nonlinear optical crystals to convert the wavelength into harmonics of ultraviolet light. Furthermore, a solid laser (wavelength: 355nm, 266nm) or the like can also be used.

In addition, although the above-mentioned embodiments described the case where the projection optical system PL is a multi-lens projection optical system with a plurality of projection optical units, the number of projection optical units is not limited to this, as long as it is one That's all. In addition, it is not limited to the projection optical system of the multi-lens method, and may be, for example, a projection optical system using an Ofner type large mirror.

In addition, the projection optical system in the exposure apparatus of each of the above embodiments is not limited to the equal magnification system, and may be either a reduction system or an enlargement system, or any of a catadioptric system, a reflection system, and a refraction system. In addition, the projected image can be either an inverted image or an upright image.

In addition, in the above-mentioned embodiment, although a light-transmissive photomask having a predetermined light-shielding pattern (or a phase pattern or a dimming pattern) formed on a light-transmitting photomask substrate is used, it can be replaced with this photomask, for example, The specification of US Patent No. 6,778,257 discloses an electronic mask (variable shape mask) that forms a transmission pattern, a reflection pattern, or a light-emitting pattern according to the electronic data of the pattern to be exposed, for example, a non-luminous image display element (also DMD (Digital Micro-mirror Device), which is a kind of spatial light modulator, is a variable shaping mask.

In addition, the exposure apparatus of each of the above-mentioned embodiments is particularly suitable for exposing large-scale substrates with dimensions (including at least one of the outer diameter, diagonal, and one side) of 500 mm or more, such as flat panel displays (FPDs) such as liquid crystal display elements. The exposure device is particularly effective.

Moreover, each of the above-mentioned embodiments can also be applied to a step & stitch exposure apparatus. In addition, in particular, the fifth embodiment described above can be applied to, for example, a stationary exposure apparatus.

In addition, the use of the exposure device is not limited to the exposure device for liquid crystal that transfers the pattern of the liquid crystal display element to the square glass plate, but can also be widely applied to, for example, exposure devices for semiconductor manufacturing, for the manufacture of thin film magnetic heads, micromachines, and DNA Exposure equipment for wafers, etc. In addition, not only micro-elements such as semiconductor elements, but also micro-elements, the present invention can also be applied to manufacture photomasks or reticles used in light exposure devices, EUV exposure devices, X-ray exposure devices, and electronic line exposure devices. The circuit pattern is transferred to exposure devices such as glass substrates or silicon wafers. Furthermore, the object to be exposed is not limited to a glass plate, and may also be other objects such as a wafer, a ceramic substrate, a thin film member, or a mask blank. In addition, when the exposure target is a substrate for a flat panel display, the thickness of the substrate is not particularly limited. For example, a film-like (flexible sheet-like member) is also included.

In addition, the disclosures of all publications, international publications, U.S. patents, and U.S. patent application publications on exposure devices cited in the above description are cited as part of the description of this specification. "Component Manufacturing Method"

Next, a description will be given of a method of manufacturing micro-elements using the exposure apparatus of the above-mentioned embodiments in the lithography process. The exposure apparatus of each of the above embodiments can also obtain a liquid crystal display element as a micro element by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a flat plate (glass substrate). <Pattern Formation Step>

First, using the exposure device of each of the above embodiments, a so-called lithography process is performed to form a pattern image on a photosensitive substrate (a glass substrate coated with a photoresist, etc.). With this photolithography process, a predetermined pattern including many electrodes and the like is formed on the photosensitive substrate. After that, the exposed substrate undergoes various steps such as a development step, an etching step, and a photoresist stripping step to form a predetermined pattern on the substrate. <Color filter forming steps>

Secondly, form a group of three dots corresponding to R (Red), G (Green), and B (Blue). Most of the color filters arranged in a matrix, or a group of filters with three lines of R, G and B A plurality of color filters arranged in the horizontal scanning line direction. <Unit assembly steps>

Next, a liquid crystal panel (liquid crystal cell) is assembled using a substrate with a predetermined pattern obtained in the pattern forming step, and a color filter obtained in the color filter forming step. For example, liquid crystal is injected between the substrate with a predetermined pattern obtained in the pattern forming step and the color filter obtained in the color filter forming step to manufacture a liquid crystal panel (liquid crystal cell). <Module assembly steps>

After that, install the circuit and backlight unit to perform the display operation of the assembled liquid crystal panel (liquid crystal unit) to complete the liquid crystal display element

In this case, in the pattern forming step, since the exposure device of each of the above embodiments can be used to expose the plate with high productivity and high precision, as a result, the productivity of the liquid crystal display element can be improved. Industrial availability

As explained above, the exposure device of the present invention is suitable for moving the object of the exposure target in the scanning direction with a predetermined stroke relative to the exposure energy beam during the exposure process. In addition, the mobile device of the present invention is very suitable for driving a mobile body. In addition, the method for manufacturing flat panel displays of the present invention is very suitable for manufacturing flat panel displays. The device manufacturing method of the present invention is suitable for the production of micro devices.

10.110: Exposure device 12: Bed 13: Anti-vibration device 14: Base frame 14a: Body part of the base frame 14b: Legs of the base frame 14c: Adjuster of the base frame 16: Optical mask interferometer 18X: X voice coil motor 18Y: Y voice coil motor 18Z: Z voice coil motor 19: substrate stage 21: fine movement stage 22X: X moving mirror 22Y: Y moving mirror 23: coarse movement stage 23X: X coarse movement Stage 23Y: Y Coarse movement stage 24X, 24Y: Mirror base 26: Micro-motion stage drive system 40, 40', 40A～40C: Weight reduction device 41: Chassis 41C: Main body 42: Air spring 43: Z Slide 44: Air bearing (base pad) 45: Connecting device 46: Target 47: Arm member 48: Parallel plate spring device 49: Leveling cup 50: Main control device 51: Spacer 52: Z sensor 57, 57A: Leveling device 61a to 61f: Legs 61a ₀ to 61f ₀ : Adjusters 62a, 62b: Foundation 63: Fixing member 63 ₀ : Fixing device 64: Polyhedral member 65: Air bearing 66: Fixing plate 67e: Parallel plate Spring 68: Plate 70A, 70: Fan 71A: Y Linear Guide 71B: Y Slider 72A: Y Movable Element 73: Y Fixer 74A: Y Linear Guide 74B: Slider 75: Y Bracket 76: Plate 77A : Y linear guide 77B: slider 78: auxiliary bracket 79: connecting member 80A: X linear guide 80B: slider 81A: X fixed member 81B: X movable member 82: Y linear motor 83: Y bracket 84: movable member 85: cushion block 86: parallel plate spring 87: cover 92: substrate interferometer system 100: a set of permanent magnets 100a, 100b: permanent magnet 101: X column 102: X guide 102a: guide body 102b: rib 103 : Auxiliary guide frame 107: Flexure device 108: Propulsion device 109: Thrust type air bearing 199: Connecting member 200: Falling prevention device AL ₁ to AL ₆ : Alignment detection system EX: X linear encoder system EXh1, EXh2 : Read head EXs1, EXs2: Scale EY: Y linear encoder system F: Floor IL: Exposure light IOP: Illumination system M: Mask MD ₁ to MD ₆ : Mark image detection system MSD: Mask stage drive system MST: Mask stage P: Substrate PH: Substrate holder PL: Projection optics PSD: Substrate stage drive system PST, PSTa～PSTe: Substrate stage device STX: X stage STY: Y stage XD1, XD2: X-axis drive unit XD11, XD21: movable element XD12, XD22: fixed element XDM: X linear motor XG1, XG2, XG3: guide device XG3a, XG4: thrust type hydrostatic gas bearing device XGG3, XGG4: guide surface XGP3 , XGP4: Air cushion XGR1, XGR2, XGR3: X axis linear guide XGS1, XGS2 XGS3: Slider YD: Y-axis drive unit YD1: Movable element YD2: Fixed element YDM: Y linear motor YG: Guide device YGR: Y-axis linear guide YGS: Slider

[Fig. 1] A diagram schematically showing the structure of the exposure apparatus of the first embodiment. [Fig. 2] A plan view of a substrate stage included in the exposure apparatus of Fig. 1. [Fig. [Fig. 3] (A) is a side view of the substrate stage in Fig. 2 viewed from the -Y direction (a cross-sectional view along the line AA in Fig. 2), and Fig. 3(B) is the periphery of the weight reduction device of the substrate stage The enlarged view, Figure 3(C) is an enlarged view of the periphery of the base frame (-X side). [Fig. 4] It is a plan view of the substrate stage with the micro-movement stage removed (a cross-sectional view taken along line BB in Fig. 3(A)). [Figure 5] is a cross-sectional view taken along line CC in Figure 2. [Fig. 6] A perspective view of a part of the substrate stage of Fig. 2 omitted. [FIG. 7] A block diagram showing the input/output relationship of the main control device composed mainly of the control system of the exposure apparatus of the first embodiment. [Fig. 8] A diagram schematically showing the structure of the exposure apparatus of the second embodiment. Fig. 9 is a plan view of a substrate stage included in the exposure apparatus of Fig. 8. [Figure 10] is a cross-sectional view taken along the line D-D in Figure 9. [Fig. 11] It is a plan view of the substrate stage after the micro-movement stage is removed (E-E line cross-sectional view in Fig. 10). [Figure 12] is a cross-sectional view taken along the line F-F in Figure 9. [FIG. 13] A cross-sectional view of the weight reduction device included in the substrate stage device of FIG. 9. [Fig. 14] A plan view of the substrate stage of the third embodiment. [Figure 15] is a cross-sectional view taken along line G-G in Figure 14. [FIG. 16] A cross-sectional view of the weight reduction device included in the substrate stage device of FIG. 14. [Fig. 17] A plan view of the substrate stage of the fourth embodiment. [Fig. 18] is a cross-sectional view of the weight reduction device and the leveling device included in the substrate stage device of the first modification. [Fig. 19] is a cross-sectional view of the weight reduction device and the leveling device included in the substrate stage device of the second modification. Fig. 20 is a cross-sectional view of the weight reduction device and the leveling device included in the substrate stage device of the third modification. [FIG. 21] (A) is a diagram showing a modification of the X guide, and FIG. 21(B) and FIG. 21(C) are diagrams respectively showing a substrate stage device of another modification. [Fig. 22] A diagram showing another modification example of the substrate stage. Fig. 23 is a side view showing the schematic configuration of a stage device included in the exposure apparatus of the fifth embodiment. [Figure 24] is a cross-sectional view taken along the line H-H in Figure 23. [FIG. 25] A block diagram for explaining the input/output relationship of the main control device included in the exposure apparatus of the fifth embodiment. [Figure 26] is a cross-sectional view showing the schematic configuration of a single-axis drive unit constituting the stage drive system. [Fig. 27] A diagram for explaining the balance of forces acting on the components of the uniaxial drive unit. [Fig. 28] A diagram for explaining the assembly method of the single-axis drive unit. [Fig. 29] A diagram showing a modification (Part 1) of the single-axis drive unit. [Fig. 30] A diagram showing a modification (Part 2) of the single-axis drive unit.

12: bottom bed

14: Pedestal frame

14a: The body of the base frame

14b: The feet of the base frame

14c: Adjuster for base frame

18: Voice coil motor

18X: X voice coil motor

18Z:Z voice coil motor

19: Substrate carrier stage

21: Micro-motion stage

22X:X moving mirror

22Y:Y moving mirror

23: coarse movement stage

23X:X coarse motion stage

23Y: Y coarse motion stage

24X, 24Y: mirror base

40: Weight elimination device

41: Chassis

42: Air spring

43: Z Slide

44: Air bearing (base pad)

45: Link device

57: leveling device

71A: Y linear guide

71B: Y slider

72: Y movable element

73: Y anchor

74A: Y linear guide

74B: Slide

75: Y bracket

76: plate

77A: Y linear guide

77B: Slide

79: Connection member

80A: X linear guide

80B: Slide

101: X column

102: X guide

102a: guide body

102b: ribs

103: auxiliary guide frame

F: Ground

P: substrate

PH: substrate holder

PST: substrate stage device

Claims (9)

An exposure device, one side of which allows an object to move relative to an energy beam in a first direction while performing exposure, and includes: The holding part, which holds the object; A first supporting portion, which supports the holding portion and can move in the first direction; A second supporting portion that supports the first supporting portion that moves in the first direction; A first base that supports the second supporting portion that moves in a second direction that crosses the first direction; A driving portion that drives the first support portion in the first direction relative to the second support portion, and drives the second support portion in the second direction; and The second base is disposed in the first direction separately from the first base and supports the driving part. Such as the exposure device of claim 1, which further has: A first connecting portion which connects the first supporting portion with the driving portion; The driving part drives the first support part through the first connection part in the first direction. Such as the exposure device of claim 1 or 2, which further has: A second connecting portion which connects the second supporting portion with the driving portion; The driving part drives the second support part through the second connecting part in the second direction. Such as the exposure device of any one of claims 1 to 3, wherein: The driving portion has a first drive system that drives the first support portion in the first direction relative to the second support portion, and a second drive system that drives the second support portion in the second direction; The second drive system supports the first drive system. Such as the exposure device of any one of claims 1 to 4, wherein: The material system is used for the substrate of flat panel display. Such as the exposure device of claim 5, in which, The length or diagonal length of at least one side of the substrate is 500 mm or more. A method for manufacturing a flat panel display, which comprises The action of exposing the object using the exposure device of claim 5 or 6; and The action of developing the object after exposure. A component manufacturing method, which includes The action of exposing the object using the exposure device of any one of claim items 1 to 6; and The action of developing the object after exposure. An exposure method, in which one side moves an object relative to the energy beam in the first direction while performing exposure, which includes: An action of moving the first supporting portion of the holding portion supporting and holding the object in the first direction; Supporting the movement of the first supporting portion moving in the first direction by the second supporting portion; The action of supporting the second supporting portion moving in a second direction crossing the first direction by the first base; An action of driving the first support portion in the first direction relative to the second support portion by a drive system, and driving the second support portion in the second direction; and The operation of the driving system is supported by a second base that is separated from the first base and arranged in the first direction.

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