JP6900974B2 - Exposure equipment, flat panel display manufacturing method, and device manufacturing method - Google Patents

Description

The present invention relates to an exposure apparatus, a method for manufacturing a flat panel display, and a device manufacturing method, and more specifically, an exposure apparatus used in a lithography process for manufacturing a semiconductor element, a liquid crystal display element, or the like, and a flat panel using the exposure apparatus. The present invention relates to a method for manufacturing a display and a method for manufacturing a device using the exposure apparatus.

Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements and semiconductor elements (integrated circuits, etc.), masks or reticle (hereinafter collectively referred to as "masks") and glass plates or wafers (hereinafter, hereinafter, "masks") are used. A step-and-scan exposure method in which a pattern formed on a mask is transferred onto a substrate using an energy beam while synchronously moving the “substrate”) along a predetermined scanning direction (scanning direction). Devices (so-called scanning steppers (also called scanners)) and the like are used.

This type of exposure device is a stacking type (gantry) in which a Y coarse movement stage that can move in the cross scan direction (direction orthogonal to the scan direction) is mounted on an X coarse movement stage that can move in the scanning direction with a long stroke. A type) stage device is known, and as the stage device, for example, a structure in which a weight canceling device moves along a horizontal plane on a surface plate made of stone is known (for example,). See Patent Document 1).

However, in the exposure apparatus described in Patent Document 1, since the weight canceling apparatus moves in a wide range corresponding to the step-and-scan operation, the upper surface of the surface plate (moving guide surface of the weight canceling apparatus) covers a wide range. It is necessary to finish with high flatness. However, in recent years, the substrate to be exposed by the exposure apparatus tends to be larger, and the surface plate is also enlarged accordingly. Therefore, in addition to the cost increase, the transportability of the exposure apparatus and the work at the time of assembly There are concerns about sexual deterioration.

Further, in the exposure apparatus described in Patent Document 1, the XY 2-axis stage, an actuator for finely driving the fine movement stage, and the like are accommodated between the surface plate (stage base) and the fine movement stage in the height direction. A large space was needed. Therefore, the weight canceling device has to be large (tall), and therefore, a large driving force is required to drive the weight canceling device along the horizontal plane.

Conventionally, when driving a large-mass substrate stage, a linear motor with a core that generates a large driving force (thrust) has been adopted. In this linear motor with a core, magnetic attraction of several times the thrust between the magnet unit included in the mover (or stator) and the coil unit having the core (iron core) included in the stator (or mover). Force (suction force) is generated. Specifically, a suction force of 1000 to 20000 N is generated for a thrust of 4000 N.

Therefore, in the case of the conventional substrate stage apparatus having the above-described configuration, a large number of substrates, a Y coarse stage, an X coarse stage, etc. are added to the pair of single-axis drive units arranged between the X coarse stage and the stage base. A heavy load (and an inertial force accompanying the movement of the X coarse motion stage) acts, and in particular, a large attractive force generated from a linear motor with a core constituting the pair of single-axis drive units also acts. Therefore, it is necessary to provide a large load capacity (capacity) to the uniaxial drive unit, particularly the linear motor and the guide device that form a part of the uniaxial drive unit, respectively, and the movable member and the fixing member are linear motors. It is also necessary to make it strong so that it can withstand the suction force from.

On the other hand, a large frictional resistance acts between the linear guide (rail) constituting the guide device (uniaxial guide) and the slider, which increases the driving resistance. Therefore, a linear motor that generates a larger driving force is required. Will be done. In addition, additional problems such as an increase in the size of the substrate stage device, frictional heat in the guide device, Joule heat in the linear motor, and mechanical damage due to adsorbents will become apparent.

U.S. Patent Application Publication No. 2010/0018950

According to the first aspect of the present invention, it is an exposure device that exposes an object to be exposed while moving in the first direction, and an object holding member that holds the object and the object holding member from below. a support member for supporting a support device for supporting the supporting member supporting the object holding member from below, a base portion for supporting the supporting device in a state where the support member is supporting the object holding member, the The first drive unit that moves the support member in the first direction with respect to the support device, and the support device and the support member on the support device are moved in a second direction that intersects the first direction. It has a second drive unit, a first component provided on the object holding member, and a second component provided on the first drive unit, via the first component and the second component. A third drive unit that moves the object holding member relative to the first drive unit in the first direction and the second direction, and the first direction with respect to the base unit that supports the support device. An exposure apparatus is provided that includes a base member that is spaced apart from the surface and supports the second drive unit.

According to a second aspect of the present invention, there is provided a method for manufacturing a flat panel display including exposing a substrate using the exposure apparatus according to the first aspect and developing the exposed substrate. Will be done.

According to a third aspect of the present invention, there is provided a device manufacturing method including exposing an object using the exposure apparatus according to the first aspect and developing the exposed object.

It is a figure which shows schematic the structure of the exposure apparatus which concerns on 1st Embodiment. It is a top view of the substrate stage which the exposure apparatus of FIG. 1 has. FIG. 3A is a side view of the substrate stage of FIG. 2 as viewed from the −Y direction (cross-sectional view taken along the line AA of FIG. 2), and FIG. 3B is an enlargement of the periphery of the weight canceling device of the substrate stage. FIG. 3C is an enlarged view of the periphery of the base frame (−X side). It is a top view (the cross-sectional view taken along line BB of FIG. 3A) of the substrate stage excluding the fine movement stage. FIG. 2 is a cross-sectional view taken along the line CC of FIG. It is a perspective view which partially omitted the substrate stage of FIG. It is a block diagram which shows the input / output relation of the main control apparatus which mainly constitutes the control system of the exposure apparatus which concerns on 1st Embodiment. It is a figure which shows schematic the structure of the exposure apparatus which concerns on 2nd Embodiment. It is a top view of the substrate stage which the exposure apparatus of FIG. 8 has. FIG. 9 is a cross-sectional view taken along the line DD of FIG. It is a top view (the cross-sectional view taken along line EE of FIG. 10) of the substrate stage excluding the fine movement stage. FIG. 9 is a cross-sectional view taken along the line FF of FIG. It is sectional drawing of the weight canceling apparatus which the substrate stage apparatus of FIG. 9 has. It is a top view of the substrate stage which concerns on 3rd Embodiment. FIG. 14 is a cross-sectional view taken along the line GG of FIG. It is sectional drawing of the weight canceling apparatus included in the substrate stage apparatus of FIG. It is a top view of the substrate stage which concerns on 4th Embodiment. It is sectional drawing of the weight canceling apparatus and leveling apparatus which the substrate stage apparatus which concerns on 1st modification has. It is sectional drawing of the weight canceling apparatus and the leveling apparatus which the substrate stage apparatus which concerns on 2nd modification has. It is sectional drawing of the weight canceling apparatus and leveling apparatus which the substrate stage apparatus which concerns on 3rd modification has. 21 (A) is a diagram showing a modified example of the X guide, and FIGS. 21 (B) and 21 (C) are diagrams showing a substrate stage device related to other modifications. It is a figure which shows the other modification of the substrate stage. It is a side view which shows the schematic structure of the stage apparatus provided in the exposure apparatus which concerns on 5th Embodiment. FIG. 2 is a cross-sectional view taken along the line HH of FIG. 23. It is a block diagram for demonstrating the input / output relation of the main control apparatus included in the exposure apparatus which concerns on 5th Embodiment. It is sectional drawing which shows the schematic structure of the uniaxial drive unit which constitutes a stage drive system. It is a figure for demonstrating the balance of the force acting on each part of the structure of a uniaxial drive unit. It is a figure for demonstrating the assembling method of a uniaxial drive unit. It is a figure which shows the modification (the 1) of the uniaxial drive unit. It is a figure which shows the modification (the 2) of the uniaxial drive unit.

<< First Embodiment >>
Hereinafter, the first embodiment will be described with reference to FIGS. 1 to 7.

FIG. 1 schematically shows the configuration of the exposure apparatus 10 according to the first embodiment. The exposure apparatus 10 is a step-and-scan projection exposure apparatus, a so-called scanner, in which a rectangular glass substrate P (hereinafter, simply referred to as a substrate P) used for a liquid crystal display device (flat panel display) is an exposure object. is there.

As shown in FIG. 1, the exposure apparatus 10 movably holds the illumination system IOP, the mask stage MST holding the mask M, the projection optical system PL, the pair of substrate stage mounts 19, and the substrate P along the horizontal plane. It is equipped with a substrate stage device PST, a control system for these, and the like. In the following, one direction in the horizontal plane in which the mask M and the substrate P are scanned relative to the projection optical system PL at the time of exposure is defined as the X-axis direction, and the direction orthogonal to this in the horizontal plane is the Y-axis direction and X. The direction orthogonal to the axis and the Y-axis direction is defined as the Z-axis direction, and the rotation (tilt) directions around the X-axis, the Y-axis, and the Z-axis are defined as the θx, θy, and θz directions, respectively.

The lighting system IOP is configured in the same manner as the lighting system disclosed in, for example, US Pat. No. 6,552,775. That is, the illumination system IOP has a plurality of, for example, five illumination systems that illuminate each of a plurality of, for example, five illumination regions arranged in a staggered pattern on the mask M, and each illumination system has a light source (for example, not shown). , Mercury lamp) is irradiated to the mask M as exposure illumination light (illumination light) IL through a reflector (not shown), a dichroic mirror, a shutter, a wavelength selection filter, various lenses, and the like. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm) (or the composite light of the i-line, g-line, and h-line) is used. Further, the wavelength of the illumination light IL can be appropriately switched by the wavelength selection filter, for example, according to the required resolution.

On the mask stage MST, a mask M on which a circuit pattern or the like is formed on the pattern surface (lower surface in FIG. 1) is fixed, for example, by vacuum suction. The mask stage MST is mounted on a guide member (not shown) in a non-contact state, and is determined in the scanning direction (X-axis direction) by, for example, a mask stage drive system MSD (not shown in FIG. 1, see FIG. 7) including a linear motor. It is driven by the stroke of, and is also slightly driven in the Y-axis direction and the θz direction as appropriate.

The position information of the mask stage MST in the XY plane is referred to as a laser interferometer (hereinafter referred to as "mask interferometer") that irradiates a laser beam (measurement beam) on a reflection surface fixed (or formed) on the mask M. ) 16, it is always measured with a resolution of, for example, about 0.5 to 1 nm. This measurement result is supplied to the main control device 50 (see FIG. 7).

The main control device 50 drives and controls the mask stage MST via the mask stage drive system MSD (not shown in FIG. 1, see FIG. 4) based on the measurement result by the mask interferometer 16. An encoder (or an encoder system composed of a plurality of encoders) may be used instead of the mask interferometer 16 or together with the mask interferometer 16.

The projection optical system PL is arranged below the mask stage MST in FIG. The projection optical system PL has, for example, the same configuration as the projection optical system disclosed in US Pat. No. 6,552,775. That is, the projection optical system PL includes a plurality of, for example, five projection optical systems (multi-lens projection optical systems) in which the projection regions of the pattern image of the mask M are arranged in a staggered pattern corresponding to the plurality of illumination regions described above. Including, it functions equivalently to a projection optical system having a single rectangular image field with the Y-axis direction as the longitudinal direction. In the present embodiment, each of the plurality of projection optical systems includes, for example, a two-stage in-mirror lens optical system including two sets of prisms, optical element groups (lens groups), and reflectors arranged along the optical axis. For example, a bilateral telecentric equal-magnification system that forms an erect image is used.

Therefore, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system IOP, the mask M is arranged so that the first surface (object surface) of the projection optical system PL and the pattern surface substantially coincide with each other. The projected image (partially upright image) of the circuit pattern of the mask M in the illumination region is arranged on the second surface (image plane) side of the projection optical system PL by the illumination light IL that has passed through the projection optical system PL. It is formed in the irradiation region (exposure region) of the illumination light IL conjugated to the illumination region on the substrate P on which the resist (sensitizer) is coated on the surface. Then, the mask M is moved relative to the illumination region (illumination light IL) in the scanning direction (X-axis direction) by synchronous driving of the mask stage MST and the fine movement stage 21 which is a part of the substrate stage device PST, which will be described later. By moving the substrate P relative to the exposure region (illumination light IL) in the scanning direction (X-axis direction), scanning exposure of one shot region (partition region) on the substrate P is performed. The pattern of the mask M (mask pattern) is transferred to the shot area. That is, in the present embodiment, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the pattern is generated on the substrate P by the exposure of the sensitive layer (resist layer) on the substrate P by the illumination light IL. Is formed.

Each of the pair of substrate stage mounts 19 is composed of members extending in the Y-axis direction (see FIG. 5), and both ends in the longitudinal direction thereof are supported from below by a vibration isolator 13 installed on the floor (floor surface) F. ing. The pair of substrate stage mounts 19 are arranged in parallel at predetermined intervals in the X-axis direction. The pair of substrate stage mounts 19 constitute the apparatus main body (body) of the exposure apparatus 10, and the projection optical system PL, the mask stage MST, and the like are mounted on the apparatus main body.

As shown in FIG. 1, the substrate stage device PST supports a pair of beds 12, a pair of base frames 14, a coarse movement stage 23, a fine movement stage 21, a weight canceling device 40, and a weight canceling device 40 from below. It is equipped with a guide 102 and the like.

As shown in FIG. 2, each of the pair of beds 12 is composed of a rectangular box-shaped member (rectangular parallelepiped member) whose longitudinal direction is the Y-axis direction in a plan view (viewed from the + Z side). The pair of beds 12 are arranged in parallel at predetermined intervals in the X-axis direction. As shown in FIG. 1, the bed 12 on the + X side is mounted on the substrate stage pedestal 19 on the + X side, and the bed 12 on the −X side is mounted on the substrate stage pedestal 19 on the −X side. The positions of the upper surfaces of the pair of beds 12 with respect to the Z-axis direction (hereinafter referred to as Z positions) are adjusted to be substantially the same.

As can be seen from FIGS. 1 and 2, the pair of beds 12 are mechanically connected to each other in the vicinity of both ends in the longitudinal direction by two connecting members 79. As shown in FIG. 3A, the pair of beds 12 are each made of a hollow member, and ribs made of a plate-shaped member parallel to the YZ plane are formed between the upper surface portion and the lower surface portion in the X-axis direction. A plurality of them are provided at predetermined intervals to ensure rigidity and strength. Further, although not shown, a plurality of ribs made of plate-shaped members parallel to the XZ plane are provided at predetermined intervals in the Y-axis direction between the upper surface portion and the lower surface portion of the bed 12. Circular holes for weight reduction and molding are formed in the central portion of each of the plurality of ribs and the side surface portion of the bed 12 (see FIG. 5). In addition, for example, when sufficient exposure accuracy can be ensured without providing the connecting member 79, it is not necessary to provide the connecting member 79.

As shown in FIG. 2, a plurality of Y linear guides 71A, which are elements of the mechanical uniaxial guide device, are provided on the upper surfaces of the pair of beds 12 (for example, four Y linear guides 71A per bed in the present embodiment). , Are fixed parallel to each other at predetermined intervals in the X-axis direction.

As shown in FIGS. 1 and 3A, one of the pair of base frames 14 is arranged on the + X side of the bed 12 on the + X side, and the other is arranged on the −X side of the bed 12 on the −X side. Is located in. Since the pair of base frames 14 have the same structure, the base frame 14 on the −X side will be described below. As shown in FIG. 3C, the base frame 14 has a main body portion 14a having one surface parallel to the YZ plane and another surface and extending in the Y-axis direction, and the main body portion 14a from below. Includes a plurality of supporting legs 14b (not shown in FIGS. 2 and 4). The length of the main body portion 14a (longitudinal direction (Y-axis direction) dimension) is set to be longer than the length of each of the pair of beds 12 in the Y-axis direction. For example, three legs 14b are provided at predetermined intervals in the Y-axis direction. A plurality of adjusters 14c are provided at the lower end of the leg portion 14b so that the Z position of the main body portion 14a can be adjusted.

Y stators 73, which are elements of the linear motor, are fixed to both side surfaces of the main body 14a. The Y stator 73 has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the Y-axis direction. Further, a Y linear guide 74A, which is an element of a mechanical uniaxial guide device, is fixed to the upper surface and both side surfaces (below the Y stator 73) of the main body portion 14a, respectively.

Returning to FIG. 1, the coarse movement stage 23 includes a Y coarse movement stage 23Y and an X coarse movement stage 23X mounted on the Y coarse movement stage 23Y. The coarse movement stage 23 is located above (+ Z side) of the pair of beds 12.

The Y coarse movement stage 23Y has a pair of X beams 101 as shown in FIG. Each of the pair of X-beams 101 has a member having a rectangular YZ cross section extending in the X-axis direction, and is arranged parallel to each other at predetermined intervals in the Y-axis direction. Since each X-beam 101 is not required to have rigidity in the Y-axis direction as compared with rigidity in the Z-axis direction (gravity direction), the shape of the YZ cross section may be, for example, I-shaped.

As shown in FIG. 6, a member called a Y carriage 75 is fixed to the lower surface of each of the pair of X beams 101 in the vicinity of both ends in the longitudinal direction via a plate 76. That is, for example, a total of four Y carriages 75 are attached to the lower surface of the Y coarse movement stage 23Y. The plate 76 is composed of a plate-shaped member parallel to the XY plane extending in the Y-axis direction, and a pair of X beams 101 are mechanically connected to each other. For example, since each of the four Y carriages 75 has the same structure, one Y carriage 75 corresponding to the base frame 14 on the −X side will be described below.

As shown in FIG. 3C, the Y carriage 75 is composed of an inverted U-shaped member with an XZ cross section, and the main body portion 14a of the base frame 14 is inserted between the pair of facing surfaces. On each of the pair of facing surfaces of the Y carriage 75, each of the pair of Y stators 72 facing each other via a predetermined clearance (gap / gap) is fixed to each of the pair of Y stators 73. Each Y mover 72 includes a coil unit (not shown), and together with an opposing Y stator 73, drives a Y coarse movement stage 23Y (see FIG. 1) with a predetermined stroke in the Y-axis direction, a Y linear motor YDM (FIG. 7). See). In the present embodiment, for example, a total of four Y carriages 75 are provided as described above, so that the Y coarse movement stage 23Y is driven in the Y-axis direction by, for example, a total of eight Y linear motors YDM.

A slider 74B that includes a rolling element (for example, a plurality of balls) and slidably engages with the Y linear guide 74A is fixed to each of the pair of facing surfaces and the ceiling surface of the Y carriage 75. Although in FIG. 3C, the sliders 74B are overlapped and hidden in the depth direction of the paper surface, but the sliders 74B are spaced apart from each other in the depth direction of the paper surface (Y-axis direction) on each of the pair of facing surfaces of the Y carriage 75 and the ceiling surface. So, for example, two are attached (see FIG. 5). The Y coarse movement stage 23Y (see FIG. 1) is guided straight in the Y-axis direction by a plurality of Y linear guide devices including a Y linear guide 74A and a slider 74B. Although not shown, a Y scale having a Y-axis direction as a periodic direction is fixed to the main body 14a of the base frame 14, and a Y-axis of the Y coarse movement stage 23Y is fixed to the Y carriage 75 together with the Y scale. An encoder head constituting a Y linear encoder system EY (see FIG. 7) for obtaining position information regarding a direction is fixed. The position of the Y coarse movement stage 23Y with respect to the Y-axis direction is controlled by the main control device 50 (see FIG. 7) based on the output of the encoder head.

Here, as shown in FIG. 1, the auxiliary guide frame 103 is arranged between the pair of beds 12 described above. The auxiliary guide frame 103 is composed of a member extending in the Y-axis direction, and is installed on the floor (floor surface) F via a plurality of adjusters. A single Y linear guide 77A, which is an element of a mechanical uniaxial guide device extending in the Y-axis direction, is fixed to the upper end surface (end surface on the + Z side) of the auxiliary guide frame 103. The Z position of the upper end of the auxiliary guide frame 103 is set to be substantially the same as the upper surface of the pair of beds 12. Further, the auxiliary guide frame 103 is oscillatedly separated from each of the pair of beds 12 and the pair of substrate stage mounts 19. Since the pair of beds 12 are mechanically connected by the connecting member 79, the auxiliary guide frame 103 is formed with a through hole (not shown) for passing the connecting member 79.

An auxiliary carriage 78 (see FIG. 6) is fixed to the lower surface of each of the pair of X beams 101 in the central portion in the longitudinal direction. The auxiliary carriage 78 is composed of a rectangular parallelepiped member, and as shown in FIG. 1, a slider having a rolling element (for example, a plurality of balls) on the lower surface thereof and slidably engaging with the Y linear guide 77A. 77B is fixed. Although they are overlapped and hidden in the depth direction of the paper surface in FIG. 1, two sliders 77B are attached to one auxiliary carriage 78 at predetermined intervals in the depth direction of the paper surface (Y-axis direction), for example. As described above, in the Y coarse movement stage 23Y, the central portion in the longitudinal direction is supported from below by the auxiliary guide frame 103 via the auxiliary carriage 78, and the bending due to its own weight is suppressed.

Returning to FIG. 2, on the upper surface of each of the pair of X beams 101, a plurality of X linear guides 80A, which are elements of the mechanical uniaxial guide device extending in the X-axis direction, are provided at predetermined intervals in the Y-axis direction (the present embodiment). Then, for each X-beam 101, for example, two) are fixed in parallel with each other. Further, the X stator 81A is fixed to the upper surface of each of the pair of X beams 101 and in the region between the pair of X linear guides 80A. The X stator 81A has a magnet unit including a plurality of permanent magnets arranged at predetermined intervals in the X-axis direction.

As described above, the Y coarse movement stage 23Y is supported from below by the pair of base frames 14 and the auxiliary guide frame 103, and is oscillatedly separated from the pair of beds 12 and the substrate stage pedestal 19. There is.

The X coarse movement stage 23X is composed of a plate-shaped member having a rectangular shape in a plan view, and has an opening formed in the central portion thereof as shown in FIG. On the lower surface of the X coarse movement stage 23X, as shown in FIG. 5, a pair of X stators 81A fixed to each of the pair of X beams 101 are opposed to each other via a predetermined clearance (gap / gap). The X mover 81B is fixed. Each X mover 81B includes a coil unit (not shown), and together with the opposing X stator 81A, constitutes an X linear motor XDM (see FIG. 7) that drives the X coarse movement stage 23X with a predetermined stroke in the X axis direction. ing. In the present embodiment, the X coarse motion stage 23X is driven in the X-axis direction by, for example, a pair (two) of X linear motors XDM provided corresponding to the pair of X beams 101.

Further, as shown in FIG. 1, a plurality of sliders 80B including rolling elements (for example, a plurality of balls and the like) and slidably engaged with the X linear guide 80A are fixed to the lower surface of the X coarse movement stage 23X. ing. For each X linear guide 80A, for example, four sliders 80B are provided at predetermined intervals in the X-axis direction, and for example, a total of 16 sliders 80B are fixed to the lower surface of the X coarse movement stage 23X. There is. The X coarse movement stage 23X is guided straight in the X-axis direction by a plurality of X linear guide devices including the X linear guide 80A and the slider 80B, respectively. Further, the X coarse movement stage 23X is restricted from moving relative to the Y coarse movement stage 23Y in the Y-axis direction by a plurality of sliders 80B, and moves integrally with the Y coarse movement stage 23Y in the Y-axis direction.

Although not shown, an X scale having a periodic direction in the X-axis direction is fixed to at least one of the pair of X beams 101, and an X coarse movement stage 23X together with the X scale The encoder head constituting the X linear encoder system EX (see FIG. 7) for obtaining the position information of the 23X in the X-axis direction is fixed. The position of the X coarse movement stage 23X in the X-axis direction is controlled by the main controller 50 (see FIG. 7) based on the output of the encoder head. In the present embodiment, the above-mentioned X linear encoder system EX and the above-mentioned Y linear encoder system EY are included, and the position information (including rotation in the θz direction) of the coarse motion stage (X coarse motion stage 23X) in the XY plane is included. An encoder system 20 (see FIG. 7) for detecting the above is configured.

Further, although not shown, the X coarse movement stage 23X has a stopper member that mechanically limits (regulates) the movable amount of the fine movement stage 21 with respect to the X coarse movement stage 23X, or the X-axis and Y-axis directions. A gap sensor or the like for measuring the relative movement amount of the fine movement stage 21 with respect to the X coarse movement stage 23X is attached.

As can be seen from FIGS. 1 and 2, the fine movement stage 21 is composed of a plate-shaped member (or a box-shaped (hollow rectangular parallelepiped) member) having a substantially square plan view, and the substrate P is placed on the upper surface thereof via the substrate holder PH. For example, it is adsorbed and held by vacuum adsorption (or electrostatic adsorption).

The fine movement stage 21 is a fine movement stage drive including a plurality of voice coil motors (or linear motors) including a stator fixed to the X coarse movement stage 23X and a mover fixed to the fine movement stage 21. The system 26 (see FIG. 7) is slightly driven on the X coarse motion stage 23X in the three-degree-of-freedom directions (X-axis, Y-axis, and θz directions) in the XY plane. As a plurality of voice coil motors, as shown in FIG. 2, a pair of X voice coil motors 18X that slightly drive the fine movement stage 21 in the X-axis direction are provided so as to be separated from each other in the Y-axis direction, and the fine movement stage 21 is provided on the Y-axis. A pair of Y voice coil motors 18Y that are slightly driven in the direction are provided so as to be separated from each other in the X-axis direction. The fine movement stage 21 is synchronously driven by the X coarse movement stage 23X (driven at the same speed in the same direction as the X coarse movement stage 23X) by using the X voice coil motor 18X and / or the Y voice coil motor 18Y. , X Coarse movement stage 23X moves in the X-axis direction and / or the Y-axis direction with a predetermined stroke. Therefore, the fine movement stage 21 can move (coarse movement) with a long stroke in the XY2 axis direction with respect to the projection optical system PL (see FIG. 1), and also makes a slight movement (fine movement) in the three degrees of freedom direction in the XY, θz directions. ) It is possible.

Further, as shown in FIG. 3B, the fine movement stage drive system 26 finely drives the fine movement stage 21 in the directions of θx, θy, and three degrees of freedom in the Z-axis direction, and the plurality of Z voice coil motors 18Z. have. The plurality of Z voice coil motors 18Z are arranged at locations corresponding to the four corners of the bottom surface of the fine movement stage 21 (in FIG. 3B, only two of the four Z voice coil motors 18Z are shown. The other two are not shown). The configuration of the fine movement stage drive system, including the plurality of voice coil motors, is disclosed, for example, in US Patent Application Publication No. 2010/0018950.

In the present embodiment, the substrate stage drive system PSD includes a fine movement stage drive system 26, a coarse movement stage drive system including the above-mentioned plurality of Y linear motors YDM, and a pair of X linear motors XDM. (See Fig. 7).

As shown in FIG. 3A, an X moving mirror (bar mirror) 22X having a reflecting surface orthogonal to the X axis is fixed to the side surface of the fine movement stage 21 on the −X side via a mirror base 24X. There is. Further, as shown in FIG. 5, a Y moving mirror 22Y having a reflecting surface orthogonal to the Y axis is fixed to the side surface of the fine movement stage 21 on the −Y side via a mirror base 24Y. The position information of the fine movement stage 21 in the XY plane is obtained by, for example, 0. It is always detected with a resolution of about 5 to 1 nm. In reality, the substrate interferometer system 92 includes a plurality of X laser interferometers corresponding to the X moving mirror 22X and a plurality of Y laser interferometers corresponding to the Y moving mirror 22Y, respectively. Only the X laser interferometer is shown. Each of the plurality of laser interferometers is fixed to the main body of the apparatus. Further, the position information regarding the θx, θy, and Z-axis directions of the fine movement stage 21 is obtained by a sensor (not shown) fixed to the lower surface of the fine movement stage 21, for example, using a target fixed to the weight canceling device 40 described later. Be done. The configuration of the position measurement system of the fine movement stage 21 is disclosed, for example, in US Patent Application Publication No. 2010/0018950.

As shown in FIG. 3A, the weight canceling device 40 is composed of a columnar member extending in the Z-axis direction, and is also referred to as a core column. The weight canceling device 40 is mounted on the X guide 102 described later, and supports the fine movement stage 21 from below via the leveling device 57 described later. The upper half of the weight canceling device 40 is inserted into the opening of the X coarse movement stage 23X, and the lower half thereof is inserted between the pair of X beams 101 (see FIG. 4).

As shown in FIG. 3B, the weight canceling device 40 includes a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is made of a bottomed tubular member having an open surface on the + Z side. A plurality of air bearings (hereinafter, referred to as base pads) 44 having bearing surfaces facing the −Z side are attached to the lower surface of the housing 41. The air spring 42 is housed inside the housing 41. Pressurized gas is supplied to the air spring 42 from the outside. The Z slider 43 is made of a tubular member extending in the Z axis direction, is inserted into the housing 41, and is mounted on the air spring 42. An air bearing (not shown) with the bearing surface facing the + Z side is attached to the end of the Z slider 43 on the + Z side.

The leveling device 57 is a device that supports the fine movement stage 21 so as to be tiltable (swingable in the θx and θy directions with respect to the XY plane), and is non-contactly supported from below by the air bearing attached to the Z slider 43. ing. The weight canceling device 40 cancels (cancels) the weight (downward force in the gravity direction) of the system including the fine movement stage 21 via the Z slider 43 and the leveling device 57 by the upward force in the gravity direction generated by the air spring 42. ) By this, the load of the plurality of Z voice coil motors 18Z described above is reduced.

The weight canceling device 40 is mechanically connected to the X coarse movement stage 23X via a plurality of connecting devices 45. The Z position of the plurality of connecting devices 45 substantially coincides with the position of the center of gravity of the weight canceling device 40 in the Z-axis direction. The connecting device 45 includes a thin steel plate having a thickness parallel to the XY plane, and is also referred to as a flexure device. The connecting device 45 connects the housing 41 of the weight canceling device 40 and the X coarse movement stage 23X on the + X side, the −X side, the + Y side, and the −Y side of the weight canceling device 40 (in FIG. 3B). The + Y side and −Y side coupling devices 45 are not shown. See FIG. 4). Therefore, the weight canceling device 40 is pulled by the X coarse movement stage 23X via any of the plurality of coupling devices 45, and is integrally with the X coarse movement stage 23X in the X-axis direction or the Y-axis direction. Moving. At this time, since the traction force acts on the weight canceling device 40 in the plane parallel to the XY plane including the position of the center of gravity in the Z-axis direction, the moment (pitching moment) around the axis orthogonal to the moving direction does not act. The detailed configuration of the weight canceling device 40 of the present embodiment, including the leveling device 57 and the connecting device 45, is disclosed in, for example, US Patent Application Publication No. 2010/0018950.

As shown in FIG. 3A, the X guide 102 includes a guide main body 102a made of a member (see FIG. 5) having an inverted U-shaped cross section in YZ with the X-axis direction as the longitudinal direction, and a plurality of ribs 102b. including. The X guide 102 is arranged above the pair of beds 12 (+ Z side) so as to cross the pair of beds 12. The length of the X guide 102 (dimension in the longitudinal direction (X-axis direction)) is the dimension in the X-axis direction of each of the pair of beds 12 arranged at predetermined intervals in the X-axis direction, and the X of the gap between the pair of beds 12. It is set somewhat longer than the sum of the axial dimensions. Therefore, as shown in FIG. 2, the + X-side end of the X-guide 102 protrudes to the + X side (outside of the bed 12) from the + X-side end of the + X-side bed 12, and the X-guide The −X side end of 102 protrudes to the −X side (outside of the bed 12) from the −X side end of the −X side bed 12.

The upper surface (the surface on the + Z side) of the guide body 102a is parallel to the XY plane and has a very high flatness. A weight canceling device 40 is mounted on the upper surface of the guide main body 102a in a non-contact state via a plurality of base pads 44. The upper surface of the guide main body 102a is precisely adjusted so as to be parallel to the horizontal plane, and functions as a guide surface when the weight canceling device 40 moves. The length (longitudinal dimension) of the guide main body 102a is set to be slightly longer than the movable amount in the X-axis direction of the weight canceling device 40 (that is, the X coarse movement stage 23X). The width (dimension in the Y-axis direction) of the upper surface of the guide main body 102a is set to a dimension that can face the bearing surfaces of all the plurality of base pads 44 (see FIG. 4). Further, both ends of the guide main body 102a in the longitudinal direction are closed by plate-shaped members parallel to the YZ plane.

The plurality of ribs 102b are each composed of plate-shaped members parallel to the YZ plane, and are provided at predetermined intervals in the X-axis direction. Each of the plurality of ribs 102b is connected to a pair of facing surfaces of the guide main body 102a and a ceiling surface. Here, the material and manufacturing method of the X guide 102 including the plurality of ribs 102b are not particularly limited, but when it is formed by casting using, for example, iron or the like, it is formed of a stone material (for example, gabbro). When the guide body 102a and the plurality of ribs 102b are formed of ceramics or CFRP (Carbon Fiver Reinforced Plastics) material, the guide body 102a and the plurality of ribs 102b are integrally formed. However, the guide main body 102a and the plurality of ribs 102b may be used as separate members, and the plurality of ribs 102b may be connected to the guide main body 102a by welding, for example. The X guide 102 may be composed of a solid member or a box-shaped member whose lower surface side is closed.

Each lower end of each of the plurality of ribs 102b includes a rolling element (for example, a plurality of balls) and is slidable to the Y linear guide 71A fixed to the upper surface of each of the pair of beds 12 described above. Is fixed. As shown in FIG. 4, a plurality of Y sliders 71B (for example, two for each Y linear guide 71A in the present embodiment) are fixed at predetermined intervals in the Y-axis direction. The flatness of the upper surface of the guide body 102a may be adjusted by appropriately inserting a shim or the like between the plurality of ribs 102b and the Y slider 71B.

As shown in FIG. 2, the plate-shaped members provided at both ends of the X guide 102 in the longitudinal direction include a Y linear motor 82 (as shown in FIG. 2) for driving the X guide 102 with a predetermined stroke in the Y axis direction. The Y mover 72A, which is an element of FIG. 7), is fixed to each of the pair of Y stators 73 (see FIG. 3C) described above so as to face each other via a predetermined clearance (gap / gap). (See FIG. 4. The plate 76 is not shown in FIG. 4 for ease of understanding). Each Y mover 72A has a coil unit (not shown). The X guide 102 is driven by a pair of Y linear motors 82 including a Y stator 73 and a Y mover 72A, respectively, with a predetermined stroke in the Y-axis direction. That is, in the present embodiment, the pair of Y linear motors 82 for driving the X guide 102 in the Y-axis direction and the Y linear motor YDM for driving the Y coarse motion stage 23Y in the Y-axis direction are common to each other. The stator 73 is used.

Further, although not shown, a Y scale having a Y-axis direction as a periodic direction is fixed to one of the pair of beds 12 described above, and the Y-axis of the X-guide 102 is fixed to the X-guide 102 together with the Y-scale. An encoder head constituting a Y linear encoder system 104 (see FIG. 7) for obtaining position information regarding a direction is fixed. The X guide 102 and the Y coarse movement stage 23Y are synchronously driven in the Y-axis direction by the main controller 50 (see FIG. 7) based on the output of the encoder head (however, Y individually if necessary). You can also control the position).

In addition, a rectangular mark plate (not shown) having a longitudinal direction in the Y-axis direction is fixed on the upper surface of the substrate holder PH. The height of the mark plate is set so that the surface thereof is substantially the same as the surface of the substrate P placed on the substrate holder PH. A plurality of, here, six reference marks (not shown) are formed on the surface of the mark plate side by side in the Y-axis direction.

_{Further, inside the substrate holder PH (fine movement stage 21), six mark image detection systems MD 1} including a lens system and an image sensor (CCD, etc.) below each of the six reference marks (-Z side). ~ MD ₆ (see FIG. 7) is arranged. In these mark image detection systems MD _{1 to MD 6} , the projected image of the alignment mark on the mask M by each of the five projection optical systems and the lens system and the image of the reference mark (not shown) by the lens system are simultaneously displayed. Detect and measure the position of the image of the alignment mark with reference to the position of the image of the reference mark. The measurement result is supplied to the main control device 50 and used for the alignment (mask alignment) of the mask M and the like.

Further, the exposure apparatus 10 is provided with six off-axis alignment detection systems AL _{1 to AL 6} (see FIG. 7) in order to detect the six reference marks and the alignment marks on the substrate P. The six alignment detection systems are arranged in order along the Y axis on the + X side of the projection optical system PL.

As each alignment detection system, an image processing type FIA (Field Image Alignment) type sensor is adopted. For example, the FIA sensor irradiates the target mark with broadband detection light that does not expose the resist on the substrate P, and the image and index (non-existence) of the target mark formed on the light receiving surface by the reflected light from the target mark. The image of (shown) is imaged using an image sensor (CCD) or the like. The detection results of the alignment detection systems AL _{1 to AL 6} are sent to the main control device 50 via the alignment signal processing system (not shown).

Not limited to the FIA system, the target mark is irradiated with coherent detection light to detect scattered light or diffracted light generated from the target mark, or two diffracted lights (for example, the same order) generated from the target mark. It is also possible to use an alignment sensor that detects by interfering with each other alone or in combination as appropriate.

FIG. 7 shows a block diagram showing an input / output relationship of a main control device 50 that mainly configures the control system of the exposure apparatus 10 and controls each component in an integrated manner. The main control device 50 includes a workstation (or a microprocessor) and the like, and controls each component of the exposure device 10 in an integrated manner.

Next, the lot processing of the substrate P in the exposure apparatus 10 will be briefly described.

A lot to be processed, which is composed of a plurality of (for example, 50 or 100) substrates P, is carried into a coater / developer (hereinafter referred to as “C / D”) (not shown) connected in-line to the exposure apparatus 10. Then, the substrates in the lot are sequentially coated with resist by the coater (resist coating device) in the C / D, and are conveyed to the exposure apparatus 10 by the transfer system (not shown). Further, under the control of the main control device 50, the mask M is loaded onto the mask stage MST by a mask transfer device (mask loader) (not shown), and then the above-mentioned mask alignment is performed.

Then, when the resist-coated substrate P is loaded onto the substrate holder PH, the main control device 50 detects the reference mark on the substrate holder PH using _{the alignment detection systems AL 1 to AL 6} and bases the substrate P. Perform line measurement.

Then, the main control device 50 detects a plurality of alignment marks transferred and formed on the substrate P together with the pattern during the exposure before the pre-layer using the alignment detection systems AL _{1 to AL 6,} and aligns the substrate P. I do.

After the alignment of the substrate P is completed, the main control device 50 performs a step-and-scan exposure operation for sequentially transferring the pattern of the mask M to a plurality of shot regions on the substrate P by the above-mentioned scanning exposure. Is done. Since this exposure operation is the same as the conventional step-and-scan exposure operation, detailed description thereof will be omitted.

Here, in the step-and-scan exposure operation, the exposure processing is sequentially performed on a plurality of shot regions provided on the substrate P. The substrate P is driven at a constant speed in the X-axis direction with a predetermined stroke during the scanning operation (hereinafter referred to as the X-scan operation), and during the step operation (moving between shot areas), the substrate P is driven in the X-axis direction and / or the Y-axis. It is appropriately driven in the direction (hereinafter, referred to as X-step operation and Y-step operation, respectively).

When moving the board P in the X-axis direction during the X scan operation and the X step operation, the board stage device PST responds to an instruction based on the measurement value of the X linear encoder system EX from the main control device 50, and Y On the coarse movement stage 23Y, the X coarse movement stage 23X is driven in the X-axis direction by a pair (two) of X linear motors XDM, and the instruction is based on the measurement value of the substrate interferometer system 92 from the main control device 50. Accordingly, the fine movement stage 21 is synchronously driven by the X coarse movement stage 23X by the plurality of X voice coil motors 18X. Further, when the X coarse movement stage 23X moves in the X-axis direction, the weight canceling device 40 moves in the X-axis direction together with the X coarse movement stage 23X by being pulled by the X coarse movement stage 23X. At this time, the weight canceling device 40 moves on the X guide 102. During the X scan operation and the X step operation, the fine movement stage 21 may be slightly driven in the Y-axis direction and / or the θz direction with respect to the X coarse movement stage 23X, but the Y of the weight canceling device 40 Since the position does not change, the weight canceling device 40 always moves only on the X guide 102.

On the other hand, during the Y step operation, in the board stage device PST, the Y coarse movement stage 23Y is operated by a plurality of Y linear motors YDM in response to an instruction based on the measurement value of the Y linear encoder system EY from the main control device 50. It is driven by a predetermined stroke in the Y-axis direction on the pair of base frames 14, and the X-coarse movement stage 23X moves integrally with the Y-coarse movement stage 23Y in the Y-axis direction with a predetermined stroke. Further, the weight canceling device 40 moves integrally with the X coarse movement stage 23X in the Y-axis direction with a predetermined stroke. At this time, the X guide 102 that supports the weight canceling device 40 from below is synchronously driven by the Y coarse movement stage 23Y. Therefore, the weight canceling device 40 is always supported by the X guide 102 from below.

As described above, according to the exposure apparatus 10 according to the present embodiment, the weight canceling apparatus 40 is always supported from below by the X guide 102 regardless of the position of the XY plane. Since the X guide 102 is composed of a narrow plate-shaped member extending in the scanning direction, for example, a guide member having a wide guide surface covering the entire moving range of the weight canceling device 40 (for example, a surface plate formed of a stone material) is used. Compared with the case, the weight of the substrate stage device PST can be reduced. Further, the guide member having the wide guide surface becomes difficult to process and transport when the substrate becomes large, but the X guide 102 of the present embodiment has a narrow band-shaped guide surface extending in the X-axis direction. Since it is composed of a plate-shaped member having a width, it is easy to process and transport.

Further, since the X guide 102, which is a member extending in the X-axis direction, is supported from below at a plurality of locations by the pair of beds 12, bending due to the weight of the X guide 102 or the load of the weight canceling device 40 occurs. It is suppressed. Further, since the number of beds 12 is two, the size of each of the two beds 12 can be reduced in size and weight as compared with the case where the number of beds 12 is one. Therefore, the bed 12 can be easily processed and transported, and the workability at the time of assembling the substrate stage device PST is improved.

Further, since the X guide 102 and the pair of beds 12 that guide the X guide 102 in the Y-axis direction have a rib structure, they are lightweight and can easily secure the rigidity in the Z-axis direction. Therefore, the work of assembling the substrate stage device PST is also better in workability than the case of using the guide member having the wide guide surface.

Further, since the weight canceling device 40 is non-contactly supported on the X guide 102, the vibration caused by the movement of the weight canceling device 40 is not transmitted to the X guide 102. Therefore, the vibration is not transmitted to, for example, the projection optical system PL via the X guide 102, the pair of beds 12, the substrate stage mount 19, and the like, and the exposure operation can be performed with high accuracy. Further, since the X guide 102 is driven near the center of gravity in the Z-axis direction by a pair of Y linear motors 82 including a Y stator 73 fixed to the pair of base frames 14, a moment (pitching) around the X axis is driven. A moment) is not generated, and the reaction force of the driving force is not transmitted to the substrate stage mount 19. Therefore, the exposure operation can be performed with high accuracy.

Further, since the movement of the X guide 102 in the Y-axis direction is performed during the above-mentioned Y step operation that does not require high-precision positioning accuracy, the frictional resistance force of the linear guide device or the moment due to driving is assumed to be the weight canceling device 40 or X. Even if it acts on the guide 102, the vibration generated due to the above moment can be converged by the X scan operation after the Y step operation. Further, the yawing motion (moment around the Z axis) caused by driving the X guide 102 in the Y axis direction is strictly controlled and suppressed by the driving force difference of the pair of Y linear motors 82 for driving the X guide 102. Can be done.

Further, since the coarse movement stage 23 (XY stage device) of the present embodiment has a configuration in which the X coarse movement stage 23X is mounted on the Y coarse movement stage 23Y, for example, the Y coarse movement stage is mounted on the X coarse movement stage. The inertial mass of the X coarse movement stage 23X, which moves with a long stroke in the X-axis direction, which is the scanning direction, is smaller than that of the conventional XY stage device having the mounted configuration. Therefore, the driving reaction force received by the floor (floor surface) F through the coarse motion stage 23 during the X scan operation becomes small. As a result, it is possible to suppress floor vibration that affects the entire device during the X-scan operation. On the other hand, the drive mass and drive reaction force when the Y coarse motion stage 23Y moves in the Y-axis direction are larger than those of the conventional XY stage device, but the Y step operation does not require highly accurate positioning. Therefore, the influence of floor vibration on the exposure operation is small.

Further, in the coarse movement stage 23, the pair of X beams 101 included in the Y coarse movement stage 23Y are supported by the auxiliary guide frames 103 arranged between the pair of beds 12, respectively, and the intermediate portion in the X direction is supported by their own weight or X. Deflection due to the load of the coarse motion stage 23X is suppressed. Therefore, the straightness accuracy of the X linear guide 80A fixed on the pair of X beams 101 can be improved, and the X coarse movement stage 23X can be guided straight in the X-axis direction with high accuracy. Further, as compared with the case where only both ends are supported, it is not necessary for each of the pair of X beams 101 to have a sturdy structure in order to secure the bending rigidity (a delicate member may be used), and the weight can be reduced.

<< Second Embodiment >>
Next, the second embodiment will be described with reference to FIGS. 8 to 13. Here, the same or similar reference numerals are used for the same or equivalent components as those in the first embodiment described above, and the description thereof will be simplified or omitted.

FIG. 8 schematically shows the configuration of the exposure apparatus 110 according to the second embodiment. The exposure apparatus 110 is a so-called scanner, which is a step-and-scan type projection exposure apparatus in which a substrate P used for a liquid crystal display device (flat panel display) is an exposure target.

9 shows a plan view of the substrate stage device PSTa included in the exposure device 110 of FIG. 8, and FIG. 10 shows a cross-sectional view taken along the line DD of FIG. Further, FIG. 11 shows a plan view (cross-sectional view taken along the line EE of FIG. 10) of the substrate stage device excluding the fine movement stage, and FIG. 12 shows a cross-sectional view taken along the line FF of FIG. ing. Further, FIG. 13 shows a cross-sectional view of the weight canceling device included in the substrate stage device PSTa.

As can be seen by comparing FIGS. 8 to 13 with FIGS. 1 to 6 according to the first embodiment, the exposure apparatus 110 according to the second embodiment replaces the substrate stage apparatus PST described above. The difference from the exposure apparatus 10 is that the substrate stage apparatus PSTa is provided.

The overall configuration of the board stage device PSTa is the same as that of the board stage device PST, but instead of the weight canceling device 40, a weight canceling device 40'is provided, and the X guide 102 is driven. The system configuration is different from the substrate stage apparatus PST in some respects, such as being partially different from the substrate stage apparatus PST. Hereinafter, the differences will be mainly described.

In the substrate stage device PSTa, as can be seen from FIGS. 8 and 10, the positions (height positions) of the Y coarse movement stage 23Y and the X guide 102 in the Z-axis direction (vertical direction) partially overlap.

Specifically, in the substrate stage device PSTa, as shown in FIGS. 8 and 10, the above-mentioned Y carriage 75 is provided on both side surfaces (not the lower surfaces near both ends) of each of the pair of X beams 101 in the longitudinal direction. Is fixed. That is, the Y coarse movement stage 23Y has, for example, a total of four Y carriages 75. Further, the upper surfaces of the two Y carriages 75 on the + X side are mechanically connected by the plate 76, and the upper surfaces of the two Y carriages 75 on the −X side are also mechanically connected by the plate 76. The plate 76 is not shown in FIG. 11 for ease of understanding.

Further, as the weight canceling device 40', for example, as shown in FIG. 10, a type of device in which the Z slider 43 and the leveling device 57 are integrally fixed is used. The weight canceling device 40'is mounted on the X guide 102, and the lower half thereof is inserted into the opening of the X coarse movement stage 23X. In addition, in FIGS. 8 and 10 to 12, the weight canceling device 40', the leveling device 57, and the like are schematically shown from the viewpoint of avoiding the complexity of the drawings (see FIG. 13 for the detailed configuration).

As shown in FIG. 13, the weight canceling device 40'has a housing 41, an air spring 42, a Z slider 43, and the like. The housing 41 is made of a bottomed tubular member having an open surface on the + Z side. A plurality of base pads 44 with the bearing surface facing the −Z side are attached to the lower surface of the housing 41. On the outer wall surface of the housing 41, a plurality of arm members 47 for supporting the targets 46 of the plurality of Z sensors 52 fixed to the lower surface of the fine movement stage 21 are fixed. The air spring 42 is housed inside the housing 41. Pressurized gas is supplied to the air spring 42 from the outside. The Z slider 43 is composed of a tubular member extending in the Z-axis direction, which is lower in height (shorter) than the Z slider used in the first embodiment described above. The Z slider 43 is inserted into the housing 41 and mounted on the air spring 42. The Z slider 43 is connected to the inner wall surface of the housing 41 by a parallel leaf spring device 48 including a pair of leaf springs parallel to the XY planes arranged apart from each other in the Z axis direction. A plurality (for example, three or four) of parallel leaf spring devices 48 are provided, for example, around the outer circumference of the Z slider 43 (in the θz direction) at substantially equal intervals. The Z slider 43 moves along the XY plane integrally with the housing 41 due to the rigidity (tensile rigidity) in the direction parallel to the horizontal plane of the plurality of leaf springs. On the other hand, the Z slider 43 can be slightly moved in the Z-axis direction with respect to the housing 41 due to the flexibility of the leaf spring. Since the pair of leaf springs included in the parallel leaf spring device 48 are separated in the Z-axis direction, the Z slider 43 is suppressed from falling (rotation in the θx or θy direction), and is substantially in the Z-axis direction. It is possible to move with respect to the housing 41 with a very small stroke.

The leveling device 57 is a device that supports the fine movement stage 21 so as to be tiltable (swingable in the θx and θy directions with respect to the XY plane), and is an upper half via an opening 21a formed on the lower surface of the fine movement stage 21. The portion is inserted in the fine movement stage 21. The weight canceling device 40'cancels (cancels) the weight (downward force in the gravity direction) of the system including the fine movement stage 21 via the Z slider 43 and the leveling device 57 by the upward force in the gravity direction generated by the air spring 42. By doing so, the load of the plurality of Z voice coil motors 18Z is reduced.

The leveling device 57 includes a leveling cup 49 made of a cup-shaped member having an open + Z side surface, a polyhedral member 64 inserted into the inner diameter side of the leveling cup 49, and a plurality of leveling cups 49 attached to the inner wall surface of the leveling cup 49. Includes with air bearing 65. The lower surface of the leveling cup 49 is integrally fixed to the upper surface of the Z slider 43 via a plate 68. A plurality of dropout prevention devices 200 for preventing the leveling cup 49 from falling off are attached to the ceiling surface of the fine movement stage 21. The polyhedral member 64 is made of a triangular pyramid-shaped member, and its tip is inserted into the leveling cup 49. The bottom surface (the surface facing the + Z side) of the polyhedral member 64 is fixed to the ceiling surface of the fine movement stage 21 via the spacer 51. Three air bearings 65 are provided on the inner wall surface of the leveling cup 49 at substantially equal intervals around θz, for example. The leveling device 57 injects pressurized gas from the plurality of air bearings 65 onto the side surfaces of the polyhedral member 64 so that the fine movement stage 21 can be tilted around the center of gravity position CG of the system including the fine movement stage 21. Non-contact support via (gap / gap). For ease of understanding, FIG. 13 shows, for example, two cross sections of the three air bearings 65 (that is, FIG. 13 shows a cross section parallel to the YZ plane with respect to the leveling device 57. Not a cross section).

Here, when the fine movement stage 21 moves in a direction parallel to the XY plane, the polyhedral member 64 moves integrally with the fine movement stage 21 in a direction parallel to the XY plane. At this time, the air bearing 65 is pressed against the polyhedral member 64 by the rigidity (static pressure) of the gas film formed between the bearing surface of the air bearing 65 and the polyhedral member 64, whereby the fine movement stage 21 and the leveling cup 49 And integrally move in the same direction as the fine movement stage 21. Since the leveling cup 49 and the Z slider 43 are fixed via the plate 68, the fine movement stage 21 and the Z slider 43 move integrally in a direction parallel to the horizontal plane. Further, as described above, since the Z slider 43 and the housing 41 are connected by a plurality of parallel leaf spring devices 48, the fine movement stage 21 and the housing 41 move integrally in the direction parallel to the horizontal plane. To do. As described above, the fine movement stage 21 and the weight canceling device 40'are always integrally moved in a direction parallel to the XY plane, including the case where the fine movement stage 21 and the weight canceling device 40'are slightly driven by a plurality of voice coil motors 18X and 18Y. Therefore, in the second embodiment, the above-mentioned connecting device 45 is not provided between the weight canceling device 40'and the X coarse movement stage 23X.

Further, in the second embodiment, the dimension of the guide main body 102a in the Z-axis direction is set to be the same as the dimension of the X-beam 101 in the Z-axis direction. Then, as can be seen from FIGS. 9, 10, and 12, the guide main body 102a is inserted between the pair of X beams 101. That is, the Z position (position in the vertical direction) of the X guide 102 and the Z position of the Y coarse movement stage 23Y partially overlap.

The configuration of other parts of the substrate stage apparatus PSTa is the same as that of the substrate stage apparatus PST described above.

In the exposure apparatus 110 configured as described above, in the step-and-scan type exposure operation, when the substrate P is moved in the X-axis direction during the X-scan operation and the X-step operation, the substrate stage apparatus PSTa Basically, the drive of the X coarse movement stage 23X and the synchronous drive of the fine movement stage 21 and the X coarse movement stage 23X on the Y coarse movement stage 23Y similar to the first embodiment described above are performed by the main control device 50. It is done according to the instruction from. However, in the substrate stage device PSTa, the weight canceling device 40'moves in the X-axis direction together with the fine movement stage 21 without being pulled by the X coarse movement stage 23X. During the X scan operation and the X step operation, the fine movement stage 21 is slightly driven in the Y-axis direction with respect to the X coarse movement stage 23X, and the Y position of the weight canceling device 40'may change slightly. The width direction dimension of the X guide 102 is set so that the base pad 44 does not fall off from the X guide 102 even when the weight canceling device 40'is slightly driven in the Y axis direction.

Further, during the Y step operation, in the substrate stage device PSTa, basically, the Y coarse movement stage 23Y and the X coarse movement stage 23X are driven in the Y-axis direction, and the X coarse movement is the same as in the first embodiment described above. Synchronous drive of the stage 23X and the fine movement stage 21 is performed in response to an instruction from the main control device 50. However, in the substrate stage device PSTa, the weight canceling device 40'moves in the Y-axis direction together with the fine movement stage 21. At this time, the X guide 102 that supports the weight canceling device 40'from below is synchronously driven by the Y coarse movement stage 23Y. Therefore, the weight canceling device 40'is always supported by the X guide 102 from below.

According to the exposure apparatus 110 according to the second embodiment described above, the same effect as that of the exposure apparatus 10 according to the first embodiment described above can be obtained. In addition to this, according to the exposure apparatus 110, the Z position (vertical position) of the X guide 102 and the Z position of the Y coarse movement stage 23Y partially overlap, so that, for example, a guide member having a wide guide surface The Z-axis direction dimension of the weight canceling device 40'can be shortened as compared with the case where the weight canceling device 40'is mounted on the top. In this case, since the dimensions of the housing 41 and the Z slider 43 in the Z-axis direction can be shortened, the weight canceling device 40'can be reduced in weight. Further, when the weight canceling device 40'is reduced in weight, the actuators (a plurality of linear motors and a plurality of voice coil motors) for driving the fine movement stage 21 can be miniaturized.

Further, since the weight canceling device 40'is vibrationally separated from the coarse movement stage 23, vibration transmission from the coarse movement stage 23 can be completely eliminated, and the control performance is improved. Further, by integrating the weight canceling device 40'and the fine movement stage 21, the structure is simplified, so that the weight can be further reduced, the manufacturing cost is lowered, and the probability of failure is also reduced. Further, since the weight canceling device 40'and the fine movement stage 21 are integrated, the center of gravity position CG of the fine movement stage 21 is lowered, so that even if the substrate holder PH is enlarged, the center of gravity position is prevented from being raised. Can be done.

Further, according to the exposure apparatus 110, since the X guide 102, which is a member extending in the X-axis direction, is supported from below at a plurality of locations by the pair of beds 12, the weight canceling apparatus 40 can be operated by the weight of the X guide 102. The bending caused by the load of the fine movement stage 21 including the fine movement stage 21 is suppressed.

Further, since the weight canceling device 40'is separated from the coarse movement stage 23, the vibration caused by the movement of the weight canceling device 40 is not transmitted to the X guide 102. Therefore, the vibration is not transmitted to, for example, the projection optical system via the X guide 102, the pair of beds 12, the substrate stage mount 19, and the like, and the exposure operation can be performed with high accuracy.

<< Third Embodiment >>
Next, the third embodiment will be described with reference to FIGS. 14 to 16. The substrate stage apparatus PSTb according to the third embodiment has substantially the same configuration as the substrate stage apparatus PSTa (see FIG. 9 and the like) of the second embodiment, except that the driving method of the X guide 102 is different. Therefore, the same or similar reference numerals are used for the same or equivalent components as those in the second embodiment, and the description thereof will be simplified or omitted.

In the second embodiment, the Y carriage 75 is fixed to both side surfaces of the X beam 101, whereas in the third embodiment, as shown in FIG. 15, the Y carriage 75 is described above. Like the exposure apparatus 10, it is fixed to the lower surface of the X beam 101. Therefore, the height of the base frame 14 (the same reference numerals are used for convenience) is lower than that of the second embodiment. As a result, the substrate stage device PSTb can be compactly configured.

Further, while the X guide 102 is electromagnetically driven by the pair of Y linear motors 82 in the first and second embodiments, the X guide 102 is shown in FIG. 14 in the third embodiment. As described above, the X-beam 101 is mechanically connected to the X-beam 101 by a pair of devices called flexure devices 107 via a connecting member 199 in the vicinity of both ends in the longitudinal direction. For ease of understanding, FIG. 14 does not show a pair of plates 76 (see FIG. 9) and a fine movement stage 21 (see FIG. 8) connecting the pair of X beams 101.

Each flexure device 107 includes a thin steel plate extending in the Y-axis direction (for example, a leaf spring) arranged parallel to the XY plane, and the X beam 101 and the X guide via a sliding device such as a ball joint. It is erected between 102 and 102. Each flexure device 107 connects the X beam 101 and the X guide 102 with high rigidity in the Y-axis direction due to the rigidity of the steel plate in the Y-axis direction. Therefore, the X guide 102 moves in the Y-axis direction integrally with the Y coarse movement stage 23Y by being pulled by any of the pair of X beams 101 via the flexure device 107. On the other hand, each flexure device 107 restrains the X guide 102 with respect to the X beam 101 in the five-degree-of-freedom direction excluding the Y-axis direction due to the flexibility (or flexibility) of the steel plate and the action of the sliding device. Therefore, it is difficult for the vibration to be transmitted to the X guide 102 via the X beam 101. Further, the plurality of flexure devices 107 connect the pair of X beams 101 and the X guide 102 in a plane parallel to the XY plane including the position of the center of gravity of the X guide 102. Therefore, when the X guide 102 is towed, the moment in the θx direction does not act on the X guide 102.

In the substrate stage apparatus PSTb according to the third embodiment, in addition to the effects obtained by the substrate stage apparatus PSTa of the second embodiment, the X beam 101 is configured to pull the X guide 102 via the flexure apparatus 107. Therefore, the cost is lower than, for example, when an actuator for driving the X guide 102 is provided. Further, a measurement system (for example, a linear encoder or the like) for obtaining the position information of the X guide 102 is not required. Further, the cost of the X guide 102 can be reduced because the dimensions in the X-axis direction can be shortened as compared with the second embodiment. Further, since the pair of base frames 14 are arranged on both inner sides in the X-axis direction as compared with the second embodiment, the apparatus becomes compact.

Further, since the flexure device 107 has a structure (shape and material) having extremely low rigidity other than the Y-axis direction, vibration due to the transmission of a force other than the Y-axis direction is difficult to be transmitted to the X guide 102, and the controllability of the fine movement stage 21 is improved. good. Even if vibration in the Y-axis direction enters the X guide 102, the X guide 102 and the weight canceling device 40 are provided by the base pad 44, which is a gaseous hydrostatic bearing installed on the lower surface of the weight canceling device 40'. 'Because the horizontal force connection is divided, it does not affect the fine movement stage 21. Further, since the connection of the force in the Y-axis direction is suppressed by the Y linear guide 71A between the X guide 102 and the bed 12 (the force in the Y-axis direction escapes), the bed 12 (device body) may be affected. Absent. Similarly, it goes without saying that the pair of flexure devices 107 may be used to connect the pair of X beams 101 and the X guide 102 of the substrate stage device PST according to the first embodiment described above.

<< Fourth Embodiment >>
Next, the fourth embodiment will be described with reference to FIG. The substrate stage apparatus PSTc according to the fourth embodiment has substantially the same configuration as the substrate stage apparatus PSTa (see FIG. 9 and the like) of the second embodiment, except that the driving method of the X guide 102 is different. Therefore, the same or similar reference numerals are used for the same or equivalent components as those in the second embodiment, and the description thereof will be simplified or omitted.

As shown in FIG. 17, in the substrate stage device PSTc, each of the pair of X beams 101 has two pusher devices 108 separated from each other in the X-axis direction on facing surfaces facing each other. That is, a total of four pusher devices 108 are provided. Each pusher device 108 has a steel ball facing the + Y side surface or the −Y side side surface of the X guide 102. The steel ball is normally separated from the X guide 102, but in the substrate stage device PSTc, when the Y coarse movement stage 23Y is driven in the Y-axis direction, the steel ball is pressed by the pusher device 108, so that the X guide 102 Is pressed, which causes the Y coarse movement stage 23Y and the X guide 102 to move integrally in the Y-axis direction. The pusher device 108 does not necessarily have to be provided on the X beam 101. For example, the pusher device 108 may be installed inside the Y carriage 75 in the X-axis direction and inside the Y-axis direction to push the X guide 102.

Further, in the substrate stage device PSTc, the Y coarse movement stage 23Y is driven in a direction away from the X guide 102 in order to prevent vibration transmission after the X guide 102 is moved by Y steps to a predetermined position, whereby Y The coarse movement stage 23Y and the X guide 102 are oscillatedly separated. As a method of vibratingly separating the Y coarse motion stage 23Y and the X guide 102, for example, the X beam 101 may be slightly driven as appropriate, or the pusher device 108 may be slightly driven in the Y-axis direction (not shown). An actuator such as an air cylinder may be provided. Further, as the pusher device, a spheroid that can rotate about 90 ° around the Z axis or the X axis is provided instead of the steel ball, and the spheroid is appropriately rotated to allow the X guide 102 and the Y coarse. The gap between the moving stage 23Y and the Y-axis direction may be varied (switching between a contact state and a non-contact state depending on the amount of rotation of the spheroid).

In the fourth embodiment, the mechanical connection between the X beam 101 and the X guide 102 is lost during the exposure operation except when the X guide 102 is moved in the cross scan direction, and the disturbance enters the X guide 102. It can be completely prevented. Similarly, in the substrate stage device PST according to the first embodiment described above, it goes without saying that the pusher device 108 may be provided on either of the pair of X beams 101 and the X guide 102.

The configuration of the substrate stage apparatus included in the exposure apparatus of the first to fourth embodiments is an example, and the configuration is not limited thereto. Hereinafter, a modification of the weight canceling device and the leveling device of the substrate stage device will be described. In the following description, only the leveling device and the weight canceling device will be described for the sake of simplification of the description and convenience of illustration, and those having the same configuration as the second embodiment will be described in the second embodiment. The same reference numerals as those of the embodiment are assigned, and the description thereof will be omitted.

<< First variant >>
FIG. 18 shows a weight canceling device 40A and a leveling device 57A included in the substrate stage device according to the first modification. In the first modification, the leveling device 57A and the weight canceling device 40A have the same configuration as that of the second embodiment, but the leveling device 57A supports the weight canceling device 40A from below (that is, the first modification). In the second embodiment, the arrangement of the leveling device 57 and the weight canceling device 40'is interchanged in the vertical direction). Specifically, the lower surface of the housing 41 is connected to the upper surface of the polyhedral member 64. Although omitted in FIG. 18, the upper surface of the Z slider 43 of the weight canceling device 40A is fixed to the fine movement stage 21 via the spacer 51.

In the substrate stage device according to the first modification, by installing the weight canceling device 40A above the leveling device 57A, the number of parts between the polyhedron member 64 and the base pad 44 is reduced as compared with each of the above embodiments. By reducing the weight, the inertial mass of the polyhedron member 64 or less (from the polyhedron member 64 to the base pad 44) during horizontal movement such as during scanning becomes smaller, and the position of the center of gravity thereof becomes the drive point (polyhedron member 64 and air bearing 65). Since it approaches the point where is in contact), the rigidity in the θx and θy directions becomes high (it becomes difficult to swing), so that the controllability is improved.

<< Second variant >>
FIG. 19 shows a weight canceling device 40B and a leveling device 57B included in the substrate stage device according to the second modification. The second modification has the same configuration as the first modification (see FIG. 18) except that the positions of the air spring 42 and the Z slider 43 (including the parallel leaf spring device 48) are exchanged in the vertical direction. Is. In the weight canceling device 40B, the housing 41B is made of a bottomed tubular member having an open lower surface, and the upper surface thereof is integrally fixed to the fine movement stage 21 (not shown in FIG. 19).

In the substrate stage device according to the second modification, in addition to the effect obtained by the substrate stage apparatus according to the first modification, the position of the parallel leaf spring device 48 is lowered, and the position closer to the center of gravity of the weight canceling device 40B. Since it is arranged in, the stability of the exposure operation is improved.

<< Third variant >>
FIG. 20 shows a weight canceling device 40C included in the substrate stage device according to the third modification. The weight canceling device 40C includes a body 41C of a bottomed tubular member having an open upper surface, an air spring 42 housed in the body 41C, a leveling cup 49 connected to the upper surface of the air spring 42, and a plurality of air bearings. It is composed of 65 and a polyhedral member 64 and the like fixed to a fine movement stage 21 (not shown). In the third modification, the Z slider is eliminated, and the lower surface of the leveling cup 49 is directly pushed by the air spring 42 in the Z-axis direction. A plurality of arm members 47 for supporting the target 46 are fixed to the outer wall surface of the body 41C.

The leveling cup 49 also plays the role of the Z slider 43 (see FIG. 13) in the second embodiment and the like, in addition to the same role as the second embodiment and the like. Therefore, a plurality of parallel leaf springs 67e (for example, four evenly in the circumferential direction) are connected to the upper end surface and the lower end surface of the outer peripheral portion of the leveling cup 49 (however, ± The parallel leaf spring 67e arranged on the X side is not shown to avoid complication of the drawings). As a result, the leveling cup 49 is restricted from moving relative to the body 41C in the horizontal direction, and can only slide up and down.

In the substrate stage device according to the third modification, since the Z slider is not required as compared with each of the above embodiments, the structure of the weight canceling device 40C is simpler, and the weight canceling device 40C can be manufactured at low cost.

Further, among the parts that are installed under the polyhedral member 64 and swing (swing) during operation, the parallel leaf spring 67e is used to move the vicinity of the upper and lower end surfaces of the leveling cup 49, which is relatively large and has a large dimension in the Z-axis direction. Since it is connected to the body 41C so that it cannot move relative to the polyhedron member 64 in the horizontal direction, the rigidity of the lower part of the polyhedron member 64 in the θx and θy directions is increased, and the runout of the parts under the polyhedron member 64 due to the inertia during horizontal movement is suppressed. Improves controllability.

Further, due to the action of the parallel leaf spring 67e, the leveling cup 49 moves only in the Z direction while maintaining high straightness with respect to the body 41C, so that the bottom surface of the leveling cup 49 and the upper surface of the air spring 42 (metal plate). ) Does not have to be fixed, and it can be easily assembled and disassembled to improve workability.

Further, the Z-axis direction drive by the air spring 42 and the leveling drive (θx, θy) by the polyhedral member 64 can be controlled independently (does not interfere with each other), so that the controllability is good.

The weight canceling devices 40A to 40C according to each of the above modifications are not limited to the XY 2-axis stage, but are mounted on a 1-axis stage having only the X-axis (or Y-axis) or a Y-coarse stage on the X-coarse stage. It can also be applied to the conventional XY 2-axis stage device.

Further, in the second to fourth embodiments (and each of the above modifications), the Z slider 43 or the leveling cup 49 of the weight canceling device moves only in the Z-axis direction by arranging a plurality of parallel leaf spring devices 48. However, the present invention is not limited to this, and for example, an air bearing or a rolling guide may be used.

Further, in the second to fourth embodiments (and each of the above modifications), the X coarse movement stage 23X is placed on the Y coarse movement stage 23Y, but the present invention is not limited to this, and the weight canceling device is not limited to this. If we focus only on reducing the size of 40 and integrating it with the fine movement stage 21, the coarse movement stage 23 may have the Y coarse movement stage 23Y mounted on the X coarse movement stage 23X as in the conventional device. good. In this case, the weight canceling device 40 steps in the Y-axis direction on a member (temporarily referred to as a Y-guide) in which the X guide 102 used in the present embodiment is arranged so that the Y-axis direction is the longitudinal direction. , The Y guide moves in the X-axis direction, which is the scanning direction.

Further, in the second to fourth embodiments (and each of the above modifications), the X guide 102 is installed on the substrate stage pedestal 19 which is a part of the apparatus main body (body) via the pair of beds 12. However, the present invention is not limited to this, and a plurality of Y linear guides 71A may be directly fixed on the substrate stage pedestal 19 as in the substrate stage apparatus PSTd shown in FIG. As a result, the bed 12 (see FIG. 8) can be omitted, the weight of the entire exposure apparatus can be further reduced, and the overall height (Z-axis direction dimension) can be further reduced. The same applies to the first embodiment.

Further, in each of the first to fourth embodiments (hereinafter, referred to as each embodiment), the X guide 102 is supported from below by the two beds 12, but the number of beds 12 is not limited to this. May be 3 or more. In this case, the number of auxiliary guide frames 103 arranged between the adjacent beds 12 may be increased. Further, when the amount of movement of the substrate P in the X-axis direction is small (or when the substrate P itself is small), one bed 12 may be used. Further, the shape of the bed 12 is set to have a length in the Y-axis direction longer than the length in the X-axis direction, but the length is not limited to this, and the length in the X direction may be longer. Further, the plurality of beds may be separated in the X-axis and / or Y-axis directions.

Further, when the deflection of the X guide 102 is small enough to be ignored, the auxiliary guide frame 103 may not be installed.

Further, in each of the above embodiments, a plurality of Y linear guides 71A are fixed on the pair of beds 12, and the X guides 102 are configured to move in the Y-axis direction along the plurality of Y linear guides 71A. Not limited to this, for example, a plurality of rolling elements such as gaseous hydrostatic bearings or rollers may be provided on the lower surface of the X guide 102 so that the rolling elements can move on the bed 12 with low friction. However, in order to keep the distance between the Y mover 72A and the Y stator 73 constant, it is preferable to provide some device for restricting the movement of the X guide 102 with respect to the pair of beds 12 in the X-axis direction. As a device for restricting the movement of the X guide 102 in the X-axis direction, for example, a gaseous hydrostatic bearing, a mechanical uniaxial guide device, or the like can be used. This eliminates the need for position adjustment work for arranging the plurality of Y linear guides 71A in parallel with each other, and facilitates the assembly of the substrate stage device.

Further, a device (escape device) that allows the X guide 102 and the Y slider 71B to move relative to each other by a minute distance in the X axis direction may be provided between the X guide 102 and the Y slider 71B, for example. In this case, even if the plurality of Y linear guides 71A are not arranged in parallel, the X guide 102 can smoothly move straight in the Y-axis direction on the plurality of Y linear guides 71A. As a device that allows the X guide 102 and the Y slider 71B to move relative to each other in the X-axis direction, for example, a hinge device or the like can be used. A similar relief device may be provided in other linear guide devices. Similarly, a device that allows the pair of X-beams 101 and the Y-carriage 75 to move relative to each other by a minute distance in the X-axis direction may be provided. In this case, even if the pair of base frames 14 are not arranged in parallel, the pair of X beams 101 can be smoothly guided straight in the Y-axis direction.

Further, as shown in FIG. 21 (A), in the first or second embodiment, a pair of Y carriages 83 having XZ cross sections of J-shape and inverted J-shape are provided at both ends of the X guide 102, respectively. It may be attached and the Y mover 72A may be further fixed to each of the Y carriages 83. In this case, the magnetic attraction force between the magnet unit of the Y stator 73 (see FIGS. 1 and 8) and the coil unit of the Y mover 72A acts evenly on the base frame 14, and the base frame 14 Can prevent falling. Further, the thrust for driving the X guide 102 is also improved. In the first and second embodiments, the plurality of linear motors are all of the moving coil type, but the moving magnet type may be used as well. Further, in the embodiment other than the second embodiment, the driving device for driving the Y carriage 75 in the Y-axis direction is not limited to the linear motor, for example, a ball screw type driving device, a belt type driving device, or a rack. An and pinion type drive device or the like may be used.

Further, in the first and second embodiments, the Y stator 73 (see FIGS. 1 and 8) fixed to the base frame 14 drives a Y linear motor and a Y coarse movement stage for driving the X guide 102. Although commonly used for Y linear motors for driving 23Y, each Y linear motor may be configured separately. Further, the Y stator of the Y linear motor for driving the Y coarse movement stage 23Y may be fixed to the auxiliary guide frame 103, and the Y mover may be attached to the auxiliary carriage 78.

Further, in the first and second embodiments, the pair of X beams 101 are mechanically connected at both ends in the X direction by, for example, a plate 76, but the present invention is not limited to this, and the pair is similar to, for example, the X beam 101. It may be connected by a member having a cross-sectional area. Further, the Z-axis dimension of the X guide 102 (guide main body 102a) may be larger than the Z-axis dimension of each of the pair of X beams 101. In this case, the Z-axis dimension of the weight canceling device 40 can be further shortened.

Further, in the first and second embodiments, for example, two (four in total) Y carriages 75 are provided on each of the + X side and the −X side of the Y coarse movement stage 23Y, but the present invention is not limited to this. , Y carriage 75 may be one on each of the + X side and the −X side of the Y coarse movement stage 23Y, for example. In this case, if the length of the Y carriage 75 is made equal to that of the plate 76, the plate 76 becomes unnecessary. The Y carriage in this case is formed with notches into which Y movers 72A attached to both end faces of the X guide 102 in the X-axis direction are inserted.

Further, in each of the above embodiments, the pair of X beams 101 are mechanically connected, but the present invention is not limited to this, and the pair of X beams 101 may be mechanically separated. Even in this case, each of the pair of X beams 101 may be synchronously controlled.

Further, in the fourth embodiment, the X guide 102 is pressed against the X beam 101 via the pusher device 108 in a contact state, but the present invention is not limited to this, and the X guide 102 is pressed against the X beam 101 in a non-contact state. It may be configured to be pressed. For example, as shown in FIG. 21 (B), a thrust type air bearing 109 (air pad) is attached to the X beam 101 (or X guide 102), and the static pressure of the gas ejected from the bearing surface causes non-contact. It is preferable that the X guide 102 is pressed. Alternatively, as shown in FIG. 21 (C), the permanent magnets 100a and 100b (a set of permanent magnets 100) are provided so that the magnetic poles of the portions facing each other are the same for the X beam 101 and the X guide 102, respectively. The X guide 102 may be pressed in a non-contact manner by the repulsive force (repulsive force) generated between the permanent magnets 100a and 100b facing each other. When a set of permanent magnets 100 is used in this way, it is not necessary to supply pressurized gas, electricity, or the like, which simplifies the configuration of the device. The thrust type air bearing 109 and a set of permanent magnets 100 are arranged in the X-axis direction between the X beam 101 and the X guide 102 on the + Y side and between the X beam 101 and the X guide 102 on the −Y side, respectively. It is preferable to provide a plurality (for example, two) apart from each other.

<< Fifth Embodiment >>
Next, a fifth embodiment will be described with reference to FIGS. 23 to 28.

The exposure apparatus according to the fifth embodiment is configured in the same manner as the exposure apparatus 10 of the first embodiment described above, except that the substrate stage apparatus PSTe is provided instead of the substrate stage apparatus PST. There is.

Hereinafter, the substrate stage device PSTe will be mainly described. Here, the same or similar reference numerals are used for the same or equivalent components as the exposure apparatus 10 according to the first embodiment described above, and the description thereof will be simplified or omitted.

In the exposure apparatus according to the fifth embodiment, instead of the substrate stage having the coarse and fine movement configuration described above, as shown in FIGS. 23 and 24, a beam having a length in the Y-axis direction that moves in the X-axis direction ( A so-called gantry type 2-axis stage (board stage) ST equipped with a beam) -shaped X-stage STX and a Y-stage STY that holds a substrate (plate) P on the X-stage STX and moves in the Y-axis direction. The substrate stage apparatus PSTe provided with the above is used. Although not shown, the substrate stage device PST is arranged below (-Z side) the projection optical system PL (not shown in FIGS. 23 and 24, see FIG. 1) in the same manner as the above-mentioned substrate stage device PST. ing.

The substrate stage device PSTe includes a substrate stage ST and a substrate stage drive system PSD (not shown in FIGS. 23 and 24, see FIG. 25) that drives the substrate stage ST. As shown in FIGS. 24 and 25, the substrate stage drive system PSD has a pair of X-axis drive units XD1 and XD2 for driving the X-stage STX in the X-axis direction, and the Y-stage STY on the X-stage STX on the Y-axis. It includes a Y-axis drive unit YD that drives in the direction. The Y stage STY holding the substrate P is driven by the substrate stage drive system PSD in the X-axis direction and the Y-axis direction with predetermined strokes.

More specifically, as shown in FIGS. 23 and 24, the substrate stage device PSTe has a total of six legs 61a to which are installed side by side in the XY two-dimensional direction on the floor surface F of the clean room where the exposure device is installed. A pair (two) X-axis drive units provided on each of the two base blocks 62a and 62b supported by the 61f and the three legs 61a to 61c and 61d to 61f, respectively. XD1, XD2, X-axis drive unit XD1, XD2 driven in the X-axis direction, Y-axis drive unit YD provided on the X-stage STX, and Y-axis drive unit YD in the Y-axis direction. It is equipped with a driven Y stage STY and the like.

As shown in FIG. 23, the legs 61a to 61c are arranged at predetermined intervals in the X-axis direction. Similarly, the legs 61d to 61f are arranged on the + Y side (the back side of the paper surface in FIG. 23) of the legs 61a to 61c, respectively, at predetermined intervals in the X-axis direction. _{Four adjusters 61a 0 to} 61f ₀ are provided on the hem of each of the legs 61a to 61f. As can be seen from FIGS. 23 and 24, for example, the leg portion 61b is provided with _{two adjusters 61b 0 at the hem portion on the ± Y side surface thereof.}

The legs 61a to 61c and 61d to 61f support the base blocks 62a and 62b arranged in parallel with each other at a predetermined distance in the Y-axis direction with the longitudinal direction as the X-axis direction, respectively. The base blocks 62a and 62b are parallel to a plane orthogonal to the earth's axis (direction of gravity) by appropriately adjusting _{the adjusters 61a 0 to} 61f ₀ provided on the legs 61a to 61f using a spirit level, for example. It is supported parallel to the horizontal plane) and at the same height from the floor surface F.

As shown in FIG. 24, the base blocks 62a and 62b are provided with X-axis drive units XD1 and XD2, respectively. The X-axis drive units XD1 and XD2 support the −Y side end and the + Y side end of the X stage STX from below, respectively, and drive the X stage STX in the X-axis direction.

On the other hand (-Y side), the X-axis drive unit XD1 has a plurality of fixing members 63, one movable member 84, and a pair of linears that generate a driving force in the X-axis direction, as shown in FIGS. 23 and 24. Regarding the X-axis directions of the motors XDM1 and XDM2, the pair of guide devices XG1 and XG2 that restrict the movement of the X-stage STX in directions other than the X-axis direction, and the movable member (X-stage STX) with respect to the fixing member 63 (base block 62a). Includes a linear encoder EX1 (see FIG. 25) that measures position.

As shown in FIGS. 23 and 24, a plurality of fixing members 63 (10 each in the present embodiment) are fixed to the ends of the base block 62a on the ± Y side side by side in the X-axis direction. There is. For ease of understanding, in FIG. 23, a part of the plurality of fixing members 63 (including the stator XD12 described later) on the −Y side is not shown or is shown broken. .. Each fixing member 63, -Z end is fixed to the side face of the base block 62a using fasteners (bolts) 63 _0. Here, as shown in FIG. 26, the inner surface surface of each fixing member 63 is inclined inward with respect to the XZ plane by an angle π / 2-θ (forming an angle θ with respect to the XY plane). There is). As a result, the shape of the YZ cross section of the member in which the base block 62a and the fixing member 63 are combined is substantially U-shaped with the + Z side open (however, the distance between the pair of facing surfaces is-on the + Z side (opening side). It is narrower than the Z side).

As shown in FIG. 24, the movable member 84 is made of a prism member having an isosceles trapezoidal YZ cross section, and its upper surface and lower surface are horizontal (parallel to the XY plane) and its longitudinal direction is the movable direction (X). (Axial direction). The movable member 84 has a fixture (bolt) on the lower surface (-Z surface) near the -Y end of the X stage STX via a riser (raising) block 85 having a rectangular YZ cross section fixed to the upper surface thereof. It is attached to a fixed plate 66 fixed by 66 _0.

The movable member 84 is arranged in the space formed by the base block 62a and the fixing member 63. Here, the ± Y side surface of the movable member 84 is inclined at an angle π / 2-θ with respect to the XZ plane (the angle θ is formed with respect to the XY plane). That is, the + Y-side surface of the movable member 84 faces the −Y-side surface of the + Y-side fixing member 63 with a predetermined gap, and the −Y-side surface of the movable member 84 is −. It is parallel to the + Y side surface of the Y side fixing member 63 and faces with a predetermined gap. The movable member 84 has a hollow structure for weight reduction. The ± X end faces of the movable member 84 do not necessarily have to be parallel. Further, the YZ cross section does not necessarily have to be trapezoidal. Further, if the surface on which the movers XD11 and XD21, which will be described later, are fixed is inclined at an angle of π / 2-θ with respect to the XZ surface (Z axis), the corner portion of the movable member 84 may be chamfered. good.

As shown in FIG. 24, the linear motor XDM1 is composed of a mover XD11 and a stator XD12, and the linear motor XDM2 is composed of a mover XD21 and a stator XD22.

As shown in FIG. 24, the pair of stators XD12 and XD22 are fixed to the inner side surface of the fixing member 63 on the ± Y side, respectively, and extend in the X-axis direction as shown in FIG. 23. (In FIG. 23, the stator XD12 is not shown). As shown in FIG. 23, the stators XD12 and XD22 (the stator XD12 is not shown in FIG. 23) are not fixed to the fixing members 63 on the most + X side and the most −X side. The pair of stators XD11 and XD21 are fixed to both side surfaces of the movable member 84 on the ± Y side, respectively, and the stators XD12, XD22 and the Z axis (XZ plane) fixed to the fixing members 63 having both side surfaces facing each other. With respect to the angle θ, they face each other with a slight gap in between.

Although not shown, a plurality of coil units (each including a plurality of coils in which windings are wound around a core (iron core)) are arranged in the X-axis direction inside each of the movers XD11 and XD21. Has been done. Inside each of the stators XD12 and XD22, a plurality of magnet units (each including a plurality of permanent magnets) are arranged in the X-axis direction. In the fifth embodiment, the mover XD11 and the stator XD12 constitute a moving coil type linear motor XDM1, and the mover XD21 and the stator XD22 constitute a moving coil type XDM2.

As shown in FIGS. 23 and 24, the guide device XG1 includes an X-axis linear guide (rail) XGR1 and two sliders XGS1. Similarly, the guide device XG2 includes an X-axis linear guide (rail) XGR2 and two sliders XGS2.

More specifically, the upper surface of the base block 62a is provided with a concave groove having a predetermined depth extending in the X-axis direction, and the X is located at a position approximately the same distance away from the center of the inner bottom surface of the groove in the Y-axis direction on the ± Y side. The X-axis linear guides XGR1 and XGR2 extending in the axial direction are fixed in parallel with each other. The two sliders XGS1 and XGS2 are fixed at positions facing the X-axis linear guides XGR1 and XGR2 on the lower surface of the movable member 84, respectively. Here, the sliders XGS1 and XGS2 have an inverted U-shaped cross section, the two sliders XGS1 on the −Y side engage the X-axis linear guide XGR1, and the two sliders XGS2 on the + Y side are the X-axis linear guide XGR2. Is engaged in. As shown in FIG. 23, stop devices 88 and 89 for preventing overrun of the X stage STX are provided near the ± X ends of the X-axis linear guides XGR1 and XGR2, respectively.

The linear encoder EX1 includes a head EXh1 and a scale EXs1 as shown in FIG. In the scale EXs1, a reflection type diffraction grating having a periodic direction in the X-axis direction is formed on the surface thereof, and is parallel to the X-axis linear guides XGR1 and XGR2 in the center of the inner bottom surface of the concave groove of the base block 62a in the Y-axis direction. It has been extended. The head EXh1 is provided on the lower surface (or the side surface on the + X side (or −X side)) of the movable member 84. The head EXh1 faces the scale EXs1 within the moving stroke of the movable member 84 (X stage STX) in the X-axis direction, irradiates the scale EXs1 with the measurement light, and receives the reflected diffracted light from the scale EXs1 to receive the base. Position information regarding the X-axis direction of the movable member 84 (-Y end of the X stage STX) with respect to the block 62a is measured. The measurement result is transferred to the main control device 50 (see FIG. 25).

On the other hand (+ Y side), the X-axis drive unit XD2 has almost the same configuration as the X-axis drive unit XD1 described above. However, the movable member 84 included in the X-axis drive unit XD2 is the X stage STX the + Y end vicinity of the lower surface fixed plate 66 fixed with the fixture 66 ₀ (-Z plane) above the riser ( It is attached via a parallel leaf spring 86 provided in place of the block 85. The parallel leaf spring 86 is composed of a pair of leaf springs separated by a predetermined distance in the Y-axis direction whose longitudinal direction is the X-axis direction parallel to the XZ plane. The parallel leaf spring 86 allows the fixed plate 66 and the movable member 84 to move relative to each other in a minute stroke in the Y-axis direction. Therefore, even if the parallelism between the base block 62a and the base block 62b is lowered, the guide device XG3 (slider XGS3 and the X-axis linear guide (rail) XGR3) described later is composed of the guide device XG3 (slider XGS3) due to the action of the parallel leaf spring 86. The load on the) is reduced.

Further, as described above, on the upper surface of the fixing member 63, the deformation of the parallel leaf spring 86 that occurs when the fixing plate 66 and the movable member 84 move relative to each other in the Y-axis direction with a minute stroke is allowed, and the upper surface of the fixing member 63 has an upper surface. A cover 87 that closes the opening is attached. Similarly, a cover 87 that allows the riser block 85 to move in the Y-axis direction due to the deformation of the parallel leaf spring 86 and closes the opening on the upper surface is attached to the upper surface of the fixing member 63 on the X-axis drive unit XD1 side. Has been done. With these covers 87, it is possible to prevent the heat generated from the coil units in the pair of movers XD11 and XD21 of each of the X-axis drive units XD2 and XD1 from diffusing to the outside of the X-axis drive units XD2 and XD1.

As shown in FIG. 24, the X-axis drive unit XD2 has one guide device including one X-axis linear guide XGR3 and two sliders XGS3 engaged with the guide devices XG1 and XG2. Only XG3 is provided. The X-axis drive unit XD2 is provided with a linear encoder EX2 composed of a head EXh2 and a scale EXs2, similarly to the linear encoder EX1 described above. The linear encoder EX2 measures the position information of the movable member 84 with respect to the base block 62b in the X-axis direction. The measurement result is transferred to the main control device 50 (see FIG. 25).

Further, as shown in FIG. 23, each of the X-axis drive units XD1 and XD2 has a fan 70A and a fan 70B at an end portion on the −X side and an end portion on the + X side, respectively. The fan 70A is an air supply fan that takes in outside air (air) into the internal space of the X-axis drive unit (the space between the base block (62a or 62b) and the pair of fixing members 63). This is an exhaust fan that exhausts the air that has passed through the internal space of the X-axis drive unit to the outside. These fans 70A and 70B can efficiently cool the coil units in the pair of movers XD11 and XD21 provided in the internal spaces of the X-axis drive units XD1 and XD2, respectively.

Here, loads (and inertial forces associated with their movement) such as the X stage STX and the Y stage STY supported on the X stage STX are applied to the X-axis drive units XD1 and XD2. Further, in the linear motors XDM1 and XDM2 included in the X-axis drive units XD1 and XD2, a magnetic attraction force several times as much as the driving force is generated between each mover and the stator. Here, the magnetic attraction force acting on the mover with respect to the stator acts as a buoyancy (force in the antigravity direction) for the movable member 84. The X-axis drive units XD1 and XD2 use the magnetic attraction force (buoyancy) to substantially cancel the above load, and the X stage STX can be operated without applying a large load (and inertial force) to the guide devices XG1 to XG3. Support and drive. The offset (balance) between the load of the X stage STX and the like in the X-axis drive unit XD1 (XD2) and the magnetic attraction force (buoyancy) from the linear motors XDM1 and XDM2 will be described in detail later.

As shown in FIG. 23, the Y stage STY is supported on the X stage STX via a guide device YG that constitutes a part of the Y axis drive unit YD. The substrate P is held on the Y stage STY.

As shown in FIG. 23, the Y-axis drive unit YD includes a linear motor YDM that generates a driving force in the Y-axis direction, a guide device YG that restricts the movement of the Y stage STY in a direction other than the Y-axis direction, and an X stage. Includes a linear encoder EY (see FIG. 25) that measures the position of the Y stage STY with respect to the STX in the Y-axis direction.

The linear motor YDM includes a mover YD1 and a stator YD2, as shown in FIG. The stator YD2 extends in the Y-axis direction at the center of the upper surface of the X-stage STX in the X-axis direction. The mover YD1 faces the stator YD2 in the Z-axis direction and is fixed to the center of the bottom surface of the Y stage STY in the X-axis direction.

The guide device YG includes a pair of Y-axis linear guide (rail) YGR and four sliders YGS (partially not shown in FIG. 23). Each of the pair of Y-axis linear guides YGR extends in the Y-axis direction in parallel with each other near the ends on the −X side and the + X side of the upper surface of the X stage STX. Each of the four sliders YGS is fixed near the four corners of the lower surface of the Y stage STY. Here, the four sliders YGS have an inverted U-shaped XZ cross section, and two sliders YGS located on the −X side of the four are engaged with the Y-axis linear guide YGR on the −X side on the X stage STX. Together, the two sliders YGS located on the + X side engage the Y-axis linear guide YGR on the + X side (see FIG. 24).

The linear encoder EY (see FIG. 25) is composed of a head and a scale. The scale (not shown) has a reflection type diffraction grating having a periodic direction in the Y-axis direction formed on its surface, and extends in parallel with the Y-axis linear guide YGR on the X stage STX. The head (not shown) is provided on the lower surface (or the side surface on the + Y side (or −Y side)) of the Y stage STY. The head faces the scale within the movement stroke of the Y stage STY in the Y axis direction, irradiates the scale with measurement light, and receives the reflected diffracted light from the scale to receive the reflected diffracted light from the scale. Measure position information about the direction. The measurement result is transferred to the main control device 50 (see FIG. 25).

The position information (including yawing (rotation θz in the θz direction)) of the board stage ST (Y stage STY) in the XY plane is the linear encoders EX1 and EX2 included in each of the above-mentioned X-axis drive units XD1 and XD2. , The encoder system 20 (see FIG. 25) including the linear encoder EY included in the Y-axis drive unit YD constantly measures.

Further, independently of the encoder system 20, the above-mentioned substrate interferometer system 92 of the Y stage STY (board stage ST) via a reflective surface (not shown) provided (or formed) on the Y stage STY. Position information (including θz) in the XY plane and inclination amount information with respect to the Z axis (pitching (rotation amount in the θx direction) and rolling (rotation amount in the θy direction)) are measured. The measurement result of the board interferometer system 92 is supplied to the main control device 50 (see FIG. 25).

The main control device 50 is based on the measurement results of the encoder system 20 and / or the board interferometer system 92, and the board stage drive system PSD (see FIG. 25), more accurately, the X-axis drive units XD1, XD2, and Y. The substrate stage ST (Y stage STY and X stage STX) is driven and controlled via the linear motors XDM1, XDM2, and YDM that form a part of each of the shaft drive units YD.

FIG. 25 shows a block diagram showing an input / output relationship of the main control device 50 that mainly configures the control system of the exposure apparatus according to the fifth embodiment and controls each component in an integrated manner. The main control device 50 includes a workstation (or a microprocessor) and the like, and controls each component of the exposure device in an integrated manner.

Next, the balance between the load of the X stage STX and the like in the above-mentioned X-axis drive unit XD1 (XD2) and the magnetic attraction force (buoyancy) from the linear motors XDM1 and XDM2 will be described. Since the balance between the load and the buoyancy is the same for the X-axis drive unit XD1 and the X-axis drive unit XD2, the X-axis drive unit XD1 will be described below.

As shown in FIG. 26, when the X stage STX (see FIG. 24) is stationary, the movable member 84 of the X-axis drive unit XD1 is vertically downward (the direction indicated by the white arrow) of the X stage STX. , Y stage STY, etc., a load W of about 1/2 of the total weight acts. At the same time, the movable member 84 constitutes the linear motor XDM2 in a direction in which the magnetic attraction force F1 generated between the mover XD11 and the stator XD12 constituting the linear motor XDM1 forms an angle θ with respect to the Z axis. The magnetic attraction force F2 generated between the mover XD21 and the stator XD22 acts in the directions forming an angle −θ with respect to the Z axis. For example, when the Y stage STY is located in the center of the movable range, the movable members 84 of the X-axis drive unit XD1 and the X-axis drive unit XD2 are subjected to the X-stage STX and the Y-stage STY, respectively. The load W, which is about half of the total weight of the above, acts almost evenly, but strictly speaking, the load (load) acting on the movable member 84 in the vertical direction changes depending on the position of the Y stage STY.

Here, it is assumed that the magnetic attraction forces F1 and F2 generated in each of the linear motors XDM1 and XDM2 are equal to each other (that is, F1 = F2 = F). Therefore, the resultant force P = Fz1 + Fz2 (= 2Fcosθ) of the vertical components of the magnetic attraction forces F1 and F2 by the linear motors XDM1 and XDM2 acts on the movable member 84 in the vertical direction upward (the direction indicated by the black arrow). The angle θ of the resultant force P is set so as to be substantially equal to the load W. Therefore, a load (residual force) | WP |, which is much smaller than the load W, acts on the guide devices XG1 and XG2. In the horizontal direction (Y-axis direction), since the horizontal components Fy1 and Fy2 of the magnetic attraction forces F1 and F2 cancel each other out, no resultant force acts on the movable member 84 (zero resultant force acts). Since the guide devices XG1 and XG2 limit the relative movement of the fixed member 63 and the movable member 84 in the Z-axis direction (+ Z direction and −Z direction), the relationship between the resultant force P and the load W is , P <W or P> W.

In the X-axis drive unit XD1 (XD2) having the above configuration, the inclination (inclination angle θ) of the side surfaces of the movable member 84 and the fixing member 63 facing each other is appropriately determined according to the load capacity of the guide devices XG1 and XG2. By utilizing the magnetic attraction forces F1 and F2 of the linear motors XDM1 and XDM2, the load W acting in the vertical direction can be canceled without applying a force in the horizontal direction to the movable member 84.

On the other hand, the magnetic attraction force (-F1) generated by the linear motor XDM1 acts on the fixing member 63 fixed to the −Y side of the base block 62a in the direction θ with respect to the Z axis. This suction force gives a shearing force and a bending moment to the fixing member 63. Similarly, a magnetic attraction force (-F2) generated by the linear motor XDM2 acts on the fixing member 63 fixed to the + Y side of the base block 62a in the direction of −θ with respect to the Z axis. This suction force gives a shearing force and a bending moment to the fixing member 63. Therefore, both fixing members 63 bend inward with respect to the fixed end with the base block 62a, and as a result, the size of the gap between the side surfaces of the fixing member 63 and the movable member 84 facing each other can change.

The change in the size of the gap due to the bending of the fixing member 63 can be suppressed by optimizing the thickness (width in the Y-axis direction) of the fixing member 63.

For example, when the driving force (thrust) of the X stage STX is small and the load W is large with respect to the magnetic attraction forces F1 and F2 (to be exact, the vertical upward resultant force P = 2Fcosθ) (W> P), the inclination angle θ is set. Set small. As a result, the resultant force P, that is, the buoyancy applied to the movable member 84 becomes large, and the load (residual force) | WP | acting on the guide devices XG1 and XG2 becomes small. In this case, since the magnetic attraction force is small, the shearing force and bending moment acting on the fixing member 63 are also small. Therefore, the thickness of the fixing member 63 can be set small.

On the contrary, when the driving force (thrust) of the X stage STX is large and the load W is small with respect to the magnetic attraction forces F1 and F2 (vertically upward resultant force P = 2Fcosθ) (W <P), the inclination angle θ is largely determined. .. As a result, the resultant force P and the load W are balanced. In this case, since the magnetic attraction force is large with respect to the large inclination angle θ, the shearing force and the bending moment acting on the fixing member 63 are large. Therefore, it is necessary to increase the thickness of the fixing member 63.

Next, with reference to FIG. 27, how to obtain the thickness (width in the Y-axis direction) h of the fixing member 63 will be described. As shown in FIG. 27, the widths of the movers XD11, XD21 and the stators XD12, XD22 are s (projected length a in the Y-axis direction a = scosθ), and the gap between the side surfaces of the movable member 84 and the fixing member 63 facing each other. The size is c (projected length d in the Y-axis direction d = csinθ), the length of the fixing member 63 in the X-axis direction is b, and the center of the inner surface of the fixing member 63 from the fixed end (center of the stators XD12 and XD22). The height (distance in the Z-axis direction) of is L = (s / 2) sinθ + α. However, α is a margin dimension. Further, it is assumed that the magnetic attraction force is F1 = F2 = F, that is, the buoyancy acting on the movable member 84 is P = 2 (Fcosθ). When the Young's modulus (longitudinal elastic modulus) and the deflection of the fixing member 63 are expressed as E and w, respectively, the thickness h of the fixing member 63 uses the relational expression of the deflection when a right angle force acts on the tip of the simple cantilever. Therefore, it is obtained as shown in the following equation (1).

なお、Ｘ軸駆動ユニットＸＤ１を小型化（より詳細には、Ｘ軸駆動ユニットＸＤ１のＹ軸方向の幅寸法を短く）するには、a＋ｄ＋ｈが小さくなるように、傾斜角θを定めれば良い。

In order to reduce the size of the X-axis drive unit XD1 (more specifically, to shorten the width dimension of the X-axis drive unit XD1 in the Y-axis direction), the inclination angle θ may be set so that a + d + h becomes small. ..

However, as described above, between the fixed member 63 and the movable member 84, the straightness error (Y translation error and Z translation error) of the movable member 84, the rotation / tilt error, and the reaction force due to the movement of the Y stage STY. Guide devices XG1 and XG2 are provided in order to suppress such factors. Therefore, the load W applied to the movable member 84 does not have to be completely canceled only by the buoyancy P from the linear motors XDM1 and XDM2.

For example, for s = 100 mm, b = 500 mm, c = 50 mm, E = 16000 kgf / mm ² , α = 100 mm, F = 2000 kgf, w = 0.1 mm, W = 800 kgf. The relationship between θ, a, d, h, a + d + h, and buoyancy P (= 2Fcosθ) is obtained as shown in Table 1 below.

From Table 1 above, the angle θ is preferably set to θ = 70 to 85 degrees. The buoyancy P = 1368.13-48.6 kgf with respect to the load W = 800 kgf, that is, the residual force acting on the guide devices XG1 and XG2 is −568.1 to +451.4 kgf, and the load W can be substantially offset. Further, since the residual force can be adjusted to be extremely small, the guide devices XG1 and XG2 can be miniaturized. As a result, the frictional resistance between the X-axis linear guides and the sliders constituting the guide devices XG1 and XG2 is also reduced. That is, the thrust required to drive the movable member 84 (X stage STX) is also reduced, and the movable member 84 can be moved manually, for example, and the work efficiency such as maintenance of the X stage STX is improved. Further, by setting the inclination angle θ to be large, the fixing member 63, that is, the X-axis drive unit XD1 can be miniaturized.

Further, in the X-axis drive units XD1 and XD2 having the above-described configuration, the gap between the movers XD11 and XD21 and the stators XD12 and XD22 can be easily adjusted without using an adjusting plate such as a spacer. Hereinafter, the adjustment procedure will be described with reference to FIG. 28. In the adjustment, the operator first fixes the movable member 84 to the base block 62a using a suitable fixture. Next, the operator attaches the non-magnetic block 69 having a thickness larger than that of the movers XD11 and XD21 by an appropriate gap amount g on both side surfaces of the movable member 84. Then, the operator, the stator XD12, XD22 fixed to the inner surface of the fixing member 63 in a state in contact with the non-magnetic block 69, a fixing member 63 using fasteners (bolts) 63 ₀ Base It is fixed to the block 62a. Here, since the fixing surface (the surface parallel to the XZ plane) is not parallel to the inner surface surface (the surface inclined by ± angle θ with respect to the Z axis) of the fixing member 63, the fixing member 63 is outlined in FIG. The size of the gap can be adjusted by adjusting the fixed position (height) by sliding it in the vertical direction indicated by the arrow. Here, to allow this adjustment, the fixing member 63, a fixture (bolts) 63 ₀ XZ cross-section can slide up and down a long elongated hole in the Z axis direction as compared with a circle is formed.

Next, the operator fixes all the fixing members 63 (excluding the fixing member 63 at the most + X end and the most −X end) to the base block 62a in the same manner while changing the X position of the movable member 84. Finally, the operator replaces the non-magnetic block 69 with the movers XD11 and XD21 in a state where the movable member 84 is retracted to the + X end (or −X end), and then the fixed member 63 at the ± X end. Is fixed to the base block 62a.

As a result, the stators XD12 and XD22 can be firmly fixed to a wide range on the inner surface of the fixing member 63, and the gap between the stators XD11 and XD21 can be easily adjusted. Further, it is economical because the processing accuracy of the structure of the X-axis drive units XD1 and XD2 becomes loose. As a result, it is possible to inexpensively configure the substrate stage device PSTe with high drive accuracy. Further, since the stators XD12 and XD22 (magnet units) are fixed to the inside of the X-axis drive units XD1 and XD2 (inner side surface of the fixing member 63), they are attracted even if the magnetic material is brought close to the outer surface of the fixing member 63. It will never be done.

In the exposure apparatus according to the fifth embodiment configured as described above, although detailed description is omitted, lot processing is performed in the same procedure as the exposure apparatus 10 according to the first embodiment described above. ..

As described above, according to the exposure apparatus according to the fifth embodiment, the first movable unit provided by the pair of X-axis drive units XD1 and XD2 for driving the substrate stage ST (X stage STX) in the X-axis direction, respectively. The attractive force Fz1 acting between the child XD11 and the first stator XD12 and the resultant force P of the vertical component force between the attractive force Fz2 acting between the second mover XD21 and the second stator XD22 are used as the levitation force. The load on the base blocks 62a and 62b including the weight of the substrate stage ST can be reduced, and the drive control of the substrate stage ST (X stage STX) can be performed with high accuracy without impairing the drive performance.

Further, according to the exposure apparatus according to the fifth embodiment, the substrate stage ST holding the substrate P (more accurately, the X stage STX holding the substrate P via the Y stage STY) is subjected to scanning exposure of the substrate P. Since it can sometimes be driven with high precision, it is possible to expose the substrate P with high precision.

In the fifth embodiment, the X-axis drive unit XD1 (XD2) is configured by using the movable member 84 having an isosceles trapezoidal cross section. It is also possible to configure the X-axis drive unit XD1 (XD2) by using a movable member 84 having a trapezoidal cross section that is not an isosceles trapezoid as in the modified example of 2.

FIG. 29 shows the configuration of the X-axis drive unit XD1 (XD2) according to the first modification (however, with respect to the base block 62a, the fixing member 63, and the movable member 84, the fifth embodiment described above is performed for convenience. It has the same code as the form). In the configuration of FIG. 29, the inclination angles of the ± Y side surfaces of the movable member 84 are different from each other (θ ₁ > θ ₂ ). Therefore, the horizontal components of the magnetic attraction forces F1 and F2 of the linear motors XDM1 and XDM2 are not canceled out, and the resultant force Py in the −Y direction acts on the movable member 84.

In the configuration of the X-axis drive unit XD1 (XD2) of FIG. 29, thrust type hydrostatic gas bearing devices XG3a and XG4 are used as guide devices. Guide surfaces XGG3 and XGG4 with high flatness are formed on the inner bottom surface and both side surfaces of the concave groove of the base block 62a (each of the guide surfaces XGG3 and XGG4 is orthogonal to the bottom surface and the side surface of the concave groove 2). Has one guide surface). Air pads XGP3 and XGP4, which are a plurality of hydrostatic gas bearings having bearing surfaces facing the guide surfaces XGG3 and XGG4, are attached to the bottom surface of the movable member 84. The air pads XGP3 and XGP4 eject high-pressure air into a slight gap (bearing gap) between the bearing surface and the guide surfaces XGG3 and XGG4 via a diaphragm (compensation element). Here, each of the air pads XGP3 and XGP4 has the functions of two air pads that limit the pitching motion and the yawing motion of the movable member 84.

In the thrust type hydrostatic gas bearing devices XG3a and XG4, the rigidity of the air film (air pad) in the gap is obtained by applying an external force to the movable member 84 so as to press the bearing surface of the air pads XGP3 and XGP4 against the guide surfaces XGG3 and XGG4. Can be raised. _{Therefore, the inclination angles θ 1} and θ ₂ of the ± Y side surface of the movable member 84 are appropriately determined, and the resultant force Pz of the vertical component and the resultant force Py of the horizontal component of the magnetic attraction forces F1 and F2 of the linear motors XDM1 and XDM2 The rigidity of each air pad can be arbitrarily adjusted by adjusting the vertical load and the horizontal load applied to the air pads XGP3 and XGP4.

_{Further, one of} the air pads XGP3 and XGP4 is adjusted by adjusting the resultant force Py by appropriately determining the inclination angles θ 1 and θ ₂ of the ± Y side surface of the movable member 84 and adjusting the horizontal load applied to the air pads XGP3 and XGP4. The rigidity of one can be made higher than the rigidity of the other. As a result, the movable member 84 can be moved along one of the guide surfaces. Therefore, when the parallelism of the guide surfaces XGG3 and XGG4 formed on both side surfaces of the concave groove is poor, the movable member 84 can be moved along the guide surface facing the air pad having the higher rigidity. Further, when one of the guide surfaces XGG3 and XGG4 formed on both side surfaces of the concave groove is not straight, the movable member 84 is made rigid by increasing the rigidity of the air pad facing the other of the guide surfaces XGG3 and XGG4. The higher air pad can be moved along the opposite guide surface with better straightness.

FIG. 30 shows a second modified configuration of the X-axis drive unit XD1 (XD2) (however, the base block 62a, the fixing member 63, and the movable member 84 are the same as those in the fifth embodiment for convenience. Signed). In the configuration of FIG. 30, the above-mentioned guide surface XGG3 is formed on the bottom surface and the side surface of the concave groove on the −Y side, but on the + Y side of the concave groove, the guide surface XGG4'is formed only on the bottom surface. Is formed. Then, air pads XGP3 and XGP4'having bearing surfaces facing each of the guide surfaces XGG3 and XGG4'are attached to the bottom surface of the movable member 84. In this case as well, the movable member 84 can be moved along the guide surface XGG3 on which the air pad XGP3 faces, as in the first modification.

Since it is generally difficult to form guide surfaces having high flatness on both side surfaces of the concave groove of the base block 62a, the base block 62a is configured by using a plurality of dividing members, and the guide surfaces are formed on both side surfaces of the concave groove. May be provided.

In the fifth embodiment, in each of the linear motors XDM1 and XDM2 included in the two X-axis drive units XD1 and XD2, magnetism is formed between the stator (XD11, XD21) and the mover (XD12, XD22). The case where the suction force works and the vertical component of the suction force is in the direction of pulling up the mover from the stator side has been described. However, the present invention is not limited to this, and for example, in each of the linear motors XDM1 and XDM2 in the fifth embodiment, the positions of the stator (XD11, XD21) and the mover (XD12, XD22) are exchanged. You may. In this case, a magnetic repulsive force (repulsive force) acts between the stators (XD11, XD21) and the movers (XD12, XD22) when the X stage STX is driven in the X-axis direction. The vertical component of the repulsive force (repulsive force) may be in the direction of pushing up the mover from the stator side. Even in such a case, the resultant force of the vertical component of the force acting between the stator (XD11, XD21) and the mover (XD12, XD22) can be used as the levitation force, which is equivalent to the fifth embodiment. The effect of can be obtained. In addition, in addition to or in place of the magnetic force between the stator (XD11, XD21) and the mover (XD12, XD22), another attractive force (for example, vacuum attractive force) or repulsive force (for example, static gas). Pressure, etc.) may be activated at least when the X stage STX is driven in the X-axis direction. Even in such a case, the vertical component of the suction force or the repulsive force can be used as the levitation force.

In the fifth embodiment, the substrate P is placed on the Y stage STY, but the Y stage STY has the same stage apparatus as disclosed in US Patent Application Publication No. 2010/0018950. On the other hand, a fine movement stage that is slightly driven in the direction of 6 degrees of freedom may be provided, and the substrate P may be placed on the fine movement stage. In this case, a weight canceling device as disclosed in US Patent Application Publication No. 2010/0018950 may be provided to support the fine movement stage from below.

In the exposure apparatus according to each of the above embodiments, the illumination light is ultraviolet light such as ArF excimer laser light (wavelength 193 nm), KrF excimer laser light (wavelength 248 _{nm), or vacuum such as F 2} laser light (wavelength 157 nm). It may be ultraviolet light. As the illumination light, for example, single wavelength laser light in the infrared region or visible region oscillated from a DFB semiconductor laser or fiber laser is amplified by a fiber amplifier doped with erbium (or both erbium and itterbium), for example. However, a harmonic whose wavelength is converted to ultraviolet light using a nonlinear optical crystal may be used. Further, a solid-state laser (wavelength: 355 nm, 266 nm) or the like may be used.

Further, in each of the above embodiments, the case where the projection optical system PL is a multi-lens type projection optical system including a plurality of projection optical units has been described, but the number of projection optical units is not limited to this. All you need is more than a book. Further, the projection optical system is not limited to the multi-lens type, and may be, for example, a projection optical system using a large mirror of the Offner type.

Further, in the exposure apparatus according to each of the above embodiments, the projection optical system may be not only a 1x system but also a reduction system and an enlargement system, and may be a reflection / refraction system, a reflection system and a refraction system. Either is fine. Further, the projected image may be either an inverted image or an upright image.

In the above embodiment, a light-transmitting mask in which a predetermined light-shielding pattern (or phase pattern / dimming pattern) is formed on a light-transmitting mask substrate is used. Instead of this mask, for example, a US patent As disclosed in No. 6,778,257, an electronic mask (variable molding mask) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on the electronic data of the pattern to be exposed, for example. A variable molding mask using a DMD (Digital Micro-mirror Device), which is a kind of non-emission type image display element (also called a spatial light modulator), may be used.

The exposure apparatus according to each of the above embodiments is a substrate having a size (including at least one of an outer diameter, a diagonal line, and one side) of 500 mm or more, for example, a large substrate for a flat panel display (FPD) such as a liquid crystal display element. It is particularly effective to apply it to an exposure apparatus for exposure.

Further, each of the above embodiments can also be applied to a step-and-stitch type exposure apparatus. Further, in particular, the fifth embodiment can be applied to, for example, a static exposure apparatus.

Further, the application of the exposure apparatus is not limited to the exposure apparatus for liquid crystal that transfers the liquid crystal display element pattern to a square glass plate, for example, an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, a DNA chip, and the like. It can be widely applied to an exposure apparatus for manufacturing. Further, in order to manufacture masks or reticle used not only in microdevices such as semiconductor elements but also in optical exposure equipment, EUV exposure equipment, X-ray exposure equipment, electron beam exposure equipment, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern to a wafer. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or a mask blank. When the object to be exposed is a substrate for a flat panel display, the thickness of the substrate is not particularly limited, and for example, a film-like (flexible sheet-like member) is also included.

It should be noted that the disclosures of all the gazettes, international publications, US patent application publication specifications, and US patent specifications cited in the above description are incorporated as a part of the description of this specification.

<< Device manufacturing method >>
Next, a method for manufacturing a microdevice using the exposure apparatus according to each of the above embodiments in the lithography process will be described. In the exposure apparatus according to each of the above embodiments, a liquid crystal display element as a microdevice can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate).

<Pattern formation process>
First, a so-called optical lithography step of forming a pattern image on a photosensitive substrate (such as a glass substrate coated with a resist) is executed using the exposure apparatus according to each of the above embodiments. By this optical lithography process, a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate. After that, the exposed substrate undergoes each step such as a developing step, an etching step, and a resist peeling step, so that a predetermined pattern is formed on the substrate.

<Color filter forming process>
Next, a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix, or a set of filters having three stripes of R, G, and B. A color filter arranged in the direction of a plurality of horizontal scanning lines is formed.

<Cell assembly process>
Next, a liquid crystal panel (liquid crystal cell) is assembled using a substrate having a predetermined pattern obtained in the pattern forming step, a color filter obtained in the color filter forming step, and the like. For example, a liquid crystal panel (liquid crystal cell) is manufactured by injecting liquid crystal between a substrate having a predetermined pattern obtained in the pattern forming step and a color filter obtained in the color filter forming step.

<Module assembly process>
After that, each component such as an electric circuit and a backlight for displaying the assembled liquid crystal panel (liquid crystal cell) is attached to complete the liquid crystal display element.
In this case, in the pattern forming step, the plate is exposed with high throughput and high accuracy by using the exposure apparatus according to each of the above embodiments, and as a result, the productivity of the liquid crystal display element can be improved.

As described above, the exposure apparatus of the present invention is suitable for moving an object to be exposed with a predetermined stroke in the scanning direction with respect to an energy beam for exposure during an exposure process. Further, the method for manufacturing a flat panel display of the present invention is suitable for manufacturing a flat panel display. Moreover, the device manufacturing method of the present invention is suitable for the production of microdevices.

Claims (16)

An exposure apparatus that exposes an object to be exposed while moving in the first direction.
An object holding member that holds the object and
A support member that supports the object holding member from below, and
A support device that supports the object holding member from below, and a support device that supports the support member from below.
A base portion that supports the support device and
A first drive unit that moves the support member in the first direction with respect to the support device while the support member supports the object holding member.
A second drive unit that moves the support device and the support member on the support device in a second direction intersecting the first direction, and
It has a first component that is a mover provided on the object holding member and a second component that is a stator provided on the first drive unit, and is interposed via the first component and the second component. A third drive unit, which is a linear motor that moves the object holding member relative to the first drive unit in the first direction and the second direction.
An exposure apparatus including a base member that is arranged apart from the base portion that supports the support device in the first direction and supports the second drive portion. The exposure device according to claim 1, wherein the second drive unit moves the first drive unit together with the support device in the second direction. A connecting device for connecting the second drive unit and the support device is provided.
The exposure device according to claim 1 or 2, wherein the support device is moved in the second direction by the second drive unit via the connection device. The exposure apparatus according to claim 3, wherein the connecting device has a rigidity lower in the other direction than the rigidity in the second direction. A connecting portion for connecting the first driving portion and the supporting member is provided.
The exposure device according to claim 1 or 2, wherein the first driving unit drives the support member on the support device in the first direction via the connecting portion. The exposure apparatus according to any one of claims 1 to 5, wherein the base portion has a first base and a second base that support different parts of the support device from below in the first direction. The exposure device according to claim 6, wherein the second drive unit drives the support device in the second direction with respect to the base. The first base and the second base are arranged apart from each other in the first direction.
The exposure apparatus according to claim 6 or 7, wherein the base portion supports the support device in a state of being passed between the first base and the second base. The exposure device according to any one of claims 1 to 8, wherein the second drive unit is arranged on both sides of the support device in the second direction. The exposure apparatus according to any one of claims 1 to 9, wherein the support member is supported so as to be movable relative to the support device in the second direction. The exposure apparatus according to any one of claims 1 to 10, further comprising a limiting portion that limits a range in which the support member and the support device can move relative to each other. The exposure device according to any one of claims 1 to 11, wherein the support device supports the support member in a non-contact manner. The exposure apparatus according to any one of claims 1 to 12, wherein the object is a substrate used for manufacturing a flat panel display. The exposure apparatus according to any one of claims 1 to 12, wherein the object is a substrate having a size of 500 mm or more. To expose the substrate by using the exposure apparatus according to claim 14.
A method for manufacturing a flat panel display, comprising developing the exposed substrate. Exposing an object using the exposure apparatus according to any one of claims 1 to 14.
A device manufacturing method comprising developing the exposed object.

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