WO2010044267A1

WO2010044267A1 - Moving body apparatus, exposure apparatus, device manufacturing method, assembling method and maintaining method for moving body apparatus, and adjusting method, maintaining method, and assembling method for exposure apparatus

Info

Publication number: WO2010044267A1
Application number: PCT/JP2009/005376
Authority: WO
Inventors: 青木保夫
Original assignee: 株式会社ニコン
Priority date: 2008-10-15
Filing date: 2009-10-15
Publication date: 2010-04-22
Also published as: KR20110084913A; JP5316820B2; TW201019052A; JPWO2010044267A1; TWI521311B; KR101670673B1

Abstract

A fine movement stage (21) is rockably supported on a dead weight cancelling apparatus (27) by a leveling apparatus (76). Rocking of the fine movement stage (21) is mechanically limited by a leveling lock apparatus (60) for pressing a roller provided to a leveling cup of the leveling apparatus (76), where the pressing of the roller is performed through a polyhedron member and an air cylinder by means of a pressing section provided to the fine movement stage (21). Rocking of the fine movement stage (21) is mechanically limited also by a jack stopper apparatus (100) bridged between the fine movement stage (21) and a Y coarse movement stage (23Y). Accordingly, the attitude of the rockably supported fine movement stage can be stabilized when a moving body apparatus is not being operated.

Description

MOBILE DEVICE, EXPOSURE DEVICE, DEVICE MANUFACTURING METHOD, MOBILE DEVICE ASSEMBLY METHOD AND MAINTENANCE METHOD, AND EXPOSURE DEVICE ADJUSTMENT METHOD, MAINTENANCE METHOD, AND ASSEMBLY METHOD

The present invention relates to a mobile device, an exposure apparatus, a device manufacturing method, a mobile device assembly method and a maintenance method, and an exposure apparatus adjustment method, a maintenance method and an assembly method, and more particularly, to a predetermined two-dimensional plane. Mobile device including moving body moving along, exposure apparatus including the mobile device, device manufacturing method using the exposure device, assembly method and maintenance method of the mobile device, adjustment method of the exposure device, and maintenance The present invention relates to a method and an assembly method.

Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a step-and-repeat type projection exposure apparatus (so-called stepper) or step-and- A scanning projection exposure apparatus (a so-called scanning stepper (also called a scanner)) or the like is used.

However, in recent years, substrates that are exposure objects of exposure apparatuses (particularly glass substrates used for display panels of display devices) tend to be larger, and even in this type of exposure apparatus, a substrate that holds the substrate. As the stage becomes larger and the weight increases, it is difficult to control the position of the substrate. As an exposure apparatus that solves such a problem, an exposure apparatus that supports the self-weight of a substrate stage with a self-weight canceling apparatus that is formed of a single columnar member has been developed (for example, see Patent Document 1).

On the other hand, the exposure apparatus disclosed in Patent Document 1 is configured to support the substrate stage in a swingable manner using a single weight canceling device, which is advantageous for controlling the position of the substrate stage, At the time of maintenance of the exposure apparatus, the posture of the substrate stage is not stable.

Further, in the exposure apparatus disclosed in Patent Document 1, since the substrate stage is supported in a non-contact manner on the surface plate via the self-weight canceling apparatus, for example, when the exposure apparatus is urgently stopped while the substrate stage is being driven. The substrate stage continues to move further due to inertia. Therefore, in the exposure apparatus, it is desirable to provide a stopper device that mechanically determines the movement limit position of the substrate stage. However, when the movement of the substrate stage is mechanically limited by the stopper device, the posture of the substrate stage may change due to an impact when the movement is stopped.

Further, in the exposure apparatus disclosed in Patent Document 1, since the self-weight canceling apparatus is housed in a space formed inside the stage apparatus, when performing maintenance of the self-weight canceling apparatus, the entire stage apparatus is used. It must be disassembled and the work is complicated.

Furthermore, recently, it is desired to develop an exposure apparatus that can control the position of the substrate with higher accuracy.

International Publication No. 2008/129762

The present invention has been made under the circumstances described above. From a first viewpoint, the present invention is a movable body that moves along a predetermined two-dimensional plane parallel to the horizontal plane; and the movable body is swingable from below. A leveling device to support; a self-weight support device for supporting the weight of the movable body via the leveling device; and a movable member provided on one of the movable body and the leveling device, the movable member being moved And a locking device that mechanically restricts swinging of the moving body by being brought into contact with the other of the body and the leveling device.

According to this, the movable body supported to be swingable by the leveling device is supported by its own weight support device through the leveling device, and its swing is mechanically limited by the lock device. In this locking device, the movable member provided in one of the moving body and the leveling device is brought into contact with the other of the moving body and the leveling device to limit the function of the leveling device, so that the moving body can be reliably swung. Can be limited.

From a second aspect, the present invention provides a moving body that moves along a predetermined two-dimensional plane parallel to a horizontal plane; a leveling device that supports the moving body in a swingable manner from below; and via the leveling device. A weight supporting device that supports the weight of the moving body; a first member that is fixed to the moving body and includes a first engaging portion; and a facing member that is disposed to face the lower surface of the moving body. And a second member including a second engagement portion engageable with the first engagement portion, and engaging the first and second engagement portions to face the movable body. And a stopper device that mechanically restricts relative movement of the member in a direction approaching each other at least.

According to this, the movable body that is swingably supported by the leveling device is supported by the self-weight support device via the leveling device, and at least approaches the opposing member by the stopper device. By restricting the relative movement, the swinging is restricted. Here, since the stopper device is configured to engage the first member fixed to the moving body and the second member fixed to the facing member, the moving body does not support the moving body by the self-weight support device. Can be stably supported by the opposing member.

According to a third aspect of the present invention, there is provided either of the first and second moving body devices of the present invention in which an object is placed on the moving body; A pattern forming apparatus for forming a pattern; and a first exposure apparatus.

According to a fourth aspect of the present invention, there is provided a first moving body that moves along a predetermined two-dimensional plane that includes at least first and second axes orthogonal to each other and is parallel to a horizontal plane; A second moving body that is movable upward in a plane parallel to at least the two-dimensional plane with respect to the first moving body; supporting the weight of the second moving body from below; and together with the first moving body, A self-weight support device that moves along a two-dimensional plane; and a part of the second movable body is part of the first movable body on a plane parallel to the two-dimensional plane including the center of gravity of the second movable body. And a setting device that mechanically sets a movement limit position of the second moving body with respect to the first moving body with respect to at least one of the first and second axial directions. It is a mobile device.

According to this, the second moving body whose own weight is supported by the own weight support device can move in a plane parallel to the predetermined two-dimensional plane with respect to the first moving body, and the movement limit position is set. Set mechanically by the device. Further, since the setting device causes a part of the second moving body to abut on a part of the first moving body on a plane parallel to the two-dimensional plane including the position of the center of gravity of the second moving body, the second moving body When the movement is restricted, moments around the first axis and the second axis are not generated in the second moving body. Therefore, the posture of the moving body is stabilized.

According to a fifth aspect of the present invention, there is provided a third moving body device according to the present invention in which an object is placed on the second moving body; and a predetermined pattern is formed by irradiating the object with an energy beam. A second exposure apparatus comprising: a pattern forming apparatus that performs:

From a sixth aspect, the present invention provides a first moving body that moves along a predetermined two-dimensional plane parallel to a horizontal plane; a self-weight support device that supports the weight of the first moving body from below; A second moving body that is movable along a plane parallel to the dimension plane, has a notch formed in at least a part of the outer peripheral edge thereof, and has the self-weight support device disposed in the notch. 4 is a mobile device.

According to this, since the self-weight support device is disposed in the notch formed in the outer peripheral edge portion of the second moving body, maintenance can be easily performed through the notch.

From a seventh aspect, the present invention includes: a first moving body movable along a predetermined two-dimensional plane parallel to a horizontal plane; and a fixing member fixed to the first moving body, wherein the first movement A self-weight support device that supports the self-weight of the body from below on a base parallel to the two-dimensional plane; and the combined gravity center position in the direction perpendicular to the two-dimensional plane of the first moving body and the fixed member. And a drive system that includes an actuator that generates a driving force in a plane parallel to the two-dimensional plane, and that drives the first moving body in a plane parallel to the two-dimensional plane.

According to this, the first moving body whose own weight is supported on the base by the own weight support device is driven along a predetermined two-dimensional plane by the drive system. And the synthetic | combination gravity center position of the fixing member which is a part of self-weight support apparatus, and a 1st mobile body becomes a base side rather than the gravity center position of a 1st mobile body single-piece | unit. Therefore, the center of gravity of the first moving body can be easily driven by the drive system, and the position control of the first moving body can be performed with high accuracy.

According to an eighth aspect of the present invention, any of the fourth and fifth movable body devices of the present invention in which an object is placed on the movable body; the object placed on the movable body; And a patterning device that irradiates the energy beam.

According to a ninth aspect of the present invention, there is provided a device manufacturing method comprising: exposing an object using any one of the first to third exposure apparatuses of the present invention; and developing the exposed object. Is the method.

According to a tenth aspect of the present invention, a movable body movable in a direction parallel to and intersecting a predetermined two-dimensional plane parallel to a horizontal plane is positioned at a predetermined measurement position; A stopper device that mechanically restricts the movement of the moving body by engaging a first member that is fixed and a second member that is fixed to the facing member that is disposed to face the lower surface of the moving body. And fixing the at least one of the first and second members to the corresponding moving body or the opposing member in a state where the moving body is positioned at the measurement position. It is an assembly method.

According to this, when the first member and the second member of the stopper device are engaged, the movement of the moving body in the direction parallel to and intersecting the predetermined two-dimensional plane parallel to the horizontal plane is mechanically limited. Is done. Here, since the first and second members are fixed in a state where the moving body is positioned at the measurement position, the moving body can be easily brought into the measurement position by engaging the first member and the second member. Can be positioned.

According to an eleventh aspect of the present invention, a cutout in which at least a part of the outer peripheral edge extends in the first axial direction in a predetermined two-dimensional plane parallel to the horizontal plane and opens on one side in the first axial direction. And driving the second moving body in which the own weight supporting device for supporting the own weight of the first moving body from below is disposed in the notch to the vicinity of a predetermined position on the other side in the first axial direction. Removing a connecting member provided between a pair of opposing surfaces that divides the notch from the second moving body; a first member provided on the first moving body; and the second moving body Supporting the first moving body on the second moving body by a stopper device that mechanically restricts the movement of the first moving body by engaging the second member provided on the second member; Separating the self-weight support device from the first moving body; Releasing the connection between the holding device and the second moving body and separating them; and moving the self-weight support device to one side in the first axial direction to move the inside of the notch of the second moving body. A moving body device maintenance method comprising: allowing the second moving body to leave the second moving body by passing it through.

According to this, since the self-weight support device can be easily detached from the first moving body and the second moving body, the efficiency of the maintenance work can be improved.

According to a twelfth aspect of the present invention, a first moving body that holds an object and moves along a predetermined two-dimensional plane parallel to a horizontal plane, and supports the first moving body so as to be swingable from below. An exposure comprising: a leveling device; and a self-weight support device that is provided on a second moving body arranged to face the lower surface of the first moving body and supports the weight of the moving body via the leveling device. An apparatus maintenance method, wherein the swinging of the movable body is mechanically limited by a lock device.

According to this, since the swinging of the moving body supported by the leveling device is mechanically limited by the locking device, the swinging of the moving body can be surely limited, and thus the maintenance work can be performed. It is possible to improve the performance.

From a thirteenth aspect, the present invention supports a first moving body that holds an object and moves along a predetermined two-dimensional plane parallel to a horizontal plane, and supports the first moving body in a freely swingable manner from below. A leveling device, and a self-weight support device that is provided on a second moving body arranged to face the lower surface of the first moving body and supports the self-weight of the first moving body via the leveling device. A method for adjusting an exposure apparatus, comprising: mechanically limiting a relative movement of at least the first moving body and the second moving body in a direction approaching each other by a stopper device. is there.

According to this, the relative movement in the direction in which the first moving body and the second moving body are close to each other is mechanically limited by the stopper device, and the first moving body is not supported by the self-weight support device. The first moving body can be stably supported by the second moving body. Therefore, it is possible to improve workability during adjustment.

Here, the adjustment of the exposure apparatus is performed at any time during maintenance of the exposure apparatus or when the exposure apparatus is assembled (including initial assembly and reassembly).

Therefore, from another viewpoint, the present invention provides an exposure apparatus maintenance method that includes executing the exposure apparatus adjustment method of the present invention or an exposure apparatus that includes executing the exposure apparatus adjustment method of the present invention. It can be said that it is an assembly method.

It is a figure which shows schematic structure of the liquid-crystal exposure apparatus which concerns on 1st Embodiment. It is a perspective view which shows the structure of the stage apparatus which the liquid-crystal exposure apparatus of FIG. 1 has. It is the top view which looked at the X coarse movement stage and the Y coarse movement stage which comprise the stage apparatus of FIG. 2 from the Z-axis direction. It is sectional drawing which shows schematic structure of the dead weight cancellation apparatus. It is a figure which shows the structure of the flexure which connects a dead weight cancellation apparatus and a Y coarse movement stage. 6A is a plan view of the leveling device viewed from the Z-axis direction, and FIG. 6B is a cross-sectional view taken along line BB of FIG. 6A. FIGS. 7A to 7C are diagrams for explaining a procedure for locking the fine movement stage using the leveling lock device. FIG. 8A and FIG. 8B are diagrams showing a protection mechanism of the leveling device. It is a perspective view which shows the structure of a gravity center stopper apparatus. FIG. 10A is a plan view of the gravity center stopper device viewed from the Z-axis direction, and FIG. 10B is a side view of the gravity center stopper device viewed from the Y-axis direction. It is a figure for demonstrating the arrangement position of a gravity center stopper apparatus. It is a figure for demonstrating arrangement | positioning of a jack stopper apparatus and a positioning device. FIG. 13A to FIG. 13D are diagrams for explaining the configuration and use procedure of the jack stopper device. FIG. 14A is a diagram illustrating a state in which the expansion / contraction portion of the positioning device is extended, and FIG. 14B is a diagram illustrating a state in which the expansion / contraction portion of the positioning device is contracted. FIGS. 15A to 15C are diagrams for explaining the procedure for removing the self-weight canceling device. It is a disassembled perspective view which shows the structure of the stage apparatus which concerns on 2nd Embodiment. It is a figure for demonstrating the arrangement | positioning relationship between the gravity center position of a fine movement stage, and XY drive VCM. It is a figure which shows schematic structure of the self-weight canceller which concerns on 2nd Embodiment. It is a perspective view which shows the leveling pad of a self-weight canceller and a leveling apparatus. It is a figure for demonstrating the force which lifts the fine movement stage etc. of a leveling apparatus. FIG. 21A and FIG. 21B are diagrams for explaining conditions under which the polyhedral member does not come off the leveling pad. It is a flowchart for demonstrating the method to manufacture a liquid crystal display element.

<< First Embodiment >>
A first embodiment of the present invention will be described below with reference to FIGS. 1 to 15C.

FIG. 1 shows a schematic configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan projection exposure apparatus, a so-called scanner.

As shown in FIG. 1, the liquid crystal exposure apparatus 10 includes an illumination system IOP, a mask stage MST that holds a mask M, a projection optical system PL, a stage apparatus 11 that holds the substrate P movably along the XY plane, and It includes a mask stage MST, a projection optical system PL, a body BD on which a stage device 11 and the like are mounted, and a control system thereof. In the following, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL is defined as the Y-axis direction, and the direction orthogonal to this in the horizontal plane is orthogonal to the X-axis direction, X-axis direction, and Y-axis direction. In the following description, it is assumed that the direction of rotation is the Z-axis direction, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis are θx, θy, and θz directions, respectively.

The illumination system IOP includes an illumination system disclosed in, for example, US Pat. No. 5,729,331, US Pat. No. 6,288,772, and US Patent Application Publication No. 2001/0033490. It is constituted similarly. That is, the illumination system IOP emits coherent exposure illumination light (illumination light) IL such as laser light toward the mask M. The wavelength of the illumination light IL is, for example, 365 nm (i line).

The body BD is supported at a plurality of points (for example, four points) by a plurality of (for example, four) vibration isolation mechanisms 34 (for example, a vibration isolation mechanism on the back side of the paper is not shown) installed on the floor surface F. A lens barrel fixed horizontally supported on the substrate stage frame 33 and a plurality of (for example, four) support members 32 (however, the support member 32 on the back side of the drawing is not shown) on the substrate stage frame 33. The board 31 is included. On the upper surface of the substrate stage pedestal 33, the stage base 12 is installed.

A mask M having a circuit pattern or the like formed on its pattern surface (the lower surface in FIG. 1) is fixed to the mask stage MST by, for example, vacuum suction. The mask stage MST is supported on the upper surface of the lens barrel base plate 31 in a non-contact state via an air pad (not shown) on a pair of convex portions 31a having a longitudinal direction in the Y-axis direction that is arranged at a predetermined interval with respect to the X-axis direction. Has been. The pair of convex portions 31 a are integrally provided on the lens barrel base plate 31. The mask stage MST is defined in a predetermined scanning direction (here, the Y-axis direction orthogonal to the paper surface in FIG. 1) by a mask stage drive system (not shown) including, for example, a linear motor or the like with reference to the upper surface of the convex portion 31a. Can be driven at a scanning speed specified in (2), and can be driven minutely in the XY plane.

The position (including the position in the θz direction (θz rotation)) of the mask stage MST in the XY plane is fixed (or formed) on the mask stage MST by a mask laser interferometer (hereinafter referred to as “mask interferometer”) 41. It is always detected with a resolution of, for example, about 0.5 to 1 nm through a reflecting surface (not shown). The measurement value of the mask interferometer 41 is sent to a control device (not shown), and the control device uses the measurement value of the mask interferometer 41 and the X-axis direction and the Y-axis direction of the mask stage MST via the mask stage drive system. And the position (and velocity) in the θz direction are controlled.

Projection optical system PL is arranged below mask stage MST in FIG. The projection optical system PL of this embodiment has the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system PL includes a plurality of projection optical modules arranged in a staggered manner, and functions in the same manner as a projection optical system having a single rectangular image field whose longitudinal direction is the X-axis direction. In the present embodiment, as each of the plurality of projection optical modules, for example, one that forms an erect image with a double-sided telecentric equal magnification system is used.

For this reason, when a plurality of illumination areas on the mask M are illuminated by the illumination light IL from the illumination system IOP, the illumination light IL that has passed through the mask M causes the mask M in each illumination area to pass through the projection optical system PL. Illuminated light IL conjugated to the illumination area on the substrate P on which a resist (sensitive agent) is applied is disposed on the image plane side of the projection optical system PL. Are formed in the irradiation region (exposure region). Then, by synchronous driving of the mask stage MST and the substrate stage PST, the mask M is relatively moved in the scanning direction (Y-axis direction) with respect to the plurality of illumination regions (illumination light IL), and the plurality of exposure regions (illumination light). IL), the substrate P is moved relative to the scanning direction (Y-axis direction), thereby performing scanning exposure of one shot area (partition area) on the substrate P, and the pattern of the mask M is formed in the shot area. Transcribed. That is, in this embodiment, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the pattern is formed on the substrate P by exposure of the photosensitive layer (resist layer) on the substrate by the illumination light IL. Is formed.

The stage device 11 is arranged on the substrate stage frame 33, holds the substrate P, moves the substrate stage PST in the XY plane, and the weight of the fine movement stage 21 that is a part of the substrate stage PST above the stage base 12. A self-weight cancel device (also referred to as “center pillar”) 27 that supports non-contact and a leveling device 76 that supports the fine movement stage 21 on the self-weight cancel device 27 so as to be swingable with respect to a horizontal plane (XY plane) (not shown in FIG. 1). (See Fig. 4).

The substrate stage PST is arranged above the X coarse movement stage 23X arranged above the stage base 12, the Y coarse movement stage 23Y arranged above the X coarse movement stage 23X, and the Y coarse movement stage 23Y. And a fine movement stage 21 having in part a substrate table 22A to be held.

Hereinafter, each part constituting the substrate stage PST will be specifically described. FIG. 2 is an exploded perspective view of the substrate stage PST from which the substrate table 22A, the self-weight canceling device 27, and the leveling device 76 are removed. FIG. 3 is a plan view of the X coarse movement stage 23X and the Y coarse movement stage 23Y that respectively constitute part of the substrate stage PST when viewed from the + Z direction.

As shown in FIG. 2, the X coarse movement stage 23 X is composed of a frame-shaped member having a rectangular outer shape whose longitudinal direction is the Y-axis direction when viewed in plan (viewed from the Z-axis direction). The rectangular opening 23Xa having the longitudinal direction in the Y-axis direction is formed so as to penetrate in the Z-axis direction. The X coarse movement stage 23X is arranged in parallel with each other at a predetermined interval in the Y-axis direction, and a guide member 135 including a rolling guide (not shown) in a pair (a pair) of X guides 61X whose longitudinal direction is the X-axis direction. Is supported through. Each of the set of X guides 61X is supported on the floor surface F via a plurality of support legs 137 (see FIG. 1). The X coarse movement stage 23X is driven in the X-axis direction on a set of X guides 61X by an X drive system including a linear motor (not shown).

As shown in FIG. 2, the Y coarse movement stage 23Y is composed of a rectangular parallelepiped member disposed above the X coarse movement stage 23X. The Y coarse movement stage 23Y includes a rolling guide (not shown) in a pair (a pair) of Y guides 61Y extending in the Y-axis direction and fixed to the + X and −X side ends of the upper surface of the X coarse movement stage 23X. It is supported via a guide member 133. The Y coarse movement stage 23Y is driven in the Y-axis direction on a set of Y guides 61Y by a Y drive system including a linear motor (not shown). Note that the drive system for driving the X coarse movement stage 23X and the Y coarse movement stage 23Y in the X-axis direction and the Y-axis direction, respectively, may be another system such as a drive system using a feed screw or a belt drive system. .

As shown in FIGS. 2 and 3, the Y coarse movement stage 23Y is formed with a cutout 23Ya parallel to the Y axis from the + Y side end portion to the center portion thereof, and is substantially U-shaped in plan view. , A first connecting member 25 that spans between a pair of opposing surfaces that define the notch 23Ya (forms a part of the notch 23Ya), and the −Y side from the first connecting member 25 On the (center side of the Y coarse movement stage 23Y), similarly to the first connection member 25, a second connection member 26 is provided between a pair of opposed surfaces that define the notch 23Ya. The first and second connecting

members

25 and 26 are detachably attached to the main body 24 via bolts (not shown), for example. The + Y side end surface of the first connecting member 25 is substantially flush with the + Y side end surface of the main body 24. The first connecting member 25 is a member functioning as a stiffening member for ensuring the rigidity of the main body 24, and the second connecting member 26 is a rough Y-shaped member via a flexure 89 (see FIG. 3) described later. This is a member for connecting the moving stage 23Y and the dead weight canceling device 27. Further, as shown in FIG. 3, the self-weight canceling device 27 is arranged in the space on the −Y side from the second connecting member 26 (substantially the center of the Y coarse movement stage 23Y) in the notch 23Ya. . The cutout 23 Ya is formed with a width that allows the self-weight canceling device 27 to pass (allow passage).

As shown in FIG. 1, fine movement stage 21 is arranged above Y coarse movement stage 23Y (+ Z side). The fine movement stage 21 includes a substrate table 22A and a stage main body 22B that supports the substrate table 22A from below. The substrate table 22A is made of a rectangular plate-like member, and a vacuum suction mechanism (or a substrate holder) (not shown) for sucking and holding the substrate P is provided on the upper surface thereof.

As shown in FIG. 2, the stage main body 22B is formed of a rectangular parallelepiped member in a plan view, and movable mirrors (bar mirrors) 17X and 17Y are attached to the −X side and + Y side surfaces, respectively. It is attached via

members

24X and 24Y. Position information of the fine movement stage 21 in the XY plane is, for example, 0.5 by a substrate laser interferometer (hereinafter referred to as “substrate interferometer”) 19 (see FIG. 1) that irradiates the measuring mirrors 17X and 17Y with a measurement beam. It is always detected with a resolution of about 1 nm. In the stage apparatus 11 of the present embodiment, actually, an X laser interferometer and a Y laser interferometer (not shown) are provided corresponding to the X movable mirror 17X and the Y movable mirror 17Y, respectively. These X laser interferometer and Y laser interferometer are typically shown as a substrate interferometer 19 in FIG. Note that the positions of the X coarse movement stage 23X and the Y coarse movement stage 23Y may be controlled based on the measurement value of another sensor (for example, a linear encoder) without using the interferometer 19. When using a linear encoder, a scale may be placed on each stage, and the position information of each stage may be measured with a head placed outside each stage, or a head is placed on each stage and placed outside. The position information of each stage may be measured using a scale.

As shown in FIG. 2, the stage main body portion 22B has a plurality (two in FIG. 2) of X holder supports 28X fixed to the side surface on the + X side and a plurality (FIG. 2) fixed to the side surface on the −Y side. 2 is provided with two Y holder supports 28Y. Each X holder support 28X is an arm-like member provided in the + X direction from the side surface on the + X side of the stage main body 22B. Each Y holder support 28Y is an arm-like member provided in the −Y direction from the side surface on the −Y side of the stage main body 22B. Each of the X holder support 28X and the Y holder support 28Y supports the lower surface of the substrate table 22A via a pad member (not shown) provided at the tip thereof. In FIG. 2, two X holder supports 28X and two Y holder supports 28Y are shown, but the number of X holder supports 28X and Y holder supports 28Y is not limited to this, and can be changed as appropriate. For example, three or more may be provided. The number of X holder supports 28X and Y holder supports 28Y may not be the same.

The substrate stage PST slightly drives the fine movement stage 21 in the X-axis, Y-axis, and Z-axis directions, respectively (not shown), an X voice coil motor (hereinafter referred to as XVCM) and a Y voice coil motor (hereinafter referred to as YVCM). ), A Z voice coil motor (hereinafter referred to as ZVCM). That is, the XVCM is fixed to the X stator 49 (see FIG. 9) supported by the X stator support member 29X fixed to the upper surface of the Y coarse movement stage 23Y and the side surface on the + X side of the stage main body 22B. It consists of an X mover (not shown). The YVCM is a Y stator (not shown) supported by a Y stator support member 29Y fixed to the upper surface of the Y coarse movement stage 23Y, and a side not on the -Y side of the stage body 22B. Y mover. The ZVCM is a Z stator (not shown) fixed to four corners (or three points not on the same straight line) on the upper surface of the Y coarse movement stage 23Y, and a Z stator (not shown) fixed to the lower surface of the stage main body 22B. It consists of a Z mover. The substrate stage PST of this embodiment uses the above-described XVCM, YVCM, and ZVCM to move the fine movement stage 21 (stage main body portion 22B) with respect to the Y coarse movement stage 23Y in a total of six degrees of freedom (X, Y, Z, θx, θy, θz) can be driven minutely.

Next, the self-weight cancel device 27 will be described with reference to FIGS. As shown in FIG. 4, the self-weight cancel device 27 includes a housing 70, an air spring 71 accommodated in the housing 70, and a main body 74 having a slide portion 73 that can move up and down in the Z-axis direction, Three base pads 75 attached to the outside of the bottom surface of the main body 74, and supports the weight of the fine movement stage 21 on the stage base 12 in a non-contact manner.

The housing 70 is a bottomed cylindrical member having an octagonal cross section perpendicular to the Z axis (see FIG. 3). A plurality (four in FIG. 4) of air pads 78 are arranged inside the side wall of the housing 70, and each air pad 78 is attached to the housing 70 via a ball joint 72. Further, one end of each of the four flexures 89 is fixed to each of the side surfaces of the housing 70 on the + X side, the −X side, the + Y side, and the −Y side, as shown in FIG. The other end of each flexure 89 is connected to each of the four support members 90 provided on the Y coarse movement stage 23Y (see FIG. 4). As shown in FIG. 4, each flexure 89 connects the housing 70 and the support member 90 at a height position (Z position) substantially the same as the gravity center G of the self-weight canceling device 27. In this embodiment, as shown in FIG. 3, three of the four support members 90 are provided on the main body 24 of the Y coarse movement stage 23 Y, and the other one is a second connection. The member 26 is provided. The configuration of the four flexures 89 is substantially the same.

FIG. 5 representatively shows the flexure 89 connected to the side surface on the + X side of the housing 70 among the four flexures 89. As shown in FIG. 5, the flexure 89 includes a thin plate 86 formed of, for example, a steel material, and the thin plate 86 includes a main body 74 and a support member 90 of the self-weight canceling device 27 via ball joints 87 and 88, respectively. It is connected to the. The flexure 89 is provided with a wire rope 85 provided between the ball joints 87 and 88 as a supplement in case the thin plate 86 is damaged. The flexure 89 interlocks the self-weight cancel device 27 and the Y coarse movement stage 23Y in each of the X-axis direction and the Y-axis direction by the rigidity of the thin plate 86 (the rigidity of the wire rope 85 when the thin plate 86 is damaged). Let On the other hand, the flexure 89 does not restrain the position of the self-weight canceling device 27 in the Z-axis direction, θx, θy, and θz directions by the Y coarse movement stage 23Y by the action of the ball joints 87 and 88.

Here, the support member 90 of this embodiment is provided with a tension adjusting mechanism for adjusting the tension of the thin plate 86 of the flexure 89. As shown in FIG. 5, the support member 90 includes a lever member 68 that is supported by a fixed member 66 fixed to the Y coarse movement stage 23 Y via a support shaft 67 so as to be rotatable (turnable). One end of the lever member 68 is connected to the thin plate 86 via a ball joint 88. Further, the tip end portion of the adjusting screw 65 screwed into the screw hole formed in the plate-like convex portion protruding from the fixing member 66 is in contact with the side surface on the + X side at the other end of the lever member 68. Therefore, in the support member 90, when the adjustment screw 65 is tightened, one end of the lever member 68 moves in a direction away from the self-weight canceling device 27 (see the black arrow in FIG. 5), thereby increasing the tension of the thin plate 86. To do. On the other hand, when the adjustment screw 65 is loosened, the tension of the thin plate 86 decreases. In this embodiment, the ratio of the distance between the other end of the lever member 68 and the support shaft 67 and the distance between the one end of the lever member 68 and the support shaft 67 is about 1: 3. Will work. Therefore, a large tension can be easily applied to the thin plate 86 by simply screwing the adjusting screw 65 in a small amount. The flexure 89 includes an interval sensor 84 that detects when the thin plate 86 is damaged or extends and the interval between the self-weight canceling device 27 and the support member 90 is more than a predetermined distance. The distance sensor 84 includes an arm member 84a fixed to the self-weight canceling device 27 side, and a photosensor 84b fixed to the Y coarse movement stage 23Y side and detecting the position of the tip of the arm member 84a.

Returning to FIG. 4, the air spring 71 is accommodated in the lowermost part inside the housing 70. Gas (for example, air) is supplied to the air spring 71 from a gas supply device (not shown), and thereby the inside is set in a positive pressure space having a higher atmospheric pressure than the outside. The self-weight cancel device 27 reduces the load on the ZVCM (not shown) by generating a vertical upward force by the air spring 71 and absorbing the self-weight of the fine movement stage 21. The air spring 71 also functions as an air actuator that drives the slide portion 73 in the Z-axis direction by its internal pressure.

Each base pad 75 is connected to the bottom surface (lower surface) of the housing 70 via a ball joint 82, as shown in FIG. Each base pad 75 functions as a static gas bearing that ejects gas to the upper surface of the stage base 12 and forms a predetermined clearance with the upper surface of the stage base 12 by the static pressure. In addition, each base pad 75 can change the posture in the inclination direction with respect to the XY plane by the ball joint 82.

The slide portion 73 is a cylindrical member housed inside the housing 70, and the outer peripheral surface of each of the plurality of air pads 78 disposed inside the side wall of the housing 70 described above via a predetermined clearance. Opposite. Further, on the upper surface of the slide portion 73, three pad members 81 made of a plate-shaped member having a substantially rhombic shape (see FIG. 3) in plan view (as viewed from the + Z direction) are provided. Each pad member 81 is supported by the slide portion 73 via the ball joint 80, and can change the posture in the inclination direction with respect to the XY plane. From the upper surface (surface on the + Z side) of each pad member 81, gas can be ejected to the lower surface of the leveling device 76, and as shown in FIG. 4, the lower surface of the leveling device 76 and each pad member A predetermined clearance is formed between the gas and the gas 81 by the static pressure of the gas.

The self-weight canceling device 27 of the present embodiment is provided with a Z stopper 63 that defines a movement upper limit position and a movement lower limit position in the Z-axis direction of the slide portion 73. The Z stopper 63 is connected to a plate-like member 64 disposed between the slide portion 73 and the air spring 71, and has a tip (plate) outside the housing 70 through an opening 70 a formed in the housing 70. The end portion on the side opposite to the shape member 64 is exposed to the outside of the housing 70. A diffraction grating 61 having a periodic direction in the Z-axis direction is disposed at the tip of the Z stopper 63. Therefore, when the slide portion 73 slides in the Z-axis direction via the air spring 71, the diffraction grating 61 also moves in the Z-axis direction. On the other hand, an encoder head 62 facing the diffraction grating 61 is attached near the bottom of the housing 70, and the encoder head 62 and the diffraction grating 61 constitute a Z linear encoder system. The output of the encoder head 62 is supplied to a control device (not shown), and the control device controls the Z position of the slide portion 73 based on the output of the encoder head 62.

As can be seen from FIGS. 3 and 4, four arm members 91 are fixed on the outer surface near the upper end of the side wall of the housing 70. As shown in FIG. 3, each of the four arm members 91 extends radially at an angle of 45 ° with respect to each of the X axis and the Y axis. As shown in FIG. 4, a probe portion 92 is fixed to the top surface of each arm member 91, and the probe body 92 is opposed to the bottom surface of the stage main body portion 22 B of the fine movement stage 21. A portion 93 is provided. In the stage apparatus 11 according to the present embodiment, a capacitance sensor 94 (hereinafter referred to as a “capacitance sensor 94”) that measures a distance between the probe unit 92 and the target unit 93 including a pair of the probe unit 92 and the target unit 93 facing each other. Z sensor 94) is configured. The Z position of the fine movement stage 21 with respect to the upper surface of the stage base 12 and the tilt angle with respect to the XY plane are calculated by using the measurement results of the four Z sensors 94. The number of arm members 91 may be three instead of four, that is, the number of Z sensors 94 may be three. Further, the positional relationship between the probe portion 92 and the target portion 93 of the Z sensor 94 may be reversed. The Z sensor 94 only needs to be able to measure the Z position with respect to the upper surface of the stage base 12 of the fine movement stage 21, and is not limited to a capacitance sensor, and other sensors such as an interferometer can also be used.

Further, a probe portion 95 is fixed adjacent to the probe portion 92 on the top surface of the distal end portion of each arm member 91, and a target portion 96 is provided on the bottom surface of the stage main body portion 22B so as to face the probe portion 95. ing. In the present embodiment, a capacitance sensor (hereinafter referred to as a leveling origin sensor 97) is configured including a pair of a probe unit 95 and a target unit 96 facing each other. The function of the leveling origin sensor 97 will be described in detail later. The leveling origin sensor 97 is not limited to a capacitance sensor, and other sensors such as a laser displacement meter can also be used.

As shown in FIG. 4, the leveling device 76 is provided between the polyhedron member 50 fixed to the lower surface of the stage main body portion 22 B and the slide portion 73 (more specifically, three pad members 81). . FIG. 6A shows a plan view of the leveling device 76 viewed from the + Z side. Further, FIG. 6B shows a cross-sectional view taken along the line BB of FIG. The polyhedron member 50 has an outer shape in which each tip portion of a regular triangular pyramidal member is flattened, and the bottom surface thereof is integrally fixed to the lower surface of the stage main body portion 22B. More specifically, the polyhedron member 50 cuts out a regular triangular pyramid with a plane parallel to the bottom surface at a predetermined height, and has three tip portions including apexes of the triangle forming the bottom surface in a plane perpendicular to the bottom surface. It is an octahedron having an outer shape that is cut out.

As shown in FIG. 6B, the leveling device 76 includes a ceramic leveling cup 51 formed in a cup shape with a flat bottom surface, and a plurality of (this embodiment) provided inside the peripheral wall of the leveling cup 51. It includes three ball joints 52 (see FIG. 6A) and disc-shaped pad portions 53 supported by the respective ball joints 52. As shown in FIG. 4, the leveling cup 51 is supported by the three pad members 81 in a non-contact manner with respect to the self-weight canceling device 27. As shown in FIG. 6A, each of the ball joint 52 and the pad portion 53 is provided so as to face each inclined surface of the polyhedron member 50. A hinge joint or the like can be used instead of the ball joint. This is because the frictional resistance can be suppressed to a negligible level.

The three pad portions 53 eject gas supplied from a gas supply device (not shown) to each inclined surface of the polyhedron member 50. For this reason, the polyhedron member 50 is supported in a non-contact manner with respect to the leveling cup 51 in a state where a predetermined clearance is formed between each pad portion 53 due to the static pressure of the gas ejected from each pad portion 53. The Further, since each pad portion 53 is attached to the leveling cup 51 via the ball joint 52, the polyhedral member 50 (that is, the fine movement stage 21) is swung with respect to the XY plane by the leveling device 76. It is supported freely (in a state where movement (tilt) in the θx and θy directions is allowed). That is, the leveling device 76 of this embodiment functions as a spherical bearing (for example, a ball joint) as a whole by using the three pad portions 53 (air pads).

Here, in the stage apparatus 11 of the present embodiment, the fine movement stage 21 is swingably supported via the leveling device 76 as described above, so the fine movement stage 21 (and the substrate P on the fine movement stage 21). However, the position of the fine movement stage 21 becomes unstable when performing maintenance of the liquid crystal exposure apparatus 10, for example. Therefore, the stage apparatus 11 of the present embodiment is provided with a leveling lock apparatus 60 that limits the function of the leveling apparatus 76, that is, mechanically locks the tilting operation of the fine movement stage 21 (in FIG. 4, The leveling lock device 60 is not shown).

Hereinafter, the leveling lock device 60 will be described with reference to FIGS. 6 (A) to 7 (C). As shown in FIGS. 6 (A) and 6 (B), the leveling lock device 60 has one end (end on the bottom side of the cylinder) fixed to the side surface of the polyhedron member 50 via a fixing member 39. Pressing members 55a to 55c fixed to the lower surface of the driven member at the other end (the tip of the piston rod) of each of the three air cylinders 54 and the three air cylinders 54 (hereinafter collectively referred to as pressing member 55). And three rollers 56 (not shown in FIG. 6A, see FIG. 6B) attached to the leveling cup 51 corresponding to the three air cylinders 54. As described above, the polyhedron member 50 is an octahedron having the above-described shape, and the three air cylinders 54 each include three flat surfaces perpendicular to the bottom surface of the polyhedron member 50 (the bonding surface to the fine movement stage 21). It is fixed to. Therefore, each of the three air cylinders 54 is arranged in parallel to the XY plane and at equal intervals (120 ° intervals).

Each pressing member 55a to 55c is a member fixed to the lower surface of the driven member at the tip of the piston rod of the air cylinder 54, and is linked to a predetermined axis parallel to the XY plane in conjunction with the expansion and contraction of each air cylinder 54. It reciprocates along and moves toward and away from the center of the bottom surface of the polyhedron member 50. Here, in each air cylinder 54, the piston rod reciprocates along the above-mentioned axis, and the air cylinder itself does not expand and contract, but the air cylinder including the driven member at the tip of the piston rod does not necessarily expand or contract. Since the total length changes due to the reciprocating movement of the piston rod, in the following, when the piston rod moves so that the total length of the air cylinder extends (the driven member at the tip of the piston rod is separated from the center of the bottom surface of the polyhedral member 50). ) Is expressed as the air cylinder 54 extending, and the case where the piston rod moves in the opposite direction is expressed as the air cylinder contracting.

In each of the pressing members 55a to 55c, an inclined surface inclined with respect to the XY plane is formed on the lower surface of the tip in the moving direction when the air cylinder 54 extends. Further, other portions of the lower surfaces of the pressing members 55a to 55c are formed in parallel to the XY plane. Here, of the three pressing members 55a to 55c, the inclined surface of one pressing portion 55a is set to have a slant angle that is gentler than the inclined surfaces of the other two

pressing members

55b and 55c (FIG. 6B )reference). Since the lengths of the pressing members 55a to 55c are substantially the same, as shown in FIG. 6B, the

pressing members

55b and 55c whose inclination angle is set larger than that of the pressing member 55a are The flat part is longer than the pressing member 55a.

Each of the three rollers 56 is supported by the leveling cup 51 via a protective device 69 described later.

Next, a procedure for locking the tilt operation of the fine movement stage 21 using the leveling lock device 60 will be described with reference to FIGS. 7 (A) to 7 (C). Since the pressing member 55b and the pressing member 55c function in the same manner, only the pressing member 55b is shown as a representative in FIGS. 7A to 7C. As shown in FIG. 7A, in a state before the tilting operation of the fine movement stage 21 is locked, that is, in a state where the fine movement stage 21 is swingable with respect to the XY plane via the leveling device 76. Each of the air cylinders 54 is in a contracted state. When the tilting operation of fine movement stage 21 is locked, first, as shown in FIG. 7B, two air cylinders 54 to which two

pressing members

55b and 55c having the same inclined surface angle are connected. At the same time. As a result, each of the

pressing members

55 b and 55 c is guided by the roller 56 and the flat portion rides on the roller 56.

Next, as shown in FIG. 7C, the remaining one air cylinder 54 is extended. At this time, the tip portion (inclined surface portion) of the pressing member 55a connected to the air cylinder 54 functions as a wedge inserted between the fine movement stage 21 and the roller 56, and the fine movement stage 21 is shown in FIG. ) From a non-contact state to the leveling cup 51 shown in FIG. 2), the leveling cup 51 is contacted and supported at three points via the polyhedron member 50, the air cylinder 54, the pressing members 55a to 55c, the roller 56, and the like. Tilt operation is limited. Since the weight of the fine movement stage 21 reaches several tons, for example, even if the pressing member 55a is pressed against the roller 56 as shown in FIG. 7C, the fine movement stage 21 is caused by the reaction force of the air cylinder 54. Does not float or move in the XY plane.

In the leveling lock device 60, even when the air cylinder 54 shown in FIG. 7A is contracted, that is, when the tilt operation of the fine movement stage 21 is not limited, the tilt amount of the fine movement stage 21 exceeds a predetermined amount. In this case, any one of the three pressing members 55a to 55c comes into contact with the roller 56, and functions as a stopper device that mechanically limits the tiltable amount of the fine movement stage 21. On the other hand, in the leveling lock device 60, if the fine movement stage 21 further moves in the tilt direction (θx, θy direction) in a state where the pressing members 55a to 55c and the roller 56 are in contact with each other, the dead weight (large) of the fine movement stage 21 is large. Load) directly acts on the leveling cup 51 via the pressing members 55 a to 55 c and the roller 56. Therefore, in the leveling lock device 60 of the present embodiment, when a load larger than a predetermined value is applied to the leveling cup 51, a protection device 69 that absorbs this load and protects the leveling cup 51 (FIG. 6A). And FIG. 6B).

8A and 8B are diagrams for explaining the configuration and function of the protection device 69 of the leveling cup 51. FIG. As shown in FIG. 6A, the protection devices 69 are provided at three locations on the outer peripheral edge of the leveling cup 51 corresponding to the three rollers 56. Since the functions are the same, only one protective device 69 is representatively shown in FIGS. 8A and 8B. As shown in FIGS. 8A and 8B, the protection device 69 supports a base member 57 fixed to the leveling cup 51 and a roller 56, and supports the base member 57 via a support shaft 57a. And a roller support member 58 that is rotatably supported, and a compression coil spring 59 disposed between the base member 57 and the roller support member 58.

As shown in FIG. 8A, the support shaft 57a is provided at the + Z side end of the base member 57, and the + Z side end of the roller support member 58 is supported by the support shaft 57a. Yes. A recess 57d is formed on the surface of the base member 57 on the roller support member 58 side. An opening is formed in the portion of the roller support member 58 that faces the recess 57d, and a lid member 58A that closes the opening is fixed on the opposite side of the opening to the base member 57. A compression coil spring 59 is inserted into the opening of the roller support member 58, and the compression coil spring 59 is sandwiched between the recess 57d of the base member 57 and the lid member 58A. That is, the lid member 58A also serves as a spring retainer plate. In this case, the end portion on the −Z side of the roller support member 58 is provided by the compression coil spring 59. It is pressed (biased) in a direction away from the base member 57.

A stopper member 57b is fixed to the base member 57 on the side opposite to the leveling cup 51 at the end portion on the −Z side (for example, the + X side in FIG. 8A). The roller support member 58 is pressed against the stopper member 57b by the pressing force of the compression coil spring 59, whereby the state shown in FIG. 8A is maintained. Then, when a load of a predetermined magnitude or more in the −Z direction is further applied to the roller 56 in a state where the pressing member 55 and the roller 56 are in contact with each other, as shown in FIG. Rotates around the support shaft 57 a against the urging force of the compression coil spring 59. At this time, the fine movement stage 21 is also tilted in conjunction with the tilt of the roller 56 (rotation of the roller support member 58) and hits another stopper (for example, a center of gravity stopper device 40 described later), whereby a load of a predetermined magnitude or more is applied. Acting on the leveling cup 51 is prevented, and the leveling cup 51 is protected.

Note that, as shown in FIG. 8A, a fall prevention member 83 made of a substantially L-shaped member is fixed to the above-described polyhedral member 50 via a fixing member 39. The fall prevention member 83 is not supported by the self weight canceling device 27 when the self weight canceling device 27 is retracted from below the leveling device 76 (leveling cup 51), for example, when the self weight canceling device 27 is replaced. This is a member for preventing the leveling device 76 from dropping. One end portion of the fall prevention member 83 is fixed to the polyhedron member 50 (that is, the fine movement stage 21) via the fixing member 39, and an intermediate portion thereof is inserted in a through hole 57c formed in the base member 57 in a non-contact state. Yes. When the leveling device 76 is no longer supported by the dead weight canceling device 27, the base member 57 is caught by the fall preventing member 83, thereby preventing the leveling device 76 from falling.

Further, in the stage apparatus 11 of the present embodiment, the movable amount (range) in the X-axis direction and the Y-axis direction of the fine movement stage 21 with respect to the Y coarse movement stage 23Y is measured on the XY plane including the center of gravity of the fine movement stage 21. A center-of-gravity stopper device 40 is provided for restricting automatically. That is, as described above, the fine movement stage 21 is supported in a non-contact manner by the self-weight canceling device 27. Therefore, for example, when the liquid crystal exposure apparatus 10 is urgently stopped while the fine movement stage 21 is being driven, the fine movement stage 21 tends to move in the XY plane further than the initial stop position due to inertia. On the other hand, when the driving of the Y coarse movement stage 23Y is stopped, the position in the XY plane of the self-weight canceling device 27 is fixed, so that the fine-motion stage 21 moves with respect to the self-weight canceling device 27 due to inertia and cancels the self-weight. The support position of the fine movement stage 21 by the device 27 is deviated from a predetermined position (usually immediately below the position of the center of gravity of the fine movement stage 21). The gravity center stopper device 40 of the present embodiment is a device for preventing the support position of the fine movement stage 21 by the self-weight canceling device 27 from greatly deviating from a predetermined position even in the above case. Hereinafter, the configuration and function of the gravity center stopper device 40 will be described with reference to FIGS.

As described above, the Y coarse movement stage 23Y includes the X stator 49 (see FIG. 9) constituting the XVCM and YVCM for driving the fine movement stage 21 in the XY plane, as shown in FIG. 2, and the Y stator. A plurality (two each in FIG. 2) of X stator support members 29X and Y stator support members 29Y supporting each (not shown) are fixed. FIG. 9 is a perspective view showing one X stator support member 29X as a representative of the plurality of X

stator support members

29X and 29Y. The X stator support member 29X includes a base portion 43 fixed to the Y coarse movement stage 23Y and a set (a pair) of stators fixed to the + Y side and −Y side ends of the upper surface of the base portion 43. And a support portion 44. A set of X stators 49 is supported on each set of stator support portions 44. Between the set of stator support portions 44, one of the plurality of X holder supports 28X described above is inserted in a non-contact state.

As shown in FIGS. 10A and 10B, the center-of-gravity stopper device 40 has a stopper block 45 (in FIG. 9, a stopper blade 36) fixed to the upper surface (the surface on the + Z side) of the X holder support 28X. The stopper block 45 includes a stopper blade 36 provided on the X stator support member 29 X, and the stopper block 45 is illustrated as being removed from the X holder support 28 X. As shown in FIG. 10 (B), the stopper block 45 is fixed to the fixing part 46, which is a rectangular parallelepiped member fixed to the upper surface of the X holder support 28X, and to the side surfaces of the fixing part 46 on the + X side and the −X side. The set (a pair) of

X pad members

47a and 47b, and a set (a pair) of

Y pad members

48a and 48b fixed to the side surfaces of the fixing portion 46 on the + Y side and the −Y side, respectively. In FIG. 10B, the Y pad member 48a is hidden behind the Y pad member 48b.

As shown in FIG. 9, the stopper blade 36 is a plate-like member that is substantially parallel to the XY plane fixed to the side surface on the + X side in the vicinity of the upper end portion of the stator support portion 44. As shown in FIG. 10B, the X holder support 28X is disposed in a non-contact state below the stopper blade 36 (−Z side). As shown in FIG. 9, the stopper blade 36 has an opening 36a penetrating in the Z-axis direction at the center thereof. As can be seen from FIGS. 10A and 10B, the stopper block 45 is disposed in the opening 36a except for the

Y pad members

48a and 48b. The stopper blade 36 is a pair (a pair) each having a wall surface orthogonal to the X-axis and disposed so as to face the pair of

X pad members

47a and 47b of the stopper block 45 with a clearance of 3 mm, for example.

Stopper portions

37a and 37b. Accordingly, the movable amount (distance) in the X-axis direction with respect to the Y coarse movement stage 23Y of the fine movement stage 21 is 3 mm (total 6 mm) in the + X direction and the −X direction from the state shown in FIG. .

Here, as shown in FIG. 11, the set of

X pad members

47 a and 47 b and the set of

stopper portions

37 a and 37 b facing these include the center of gravity position CG of the fine movement stage 21 in the Z-axis direction. They are arranged on a plane parallel to the XY plane. Therefore, in the gravity center stopper device 40 of the present embodiment, when the fine movement stage 21 moves in the XY plane and the X pad member 47a (or 47b) contacts the stopper portion 37a (or 37b), the fine movement stage 21 is moved to the fine movement stage 21. It is possible to suppress the moment around the Y axis from acting. Therefore, it is possible to prevent the fine movement stage 21 from rotating around the Y axis and a load from acting on the leveling cup 51 and the pad portion 53 of the leveling device 76, and to protect the leveling device 76.

Further, the gravity center stopper device 40 shown in FIGS. 9 to 11 mechanically limits the movable amount of the fine movement stage 21 in the Z-axis direction and the movable amount (rotation amount) in the θx direction. As shown in FIG. 10B, the Y pad member 48b provided on the stopper block 45 and the lower surface of the Y pad member 48a hidden behind the Y pad member 48b in FIG. It faces the upper surface of the stopper blade 36 through a predetermined clearance. Further, the upper surface of the X holder support 28X is opposed to the lower surface of the stopper blade 36 with a predetermined clearance. Therefore, when the fine movement stage 21 moves in the Z-axis direction or rotates (tilts) around the X-axis, at least one of the

Y pad members

48a and 48b and the X holder support 28X contacts the stopper blade 36, and the fine movement stage The movement of 21 in the Z-axis direction and the θx direction is mechanically limited. Accordingly, similarly, the leveling cup 51 and the pad portion 53 of the leveling device 76 can be protected. The stage apparatus 11 of the present embodiment includes two gravity center stopper apparatuses 40 that limit the movement of the fine movement stage 21 described above in the X-axis direction, θx direction, and Z-axis direction. That is, as shown in FIG. 2, two X stator support members 29X are fixed on the Y coarse movement stage 23Y, and between the stator support portions 44 of the plurality of X stator support members 29X, respectively. An X holder support 28X is inserted. In the stage apparatus 11 of the present embodiment, the two X stator support members 29X are provided with stopper blades (not shown) having the same configuration as the stopper blades 36 shown in FIGS. A stopper block (not shown) having the same configuration as the stopper block 45 described above is fixed to the corresponding X holder support 28X.

9 to 11 described above (hereinafter, referred to as X center of gravity stopper device 40X as appropriate) moves fine movement stage 21 in the X axis direction, θx direction, and Z axis direction. Although the possible range is limited, the stage apparatus 11 according to the present embodiment is a center-of-gravity stopper device having a similar configuration that limits the movable range of the fine movement stage 21 in the Y-axis direction, θy direction, and Z-axis direction ( (The illustration is omitted. Hereinafter, the Y gravity center stopper device 40Y will be referred to as appropriate). In this Y center-of-gravity stopper device 40Y, a stopper block having the same configuration as the stopper block 45 shown in FIGS. 9 to 11 is fixed to the Y holder support 28Y (see FIG. 2), and the stopper blade shown in FIGS. A stopper blade having the same configuration as 36 is fixed to the Y stator support member 29Y (see FIG. 2).

Here, in the stage apparatus 11 of the present embodiment, as shown in FIG. 12, a jack stopper apparatus 100 and a positioning apparatus 120 are provided between the Y coarse movement stage 23Y and the stage main body 22B of the fine movement stage 21. It has been. FIG. 12 is a diagram for explaining the overall configuration of the jack stopper device 100 and the positioning device 120 and the positional relationship with respect to the Y coarse movement stage 23Y, the fine movement stage 21, the self-weight canceling device 27, and the like. The actual arrangement of 100 and positioning device 120 is not necessarily the same as in FIG. 12 (the specific arrangement of jack stopper device 100 and positioning device 120 will be described below as appropriate).

The jack stopper device 100 is a device that directly supports the fine movement stage 21 on the Y coarse movement stage 23Y as shown in FIG. In the stage device 11 of the present embodiment, for example, a total of four jack stopper devices having the same configuration as the jack stopper device 100 shown in FIG. 12 are supported so as to support positions corresponding to the four corners of the fine movement stage 21 ( (Not shown). The number of jack stopper devices 100 is not limited to this, and may be three, for example. Further, the jack stopper device 100 does not have to be arranged corresponding to the four corners of the fine movement stage 21 as long as it can support the fine movement stage 21 at least at three points not on the same straight line.

The jack stopper device 100 is a screw-type jack device having a jack portion 101 fixed to the Y coarse movement stage 23Y and a jack receiving portion 106 fixed to the fine movement stage 21 (the lower surface of the stage main body portion 22B). As shown in FIG. 13 (A), the jack portion 101 is formed in a cylindrical shape, and has a jack base 102 having an internal thread formed on its inner peripheral surface, and is screwed to the female screw of the jack base 102 in the Z-axis direction. And an elevating unit 103 that can move (elevate). The elevating part 103 has a screw part 103a in which a male screw that is screwed to the female screw of the jack base 102 is formed on the outer peripheral surface thereof, and an operation part 103b that is integrally provided on the + Z side of the screw part 103a. The unit 103b is moved (vertically moved) in the Z-axis direction by being rotated by, for example, a user of the liquid crystal exposure apparatus 10. A conical recess 104 is formed at the center of the upper surface of the operation portion 103b, and a ball 105 (steel ball) made of, for example, a steel material is fitted in the recess 104.

On the other hand, the jack receiving portion 106 has a main body portion 107 that is a cylindrical member fixed to the fine movement stage 21, and a conical concave portion 108 is formed at the end of the main body portion 107 in the −Z direction. Is formed. Moreover, the jack receiving part 106 is formed in the cylindrical shape, and is provided with the stopper ring 109 in which the internal thread was formed in the internal peripheral surface. A male screw is formed on the outer peripheral surface of the main body 107, and the female screw of the stopper ring 109 is screwed with this male screw. Therefore, the stopper ring 109 can move up and down with respect to the main body 107.

In the jack stopper device 100, as shown in FIG. 13 (B), when the elevating part 103 is raised in the + Z direction with the stopper ring 109 raised, the ball 105 is fitted in the recess 108, Thus, the fine movement stage 21 is supported by the Y coarse movement stage 23Y. As described above, there are a total of four jack stopper devices 100 corresponding to the four corners of fine movement stage 21, and therefore the length of each jack stopper device 100 (the Z position of ball 105) is adjusted as appropriate. Thus, the Z position of the surface of fine movement stage 21 and the inclination angle with respect to the XY plane can be finely adjusted. Further, since the fine movement stage 21 is supported by the four jack stopper devices 100, even if the self-weight canceling device 27 is separated from the stage device 11, the fine movement stage 21 can be stably supported. Therefore, it is convenient when the stage device 11 is assembled or maintenance work is performed.

Referring back to FIG. 12, the positioning device 120 includes a telescopic part 121 fixed to the Y coarse movement stage 23Y and a positioning block 123 fixed to the stage main body part 22B of the fine movement stage 21. As shown in FIG. 14A, the telescopic part 121 includes an air cylinder that expands and contracts in the Z-axis direction, and the tip of the piston rod is a spherical part 122. Further, the positioning block 123 is formed with a conical recess 124, and the spherical portion 122 of the telescopic portion 121 can be fitted into the recess 124. The positioning device 120 is disposed adjacent to the jack stopper device 100 at each of the positions corresponding to the four corners of the fine movement stage 21, for example, and a total of four positioning devices (not shown) are provided. The number of positioning devices 120 is not limited to this, and may be three, for example. Further, the positioning device 120 may not be arranged corresponding to the four corners of the fine movement stage 21, and may be arranged at least at three places not on the same straight line in the XY plane.

Hereinafter, operations of the jack stopper device 100 and the positioning device 120 will be described. When the fine movement stage 21 and the Y coarse movement stage 23Y are coupled (docked) during the initial assembly of the stage device 11 (or during reassembly after maintenance), as shown in FIG. The jack portion 101 of the stopper device 100 is not fixed to the Y coarse movement stage 23Y but is movable along the upper surface of the Y coarse movement stage 23Y. In addition, air is supplied to the air spring 71 of the self-weight canceling device 27 in a state before the fine movement stage 21 (stage main body portion 22B) and the Y coarse movement stage 23Y shown in FIG. Make it not exist.

Then, the fine movement stage 21 is mounted on the Y coarse movement stage 23Y by fitting the ball 105 into the recess 108 (not shown). However, as described above, since the jack stopper 101 is not fixed, the jack stopper device 100 adjusts the position (including the θz position) of the fine movement stage 21 in the XY plane by moving the position of the jack 101. It can be performed.

Next, in the stage apparatus 11, the position of the fine movement stage 21 in the θz direction is adjusted so that the measurement beam of the substrate interferometer 19 and the reflection surfaces of the

movable mirrors

17X and 17Y are orthogonal to each other. Further, as shown in FIG. 10A, the fine movement stage 21 has the same clearance between each pad member of the gravity center stopper device 40 (X gravity center stopper device 40X and Y gravity center stopper device 40Y) and the stopper portion ( For example, the positions in the X-axis and Y-axis directions are adjusted to be 3 mm each.

Further, in the stage apparatus 11, the Z position of the fine movement stage 21 is adjusted with respect to the upper surface of the stage base 12 so that the Z position of the surface of the substrate P (see FIG. 1) becomes a predetermined position. Adjustment of the Z position of the fine movement stage 21 is appropriately adjusted according to the screwing amount of the screw portion 103a of each lifting / lowering portion 103 of the four jack stopper devices 100. When the Z position of the fine movement stage 21 is adjusted, that is, when the operation part 103b of the elevating part 103 is operated and the fine movement stage 21 is moved in the Z-axis direction, the self-weight cancel device 27 has an air spring 71. The air is supplied to the fine movement stage 21 to support a part of the dead weight of the fine movement stage 21 to assist the operator in operating the elevating unit 103. The Z position adjustment of fine movement stage 21 at this time is performed using Z position measurement tool 110 shown in FIG. The Z position measurement tool 110 includes a dial gauge 311 and measures the Z position of the fine movement stage 21 at a plurality of locations on the stage base 12 with reference to the Z position of a height reference device (not shown) arranged on the stage base 12. To do. In the present embodiment, four Z position measuring tools 110 are used so that the Z position on the upper surface of fine movement stage 21 can be measured simultaneously at four locations (in FIG. 12, one of the four Z position measuring tools). Only the book is shown, and the other three are omitted), and the lifting / lowering parts 103 of the four jack stopper devices 100 are operated so that the values of the four Z position measuring tools 110 are the same. Is done.

After the position adjustment of the fine movement stage 21 in the XY plane and the Z position adjustment are finished, in each jack stopper device 100, as shown in FIG. 13 (B), the jack portion 101 moves Y coarsely via the bolt 101a. It is fixed to the stage 23Y. The XY position (including the θz position) of fine movement stage 21 with respect to Y coarse movement stage at this time is fixed to gap sensor 30 fixed to X stator support member 29X and Y stator support member 29Y shown in FIG. Measured by a gap sensor (not shown) (hereinafter collectively referred to as gap sensor 30), the measured value (measurement result) is sent to the control device and stored in a memory device provided in the control device. Further, the Z position (including the θx and θy positions) of the fine movement stage 21 is measured by the leveling origin sensor 97 shown in FIG. 4, and the measured value (measurement result) is sent to the control device, which is provided in the control device. Stored in a memory device. That is, in the stage apparatus 11 of this embodiment, after the fine movement stage 21 is positioned, the jack portion 101 of the jack stopper apparatus 100 is fixed to the Y coarse movement stage 23Y (see FIG. 13B), and the fine movement at this time The position of the stage 21 is measured by the gap sensor 30 and the leveling origin sensor 97, and the measurement value is stored in the memory device of the control device, thereby setting the measurement origin (position) of the gap sensor 30 and the leveling origin sensor 97 (measurement). Position setting or reference position setting) is performed.

Here, in the stage device 11, when the initial assembly is performed, the fine movement stage 21 is positioned via the jack stopper device 100 shown in FIG. 13B (the measurement origin (position of the gap sensor 30 and the leveling origin sensor 97)). ) In the state in which the expansion / contraction part 121 and the positioning block 123 of each positioning device 120 are in the state shown in FIG. 14B (that is, the spherical part 122 and the recess 124 are fitted). ) Is fixed to one of the Y coarse movement stage 23Y and the stage main body 22B via a

bolt

121a or 123a. Thereafter, the other of the expansion / contraction part 121 and the positioning block 123 of each positioning device 120 is fixed to the other of the Y coarse movement stage 23Y and the stage main body part 22B via a bolt.

After the expansion / contraction part 121 and the positioning block 123 are fixed, the expansion / contraction part 121 is contracted as shown in FIG. Therefore, from the state where the position of the fine movement stage 21 is not restrained (the ball 105 and the recess 108 of the jack stopper device 100 are not fitted and the leveling lock device 60 is off), When the spherical surface portion 122 and the concave portion 124 are fitted, the position of the fine movement stage 21 in the XY plane is the position when the ball 105 and the concave portion 108 of the jack stopper device 100 shown in FIG. That is, it is automatically positioned at the same position as that when the measurement beam of the substrate interferometer 19 is adjusted and the measurement origin (position) of the gap sensor 30 is set. The positioning device 120 is used in a state where the position of the fine movement stage 21 is not constrained by the jack stopper device 100 or the leveling lock device 60 when performing exposure processing on the substrate P using the liquid crystal exposure device 10. Therefore, the fine movement stage 21 can be easily and quickly positioned at the measurement origin position (measurement position or reference position) of the gap sensor 30 each time exposure is started. Since the positioning device 120 of this embodiment has a structure in which the spherical portion 122 and the conical recess 124 are fitted, the axis of the spherical portion 122 and the axis of the positioning block 123 can be easily aligned. The fine movement stage 21 can be positioned at a predetermined position with high accuracy. The fine movement stage 21 before exposure is positioned in the Z-axis direction by supplying air to the air spring 71.

Referring back to FIG. 13B, the stage apparatus 11 fixes the jack portion 101 to the Y coarse movement stage 23Y at the time of initial assembly, and then couples the fine movement stage 21 to the Y coarse movement stage 23Y at the time of maintenance, and the ball 105 is recessed. After that, the air is supplied to the air spring 71 of the self-weight canceling device 27 in a state where the ball 105 is fitted in the recess 108. As a result, fine movement stage 21 moves in the + Z direction, and in jack stopper device 100, ball 105 is detached from recess 108. At this time, the positioning device 120 is in a state where the air cylinder of the telescopic portion 121 is contracted, and the spherical surface portion 122 is not fitted in the concave portion 124. In this state, fine movement stage 21 is supported only by its own weight cancellation device 27, so it can be confirmed whether fine movement stage 21 is balanced. When it is confirmed that the fine movement stage 21 is balanced, as shown in FIG. 13C, the operation unit 103b of the elevating unit 103 is operated to move the ball 105 in the −Z direction. Is done.

Here, in addition to the function as the position adjusting device of the fine movement stage 21 described above, the jack stopper device 100 of the present embodiment is a stopper device that restricts the movable amount of the fine movement stage 21 in the 6-degree-of-freedom direction during exposure or the like. It also has the function as As shown in FIG. 13D, the upper surface of the operation unit 103b of the elevating unit 103 is formed in a cylindrical shape. Then, the stopper ring 109 provided in the jack receiving portion 106 is moved in the −Z direction, so that as shown in FIG. 13 (D), the X, Y, and Z axis directions respectively with respect to the operation portion 103b. In addition, it is mechanically engaged through a predetermined clearance. Since the stopper ring 109 can move (vertically move) in the Z-axis direction, the clearance in the Z-axis direction with respect to the jack portion 101 can be adjusted.

In the jack stopper device 100, in the state shown in FIG. 13C, after it is confirmed that the fine movement stage 21 can be supported in a well-balanced manner by the self-weight canceling device 27, the stopper is shown in FIG. 13D. The ring 109 is moved in the −Z direction. In the state shown in FIG. 13D, predetermined clearances are formed between the stopper ring 109 and the upper surface of the elevating unit 103 in each of the X axis direction, the Y axis direction, and the Z axis direction. The amount of movement of the fine movement stage 21 in the ± X direction, ± Y direction, −Z direction, θx direction, and θy direction with respect to the Y coarse movement stage 23Y is determined by this clearance. Further, since the jack stopper device 100 is provided corresponding to the four corners of the fine movement stage 21 (that is, at four places not on the same straight line), the movable amount of the fine movement stage 21 in the θz direction is also determined by this clearance. Determined by.

The stage device 11 of the present embodiment includes the above-described center of gravity stopper device 40 (see FIGS. 9 to 11) as a mechanism for limiting the movable amount of the fine movement stage 21. In the stage apparatus 11 of the present embodiment, the movable amount of the fine movement stage 21 with respect to the Y coarse movement stage 23Y at the time of exposure is mainly defined by the gravity center stopper apparatus 40, and the jack stopper apparatus 100 preliminarily moves the fine movement stage 21. A movable amount with respect to the Y coarse movement stage 23Y is defined. That is, in the state shown in FIG. 13D, the clearance formed between the stopper ring 109 of the jack stopper device 100 and the lifting / lowering unit 103 is determined by the stopper members (pad members 47a, 40Y) of the gravity center stopper devices 40X and 40Y. 47b, 48a, 48b) and the clearance formed between the stopper blade 36 (or holder support) (see FIGS. 10A and 10B) (for example, X-axis and Y-axis directions). Is ± 3.5 mm). Therefore, in the stage apparatus 11 of the present embodiment, when there is a possibility that the fine movement stage 21 moves beyond the predetermined allowable amount with respect to the Y coarse movement stage 23Y, the movement is first performed by the gravity center stopper device 40. For example, when the stopper block 45 of the gravity center stopper device 40 is detached from the X holder support 28X (or Y holder support 28Y), the movement is restricted by the jack stopper device 100. Therefore, in the stage apparatus 11 of the present embodiment, the fine movement stage 21 is reliably prevented from moving beyond the allowable amount with respect to the Y coarse movement stage 23Y.

Next, a procedure for removing the self-weight cancel device 27 from the stage device 11 according to the present embodiment will be described with reference to FIGS. 15 (A) to 15 (C). When the self-weight cancel device 27 is removed from the stage device 11, the stage device 11 firstly, as shown in FIG. 15A, the Y coarse movement stage 23Y is -Y with respect to the X coarse movement stage 23X up to a predetermined position. Driven in the direction. Here, the predetermined position is a predetermined position of the Y coarse movement stage 23Y in the −Y direction movement limit position (determined by a mechanical limit or a soft limit) or in the vicinity thereof (before the movement limit position).

Next, as shown in FIG. 15B, the first and second connecting

members

25, 26 of the Y coarse movement stage 23Y are removed. Note that the procedure shown in FIGS. 15A and 15B may be reversed (the connection member is removed first).

After the first and second connecting

members

25 and 26 are removed, the fine movement stage 21 is supported on the Y coarse movement stage 23Y by the jack stopper device 100 (see FIG. 12). As a result, the Z position of fine movement stage 21 and leveling device 76 (see FIG. 4) is fixed. Next, the internal pressure of the air spring 71 is reduced, and the slide portions 73 (see FIG. 4 respectively) are lowered. As described above, since the Z position of fine movement stage 21 is fixed, self-weight canceling device 27 and leveling device 76 are thereby separated.

Next, in the stage device 11, the connection between the flexure 89 and the Y coarse movement stage 23Y is disconnected, so that the self-weight cancel device 27 is separated from the Y coarse movement stage 23Y. In FIG. 15C, the flexure 89 is cut off at the connecting portion with the Y coarse movement stage 23Y, but the connecting portion between the flexure 89 and the own weight canceling device 27 is cut off to change the own weight canceling device 27 to Y. It may be separated from the coarse movement stage 23Y.

Next, as shown in FIG. 15C, the self-weight canceling device 27 is moved in the + Y direction and passed through the notch 23Ya of the Y coarse movement stage 23Y, so that the self-weight canceling device 27 is notched 23Ya. Through the Y coarse movement stage 23Y. At this time, since the self-weight cancel device 27 is supported in a non-contact manner on the stage base 12, it can be easily detached from the Y coarse movement stage 23Y. Thereafter, the self-weight canceling device 27 is lifted in the + Z-axis direction, so that the self-weight canceling device 27 is detached from the stage device 11. In addition, the operation | work which incorporates the dead weight cancellation apparatus 27 in the stage apparatus 11 is performed in the reverse procedure to the procedure mentioned above.

It should be noted that the connecting

members

25 and 26 are removed and the fine movement stage 21 (first moving body) is supported by the Y coarse movement stage 23Y (second moving body) (the jack stopper device 100 causes the fine movement stage 21 to move to the Y coarse movement stage 23Y. The position where the self-weight canceling device 27 is disengaged from the fine movement stage 21 (the position where the self-weight canceling device 27 and the leveling device 76 are separated), and the connection between the self-weight canceling device 27 and the Y coarse movement stage 23Y is released. Even if at least one of the position (the position where the connection between the flexure 89 and the Y coarse movement stage 23Y is disconnected) and the separation position of the self-weight canceling device 27 from the Y coarse movement stage 23Y are different from the positions described above. good.

Returning to FIG. 1, in the liquid crystal exposure apparatus 10 configured as described above, the mask M is loaded onto the mask stage MST by the mask loader (not shown) and is not shown under the control of the control apparatus (not shown). The substrate P is loaded onto the fine movement stage 21 by the substrate loader. Thereafter, the control device performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its description is omitted.

As described above, the stage apparatus 11 of the present embodiment has the fine movement stage 21, the leveling apparatus 76 that supports the fine movement stage 21 so as to be swingable, and the weight of the fine movement stage 21 via the leveling apparatus 76. A self-weight cancel device 27 supported above is provided (see FIG. 4). The stage apparatus 11 of this embodiment is further provided with a leveling lock device 60 (see FIG. 8) that mechanically restricts the swing of the fine movement stage 21. For example, maintenance of the liquid crystal exposure apparatus 10 is performed. When performing (when the liquid crystal exposure apparatus 10 is not in operation), the attitude of the fine movement stage 21 can be stabilized by locking the fine movement stage 21. Further, since the leveling lock device 60 is provided with a protection device 69 (see FIG. 8) for protecting the leveling device 76, damage to the leveling device 76 can be prevented.

Further, the stage apparatus 11 of this embodiment further includes a plurality of jack stopper devices 100 (see FIG. 12) that can directly support the fine movement stage 21 on the Y coarse movement stage 23Y. The fine movement stage 21 can be surely arranged at a predetermined target position, and fine adjustment of the arrangement position of the fine movement stage 21 can be easily performed. In addition, when performing the exposure process on the substrate P, the jack stopper device 100, together with the gravity center stopper device 40 (see FIG. 9), restricts the movable amount of the fine movement stage 21 in the direction of 6 degrees of freedom. Since it also functions as an apparatus, the fine movement stage 21 is reliably prevented from moving beyond the allowable amount with respect to the Y coarse movement stage 23Y.

In addition, since the stage apparatus 11 of the present embodiment further includes a plurality of positioning devices 120 (see FIG. 12), the fine movement stage 21 can be easily moved to each measuring device (gap sensor 30 (FIG. 12) at the start of exposure. And a measurement origin position (measurement position or reference position) of the leveling origin sensor 97 (see FIG. 4)).

In addition, the stage device 11 of the present embodiment further includes a gravity center stopper device 40 (see FIG. 11) that limits the movable amount of the fine movement stage 21 on a plane parallel to the XY plane including the gravity center CG of the fine movement stage 21. Therefore, even when the movement of the fine movement stage 21 is restricted, it is possible to prevent the leveling device 76 from being loaded.

Further, the notch 23Ya is formed in the Y coarse movement stage 23Y, and the self-weight cancel device 27 is disposed in the notch 23Ya, so that the removal work (and replacement work) of the self-weight cancel device 27 can be easily performed. .

In the leveling lock device 60 of the first embodiment, the air cylinder 54 is provided on the polyhedron member 50 and the roller 56 is provided on the leveling cup 51. However, the present invention is not limited to this. May be arranged on the polyhedron member (or fine movement stage 21). In the leveling lock device 60, the actuator that drives the pressing member 55 is not limited to the air cylinder 54, and may be, for example, a hydraulic cylinder or a feed screw mechanism. In the leveling lock device 60 of the first embodiment, the pressing member 55 is driven in parallel to the XY plane and presses the roller 56 in the −Z direction via the inclined surface. An air cylinder that can extend and contract in the axial direction may be provided, and the leveling cup may be pressed directly in the −Z direction.

In the first embodiment, the jack stopper device 100 is a screw-type jack that is manually operated by an operator. However, the present invention is not limited to this, and an actuator such as a hydraulic jack provided with a hydraulic cylinder and an air provided with an air cylinder. A jack or the like may be used. Further, since the stage apparatus 11 of the first embodiment is a stage apparatus having a so-called coarse / fine movement configuration, the jack stopper apparatus 100 supports the fine movement stage 21 on the Y coarse movement stage 23Y. However, the present invention is not limited to this, and for example, a single movable table member may be supported on a table base (surface plate). Further, the jack stopper device 100 of the first embodiment has a jack function for supporting the fine movement stage 21 on the Y coarse movement stage 23Y and a stopper function for limiting the movable amount of the fine movement stage 21 during exposure or the like. However, the stopper function is not necessarily provided.

In the first embodiment, the positioning device 120 includes the air cylinder. However, the actuator that drives the spherical surface portion 122 is not limited to this, and may be, for example, a hydraulic cylinder or a feed screw mechanism. . Further, the air cylinder is provided on the Y coarse movement stage 23Y side, but conversely, it may be provided on the fine movement stage 21 side.

Further, the stage device 11 of the first embodiment includes a gravity center stopper device 40 that limits the amount of movement of the fine movement stage 21 in the + X direction and the −X direction on the + X side of the fine movement stage 21 (see FIG. 9). However, the center-of-gravity stopper device is not limited to this. For example, the center of gravity stopper device may determine a movable amount only in the + X direction (or -X direction) (movable limit position of the fine movement stage). However, in this case, a gravity center stopper device having a similar structure is further provided on the −X side of the fine movement stage 21, and the movable limit position of the fine movement stage in the −X direction (or + X direction) is determined by this gravity center stopper device.

In the first embodiment, the notch 23Ya that accommodates the self-weight canceling device 27 is formed with a width that allows the self-weight canceling device 27 to pass. However, the notch width is not limited to this, and the self-weight canceling is not limited thereto. It may be narrower than the width of the device 27. Even in this case, the operator can perform maintenance work such as repair and cleaning without removing the dead weight canceling device 27 by removing the connecting

members

25 and 26 and inserting a hand into the notch 23Ya. it can. In the first embodiment, two connecting members (connecting members 25 and 26) are provided on the Y coarse movement stage 23Y. However, the number of connecting members may be one, or may be three or more. . Further, if the rigidity of the Y coarse movement stage is sufficiently ensured, the connecting member is not necessarily provided.

In the first embodiment, the Y coarse movement stage 23Y has the notch 23Ya formed at the end on the + Y side. However, the present invention is not limited to this, and the notch may penetrate in the Y-axis direction. . In this case, the Y coarse movement stage is constituted by a main body part constituted by two members and a connecting member for connecting two members constituting the main body part. In this case, it is convenient because the replacement operation of the self-weight cancel device 27 can be performed from the + Y side and the −Y side of the Y coarse movement stage.

In the above embodiment, the case where the stage device 11 includes the leveling lock device 60, the jack stopper device 100, and the positioning device 120 has been described. However, the mobile device according to the present invention is one of these. Or it is not necessary to provide two. Further, the leveling lock device 60, the jack stopper device 100, and the positioning device 120 are used not only at the time of assembly of the exposure apparatus (including the time of initial assembly and reassembly) but also at the time of maintenance.

<< Second Embodiment >>
Next, a liquid crystal exposure apparatus according to a second embodiment of the present invention will be described with reference to FIGS. 16 to 21B. The liquid crystal exposure apparatus according to the second embodiment is the same as that of the first embodiment except that the configuration of the stage apparatus is different. Therefore, only the differences will be described below. Further, in the stage apparatus according to the second embodiment, illustration or description of parts having the same configuration and function as those of the stage apparatus according to the first embodiment described above is omitted as appropriate.

FIG. 16 shows a plurality of voice coils for finely driving the stage main body 122B of the fine movement stage 221 (see FIG. 17) on the Y coarse movement stage 123Y in the X axis direction, the Y axis direction, or the Z axis direction. The configuration of the motor is shown.

As shown in FIG. 16, a total of eight stators (X stators 16X ₁ and 16X ₂ ,

Y stators

16Y ₁ and 16Y ₂ , Z stators 16Z ₁ and 16Z ₂ are placed on the Y coarse movement stage 123Y. 16Z ₃ , 16Z ₄ ). The X stators 16X ₁ and 16X ₂ are arranged in the vicinity of the + X side end of the upper surface of the Y coarse movement stage 123Y at a predetermined interval in the Y axis direction, and are supported by the support member 13, respectively. The

Y stators

16Y ₁ and 16Y ₂ are arranged in the vicinity of the −Y side end of the upper surface of the Y coarse movement stage 123Y at a predetermined interval in the X-axis direction, and are supported by the support member 13, respectively. Each of the Z stators 16Z ₁ to 16Z ₄ is fixed near the four corners of the Y coarse movement stage 123Y. The X stators 16X ₁ and 16X ₂ , the

Y stators

16Y ₁ and 16Y ₂ , and the Z stators 16Z ₁ to 16Z ₄ each have an armature unit including a plurality of armature coils therein.

Further, X movers 14X ₁ and 14X ₂ having a U-shaped cross section are fixed to the side surface on the + X side of the stage main body 122B. The X movers 14X ₁ and 14X ₂ each include a magnet unit including a plurality of permanent magnets (or a single permanent magnet) arranged along the X-axis direction (not shown) on each pair of opposed surfaces. Have. The X movers 14X ₁ and 14X ₂ engage with the X stators 16X ₁ and 16X ₂ in a state where the stage main body 122B and the Y coarse movement stage 123Y are combined (see FIG. 17). Therefore, the current supplied to the armature unit (armature coil) included in the X stators 16X ₁ and 16X ₂ and the magnetic field formed in the internal space of the magnet unit included in the X movers 14X ₁ and 14X ₂ Due to the electromagnetic interaction between them, it is possible to apply a driving force in the X-axis direction to the X movers 14X ₁ and 14X ₂ . That is, by the X mover 14X ₁ and X stators 16X _1, X-axis voice coil motor 18X ₁ (hereinafter, shortly referred to as X-axis VCM18X ₁₎ is constructed, X mover 14X ₂ and X stators 16X ₂ and a, X-axis voice coil motor 18X ₂ (hereinafter, shortly referred to as X-axis VCM18X ₂₎ is formed.

Further, Y movers 14Y ₁ and 14Y ₂ are fixed to the side surface on the −Y side of the stage body 22B. The Y movers 14Y ₁ and 14Y ₂ are magnet units each including a plurality of permanent magnets (or a single permanent magnet) arranged along the Y-axis direction (not shown) on each pair of opposed surfaces. Have. The Y movers 14Y ₁ and 14Y ₂ engage with the

Y stators

16Y ₁ and 16Y ₂ in a state where the stage main body 122B and the Y coarse movement stage 123Y are combined (see FIG. 17). Therefore, between the current supplied to the armature units (armature coils) of the

Y stators

16Y ₁ and 16Y ₂ and the magnetic field formed in the internal space of the magnet units of the Y movers 14Y ₁ and 14Y ₂ Due to the electromagnetic interaction, a driving force in the Y-axis direction can be applied to each of the Y movers 14Y ₁ and 14Y ₂ . That is, in this embodiment, by a Y mover 14Y ₁ and Y stator 16Y _1, Y-axis voice coil motor 18Y ₁ (hereinafter, shortly referred to as Y-axis VCM18Y ₁₎ it is constructed, and Y mover 14Y ₂ by the Y stator 16Y _2, Y-axis voice coil motor 18Y ₂ (hereinafter, shortly referred to as Y-axis VCM18Y ₂₎ is formed.

Each of the X-axis VCMs 18X ₁ and 18X ₂ and the Y-axis VCMs 18Y ₁ and 18Y ₂ (hereinafter, these four voice coil motors will be collectively referred to as the XY drive VCM 18) are provided outside the stage main body 122B. Has been placed. Accordingly, the structure of the stage main body 122B is simple, small and light, and the maintenance of each voice coil motor is excellent.

Here, the stators and movers of the four voice coil motors X-axis VCMs 18X ₁ and 18X ₂ and Y-axis VCMs 18Y ₁ and 18Y ₂ constituting the XY driving VCM 18 are positioned in the Z-axis direction (stage base 12 (FIG. 17)) is the same. As shown in FIG. 17, the X-axis VCMs 18X ₁ and 18X ₂ (and Y-axis VCMs 18Y ₁ and 18Y ₂ not shown in FIG. 17) are respectively in a single plane parallel to the XY plane. In this case, a driving force (thrust force) for driving the fine movement stage 221 is generated in a horizontal plane including the combined gravity center position CG of the fine movement stage 221 and a slide portion 173 of the self-weight canceling device 127 described later. Actually, the substrate P is placed on the fine movement stage 221, but since the weight of the substrate P is much lighter than the weight of the fine movement stage 221, the change in the composite gravity center position CG due to the substrate P is substantially ignored. it can. Hereinafter, the case where the XY driving VCM 18 generates the driving force in the plane including the center of gravity position CG of the driving target (such as the fine movement stage 21) to drive the driving target will be referred to as center of gravity driving. To do.

Returning to FIG. 16, Z movers 14Z ₁ , 14Z ₂ , 14Z ₃ , 14Z ₄ having an inverted U-shaped cross section are fixed near the four corners of the lower surface (the −Z side surface) of the stage main body 122B. ing. Each of the Z movers 14Z ₁ to 14Z ₄ has a magnet unit including a plurality of permanent magnets (or a single permanent magnet) arranged along the Z-axis direction on a pair of opposing surfaces. Z mover _14Z 1 ~ 14Z ₄ is, in a state where the fine movement stage 21 and the Y coarse movement stage 123Y is Kumia' (see FIG. 17), to engage the respective Z stators _16Z 1 ~ _16Z _4. Therefore, the current supplied to the armature coil of the Z stator _16Z 1 ~ 16Z _4, by the electromagnetic interaction between the magnetic field formed in the internal space of the Z movable elements _14Z 1 ~ 14Z _4, Z movable elements A driving force in the Z-axis direction can be applied to each of 14Z ₁ to 14Z ₄ . That is, in this embodiment, the Z mover 14Z ₁ and the Z stator 16Z ₁ constitute a Z-axis voice coil motor 18Z ₁ (hereinafter abbreviated as Z-axis VCM 18Z ₁ ), and the Z mover 14Z ₂ by the Z stator 16Z _2, Z-axis voice coil motor 18Z ₂ (hereinafter, Z axis VCM18Z ₂ and outlines) are constituted, further, by a Z movable element 14Z ₃ and Z stator 16Z _3, Z-axis voice coil motor 18Z ₃ (hereinafter, Z axis shortly referred to VCM18Z ₃₎ is constituted by a Z mover 14Z ₄ and Z stator 16Z _4, Z-axis voice coil motor 18Z ₄ (hereinafter, Z axis VCM18Z ₄ substantially Is described).

In the stage apparatus 111, as described above, the X-axis VCMs 18X ₁ and 18X ₂ , the Y-axis VCMs 18Y ₁ and 18Y ₂ , and the Z-axis VCMs 18Z ₁ to 18Z ₄ are arranged between the stage main body 122B and the Y coarse movement stage 123Y. Thus, the stage main body 122B can be finely driven in the X axis, Y axis, and Z axis directions with respect to the Y coarse movement stage 123Y. Further, by making the driving force of each of the X-axis VCMs 18X ₁ and 18X ₂ (or the driving force of each of the Y-axis VCMs 18Y ₁ and 18Y ₂ ) different, the stage main body 122B is rotated around the Z axis with respect to the Y coarse movement stage 123Y. Can be finely driven in the rotation direction (θz direction) of the Z-axis, and the Z-axis VCMs 18Z ₁ to 18Z ₄ can be driven differently to move the stage main body 122B to the Y coarse movement stage 123Y. It is possible to finely drive in the rotation direction (θx direction) around the X axis and / or the rotation direction (θy direction) around the Y axis. In FIG. 16, the X-axis VCM and the Y-axis VCM are arranged on the side surfaces on the + X side and the −Y side of the stage main body part 122B, but three or four sides of the stage main body part 122B are shown. Alternatively, the voice coil motors may be distributed. In each voice coil motor, the magnet unit and the armature unit may be at least partially in a reverse positional relationship. The Z-axis VCM only needs to be able to drive the fine movement stage 21 in the Z-axis direction, the θx direction, and / or the θy direction. Therefore, at least so that the driving force can be generated in the Z direction at three points that are not on the same straight line. It is sufficient if three are provided.

Next, the self-weight canceling device 127 and the leveling device 180 that supports the self-weight canceling device 127 in a swingable manner will be described with reference to FIGS.

The self-weight cancel device 127 is inserted into a through-hole 123Ya formed in the Y coarse movement stage 123Y as shown in FIG. Further, as shown in FIG. 18, the self-weight cancel device 127 includes a housing 170, an air spring 71, and a slide portion 173.

Here, as shown in FIG. 17, the stage main body 122B of the fine movement stage 221 of the second embodiment is formed of a (hollow) box-shaped member having a space inside, and an opening is formed at the center of the lower surface thereof. The part is formed. The casing 170 is formed of a bottomed cylindrical member extending in parallel with the Z-axis direction, and its upper end (+ Z side end) is a stage main body of the fine movement stage 221 as shown in FIG. It is inserted into the stage main body 122B through an opening formed in the lower surface of the part 122B. As shown in FIG. 18, a plurality (four in FIG. 18) of air pads 78 are arranged inside the peripheral wall of the housing 170, and each of these air pads 78 is interposed through the ball joint 72. It is attached to the peripheral wall.

A polyhedral member 175 (see FIG. 19) is fixed to the lower surface of the housing 170 as shown in FIG. As shown in FIG. 19, the polyhedral member 175 has an outer shape in which each tip portion of the triangular pyramidal member is flattened, that is, the same shape as the polyhedral member 50 of the first embodiment described above. . The bottom surface of the polyhedral member 175 faces the lower surface of the housing 170. The self-weight canceling device 127 is supported by the leveling device 180 (described later) on the stage base 12 via the polyhedral member 175 so as to be swingable (rotatable by a predetermined amount in the θx direction and the θy direction). The air spring 71 is substantially the same as the air spring 71 (see FIG. 4) of the first embodiment.

The slide portion 173 is a cylindrical member housed in the housing 170, and the outer peripheral surface thereof faces each of the plurality of air pads 78 described above with a predetermined clearance. As shown in FIG. 18, a disc-shaped attachment member 173a is fixed to the upper end portion of the slide portion 173, and the attachment member 173a is attached to the stage main body portion 122B of the fine movement stage 221 via a disc-like spacer 129. (See FIG. 17). Therefore, when the fine movement stage 221 is driven in the XY plane by the XY driving VCM 18 described above, the self-weight cancel device 127 follows the movement and moves in the XY plane integrally with the fine movement stage 221. Note that the spacer 129 is not necessarily provided.

Here, in the stage apparatus 111 of the second embodiment, the slide portion 173 of the dead weight cancellation apparatus 127 is fixed to the fine movement stage 221. Therefore, as shown in FIG. 17, the drive target of the VCM 18 for XY drive The combined gravity center position CG of the fine movement stage 221 and the slide portion 173 in the Z-axis direction is lower than the gravity center position CG ′ of the fine movement stage 221 alone in the Z-axis direction toward the stage base 12 (−Z side). Yes. As described above, the XY driving VCM 18 generates a driving force (see the black arrows in FIG. 17) in the X-axis and Y-axis directions on a plane parallel to the XY plane including the combined gravity center position CG. .

As shown in FIG. 18, the leveling device 180 includes a casing 181 that houses a part (generally the lower half) of the above-described self-weight canceling device 127. The casing 181 is formed in a bottomed cylindrical shape, and the inner diameter dimension thereof is set larger than the outer diameter dimension of the casing 170 of the self-weight canceling device 127. A predetermined clearance is formed between the inner peripheral surface of the casing 181 and the outer peripheral surface of the dead weight canceling device 127. The casing 181 is inserted into the opening 123Ya of the Y coarse movement stage 123Y and the opening 23Xa (not shown in FIG. 18, refer to FIG. 17) of the X coarse movement stage 23X. On the outer peripheral surface near the upper end of the casing 181 are two X arm-like members 184 extending in the + X direction and the −X direction, respectively, and although not shown in FIGS. 17 and 18, the + Y direction and −Y Two Y arm-shaped members (hereinafter, the four arm-shaped members are simply referred to as arm-shaped members 184) extending in the respective directions are fixed. As shown in FIG. 17, a probe portion 92 is fixed to the upper surface of the tip end portion of each of these four arm-shaped members 184. Opposite to the probe portion 92, a target portion 93 is disposed on the main body portion 122B of the fine movement stage 221 as shown in FIG. In the second embodiment, a Z sensor 94 (see FIG. 4) including the probe portion 92 and the target portion 93 and including the same capacitance sensor as that of the first embodiment is configured. For example, the casing 181 may be a flat plate shape, and the four arm-shaped members may be L-shaped. In addition, an arm-shaped member may be arranged below the Y coarse movement stage 23Y. In this case, a hole that penetrates in the Z-axis direction is formed in the Y coarse movement stage Y23Y, and the (Y coarse The Z sensor 94 may be configured so as not to be disturbed by the moving stage 23Y. The Z sensor 94 is not limited to a capacitance sensor, but can be constituted by other sensors such as a laser interferometer and a laser displacement meter.

A plurality of, for example, three air pads 186 (however, one of the three air pads is omitted in FIGS. 17 and 18) are attached to the lower surface of the casing 181 via a ball joint 185. The air pad 186 forms a hydrostatic bearing that floats the casing 181 from the upper surface of the stage base 12 through a predetermined clearance by ejecting a pressurized gas supplied from a gas supply device (not shown) onto the upper surface of the stage base 12. To do.

In the lowermost part of the casing 181, there are three air pads 182 (provided that face each side surface of a polyhedral member 175 (see FIG. 19) fixed to the lower surface of the casing 170 of the dead weight canceling device 127 (however, In FIG. 18, one of the three air pads 182 is omitted). Hereinafter, in order to distinguish from the air pad 186 described above, the air pad 182 is also referred to as a leveling pad 182. Each of the three leveling pads 182 is swingably attached to the casing 181 via a ball joint (or hinge joint) 183. Each leveling pad 182 ejects pressurized gas supplied from a gas supply device (not shown) to each side surface of the polyhedron member 175 so that the self-weight canceling device 127 is centered on a predetermined leveling center point through a predetermined clearance. And a hydrostatic bearing that is supported in a non-contact manner so as to be swingable. Here, as shown in FIG. 18, the leveling center point of the leveling device 180 is arranged in the vicinity of the combined centroid position CG of the fine movement stage 221 and the slide portion 173 (or a position that coincides with the combined centroid position CG). Has been. In the state where the self-weight canceling device 127 shown in FIG. 18 is vertically supported, the elevation angle of each leveling pad 182 (the angle formed by the normal of the bearing surface and the XY plane (horizontal plane)) is set to about 70 °, for example. Has been. However, each of the three leveling pads 182 is connected to the casing 181 via a ball joint 183, and its elevation angle is variable within a very small range. Accordingly, even when the fine movement stage 221 is driven in the θx direction (and / or θy direction) via the Z-axis VCM 18Z, for example, the clearance between the three leveling pads 182 and each side surface of the polyhedral member 175 is substantially equal. Parallel state is maintained.

In the stage device 111 of the second embodiment, when the fine movement stage 221 moves along the XY plane, the slide portion 173 of the self-weight cancel device 127 moves in parallel with the fine movement stage 221 in parallel to the XY plane. At this time, in the self-weight canceling device 127, the distance between the slide portion 173 and the housing 170 is kept constant by the air pad 78. Therefore, when the slide portion 173 moves parallel to the XY plane, the housing 170 follows this. Also move parallel to the XY plane. Since the clearance between each side surface portion of the polyhedron member 175 fixed to the lower surface of the housing 170 and the air pad 182 of the leveling device 180 is kept substantially constant, the casing 181 of the leveling device 180 is provided with a self-weight canceling device. Following 127, it moves parallel to the XY plane. That is, in the stage apparatus 111 of the present embodiment, the fine movement stage 221, the self-weight cancellation apparatus 127, and the leveling apparatus 180 are configured to move integrally with respect to a direction parallel to the XY plane.

Here, in the liquid crystal exposure apparatus, if the substrate to be exposed is enlarged, the substrate table 22A (see FIG. 17) that holds the substrate needs to be enlarged accordingly. On the other hand, when the substrate table 22A is enlarged, the center of gravity position of the fine movement stage 221 is increased due to the accompanying weight increase (in some cases, the center of gravity is within the substrate table 22A). However, if the position of the center of gravity of the fine movement stage 221 is increased as described above, it becomes difficult to dispose the XY drive VCM 18 outside (side) the stage main body 122B in order to drive the fine movement stage 221 with the center of gravity. On the other hand, in the stage device 111 of the second embodiment, as shown in FIG. 18, the slide portion 173 of the self-weight cancel device 127 is fixed to the stage main body portion 122B, and the XY driving VCM 18 is driven. The gravity center position CG of the object (fine movement stage 221 and slide portion 173) is lower than the gravity center position CG ′ of the fine movement stage 221 alone. Therefore, even if the substrate is enlarged, the XY driving VCM 18 can be disposed on the side of the stage main body 122B, that is, the fine movement stage 221 can be easily driven at the center of gravity. Therefore, the position control of the fine movement stage 221 can be performed with high accuracy.

Further, in the stage device 11 of the second embodiment, a part (slide part 73) of the self-weight cancel device 127 is fixed to the stage main body portion 122B, and the fine movement stage 221 and the self-weight cancel device 127 are moved on the stage base 12. Since the structure moves integrally, a member (for example, a member that connects the Y coarse movement stage 123Y and the casing 170 of the self-weight canceling device 127) for interlocking the self-weight canceling device 127 with the fine movement stage 221 becomes unnecessary. The configuration of the stage device 111 can be simplified. In addition, since vibration (disturbance) is not transmitted from the Y coarse movement stage 123Y or the like to the self-weight cancel device 127, the operation of the self-weight cancel device 127 is stabilized.

Further, since the leveling device 180 of the second embodiment is configured to support the lower end portion of the self-weight canceling device 127, the leveling center point (near the combined gravity center position CG of the fine movement stage 221 and the slide portion 73) and And the leveling pad 182 (supporting position of the self-weight canceling device 127) are separated from each other. The leveling pad 182 can be set to have a higher elevation angle as the leveling pad 182 is further away from the leveling center point, thereby increasing the support force of the leveling device 180 (the force for lifting the self-weight cancel device 127 and the fine movement stage 221). FIG. 20 is a diagram for explaining the magnitude of the support force of the leveling device 180. The arrangement of the leveling pad, polyhedral member, fine movement stage, and the like is different from the stage device 111 of the present embodiment. For convenience, the same reference numerals as those of the stage apparatus 111 according to the present embodiment are given. As shown in FIG. 20, the force F by which the three leveling pads 182 (one of the three leveling pads 182 is not shown in FIG. 20) lifts the fine movement stage 221 is F = 3 (N · sin θ −f · cos θ), where θ is the elevation angle of the leveling pad 182, f is the frictional force between the leveling pad 182 and the polyhedral member 175, and N is the force perpendicular to the pad surface (bearing surface) of the leveling pad 182 It is.

Here, in the second embodiment, since the leveling pad 182 supports the polyhedron member 175 in a non-contact manner through air (friction coefficient≈0), F = 3 · N · sin θ. Therefore, as the elevation angle of the leveling pad 182 increases, the force for lifting the fine movement stage 221 and the self-weight canceling device 127 increases. As described above, the leveling device 180 of the present embodiment is disposed below the self-weight canceling device 127, and the leveling center point thereof is disposed in the vicinity of the combined gravity center position CG of the fine movement stage 221 and the slide portion 73. Therefore, the elevation angle of the leveling pad 182 can be set large. Therefore, even if the fine movement stage 221 is enlarged and its weight increases, the fine movement stage 221 and the self-weight cancel device 127 can be reliably supported on the stage base 12.

In the leveling device 180 of the present embodiment, when the elevation angle of the leveling pad 182 (for example, 70 ° in the present embodiment) is large, for example, when the fine movement stage 221 is suddenly accelerated or decelerated (for example, at an emergency stop). There is a possibility that the leveling pad 182 is detached from the polyhedron member 175 due to inertial force. FIG. 21A and FIG. 21B are diagrams for explaining the condition that the leveling pad 182 does not come off from the polyhedron member 175. Referring to FIG. 21A, out of the total weight P (for example, 10000 N) of an object to be supported by the leveling device 180 (fine movement stage 221, own weight cancellation device 127, etc.), it is perpendicular to the bearing surface of the leveling pad 182. The acting component force P1 becomes P1 = P / (2 · cosτ) from 2 · P1 · cosτ = P. Further, as shown in FIG. 21B, when the fine movement stage 221 moves in the horizontal direction (within the XY plane), a horizontal force (for example, abruptly) acting on the leveling pad 182 via the polyhedron member 175. Assuming that the inertial force during acceleration / deceleration is Fx, the condition that the leveling pad 182 does not deviate from the polyhedron member 175 is (P1 + Fx · sinτ) × μ> Fx · cosτ−P · sinτ.

Here, when the friction coefficient μ of air is 0, the above equation becomes Fx <P · sinτ / cosτ. In this embodiment, P = 10000N and τ = 20 °, so if this is substituted, Fx <about 3640N. That is, if the horizontal load Fx is less than 3640 N, the leveling pad 182 does not come off from the polyhedron member 175. In the present embodiment, the level m of the leveling device 180 (casing 181, arm-shaped member 184, ball joint 185, air pad 186, etc.) is, for example, about 200 kg. Accordingly, when Fx = 3640N, from Fx = m · α, α = 1820 m / s ² , and when the fine movement stage 221 moves in the horizontal direction, if the acceleration / deceleration is up to about 1.8 G, the leveling device 180 Can support the dead weight canceling device 127. Note that the elevation angle θ of the leveling pad 182 and the mass m of the leveling device 180 may be appropriately set in consideration of, for example, inertia force (acceleration / deceleration) assumed when the fine movement stage 221 stops suddenly.

In the first and second embodiments, the self-weight cancel

devices

27 and 127 are single columnar members also called core columns, but the shapes of the self-weight cancel

devices

27 and 127 are not limited thereto. Further, in the case of using the core column type self-weight canceling device, the number is not limited to one, and may be plural. Moreover, in the said 1st Embodiment, although the dead weight cancellation apparatus 27 was non-contact supported on the stage base 12, not only this but the contact support may be sufficient. Further, although the self-weight canceling device 27 supports the leveling device 76 in a non-contact manner, it is not limited to this and may support the contact. Further, the self-weight cancel device may directly support the fine movement stage without using a leveling device, and the support method may be either contact support or non-contact support. Moreover, in the said 2nd Embodiment, although the self-weight cancellation apparatus 127 was non-contact supported by the leveling apparatus 180, not only this but the contact support may be sufficient. Further, the leveling device 180 is supported in a non-contact manner on the stage base 12, but is not limited thereto and may be supported in a contact manner.

In the first and second embodiments, as the illumination light, for example, infrared or visible single wavelength laser light oscillated from a DFB semiconductor laser or fiber laser is used, for example, erbium (or erbium and ytterbium Both of them may be amplified with a fiber amplifier doped and then a harmonic wave converted to ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

In the first and second embodiments, the case where the projection optical system PL is a multi-lens projection optical system including a plurality of projection optical units (modules) has been described. The number is not limited to this and may be one or more. The projection optical system is not limited to a multi-lens projection optical system, and may be a projection optical system using an Offner type large mirror.

In the first and second embodiments, the case where the projection optical system PL has the same projection magnification has been described. However, the present invention is not limited to this, and the projection optical system may be either a reduction system or an enlargement system. good.

In the first and second embodiments, a light transmissive mask in which a predetermined light shielding pattern (or phase pattern / dimming pattern) is formed on a light transmissive mask substrate is used. Instead, for example, as disclosed in US Pat. No. 6,778,257, an electronic mask (variable) that forms a transmission pattern, a reflection pattern, or a light emission pattern based on electronic data of a pattern to be exposed. For example, a variable shaping mask using a DMD (Digital Micro-mirror Device) which is a kind of non-light-emitting image display element (also called a spatial light modulator) may be used.

The stage device (11) of each of the embodiments described above is a large substrate for a flat panel display (FPD) such as a substrate having a size (including at least one of an outer diameter, a diagonal line, and one side) of 500 mm or more, for example, a liquid crystal display element. It is particularly effective to apply to an exposure apparatus that exposes a substrate. This is because the stage device of each of the above embodiments includes a leveling device, a self-weight cancel device, a leveling lock device, a protection device, a jack stopper device, a gravity center stopper device, and the like in order to cope with an increase in the size of the substrate. .

In the first and second embodiments described above, the case where the present invention is applied to a projection exposure apparatus that performs scanning exposure with a step-and-scan operation of a plate has been described. The present invention can also be applied to a proximity type exposure apparatus that does not use a projection optical system. The present invention can also be applied to a step-and-repeat type exposure apparatus (so-called stepper) or a step-and-stitch type exposure apparatus.

Further, the use of the exposure apparatus is not limited to an exposure apparatus for liquid crystal that transfers a liquid crystal display element pattern onto a square glass plate. For example, an exposure apparatus for manufacturing a semiconductor, a thin film magnetic head, a micromachine, a DNA chip, etc. The present invention can also be widely applied to an exposure apparatus for manufacturing. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in light exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern. The object to be exposed is not limited to the glass plate, and may be another object such as a wafer, a ceramic substrate, a film member, or mask blanks. Further, as an exposure apparatus for transferring a circuit pattern onto a silicon wafer or the like, for example, an immersion type exposure in which a liquid is filled between a projection optical system and a wafer as disclosed in, for example, US Patent Application Publication No. 2005/0259234. The present invention may be applied to an apparatus or the like.

Further, as disclosed in, for example, International Publication No. 2001/035168, the present invention is also applied to an exposure apparatus (lithography system) that forms line and space patterns on a wafer by forming interference fringes on the wafer. The invention can be applied.

Note that the present invention is not limited to the exposure apparatus, and may be applied to an element manufacturing apparatus provided with, for example, an ink jet type functional liquid application apparatus.

It should be noted that all the publications related to the exposure apparatus and the like cited in the above description, the international publication, the US patent application specification, and the disclosure of the US patent specification are incorporated herein by reference.

<Device manufacturing method>
Next, a microdevice manufacturing method using the liquid crystal exposure apparatus according to the first and second embodiments in a lithography process will be described. In the liquid crystal exposure apparatuses of the first and second embodiments, a liquid crystal display element as a micro device can be obtained by forming a predetermined pattern (circuit pattern, electrode pattern, etc.) on a plate (glass substrate). it can. FIG. 14 is a flowchart for explaining a method of manufacturing a liquid crystal display element as a micro device by forming a predetermined pattern on a plate using the liquid crystal exposure apparatus of the first and second embodiments. is there.

In the pattern forming process of step 202 in FIG. 14, a so-called photolithography process is performed in which a pattern image is formed on a photosensitive substrate (such as a glass substrate coated with a resist) using the liquid crystal exposure apparatus described above. By this photolithography process, a predetermined pattern including a large number of electrodes and the like is formed on the photosensitive substrate. Thereafter, the exposed substrate is subjected to various processes such as a developing process, an etching process, and a resist stripping process, whereby a predetermined pattern is formed on the substrate.

Next, in the color filter forming process in step 204, a large number of sets of three dots corresponding to R (Red), G (Green), and B (Blue) are arranged in a matrix, or R, G, B A color filter is formed by arranging a set of three stripe filters in the direction of a plurality of horizontal scanning lines. Then, after the color filter forming step (step 204), the cell assembly step of step 206 is executed. In the cell assembly process of step 206, a liquid crystal panel (liquid crystal cell) is assembled using the substrate having the predetermined pattern obtained in the pattern formation process, the color filter obtained in the color filter formation process, and the like.

In the cell assembly process of step 206, for example, liquid crystal is injected between a substrate having a predetermined pattern obtained in the pattern formation process and the color filter obtained in the color filter formation process, and a liquid crystal panel (liquid crystal cell ). Thereafter, in the module assembly process of step 208, components such as an electric circuit and a backlight for performing display operation of the assembled liquid crystal panel (liquid crystal cell) are attached to complete the liquid crystal display element.

In this case, since the plate is exposed at a high throughput using the liquid crystal exposure apparatuses of the first and second embodiments in the pattern forming step, as a result, the productivity of the liquid crystal display element can be improved. it can.

As described above, the mobile device of the present invention is suitable for controlling a mobile device. The exposure apparatus of the present invention is suitable for forming a pattern on an object. The device manufacturing method of the present invention is suitable for manufacturing a micro device such as a liquid crystal display element or a semiconductor element.

Claims

A moving body that moves along a predetermined two-dimensional plane parallel to the horizontal plane;
A leveling device for swingably supporting the movable body from below;
A self-weight support device that supports the self-weight of the movable body via the leveling device;
A lock that includes a movable member provided on one of the movable body and the leveling device, and mechanically restricts swinging of the movable body by bringing the movable member into contact with the other of the movable body and the leveling device. A mobile device comprising: a device;
The mobile device according to claim 1,
The movable member has an inclined surface that is inclined with respect to the two-dimensional plane at a tip portion thereof, and moves in parallel with the two-dimensional plane to press the inclined surface against the other of the moving body and the leveling device. A moving body device that restricts swinging of the moving body.
The mobile device according to claim 1 or 2,
The locking device is a moving body device that restricts swinging of the moving body at at least three points that are not on the same straight line in the two-dimensional plane.
The mobile device according to any one of claims 1 to 3,
When a load more than a predetermined load acts on the leveling device in a direction intersecting the two-dimensional plane via the movable member in a state where the swing of the moving body is limited by the locking device, A mobile device further comprising a protection device for absorbing the load.
The mobile device according to claim 4,
The protection device is a mobile device that absorbs the load by changing the position or shape of some of the constituent members.
The mobile device according to any one of claims 1 to 5,
The leveling device is a moving body device that supports the moving body in a non-contact manner.
The mobile device according to any one of claims 1 to 6,
The leveling device is a mobile device that is supported in a non-contact manner by the self-weight support device.
The mobile device according to any one of claims 1 to 7,
A second member fixed to the moving body and including a first engaging portion, and a second member fixed to an opposing member disposed to face the lower surface of the moving body and engageable with the first engaging portion. A second member including an engaging portion, and engaging the first and second engaging portions to mechanically move the movable body and the opposing member in a direction approaching each other at least. A mobile device further provided with a stopper device limited to
A moving body that moves along a predetermined two-dimensional plane parallel to the horizontal plane;
A leveling device for swingably supporting the movable body from below;
A self-weight support device that supports the self-weight of the movable body via the leveling device;
A second member fixed to the moving body and including a first engaging portion, and a second member fixed to an opposing member disposed to face the lower surface of the moving body and engageable with the first engaging portion. A second member including an engaging portion, and engaging the first and second engaging portions to mechanically move the movable body and the opposing member in a direction approaching each other at least. A movable body device comprising: a stopper device limited to
The mobile device according to claim 8 or 9,
The stopper device has each of the first and second members at least at three locations that are not on the same straight line within the two-dimensional plane, and the movable body and the opposing member at three locations within the two-dimensional plane. Mobile device that restricts relative movement of
The mobile device according to any one of claims 8 to 10,
One of the first and second engaging portions has a spherical portion at least partially, and the other of the first and second engaging portions is formed with a conical recess that fits with the spherical portion. Including mobile device.
The mobile device according to any one of claims 8 to 11,
The first member further includes a third engagement portion,
The second member is engaged with the third engaging portion through a predetermined clearance when the first and second engaging portions are in a non-engaged state, and at least the two-dimensional shape is provided by the clearance. A fourth engagement portion that mechanically defines a movable amount of the movable body with respect to the opposing member with respect to a first and second axial directions orthogonal to each other in a plane and a third axial direction orthogonal to the two-dimensional plane; A mobile device comprising:
The mobile device according to claim 12, wherein
At least one of the third and fourth engaging portions is a movable body device that is movable in the third axial direction.
The mobile device according to any one of claims 8 to 13,
A third member fixed to the movable body and including a fifth engaging portion; and a fourth member including a sixth engaging portion fixed to the opposing member and engageable with the fifth engaging portion. And when the first and second engaging portions of the stopper device are in the non-engaged state, the fifth and sixth engaging portions are engaged, and at least the position within the two-dimensional plane of the movable body A movable body device further comprising a positioning device that positions the first and second engaging portions at the same position as when the first and second engaging portions are engaged.
The mobile device according to claim 14,
It further includes a measurement system that measures position information of at least the two-dimensional plane of the movable body and sets the measurement origin position in a state where the first and second engaging portions of the stopper device are engaged. Mobile device.
The mobile device according to claim 14 or 15,
The positioning device has the fifth and sixth engaging portions in at least three places that are not on the same straight line, and positions the moving body at at least three points that are not on the same straight line in the two-dimensional plane. Mobile device.
The mobile device according to any one of claims 14 to 16,
One of the fifth and sixth engaging portions has a spherical portion at least in part, and the other of the fifth and sixth engaging portions is formed with a conical recess that fits into the spherical portion. Mobile device.
The mobile device according to any one of claims 14 to 17,
The positioning device includes a actuator that drives at least one of the fifth and sixth engaging portions to engage the fifth and sixth engaging portions.
The moving body device according to any one of claims 1 to 18, wherein an object is placed on the moving body;
An exposure apparatus comprising: a pattern forming apparatus that forms a predetermined pattern by irradiating the object with an energy beam.
A first moving body that moves along a predetermined two-dimensional plane including at least first and second axes orthogonal to each other and parallel to a horizontal plane;
A second moving body movable above the first moving body in a plane parallel to the two-dimensional plane with respect to the first moving body;
A self-weight support device that supports the weight of the second moving body from below and moves along the two-dimensional plane together with the first moving body;
A part of the second moving body is brought into contact with a part of the first moving body on a plane parallel to the two-dimensional plane including the position of the center of gravity of the second moving body, and the first and second A setting device that mechanically sets a movement limit position of the second moving body with respect to the first moving body with respect to at least one of the axial directions.
The mobile device according to claim 20,
The setting device is a mobile device that sets a movement limit position in two opposite movement directions with respect to at least one of the first and second axial directions.
The mobile device according to claim 21, wherein
The setting device is provided on one of the first and second moving bodies, and is provided on the other of the pair of wall members orthogonal to the setting target direction of the movement limit position and the first and second moving bodies, A moving body device including a stopper member disposed between the pair of wall members, wherein the movement limit position is set according to a distance between the pair of wall members and the stopper member.
The mobile device according to any one of claims 20 to 22,
The setting device includes a first axial direction setting device that defines a movement limit position in the first axis direction, and a second axial direction setting device that defines a movement limit position in the second axis direction. And a plurality of second-axis-direction setting devices.
The mobile device according to any one of claims 20 to 23,
The setting device further includes a moving body that mechanically sets at least one of a rotation limit position around the first axis and a rotation limit position around the second axis of the second moving body with respect to the first moving body. apparatus.
The mobile device according to any one of claims 20 to 24,
The self-weight support device is a mobile device that supports the second mobile body in a non-contact manner.
The mobile device according to any one of claims 20 to 25,
The second moving body is moved in a non-contact manner with respect to the first moving body by an actuator including a stator provided on the first moving body and a mover provided on the second moving body. Body equipment.
The mobile device according to any one of claims 20 to 26, wherein an object is placed on the second mobile body;
An exposure apparatus comprising: a pattern forming apparatus that forms a predetermined pattern by irradiating the object with an energy beam.
A first moving body that moves along a predetermined two-dimensional plane parallel to the horizontal plane;
A dead weight support device for supporting the dead weight of the first moving body from below;
A second moving body that is movable along a plane parallel to the two-dimensional plane, has a notch formed in at least a part of an outer peripheral edge thereof, and the self-weight support device is disposed in the notch. A mobile device comprising:
29. A mobile device according to claim 28.
The notch is a mobile device having a width that allows passage of the self-weight support device.
The mobile device according to claim 28 or 29,
A said 2nd moving body is a moving body apparatus provided with the connection member constructed between a pair of opposing surfaces which divides the said notch.
The mobile device according to claim 30, wherein
A mobile device provided with a plurality of the connecting members.
The mobile device according to any one of claims 28 to 31,
A mobile device further comprising a connection member that mechanically connects the self-weight support device and the second mobile body and interlocks the self-weight support device and the second mobile body along a plane parallel to the predetermined plane. .
The mobile device according to claim 32, wherein
The connection member is a mobile device that detachably connects the self-weight support device to the second mobile body.
The mobile device according to any one of claims 28 to 33,
The self-weight support device is a moving body device that supports the first moving body in a non-contact manner.
The mobile device according to any one of claims 1 to 18, 20 to 26, 28 to 34,
The self-weight support device is a mobile device comprising a single columnar member perpendicular to the two-dimensional plane.
The mobile device according to any one of claims 1 to 18, 20 to 26, 28 to 35,
The self-weight support device is a mobile device that is supported in a non-contact manner on a base parallel to the two-dimensional plane.
A first moving body movable along a predetermined two-dimensional plane parallel to the horizontal plane;
A self-weight support device including a fixing member fixed to the first moving body, and supporting the self-weight of the first moving body from below on a base parallel to the two-dimensional plane;
An actuator that generates a driving force in a plane parallel to the two-dimensional plane including a composite barycentric position in a direction orthogonal to the two-dimensional plane between the first moving body and the fixed member; and And a drive system that drives in a plane parallel to the two-dimensional plane.
38. A mobile device according to claim 37.
A movable body device further comprising a swing support device that supports the self-weight support device so as to swing on the base from below.
40. A mobile device according to claim 38.
The swing support device is a mobile device that supports the self-weight support device in a non-contact state.
40. A mobile device according to claim 39.
The swing support device includes a hydrostatic bearing that ejects gas to the self-weight support device and supports the self-weight support device in a floating manner.
The mobile device according to any one of claims 37 to 40,
The swing support device is a mobile device that is supported in a non-contact manner on the base.
The mobile device according to any one of claims 37 to 41,
The self-weight support device is a movable body device including a single columnar member orthogonal to the upper surface of the base.
The mobile device according to any one of claims 37 to 42, wherein the actuator is arranged outside the first mobile body.
The mobile device according to any one of claims 37 to 43,
The actuator is a mobile device that is a voice coil motor.
The mobile device according to any one of claims 37 to 44,
A second moving body that is disposed between the first moving body and the base and is movable along the predetermined two-dimensional plane;
The actuator includes a stator provided on the second moving body and a mover provided on the first moving body,
The driving system is a moving body device that drives the first moving body with respect to the second moving body.
The mobile device according to any one of claims 37 to 45,
The actuator generates a driving force in a first axis direction in the two-dimensional plane and a second actuator generates a driving force in a second axis direction orthogonal to the first axis in the two-dimensional plane. A mobile device including an actuator.
49. A mobile device according to claim 46.
A moving body device in which a plurality of the first actuators and the second actuators are provided.
The mobile device according to any one of claims 28 to 47, wherein an object is placed on the first mobile body;
An exposure apparatus comprising: a pattern forming apparatus that forms a predetermined pattern by irradiating the object with an energy beam.
In the exposure apparatus according to any one of claims 19, 27, and 48,
The object is an exposure apparatus including a substrate having a size of 500 mm or more.
The exposure apparatus according to any one of claims 19, 27, 48, and 49,
The object is an exposure apparatus including a substrate for a flat panel display.
Exposing an object using the exposure apparatus according to any one of claims 19, 27, and 48 to 50;
Developing the exposed object. A device manufacturing method comprising:
Positioning a movable body movable in a direction parallel to and intersecting a predetermined two-dimensional plane parallel to the horizontal plane at a predetermined measurement position;
The movement of the moving body is mechanically performed by engaging the first member fixed to the moving body and the second member fixed to the facing member disposed to face the lower surface of the moving body. Fixing at least one of the first and second members of the limiting stopper device to the corresponding moving body or the opposing member in a state where the moving body is positioned at the measurement position. A method for assembling a mobile device.
The method of assembling a mobile device according to claim 52,
The moving body is positioned in a state in which a member fixed after the positioning is attached in a non-fixed state and the first member and the second member are engaged with each other.
54. The method of assembling a mobile device according to claim 52 or 53,
A method of assembling a mobile device using a self-weight support device that generates a vertical upward force to support the weight of the mobile from below when positioning the vertical position of the mobile.
In the method for assembling the moving body according to any one of claims 52 to 54,
After the stopper device is fixed, the first member and the second member are disengaged to confirm the posture of the moving member supported by the self-weight support device. Assembly method.
A method for assembling a mobile device according to any one of claims 52 to 55,
The relative movement of the movable body and the opposing member in the horizontal direction is mechanically engaged by engaging a third member fixed to the movable body and a fourth member fixed to the opposing member. Among the positioning devices to be restricted, at least one of the third member and the fourth member is fixed to the corresponding moving body or opposing member in a state where the moving body is positioned at the measurement position by the stopper device. And a method for assembling the mobile device.
A cutout that extends in a first axial direction in a predetermined two-dimensional plane parallel to the horizontal plane and that opens on one side in the first axial direction is formed in at least a part of the outer peripheral edge, and the first cutout is formed in the first cutout. Driving a second moving body in which a self-weight support device for supporting the own weight of the moving body from below is arranged to a vicinity of a predetermined position on the other side in the first axial direction;
Removing a connecting member erected between a pair of opposing surfaces that defines the notch from the second moving body;
By a stopper device that mechanically limits the movement of the first moving body by engaging the first member provided on the first moving body and the second member provided on the second moving body. Supporting the first moving body on the second moving body;
Separating the self-weight support device from the first moving body;
Releasing the connection between the self-weight support device and the second moving body to separate them;
Moving the self-weight support device to one side in the first axial direction and passing it through the notch of the second moving body, thereby detaching it from the second moving body;
A maintenance method for a mobile device including
A first moving body that holds an object and moves along a predetermined two-dimensional plane parallel to the horizontal plane, a leveling device that supports the first moving body so as to be swingable from below, and a lower surface of the first moving body A self-weight support device that is provided on a second moving body that is disposed opposite to and supports the self-weight of the moving body via the leveling device.
An exposure apparatus maintenance method comprising mechanically limiting swinging of the movable body by a lock device.
The exposure apparatus maintenance method according to claim 58, wherein:
An exposure apparatus maintenance method, further comprising mechanically restricting relative movement between the first moving body and the second moving body in a direction in which the first moving body and the second moving body are close to each other by a stopper device.
A first moving body that holds an object and moves along a predetermined two-dimensional plane parallel to the horizontal plane, a leveling device that supports the first moving body so as to be swingable from below, and a lower surface of the first moving body A self-weight support device that is provided on a second moving body disposed opposite to the first moving body and supports the self-weight of the first moving body via the leveling device.
A method for adjusting an exposure apparatus, comprising: mechanically restricting relative movement of the first moving body and the second moving body in at least a direction approaching each other by a stopper device.
In the adjustment method of the exposure apparatus according to claim 60,
An exposure apparatus adjustment method that restricts relative movement between the first moving body and the second moving body at least at three locations that are not on the same straight line by the stopper device.
In the adjustment method of the exposure apparatus according to claim 60 or 61,
The self-weight support device generates an upward force in the vertical direction, lifts the first moving body from below, and releases the restriction on the relative movement between the first moving body and the second moving body. A method for adjusting an exposure apparatus, further comprising confirming a posture of the movable body supported by the exposure apparatus.
An exposure apparatus maintenance method comprising executing the exposure apparatus adjustment method according to any one of claims 60 to 62.
An exposure apparatus assembling method comprising executing the exposure apparatus adjustment method according to any one of claims 60 to 62.