JP2011085672A - Mobile object device, exposure apparatus, and method for manufacturing device - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To provide a weight canceling device having a simple configuration. <P>SOLUTION: The weight canceling device 100 includes a cylindrical housing 102, an air spring 104 housed in the lowermost part of the housing 102, and a Z slider 106 mounted above the air spring 104. The Z slider 106 is mechanically connected to a guide cylinder 130 comprising a cylindrical member inserted into the housing 102, by a plurality of parallel leaf spring devices 140 including a pair of leaf springs 142 spaced apart from each other in a vertical direction (Z-axis direction). Therefore, the Z slider 106 can be guided with the vertical direction with high accuracy in a simple configuration. <P>COPYRIGHT: (C)2011,JPO&INPIT

Description

  The present invention relates to a mobile device, an exposure apparatus, and a device manufacturing method. More specifically, the present invention relates to a mobile device including a weight cancellation device that cancels the weight of the mobile body, an exposure apparatus including the mobile device, and the exposure. The present invention relates to a device manufacturing method using an apparatus.

  Conventionally, in a lithography process for manufacturing electronic devices (microdevices) such as liquid crystal display elements, semiconductor elements (integrated circuits, etc.), a step-and-repeat type projection exposure apparatus (so-called stepper) or step-and- A scanning projection exposure apparatus (a so-called scanning stepper (also called a scanner)) or the like is used.

  2. Description of the Related Art Conventionally, as this type of exposure apparatus, an exposure apparatus that includes a weight cancellation apparatus that cancels the weight (vertical downward force) of a stage member on which a substrate is placed is known (for example, see Patent Document 1). .

  The weight cancellation device described in Patent Document 1 has an air spring capable of adjusting the internal pressure, and has a structure that cancels the weight of the stage member using a vertical upward force generated by the air spring. A movable member movable in the vertical direction is disposed between the stage members. The movable member is guided in the vertical direction in a non-contact state with respect to the housing by a plurality of gas static pressure bearings (air pads) attached to the inner wall surface of the housing formed in a cylindrical shape.

  However, in the weight cancellation device described in Patent Literature 1, when the gap between the movable member and the bearing surface of the air pad changes due to, for example, distortion in the housing due to a load acting on the housing. There is a possibility that the dynamic characteristics of the movable member will fluctuate, which may affect the controllability of the stage member, or the movable member and the air pad may come into contact with each other. For this reason, it is necessary to appropriately adjust the gap between the outer peripheral surface of the movable member and the bearing surface of the air pad. However, since it is necessary to disassemble the weight canceling device, much work and time are required for the work. It was.

International Publication No. 2008/129762

  The present invention has been made under the above circumstances, and from a first viewpoint, a movable body that can move at least in the vertical direction; and a weight cancellation device that cancels the weight of the movable body below the movable body And the weight canceling device includes a cylindrical main body, a force generator that generates upward force in the vertical direction in the main body, and the force generator and the movable body. A transmission unit that transmits force between the moving body and the force generation unit, mechanically connects the main body unit and the transmission unit, and the elasticity of the transmission unit is perpendicular to the main body unit due to its elasticity. And a restriction device that allows relative movement in the direction and restricts relative movement in the horizontal direction of the transmission unit with respect to the main body by its rigidity.

  According to this, the weight canceling device cancels (cancels) the weight of the moving body (vertical downward force) by the force generator generating a vertical upward force. Moreover, the transmission part which transmits the force between the moving body and the force generation part is mechanically connected to the main body part by the limiting device. Here, the limiting device does not hinder the transmission of force between the moving body and the force generation unit by allowing the transmission unit to move in the vertical direction due to its elasticity, but the rigidity of the body of the transmission unit due to its rigidity Limit relative movement in the horizontal direction to the part. Accordingly, the distance between the main body portion and the transmission portion does not change, the operation of the transmission portion is stabilized, and maintenance is facilitated.

  From a second viewpoint, the present invention provides a moving body apparatus according to the present invention in which a predetermined object is placed on the moving body; a pattern forming apparatus that forms a predetermined pattern on the object by exposure with an energy beam; Is an exposure apparatus.

  From a third aspect, the present invention is a device manufacturing method including: exposing the object using the exposure apparatus of the present invention; and developing the exposed object.

It is a figure which shows schematic structure of the liquid-crystal exposure apparatus which concerns on 1st Embodiment. It is sectional drawing of the substrate stage apparatus which the liquid-crystal exposure apparatus of FIG. 1 has. It is sectional drawing which shows the weight cancellation apparatus which the substrate stage apparatus of FIG. 2 has. FIG. 4A to FIG. 4D are diagrams for explaining an assembly procedure of the weight cancellation device. FIG. 5A and FIG. 5B are model diagrams schematically illustrating the weight cancellation device. It is a longitudinal cross-sectional view which shows the dead weight cancellation apparatus which concerns on 2nd Embodiment.

<< First Embodiment >>
Hereinafter, a first embodiment of the present invention will be described with reference to FIGS. 1 to 5B.

  FIG. 1 shows a schematic configuration of a liquid crystal exposure apparatus 10 according to the first embodiment. The liquid crystal exposure apparatus 10 is a step-and-scan type projection exposure that uses a rectangular (square) glass substrate P (hereinafter simply referred to as a substrate P) used for, for example, a display panel of a liquid crystal display device as an exposure object. A device, a so-called scanner.

  The liquid crystal exposure apparatus 10 includes an illumination system IOP, a mask stage MST for holding a mask M, a projection optical system PL, a body BD on which the mask stage MST and the projection optical system PL are mounted, and a substrate stage apparatus PST for holding a substrate P. , And their control system. In the following, the direction in which the mask M and the substrate P are relatively scanned with respect to the projection optical system PL at the time of exposure is defined as the X-axis direction, and the directions orthogonal to this in the horizontal plane are the Y-axis direction, X-axis, and Y-axis. The direction orthogonal to the Z-axis direction will be described, and the rotation (tilt) directions around the X-axis, Y-axis, and Z-axis will be described as the θx, θy, and θz directions, respectively.

  The illumination system IOP is configured similarly to the illumination system disclosed in, for example, US Pat. No. 6,552,775. That is, the illumination system IOP emits light emitted from a light source (not shown) (for example, a mercury lamp) through exposure mirrors (not shown), dichroic mirrors, shutters, wavelength selection filters, various lenses, and the like. Irradiation light) is applied to the mask M as IL. As the illumination light IL, for example, light such as i-line (wavelength 365 nm), g-line (wavelength 436 nm), h-line (wavelength 405 nm), or the combined light of the i-line, g-line, and h-line is used. Further, the wavelength of the illumination light IL can be appropriately switched by a wavelength selection filter, for example, according to the required resolution.

  A mask M having a circuit pattern or the like formed on its pattern surface (the lower surface in FIG. 1) is fixed to the mask stage MST by, for example, vacuum suction (or electrostatic suction). The mask stage MST is levitated and supported in a non-contact state, for example, via an air bearing (not shown) on a pair of mask stage guides 35 fixed to the upper surface of a lens barrel base plate 31 that is a part of a body BD described later. ing. The mask stage MST is driven with a predetermined stroke in the scanning direction (X-axis direction) on the pair of mask stage guides 35 by a mask stage drive system (not shown) including a linear motor, for example, And are slightly driven appropriately in the θz direction. Position information of the mask stage MST in the XY plane (including rotation information in the θz direction) is measured by a mask interferometer system including a laser interferometer 38 that irradiates a measurement beam on a reflecting surface (not shown) of the mask stage MST. Is done.

  Projection optical system PL is supported by lens barrel surface plate 31 below mask stage MST in FIG. The projection optical system PL of this embodiment has the same configuration as the projection optical system disclosed in, for example, US Pat. No. 6,552,775. That is, the projection optical system PL has a plurality of optical systems (lens barrels) including lens modules and the like, and the plurality of optical systems are arranged in a so-called staggered pattern along the Y-axis direction (multi-lens projection). Also called optical system). As each of the plurality of optical systems, for example, a bilateral telecentric equal magnification system that forms an erect image is used. The aforementioned illumination system IOP is configured to irradiate the mask M with a plurality of illumination lights IL corresponding to the plurality of optical systems. Therefore, on the mask M, illumination areas of a plurality of illumination lights IL arranged in a staggered pattern are formed, and on the substrate P arranged below the projection optical system PL, a plurality of optical systems are respectively provided. Corresponding to the above, irradiation regions of a plurality of illumination lights IL arranged in a staggered pattern are formed. In the liquid crystal exposure apparatus 10, the projection optical system PL including a plurality of optical systems arranged in a staggered manner has a Y axis direction as a longitudinal direction by combining a plurality of irradiation regions formed on the substrate P. It functions in the same way as a projection optical system having a single rectangular image field.

  For this reason, when the illumination area on the mask M is illuminated by the illumination light IL from the illumination system IOP, the illumination light IL that has passed through the mask M causes the circuit of the mask M in the illumination area to pass through the projection optical system PL. Irradiation region of illumination light IL conjugate to an illumination region on a substrate P on which a resist (sensitive agent) is coated, on which a projection image (partial upright image) of a pattern is arranged on the image plane side of projection optical system PL It is formed in (exposure area). Then, by synchronous driving of the mask stage MST and the substrate stage apparatus PST, the mask M is moved relative to the illumination area (illumination light IL) in the scanning direction (X-axis direction), and at the exposure area (illumination light IL). On the other hand, when the substrate P is relatively moved in the scanning direction (X-axis direction), scanning exposure of one shot region (partition region) on the substrate P is performed, and the pattern of the mask M is transferred to the shot region. . That is, in this embodiment, the pattern of the mask M is generated on the substrate P by the illumination system IOP and the projection optical system PL, and the pattern is formed on the substrate P by exposure of the sensitive layer (resist layer) on the substrate P by the illumination light IL. Is formed.

  The body BD includes a substrate stage base 33 and a lens barrel base plate 31 supported horizontally via a pair of support members 32 arranged on the substrate stage base 33. The substrate stage gantry 33 is made of a member whose longitudinal direction is the Y-axis direction, and both ends in the longitudinal direction are supported by the vibration isolation mechanism 34 installed on the floor surface F. Vibrationally separated. As a result, the body BD, the projection optical system PL supported by the body BD, and the like are vibrationally separated from the floor surface F.

  The substrate stage apparatus PST includes a surface plate 12 fixed on a substrate stage mount 33, a pair of base frames 14 arranged at predetermined intervals in the Y-axis direction, and an X coarse motion mounted on the pair of base frames 14. The Y coarse movement stage 23Y, which is mounted on the stage 23X and the X coarse movement stage 23X and constitutes the XY two-dimensional stage apparatus together with the X coarse movement stage 23X, is disposed on the + Z side (upper side) of the Y coarse movement stage 23Y. A fine movement stage 21 and a weight cancellation device 100 that supports the fine movement stage 21 on the surface plate 12 are provided.

  The surface plate 12 is made of a rectangular plate-like member (for example, viewed from the + Z side) formed of a stone material, and the upper surface thereof is finished with extremely high flatness.

  One of the pair of base frames 14 is disposed on the + Y side of the surface plate 12, and the other is disposed on the −Y side of the surface plate 12. Each of the pair of base frames 14 is made of a member whose longitudinal direction is the X-axis direction, and is fixed to the floor surface F in a state of straddling the substrate stage mount 33. Although not shown in FIG. 1, the pair of base frames 14 includes an X linear guide for linearly guiding the X coarse movement stage 23X in the X axis direction, and an X linear motor for driving the X coarse movement stage 23X. It has the X stator (for example, coil unit) etc. which comprise.

  The X coarse movement stage 23X is composed of a frame-like member having a rectangular outer shape in plan view, and has a long hole-like opening 23Xa (see FIG. 2) with the Y-axis direction as the longitudinal direction at the center. Yes. On the lower surface of the X coarse movement stage 23X, a pair of stage guides 15 formed in a YZ cross-section inverted U shape are fixed corresponding to the pair of base frames 14. Although not shown in FIG. 1, the stage guide 15 constitutes an X linear motor together with a slide member slidably engaged with an X linear guide (not shown) of the base frame 14 and the X stator described above. X mover (for example, a magnet unit) or the like. The X coarse movement stage 23X is driven with a predetermined stroke in the X axis direction on the pair of base frames 14 by an X coarse movement stage drive system including an X linear motor. A pair of Y linear guides 28 that are spaced apart in the X-axis direction are fixed to the upper surface of the X coarse movement stage 23X (the Y linear guide 28 on the −X side is hidden behind the paper surface). ). Although not shown in FIG. 1, a Y stator (for example, a coil unit) constituting a Y linear motor that drives the Y coarse movement stage 23Y is fixed to the upper surface of the X coarse movement stage 23X.

  The Y coarse movement stage 23Y is composed of a frame-like member having a rectangular outer shape in plan view, which is shorter in the Y-axis direction than the X coarse movement stage 23X, and has an opening 23Ya (see FIG. 2) at the center thereof. Have. A slide member 29 formed in an inverted U-shaped XZ cross section is fixed to, for example, the four corners of the lower surface of the Y coarse movement stage 23Y (the two sliders 29 on the −X side are hidden behind the paper surface). ). The two slide members 29 on the + X side are slidably engaged with the Y linear guide 28 on the + X side, and the two slide members 29 on the −X side (not shown) are the X linear guides 28 (not shown) on the −X side. ) Is slidably engaged. Although not shown in FIG. 1, a Y mover (for example, a magnet unit) that constitutes a Y linear motor is fixed to the lower surface of the Y coarse movement stage 23Y together with the Y stator described above. The Y coarse movement stage 23Y is driven with a predetermined stroke in the Y axis direction on the X coarse movement stage 23X by a Y coarse movement stage drive system including a Y linear motor. Position information of each of the X coarse movement stage 23X and the Y coarse movement stage 23Y is measured by, for example, a linear encoder system (not shown). Note that the drive system for driving the X coarse movement stage 23X and the Y coarse movement stage 23Y in the X-axis direction and the Y-axis direction, respectively, may be another system such as a drive system using a feed screw or a belt drive system. . Further, the position information of each of the X coarse movement stage 23X and the Y coarse movement stage 23Y may be obtained by another measurement method such as an optical interferometer system.

  Fine movement stage 21 is formed of a rectangular parallelepiped member having a substantially square shape in plan view, and holds substrate P on its upper surface via substrate holder PH. The substrate holder PH has, for example, a vacuum suction device (or electrostatic suction device) (not shown) and holds the substrate P on the upper surface thereof. A Y movable mirror (bar mirror) 22Y having a reflecting surface perpendicular to the Y axis is fixed to the side surface on the −Y side of fine movement stage 21 via mirror base 24Y. Further, an X movable mirror (not shown) having a reflecting surface orthogonal to the X axis is fixed to a side surface on the −X side of fine movement stage 21 via a mirror base (not shown). The positional information of the fine movement stage 21 in the XY plane is, for example, 0.5 by a laser interferometer system including a laser interferometer that irradiates each of the Y movable mirror 22Y and the X movable mirror with a measurement beam and receives the reflected light. It is always detected with a resolution of about 1 nm. The laser interferometer system includes an X laser interferometer and a Y laser interferometer corresponding to the Y movable mirror 22Y and the X movable mirror, respectively. In FIG. It is shown in the figure.

  As shown in FIG. 2, fine movement stage 21 includes a Y stator 16y (for example, a coil unit) fixed to Y coarse movement stage 23Y, and a Y mover 17y (for example, a magnet unit) fixed to fine movement stage 21. ) Is slightly driven in the Y-axis direction on the Y coarse movement stage 23Y by the Y voice coil motor 18y of the Lorentz electromagnetic force drive system. Although not shown in FIG. 2, a plurality of Y voice coil motors 18y are provided at predetermined intervals in the X-axis direction. Although not shown in FIG. 2, the fine movement stage 21 is a Lorentz electromagnetic force drive system including an X stator fixed to the Y coarse movement stage 23 </ b> Y and an X mover fixed to the fine movement stage 21. The X voice coil motor is slightly driven in the X-axis direction on the Y coarse movement stage 23Y. A plurality of X voice coil motors are provided at predetermined intervals in the Y-axis direction. Further, the fine movement stage 21 includes a Z stator 16z fixed to the Y coarse movement stage 23Y and a Z mover 17z fixed to the fine movement stage 21 by a Lorentz electromagnetic force drive type Z voice coil motor 18z. It is slightly driven in the Z-axis direction on the Y coarse movement stage 23Y. The Z voice coil motor 18z is disposed at a position corresponding to the four corners of the fine movement stage 21, for example. With the above configuration, the fine movement stage 21 can move (coarse movement) with a long stroke in the XY 2-axis direction with respect to the projection optical system PL (see FIG. 1), and has six degrees of freedom (X-axis, Y-axis, Z-axis). , Θx, θy, and θz) (moving slightly). Further, fine movement stage 21 has a device called leveling device 120 on its lower surface side. The configuration of the leveling device 120 will be described in detail later.

  As shown in FIG. 2, the weight canceling apparatus 100 is inserted into the opening 23Xa of the X coarse movement stage 23X and the opening 23Ya of the Y coarse movement stage 23Y, and extends in the Z-axis direction. It is also called a core column. The weight canceling apparatus 100 supports the central portion of the fine movement stage 21 from below via the leveling apparatus 120. As shown in FIG. 3, the weight cancellation device 100 includes a housing 102, an air spring 104, and a Z slider 106.

  The casing 102 includes a base 102a made of a plate-like member having an octagonal outer shape in plan view, and a housing 102b made of a cylindrical member having an outer shape having an octagonal XY cross section fixed to the upper surface of the base 102a. And including. The casing 102 is supported in a non-contact manner on the surface plate 12 by a plurality of static gas bearings, for example, air bearings 108 (also referred to as base pads) attached to the lower surface of the base 102a (see FIG. 2). . Further, as shown in FIG. 2, the housing 102 is attached to the Y coarse movement stage 23Y by a plurality of connecting devices 110 (also referred to as flexure devices) including a leaf spring (or a thin steel plate having no spring property). It is connected. The coupling device 110 is provided on each of the + X side, the −X side, the + Y side, and the −Y side of the housing 102, and the center of gravity of the weight canceling device 100 in the Z-axis direction is connected to the Y coarse movement stage 23Y. It is connected at a nearby position (height) (however, the + X side and −X side coupling devices 110 are not shown). The case 102 is pulled by the Y coarse movement stage 23Y via the coupling device 110, thereby moving on the surface plate 12 in the X axis direction and / or the Y axis direction integrally with the Y coarse movement stage 23Y. .

  A plurality of (for example, four) arm members 112 are fixed to the outer wall surface of the housing 102 (two of the four arm members are not shown). The four arm members 112 extend radially so as to form an angle of, for example, 45 ° with respect to the X axis and the Y axis. At the front end of each of the four arm members 112, together with four laser displacement sensors 92 (two of the four laser displacement sensors are not shown) fixed to the lower surface of the fine movement stage 21, the weight cancellation of the fine movement stage 21 is performed. A target 93 that constitutes a Z sensor is fixed to measure position information (amount of movement in the vertical direction and a tilt amount with respect to a horizontal plane) in the Z-axis direction, θx, and θy directions with respect to the apparatus 100.

  As shown in FIG. 3, the air spring 104 is accommodated in the lowermost part in the housing 102 and placed on the base 102 a. The air spring 104 includes a bellows 104a made of a hollow member formed of a rubber-based material (for example, a resin material having rubber properties such as elastomer), an upper (+ Z side), and a lower (− And a pair of plates 104b and 104c (for example, metal plates) parallel to the XY plane disposed on the Z side). The inside of the bellows 104a is a positive pressure space whose pressure is higher than that of the outside by supplying compressed gas (for example, air) from a gas supply device (for example, a compressor) (not shown). The weight canceling device 100 is an upward force (+ Z direction) generated by the air spring 104, and the supporting object, specifically, the Z slider 106, the fine movement stage 21 shown in FIG. 2 (including the leveling device 120). Further, the load of the plurality of Z voice coil motors 18z described above is reduced by canceling the weight of the system including the substrate holder PH and the substrate P (downward force due to gravitational acceleration (−Z direction)).

  A plurality of (for example, four) plates 114 are connected to the plate 104b disposed above the bellows 104a (two of the four plates 114 are not shown). Each of the four plates 114 extends radially in the + X, −X, + Y, and −Y directions. The four plates 114 are respectively inserted into four openings 102c (two of the four openings 102c are not shown) formed in the housing 102b, and stick out of the housing 102b. In addition, a pair of stoppers 116 are fixed to the outer wall surface of the housing 102b on each of the + Z side and the −Z side of the opening 102c, and the upper limit movement position of the plate 104b in the Z-axis direction by the pair of stoppers 116. A movement lower limit position is defined.

  The Z slider 106 is a columnar member that is accommodated in the housing 102 and extends substantially parallel to the Z-axis direction, and is mounted on the plate 104b. The Z-slider 106 has an outer shape in which three portions at equal intervals (120 ° intervals) around the Z-axis on the outer peripheral surface of the cylindrical member are cut out perpendicular to the XY plane (see FIG. 4 (A)). Hereinafter, a surface perpendicular to the three XY planes of the Z slider 106 will be referred to as an outer wall surface. A guide ring 117 made of an annular member is fixed to the upper surface of the plate 104b, and the Z slider 106 is inserted on the inner diameter side of the guide ring 117, and the movement (lateral shift) in a direction parallel to the XY plane is performed. It is suppressed. An opening that penetrates in the Z-axis direction is formed at the center of the Z slider 106, and an auxiliary tank (reservation tank) (not shown) that communicates with the bellows 104a is inserted into the opening. A plurality of, for example, three static gas bearings, for example, air bearings 118 (air pads) are attached to the surface (upper surface) on the + Z side of the Z slider 106. Since the bearing surface of the air bearing 118 faces the + Z direction (the ceiling direction), it is also referred to as a sealing pad 118. In the weight cancellation apparatus 100, when the fine movement stage 21 is driven in the Z-axis direction by the Z voice coil motor 18z (see FIG. 2), the Z slider 106 follows the fine movement stage 21 and moves in the Z-axis direction. The pressure in the bellows 104a is controlled.

  As shown in FIG. 2, the leveling device 120 is disposed above the Z slider 106, and has a leveling cup 122 formed in a cup shape with a flat bottom surface, and a hinge joint 124 on the inner wall surface of the leveling cup 122. A plurality of (for example, three) hydrostatic bearings, for example, air bearings 126, which are swingably (oscillated) through (or ball joints). The leveling cup 122 is supported in a non-contact manner from below by a plurality of air bearings 118 (sealing pads) attached to the Z slider 106. The plurality of air bearings 126 eject gas supplied from a gas supply device (not shown) to each of a plurality of side surfaces of a polyhedral member 128 having a triangular pyramid shape, for example, which is fixed to the lower surface of the fine movement stage 21. 21 is supported in a non-contact manner. As a result, the fine movement stage 21 is supported by the weight canceling apparatus 100 so as to be swingable with respect to the XY plane (in a state where movement (tilt) in the θx and θy directions is allowed). The configuration of the connecting device 110 (flexure device), the leveling device 120, and the like is disclosed in, for example, International Publication No. 2008/129762.

  Next, a connection structure between the Z slider 106 and the housing 102 for guiding the Z slider 106 linearly in the Z-axis direction in the weight canceling apparatus 100 will be described with reference to FIG. FIG. 3 is a cross-sectional view for explaining a connection structure between the Z slider 106 and the housing 102 in the weight canceling apparatus, and is a cross-sectional view taken along the line AA in FIG.

  A guide cylinder 130 made of a cylindrical member is inserted into the housing 102b of the housing 102. A predetermined clearance is formed between the inner wall surface of the housing 102 b and the outer wall surface of the guide cylinder 130. The Z slider 106 is inserted in the guide cylinder 130. A predetermined clearance is also formed between the outer wall surface of the Z slider 106 and the inner wall surface of the guide cylinder 130. The clearance is between the inner wall surface of the housing 102b and the outer wall surface of the guide cylinder 130. It is set wider than the clearance. The dimension (height) of the guide cylinder 130 in the Z-axis direction is set smaller (shorter) than the dimension of the Z slider 106 in the Z-axis direction.

  The Z slider 106 is connected to the guide cylinder 130 by a plurality of parallel leaf spring devices 140 including a pair of leaf springs 142 that are spaced apart from each other in the Z-axis direction and arranged in parallel to each other. In the present embodiment, three parallel leaf spring devices 140 are provided at substantially equal intervals (120 ° intervals) around the Z axis with respect to the Z slider 106 (see FIG. 4B). The leaf spring 142 is made of a steel plate having a thickness of about 0.1 mm to 0.5 mm, for example. Therefore, when a shearing force (force in the Z-axis direction) is applied to the leaf spring 142, the leaf spring 142 is elastically deformed by a predetermined amount in the Z-axis direction. Here, the movement stroke in the Z-axis direction of fine movement stage 21 by Z voice coil motor 18z (see FIG. 2) is, for example, about 10 mm, and Z slider 106 moves, for example, about 10 mm in the Z-axis direction. As the leaf spring 142, one that deforms (elastically deforms) following the Z slider 106 within an elastic region is used.

  As shown in FIG. 4A, the Z slider 106 has a stepped surface portion 144a (from the upper end surface of the Z slider 106) by cutting out the upper end portions (+ Z side end portions) of the three outer wall surfaces. Is also formed on the -Z side. Similarly, a stepped surface portion 144b (a surface portion recessed toward the + Z side with respect to the lower end surface of the Z slider 106) is also formed on the lower end portions (−Z side end portions) of the three outer wall surfaces of the Z slider 106. Yes. As shown in FIG. 3, of the pair of leaf springs 142 that constitute the parallel leaf spring device 140 and are separated in the Z-axis direction, the leaf spring 142 on the + Z side includes the upper end surface portion of the guide cylinder 130 and the Z slider. It is constructed between the stepped surface portion 144a of 106 (see FIG. 4B). The leaf spring 142 is fixed to the guide cylinder 130 and the Z slider 106 by bolts 148 via a plurality of washers 146, respectively. Of the pair of leaf springs 142 constituting the parallel leaf spring device 140, the -Z side leaf spring 142 is installed between the lower end surface portion of the guide cylinder 130 and the stepped surface portion 144b of the Z slider 106, It is fixed to the guide cylinder 130 and the Z slider 106 by bolts 148 via a plurality of washers 146. Although not shown in FIGS. 4B to 4D, a plurality of bolts 148 are used along the width direction of the leaf spring 142.

  The Z slider 106 can be moved relative to the guide cylinder 130 in the Z-axis direction by the elasticity of the leaf spring 142 of each of the three parallel leaf spring devices 140. On the other hand, relative movement of the Z slider 106 in the direction parallel to the XY plane with respect to the guide cylinder 130 is limited by the rigidity (tensile rigidity) of the leaf spring 142 included in each of the three parallel leaf spring devices 140. Since the parallel leaf spring device 140 includes a pair of parallel leaf springs 142 separated in the Z-axis direction, the parallel leaf spring device 140 is around an axis parallel to the XY plane of the Z slider 106 (for example, around the X axis or around the Y axis). Is prevented from rotating. Accordingly, the Z slider 106 is guided only in the Z-axis direction (vertical direction) with respect to the guide cylinder 130 by the plurality of parallel leaf spring devices 140.

  In addition, as shown in FIG. 3, the housing 102b has a plurality of pairs of through holes (not shown) spaced in the Z-axis direction (vertical direction) at substantially equal intervals (90 ° intervals) around the Z-axis. In each through hole, a sleeve 150 having a stepped portion on the inner diameter side is inserted (the sleeves 150 provided on the + X side and the −X side of the housing 102b are not shown). A screw thread is formed on the outer peripheral surface of the sleeve 150 and is fixed by being screwed into the housing 102b. The screwing amount of the sleeve 150 into the housing 102b can be adjusted from the outside (outside) of the housing 102b. An adjustment screw 152 is inserted on the inner diameter side of the sleeve 150, and a tip end portion of the adjustment screw 152 is screwed into a screw hole (not shown) formed on the outer wall surface of the guide cylinder 130. The screw head of the adjustment screw 152 is exposed on the outer wall surface of the housing 102b and can be operated from the outside. Therefore, the clearance between the outer wall surface of the guide cylinder 130 and the inner wall surface of the housing 102b can be adjusted by appropriately adjusting the screwing amounts of the adjusting screw 152 and the sleeve 150.

  Since the adjustment screw 152 and the sleeve 150 are provided as a pair apart from each other in the Z-axis direction (vertical direction), the screwing amount of the adjustment screw 152 and the sleeve 150 is made different so that the guide cylinder 130 The amount of inclination with respect to the housing 102b (inclination with respect to the vertical axis (Z axis)) can be adjusted. Thereby, the inclination adjustment (verticality adjustment) with respect to the vertical axis of the moving direction of the Z slider 106 can be performed. Here, in the leveling device 120 (see FIG. 2), since the swingable amount (angle) of the fine movement stage 21 is defined by the movable range of the hinge joint 124, the fine movement stage 21 is rocked by an equal amount in all directions. In order to make it possible, it is preferred that the leveling cup 122 is arranged horizontally. In the weight canceling apparatus 100, by adjusting the verticality of the Z slider 106, the bearing surfaces of the plurality of sealing pads 118 can be adjusted horizontally, whereby the leveling cup 122 can be leveled.

  Next, a procedure for assembling the weight cancellation apparatus 100 will be briefly described with reference to FIGS. 4 (A) to 4 (D). When assembling the weight cancellation device 100, first, as shown in FIG. 4B, a plurality of leaf springs constituting the parallel leaf spring device 140 in a state where the Z slider 106 is inserted into the guide cylinder 130. One end of 142 is fixed to the guide cylinder 130, and the other end is fixed to the Z slider 106. Although not shown in FIG. 4B, when assembling the weight canceling apparatus 100, in addition to the leaf spring 142 between the guide cylinder 130 and the Z slider 106, it is provisionally used only during assembly. A plurality of fastening members are installed to limit the relative movement between the guide cylinder 130 and the Z slider 106 (hanging down of the Z slider 106).

  Next, as shown in FIG. 4C, the guide cylinder 130 and the Z slider 106, which are integrally fastened by the fastening member (not shown), are mounted on the air spring 104 fixed on the base 102a. The Thereafter, as shown in FIG. 4D, the housing 102b is fixed to the base 102a, and the housing 102b and the guide cylinder 130 are fastened by using the sleeve 150 and the adjusting screw 152 (see FIG. 3). Is done. Then, by supplying air into the bellows 104a of the air spring 104, a fastening member (not shown) that fastens the guide cylinder 130 and the Z slider 106 with the Z slider 106 supported by the air spring 104 is provided. Removed.

  Next, a system including a fine movement stage (a system including a fine movement stage 21, a substrate holder PH and a substrate P (see FIG. 2)) and a system including a Z slider 106 (Z slider 106, air) using an air spring 104 are used. A method for canceling the weight of a system (hereinafter referred to as a fine movement stage system) that combines the bearing 118 (see FIG. 3) and the like will be described.

  5A and 5B schematically illustrate the weight canceling apparatus 100 (in order to facilitate understanding, the air spring 104 and the plurality of parallel leaf spring apparatuses 140 are shown as coil springs). The figure is shown. As shown in FIGS. 5A and 5B, a total of six leaf springs 142 (FIG. 3) having the spring constant of the air spring 104 (see FIG. 3) in the K1, three parallel leaf spring devices 140 are provided. The total spring constant of (see) is K2.

  In FIG. 5A, the downward force P (total weight of the fine movement stage system) acting on the air spring 104 and the upward force P due to the internal pressure in the air spring 104 (bellows 104a) are balanced. ing. On the other hand, FIG. 5B shows a state where fine movement stage 21 is driven by a distance s in the + Z direction by Z voice coil motor 18z (see FIG. 2). In the state shown in FIG. 5B, if the internal pressure in the bellows 104a of the air spring 104 is not changed from the state of FIG. 5A, the force (at rest) required for the Z voice coil motor 18z is F. Then, the balance of the force is expressed by P−s · K1 + F = P + s · K2, and from this, F = s · (K1 + K2).

  That is, in the weight cancellation apparatus 100 of the present embodiment, the force of F = s · (K1 + K2) is generated in the air spring 104 according to the displacement amount s of the fine movement stage 21 in the Z-axis direction. The force and the weight of the fine movement stage system can be balanced (that is, the weight of the fine movement stage system can be canceled), and the load on the Z voice coil motor 18z can be reduced. The pressure in the bellows 104a is monitored by a control device (not shown) using a pressure sensor (not shown) provided in a gas supply line connecting the gas supply device (not shown) and the air spring 104. The control device automatically adjusts the pressure of the compressed air supplied to the air spring 104 in accordance with the change in the Z position of the fine movement stage 21. At this time, a servo valve with high responsiveness is provided in the gas supply line, and pressure adjustment is performed by opening / closing control of the servo valve. The force F generated by the air spring 104 is obtained by multiplying the pressure difference between the internal pressure and the external air pressure of the bellows 104a by the effective pressure receiving area of the air spring 104, apart from the force due to the spring property of the bellows 104a. Strictly speaking, the spring constant K1 of the air spring 104 is not limited to the stiffness of the air spring 104 (bellows 104a). The rigidity due to the area effect is synthesized. As for the control method, there is no need to perform complete weight cancellation by controlling the internal pressure of the bellows to follow the position of the fine movement stage. In a high frequency control region (for example, 5 Hz or more) where responsiveness is required, Z voice The position of fine movement stage 21 may be controlled by driving coil motor 18z.

  In the liquid crystal exposure apparatus 10 (see FIG. 1) configured as described above, the mask M is loaded onto the mask stage MST by the mask loader (not shown) and is not controlled under the control of the main controller (not shown). The substrate P is loaded onto the substrate stage device PST by the illustrated substrate loader. Thereafter, the main controller performs alignment measurement using an alignment detection system (not shown), and after the alignment measurement is completed, a step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its description is omitted.

  As described above, according to the substrate stage apparatus PST of the first embodiment, the weight of the system including the fine movement stage 21 (the downward force in the vertical direction) is caused by the upward force in the gravity direction (vertical direction) generated by the air spring 104. ) Is canceled (offset), the load on the Z voice coil motor 18z that drives the fine movement stage 21 in the Z-axis direction is reduced. Since the Z slider 106 that transmits the force in the vertical direction between the fine movement stage 21 and the air spring 104 is connected to the guide cylinder 130 by a plurality of parallel leaf spring devices 140, the Z slider 106 can be configured with a simple configuration. Can be guided straight in the Z-axis direction with high accuracy. In addition, since the configuration is simple, the cost (manufacturing cost and running cost) of the weight canceling apparatus 100 can be reduced, and assembly and adjustment operations are facilitated.

  Further, since three parallel leaf spring devices 140 are provided around the Z slider 106 at substantially equal intervals, rigidity can be exhibited in all directions within a plane parallel to the XY plane.

  Further, since the inclination of the Z slider 106 with respect to the housing 102b can be adjusted using the sleeve 150 and the adjusting screw 152, for example, even if the housing 102 is distorted, the movement direction of the Z slider 106 is set to the vertical direction. Adjustment (verticality adjustment) can be made parallel to the axis (Z-axis). Further, since the sleeve 150 and the adjustment screw 152 can be operated from the outside of the housing 102, the vertical degree of the Z slider 106 can be adjusted easily and quickly. Further, the vertical adjustment of the Z slider 106 also serves as adjustment of the parallelism between the bearing surface of the base pad 108 and the lower surface of the sealing pad 118, so that the upper surface side of the weight canceling device 100 (the bearing surface side of the sealing pad). The fine movement stage 21 to be mounted can be surely made parallel to the surface plate 12. The parallelism between the bearing surface of the base pad 108 and the lower surface of the sealing pad 118 may be adjusted by changing the position of the bearing surface of each of the three sealing pads 108 that can swing (swing). In this case, the vertical degree adjustment of the Z slider 106 may not be performed.

<< Second Embodiment >>
Next, a second embodiment of the present invention will be described with reference to FIG. Since the liquid crystal exposure apparatus according to the second embodiment is different from the first embodiment only in the configuration of the weight cancellation apparatus, the configuration of the weight cancellation apparatus will be described below. For the sake of simplification of description and convenience of illustration, components having the same configuration and operation as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment, and description thereof is omitted. .

  As shown in FIG. 6, the weight cancellation device 200 according to the second embodiment is different from the first embodiment in that the Z slider 206 is moved in the Z-axis direction by the parallel link device 240 instead of the parallel leaf spring device. The main difference is that it is guided straight ahead. The Z slider 206 is directly connected to the housing 102b by the parallel link device 240. In addition, the parallel link device 240 is substantially equal to the circumference of the Z slider 206 (120 ° around the Z axis) as in the parallel leaf spring device 140 (see FIG. 4B) of the first embodiment. 3) (one of the three parallel link devices 240 is not shown).

  The parallel link device 240 includes a housing side fixing portion 240a which is a rectangular plate-like portion fixed to the inner wall surface of the housing 102b by a plurality of bolts 242 and a rectangular shape fixed to the outer wall surface of the Z slider 206 by a plurality of bolts 242. A Z-slider-side fixing portion 240b that is a plate-like portion, and an upper-side erection portion 240c that is a rectangular plate-like portion that is laid between the + Z-side ends of the housing-side fixing portion 240a and the Z-slider-side fixing portion 240b. And a lower installation part 240d which is a rectangular plate-like part provided between the −Z side ends of each of the housing side fixing part 240a and the Z slider side fixing part 240b. The housing side fixing part 240a, the Z slider side fixing part 240b, the upper erection part 240c, and the lower erection part 240d are integrally formed of a material having a spring property, such as a metal material (or a synthetic resin material). . The Z slider 206 has a recess 206a formed at the center in the Z-axis direction, and the Z slider side fixing portion 240b is fixed to the bottom surface portion (surface portion orthogonal to the horizontal plane) of the recess 206a.

  For example, a groove formed by using a wire cutting process or the like is formed in the connection portion between the upper erection portion 240c and the housing side fixing portion 240a and the Z slider side fixing portion 240b. It is formed on each side. That is, the connecting portion between the upper erection portion 240c and the housing side fixing portion 240a and the Z slider side fixing portion 240b is thinner than the other portions and functions as a hinge. Similarly, a groove is formed in the connecting portion between the lower erection portion 240d and each of the housing side fixing portion 240a and the Z slider side fixing portion 240b. The lower erection portion 240d and the housing side fixing portion 240a are also formed. And the connection part with each Z slider side fixing | fixed part 240b functions as a hinge. Therefore, the parallel link device 240 limits the relative movement of the Z slider 206 and the housing 102b in the direction parallel to the horizontal plane by the horizontal rigidity of the upper erection part 240c and the lower erection part 240d, and the Z slider by the hinge function. 206 can be guided straight in the Z-axis direction.

  Also in the weight cancellation apparatus 200 of the second embodiment, similarly to the first embodiment, the Z slider 206 can be guided straight in parallel with the Z axis with a simple configuration.

  In addition, the structure of the weight cancellation apparatuses 100 and 200 which concern on the said 1st and 2nd embodiment is an example, Comprising: This invention is not limited to this. For example, in the first and second embodiments, the air spring 104 is used as a force generation unit that generates an upward force in the gravitational direction. However, the present invention is not limited to this. For example, an actuator such as an air cylinder, or a coil An elastic member such as a spring may be used.

  In the first embodiment, the Z slider 106 and the housing 102b are connected by the parallel leaf spring device 140 via the guide cylinder 130. However, the Z slider 106 may be directly connected to the housing 102b. . In the second embodiment, the Z slider 106 is directly connected to the housing 102b. For example, a guide cylinder similar to that of the first embodiment is inserted into the housing 102b, and the guide cylinder and the Z slider are inserted. 206 may be connected by a parallel link device 240.

  Moreover, although the parallel leaf | plate spring apparatus 140 (refer FIG. 3) of the said 1st Embodiment is comprised by the two leaf | plate springs 142 spaced apart to the up-down direction, it is not restricted to this, For example, three or more parallel springs are used. You may comprise with a flat leaf spring. In this case, the rigidity of the parallel leaf spring device other than the Z-axis direction can be improved.

  In the first and second embodiments, three parallel leaf spring devices 140 (see FIG. 3) or parallel link devices 240 (see FIG. 6) are provided at substantially equal intervals around the Z slider. However, each of the parallel leaf spring device 140 and the parallel link device 240 has rigidity in a direction parallel to the XY plane and can guide the Z slider in the Z-axis direction. Further, two or four or more parallel leaf spring devices 140 or parallel link devices 240 may be provided around the Z slider at substantially equal intervals.

  Moreover, although the parallel link apparatus 240 (refer FIG. 6) of the said 2nd Embodiment consisted of one member formed integrally, it is not restricted to this, The part containing the upper erection part 240c, and lower side It is good also as two members by dividing | segmenting with the part containing the installation part 240d.

In the above embodiment, the illumination light is ultraviolet light such as ArF excimer laser light (wavelength 193 nm) or KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as F ₂ laser light (wavelength 157 nm). Also good. As the illumination light, for example, a single wavelength laser beam oscillated from a DFB semiconductor laser or a fiber laser is amplified by a fiber amplifier doped with, for example, erbium (or both erbium and ytterbium). In addition, harmonics converted into ultraviolet light using a nonlinear optical crystal may be used. A solid laser (wavelength: 355 nm, 266 nm) or the like may be used.

  In the above-described embodiment, the case where the projection optical system PL is a multi-lens projection optical system including a plurality of optical systems has been described. However, the number of projection optical systems is not limited to this, and one or more projection optical systems are used. I just need it. In the above embodiment, the case where the projection optical system PL has the same magnification as the projection magnification has been described. However, the present invention is not limited to this, and the projection optical system may be either an enlargement system or a reduction system.

  In each of the above embodiments, the case where the present invention is applied to a scanning stepper has been described. However, the present invention is not limited to this, and the present invention may be applied to a stationary exposure apparatus such as a stepper. The present invention can also be applied to a step-and-stitch type projection exposure apparatus that synthesizes a shot area and a shot area. The present invention can also be applied to a proximity type exposure apparatus that does not use a projection optical system.

  Further, the use of the exposure apparatus is not limited to a liquid crystal exposure apparatus that transfers a liquid crystal display element pattern onto a square glass plate. For example, an exposure apparatus for semiconductor manufacturing, a thin film magnetic head, a micromachine, and a DNA chip The present invention can also be widely applied to an exposure apparatus for manufacturing the above. Moreover, in order to manufacture not only microdevices such as semiconductor elements but also masks or reticles used in optical exposure apparatuses, EUV exposure apparatuses, X-ray exposure apparatuses, electron beam exposure apparatuses, etc., glass substrates, silicon wafers, etc. The present invention can also be applied to an exposure apparatus that transfers a circuit pattern. The object to be exposed is not limited to the glass plate, but may be another object such as a wafer, a ceramic substrate, or a mask blank.

  The mobile device according to the present invention is not limited to the exposure apparatus, and can be applied to, for example, an element manufacturing apparatus including an ink jet type functional liquid application apparatus.

  For electronic devices such as liquid crystal display elements (or semiconductor elements), the step of designing the function and performance of the device, the step of producing a mask (or reticle) based on this design step, and the step of producing a glass substrate (or wafer) , Lithography step to transfer mask (reticle) pattern to glass substrate, development step to develop exposed glass substrate, etching step to remove exposed member other than resist remaining portion by etching, etching is completed The resist is removed through a resist removal step, a device assembly step, an inspection step, and the like. In this case, in the lithography step, the exposure method described above is executed using the exposure apparatus of each of the above embodiments, and a device pattern is formed on the glass substrate. Therefore, a highly integrated device can be manufactured with high productivity. it can.

  As described above, the mobile device of the present invention is suitable for accurately guiding the mobile device in the vertical direction. The exposure apparatus of the present invention is suitable for forming a predetermined pattern on an object. The device manufacturing method of the present invention is suitable for the production of micro devices.

  DESCRIPTION OF SYMBOLS 10 ... Liquid crystal exposure apparatus, 21 ... Fine movement stage, 100 ... Weight cancellation apparatus, 102 ... Case, 104 ... Air spring, 106 ... Z slider, 130 ... Guide cylinder, 140 ... Parallel leaf spring apparatus, 142 ... Leaf spring, P ... Substrate, PST ... Substrate stage device.

Claims (18)

A moving body that can move at least vertically;
A weight cancellation device for canceling the weight of the moving body below the moving body;
The weight cancellation device is
A main body part formed in a cylindrical shape, a force generating part that generates a force upward in the vertical direction within the main body part, and provided between the force generating part and the moving body, the moving body and the force generating part A transmission unit that transmits a force between each other, and the main body unit and the transmission unit are mechanically coupled, and the elasticity allows the relative movement of the transmission unit in the vertical direction with respect to the main body unit, and And a limiting device that limits relative movement of the transmission unit in the horizontal direction with respect to the main body by rigidity. The restriction device includes a pair of leaf springs arranged in parallel apart from each other in the vertical direction,
2. The mobile device according to claim 1, wherein each of the pair of leaf springs has one end connected to the main body and the other end connected to the transmission unit. The limiting device includes a main body part side connection part connected to the main body part, a transmission part side connection part connected to the transmission part, and an elastic hinge part for each of the main body side connection part and the transmission part side connection part. Including a erection part erected via
The movable body apparatus according to claim 1, wherein a pair of the erection portions are provided in parallel with being spaced apart in the vertical direction.   The mobile device according to claim 3, wherein the limiting device has a spring property.   The mobile device according to claim 3 or 4, wherein the main body side connection portion, the transmission portion side connection portion, and the pair of installation portions are integrally formed.   The mobile device according to claim 1, wherein a plurality of the limiting devices are provided around the vertical axis with respect to the transmission unit.   The mobile body device according to claim 6, wherein three restriction devices are provided at equal intervals around at least the vertical axis.   The mobile device according to claim 1, further comprising an adjustment device capable of adjusting an inclination of the transmission unit with respect to a vertical axis. The main body portion includes a first main body portion made of a cylindrical member mechanically connected to the transmission portion by the restriction device, and a cylindrical member that accommodates the first main body portion through a predetermined clearance. A second body portion comprising:
The mobile device according to claim 8, wherein the adjustment device adjusts the clearance between the first and second main body portions to adjust the inclination of the transmission portion with respect to the vertical axis.   The adjustment device includes a plurality of screws operable from an outer surface side of the second main body portion, and adjusts the clearance between the first and second main body portions according to screwing amounts of the plurality of screws. A mobile device according to claim 1.   2. The force generation unit is variably controlled in consideration of an elastic force of the limiting device in which the magnitude of the force generated in the vertical direction is changed according to the position of the transmission unit in the vertical direction. The mobile body apparatus as described in any one of 10-10.   The mobile device according to claim 1, wherein the force generation unit includes a member having a spring property.   The mobile device according to claim 12, wherein the force generation unit includes an air spring in which a force generated upward in the vertical direction is variably controlled by a change in internal pressure. A lower moving body arranged below the moving body and movable with a predetermined stroke along a plane parallel to a horizontal plane integrally with the weight cancellation device;
An actuator that includes a stator provided on the lower moving body and a mover provided on the moving body, and that drives the moving body at least in the vertical direction relative to the lower moving body. Item 14. The mobile device according to any one of Items 1 to 13.   The mobile device according to claim 1, wherein the transmission member supports the mobile body in a non-contact manner. The moving body device according to any one of claims 1 to 15, wherein a predetermined object is placed on the moving body;
An exposure apparatus comprising: a pattern forming apparatus that forms a predetermined pattern on the object by exposure with an energy beam;   The exposure apparatus according to claim 16, wherein the object is a substrate used for a display panel of a display device. Exposing the object using the exposure apparatus according to claim 16 or 17;
Developing the exposed object. A device manufacturing method comprising:

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