JP2007311597A - Interferometer system, stage apparatus, and exposure apparatus - Google Patents

Abstract

<P>PROBLEM TO BE SOLVED: To move a fine adjustment stage highly accurately by suppressing the generation of any oscillation. <P>SOLUTION: In a stage apparatus, a fine adjustment stage FS performs a fine movement at least in an X axis direction in relation to a coarse adjustment stage RS driven by a long stroke in a Y direction. Further, when the coarse adjustment stage RS receives the reaction force caused by the fine movement of the fine adjustment stage FS which is performed in the X axis direction, the coarse adjustment stage RS moves in the opposite direction to the fine adjustment stage FS, Therefore, a highly accurate movement of the fine adjustment stage FS can be performed, since the reaction force caused by the movement of the fine adjustment stage FS which is related to the X axis direction is so canceled that the generation of any oscillation is suppressed. <P>COPYRIGHT: (C)2008,JPO&INPIT

Description

  The present invention relates to an interferometer system, a stage apparatus, and an exposure apparatus. More specifically, the present invention relates to an interferometer system that measures the position of an object, an exposure apparatus that forms an image of a pattern formed on a mask on a substrate, and the exposure apparatus. The present invention relates to a stage device suitable for use.

  In recent years, in a lithography process for manufacturing a semiconductor element, a liquid crystal display element, and the like, a mask or a reticle (hereinafter collectively referred to as “reticle”) and a photosensitive object such as a wafer or a glass plate (hereinafter collectively referred to as “wafer”). Is a step-and-scan type scanning exposure apparatus (so-called scanning stepper) that transfers a reticle pattern onto a wafer via a projection optical system while synchronously moving in a predetermined scanning direction (scanning direction). Etc. have come to be used relatively frequently.

  In this scanning exposure apparatus, a drive device for driving the reticle is required on the reticle side in addition to the wafer side. In a recent scanning type exposure apparatus, as a reticle side drive device, a reticle stage that is levitated and supported on a reticle surface plate by an air bearing or the like is driven in a predetermined stroke range in a scanning direction by a pair of linear motors, for example. A reticle stage device that is finely driven in a direction and a non-scanning direction is employed. Further, the reticle stage device includes a reticle coarse movement stage that is driven in a predetermined stroke range in the scanning direction by a pair of linear motors arranged on both sides of the non-scanning direction (non-scanning direction) orthogonal to the scanning direction, A coarse / fine movement stage device having a reticle fine movement stage that is finely driven by a voice coil motor or the like in the scanning direction, the non-scanning direction, and the yawing direction is also used for the reticle coarse movement stage.

  In addition, in order to suppress the reaction force generated in the stator of the linear motor according to the driving of the reticle stage from being a factor of vibration of the reticle surface plate and a factor of posture change as much as possible, in response to the reaction force, the law of conservation of momentum is applied. There is also a reticle stage device provided with a counter mass mechanism having a counter mass (weight member) that moves in a direction opposite to the reticle stage (see, for example, Patent Document 1).

  However, in the reticle stage apparatus employed by the scanning exposure apparatus, a configuration / arrangement for effectively functioning the counter mass mechanism is adopted, and transmission of vibration components that cannot be suppressed by the counter mass mechanism to the reticle is minimized. It is also necessary to reduce the overall footprint of the exposure apparatus by simplifying and downsizing the reticle stage apparatus. From the viewpoint of simplification of this apparatus, it is also important to simplify a position measuring apparatus (such as an interferometer system) that measures the position of the reticle stage.

JP 2004-304034 A

  The present invention has been made under the circumstances described above. From the first viewpoint, the position measurement of the object moving in the first axis direction in the second and third axis directions perpendicular to the first axis is performed. An interferometer system for performing a first reflecting surface extending in the first axis direction and perpendicular to the second axis, and a second reflecting surface extending in the first axis direction and perpendicular to the third axis. A columnar fixed mirror member having a first beam which is provided on the object and measures a position of the object in the second axis direction substantially perpendicularly toward the first reflecting surface of the fixed mirror member; A first optical member that irradiates; a second beam that is provided on the object and that measures the position of the object in the third axis direction is irradiated substantially perpendicularly toward the second reflecting surface of the fixed mirror member. A second optical member that receives the beam reflected by each reflecting surface of the fixed mirror member; Is an interferometer system comprising: an optical system.

  According to this, the first member that irradiates the first beam substantially perpendicularly to the first reflecting surface (the reflecting surface extending in the first axis direction and perpendicular to the second axis) of the columnar fixed mirror member, and the fixed member Since the object is provided with the second member that irradiates the second beam substantially perpendicularly to the second reflecting surface (the reflecting surface extending in the first axis direction and perpendicular to the third axis) of the mirror member, By receiving the beam reflected by each reflecting surface of the fixed mirror member in the light receiving system, the position of the object in the second axis direction and the third axis direction can be measured with reference to one fixed mirror member. Thereby, compared with the case where each reflective surface is provided in a separate fixed mirror member, it is possible to reduce a number of parts.

  From a second aspect, the present invention provides a coarse movement stage that moves in a first axial direction in a horizontal plane and a second axial direction that is orthogonal to the first axis in the horizontal plane; A fine movement stage that moves minutely in the second axis direction, and the coarse movement stage receives the reaction force generated by the minute movement of the fine movement stage in the second axis direction, Is a first stage device characterized by moving in the opposite direction.

  According to this, the fine movement stage moves minutely at least in the second axis direction with respect to the coarse movement stage, and the coarse movement stage receives a reaction force generated by the fine movement of the fine movement stage in the second axis direction. At this time, since it moves in the direction opposite to the fine movement stage, the reaction force in the second axial direction caused by the movement of the fine movement stage is canceled, and the generation of vibration is suppressed.

  From a third aspect, the present invention is a stage device that is disposed on a predetermined support member and drives a pattern forming member, and a surface plate provided above the support member; It is a 2nd stage apparatus provided with the stage mechanism which drives a pattern formation member to a 6 degrees-of-freedom direction; and the anti-vibration mechanism provided between the said surface plate and the said supporting member.

  According to this, since the stage mechanism moves the pattern forming member in the direction of six degrees of freedom on the surface plate provided above the support member via the vibration isolation mechanism, the stage mechanism passes through the support member and the surface plate. Therefore, the movement of the stage mechanism can be realized with high accuracy.

  According to a fourth aspect of the present invention, a coarse movement stage that moves in a predetermined direction, and a coarse movement stage that is arranged with a gap with respect to the coarse movement stage and the predetermined direction and moves slightly in the predetermined direction with respect to the coarse movement stage. The fixed mirror member, comprising: a fine movement stage; and a fixed mirror member that reflects a beam irradiated from the fine movement stage along the predetermined direction in order to measure a position of the fine movement stage in the predetermined direction. Is a third stage apparatus characterized in that the coarse movement stage and the fine movement stage are mechanically separated from each other and are arranged in the gap between the coarse movement stage and the fine movement stage.

  According to this, in order to measure the position of the fine movement stage in a predetermined direction, the fixed mirror member that reflects the beam irradiated from the fine movement stage is mechanically separated from the coarse movement stage and the fine movement stage. Since it is arranged in the gap between the stage and the fine movement stage, the position of the fine movement stage in a predetermined direction is measured using a fixed mirror member provided in the vicinity of the fine movement stage. It can be suppressed as much as possible. As a result, it is possible to realize highly accurate position measurement of the fine movement stage.

  According to a fifth aspect of the present invention, there is provided an exposure apparatus for forming an image of a pattern formed on a mask on a substrate, wherein either the mask or the substrate is held by a fine movement stage. 1 is a first exposure apparatus including a first stage apparatus.

  According to this, since either the mask or the substrate can be moved with high accuracy, an image of the pattern formed on the mask can be formed on the substrate with high accuracy.

  According to a sixth aspect of the present invention, there is provided an exposure apparatus for forming an image of a pattern formed on a mask on a pattern forming member, comprising the second stage apparatus of the present invention. This is a second exposure apparatus.

  According to this, since the stage mechanism capable of high-precision movement is provided, the pattern forming member can be moved with high precision, and the pattern image formed on the mask can be accurately printed on the substrate. Can be formed.

  According to a seventh aspect of the present invention, there is provided an exposure apparatus for projecting a pattern formed on a mask onto a substrate via a projection optical system, comprising the third stage apparatus of the present invention, wherein the fixed mirror member Is a third exposure apparatus connected to the projection optical system.

  According to this, since the mask or the substrate is moved by the fine movement stage and the fixed mirror member is connected to the projection optical system, it is possible to measure the position of the mask or the substrate with high accuracy based on the projection optical system. is there. Therefore, the pattern formed on the mask can be projected onto the substrate with high accuracy via the projection optical system.

  Hereinafter, an embodiment of the present invention will be described with reference to FIGS.

  FIG. 1 shows a schematic configuration of an exposure apparatus 10 according to an embodiment. The exposure apparatus 10 is a step-and-scan type scanning projection exposure apparatus, that is, a so-called scanning stepper.

  The exposure apparatus 10 includes an illumination unit IOP, a reticle stage apparatus 20 including a reticle stage RST that holds reticles R1 and R2, a projection optical system PL, a wafer stage that holds a wafer W and moves in an XY two-dimensional direction in an XY plane. A WST, a control system thereof, and a column 34 for holding the reticle stage device 20 and the projection optical system PL are provided.

The illumination unit IOP includes a light source and an illumination optical system, and illumination light as an energy beam in a rectangular or arcuate illumination region defined by a field stop (also referred to as a mask king blade or a reticle blind) disposed therein. Illumination is performed to illuminate reticle R1 (or R2) on which a circuit pattern is formed with uniform illuminance. Here, as the illumination light IL, far ultraviolet light such as KrF excimer laser light (wavelength 248 nm), or vacuum ultraviolet light such as ArF excimer laser light (wavelength 193 nm) or F ₂ laser light (wavelength 157 nm) is used. And However, in place of them, an ultraviolet emission line (wavelength 436 nm g-line, wavelength 365 nm i-line, etc.) from an ultra-high pressure mercury lamp may be used.

  The reticle stage device 20 includes the reticle stage RST that is disposed below the illumination unit IOP and can hold two reticles R1 and R2 in a state of being aligned in the Y-axis direction. As shown in FIG. 1, reticle stage RST is arranged above reticle stage surface plate RBS provided above top plate portion 32 a of column 34. The specific configuration of reticle stage device 20 will be described in detail later.

  As the projection optical system PL, for example, a refractive optical system including a plurality of lenses (lens elements) having a common optical axis in the Z-axis direction is used. The projection optical system PL is, for example, both-side telecentric and has a predetermined projection magnification (for example, 1/4 or 1/5). For this reason, when the illumination area is illuminated by the illumination light IL from the illumination unit IOP, the reticle (R1 or R2) in which the first surface (object surface) and the pattern surface of the projection optical system PL are substantially aligned is arranged. The reduced illumination image (a projection image of a part of the circuit pattern) of the reticle in the illumination area is arranged on the second surface (image surface) side by the passing illumination light IL through the projection optical system PL. , A region (exposure region) conjugate to the illumination region on the wafer W having a resist (photosensitive agent) coated on the surface thereof is formed.

  The reticle stage RST and wafer stage WST are driven synchronously to move the reticle relative to the illumination area (illumination light IL) in the scanning direction (Y-axis direction) and to the exposure area (illumination light IL). By relatively moving the wafer W in the scanning direction (Y-axis direction), scanning exposure of one shot area (partition area) on the wafer W is performed, and a reticle pattern is transferred to the shot area. That is, in the present embodiment, a pattern is generated on the wafer W by the illumination unit IOP, the reticle, and the projection optical system PL, and the sensitive layer (resist layer) on the wafer W is exposed on the wafer W by the illumination light IL. A pattern is formed.

  A flange FLG is provided at substantially the center in the height direction of the lens barrel of the projection optical system PL.

  The column 34 has a plurality of leg portions 32b (here, for example, three legs) whose lower ends are fixed to the floor surface F, and the floor surface F by the leg portions 32b. And a top plate portion 32a supported above. A rectangular opening 34a in a plan view (viewed from above) is formed in the central portion of the top plate portion 32a so as to penetrate in the vertical direction (Z-axis direction).

  The projection optical system PL is connected to the flange FLG portion via three suspension support mechanisms 37 (one suspension support mechanism on the back side of the drawing is not shown) whose one end is fixed to the lower surface side of the top plate portion 32a. Suspended and supported. Each of these suspension support mechanisms 37 includes a coil spring 36 and a wire 35 which are flexible connection members. Since the coil spring 36 vibrates like a pendulum in a direction perpendicular to the optical axis (Z-axis) of the projection optical system PL, the vibration isolation performance (floor vibration in the direction perpendicular to the optical axis of the projection optical system PL). Has a performance to prevent transmission to the projection optical system PL. Also, it has high vibration isolation performance in the direction parallel to the optical axis.

  Further, a convex portion 134a is formed in the vicinity of the central portion in the Z-axis direction of each leg portion 32b of the column 34, and a drive mechanism 40 is provided between each convex portion 134a and the outer peripheral portion of the flange of the projection optical system PL. Is provided. This drive mechanism includes a voice coil motor that drives the projection optical system PL in the radial direction of the lens barrel, and a voice coil motor that drives the projection optical system PL in the optical axis direction (Z-axis direction). With these drive mechanisms, the projection optical system PL can be moved in the direction of six degrees of freedom.

  The flange FLG of the projection optical system PL is provided with an acceleration sensor 234 (not shown in FIG. 1, refer to FIG. 10) for detecting the acceleration of the projection optical system PL in the direction of 6 degrees of freedom. The main controller 50 (not shown in FIG. 1, refer to FIG. 10) drives the drive mechanism so that the projection optical system PL is stationary with respect to the column 34 and the floor surface F. Controls the driving of 40 voice coil motors.

  From the lower surface of the flange FLG of the projection optical system PL, a ring-shaped measurement mount 51 is suspended and supported via a plurality of (for example, three in this case) support members 53 (however, a support member on the back side of the paper surface is not shown). Has been. The three support members 53 are actually configured to include link members having flexure portions that can be displaced by five degrees of freedom other than the longitudinal direction of the support member 53 at both ends thereof, and the measurement mount 51 and the flange FLG. The measurement mount 51 can be supported with almost no stress between the two.

  The measurement mount 51 holds a wafer interferometer 58, an alignment system ALG (not shown in FIG. 1, refer to FIG. 10), a multipoint focal position detection system (not shown), and the like. As the alignment system, an image processing type sensor can be used, and this image processing type sensor is disclosed in, for example, Japanese Patent Laid-Open No. 4-65603. As the multipoint focal position detection system, for example, a multipoint focal position detection system disclosed in Japanese Patent Laid-Open No. 6-283403 (corresponding to US Pat. No. 5,448,332) can be used.

  Wafer stage WST is levitated and supported on the upper surface of stage surface plate BS arranged horizontally below projection optical system PL via an air bearing or the like provided on the bottom surface thereof.

  Here, the stage surface plate BS is directly installed on the floor surface F, and the surface (upper surface) on the + Z side is processed so as to have a very high flatness, and the wafer stage WST. The movement reference plane (guide plane).

  Wafer stage WST holds wafer W by vacuum suction or the like via wafer holder 25, and stage controller BS via main stage 50 via wafer stage drive system 122 (not shown in FIG. 1, see FIG. 10). It is designed to be freely driven in the XY two-dimensional direction along the upper surface.

  Next, the reticle stage device 20 will be described with reference to FIGS.

  FIG. 2 shows the reticle stage device 20 in a perspective view. As can be seen from FIGS. 2 and 1, the reticle stage apparatus 20 includes a flat plate member 12 provided on the top plate portion 32 a of the column 34, and a plurality of (here, for example, three) members on the flat plate member 12. ) Of a reticle stage surface plate RBS supported via a vibration isolation unit 14 (not shown in FIG. 2, refer to FIG. 1), a reticle stage RST disposed above the reticle stage surface plate RBS, and the reticle stage RST. Y linear motors YLM1 and YLM2 (not shown in FIG. 1, refer to FIG. 2) that drive with a long stroke in the Y-axis direction are included.

  As shown in FIG. 8, which is a perspective view of the flat member 12 with the reticle stage RST removed from FIG. 2, a rectangular opening 12a penetrating in the vertical direction (Z-axis direction) is formed at the center thereof. ing. As shown in FIG. 1, the flat plate member 12 is fixed to the top surface of the top plate portion 32a of the column 34, and the opening 12a communicates with the above-described opening 34a of the top plate portion 32a.

  The reticle stage surface plate RBS is composed of a substantially rectangular plate-like member in plan view (viewed from above), and a rectangular opening RBSa is formed at the center thereof as shown in FIGS. Yes. This rectangular opening RBSa is in a state communicating with the opening 12a of the flat plate member 12 and the opening 34a of the top plate portion 32a in the Z-axis direction. In addition, convex portions RBSb and RBSc extend along the Y-axis direction at positions on the upper surface of the reticle stage surface plate RBS that are equidistant from the center in the + X direction and the −X direction. The upper surfaces (+ Z side surfaces) of the convex portions RBSb and RBSc are processed so that the flatness is very high.

  A plurality of (for example, three in this case) anti-vibration units 14 shown in FIG. 1 provided between the reticle stage surface plate RBS and the flat plate-like member 12 are each a mechanical type such as an air damper or a hydraulic damper. It includes a damper and an electromagnetic actuator such as a voice coil motor. When the inclination angle of the upper surface of reticle stage surface plate RBS with reference to projection optical system PL is detected by displacement sensor 55 (not shown in FIGS. 1 and 2, see FIG. 10), main controller 50 in FIG. The electromagnetic dampers constituting each vibration isolation unit 14 are driven so that the inclination angle is within the allowable range, and the pneumatic pressure or hydraulic pressure of the mechanical damper is controlled as necessary. In the vibration isolating unit 14, it is possible to avoid transmission of relatively high frequency vibrations to the reticle stage RST by an air damper or a hydraulic damper. In the present embodiment, not only the displacement sensor, but also the image stabilization unit 14 is controlled based on the detection result of a sensor that measures at least one of the position, speed, and acceleration other than the tilt angle of the reticle stage surface plate RBS. It is also good to do.

  As shown in FIG. 2, the reticle stage RST includes a fine trapezoidal fine movement stage FS in plan view (viewed from above) and a plan view (viewed from above) provided in a state surrounding the fine movement stage FS. And a rectangular frame-shaped coarse movement stage RS.

  A concave portion 11a that is rectangular in plan view (viewed from above) is formed at the center of the fine movement stage FS, and the illumination light IL is formed on the inner bottom surface of the concave portion 11a as shown in the plan view of FIG. The two rectangular openings 19a and 19b serving as the passages are formed in a state of being spaced a predetermined distance in the Y-axis direction. A plurality of (for example, three) reticle support members 54 that support the reticles R1 and R2 at a plurality of points (for example, three points) from the lower side are provided in the peripheral portions of the openings 19a and 19b. The reticle support member 54 sucks and holds the reticle R1 or reticle R2 by vacuum suction or electrostatic suction. Further, a rectangular reticle reference plate FM1 is provided near the −Y side end of the inner bottom surface of the recess 11a (near the −Y side of the reticle R1), and near the + Y side end of the inner bottom surface of the recess 11a ( A reticle reference plate FM2 similar to the reticle reference plate FM1 is provided in the vicinity of the + Y side of the reticle R2. These reticle reference plates FM1 and FM2 are irradiated with a measurement beam from an optical sensor 56 (not shown in FIGS. 1 and 2, etc., see FIG. 10) configured by, for example, an interferometer or a focus position detection system. In addition, the optical sensor 56 measures position information about the Z-axis direction of each of the reticle reference plates FM1 and FM2. Therefore, by receiving the beam reflected by the sensor 56, the positional information regarding the Z-axis direction of the fine movement stage FS (and thus the reticles R1 and R2) and the information regarding the rotation (θx) direction around the X-axis are acquired. Is possible.

  FIG. 4 shows an exploded perspective view of reticle stage RST. As can be seen from FIG. 4, on the −X side end surface of the fine movement stage FS, a mover 62X comprising a magnetic pole unit constituting an X voice coil motor 66X for minutely driving the fine movement stage FS in the X-axis direction is provided. On the −Y side end face, there is provided a mover 62Y comprising a magnetic pole unit constituting a Y voice coil motor 66Y for minutely driving the fine movement stage FS in the Y-axis direction and the rotation direction (θz) around the Z-axis. Yes. The mover 62X includes a main body having a substantially T-shaped XZ cross section and a plurality of permanent magnets provided on the main body. Further, the mover 62Y has a main body portion whose longitudinal direction is the X-axis direction and whose YZ section is substantially T-shaped, and a plurality of permanent magnets provided in the main body portion.

  As shown in FIG. 4, the coarse movement stage RS constitutes a first portion 58a having a substantially L shape in plan view (viewed from above), a second portion 58b having a rectangular parallelepiped shape, and an X voice coil motor 66X. And a stator 64Y composed of an armature unit constituting the Y voice coil motor 66Y, which are combined to form a rectangular frame shape as a whole.

The stator 64X includes a casing whose XZ section is U-shaped (U-shaped) and an armature coil provided inside the casing, and a Z in which a permanent magnet of the mover 62X is generated. The fine movement stage FS can be finely driven in the X-axis direction with respect to the coarse movement stage RS by electromagnetic interaction between the magnetic field in the axial direction and the current supplied to the armature coil in the stator 64X. (See arrow A in FIG. 5). In addition, the stator 64Y includes a housing whose YZ cross section is U-shaped (U-shaped) and a plurality of armature coils provided inside the housing, and the plurality of armatures of the stator 64Y. Due to the electromagnetic interaction between the current supplied to each coil and the magnetic field generated by the mover 62Y, for example, the driving force in the Y-axis direction indicated by arrows B ₁ and B ₂ in FIG. 5 acts on the fine movement stage FS. It is possible to make it. Therefore, in the Y voice coil motor 66Y composed of the mover 62Y and the stator 64Y, the fine movement stage FS is moved relative to the coarse movement stage RS by making the driving forces indicated by the arrows B ₁ and B _{2 the} same. Thus, it is possible to finely drive in the Y-axis direction, and it is possible to rotate in the rotation direction (θz direction) around the Z-axis by making the driving force indicated by arrows B ₁ and B ₂ different. .

  Returning to FIG. 2, three self-weight cancellation mechanisms 60 are provided between the fine movement stage FS and the coarse movement stage RS. The self-weight canceling mechanism 60 holds the fine movement stage FS in a non-contact manner by the coarse movement stage RS, and also rotates the fine movement stage FS with respect to the coarse movement stage RS in the Z-axis direction and the X-axis rotation direction (θx direction), the Y-axis. Minute driving in the rotating direction (θy direction) is performed. Hereinafter, the configuration and the like of the self-weight canceling mechanism 60 will be described with reference to FIGS. 6A and 6B.

  6A shows a longitudinal sectional view of the self-weight canceling mechanism 60 (here, the self-weight canceling mechanism 60 located on the most + Y side in FIG. 2), and FIG. 6B shows the self-weight canceling mechanism 60 in FIG. ) Is shown.

  As shown in FIG. 6B, the self-weight canceling mechanism 60 includes a stator unit 72 provided on the upper side of the fine movement stage FS, a pad member 74 provided on the lower side of the fine movement stage FS, a piston member 76, A cylinder member 78 and a support member 82 are included.

  The stator unit 72 has a shape that combines a semicircle and a rectangle in plan view (viewed from above) (see FIG. 2), and is cantilevered on the upper surface of the coarse movement stage RS. A circular opening 72b is formed in the −Y side half of the stator unit 72 in a state of penetrating in the Z-axis direction, and the peripheral wall portion of the opening 72b is an annular shape protruding downward. It is set as the convex part 72a. An armature coil 84a wound in a circular shape is accommodated in an internal space having a rectangular cross section formed in the convex portion 72a.

  A circular U-shaped groove FSa in plan view (viewed from above) is formed in a portion of fine movement stage FS corresponding to annular convex portion 72a of stator unit 72. A magnetic pole unit 84b including a plurality of permanent magnets is provided on the inner peripheral surface and the outer peripheral surface of the U-shaped groove FSa. In this U-shaped groove FSa, an annular convex portion 72a portion of the stator unit 72 is inserted, and the armature coil 84a and the magnetic pole unit 84b in the convex portion 72a are inserted in the Z-axis direction. A Z voice coil motor 86 that generates a driving force is configured.

  The pad member 74 is in a state of being close to the lower surface of the fine movement stage FS, and has a substantially hemispherical shape having a flat upper surface and a curved surface (spherical surface). A through hole 74 a penetrating in the Z-axis direction is formed from the center of the upper surface of the pad member 74.

  The piston member 76 is formed of a member having a circular shape in the XY section and a recess 76a having a predetermined depth, and is provided on the lower side (−Z side) of the pad member 74. The upper surface of the piston member 76 is curved (spherical) corresponding to the lower surface of the pad member 74, and a through-hole 76b penetrating in the Z-axis direction is formed from the center.

  The cylinder member 78 is formed of a substantially cylindrical member, and its peripheral wall has an inverted U-shaped cross section and has a shape in which an inner foot portion is set shorter than an outer foot portion. The piston member 76 inserted into the internal space of the cylinder member 78 is slidable in the Z-axis direction.

  The support member 82 is made of a plate-like member and is cantilevered on the lower surface of the coarse movement stage RS. The support member 82 holds a cylinder member 78 on its upper surface, and a space (air chamber 90) in which a space surrounded by the support member 82, the cylinder member 78, and the piston member 76 is substantially sealed. ). Accordingly, gas is supplied into the air chamber 90 from the gas supply device 92 (not shown in FIGS. 6A and 6B, see FIG. 10), so that the air chamber 90 is in the reticle stage RST. It is set to a pressure higher than the ambient atmosphere where it is installed.

  Here, the gas in the air chamber 90 is supplied between the upper surface of the piston member 76 and the lower surface of the pad member 74 through the through hole 76b. For this reason, a minute gap is formed between the piston member 76 and the pad member 74 by the static pressure of the gas that has entered between the upper surface of the piston member 76 and the lower surface of the pad member 74. Further, a part of the gas passing through the through hole 76 b passes through the through hole 74 a formed in the pad member 74 and is supplied between the upper surface of the pad member 74 and the lower surface of the fine movement stage FS. As a result, a small gap is formed between the pad member 74 and the fine movement stage FS by the static pressure of the gas that has entered between the upper surface of the pad member 74 and the lower surface of the fine movement stage FS.

  Other weight cancellation mechanisms 60 are configured in the same manner.

According to the three self-weight canceling mechanisms 60 configured in this way, the self-weight of the fine movement stage FS is supported by the gas in the air chamber 90, and the relatively high-frequency vibrations that the vibration-proof unit 14 described above isolates vibrations. However, transmission of low-frequency vibrations to the fine movement stage FS can be suppressed as much as possible. Further, since each of the voice coil motors 86 constituting each weight canceling mechanism 60 can generate a driving force in the Z-axis direction (see arrows C ₁ , C ₂ , C _{3 in} FIG. 5), each voice coil By making the motor driving force the same, the fine movement stage FS can be driven in the Z-axis direction with respect to the coarse movement stage RS, and by making the driving force of each voice coil motor different, the fine movement stage The FS can be driven in the rotation direction (θx) around the X axis and the rotation direction (θy) around the Y axis.

  Further, since the upper surface of the pad portion 74 and the lower surface of the fine movement stage FS and the lower surface of the pad portion 74 and the upper surface of the piston member 76 are maintained in non-contact by the atmospheric pressure in the air chamber 90, the XY surface of the fine movement stage FS. It is possible to support the own weight in a state in which the minute movement in the inside and the inclination in the inclination direction with respect to the XY plane are allowed.

  In the self-weight canceling mechanism 60 of the present embodiment, the voice coil motor 86 is disposed at the top, so that maintenance and assembly can be performed relatively easily. Moreover, since the volume of the air chamber 90 can be increased for the overall size by arranging the voice coil motor in the upper part, it is possible to effectively use the space and to downsize the apparatus. . Furthermore, in this embodiment, since a moving magnet type voice coil motor in which a permanent magnet is disposed on the fine movement stage FS side is employed as the voice coil motor, there is no connection of wiring to the fine movement stage FS side. Accordingly, since the fine movement stage FS is completely non-contact with other members, it is possible to eliminate the transmission of vibrations via the other members, and there is no drag of the wiring. It is possible to realize a fine movement of the fine movement stage.

  Returning to FIG. 2, a part of the lower surface of coarse movement stage RS faces convex portions RBSb and RBSc provided on the upper surface of reticle stage surface plate RBS, and an air bearing 136 (FIG. 2 and the like are not shown (see FIG. 10). The air bearing 136 levitates and supports the coarse movement stage RS so that the coarse movement stage RS can move two-dimensionally in the XY plane in a state of being slightly spaced from the convex portions RBSb and RBSc.

  Furthermore, as shown in FIG. 4, movers 94 a and 94 b and a mover 95 are provided on the side surface on the + X side of the coarse movement stage RS. Moreover, movers 94c and 94d are provided on the side surface on the -X side. Each of the movers 94a, 94b, 94c, and 94d is an armature unit that includes a T-shaped casing having an XZ cross section and an armature coil provided in the casing. An armature unit including a casing having a T-shaped XZ section (the length in the Y-axis direction is set shorter than that of the movers 94a to 94d) and an armature coil provided in the casing. .

  As shown in FIG. 2, the movers 94a and 94b and the mover 95 are engaged with a stator 98A whose longitudinal direction is the Y-axis direction, and the movers 94c and 94d are in the Y-axis direction. Is in a state of being engaged with a stator 98B having a longitudinal direction.

  The stator 98A includes a main body member 99 having a U-shaped (U-shaped) XZ cross section, and on the upper and lower opposing surfaces inside the main body member 99, as shown in FIG. A plurality of permanent magnets 109a and 109b are arranged in the Y-axis direction. The permanent magnets 109a and 109b have opposite polarities between magnets opposed in the Z-axis direction and magnets adjacent in the Y-axis direction. Further, permanent magnets 110 a and 110 b whose longitudinal direction is the Y-axis direction are provided on the inner upper surface and lower surface of the main body member 99. The permanent magnet 110a and the permanent magnet 110b have opposite polarities.

In the present embodiment, the driving force in the Y-axis direction is generated by electromagnetic interaction between the magnetic field formed by the plurality of permanent magnets 109a and 109b and the current flowing through the armature coils in the movers 94a and 94b. (See arrows D ₁ and D _{2 in} FIG. 5). That is, in this embodiment, the stator 98A (permanent magnets 109a and 109b) and the movers 94a and 94b constitute the Y-axis linear motor YLM1 shown in FIG.

  Furthermore, in this embodiment, a minute driving force along the X axis is generated by electromagnetic interaction between the magnetic field formed by the permanent magnets 110a and 110b and the current flowing through the armature coil in the mover 95. (See arrow E in FIG. 5). That is, in the present embodiment, the stator 98A (permanent magnets 110a and 110b) and the mover 95 constitute an X-axis voice coil motor XVM (see FIG. 10).

  Here, the stator 98A will be described in more detail. As shown in FIG. 7 and FIG. 8, the main body member 99 has the same length in the Y-axis direction as the main body member 99, and the XZ cross section is substantially L-shaped. The pad support member 101 is fixed.

  The pad support member 101 is formed with L-shaped portions 108a and 108b that protrude in the + X direction at two locations separated by a predetermined distance in the Y-axis direction, and each of the L-shaped portions 108a and 108b. The air pads 103A and 103B are provided. Also, as shown in FIG. 7, air pads 105A and 105B are provided at two locations (Y positions corresponding to the two L-shaped portions) at a predetermined distance in the Y-axis direction on the lower surface of the pad support member 101. ing. Gas is ejected from these air pads 103A, 103B, 105A, 105B at a predetermined pressure.

  As can be seen from FIG. 7, the air pads 103A and 103B face the first inclined surfaces 207a of the fixing members 107A and 107B having a substantially L-shaped XZ cross section fixed on the reticle base RBS. , 105B are in a state of facing the second inclined surface 207b of the fixing members 107A, 107B, as shown in FIG. In this case, the component force Fax in the X-axis direction of the force Fa generated by the air pad 103A (or 103B) and the component force Fbx in the X-axis direction of the force Fb generated by the air pad 105A (or 105B) are opposite and the same. The component force Fz of the force Fa generated by the air pad 103A (or 103B) with respect to the Z-axis direction and the component force Fbz of the force Fb generated by the air pad 105A (or 105B) with respect to the Z-axis direction. Therefore, the stator 98A can be supported in a non-contact manner with respect to the fixing members 107A and 107B.

  In this case, the air pads 103A, 103B, 105A, and 105B allow the movement of the stator 98A in the X-axis direction, the Z-axis direction, the θx direction, the θy direction, and the θz direction with respect to the fixing members 107A and 107B. As a result, the stator 98A can move only in the Y-axis direction.

The other stator 98B is also bilaterally symmetric, but is configured in substantially the same manner as the stator 98A (except that the permanent magnets 110a and 110b are not provided). That is, in this embodiment, the Y axis linear motor YLM2 is configured by the stator 98B and the movers 94c and 94d engaged therewith, and the current flowing through the armature coils in the movers 94c and 94d, A driving force in the Y-axis direction (directions indicated by arrows D ₃ and D ₄ in FIG. 5) can be applied by electromagnetic interaction with the magnetic field formed by the permanent magnets constituting the stator 98B. ing.

  Accordingly, the coarse movement stage RS is driven in the Y-axis direction by the Y-axis linear motor YLM2 and the Y-axis linear motor YLM1 described above, and the driving force of each Y-axis linear motor is made different, so that It is also possible to drive in the rotation direction (θz direction). Further, the stator 98B can move only in the Y-axis direction with respect to the fixing members 107C and 107D (refer to FIG. 8 for the fixing member 107D) by the air pad similarly to the stator 98A.

  Here, the stators 98A and 98B are arranged so that the coarse movement stage RS is driven in the Y axis direction by the Y axis linear motors YLM1 and YLM2 and receives the reaction force generated by the drive. It functions as a reaction force cancellation mechanism that moves to the opposite side. Therefore, the positions of the stators 98A and 98B are adjusted between the reticle stage surface plate RBS and the stators 98A and 98B so that the stator 98A and the stator 98B do not move beyond a predetermined range in the Y-axis direction. Trim motors TM1 and TM2 are provided. These trim motors TM1 and TM2 are composed of a linear motor having a mover fixed to a stator 98A (98B) and a stator fixed on a reticle stage surface plate RBS. The main controller 50 (see FIG. 10). ), The position of the stators 98A and 98B in the Y-axis direction is adjusted by generating a driving force in the Y-axis direction.

  In addition, together with the trim motors TM1 and TM2, a damper member for preventing the stators 98A and 98B from exceeding a predetermined range is positioned at a predetermined distance from the + Y end portions of the stators 98A and 98B and at the −Y end. It is good also as providing in the position of predetermined distance from a part.

  Furthermore, in this embodiment, the coarse movement stage RS is opposite to the fine movement stage FS when it receives a reaction force caused by movement of the fine movement stage FS in the X-axis direction (movement in the direction of arrow A in FIG. 5). Move to the side. That is, the coarse movement stage RS also functions as a reaction force cancellation mechanism that cancels the reaction force caused by the movement of the fine movement stage FS in the X-axis direction.

  Next, an interferometer system 140 (see FIG. 10) that measures the position of fine movement stage FS will be described with reference to FIGS. 9 (A), 9 (B), and the like.

  The interferometer system 140 of the present embodiment employs a double-pass method, and includes an interferometer 21A and an interferometer 21B shown in FIG. 2, and a fine movement stage shown in FIGS. 9A and 9B. Four optical units 111, 112, 113, 114 provided on the side portion of the FS on the + X side, a movable mirror 115 (see FIG. 4) provided on the side of the + Y side of the fine movement stage FS, and FIG. As shown in FIG. 4, a part of the fixed mirror 116 includes a columnar fixed mirror 116 disposed in a gap between the fine movement stage FS and the coarse movement stage RS. Interferometers 21A and 21B are fixed to projection optical system PL via a frame (metrology frame) (not shown).

  The fixed mirror 116 is formed of a rectangular parallelepiped member, and the + Z side surface (116b) and the -X side surface (116a) are mirror-finished to be reflective surfaces (hereinafter, these surfaces are referred to as reflective surfaces). 116b and the reflecting surface 116a). As shown in FIG. 8, the fixed mirror 116 is inserted into an opening 12a formed in the plate-like member 12 and an opening RBSa formed in the reticle stage surface plate RBS, which is not shown. However, its lower end is fixed to the projection optical system PL via a frame (metrology frame) (not shown). The coarse movement stage RS has a notch 158a for avoiding mechanical interference with the fixed mirror 116 (see FIG. 4 and the like).

  As shown in FIG. 2, the interferometer 21 </ b> A has three beams that do not interfere with the coarse movement stage RS via the round holes 201 a, 201 b, 201 c formed in the coarse movement stage RS. The light is emitted toward the optical units 111, 112, 113, and 114 provided in the FS. One of the beams IZ is incident on the optical unit 111 and directed toward the reflecting surface 116b of the fixed mirror 116 via a mirror (not shown) provided inside as shown in FIG. 9B. Irradiated almost vertically. Then, the beam reflected by the reflecting surface 116b returns to the optical unit 111 again, and again toward the upper surface of the fixed mirror 116 via an internal beam splitter, a quarter-wave plate (λ / 4 plate), or the like. After being emitted and reflected by the reflecting surface 116b again, the light returns to the interferometer 21A via the optical unit 111.

  In addition, the beam IX1 enters the optical unit 112 and is irradiated substantially perpendicularly toward the reflecting surface 116a via a mirror (not shown) provided inside. Then, the beam reflected by the reflecting surface 116a of the fixed mirror 116 returns again to the optical unit 112, and is emitted again toward the reflecting surface 116a of the fixed mirror 116 via an internal beam splitter, a λ / 4 plate, or the like. After being reflected by the reflecting surface 116a, the optical unit 112 is returned to the interferometer 21A.

Further, the beam IX2 is incident on the optical unit 113 and branched into _two beams IX2 ₁ and IX2 ₂ via a mirror (not shown) provided inside. One of the beams IX2 ₁ of this is emitted substantially perpendicularly toward the reflecting surface 116a from the optical unit 113, the beam IX2 ₁ reflected by the reflecting surface 116a is returned to the optical unit 113 again, the interior of the beam splitter Then, the light is emitted again toward the upper surface of the reflecting surface 116a through a λ / 4 plate or the like. Then, after being reflected by the reflecting surface 116a, the optical unit 113 is returned to the interferometer 21A.

On the other hand, the other beam IX2 ₂ branched inside the optical unit 113 is incident on the optical unit 114, and is substantially perpendicular to the reflecting surface 116a of the fixed mirror 116 via a mirror (not shown) provided therein. Irradiated. Then, the beam reflected by the reflecting surface 116a returns to the optical unit 114 again, and is emitted again toward the reflecting surface 116a via the internal beam splitter, λ / 4 plate, etc., and is reflected by the reflecting surface 116a. Thereafter, the process returns to the optical unit 114. Then, the optical unit 114 and 112 are returned to the interferometer 21A.

Each beam returning to the interferometer 21A passes through an analyzer (not shown) provided in the interferometer 21A in a state of being coaxially combined with a reference beam (not shown) obtained in each optical unit. Then, interference light between each beam and each reference beam is output from the analyzer, the interference light is received by a photoelectric conversion element (not shown), and the positional information of fine movement stage FS with reference to fixed mirror 116 is the main control. Sent to the device 50. Here, the position information about the Z-axis direction of the fine movement stage FS can be obtained from the beam IZ, and the position information about the X-axis direction of the fine movement stage FS and the Z-axis direction are obtained from the beams IX1, IX2 ₁ and IX2 _2. Rotation information (yawing) and rotation information about the Y axis (rolling) can be measured.

  Returning to FIG. 2, the interferometer 21B irradiates two beams separated in the Z-axis direction to the movable mirror 115 provided in the fine movement stage FS through the round holes 201d and 201e formed in the coarse movement stage RS. is doing. Therefore, the interferometer 21B can measure the positional information about the Y-axis direction of the fine movement stage FS and the rotation information (pitching) about the X-axis by receiving the beam reflected by the reflecting surface of the movable mirror 115. It has become.

  Therefore, in the present embodiment, the interferometer unit 140 including the interferometers 21A and 21B measures the position information of the fine movement stage in the X, Y, and Z axis directions and the rotation information about the X, Y, and Z axes with high accuracy. Is possible.

  Note that the position or the like of the coarse movement stage RS in the Y-axis direction is measured using the encoder ENC shown in FIG.

  FIG. 10 is a block diagram showing a control system of the exposure apparatus 10 of the present embodiment. The control system of FIG. 10 includes a so-called microcomputer (or workstation) composed of a CPU (Central Processing Unit), ROM (Read Only Memory), RAM (Random Access Memory), etc. The main controller 50 is configured to be centrally controlled.

  Next, the flow of the exposure operation by the exposure apparatus 10 configured as described above will be briefly described.

  First, under the control of main controller 50, reticle R1 and R2 are loaded onto reticle stage RST with a reticle loader (not shown), and wafer W is loaded onto wafer stage WST with a wafer loader (not shown). In addition, using an alignment system ALG (see FIG. 10), an aerial image measuring device (not shown) provided on the wafer stage, etc., reticle alignment, baseline measurement (from the detection center of the alignment system ALG to the projection optical system) Preparatory work such as measurement of the distance to the optical axis of the PL is performed in a predetermined procedure.

  After that, the main controller 50 executes alignment measurement such as EGA (Enhanced Global Alignment) disclosed in Japanese Patent Application Laid-Open No. 61-44429 using the alignment detection system ALG, and after the alignment measurement is completed. A step-and-scan exposure operation is performed. Since this exposure operation is the same as the conventional step-and-scan method, its description is omitted.

  In this exposure operation, wafer stage WST and reticle stage RST are relatively driven in the Y-axis direction under the control of main controller 50. In this case, main controller 50 includes interferometer system 140 and encoder. Based on the measurement result by ENC, the coarse movement by the Y-axis linear motors YLM1 and YLM2, and the fine movement of the X voice coil motor 66X, the Y voice coil motor 66Y, the Z voice coil motor 86, and the X axis voice coil motor XVM, Thus, reticle stage RST is driven. At this time, main controller 50 controls the thrust generated by X-axis voice coil motor XVM so that coarse movement stage RS can move in the direction opposite to fine movement stage FS according to the movement of fine movement stage FS in the X-axis direction. To do.

  In the present embodiment, since reticle R1 and reticle R2 can be simultaneously placed on reticle stage RST, main controller 50 performs reticle alignment on reticle R1 and reticle R2, so that reticle stage is performed. Only by moving the reticle stage RST based on the measurement value of the interferometer system 140 without performing the reticle exchange operation with respect to the RST, the reticle R1 and the reticle R2 are switched, for example, disclosed in Japanese Patent Laid-Open No. 4-273245. So-called double exposure can be performed.

  As described above in detail, according to the present embodiment, the fine movement stage FS moves slightly in at least the X-axis direction relative to the coarse movement stage RS that is driven with a long stroke in the Y-axis direction. When the RS receives a reaction force generated by a minute movement of the fine movement stage FS in the X-axis direction, the RS moves in a direction opposite to the fine movement stage FS, and therefore, a reaction force in the X-axis direction generated by the movement of the fine movement stage FS is generated. Canceled and the occurrence of vibration is suppressed, so that the fine movement stage FS can be moved with high accuracy. In this embodiment, the X-axis voice coil motor XVM is controlled so that the coarse movement stage RS can be moved by the movement reaction force in the X-axis direction of the fine movement stage FS. However, the present invention is not limited to this. The X-axis direction position of the coarse movement stage RS may be actively controlled according to the target position of the FS in the X-axis direction.

  In this embodiment, the reticle stage RST and the drive mechanism (YLM1, YLM2, XVM, 66X, 66Y, 86) for driving the reticle stage RST are provided above the plate-like member 12 via the vibration isolation mechanism 14. Since the reticles R1 and R2 are driven in the direction of 6 degrees of freedom on the surface plate RBS, vibration transmission to the reticle stage RST via the plate member 12 and the reticle stage surface plate RBS can be avoided. It is possible to realize the movement of the reticle stage RST and thus the movement of the reticles R1 and R2.

  Further, according to the exposure apparatus 10 of the present embodiment, since the reticle stage device 20 capable of driving the reticle with high accuracy as described above is provided, the reticle can be moved with high accuracy, and the reticle can be moved. An image of the pattern formed on R1 (R2) can be formed on the wafer W with high accuracy.

  Further, according to the interferometer system of the present embodiment, the optical unit 111 for irradiating the measuring beam substantially perpendicularly toward the reflecting surface 116b of the columnar fixed mirror 116 and the reflecting surface 116a of the fixed mirror 116 are directed. Since the optical units 112, 113, and 114 that irradiate the beam substantially vertically are provided on the fine movement stage FS, the beams reflected by the reflecting surfaces 116 a and 116 b of the fixed mirror 116 in the laser interferometer 21 </ b> A are provided. By receiving the light, the position of the fine movement stage FS with respect to the X axis and the Z axis can be measured. Thereby, compared with the case where each reflective surface 116a, 116b is provided in a separate fixed mirror, a number of parts can be decreased and it is possible to simplify the structure of an interferometer system.

  Further, according to the interferometer system of the present embodiment, the fixed mirror 116 that reflects the beams emitted from the optical units 111 to 114 provided on the fine movement stage FS in order to measure the position of the fine movement stage FS includes the coarse movement stage. The position of the fine movement stage FS is provided in the vicinity of the fine movement stage FS because it is mechanically separated from the RS and the fine movement stage FS and is disposed in the gap between the coarse movement stage RS and the fine movement stage FS. By measuring using the fixed mirror 116, it is possible to suppress the influence of fluctuations in the surrounding atmosphere as much as possible. Thereby, it is possible to realize highly accurate position measurement of the fine movement stage FS.

  In the present embodiment, since the fixed mirror 116 is connected to the projection optical system PL via a frame (not shown), the position of the reticle can be measured with high accuracy based on the projection optical system PL. is there. Therefore, the pattern formed on the reticle can be projected onto the wafer W with high accuracy via the projection optical system PL.

  In the above-described embodiment, the case where two reticles R1 and R2 are placed on reticle stage RST (fine movement stage FS) has been described. However, the present invention is not limited to this, and one reticle or one reticle is used. Three or more may be placed.

  In the above embodiment, the case where the stage apparatus of the present invention is employed in the reticle stage apparatus 20 has been described. However, instead of or in combination with this, the stage apparatus of the present invention is employed in the wafer stage apparatus. Also good.

  In the above embodiment, the case where a voice coil motor having a circular cross section is employed as the voice coil motor of the self-weight canceling mechanism 60 shown in FIGS. 6A and 6B has been described. It is not a thing. That is, for example, in the case where the coarse movement direction (scanning direction) of the reticle stage RS (coarse movement stage RS) is the Y axis direction as in the above embodiment, in preparation for runaway or collision in the Y axis direction, Y It is desirable to take a large stroke in the axial direction. For example, a voice coil motor VCM as shown in FIG. 11 can be adopted.

  The voice coil motor VCM shown in FIG. 11 includes a rectangular frame-shaped stator 251 and a movable element 253 in which a rectangular groove 253a into which the rectangular frame-shaped stator 251 is inserted is formed.

  In this voice coil motor VCM, by setting the width Ly of the side extending in the X-axis direction of the rectangular shape about the groove 253a of the mover 253, it is possible to avoid runaway and collision in the Y-axis direction. By reducing the width Lx of the side extending in the X-axis direction of the rectangle, it is possible to minimize the loss of driving force in the Z-axis direction due to the wide width Ly.

  In the above embodiment, the position of the fine movement stage FS is measured using the reflecting surfaces 116a and 116b of the fixed mirror, and the fixed mirror is disposed in the gap between the fine movement stage FS and the coarse movement stage RS. When the coarse movement stage RS receives a reaction force generated by the movement of the fine movement stage FS in the X-axis direction, it moves to the opposite side of the fine movement stage, the reticle stage has 6 degrees of freedom, and the reticle stage surface plate Although the reticle stage apparatus including the features that the RBS is supported above the plate-like member 12 via the vibration isolation unit 14 has been described, the invention is not limited to this, and at least one of the features is included. Just go out.

  That is, for example, if at least one other feature is included, as the fixed mirror, a fixed mirror member having a reflective surface parallel to the XY plane and a fixed mirror member having a reflective surface parallel to the YZ plane are separately provided. It may be provided. Of course, not limited to the case of using a fixed mirror, as in the past, a movable mirror that is fixed to the fine movement stage and moves with the fine movement stage is provided, and fine movement is performed by irradiating the movable mirror with a beam from an interferometer. Position information related to the upper position of the stage in the X-axis direction and in the Z-axis direction may be detected.

  If at least one other feature is included, the fixed mirror 116 is provided on the outer side of the coarse movement stage RS without arranging the fixed mirror 116 in the gap between the fine movement stage FS and the coarse movement stage RS. It's also good.

  In addition, as long as at least one other feature is included, the coarse movement stage RS may not function as a counter mass, or the anti-vibration unit 14 may not be provided.

  In the above embodiment, the case where the coarse movement stage RS has a rectangular frame shape surrounding the fine movement stage has been described. However, the present invention is not limited to this, for example, in plan view (viewed from above). It may be U-shaped (U-shaped) or L-shaped. Even in this case, since a gap is formed between the coarse movement stage RS and the fine movement stage FS, the fixed mirror 116 can be disposed in the gap.

  In the above embodiment, the case where the reticle stage RST having the coarse / fine movement structure including the fine movement stage FS and the coarse movement stage RS has been described. However, the present invention is not necessarily limited to the case where the reticle stage having the coarse / fine movement structure is adopted. Absent.

  In the above-described embodiment, the case where the columnar fixed mirror 116 in which the + Z side surface and the −X side surface are reflecting surfaces is connected to the projection optical system PL via a frame (not shown) has been described. However, the present invention is not limited to this, and the columnar fixed mirror 116 in which the surface on the + Z side and the surface on the −X side are reflecting surfaces may not be connected to the projection optical system. A fixed mirror whose only surface is a reflecting surface may be connected to the projection optical system PL via a frame (not shown).

  In the above embodiment, rotation information about the X axis of fine movement stage FS is measured using reticle reference plates FM1 and FM2. However, the present invention is not limited to this, and for example, a measurement device (reticle) such as a multipoint focal position detection system is used. The tilt of the pattern surface of the reticle may be measured using a method called AF.

  In the above embodiment, the case where only one wafer stage WST is provided has been described. However, the present invention is not limited to this, and a twin stage type stage device including two wafer stages can be adopted. It is also possible to employ a stage apparatus including a wafer stage and a measurement stage as disclosed in the publication No. 2005/074014 pamphlet.

  Note that the present invention can also be applied to an immersion exposure apparatus disclosed in International Publication No. 2004/53955 pamphlet.

  In the above-described embodiment, the case where the present invention is applied to a scanning exposure apparatus such as a step-and-scan method has been described, but it is needless to say that the scope of the present invention is not limited to this. That is, the present invention can be suitably applied to a step-and-repeat reduction projection exposure apparatus.

  The semiconductor device is formed on the reticle using the step of designing the function and performance of the device, the step of manufacturing a reticle based on this design step, the step of manufacturing a wafer from a silicon material, and the exposure apparatus of the above embodiment. It is manufactured through a lithography step, a device assembly step (including a dicing process, a bonding process, and a packaging process), an inspection step, and the like that transfer the formed pattern onto an object such as a wafer. In this case, since the device pattern is formed on the object using the exposure apparatus of the above embodiment in the lithography step, it is possible to improve the productivity of a highly integrated device.

  As described above, the interferometer system of the present invention is suitable for measuring the position of an object. The exposure apparatus of the present invention is suitable for forming an image of a pattern formed on a mask on a substrate. The stage apparatus of the present invention is suitable for use in an exposure apparatus.

It is the schematic which shows the exposure apparatus which concerns on one Embodiment. It is a perspective view of the reticle stage apparatus of FIG. It is a top view of the fine movement stage of FIG. FIG. 3 is an exploded perspective view of the reticle stage of FIG. 2. It is a figure which shows typically the driving force which generate | occur | produces in a reticle stage apparatus. 6A is a longitudinal sectional view of a self-weight canceling mechanism provided in the reticle stage device, and FIG. 6B is a perspective view of FIG. 6A. It is a figure which shows the state which looked at the stator 98A from + X direction. FIG. 3 is a perspective view showing a state where a reticle stage is removed from FIG. 2. 9A and 9B are diagrams for explaining the interferometer system. It is a figure which shows the control system of the exposure apparatus which concerns on one Embodiment. It is a figure which shows the modification of the voice coil motor which comprises a self weight cancellation mechanism.

Explanation of symbols

  DESCRIPTION OF SYMBOLS 10 ... Exposure apparatus, 12 ... Plate-shaped member (support member), 14 ... Anti-vibration mechanism, 20 ... Reticle stage apparatus (stage apparatus), 21A ... Interferometer (light receiving system), 56 ... Optical sensor (measurement apparatus), 60 ... Self-weight cancel mechanism (support mechanism), 66X ... X voice coil motor (second drive device), 66Y ... Y voice coil motor (second drive device), 76 ... Piston member (piston), 78 ... Cylinder member (Cylinder), 86 ... Z voice coil motor (second drive device), 94a to 94d ... mover, 90 ... air chamber, 98A, 98B ... stator, 111 ... optical unit (second optical member), 112, 113, 114 ... Optical unit (first optical member), 116 ... Fixed mirror (fixed mirror member), 116a ... Reflecting surface (first reflecting surface), 116b ... Reflecting surface (second reflecting surface), 140 ... Interference System, FM1, FM2 ... reticle reference plate, FS ... fine movement stage (object), PL ... projection optical system, R1, R2 ... reticle (mask, pattern forming member), RBS ... reticle stage surface plate (surface plate), RS ... Coarse movement stage, RST ... reticle stage (stage mechanism), TM1, TM2 ... trim motor (adjustment device), W ... wafer (substrate), YLM1, YLM2, ... Y-axis linear motor (first drive device).

Claims (20)

An interferometer system for measuring a position of an object moving in a first axis direction in the second and third axis directions perpendicular to the first axis,
A columnar fixed mirror member having a first reflecting surface extending in the first axis direction and perpendicular to the second axis, and a second reflecting surface extending in the first axis direction and perpendicular to the third axis;
A first optical member which is provided on the object and irradiates a first beam for measuring a position of the object in the second axis direction substantially perpendicularly toward the first reflecting surface of the fixed mirror member;
A second optical member provided on the object and irradiating a second beam for measuring a position of the object in the third axis direction substantially perpendicularly toward the second reflecting surface of the fixed mirror member;
An interferometer system comprising: a light receiving system that receives a beam reflected by each reflecting surface of the fixed mirror member. A coarse movement stage that moves in a first axial direction in a horizontal plane and in a second axial direction orthogonal to the first axis in the horizontal plane;
A fine movement stage that moves at least in the second axis direction with respect to the coarse movement stage;
The coarse movement stage moves in a direction opposite to the fine movement stage when receiving a reaction force generated by a fine movement of the fine movement stage in the second axis direction. A first drive having a mover connected to the coarse movement stage and a stator for generating a drive force for driving the coarse movement stage in the first axial direction by electromagnetic interaction with the mover. Further comprising a device,
3. The stage according to claim 2, wherein the stator moves in a direction opposite to the coarse movement stage when receiving a reaction force generated by the movement of the coarse movement stage in the first axial direction. apparatus. A second driving device that finely drives the fine movement stage with respect to the coarse movement stage;
4. The stage device according to claim 2, wherein the second driving device finely drives the fine movement stage with six degrees of freedom with respect to the coarse movement stage. 5. Two reference plates provided on the fine movement stage at a predetermined interval in the first axis direction;
The stage device according to any one of claims 2 to 4, further comprising: a measuring device that measures a position of the two reference plates in a third axis direction orthogonal to the horizontal plane. The interferometer system according to claim 1, further comprising:
The stage apparatus according to any one of claims 2 to 5, wherein the interferometer system is used to measure the position of the fine movement stage or the coarse movement stage. A stage device disposed on a predetermined support member and driving a pattern forming member,
A surface plate provided above the support member;
A stage mechanism that drives the pattern forming member in a direction of six degrees of freedom on the surface plate;
And a vibration isolation mechanism provided between the surface plate and the support member. The stage mechanism is
A coarse movement stage that can move with a long stroke in the first axial direction using the upper surface of the surface plate as a movement guide surface;
A fine movement stage disposed on the coarse movement stage and holding the pattern forming member;
8. A support mechanism provided between the coarse movement stage and the fine movement stage, and supporting the fine movement stage along a third axis direction orthogonal to the movement guide surface. The stage apparatus as described.   The coarse movement stage moves in a direction opposite to the fine movement stage when receiving a reaction force generated by a fine movement of the fine movement stage in a second axis direction orthogonal to the first axis within the movement guide surface. The stage apparatus according to claim 8, wherein The coarse movement stage is driven in the first axial direction by a drive device including a stator movably provided on the surface plate and a mover connected to the coarse movement stage,
The stage according to claim 9, wherein the stator moves in a direction opposite to the coarse movement stage when receiving a reaction force generated by the movement of the coarse movement stage in the first axial direction. apparatus. An adjustment device for adjusting the position of the stator in the first axial direction;
The stage device according to claim 10, wherein the adjustment device is provided on the surface plate. The support mechanism includes a cylinder and a piston that forms an air chamber between the cylinder and the cylinder.
The stage apparatus according to any one of claims 8 to 11, wherein the cylinder is fixed to the coarse movement stage.   The stage device according to any one of claims 8 to 12, wherein the fine movement stage is finely driven with six degrees of freedom with respect to the coarse movement stage.   The stage apparatus according to claim 7, wherein the vibration isolation mechanism performs vibration isolation based on at least one of a position, a speed, and an acceleration of the surface plate. Two reference plates provided on the stage mechanism at predetermined intervals in a predetermined direction in a plane parallel to the surface of the surface plate;
The stage device according to any one of claims 7 to 14, further comprising: a measuring device that measures positions of the two reference plates in a direction perpendicular to the surface of the surface plate. The interferometer system according to claim 1, further comprising:
The stage apparatus according to any one of claims 7 to 15, wherein the interferometer system is used to measure a position of at least a part of the stage mechanism. A coarse movement stage that moves in a predetermined direction, a fine movement stage that is arranged with a gap with respect to the coarse movement stage and in the predetermined direction and moves in a predetermined direction with respect to the coarse movement stage, and the predetermined direction of the fine movement stage In a stage apparatus comprising: a fixed mirror member that reflects a beam irradiated along the predetermined direction from the fine movement stage in order to measure a position with respect to
The stage device characterized in that the fixed mirror member is disposed in the gap between the coarse movement stage and the fine movement stage in a state of being mechanically separated from the coarse movement stage and the fine movement stage. An exposure apparatus for forming an image of a pattern formed on a mask on a substrate,
An exposure apparatus comprising the stage device according to any one of claims 2 to 6, wherein either the mask or the substrate is held by a fine movement stage. An exposure apparatus for forming an image of a pattern formed on a mask on a substrate,
An exposure apparatus comprising the stage apparatus according to any one of claims 7 to 15. An exposure apparatus that projects a pattern formed on a mask onto a substrate via a projection optical system,
A stage apparatus according to claim 16 or 17,
The exposure apparatus characterized in that the fixed mirror member is connected to the projection optical system.

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