JP2006032930A - ドーピング装置 - Google Patents
ドーピング装置 Download PDFInfo
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- JP2006032930A JP2006032930A JP2005174372A JP2005174372A JP2006032930A JP 2006032930 A JP2006032930 A JP 2006032930A JP 2005174372 A JP2005174372 A JP 2005174372A JP 2005174372 A JP2005174372 A JP 2005174372A JP 2006032930 A JP2006032930 A JP 2006032930A
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Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2005174372A JP2006032930A (ja) | 2004-06-14 | 2005-06-14 | ドーピング装置 |
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004176230 | 2004-06-14 | ||
| JP2005174372A JP2006032930A (ja) | 2004-06-14 | 2005-06-14 | ドーピング装置 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006032930A true JP2006032930A (ja) | 2006-02-02 |
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Cited By (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2008288266A (ja) * | 2007-05-15 | 2008-11-27 | Advanced Lcd Technologies Development Center Co Ltd | 半導体膜の結晶化方法、半導体膜を有する基板 |
| JP2011129332A (ja) * | 2009-12-17 | 2011-06-30 | Nissin Ion Equipment Co Ltd | イオンビーム照射装置 |
| JP2011233387A (ja) * | 2010-04-28 | 2011-11-17 | Nissin Ion Equipment Co Ltd | ビーム電流密度分布の調整目標設定方法及びイオン注入装置 |
| JP2012059448A (ja) * | 2010-09-07 | 2012-03-22 | Nissin Ion Equipment Co Ltd | イオン注入方法及びイオン注入装置 |
| JP2017203987A (ja) * | 2016-05-13 | 2017-11-16 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | フレキシブル表示装置及びその製造方法並びにフレキシブル導電性パターン |
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| JPH03262130A (ja) * | 1990-03-13 | 1991-11-21 | Oki Electric Ind Co Ltd | 半導体素子の製造方法 |
| JPH05182923A (ja) * | 1991-05-28 | 1993-07-23 | Semiconductor Energy Lab Co Ltd | レーザーアニール方法 |
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| Publication number | Priority date | Publication date | Assignee | Title |
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| JP2008288266A (ja) * | 2007-05-15 | 2008-11-27 | Advanced Lcd Technologies Development Center Co Ltd | 半導体膜の結晶化方法、半導体膜を有する基板 |
| JP2011129332A (ja) * | 2009-12-17 | 2011-06-30 | Nissin Ion Equipment Co Ltd | イオンビーム照射装置 |
| JP2011233387A (ja) * | 2010-04-28 | 2011-11-17 | Nissin Ion Equipment Co Ltd | ビーム電流密度分布の調整目標設定方法及びイオン注入装置 |
| JP2012059448A (ja) * | 2010-09-07 | 2012-03-22 | Nissin Ion Equipment Co Ltd | イオン注入方法及びイオン注入装置 |
| JP2017203987A (ja) * | 2016-05-13 | 2017-11-16 | 三星ディスプレイ株式會社Samsung Display Co.,Ltd. | フレキシブル表示装置及びその製造方法並びにフレキシブル導電性パターン |
| JP7007106B2 (ja) | 2016-05-13 | 2022-01-24 | 三星ディスプレイ株式會社 | フレキシブル表示装置及びフレキシブル導電性パターン |
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