JP2006027925A5 - - Google Patents
Download PDFInfo
- Publication number
- JP2006027925A5 JP2006027925A5 JP2004205801A JP2004205801A JP2006027925A5 JP 2006027925 A5 JP2006027925 A5 JP 2006027925A5 JP 2004205801 A JP2004205801 A JP 2004205801A JP 2004205801 A JP2004205801 A JP 2004205801A JP 2006027925 A5 JP2006027925 A5 JP 2006027925A5
- Authority
- JP
- Japan
- Prior art keywords
- humidity sensor
- sensor material
- humidity
- alkoxide
- present
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000463 material Substances 0.000 claims description 310
- 239000011148 porous material Substances 0.000 claims description 207
- 229910004298 SiO 2 Inorganic materials 0.000 claims description 60
- 238000005259 measurement Methods 0.000 claims description 24
- 229910010413 TiO 2 Inorganic materials 0.000 claims description 11
- 229910006404 SnO 2 Inorganic materials 0.000 claims description 8
- -1 silicon alkoxide Chemical class 0.000 description 102
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 97
- 239000003054 catalyst Substances 0.000 description 66
- 238000000034 method Methods 0.000 description 57
- 239000010703 silicon Substances 0.000 description 57
- 229910052710 silicon Inorganic materials 0.000 description 57
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 50
- 238000004519 manufacturing process Methods 0.000 description 45
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 43
- 230000002378 acidificating effect Effects 0.000 description 37
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 36
- 239000003795 chemical substances by application Substances 0.000 description 35
- 229910052698 phosphorus Inorganic materials 0.000 description 35
- 239000011574 phosphorus Substances 0.000 description 35
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 30
- 239000011521 glass Substances 0.000 description 29
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 26
- 150000004703 alkoxides Chemical class 0.000 description 25
- 238000003756 stirring Methods 0.000 description 24
- 229910052726 zirconium Inorganic materials 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 22
- 229910052814 silicon oxide Inorganic materials 0.000 description 22
- 238000000465 moulding Methods 0.000 description 21
- 239000005373 porous glass Substances 0.000 description 20
- 238000005245 sintering Methods 0.000 description 19
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 18
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 18
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 18
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical class Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 description 17
- 238000001035 drying Methods 0.000 description 15
- 239000001257 hydrogen Substances 0.000 description 15
- 229910052739 hydrogen Inorganic materials 0.000 description 15
- 238000003980 solgel method Methods 0.000 description 15
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 14
- 239000010936 titanium Substances 0.000 description 14
- 230000003247 decreasing effect Effects 0.000 description 13
- 238000010438 heat treatment Methods 0.000 description 12
- 239000002245 particle Substances 0.000 description 12
- 238000002336 sorption--desorption measurement Methods 0.000 description 12
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 11
- 229910052796 boron Inorganic materials 0.000 description 11
- 229910052718 tin Inorganic materials 0.000 description 11
- 229910052719 titanium Inorganic materials 0.000 description 11
- 238000002156 mixing Methods 0.000 description 9
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 8
- LZZYPRNAOMGNLH-UHFFFAOYSA-M Cetrimonium bromide Chemical compound [Br-].CCCCCCCCCCCCCCCC[N+](C)(C)C LZZYPRNAOMGNLH-UHFFFAOYSA-M 0.000 description 8
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 8
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 8
- 239000003093 cationic surfactant Substances 0.000 description 8
- 230000007423 decrease Effects 0.000 description 8
- 229920006395 saturated elastomer Polymers 0.000 description 8
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 7
- 230000007062 hydrolysis Effects 0.000 description 7
- 238000006460 hydrolysis reaction Methods 0.000 description 7
- 239000000126 substance Substances 0.000 description 7
- 239000010409 thin film Substances 0.000 description 7
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 6
- 239000012298 atmosphere Substances 0.000 description 6
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- GPRLSGONYQIRFK-UHFFFAOYSA-N hydron Chemical compound [H+] GPRLSGONYQIRFK-UHFFFAOYSA-N 0.000 description 6
- 239000011159 matrix material Substances 0.000 description 6
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 5
- 238000009826 distribution Methods 0.000 description 5
- 239000000758 substrate Substances 0.000 description 5
- 238000004438 BET method Methods 0.000 description 4
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 4
- 238000002474 experimental method Methods 0.000 description 4
- 238000006068 polycondensation reaction Methods 0.000 description 4
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 3
- 235000011114 ammonium hydroxide Nutrition 0.000 description 3
- 125000004429 atom Chemical group 0.000 description 3
- 238000006243 chemical reaction Methods 0.000 description 3
- 150000001805 chlorine compounds Chemical class 0.000 description 3
- 239000008119 colloidal silica Substances 0.000 description 3
- 238000010411 cooking Methods 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 229910001873 dinitrogen Inorganic materials 0.000 description 3
- 238000003618 dip coating Methods 0.000 description 3
- 238000010494 dissociation reaction Methods 0.000 description 3
- 230000005593 dissociations Effects 0.000 description 3
- 238000010304 firing Methods 0.000 description 3
- 229910044991 metal oxide Inorganic materials 0.000 description 3
- 150000004706 metal oxides Chemical class 0.000 description 3
- 229910052760 oxygen Inorganic materials 0.000 description 3
- 239000001301 oxygen Substances 0.000 description 3
- RLOWWWKZYUNIDI-UHFFFAOYSA-N phosphinic chloride Chemical compound ClP=O RLOWWWKZYUNIDI-UHFFFAOYSA-N 0.000 description 3
- FAIAAWCVCHQXDN-UHFFFAOYSA-N phosphorus trichloride Chemical compound ClP(Cl)Cl FAIAAWCVCHQXDN-UHFFFAOYSA-N 0.000 description 3
- 229920000642 polymer Polymers 0.000 description 3
- 239000002243 precursor Substances 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- 238000011946 reduction process Methods 0.000 description 3
- 230000004044 response Effects 0.000 description 3
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 3
- LFQCEHFDDXELDD-UHFFFAOYSA-N tetramethyl orthosilicate Chemical compound CO[Si](OC)(OC)OC LFQCEHFDDXELDD-UHFFFAOYSA-N 0.000 description 3
- WOWHHFRSBJGXCM-UHFFFAOYSA-M cetyltrimethylammonium chloride Chemical compound [Cl-].CCCCCCCCCCCCCCCC[N+](C)(C)C WOWHHFRSBJGXCM-UHFFFAOYSA-M 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004528 spin coating Methods 0.000 description 2
- 102100030310 5,6-dihydroxyindole-2-carboxylic acid oxidase Human genes 0.000 description 1
- 101000773083 Homo sapiens 5,6-dihydroxyindole-2-carboxylic acid oxidase Proteins 0.000 description 1
- 229910020068 MgAl Inorganic materials 0.000 description 1
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 1
- 239000003377 acid catalyst Substances 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000004020 conductor Substances 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002343 gold Chemical class 0.000 description 1
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 1
- 230000010354 integration Effects 0.000 description 1
- 239000007788 liquid Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 230000001737 promoting effect Effects 0.000 description 1
- 239000002994 raw material Substances 0.000 description 1
- 230000004043 responsiveness Effects 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052709 silver Inorganic materials 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 229910052717 sulfur Inorganic materials 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004205801A JP2006027925A (ja) | 2004-07-13 | 2004-07-13 | 湿度センサー材料、湿度センサー材料を用いた湿度センサー及び湿度センサー材料を備えた電気機器 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004205801A JP2006027925A (ja) | 2004-07-13 | 2004-07-13 | 湿度センサー材料、湿度センサー材料を用いた湿度センサー及び湿度センサー材料を備えた電気機器 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2006027925A JP2006027925A (ja) | 2006-02-02 |
| JP2006027925A5 true JP2006027925A5 (cg-RX-API-DMAC7.html) | 2007-08-16 |
Family
ID=35894720
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2004205801A Pending JP2006027925A (ja) | 2004-07-13 | 2004-07-13 | 湿度センサー材料、湿度センサー材料を用いた湿度センサー及び湿度センサー材料を備えた電気機器 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2006027925A (cg-RX-API-DMAC7.html) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4700354B2 (ja) * | 2005-01-19 | 2011-06-15 | 財団法人川村理化学研究所 | シリカナノチューブ会合体及びその製造方法 |
| BR112012012518B1 (pt) * | 2009-11-25 | 2019-07-16 | Lg Chem, Ltd. | Catodo baseado em dois tipos de compostos e bateria secundária de lítio compreendendo o mesmo |
Family Cites Families (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH02260502A (ja) * | 1989-03-31 | 1990-10-23 | Seiko Epson Corp | 湿度センサ |
| JPH02260503A (ja) * | 1989-03-31 | 1990-10-23 | Seiko Epson Corp | 湿度センサ |
| JPH0354444A (ja) * | 1989-07-24 | 1991-03-08 | Seiko Epson Corp | 湿度センサ素子 |
| JP3417015B2 (ja) * | 1993-11-26 | 2003-06-16 | 東陶機器株式会社 | 多孔質部材及びその製造方法 |
| JPH08301672A (ja) * | 1995-05-01 | 1996-11-19 | Shin Etsu Chem Co Ltd | 多孔質焼結体用粉末の製造方法 |
| JP3757041B2 (ja) * | 1997-10-17 | 2006-03-22 | 株式会社豊田中央研究所 | 蒸気吸放出材料 |
| FR2776287B1 (fr) * | 1998-03-20 | 2000-05-12 | Ceramiques Tech Soc D | Materiau ceramique poreux massif homogene |
| JP4094830B2 (ja) * | 2000-11-24 | 2008-06-04 | 日本碍子株式会社 | 多孔質ハニカムフィルター及びその製造方法 |
| JP4160350B2 (ja) * | 2001-09-25 | 2008-10-01 | 三菱化学株式会社 | シリカ、及びシリカの製造方法 |
| JP3803862B2 (ja) * | 2001-10-23 | 2006-08-02 | 三菱マテリアル株式会社 | 湿度センサー及びその製造方法 |
| JP4470368B2 (ja) * | 2001-11-22 | 2010-06-02 | 三菱化学株式会社 | 異元素含有シリカゲル |
| JP3933979B2 (ja) * | 2002-04-23 | 2007-06-20 | 独立行政法人科学技術振興機構 | 表面修飾された多孔性シリカおよびその製造方法 |
| JP4160321B2 (ja) * | 2002-05-31 | 2008-10-01 | 三菱化学株式会社 | イオン伝導体用シリカゲル及びイオン伝導体、並びに燃料電池及びリチウムイオン二次電池 |
-
2004
- 2004-07-13 JP JP2004205801A patent/JP2006027925A/ja active Pending
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| Colomer et al. | High porosity silica xerogels prepared by a particulate sol–gel route: pore structure and proton conductivity | |
| Tomer et al. | Cubic mesoporous Ag@ CN: a high performance humidity sensor | |
| Wang et al. | Humidity sensors based on silica nanoparticle aerogel thin films | |
| Li et al. | Highly ordered mesoporous tungsten oxides with a large pore size and crystalline framework for H2S sensing | |
| CN108589272B (zh) | 含二氧化硅气凝胶的毡的制备方法和使用该制备方法制备的含二氧化硅气凝胶的毡 | |
| Prince et al. | Proposed general sol− gel method to prepare multimetallic layered double hydroxides: synthesis, characterization, and envisaged application | |
| Vichi et al. | Nanopore ceramic membranes as novel electrolytes for proton exchange membranes | |
| KR101323303B1 (ko) | 다공성 복합화합물 및 그 제조방법, 다공성 복합화합물을 함유한 시멘트 조성물 | |
| EP0952965A2 (en) | Method for producing porous inorganic materials | |
| CN105606656B (zh) | 一种抗硅抗硫中毒的热线型甲烷传感器 | |
| JP3869318B2 (ja) | プロトン伝導性薄膜およびその製造方法 | |
| CN102441375B (zh) | 均相介孔氧化铑/氧化铝复合催化材料及制备方法和应用 | |
| Nidhi et al. | Single-pot hydrothermal derived TiO2/SBA-16 cubic mesoporous nanocomposite for humidity sensing | |
| Othman et al. | Radiation synthesis of porous calcium silicate aerogel derived from polyacrylamide hydrogel as thermal insulator | |
| JP2006027925A5 (cg-RX-API-DMAC7.html) | ||
| Ma et al. | Aqueous route synthesis of mesoporous ZrO 2 by agarose templation | |
| JP2006027925A (ja) | 湿度センサー材料、湿度センサー材料を用いた湿度センサー及び湿度センサー材料を備えた電気機器 | |
| Kruefu et al. | Effects of Niobium‐Loading on Sulfur Dioxide Gas‐Sensing Characteristics of Hydrothermally Prepared Tungsten Oxide Thick Film | |
| CN110376252B (zh) | 一种SnO2纳米粉体及透明气体传感器的制备方法 | |
| Dhariwal et al. | Efficient fabrication of CrFeO3‐based humidity sensing device with fast dynamics for real‐time breath monitoring and contact‐less sensing | |
| Colomer et al. | Transport properties of fast proton conducting mesoporous silica xerogels | |
| JP2000053479A (ja) | セラミック拡散制限層の製造方法ならびにこの層の使用方法 | |
| CN107497433B (zh) | 一种复合光催化硅藻板及其制备方法 | |
| JP2019152623A (ja) | ガスセンサー素子、ガスセンサー素子の製造方法、およびガスセンサー | |
| JP3577544B2 (ja) | ガスセンサおよび金属酸化物薄層表面状態制御方法。 |