JP2006024652A5 - - Google Patents

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Publication number
JP2006024652A5
JP2006024652A5 JP2004199870A JP2004199870A JP2006024652A5 JP 2006024652 A5 JP2006024652 A5 JP 2006024652A5 JP 2004199870 A JP2004199870 A JP 2004199870A JP 2004199870 A JP2004199870 A JP 2004199870A JP 2006024652 A5 JP2006024652 A5 JP 2006024652A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2004199870A
Other languages
Japanese (ja)
Other versions
JP2006024652A (ja
JP4286733B2 (ja
Filing date
Publication date
Application filed filed Critical
Priority claimed from JP2004199870A external-priority patent/JP4286733B2/ja
Priority to JP2004199870A priority Critical patent/JP4286733B2/ja
Priority to EP05765494A priority patent/EP1783832A4/en
Priority to CN200810089719.1A priority patent/CN101256999B/zh
Priority to KR1020077014093A priority patent/KR100786166B1/ko
Priority to US11/631,635 priority patent/US20080067073A1/en
Priority to KR1020067004600A priority patent/KR100786156B1/ko
Priority to PCT/JP2005/012424 priority patent/WO2006004127A1/ja
Priority to TW094122867A priority patent/TW200614896A/zh
Publication of JP2006024652A publication Critical patent/JP2006024652A/ja
Publication of JP2006024652A5 publication Critical patent/JP2006024652A5/ja
Publication of JP4286733B2 publication Critical patent/JP4286733B2/ja
Application granted granted Critical
Priority to US13/328,710 priority patent/US20120085655A1/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2004199870A 2004-07-06 2004-07-06 インターポーザおよびインターポーザの製造方法 Expired - Fee Related JP4286733B2 (ja)

Priority Applications (9)

Application Number Priority Date Filing Date Title
JP2004199870A JP4286733B2 (ja) 2004-07-06 2004-07-06 インターポーザおよびインターポーザの製造方法
KR1020067004600A KR100786156B1 (ko) 2004-07-06 2005-07-05 인터포저 및 인터포저의 제조 방법
PCT/JP2005/012424 WO2006004127A1 (ja) 2004-07-06 2005-07-05 インターポーザおよびインターポーザの製造方法
CN200810089719.1A CN101256999B (zh) 2004-07-06 2005-07-05 互连导电层及互连导电层的制造方法
KR1020077014093A KR100786166B1 (ko) 2004-07-06 2005-07-05 인터포저 및 인터포저의 제조 방법
US11/631,635 US20080067073A1 (en) 2004-07-06 2005-07-05 Interposer And Manufacturing Method For The Same
EP05765494A EP1783832A4 (en) 2004-07-06 2005-07-05 INTERPOSER AND METHOD FOR PRODUCING AN INTERPOSER
TW094122867A TW200614896A (en) 2004-07-06 2005-07-06 Interposer and interposer producing method
US13/328,710 US20120085655A1 (en) 2004-07-06 2011-12-16 Interposer and manufacturing method for the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2004199870A JP4286733B2 (ja) 2004-07-06 2004-07-06 インターポーザおよびインターポーザの製造方法

Publications (3)

Publication Number Publication Date
JP2006024652A JP2006024652A (ja) 2006-01-26
JP2006024652A5 true JP2006024652A5 (enExample) 2006-03-09
JP4286733B2 JP4286733B2 (ja) 2009-07-01

Family

ID=35797730

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004199870A Expired - Fee Related JP4286733B2 (ja) 2004-07-06 2004-07-06 インターポーザおよびインターポーザの製造方法

Country Status (1)

Country Link
JP (1) JP4286733B2 (enExample)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2008066481A (ja) * 2006-09-06 2008-03-21 Shinko Electric Ind Co Ltd パッケージ、半導体装置、パッケージの製造方法及び半導体装置の製造方法
US8736066B2 (en) * 2010-12-02 2014-05-27 Tessera, Inc. Stacked microelectronic assemby with TSVS formed in stages and carrier above chip
US8587126B2 (en) 2010-12-02 2013-11-19 Tessera, Inc. Stacked microelectronic assembly with TSVs formed in stages with plural active chips
CN102918593B (zh) 2011-03-08 2016-07-13 松下知识产权经营株式会社 信息记录介质及其制造方法
JP6690142B2 (ja) * 2015-07-09 2020-04-28 大日本印刷株式会社 貫通電極基板、貫通電極基板の製造方法及び貫通電極基板を用いたインターポーザ
JP6341245B2 (ja) * 2016-09-05 2018-06-13 大日本印刷株式会社 貫通電極基板の製造方法、貫通電極基板および半導体装置
JP7022365B2 (ja) * 2017-03-24 2022-02-18 大日本印刷株式会社 貫通電極基板及びその製造方法
JP2018195661A (ja) * 2017-05-16 2018-12-06 大日本印刷株式会社 貫通電極基板、貫通電極基板の製造方法及び貫通電極基板を用いた半導体装置
US11078112B2 (en) * 2017-05-25 2021-08-03 Corning Incorporated Silica-containing substrates with vias having an axially variable sidewall taper and methods for forming the same
JP6369653B1 (ja) * 2018-05-17 2018-08-08 大日本印刷株式会社 貫通電極基板および半導体装置

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